Auxiliary powder dispersing device of atomic layer deposition equipment

Abstract

The invention belongs to the technical field of atomic layer deposition, and relates to an auxiliary powder dispersing device of atomic layer deposition equipment, which comprises a cylinder body, an outlet is formed in the side wall of the cylinder body, an inlet is formed in the bottom wall of the cylinder body, a containing cavity is formed in the cylinder body, and the containing cavity is respectively connected with the outlet and the inlet; the separation part is arranged in the containing cavity and divides the containing cavity into an electric field applying cavity and a heating reaction cavity, the electric field applying cavity is connected with the inlet, the electric field applying cavity is connected with the outlet, and the electric field applying cavity is connected with the heating reaction cavity. According to the invention, through an electrostatic-assisted dispersion technology, a powder sample can be dispersed more uniformly, and the agglomeration phenomenon is reduced, so that the contact area of powder and gas is increased, and the reaction efficiency is enhanced; due to the double-cavity design, the sampling process is more direct, simple and convenient, powder is prevented from remaining in the reaction cavity, and the cleanliness of equipment and the consistency of products are improved.

Description

Technical Field

[0001] The invention relates to the technical field of atomic layer deposition, and in particular to an atomic layer deposition equipment auxiliary powder dispersion device. Background Art

[0002] In traditional powder atomic layer deposition (ALD) technology, the dispersion and reaction efficiency of powder samples are key factors affecting product quality and production efficiency.

[0003] Existing powder ALD equipment usually adopts a single chamber design, in which the reaction process of the powder sample is directly carried out in a fixed chamber, which makes it easy for the powder sample to remain in the chamber, affecting the reaction effect of subsequent batches. In addition, due to the agglomeration of the powder sample, its contact area with the gas is reduced, reducing the reaction efficiency. Summary of the invention

[0004] In view of this, the present invention provides an auxiliary powder dispersion device for atomic layer deposition equipment.

[0005] Specifically, the present invention is achieved through the following technical solutions:

[0006] According to a first aspect of the present invention, there is provided an atomic layer deposition equipment auxiliary powder dispersion device, comprising:

[0007] A cylinder, wherein the side wall of the cylinder is provided with an outlet, the bottom wall of the cylinder is provided with an inlet, and a receiving cavity is provided in the cylinder, and the receiving cavity is connected to the outlet and the inlet respectively;

[0008] A partition is disposed in the accommodating chamber and divides the accommodating chamber into an electric field application chamber and a heating reaction chamber, wherein the electric field application chamber is connected to the inlet, the electric field application chamber is connected to the outlet, and the electric field application chamber is connected to the heating reaction chamber.

[0009] Optionally, a through hole is provided on the partition, and the electric field application chamber and the heating reaction chamber are connected through the through hole.

[0010] Optionally, a groove is provided on the inner wall of the cylinder, and the edge of the partition is correspondingly inserted into the groove.

[0011] Optionally, the outer wall surface of the cylinder protrudes outward to form a boss.

[0012] Optionally, the outer surface of the side wall of the cylinder protrudes outward to form the boss, and the inner surface of the side wall is recessed inward to form the groove.

[0013] Optionally, the partition is a filter screen, and an edge of the filter screen is connected to an inner wall of the accommodating cavity.

[0014] Optionally, the top opening cover of the cylinder is provided with a top cover.

[0015] Optionally, an inner cylinder is detachably inserted in the accommodating cavity, and the bottom of the inner cylinder is supported on the partition.

[0016] Optionally, the top cover is hinged to the top opening of the cylinder.

[0017] Optionally, a grip portion is provided on the top cover.

[0018] The technical solution provided by the present invention brings at least the following beneficial effects:

[0019] The present application provides an atomic layer deposition equipment assisted powder dispersion device which uses electrostatic assisted dispersion technology to disperse powder samples more evenly and reduce agglomeration, thereby increasing the contact area between powder and gas and enhancing reaction efficiency; the dual-chamber design makes the sampling process more direct and simple, avoids powder residue in the reaction chamber, reduces the risk of cross contamination, and improves the cleanliness of the equipment and the consistency of the product; the dual-chamber structure allows the movement of the reaction chamber, improves the flexibility of operation, and can adjust the working status of each chamber as needed to optimize the production process. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0021] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0022] Figure 1 A schematic diagram of the structure of an auxiliary powder dispersion device for atomic layer deposition equipment provided by an embodiment of the present invention;

[0023] Figure 2 A schematic diagram of the internal structure of an auxiliary powder dispersion device for an atomic layer deposition device provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0025] Figure 1 A schematic diagram shows an atomic layer deposition equipment auxiliary powder dispersion device applicable to an embodiment of the present invention.

[0026] Reference Figure 1-2 As shown, the present application provides an atomic layer deposition equipment auxiliary powder dispersion device, comprising:

[0027] A cylinder 10, wherein the side wall of the cylinder 10 is provided with an outlet 11, the bottom wall of the cylinder 10 is provided with an inlet 12, and the cylinder 10 is provided with a receiving cavity 13, and the receiving cavity 13 is connected to the outlet 11 and the inlet 12 respectively;

[0028] The partition 20 is arranged in the accommodating chamber 13, and divides the accommodating chamber 13 into an electric field application chamber 14 and a heating reaction chamber 15. The electric field application chamber 14 is connected to the inlet 12, the electric field application chamber 14 is connected to the outlet 11, and the electric field application chamber 14 is connected to the heating reaction chamber 15.

[0029] In the embodiment of the present application, the powder is placed in the heating reaction chamber 15 of the cylinder 10, and the two ends of the cylinder 10 are respectively connected to the positive and negative electrodes of the power supply, so that an electric field can be formed in the electric field application chamber 14. The electric field acts on the powder in the heating reaction chamber 15 above the electric field application chamber 14, so that each powder is charged with the same charge, and the powders repel each other. Then, gas is introduced into the inlet 12, and a vacuum pump is connected to the outlet 11. The gas passes through the electric field application chamber 14, the heating reaction chamber 15 and the outlet 11 from the inlet 12, thereby driving the powder to move in the heating reaction chamber 15. At the same time, the heating reaction chamber 15 heats the internal material and passes through the reaction site. The atomic layer deposition equipment auxiliary powder dispersion device shows significant technical advantages by combining electrostatic assisted dispersion technology and dual-chamber design. The following is a further elaboration of the characteristics of the device:

[0030] Cylinder design: The cylinder is the main body of the device, and its side wall and bottom wall are respectively provided with an outlet and an inlet, and these two openings are connected to the containing cavity in the cylinder. The containing cavity is used to load the powder sample and serves as the main place for powder dispersion and reaction.

[0031] Partition setting: The partition is located in the receiving chamber, which cleverly divides the receiving chamber into two independent functional areas: the electric field application chamber and the heating reaction chamber. The electric field application chamber is directly connected to the inlet, used to receive the powder sample and achieve uniform dispersion of the powder through the action of the electrostatic field. The heating reaction chamber is connected to the electric field application chamber (through the channel or gap on the partition) for the reaction of powder and gas.

[0032] Electrostatic assisted dispersion technology: By applying an electrostatic field in the electric field application chamber, the powder sample is subjected to the electrostatic force to achieve a more uniform dispersion. This technology significantly reduces the agglomeration between powder particles, thereby increasing the contact area between the powder and the gas. The increased contact area helps to improve the reaction efficiency because more powder particles can react with the gas at the same time. Dual-chamber design: The separate design of the electric field application chamber and the heated reaction chamber makes the sampling process more direct and simple. After the powder is dispersed in the electric field application chamber, the dispersed powder can be directly sent to the heated reaction chamber for reaction. This design avoids the residue of powder in the reaction chamber, thereby improving the cleanliness of the equipment and the consistency of the product. In addition, the dual-chamber design also helps to achieve segmented control of powder and gas, further improving the accuracy and controllability of the reaction.

[0033] The atomic layer deposition equipment auxiliary powder dispersion device has broad application prospects in the fields of materials science, nanotechnology, semiconductor manufacturing, etc. By improving the dispersion uniformity and reaction efficiency of powders, the device helps to improve the quality and performance of related products. At the same time, its dual-chamber design simplifies the sampling process, reduces the difficulty of operation and maintenance costs, and provides researchers and enterprises with more convenient and efficient experimental and production tools.

[0034] In summary, the atomic layer deposition equipment auxiliary powder dispersion device achieves uniform dispersion and efficient reaction of powder through innovative technical design, providing strong support for scientific research and production in related fields.

[0035] Exemplarily, a through hole is provided on the partition 20 , and the electric field application chamber 14 is connected with the heating reaction chamber 15 through the through hole.

[0036] In the embodiment of the present application, the through hole is used to allow gas to enter the heating reaction chamber 15 from the electric field application chamber 14 .

[0037] Exemplarily, a groove 16 is provided on the inner wall of the cylinder 10 , and the edge of the partition 20 is correspondingly inserted into the groove 16 .

[0038] In the embodiment of the present application, the groove 16 is used to fasten the edge of the partition 20 to facilitate the removal of the partition 20 .

[0039] Exemplarily, the outer wall surface of the cylinder 10 protrudes outward to form a boss 17 .

[0040] In the embodiment of the present application, the boss 17 is used to fit and install with an external structure (such as a fixing groove) so as to stably fix the cylinder 10.

[0041] Exemplarily, the outer surface of the side wall of the cylinder 10 protrudes outward to form the boss 17 , and the inner surface of the side wall is recessed inward to form the groove 16 .

[0042] In the embodiment of the present application, the inner surface of the same portion of the side wall on the cylinder 10 is recessed inwardly to form a groove 16 , while the outer surface of the portion is protruded outwardly to form a boss 17 .

[0043] Exemplarily, the partition 20 is a filter screen, and an edge of the filter screen is connected to the inner wall of the accommodating cavity 13 .

[0044] In the embodiment of the present application, the edge of the filter is fixed in the groove 16, and the gas enters the heating reaction chamber 15 from the electric field application chamber 14 through the filter. At the same time, the filter can also prevent powder from entering the electric field application chamber 14 from the heating reaction chamber 15.

[0045] Exemplarily, the top opening cover of the cylinder 10 is provided with a top cover 18 .

[0046] In the embodiment of the present application, the top cover 18 is rotatably assembled on the top opening of the cylinder 10 through a threaded structure, so that the top cover 18 can be opened conveniently to add powder into the cylinder 10 .

[0047] Exemplarily, an inner cylinder 19 is detachably inserted in the accommodating cavity 13 , and the bottom of the inner cylinder 19 is supported on the partition 20 .

[0048] In the embodiment of the present application, the bottom of the inner cylinder 19 is supported on the partition 20 , so that it can be pulled out of or inserted into the accommodating cavity 13 as needed.

[0049] Exemplarily, the top cover 18 is hinged to the top opening of the cylinder 10 .

[0050] In the embodiment of the present application, the top cover 18 is hinged to the top opening edge of the cylinder body 10 via a hinge.

[0051] Exemplarily, a grip portion 110 is provided on the top cover 18 .

[0052] In the embodiment of the present application, the gripping portion 110 is a convex column, which facilitates the rotation and operation of the top cover 18 .

[0053] The following is a further analysis of the ALD equipment's auxiliary powder dispersion device:

[0054] 1. Partition design

[0055] Through holes: The partition 20 is provided with through holes, which allow the gas to pass through the electric field application chamber 14 and enter the heating reaction chamber 15. This is a key channel for achieving effective reaction between powder and gas in the heating reaction chamber.

[0056] The groove is fixed to the partition: the groove 16 on the inner wall of the cylinder 10 is designed to fasten the edge of the partition 20. This design not only ensures the stability of the partition, but also facilitates the removal of the partition for cleaning or replacement.

[0057] Filter function: The partition 20 is designed with a filter, and its edge is fixed in the groove 16. The filter not only allows gas to pass through, but also effectively prevents powder from flowing back from the heating reaction chamber 15 to the electric field application chamber 14, thereby maintaining the independence and cleanliness of the two chambers.

[0058] 2. Cylinder design

[0059] Boss and fixation: The boss 17 on the outer wall surface of the cylinder 10 is designed to fit with the external structure (such as the fixing groove) to stably fix the cylinder. This design ensures the stability and safety of the equipment during operation.

[0060] Combination of groove and boss: At the same position of the side wall of the cylinder 10, the inner surface is concave inward to form a groove 16, and the outer surface is convex outward to form a boss 17. This design makes full use of the space of the cylinder, not only meets the fixing requirements of the partition, but also provides a connection point with the external structure.

[0061] Top cover design: The top opening cover of the cylinder 10 is provided with a top cover 18, which is rotatably assembled on the cylinder through a threaded structure. This design facilitates opening the top cover to add powder into the cylinder, while also ensuring the stability and sealing of the top cover.

[0062] Hinged top cover: In another design, the top cover 18 is hinged to the top opening edge of the cylinder 10. This design makes the opening and closing of the top cover more convenient while maintaining the integrity and aesthetics of the device.

[0063] Grip: A grip 110, such as a boss, is provided on the top cover 18 to facilitate rotation and operation of the top cover. This design improves the ease of use and user-friendliness of the device.

[0064] 3. Inner tube design

[0065] Removable inner cylinder: The inner cylinder 19 is removably inserted in the accommodating chamber 13, and its bottom is supported on the partition 20. This design allows the inner cylinder to be pulled out or inserted from the accommodating chamber as needed, which is convenient for cleaning, replacement or adjustment of the powder loading amount.

[0066] The atomic layer deposition equipment auxiliary powder dispersion device achieves uniform dispersion of powder, effective introduction of gas, stable fixation of equipment and convenient operation through ingenious partition design, cylinder design, top cover design and inner cylinder design. These design features not only improve the reaction efficiency and product consistency of the equipment, but also reduce the difficulty of operation and maintenance costs, providing strong support for the application of atomic layer deposition technology. The atomic layer deposition equipment auxiliary powder dispersion device provided in this application uses electrostatic assisted dispersion technology to disperse powder samples more evenly, reduce agglomeration, thereby increasing the contact area between powder and gas and enhancing reaction efficiency; the dual-chamber design makes the sampling process more direct and simple, avoids powder residue in the reaction chamber, reduces the risk of cross contamination, and improves the cleanliness of the equipment and the consistency of the product; the dual-chamber structure allows the movement of the reaction chamber, improves the flexibility of operation, and can adjust the working state of each chamber as needed to optimize the production process.

[0067] It should be noted that, in the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0068] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0069] In addition, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0070] In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0071] The foregoing is merely a specific embodiment of the present invention, which enables those skilled in the art to understand or implement the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features claimed herein.

Claims

1. An atomic layer deposition equipment auxiliary powder dispersion device, characterized in that: include: A cylinder, wherein the side wall of the cylinder is provided with an outlet, the bottom wall of the cylinder is provided with an inlet, and a receiving cavity is provided in the cylinder, and the receiving cavity is connected to the outlet and the inlet respectively; A partition is disposed in the accommodating chamber and divides the accommodating chamber into an electric field application chamber and a heating reaction chamber, wherein the electric field application chamber is connected to the inlet, the electric field application chamber is connected to the outlet, and the electric field application chamber is connected to the heating reaction chamber.

2. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 1, characterized in that: The partition is provided with a through hole, and the electric field application chamber is connected with the heating reaction chamber through the through hole.

3. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 1, characterized in that: The inner wall of the cylinder is provided with a groove, and the edge of the partition is correspondingly inserted into the groove.

4. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 3, characterized in that: The outer wall surface of the cylinder protrudes outwards to form a boss.

5. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 3, characterized in that: The outer surface of the side wall of the cylinder body protrudes outward to form the boss, and the inner surface of the side wall is recessed inward to form the groove.

6. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 1, characterized in that: The partition is a filter screen, and the edge of the filter screen is connected to the inner wall of the accommodating cavity.

7. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 1, characterized in that: The top opening cover of the cylinder is provided with a top cover.

8. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 7, characterized in that: An inner cylinder is detachably inserted in the accommodating cavity, and the bottom of the inner cylinder is supported on the partition.

9. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 7, characterized in that: The top cover is hinged to the top opening of the cylinder.

10. The device for assisting powder dispersion of atomic layer deposition equipment according to claim 7, characterized in that: A gripping portion is provided on the top cover.

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