Gasifier and liquid material gasification device

Abstract

The invention provides a gasifier and a liquid material gasification device. A vaporizer (3) for vaporizing a liquid material (LQ) by heating the liquid material (LQ) is provided with a spray chamber (121), a plurality of heating channels (122), and a tapered section (13). The liquid material (LQ) is sprayed into the spray chamber (121) in a mist form. The plurality of heating channels (122) extend from the spray chamber (121) at least in one axial direction (Da). The tapered section (13) has a tip that tapers in the axial direction at a communication section (123) between the spray chamber (121) and the heating flow path (122).

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority based on Japanese Patent Application No. 2023-158924 filed on September 22, 2023. The entire disclosure of the Japanese Patent Application is incorporated by reference into the disclosure of this specification. Technical Field

[0002] The invention relates to a gasifier and a liquid material gasification device. Background Art

[0003] In a DLI (Direct Liquid Injection) vaporizer, a gas-liquid mixture of a liquid material and a carrier gas is sprayed into a vaporization chamber through a nozzle to vaporize the liquid material. In addition, in recent years, due to the increase in film forming area in semiconductor manufacturing processes, it is necessary to vaporize the liquid material at a large flow rate and supply it to the semiconductor manufacturing equipment.

[0004] For example, in Japanese Patent Publication No. 2010-67906, a liquid raw material in the form of droplets is introduced into the diameter expansion space of the vaporization chamber together with a carrier gas. The vaporization chamber has a diameter expansion space, a guide space, and a lead-out space. The guide space is composed of a plurality of guide holes (hereinafter referred to as heating flow channels) vertically formed from the top to the bottom, and guides the droplets of the liquid raw material introduced into the diameter expansion space to the lead-out space. The droplets of the liquid raw material are vaporized when passing through the diameter expansion space, the guide space, and the lead-out space in sequence.

[0005] However, when the liquid material is vaporized at a large flow rate through multiple heating channels as in Japanese Patent Publication No. 2010-67906, residues of the liquid material may adhere to the connecting portion connected to the heating channels. If the residues adhere to more, the heating channels are blocked by the residues, or the flow rate of the liquid material in the heating channels is reduced. In addition, in the latter case, poor vaporization may occur due to the increase in flow rate in other heating channels. Summary of the invention

[0006] The present invention is made to solve the above-mentioned problems, and its purpose is to make the liquid material flow reliably to each heating flow channel of the vaporizer, and to fully vaporize the liquid material even at a large flow rate.

[0007] A vaporizer according to one aspect of the present invention heats a liquid material to vaporize the liquid material. The vaporizer includes a spray chamber, a plurality of heating channels, and a tapered portion. The liquid material is sprayed in the spray chamber in a mist form. The plurality of heating channels extend from the spray chamber in at least one axial direction. The tapered portion tapers toward the axial direction at the connecting portion between the spray chamber and the heating channels.

[0008] A liquid material vaporizing device according to another aspect of the present invention includes the above-mentioned vaporizer and a liquid material supply unit that supplies the liquid material to the vaporizer.

[0009] Further features and advantages of the present invention will become more apparent from the following embodiments.

[0010] According to the present invention, the liquid material can be reliably flowed to each heating flow channel of the vaporizer, and the liquid material can be fully vaporized even at a large flow rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1 It is a cross-sectional view schematically showing an example of the general structure of a liquid material vaporization device according to one embodiment of the present invention. Figure 2 It is a perspective cross-sectional view showing a structural example of a vaporizer included in the liquid material vaporization device. Figure 3A It is a cross-sectional view showing, in an enlarged manner, a first structural example of the communicating portion between the spray chamber and each heating flow channel in the vaporizer. Figure 3B This is a cross-sectional view of the communication portion of the first structural example as viewed obliquely from the other axial side. Figure 4A It is a cross-sectional view showing a first modified example of the cylindrical portion. Figure 4B It is a cross-sectional view showing a second modified example of the cylindrical portion. Figure 5A It is a cross-sectional view showing an enlarged second structural example of the communication portion. Figure 5B This is a cross-sectional view of the communicating portion of the second structural example as viewed obliquely from the other axial side. Fig. 6A It is a cross-sectional view showing an enlarged third structural example of the communication portion. Figure 6B This is a cross-sectional view of the communication portion of the third structural example as viewed obliquely from the other axial side. Fig. 7A It is a cross-sectional view showing, in enlarged form, a fourth configuration example and a fifth configuration example of the communication portion. Figure 7B This is a cross-sectional view of the communication portion of the fourth structural example as viewed obliquely from the other axial side. Figure 7C This is a cross-sectional view of the communication portion of the fifth structural example as viewed obliquely from the other axial side. Fig. 8A It is a cross-sectional view showing an enlarged sixth structural example of the communication portion. Figure 8B This is a cross-sectional view of the communication portion of the sixth structural example as viewed obliquely from the other axial side. Fig. 9 It is a perspective view showing a part of a static mixer as a heat exchange element provided in the vaporizer. Description of Reference Numerals

[0012] 1 liquid material vaporization device, 2 liquid material supply part, 21 gas-liquid mixing part, 22 actuator, 3 vaporizer, 31 heater, 32 cylinder, 321 frustum part, 322 pipe part, 323 frustum part, 4 connection part, 11 nozzle, 111 spray hole, 12 vaporization part, 121 spray chamber, 122, 122a heating flow channel, 123, 123a communication part, 124 convex part, 13 conical part, 131 first conical part, 132 second conical part, 133 tip part, 14 residue prevention layer, 15 heat exchange element, 150 fin, 151 first fin, 152 second fin, CG carrier gas, LQ liquid material, MG gas-liquid mixture, MGa mixed gas, CA central axis, JF, JFa first axis, JT second axis, Da axial one side, Db axial other side. DETAILED DESCRIPTION

[0013] Hereinafter, exemplary embodiments of the present invention will be described with reference to the drawings.

[0014] Figure 1 1 is a cross-sectional view schematically showing an example of the general structure of a liquid material vaporization device 1 according to an embodiment of the present invention. The liquid material vaporization device 1 is provided in, for example, a semiconductor manufacturing device (not shown). The liquid material vaporization device 1 includes a liquid material supply unit 2 and a vaporizer 3. The liquid material supply unit 2 and the vaporizer 3 are connected via a connection unit 4, but may be directly connected without passing through the connection unit 4.

[0015] The liquid material supply unit 2 supplies the liquid material LQ to the vaporizer 3. Such a liquid material supply unit 2 is composed of, for example, a flow control valve (flow regulating valve). In particular, in the present embodiment, the liquid material supply unit 2 supplies a gas-liquid mixture MG in which the liquid material LQ and the carrier gas CG are mixed to the vaporizer 3. The above-mentioned liquid material LQ is a liquid material of a desired gas used in a semiconductor manufacturing process. As the above-mentioned carrier gas CG, for example, an inert gas such as nitrogen or argon can be used.

[0016] The liquid material LQ and the carrier gas CG are mixed in the gas-liquid mixing section 21. The gas-liquid mixing section 21 is, for example, constructed to have a valve seat member and a valve core member. The valve core member is driven by the actuator 22 to contact or separate from the valve seat member. By contacting or separating the valve core member from the valve seat member, the supply of the liquid material LQ flowing through the gap between the valve seat member and the valve core member is turned on or off. In this way, the mixing of the liquid material LQ with the carrier gas CG can be switched on and off. The actuator 22 is, for example, composed of a piezoelectric stack in which a plurality of piezoelectric elements are stacked, but may also be composed of a solenoid or the like.

[0017] The vaporizer 3 heats the gas-liquid mixture MG to vaporize the liquid material LQ. Figure 2 It is a perspective cross-sectional view showing a structural example of the vaporizer 3 included in the liquid material vaporization device 1 . Figure 3A It is a cross-sectional view showing, in an enlarged manner, a first structural example of a communication portion 123 between a spray chamber 121 described later and each heating flow channel 122 described later in the vaporizer 3 . Figure 3B This is a cross-sectional view of the connecting portion 123 of the first structural example observed obliquely from the other axial direction Db side. In addition, the connecting portion 123 includes one axial end portion (particularly one axial end face) of the spray chamber 121 and the other axial end portion (particularly the inner circumferential surface of the other axial end portion) of each heating flow channel 122. In addition, the connecting portion 123 may also include the inner circumferential surface of one axial end portion of the spray chamber 121. Figure 2 and Figure 3B It means that the axis is perpendicular to the axis and contains Figure 1 The cross-sectional structure of the gasifier 3 virtually cut along the plane of the double-dotted chain line II-II. Figure 3A Corresponds to Figure 1 The dotted line encloses the cross-sectional structure of part IIIa. Figure 3B In order to facilitate understanding of the structure, the heater 31 is omitted from the illustration.

[0018] The vaporizer 3 includes a nozzle 11 and a vaporization portion 12 .

[0019] The vaporization section 12 of the vaporizer 3 is a cylindrical structure extending in the axial direction along the central axis CA, and has a spray chamber 121 and a plurality of heating channels 122 inside. Each heating channel 122 extends from the spray chamber 121 toward at least one axial direction Da of the axial end of the vaporization section 12. The other axial end of each heating channel 122 is an opening for the spray of the gas-liquid mixture MG to flow in, and is arranged at one axial end of the spray chamber 121 (particularly the connecting portion 123). One axial end of each heating channel 122 is an opening for the mixed gas MGa to flow out, and is arranged at one axial end surface of the vaporization section 12.

[0020] In addition, in the present embodiment, all the heating channels 122 extend in a straight line in the axial direction Da. However, this illustration does not exclude a structure in which all the heating channels 122 do not extend in the same manner. For example, when viewed from the axial direction, each heating channel 122 can also be arranged radially with the vicinity of the central axis CA as the center. In addition, the extension shape of a portion of the heating channel 122 may also be different from the extension shape of another portion of the heating channel 122. In addition, as long as one axial end of at least one heating channel 122 is arranged on an axial end face of the vaporization section 12, it may not extend in a straight line but extend in a curved manner, and may also extend in a direction intersecting the axial direction Da. Here, the direction intersecting the axial direction Da is a direction that includes at least one of a radial component and a circumferential component in addition to the axial direction Da component.

[0021] The spray hole 111 of the nozzle 11 is arranged at the other axial end surface of the spray chamber 121. The nozzle 11 sprays the gas-liquid mixture MG supplied from the liquid material supply unit 2 into the spray chamber 121 from the spray hole 111. The spray of the gas-liquid mixture MG flows from the spray chamber 121 to each heating flow channel 122.

[0022] In addition, a plurality of heaters 31 for heating the vaporization section 12 (particularly, the heating flow passages 122) are embedded in the vaporizer 3. The heaters 31 are columnar and extend in the axial direction, and a plurality of the heaters 31 are arranged in the circumferential direction around the central axis CA outside the spray chamber 121 and the plurality of heating flow passages 122. That is, the plurality of heaters 31 are arranged to surround the spray chamber 121 and the plurality of heating flow passages 122 at a position radially outward of the spray chamber 121 and the plurality of heating flow passages 122.

[0023] In addition, the vaporizer 3 also has a barrel 32. The barrel 32 is cylindrical and surrounds the central axis CA, and extends in an axial direction Da at an axial end of the vaporizer 3. In detail, the barrel 32 extends from an axial end surface of the vaporization section 12 toward an axial direction Da. An axial end of the barrel 32 is connected to a semiconductor manufacturing device not shown. The other axial end of the barrel 32 is arranged at a position radially outward than the axial ends of the plurality of heating channels 122 at an axial end surface of the vaporization section 12, and surrounds the axial ends of the plurality of heating channels 122. In the present embodiment, the other axial end of the barrel 32 surrounds the axial ends of all the heating channels 122. In addition, in the present embodiment, the axial ends of each heating channel 122 are connected to the inner peripheral edge of the axial end of the barrel 32 (refer to Figure 1 and Figure 2 ). However, the present invention is not limited to this example, and one axial end of at least one heating channel 122 may be separated from the other axial end of the cylinder portion 32 in the radially inward direction.

[0024] The mixed gas MGa flowing out from one axial end of each heating flow channel 122 merges inside the cylinder 32 and is supplied to a semiconductor manufacturing device (not shown). The cylinder 32 may be cylindrical or square.

[0025] In this embodiment, if Figure 1 and Figure 2 As shown, the inner diameter of the cylinder 32 is constant throughout the axial direction. Figure 1 and Figure 2 As an example, the inner diameter of one axial end portion of the cylindrical portion 32 may be different from the inner diameter of the other axial end portion of the cylindrical portion 32 . Figure 4A It is a cross-sectional view showing a first modified example of the cylindrical portion 32 . Figure 4B : is a cross-sectional view showing a second modified example of the tube portion 32. Figure 4A and Figure 4B Corresponds to Figure 1 The dashed line encloses the cross-sectional structure of part IV.

[0026] For example Figure 4A As shown, the inner diameter Wa1 of one axial end portion of the cylinder 32 may be smaller than the inner diameter Wb1 of the other axial end portion of the cylinder 32. Figure 4A In the embodiment, the cylinder 32 has a conical portion 321 and a tube portion 322. The conical portion 321 is a conical-shaped cylinder extending from one axial end surface of the gasification portion 12 toward one axial direction Da. As it moves toward the axial direction Da, the front end of the conical portion 321 becomes thinner, so that the inner diameter of the conical portion 321 becomes smaller. The tube portion 322 extends from one axial end of the conical portion 321 toward the axial direction Da. The inner diameter of the tube portion 322 is constant throughout the axial direction. Figure 4A In the embodiment, one axial end of the tube portion 322 is one axial end of the cylinder portion 32. The other axial end of the cylinder portion 32 is the other axial end of the frustum portion 321. Figure 4A The example does not exclude a structure in which the tube portion 322 is omitted. That is, one axial end portion of the cylinder portion 32 may be one axial end portion of the frustum portion 321.

[0027] Or Figure 4B As shown, the inner diameter Wa2 of one axial end portion of the cylinder 32 may be larger than the inner diameter Wb2 of the other axial end portion of the cylinder 32. Figure 4B In the embodiment, the cylinder 32 has a tube 322 and a frustum 323. The frustum 323 is a frustum-shaped cylinder extending from one axial end surface of the vaporization section 12 toward one axial direction Da. As the front end of the frustum 323 becomes thicker toward the axial direction Da, the inner diameter of the frustum 323 becomes larger. Figure 4B In the figure, the other axial end of the frustum portion 323 is the other axial end of the tube portion 32. The tube portion 322 extends from one axial end of the frustum portion 323 in one axial direction Da. Figure 4BThe structure of the tube portion 322 is Figure 4A The structure of the tube portion 322 is the same. In addition, Figure 4B The example does not exclude a structure in which the tube portion 322 is omitted. That is, one axial end portion of the cylinder portion 32 may be one axial end portion of the frustum portion 323.

[0028] The inner diameter Wa1 (or Wa2) of one axial end portion of the barrel 32 is different from the inner diameter Wb1 (or Wb2) of the other axial end portion, thereby making it possible to make the inner diameter Wa1 (or Wa2) of the connection port (i.e., one axial end portion of the barrel 32) connected to the semiconductor manufacturing device (not shown) of any size. That is, the inner diameter Wa1 (or Wa2) is not affected by the inner diameter Wb1 (or Wb2) of the other axial end portion of the barrel 32 and the configuration of the axial end portions of each heating flow channel 122 at the axial end surface of the vaporization section 12. Therefore, the inner diameter Wa1 (or Wa2) can be made into a size suitable for connection to the semiconductor manufacturing device (not shown).

[0029] In addition, in the cylinder 32, if a tubular member having a constant inner diameter and different from the inner diameter Wa1 and Wa2 of the tube 322 is provided instead of the frustum 321 and 323, a step having a plane perpendicular to the axial direction is formed inside the portion where the tubular member is connected to the tube 322. In this case, the flow channel cross-sectional area of ​​the mixed gas MGa in the cylinder 32 changes sharply at the step. Therefore, the mixed gas MGa is easily retained and its residue is easily attached at the step. In particular, when the inner diameter Wb1 of the other axial end of the cylinder 32 is larger than the inner diameter Wa1 of the tube 322, the step is formed at a position closer to the other axial side Db (i.e., the upstream side of the mixed gas MGa) than the tube 322. Therefore, the tendency that the mixed gas MGa is retained and its residue is easily attached is particularly significant when Wa1<Wb1.

[0030] In contrast, Figure 4A and Figure 4B In the embodiment, the above-mentioned step is not formed at the portion where the frustum portions 321 and 323 are connected to the tube portion 322, and the mixed gas MGa flowing near the inner peripheral surface of the cylinder portion 32 flows smoothly along the inner peripheral surfaces of the tapered frustum portions 321 and 323 toward the tube portion 322. Therefore, the mixed gas MGa does not stagnate at the portion where the frustum portions 321 and 323 are connected to the tube portion 322, and thus the adhesion of its residue can be effectively suppressed or prevented.

[0031] Especially in Figure 4AIn the embodiment, the step is not formed on the other axial direction Db side of the portion where the frustum portion 321 and the tube portion 322 are connected, so the flow channel cross-sectional area of ​​the mixed gas MGa in the cylinder portion 32 does not decrease sharply. In addition, the inner diameter of one axial end portion of the frustum portion 321 is the same as the inner diameter of the other axial end portion of the tube portion 322. Therefore, the retention of the mixed gas MGa and the adhesion of its residue on the inner peripheral surface of the cylinder portion 32 (especially near the portion where the frustum portion 321 and the tube portion 322 are connected) can be more reliably suppressed or prevented.

[0032] In addition, Figure 4B In the embodiment, by configuring the frustum portion 323, the flow channel cross-sectional area of ​​the mixed gas MGa in the cylinder portion 32 increases as it moves toward one axial direction Da. Therefore, the mixed gas MGa does not stay on the other axial direction Db side of the cylinder portion 32, but flows smoothly toward the semiconductor manufacturing device (not shown). Therefore, it is possible to prevent the residue of the mixed gas MGa from adhering to the other axial direction Db side of the cylinder portion 32. Thus, the mixed gas MGa can reliably flow toward the semiconductor manufacturing device, and a large volume of the mixed gas MGa can be fully supplied to the semiconductor manufacturing device.

[0033] In addition, in this embodiment, if Figure 4A and Figure 4B As shown, one axial end of each heating channel 122 is connected to the other axial end (inner circumference) of the barrel 32. As a result, the mixed gas MGa can be more effectively prevented from being retained on the other axial side Db of the barrel 32. Therefore, the mixed gas MGa can flow more smoothly toward the semiconductor manufacturing device. However, this illustration does not exclude a structure in which one axial end of at least one heating channel 122 leaves the other axial end (inner circumference) of the barrel 32 in the radially inward direction.

[0034] Liquid material LQ contained in the mist-sprayed gas-liquid mixture MG is heated and vaporized in the vaporization unit 12 (particularly the heating channel 122). Mixed gas MGa of vaporized liquid material LQ and carrier gas CG is discharged from one axial end of each heating channel 122 to a semiconductor manufacturing device (not shown).

[0035] In addition, at least a portion of the heating channels 122 are arranged in the circumferential direction around the central axis CA. The central axis CA passes through the spray hole 111 disposed on the other axial end surface of the spray chamber 121 and extends in the axial direction. For example, in this embodiment, all the heating channels 122 are arranged in the circumferential direction around the central axis CA (for example, see Figure 2 ).

[0036] Here, if Figure 5A and Figure 5BAs shown in the figures, a portion of the heating channels 122a may be arranged in the circumferential direction around the central axis CA, and another portion of the heating channels 122 may be arranged at a position closer to the inner radial direction than the heating channels 122 arranged in the circumferential direction. Figure 5A It is a cross-sectional view showing an enlarged second configuration example of the communication portion 123 . Figure 5B This is a cross-sectional view of the communication portion 123 of the second structural example as viewed obliquely from the other axial direction Db side. Figure 5A Corresponds to Figure 1 The dotted line encloses the cross-sectional structure of part IIIa. Figure 5B Corresponds to the line perpendicular to the axis and containing Figure 1 The cross-sectional structure of the gasifier 3 is virtually cut along the plane of the double-dotted line II-II. Figure 5B In order to facilitate understanding of the structure, the heater 31 is omitted from the illustration.

[0037] exist Figure 5A and Figure 5B The other axial end of the heating channel 122a of the other part is axially opposite to the spray hole 111. In addition, the first axis JFa passing through the center of the heating channel 122a of the other part and extending in the axial direction preferably passes through the spray hole 111, and more preferably coincides with the central axis CA of the vaporization part 12.

[0038] As a result, the spray of the liquid material LQ can flow more evenly to a portion of the heating flow channels 122 arranged in the circumferential direction. Furthermore, a portion of the spray of the gas-liquid mixture MG sprayed in a mist form from the spray hole 111 can flow directly to another portion of the heating flow channel 122a. Therefore, the residue of the liquid material LQ is less likely to adhere to the connecting portion 123a between the spray chamber 121 and another portion of the heating flow channel 122a and its vicinity.

[0039] At this time, it is further preferred that the inner diameter W2 of the other portion of the heating channel 122a is smaller than the inner diameter W1 of the portion of the heating channel 122 arranged in the circumferential direction (see Figure 5A ). Thus, the flow rate of the spray body in the heating flow channel 122a of the other part can be reduced and approached to the flow rate of the spray body in each of the heating flow channels 122 of the part arranged in the circumferential direction. That is, the flow rate difference between the two can be reduced or eliminated. This is because the spray body is more likely to flow to the heating flow channel 122a of the other part than to each of the heating flow channels 122 of the part. Therefore, even if Figure 5A Such a configuration can also make the flow rate of the spray body flowing to each heating channel 122, 122a more uniform. Therefore, it is possible to suppress or prevent the poor vaporization of the liquid material LQ caused by excessive flow (especially in the other part of the heating channel 122a). However, this example does not exclude the structure of W2≥W1.

[0040] In addition, the above examples do not exclude a structure in which at least a portion of the heating channels 122 are not arranged in the circumferential direction around the central axis CA, nor do they exclude a structure in which the other axial end of another portion of the heating channels 122a is not axially opposite to the spray hole 111. For example, when viewed from the other axial direction Db side, the plurality of heating channels 122 may be randomly arranged in two dimensions.

[0041] In addition, if Figure 3A to Figure 3B and Figure 5A to Figure 8B As shown, the spray chamber 121 of the vaporization section 12 of the vaporizer 3 also has a tapered portion 13. The tapered portion 13 is arranged at the connecting portion 123 between the spray chamber 121 and each heating channel 122. For example, as described later, the tapered portion 13 is arranged at at least one of the axial end portion of the spray chamber 121 (particularly the axial end surface of the spray chamber 121 facing the axial other direction Db) and the axial other end portion of each heating channel 122 (particularly the inner circumferential surface of the axial other end portion). In addition, the tapered portion 13 can also be arranged on the inner circumferential surface of the axial end portion of the spray chamber 121. The tapered portion 13 tapers toward the axial direction at the connecting portion 123 between the spray chamber 121 and the heating channel 122. Fig. 6A It is a cross-sectional view showing an enlarged view of a third structural example of the communication portion 123 . Figure 6B This is a cross-sectional view of the communication portion 123 of the third structural example as viewed obliquely from the other axial direction Db side. Fig. 7A It is a cross-sectional view showing, in enlarged form, a fourth configuration example and a fifth configuration example of the communication portion 123 . Figure 7B This is a cross-sectional view of the communication portion 123 of the fourth structural example as viewed obliquely from the other axial direction Db side. Figure 7C This is a cross-sectional view of the communication portion 123 of the fifth structural example as viewed obliquely from the other axial direction Db side. Fig. 8A It is a cross-sectional view showing an enlarged sixth structural example of the communication portion 123 . Figure 8B This is a cross-sectional view of the communication portion 123 of the sixth structural example as viewed obliquely from the other axial direction Db side. Fig. 6A , Fig. 7A and Fig. 8A Corresponds to Figure 1 The dotted line encloses the cross-sectional structure of part IIIa. Figure 6B , Figure 7B , Figure 7C and Figure 8B Corresponds to the line perpendicular to the axis and containing Figure 1 The cross-sectional structure of the gasifier 3 is virtually cut along the plane of the double-dotted line II-II. Figure 6B , Figure 7B , Figure 7C and Figure 8B In order to facilitate understanding of the structure, the heater 31 is omitted from the illustration.

[0042] like Figure 3A to Figure 3B and Figures 5A to 8A As shown, the above-mentioned tapered portion 13 is arranged in the above-mentioned connecting portion 123 between the spray chamber 121 and each heating flow channel 122, so that the spray of the gas-liquid mixture MG does not stay in the above-mentioned connecting portion 123, but flows smoothly to each heating flow channel 122. Therefore, it is possible to prevent the residue of the liquid material LQ sprayed in a mist form from adhering to the above-mentioned connecting portion 123. As a result, the liquid material LQ can be reliably flowed to each heating flow channel 122 of the vaporizer 3, and the liquid material LQ can be fully vaporized even in a large volume.

[0043] Preferably, a residue prevention layer 14 for repelling the liquid material LQ is disposed on the inner surface of at least one of the spray chamber 121 and the tapered portion 13. That is, the vaporizer 3 includes the residue prevention layer 14. More preferably, a residue prevention layer 14 is disposed on the inner surface of the tapered portion 13. For example, in this embodiment, Figures 6A to 8A As shown, a residue prevention layer 14 is arranged on the entire inner surface of the spray chamber 121 and the tapered portion 13. In addition, the residue prevention layer 14 can be arranged by a fluororesin coating process such as a PFA (perfluoroalkoxy alkane) process, a hydrophobic process based on laser irradiation to the above-mentioned inner surface, or the like. As a result, it is difficult for the liquid material LQ to adhere to the residue prevention layer 14 at the above-mentioned inner surface, so that the adhesion of the residue of the spray body of the liquid material LQ can be effectively suppressed or prevented. However, this illustration does not exclude a structure in which the residue prevention layer 14 is not arranged on the inner surface of the other axial side Db of the spray chamber 121, nor does it exclude a structure in which the residue prevention layer 14 is not arranged on the inner surface of the spray chamber 121 and the tapered portion 13.

[0044] Furthermore, it is preferred that Figure 3A to Figure 5B and Figure 8A to Figure 8B As shown, the conical portion 13 includes a first conical portion 131. The first conical portion 131 is disposed on an axial end surface of the spray chamber 121 and is a conical curved surface whose outer diameter decreases as it moves toward one axial direction Da or the other axial direction Db. In this case, a portion of the first conical portion 131 (for example, the other axial direction Db side) may also be disposed on the inner circumferential surface of one axial end portion of the spray chamber 121. For example, Figure 3A to Figure 5B and Figure 8A to Figure 8B In the embodiment, the first conical portion 131 refers to the portion from one axial end portion to the other axial end portion of the conical curved surface disposed on one axial end surface of the spray chamber 121. In addition, the conical shape here includes not only a conical shape with a pointed tip (e.g., a cone shape, a pyramid shape) but also a truncated cone shape with a flat tip (e.g., a truncated cone shape, a truncated pyramid shape). For example, in Figure 3A to Figure 3B , Figure 5A to Figure 5B and Figure 8A to Figure 8BIn the embodiment, the conical first tapered portion 131 is disposed on one axial end surface of the spray chamber 121, and its outer diameter decreases as it moves toward the axial direction Da. Figure 6A to Figure 6B In the embodiment, the conical first tapered portion 131 is disposed on one axial end surface of the spray chamber 121, and its outer diameter decreases as it moves toward the other axial direction Db. Figure 6A to Figure 6B In the embodiment, the first tapered portion 131 may also be in the shape of a frustum.

[0045] The first tapered portion 131 can reduce or eliminate a plane disposed at the communicating portion 123 on one axial end surface of the spray chamber 121 and intersecting (particularly orthogonal to) the axial direction. Figure 3A to Figure 3B , Figure 5A to Figure 5B and Figure 8B In the embodiment, the gas-liquid mixture MG can smoothly flow from the spray chamber 121 to each heating channel 122 at the connecting portion 123. In addition, the adhesion of the residue of the liquid material LQ at the axial end surface of the spray chamber 121 can be suppressed or prevented, especially at the Figure 3A to Figure 3B , Figure 5A to Figure 5B and Figure 8A to Figure 8B In this way, the attachment of the residue of the liquid material LQ to the axial end surface of the spray chamber 121 can be effectively suppressed or prevented. For example, near the first tapered portion 131, the airflow of the spray body flowing from the spray chamber 121 to each heating channel 122 flows in the axial direction Da along the first tapered portion 131 and flows into each heating channel 122. Therefore, it is difficult for the residue of the liquid material LQ to be generated in the first tapered portion 131. In addition, even if the residue is generated, the residue will be rushed to the heating channel 122 by the airflow.

[0046] In addition, in the present embodiment, the central axis (not shown) of the cone or frustum of the first tapered portion 131 coincides with the central axis CA of the gasification portion 12, passes through the center of gravity of the cone or frustum and extends in the axial direction. However, this illustration does not exclude a structure in which the central axis of the first tapered portion 131 does not coincide with the central axis CA. For example, the central axis of the first tapered portion 131 may extend in a direction obliquely intersecting the central axis CA, or may be away from the central axis CA.

[0047] Furthermore, it is preferred that Figures 7A to 8B As shown, the tapered portion 13 includes a second tapered portion 132. Figure 7A to Figure 7C In the embodiment, the tapered portion 13 includes only the second tapered portion 132. On the other hand, in Figure 8A to Figure 8B In the embodiment, the tapered portion 13 includes both a first tapered portion 131 and a second tapered portion 132 .

[0048] The second tapered portion 132 is disposed on the inner circumference of the other axial end of at least one heating channel 122 and is a truncated cone-shaped curved surface whose outer diameter decreases as it moves toward the axial direction Da. Figures 7A to 8BIn the figure, the second tapered portion 132 of each heating channel 122 refers to the portion from one axial end portion to the other axial end portion of the above-mentioned frustum-shaped curved surface disposed at the other axial end portion of the heating channel 122. Thus, the second tapered portion 132 can be used to allow the airflow of the spray body of the liquid material LQ to flow smoothly from the spray chamber 121 to each heating channel 122. In addition, by configuring the second tapered portion 132, the outer diameter of the other axial end portion of the heating channel 122 can be made larger than the inner diameter of the heating channel 122. Therefore, the area of ​​the plane formed on one axial end face of the spray chamber 121 can be reduced or eliminated. Thus, the generation of residues of the liquid material LQ can be suppressed or prevented.

[0049] More preferably, in at least two heating channels 122 adjacent in the circumferential direction with the central axis CA as the center, the second tapered portions 132 arranged in each heating channel 122 (i.e., the second tapered portions 132 adjacent in the circumferential direction) are connected in the circumferential direction. Further preferably, in all the heating channels 122 arranged in the circumferential direction, the second tapered portions 132 arranged in each heating channel 122 adjacent in the circumferential direction are connected in the circumferential direction. For example Figure 7C As shown in FIG. 1 , a tip portion 133 is disposed between the second tapered portions 132 adjacent in the circumferential direction. The tip portion 133 is composed of the second tapered portions 132 adjacent in the circumferential direction, and becomes sharper toward the other axial direction Db. In addition, when the second tapered portions 132 adjacent in the circumferential direction are in point contact, the tip portion 133 is a point shape when viewed from the axial direction, and is the contact point between the two. In addition, when the second tapered portions 132 adjacent in the circumferential direction are in line contact, the tip portion 133 is a line shape when viewed from the axial direction, and is the ridgeline between the two (refer to FIG. 1 ). Figure 7C and Figure 8B ). Thus, when viewed from the axial direction, each second tapered portion 132 can be further enlarged. Therefore, the airflow of the spray body of the liquid material LQ can flow smoothly to the heating flow channel 122. In addition, the area of ​​the plane formed on the axial end face of the spray chamber 121 can be further reduced or eliminated. Thus, the generation of the residue of the liquid material LQ can be further suppressed or prevented.

[0050] However, the above example is not limited thereto, and in at least a portion of the heating channels 122, the second tapered portions 132 disposed at the other axial ends of at least two heating channels 122 adjacent in the circumferential direction around the central axis CA (i.e., the second tapered portions 132 adjacent in the circumferential direction) may also be separated by a gap in the circumferential direction. Figure 7BAs shown in FIG. 1 , a portion of an axial end surface of the spray chamber 121 (i.e., the inner surface of the spray chamber 121 facing the other axial direction Db) is disposed between the second tapered portions 132 adjacent in the circumferential direction. Thus, when viewed from the axial direction, the size of each second tapered portion 132 can be made such that the second tapered portions 132 do not touch each other. Therefore, the second tapered portion 132 is easily formed.

[0051] In at least one heating channel 122, the first axis JF is preferably different from the second axis JT, and more preferably moves away from the second axis JT in a radially outward direction based on the central axis CA. In addition, the first axis JF is the central axis of the heating channel 122, passes through the center of the heating channel 122 and extends in the axial direction. The second axis JT is the central axis of the cone-shaped second tapered portion 132 disposed in the heating channel 122, passes through the center of gravity of the cone-shaped second tapered portion 132 and extends in the axial direction. For example, in Figures 7A to 8B In the embodiment, the first axis JF of each heating channel 122 is separated from the second axis JT of the second tapered portion 132 disposed at the other axial end portion of the heating channel 122 in the radially outward direction.

[0052] By offsetting the central axis (i.e., the first axis JF) of the heating flow channel 122 from the central axis (i.e., the second axis JT) of the second tapered portion 132, the degree of freedom in designing the layout of the second tapered portion 132 can be increased. In addition, the outer diameter of the other axial end of the second tapered portion 132 can be further increased. Furthermore, by offsetting the first axis JF from the second axis JT in the radially outward direction, the area of ​​the second tapered portion 132 (particularly the radially inward side) can be further increased. Therefore, the area of ​​the plane formed on the axial end face of the spray chamber 121 can be further reduced or eliminated. As a result, the generation of residues of the liquid material LQ can be further suppressed or prevented.

[0053] However, the above examples do not exclude a structure in which the first axis JF in at least one heating channel 122 moves away from the second axis JT in other directions perpendicular to the axial direction (e.g., radial inward direction, circumferential direction), nor do they exclude a structure in which the first axis JF of at least one heating channel 122 overlaps with the second axis JT in the heating channel 122.

[0054] Unless there is any particular contradiction, the tapered portion 13 may also be Figure 8A to Figure 8B As shown, it includes both the first tapered portion 131 and the second tapered portion 132. Alternatively, the tapered portion 13 may be as Figure 3A to Figure 3B and Figure 6A to Figure 6B As shown, only the first tapered portion 131 is included, or Figure 7A to Figure 7BAs shown, only the second tapered portion 132 is included. That is, the tapered portion 13 only needs to include at least one of the first tapered portion 131 and the second tapered portion 132 disposed at the other axial end of at least one heating channel 122 .

[0055] In addition, Figure 1 to Figure 8B In the embodiment, a tapered surface (reference numeral omitted) whose outer diameter decreases toward the other axial direction Db is arranged on the other axial end surface of the spray chamber 121. However, the present invention is not limited to this example, and the other axial end surface of the spray chamber 121 may be a flat surface.

[0056] In addition, if Figure 6A to Figure 6B and Figure 7C to Figure 8B As shown in FIG. 1 , a convex portion 124 that protrudes in the other axial direction Db may be arranged on one axial end surface of the spray chamber 121. The outer diameter of the convex portion 124 viewed from the axial direction decreases as it moves toward the other axial direction Db. The convex portion 124 may be as shown in FIG. Figure 7C As shown in the figure, it is a frustum, or it can be Figure 6A to Figure 6B and Figure 8A to Figure 8B As shown in FIG. 1 , the front end is a tapered shape with a sharp tip. Figure 6A to Figure 6B In the embodiment, the other axial end of each heating channel 122 is arranged on the other axial end surface of the convex portion 124. Therefore, the gas-liquid mixture MG flowing along the other axial end surface of the convex portion 124 can flow to each heating channel 122 more smoothly.

[0057] Preferably, the other axial end portion of the convex portion 124 tapers toward the other axial direction Db and faces the spray hole 111 disposed on the other axial end surface of the spray chamber 121 in the axial direction (see Fig. 8A The residue of the spray body of the liquid material LQ is easily attached to the area near the axial end surface of the spray chamber 121 that is axially opposite to the spray hole 111. Therefore, by configuring the convex portion 124 that tapers toward the other axial direction Db (i.e., the spray hole 111 side), the attachment of the residue near the above-mentioned area can be suppressed or prevented.

[0058] However, the above examples do not exclude a structure in which the other axial end of the projection 124 does not taper in the other axial direction Db, a structure in which the other axial end of the projection 124 does not face the spray hole 111 in the axial direction, or a structure in which the projection 124 is not disposed on one axial end surface of the spray chamber 121 .

[0059] Furthermore, the first to sixth configuration examples of the communication portion 123 described above can be implemented by combining at least a portion of the configurations with each other unless any particular contradiction occurs.

[0060] Next, the vaporizer 3 is provided with a heat exchange element 15. The heat exchange element 15 is arranged in each heating channel 122 and is in contact with the inner surface of the heating channel 122 at a predetermined position. The heat exchange element 15 is formed of, for example, a metal material having thermal conductivity. Examples of the above-mentioned metal material include SUS (stainless steel), copper, aluminum, titanium, and the like.

[0061] The heat exchange element 15 is, for example, a static mixer. Fig. 9 1 is a perspective view showing a part of a static mixer as a heat exchange element 15 provided in the vaporizer 3. The static mixer is configured by connecting a plurality of fins 150 in the axial direction. In addition, the number of fins 150 is not particularly limited as long as there are a plurality of fins. The liquid material LQ can be stirred in the heating flow channel 122 by using each fin 150. As a result, a more complex turbulent flow can be generated in the heating flow channel 122, and the heat exchange efficiency of the liquid material LQ can be improved, thereby improving the vaporization performance.

[0062] For example, the plurality of fins 150 include a first fin 151 and a second fin 152. The first fin 151 has a shape in which a flat plate is twisted clockwise around its central axis (reference numerals omitted) when viewed from one axial side Da. The second fin 152 has a shape in which a flat plate is twisted counterclockwise around its central axis when viewed from one axial side Da. The first fin 151 and the second fin 152 are alternately arranged in the axial direction and connected by welding or the like. If configured in this manner, the flow channel of the liquid material LQ is repeatedly divided (divided into the flow channel to the surface side and the back side of the fin 150) and the flow channels after division are merged in the heating channel 122 using the first fin 151 or the second fin 152. As a result, a more complex turbulence can be reliably generated in the heating channel 122, thereby achieving improved gasification performance.

[0063] In addition, the structure of the static mixer is not limited to Fig. 9 For example, at least one through hole extending in the axial direction or thickness direction may be provided on the flat plate of at least one of the first fin 151 and the second fin 152, or a partially open cutout may be formed around the flat plate. By providing the through hole in the static mixer, a flow channel passing through the through hole can be generated in the static mixer. Therefore, complex turbulence can be generated more reliably in the heating flow channel 122, thereby further improving the gasification performance.

[0064] In addition, a filler may be arranged in the heat exchange element 15 arranged in at least one heating flow channel 122 instead of a static mixer. The filler is composed of a metal granular material and a filter arranged on the upstream side and the downstream side of the flow channel relative to the granular material. The filler can achieve the same heat exchange efficiency as the static mixer. Therefore, even if the filler is used instead of the static mixer, the gasification performance of the liquid material LQ can be improved, and the gasification of the liquid material LQ at a large flow rate can be achieved.

[0065] In addition, the liquid material vaporization device 1 of the present embodiment is an internal mixing method in which the liquid material LQ and the carrier gas CG are mixed inside the liquid material supply part 2. However, not limited to this example, the liquid material vaporization device 1 may also be an external mixing method in which the liquid material LQ and the carrier gas CG are mixed outside the liquid material supply part 2. In the external mixing method, for example, the liquid material supply part 2 introduces the liquid material LQ into the vaporization part 12 via the nozzle 11, and introduces the carrier gas CG into the vaporization part 12 via other paths. Even in such an external mixing method, by applying the structure of the vaporizer 3 of the present embodiment, it is possible to improve the vaporization performance of the liquid material LQ and realize the vaporization of the liquid material LQ at a large flow rate, and there is no change in this aspect.

[0066] As mentioned above, although embodiment of this invention was described, the scope of this invention is not limited to this, It can expand or change and implement within the range which does not deviate from the summary of this invention.

[0067] The following is a summary of the embodiments described so far.

[0068] For example, the vaporizer 3 disclosed in this specification has the following structure (first structure). The vaporizer 3 heats the liquid material LQ to vaporize the liquid material LQ, and the vaporizer 3 comprises: a spray chamber 121 for spraying the liquid material LQ in a mist form; a plurality of heating channels 122 extending from the spray chamber 121 in at least one axial direction Da; and a tapered portion 13, which tapers toward the axial direction at the connecting portion 123 between the spray chamber 121 and the heating channel 122.

[0069] The vaporizer 3 having the above-mentioned first structure may have the following structure (second structure). The tapered portion 13 includes a first tapered portion 131 disposed on one axial end surface of the spray chamber 121 . The first tapered portion 131 is a tapered curved surface whose outer diameter decreases toward one axial direction Da or the other axial direction Db.

[0070] Furthermore, the vaporizer 3 having the first structure or the second structure may have the following structure (third structure). The tapered portion 13 includes a second tapered portion 132 disposed on the inner circumferential surface of the other axial end portion of at least one of the heating channels 122 . The second tapered portion 132 is a truncated cone-shaped curved surface whose outer diameter decreases toward the axial direction Da.

[0071] Furthermore, the vaporizer 3 having the third structure described above may have the following structure (fourth structure). In at least two circumferentially adjacent heating channels 122 , a tip portion 133 is arranged between the second tapered portions 132 arranged in each of the heating channels 122 . The tip portion 133 is composed of the circumferentially adjacent second tapered portions 132 and tapers toward the other axial direction Db.

[0072] Furthermore, the vaporizer 3 having the third structure or the fourth structure may have the following structure (fifth structure). In at least two of the heating channels 122 adjacent to each other in the circumferential direction, a portion of one axial end surface of the spray chamber 121 is disposed between the second tapered portions 132 disposed in the respective heating channels 122 .

[0073] Furthermore, the vaporizer 3 having any one of the third to fifth structures may have the following structure (sixth structure). In at least one of the heating channels 122 , a first axis JF passing through the center of the heating channel and extending in the axial direction is different from a second axis JT passing through the center of gravity of the frustum of the second tapered portion 132 disposed in the heating channel 122 and extending in the axial direction.

[0074] Furthermore, the vaporizer 3 having any one of the first to sixth structures may have the following structure (seventh structure). A convex portion 124 protruding in the other axial direction Db is arranged on one axial end surface of the spray chamber 121 . The other axial end of the convex portion 124 tapers in the other axial direction Db and faces the spray hole 111 arranged on the other axial end surface of the spray chamber 121 in the axial direction.

[0075] Furthermore, the vaporizer 3 having any one of the first to seventh structures may also have the following structure (eighth structure). A residue prevention layer 14 for repelling the liquid material LQ is disposed on the inner surface of at least one of the spray chamber 121 and the tapered portion 13 .

[0076] Furthermore, the vaporizer 3 having any one of the first to eighth structures may have the following structure (ninth structure). At least a portion of the heating flow path 122 is arranged in a circumferential direction around a central axis CA, and the central axis CA passes through the spray hole 111 disposed on the other axial end surface of the spray chamber 121 and extends in the axial direction.

[0077] Furthermore, the vaporizer 3 having any one of the first to eighth structures may also have the following structure (tenth structure). The vaporizer 3 also has a cylindrical portion 32 extending in an axial direction Da at one axial end portion of the vaporizer 3, and the other axial end portion of the cylindrical portion 32 surrounds one axial end portion of the heating flow channel 122, and the inner diameter Wa1 (or Wa2) of the one axial end portion of the cylindrical portion 32 is different from the inner diameter Wb1 (or Wb2) of the other axial end portion of the cylindrical portion 32.

[0078] Furthermore, the liquid material vaporizing device 1 disclosed in this specification has the following structure (eleventh structure). The liquid material vaporizing device 1 includes: a vaporizer 3 having any one of the first to tenth structures; and a liquid material supply unit 2 for supplying the liquid material LQ to the vaporizer 3 . Industrial Applicability

[0079] The present invention can be applied to, for example, a vaporizer provided in a front stage of a semiconductor manufacturing apparatus.

Claims

1. A vaporizer for vaporizing a liquid material by heating the liquid material, characterized in that: have: a spray chamber for spraying the liquid material in a mist form; A plurality of heating channels extending from the spray chamber in at least one axial direction; and The tapered portion tapers toward the axial direction at a connecting portion between the spray chamber and the heating flow channel.

2. The gasifier according to claim 1, characterized in that: The tapered portion includes a first tapered portion disposed on one axial end surface of the spray chamber. The first tapered portion is a tapered curved surface whose outer diameter decreases toward one axial direction or the other axial direction.

3. The gasifier according to claim 1 or 2, characterized in that: The tapered portion includes a second tapered portion disposed on the inner peripheral surface of the other axial end portion of at least one of the heating channels, The second tapered portion is a truncated cone-shaped curved surface whose outer diameter decreases toward one axial direction.

4. The gasifier according to claim 3, characterized in that: In at least two of the heating channels adjacent to each other in the circumferential direction, a tip portion is arranged between the second tapered portions arranged in each of the heating channels. The tip portion is formed by the second tapered portions adjacent to each other in the circumferential direction, and tapers toward the other direction in the axial direction.

5. The gasifier according to claim 3 or 4, characterized in that: In at least two of the heating flow channels adjacent to each other in the circumferential direction, a portion of one axial end surface of the spray chamber is disposed between the second tapered portions disposed in the respective heating flow channels.

6. The gasifier according to any one of claims 3 to 5, characterized in that: In at least one of the heating channels, a first axis passing through the center of the heating channel and extending in the axial direction is different from a second axis passing through the center of gravity of the frustum of the second tapered portion disposed in the heating channel and extending in the axial direction.

7. The gasifier according to any one of claims 1 to 6, characterized in that: A convex portion protruding in the other axial direction is arranged on one axial end surface of the spray chamber. The other axial end portion of the convex portion tapers in the other axial direction and faces the spray hole arranged on the other axial end surface of the spray chamber in the axial direction.

8. The gasifier according to any one of claims 1 to 7, characterized in that: A residue prevention layer for repelling the liquid material is disposed on an inner surface of at least one of the spray chamber and the tapered portion.

9. The gasifier according to any one of claims 1 to 8, characterized in that: At least a portion of the heating flow channels is arranged in a circumferential direction around a central axis, and the central axis passes through a spray hole arranged on the other axial end surface of the spray chamber and extends in the axial direction.

10. The gasifier according to any one of claims 1 to 9, characterized in that: The vaporizer further includes a cylindrical portion extending in one axial direction at one axial end portion of the vaporizer. The other axial end of the cylinder surrounds one axial end of the heating channel. An inner diameter of one axial end portion of the cylindrical portion is different from an inner diameter of the other axial end portion of the cylindrical portion.

11. A liquid material gasification device, characterized in that: have: The gasifier according to any one of claims 1 to 10; and The liquid material supply unit supplies the liquid material to the vaporizer.

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