Large-flow gas mixing system and method and semiconductor process equipment

Abstract

The invention relates to a high-flow gas mixing system and method and semiconductor process equipment. The large-flow gas mixing system comprises a first gas input unit, a second gas input unit, at least one first flow control unit, at least one second flow control unit, a first gas mixing unit, a first concentration analysis unit, a second gas mixing unit, a second concentration analysis unit, a first gas output unit and a second gas output unit. The flow control device has the advantages that the first gas input unit is communicated with the plurality of first flow control units, the second gas input unit is communicated with the plurality of second flow control units, and the plurality of second flow control units are used for controlling the flow at the same time, so that the flow control precision is improved, and the concentration precision is further improved; the first gas mixing unit is respectively communicated with the first flow control unit and the second flow control unit, and the first gas and the second gas are primarily mixed through the first gas mixing unit, so that the concentration uniformity of the whole system is improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor process gas mixing technology, and in particular to a large-flow gas mixing system, method and semiconductor process equipment. Background Art

[0002] The main application of gas mixing systems is to provide mixed gases with precise proportions and compositions, which are essential for the manufacturing process of semiconductor devices. They are used in a variety of process steps, including cleaning, annealing, atmosphere preparation, chemical vapor deposition (CVD), etching, gas phase doping and high temperature processes. Gas mixing equipment can ensure that the composition, flow rate and stability of the gas mixture meet high-precision process requirements, which is essential for the manufacture of high-performance semiconductor devices.

[0003] For gas mixing with a flow rate exceeding 200L / min, the existing technology is to control the two gas sources to a certain flow rate using a flow control module and then transport them to two 100L buffer tanks, and finally transport them to the process machine (such as Figure 1 Two concentration analyzers are used to detect the concentration before and after entering the buffer tank. The calibration gas unit uses a mixed gas with a fixed concentration to calibrate the concentration analyzer. The exhaust unit exhausts the exhaust gas out of the system.

[0004] However, the existing technology only uses one set of flow control modules, which easily causes large errors and large fluctuations in the concentration of the mixed gas during the process of the gas source transporting gas to the mixing tank. In addition, in the initial mixing stage before the mixed gas enters the buffer tank, the existing equipment cannot stabilize the concentration.

[0005] At present, no effective solution has been proposed for the problems existing in related technologies, such as large mixing errors, large fluctuations in mixing concentration, and inability to stabilize concentration in the initial mixing stage. Summary of the invention

[0006] The purpose of the present invention is to provide a large flow gas mixing system, method and semiconductor process equipment to address the deficiencies in the prior art, so as to solve the problems existing in the related art such as large gas mixing error, large fluctuation of gas mixing concentration, and inability to stabilize concentration in the initial mixing stage.

[0007] To achieve the above object, the technical solution adopted by the present invention is:

[0008] In a first aspect, the present invention provides a large flow gas mixing system, comprising:

[0009] A first gas input unit, the first gas input unit is connected to a first gas source and is used to deliver a first gas;

[0010] A second gas input unit, the second gas input unit is connected to a second gas source and is used to deliver a second gas;

[0011] at least one first flow control unit, the first flow control unit being in communication with the first gas input unit and being located downstream of the first gas input unit, and being used to control the flow of the first gas;

[0012] at least one second flow control unit, the second flow control unit being in communication with the second gas input unit and being located downstream of the second gas input unit, and being used to control the flow of the second gas;

[0013] a first gas mixing unit, which is connected to the first flow control unit and the second flow control unit respectively, and is located downstream of the first flow control unit and downstream of the second flow control unit, and is used for preliminarily mixing the first gas and the second gas to obtain a first mixed gas;

[0014] a first concentration analysis unit, which is connected to the first gas mixing unit and is located downstream of the first gas mixing unit, and is used to detect the concentration of the first mixed gas;

[0015] a second gas mixing unit, the second gas mixing unit being in communication with the first gas mixing unit and configured to finely mix the first mixed gas to obtain a second mixed gas;

[0016] a second concentration analysis unit, the second concentration analysis unit being in communication with the second gas mixing unit and being located downstream of the second gas mixing unit, and being used for detecting the concentration of the second mixed gas;

[0017] a first gas output unit, the first gas output unit being connected to the first gas mixing unit, the second gas mixing unit, the second concentration analysis unit, and the process equipment respectively, and being located downstream of the second gas mixing unit, and being used for delivering the second mixed gas to the process equipment when the second concentration analysis unit detects that the gas meets the standard;

[0018] The second gas output unit is connected to the first concentration analysis unit, the second concentration analysis unit, the first gas output unit, and the exhaust gas treatment equipment respectively, and is used for conveying the exhaust gas.

[0019] In some of the embodiments, it also includes:

[0020] The first gas input unit is in communication with the first concentration analysis unit and is used to deliver the first gas to the first concentration analysis unit so that the first concentration analysis unit uses the first gas for zero gas calibration;

[0021] The first gas input unit is in communication with the second concentration analysis unit, and is used to deliver the first gas to the second concentration analysis unit so that the second concentration analysis unit uses the first gas for zero gas calibration;

[0022] The third gas input unit is connected to the calibration gas source, the first concentration analysis unit and the second concentration analysis unit respectively, and is used to calibrate the first concentration analysis unit and the second concentration analysis unit with the calibration gas.

[0023] In some of the embodiments, it also includes:

[0024] A purge unit is connected to the second gas input unit and the second gas output unit respectively, and is used to purge the entire pipeline and equipment.

[0025] In some of the embodiments, it also includes:

[0026] A pressure relief unit, wherein the pressure relief unit is respectively connected to the first gas mixing unit, the second gas mixing unit, and the second gas output unit for pressure relief.

[0027] In some of the embodiments, it also includes:

[0028] A pressure protection unit, wherein the pressure protection unit is respectively connected to the first gas output unit, the second gas output unit, the first gas mixing unit and the second gas mixing unit, and is used to protect the pipeline.

[0029] In some of the embodiments, it also includes:

[0030] A backup mixed gas supply unit is connected to the first gas output unit and is used to deliver gas to the process equipment.

[0031] In a second aspect, the present invention further provides a large flow gas mixing method, comprising:

[0032] The first gas input unit obtains the first gas and delivers the first gas to the first flow control unit;

[0033] The first flow control unit obtains the first gas and controls the flow rate of the first gas to the first gas mixing unit;

[0034] The second gas input unit obtains the second gas and delivers the second gas to the second flow control unit;

[0035] The second flow control unit obtains the second gas and controls the flow rate of the second gas to the first gas mixing unit;

[0036] The first gas mixing unit obtains the first gas and the second gas and preliminarily mixes the first gas and the second gas to obtain a first mixed gas;

[0037] The first concentration analysis unit obtains the first mixed gas and detects the concentration of the first mixed gas;

[0038] When the concentration of the first mixed gas detected by the first concentration analysis unit meets the standard, the second gas mixing unit obtains the first mixed gas and finely mixes the first mixed gas to obtain a second mixed gas;

[0039] The second concentration analysis unit obtains the second mixed gas and detects the concentration of the second mixed gas;

[0040] When the concentration of the second mixed gas detected by the second concentration analysis unit meets the standard, the first gas output unit delivers the second mixed gas to the process equipment.

[0041] In some of the embodiments, it also includes:

[0042] The first gas input unit delivers the first gas to the first concentration analysis unit and the second concentration analysis unit to achieve zero gas calibration of the first concentration analysis unit and the second concentration analysis unit;

[0043] The third gas input unit delivers standard gas to the first concentration analysis unit and the second concentration analysis unit to achieve standard gas calibration of the first concentration analysis unit and the second concentration analysis unit.

[0044] In some of the embodiments, it also includes:

[0045] The purge unit obtains the purge gas and delivers the purge gas to the entire pipeline and equipment to purge the entire pipeline and equipment.

[0046] In some of the embodiments, it also includes:

[0047] When the air pressure inside the pipeline exceeds the preset threshold, the pressure relief unit will relieve the pressure on the entire pipeline and equipment.

[0048] In some of the embodiments, it also includes:

[0049] When the pressure in the pipeline exceeds a preset threshold, the pressure protection unit is opened, so that the pressure inside the pipeline can be discharged through the second gas output unit.

[0050] In some of the embodiments, it also includes:

[0051] In the event that the second mixed gas is cut off, the backup mixed gas supply unit may deliver the second mixed gas to the process equipment.

[0052] In a third aspect, the present invention further provides a semiconductor process equipment, comprising:

[0053] A large flow gas mixing system as described in the first aspect.

[0054] The present invention adopts the above technical solution, and has the following technical effects compared with the prior art:

[0055] A large-flow gas mixing system, method and semiconductor process equipment of the present invention improves the control accuracy of the flow rate and further improves the concentration accuracy by connecting a first gas input unit with multiple first flow control units and a second gas input unit with multiple second flow control units, and using multiple second flow control units to control the flow rate simultaneously; by connecting a first gas mixing unit with a first flow control unit and a second flow control unit respectively, the first gas and the second gas are preliminarily mixed by the first gas mixing unit, thereby improving the concentration uniformity of the overall system; by connecting the second gas mixing unit with the first gas mixing unit, the second mixed gas obtained by the preliminarily mixing is finely mixed, thereby further improving the concentration uniformity of the gas mixing. BRIEF DESCRIPTION OF THE DRAWINGS

[0056] Figure 1 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (I);

[0057] Figure 2 is a schematic diagram of a first gas input unit and a second gas input unit according to an embodiment of the present invention;

[0058] Figure 3 is a schematic diagram of a first flow control unit and a second flow control unit according to an embodiment of the present invention;

[0059] Figure 4 is a schematic diagram of a first gas mixing unit, a first concentration analysis unit, a second gas mixing unit, and a second concentration analysis unit according to an embodiment of the present invention;

[0060] Figure 5 is a schematic diagram of a first gas output unit and a second gas output unit according to an embodiment of the present invention;

[0061] Figure 6 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (II);

[0062] Figure 7 is a schematic diagram of a third gas input unit according to an embodiment of the present invention;

[0063] Figure 8 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (III);

[0064] Fig. 9is a schematic diagram of a purge unit according to an embodiment of the present invention;

[0065] Fig.10 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (IV);

[0066] Fig.11 is a schematic diagram of a pressure relief unit according to an embodiment of the present invention;

[0067] Fig.12 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (V);

[0068] Fig.13 is a schematic diagram of a pressure protection unit according to an embodiment of the present invention;

[0069] Fig.14 is a schematic diagram of a large flow gas mixing system according to an embodiment of the present invention (VI);

[0070] Fig.15 is a schematic diagram of a backup mixed gas supply unit according to an embodiment of the present invention;

[0071] Fig.16 It is a specific embodiment of the large flow gas mixing system according to an embodiment of the present invention.

[0072] The reference numerals are: 100, first gas input unit; 101, first control valve element; 102, first pressure regulating element; 103, first pressure monitoring element; 104, second pressure monitoring element; 105, thirteenth control valve element; 106, fourteenth control valve element; 107, fifteenth control valve element; 200, second gas input unit; 201, second control valve element; 202, second pressure regulating element; 203, third pressure monitoring element; 204, fourth pressure monitoring element; 300, first flow control unit; 301, first flow control element; 302, third control valve element; 40 0, second flow control unit; 401, second flow control element; 402, fourth control valve element; 500, first gas mixing unit; 501, first gas mixing element; 502, fifth control valve element; 600, first concentration analysis unit; 601, first concentration analysis element; 602, sixth control valve element; 603, third pressure regulating element; 604, fifth pressure monitoring element; 700, second gas mixing unit; 701, second gas mixing element; 702, seventh control valve element; 800, second concentration analysis unit; 801, second concentration analysis element; 802, eighth control valve element; 803, fourth pressure regulating element Element; 804, sixth pressure monitoring element; 900, first gas output unit; 901, ninth control valve element; 902, tenth control valve element; 903, fifth pressure regulating element; 904, seventh pressure monitoring element; 905, first flow detection element; 906, second flow detection element; 1000, second gas output unit; 1001, eleventh control valve element; 1002, twelfth control valve element; 1100, third gas input unit; 1101, sixteenth control valve element; 1200, purge unit; 1201, seventeenth control valve element; 1202, eighteenth control valve element; 1 203, the nineteenth control valve element; 1204, the twentieth control valve element; 1205, the vacuum element; 1206, the twenty-first control valve element; 1300, the pressure relief unit; 1301, the first pressure relief valve element; 1302, the second pressure relief valve element; 1400, the pressure protection unit; 1401, the twenty-second control valve element; 1402, the first protection element; 1403, the second protection element; 1404, the eighth pressure monitoring element; 1500, the backup mixed gas supply unit; 1501, the twenty-third control valve element; 1502, the ninth pressure monitoring element; 1503, the third flow detection element. DETAILED DESCRIPTION

[0073] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0074] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0075] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0076] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units that are not listed, or may also include other steps or units inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there may be three relationships, for example, "A and / or B" can represent: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0077] Example 1

[0078] This embodiment relates to a large flow gas mixing system in the present invention.

[0079] An exemplary embodiment of the present invention is as follows Figure 1As shown, a large-flow gas mixing system includes a first gas input unit 100, a second gas input unit 200, at least one first flow control unit 300, at least one second flow control unit 400, a first gas mixing unit 500, a first concentration analysis unit 600, a second gas mixing unit 700, a second concentration analysis unit 800, a first gas output unit 900 and a second gas output unit 1000. Among them, the first gas input unit 100 is connected to the first gas source for conveying the first gas; the second gas input unit 200 is connected to the second gas source for conveying the second gas; the first flow control unit 300 is connected to the first gas input unit 100 and is located downstream of the first gas input unit 100, for controlling the flow of the first gas; the second flow control unit 400 is connected to the second gas input unit 200 and is located downstream of the second gas input unit 200, for controlling the flow of the second gas; the first gas mixing unit 500 is respectively connected to the first flow control unit 300 and the second flow control unit 400, and is located downstream of the first flow control unit 300 and downstream of the second flow control unit 400, for preliminarily mixing the first gas and the second gas to obtain a first mixed gas; the first concentration analysis unit 600 is connected to the first gas mixing unit 500 and is located at the first Downstream of the gas mixing unit 500, it is used to detect the concentration of the first mixed gas; the second gas mixing unit 700 is connected to the first gas mixing unit 500, and is used to finely mix the first mixed gas and obtain the second mixed gas; the second concentration analysis unit 800 is connected to the second gas mixing unit 700, and is located downstream of the second gas mixing unit 700, and is used to detect the concentration of the second mixed gas; the first gas output unit 900 is respectively connected to the first gas mixing unit 500, the second gas mixing unit 700, the second concentration analysis unit 800, and the process equipment, and is located downstream of the second gas mixing unit 700, and is used to deliver the second mixed gas to the process equipment when the second concentration analysis unit 800 detects that it meets the standards; the second gas output unit 1000 is respectively connected to the first concentration analysis unit 600, the second concentration analysis unit 800, the first gas output unit 900, and the waste gas treatment equipment, and is used to deliver waste gas.

[0080] It should be noted that the first end and the second end in the present invention are two ends in the length direction thereof.

[0081] like Figure 2 As shown, the first gas input unit 100 includes a first gas input element and a first control valve element 101. The first gas input element is connected to the first gas source and the first flow control unit 300 respectively, and is used to deliver the first gas; the first control valve element 101 is arranged on the first gas input element, and is used to control the flow of the first gas input element.

[0082] Specifically, the first end of the first gas input element is communicated with the first gas source, and the second end of the first gas input element is communicated with the first flow control unit 300 .

[0083] In some of the embodiments, the first gas input element includes but is not limited to a stainless steel tube.

[0084] Specifically, the first control valve element 101 includes a first manual diaphragm valve and a second manual diaphragm valve. The first manual diaphragm valve is arranged at the first gas input element, and is used to manually control the flow between the first gas input element and the first gas source; the second manual diaphragm valve is arranged at the first gas input element and is located downstream of the first manual diaphragm valve, and is used to manually control the flow between the first gas input element and the first gas mixing unit 500.

[0085] In some of the embodiments, the first control valve element 101 includes, but is not limited to, a diaphragm valve.

[0086] Furthermore, the first gas input unit 100 further includes a first pressure regulating element 102 and a first pressure monitoring element 103. The first pressure regulating element 102 is disposed in the first gas input element and is used to regulate the gas pressure inside the first gas input element; the first pressure monitoring element 103 is connected to the first gas input element and is used to monitor the gas pressure upstream and downstream of the first pressure regulating element 102.

[0087] Specifically, the first pressure regulating element 102 is located downstream of the first manual diaphragm valve and upstream of the second manual diaphragm valve.

[0088] In some embodiments, the first pressure regulating element 102 includes but is not limited to a pressure regulating valve.

[0089] Specifically, the first pressure monitoring element 103 includes a first pressure gauge and a second pressure gauge. The first pressure gauge is connected to the first gas input element, and the connection point between the first pressure gauge and the first gas input element is located downstream of the first manual diaphragm valve and upstream of the first pressure regulating element 102; the second pressure gauge is connected to the first gas input element, and the connection point between the second pressure gauge and the first gas input element is located downstream of the first pressure regulating element 102 and upstream of the second manual diaphragm valve.

[0090] In some of the embodiments, the first pressure monitoring element 103 includes but is not limited to a pressure gauge.

[0091] Furthermore, the first gas input unit 100 further includes a second pressure monitoring element 104. The second pressure monitoring element 104 is connected to the first gas input element and is located downstream of the first control valve element 101, and is used to monitor the gas pressure inside the first gas input element.

[0092] Specifically, the second pressure monitoring element 104 includes a first pressure sensor, wherein the first pressure sensor is connected to the first gas input element, and the connection point between the first pressure sensor and the first gas input element is located downstream of the second manual diaphragm valve.

[0093] In some of the embodiments, the second pressure monitoring element 104 includes but is not limited to a pressure sensor.

[0094] like Figure 2 As shown, the second gas input unit 200 includes a second gas input element and a second control valve element 201. The second gas input element is respectively connected to the second gas source and the second flow control unit 400 for delivering the second gas; the second control valve element 201 is arranged on the second gas input element for controlling the flow of the second gas input element.

[0095] Specifically, a first end of the second gas input element is communicated with the second gas source, and a second end of the second gas input element is communicated with the second flow control unit 400 .

[0096] In some of the embodiments, the second gas input element includes but is not limited to a stainless steel tube.

[0097] Specifically, the second control valve element 201 includes a third manual diaphragm valve and a fourth manual diaphragm valve. The third manual diaphragm valve is disposed at the second gas input element and is used to manually control the flow between the second gas input element and the second gas source; the fourth manual diaphragm valve is disposed at the second gas input element and is located downstream of the third manual diaphragm valve and is used to manually control the flow between the second gas input element and the first gas mixing unit 500.

[0098] In some of the embodiments, the second control valve element 201 includes, but is not limited to, a diaphragm valve.

[0099] Furthermore, the second gas input unit 200 also includes a second pressure regulating element 202 and a third pressure monitoring element 203. The second pressure regulating element 202 is disposed in the second gas input element and is used to regulate the gas pressure inside the second gas input element; the third pressure monitoring element 203 is connected to the second gas input element and is used to monitor the gas pressure upstream and downstream of the second pressure regulating element 202.

[0100] Specifically, the second pressure regulating element 202 is located downstream of the third manual diaphragm valve and upstream of the fourth manual diaphragm valve.

[0101] In some of the embodiments, the second pressure regulating element 202 includes but is not limited to a pressure regulating valve.

[0102] Specifically, the third pressure monitoring element 203 includes a third pressure gauge and a fourth pressure gauge. The third pressure gauge is connected to the second gas input element, and the connection point between the third pressure gauge and the second gas input element is located downstream of the third manual diaphragm valve and upstream of the second pressure regulating element 202; the fourth pressure gauge is connected to the second gas input element, and the connection point between the fourth pressure gauge and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve.

[0103] In some of the embodiments, the third pressure monitoring element 203 includes but is not limited to a pressure gauge.

[0104] Furthermore, the second gas input unit 200 further includes a fourth pressure monitoring element 204. The fourth pressure monitoring element 204 is connected to the second gas input element and is located downstream of the second control valve element 201, and is used to monitor the gas pressure inside the second gas input element.

[0105] Specifically, the fourth pressure monitoring element 204 includes a second pressure sensor, wherein the second pressure sensor is connected to the second gas input element, and the connection point between the second pressure sensor and the second gas input element is located downstream of the fourth manual diaphragm valve.

[0106] In some of the embodiments, the fourth pressure monitoring element 204 includes but is not limited to a pressure sensor.

[0107] like Figure 3 As shown, the first flow control unit 300 includes at least one first flow pipeline element, at least one first flow control element 301 and at least one third control valve element 302. The first flow pipeline element is connected to the first gas input unit 100 and the first gas mixing unit 500 respectively, and is used to deliver the first gas to the first gas mixing unit 500; the first flow control element 301 is arranged on the first flow pipeline element, and is used to control the flow to the first gas mixing unit 500; the third control valve element 302 is arranged on the first flow pipeline element, and is used to control the circulation of the first flow pipeline element.

[0108] Specifically, the first end of the first flow line element is communicated with the second end of the first gas input element, and the second end of the first flow line element is communicated with the first gas mixing unit 500 .

[0109] In some of the embodiments, the first flow line element includes, but is not limited to, a stainless steel tube.

[0110] More specifically, there are a plurality of first flow line elements, the first ends of the plurality of first flow line elements are connected in parallel with the second end of the first gas input element, and the second ends of the plurality of first flow line elements are connected in parallel with the first gas mixing unit 500 .

[0111] It should be noted that the number of the first flow control elements 301 matches the number of the first flow line elements. It should be understood that the number of the first flow control elements 301 is the same as the number of the first flow line elements. That is, the first flow control elements 301 correspond to the first flow line elements one by one.

[0112] Specifically, the third control valve element 302 includes a first pneumatic diaphragm valve and a second pneumatic diaphragm valve. The first pneumatic diaphragm valve is arranged on the first flow line element and is located upstream of the first flow control element 301, and is used to automatically control the flow between the first flow line element and the first gas input element; the second pneumatic diaphragm valve is arranged on the first flow line element and is located downstream of the first flow control element 301, and is used to automatically control the flow between the first flow line element and the first gas mixing unit 500.

[0113] In some of the embodiments, the third control valve element 302 includes, but is not limited to, a diaphragm valve.

[0114] like Figure 3 As shown, the second flow control unit 400 includes at least one second flow pipeline element, at least one second flow control element 401 and at least one fourth control valve element 402. The second flow pipeline element is respectively connected to the second gas input unit 200 and the first gas mixing unit 500, and is used to deliver the second gas to the first gas mixing unit 500; the second flow control element 401 is arranged on the second flow pipeline element, and is used to control the flow to the first gas mixing unit 500; the fourth control valve element 402 is arranged on the second flow pipeline element, and is used to control the circulation of the second flow pipeline element.

[0115] Specifically, the first end of the second flow line element is communicated with the second gas delivery element, and the second end of the second flow line element is communicated with the first gas mixing unit 500 .

[0116] In some of the embodiments, the second flow line element includes, but is not limited to, a stainless steel tube.

[0117] More specifically, there are a plurality of second flow line elements, the first ends of the plurality of second flow line elements are connected in parallel with the second end of the second gas input element, and the second ends of the plurality of second flow line elements are connected in parallel with the first gas mixing unit 500 .

[0118] It should be noted that the number of the second flow control elements 401 matches the number of the second flow line elements. It should be understood that the number of the second flow control elements 401 is the same as the number of the second flow line elements, that is, the second flow control elements 401 correspond to the second flow line elements one by one.

[0119] Specifically, the fourth control valve element 402 includes a third pneumatic diaphragm valve and a fourth pneumatic diaphragm valve. The third pneumatic diaphragm valve is arranged on the second flow line element and is located upstream of the second flow control element 401, and is used to automatically control the flow between the second flow line element and the second gas input element; the fourth pneumatic diaphragm valve is arranged on the second flow line element and is located downstream of the second flow control element 401, and is used to automatically control the flow between the second flow line element and the first gas mixing unit 500.

[0120] In some of the embodiments, the fourth control valve element 402 includes, but is not limited to, a diaphragm valve.

[0121] like Figure 4 As shown, the first gas mixing unit 500 includes a first gas mixing element 501 and a fifth control valve element 502. The first gas mixing element 501 is respectively connected with the first flow control unit 300, the second flow control unit 400, the first concentration analysis unit 600, the first gas output unit 900, and the second gas mixing unit 700, and is used to preliminarily mix the first gas and the second gas to obtain the first mixed gas; the fifth control valve element 502 is arranged on the first gas mixing element 501, and is used to control the flow of the first gas mixing element 501.

[0122] Specifically, the first gas mixing element 501 includes a first gas mixing input pipeline, a buffer tube and a first gas mixing output pipeline. The first end of the first gas mixing input pipeline is respectively connected to the second end of the first flow pipeline element and the second end of the second flow pipeline element; the first end of the buffer tube is connected to the second end of the first gas mixing pipeline; the first end of the first gas mixing output pipeline is connected to the second end of the buffer tube, and the second end of the first gas mixing output pipeline is respectively connected to the first gas output unit 900, the first concentration analysis unit 600, and the second gas mixing unit 700.

[0123] In some of the embodiments, the first mixed gas input pipeline includes but is not limited to a stainless steel pipe.

[0124] In some of the embodiments, the buffer tube includes but is not limited to XX buffer tube (with detailed model and type of the buffer tube provided by the inventor).

[0125] In some of the embodiments, the first mixed gas output pipeline includes but is not limited to a stainless steel pipe.

[0126] Specifically, the fifth control valve element 502 includes a fifth manual diaphragm valve, wherein the fifth manual diaphragm valve is disposed in the first mixed gas output pipeline and is used to manually control the flow of the first mixed gas output pipeline.

[0127] In some of the embodiments, the fifth control valve element 502 includes, but is not limited to, a diaphragm valve.

[0128] like Figure 4 As shown, the first concentration analysis unit 600 includes a first concentration pipeline element, a first concentration analysis element 601 and a sixth control valve element 602. The first concentration pipeline element is connected to the first gas mixing unit 500 and the first gas output unit 900 respectively, and is used to deliver the first mixed gas; the first concentration analysis element 601 is connected to the first concentration pipeline element, and is used to detect the concentration of the first mixed gas; the sixth control valve element 602 is arranged on the first concentration pipeline element, and is used to control the flow of the first concentration pipeline element.

[0129] Specifically, the first concentration pipeline element includes a first concentration input pipeline and a first concentration output pipeline. The first end of the first concentration input pipeline is connected to the second end of the first mixed gas output pipeline, and the second end of the first concentration input pipeline is connected to the first concentration analysis element 601; the first end of the first concentration output pipeline is connected to the first concentration analysis element 601, and the second end of the first concentration output pipeline is connected to the second gas output unit 1000.

[0130] In some of the embodiments, the first concentration input pipeline includes but is not limited to a stainless steel tube.

[0131] In some of the embodiments, the first concentration output pipeline includes but is not limited to a stainless steel tube.

[0132] Specifically, the first concentration analysis element 601 includes a first analysis pipeline, a first flowmeter, a first analyzer, a second analysis pipeline, a second flowmeter and a third analysis pipeline. Among them, the first end of the first analysis pipeline is connected to the second end of the first concentration input pipeline; the first flowmeter is arranged in the first analysis pipeline, and is used to adjust the flow of the first mixed gas to adapt to the first analyzer; the first analyzer is connected to the second end of the first analysis pipeline; the first end of the second analysis pipeline is connected to the second end of the first concentration input pipeline, and the second end of the second analysis pipeline is connected to the first end of the first concentration output pipeline; the second flowmeter is arranged in the second analysis pipeline, and is used to discharge the excess first mixed gas directly to the second gas output unit 1000; the first end of the third analysis pipeline is connected to the first analyzer, and the second end of the third analysis pipeline is connected to the first end of the first concentration output pipeline.

[0133] In some of the embodiments, the first analysis line includes, but is not limited to, a stainless steel tube.

[0134] In some of these embodiments, the first flow meter includes, but is not limited to, a float flow meter.

[0135] In some of these embodiments, the first analyzer includes, but is not limited to, a concentration analyzer.

[0136] In some of these embodiments, the second analysis line includes, but is not limited to, a stainless steel tube.

[0137] In some of these embodiments, the second flow meter includes, but is not limited to, a float flow meter.

[0138] In some of the embodiments, the third analysis line includes, but is not limited to, a stainless steel tube.

[0139] Specifically, the sixth control valve element 602 includes a fifth pneumatic diaphragm valve, a first one-way valve and a second one-way valve. The fifth pneumatic diaphragm valve is arranged in the first concentration input pipeline, and is used to automatically control the flow of the first concentration input pipeline and the first mixed gas output pipeline; the first one-way valve is arranged in the first concentration input pipeline, and is located downstream of the fifth pneumatic diaphragm valve, and is used to make the first mixed gas inside the first concentration input pipeline flow in one direction; the second one-way valve is arranged in the first concentration output pipeline, and is used to make the first mixed gas inside the first concentration output pipeline flow in one direction.

[0140] In some embodiments, the sixth control valve element 602 includes but is not limited to a diaphragm valve and a one-way valve.

[0141] Furthermore, the first concentration analysis unit 600 further includes a third pressure regulating element 603 and a fifth pressure monitoring element 604. The third pressure regulating element 603 is disposed in the first concentration pipeline element and is used to regulate the air pressure inside the first concentration pipeline element; the fifth pressure monitoring element 604 is connected to the first concentration pipeline element and is used to monitor the air pressure inside the first concentration pipeline element.

[0142] Specifically, the third pressure regulating element 603 is disposed in the first concentration input pipeline and is located downstream of the first one-way valve, and is used to regulate the gas pressure inside the first concentration input pipeline.

[0143] In some of the embodiments, the third pressure regulating element 603 includes but is not limited to a pressure regulating valve.

[0144] Specifically, the fifth pressure monitoring element 604 includes a fifth pressure gauge which is connected to the first concentration input pipeline and the connection point between the fifth pressure gauge and the first concentration input pipeline is located downstream of the first one-way valve, and is used to monitor the air pressure inside the first concentration input pipeline in real time.

[0145] In some of these embodiments, the fifth pressure monitoring element 604 includes, but is not limited to, a pressure gauge.

[0146] like Figure 4As shown, the second gas mixing unit 700 includes a plurality of second gas mixing elements 701 and a plurality of seventh control valve elements 702. The plurality of second gas mixing elements 701 are connected in series, and any second gas mixing element 701 located on both sides is connected to the first gas mixing unit 500, and another second gas mixing element 701 is connected to the first gas output unit 900, and is located downstream of the first gas mixing unit 500 and upstream of the first gas output unit 900, for fine mixing the first mixed gas and obtaining the second mixed gas; and the plurality of seventh control valve elements 702 are respectively arranged on the corresponding second gas mixing elements 701, for controlling the circulation of the second gas mixing elements 701.

[0147] More specifically, the number of the second gas mixing elements 701 is three, the three second gas mixing elements 701 are sequentially connected in series, and the two second gas mixing elements 701 located on the outer side are respectively connected to the first gas mixing output pipeline and the first gas output pipeline.

[0148] In some of the embodiments, the second gas mixing element 701 includes but is not limited to a gas mixing tank.

[0149] In some of the embodiments, the second gas mixing element 701 includes but is not limited to a 29L gas mixing tank.

[0150] In some of the embodiments, a plurality of second gas mixing elements 701 form a plurality of groups of second gas mixing elements 701. Each group of second gas mixing elements 701 includes a plurality of second gas mixing elements 701. Generally, each group of second gas mixing elements 701 contains the same number of second gas mixing elements 701. That is, the number of second gas mixing elements 701 is a=b*c, where a is the total number, b is the number of groups, and c is the number of second gas mixing elements 701 contained in each group.

[0151] Specifically, the seventh control valve element 702 includes a sixth manual diaphragm valve, wherein the sixth manual diaphragm valve is arranged at the air inlet and / or the air outlet of the second gas mixing element 701 .

[0152] In some of the embodiments, the seventh control valve element 702 includes, but is not limited to, a diaphragm valve.

[0153] It should be noted that the number of the seventh control valve elements 702 matches the number of the second gas mixing elements 701. It should be understood that the number of the seventh control valve elements 702 is an integer multiple of the number of the second gas mixing elements 701. For example, the number of the seventh control valve elements 702 is equal to the number of the second gas mixing elements 701, or the number of the seventh control valve elements 702 is twice the number of the second gas mixing elements 701.

[0154] like Figure 4As shown, the second concentration analysis unit 800 includes a second concentration pipeline element, a second concentration analysis element 801 and an eighth control valve element 802. The second concentration pipeline element is connected to the first gas output unit 900 and the second gas output unit 1000 respectively, and is used to deliver the second mixed gas; the second concentration analysis element 801 is connected to the second concentration pipeline element, and is used to detect the concentration of the second mixed gas; the eighth control valve element 802 is arranged on the second concentration pipeline element, and is used to control the flow of the second concentration pipeline element.

[0155] Specifically, the second concentration pipeline element includes a second concentration input pipeline and a second concentration output pipeline. The first end of the second concentration input pipeline is connected to the first gas output unit 900, thereby connecting to the second gas mixing unit 700 through the first gas output unit 900, and the second end of the second concentration input pipeline is connected to the second concentration analysis element 801; the first end of the second concentration output pipeline is connected to the second concentration analysis element 801, and the second end of the second concentration output pipeline is connected to the second gas output unit 1000.

[0156] In some of the embodiments, the second concentration input pipeline includes but is not limited to a stainless steel tube.

[0157] In some of the embodiments, the second concentration output pipeline includes but is not limited to a stainless steel tube.

[0158] Specifically, the second concentration analysis element 801 includes a fourth analysis pipeline, a third flowmeter, a second analyzer, a fifth analysis pipeline, a fourth flowmeter and a sixth analysis pipeline. The first end of the fourth analysis pipeline is connected to the second end of the second concentration input pipeline; the third flowmeter is arranged in the fourth analysis pipeline, and is used to adjust the flow of the second mixed gas to adapt to the second analyzer; the second analyzer is connected to the second end of the fourth analysis pipeline; the first end of the fifth analysis pipeline is connected to the second end of the second concentration input pipeline, and the second end of the fifth analysis pipeline is connected to the first end of the second concentration output pipeline; the third flowmeter is arranged in the fifth analysis pipeline, and is used to discharge the excess second mixed gas directly to the second gas output unit 1000; the first end of the sixth analysis pipeline is connected to the second analyzer, and the second end of the sixth analysis pipeline is connected to the first end of the second concentration output pipeline.

[0159] In some of the embodiments, the fourth analysis line includes, but is not limited to, a stainless steel tube.

[0160] In some of these embodiments, the third flow meter includes, but is not limited to, a float flow meter.

[0161] In some of these embodiments, the second analyzer includes, but is not limited to, a concentration analyzer.

[0162] In some of these embodiments, the fifth analysis line includes, but is not limited to, a stainless steel tube.

[0163] In some of these embodiments, the fourth flow meter includes but is not limited to a float flow meter.

[0164] In some of these embodiments, the sixth analysis line includes, but is not limited to, a stainless steel tube.

[0165] Specifically, the eighth control valve element 802 includes a sixth pneumatic diaphragm valve, a third one-way valve and a fourth one-way valve. The sixth pneumatic diaphragm valve is arranged in the second concentration input pipeline, and is used to automatically control the flow between the second concentration input pipeline and the first gas output unit 900; the third one-way valve is arranged in the second concentration input pipeline, and is located downstream of the sixth pneumatic diaphragm valve, and is used to make the second mixed gas inside the second concentration input pipeline flow in one direction; the fourth one-way valve is arranged in the second concentration output pipeline, and is used to make the second mixed gas inside the second concentration output pipeline flow in one direction.

[0166] In some embodiments, the eighth control valve element 802 includes but is not limited to a diaphragm valve and a one-way valve.

[0167] Furthermore, the second concentration analysis unit 800 further includes a fourth pressure regulating element 803 and a sixth pressure monitoring element 804. The fourth pressure regulating element 803 is disposed in the second concentration pipeline element and is used to regulate the air pressure inside the second concentration pipeline element; the sixth pressure monitoring element 804 is connected to the second concentration pipeline element and is used to monitor the air pressure inside the second concentration pipeline element.

[0168] Specifically, the fourth pressure regulating element 803 is disposed in the second concentration input pipeline and is located downstream of the third one-way valve, and is used to regulate the gas pressure inside the second concentration input pipeline.

[0169] In some of the embodiments, the fourth pressure regulating element 803 includes but is not limited to a pressure regulating valve.

[0170] Specifically, the sixth pressure monitoring element 804 includes a sixth pressure gauge which is connected to the second concentration input pipeline and the connection point between the sixth pressure gauge and the second concentration input pipeline is located downstream of the third one-way valve, and is used to monitor the air pressure inside the second concentration input pipeline in real time.

[0171] In some of these embodiments, the sixth pressure monitoring element 804 includes but is not limited to a pressure gauge.

[0172] like Figure 5As shown, the first gas output unit 900 includes a first gas output element, a ninth control valve element 901, at least one second gas output element and at least one tenth control valve element 902. The first gas output element is respectively connected with the first gas mixing unit 500, the first concentration analysis unit 600, the second gas mixing unit 700 and the second concentration analysis unit 800, and is used to deliver the first mixed gas or the second mixed gas; the ninth control valve element 901 is arranged on the first gas output element, and is used to control the circulation of the first gas output element; the second gas output element is respectively connected with the first gas output element and the process equipment, and is used to deliver the second mixed gas to the process equipment; the tenth control valve element 902 is arranged on the second gas output element, and is used to control the circulation of the second gas output element.

[0173] Specifically, the first end of the first gas output element is connected to the second end of the first mixed gas output pipeline, and the second end of the first gas output element is connected to the first end of the second gas output element, the second concentration input pipeline, and the second gas output unit 1000.

[0174] In some of the embodiments, the first gas output element includes but is not limited to a stainless steel tube.

[0175] Specifically, the ninth control valve element 901 includes a seventh manual diaphragm valve, an eighth manual diaphragm valve and a seventh pneumatic diaphragm valve. The seventh manual diaphragm valve is arranged on the first gas output element, and is located downstream of the second gas mixing element 701 and the first gas mixing output pipeline, and upstream of the second gas mixing element 701 and the first gas output element, for controlling the flow of the first gas mixing output pipeline and the first gas output element; the eighth manual diaphragm valve is arranged on the first gas output element, and is located downstream of the second gas mixing element 701 and the first gas output element, and upstream of the connection between the first gas output element and the second gas output unit 1000, for manually controlling the flow of the first gas output element and the second gas mixing element 701; the seventh pneumatic diaphragm valve is arranged on the first gas output element, and is located downstream of the connection between the first gas output element and the second gas output unit 1000, for automatically controlling the flow of the first gas output element and the second gas output element.

[0176] In some of the embodiments, the ninth control valve element 901 includes but is not limited to a diaphragm valve.

[0177] Specifically, there are several second gas output elements, the first ends of several second gas output elements are connected in parallel with the second ends of the first gas output elements, and the second ends of several second gas output elements are respectively connected with corresponding process equipment.

[0178] In some of the embodiments, the second gas output element includes but is not limited to a stainless steel tube.

[0179] It should be noted that the number of second gas output elements matches the number of process equipment or the number of gas inlets of process equipment. It should be understood that the number of second gas output elements is the same as the number of process equipment or the number of gas inlets of process equipment.

[0180] Specifically, the tenth control valve element 902 includes a ninth manual diaphragm valve, wherein the ninth manual diaphragm valve is disposed at the corresponding second gas output element, and is used to manually control the flow between the second gas output element and the process equipment.

[0181] In some of the embodiments, the tenth control valve element 902 includes, but is not limited to, a diaphragm valve.

[0182] It should be noted that the number of the tenth control valve elements 902 matches the number of the second gas delivery elements. It should be understood that the number of the tenth control valve elements 902 is the same as the number of the second gas delivery elements. That is, the tenth control valve elements 902 correspond to the second gas delivery elements one by one.

[0183] Furthermore, the first gas output unit 900 further includes a fifth pressure regulating element 903 and a seventh pressure monitoring element 904. The fifth pressure regulating element 903 is disposed in the first gas output element and is used to regulate the gas pressure inside the first gas output element; the seventh pressure monitoring element 904 is connected to the first gas output element and is used to monitor the gas pressure upstream and downstream of the fifth pressure regulating element 903.

[0184] Specifically, the fifth pressure regulating element 903 is located downstream of the eighth manual diaphragm valve and upstream of the point where the first gas output element is connected to the second concentration input pipeline.

[0185] In some of the embodiments, the fifth pressure regulating element 903 includes but is not limited to a pressure regulating valve.

[0186] Specifically, the seventh pressure monitoring element 904 includes a third pressure sensor and a fourth pressure sensor. The third pressure sensor is connected to the first gas output element, and the connection point between the third pressure sensor and the first gas output element is located downstream of the eighth manual diaphragm valve and upstream of the fifth pressure regulating element 903; the fourth pressure sensor is connected to the first gas output element, and the connection point between the fourth pressure sensor and the first gas output element is located downstream of the connection point between the first gas output element and the second concentration input element and upstream of the connection point between the first gas output element and the second gas output unit 1000.

[0187] In some of the embodiments, the seventh pressure monitoring element 904 includes but is not limited to a pressure sensor.

[0188] Furthermore, the first gas output unit 900 further includes a first flow detection element 905 and at least one second flow detection element 906. The first flow detection element 905 is disposed in the first gas output element for detecting the flow inside the first gas output element; the second flow detection element 906 is disposed in the corresponding second gas output element for detecting the flow inside the second gas output element.

[0189] Specifically, the first flow detection element 905 is located downstream of the fourth pressure sensor and upstream of the connection point between the first gas output element and the second gas output unit 1000 .

[0190] In some of the embodiments, the first flow detection element 905 includes but is not limited to a flow meter.

[0191] Specifically, the second flow detection element 906 is located downstream of the ninth manual diaphragm valve.

[0192] In some of these embodiments, the second flow detection element 906 includes, but is not limited to, a flow meter.

[0193] like Figure 5 As shown, the second gas output unit 1000 includes a third gas output element, an eleventh control valve element 1001, at least one fourth gas output element and at least one twelfth control valve element 1002. The third gas output element is connected to the first gas output unit 900 for conveying waste gas; the eleventh control valve element 1001 is arranged on the second gas output element for controlling the flow of the second gas output element; the fourth gas output element is respectively connected to the third gas output element and the waste gas treatment device for conveying waste gas; the twelfth control valve element 1002 is arranged on the fourth gas output element for controlling the flow of the fourth gas output element.

[0194] Specifically, the first end of the third gas output element is connected to the first gas output element, and the connection between the first end of the third gas output element and the first gas output element is located downstream of the first flow detection element 905 and upstream of the seventh pneumatic diaphragm valve, and the second end of the third gas output element is connected to the first end of the fourth gas output element.

[0195] In some of the embodiments, the third gas output element includes but is not limited to a stainless steel tube.

[0196] Specifically, the eleventh control valve element 1001 includes a tenth manual diaphragm valve, wherein the tenth manual diaphragm valve is disposed on the third gas output element and is located upstream of the connection between the third gas output element and the first concentration output pipeline and the second concentration output pipeline, and is used to manually control the flow between the third gas output element and the first gas output element.

[0197] In some of the embodiments, the eleventh control valve element 1001 includes but is not limited to a diaphragm valve.

[0198] Specifically, there are several fourth gas output elements, the first ends of several fourth gas output elements are connected in parallel with the second ends of the third gas output elements, and the second ends of several fourth gas output elements are respectively connected with corresponding exhaust gas treatment devices.

[0199] In some of the embodiments, the fourth gas output element includes but is not limited to a stainless steel tube.

[0200] It should be noted that the number of fourth gas output elements matches the number of exhaust gas treatment devices or the number of air inlets on the exhaust gas treatment devices. It should be understood that the number of fourth gas output elements is the same as the number of exhaust gas treatment devices or the number of air inlets on the exhaust gas treatment devices.

[0201] Specifically, the twelfth control valve element 1002 includes an eleventh manual diaphragm valve, wherein the eleventh manual diaphragm valve is disposed at the fourth gas output element and is used to manually control the communication between the fourth gas output element and the exhaust gas treatment device.

[0202] In some of the embodiments, the twelfth control valve element 1002 includes, but is not limited to, a diaphragm valve.

[0203] It should be noted that the number of the twelfth control valve elements 1002 matches the number of the fourth gas output elements; it should be understood that the number of the twelfth control valve elements 1002 is the same as the number of the fourth gas output elements, that is, the twelfth control valve elements 1002 correspond to the fourth gas output elements one by one.

[0204] The method of using this embodiment is as follows:

[0205] The system controls the first gas source and the second gas source to deliver the first gas and the second gas to the first gas input element and the second gas input element respectively, and opens the first manual diaphragm valve, the second manual diaphragm valve, the third manual diaphragm valve, the fourth manual diaphragm valve, the first pressure regulating element 102 and the second pressure regulating element 202, so that the first pressure regulating element 102 and the second pressure regulating element 202 can respectively adjust the gas pressure inside the first gas input element and the second gas input element to appropriate values;

[0206] After the pressure regulation is completed, the system opens the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the first flow control element 301 and the second flow control element 401, so as to control the first flow pipeline element and the second flow pipeline element to deliver the first gas and the second gas with appropriate flow rates to the first gas mixing element 501, so that the first gas mixing element 501 can preliminarily mix the first gas and the second gas to obtain the first mixed gas;

[0207] The system opens the fifth manual diaphragm valve, the fifth pneumatic diaphragm valve, and the third pressure regulating element 603, so that the pressure of the first mixed gas supplied to the first flowmeter meets the standard. The first mixed gas after pressure regulation can be adjusted by the first flowmeter so that the flow rate of the first mixed gas supplied to the first analyzer meets the standard, so that the first analyzer can detect the first mixed gas until the concentration of the first mixed gas meets the standard.

[0208] When the concentration of the first mixed gas reaches a preset standard, the system closes the fifth pneumatic diaphragm valve and the sixth manual diaphragm valve, and opens the sixth manual diaphragm valve, so that the first mixed gas sequentially enters the second gas mixing element 701 for mixing to obtain the second mixed gas;

[0209] The system opens the sixth pneumatic diaphragm valve and the fourth pressure regulating element 803, so that the pressure of the second mixed gas supplied to the third flowmeter meets the standard. The second mixed gas after pressure regulation can be adjusted by the third flowmeter so that the flow rate of the second mixed gas supplied to the second analyzer meets the standard, so that the second analyzer can detect the second mixed gas until the concentration of the second mixed gas meets the standard.

[0210] When the concentration of the second mixed gas reaches a preset standard, the system opens the seventh pneumatic diaphragm valve and the ninth manual diaphragm valve, so that the second mixed gas can be delivered to the process equipment through the first gas output element and the second gas output element;

[0211] In addition, in order to discharge the excess gas flowing to the first concentration input pipeline, the system opens the sixth manual diaphragm valve, the eighth manual diaphragm valve, the fifth pressure regulating element 903, the tenth manual diaphragm valve, and the eleventh manual diaphragm valve, so that the excess first mixed gas can be discharged to the exhaust gas treatment equipment through the first mixed gas output pipeline, the first gas output element, the third gas output element, and the fourth gas output element; in order to discharge the excess gas flowing to the first flowmeter, it can be discharged to the exhaust gas treatment equipment through the second analysis pipeline, the second flowmeter, the first concentration output pipeline, and the fourth gas output element. The first mixed gas detected by the first analyzer can be discharged to the exhaust gas treatment equipment through the third analysis pipeline, the first concentration output pipeline, and the fourth gas output element;

[0212] In addition, in order to discharge excess gas flowing to the second flowmeter, it can be discharged to the exhaust gas treatment equipment through the fifth analysis pipeline, the fourth flowmeter, the second concentration output pipeline, and the fourth gas output element. The second mixed gas after detection by the second analyzer can be discharged to the exhaust gas treatment equipment through the sixth analysis pipeline, the first concentration output pipeline, and the fourth gas output element.

[0213] The advantages of this embodiment are that by connecting the first gas input unit with multiple first flow control units and the second gas input unit with multiple second flow control units, multiple second flow control units are used to control the flow simultaneously, thereby improving the control accuracy of the flow and further improving the concentration accuracy; by connecting the first gas mixing unit with the first flow control unit and the second flow control unit respectively, the first gas and the second gas are preliminarily mixed by the first gas mixing unit, thereby improving the concentration uniformity of the overall system; by connecting the second gas mixing unit with the first gas mixing unit, the second mixed gas obtained by the preliminary mixing is finely mixed, thereby further improving the concentration uniformity of the gas mixing.

[0214] Example 2

[0215] This embodiment is a variation of Embodiment 1.

[0216] like Figure 6 As shown, the large flow gas mixing system also includes a third gas input unit 1100. The first gas input unit 100 is connected with the first concentration analysis unit 600, and is used to deliver the first gas to the first concentration analysis unit 600 so that the first concentration analysis unit 600 uses the first gas for zero gas calibration; the first gas input unit 100 is connected with the second concentration analysis unit 800, and is used to deliver the first gas to the second concentration analysis unit 800 so that the second concentration analysis unit 800 uses the first gas for zero gas calibration; the third gas input unit 1100 is respectively connected with the standard gas source, the first concentration analysis unit 600, and the second concentration analysis unit 800, and is used to perform standard gas calibration on the first concentration analysis unit 600 and the second concentration analysis unit 800.

[0217] like Figure 7As shown, the first gas input unit 100 further includes a third gas input element, a thirteenth control valve element 105, a fourth gas input element, a fourteenth control valve element 106, a fifth gas input element and a fifteenth control valve element 107. The third gas input element is connected to the first gas input element for delivering the first gas; the thirteenth control valve element 105 is arranged at the third gas input element for controlling the flow of the third gas input element; the fourth gas input element is respectively connected to the third gas input element and the first concentration analysis unit 600 for delivering the first gas to the first concentration analysis unit 600 so that the first concentration analysis unit 600 performs zero gas calibration; the fourteenth control element is arranged at the fourth gas input element for controlling the flow of the fourth gas input element; the fifth gas input element is respectively connected to the third gas input element and the second concentration analysis unit 800 for delivering the first gas to the second concentration analysis unit 800 so that the second concentration analysis unit 800 performs zero gas calibration; the fifteenth control valve element 107 is arranged at the fifth gas input element for controlling the flow of the fifth gas input element.

[0218] Specifically, the connection point between the first end of the third gas input element and the first gas input element is located downstream of the second pressure monitoring element 104 and upstream of the first gas input element and the first flow pipeline element.

[0219] In some of the embodiments, the third gas input element includes but is not limited to a stainless steel tube.

[0220] Specifically, the thirteenth control valve element 105 includes a twelfth manual diaphragm valve and a fifth one-way valve. The twelfth manual diaphragm valve is arranged at the third gas input element, and is used to manually control the flow between the first gas input element and the third gas input element; the fifth one-way valve is arranged at the third gas input element, and is located downstream of the twelfth manual diaphragm valve, and is used to make the gas in the third gas input element flow in one direction.

[0221] In some embodiments, the thirteenth control valve element 105 includes but is not limited to a diaphragm valve and a one-way valve.

[0222] Specifically, the first end of the fourth gas input element is communicated with the second end of the third gas input element, and the second end of the fourth gas input element is communicated with the first concentration input pipeline.

[0223] In some of the embodiments, the fourth gas input element includes but is not limited to a stainless steel tube.

[0224] Specifically, the fourteenth control valve element 106 includes a thirteenth manual diaphragm valve, wherein the thirteenth manual diaphragm valve is disposed at the fourth gas input element, and is used to manually control the flow of the fourth gas input element.

[0225] In some of the embodiments, the fourteenth control valve element 106 includes, but is not limited to, a diaphragm valve.

[0226] Specifically, the first end of the fifth gas input element is communicated with the second end of the third gas input element, and the second end of the fifth gas input element is communicated with the second concentration input pipeline.

[0227] In some of the embodiments, the fifth gas input element includes but is not limited to a stainless steel tube.

[0228] Specifically, the fifteenth control valve element 107 includes a fourteenth manual diaphragm valve, wherein the fourteenth manual diaphragm valve is disposed at the fifth gas input element, and is used to manually control the flow of the fifth gas input element.

[0229] In some of the embodiments, the fifteenth control valve element 107 includes, but is not limited to, a diaphragm valve.

[0230] like Figure 7 As shown, the third gas input unit 1100 includes a sixth gas input element and a sixteenth control valve element 1101. The sixth gas input element is connected to the standard gas source and the third gas input element respectively, and is used to deliver standard gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 so that the second concentration analysis unit 800 can perform standard gas calibration; the sixteenth control valve element 1101 is arranged on the sixth gas input element, and is used to control the flow of the sixth gas input element.

[0231] Specifically, the first end of the sixth gas input element is connected to the calibration gas source, the second end of the sixth gas input element is connected to the third gas input element, and the connection point between the second end of the sixth gas input element and the third gas input element is located downstream of the fifth one-way valve.

[0232] In some of the embodiments, the sixth gas input element includes but is not limited to a stainless steel tube.

[0233] Specifically, the sixteenth control valve element 1101 includes a fifteenth manual diaphragm valve, wherein the fifteenth manual diaphragm valve is disposed at the sixth gas input element, and is used to manually control the flow of the sixth gas input element.

[0234] In some of the embodiments, the sixteenth control valve element 1101 includes, but is not limited to, a diaphragm valve.

[0235] The method of using this embodiment is as follows:

[0236] Before the system works with mixed gas, it is necessary to perform zero gas calibration and standard gas calibration on the first concentration analysis unit 600 and the second concentration analysis unit 800 to ensure the accuracy of detection and improve the precision of the instrument;

[0237] The system opens the first manual diaphragm valve and the second manual diaphragm valve, so that the first pressure regulating element 102 can adjust the gas pressure inside the first gas input element to a suitable value;

[0238] The system opens the twelfth manual diaphragm valve and the thirteenth manual diaphragm valve, so that the pressure of the first gas supplied to the first flowmeter meets the standard. The pressure-regulated first gas can be adjusted through the first flowmeter so that the flow supplied to the first analyzer meets the standard, thereby realizing zero gas calibration of the first analyzer.

[0239] The system opens the fourteenth manual diaphragm valve so that the pressure of the standard gas supplied to the third flowmeter meets the standard. The pressure-regulated standard gas can be adjusted by the third flowmeter so that the flow supplied to the second analyzer meets the standard, thereby realizing the zero gas calibration of the second analyzer.

[0240] In addition, after the first gas and the standard gas are used to calibrate the first analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and the standard gas can be discharged to the exhaust gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element;

[0241] In addition, after the first gas and standard gas are used to calibrate the second analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and standard gas can be discharged to the exhaust gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element.

[0242] The advantage of this embodiment is that by connecting the first gas input unit and the third gas input unit with the first concentration analysis unit and the second concentration analysis unit, the first concentration analysis unit and the second concentration analysis unit can be calibrated with zero gas and standard gas to ensure detection accuracy and improve instrument precision.

[0243] Example 3

[0244] This embodiment is a variation of Embodiments 1 to 2.

[0245] like Figure 8 As shown, the large flow mixing system further includes a purge unit 1200. The purge unit 1200 is respectively connected to the second gas input unit 200 and the second gas output unit 1000, and is used to purge the entire pipeline and equipment.

[0246] like Fig. 9As shown, the purge unit 1200 includes a first purge pipeline element, a seventeenth control valve element 1201, a second purge pipeline element, an eighteenth control valve element 1202, a third purge pipeline element, a nineteenth control valve element 1203, a vacuum element 1205, a vacuum pipeline element, a twentieth control valve element 1204, a power gas supply pipeline element and a twenty-first control valve element 1206. Among them, the first purge pipeline element is connected to the purge gas source and the second gas input unit 200 respectively, and is used to transport the purge gas; the seventeenth control valve element 1201 is arranged on the first purge pipeline element, and is used to control the circulation of the first purge pipeline element; the second purge pipeline element is connected to the second gas input unit 200 and the first gas mixing unit 500 respectively, and is used to transport the purge gas; the eighteenth control valve element 1202 is arranged on the second purge pipeline element, and is used to control the circulation of the second purge pipeline element; the third purge pipeline element is connected to the first gas mixing unit 500 and the second gas output unit 1000 respectively, and is used to transport the purge gas; the nineteenth control valve element 1203 is arranged on the second purge pipeline element, and is used to control the circulation of the second purge pipeline element; It is placed in the third purge pipeline element to control the circulation of the third purge pipeline element; the vacuum pipeline element is respectively connected to the second gas output unit 1000 and the exhaust gas treatment equipment for conveying exhaust gas; the twentieth control valve element 1204 is arranged on the vacuum pipeline element to control the circulation of the vacuum pipeline element; the vacuum element 1205 is arranged on the vacuum pipeline element to form a vacuum negative pressure at the end of the second gas input unit 200; the power gas supply pipeline element is respectively connected to the vacuum element 1205 and the power gas source for conveying the power gas source; the twenty-first control valve element 1206 is arranged on the power supply pipeline element to control the circulation of the power gas supply pipeline element.

[0247] Specifically, the first end of the first purge pipeline element is connected to the purge gas source, the second end of the first purge pipeline element is connected to the second gas input element, and the connection point between the second end of the first purge pipeline element and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve.

[0248] In some of the embodiments, the first purge line element includes, but is not limited to, a stainless steel tube.

[0249] Specifically, the seventeenth control valve element 1201 includes a sixteenth manual diaphragm valve and an eighth pneumatic diaphragm valve. The sixteenth manual diaphragm valve is arranged on the first purge pipeline element for manually controlling the flow of the first purge pipeline element; the eighth pneumatic diaphragm valve is arranged on the first purge pipeline element and is located downstream of the sixteenth manual diaphragm valve for automatically controlling the flow of the first purge pipeline element.

[0250] In some of the embodiments, the seventeenth control valve element 1201 includes, but is not limited to, a diaphragm valve.

[0251] Specifically, the first end of the second purge pipeline element is communicated with the second end of the second gas input element, and the second end of the second purge pipeline element is communicated with the first gas mixing element 501 .

[0252] In some of the embodiments, the second purge line element includes, but is not limited to, a stainless steel tube.

[0253] Specifically, the eighteenth control valve element 1202 includes a ninth pneumatic diaphragm valve, wherein the ninth pneumatic diaphragm valve is disposed in the second purge pipeline element, and is used to automatically control the flow of the second purge pipeline element.

[0254] In some of the embodiments, the eighteenth control valve element 1202 includes, but is not limited to, a diaphragm valve.

[0255] Specifically, the first end of the third purge pipeline element is connected to the first mixed gas output pipeline, and the connection point between the first end of the third purge pipeline element and the first mixed gas output pipeline is located upstream of the connection point between the first mixed gas output pipeline and the first concentration input pipeline, and the second end of the third purge pipeline element is connected to the third gas output element.

[0256] In some of the embodiments, the third purge line element includes, but is not limited to, a stainless steel tube.

[0257] Specifically, the nineteenth control valve element 1203 includes a tenth pneumatic diaphragm valve and a sixth one-way valve. The tenth pneumatic diaphragm valve is arranged in the third purge pipeline element for automatically controlling the flow of the third purge pipeline element; the sixth one-way valve is arranged in the third purge pipeline element and is located downstream of the tenth pneumatic diaphragm valve for allowing the gas in the third purge pipeline element to flow in one direction.

[0258] In some of the embodiments, the nineteenth control valve element 1203 includes but is not limited to a diaphragm valve and a one-way valve.

[0259] Specifically, the first end of the vacuum pipeline element is in communication with the second end of the third gas output element, and the second end of the vacuum pipeline element is in communication with the exhaust gas treatment device.

[0260] In some of these embodiments, the vacuum line components include, but are not limited to, stainless steel tubes.

[0261] Specifically, the twentieth control valve element 1204 includes a seventeenth manual diaphragm valve and an eighteenth manual diaphragm valve. The seventeenth manual diaphragm valve is arranged in the vacuum pipeline element for manually controlling the circulation of the vacuum pipeline element; the eighteenth manual diaphragm valve is arranged in the vacuum pipeline element and is located downstream of the seventeenth manual diaphragm valve for manually controlling the circulation of the vacuum pipeline element.

[0262] In some of these embodiments, the twentieth control valve element 1204 includes, but is not limited to, a diaphragm valve.

[0263] Specifically, the vacuum element 1205 is located downstream of the seventeenth manual diaphragm valve and upstream of the eighteenth manual diaphragm valve, and is used to provide vacuum negative pressure to the second end of the third gas input element.

[0264] In some of these embodiments, vacuum element 1205 includes, but is not limited to, a Venturi vacuum pump.

[0265] Specifically, a first end of the power gas supply pipeline element is in communication with the power gas source, and a second end of the power gas supply pipeline element is in communication with the vacuum element 1205 .

[0266] In some of these embodiments, the motive gas supply line components include, but are not limited to, stainless steel pipes.

[0267] Specifically, the twenty-first control valve element 1206 includes a nineteenth manual diaphragm valve, wherein the nineteenth manual diaphragm valve is disposed in the power gas supply pipeline element, and is used to manually control the flow of the power gas supply pipeline element.

[0268] In some of these embodiments, the twenty-first control valve element 1206 includes, but is not limited to, a diaphragm valve.

[0269] The method of using this embodiment is as follows:

[0270] In order to ensure the accuracy of the mixed gas concentration in the large-flow mixing system, the entire pipeline of the system needs to be purged when mixing gas in the large-flow mixing system;

[0271] The system keeps all diaphragm valves closed, and opens the sixteenth manual diaphragm valve, the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, the sixth manual diaphragm valve, the seventh manual diaphragm valve, and the eighth manual diaphragm valve, so that the purge gas fills the pipelines in the entire system and maintains the pressure for a period of time;

[0272] Then, the system opens the nineteenth manual diaphragm valve and the vacuum element 1205, so that the power gas supply pipeline element provides power gas to the vacuum element 1205, and the vacuum element 1205 provides negative pressure at the second end of the third gas input element;

[0273] Finally, the system opens the tenth pneumatic diaphragm valve, the tenth manual diaphragm valve, the eleventh manual diaphragm valve, the seventeenth manual diaphragm valve and the eighteenth manual diaphragm valve, so that the gas in the entire pipeline is discharged through the third purge pipeline element, the third gas output element and the vacuum pipeline element.

[0274] The advantage of this embodiment is that by connecting the purge unit with the second gas input unit and the second gas output unit, the entire pipeline of the system can be purged before the large-flow gas mixing system mixes gas, thereby ensuring the accuracy of the gas mixing concentration of the large-flow gas mixing system.

[0275] Example 4

[0276] This embodiment is a variation of Embodiments 1 to 3.

[0277] like Fig.10 As shown, the large flow gas mixing system further includes a pressure relief unit 1300. The pressure relief unit 1300 is respectively connected with the first gas mixing unit 500, the second gas mixing unit 700, and the second gas output unit 1000 for pressure relief.

[0278] like Fig.11 As shown, the pressure relief unit 1300 includes a first pressure relief pipeline element, a first pressure relief valve element 1301, a plurality of second pressure relief pipeline elements and a plurality of second pressure relief valve elements 1302. The first pressure relief pipeline element is respectively connected to the first gas output unit 900 and the second gas output unit 1000; the first pressure relief valve element 1301 is arranged in the first pressure relief pipeline element, and is used to open and realize pressure relief when the pressure inside the first pressure relief pipeline element exceeds a preset pressure threshold; the plurality of second pressure relief pipeline elements are respectively connected to the second gas mixing unit 700 and the second gas output unit 1000; the plurality of second pressure relief valve elements 1302 are respectively arranged in the corresponding second pressure relief pipeline elements, and are used to open and realize pressure relief when the pressure inside the second pressure relief pipeline element exceeds a preset pressure threshold.

[0279] Specifically, the first end of the first pressure relief pipeline element is communicated with the first mixed gas output pipeline, and the second end of the first pressure relief pipeline element is communicated with the first end of the fourth gas output element.

[0280] In some of the embodiments, the first pressure relief line component includes, but is not limited to, a stainless steel pipe.

[0281] In some of the embodiments, the first pressure relief valve component 1301 includes but is not limited to a safety pressure relief valve.

[0282] Specifically, the first end of the second pressure relief pipeline element is communicated with the second gas mixing element 701 , and the second end of the second pressure relief pipeline element is communicated with the third gas output element.

[0283] In some of the embodiments, the second pressure relief line component includes, but is not limited to, a stainless steel pipe.

[0284] More specifically, the number of the second pressure relief pipeline elements is 6, and the first ends of the 6 second pressure relief pipeline elements are respectively connected to the corresponding second gas mixing elements 701, and the second ends of the 6 second pressure relief pipeline elements are connected in parallel to the third gas output element.

[0285] It should be noted that the number of the second pressure relief line elements matches the number of the second gas mixing elements 701. It should be understood that the number of the second pressure relief line elements is the same as the number of the second gas mixing elements 701.

[0286] Specifically, the number of the second pressure relief valve elements 1302 is 6, and the 6 second pressure relief valve elements 1302 are respectively disposed in corresponding second pressure relief pipeline elements.

[0287] In some of these embodiments, the second pressure relief valve component 1302 includes, but is not limited to, a safety valve.

[0288] It should be noted that the number of the second pressure relief valve elements 1302 matches the number of the second pressure relief line elements. It should be understood that the number of the second pressure relief valve elements 1302 is the same as the number of the second pressure relief line elements. That is, the second pressure relief valve elements 1302 correspond to the second pressure relief line elements one by one.

[0289] The method of using this embodiment is as follows:

[0290] After the pressure in the pipeline of the large-flow gas mixing system reaches a threshold value of 1 MPa, the gas in the pipeline can be discharged to the exhaust gas treatment equipment through the first pressure relief valve element 1301 and the second pressure relief valve element 1302 .

[0291] The advantage of this embodiment is that, by providing a pressure relief unit in the pipeline of the system, after the pressure in the pipeline of the large-flow gas mixing system reaches a threshold value of 1 MPa, automatic pressure relief can be performed to protect the entire system.

[0292] Example 5

[0293] This embodiment is a variation of Embodiments 1 to 4.

[0294] like Fig.12 As shown, the large flow gas mixing system further includes a pressure protection unit 1400. The pressure protection unit 1400 is respectively connected to the first gas output unit 900, the second gas output unit 1000, the first gas mixing unit 500 and the second gas mixing unit 700 for protecting the pipeline.

[0295] like Fig.13As shown, the pressure protection unit 1400 includes a pressure protection pipeline element, a twenty-second control valve element 1401 , a first protection element 1402 , a second protection element 1403 and an eighth pressure monitoring element 1404 . Among them, the pressure protection pipeline element is connected to the first gas output unit 900 and the second gas output unit 1000 respectively, and the connection between the pressure protection pipeline element and the first gas output unit 900 is located between the second gas mixing unit 700 and the second concentration analysis unit 800, and is used to transport gas; the twenty-second control valve element 1401 is arranged on the pressure protection pipeline element, and is used to control the circulation of the pressure protection pipeline element; the first protection element 1402 is arranged on the pressure protection pipeline element, and is located downstream of the twenty-second control valve element 1401, and is used to open when the gas flow in the pipeline is too large; the second protection element 1403 is arranged on the pressure protection pipeline element, and is located downstream of the first protection element 1402, and is used to open when the gas pressure in the pipeline is too high; the eighth pressure monitoring element 1404 is connected to the pressure protection pipeline element, and is located downstream of the second protection element 1403, and is used to monitor the gas pressure inside the pressure protection pipeline element.

[0296] Specifically, the first end of the pressure protection pipeline element is communicated with the first gas output element, and the second end of the pressure protection pipeline element is communicated with the second pressure relief pipeline element.

[0297] In some of the embodiments, the pressure protection piping element includes, but is not limited to, a stainless steel pipe.

[0298] Specifically, the twenty-second control valve element 1401 includes an eleventh pneumatic diaphragm valve, wherein the eleventh pneumatic diaphragm valve is arranged in the pressure protection pipeline element, and is used to automatically control the flow of the pressure protection pipeline element.

[0299] In some of the embodiments, the twenty-second control valve element 1401 includes but is not limited to a diaphragm valve.

[0300] In some of the embodiments, the first protection element 1402 includes but is not limited to a needle valve.

[0301] In some of the embodiments, the second protection element 1403 includes but is not limited to a back pressure valve.

[0302] Specifically, the eighth pressure monitoring element 1404 includes a fifth pressure sensor, wherein the fifth pressure sensor is connected to the pressure protection pipeline element, and is used to monitor the gas pressure passing through the second protection element 1403 in real time.

[0303] In some of these embodiments, the eighth pressure monitoring element 1404 includes but is not limited to a pressure sensor.

[0304] The method of using this embodiment is as follows:

[0305] In order to prevent the delivery pressure from being too high and affecting the back-end machine, the system is provided with a pressure protection unit 1400, the eleventh pneumatic diaphragm valve is normally open, the first protection element 1402 is adjusted to a suitable flow rate, and the second protection element 1403 is adjusted to a protection pressure. When the pressure is higher than the protection pressure, the gas will pass through the eleventh pneumatic diaphragm valve, the first protection element 1402, the second protection element 1403, and finally be discharged from the fourth gas output element.

[0306] The advantage of this embodiment is that by connecting the pressure protection unit with the first gas output unit and the second gas output unit, the gas can be automatically discharged to the second output unit when the gas pressure delivered by the first gas output unit is too high, thereby protecting the pipeline of the entire system.

[0307] Example 6

[0308] This embodiment is a variation of Embodiments 1 to 5.

[0309] like Fig.14 As shown, the large flow gas mixing system further includes a backup mixed gas supply unit 1500. The backup mixed gas supply unit 1500 is connected to the first gas output unit 900 and is used to deliver gas to the process equipment.

[0310] like Fig.15 As shown, the backup mixed gas supply unit 1500 includes a backup gas supply pipeline element, a twenty-third control valve element 1501, a ninth pressure monitoring element 1502 and a third flow detection element 1503. The backup gas supply pipeline element is respectively connected to the backup gas source and the first gas output unit 900, and is used to deliver the mixed gas to the process equipment; the twenty-third control valve element 1501 is arranged in the backup gas supply pipeline element, and is used to control the flow of the backup gas supply pipeline element; the ninth pressure monitoring element 1502 is connected to the backup gas supply pipeline element, and is used to monitor the gas pressure inside the backup gas supply pipeline element; the third flow detection element 1503 is arranged in the backup gas supply pipeline element, and is used to detect the flow inside the backup gas supply pipeline element.

[0311] Specifically, the first end of the backup gas supply pipeline element is in communication with the backup gas source, and the second end of the backup gas supply pipeline element is in communication with the second gas output element.

[0312] In some of these embodiments, the backup gas supply line components include, but are not limited to, stainless steel pipes.

[0313] Specifically, the 23rd control valve element 1501 includes a 20th manual diaphragm valve and a 12th pneumatic diaphragm valve. The 20th manual diaphragm valve is arranged in the backup gas supply pipeline element, and is used to manually control the flow of the backup gas supply pipeline element; the 12th pneumatic diaphragm valve is arranged in the backup gas supply pipeline element, and is located downstream of the 20th manual diaphragm valve, and is used to automatically control the flow of the backup gas supply pipeline element.

[0314] In some of the embodiments, the twenty-third control valve element 1501 includes, but is not limited to, a diaphragm valve.

[0315] Specifically, the ninth pressure monitoring element 1502 includes a sixth pressure sensor, wherein the sixth pressure sensor is connected to the backup gas supply pipeline element and is located downstream of the nineteenth manual diaphragm valve and upstream of the twelfth pneumatic diaphragm valve.

[0316] In some of these embodiments, the ninth pressure monitoring element 1502 includes but is not limited to a pressure sensor.

[0317] Specifically, the third flow detection element 1503 is located downstream of the twelfth pneumatic diaphragm valve.

[0318] In some of these embodiments, the third flow meter includes, but is not limited to, a flow meter.

[0319] The method of using this embodiment is as follows:

[0320] When the mixed gas supply is cut off due to system failure, the system opens the twentieth manual diaphragm valve, and the gas in the spare gas tank can flow to the spare gas supply pipeline components. When the gas pressure monitored by the twelfth pressure sensor meets the requirements, the system opens the twelfth pneumatic diaphragm valve, thereby ensuring that subsequent process equipment can work normally when the mixed gas supply is cut off due to system failure.

[0321] The advantage of this embodiment is that by connecting the backup mixed gas supply unit with the first gas output unit, the normal operation of subsequent process equipment can be ensured when the mixed gas supply is cut off due to a system failure.

[0322] Example 7

[0323] This embodiment relates to the process equipment in the present invention.

[0324] A semiconductor process equipment includes the large flow gas mixing system as described in Examples 1 to 6.

[0325] In addition, a semiconductor process equipment further includes a first gas supply device, a second gas supply device, a purge gas supply device, a standard gas supply device, an exhaust gas treatment device, a power gas supply device and a backup gas supply device. Among them, the first gas supply device is connected to the first gas input unit 100; the second gas supply device is connected to the second gas input unit 200; the purge gas supply device is connected to the purge unit 1200; the standard gas supply device is connected to the third gas input unit 1100; the exhaust gas treatment device is connected to the second gas output unit 1000; the power gas supply device is connected to the vacuum element 1205 of the purge unit 1200; and the backup gas supply device is connected to the backup mixed gas supply unit 1500.

[0326] The method of use of this embodiment is basically the same as the method of use of embodiments 1 to 6, and will not be repeated here.

[0327] The technical effects of this embodiment are substantially the same as those of Embodiments 1 to 6, and will not be described in detail herein.

[0328] Example 8

[0329] This embodiment relates to a large flow rate gas mixing method in the present invention.

[0330] A large flow rate gas mixing method is applied to the large flow rate gas mixing system as described in Examples 1 to 6 or the semiconductor process equipment as described in Example 7, comprising:

[0331] The first gas input unit 100 obtains the first gas and delivers the first gas to the first flow control unit 300;

[0332] The first flow control unit 300 obtains the first gas and controls the flow rate of the first gas flowing to the first gas mixing unit 500;

[0333] The second gas input unit 200 obtains the second gas and delivers the second gas to the second flow control unit 400;

[0334] The second flow control unit 400 obtains the second gas and controls the flow rate of the second gas to the first gas mixing unit 500;

[0335] The first gas mixing unit 500 obtains the first gas and the second gas and preliminarily mixes the first gas and the second gas to obtain a first mixed gas;

[0336] The first concentration analysis unit 600 obtains the first mixed gas and detects the concentration of the first mixed gas;

[0337] When the concentration of the first mixed gas detected by the first concentration analysis unit 600 meets the standard, the second gas mixing unit 700 obtains the first mixed gas and finely mixes the first mixed gas to obtain a second mixed gas;

[0338] The second concentration analysis unit 800 obtains the second mixed gas and detects the concentration of the second mixed gas;

[0339] When the concentration of the second mixed gas detected by the second concentration analysis unit 800 meets the standard, the first gas output unit 900 delivers the second mixed gas to the process equipment.

[0340] Specifically, the large flow rate gas mixing method described above can refer to the method of use in Example 1.

[0341] Furthermore, the large flow gas mixing method also includes:

[0342] The first gas input unit 100 delivers the first gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 to achieve zero gas calibration of the first concentration analysis unit 600 and the second concentration analysis unit 800;

[0343] The third gas input unit 1100 delivers the standard gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 to achieve standard gas calibration of the first concentration analysis unit 600 and the second concentration analysis unit 800 .

[0344] Specifically, the large flow rate gas mixing method described above can refer to the method of use of Example 2.

[0345] Furthermore, the large flow gas mixing method also includes:

[0346] The purge unit 1200 obtains the purge gas and delivers the purge gas to the entire pipeline and equipment to purge the entire pipeline and equipment.

[0347] Specifically, the large flow rate gas mixing method described above can refer to the method of use in Example 3.

[0348] Furthermore, the large flow gas mixing method also includes:

[0349] When the air pressure inside the pipeline exceeds a preset threshold, the pressure relief unit 1300 relieves the pressure on the entire pipeline and equipment.

[0350] Specifically, the large flow rate gas mixing method described above can refer to the method of use of Example 4.

[0351] Furthermore, the large flow gas mixing method also includes:

[0352] When the pressure in the pipeline exceeds a preset threshold, the pressure protection unit 1400 is opened, so that the pressure inside the pipeline can be discharged through the second gas output unit 1000 .

[0353] Specifically, the large flow rate gas mixing method described above can refer to the method of use in Example 5.

[0354] Furthermore, the large flow gas mixing method also includes:

[0355] In the event that the second mixed gas is cut off, the backup mixed gas supply unit 1500 may deliver the second mixed gas to the process equipment.

[0356] Specifically, the large flow rate gas mixing method described above can refer to the method of use of Example 6.

[0357] The technical effects of this embodiment are substantially the same as those of Embodiments 1 to 6, and will not be described in detail herein.

[0358] Example 9

[0359] This embodiment relates to a specific implementation of the large flow gas mixing system and method of the present invention.

[0360] like Fig.16 The first gas input unit 100 includes a manual diaphragm valve (MV1N, MV2NA, MV0F, MV2F, MV3F), a pressure regulating valve (REG1), a one-way valve (CV4), a pressure gauge (PG1, PG3), and a pressure sensor (PT1).

[0361] The second gas input unit 200 includes a manual diaphragm valve (MV1H, MV2HA), a pressure regulating valve (REG2), a pressure gauge (PG2, PG4), and a pressure sensor (PT2).

[0362] The first flow control unit 300 includes pneumatic diaphragm valves (AV2NA, AV3NA) and flow controllers (MFC1, MFC2).

[0363] The second flow control unit 400 includes pneumatic diaphragm valves (AV2HA, AV3HA) and flow controllers (MFC3, MFC4).

[0364] The first gas mixing unit 500 includes a buffer tube (Buffer TUBE) and a manual diaphragm valve (MV3S).

[0365] The first concentration analysis unit 600 includes a pneumatic diaphragm valve (AV1F), a one-way valve (CV2, CV3), a pressure regulating valve (REG3), a pressure gauge (PG5), and an analyzer (GRD-3000-1).

[0366] The second gas mixing unit 700 includes a gas mixing tank (Buffer Vessel) and manual diaphragm valves (TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, TV12).

[0367] The second concentration analysis unit 800 includes a pneumatic diaphragm valve (AV2F), a one-way valve (CV5, CV6), a pressure regulating valve (REG4), a pressure gauge (PG6), and an analyzer (GRD-3000-2).

[0368] The first gas output unit 900 includes a manual diaphragm valve (BYPASS2, MV3H, MV5M1, MV5M2, MV5M3), a pneumatic diaphragm valve (AV4M), a pressure regulating valve (disc, PRV1M), a pressure sensor (PT3, PT4), and a flow meter (MFM1, MFM2, MFM3, MFM4).

[0369] The second gas output unit 1000 includes manual diaphragm valves (TV2V, VAU1, VAU2).

[0370] The third gas input unit 1100 includes a cylinder (CYL) and a manual diaphragm valve (MV1F).

[0371] The purge unit 1200 includes a manual diaphragm valve (MV1P, VGO1, VGI1, PVS), a pneumatic diaphragm valve (APP-2, BYPASS1, AV0F), a one-way valve (CV1), and a Venturi vacuum pump (VG).

[0372] The pressure relief unit 1300 includes pressure relief valves (RV1, RV2, RV3, RV4, RV5, RV6, RV7).

[0373] The pressure protection unit 1400 includes a pneumatic diaphragm valve (BKV), a needle valve (MCV), a back pressure valve (BPR1V), and a pressure sensor (PT5).

[0374] The backup mixed gas supply unit 1500 includes a manual diaphragm valve (MV5M4), a pneumatic diaphragm valve (AV5M), and a pressure sensor (PT6).

[0375] Specifically, the large flow gas mixing method of this embodiment is as follows:

[0376] (I) Purge operation before mixing

[0377] The system keeps all diaphragm valves closed and opens MV1P, APP-2, MV2HA, BYPASS1, MV3S, BYPASS2, and MV3M, so that the purge gas fills the pipelines in the entire system and maintains the pressure for a period of time;

[0378] The system turns on VGI1 and VG, so that the power gas supply pipeline element provides power gas to the vacuum element 1205, and the vacuum element 1205 provides negative pressure at the second end of the third gas input element;

[0379] The system turns on AV0F, TV2V, PVS, and VG01, so that the gas in the entire pipeline is discharged through the third purge pipeline component, the third gas output component, and the vacuum pipeline component;

[0380] (II) Mixed gas calibration operation

[0381] The system turns on MV1N and MV2NA, so that REG1 can adjust the gas pressure inside the first gas input element to a suitable value;

[0382] The system turns on MV0F, MV3F, and REG3 to adjust the pressure so that the pressure of the first gas supplied to the first flowmeter meets the standard. The first gas after pressure adjustment can be adjusted by the first flowmeter so that the flow supplied to GRD-3000-1 meets the standard, thereby realizing the zero gas calibration of GRD-3000-1.

[0383] The system turns on MV2F and REG4 to adjust the pressure so that the pressure of the standard gas supplied to the third flowmeter meets the standard. The standard gas after pressure adjustment can be adjusted by the third flowmeter to make the flow supplied to GRD-3000-2 meet the standard, thereby realizing the zero gas calibration of GRD-3000-2.

[0384] After the first gas and the standard gas are used to calibrate the GRD-3000-1, the system turns on VAU1 and VAU2, so that the first gas and the standard gas can be discharged to the exhaust gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element;

[0385] After the first gas and the standard gas are used for calibration of GRD-3000-2, the system turns on VAU1 and VAU2, so that the first gas and the standard gas can be discharged to the exhaust gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element;

[0386] (III) Gas mixing operation

[0387] The system controls the first gas source and the second gas source to deliver the first gas and the second gas to the first gas input element and the second gas input element respectively, and turns on MV1N, MV2NA, MV1H, MV2HA, REG1 and REG2, so that REG1 and REG2 can adjust the gas pressure inside the first gas input element and the second gas input element to appropriate values ​​respectively;

[0388] After the pressure regulation is completed, the system turns on AV2NA, AV3NA, AV2HA, AV3HA, MFC1, MFC2, MFC3, and MFC4, thereby controlling the first flow pipeline element and the second flow pipeline element to deliver the first gas and the second gas with appropriate flow rates to the first gas mixing element 501, so that the first gas mixing element 501 can preliminarily mix the first gas and the second gas to obtain the first mixed gas;

[0389] The system turns on MV3S, AV1F, and REG3, so that the pressure of the first mixed gas supplied to the first flowmeter meets the standard. The pressure-regulated first mixed gas can be adjusted by the first flowmeter so that the flow of the first mixed gas supplied to GRD-3000-1 meets the standard, so that GRD-3000-1 can detect the first mixed gas until the concentration of the first mixed gas meets the standard.

[0390] In order to discharge the excess gas flowing to the first concentration input pipeline, the system opens BYPASS2, MV3M, TV2V, VAU1, and VAU2, so that the excess first mixed gas can be discharged to the exhaust gas treatment equipment through the first mixed gas output pipeline, the first gas output element, the third gas output element, and the fourth gas output element; in order to discharge the excess gas flowing to the first flowmeter, it can be discharged to the exhaust gas treatment equipment through the second analysis pipeline, the second flowmeter, the first concentration output pipeline, and the fourth gas output element. The first mixed gas detected by GRD-3000-1 can be discharged to the exhaust gas treatment equipment through the third analysis pipeline, the first concentration output pipeline, and the fourth gas output element;

[0391] When the concentration of the first mixed gas reaches the preset standard, the system turns off AV1F and BYPASS2, and turns on TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, and TV12, so that the first mixed gas sequentially enters the second gas mixing element 701 for mixing to obtain the second mixed gas;

[0392] The system turns on MV3M, AV2F, and REG4 to adjust the gas pressure so that the pressure of the second mixed gas delivered to the third flowmeter meets the standard. The second mixed gas after pressure adjustment can be adjusted by the third flowmeter so that the flow of the second mixed gas delivered to GRD-3000-2 meets the standard, so that GRD-3000-2 can detect the second mixed gas until the concentration of the second mixed gas meets the standard.

[0393] When the concentration of the second mixed gas reaches a preset standard, the system turns on MFM1, MFM2, MFM3, and MFM4, so that the second mixed gas can be delivered to the process equipment through the first gas output element and the second gas output element;

[0394] In order to discharge the excess gas flowing to the second flowmeter, it can be discharged to the exhaust gas treatment equipment through the fifth analysis pipeline, the fourth flowmeter, the second concentration output pipeline, and the fourth gas output element. The second mixed gas after being detected by GRD-3000-2 can be discharged to the exhaust gas treatment equipment through the sixth analysis pipeline, the first concentration output pipeline, and the fourth gas output element;

[0395] (IV) Pressure relief operation

[0396] When the pressure in the pipeline of the large-flow gas mixing system reaches the threshold value of 1Mpa, the gas in the pipeline can be discharged to the exhaust gas treatment equipment through RV1, RV2, RV3, RV4, RV5, RV6, and RV7;

[0397] (V) Overvoltage protection

[0398] BKV is normally open, MCV is adjusted to a suitable flow rate, and BPR1V is adjusted to a protection pressure. When the pressure is higher than the protection pressure, the gas will pass through BKV, MCV, BPR1V, and finally be discharged from the fourth gas output element;

[0399] (VI) Gas supply

[0400] When the mixed gas supply is cut off due to system failure, the system opens MV5M4, and the gas in the backup gas tank can flow to the backup gas supply pipeline components. When the gas pressure monitored by PT6 meets the requirements, the system opens AV5M, thereby ensuring that subsequent process equipment can work normally when the mixed gas supply is cut off due to system failure.

[0401] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0402] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A large flow gas mixing system, characterized in that: include: A first gas input unit, the first gas input unit is connected to a first gas source and is used to deliver a first gas; A second gas input unit, the second gas input unit is connected to a second gas source and is used to deliver a second gas; at least one first flow control unit, the first flow control unit being in communication with the first gas input unit and being located downstream of the first gas input unit, and being used to control the flow of the first gas; at least one second flow control unit, the second flow control unit being in communication with the second gas input unit and being located downstream of the second gas input unit, and being used to control the flow of the second gas; a first gas mixing unit, which is connected to the first flow control unit and the second flow control unit respectively, and is located downstream of the first flow control unit and downstream of the second flow control unit, and is used for preliminarily mixing the first gas and the second gas to obtain a first mixed gas; a first concentration analysis unit, which is connected to the first gas mixing unit and is located downstream of the first gas mixing unit, and is used to detect the concentration of the first mixed gas; a second gas mixing unit, the second gas mixing unit being in communication with the first gas mixing unit and configured to finely mix the first mixed gas to obtain a second mixed gas; a second concentration analysis unit, the second concentration analysis unit being in communication with the second gas mixing unit and being located downstream of the second gas mixing unit, and being used for detecting the concentration of the second mixed gas; a first gas output unit, the first gas output unit being connected to the first gas mixing unit, the second gas mixing unit, the second concentration analysis unit, and the process equipment respectively, and being located downstream of the second gas mixing unit, and being used for delivering the second mixed gas to the process equipment when the second concentration analysis unit detects that the gas meets the standard; The second gas output unit is connected to the first concentration analysis unit, the second concentration analysis unit, the first gas output unit, and the exhaust gas treatment equipment respectively, and is used for conveying the exhaust gas.

2. The large flow mixing system according to claim 1, characterized in that: The first gas input unit comprises: A first gas input element, the first gas input element is connected to the first gas source and the first flow control unit respectively, and is used to deliver the first gas; A first control valve element, the first control valve element is arranged at the first gas input element, and is used to control the flow of the first gas input element; and / or The second gas input unit comprises: A second gas input element, the second gas input element is connected to a second gas source and the second flow control unit, respectively, and is used to deliver a second gas; A second control valve element, the second control valve element is arranged at the second gas input element, and is used to control the flow of the second gas input element; and / or The first flow control unit comprises: at least one first flow pipeline element, the first flow pipeline element being connected to the first gas input unit and the first gas mixing unit respectively, and being used for delivering the first gas to the first gas mixing unit; at least one first flow control element, the first flow control element being disposed in the first flow pipeline element and being used to control the flow to the first gas mixing unit; at least one third control valve element, the third control valve element being disposed in the first flow line element and being used to control the flow of the first flow line element; and / or The second flow control unit comprises: at least one second flow pipeline element, the second flow pipeline element being connected to the second gas input unit and the first gas mixing unit respectively, and being used for delivering the second gas to the first gas mixing unit; at least one second flow control element, the second flow control element being disposed in the second flow pipeline element and being used for controlling the flow to the first gas mixing unit; at least one fourth control valve element, the fourth control valve element being disposed in the second flow line element and being used to control the flow of the second flow line element; and / or The first gas mixing unit comprises: a first gas mixing element, which is respectively connected to the first flow control unit, the second flow control unit, the first concentration analysis unit, the first gas output unit, and the second gas mixing unit, and is used to preliminarily mix the first gas and the second gas to obtain a first mixed gas; a fifth control valve element, the fifth control valve element being arranged at the first gas mixing element and being used for controlling the flow of the first gas mixing element; and / or The first concentration analysis unit comprises: a first concentration pipeline element, the first concentration pipeline element being connected to the first gas mixing unit and the first gas output unit respectively, and being used for conveying a first mixed gas; a first concentration analysis element, the first concentration analysis element being in communication with the first concentration pipeline element and being used for detecting the concentration of the first mixed gas; a sixth control valve element, the sixth control valve element being disposed in the first concentration pipeline element and being used to control the flow of the first concentration pipeline element; and / or The second gas mixing unit comprises: A plurality of second gas mixing elements, which are connected in series, and any one of the second gas mixing elements located at both sides is connected to the first gas mixing unit, and another second gas mixing element is connected to the first gas output unit, and is located downstream of the first gas mixing unit and upstream of the first gas output unit, for fine mixing the first mixed gas to obtain a second mixed gas; a plurality of seventh control valve elements, wherein the plurality of the seventh control valve elements are respectively arranged at corresponding second gas mixing elements, and are used to control the flow of the second gas mixing elements; and / or The second concentration analysis unit comprises: a second concentration pipeline element, the second concentration pipeline element being connected to the first gas output unit and the second gas output unit respectively, and being used for delivering a second mixed gas; a second concentration analysis element, the second concentration analysis element being in communication with the second concentration pipeline element and being used for detecting the concentration of the second mixed gas; an eighth control valve element, the eighth control valve element being disposed in the second concentration pipeline element and being used to control the flow of the second concentration pipeline element; and / or The first gas output unit comprises: a first gas output element, the first gas output element being connected to the first gas mixing unit, the first concentration analysis unit, the second gas mixing unit, and the second concentration analysis unit, respectively, and being used for delivering the first mixed gas or the second mixed gas; a ninth control valve element, the ninth control valve element being disposed at the first gas output element and being used to control the flow of the first gas output element; at least one second gas output element, the second gas output element being connected to the first gas output element and the process equipment respectively, and being used for delivering a second mixed gas to the process equipment; at least one tenth control valve element, the tenth control valve element being disposed at the second gas output element for controlling the flow of the second gas output element; and / or The second gas output unit comprises: a third gas output element, the third gas output element being in communication with the first gas output unit and being used for conveying exhaust gas; an eleventh control valve element, the eleventh control valve element being disposed at the second gas output element and being used to control a flow rate of the second gas output element; at least one fourth gas output element, the fourth gas output element being connected to the third gas output element and the exhaust gas treatment device respectively, and being used for conveying the exhaust gas; At least one twelfth control valve element, the twelfth control valve element is disposed at the fourth gas output element, and is used to control the flow of the fourth gas output element.

3. The large flow gas mixing system according to claim 2, characterized in that: The first gas input unit further comprises: a first pressure regulating element, the first pressure regulating element being disposed at the first gas input element and being used for regulating the gas pressure inside the first gas input element; A first pressure monitoring element, which is connected to the first gas input element and is used to monitor the gas pressure upstream and downstream of the first pressure regulating element; and / or The first gas input unit further comprises: a second pressure monitoring element, which is in communication with the first gas input element and is located downstream of the first control valve element, and is used to monitor the gas pressure inside the first gas input element; and / or The second gas input unit further comprises: a second pressure regulating element, the second pressure regulating element being disposed at the second gas input element and being used for regulating the gas pressure inside the second gas input element; A third pressure monitoring element, the third pressure monitoring element is connected to the second gas input element and is used to monitor the gas pressure upstream and downstream of the second pressure regulating element; and / or The second gas input unit further comprises: a fourth pressure monitoring element, the fourth pressure monitoring element being in communication with the second gas input element and being located downstream of the second control valve element, for monitoring the gas pressure inside the second gas input element; and / or The first concentration analysis unit also includes: a third pressure regulating element, the third pressure regulating element being arranged in the first concentration pipeline element and being used for regulating the gas pressure inside the first concentration pipeline element; a fifth pressure monitoring element, the fifth pressure monitoring element being in communication with the first concentration pipeline element and being used for monitoring the gas pressure inside the first concentration pipeline element; and / or The second concentration analysis unit also includes: a fourth pressure regulating element, the fourth pressure regulating element being disposed in the second concentration pipeline element and being used for regulating the gas pressure inside the second concentration pipeline element; a sixth pressure monitoring element, the sixth pressure monitoring element being in communication with the second concentration pipeline element and being used for monitoring the gas pressure inside the second concentration pipeline element; and / or The first gas output unit further comprises: a fifth pressure regulating element, the fifth pressure regulating element being disposed at the first gas output element and being used for regulating the gas pressure inside the first gas output element; a seventh pressure monitoring element, the seventh pressure monitoring element being in communication with the first gas output element and being used for monitoring the gas pressure in the upstream and downstream of the fifth pressure regulating element; and / or The first gas output unit further comprises: a first flow detection element, which is disposed in the first gas output element and is used to detect the flow inside the first gas output element; At least one second flow detection element, wherein the second flow detection element is disposed at the corresponding second gas output element and is used to detect the flow inside the second gas output element.

4. The large flow gas mixing system according to any one of claims 1 to 3, characterized in that: Also includes: The first gas input unit is in communication with the first concentration analysis unit and is used to deliver the first gas to the first concentration analysis unit so that the first concentration analysis unit uses the first gas for zero gas calibration; The first gas input unit is in communication with the second concentration analysis unit, and is used to deliver the first gas to the second concentration analysis unit so that the second concentration analysis unit uses the first gas for zero gas calibration; a third gas input unit, the third gas input unit being connected to the standard gas source, the first concentration analysis unit, and the second concentration analysis unit, respectively, and being used to perform standard gas calibration on the first concentration analysis unit and the second concentration analysis unit; and / or a purge unit, the purge unit being connected to the second gas input unit and the second gas output unit respectively, and being used for purging the entire pipeline and equipment; and / or a pressure relief unit, the pressure relief unit being connected to the first gas mixing unit, the second gas mixing unit, and the second gas output unit, respectively, for pressure relief; and / or a pressure protection unit, the pressure protection unit being respectively connected to the first gas output unit, the second gas output unit, the first gas mixing unit and the second gas mixing unit, for protecting the pipeline; and / or A backup mixed gas supply unit is connected to the first gas output unit and is used to deliver gas to the process equipment.

5. The large flow gas mixing system according to claim 4, characterized in that: The first gas input unit further comprises: a third gas input element, the third gas input element being in communication with the first gas input unit and being used for delivering the first gas; a thirteenth control valve element, the thirteenth control valve element being disposed at the third gas input element and being used to control the flow of the third gas input element; a fourth gas input element, the fourth gas input element being connected to the third gas input element and the first concentration analysis unit respectively, and being used for delivering the first gas to the first concentration analysis unit so that the first concentration analysis unit can be calibrated with zero gas; a fourteenth control valve element, the fourteenth control element being disposed at the fourth gas input element and being used to control the flow of the fourth gas input element; a fifth gas input element, the fifth gas input element being connected to the third gas input element and the second concentration analysis unit respectively, and being used for delivering the first gas to the second concentration analysis unit so that the second concentration analysis unit can be calibrated with zero gas; a fifteenth control valve element, the fifteenth control valve element being disposed at the fifth gas input element and being used to control the flow of the fifth gas input element; and / or The third gas input unit comprises: a sixth gas input element, the sixth gas input element being connected to the standard gas source, the first concentration analysis unit, and the second concentration analysis unit, respectively, and being used to deliver standard gas to the first concentration analysis unit and the second concentration analysis unit so that the second concentration analysis unit performs standard gas calibration; a sixteenth control valve element, the sixteenth control valve element being disposed at the sixth gas input element and being used to control the flow of the sixth gas input element; and / or The purge unit comprises: a first purge pipeline element, the first purge pipeline element being connected to a purge gas source and the second gas input unit respectively, and being used for conveying a purge gas; a seventeenth control valve element, the seventeenth control valve element being disposed on the first purge pipeline element and being used to control the flow of the first purge pipeline element; a second purge pipeline element, the second purge pipeline element being connected to the second gas input unit and the first gas mixing unit respectively, and being used for conveying purge gas; an eighteenth control valve element, the eighteenth control valve element being disposed in the second purge pipeline element and being used to control the flow of the second purge pipeline element; a third purge pipeline element, the third purge pipeline element being connected to the first gas mixing unit and the second gas output unit respectively, and being used for conveying purge gas; a nineteenth control valve element, the nineteenth control valve element being disposed on the third purge pipeline element and being used to control the flow of the third purge pipeline element; A vacuum pipeline element, the vacuum pipeline element is connected to the second gas output unit and the exhaust gas treatment device respectively, and is used to transport the exhaust gas; a twentieth control valve element, the twentieth control valve element being disposed in the vacuum pipeline element and used for controlling the flow of the vacuum pipeline element; A vacuum element, which is arranged on the vacuum pipeline element and is used to form a vacuum negative pressure at the end of the second gas input unit; A power gas supply pipeline component, the power gas supply pipeline component is connected to the vacuum component and the power gas source respectively, and is used to transport the power gas source; a twenty-first control valve element, the twenty-first control valve element being disposed in the power supply pipeline element and being used to control the flow of the power gas supply pipeline element; and / or The pressure relief unit comprises: a first pressure relief pipeline element, wherein the first pressure relief pipeline element is connected to the first gas output unit and the second gas output unit respectively; a first pressure relief valve element, the first pressure relief valve element being disposed in the first pressure relief pipeline element and being used for opening and achieving pressure relief when the pressure inside the first pressure relief pipeline element exceeds a preset pressure threshold; A plurality of second pressure relief pipeline elements, wherein the plurality of second pressure relief pipeline elements are respectively connected to the second gas mixing unit and the second gas output unit; a plurality of second pressure relief valve elements, each of which is disposed in a corresponding second pressure relief piping element and is used to open and achieve pressure relief when the pressure inside the second pressure relief piping element exceeds a preset pressure threshold; and / or The pressure protection unit comprises: a pressure protection pipeline element, the pressure protection pipeline element being connected to the first gas output unit and the second gas output unit respectively, and the connection point between the pressure protection pipeline element and the first gas output unit is located between the second gas mixing unit and the second concentration analysis unit, and is used for conveying gas; a twenty-second control valve element, the twenty-second control valve element being disposed in the pressure protection pipeline element and being used to control the flow of the pressure protection pipeline element; a first protection element, which is disposed in the pressure protection pipeline element and is located downstream of the twenty-second control valve element, and is used to open when the gas flow in the pipeline is too large; A second protection element, which is arranged on the pressure protection pipeline element and is located downstream of the first protection element, and is used to open when the gas pressure in the pipeline is too high; an eighth pressure monitoring element, the eighth pressure monitoring element being in communication with the pressure protection piping element and being located downstream of the second protection element, and being used for monitoring the air pressure inside the pressure protection piping element; and / or The backup mixed gas supply unit comprises: A backup gas supply pipeline element, the backup gas supply pipeline element is connected to the backup gas source and the first gas output unit respectively, and is used to deliver the mixed gas to the process equipment; a twenty-third control valve element, the twenty-third control valve element being disposed on the backup gas supply pipeline element and being used to control the flow of the backup gas supply pipeline element; a ninth pressure monitoring element, the ninth pressure monitoring element being in communication with the backup gas supply pipeline element and being used for monitoring the gas pressure inside the backup gas supply pipeline element; A third flow detection element is provided in the backup gas supply pipeline element and is used to detect the flow inside the backup gas supply pipeline element.

6. A semiconductor process equipment, characterized in that: include: A high-flow gas mixing system as claimed in any one of claims 1 to 5.

7. A large flow gas mixing method, characterized in that: Applicable to the large flow gas mixing system according to any one of claims 1 to 5 or the semiconductor process equipment according to claim 6, comprising: The first gas input unit obtains the first gas and delivers the first gas to the first flow control unit; The first flow control unit obtains the first gas and controls the flow rate of the first gas to the first gas mixing unit; The second gas input unit obtains the second gas and delivers the second gas to the second flow control unit; The second flow control unit obtains the second gas and controls the flow rate of the second gas to the first gas mixing unit; The first gas mixing unit obtains the first gas and the second gas and preliminarily mixes the first gas and the second gas to obtain a first mixed gas; The first concentration analysis unit obtains the first mixed gas and detects the concentration of the first mixed gas; When the concentration of the first mixed gas detected by the first concentration analysis unit meets the standard, the second gas mixing unit obtains the first mixed gas and finely mixes the first mixed gas to obtain a second mixed gas; The second concentration analysis unit obtains the second mixed gas and detects the concentration of the second mixed gas; When the concentration of the second mixed gas detected by the second concentration analysis unit meets the standard, the first gas output unit delivers the second mixed gas to the process equipment.

8. The large flow gas mixing method according to claim 7, characterized in that: Also includes: The first gas input unit delivers the first gas to the first concentration analysis unit and the second concentration analysis unit to achieve zero gas calibration of the first concentration analysis unit and the second concentration analysis unit; The third gas input unit delivers standard gas to the first concentration analysis unit and the second concentration analysis unit to achieve standard gas calibration of the first concentration analysis unit and the second concentration analysis unit; and / or The purge unit obtains the purge gas and delivers the purge gas to the entire pipeline and equipment to purge the entire pipeline and equipment; and / or When the air pressure inside the pipeline exceeds a preset threshold, the pressure relief unit relieves the pressure of the entire pipeline and equipment; and / or When the pressure in the pipeline exceeds a preset threshold, the pressure protection unit is turned on, so that the pressure inside the pipeline can be discharged through the second gas output unit; and / or In the event that the second mixed gas is cut off, the backup mixed gas supply unit may deliver the second mixed gas to the process equipment.

9. The large flow gas mixing method according to claim 7 or 8, characterized in that: Also includes: The first gas input element obtains the first gas and delivers the first gas to the first flow line element; The first flow line element obtains the first gas and controls the flow rate of the first gas to the first gas mixing element through the first flow control element; The second gas input element obtains the second gas and delivers the second gas to the second flow line element; The second flow pipeline element obtains the second gas and controls the flow rate of the second gas to the first gas mixing element through the second flow control element; The first gas mixing element obtains the first gas and the second gas and preliminarily mixes the first gas and the second gas to obtain a first mixed gas; The first concentration pipeline element obtains the first mixed gas and transmits it to the first concentration analysis element to detect the concentration of the first mixed gas; When the concentration of the first mixed gas detected by the first concentration analysis element meets the standard, the second gas mixing element obtains the first mixed gas and performs fine mixing on the first mixed gas to obtain the second mixed gas; The second concentration pipeline element obtains the second mixed gas and transmits it to the second concentration analysis element to detect the concentration of the second mixed gas; When the concentration of the second mixed gas detected by the second concentration analysis element meets the standard, the first gas output element and the second gas output element deliver the second mixed gas to the process equipment.

10. The large flow gas mixing method according to claim 9, characterized in that: Also includes: The first gas input element delivers the first gas to the first concentration analysis element and the second concentration analysis element to achieve zero gas calibration of the first concentration analysis element and the second concentration analysis element; The fifth gas input element delivers the standard gas to the first concentration analysis element and the second concentration analysis element to achieve standard gas calibration of the first concentration analysis element and the second concentration analysis element; and / or The purge pipeline element obtains the purge gas and delivers the purge gas to the entire pipeline and equipment to purge the entire pipeline and equipment; and / or When the air pressure inside the pipeline exceeds a preset threshold, the first pressure relief pipeline element and the second pressure relief pipeline element are opened to relieve the pressure of the entire pipeline and equipment; and / or When the pressure in the pipeline exceeds a preset threshold, opening the first pressure protection pipeline element and the second pressure protection pipeline element, so that the pressure inside the pipeline can be discharged through the second gas output unit; and / or In the event that the second mixed gas is cut off, the backup gas supply pipeline element can deliver the second mixed gas to the process equipment.

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