Novel multi-purpose furnace experiment equipment

Abstract

The invention relates to novel multi-purpose furnace experimental equipment which comprises a magnetron sputtering device, a high-temperature evaporation device, a sample support, a fixing frame and a transfer table, all parts of the equipment work cooperatively, accurate control and multi-dimensional treatment of samples are achieved, and remarkable convenience and benefits are brought to scientific research and production. The production efficiency is improved, and the material processing time is shortened; operation safety is improved, and direct contact of workers with high temperature and residual materials is reduced; the error risk is reduced, and the material replacement process is accurately controlled; labor intensity is reduced, and material carrying and replacing are automatically completed; material utilization rate is increased, waste is reduced, production environment cleanliness is improved, and product quality is guaranteed; and energy loss and waste generation are reduced, and the environmental burden is relieved.

Description

Technical Field

[0001] The invention relates to a novel multi-purpose furnace experimental device, in particular to a novel multi-purpose furnace experimental device integrating multiple functions such as magnetron sputtering and high-temperature evaporation, and belongs to the technical field of material science experiments and processing. Background Art

[0002] In the wave of continuous progress in industrial technology, especially in key industries such as metallurgy, ceramics and chemicals, the application demand for furnace materials is undergoing unprecedented changes. These industries have increasingly diversified and refined performance requirements for furnace materials to meet the ever-increasing product needs and process standards. However, the traditional method of replacing furnace materials is inadequate. It is inefficient, time-consuming and heavily dependent on human resources, which not only increases production costs, but also may lead to the inability to fully guarantee the safety and stability of furnace operations.

[0003] In the face of this challenge, multi-purpose furnace technology came into being, aiming to optimize the replacement process of materials in the furnace through technological innovation, improve production efficiency, shorten replacement time, and maximize the utilization of human resources. The design of the multi-purpose furnace fully considers the diversity and refinement requirements of the materials in the furnace, and realizes flexible processing and efficient utilization of different materials by integrating multiple functional modules.

[0004] In the process of replacing materials in the furnace, the traditional replacement method often lacks standardization and automation, resulting in low replacement efficiency and prone to errors. In addition, the operating environment in the furnace is complex and changeable, requiring high professional skills and safety awareness of personnel, further increasing the risks and uncertainties in the replacement process.

[0005] Therefore, in order to improve the efficiency and safety of material replacement in the furnace, multi-purpose furnace technology came into being. By integrating advanced automation and intelligent technologies, multi-purpose furnaces can accurately identify and efficiently process different materials, thereby greatly shortening the replacement time and reducing labor costs. At the same time, the design of multi-purpose furnaces also fully considers the safety and stability requirements of furnace operations, and ensures the stability and controllability of the furnace environment by adopting advanced materials and manufacturing processes.

[0006] In summary, with the continuous advancement of industrial technology and the accelerated advancement of industrial upgrading, the demand for diversification and refinement of furnace materials will become increasingly prominent. As one of the important means to cope with this challenge, multi-purpose furnace technology will play a more important role in the future. Through continuous optimization and innovation, multi-purpose furnaces will provide strong support for achieving a more efficient, safer and more environmentally friendly furnace material replacement process. Summary of the invention

[0007] In order to overcome the shortcomings of the prior art, the present invention provides a new type of multi-purpose furnace experimental equipment, which integrates multiple functions such as magnetron sputtering and high-temperature evaporation, and provides an efficient and flexible platform for material processing and scientific experiments.

[0008] A new type of multi-purpose furnace experimental equipment includes a vacuum chamber shell, wherein the vacuum chamber shell is equipped with 5 layers of special fixed racks, 3 layers of special transfer racks, a vacuum pump for extracting residual evaporation and sputtering materials, several sample holders and gas sources, wherein the special fixed rack is equipped with a magnetron sputtering device and a high-temperature evaporation device, wherein the magnetron sputtering device is located in the lower area of ​​the vacuum chamber shell, fixedly installed on the lower layer of the special fixed rack, and the sputtering nozzle is facing downward; the high-temperature evaporation device is located in the upper area of ​​the vacuum chamber shell, and the evaporation nozzle is facing upward; the sample holder carries the sample, exchanges positions between the 3 layers of the special transfer rack, and realizes rotation around the x-axis in the middle layer of the special fixed rack. The magnetron sputtering device is located in the lower area of ​​the vacuum chamber, fixedly installed on the e layer of the special fixed rack, and its sputtering head is facing downward, and is used to accurately deposit the sputtering material on the sample. The high-temperature evaporation device is located in the upper area of ​​the vacuum chamber, fixedly installed on the inner top of the vacuum chamber, and the evaporation head is facing upward, and can perform high-temperature evaporation treatment on the sample.

[0009] The special fixing frame is fixed to the upper and lower ends of the vacuum chamber by fixing rods, and extends from top to bottom into five layers a, b, c, d, and e, wherein the three layers a, c, and e are designed as a three-prong structure, and a pneumatic nozzle is installed at the tail of the rod.

[0010] The pneumatic nozzle has different spraying directions, layer a is 30° upward, layer c is rightward, and layer e is ±30° upward and downward to meet different experimental requirements. The c layer of the special fixed frame can also rotate around the x-axis under the control of the power supply, providing a multi-dimensional processing environment for the sample.

[0011] The specially made fixing frame c layer rotates around the x-axis under the action of the control power supply.

[0012] The special transfer stand is fixed to the upper and lower ends of the vacuum chamber by fixing rods, and a double-layer tripod structure is extended from top to bottom, which can move up and down between the corresponding a, c, and e layers. At the end of the a, c, and e layers, a gas nozzle is also designed, with the spray direction to the left, to further control the experimental environment.

[0013] The specially made transfer stand is designed with gas nozzles at the ends of the a, c, and e3 layers, with the spray direction being to the left.

[0014] The sample holder is divided into three parts: upper, middle and lower. The middle part is designed with three through holes, which cooperate with the tripod rods of the special fixing frame and the special transfer stand to ensure that the sample can be stably fixed on the equipment.

[0015] The upper part of the sample holder can hold a sample with the sample surface facing upwards, and the lower part can hold a sample with the sample surface facing downwards. This design enables the device to process multiple samples at the same time and meet different experimental requirements.

[0016] The gas source supplies inert gases of different densities to the nozzles under the command of the control power supply, wherein the a layer is low-density gas and the c and e layers are high-density gas, so as to achieve precise control of the experimental environment.

[0017] The vacuum pump is responsible for extracting the residual evaporation and sputtering materials in the vacuum chamber to ensure the cleanliness of the experimental environment. One vacuum pump is set at the top of the vacuum chamber, and the other is set at the bottom of the vacuum chamber. They are respectively pointed obliquely upward / obliquely downward by the a-layer nozzle / e-layer nozzle of the special fixed frame to optimize the exhaust effect.

[0018] During the experiment, the sample carried by the sample holder exchanges positions between the three layers a, c, and e of the special transfer stand, and rotates around the x-axis on the c layer of the special fixed frame, so as to receive experimental treatments in different directions and treatment methods. The magnetron sputtering device and the high-temperature evaporation device sputter and evaporate the samples according to the experimental requirements. The gas source provides inert gas of different densities to the experimental environment through various pneumatic nozzles to control the experimental atmosphere. The vacuum pump works continuously to ensure the cleanliness and stability of the experimental environment.

[0019] Compared with the prior art, the present invention has the following beneficial effects:

[0020] The novel multi-purpose furnace experimental equipment of the present invention integrates multiple functions into one, providing an efficient and flexible platform for material processing and scientific experiments. The various components of the equipment work together to achieve precise control and multi-dimensional processing of samples, bringing significant convenience and benefits to scientific research and production. Improve production efficiency and shorten material processing time; improve operational safety and reduce workers' direct contact with high temperature and residual materials; reduce the risk of errors and accurately control the material replacement process; reduce labor intensity and automatically complete material handling and replacement; improve material utilization, reduce waste, improve the cleanliness of the production environment, and ensure product quality; save energy and protect the environment, reduce energy loss and waste generation, and reduce environmental burden. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1This is the overall structural diagram of a novel multi-purpose furnace experimental equipment of the present invention;

[0023] Figure 2 It is a structural diagram of a magnetron sputtering device in a novel multi-purpose furnace experimental equipment of the present invention;

[0024] Figure 3 It is a structural diagram of the sample holder flipping in a novel multi-purpose furnace experimental equipment of the present invention;

[0025] Figure 4 It is a structural diagram of the high-temperature steaming device and the pneumatic nozzle in a new type of multi-purpose furnace experimental equipment of the present invention;

[0026] Figure 5 Schematic diagram of gas cleaning in the vacuum chamber of the present invention.

[0027] In the figure, in the figure: 1-magnetron sputtering device; 2-high temperature evaporation device; 3-special fixing frame; 4-special transfer stand; 5-control power supply; 6-vacuum pump; 7-sample holder; 8-gas source; 9-vacuum chamber shell. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] Reference Figure 1 A new type of multi-purpose furnace experimental equipment, including: a magnetron sputtering device 1, a high-temperature evaporation device 2, a special fixed frame 3 (a, b, c, d, e 5 layers), a special transfer stand 4 (a, c, e 3 layers), a control power supply 5, a vacuum pump 6, a number of sample holders 7, a gas source 8, a vacuum chamber shell 9 and other components. The control power supply 5 provides power for the magnetron sputtering device 1, the high-temperature evaporation device 2, and the vacuum pump 6. The equipment is mainly aimed at the preparation process of composite thin films, and can perform two film-making operations of magnetron sputtering and high-temperature evaporation on multiple samples without destroying the vacuum environment as much as possible. The special fixed frame 3 is fixed to the upper and lower ends of the vacuum chamber by a fixing rod, and extends from top to bottom to fix the a, b, c, d, e 5 layers, among which the b and d layers are used to fix the high-temperature evaporation device 2 and the magnetron sputtering device 1 respectively; the a, c, and e layers are designed as a three-prong structure, and a pneumatic nozzle is installed at the tail of the rod. The positions at the same height as the three layers of the special fixed rack 3a, c, e are the three layers a, c, e of the special transfer stand 4, which are used for storing the sample holder 7 and the specimens.

[0030] Reference Figure 2, the special transfer stand 4 is close to the vacuum chamber door, which is convenient for placing the sample holder 7. After the placement, the chamber door is closed and the vacuum pump starts to operate. Taking the sample holder on the c layer on the special transfer stand 4 as an example, the sample holder 7 moves from the c layer to the e layer from top to bottom, and slides from right to left to the e layer of the special fixed frame 3 under the action of the pneumatic nozzle. The magnetron sputtering device 1 starts coating from top to bottom. At this time, the sample m on the upper part of the sample holder 7 begins to grow the first layer of thin film.

[0031] Reference Figure 3 For example, when the sample m needs to be coated with a second layer of film by high-temperature evaporation on the basis of the first layer of film, it returns to the e layer of the special transfer stand 4 under the action of the pneumatic nozzle, rises to the c layer, and then moves to the c layer of the special fixed stand 3. Considering the factors such as the nozzle of the high-temperature evaporation device 2 is suitable for spraying from bottom to top, the sample m completes a 180° rotation around the x-axis on the c layer of the special fixed stand, and then returns to the special transfer stand 4.

[0032] Reference Figure 4 , the high temperature evaporation device 2 performs the coating experiment on the sample m from bottom to top. In addition, for the pneumatic nozzle, the special fixing frame a layer adopts oblique upward spraying. While pushing the sample holder to slide, the sprayed inert gas cleans the track and other parts. The special fixing frame e layer adopts oblique upward spraying to give the sample holder a sliding force, and uses oblique upward spraying to clean the track and other parts. During cleaning, the spray direction points to the vacuum pump outlet.

[0033] Reference Figure 5 The gas source 8 supplies inert gases of different densities to the nozzles, wherein the a layer is low-density gas, and the c and e layers are high-density gas. In this way, the upper and lower vacuum pumps 6 can extract the gas in the cavity nearby, and avoid the deposition or contamination of the components in the cavity by chemical substances as much as possible.

[0034] The present invention fully addresses the complexity of vacuum experiments, that is, each time the chamber door is opened, the vacuum environment inside the chamber will be damaged, so the experimental efficiency is improved as much as possible. At the same time, a pneumatic nozzle is introduced to realize the movement of the sample holder and the self-cleaning function of the parts in the vacuum chamber. Finally, from the perspective of application, compared with existing experimental equipment, this invention can set experimental parameters more flexibly and efficiently, greatly reducing the experimental errors caused by contamination in the chamber.

[0035] The embodiments of the present invention are described in detail above with reference to the accompanying drawings, but the present invention is not limited to the described embodiments. For those skilled in the art, various changes, modifications, substitutions and variations of these embodiments are made without departing from the principles and spirit of the present invention, and still fall within the scope of protection of the present invention.

Claims

1. A new type of multi-purpose furnace experimental equipment, characterized by: It includes a vacuum chamber shell, in which are installed 5 layers of special fixing frames, 3 layers of special transfer racks, a vacuum pump for extracting residual evaporated and sputtered materials, a number of sample holders and a gas source; the special fixing frame is installed with a magnetron sputtering device and a high-temperature evaporation device; the magnetron sputtering device is located in the lower area of ​​the vacuum chamber shell and is fixedly installed on the lower layer of the special fixing frame, with the sputtering nozzle facing downward; the high-temperature evaporation device is located in the upper area of ​​the vacuum chamber shell, with the evaporation nozzle facing upward; the sample holder carries the sample, exchanges positions between the 3 layers of the special transfer rack, and realizes rotation around the x-axis in the middle layer of the special fixing frame.

2. A novel multi-purpose furnace experimental equipment according to claim 1, characterized in that: The special fixing frame is fixed to the upper and lower ends of the vacuum chamber shell by fixing rods, and extends from top to bottom into five layers a, b, c, d, and e, wherein the three layers a, c, and e are designed as a three-prong structure, and a pneumatic nozzle is installed at the tail of the rod.

3. A novel multi-purpose furnace experimental equipment according to claim 2, characterized in that: The pneumatic nozzles have different spraying directions: layer a is 30° upward, layer c is rightward, and layer e is ±30° upward and downward.

4. A novel multi-purpose furnace experimental equipment according to claim 2, characterized in that: The specially made fixing frame c layer rotates around the x-axis under the action of the control power supply.

5. The novel multi-purpose furnace experimental equipment according to claim 1 is characterized in that: The special transfer stand is fixed to the upper and lower ends of the vacuum chamber shell by fixing rods, and a double-layer tripod rod structure is extended from top to bottom and fixed, which can move up and down between the corresponding a, c, and e3 layers.

6. A novel multi-purpose furnace experimental equipment according to claim 5, characterized in that: The specially made transfer stand is designed with gas nozzles at the ends of the a, c, and e3 layers, with the spray direction being to the left.

7. The novel multi-purpose furnace experimental equipment according to claim 1 is characterized in that: The sample holder is divided into three parts: upper, middle and lower. The middle part is designed with three through holes, which match with the tripod rods of the special fixing frame and the special transfer stand.

8. The novel multi-purpose furnace experimental equipment according to claim 7 is characterized in that: A sample can be fixed on the upper part of the sample holder, with the sample surface facing upward; and a sample can be fixed on the lower part, with the sample surface facing downward.

9. The novel multi-purpose furnace experimental equipment according to claim 1 is characterized in that: The gas source supplies inert gases of different densities to the nozzles under the command of the control power supply, wherein the a layer is low-density gas, and the c and e layers are high-density gas.

10. The novel multi-purpose furnace experimental equipment according to claim 1 is characterized in that: One of the vacuum pumps is arranged at the top of the vacuum chamber, and the other is arranged at the bottom of the vacuum chamber.

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