Double-channel chemical vapor deposition furnace with weighing device

Abstract

The invention discloses a double-channel chemical vapor deposition furnace with a weighing device, and belongs to the technical field of chemical vapor deposition furnaces. Comprising a weighing sensor and a reaction chamber, in order to display the weight in real time, one end of the weighing sensor is connected with a controller, and the other end is connected with a fixed pulley; the fixed pulley, the lifting pulley and the carrying disc are connected through the pulling rope, the mass of a base material is measured in real time through the weighing sensor, repeated blowing-in for weighing is avoided to the maximum extent, and therefore energy is saved, and production efficiency is greatly improved. The weighing device of the deposition furnace can be reasonably arranged on the furnace top cover of the deposition furnace, and the mass of a base material can be measured in real time through the weighing sensor in the deposition experiment process; the deposition effect is roughly obtained according to the quality of the base material, so that the progress of a deposition experiment is judged, the optimal experiment time is mastered, the frequency of repeated blowing-in for weighing is reduced to the maximum extent, resources are saved, and the production efficiency is improved.

Description

Technical Field

[0001] The invention belongs to the technical field of chemical vapor deposition furnaces, and in particular relates to a double-channel chemical vapor deposition furnace with a weighing device. Background Art

[0002] A vapor deposition furnace is a device used for material deposition. Its basic principle is to convert gaseous precursors into solid thin films or coatings through gas phase reactions. At present, the method to reflect the deposition effect of a deposition furnace is to judge by the difference in substrate quality before and after deposition. Specifically, before deposition, the substrate is weighed, and then the technicians select a certain deposition time and deposition temperature based on experience. Finally, the substrate is taken out of the deposition furnace and weighed to calculate the deposition difference. If the deposition effect fails to achieve the expected goal, then the above steps need to be repeated, including re-weighing, adjusting the deposition time and temperature, vacuuming and filling with protective gas, etc., until the ideal deposition effect is finally obtained.

[0003] Currently, the weighing of the substrate is carried out outside the deposition furnace, and each weighing must be carried out after the entire process is completed. This means that if the deposition does not achieve the expected effect, the entire process needs to be repeated and the deposition time needs to be recalculated. This repetitive operation not only wastes a lot of manpower and time, resulting in a waste of resources, but also greatly reduces the deposition efficiency of the product and has a certain impact on the performance of the substrate after deposition. Summary of the invention

[0004] The present invention mainly solves the technical problems existing in the above-mentioned prior art and provides a double-channel chemical vapor deposition furnace with a weighing device.

[0005] The above technical problems of the present invention are mainly solved by the following technical solutions: a dual-channel chemical vapor deposition furnace with a weighing device, comprising a reaction furnace and a mixing tank, the reaction furnace comprising a reaction chamber and a furnace top, the furnace wall of the reaction chamber is a hollow structure, a water cooling device is arranged in the furnace wall of the reaction chamber, an exhaust channel and a weighing channel are arranged on the top of the furnace top, an isolation plate is arranged between the exhaust channel and the weighing channel, a controller, a weighing sensor and a wire box are arranged in the weighing channel, the wire box is arranged on the inner wall surface of the weighing channel, the controller and the weighing sensor are arranged on the top of the weighing channel, the control is connected to the weighing sensor for monitoring weight, a lifting pulley is arranged in the wire box, a fixed pulley is arranged at the bottom of the weighing sensor, a traction rope is arranged in the wire box, one end of which is fixedly connected to the lifting pulley, and the other end is bypassed by the fixed pulley and vertically arranged in the reaction chamber, and a loading plate is arranged on the end.

[0006] Preferably, the isolation plate is provided with a plurality of vent holes, so that the gas in the weighing channel can flow into the exhaust channel through the vent holes for exhaust during the exhaust process.

[0007] Preferably, an air inlet is provided at the bottom of the reaction chamber, and an air inlet pipe is connected between the gas mixing tank and the air inlet of the reaction furnace.

[0008] Preferably, a plurality of gas tanks are connected to the gas mixing tank, the gas tanks are connected to the gas mixing tank via pipelines, and flow meters are provided between the gas tanks and the gas mixing tanks.

[0009] Preferably, the water cooling device comprises a water exchange water pipe spirally wound inside the furnace wall of the reaction chamber.

[0010] The invention has the beneficial effects of comprising a weighing sensor and a reaction chamber, wherein, in order to display the weight in real time, one end of the weighing sensor is connected to the controller, and the other end is connected to the fixed pulley; the fixed pulley, the lifting pulley and the loading plate are connected by a traction rope, and the mass of the substrate is measured in real time by a weighing sensor, so that repeated opening of the furnace for weighing is avoided to the greatest extent, thereby saving energy and greatly improving production efficiency;

[0011] The deposition furnace weighing device can be reasonably set on the top cover of the deposition furnace. During the deposition experiment, the mass of the substrate can be measured in real time through the weighing sensor. The deposition effect can be roughly obtained through the mass of the substrate, thereby judging the progress of the deposition experiment, grasping the best experimental time, and minimizing the number of repeated furnace openings for weighing, saving resources, and improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a structural schematic diagram of the present invention;

[0013] Figure 2 It is a structural schematic diagram of a weighing channel of the present invention;

[0014] Figure 3 It is a structural schematic diagram of a hot water exchange pipe of the present invention;

[0015] Figure 4 It is a structural schematic diagram of the isolation plate of the present invention.

[0016] In the figure: 1. Reactor; 2. Mixing tank; 3. Reaction chamber; 4. Furnace roof; 5. Water cooling device; 6. Exhaust channel; 7. Weighing channel; 8. Isolation plate; 9. Controller; 10. Weighing sensor; 11. Wire box; 12. Lifting pulley; 13. Fixed pulley; 14. Traction rope; 15. Loading tray; 16. Vent; 17. Air inlet; 18. Air inlet pipe; 19. Gas tank; 20. Flow meter; 21. Hot water exchange pipe. DETAILED DESCRIPTION

[0017] The technical solution of the present invention is further specifically described below through embodiments and in conjunction with the accompanying drawings.

[0018] Embodiment: A dual-channel chemical vapor deposition furnace with a weighing device, such as Figure 1-Figure 3 As shown, it includes a reaction furnace 1 and a mixing tank 2, the reaction furnace 1 includes a reaction chamber 3 and a furnace top 4, the furnace wall of the reaction chamber 3 is a hollow structure, a water cooling device 5 is arranged in the furnace wall of the reaction chamber 3, an exhaust channel 6 and a weighing channel 7 are arranged on the top of the furnace top 4, an isolation plate 8 is arranged between the exhaust channel 6 and the weighing channel 7, a controller 9, a weighing sensor 10 and a wire box 11 are arranged in the weighing channel 7, the wire box 11 is arranged on the inner wall surface of the weighing channel 7, the controller 9 and the weighing sensor 10 are arranged on the top of the weighing channel 7, the control connection weighing sensor 10 is used to monitor the weight, a lifting pulley 12 is arranged in the wire box 11, a fixed pulley 13 is arranged at the bottom of the weighing sensor 10, a traction rope 14 is arranged in the wire box 11, one end of which is fixedly connected to the lifting pulley 12, and the other end is vertically arranged in the reaction chamber 3 around the fixed pulley 13, and a loading plate 15 is arranged on the end.

[0019] The isolation plate 8 is provided with a plurality of vent holes 16, so as to facilitate the gas in the weighing channel 7 to flow into the exhaust channel 6 through the vent holes 16 for exhaust during the exhaust process; an air inlet 17 is provided at the bottom of the reaction chamber 3, and an air inlet pipe 18 is connected between the mixing tank 2 and the air inlet 17 of the reactor 1; a plurality of gas tanks 19 are connected to the mixing tank 2, and the gas tanks 19 are connected to the mixing tank 2 through pipelines, and a flow meter 20 is provided between the gas tanks 19 and the mixing tank 2; the water cooling device 5 includes a hot water exchange pipe 21 spirally wound in the furnace wall of the reaction chamber 3.

[0020] The principle of the present invention: The weighing device is placed in the weighing channel 7, mainly by connecting the controller 9 with the upper end of the weighing sensor 10 to transmit signals in real time and control the deposition time. The lower end of the weighing sensor 10 is connected to the fixed pulley 13, and the traction rope 14 connects the fixed pulley 13 and the lifting pulley 12 that provides power, and the lifting pulley 12 is placed in the wire box 11. The other end of the traction rope 14 is connected to the loading plate 15, and the distance between the loading plate 15 and the air inlet is controlled through the lifting pulley 12;

[0021] The isolation plate 8 is placed between the weighing channel 7 and the exhaust channel 6. A plurality of vent holes 16 are left on the isolation plate 8. The main function of the isolation plate 8 is that when the reaction chamber 3 starts to react, the chamber will be filled with reaction gas. Before the furnace is opened, in order to exhaust all the reaction gas without leaving it in the weighing channel 7, a porous isolation plate 8 is set. The size of the vent holes 16 of the isolation plate 8 is adjustable, but it does not affect the vertical state of the pulling rope;

[0022] The gas inlet channel is connected to the gas mixing tank. In order to prevent the mixed gas from entering the reaction chamber 3 at a certain temperature, the gas mixing tank has a heating and heat preservation function. The gas mixing tank is connected to the gas tank 19. The number of gas tanks 19 is determined by the number of gases required for the experiment. In order to control the intake volume and intake speed, a flow meter 20 is connected between the gas tank 19 and the gas mixing tank.

[0023] Finally, it should be pointed out that the above embodiments are only representative examples of the present invention. Obviously, the present invention is not limited to the above embodiments, and there are many variations. Any simple modification, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention should be considered to belong to the protection scope of the present invention.

Claims

1. A dual-channel chemical vapor deposition furnace with a weighing device, comprising a reaction furnace (1) and a gas mixing tank (2), characterized in that: The reaction furnace (1) comprises a reaction chamber (3) and a furnace top (4); the furnace wall of the reaction chamber (3) is a hollow structure; a water cooling device (5) is arranged in the furnace wall of the reaction chamber (3); an exhaust channel (6) and a weighing channel (7) are arranged at the top of the furnace top (4); an isolation plate (8) is arranged between the exhaust channel (6) and the weighing channel (7); a controller (9), a weighing sensor (10) and a wire box (11) are arranged in the weighing channel (7); and the wire box (11) is arranged inside the weighing channel (7). On the wall, the controller (9) and the weighing sensor (10) are arranged at the top of the weighing channel (7), the control is connected to the weighing sensor (10) for monitoring the weight, a pulling pulley (12) is arranged in the wire box (11), a fixed pulley (13) is arranged at the bottom of the weighing sensor (10), a traction rope (14) is arranged in the wire box (11), one end of which is fixedly connected to the pulling pulley (12), and the other end of which is bypassed by the fixed pulley (13) and vertically arranged in the reaction chamber (3), and a loading plate (15) is arranged on the end.

2. A dual-channel chemical vapor deposition furnace with a weighing device according to claim 1, characterized in that: The isolation plate (8) is provided with a plurality of vent holes (16) to facilitate the gas in the weighing channel (7) to flow into the exhaust channel (6) through the vent holes (16) for exhaust during the exhaust process.

3. The double-channel chemical vapor deposition furnace with a weighing device according to claim 1, characterized in that: An air inlet (17) is provided at the bottom of the reaction chamber (3), and an air inlet pipe (18) is connected between the gas mixing tank (2) and the air inlet (17) of the reaction furnace (1).

4. The double-channel chemical vapor deposition furnace with a weighing device according to claim 1, characterized in that: The gas mixing tank (2) is connected to a plurality of gas tanks (19), the gas tanks (19) are connected to the gas mixing tank (2) via pipelines, and flow meters (20) are provided between the gas tanks (19) and the gas mixing tank (2).

5. The double-channel chemical vapor deposition furnace with a weighing device according to claim 1, characterized in that: The water cooling device (5) comprises a hot water exchange pipe (21) spirally wound inside the furnace wall of the reaction chamber (3).

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