A single crystal furnace leakage detection device and method

Abstract

The present disclosure provides a single crystal furnace leakage detection device and method, the single crystal furnace leakage detection device comprises a sensing element, the sensing element comprises a thermal probe, the sensing element is used for generating a corresponding sensing signal according to the temperature information of the thermal probe around a leakage detection point of a single crystal furnace; a processor connected with the thermal probe, the processor is used for judging whether the leakage detection point exists leakage according to the sensing signal of the sensing element. The present disclosure provides a single crystal furnace leakage detection device and method, which is simple to operate, does not require the cooperation of multiple operators, and saves time and effort.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor processing, and in particular to a single crystal furnace leakage detection device and method. BACKGROUND

[0002] In the photovoltaic and semiconductor crystal pulling process, the CZ pulling method (Czochralski Process) is a mainstream method. The crystal pulling process must be carried out in a closed environment, and it is particularly important to maintain the negative pressure and oxygen-free environment of the crystal pulling furnace to ensure the quality of the single crystal silicon. Therefore, it is very important to detect the leakage of the crystal pulling furnace before pulling the crystal. For example, for a 12-inch single crystal pulling furnace, the leakage rate is generally less than 300 mTorr.l / sec. If the leakage rate is higher than this value, leakage detection needs to be performed to find the leakage point.

[0003] However, in the prior art, the single crystal furnace leakage detection operation is carried out by spraying helium at different positions of the single crystal furnace. If there is a leakage point, helium will be sucked into the helium leak detector through the leakage point. By observing the changes of the helium leak detector, it can be determined whether there is a leakage point. The entire leakage detection operation is relatively complex and requires the cooperation of three operators. During the specific leakage detection process, the furnace body needs to be evacuated first, and the helium tube is connected to the helium leak detector. The first operator needs to pull the helium tube and detect and find the leakage point at each position in the order from top to bottom. The second operator needs to drag the helium cylinder during this process. The third operator needs to observe the changes of the helium leak detector to determine the leakage point, and then process the leakage point. The entire process takes about 3-4 hours, which is time-consuming and labor-intensive. SUMMARY

[0004] To solve at least one of the above technical problems in the prior art, the present application provides a single crystal furnace leakage detection device and method.

[0005] The technical solutions provided by the present application are as follows:

[0006] In a first aspect, the present application provides a single crystal furnace leakage detection device, comprising:

[0007] A sensing element comprising a thermal probe, the sensing element being configured to generate a corresponding sensing signal based on temperature information of the thermal probe around a leakage detection point of the single crystal furnace;

[0008] A processor connected to the thermal probe, the processor being configured to determine whether the leakage detection point currently has a leakage based on the sensing signal of the sensing element.

[0009] Illustratively, the single crystal furnace leakage detection device further comprises a heating assembly, the heating assembly is connected with the thermal probe and the processor respectively, and the heating assembly is used for heating the thermal probe to a preset initial temperature according to preset initial temperature data in the processor.

[0010] The processor is specifically configured to: when a temperature difference between the current temperature of the thermal probe around the leakage detection point and the initial temperature is greater than or equal to a threshold value, it is determined that the current leakage detection point has a leakage.

[0011] Illustratively, the thermal probe comprises a rhombic thermal sensitive metal probe.

[0012] Illustratively, the single crystal furnace leakage detection device further comprises at least one of the following:

[0013] a display connected with the processor, the display being used for displaying whether the current leakage detection point has a leakage;

[0014] an alarm connected with the processor, the alarm being used for sending an alarm signal when it is determined that the leakage detection point has a leakage.

[0015] In a second aspect, the embodiments of the present disclosure further provide a single crystal furnace leakage detection method, which utilizes the single crystal furnace leakage detection device as described above to detect the leakage of the single crystal furnace; and the method comprises the following steps:

[0016] vacuumizing the single crystal furnace so as to keep the single crystal furnace in a predetermined furnace internal environment;

[0017] placing the single crystal furnace leakage detection device around each leakage detection point on the single crystal furnace to detect the leakage of each leakage detection point.

[0018] Illustratively, the predetermined furnace internal environment is a vacuum environment when the single crystal furnace is performing a crystal pulling process.

[0019] Illustratively, the predetermined furnace internal environment is that the vacuum pressure in the single crystal furnace is less than or equal to 20 mTorr.

[0020] Illustratively, the step of placing the single crystal furnace leakage detection device around each leakage detection point on the single crystal furnace to detect the leakage of each leakage detection point specifically comprises:

[0021] each leakage detection point on the single crystal furnace comprises a plurality of dynamic sealing leakage detection points, and for any dynamic sealing leakage detection point, the single crystal furnace leakage detection device is placed around the dynamic sealing leakage detection point to detect the leakage of the dynamic sealing leakage detection point under the condition that the corresponding moving part of the dynamic sealing leakage detection point keeps persistent movement.

[0022] Exemplarily, the dynamic sealing leak detection points include at least one of the following:

[0023] The crystal rotation magnetic fluid dynamic sealing leak detection point of the single crystal furnace;

[0024] The crucible rotation movement dynamic sealing leak detection point of the single crystal furnace;

[0025] The heat shield lifting dynamic sealing leak detection point of the single crystal furnace.

[0026] Exemplarily, each leak detection point on the single crystal furnace further includes a plurality of static sealing leak detection points.

[0027] The beneficial effects brought by the embodiments of the present disclosure are as follows:

[0028] The single crystal furnace leak detection device and method provided by the embodiments of the present disclosure can include a sensing element and a processor. The sensing element can include a thermal probe, and the sensing element can generate a corresponding sensing signal according to temperature information of the thermal probe around a leak detection point of a single crystal furnace. The processor can determine whether the leak detection point currently exists a leak according to the sensing signal.

[0029] In the leak detection of the single crystal furnace, the single crystal furnace can be first vacuumized, the single crystal furnace is kept in a predetermined furnace environment, and then the single crystal furnace leak detection device is placed around each leak detection point on the single crystal furnace to detect the leak of each leak detection point. The thermal probe is used to measure the ambient temperature around each leak detection point according to the temperature change characteristics. When a gas leak occurs in the leak detection point, there is a pressure difference between the inside and outside of the furnace body, and the external environment air will be quickly sucked into the furnace from the leak point. The local air flow rate will be obviously greater than that at other positions. Therefore, when the flowing air passes through the thermal probe, heat exchange will occur between the flowing air and the thermal probe, and the temperature of the thermal probe will change accordingly. According to the forced convection heat exchange theory, there is a relationship between the heat exchanged by the thermal probe and the speed of the flowing air. Therefore, the temperature change of the thermal probe can be used to reflect the speed of the air, and then the leak of the leak detection point can be determined. Compared with the prior art of detecting the leak of the single crystal furnace by using a helium detector, the operation is simple, and multiple operators are not required, which saves time and effort. BRIEF DESCRIPTION OF DRAWINGS

[0030] Figure 1 FIG. 1 shows a structural schematic diagram of a single crystal furnace leak detection device provided in an embodiment of the present disclosure;

[0031] Figure 2 FIG. 2 shows a flowchart of a single crystal furnace leak detection method provided in an embodiment of the present disclosure;

[0032] Figure 3FIG. 1 shows a schematic diagram of a single crystal furnace leak detection device provided in an embodiment of the present disclosure detecting a leak of a single crystal furnace. DETAILED DESCRIPTION

[0033] In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are some but not all of the embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by a person of ordinary skill in the art without creative effort belong to the scope of protection of the present disclosure.

[0034] Unless otherwise defined, technical terms or scientific terms used in the present disclosure shall have the ordinary meaning commonly understood by a person of ordinary skill in the art to which the present disclosure belongs. The terms "first", "second" and similar terms used in the present disclosure do not denote any order, quantity or importance, but are used to distinguish different components. Similarly, the terms "one", "a" or "the" and similar terms do not denote quantity limitation, but mean that there is at least one. The terms "include" or "contain" and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, and do not exclude other elements or objects. The terms "connect" or "connected" and similar terms are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The terms "upper", "lower", "left", "right" and the like are only used to represent relative positional relationships, and when the absolute positions of the described objects are changed, the relative positional relationships can also be changed accordingly.

[0035] The features "parallel", "perpendicular" and "same" and the like used in the embodiments of the present disclosure include the strictly "parallel", "perpendicular", "same" and the like, and "approximately parallel", "approximately perpendicular", "approximately same" and the like with a certain tolerance, which, considering the measurement and the tolerance related to the measurement of a specific value (for example, the limitation of a measurement system), represents the acceptable deviation range for a specific value determined by a person of ordinary skill in the art. For example, "approximately" can mean within one or more standard deviations, or within 3% or 5% of the value.

[0036] Further, in this document, the terms“substantial,”“essentially,”“approximately,” and“about” are used to describe and account for small variations. When used with an event or circumstance, these terms can encompass instances where the event or circumstance occurs precisely as well as instances where the event or circumstance occurs approximately or substantively. For example, when used in a contextual manner, the terms“substantially,”“essentially,”“approximately,” and“about” can cover variations that can exist in the art. For example, when used in a contextual manner, the terms“substantially,”“essentially,”“approximately,” and“about” can cover variations that can exist in the art such as a range of less than or equal to 10% of a value, such as less than or equal to ± 5%, less than or equal to ± 4%, less than or equal to ± 3%, less than or equal to ± 2%, less than or equal to ± 1%, less than or equal to ± 0.5%, less than or equal to ± 0.1%, less than or equal to ± 0.05%. The term“substantially co-planar” can refer to two surfaces being aligned along the same plane within the micrometer range, for example, within 40 μm, 30 μm, 20 μm, 10 μm, or 1 μm.

[0037] As shown in Figure 1 The single crystal furnace leakage detection device provided by the embodiment of the present disclosure comprises:

[0038] A sensing element comprising a thermosensitive probe 100, the sensing element being configured to generate a corresponding sensing signal according to temperature information of the thermosensitive probe 100 around a leakage detection point of a single crystal furnace;

[0039] A processor 200 connected to the thermosensitive probe 100, the processor 200 being configured to determine whether the leakage detection point is leaking according to the sensing signal of the sensing element.

[0040] The working principle of the single crystal furnace leakage detection device provided by the embodiment of the present disclosure is that when a fluid flows through the thermosensitive probe 100, heat exchange occurs between the thermosensitive probe 100 and the fluid, thereby causing the temperature of the thermosensitive probe 100 to change. According to the forced convection heat exchange theory, there is a relationship between the heat Q exchanged between the thermosensitive probe 100 and the fluid and the speed v of the fluid. Therefore, the temperature change of the thermosensitive probe 100 can be converted into the speed of the fluid.

[0041] Based on the working principle of the single crystal furnace leakage detection device provided by the embodiment of the present disclosure, when detecting the leakage of a single crystal furnace, the single crystal furnace can be first evacuated, and the single crystal furnace can be kept in a predetermined furnace environment. Then, the single crystal furnace leakage detection device is placed around each leakage detection point on the single crystal furnace, and each leakage detection point is detected for leakage.

[0042] The temperature change characteristics of the thermal probe 100 are used to measure the ambient temperature around each leak detection point. When a gas leak occurs at a leak detection point, there is a pressure difference between the inside and outside of the furnace. The outside air is quickly sucked into the furnace from the leak point. The air flow rate at the leak point is significantly greater than at other locations. Therefore, when the flowing air passes through the thermal probe 100, heat exchange occurs between the thermal probe 100 and the flowing air. The temperature of the thermal probe 100 changes accordingly. According to the forced convection heat exchange theory, there is a relationship between the heat Q exchanged by the thermal probe 100 and the air speed v. Therefore, the temperature change of the thermal probe 100 can reflect the air speed, and the presence or absence of a leak at the leak detection point can be determined.

[0043] Compared with the prior art of detecting single crystal furnace leakage by using a helium detector, the single crystal furnace leakage detection device provided by the embodiments of the present disclosure is simple to operate and does not require multiple operators.

[0044] It should be noted that when the single crystal furnace leakage detection device provided by the embodiments of the present disclosure is used to detect single crystal furnace leakage, the single crystal furnace is first evacuated. On the one hand, the vacuum in the single crystal furnace is maintained to generate a pressure difference with the outside environment to generate flowing air for heat exchange with the thermal probe 100. On the other hand, since the crystal pulling process is performed in a vacuum environment, the single crystal furnace can also be maintained in a vacuum environment during leakage detection to simulate the crystal pulling process environment.

[0045] During leakage detection, the single crystal furnace is first evacuated to maintain the single crystal furnace at a predetermined furnace environment. Specifically, the predetermined furnace environment can be the vacuum environment during the crystal pulling process of the single crystal furnace. In other words, the single crystal furnace is maintained in the vacuum environment during the crystal pulling process.

[0046] For example, in some embodiments, the predetermined furnace environment is a furnace vacuum pressure of the single crystal furnace less than or equal to 20 mTorr. However, this is not limiting.

[0047] In addition, in some exemplary embodiments, the single crystal furnace leakage detection device further comprises a heating assembly connected with the thermal probe 100 and the processor 200, respectively. The heating assembly is used to heat the thermal probe 100 to a preset initial temperature according to the initial temperature data preset in the processor 200. The processor 200 is specifically configured to determine that the current leak detection point has a leak when the temperature difference between the current temperature of the thermal probe 100 around the leak detection point and the initial temperature is greater than or equal to a threshold value.

[0048] With the above scheme, when detecting the leakage of the single crystal furnace, the heating assembly can be used to heat the thermal probe 100 to an initial temperature, which can be higher than the temperature of the ambient air. When the ambient air flows through the thermal probe 100, the ambient air can take away part of the heat of the thermal probe 100, and then the flow rate of the air can be converted according to the relationship between the heat and the flow rate of the air.

[0049] In some embodiments, the heating assembly can heat the thermal probe 100 by passing current through the thermal probe 100. However, it is not limited thereto.

[0050] In addition, in some embodiments, the thermal probe 100 can include a thermocouple, a thermistor, or the like, and the material thereof can include, but is not limited to, a metal material.

[0051] In some exemplary embodiments, as shown in Figure 1 The thermal probe 100 includes a rhombic thermal metal probe. The rhombic shape of the probe can increase the surface area of the probe, so that the probe can quickly absorb and conduct heat, thereby quickly reflecting the temperature change. In addition, the metal probe generally has high measurement accuracy and can provide accurate temperature readings, which helps to better determine the existence and location of the leakage point. In addition, the rhombic thermal metal probe is made of high-temperature-resistant material and is suitable for use in high-temperature or extreme environments, and can maintain stability under harsh conditions. The design of the rhombic thermal metal probe also makes the probe easy to place around the leakage detection point outside various furnace bodies, and the structure is more suitable for the space around the leakage detection point, which is convenient for field application.

[0052] However, it should be understood that the specific structure of the thermal probe 100 is not limited thereto.

[0053] In addition, in some exemplary embodiments, the single crystal furnace leakage detection device further includes at least one of a display and an alarm. The display is connected to the processor 200, and the display is used to display whether the current leakage detection point has a leakage. The alarm is connected to the processor 200, and the alarm is used to send an alarm signal when it is determined that the leakage detection point has a leakage.

[0054] In addition, it should be noted that other components of the single crystal furnace leakage detection device, such as a shell, are understood by those skilled in the art, and are not described herein, and should not be considered as a limitation on the present disclosure.

[0055] In addition, the embodiment of the present disclosure also provides a single crystal furnace leakage detection method. The single crystal furnace leakage detection device in the embodiment of the present disclosure is used to detect the leakage of the single crystal furnace. As shown in Figure 2 The method includes the following steps:

[0056] Step S01, vacuumizing the single crystal furnace, and keeping the single crystal furnace in a predetermined furnace environment;

[0057] Step S02, placing the single crystal furnace leakage detection device around each leakage detection point on the single crystal furnace, and detecting leakage of each leakage detection point.

[0058] Based on the working principle of the single crystal furnace leakage detection device, when detecting leakage of the single crystal furnace, the single crystal furnace can be first vacuumized, and then the single crystal furnace leakage detection device is placed around each leakage detection point on the single crystal furnace, and leakage of each leakage detection point is detected.

[0059] Wherein, the temperature change characteristics of the thermal probe 100 are used to measure the ambient temperature around each leakage detection point. When gas leakage occurs at the leakage detection point, there is a pressure difference between the inside and outside of the furnace body, and the external environment air will be quickly sucked into the furnace from the leakage point. The local air flow rate will be significantly greater than other positions. Therefore, when the flowing air passes through the thermal probe 100, heat exchange will occur between the flowing air and the thermal probe 100, and the temperature of the thermal probe 100 will change accordingly. According to the forced convection heat exchange theory, there is a relationship between the heat Q exchanged by the thermal probe 100 and the speed v of the flowing air. Therefore, the temperature change of the thermal probe 100 can reflect the speed of the air, and further determine whether the leakage detection point leaks.

[0060] The single crystal furnace leakage detection method provided by the embodiment of the present disclosure is used to detect leakage of the single crystal furnace. Compared with the prior art of detecting leakage of the single crystal furnace by a helium detector, the operation is simple, and multiple operators are not required, saving time and effort.

[0061] It should be noted that when the single crystal furnace leakage detection method provided by the embodiment of the present disclosure is used to detect leakage of the single crystal furnace, the single crystal furnace is first vacuumized. On the one hand, the vacuum in the single crystal furnace is maintained to generate a pressure difference with the environment outside the furnace to generate flowing air for heat exchange with the thermal probe 100. On the other hand, since the crystal pulling process is carried out in the single crystal furnace, the vacuum environment in the furnace needs to be maintained. Therefore, when detecting leakage, the single crystal furnace can also be kept in a vacuum environment to simulate the crystal pulling process environment.

[0062] In some embodiments, when detecting leakage, the single crystal furnace is first vacuumized, and the single crystal furnace is kept in a predetermined furnace environment. Specifically, the predetermined furnace environment can be the vacuum environment when the single crystal furnace is subjected to the crystal pulling process. In other words, the single crystal furnace is kept in the vacuum environment when the crystal pulling process is carried out.

[0063] For example, in some embodiments, the predetermined in-furnace environment is an in-furnace vacuum pressure of the single crystal furnace less than or equal to 20 mTorr. However, the present disclosure is not limited thereto.

[0064] In addition, for a single crystal furnace, it is a large furnace body. In the prior art, the single crystal furnace leak detection operation is carried out by spraying helium gas at different positions of the single crystal furnace. If there is a leak point, the helium gas will be sucked into the helium leak detector through the leak point. By observing the change of the helium leak detector, it is determined whether there is a leak point. The whole leak detection operation is relatively complex and needs to be completed by three operators. In the specific leak detection process, the furnace body needs to be first evacuated, the helium gas pipe is connected to the helium leak detector, the first operator needs to pull the helium gas pipe to detect and find the leak point, the second operator needs to drag the helium cylinder in the process, and the third operator needs to observe the change of the helium leak detector to determine the leak point. Then, the leak point is treated. The whole process generally needs 3-4 hours, which is time-consuming and laborious.

[0065] In addition, in the process of finding the leak point, the first operator needs to detect and find the leak point at each position in the order from top to bottom, which is time-consuming.

[0066] For a single crystal furnace, sealing is an important part of ensuring system safety and efficiency in furnace body design and operation. According to different application requirements, sealing can be divided into dynamic sealing and static sealing. The following are the definitions, characteristics and applications in furnace body leak detection of the two sealing methods.

[0067] Static sealing refers to the sealing between two or more components without relative motion. It is commonly used in connection surfaces, flanges, gaskets, etc. Rubber, polymer, metal gasket and other materials are commonly used. In furnace applications, static sealing materials need to have good high temperature resistance to adapt to the working environment of the furnace body. Pressure is applied by bolts or other means to maintain the sealing effect. When a leak occurs, static sealing is usually easy to replace and maintain. Generally, static sealing is used in flange connections, gas outlets, feed ports and other parts of the furnace body to prevent gas or liquid leakage.

[0068] Dynamic sealing refers to the sealing between two or more components with relative motion. It is commonly used in pistons, bearings, pumps and other components. Mechanical seals, oil seals, lip seals and other structural designs are commonly used. Dynamic sealing materials need to have good wear resistance to withstand friction caused by motion. In some cases, dynamic sealing needs to use lubricants to reduce friction and wear. The design and installation of dynamic sealing are usually more complex than static sealing. In the furnace body, dynamic sealing is commonly used in valves, pumps, rotating parts, lifting parts and other parts to prevent gas or liquid leakage.

[0069] For example, the dynamic seal of the single crystal furnace can include a crystal rotation magnetic fluid dynamic seal, a crucible rotation movement dynamic seal, a heat shield lifting dynamic seal, etc.

[0070] In some example embodiments of the present disclosure, in the step S02, the leak detection points on the single crystal furnace include a plurality of dynamic seal leak detection points.

[0071] In this way, the leak detection points can be detected and found without strictly following the order from top to bottom, and the dynamic seal leak detection points can be used as the leak detection points with high possibility of leakage for focused detection, so as to avoid blind search for the leak detection points and improve the detection efficiency.

[0072] In addition, in the production process of the single crystal furnace, for example, the dynamic seal such as the crystal rotation magnetic fluid dynamic seal, the crucible rotation movement dynamic seal, the heat shield lifting dynamic seal, etc., if the dynamic seal leaks, the dynamic seal points may not leak when the moving part corresponding to the dynamic seal is in a stationary state, and the dynamic seal can only be detected to leak when the moving part is in a moving state.

[0073] Therefore, in some example embodiments of the present disclosure, as shown in Figure 3 The step S02 can further include the following steps.

[0074] For any dynamic seal leak detection point, in the case that the moving part corresponding to the dynamic seal leak detection point of the single crystal furnace 20 keeps continuous movement, the single crystal furnace leak detection device 10 is placed around the dynamic seal leak detection point, and the dynamic seal leak detection point is detected for leakage.

[0075] By using the above scheme, for the dynamic seal, the corresponding dynamic seal leak detection point can be detected for leakage in the case that the moving part keeps continuous movement, and the detection accuracy can be improved.

[0076] For example, the dynamic seal leak detection point includes at least one of the following:

[0077] The crystal rotation magnetic fluid dynamic seal leak detection point of the single crystal furnace;

[0078] The crucible rotation movement dynamic seal leak detection point of the single crystal furnace;

[0079] The heat shield lifting dynamic seal leak detection point of the single crystal furnace.

[0080] In addition, in some example embodiments of the present disclosure, the step S02 can further include that the leak detection points on the single crystal furnace further include a plurality of static seal leak detection points.

[0081] Therefore, the leakage detection can be performed by taking the static sealing leakage detection point as a leakage detection point with a larger leakage possibility, and the leakage detection efficiency is improved.

[0082] In the detection of the static sealing leakage detection point, the moving part corresponding to the dynamic sealing leakage detection point can be kept in a sustained motion. Figure 3

[0083] In the detection of the static sealing leakage detection point, the moving part corresponding to the dynamic sealing leakage detection point can be kept in a sustained motion.

[0084] In summary, the single crystal furnace leakage detection device and the single crystal furnace leakage detection method provided by the embodiments of the present disclosure can quickly and efficiently find the leakage position of the single crystal furnace, so as to repair the leakage position and reduce the downtime of the equipment. In addition, the labor cost can be reduced, and only one operator is needed to complete the leakage detection operation. In addition, the leakage detection can be focused on the leakage detection point with a larger leakage possibility without following the strict top-to-bottom leakage detection order. In addition, the moving part in the single crystal furnace can be tracked for sustained leakage detection to improve the leakage detection accuracy.

[0085] The following points need to be explained:

[0086] (1) The drawings of the embodiments of the present disclosure only involve the structures involved in the embodiments of the present disclosure, and other structures can be referred to the general design.

[0087] (2) For the sake of clarity, the thickness of the layer or region is magnified or reduced in the drawings used to describe the embodiments of the present disclosure, that is, the drawings are not drawn according to the actual proportion. It can be understood that when an element such as a layer, a film, a region or a substrate is referred to as being located “on” or “under” another element, the element can be “directly” located on or under another element or there can be an intermediate element.

[0088] (3) In the case of no conflict, the embodiments of the present disclosure and the features in the embodiments can be combined to obtain new embodiments.

[0089] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure should be subject to the protection scope of the claims.​

Claims

1. A single crystal furnace leak detection apparatus, characterized by comprising: The single crystal furnace leakage detection device comprises: a sensing element comprising a thermal probe, the sensing element being configured to generate a corresponding sensing signal according to temperature information of the thermal probe around a leakage detection point of a single crystal furnace; a processor connected to the thermal probe, the processor being configured to determine whether the leakage detection point currently has a leakage according to the sensing signal of the sensing element; the single crystal furnace leakage detection device further comprises a heating assembly connected to the thermal probe and the processor, the heating assembly being configured to heat the thermal probe to a preset initial temperature according to preset initial temperature data in the processor. The processor is specifically configured to determine that the leakage detection point currently has a leakage when a temperature difference between a current temperature of the thermal probe around the leakage detection point and the initial temperature is greater than or equal to a threshold value.

2. The single crystal furnace leak detection apparatus of claim 1, wherein The thermal probe comprises a rhombic thermal metal probe.

3. The single crystal furnace leak detection apparatus of claim 1, wherein The single crystal furnace leakage detection device further comprises at least one of the following: a display connected to the processor, the display being configured to display whether the current leakage detection point has a leakage; an alarm connected to the processor, the alarm being configured to send an alarm signal when it is determined that the leakage detection point has a leakage.

4. A method of detecting a leak in a single crystal furnace, the method comprising: The single crystal furnace leakage detection device according to any one of claims 1 to 3 is used to detect a leakage of the single crystal furnace, and the method comprises: vacuumizing the single crystal furnace to keep the single crystal furnace in a predetermined furnace environment; placing the single crystal furnace leakage detection device around each leakage detection point on the single crystal furnace to detect a leakage of each leakage detection point; wherein the placing of the single crystal furnace leakage detection device around each leakage detection point on the single crystal furnace to detect a leakage of each leakage detection point specifically comprises: each leakage detection point on the single crystal furnace comprises a plurality of dynamic sealing leakage detection points, and for any dynamic sealing leakage detection point, the single crystal furnace leakage detection device is placed around the dynamic sealing leakage detection point to detect a leakage of the dynamic sealing leakage detection point when the corresponding moving part of the dynamic sealing leakage detection point keeps continuous movement.

5. The method of claim 4, wherein the step of detecting a leak is performed by a method comprising: The predetermined furnace environment is a vacuum environment when the single crystal furnace performs a crystal pulling process.

6. The method of claim 5, wherein the step of detecting a leak is performed by detecting a change in the pressure of the gas in the chamber. The predetermined furnace environment is that a furnace vacuum pressure of the single crystal furnace is less than or equal to 20 mTorr.

7. The method of claim 4, wherein the step of detecting a leak is performed by a method comprising: The dynamic sealing leakage detection point comprises at least one of the following: a crystal rotation magnetic fluid dynamic sealing leakage detection point of the single crystal furnace; a crucible rotation movement dynamic sealing leakage detection point of the single crystal furnace; a heat shield lifting dynamic sealing leakage detection point of the single crystal furnace.

8. The method of claim 4, wherein the step of detecting a leak is performed by a method comprising: Each leakage detection point on the single crystal furnace further comprises a plurality of static sealing leakage detection points.

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