Developing nozzle

Abstract

The developing nozzle provided by the invention comprises a liquid inlet, an overflow cavity, an overflow channel, a vertical flow channel and a liquid outlet which are connected in sequence, the overflow channel comprises a first end connected with the overflow cavity and a second end connected with the vertical flow channel, and the second end is higher than the first end; the first end is higher than the bottom of the overflow cavity, so that the overflow cavity comprises a liquid storage part; the vertical flow channel extends in the vertical direction; the multiple liquid outlets are formed in the lower portion of the vertical flow channel and communicate with the vertical flow channel. According to the invention, through the overflow cavity and the overflow channel, the flowing kinetic energy of the developing solution is weakened, so that the impact force of the developing solution sprayed on a wafer is reduced; and when the developing solution flows in the overflow cavity and the overflow channel, bubbles move upwards due to buoyancy, and then the developing solution flows downwards to the solution outlet through the vertical flow channel, so that the bubbles in the developing solution are further reduced, and the developing process defects caused by the bubbles are reduced.

Description

Technical Field

[0001] The invention relates to the field of semiconductor manufacturing equipment, in particular to a developing nozzle. Background Art

[0002] The development process in wafer manufacturing refers to the process of removing the photoresist from the exposed wafer through the development equipment, leaving the photolithography pattern. In this process, the developer should be sprayed evenly onto the wafer through the development nozzle. The developer sprayed onto the wafer should contain as few bubbles as possible, and the photolithography pattern will not be damaged by the impact of the sprayed liquid.

[0003] Figure 1A and Figure 1B They are the front and side cross-sectional views of the current developing nozzle, respectively. The developing liquid enters the nozzle from the liquid inlet 100, then flows into the two inclined cylindrical flow channels 200, then flows into the rectangular flow channel 300, passes through the buffer net 400, and finally flows out from the liquid outlet 500. When the developing liquid flows from the two cylindrical flow channels 200 into the rectangular flow channel 300, the cross-sectional area of ​​the flow channel in the horizontal direction suddenly increases, which is easy to produce tiny bubbles. The developing liquid mixed with bubbles is sprayed onto the wafer, which will affect the developing effect and cause developing defects. In addition, the buffer net 400 in the developing nozzle has a relatively small buffering effect on the developing liquid, and the impact force of the developing liquid sprayed onto the wafer is large, which is easy to cause the developing pattern to collapse. Summary of the invention

[0004] The object of the present invention is to provide a developing nozzle for solving the problem in the prior art that the developing solution is prone to generate tiny bubbles and has a large impact force.

[0005] To achieve the above-mentioned purpose and other related purposes, the present invention provides a developing nozzle, comprising: a liquid inlet, an overflow cavity, an overflow channel, a vertical channel and a liquid outlet connected in sequence; the overflow channel comprises a first end connected to the overflow cavity and a second end connected to the vertical channel, and the second end is higher than the first end; the first end is higher than the bottom of the overflow cavity so that the overflow cavity includes a liquid storage part; the vertical channel extends in a vertical direction; a plurality of the liquid outlets are arranged below the vertical channel and are connected to the vertical channel.

[0006] Furthermore, the overflow cavity, the overflow channel and the vertical flow channel each have a rectangular cross-section perpendicular to the liquid flow direction.

[0007] Furthermore, it also includes a liquid inlet pipe and a liquid inlet switch, one end of the liquid inlet pipe is connected to the liquid inlet, and the other end of the liquid inlet pipe is connected to the liquid inlet switch.

[0008] Furthermore, it also includes a bubble discharge module; the bubble discharge module includes a bubble discharge port, a bubble discharge tube and a bubble discharge switch, the bubble discharge port is arranged at the top of the overflow cavity and the vertical flow channel, one end of the bubble discharge tube is connected to a plurality of bubble discharge ports, and the other end of the bubble discharge tube is connected to the bubble discharge switch.

[0009] Furthermore, it also includes a negative pressure unit connected to the bubble discharge switch, and used for providing negative pressure to the bubble discharge tube through the bubble discharge switch.

[0010] Furthermore, the bubble drainage pipe includes a bubble drainage main pipe and a plurality of bubble drainage branch pipes, the plurality of bubble drainage branch pipes are respectively connected to the plurality of bubble drainage ports, the plurality of bubble drainage branch pipes are gathered to one end of the bubble drainage main pipe, and the other end of the bubble drainage main pipe is connected to the bubble drainage switch.

[0011] Furthermore, a bubble sensor is provided on the bubble discharge pipe for detecting the bubble content in the liquid; and the developing nozzle is configured to open the liquid inlet switch and the bubble discharge switch when the bubble content in the liquid is higher than a first set value.

[0012] Furthermore, the developing nozzle is further configured to: close the liquid inlet switch and the bubble discharge switch after a preset time period, wherein the preset time period is set according to the flow rate of the developing solution.

[0013] Furthermore, the developing nozzle is further configured to: when the bubble content in the liquid is lower than a second set value, close the liquid inlet switch and the bubble discharge switch, wherein the second set value is lower than the first set value.

[0014] Furthermore, a one-way valve is provided on the bubble discharge branch pipe.

[0015] Furthermore, it also includes a vacuum pipeline connected to the bubble discharge switch, which is used to guide the bubbles to flow into the vacuum pipeline through the bubble discharge switch, and the bubble discharge switch is a normally open switch.

[0016] Furthermore, a breathable membrane is provided at the connection between the bubble discharge port, the overflow cavity and the vertical flow channel.

[0017] Furthermore, the breathable membrane is a one-way breathable membrane.

[0018] Furthermore, the material of the breathable membrane includes PTFE material.

[0019] As described above, the present invention provides a developing nozzle having the following beneficial effects: the present invention reduces the kinetic energy of the developer flow through the overflow cavity and the overflow channel, thereby reducing the impact force of the developer sprayed onto the wafer; and when the developer flows in the overflow cavity and the overflow channel, the bubbles will move upward due to the buoyancy, and then the developer flows downward to the liquid outlet through the vertical flow channel, further reducing the bubbles in the developer, thereby reducing the developing process defects caused by the bubbles. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1A and Figure 1B Shown are front and side cross-sectional views of a prior art developer nozzle;

[0021] Figure 2 It is a schematic diagram of a developing nozzle in the first embodiment of the present invention;

[0022] Figure 3 Shown is a side cross-sectional view of a developing nozzle in Embodiment 1 of the present invention;

[0023] Figure 4 A schematic diagram showing a bubble removal module of a developing nozzle in a first embodiment of the present invention;

[0024] Figure 5 Shown is a side cross-sectional view of a developing nozzle in the third embodiment of the present invention. DETAILED DESCRIPTION

[0025] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.

[0026] It should be noted that the illustrations provided in this embodiment are only schematic illustrations of the basic concept of the present invention. Although the illustrations only show components related to the present invention and are not drawn according to the number, shape and size of components in actual implementation, the form, quantity and proportion of each component in actual implementation can be changed arbitrarily, and the component layout form may also be more complicated. In addition, the parts with the same reference numerals in multiple drawings represent the same or equivalent parts or components.

[0027] Embodiment 1

[0028] This embodiment 1 proposes a developing nozzle such as Figure 2 , Figure 3As shown, it includes: a liquid inlet 11, an overflow cavity 12, an overflow channel 13, a vertical channel 14 and a liquid outlet 15, wherein the liquid inlet 11 is connected to the overflow cavity 12, the two ends of the overflow channel 13 are respectively connected to the overflow cavity 12 and the vertical channel 14, and the bottom of the vertical channel 14 is connected to a plurality of liquid outlets 15. The overflow cavity 12, the overflow channel 13 and the vertical channel 14 each have a rectangular cross section perpendicular to the liquid flow direction. Figure 3 The arrows are used to indicate the liquid flow direction, and the liquid has corresponding flow directions in the overflow cavity 12, the overflow channel 13 and the vertical channel 14. For example, in the overflow cavity 12, the liquid flows downward as indicated by the arrow, and the cross section of the overflow cavity 12 perpendicular to the liquid flow direction is a rectangle; in the overflow channel 13, the liquid flows upward to the right as indicated by the arrow, and the cross section of the overflow channel 13 perpendicular to the liquid flow direction is a rectangle; in the vertical channel 14, the liquid flows downward as indicated by the arrow, and the cross section of the vertical channel 14 perpendicular to the liquid flow direction is a rectangle.

[0029] The liquid outlet 15 is a cylindrical flow channel. There is a certain angle between the axis of the liquid outlet 15 and the axis of the vertical flow channel 14 to form a buffer and reduce the impact force of the developer spraying onto the wafer. Figure 2 A plurality of liquid outlets 15 are arranged at intervals below the vertical flow channel 14 and are all connected to the vertical flow channel 14, so that the developing liquid flows out through the liquid outlets 15 and is sprayed onto the wafer. Figure 2 The shape and size of the liquid outlet 15 are not limited.

[0030] Specifically, the overflow channel 13 is an upwardly inclined channel, including a first end 131 connected to the overflow cavity 12 and a second end 132 connected to the vertical flow channel 14, and the second end 132 is higher than the first end 131. The vertical flow channel 14 can be formed by the second end 132 of the overflow channel 13 extending downward. The first end 131 of the overflow channel 13 is at a certain distance from the bottom of the overflow cavity 12. In this embodiment 1, the connection between the overflow channel 13 and the overflow cavity 12 can be set at the middle position of the overflow cavity 12 in the vertical direction, so that a liquid storage part is formed in the overflow cavity 12, thereby realizing the overflow function.

[0031] Figure 3 The figure shows the flow direction of the developer. After the developer enters the overflow chamber 12 from the liquid inlet 11, since the connection between the overflow channel 13 and the overflow chamber 12 is higher than the bottom surface of the overflow chamber 12, the developer changes direction, overflows to the vertical flow channel 14 through the overflow channel 13, and finally flows out from the liquid outlet 15. The design of the overflow chamber 12 and the overflow channel 13 can reduce the kinetic energy of the developer flow, thereby reducing the impact force of the developer sprayed onto the wafer and avoiding the collapse of the development pattern.

[0032] When the developer flows through the overflow chamber 12, the bubbles in the developer will move upward due to the buoyancy and gather at the top of the overflow chamber 12, thereby reducing the bubbles entering the overflow channel 13. When the developer continues to flow from the overflow channel 13 into the vertical flow channel 14, the bubbles will also move upward due to the buoyancy and gather at the top of the vertical flow channel 14. The developer enters the vertical flow channel 14 and flows downward, further reducing the bubbles in the developer, thereby reducing the development process defects caused by bubbles.

[0033] After the developing nozzle sprays liquid for a long time, bubbles will gather in the top area of ​​the overflow cavity 12 and the vertical channel 14. Figure 4 As shown, the developing nozzle provided in this embodiment 1 also includes a bubble discharge module 16, including a bubble discharge port 161, a bubble discharge tube 162 and a bubble discharge switch 163. When the number of the bubble discharge port 161 is 1, one end of the bubble discharge tube 162 is connected to the bubble discharge port 161, and the other end is connected to the bubble discharge switch 163. There can be multiple bubble discharge ports 161, which are arranged at the top of the overflow cavity 12 and the vertical flow channel 14. In this embodiment 1, there can be four bubble discharge ports 161, such as Figure 2 and Figure 3 As shown, they are respectively arranged on both sides of the top of the overflow cavity 12 and both sides of the top of the vertical flow channel 14. In this embodiment, the bubble discharge pipe 162 includes a bubble discharge main pipe and a plurality of bubble discharge branch pipes 1621. Figure 4 As shown, the plurality of bubble discharge ports 161 are all connected to a bubble discharge branch pipe 1621 , one end of the plurality of bubble discharge branch pipes 1621 converges to a bubble discharge main pipe, and the other end of the bubble discharge main pipe is connected to a bubble discharge switch 163 .

[0034] The bubble discharge pipe 162 is also provided with a one-way valve 1622 to prevent the liquid from flowing back into the developing nozzle. Figure 4 As shown, a one-way valve 1622 is arranged on the main bubble discharge pipe. In other embodiments, a one-way valve can be arranged on each bubble discharge branch pipe 1621. The bubble discharge pipe 162 is connected to the bubble discharge switch 163, and the other end of the bubble discharge switch 163 is connected to a negative pressure unit. Specifically, the negative pressure unit can be a negative pressure liquid discharge tank, and the internal pressure can be -5kpa. Correspondingly, the liquid inlet 11 is connected to the liquid inlet pipe 111, and the other end of the liquid inlet pipe 111 is connected to the liquid inlet switch 112. In this embodiment 1, the bubble discharge switch 163 and the liquid inlet switch 112 are both pneumatic switch valves.

[0035] In the present embodiment 1, a bubble sensor 1623 may be further provided on the bubble discharge branch pipe 1621 for detecting the bubble content in the liquid. The number of bubble sensors 1623 may be two, which are respectively provided on the bubble discharge branch pipe 1621 connected to the overflow chamber 12 and the vertical flow channel 14, and are respectively used to detect the bubble content in the overflow chamber 12 and the vertical flow channel 14. When the bubble sensor 1623 detects that the bubble content in the developer exceeds the first set value, the bubble sensor 1623 may send a signal to the control system. The control system may be a control module in the developer nozzle, or may be a control system independent of the developer nozzle, and the present application does not limit this. After the control system detects that the current development process is completed, the liquid inlet switch 112 and the bubble discharge switch 163 are controlled to be turned on, and the developer containing bubbles is discharged through the multiple bubble discharge branch pipes 1621 and the bubble discharge pipe 162; after a preset time, the liquid inlet switch 112 and the bubble discharge switch 163 are controlled to be turned off; after the bubble discharge is completed, the next development process is performed. The preset time length can be set according to the flow rate of the developer. For example, if the flow rate of the developer is 0.6 to 1 LPM (liters per minute), the preset time length can be set to 30 seconds to discharge the developer containing bubbles in the current developing nozzle.

[0036] In other embodiments, the bubble sensor 1623 may be disposed on the main bubble drain pipe to detect the bubble content in the liquid in the main bubble drain pipe.

[0037] Embodiment 2

[0038] This embodiment 2 provides a developing nozzle, which is different from the embodiment 1 in that the method of controlling the bubble discharge switch 163 to be closed is different from that of the embodiment 1. In this embodiment 2, when the bubble sensor 1623 detects that the bubble content in the developer exceeds the first set value, the bubble sensor 1623 sends a signal to the control system. After the control system detects that the current developing process is finished, the liquid inlet switch 112 and the bubble discharge switch 163 are controlled to be opened, and the developer containing bubbles is discharged through multiple bubble discharge branch pipes 1621 and the bubble discharge pipe 162; the bubble sensor 1623 detects the bubble content in the developer in real time, and when it is detected that the bubble content is lower than the second set value, the bubble discharge switch 163 and the liquid inlet switch 112 can be controlled to be closed; after the bubble discharge is finished, the next developing process is performed. Among them, the second set value is lower than the first set value.

[0039] The other configurations of this embodiment are the same as those of the first embodiment and will not be described in detail here.

[0040] Embodiment 3

[0041] This embodiment 3 provides a developing nozzle, which is different from the embodiment 1 in that:

[0042] like Figure 5As shown, a breathable membrane 17 is provided below the bubble outlet 161 at a position connected to the overflow cavity 12 and the vertical flow channel 14. The breathable membrane 17 is made of breathable material, and only gas can pass through, but not liquid. Figure 5 , the bubble discharge port 161 is a through hole with a certain height, and the breathable membrane 17 can be set at any height in the bubble discharge port 161, preferably, it is set at the bottom of the bubble discharge port 161 to prevent liquid from overflowing. The breathable membrane 17 can be a one-way breathable membrane to prevent bubbles from flowing back into the developer. In certain embodiments, the material of the breathable membrane 17 includes PTFE (polytetrafluoroethylene). In this embodiment 3, the liquid inlet switch 112 is a pneumatic switch valve, the bubble discharge switch 163 is a normally open pneumatic switch valve, and the other end of the bubble discharge switch 163 is connected to the vacuum pipeline. The air pressure of the vacuum pipeline can be between -70kpa and -90kpa, and the negative pressure in the vacuum pipeline can come from a vacuum pump. The bubbles in the developer can pass through the breathable membrane 17, and then be discharged through a plurality of bubble discharge branch pipes 1621, the bubble discharge pipe 162 and the vacuum pipeline in turn, and can be discharged while the developing process, realizing a continuous bubble discharge function.

[0043] The other configurations of this embodiment are the same as those of the first embodiment and will not be described in detail here.

[0044] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. A developing nozzle, characterized in that: include: A liquid inlet, an overflow cavity, an overflow channel, a vertical channel and a liquid outlet are connected in sequence; the overflow channel includes a first end connected to the overflow cavity and a second end connected to the vertical channel, and the second end is higher than the first end; the first end is higher than the bottom of the overflow cavity so that the overflow cavity includes a liquid storage part; the vertical channel extends in a vertical direction; a plurality of liquid outlets are arranged below the vertical channel and are connected to the vertical channel.

2. The developing nozzle according to claim 1, characterized in that: The overflow cavity, the overflow channel and the vertical flow channel each have a rectangular cross section perpendicular to the liquid flow direction.

3. The developing nozzle according to claim 1, characterized in that: It also includes a liquid inlet pipe and a liquid inlet switch, one end of the liquid inlet pipe is connected to the liquid inlet, and the other end of the liquid inlet pipe is connected to the liquid inlet switch.

4. The developing nozzle according to claim 3, characterized in that: It also includes a bubble discharge module; the bubble discharge module includes a bubble discharge port, a bubble discharge tube and a bubble discharge switch, the bubble discharge port is arranged at the top of the overflow cavity and the vertical flow channel, one end of the bubble discharge tube is connected to a plurality of bubble discharge ports, and the other end of the bubble discharge tube is connected to the bubble discharge switch.

5. The developing nozzle according to claim 4, characterized in that: It also includes a negative pressure unit connected to the bubble discharge switch and used for providing negative pressure to the bubble discharge pipe through the bubble discharge switch.

6. The developing nozzle according to claim 4, characterized in that: The bubble drainage pipe comprises a bubble drainage main pipe and a plurality of bubble drainage branch pipes, the plurality of bubble drainage branch pipes are respectively connected to the plurality of bubble drainage ports, the plurality of bubble drainage branch pipes are aggregated to one end of the bubble drainage main pipe, and the other end of the bubble drainage main pipe is connected to the bubble drainage switch.

7. The developing nozzle according to claim 6, characterized in that: The bubble discharge branch pipe is provided with a bubble sensor for detecting the bubble content in the liquid; the developing nozzle is configured to open the liquid inlet switch and the bubble discharge switch when the bubble content in the liquid is higher than a first set value.

8. The developing nozzle according to claim 7, characterized in that: The developing nozzle is further configured to close the liquid inlet switch and the bubble discharge switch after a preset time period, wherein the preset time period is set according to the flow rate of the developing solution.

9. The developing nozzle according to claim 7, characterized in that: The developing nozzle is further configured to close the liquid inlet switch and the bubble discharge switch when the bubble content in the liquid is lower than a second set value, wherein the second set value is lower than the first set value.

10. The developing nozzle according to claim 6, characterized in that: A one-way valve is also provided on the bubble discharge branch pipe.

11. The developing nozzle according to claim 4, characterized in that: It also includes a vacuum pipeline connected to the bubble discharge switch and used for guiding bubbles to flow into the vacuum pipeline through the bubble discharge switch. The bubble discharge switch is a normally open switch.

12. The developing nozzle according to claim 11, characterized in that: A breathable membrane is provided at the connection between the bubble discharge port, the overflow cavity and the vertical flow channel.

13. The developing nozzle according to claim 12, characterized in that: The breathable membrane is a one-way breathable membrane.

14. The developing nozzle according to claim 12, characterized in that: The material of the breathable membrane includes PTFE material.

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