Self-cleaning-radiation refrigeration-icing integrated functional coating and preparation method and application thereof

Abstract

The application discloses a self-cleaning-radiation refrigeration-icing integrated functional coating and a preparation method and application thereof, and belongs to the technical field of functional protective coatings and preparation thereof. The application solves the problems that the surface of an existing solar cell panel is easily covered by sand, dust and ice and snow, and the solar cell panel is overheated in summer. The application firstly adopts a magnetron sputtering technology to prepare an ITO heating coating, and uses plasma to pretreat the surface of the ITO coating, introduces more polar groups, and then performs spin coating on the surface of the ITO coating by using a PDMS-SiO2 modified sol, so that the ITO heating coating has hydrophobicity and radiation refrigeration properties after solidification treatment. In order to further reduce the surface energy of the coating, a n-hexane solution of perfluorosilane is used to reduce the surface energy of the coating, and a self-cleaning / radiation refrigeration / icing integrated coating with high adhesion and high transparency is obtained. The prepared coating is widely applied to technical fields such as solar power generation.

Description

TECHNICAL FIELD

[0001] The present application relates to a self-cleaning-radiation refrigeration-icing integrated functional coating and its preparation method and application, and belongs to the field of functional protective coating and its preparation technology. BACKGROUND

[0002] Solar power generation technology has the advantages of high reliability, low cost, no resource distribution and geographical limitations, etc., and is the development trend of human beings to directly obtain clean energy. At present, the problem of dust accumulation on the surface of photovoltaic panels is becoming increasingly serious, which affects the light transmittance of photovoltaic modules, and dust entering the solar cell will cause serious damage to its components. Part of the sunlight is absorbed by the dust on the surface to produce heat, which is transferred to the solar cell, further increasing the surface temperature, causing the lattice of the photovoltaic material to expand, the band gap to decrease, the reverse current density (J0) to increase, and the photoelectric conversion efficiency to decrease. Studies have shown that for every 10℃ increase in temperature, the photoelectric conversion efficiency of crystalline silicon cells will decrease by 4% to 5%. And the problem of icing on the surface of solar cell panels in winter will also reduce the light transmittance of the surface of solar cell panels, resulting in a decrease in power generation efficiency, and the yield loss can be as high as 100%. Therefore, it is crucial to protect the surface of solar cell panels with self-cleaning-cooling-icing functions.

[0003] To reduce the problem of dust and ice and snow coverage on the surface of solar cell panels, as well as the problem of overheating of the panels in summer, scientists have studied various methods. Among them, the robot dust removal method can clean the dust on the surface of solar cell panels, but it requires a matching charging device, maintenance equipment and system. The manual deicing method can clean the surface ice and snow on time, but the deicing efficiency is low, the labor cost is too high, and the solar cell panels are easily damaged. The jet impingement cooling technology can be applied to heat dissipation, but since solar cells are generally built in highland and desert areas where water resources are scarce, it is not suitable for use in some solar power stations. In summary, there is currently a lack of a solution that can simultaneously solve the problems of dust and ice and snow coverage, as well as the problem of overheating of solar cell panels in summer.

[0004] To this end, the preparation of a multifunctional coating with self-cleaning, radiation refrigeration and icing integration is expected to solve the above problems. The coating protection method has little effect on the performance of solar cell panels, and has the advantages of simple preparation, low cost and integration of multiple functions. Therefore, by coating a special material on the surface of solar cell panels, the adhesion of dust particles is reduced, and the impact of dust on solar cell equipment is reduced. At the same time, the coating material can be improved to have radiation refrigeration and electric heating properties, providing a functional film that can effectively prevent dust adhesion, ice and snow coverage, and reduce the surface temperature of solar cell panels, and a preparation method thereof are very necessary. SUMMARY

[0005] The present application is directed to the problems of the surface being easily covered by sand, dust and ice and snow and the overheating of the solar cell panel in summer in the existing solar cell panel application process, and provides a self-cleaning-radiation refrigeration-ice removal integrated functional coating and a preparation method and application thereof.

[0006] The technical scheme of the present application:

[0007] One of the purposes of the present application is to provide a preparation method of a self-cleaning-radiation refrigeration-ice removal integrated functional coating, which specifically comprises the following steps:

[0008] (1) ITO thin film is prepared by using a magnetron sputtering method, and is annealed for standby;

[0009] (2) The surface of the annealed ITO thin film is pretreated by using a plasma treatment method;

[0010] (3) PDMS-SiO2 sol is prepared by using a sol-gel method;

[0011] (4) The PDMS-SiO2 sol is spin-coated on the pretreated ITO thin film, heat-treated in an air atmosphere, then modified by soaking in a low surface energy modifier solution, and heated and solidified to obtain a self-cleaning / radiation refrigeration / ice removal coating.

[0012] Further limited, the process parameters for preparing the ITO thin film in (1) are as follows: the target material is mixed by In2O3 and SnO2 according to an atomic percentage of 90:10, the film plating temperature is 280-600 DEG C, the argon gas flow is 50 sccm, the oxygen flow is 0-0.3 sccm, the target-substrate distance is 10-20 cm, and the sputtering power is 23-38 W.

[0013] More limited, the film plating temperature is 360 DEG C.

[0014] More limited, the film plating temperature is 440 DEG C.

[0015] More limited, the film plating temperature is 520 DEG C.

[0016] More limited, the oxygen flow is 0.1 sccm.

[0017] More limited, the oxygen flow is 0.2 sccm.

[0018] More limited, the target-substrate distance is 15 cm.

[0019] More limited, the sputtering power is 28 W.

[0020] More limited, the sputtering power is 33 W.

[0021] Further, the substrate for preparing the ITO thin film is ultrasonically cleaned with anhydrous ethanol, acetone, deionized water and anhydrous ethanol in sequence for 10-30 minutes, and then is placed in a beaker containing anhydrous ethanol for standby use.

[0022] Further, the annealing temperature in (1) is 300-400°C, and the annealing time is 30 minutes.

[0023] Further, the thickness of the ITO thin film obtained in (1) is 40-400 nm.

[0024] Further, the thickness of the ITO thin film obtained in (1) is 100 nm.

[0025] Further, the thickness of the ITO thin film obtained in (1) is 135 nm.

[0026] Further, the thickness of the ITO thin film obtained in (1) is 185 nm.

[0027] Further, the thickness of the ITO thin film obtained in (1) is 220 nm.

[0028] Further, the plasma processing parameters in (2) are as follows: the gas type is oxygen, the flow rate is 5 slpm, the power is 80 W, and the time is 5 minutes.

[0029] Further, the operation of (3) comprises the following steps:

[0030] Step 1: slowly adding a hydrochloric acid / ethanol aqueous solution to a tetraethyl orthosilicate / ethanol solution, stirring, sealing and aging to obtain a SiO2 sol;

[0031] Step 2: adding the SiO2 / ethanol solution to the SiO2 sol, stirring after adding zirconium beads, and ultrasonically dispersing to obtain a SiO2-ethanol sol;

[0032] Step 3: grinding and ball-milling the cured PDMS in sequence to obtain a PDMS solution, and mixing the PDMS solution with the SiO2-ethanol sol to obtain a PDMS-SiO2 sol.

[0033] Further, the tetraethyl orthosilicate / ethanol solution in Step 1 is prepared by mixing tetraethyl orthosilicate and anhydrous ethanol in a molar ratio of 1:6-10.

[0034] Further, the molar ratio of tetraethyl orthosilicate, water and hydrochloric acid in Step 1 is 1:4:0.05.

[0035] Further, the molar ratio of tetraethyl orthosilicate and anhydrous ethanol is 1:7.

[0036] More preferably, the molar ratio of tetraethyl silicate and absolute ethanol is 1:8.

[0037] More preferably, the molar ratio of tetraethyl silicate and absolute ethanol is 1:9.

[0038] More preferably, the aging time in step 1 is 6-10 h.

[0039] More preferably, the aging time is 8 h.

[0040] More preferably, the SiO2 / ethanol solution in step 2 is prepared by mixing hydrophobic SiO2 with a particle size of 15 nm and absolute ethanol at a mass ratio of 1:60-70.

[0041] More preferably, the mass ratio of the SiO2 / ethanol solution and the SiO2 sol in step 2 is 1:8-14.

[0042] More preferably, the mass ratio of the SiO2 / ethanol solution and the SiO2 sol is 1:10.

[0043] More preferably, the mass ratio of the SiO2 / ethanol solution and the SiO2 sol is 1:12.

[0044] More preferably, the curing temperature of PDMS in step 3 is 300-400°C, and the curing time is 4-6 h.

[0045] More preferably, the grinding treatment in step 3 is to mix the cured PDMS, ethanol and zirconium beads at a mass-volume ratio of 5 g:20 mL:20 g, and then to grind the mixture to obtain a yellowish granular product, which is dried at 60-80°C for 4 h.

[0046] More preferably, the grinding treatment in step 3 is to mix the yellowish granular product obtained by grinding with ethanol at a mass-volume ratio of 2.5 g:10 mL, and then to perform ball milling treatment for 20 h using zirconium beads to obtain a PDMS solution.

[0047] More preferably, the mass ratio of PDMS and SiO2-ethanol sol in the PDMS-SiO2 sol obtained in step 3 is 1:2-10.

[0048] More preferably, the mass ratio of PDMS and SiO2-ethanol sol is 1:4.

[0049] More preferably, the mass ratio of PDMS and SiO2-ethanol sol is 1:6.

[0050] More preferably, the mass ratio of PDMS and SiO2-ethanol sol is 1:8.

[0051] Further limit, the spin coating speed in (4) is 2000-4000 rpm, and the time is 15 s.

[0052] Further limit, the spin coating speed is 3000 rpm.

[0053] Further limit, the heat treatment temperature in (4) is 550 DEG C, and the time is 2-4 h.

[0054] Further limit, the low surface energy modifier in (4) is 1H, 1H, 2H, 2H-perfluorodecyl triethoxysilane, methoxytrimethylsilane, octyltrimethoxysilane, octadecyltrichlorosilane, hexamethyldisilazane or octadecyltriethylsilane.

[0055] Further limit, the low surface energy modifier solution in (4) is prepared by low surface energy modifier and n-hexane, and the mass concentration is 1-4 %.

[0056] Further limit, the soaking time in (4) is 0.5-2 h.

[0057] Further limit, the heating and curing temperature in (4) is 80 DEG C, and the time is 15-30 min.

[0058] The second object of the application is to provide a self-cleaning-radiation refrigeration-icing integrated functional coating prepared by the above method.

[0059] The third object of the application is to provide a self-cleaning-radiation refrigeration-icing integrated functional coating for surface protection of solar cell panel.

[0060] Advantages:

[0061] The application firstly prepares ITO heating coating by using magnetron sputtering technology, and uses plasma to pretreat the surface of ITO coating, introduces more polar groups, and then spin coats PDMS-SiO2 modified sol on the surface, and after curing treatment, the ITO heating coating has hydrophobicity and radiation refrigeration property, in order to further reduce the surface energy of the coating, the n-hexane solution of perfluorosilane is used to reduce the surface energy of the coating, and a self-cleaning / radiation refrigeration / icing integrated coating with high adhesion and high transparency is obtained.

[0062] (1) the application adopts the method of direct current magnetron sputtering to prepare ITO heating coating, and Sn 4+After high-temperature annealing, the SnO2 molecules rearrange, the small crystal grains in the film reduce the roughness by merging and growing, and the residual stress and defects in the film are eliminated, further improving the surface morphology, reducing the scattering of electrons at the grain boundary, thereby improving the carrier mobility and enhancing the conductivity of the film. And the conductivity mechanism of ITO coating is that In2O3 is a high-width band semiconductor material, which is a cubic body-centered pyrolite crystal structure at room temperature, and the six-coordinated In 3+ ions are located in the center of the cube, and the four-coordinated O 2- ions are at the vertices, which has high light transmittance and good conductivity. When a small amount of Sn 4+ ions are doped in In2O3, Sn 4+ ions replace In 3+ ions, each replacement can contribute an electron to the conduction band, enhance the conductivity and chemical stability of the material, and make the ITO material have lower sheet resistance, thereby realizing the deicing performance of the material.

[0063] In addition, by setting appropriate plating temperature, oxygen flow, target-substrate distance and sputtering power and other parameters, ITO coatings of different thicknesses can be prepared, and uniform ITO coatings can be prepared.

[0064] (2) The present application uses high-energy electrons in low-temperature plasma to destroy chemical bonds, forming free radicals on the surface of ITO. When exposed to an oxygen-containing atmosphere, the surface is activated to form hydroxyl peroxide, introducing more polar groups and increasing the adhesion strength with the upper PDMS-SiO2 composite material. At the same time, O2 plasma can open the olefin bond of the monomer for graft polymerization, introducing more polar groups such as -COOH, -NH2 and epoxy groups on the surface of the substrate. These groups are reactive groups, which improve the bonding force between ITO and the surface of the upper PDMS-SiO2 composite material, thereby increasing the adhesion strength with the upper PDMS-SiO2 composite material.

[0065] (3) The present application uses a sol-gel method, selects tetraethyl orthosilicate (TEOS) as a precursor, uses anhydrous ethanol as a solvent, and uses an acid catalyst. In the reaction process, the hydrolysis reaction plays a major role, and the main component of the sol prepared is Si(OH)4, which forms a linear chain to better coat SiO2 particles. The porous SiO2 is in the form of granular clusters, and a granular gel film with high porosity is prepared, which has good antireflection performance. Zirconium beads are added to the solution before stirring, which can better disperse the solution during stirring, not only reducing the possibility of forming large clusters, but also affecting the transmittance of the coating less after the coating is prepared. The prepared PDMS-SiO2 coating with hydrophobicity and radiative cooling properties almost does not affect the transmittance of the functional coating.

[0066] (4) The application uses phase separation, utilizes the different volatilization rates of water and ethanol in the obtained PDMS-SiO2 sol, drives the assembly of SiO2 in the sol, and constructs a micro-nano rough structure on the surface of the ITO coating. When dust contacts the surface of the coating, the surface of the coating has a certain rough structure, the rough structure of the surface can reduce the contact area of the dust particles and the surface of the coating, and because the small-particle-size SiO2 is modified by a low-surface-energy modifier, the solid surface energy is low, the dust and the surface have low van der Waals force, and the dust adhesion is low, so that the self-cleaning performance of the coating is realized. In addition, the use of 1-4wt% perfluorosilane in n-hexane solution reduces the surface energy of the coating, and further reduces the adhesion of the dust particles.

[0067] (5) The application selects PDMS material as the main material of the transparent radiator, because it has very high visible light transmittance and infrared radiation characteristics, and has the advantages of simple preparation, environmental friendliness, industrial scalability, and is regarded as an ideal material for photovoltaic radiation cooling. The C-O-C (1260-1110cm -1 ), C-OH (1239-130cm -1 ) and Si-O-Si (1100cm -1 ) bonds in the material have strong thermal emission potential. With the increase of the proportion of polydimethylsiloxane, the C-H bond symmetric stretching vibration frequency is enhanced, the thin film absorbs a small part of the incident sunlight, and the transmittance decreases, and the number of Si-O-Si groups increases, and the asymmetric stretching vibration is enhanced, so that the emissivity in the 10-11 mu m band in the atmospheric window is significantly improved, realizing radiation cooling and heat dissipation.

[0068] (6) The application performs ball milling and heat treatment on PDMS. At a low temperature of 150-250 DEG C, the main decomposition product is siloxane oligomer; at a medium temperature of 250-400 DEG C, through thermal cracking reaction, part of the dimethylsiloxane unit is released into dimethylsilane, and part of the molecules may undergo hydrolysis reaction to produce silanol; at a high temperature of 400 DEG C or above, the thermal decomposition of PDMS becomes more intense, the chemical structure is significantly destroyed, and SiO2 is generated by the rupture of siloxane bond. By controlling the temperature to be 300-400 DEG C, the performance of PDMS can be ensured without much influence, and the radiation cooling performance is maintained. During ball milling, the dispersion degree of PDMS is large, and there is no large-area cluster. The particle size is mostly nanoscale, and it is almost uniformly dispersed on the glass surface, which effectively ensures the transmittance and increases the firmness of the coating. After the ball-milled PDMS is added into the SiO2 solution and spin-coated on the glass surface and annealed, oxidation and crosslinking occur during the annealing process, which will crosslink with SiO2 and the sol to form bonds, thereby increasing the bonding force between them, and thus helping to increase the adhesion of the coating. BRIEF DESCRIPTION OF DRAWINGS

[0069] Figure 1 AFM image of PDMS-SiO2 sol prepared for Example 1;

[0070] Figure 2 SEM image of PDMS-SiO2 sol prepared for Example 1;

[0071] Figure 3 Visible light transmittance of ITO / PDMS-SiO2 coating prepared for Example 1. DETAILED DESCRIPTION

[0072] In order to make the above objectives, features and advantages of the present application more apparent, specific embodiments of the present application will be described in detail below with reference made to the embodiments of the present application.

[0073] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, it will be apparent to one skilled in the art that the present application can be practiced without the specific details presented herein. In other instances, well-known methods have not been described in detail in order to avoid obscuring aspects of the present application. Therefore, the present application is not intended to be limited by the embodiments disclosed herein, which are for illustrative purposes.

[0074] Secondly, the "one embodiment" or "embodiment" referred to herein means that the specific features, structures or characteristics can be included in at least one implementation of the present application. The "in one embodiment" appearing in different places in the specification does not mean the same embodiment, nor is it an embodiment that is independent or alternative to other embodiments.

[0075] The experimental methods used in the following embodiments are conventional methods unless otherwise specified. The materials, reagents, methods and instruments used are conventional materials, reagents, methods and instruments in the art unless otherwise specified, and can be obtained by commercial channels by those skilled in the art.

[0076] Example 1

[0077] The process of preparing the self-cleaning-radiation refrigeration-icing integrated functional coating (ITO / PDMS-SiO2) in this embodiment includes the following steps:

[0078] Step one: preparation of ITO coating

[0079] A 3cm x 3cm quartz glass test piece was sequentially cleaned with absolute ethanol, acetone, deionized water and absolute ethanol for 15min, the coating temperature was set to 520℃, the oxygen flow rate was 0.2sccm, the target-substrate distance was 15cm, the target material was a mixture of In2O3 and SnO2 with an atomic percentage of 90:10, the sputtering power was 33W, and a 100nm thick ITO sample was prepared at a deposition time of 8min, and then placed in a 350℃ tube furnace for annealing for 30min to obtain the ITO coating.

[0080] Step 2: Preparation of PDMS-SiO2 sol

[0081] ① Mix 5.21g of tetraethyl silicate with 4.02g of anhydrous ethanol and stir for 5 minutes to obtain a stable dispersed solution a. Mix 1.8g of deionized water, 2.07g of hydrochloric acid (pH 2), and 4.02g of anhydrous ethanol and stir for 5 minutes to obtain a stable dispersed solution b. Under stirring conditions, slowly add solution b to solution a and stir for 30 minutes to obtain solution A. Seal solution A with plastic wrap and age at room temperature for 6 hours to obtain SiO2 sol. The diameter of the SiO2 particles in this sol is approximately 50nm.

[0082] ② Take 2g of hydrophobic SiO2 with a particle size of 15nm and add it to the sol. Add an appropriate amount of zirconium beads and stir for 4h. Then, ultrasonically disperse for 30min to obtain SiO2-ethanol sol.

[0083] ③ Weigh 10g of PDMS and heat it in a tube furnace at 350℃ for 5h. Take 5g of the cured particles into a mortar, add 20mL of ethanol solution and 20g of zirconium beads for the first step of grinding. Dry the ground solution in an oven at 70℃ for 4h to obtain slightly yellow particles. Divide the particles into equal weights and place them in two ball mill jars to start ball milling. Add 10mL of ethanol at the same time and ball mill with large zirconium beads for 20h to obtain PDMS solution. Take 3.5g of this solution and prepare PDMS-SiO2 sol in SiO2-ethanol sol.

[0084] Step 3: Preparation of ITO / PDMS-SiO2 coating

[0085] ① The ITO coating surface obtained in step one is subjected to plasma treatment for 15 minutes. The specific plasma treatment parameters are: the gas type is oxygen, the flow rate is 5 slpm, and the power is 80W, which enhances the adhesion with the upper coating.

[0086] ② Set the spin coating speed to 3000 rpm and the acceleration to 1500 r / min. 2 The PDMS-SiO2 sol was spin-coated onto the ITO coating for 15 seconds and then heat-treated at 550℃ for 3 hours.

[0087] ③ The coating is hydrophobically modified by soaking in a hexane solution containing 2 wt% perfluorosilane for 2 h, and then cured by heating at 80 °C for 30 min to obtain an ITO / PDMS-SiO2 coating.

[0088] The microstructure of the prepared ITO / PDMS-SiO2 coating was characterized, and the specific AFM images are shown below. Figure 1 As shown, by Figure 1It can be seen that the coating is formed by the accumulation of particles into a film, and the roughness Rq=88.5 nm, which is a necessary condition for the micro-rough surface to have super-hydrophobicity and dust-proof. The SEM image of the ITO / PDMS-SiO2 coating is shown in Figure 2 It can be seen that the micro-morphology of the PDMS-SiO2 coating is similar to Figure 2 It can be seen that the micro-morphology of the PDMS-SiO2 coating is similar to Figure 1 After heat treatment at 550°C, the PDMS undergoes thermal cracking, and short-chain PDMS is generated, which forms a smooth coating with the sol.

[0089] The transmittance of the obtained ITO / PDMS-SiO2 coating was tested, and the results are shown in Figure 3 As can be seen from the figure, the ITO / PDMS-SiO2 coating has good transmittance in the visible light band.

[0090] Comparative Example 1

[0091] The difference between this comparative example and Example 1 is that step ① in step three is not performed, and the remaining process steps and parameter settings are the same as those in Example 1.

[0092] Comparative Example 2

[0093] The difference between this comparative example and Example 1 is that step ③ in step two is not performed, and the remaining process steps and parameter settings are the same as those in Example 1.

[0094] Comparative Example 3

[0095] The difference between this comparative example and Example 1 is that only step one is performed to obtain an ITO coating.

[0096] Comparative Example 4

[0097] The difference between this comparative example and Example 1 is that step one is not performed, and the cleaned quartz glass test piece is subjected to plasma treatment in step three, and then PDMS-SiO2 sol is spin-coated, and the remaining process steps and parameter settings are the same as those in Example 1.

[0098] Comparative Example 5

[0099] The difference between this comparative example and Example 1 is that steps ① and ② in steps one, two and three are not performed, and only the cleaned quartz glass test piece is immersed in a 2wt% perfluorosilane solution in n-hexane, and heated at 80°C for 30 minutes.

[0100] The coatings prepared in Example 1 and Comparative Examples 1-5 were tested for performance, and the results of the water contact angle, first dust removal angle, durability, ice removal effect under 5V voltage and emissivity tests are shown in Table 1.

[0101] Table 1

[0102]

[0103] As can be seen from Comparative Example 1 and Example 1, the dust removal angle of Example 1 is still low after 100 times of continuous dust removal, which proves that the coating has stronger bonding capacity with the substrate after plasma treatment, and the PDMS-SiO2 coating is not easy to fall off under the continuous impact of dust, thereby realizing effective bonding of the interface between the ITO layer and the PDMS-SiO2 coating.

[0104] As can be seen from Comparative Example 1 and Comparative Example 2, the PDMS-SiO2 coating is the key to realizing super-hydrophobic and dust-proof performance. Meanwhile, as can be seen from Comparative Example 1 and Comparative Example 2, the coating without 350℃ pre-curing has no dust removal performance, which is because PDMS is not miscible with ethanol, and there is no PDMS component in the coating, so that the super-hydrophobic performance cannot be achieved, and the dust removal and wear resistance are poor.

[0105] As can be seen from Comparative Example 1 and Comparative Examples 4 and 5, the ITO film is a necessary condition to realize ice removal performance. Meanwhile, as can be seen from the ice removal time of Example 1 and Comparative Examples 1, 2 and 3, the super-hydrophobic performance can improve the ice removal efficiency, which is because the super-hydrophobic surface has low adhesion, and the ice can easily fall off the surface after being melted into water. In Comparative Example 3, the surface has no hydrophobic performance, and the water droplets adhere to the surface, so more time and heat are needed to evaporate the water droplets to achieve complete ice removal.

[0106] Moreover, Example 1 has the optimal infrared emissivity, which proves that the coating has excellent heat dissipation effect. In summer, the surface temperature of Example 1 is lower than that of Comparative Examples without coating or other comparative examples under the same conditions, thereby effectively improving the power generation efficiency.

[0107] Although the present application has been disclosed with the preferred embodiments as above, it is not intended to limit the present application, and anyone skilled in the art can make various modifications and modifications without departing from the spirit and scope of the present application. Therefore, the protection scope of the present application should be defined by the claims.

Claims

1. A method for preparing a self-cleaning-radiation refrigeration-icing integrated functional coating, characterized in that, The method comprises the following steps: (1) ITO thin film is prepared by magnetron sputtering method, and the ITO thin film is used after annealing treatment; The process parameters of the ITO thin film prepared by the magnetron sputtering method in the step (1) are as follows: the target material is prepared by mixing In2O3 and SnO2 at an atomic percentage of 90:10, the film plating temperature is 280-600 ℃, the argon flow is 50 sccm, the oxygen flow is 0-0.3 sccm, the target-substrate distance is 10-20 cm, and the sputtering power is 23-38 W; the annealing treatment temperature is 300-400 ℃, and the time is 30 min; (2) The surface of the ITO thin film after the annealing treatment is pretreated by using a plasma treatment method; (3) PDMS-SiO2 sol is prepared by using a sol-gel method; (4) The PDMS-SiO2 sol is spin-coated on the pretreated ITO thin film, heat treatment is carried out in an air atmosphere, then a low surface energy modifier solution is used for soaking modification, and heat curing is carried out, so that a coating is obtained; The low surface energy modifier in the step (4) is 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane, methoxytrimethylsilane, octyltrimethoxysilane, octadecyltrichlorosilane, hexamethyldisilazane or octadecyltriethylsilane.

2. The production method according to claim 1, characterized by, The thickness of the ITO thin film obtained in the step (1) is 40-400 nm.

3. The preparation method according to claim 1, characterized in that, The plasma treatment parameters in the step (2) are as follows: the gas type is oxygen, the flow is 5 slpm, the power is 80 W, and the time is 5 min.

4. The production method according to claim 1, characterized by, The operation of the step (3) comprises the following steps: Step 1, hydrochloric acid / ethanol aqueous solution is slowly added to tetraethyl orthosilicate / ethanol solution, and after stirring, the mixture is sealed and aged to obtain SiO2 sol; Step 2, SiO2 / ethanol solution is added to the SiO2 sol, zirconium beads are added, and then stirring and ultrasonic dispersion are carried out to obtain SiO2-ethanol sol; Step 3, the cured PDMS is subjected to grinding and ball milling treatment in sequence to obtain PDMS solution, and the PDMS solution is mixed with the SiO2-ethanol sol to obtain PDMS-SiO2 sol.

5. The preparation method according to claim 4, characterized in that, The mass ratio of PDMS to SiO2-ethanol sol in the obtained PDMS-SiO2 sol is 1:2-10, the mass ratio of SiO2 / ethanol solution to SiO2 sol in the SiO2-ethanol sol is 1:8-14, and the mass ratio of SiO2 to anhydrous ethanol in the SiO2 / ethanol solution is 1:60-70.

6. The method of claim 1, wherein, The heat treatment temperature in the step (4) is 550 ℃, and the time is 2-4 h; the heat curing temperature is 80 ℃, and the time is 15-30 min.

7. A self-cleaning-radiative refrigeration-icing integrated functional coating prepared by the method in any one of claims 1-6.

8. Use of the self-cleaning-radiation-refrigeration-deicing integrated functional coating according to claim 7, characterized in that, Surface protection for solar cell panels.

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