Ceramic surface feature processing method

Abstract

The invention discloses a ceramic surface feature machining method. The ceramic surface feature machining method comprises the following steps that S1, ceramic is placed on a machining disc; s2, coating a film on a to-be-protected area of the ceramic; s3, selecting a sand blasting medium with a proper specification; and S4, the sand blasting machine is adjusted to conduct small-range sand blasting, the nozzle moves relative to the ceramic, sweeping type machining is conducted on the ceramic surface, the sweeping range of the nozzle covers the ceramic surface, the machining disc is a rotating disc, the rotating disc can drive the ceramic to rotate, and the nozzle forms a spiral sand blasting track relative to the ceramic surface. According to the method and the device, the sand blasting range of the nozzle is narrowed, so that the whole ceramic surface cannot be completely covered with sand blasting in a small range, a relative movement path is generated between the nozzle and the ceramic surface by moving the nozzle, and the whole ceramic is completely covered along the movement path through the sand blasting range.

Description

Technical Field

[0001] The invention relates to the technical field of ceramic processing, and in particular to a method for processing ceramic surface features. Background Art

[0002] In integrated circuit manufacturing equipment, the application of ceramics is mainly concentrated in high-end photolithography machines. Photolithography machines are one of the most critical equipment in the integrated circuit manufacturing process, used to project circuit patterns onto silicon wafers. Since photolithography machines have very high requirements for structural materials, ceramics have become an ideal choice.

[0003] For example, publication number "CN117655330A" discloses "a method for producing copper-based silicon carbide composite ceramics", which involves mixing an appropriate amount of prepared silicon carbide slurry with copper alloy slurry, and adding an appropriate amount of binder to form a mixed slurry. Then, the mixed slurry is placed in a mold for shaping, and is formed into a dense copper-based silicon carbide composite ceramic through heat treatment methods such as vacuum sintering. Finally, a smooth surface is obtained through processes such as grinding and polishing. However, in actual use, this sandblasting method cannot guarantee a uniform sandblasting effect on each area on the ceramic surface. Summary of the invention

[0004] In view of the problem that the prior art mentioned in the background technology cannot ensure the uniformity of sandblasting, the present invention provides a method for processing ceramic surface features, which can improve the processing uniformity of sandblasting on the ceramic surface by narrowing the sandblasting range and using a sweeping sandblasting method to cover the ceramic surface.

[0005] To achieve the above objectives, the present invention adopts the following technical solutions.

[0006] A method for processing ceramic surface features comprises the following steps: S1, placing ceramic on a processing disk; S2, coating the area of ​​the ceramic that needs to be protected; S3, selecting sandblasting media of suitable specifications; S4, adjusting the sandblasting machine to perform small-range sandblasting, moving the nozzle relative to the ceramic, performing sweeping processing on the ceramic surface, the sweeping range of the nozzle covering the ceramic surface, the processing disk being a rotating disk, the rotating disk being able to drive the ceramic to rotate, and the nozzle forming a spiral sandblasting trajectory relative to the ceramic surface. In the present application, the sandblasting range of the nozzle is reduced so that the small-range sandblasting cannot fully cover the entire ceramic surface, and the nozzle is moved so that a relative motion path is generated between the nozzle and the ceramic surface, and the entire ceramic is completely covered along the motion path by the sandblasting range. Since the sandblasting range is reduced, the sandblasting uniformity within this range can be more accurately controlled, and the sandblasting trajectory is fully covered, so that the sandblasting effect of the entire ceramic surface is uniform, and the phenomenon that the edge sandblasting effect is not as good as the center sandblasting effect due to large-scale sandblasting is reduced, thereby improving the controllability of the uniformity of the entire ceramic surface; the nozzle forms a spiral sandblasting trajectory on the ceramic surface, which can improve the sandblasting efficiency, and the spiral sandblasting trajectory has a more uniform coverage range than the straight sandblasting trajectory, and is more suitable for the shape of the ceramic surface for processing, so that the action trajectory that the nozzle needs to set is simpler.

[0007] Preferably, the movement trajectory of the nozzle on the silicon carbide surface is a "J"-shaped reciprocating motion. Through the reciprocating "J"-shaped structure, the movement process of the nozzle on the ceramic surface is continuous and the sandblasting coverage dead corner is avoided.

[0008] Preferably, the processing disk is a rotating disk, which can drive the ceramic to rotate, and the travel trajectory of the nozzle is the diameter line of the ceramic. During the movement of the nozzle, the rotating disk rotates synchronously, and the nozzle forms a spiral sandblasting trajectory relative to the ceramic surface. A rotating disk is placed below the processing disk, which can drive the processing disk to rotate synchronously, so that during the movement of the nozzle, the processing disk can also actively move relative to the nozzle, wherein since the processing disk is in rotational motion, the travel trajectory of the nozzle is set to a straight line, which is a diameter line passing through the center of the ceramic surface, so that the nozzle forms a spiral sandblasting trajectory on the ceramic surface, which can improve the sandblasting efficiency, and the spiral sandblasting trajectory has a more uniform coverage range than the straight sandblasting trajectory, and is more suitable for the shape of the ceramic surface for processing, so that the action trajectory that the nozzle needs to set is simpler, and by setting the travel trajectory of the nozzle as a diameter line, the spiral trajectory formed can evenly and comprehensively cover the entire ceramic surface to reduce the generation of sandblasting dead angles, while ensuring the sandblasting efficiency.

[0009] Preferably, during the movement of the nozzle, when the nozzle moves close to the center of the ceramic surface, the nozzle movement speed gradually increases, and when the nozzle moves away from the center of the ceramic surface, the nozzle movement speed gradually decreases. Since the ceramic surface is a circular structure, when the relative speed between the nozzle and the processing disk is kept fixed, the processing frequency of the outer side of the ceramic surface is insufficient, while the processing frequency of the inner side of the ceramic surface is excessive. Therefore, the relative speed between the designer nozzle and the ceramic surface in this application is not fixed, thereby solving the problem of the non-uniform processing frequency of the inner and outer sides. First, since the inner and outer angular velocities of the ceramic surface are the same, and the arc lengths corresponding to the same angles are different, the processing arc lengths of the inner and outer sides of the sandblasting are different in the same time, thereby causing the nozzle to stay at the same arc length on the inner and outer sides. The uniformity of the sandblasting on the inner and outer sides is different. Therefore, the present application sets the nozzle movement speed to be reduced on the side away from the center of the ceramic surface, so that the sandblasting effect can be obtained for a longer time on the outer side of the ceramic surface, and the nozzle movement speed is increased on the inner side of the ceramic surface, thereby reducing the time the nozzle stays on the inner side of the ceramic surface, thereby averaging the sandblasting effect of the entire ceramic surface and improving the uniformity of the sandblasting.

[0010] Preferably, after the nozzle has traveled a complete diameter line path, the nozzle repeats traveling along the diameter line on the ceramic surface, the rotating disk rotates in the opposite direction, and the nozzle forms a reverse spiral sandblasting track relative to the ceramic surface. After the nozzle has traveled a complete diameter line, the nozzle forms two staggered spirals on the ceramic surface, and since the rotating disk always rotates in the same direction during this process, the spirals rotate in the same direction. Therefore, after the nozzle finishes a diameter line movement, the nozzle sets the rotation direction of the rotating disk in the opposite direction when traveling the next diameter line, so that the direction of the spiral formed between the nozzle and the ceramic surface is opposite to the previous spiral direction, so that the coverage area of ​​the sandblasting track can be more uniform.

[0011] Preferably, when the nozzle moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface, the nozzle stops sandblasting, and the nozzle continues to move along the diameter line. When the nozzle moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface again, the nozzle resumes sandblasting. During the movement of the nozzle, since the sandblasting range of the nozzle always covers the area when it passes through the center of the ceramic surface and its surrounding area, the area will be repeatedly sandblasted for a long time, resulting in a large amount of sandblasting and grinding in the area. Therefore, when the sandblasting range of the nozzle is set to be tangent to the center of the ceramic surface, the sandblasting is stopped to avoid the sandblasting range covering both sides of the center of the ceramic surface, resulting in repeated sandblasting and grinding. When the sandblasting range of the nozzle is tangent to the center of the ceramic surface, it means that the sandblasting range has formed a complete spiral. When the nozzle continues to move along the diameter line until it is tangent to the center of the ceramic surface again, sandblasting is restarted, and a new round of sandblasting spiral formation begins. Preferably, the position where the nozzle stops sandblasting is set relative to the position where the nozzle restarts sandblasting, so as to ensure that the two spirals can be staggered to cover the entire ceramic surface.

[0012] Preferably, when the nozzle moves along a straight path to the point where the edge of the sandblasting range is one sandblasting range away from the center of the ceramic surface, the sandblasting stops, and the rotating disk stops rotating synchronously. When the nozzle moves to the point where the edge of the sandblasting range is tangent to the center of the ceramic surface, the nozzle starts sandblasting again, and the nozzle forms a circular trajectory relative to the center of the ceramic surface. In order to avoid repeated spraying operations on the center of the ceramic surface, the nozzle is set to be one sandblasting range away from the center of the ceramic surface when it stops sandblasting. At this time, the unsandblasted range of the center of the ceramic surface is close to a circle, and the radius of the circle is the size of a sandblasting range. Therefore, the nozzle is controlled to move until the sandblasting range is tangent to the center of the ceramic surface, so that the sandblasting range of the nozzle can be just tangent to the outer diameter of the unsandblasted range, and then sandblasting is performed, and the ceramic surface and the nozzle are made to have relative circular motion. At this time, after the nozzle and the ceramic surface rotate one circle relative to each other, the sandblasting of this range can be completely covered, and no repeated sandblasting effect will be produced, thereby ensuring the uniformity of sandblasting.

[0013] Preferably, the rotating disk stops rotating, and the nozzle rotates around the center of the ceramic surface to form a circular trajectory. After the nozzle rotates one circle, it moves in the opposite direction along the diameter line, and the rotating disk rotates in the opposite direction synchronously until the nozzle leaves the ceramic surface. After the rotating disk stops rotating, the circular trajectory is formed by rotating the nozzle around the center of the ceramic surface. When a complete circular trajectory needs to be formed, the starting position and the ending position of the nozzle are the same position, so the nozzle will return to the position where the nozzle stops sandblasting at the beginning after the circle ends. Then the nozzle moves along the reverse diameter line, and the rotating disk is rotated in the opposite direction at this time, so a reverse spiral trajectory can be formed, which is different from the previous positive spiral trajectory, so the uniformity of sandblasting on the ceramic surface can be improved. At the same time, since the nozzle moves in the opposite diameter line after the circle, when the nozzle completes sandblasting, the position of the nozzle is at the initial starting position. At this time, the nozzle forms a forward and reverse spiral trajectory on the ceramic trajectory, and the nozzle can be reset after the trajectory ends, so that the surface sandblasting of the next ceramic product can be seamlessly connected.

[0014] Preferably, in step S2, the coating material is selected as polyvinyl chloride coating. Polyvinyl chloride coating is finally selected for silicon carbide due to its high hardness and wear resistance. The adhesion of this coating is 28N / 100mm, and it is not easy to fall off when attached to the surface of silicon carbide ceramic during sandblasting; it has excellent wear resistance and will not deform during sandblasting, resulting in poor ceramic morphology processing; the coating backing is a rubber adhesive, and removing the coating after sandblasting will not pollute the ceramic surface. It meets the needs of high-precision and high-quality surface processing, ensures the fineness and accuracy of processing, and greatly reduces the occurrence of poor boss height or diameter size produced on the surface after processing.

[0015] Preferably, in step S3, 320 mesh silicon carbide particles are selected as sandblasting media to perform sandblasting on the product. The type and particle size of the sandblasting medium are adjusted to meet the high hardness and wear resistance of the processed material silicon carbide and meet the requirements of product surface roughness. The test media mainly include 120, 320, 500 mesh alumina and 120, 320, 500 mesh silicon carbide particles. Through experiments, it was found that the cutting force of alumina particles in sandblasting is small, the surface roughness of the ceramic is too large after 120 mesh silicon carbide sandblasting, and the uniformity of 500 mesh silicon carbide sandblasting is poor. Finally, 320 mesh silicon carbide particles are selected as sandblasting media to perform sandblasting on the product. The selection of this kind of particles as sandblasting media can greatly shorten the product processing time, improve processing efficiency, and meet the design requirements of silicon carbide CHUCK.

[0016] The beneficial effects of the present invention are as follows: (1) By reducing the blasting range and using a sweeping blasting method to cover the ceramic surface, the processing uniformity of the blasting on the ceramic surface can be improved; (2) Trajectory planning can be used to improve sandblasting efficiency and ensure the uniformity of sandblasting on the ceramic surface. At the same time, the position of the nozzle can be self-reset, reducing the need to reset the nozzle to its initial position after sandblasting is completed. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of the present invention.

[0018] Figure 2 Schematic diagram of the sandblasting trajectory of Example 1.

[0019] Figure 3 It is a schematic diagram of the structures of Embodiment 2 and Embodiment 3.

[0020] Figure 4 Schematic diagram of the sandblasting trajectory of Example 2.

[0021] Figure 5 Schematic diagram of the sandblasting trajectory of Example 3.

[0022] In the figure: 1 Nozzle, 2 Ceramic surface, 3 Processing disk, 4 Rotating disk. DETAILED DESCRIPTION

[0023] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments.

[0024] Embodiment 1: like Figure 1 As shown, a ceramic surface feature processing method includes the following steps: S1, placing the ceramic on a processing disk 3; S2, coating the area of ​​the ceramic that needs to be protected; S3, selecting a sandblasting medium of suitable specifications; S4, adjusting the sandblasting machine to a small range of sandblasting, the nozzle 1 moves relative to the ceramic, and performs a sweeping process on the ceramic surface 2, and the sweeping range of the nozzle 1 covers the ceramic surface 2. In the present application, by reducing the sandblasting range of the nozzle 1, the small range of sandblasting cannot fully cover the entire ceramic surface 2, and by moving the nozzle 1, a relative motion path is generated between the nozzle 1 and the ceramic surface 2, and the entire ceramic is completely covered along the motion path by the sandblasting range. Since the sandblasting range is reduced, the uniformity of the sandblasting within this range can be more accurately controlled, and the sandblasting track is fully covered, so that the sandblasting effect of the entire ceramic surface 2 is uniform, and the phenomenon that the edge sandblasting effect is not as good as the center sandblasting effect due to large-scale sandblasting is reduced, thereby improving the controllability of the uniformity of the entire ceramic surface 2.

[0025] like Figure 2As shown, the movement trajectory of the nozzle 1 on the silicon carbide surface is a "J"-shaped reciprocating motion. Through the reciprocating "J"-shaped structure, the movement process of the nozzle 1 on the ceramic surface 2 is continuous and the sandblasting coverage dead corner is avoided.

[0026] In step S2, polyvinyl chloride coating is selected as the coating material. Polyvinyl chloride coating is finally selected for silicon carbide due to its high hardness and wear resistance. The adhesion of this coating is 28N / 100mm, and it is not easy to fall off when attached to the silicon carbide ceramic surface 2 during sandblasting; it has excellent wear resistance and will not deform during sandblasting, resulting in poor ceramic morphology processing; the coating backing is a rubber adhesive, and removing the coating after sandblasting will not pollute the ceramic surface 2. It meets the requirements of high-precision and high-quality surface processing, ensures the fineness and accuracy of processing, and greatly reduces the occurrence of poor boss height or diameter size generated on the surface after processing.

[0027] In step S3, 320 mesh silicon carbide particles are selected as the sandblasting medium to perform sandblasting on the product. The type and particle size of the sandblasting medium are adjusted to meet the high hardness and wear resistance of the processed material silicon carbide and meet the requirements of product surface roughness. The test media mainly include 120, 320, 500 mesh alumina and 120, 320, 500 mesh silicon carbide particles. Through experiments, it was found that the cutting force of alumina particles in sandblasting was small, the roughness of the ceramic surface 2 was too large after 120 mesh silicon carbide sandblasting, and the uniformity of 500 mesh silicon carbide sandblasting was poor. Finally, 320 mesh silicon carbide particles were selected as the sandblasting medium to perform sandblasting on the product. The selection of this type of particles as the sandblasting medium can greatly shorten the product processing time, improve the processing efficiency, and meet the design requirements of silicon carbide CHUCK.

[0028] Embodiment 2: like Figure 3 , 4 As shown, in this embodiment, the processing disk 3 is a rotating disk 4, which can drive the ceramic to rotate, and the travel trajectory of the nozzle 1 is the diameter line of the ceramic. During the movement of the nozzle 1, the rotating disk 4 rotates synchronously, and the nozzle 1 forms a spiral sandblasting trajectory relative to the ceramic surface 2. A rotating disk 4 is placed below the processing disk 3, and the rotating disk 4 can drive the processing disk 3 to rotate synchronously, so that during the movement of the nozzle 1, the processing disk 3 can also actively move relative to the nozzle 1. Since the processing disk 3 is in rotational motion, the travel trajectory of the nozzle 1 is set to a straight line, which is a diameter line passing through the center of the ceramic surface 2. Therefore, the nozzle 1 forms a spiral sandblasting trajectory on the ceramic surface 2, which can improve the sandblasting efficiency. Compared with the straight sandblasting trajectory, the spiral sandblasting trajectory has a more uniform coverage and is more suitable for the shape of the ceramic surface 2 for processing, so that the motion trajectory that the nozzle 1 needs to set is simpler. In the attached figure of this embodiment, Figure 4In the figure, the solid line trajectory is formed by movement from outside to inside, and the dotted line trajectory is formed by movement from inside to outside.

[0029] During the movement of the nozzle 1 , when the nozzle 1 moves close to the center of the ceramic surface 2 , the moving speed of the nozzle 1 gradually increases, and when the nozzle 1 moves away from the center of the ceramic surface 2 , the moving speed of the nozzle 1 gradually decreases. Since the ceramic surface 2 is a circular structure, when the relative speed between the nozzle 1 and the processing disk 3 remains fixed, the processing frequency of the outer side of the ceramic surface 2 will be insufficient, while the processing frequency of the inner side of the ceramic surface 2 will be excessive. Therefore, in the present application, the designer makes the relative speed between the nozzle 1 and the ceramic surface 2 not fixed, thereby solving the problem of inconsistent processing frequencies on the inside and outside. First, since the angular velocities of the inner and outer sides of the ceramic surface 2 are the same, while the arc lengths corresponding to the same angles are different, the sandblasting will have different processing arc lengths on the inner and outer sides within the same time. Therefore, the nozzle 1 stays for different times on the same arc length on the inner and outer sides, resulting in differences in the uniformity of the sandblasting on the inner and outer sides. Therefore, the present application sets a lower moving speed of the nozzle 1 on the side away from the center of the ceramic surface 2, thereby enabling a longer sandblasting effect to be obtained on the outer side of the ceramic surface 2, and sets an increased moving speed of the nozzle 1 on the inner side of the ceramic surface 2, thereby reducing the time that the nozzle 1 stays on the inner side of the ceramic surface 2, thereby averaging the sandblasting effect of the entire ceramic surface 2 and improving the uniformity of the sandblasting.

[0030] like Figure 4 As shown, after the nozzle 1 has completed a complete diameter line path, the nozzle 1 repeats the movement along the diameter line on the ceramic surface 2, and the rotating disk 4 rotates in the opposite direction, so that the nozzle 1 forms a reverse spiral sandblasting track relative to the ceramic surface 2. After the nozzle 1 has completed a complete diameter line, the nozzle 1 forms two staggered spirals on the ceramic surface 2, and since the rotating disk 4 always keeps rotating in the same direction during this process, the rotation direction of the spirals will be the same. Therefore, after the nozzle 1 finishes a diameter line movement, when the nozzle 1 moves on the next diameter line, the rotation direction of the rotating disk 4 is set to the opposite direction, so that the direction of the spiral formed between the nozzle 1 and the ceramic surface 2 is opposite to the previous spiral direction, so that the coverage area of ​​the sandblasting track can be more uniform.

[0031] When nozzle 1 moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface 2, nozzle 1 stops sandblasting and continues to move along the diameter line. When nozzle 1 moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface 2 again, nozzle 1 starts sandblasting again. During the movement of the nozzle 1, since the sandblasting range of the nozzle 1 always covers the area when passing through the center of the ceramic surface 2 and its surrounding area, the area will be repeatedly sandblasted for a long time, resulting in a large amount of sandblasting and grinding in the area. Therefore, when the sandblasting range of the nozzle 1 is tangent to the center of the ceramic surface 2, the sandblasting is stopped to avoid the sandblasting range covering both sides of the center of the ceramic surface 2, resulting in repeated sandblasting and grinding. When the sandblasting range of the nozzle 1 is tangent to the center of the ceramic surface 2, it means that the sandblasting range has formed a complete spiral. When the nozzle 1 continues to move along the diameter line until it is tangent to the center of the ceramic surface 2 again, sandblasting is restarted, and a new round of sandblasting spiral formation begins. Preferably, the position where the nozzle 1 stops sandblasting is set relative to the position where the nozzle 1 restarts sandblasting, so as to ensure that the two spirals can cover the entire ceramic surface 2 with a staggered position.

[0032] In this embodiment, the processing process includes the following steps: S1, placing the ceramic on the processing disk 3; S2, coating the area of ​​the ceramic that needs to be protected; S3, selecting a sandblasting medium of appropriate specifications; S4, adjusting the sandblasting machine to a small range of sandblasting, the nozzle 1 moves relative to the ceramic, and performs a sweeping process on the ceramic surface 2, and the sweeping range of the nozzle 1 covers the ceramic surface 2. In this application, by reducing the sandblasting range of the nozzle 1, the small range of sandblasting cannot fully cover the entire ceramic surface 2, and by moving the nozzle 1, a relative motion path is generated between the nozzle 1 and the ceramic surface 2, and the entire ceramic is completely covered along the motion path by the sandblasting range. Since the sandblasting range is reduced, the uniformity of the sandblasting within this range can be more accurately controlled, and the sandblasting trajectory is fully covered, so that the sandblasting effect of the entire ceramic surface 2 is uniform, and the phenomenon that the edge sandblasting effect is not as good as the center sandblasting effect due to large-scale sandblasting is reduced, thereby improving the controllability of the uniformity of the entire ceramic surface 2.

[0033] In step S2, polyvinyl chloride coating is selected as the coating material. Polyvinyl chloride coating is finally selected for silicon carbide due to its high hardness and wear resistance. The adhesion of this coating is 28N / 100mm, and it is not easy to fall off when attached to the silicon carbide ceramic surface 2 during sandblasting; it has excellent wear resistance and will not deform during sandblasting, resulting in poor ceramic morphology processing; the coating backing is a rubber adhesive, and removing the coating after sandblasting will not pollute the ceramic surface 2. It meets the requirements of high-precision and high-quality surface processing, ensures the fineness and accuracy of processing, and greatly reduces the occurrence of poor boss height or diameter size generated on the surface after processing.

[0034] In step S3, 320 mesh silicon carbide particles are selected as the sandblasting medium to perform sandblasting on the product. The type and particle size of the sandblasting medium are adjusted to meet the high hardness and wear resistance of the processed material silicon carbide and meet the requirements of product surface roughness. The test media mainly include 120, 320, 500 mesh alumina and 120, 320, 500 mesh silicon carbide particles. Through experiments, it was found that the cutting force of alumina particles in sandblasting was small, the roughness of the ceramic surface 2 was too large after 120 mesh silicon carbide sandblasting, and the uniformity of 500 mesh silicon carbide sandblasting was poor. Finally, 320 mesh silicon carbide particles were selected as the sandblasting medium to perform sandblasting on the product. The selection of this type of particles as the sandblasting medium can greatly shorten the product processing time, improve the processing efficiency, and meet the design requirements of silicon carbide CHUCK.

[0035] Embodiment 3: like Figure 5 As shown, in this embodiment, when the nozzle 1 moves along a straight path to the edge of the sandblasting range being one sandblasting range away from the center of the ceramic surface 2, the sandblasting stops, and the rotating disk 4 stops rotating synchronously. When the nozzle 1 moves to the edge of the sandblasting range being tangent to the center of the ceramic surface 2, the nozzle 1 re-sandblasts, and the nozzle 1 forms a circular trajectory relative to the center of the ceramic surface 2. In order to avoid repeated spraying operations on the center of the ceramic surface 2, the nozzle 1 is set to be one sandblasting range away from the center of the ceramic surface 2 when the sandblasting stops. At this time, the unsandblasted range of the center of the ceramic surface 2 is close to a circle, and the radius of the circle is the size of a sandblasting range. Therefore, the nozzle 1 is controlled to move until the sandblasting range is tangent to the center of the ceramic surface 2, so that the sandblasting range of the nozzle 1 can be just tangent to the outer diameter of the unsandblasted range, and then sandblasting is performed, and the ceramic surface 2 and the nozzle 1 are caused to have relative circular motion. At this time, after the nozzle 1 and the ceramic surface 2 rotate relative to each other for one circle, the sandblasting of the range can be completely covered, and no repeated sandblasting effect will be produced, thereby ensuring the uniformity of the sandblasting.

[0036] like Figure 5As shown, the rotating disk 4 stops rotating, and the nozzle 1 rotates around the center of the ceramic surface 2 to form a circular track. After the nozzle 1 rotates one circle, it moves in the opposite direction along the diameter line, and the rotating disk 4 rotates in the opposite direction synchronously until the nozzle 1 is separated from the ceramic surface 2. After the rotating disk 4 stops rotating, the circular track is formed by the nozzle 1 rotating around the center of the ceramic surface 2. When a complete circular track needs to be formed, the starting position and the ending position of the nozzle 1 are the same position, so the nozzle 1 will return to the position where the nozzle 1 stops sandblasting at the beginning after the circle is completed. Then the nozzle 1 moves along the reverse diameter line, and at this time, the rotating disk 4 is rotated in the opposite direction, so a reverse spiral track can be formed, which is different from the previous forward spiral track, so the sandblasting uniformity of the ceramic surface 2 can be improved. At the same time, since the nozzle 1 moves in the reverse diameter line after the circle, when the nozzle 1 completes the sandblasting, the position of the nozzle 1 is at the initial starting position. At this time, the nozzle 1 forms a forward and reverse spiral track on the ceramic track, and the nozzle 1 can be reset after the track ends, so that the surface sandblasting of the next ceramic product can be seamlessly connected.

[0037] The processing disk 3 is a rotating disk 4, which can drive the ceramic to rotate. The travel trajectory of the nozzle 1 is the diameter line of the ceramic. During the movement of the nozzle 1, the rotating disk 4 rotates synchronously, and the nozzle 1 forms a spiral sandblasting trajectory relative to the ceramic surface 2. The rotating disk 4 is placed below the processing disk 3, and the rotating disk 4 can drive the processing disk 3 to rotate synchronously, so that during the movement of the nozzle 1, the processing disk 3 can also actively move relative to the nozzle 1. Since the processing disk 3 is a rotating movement, the travel trajectory of the nozzle 1 is set to a straight line, which is a diameter line passing through the center of the ceramic surface 2. Therefore, the nozzle 1 forms a spiral sandblasting trajectory on the ceramic surface 2, which can improve the sandblasting efficiency. Compared with the straight sandblasting trajectory, the spiral sandblasting trajectory has a more uniform coverage range and is more suitable for the shape of the ceramic surface 2 for processing, making the motion trajectory that the nozzle 1 needs to set simpler.

[0038] During the movement of the nozzle 1 , when the nozzle 1 moves close to the center of the ceramic surface 2 , the moving speed of the nozzle 1 gradually increases, and when the nozzle 1 moves away from the center of the ceramic surface 2 , the moving speed of the nozzle 1 gradually decreases. Since the ceramic surface 2 is a circular structure, when the relative speed between the nozzle 1 and the processing disk 3 remains fixed, the processing frequency of the outer side of the ceramic surface 2 will be insufficient, while the processing frequency of the inner side of the ceramic surface 2 will be excessive. Therefore, in the present application, the designer makes the relative speed between the nozzle 1 and the ceramic surface 2 not fixed, thereby solving the problem of inconsistent processing frequencies on the inside and outside. First, since the angular velocities of the inner and outer sides of the ceramic surface 2 are the same, while the arc lengths corresponding to the same angles are different, the sandblasting will have different processing arc lengths on the inner and outer sides within the same time. Therefore, the nozzle 1 stays for different times on the same arc length on the inner and outer sides, resulting in differences in the uniformity of the sandblasting on the inner and outer sides. Therefore, the present application sets a lower moving speed of the nozzle 1 on the side away from the center of the ceramic surface 2, thereby enabling a longer sandblasting effect to be obtained on the outer side of the ceramic surface 2, and sets an increased moving speed of the nozzle 1 on the inner side of the ceramic surface 2, thereby reducing the time that the nozzle 1 stays on the inner side of the ceramic surface 2, thereby averaging the sandblasting effect of the entire ceramic surface 2 and improving the uniformity of the sandblasting.

[0039] In this embodiment, the processing process includes the following steps: S1, placing the ceramic on the processing disk 3; S2, coating the area of ​​the ceramic that needs to be protected; S3, selecting a sandblasting medium of appropriate specifications; S4, adjusting the sandblasting machine to a small range of sandblasting, the nozzle 1 moves relative to the ceramic, and performs a sweeping process on the ceramic surface 2, and the sweeping range of the nozzle 1 covers the ceramic surface 2. In this application, by reducing the sandblasting range of the nozzle 1, the small range of sandblasting cannot fully cover the entire ceramic surface 2, and by moving the nozzle 1, a relative motion path is generated between the nozzle 1 and the ceramic surface 2, and the entire ceramic is completely covered along the motion path by the sandblasting range. Since the sandblasting range is reduced, the uniformity of the sandblasting within this range can be more accurately controlled, and the sandblasting trajectory is fully covered, so that the sandblasting effect of the entire ceramic surface 2 is uniform, and the phenomenon that the edge sandblasting effect is not as good as the center sandblasting effect due to large-scale sandblasting is reduced, thereby improving the controllability of the uniformity of the entire ceramic surface 2.

[0040] In step S2, polyvinyl chloride coating is selected as the coating material. Polyvinyl chloride coating is finally selected for silicon carbide due to its high hardness and wear resistance. The adhesion of this coating is 28N / 100mm, and it is not easy to fall off when attached to the silicon carbide ceramic surface 2 during sandblasting; it has excellent wear resistance and will not deform during sandblasting, resulting in poor ceramic morphology processing; the coating backing is a rubber adhesive, and removing the coating after sandblasting will not pollute the ceramic surface 2. It meets the requirements of high-precision and high-quality surface processing, ensures the fineness and accuracy of processing, and greatly reduces the occurrence of poor boss height or diameter size generated on the surface after processing.

[0041] In step S3, 320 mesh silicon carbide particles are selected as the sandblasting medium to perform sandblasting on the product. The type and particle size of the sandblasting medium are adjusted to meet the high hardness and wear resistance of the processed material silicon carbide and meet the requirements of product surface roughness. The test media mainly include 120, 320, 500 mesh alumina and 120, 320, 500 mesh silicon carbide particles. Through experiments, it was found that the cutting force of alumina particles in sandblasting was small, the roughness of the ceramic surface 2 was too large after 120 mesh silicon carbide sandblasting, and the uniformity of 500 mesh silicon carbide sandblasting was poor. Finally, 320 mesh silicon carbide particles were selected as the sandblasting medium to perform sandblasting on the product. The selection of this type of particles as the sandblasting medium can greatly shorten the product processing time, improve the processing efficiency, and meet the design requirements of silicon carbide CHUCK.

Claims

1. A method for processing ceramic surface features, characterized in that: The following steps are included: S1, placing ceramic on a processing plate; S2. Laminating the area of ​​the ceramic that needs to be protected; S3. Select sandblasting media of appropriate specifications; S4. The sandblasting machine is adjusted to small-range sandblasting. The nozzle moves relative to the ceramic to perform sweeping processing on the ceramic surface. The sweeping range of the nozzle covers the ceramic surface. The processing disk is a rotating disk that can drive the ceramic to rotate. The nozzle forms a spiral sandblasting trajectory relative to the ceramic surface.

2. A ceramic surface feature processing method according to claim 1, characterized in that: The moving track of the nozzle on the silicon carbide surface is a "J"-shaped reciprocating motion.

3. A ceramic surface feature processing method according to claim 1, characterized in that: The moving track of the nozzle is the diameter line of the ceramic. During the movement of the nozzle, the rotating disk rotates synchronously, and the nozzle forms a spiral sandblasting track relative to the ceramic surface.

4. A ceramic surface feature processing method according to claim 1, characterized in that: During the movement of the nozzle, when the nozzle moves close to the center of the ceramic surface, the moving speed of the nozzle gradually increases, and when the nozzle moves away from the center of the ceramic surface, the moving speed of the nozzle gradually decreases.

5. A ceramic surface feature processing method according to claim 3, characterized in that: After the nozzle has traveled a complete diameter line path, the nozzle repeatedly travels along the diameter line on the ceramic surface, the rotating disk rotates in the opposite direction, and the nozzle forms a reverse spiral sandblasting trajectory relative to the ceramic surface.

6. A ceramic surface feature processing method according to claim 3, characterized in that: When the nozzle moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface, the nozzle stops sandblasting and continues to move along the diameter line. When the nozzle moves along the diameter line until the edge of the sandblasting range is tangent to the center point of the ceramic surface again, the nozzle resumes sandblasting.

7. A ceramic surface feature processing method according to claim 3, characterized in that: When the nozzle moves along a straight path to the point where the edge of the blasting range is one blasting range away from the center of the ceramic surface, the sandblasting stops and the rotating disk stops rotating synchronously. When the nozzle moves to the point where the edge of the blasting range is tangent to the center of the ceramic surface, the nozzle starts sandblasting again, and the nozzle forms a circular trajectory relative to the center of the ceramic surface.

8. A ceramic surface feature processing method according to claim 7, characterized in that: The rotating disk stops rotating, and the nozzle rotates around the center of the ceramic surface to form a circular track. After the nozzle rotates one circle, it moves in the opposite direction along the diameter line, and the rotating disk rotates in the opposite direction synchronously until the nozzle is separated from the ceramic surface.

9. A ceramic surface feature processing method according to any one of claims 1 to 8, characterized in that: In step S2, the coating material is selected as polyvinyl chloride coating.

10. A ceramic surface feature processing method according to any one of claims 1 to 8, characterized in that: In step S3, 320-mesh silicon carbide particles are selected as sandblasting media to perform sandblasting on the product.

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