Plasma generating devices and electrical equipment

Abstract

The present invention discloses a plasma generating device and an electrical device, which relate to the field of plasma technology, wherein the plasma generating device comprises a dielectric structure, a first electrode and a second electrode, the dielectric structure covers the second electrode, a part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode is arranged on a side of the planar dielectric layer away from the second electrode. The technical solution of the present application can avoid the plasma generating device from being too large in size under the condition of safe use of the plasma generating device.

Description

Technical Field

[0001] The invention relates to the field of plasma technology, in particular to a plasma generating device and electrical equipment. Background Art

[0002] Plasma sterilization and purification uses the energy and active components generated by discharge between two electrodes to kill VOCs (volatile organic compounds) and viruses and bacteria in the air, generating water and carbon dioxide, which has advantages over other air purification technologies.

[0003] In the related art, in order to improve the safety of use, it is necessary to increase the distance between the two electrodes, which easily leads to the plasma generating device being too large and difficult to use in a small space. Summary of the invention

[0004] The main purpose of the present invention is to provide a plasma generator and an electrical device, aiming to avoid the plasma generator from being too large in size under the condition of safe use of the plasma generator.

[0005] To achieve the above-mentioned purpose, the present invention provides a plasma generating device, which includes a dielectric structure, a first electrode and a second electrode, wherein the dielectric structure covers the second electrode, a portion of the dielectric structure is configured as a planar dielectric layer, and the first electrode is disposed on a side of the planar dielectric layer away from the second electrode.

[0006] The present application also provides a plasma generating device, the plasma generating device comprising a dielectric structure, a first electrode and a second electrode, at least a portion of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode overlap at the orthographic projection portion of the dielectric structure, and the maximum circumscribed circle diameter of the overlapped area is L;

[0007] A first creepage distance D is defined between the first electrode and the second electrode. min and the second creepage distance D max , the radius R of the maximum inscribed circle when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

[0008] In one embodiment, the second creepage distance D between the first electrode and the second electrode max ≥3D min .

[0009] In one embodiment, the dielectric structure is a planar dielectric structure;

[0010] Alternatively, the dielectric structure is coated on the second electrode, and a surface of the second electrode facing away from the first electrode is at least partially exposed outside the dielectric structure.

[0011] In one embodiment, at least one of the first electrode and the second electrode is disposed on a surface of a portion of the dielectric structure between the first electrode and the second electrode;

[0012] And / or, at least one of the first electrode and the second electrode is spaced apart from a portion of the dielectric structure between the first electrode and the second electrode.

[0013] In one embodiment, the distance between the first electrode and the second electrode is H, the thickness of the portion of the dielectric structure between the first electrode and the second electrode is d, and 0≤Hd≤5mm is satisfied;

[0014] And / or, a thickness d≤2 mm of a portion of the dielectric structure located between the first electrode and the second electrode.

[0015] In one embodiment, at least a portion of the first electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure;

[0016] Or, the first electrode is a conductive film;

[0017] Or, the first electrode is a conductive coating provided on the surface of the dielectric structure;

[0018] Alternatively, the plasma generating device further comprises a first carrier disposed opposite to the dielectric structure, and the first electrode is a conductive coating disposed on a surface of the first carrier;

[0019] Alternatively, the first electrode is a wire.

[0020] In one embodiment, at least a portion of the second electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure;

[0021] Or, at least a portion of the second electrode disposed opposite to the dielectric structure is a conductive film;

[0022] Or, at least part of the second electrode is a conductive coating disposed on the surface of the dielectric structure;

[0023] Alternatively, the plasma generating device further comprises a second carrier disposed opposite to the dielectric structure, and at least a portion of the second electrode is a conductive coating disposed on a surface of the second carrier.

[0024] In one embodiment, the dielectric structure includes an insulating sheet;

[0025] and / or, the dielectric structure comprises at least one insulating coating layer;

[0026] And / or, the material of the dielectric structure is at least one of ceramic, quartz and polytetrafluoroethylene.

[0027] In one embodiment, at least a portion of the first electrode is configured as a first extension segment, and the first extension segment is disposed on a surface of the dielectric structure or is disposed in parallel with the dielectric structure at an interval.

[0028] In one embodiment, the plasma generating device further comprises a housing, wherein a placement space is formed in the housing, and at least one outlet communicating with the placement space is opened;

[0029] The dielectric structure, at least a portion of the first electrode, and at least a portion of the second electrode are disposed in the placement space, and the first extension section is extended toward one of the outlets.

[0030] In one embodiment, one of the outlets is disposed opposite to a surface of the dielectric structure, and an end of the first extension segment is exposed at the outlet.

[0031] In one embodiment, the shell is further provided with a flow guiding structure, and the flow guiding structure extends from the edge of the outlet to the outside of the shell, and the end of the first extension section is arranged toward the flow guiding structure.

[0032] In one embodiment, a first mounting groove is provided on the inner surface of the housing, and at least a portion of the first extension section is disposed in the first mounting groove;

[0033] And / or, a first limiting groove is provided on the inner surface of the shell, a first limiting section is protruding from the side of the first extension section, and the first limiting section is arranged in the first limiting groove;

[0034] And / or, part of the first electrode extends to the outside of the shell to form a first power connection section.

[0035] The present application also provides a plasma generating device, comprising a dielectric structure, a first electrode and a second electrode, at least part of the dielectric structure is configured as a planar dielectric layer, the first electrode and the second electrode are respectively arranged on both sides of the planar dielectric layer;

[0036] The distance between the first electrode and the second electrode along the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d, satisfying 0≤Hd≤5mm.

[0037] In one embodiment, the thickness d of the planar dielectric layer is ≤ 2 mm.

[0038] The present application also proposes an electrical device, which is provided with a plasma generating device as described in any of the aforementioned embodiments.

[0039] In the technical solution of the present invention, the first electrode and the second electrode are separated and arranged by a dielectric structure, wherein the dielectric structure can completely cover the second electrode so that the first electrode and the second electrode are insulated. At this time, the creepage distance between the two electrodes is infinite, and there will be no creepage problem. The dielectric structure can be set according to the size of the second electrode, and there is no need to set an overly large dielectric structure, thereby controlling the volume of the plasma generating device and avoiding the plasma generating device from being too large, which is conducive to using the plasma generating device in a small space.

[0040] In addition, the first electrode and the second electrode may have a portion of the conductive surface exposed to the outside, for example, the dielectric structure may be set as a planar dielectric structure located between the first electrode and the second electrode, or the dielectric structure may be formed into an open covering structure for covering the second electrode; the first creepage distance D between the first electrode and the second electrode may be determined according to the operating voltage range of the plasma generating device. min and the second creepage distance D max The first creepage distance is set according to the use requirements of the plasma generator under the first working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode and the second electrode under the first working condition; the second creepage distance is set according to the use requirements of the plasma generator under the second working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode and the second electrode under the second working condition; the first working condition and the second working condition are different use environments of the plasma generator, and the first working condition and the second working condition can be differences in temperature, air pressure, humidity, dust concentration, and environmental pollution level. Define the radius R of the maximum inscribed circle when the dielectric structure is spread into a plane structure to satisfy (D min +L) / 2≤R≤(D max +L) / 2, it is possible to obtain a stable and more energetic plasma while ensuring the safety of the plasma generator, and to avoid the dielectric structure size and the plasma generator volume being too large, which is conducive to the use of the plasma generator in a small space. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0042] Figure 1 A structural diagram of a first embodiment of a plasma generating device provided in the present application;

[0043] Figure 2 A structural diagram of a second embodiment of a plasma generating device provided in the present application;

[0044] Figure 3 A structural diagram of a third embodiment of a plasma generating device provided in the present application;

[0045] Figure 4 A schematic diagram of an embodiment of a dielectric structure spread into a planar structure in a plasma generating device provided by the present application;

[0046] Figure 5 A structural diagram of a fourth embodiment of a plasma generating device provided in the present application;

[0047] Figure 6 A structural diagram of a fifth embodiment of a plasma generating device provided in the present application;

[0048] Figure 7 A structural diagram of a sixth embodiment of a plasma generating device provided in the present application;

[0049] Figure 8 A structural diagram of a seventh embodiment of a plasma generating device provided in the present application;

[0050] Fig. 9 A structural diagram of an eighth embodiment of a plasma generating device provided in the present application;

[0051] Fig.10 for Fig. 9 An exploded view of the plasma generating device;

[0052] Fig.11 for Fig.10 Structural diagram of the first half shell.

[0053] Description of Figure Numbers:

[0054] 100. Plasma generating device; 1. Dielectric structure; 2. First electrode; 21. First extension section; 22. First power connection section; 23. First limiting section; 3. Second electrode; 31. Second extension section; 32. Second power connection section; 33. Second limiting section; 4. Shell; 41. Accommodating space; 42. Outlet; 43. First half shell; 44. Second half shell; 45. First mounting groove; 46. Second mounting groove; 47. First limiting groove; 48. Second limiting groove; 49. Guide structure.

[0055] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0056] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0057] Plasma sterilization and purification uses the energy and active components generated by discharge between two electrodes to kill VOCs (volatile organic compounds) and viruses and bacteria in the air, generating water and carbon dioxide, which has advantages over other air purification technologies.

[0058] In the related art, the generation of plasma requires the application of AC high voltage between two electrodes. As the applied voltage increases, in order to improve the safety of use, it is necessary to increase the air creepage distance between the two electrodes, which easily leads to the plasma generating device being too large and difficult to use in a small space.

[0059] In order to solve the above problems, the present application proposes a plasma generating device 100 .

[0060] Please refer to Figure 1 The present application also proposes a plasma generating device 100, which includes a dielectric structure 1, a first electrode 2 and a second electrode 3. The dielectric structure 1 covers the second electrode 3, a portion of the dielectric structure 1 is configured as a planar dielectric layer, and the first electrode 2 is configured on a side of the planar dielectric layer away from the second electrode 3.

[0061] The dielectric structure 1 can be made of ceramic, quartz or other insulating materials, can be a planar dielectric structure, or can form a covering space for covering at least part of the second electrode 3 or the first electrode 2. The first electrode 2 and the second electrode 3 are separated by the dielectric structure 1.

[0062] When the plasma generating device 100 is used, an AC voltage is input between the first electrode 2 and the second electrode 3, so that a dielectric barrier discharge is formed on the surface of the dielectric structure 1, and acts on the fluid (for example, air, exhaust gas or liquid from certain processes) flowing through the first electrode 2 and the second electrode 3, so that the fluid and the substances in the fluid are charged and become a plasma state, so as to generate plasma, so as to kill VOCs and viruses and bacteria in the fluid, generate water and carbon dioxide, and thus achieve a purification effect.

[0063] In the plasma generator 100, it is necessary to ensure that the first electrode 2 and the second electrode 3 are insulated from each other. In this embodiment, the dielectric structure 1 completely covers the second electrode 3, so that the second electrode 3 has no exposed conductive surface, the first electrode 2 and the second electrode 3 are insulated by the dielectric structure 1, and the creepage distance between the two electrodes is infinite, and there will be no creepage problem, thereby improving the safety of the plasma generator 100; at this time, the dielectric structure 1 can be set according to the size of the second electrode 3, and there is no need to set an overly large dielectric structure 1, thereby controlling the volume of the plasma generator 100, avoiding the plasma generator 100 from being too large, and facilitating the use of the plasma generator 100 in a small space.

[0064] Combined with reference Figures 2 to 4 The present application also proposes a plasma generating device 100, which includes a dielectric structure 1, a first electrode 2 and a second electrode 3, at least a portion of the dielectric structure 1 is located between the first electrode 2 and the second electrode 3, the first electrode 2 and the second electrode 3 overlap with the orthographic projection of the dielectric structure 1, and the maximum circumscribed circle diameter of the overlapping area is L; a first creepage distance D is defined between the first electrode 2 and the second electrode 3 min and the second creepage distance D max , the radius R of the maximum inscribed circle when the dielectric structure 1 is spread into a plane structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

[0065] In this embodiment, the dielectric structure 1 can be configured as a planar dielectric structure, or as an open covering structure covering one of the electrodes, so that the first electrode 2 and the second electrode 3 both have a partial surface exposed in the air. In order to avoid creepage between the first electrode 2 and the second electrode 3 along the air or the surface of the dielectric structure 1, it is necessary to make the electrical gap or creepage distance between the first electrode 2 and the second electrode 3 not less than the first creepage distance D min ; First creepage distance D min It refers to the shortest distance between the first electrode 2 and the second electrode 3 along the surface of the dielectric structure 1 that needs to be satisfied to avoid creepage when both the first electrode 2 and the second electrode 3 are disposed on the surface of the dielectric structure 1. The first creepage distance between the first electrode 2 and the second electrode 3 can be determined according to the operating voltage range of the plasma generating device 100.

[0066] It should be noted that, in the embodiment of the present application, the first electrode 2 and the second electrode 3 can be arranged on two surfaces of the dielectric structure 1 that are arranged opposite to each other, or at least one of the first electrode 2 and the second electrode 3 can be arranged at a distance from the surface of the dielectric structure 1 that is away from the other electrode. When the first electrode 2 and the second electrode 3 are both arranged on the surface of the dielectric structure 1, it is necessary to avoid the first electrode 2 and the second electrode 3 from creeping along the surface of the dielectric structure 1, that is, it is necessary to insulate the first electrode 2 and the second electrode 3 from each other to improve the safety of use. When the plasma generating device 100 is used under different working conditions, the creepage distance requirements that need to be met to prevent the creepage phenomenon from occurring between the first electrode 2 and the second electrode 3 are different. For example, in working conditions with a relatively high environmental pollution level, the creepage distance that the first electrode 2 and the second electrode 3 need to meet is greater than the creepage distance in working conditions with a relatively low environmental pollution level. The working condition difference can also be a temperature difference, an air pressure difference, a humidity difference, and a dust concentration, etc. The creepage distance requirements under different working conditions can be obtained based on experiments, experience, or safety requirements.

[0067] In the embodiment of the present application, the minimum creepage distance that needs to be satisfied between the first electrode 2 and the second electrode 3 when the plasma generating device 100 is used in the first working condition is defined as the first creepage distance D min When the plasma generating device 100 is used in the second working condition, the minimum creepage distance between the first electrode 2 and the second electrode 3 is the second creepage distance D max , wherein the second creepage distance is not less than the first creepage distance, and the environment of the second working condition is relatively worse than that of the first working condition, such as being too humid or having a high pollution level.

[0068] In addition, when at least one of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1, the shortest distance measured along the air between the first electrode 2 and the second electrode 3, i.e., the electrical gap, is greater than the creepage distance when both the first electrode 2 and the second electrode 3 are provided in the dielectric structure 1. Therefore, when the size of the dielectric structure 1 is set according to the condition that both electrodes are provided in the dielectric structure 1 and the creepage distance between the two electrodes is not less than the first creepage distance, even if at least one of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1, the plasma generating device 100 can be used safely.

[0069] In the embodiment of the present application, the projection areas of the first electrode 2 and the second electrode 3 on the dielectric structure 1 can be partially overlapped, so that the straight-line distance between the first electrode 2 and the second electrode 3 can be reduced, thereby reducing the excitation voltage of the plasma generating device 100, which can improve the safety of the plasma generating device 100 and reduce the first creepage distance that needs to be met.

[0070] Furthermore, the overlapping position of the electrodes needs to be at the center or near the center of the dielectric structure 1. It is understandable that when the dielectric structure 1 is a planar dielectric structure, it is always in a spreading state. When the dielectric structure 1 is set as a coating structure with an open surface, its spreading state is to spread the various surfaces of the dielectric structure 1 forming the coating structure to the same surface. The embodiment of the present application is also limited in combination with the size of the electrode, and defines that the maximum circumscribed circle diameter of the overlapping projection area of ​​the first electrode 2 and the second electrode 3 on the surface of the dielectric structure 1 is L, and the radius R of the maximum inscribed circle of the planar structure formed when the dielectric structure 1 is spread satisfies (D min +L) / 2≤R≤(D max +L) / 2, this setting mode can not only meet the safety use requirements of the plasma generator 100, but also reasonably set the size of the dielectric structure 1 to avoid the dielectric structure 1 being too large. According to the required plasma energy requirements, a suitable excitation voltage can be used, and the dielectric structure 1 of appropriate size can be set according to the above size range, so as to improve the structural design flexibility of the plasma generator 100. In some embodiments, when the plasma generator 100 is provided with multiple electrodes, for example, at least two first electrodes 2 can be set to overlap with the same second electrode 3, or at least two first electrodes 2 and at least two second electrodes 3 can be set one-to-one. After calculating the corresponding minimum and maximum inscribed circles respectively, the radius of the maximum inscribed circle of the planar structure formed by the spread of the dielectric structure 11 is defined as R by combining them.

[0071] Therefore, it can be understood that in the technical solution of the present invention, the first electrode 2 and the second electrode 3 are separated and arranged by the dielectric structure 1, wherein the first electrode 2 and the second electrode 3 can have a part of the conductive surface exposed to the outside, for example, the dielectric structure 1 can be set as a planar dielectric structure located between the first electrode 2 and the second electrode 3, or the dielectric structure 1 can be formed into an open coating structure for coating the second electrode 3; the first creepage distance D between the first electrode 2 and the second electrode 3 can be obtained according to the operating voltage range of the plasma generating device 100. min and the second creepage distance D maxThe first creepage distance is set according to the use requirements of the plasma generator 100 under the first working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode 2 and the second electrode 3 under the first working condition; the second creepage distance is set according to the use requirements of the plasma generator 100 under the second working condition, and can be the minimum creepage distance limited to prevent creepage between the first electrode 2 and the second electrode 3 under the second working condition; the first working condition and the second working condition are different use environments of the plasma generator 100, and the first working condition and the second working condition can be differences in temperature, pressure, humidity, dust concentration, and environmental pollution level. Define the radius of the maximum inscribed circle when the dielectric structure 1 is spread into a planar structure (D min +L) / 2≤R≤(D max +L) / 2, it is possible to obtain a stable and more energetic plasma while ensuring the safety of the plasma generator 100, and it is possible to avoid the dielectric structure 1 and the plasma generator 100 from being too large, which is conducive to the use of the plasma generator 100 in a small space.

[0072] In one embodiment, the second creepage distance D of the first electrode 2 and the second electrode 3 is max ≥3D min This setting method can use the first creepage distance under normal use environment as the basis for setting the second creepage distance, so as to set the size of the dielectric structure 1 accordingly, ensure the performance stability of the plasma generator 100 when used in harsh environments, and facilitate the structural design of the plasma generator 100.

[0073] Please refer to Figure 2 and Figure 3 In one embodiment, the dielectric structure 1 is a planar dielectric structure; or the dielectric structure 1 forms an encapsulating space with an opening, the second electrode 3 is arranged in the encapsulating space, and the opening is located on a side of the second electrode 3 away from the first electrode 2.

[0074] In this embodiment, the dielectric structure 1 can be set as a planar dielectric structure, such as an insulating sheet, an insulating coating, etc., and the first electrode 2 and the second electrode 3 are respectively arranged on two sides of the planar dielectric structure that are back to back. Using a planar dielectric structure as the dielectric structure 1 has a simple structure and is convenient for disassembly and assembly of the plasma generating device 100.

[0075] In addition, the dielectric structure 1 can form an open encapsulation space, and the second electrode 3 is arranged in the encapsulation space; for example, the dielectric structure 1 includes a connected plane layer and a side portion, the plane layer is sandwiched between the first electrode 2 and the second electrode 3, and the side portion extends from the plane layer to the side away from the first electrode 2 and is arranged at an angle with the plane layer, and the dielectric structure 1 can also extend to the surface of the second electrode 3 away from the first electrode 2. In some embodiments, it can be regarded that the dielectric structure 1 uses a sheet structure as a raw material, and the edge of the sheet structure is folded in a direction away from the first electrode 2 to be encapsulated on a part of the surface of the second electrode 3. Setting the dielectric structure 1 as a coating structure can reduce the cross-sectional size of the dielectric structure 1, thereby reducing the volume of the plasma generator 100, which is conducive to using the plasma generator 100 in a smaller space.

[0076] Please refer to Figures 2 to 4 In one embodiment, the distance between the first electrode 2 and the second electrode 3 is H, and the thickness of the portion of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is d, satisfying 0≤Hd≤5mm.

[0077] In this embodiment, the relationship between the distance H between the first electrode 2 and the second electrode 3 and the distance d between the thickness of the dielectric structure 1 satisfies 0≤Hd≤5mm; specifically, the first electrode 2 and the second electrode 3 can be respectively arranged on two surfaces of the dielectric structure 1 that are arranged opposite to each other, and the distance between the first electrode 2 and the second electrode 3 is approximately the thickness of the dielectric structure 1; in addition, one of the first electrode 2 and the second electrode 3 can also be arranged on the surface of the dielectric structure 1, so that one of the first electrode 2 and the second electrode 3 is arranged spaced from the dielectric structure 1, and the distance between the electrode spaced from the dielectric structure 1 and the dielectric structure 1 does not exceed 5mm; or the first electrode 2 and the second electrode 3 are both spaced from the dielectric structure 1, and the sum of the distances between the two electrodes and the dielectric structure 1 does not exceed 5mm. This arrangement makes the first electrode 2 and the second electrode 3 close to the dielectric structure 1, which can reduce the thickness and volume of the plasma generating device 100.

[0078] In one embodiment, the thickness d of the portion of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is ≤ 2 mm.

[0079] In this embodiment, the dielectric structure 1 can be an insulating layer with a thickness not exceeding 2 mm, or can be an insulating coating coated on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. Such a configuration makes the thickness and volume of the plasma generating device 100 relatively small, which is conducive to applying the plasma generating device 100 in a small space.

[0080] Please refer to Figure 2 , Figure 7 and Figure 8 In one embodiment, at least one of the first electrode 2 and the second electrode 3 is disposed on a surface of a portion of the dielectric structure 1 between the first electrode 2 and the second electrode 3;

[0081] And / or, at least one of the first electrode 2 and the second electrode 3 is spaced apart from a portion of the dielectric structure 1 between the first electrode 2 and the second electrode 3 .

[0082] In this embodiment, the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is a dielectric layer, and at least one of the first electrode 2 and the second electrode 3 can be arranged on the surface of the dielectric layer, for example, the first electrode 2 and the second electrode 3 are arranged on two surfaces of the dielectric layer that are arranged opposite to each other, or one of the first electrode 2 and the second electrode 3 is arranged on the surface of the dielectric layer, and the other is arranged at a distance from the dielectric layer. Among them, the electrode is arranged on the surface of the dielectric layer, and any electrode can be attached to the surface of the dielectric structure 1, or the electrode can be a coating on the surface of the dielectric structure 1, or the electrode and the dielectric structure 1 can be a conductive coating and an insulating coating stacked on a substrate. Such an arrangement can reduce the thickness and volume of the plasma generating device 100.

[0083] In some embodiments, the first electrode 2 and the second electrode 3 may be spaced apart from the dielectric layer between the first electrode 2 and the second electrode 3 . In this case, the contact area between the electrodes and the air in the plasma generating device 100 is increased, thereby improving the plasma generating efficiency.

[0084] Please refer to Figure 1 , Figure 2 , Figure 7 and Figure 8 The present application also proposes a plasma generating device 100, comprising a dielectric structure 1, a first electrode 2 and a second electrode 3, wherein at least a portion of the dielectric structure 1 is configured as a planar dielectric layer, and the first electrode 2 and the second electrode 3 are respectively arranged on both sides of the planar dielectric layer; a distance between the first electrode 2 and the second electrode 3 along a thickness direction of the planar dielectric layer is H, and a thickness of the planar dielectric layer is d, satisfying 0≤Hd≤5mm.

[0085] In this embodiment, the first electrode 2 and the second electrode 3 are respectively arranged on the two sides of the planar dielectric layer of the dielectric structure 1 which are arranged opposite to each other, and the projection profiles of the first electrode 2 and the second electrode 3 on the surface of the planar dielectric layer may or may not overlap. It is defined that the relationship between the distance H between the first electrode 2 and the second electrode 3 in the thickness direction of the planar dielectric layer and the distance d between the thickness of the dielectric structure 1 satisfies 0≤Hd≤5mm; specifically, the first electrode 2 and the second electrode 3 may be respectively arranged on the two surfaces of the dielectric structure 1 which are arranged opposite to each other, and the distance between the first electrode 2 and the second electrode 3 is approximately the thickness of the dielectric structure 1; in addition, one of the first electrode 2 and the second electrode 3 may be arranged on the surface of the dielectric structure 1, so that one of the first electrode 2 and the second electrode 3 is spaced from the dielectric structure 1, and the distance between the electrode spaced from the dielectric structure 1 and the dielectric structure 1 does not exceed 5mm; or the first electrode 2 and the second electrode 3 are both spaced from the dielectric structure 1, and the sum of the spacings between the two electrodes and the dielectric structure 1 does not exceed 5mm. In this configuration, the first electrode 2 and the second electrode 3 are separated by the dielectric structure 1 , and both the first electrode 2 and the second electrode 3 are close to the dielectric structure 1 , which can reduce the thickness and volume of the plasma generating device 100 .

[0086] Please refer to Figures 6 to 8 In one embodiment, the thickness d of the portion of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is ≤ 2 mm.

[0087] In this embodiment, the dielectric structure 1 can be an insulating layer with a thickness not exceeding 2 mm, or can be an insulating coating coated on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. Such a configuration makes the thickness and volume of the plasma generating device 100 relatively small, which is conducive to applying the plasma generating device 100 in a small space.

[0088] In one embodiment, the first electrode 2 and the second electrode 3 partially overlap in the projection area of ​​the planar dielectric layer. In this way, the straight-line distance between the first electrode 2 and the second electrode 3 can be reduced, thereby reducing the excitation voltage of the plasma generator 100, which can improve the use safety of the plasma generator 100 and reduce the first creepage distance that needs to be met.

[0089] In one embodiment, at least a portion of the first electrode 2 disposed opposite to the dielectric structure 1 is a sheet-shaped electrode structure; or, the first electrode 2 is a conductive film; or, the first electrode 2 is a conductive coating disposed on the surface of the dielectric structure 1; or, the plasma generating device 100 further includes a first carrier disposed opposite to the dielectric structure 1, and the first electrode 2 is a conductive coating disposed on the surface of the first carrier; or, the first electrode 2 is a wire.

[0090] In this embodiment, the first electrode 2 can be one of a sheet electrode structure, a conductive film, a conductive coating, and a wire. Wherein, when the first electrode 2 is a sheet electrode structure, its thickness can be set according to actual needs, and it can be usually made of metal materials such as silver, gold, copper, carbon materials, conductive polymers or other materials, so that the structural strength of the first electrode 2 is relatively good and the performance stability is good; when the first electrode 2 is made of a conductive film and a conductive coating, the thickness of the first electrode 2 is small, which is conducive to reducing the thickness and volume of the plasma generating device 100, and is conducive to the application of the plasma generating device 100 in a small space, and improving the applicability and flexibility of use; wherein, the conductive coating can be directly arranged on the surface of the dielectric structure 1, further reducing the overall thickness of the first electrode 2 and the dielectric structure 1, and a first carrier can also be arranged to arrange the conductive coating to form the first electrode 2. Wherein, the sheet electrode structure, the conductive film, the conductive coating, etc. can all be set to the desired shape and structure of the first electrode 2 according to actual needs. For example, the part of the first electrode 2 arranged opposite to the dielectric structure 1 can be set to a strip structure, which can control the plasma generation area and diffusion direction. When the first electrode 2 is made of a wire, the end of the first electrode 2 is close to a tip, so that plasma can be concentrated in the end area.

[0091] In one embodiment, at least a portion of the second electrode 3 disposed opposite to the dielectric structure 1 is a sheet-shaped electrode structure; or, at least a portion of the second electrode 3 disposed opposite to the dielectric structure 1 is a conductive film;

[0092] Alternatively, at least a portion of the second electrode 3 is a conductive coating disposed on the surface of the dielectric structure 1; or, the plasma generating device 100 further comprises a second carrier disposed opposite to the dielectric structure 1, and at least a portion of the second electrode 3 is a conductive coating disposed on the surface of the second carrier.

[0093] In this embodiment, at least a portion of the second electrode 3 that is disposed opposite to the dielectric structure 1 can be configured as one of a sheet electrode structure, a conductive film, and a conductive coating. Wherein, when the second electrode 3 is configured as a sheet electrode structure, its thickness can be set according to actual needs, and can be generally made of metal materials such as silver, gold, copper, carbon materials, conductive polymers or other materials, so that the second electrode 3 has relatively good structural strength and good performance stability; when the second electrode 3 is made of a conductive film and a conductive coating, the thickness of the second electrode 3 is small, which is conducive to reducing the thickness and volume of the plasma generating device 100, and is conducive to the application of the plasma generating device 100 in a small space, and improving applicability and flexibility of use; wherein, the conductive coating can be directly disposed on the surface of the dielectric structure 1, further reducing the overall thickness of the second electrode 3 and the dielectric structure 1, and a second carrier can also be provided for arranging the conductive coating to form a portion of the second electrode 3 disposed opposite to the dielectric structure 1. Among them, the sheet electrode structure, the conductive film and the conductive coating can all be used to set the second electrode 3 to the desired shape and structure according to actual needs. For example, in the above embodiment, the second electrode 3 is provided with a second extension segment 31, and the end of the second extension segment 31 can be set to an arc shape, etc., so that the field strength on one side of the second electrode 3 is lower than the field strength of the first extension segment 21, thereby playing a role in controlling the plasma generation area.

[0094] In one embodiment, the dielectric structure 1 includes an insulating sheet; wherein the insulating sheet may be a ceramic sheet, a quartz sheet, etc., having a certain structural strength and not easily deformed or damaged; the thickness of the insulating sheet may be set according to actual needs and the installation space of the application environment of the plasma generator 100, or the required working voltage and other conditions. In some embodiments, the insulating sheet may also serve as a carrier of the first electrode 2 and the second electrode 3 to reduce the thickness of the plasma generator 100.

[0095] In one embodiment, the dielectric structure 1 includes at least one insulating coating. The insulating coating may be a polytetrafluoroethylene coating, an insulating paint, etc. The dielectric structure 1 may include only one insulating coating. The insulating coating is disposed on the surface of the second electrode 3, which is beneficial to reducing the thickness and volume of the plasma generating device 100, and is beneficial to the application of the plasma generating device 100 in a small space, thereby improving the applicability and flexibility of use. In some embodiments, the dielectric structure 1 covers the second electrode 3, so that the insulating coating can be applied to each surface of the second electrode 3; in addition, at least part of the surface of the second electrode 3 away from the first electrode 2 may not be covered by the insulating coating.

[0096] In addition, the dielectric structure 1 may also include an insulating carrier layer and at least one insulating coating layer. The insulating carrier layer may be the insulating sheet in the aforementioned embodiment. At least one insulating coating layer is provided on the surface of the insulating carrier layer, which can not only improve the insulation performance of the dielectric structure 1, but also reduce the thickness of the dielectric structure 1, thereby reducing the thickness and volume of the ion generating device.

[0097] Please refer to Fig. 9 and Fig.10 In one embodiment, at least a portion of the first electrode 2 is configured as a first extension segment 21 , and the first extension segment 21 is disposed on the surface of the dielectric structure 1 or is disposed in parallel with the dielectric structure 1 at an interval.

[0098] In this embodiment, at least part of the first electrode 2 is configured as a first extension section 21. The first extension section 21 can be provided on the surface of the dielectric structure 1 or spaced apart from the dielectric structure 1. The first extension section 21 can be a linear structure or a strip structure with a certain width and length. The second electrode 3 can be provided opposite to at least part of the surface of the dielectric structure 1. The second electrode 3 can be a sheet electrode, a mesh electrode, a conductive film or a conductive coating, etc. provided opposite to the dielectric structure 1. The shape of the second electrode 3 can cover most of the surface of the dielectric structure 1, or it can be a sheet strip structure provided with a second extension section 31 as in the following embodiment. The provision of the first extension section 21 can make the plasma on one side of the first electrode 2 concentratedly generated in the end area of ​​the first extension section 21, and control the generation position of the plasma on one side of the first electrode 2.

[0099] Please refer to Fig.10 In one embodiment, at least a portion of the second electrode 3 is configured as a second extension segment 31, the second extension segment 31 is disposed on the surface of the dielectric structure 1 or is spaced apart and parallel to the dielectric structure 1, and the end of the second extension segment 31 is blunter than the end of the first extension segment 21.

[0100] In this embodiment, the portion of the second electrode 3 disposed opposite to the dielectric structure 1 is configured as a second extension segment 31, and the end of the second extension segment 31 is blunter than the end of the first extension segment 21. For example, the end size of the first extension segment 21 can be smaller than the end size of the second extension segment 31, or the end of the first extension segment 21 is configured as a pointed end, and the end of the second extension segment 31 is configured as an arc-shaped profile, so as to increase the field strength on one side of the first extension segment 21, so that the plasma in the plasma generating device 100 is concentrated on one side of the first electrode 2.

[0101] Please refer to Fig. 9 In one embodiment, the cross-sectional dimension of the end of the first extension section 21 is tapered, and at least one side surface of the first extension section 21 is configured as an inclined surface inclined relative to the extension direction of the first extension section 21 .

[0102] In this embodiment, one of the side surfaces of the first extension section 21 is an inclined plane inclined relative to the extension direction of the first extension section 21, and the cross-sectional size of the end of the first extension section 21 is gradually reduced; at this time, the end shape of the first extension section 21 can be roughly a truncated cone, a prism, a trapezoid or a pointed end. In this arrangement, by designing the shape of the end of the first extension section 21, the local field strength at the end of the first extension section 21 is increased, so that more plasma can be generated at the end of the first extension section 21, and through the guidance of the inclined plane, the plasma generated in the first extension section 21 area can diffuse toward the end of the first extension section 21, that is, the diffusion direction of the ion wind generated by the plasma aerodynamic effect is controlled, thereby forming a directional ion wind, so that the plasma generated by the plasma generating device 100 from the first electrode 2 side can be controlled to diffuse outward, so that the plasma generated by the plasma generating device 100 can diffuse to the required area as required, thereby achieving a better sterilization and purification effect.

[0103] In addition, in some embodiments, the first extension section 21 and the second electrode 3 need to have different shapes. By setting the tapered shape, the field strength difference between the first extension section 21 and the second electrode 3 can be made greater, so that more plasma is generated on one side of the first extension section 21.

[0104] Please refer to Fig. 9 In some embodiments, the end of the first extension section 21 forms a pointed tip. This arrangement further reduces the radius of curvature of the end of the first extension section 21, which is beneficial to increasing the difference in field strength between the first electrode 2 and the second electrode 3, making the field strength of the first electrode 2 higher than that of the second electrode 3, so that the plasma in the plasma generating device 100 is concentrated on one side of the first electrode 2.

[0105] Among them, the tip formed by the first extension segment 21 can make the first extension segment 21 a linear needle-like structure, or the end shape of the first extension segment 21 can be roughly a pyramid structure, for example, the end of the first extension segment 21 has two side surfaces in the width direction and two side surfaces in the thickness direction, and the four side surfaces converge at one point at the end to form a tip.

[0106] Please refer to Fig. 9 In one embodiment, at least in the end region of the first extension segment 21 , the width of the first extension segment 21 is gradually reduced along the extension direction of the first extension segment 21 .

[0107] In this embodiment, the width direction of the first extension section 21 is perpendicular to the length direction of the first extension section 21 and is in the plane direction of the dielectric layer 1. The projection of the first extension section 21 on the dielectric layer 1 is roughly a strip profile with a certain width, and has two side edges spaced apart in the width direction, and at least within a certain length range near the end of the first extension section 21, at least one side edge gradually extends in an inclined direction close to the other side edge, so that the width and cross-sectional size of the first extension section 21 gradually shrink, which can reduce the radius of curvature of the end of the first extension section 21, increase the local field strength of the first extension section 21, better enable the plasma in the plasma generator 100 to be concentrated on one side of the first electrode 2, and control the diffusion of the plasma toward the end of the first extension section 21.

[0108] It should be noted that, in the embodiment of the present application, the first extension section 21 may be a sheet electrode, a conductive film or a columnar electrode, etc., which is independent of the dielectric layer 1, and may be spaced apart from the dielectric layer 1 or combined with the dielectric layer 1 by bonding or the like; the first extension section 21 may also be a conductive plating layer disposed on the surface of the dielectric layer 1. In the present embodiment, it is only necessary to make the projection of the first extension section 21 on the dielectric layer 1 a strip structure, and the width at least at the end gradually decreases.

[0109] Please refer to Fig. 9 In one embodiment, the thickness of the end portion of the first extension segment 21 is gradually reduced along the extension direction of the first extension segment 21 .

[0110] In this embodiment, the first extension section 21 has a certain thickness, and at least within a certain length range near the end of the first extension section 21, the thickness of the first extension section 21 is gradually reduced in the direction close to the end surface, so that at least one of the two surfaces in the thickness direction can be tilted in the direction close to the other surface, which can reduce the thickness of the end of the first extension section 21, which is conducive to reducing the overall thickness of the plasma generating device 100, and control the diffusion of plasma in the direction of the end of the first extension section 21, so as to achieve controllable ion wind flow direction. Among them, the two surfaces of the first extension section 21 in the thickness direction can be converged at the end to form an edge, or the two surfaces can be connected through the end surface.

[0111] In some embodiments, the surface of the first extension segment 21 away from the dielectric layer 1 is inclined toward the direction close to the dielectric layer 1, and the surface of the first extension segment 21 close to the dielectric layer 1 is in contact with or parallel to the dielectric layer 1. This can gradually reduce the thickness of the first extension segment 21 while avoiding increasing the distance between the first extension segment 21 and the second electrode 3, which is beneficial to reducing the excitation voltage of the plasma generating device 100 and improving the safety of use.

[0112] Please refer to Fig. 9In one embodiment, the plasma generating device 100 further includes a shell 4, in which an accommodation space is formed, and at least one outlet 42 connected to the accommodation space is opened; the dielectric structure 1, at least a portion of the first electrode 2 and at least a portion of the second electrode 3 are arranged in the accommodation space, and the first extension section 21 extends toward one of the outlets 42.

[0113] In this embodiment, the plasma generating device 100 is provided with a shell 4, and a housing space 41 is formed in the shell 4 for integrating the first electrode 2, the second electrode 3, and the dielectric structure 1 into an integral structure, and can protect the first electrode 2, the second electrode 3, and the dielectric structure 1. In addition, an outlet 42 connected to the housing space 41 is provided on the shell 4, and the generated plasma can diffuse outward from the outlet 42, so that the plasma diffusion area of ​​the plasma generating device 100 can be controlled.

[0114] Among them, the outlet 42 on the shell 4 can be arranged opposite to the surface of the dielectric structure 1, or the outlet 42 can be located on the side of the dielectric structure 1, for example, it can be opened on the side of the shell 4 pointed to by the first extension section 21. In addition, an outlet 42 can be opened on the shell 4, and the end of the first extension section 21 extends in the direction close to the outlet 42, so that the plasma diffused to the end of the first extension section 21 can diffuse to the outlet 42 and diffuse outward; in some embodiments, two or more outlets 42 can also be opened, for example, two outlets 42 can be opened and arranged opposite to the first extension section 21 and the second electrode 3 on both sides of the dielectric structure 1, respectively. It can be understood that when part of the structure of the second electrode 3 is also exposed to the air, part of the plasma is also generated in the area of ​​the second electrode 3. The outlet 42 corresponding to the second electrode 3 is arranged to facilitate the diffusion of the plasma generated on one side of the second electrode 3, thereby improving the efficiency of the plasma discharge outward.

[0115] Combined with reference Figures 9 to 11 In some embodiments, the shell 4 includes a first half shell 43 and a second half shell 44 that are arranged opposite to each other. The first half shell 43 and the second half shell 44 can be opened and closed relative to each other to facilitate the disassembly and assembly of the first electrode 2, the second electrode 3, the dielectric structure 1 and other structures.

[0116] Please refer to Fig. 9 In one embodiment, one of the outlets 42 is disposed opposite to the surface of the dielectric structure 1, and the end of the first extension section 21 is exposed at the outlet 42. Such an arrangement is conducive to the discharge of plasma from the outlet 42, thereby improving the plasma discharge efficiency and improving the disinfection and purification effect of the plasma generating device 100.

[0117] Please refer to Fig. 9In one embodiment, the shell 4 is further provided with a flow guiding structure 49 , which extends from the edge of the outlet 42 to the outside of the shell 4 , and the end of the first extension section 21 is arranged toward the flow guiding structure 49 .

[0118] In this embodiment, a guide structure 49 is provided on the shell 4. The guide structure 49 is located at the front side of the end of the first extension section 21 and extends from the edge of the outlet 42 in a direction away from the shell 4. With such a configuration, when the plasma diffuses from the first extension section 21 to the end and continues to diffuse forward, it will be blocked by the guide structure 49, and then diffuse along the surface of the guide structure 49 in a direction away from the shell 4; wherein, the extension direction of the guide structure 49 may be consistent with the axial direction of the outlet 42, or may be inclined relative to the axial direction of the outlet 42, which is not limited here. The configuration of the guide structure 49 further adjusts the diffusion direction of the plasma, which can make the application of the plasma generating device 100 more flexible.

[0119] In one embodiment, the second electrode 3 is not completely covered by the dielectric structure 1, and part of the structure is directly exposed to the air. In this case, at least two outlets 42 can be opened in the shell 4, wherein the two outlets 42 are respectively located on both sides of the dielectric structure 1, and are respectively arranged opposite to the first electrode 2 and the second electrode 3; thereby, plasma can be generated at both the first electrode 2 and the second electrode 3 and discharged outward from the outlets 42 on both sides of the shell 4, thereby improving the plasma generation efficiency and utilization efficiency.

[0120] In one embodiment, a first mounting groove 45 is disposed on the inner surface of the housing 4 , and at least a portion of the first extension section 21 is disposed in the first mounting groove 45 .

[0121] In this embodiment, a first mounting groove 45 can be provided on the inner surface of the shell 4 for mounting the first extension section 21 to limit the first extension section 21 and improve the stability of the mounting position of the first extension section 21, thereby accurately controlling the plasma generation and diffusion area.

[0122] In one embodiment, a first limiting groove 47 is provided on the inner surface of the shell 4, and a first limiting segment 23 is protrudingly provided on the side of the first extension segment 21, and the first limiting segment 23 is provided in the first limiting groove 47; in this embodiment, a first limiting segment 23 can be provided on the first electrode 2, and the first limiting segment 23 can be protruding on the surface of the first extension segment 21, and can also be protruding on the side of the first extension segment 21. At the same time, a first limiting groove 47 for limiting the installation of the first limiting segment 23 is provided on the inner surface of the shell 4, thereby improving the bonding strength between the first electrode 2 and the shell 4, and can limit the first electrode 2, thereby improving the stability of the installation position of the first extension segment 21, thereby accurately controlling the plasma generation and diffusion area.

[0123] In some embodiments, part of the first electrode 2 extends to the outside of the shell 4 to form a first power connection section 22; that is, the first electrode 2 is inserted into the shell 4, and the part of the first electrode 2 located outside the shell 4 forms the first power connection section 22, which is used to connect an external power supply to apply voltage to the first electrode 2; with such a configuration, when the plasma generating device 100 is used, there is no need to disassemble the shell 4 and then connect the first electrode 2 and the external power supply. When the plasma generating device 100 needs to be disassembled, the connection between the first electrode 2 and the external power supply can also be directly disconnected outside the shell 4, thereby improving the convenience of using the plasma generating device 100.

[0124] In one embodiment, the dielectric structure 1 is a planar dielectric structure, and part of the second electrode 3 is arranged opposite to the planar dielectric structure, and can be arranged on the surface of the planar dielectric structure, or can be arranged in parallel with the planar dielectric structure. Based on this, a second mounting groove 46 can be arranged on the inner surface of the housing 4, and at least part of the second electrode 3 is arranged in the second mounting groove 46; the position installation accuracy of the second electrode 3 can be improved to avoid the second electrode 3 from being offset.

[0125] In addition, part of the second electrode 3 can be configured as a second extension section 31, the second extension section 31 is arranged on the surface of the planar dielectric structure or is arranged in parallel with the planar dielectric structure, and the side of the second extension section 31 extends outward with a second limiting section 33, and a second limiting groove 48 is correspondingly arranged on the inner surface of the shell 4, so that the second limiting section 33 is limitedly installed in the second limiting groove 48, thereby improving the bonding strength between the second electrode 3 and the shell 4, avoiding the second electrode 3 from being offset and shaking in the shell 4, and improving the overall structural stability and performance stability of the plasma generating device 100. Among them, the second installation groove 46 and the second limiting groove 48 can be simultaneously arranged on the inner surface of the shell 4, the second extension section 31 is arranged in the second installation groove 46, and the second limiting section 33 is arranged in the second limiting groove 48, so that the position installation accuracy and stability of the second electrode 3 are better.

[0126] In some embodiments, the second electrode 3 is passed through the shell 4, and the portion of the second electrode 3 located outside the shell 4 forms a second power connection section 32 for connecting an external power source to apply voltage to the second electrode 3. With such a configuration, when the plasma generating device 100 is used, there is no need to disassemble the shell 4 and then connect the second electrode 3 and the external power source. When the plasma generating device 100 needs to be disassembled, the connection between the second electrode 3 and the external power source can also be directly disconnected outside the shell 4, thereby improving the convenience of using the plasma generating device 100.

[0127] In one embodiment, the first power connection section 22 and the second power connection section 32 extend in different directions. This arrangement avoids problems such as short circuits caused by too short a distance when the first power connection section 22 and the second power connection section 32 are arranged on the same side, thereby improving safety in use.

[0128] The present application also proposes an electrical device, which is provided with a plasma generator 100 as in any of the above embodiments. The specific structure of the plasma generator 100 refers to the above embodiments. Since the electrical device adopts all the technical solutions of all the above embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, which will not be repeated here. Among them, the electrical device can be but not limited to air conditioners, air purifiers, and floor scrubbers. The plasma generated by the plasma generator 100 provided in the electrical device can reduce the toxic and harmful substances contained in the wind blown out by the air conditioner and the air purifier, and can also purify, sterilize and disinfect the water used for cleaning in the floor scrubber.

[0129] The above description is only an exemplary embodiment of the present invention, and does not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the technical concept of the present invention, or directly / indirectly applied in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A plasma generating device, characterized in that: The plasma generating device comprises a dielectric structure, a first electrode and a second electrode. The dielectric structure covers the second electrode. Part of the dielectric structure is configured as a planar dielectric layer. The first electrode is disposed on a side of the planar dielectric layer away from the second electrode.

2. A plasma generating device, characterized in that: A device comprising a dielectric structure, a first electrode and a second electrode, wherein at least a portion of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode overlap with the orthographic projection of the dielectric structure, and the maximum circumscribed circle diameter of the overlapped area is L; A first creepage distance D is defined between the first electrode and the second electrode. min and the second creepage distance is D max , the radius R of the maximum inscribed circle when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

3. The plasma generating device according to claim 2, characterized in that: A second creepage distance D between the first electrode and the second electrode max ≥3D min .

4. The plasma generating device according to claim 2, characterized in that: The dielectric structure is a planar dielectric structure; Alternatively, the dielectric structure is coated on the second electrode, and a surface of the second electrode facing away from the first electrode is at least partially exposed outside the dielectric structure.

5. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least one of the first electrode and the second electrode is disposed on a surface of a portion of the dielectric structure between the first electrode and the second electrode; And / or, at least one of the first electrode and the second electrode is spaced apart from a portion of the dielectric structure between the first electrode and the second electrode.

6. The plasma generating device according to any one of claims 1 to 4, characterized in that: The distance between the first electrode and the second electrode is H, the thickness of the portion of the dielectric structure between the first electrode and the second electrode is d, and 0≤Hd≤5mm is satisfied; And / or, a thickness d≤2 mm of a portion of the dielectric structure located between the first electrode and the second electrode.

7. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the first electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure; Or, the first electrode is a conductive film; Or, the first electrode is a conductive coating provided on the surface of the dielectric structure; Alternatively, the plasma generating device further comprises a first carrier disposed opposite to the dielectric structure, and the first electrode is a conductive coating disposed on a surface of the first carrier; Alternatively, the first electrode is a wire.

8. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the second electrode disposed opposite to the dielectric structure is a sheet-shaped electrode structure; Or, at least a portion of the second electrode disposed opposite to the dielectric structure is a conductive film; Or, at least part of the second electrode is a conductive coating disposed on the surface of the dielectric structure; Alternatively, the plasma generating device further comprises a second carrier disposed opposite to the dielectric structure, and at least a portion of the second electrode is a conductive coating disposed on a surface of the second carrier.

9. The plasma generating device according to any one of claims 1 to 4, characterized in that: The dielectric structure includes an insulating sheet; and / or, the dielectric structure comprises at least one insulating coating layer; And / or, the material of the dielectric structure is at least one of ceramic, quartz and polytetrafluoroethylene.

10. The plasma generating device according to any one of claims 1 to 4, characterized in that: At least a portion of the first electrode is configured as a first extension segment, and the first extension segment is disposed on the surface of the dielectric structure or is spaced apart and parallel to the dielectric structure.

11. The plasma generating device according to claim 10, characterized in that: The plasma generating device further comprises a shell, wherein a placement space is formed in the shell, and at least one outlet communicating with the placement space is opened; The dielectric structure, at least a portion of the first electrode, and at least a portion of the second electrode are disposed in the placement space, and the first extension section is extended toward one of the outlets.

12. The plasma generating device according to claim 11, characterized in that: One of the outlets is disposed opposite to the surface of the dielectric structure, and an end of the first extension section is exposed at the outlet.

13. The plasma generating device according to claim 12, characterized in that: The shell is further provided with a flow guiding structure, and the flow guiding structure extends from the edge of the outlet to the outside of the shell, and the end of the first extension section is arranged toward the flow guiding structure.

14. The plasma generating device according to claim 11, characterized in that: The inner surface of the housing is provided with a first mounting groove, and at least a portion of the first extension section is arranged in the first mounting groove; And / or, a first limiting groove is provided on the inner surface of the shell, a first limiting section is protruding from the side of the first extension section, and the first limiting section is arranged in the first limiting groove; And / or, part of the first electrode extends to the outside of the shell to form a first power connection section.

15. A plasma generating device, characterized in that: It comprises a dielectric structure, a first electrode and a second electrode, at least a part of the dielectric structure is configured as a planar dielectric layer, and the first electrode and the second electrode are respectively arranged on two sides of the planar dielectric layer; The distance between the first electrode and the second electrode along the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d, satisfying 0≤Hd≤5mm.

16. The plasma generating device according to claim 15, characterized in that: The thickness d of the planar dielectric layer is ≤ 2 mm.

17. An electrical device, characterized in that: The electrical equipment is provided with a plasma generating device as described in any one of claims 1 to 16.

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