A display panel and a method for manufacturing the same

Abstract

The present invention discloses a display panel and a method for manufacturing the same. The display panel includes: a driving substrate; a plurality of first electrodes and a plurality of pixel defining structures, located on one side of the driving substrate; the pixel defining structure is located between two adjacent first electrodes and covers part of the first electrode; a light-emitting layer, located on the side of the first electrode and the pixel defining structure away from the driving substrate and covers the first electrode and the pixel defining structure; a second electrode layer, located on the side of the light-emitting layer away from the driving substrate and covers the light-emitting layer; the second electrode layer includes a first section, a second section and a third section; along the thickness direction of the display panel, there is a height difference between the first section and the third section, and the thickness of the second section is less than the thickness of the first section or the third section; a second electrode conductive layer, located on the side of the second electrode layer away from the driving substrate; along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least part of the second section. The present invention can improve the uniformity of the brightness of the display panel.

Description

Technical Field

[0001] The present invention relates to the technical field of display panels, and in particular to a display panel and a method for preparing the same. Background Art

[0002] As the demand for VR and AR markets expands, the demand for resolution, brightness, and color gamut of display panels is getting higher and higher. To meet the above increasing demands, the anodes of existing display panels will adopt a graphical solution, and the anode size and the distance between two adjacent anodes will become smaller and smaller;

[0003] However, the smaller anode size and spacing will cause the subsequent light-emitting layer generated by the coating process to be distorted. The cathode layer is a common conductive layer, and its distortion will increase the lateral resistance between pixels, resulting in bright edge pixels and dark middle areas due to voltage drop, which ultimately leads to uneven brightness of the display panel. Summary of the invention

[0004] The present invention provides a display panel and a manufacturing method thereof, so as to solve the problem of uneven brightness of the existing display panel.

[0005] In a first aspect, an embodiment of the present invention provides a display panel, including:

[0006] Driver substrate;

[0007] A plurality of first electrodes and a plurality of pixel defining structures are located on one side of the driving substrate; the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes;

[0008] a light-emitting layer, located on a side of the first electrode and the pixel defining structure away from the driving substrate and covering the first electrode and the pixel defining structure;

[0009] a second electrode layer, located on a side of the light-emitting layer away from the driving substrate and covering the light-emitting layer; the second electrode layer includes a first subsection, a second subsection and a third subsection; along the thickness direction of the display panel, the first subsection overlaps with the first electrode, the third subsection overlaps with the pixel defining structure, and the second subsection connects the first subsection and the third subsection; along the thickness direction of the display panel, there is a height difference between the first subsection and the third subsection, and the thickness of the second subsection is less than the thickness of the first subsection or the third subsection;

[0010] The second electrode conductive layer is located at a side of the second electrode layer away from the driving substrate; along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

[0011] Optionally, the resistivity of the second electrode conductive layer is P1, and the resistivity of the second electrode layer is P2;

[0012] Among them, P1≤10×P2.

[0013] Optionally, the thickness of the second electrode conductive layer is smaller than the thickness of the first section or the third section.

[0014] Optionally, the second electrode conductive layer includes a plurality of conductive rings, and the conductive rings surround at least a portion of the first section.

[0015] In a second aspect, an embodiment of the present invention provides a method for manufacturing a display panel, comprising:

[0016] preparing a driving substrate;

[0017] Preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes;

[0018] A light-emitting layer is prepared on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure;

[0019] A second electrode layer is prepared on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first subsection, a second subsection and a third subsection, along the thickness direction of the display panel, the first subsection overlaps with the first electrode, the third subsection overlaps with the pixel defining structure, and the second subsection connects the first subsection and the third subsection; along the thickness direction of the display panel, there is a height difference between the first subsection and the third subsection, and the thickness of the second subsection is less than the thickness of the first subsection or the third subsection;

[0020] A second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate, wherein along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

[0021] Optionally, preparing a second electrode conductive layer on a side of the second electrode layer away from the driving substrate includes:

[0022] The second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a method of selected atomic vapor deposition or selected chemical vapor deposition.

[0023] Optionally, the second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a method of selected area atomic vapor deposition, comprising:

[0024] Placing the driving substrate, the first electrode, the pixel defining structure, the light emitting layer and the second electrode layer in a vacuum cavity;

[0025] Introducing a reactive precursor into the vacuum chamber to form a reactive precursor layer on a surface of the second electrode layer that is away from the driving substrate;

[0026] Patterning the reactive precursor layer to remove the reactive precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate;

[0027] A reactant precursor is introduced into the vacuum chamber, part of the reactant precursor reacts with the reactive precursor layer located on the side of the second subsection away from the driving substrate to generate the second electrode conductive layer, and part of the reactant precursor forms a reactant precursor layer on the side of the first subsection and the third subsection away from the driving substrate;

[0028] The reactant precursor layer is patterned to remove the reactant precursor layer located at a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0029] Optionally, patterning the reactive precursor layer to remove the reactive precursor layer located on a side of the first subsection and the third subsection away from the driving substrate comprises:

[0030] The reactive precursor layer is patterned by a plasma treatment process to remove the reactive precursor layer located at a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0031] Optionally, patterning the reactant precursor layer to remove the reactant precursor layer located on a side of the first subsection and the third subsection away from the driving substrate comprises:

[0032] The reactant precursor layer is patterned by a plasma treatment process to remove the reactant precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0033] Optionally, the second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a selective chemical vapor deposition method, comprising:

[0034] Placing the driving substrate, the first electrode, the pixel defining structure, the light emitting layer and the second electrode layer in a vacuum cavity;

[0035] A reactive precursor and a reactant precursor are introduced into the vacuum chamber, and the reactive precursor and the reactant precursor react on a surface of the second electrode layer away from the driving substrate to form the second electrode conductive layer that contacts and covers the second electrode layer;

[0036] The second electrode conductive layer is patterned to remove the second electrode conductive layer located on a side of the first section and the third section away from the driving substrate.

[0037] The technical solution of the embodiment of the present invention, by setting a second electrode conductive layer on the side of the second portion of the second electrode layer away from the driving substrate, can reduce the lateral resistance of the second electrode layer at its distortion point (i.e., the second portion), reduce the voltage drop of the lateral conduction of the second electrode layer, and thus help improve the uniformity of the brightness of the display panel.

[0038] It should be understood that the contents described in this section are not intended to identify the key or important features of the embodiments of the present invention, nor are they intended to limit the scope of the present invention. Other features of the present invention will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0040] Figure 1 A schematic cross-sectional structure diagram of a display panel provided by an embodiment of the present invention;

[0041] Figure 2 A schematic cross-sectional structure diagram of another display panel provided by an embodiment of the present invention;

[0042] Figure 3 A schematic diagram of a top view structure of a display panel provided by an embodiment of the present invention;

[0043] Figure 4 A flow chart of a method for manufacturing a display panel provided by an embodiment of the present invention;

[0044] Figure 5 A flow chart of another method for preparing a display panel provided by an embodiment of the present invention;

[0045] Figure 6 A flow chart of another method for manufacturing a display panel provided by an embodiment of the present invention;

[0046] Figure 7A schematic diagram of a preparation process of a second electrode conductive layer provided in an embodiment of the present invention;

[0047] Figure 8 A flow chart of another method for manufacturing a display panel provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0048] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0049] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices. The orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", etc. is based on the orientation or positional relationship shown in the drawings, and is only used to illustrate the relative positional relationship between the components or components, and does not particularly limit the specific installation orientation of the components or components.

[0050] Figure 1 A schematic cross-sectional structure diagram of a display panel provided by an embodiment of the present invention, Figure 2 A schematic cross-sectional structure diagram of another display panel provided by an embodiment of the present invention, referring to Figure 1 and Figure 2The display panel in the embodiment of the present invention includes a driving substrate 10, a plurality of first electrodes 20, a plurality of pixel defining structures 30, a light-emitting layer 40, a second electrode layer 50 and a second electrode conductive layer 60. The plurality of first electrodes 20 and the plurality of pixel defining structures 30 are located on one side of the driving substrate 10. The pixel defining structure 30 is located between two adjacent first electrodes 20 and covers part of the first electrode 20. The light-emitting layer 40 is located on a side of the first electrode 20 and the pixel defining structure 30 away from the driving substrate 10 and covers the first electrode 20 and the pixel defining structure 30. The second electrode layer 50 is located on a side of the light-emitting layer 40 away from the driving substrate 10 and covers the light-emitting layer 40. The second electrode layer 50 includes a first subdivision 51, a second subdivision 52 and a third subdivision 53. Along the thickness direction of the display panel, the first subdivision 51 overlaps with the first electrode 20, the third subdivision 53 overlaps with the pixel defining structure 30, and the second subdivision 52 connects the first subdivision 51 and the third subdivision 53. Along the thickness direction of the display panel, there is a height difference between the first subsection 51 and the third subsection 53, and the thickness of the second subsection 52 is less than that of the first subsection 51 or the third subsection 53. The second electrode conductive layer 60 is located on a side of the second electrode layer 50 away from the driving substrate 10. Along the thickness direction of the display panel, the second electrode conductive layer 60 contacts and covers at least a portion of the second subsection 52.

[0051] It can be understood that the driving substrate 10 includes a pixel circuit, which is electrically connected to the plurality of first electrodes 20 and the second electrode layer 50, respectively, and is used to provide a first voltage to the first electrode 20 and a second voltage to the second electrode layer 50. It should be noted that the first electrode 20 can be an anode, which can absorb holes of electrons, and a hole transport layer is provided between the first electrode 20 and the light-emitting layer 40, and the hole transport layer can transfer holes from the first electrode 20 to the light-emitting layer 40. The second electrode layer 50 can be a cathode, which can generate electrons under the action of the second voltage, and an electron transport layer is provided between the second electrode layer 50 and the light-emitting layer 40, and the electron transport layer can transfer electrons from the second electrode layer 50 to the light-emitting layer 40. The electrons and holes in the light-emitting layer 40 can release photons under the action of the electric field formed by the first voltage and the second voltage, thereby generating visible light.

[0052] Exemplary, reference Figure 1, along the thickness direction of the display panel, the thickness of the pixel defining structure 30 located between two adjacent first electrodes 20 and contacting the drive substrate 10 in the embodiment of the present invention is less than the thickness of the first electrode 20, so along the thickness direction of the display panel, the height of the first subdivision 51 overlapping with the first electrode 20 is greater than the height of the surface of the third subdivision 53 overlapping with the pixel defining structure 30. The height step difference between the first subdivision 51 and the third subdivision 53 will cause the second subdivision 52 connecting the first subdivision 51 and the third subdivision 53 to be distorted, that is, along the direction from the first subdivision 51 to the third subdivision 53, the height of the second subdivision 52 will first gradually decrease and then gradually increase, thereby forming a pit, and the existence of the pit will increase the resistance of the second subdivision 52. The height step difference between the first subdivision 51 and the third subdivision 53 will also cause the thickness of the second subdivision 52 connecting the first subdivision 51 and the third subdivision 53 to be less than the thickness of the first subdivision 51 or the third subdivision 53, which will also increase the resistance of the second subdivision 52. The increase in resistance of the second section 52 will lead to an increase in the lateral voltage drop of the second electrode layer 50, that is, the voltage applied to the second electrode layer 50 will decrease faster from its edge to its middle, which will cause the display panel to have a brightness difference of dark in the middle and bright at the edges, making the brightness of the display panel obviously uneven.

[0053] refer to Figure 2 , along the thickness direction of the display panel, the thickness of the pixel defining structure 30 located between two adjacent first electrodes 20 and contacting the drive substrate 10 in the embodiment of the present invention is greater than the thickness of the first electrode 20, so along the thickness direction of the display panel, the height of the first subdivision 51 overlapping with the first electrode 20 is less than the height of the surface of the third subdivision 531 overlapping with the pixel defining structure 30. The height step difference between the first subdivision 51 and the third subdivision 53 will cause the second subdivision 52 connecting the first subdivision 51 and the third subdivision 53 to be distorted, that is, along the direction from the first subdivision 51 to the third subdivision 53, the height of the second subdivision 52 will gradually increase, thereby forming a climbing slope, and the existence of the climbing slope will increase the resistance of the second subdivision 52. The height step difference between the first subdivision 51 and the third subdivision 53 will also cause the thickness of the second subdivision 52 connecting the first subdivision 51 and the third subdivision 53 to be less than the thickness of the first subdivision 51 or the third subdivision 53, which will also increase the resistance of the second subdivision 52. The increase in resistance of the second section will lead to an increase in the lateral voltage drop of the second electrode layer, that is, the voltage applied to the second electrode layer will decrease faster from its edge to its middle, which will cause the display panel to have a brightness difference of dark in the middle and bright at the edges, making the brightness of the display panel obviously uneven.

[0054] The embodiment of the present invention is as follows Figure 1 and Figure 2A second electrode conductive layer 60 is provided on the surface of the distorted second sub-portion 52, which can reduce the resistance at the second sub-portion 52 and the lateral voltage drop of the second electrode layer 50, thereby facilitating improving the uniformity of the brightness of the display panel.

[0055] It should be noted that the second electrode conductive layer 60 that contacts and covers at least a portion of the second sub-portion 52 is equivalent to a portion of the second electrode layer 50 .

[0056] As a feasible implementation, the resistivity of the second electrode conductive layer 60 is P1, and the resistivity of the second electrode layer is P2, wherein P1≤10×P2.

[0057] The distortion of the second subdivision 52 and the insufficient sidewall coverage of the coating technology of the second electrode layer 50 will lead to a reduction in the sidewall thickness of the second subdivision 52, which in turn leads to a lateral resistance of the second subdivision 52 being greater than the lateral resistance of the first subdivision 51 and the third subdivision 52. In order to reduce the lateral resistance at the second subdivision 52 after the second electrode conductive layer 60 is set as much as possible, reduce the lateral voltage drop of the second electrode layer 50, and improve the conductivity, it is preferred to set the resistivity of the second electrode conductive layer 60 to be less than the resistivity of the second electrode layer 50, and the thickness of the second electrode conductive layer 60 required to be set will be smaller. However, in practical applications, the resistivity of the second electrode conductive layer 60 can also be set to be greater than the resistivity of the second electrode layer 50, and the thickness of the second electrode conductive layer 60 required to be set will be larger. However, since the thickness of the second electrode conductive layer 60 is limited, the resistivity of the second electrode conductive layer 60 cannot be too large, and cannot be higher than 10 times the resistivity of the second electrode layer 50.

[0058] As a feasible implementation, the thickness of the second electrode conductive layer 60 is smaller than the thickness of the first sub-portion 51 or the third sub-portion 53 .

[0059] It is understandable that if the thickness of the second electrode conductive layer 60 is greater than the thickness of the first subdivision 51 or the third subdivision 53, the thickness of the second electrode conductive layer 60 and the second subdivision 52 will also be greater than the thickness of the first subdivision 51 or the third subdivision 53, which will cause a new distortion area to appear at the connection between the first subdivision 51 and the second electrode conductive layer 60 or at the connection between the second electrode conductive layer 60 and the third subdivision 53, thereby affecting the preparation of subsequent film layers. To avoid the above situation, it is necessary to set the thickness of the second electrode conductive layer 60 to be less than the thickness of the first subdivision 51 or the third subdivision 53.

[0060] As a feasible implementation method, Figure 3 A schematic diagram of a top view of a display panel provided by an embodiment of the present invention, referring to Figure 3 The second electrode conductive layer 60 includes a plurality of conductive rings 61 , and the conductive rings 61 surround at least a portion of the first section 51 .

[0061] For example, Figure 3 The conductive ring 61 shown surrounds the first subsection 51 .

[0062] Optionally, the second electrode conductive layer 60 includes at least one of a tungsten layer, a cobalt layer, a molybdenum layer, a ruthenium layer, a tin dioxide layer and a zinc oxide layer. 2 ) and zinc oxide (ZnO) have relatively high conductivity.

[0063] Figure 4 A flow chart of a method for manufacturing a display panel provided in an embodiment of the present invention. The method for manufacturing a display panel in an embodiment of the present invention includes:

[0064] S110, preparing a driving substrate.

[0065] S120, preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes.

[0066] Exemplary, reference Figure 1 and Figure 2 , a first electrode layer that covers the driving substrate 10 can be prepared on one side of the driving substrate 10 by a deposition or evaporation process, and then the first electrode layer is patterned to form a plurality of first electrodes 20 arranged in an array, and then a pixel defining layer is prepared on the first electrode 20 and the driving substrate 10 by a deposition or evaporation process, and finally the pixel defining layer is patterned to form a Figure 1 and Figure 2 A pixel defining structure 30 is shown.

[0067] S130, preparing a light-emitting layer on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure.

[0068] Exemplary, reference Figure 1 and Figure 2 A light emitting layer 40 that completely covers the first electrode 20 and the pixel defining structure 30 can be prepared on the side of the first electrode 20 and the pixel defining structure 30 away from the driving substrate 10 by a deposition or evaporation process.

[0069] S140, preparing a second electrode layer on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first subsection, a second subsection and a third subsection, along the thickness direction of the display panel, the first subsection overlaps with the first electrode, the third subsection overlaps with the pixel defining structure, and the second subsection connects the first subsection and the third subsection. Furthermore, along the thickness direction of the display panel, there is a height step difference between the first subsection and the third subsection, and the thickness of the second subsection is less than the thickness of the first subsection or the third subsection.

[0070] Exemplary, reference Figure 1 and Figure 2 The second electrode layer 50 can be prepared by deposition or evaporation on the side of the light emitting layer 40 away from the driving substrate 10. Specifically, the second electrode layer 50 includes a first subdivision 51 and a third subdivision 52 with a height difference, so as to connect the first subdivision 51 and the third subdivision 52, and the second subdivision 52 has a deformed area such as a pit or a slope.

[0071] S150, preparing a second electrode conductive layer on a side of the second electrode layer away from the driving substrate, wherein along a thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

[0072] For example, the second electrode conductive layer 60 that contacts and covers at least a portion of the second sub-portion 52 may be prepared on a side of the second electrode layer 50 away from the driving substrate 10 by a selective deposition process.

[0073] The embodiment of the present invention is as follows Figure 1 and Figure 2 A second electrode conductive layer 60 is provided on the surface of the distorted second sub-portion 52, which can reduce the resistance at the second sub-portion 52 and the lateral voltage drop of the second electrode layer 50, thereby facilitating improving the uniformity of the brightness of the display panel.

[0074] Based on the above embodiments, Figure 5 A flowchart of another method for manufacturing a display panel provided by an embodiment of the present invention, Figure 5 The embodiment shown in the figure describes in detail how to prepare the second electrode conductive layer on the side of the second electrode layer away from the driving substrate. Referring to 5, the method for preparing the display panel in the embodiment of the present invention includes:

[0075] S210, preparing a driving substrate.

[0076] S220, preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes.

[0077] S230, preparing a light-emitting layer on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure.

[0078] S240. Prepare a second electrode layer on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first section, a second section and a third section, and along the thickness direction of the display panel, the first section overlaps with the first electrode, the third section overlaps with the pixel defining structure, and the second section connects the first section and the third section.

[0079] S250, preparing a second electrode conductive layer on a side of the second electrode layer away from the driving substrate by using a method of selected atomic vapor deposition or selected chemical vapor deposition, wherein along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

[0080] Exemplary, reference Figure 1 and Figure 2 Selective deposition can be achieved by using selected atomic vapor deposition or selected chemical vapor deposition, and the second electrode conductive layer 60 that contacts and covers at least a portion of the second section 52 can be prepared on the side of the second electrode layer 50 away from the driving substrate 10 .

[0081] Based on the above embodiments, Figure 6 A flowchart of another method for manufacturing a display panel provided by an embodiment of the present invention, Figure 6 The embodiment shown in the figure describes in detail how to prepare the second electrode conductive layer on the side of the second electrode layer away from the driving substrate by using the method of selective atomic vapor deposition. Figure 6 , the method for preparing the display panel in the embodiment of the present invention includes:

[0082] S310, preparing a driving substrate.

[0083] S320, preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes.

[0084] S330, preparing a light-emitting layer on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure.

[0085] S340. Prepare a second electrode layer on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first section, a second section and a third section, and along the thickness direction of the display panel, the first section overlaps with the first electrode, the third section overlaps with the pixel defining structure, and the second section connects the first section and the third section.

[0086] S350, placing a driving substrate, a first electrode, a pixel defining structure, a light-emitting layer and a second electrode layer in a vacuum cavity.

[0087] It should be noted that steps S310 to S340 are performed in a vacuum chamber.

[0088] S360, introducing a reactive precursor into the vacuum chamber to form a reactive precursor layer on a surface of the second electrode layer that is away from the driving substrate.

[0089] Exemplary, reference Figure 1 and Figure 2 If the second electrode conductive layer 60 to be prepared is a tungsten layer, the reactive precursor 61 introduced may be tungsten hexafluoride (WF 6 ) or tungsten pentachloride (WCl 5 If the second electrode conductive layer 60 to be prepared is tin dioxide (SnO 2 ), the reactive precursor 61 introduced can be tetrakis(dimethylamino)tin(IV), namely TDMASn. If the second electrode conductive layer 60 to be prepared is zinc oxide (ZnO), the reactive precursor 61 introduced can be diethylzinc (DEZ). Figure 7 A schematic diagram of a preparation process of a second electrode conductive layer provided in an embodiment of the present invention, referring to Figure 7 As shown in FIG. 5( a ), a reactive precursor 61 is introduced into the vacuum chamber, and part of the reactive precursor 61 is deposited on the surface of the second electrode layer 50 away from the driving substrate to form a reactive precursor layer 61 that completely covers the second electrode layer 50 .

[0090] Optionally, after executing step S360, in order to prevent the excess reactive precursor in the vacuum chamber from affecting subsequent steps, the excess reactive precursor in the vacuum chamber may be removed by a purge or vacuuming process.

[0091] S370 , patterning the reactive precursor layer to remove the reactive precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0092] As a feasible implementation mode, patterning the reactive precursor layer to remove the reactive precursor layer located on the side of the first and third sections away from the driving substrate includes: patterning the reactive precursor layer using a plasma treatment process to remove the reactive precursor layer located on the side of the first and third sections away from the driving substrate.

[0093] Specifically, refer to Figure 7As shown in Figure (b), an inert gas 70 such as Ar or N2 can be used to implement the above-mentioned plasma treatment process. In the process of preparing the display panel, the display panel will be placed on a substrate that can be energized. By adjusting the voltage applied to the substrate, the size of the ion (such as Ar+) bombarding the reactive precursor layer can be adjusted. After the ion bombardment, the reactive precursor layer covering the first division 51 and the third division 53 will be desorbed, while the reactive precursor layer covering the second division 52 (i.e., the distorted part) will be retained due to the difference in the beam current and angle of the ion bombardment.

[0094] S380, introducing a reactant precursor into the vacuum chamber, part of the reactant precursor reacts with the reactive precursor layer located on the side of the second section away from the driving substrate to generate a second electrode conductive layer, and part of the reactant precursor forms a reactant precursor layer on the side of the first section and the third section away from the driving substrate.

[0095] Exemplary, reference Figure 1 and Figure 2 If the second electrode conductive layer 60 to be prepared is a tungsten layer, the reactant precursor 62 introduced may be hydrogen (H2) or diborane (B 2 H 6 If the second electrode conductive layer 60 to be prepared is tin dioxide (SnO 2 ), the reactant precursor 62 introduced may be water (H 2 Ozone (O 3 ) or hydrogen peroxide. If the second electrode conductive layer 60 to be prepared is zinc oxide (ZnO), the reactant precursor 62 introduced can be water (H 2 Ozone (O 3 ) or hydrogen peroxide. Figure 7 As shown in Figure (c), a reactant precursor 62 is introduced into the vacuum chamber, and part of the reactant precursor 62 will be deposited on the surface of the first section 51 and the third section 53 on the side away from the driving substrate to form a reactant precursor layer, while part of the reactant precursor 62 will react with the reactive precursor layer located on the side of the second section 52 away from the driving substrate 10 to form a second electrode conductive layer 60.

[0096] Optionally, after executing step S380, in order to prevent the excess reactant precursor in the vacuum chamber from affecting subsequent steps, the excess reactant precursor in the vacuum chamber may be removed through a purge or vacuuming process.

[0097] S390 , patterning the reactant precursor layer to remove the reactant precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0098] As a feasible implementation, patterning the reactant precursor layer to remove the reactant precursor layer located on the side of the first and third sections away from the driving substrate includes: patterning the reactant precursor layer using a plasma treatment process to remove the reactant precursor layer located on the side of the first and third sections away from the driving substrate.

[0099] Specifically, refer to Figure 7 As shown in Figure (d), an inert gas 70 such as Ar or N2 can be used to implement the above-mentioned plasma treatment process. In the process of preparing the display panel, the display panel will be placed on a substrate that can be energized. By adjusting the voltage applied to the substrate, the size of the ion (such as Ar+) bombarding the reactant precursor layer can be adjusted. After the ion bombardment, the reactant precursor layer covering the first division 51 and the third division 53 is desorbed, and the second electrode conductive layer 60 formed in the second division 52 (i.e., the distorted part) will be retained due to the difference in the beam and angle of the ion bombardment.

[0100] By looping the above steps S360-S390, the following can be formed: Figure 1 or Figure 2 The second electrode conductive layer 60 shown has a preset thickness.

[0101] By adopting the above-mentioned selective deposition technology, i.e. the above-mentioned atomic vapor deposition method, the second electrode conductive layer 60 is deposited only in the second subdivision 52 (distorted part), and the second electrode conductive layer 60 cannot be deposited in the light-emitting area only (i.e. the area where the first electrode 20, the light-emitting layer 40 and the second electrode layer 50 overlap, and do not overlap with the pixel defining structure 30), thereby maintaining the light extraction efficiency of the display panel. At the same time, the equipment used for the selective deposition can be directly connected to the evaporation equipment that performs steps S310-S340. After the second electrode layer 50 is evaporated or sputtered, it directly enters the selective deposition equipment for selective coating. After the preparation of the selected film layer is completed, it directly enters the subsequent packaging process, etc. The whole process does not need to break the vacuum, can be compatible with the existing production line, and does not damage the film layer structure.

[0102] Based on the above embodiments, Figure 8 A flowchart of another method for manufacturing a display panel provided by an embodiment of the present invention, Figure 8 The embodiment shown in the figure describes in detail how to prepare the second electrode conductive layer on the side of the second electrode layer away from the driving substrate by using the chemical vapor deposition method. Figure 8 , the method for preparing the display panel in the embodiment of the present invention includes:

[0103] S410, preparing a driving substrate.

[0104] S420, preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes.

[0105] S430, preparing a light-emitting layer on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure.

[0106] S440. Prepare a second electrode layer on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first section, a second section and a third section, and along the thickness direction of the display panel, the first section overlaps with the first electrode, the third section overlaps with the pixel defining structure, and the second section connects the first section and the third section.

[0107] S450, placing a driving substrate, a first electrode, a pixel defining structure, a light-emitting layer, and a second electrode layer in a vacuum cavity.

[0108] S460, introducing a reactive precursor and a reactant precursor into the vacuum chamber, the reactive precursor and the reactant precursor react on a surface of the second electrode layer away from the driving substrate to form a second electrode conductive layer that contacts and covers the second electrode layer.

[0109] S470 , patterning the second electrode conductive layer to remove the second electrode conductive layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate.

[0110] Exemplary, reference Figure 1 and Figure 2 In the embodiment of the present invention, a reactive precursor and a reactant precursor that can react to form a second electrode conductive layer 60 are introduced into a vacuum chamber to form a second electrode conductive layer 60 that covers the second electrode layer 50. Then, the second electrode conductive layer 60 located on the side of the first sub-portion 51 and the third sub-portion 53 away from the driving substrate 10 is etched away by a patterning method, so as to obtain a Figure 1 or Figure 2The second electrode conductive layer 60 shown is only located in the second subdivision 52 (i.e., the deformed part). Specifically, while the reactive precursor and the reactant precursor are introduced for chemical reaction coating, a diluent inert gas such as Ar, N2, etc. can be added, and a bias voltage can be applied to the energized substrate on which the display panel is placed, so that ions (such as Ar+) can be guided to bombard the second electrode conductive layer 60 formed on the first subdivision 51 and the third subdivision 53, and then the second electrode conductive layer 60 on the first subdivision 51 and the third subdivision 53 is etched away, while the second electrode conductive layer 60 on the second subdivision 52 grows on the deformed area such as the side wall, and can be retained because it is bombarded by less high-energy ions vertically downward, and the continuous growth of the film layer is achieved, and finally the second electrode conductive layer 60 that meets the preset thickness is formed.

[0111] Compared with the solution of adopting steps S350-S390, that is, adopting the method of atomic vapor deposition to prepare the second electrode conductive layer, the solution of steps S450-S370 adopted in the embodiment of the present invention has fewer steps and higher efficiency.

[0112] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A display panel, characterized in that: include: Driver substrate; A plurality of first electrodes and a plurality of pixel defining structures are located on one side of the driving substrate; The pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes; a light-emitting layer, located on a side of the first electrode and the pixel defining structure away from the driving substrate and covering the first electrode and the pixel defining structure; a second electrode layer, located on a side of the light-emitting layer away from the driving substrate and covering the light-emitting layer; the second electrode layer includes a first subsection, a second subsection and a third subsection; along the thickness direction of the display panel, the first subsection overlaps with the first electrode, the third subsection overlaps with the pixel defining structure, and the second subsection connects the first subsection and the third subsection; along the thickness direction of the display panel, there is a height difference between the first subsection and the third subsection, and the thickness of the second subsection is less than the thickness of the first subsection or the third subsection; The second electrode conductive layer is located at a side of the second electrode layer away from the driving substrate; along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

2. The display panel according to claim 1, characterized in that: The resistivity of the second electrode conductive layer is P1, and the resistivity of the second electrode layer is P2; Among them, P1≤10×P2.

3. The display panel according to claim 1, characterized in that: The thickness of the second electrode conductive layer is smaller than the thickness of the first section or the third section.

4. The display panel according to claim 1, characterized in that: The second electrode conductive layer includes a plurality of conductive rings, and the conductive rings surround at least a portion of the first section.

5. A method for preparing a display panel, characterized in that: include: preparing a driving substrate; Preparing a plurality of first electrodes and a plurality of pixel defining structures on one side of the driving substrate, wherein the pixel defining structure is located between two adjacent first electrodes and covers a portion of the first electrodes; A light-emitting layer is prepared on a side of the first electrode and the pixel defining structure away from the driving substrate, wherein the light-emitting layer covers the first electrode and the pixel defining structure; A second electrode layer is prepared on a side of the light-emitting layer away from the driving substrate, wherein the second electrode layer covers the light-emitting layer and includes a first subsection, a second subsection and a third subsection, along the thickness direction of the display panel, the first subsection overlaps with the first electrode, the third subsection overlaps with the pixel defining structure, and the second subsection connects the first subsection and the third subsection; along the thickness direction of the display panel, there is a height difference between the first subsection and the third subsection, and the thickness of the second subsection is less than the thickness of the first subsection or the third subsection; A second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate, wherein along the thickness direction of the display panel, the second electrode conductive layer contacts and covers at least a portion of the second section.

6. The preparation method according to claim 5, characterized in that: A second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate, comprising: The second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a method of selected atomic vapor deposition or selected chemical vapor deposition.

7. The preparation method according to claim 6, characterized in that: The second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a method of selected area atomic vapor deposition, comprising: Placing the driving substrate, the first electrode, the pixel defining structure, the light emitting layer and the second electrode layer in a vacuum cavity; Introducing a reactive precursor into the vacuum chamber to form a reactive precursor layer on a surface of the second electrode layer that is away from the driving substrate; Patterning the reactive precursor layer to remove the reactive precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate; A reactant precursor is introduced into the vacuum chamber, part of the reactant precursor reacts with the reactive precursor layer located on the side of the second subsection away from the driving substrate to generate the second electrode conductive layer, and part of the reactant precursor forms a reactant precursor layer on the side of the first subsection and the third subsection away from the driving substrate; The reactant precursor layer is patterned to remove the reactant precursor layer located at a side of the first sub-portion and the third sub-portion away from the driving substrate.

8. The preparation method according to claim 7, characterized in that: Patterning the reactive precursor layer to remove the reactive precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate comprises: The reactive precursor layer is patterned by a plasma treatment process to remove the reactive precursor layer located at a side of the first sub-portion and the third sub-portion away from the driving substrate.

9. The preparation method according to claim 7, characterized in that: Patterning the reactant precursor layer to remove the reactant precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate comprises: The reactant precursor layer is patterned by a plasma treatment process to remove the reactant precursor layer located on a side of the first sub-portion and the third sub-portion away from the driving substrate.

10. The preparation method according to claim 6, characterized in that: The second electrode conductive layer is prepared on a side of the second electrode layer away from the driving substrate by using a selective area chemical vapor deposition method, comprising: Placing the driving substrate, the first electrode, the pixel defining structure, the light emitting layer and the second electrode layer in a vacuum cavity; A reactive precursor and a reactant precursor are introduced into the vacuum chamber, and the reactive precursor and the reactant precursor react on a surface of the second electrode layer away from the driving substrate to form the second electrode conductive layer that contacts and covers the second electrode layer; The second electrode conductive layer is patterned to remove the second electrode conductive layer located on a side of the first section and the third section away from the driving substrate.

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