Method for manufacturing laminate and apparatus for manufacturing laminate

Abstract

A method for producing a laminate, the method comprising: a bonding step for bonding a laminate film, which has a base film and an inorganic layer laminated on the base film, to a substrate; and a cutting step in which the laminated film is cut in accordance with the shape of the substrate, and in the cutting step, the laminated film is cut by heating a cutting tool to a temperature at least 65 DEG C lower than the softening point temperature of the base film.

Description

Technical Field

[0001] The present invention relates to a method for producing a laminate and an apparatus for producing a laminate. This application claims priority over the contents described in Japanese Patent Application No. 2022-165181 filed in Japan on October 14, 2022. Background Art

[0002] Anti-reflection films are used in various applications. For example, anti-reflection films are bonded to display glass of vehicle-mounted liquid crystal panels. After bonding the anti-reflection film to a substrate such as glass, the anti-reflection film is cut into a desired shape.

[0003] For example, Patent Document 1 describes that by heating a film to be cut to a temperature close to its glass transition temperature and then cutting it, it is possible to suppress the occurrence of cracks and defects on the cut surface of the film.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent Application Publication No. 2004-174664 Summary of the invention

[0007] Problems to be solved by the invention

[0008] Regarding the method described in patent document 1, when the size of the substrate becomes larger, the equipment for heating the film becomes large and the cost is high. In addition, when the film is heated, deformation and shrinkage of the film may occur, making it difficult to cut the film with high precision. In addition, the adhesive layer that adheres the film to the substrate sometimes foams due to heating. This foaming sometimes causes the poor condition of lamination and damages the aesthetics of the product after lamination.

[0009] The present disclosure has been made in view of the above-mentioned problems, and aims to provide a method for manufacturing a laminated body and an apparatus for manufacturing a laminated body that can suppress the generation of cracks during cutting.

[0010] Solutions for solving problems

[0011] In order to solve the above problems, the present disclosure proposes the following solutions.

[0012] (1) The method for manufacturing a laminated body of the first scheme comprises: a bonding step of bonding a laminated film having a base film and an inorganic layer stacked on the base film to a substrate; and a cutting step of cutting the laminated film according to the shape of the substrate, wherein the cutting tool is heated to a temperature of 65°C or more lower than the softening point temperature of the base film to cut the laminated film.

[0013] (2) In the method for producing a laminated body according to the above aspect, the cutting tool may have a cutting blade.

[0014] (3) In the method for producing a laminated body of the above embodiment, the laminated film may include an adhesive layer, the base film, and the inorganic layer, and the inorganic layer may be formed by alternately stacking low refractive index layers and high refractive index layers having a higher refractive index than the low refractive index layers.

[0015] (4) In the method for producing a laminated body according to the above aspect, a bonding surface of the substrate to which the laminated film is bonded may be curved.

[0016] (5) The manufacturing device of the second scheme of the laminated body comprises: a bonding device for bonding a laminated film having a base film and an inorganic layer stacked on the base film to a substrate; and a cutting device for cutting the laminated film according to the shape of the substrate, the cutting device comprising: a heating mechanism for heating the cutting tool to a temperature higher than 65°C lower than the softening point temperature of the base film.

[0017] (6) In the manufacturing apparatus of the laminated body according to the above aspect, the cutting device may include: a thermometer for measuring the temperature of the cutting tool; and a control unit for moving the cutting tool along the outer periphery of the substrate.

[0018] Effects of the Invention

[0019] The method for producing a laminate and the apparatus for producing a laminate according to the present embodiment can suppress the occurrence of cracks during cutting. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a figure for demonstrating the bonding process in the manufacturing method of the laminated body of this embodiment.

[0021] Figure 2 It is a cross-sectional view of the laminated film according to the present embodiment.

[0022] Figure 3 It is a diagram for explaining the cutting step in the method for producing a laminated body according to the present embodiment.

[0023] Figure 4 This is a diagram showing the measurement of the upper surface of the laminated film after the laminated film of Example 1 was cut.

[0024] Figure 5 This is a diagram showing the measurement of the upper surface of the laminated film after the laminated film of Example 2 was cut.

[0025] Figure 6 This is a diagram showing the measurement of the upper surface of the laminated film after the laminated film of Comparative Example 1 was cut.

[0026] Figure 7 This is a diagram showing the measurement of the upper surface of the laminated film of Comparative Example 2 after the laminated film was cut.

[0027] Figure 8 1 and 2 are graphs showing the relationship between the temperature of the center portion and the cutting portion of the razor blades of the cutting tools of Example 1, Example 2, Comparative Example 1, and Comparative Example 2. DETAILED DESCRIPTION

[0028] Hereinafter, the present embodiment will be described in detail with reference to the accompanying drawings as appropriate. In the accompanying drawings used in the following description, in order to facilitate the understanding of the features of the present disclosure, the features are sometimes enlarged for convenience, and the size ratios of the components are sometimes different from the actual ones. The materials, sizes, etc. illustrated in the following description are examples, and the present disclosure is not limited thereto, and can be implemented with appropriate changes within the scope of achieving its effects.

[0029] "Method for producing a laminate"

[0030] The method for producing a laminated body according to the present embodiment includes a bonding step and a cutting step.

[0031] Figure 1 This is a diagram for explaining a bonding step in the method for producing a laminated body according to the present embodiment. In the bonding step, the laminated film 10 is bonded to the substrate 20 .

[0032] The substrate 20 is, for example, glass, plastic, etc. The bonding surface 21 of the substrate 20 to which the laminated film 10 is bonded may be flat or curved. When the bonding surface 21 is curved, the bonding surface 21 may be curved in one direction within the plane where the substrate 20 extends, or may be curved in multiple directions.

[0033] There is no particular limitation on the method for bonding the laminated film 10 to the substrate 20. For example, lamination processing, vacuum processing, etc. can be used.

[0034] The laminated film 10 is preferably, for example, slightly larger than the bonding surface 21 of the substrate 20. After the laminated film 10 is bonded to the substrate 20, an excess portion of the laminated film 10 is left around the substrate 20.

[0035] The laminated film 10 includes a base film and an inorganic layer laminated on the base film. Figure 2 It is a cross-sectional view of the laminated film 10 according to the present embodiment. Figure 2 The laminated film 10 shown has, for example, a release layer 1, an adhesive layer 2, a base film 3, a hard coat layer 4, an optical function layer 5, an antifouling layer 6, and a protective layer 7. The optical function layer 5 is an example of an inorganic layer.

[0036] The release layer 1 is a layer that protects the adhesive layer 2. The release layer 1 is peeled off at the time of lamination, and the adhesive layer 2 exposed by peeling off the release layer 1 is bonded to the substrate 20. The release layer 1 is, for example, paper or film coated with a release agent. The thickness of the release layer 1 is, for example, 70 μm or more and 80 μm or less.

[0037] The adhesive layer 2 is a layer bonded to the substrate 20. The adhesive layer 2 includes, for example, an acrylic adhesive, a silicone adhesive, or a urethane adhesive. The thickness of the adhesive layer 2 is, for example, 10 μm to 50 μm, preferably 20 μm to 30 μm.

[0038] The substrate film 3 is, for example, a plastic film. The constituent material of the plastic film is, for example, a polyester resin, an acetate resin, a polyethersulfone resin, a polycarbonate resin, a polyamide resin, a polyimide resin, a polyolefin resin, a (meth)acrylic resin, a polyvinyl chloride resin, a polyvinylidene chloride resin, a polystyrene resin, a polyvinyl alcohol resin, a polyarylate resin, or a polyphenylene sulfide resin.

[0039] The substrate film 3 is, for example, a polyester resin, an acetate resin, a polycarbonate resin, or a polyolefin resin. For example, a polyethylene terephthalate (PET) substrate or a triacetyl cellulose (TAC) substrate is preferably used as the substrate film 3 .

[0040] The thickness of the substrate film 3 is, for example, 60 μm or more. If the thickness of the substrate film 3 is thin, the bending of the film may cause cracks in the laminated film 10. The thickness of the substrate film 3 is, for example, 1 mm or less, preferably 500 μm or less, and more preferably 300 μm or less. If the thickness of the substrate film 3 is too thick, the transparency of the substrate film 3 is reduced, and the rigidity is increased, and it is easy to break.

[0041] One side of the substrate film 3 may be subjected to etching treatment and / or primer treatment such as sputtering, corona discharge, ultraviolet irradiation, electron beam irradiation, chemical conversion, oxidation, etc. By performing these treatments in advance, the adhesion of the hard coating layer 4 formed on the substrate film 3 is improved.

[0042] The hard coating layer 4 is formed on one side of the substrate film 3. The hard coating layer 4 is not particularly limited, and a known material can be used. The hard coating layer 4 can contain, for example, a binder resin and a filler. In addition, the hard coating layer 4 can also contain a leveling agent.

[0043] The binder resin is preferably transparent, and may be, for example, a resin that is cured by ultraviolet rays or electron beams, an ionizing radiation curable resin, a thermoplastic resin, a thermosetting resin, or the like.

[0044] An example of an ionizing radiation curable resin as a binder resin is ethyl (meth)acrylate, ethylhexyl (meth)acrylate, styrene, methylstyrene, N-vinylpyrrolidone, etc. In addition, the ionizing radiation curable resin may also be a compound having two or more unsaturated bonds. Ionizing radiation curable resins having two or more unsaturated bonds include, for example, trimethylolpropane tri(meth)acrylate, tripropylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, di(trimethylolpropane) tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate. The present invention relates to a binder resin comprising a plurality of functional compounds, such as trimethoxymethyl acrylate, tripentaerythritol octamethoxymethyl acrylate, tetrapentaerythritol decamethoxymethyl acrylate, isocyanuric acid trimethoxymethyl acrylate, isocyanuric acid dimethoxymethyl acrylate, polyester trimethoxymethyl acrylate, polyester dimethoxymethyl acrylate, bisphenol dimethoxymethyl acrylate, diglycerol tetramethoxymethyl acrylate, adamantyl dimethoxymethyl acrylate, isobornyl dimethoxymethyl acrylate, dicyclopentyl dimethoxymethyl acrylate, tricyclodecyl dimethoxymethyl acrylate, di(trimethylolpropane) tetramethoxymethyl acrylate, etc. Among them, pentaerythritol triacrylate (PETA), dipentaerythritol hexamethoxymethyl acrylate (DPHA) and pentaerythritol tetramethoxymethyl acrylate (PETTA) are particularly preferably used as binder resins. It should be noted that "(meth)acrylate" refers to methacrylate and acrylate. Furthermore, as the ionizing radiation curable resin, the above compounds may be modified with PO (propylene oxide), EO (ethylene oxide), CL (caprolactone), etc. The ionizing radiation curable resin is preferably an acrylic ultraviolet curable resin composition.

[0045] In addition, an example of a thermoplastic resin as a binder resin is a styrene resin, (meth) acrylic resin, vinyl acetate resin, vinyl ether resin, halogen-containing resin, alicyclic olefin resin, polycarbonate resin, polyester resin, polyamide resin, cellulose derivative, silicone resin, rubber or elastomer, etc. The above-mentioned thermoplastic resin is non-crystalline and soluble in an organic solvent (especially a common solvent that can dissolve a variety of polymers and curable compounds). In particular, from the viewpoint of transparency and weather resistance, the binder resin is preferably a styrene resin, (meth) acrylic resin, alicyclic olefin resin, polyester resin, cellulose derivative (cellulose esters, etc.), etc.

[0046] Thermosetting resins used as binder resins may be, for example, phenolic resins, urea resins, diallyl phthalate resins, melamine resins, guanamine resins, unsaturated polyester resins, polyurethane resins, epoxy resins, aminoalkyd resins, melamine-urea co-condensation resins, silicone resins, polysiloxane resins (including so-called cage-shaped, ladder-shaped, etc. silsesquioxanes, etc.), etc.

[0047] The hard coat layer 4 may include an organic resin and an inorganic material, or may be an organic-inorganic hybrid material. As an example, a material formed by a sol-gel method may be cited. As an inorganic material, for example, silicon dioxide, aluminum oxide, zirconium oxide, and titanium dioxide may be cited. As an organic material, for example, an acrylic resin may be cited.

[0048] The filler may be composed of an organic substance, an inorganic substance, or both. The filler contained in the hard coat layer 4 may be selected from various fillers according to the purpose of the laminated film 10 from the perspectives of anti-glare, adhesion with the optical functional layer 5 described later, and anti-blocking. Specifically, as the filler, for example, known fillers such as silica (Si oxide) particles, alumina particles, and organic microparticles may be used.

[0049] When the filler is silica particles and / or alumina particles, the average particle size of the filler is, for example, 800 nm or less, preferably 100 nm or less, more preferably 40 nm or more and 70 nm or less. When the filler is organic fine particles, the average particle size of the organic fine particles is, for example, 10 μm or less, preferably 5 μm or less, more preferably 3 μm or less.

[0050] The thickness of the hard coat layer 4 is preferably 0.5 μm or more, and more preferably 1 μm or more, for example. The thickness of the hard coat layer 4 is preferably 100 μm or less. The hard coat layer 4 may be composed of a single layer or a plurality of layers stacked together.

[0051] The optical function layer 5 is a layer that exhibits an optical function. The optical function refers to a function of controlling reflection, transmission, and refraction, which are properties of light, and examples thereof include an antireflection function, a selective reflection function, an antiglare function, and a lens function.

[0052] The optical functional layer 5 is, for example, a laminated film in which a high refractive index layer and a low refractive index layer are alternately laminated sequentially from the hard coat layer 4 side. The refractive index of the high refractive index layer is higher than that of the low refractive index layer. The refractive index of each high refractive index layer may be the same or different. The refractive index of each low refractive index layer may be the same or different.

[0053] The total number of stacked low refractive index layers and high refractive index layers in the optical functional layer 5 is not particularly limited. Figure 2As shown, the number of laminations of each layer can be 4 layers, can be less than 3 layers, and can be more than 5 layers. The total number of laminations of the low refractive index layer and the high refractive index layer in the optical functional layer 5 is preferably more than 4 layers and less than 10 layers, more preferably more than 4 layers and less than 6 layers, and most preferably 4 layers. When the number of laminations of the optical functional layer 5 is 4 layers, the number of laminations is small and the thickness is thin, so compared with the case where the number of laminations is more than 5 layers, the productivity is excellent.

[0054] The optical function layer 5 exhibits an antireflection function by causing interference of reflected light reflected at the interface of a laminated body formed by alternately laminating high refractive index layers and low refractive index layers and by diffusing light incident from the antifouling layer 6 side.

[0055] The total thickness of the optical function layer 5 is, for example, 20 nm to 1000 nm, or 50 nm to 600 nm.

[0056] Hereinafter, the optical functional layer 5 is described as an example in which a laminate of four layers, namely, a first high refractive index layer 5A, a first low refractive index layer 5B, a second high refractive index layer 5C, and a second low refractive index layer 5D, is sequentially stacked from the side close to the hard coat layer 4. The refractive indexes of the first high refractive index layer 5A and the second high refractive index layer 5C are respectively higher than those of the first low refractive index layer 5B and the second low refractive index layer 5D.

[0057] The refractive index of the first high refractive index layer 5A and the second high refractive index layer 5C is, for example, 2.00 to 2.60, or preferably 2.10 to 2.45. The refractive indexes of the first high refractive index layer 5A and the second high refractive index layer 5C may be the same or different.

[0058] As the material of the first high refractive index layer 5A and the second high refractive index layer 5C, for example, niobium pentoxide (Nb2O5, refractive index 2.33), titanium dioxide (TiO2, refractive index 2.33-2.55), tungsten oxide (WO3, refractive index 2.2), cerium oxide (CeO2, refractive index 2.2), tantalum pentoxide (Ta2O5, refractive index 2.16), zinc oxide (ZnO, refractive index 2.1), indium tin oxide (ITO, refractive index 2.06), zirconium oxide (ZrO2, refractive index 2.2), etc. The first high refractive index layer 5A and the second high refractive index layer 5C are preferably niobium pentoxide. The materials constituting the first high refractive index layer 5A and the second high refractive index layer 5C may be the same or different.

[0059] The refractive index of the first low refractive index layer 5B and the second low refractive index layer 5D is, for example, 1.20 to 1.60, or preferably 1.30 to 1.50. The refractive indexes of the first low refractive index layer 5B and the second low refractive index layer 5D may be the same or different.

[0060] The first low refractive index layer 5B and the second low refractive index layer 5D contain, for example, oxides of Si. The first low refractive index layer 5B and the second low refractive index layer 5D are, for example, layers with SiO2 (oxides of Si) as the main component. Oxides of Si are easy to obtain and cost-effective. The SiO2 monolayer film is colorless and transparent. In this embodiment, the main component refers to the component that accounts for more than 50% by mass of the components contained in the layer. The refractive indexes of the first low refractive index layer 5B and the second low refractive index layer 5D may be the same or different.

[0061] The first low refractive index layer 5B and the second low refractive index layer 5D may also contain other elements less than 50% by mass when the oxide of Si is used as the main component. The content of the element different from the oxide of Si is preferably less than 10%. Other elements are, for example, Na, Zr, Al, and N. Na can improve the durability of the first low refractive index layer 5B and the second low refractive index layer 5D. Zr, Al, and N can improve the hardness of the first low refractive index layer 5B and the second low refractive index layer 5D and improve their alkali resistance.

[0062] The antifouling layer 6 is in contact with the surface of the optical functional layer 5 opposite to the surface in contact with the hard coating layer 4. The antifouling layer 6 can prevent contamination of the optical functional layer 5. In addition, the antifouling layer 6 can suppress the loss of the optical functional layer 5 due to pen sliding when applied to a touch panel or the like.

[0063] The antifouling layer 6 is, for example, a fluorine-based organic compound. The fluorine-based organic compound is, for example, a compound containing a fluorine-modified organic group and a reactive silane group (e.g., alkoxysilane). Commercially available products that can be used in the antifouling layer 6 include Optool DSX (manufactured by Daikin Co., Ltd.) and KY-100 series (manufactured by Shin-Etsu Chemical Co., Ltd.).

[0064] The thickness of the antifouling layer 6 is, for example, 1 nm or more and 20 nm or less, preferably 3 nm or more and 10 nm or less. When the thickness of the antifouling layer 6 is 1 nm or more, when the laminate is applied to a touch panel, etc., the wear resistance can be fully ensured. In addition, when the thickness of the antifouling layer 6 is 20 nm or less, the time required for vapor deposition can be completed in a short time, and efficient manufacturing can be achieved.

[0065] If necessary, the antifouling layer 6 may contain additives such as a light stabilizer, an ultraviolet absorber, a colorant, an antistatic agent, a lubricant, a leveling agent, a defoaming agent, an antioxidant, a flame retardant, an infrared absorber, and a surfactant.

[0066] The protective layer 7 is a layer that protects the film during transportation and storage. Examples of the protective layer 7 include a protective layer having a base material of polypropylene, polyethylene, polyethylene terephthalate, etc. and having an adhesive layer having natural rubber, synthetic rubber, acrylic resin, etc. as a main component.

[0067] Figure 3 1 is a diagram for explaining a cutting process in the method for manufacturing a laminated body according to the present embodiment. In the cutting process, the laminated film 10 is cut according to the shape of the substrate 20. In the cutting process, a cutting tool 30 is used to cut the excess portion of the laminated film 10 that is left over from the bonding surface 21 of the substrate 20. The movement of the cutting tool 30 is controlled by the control unit 60. The cutting tool 30 has, for example, a cutting blade 31, and the cutting blade 31 is heated by a heating mechanism 40. The temperature of the cutting blade 31 can be measured by a thermometer 50.

[0068] The cutting step includes, for example, a first step of heating the cutting tool 30 and a second step of cutting the laminated film 10 using the heated cutting tool.

[0069] In the first step, the cutting tool 30 is heated. The cutting tool 30 is, for example, Figure 3 As shown, the cutting tool 30 may also have a cutting edge 31. The cutting edge 31 is, for example, a cutting edge, a razor blade, a knife, etc. When the cutting tool 30 having the cutting edge 31 is used, cracks are not easily generated on the cut surface of the laminated film 10. However, the cutting tool 30 is not limited to a tool having a cutting edge 31, and may also be a metal wire, etc.

[0070] In the first step, the cutting tool 30 is heated to a temperature 65°C lower than the softening point temperature of the substrate film 3. More specifically, the temperature near the cutting portion of the cutting blade 31 of the cutting tool 30 is heated to a temperature 65°C lower than the softening point of the substrate film 3. The softening point is the temperature at which the film begins to soften and deform as the temperature rises. The softening point of the substrate film 3 can be measured, for example, using a thermomechanical analyzer (TMA) (corresponding to standards JIS K 7196, JIS K 7197, and JIS R1618). The softening point can be obtained from the inflection point of the graph obtained by thermomechanical analysis (TMA). In the case where the substrate film 3 is a substrate film stacked by a plurality of films, the cutting tool 30 is heated to a temperature 65°C lower than the highest softening point temperature of the respective softening point temperatures of the stacked plurality of films.

[0071] The softening point temperature of the TAC film is 255°C. The softening point temperature of the PET film is 240°C.

[0072] As described above, the temperature of the cutting portion of the cutting tool 30 is set to a temperature 65°C lower than the softening point of the base film 3 or higher. For example, when the base film 3 is TAC, the temperature of the cutting portion of the cutting tool 30 is set to 190°C or higher, and when the base film 3 is PET film, the temperature of the cutting portion of the cutting tool 30 is set to 175°C or higher. In addition, the temperature of the cutting portion of the cutting tool 30 is preferably lower than the melting point of the base film 3, and more preferably lower than a temperature 35°C higher than the softening point of the base film 3. If the temperature of the cutting tool 30 is too high, the melt will adhere to the cutting surface of the cutting blade, making it difficult to cut the base film 3.

[0073] The temperature of the cutting portion of the cutting tool 30 may also be lowered by a certain temperature when cutting the base film 3, for example. That is, the temperature of the cutting tool 30 at the time of starting to cut the base film 3 may be at least 65°C lower than the softening point temperature, and the temperature may be lowered during the cutting process. The maximum temperature difference between the temperature of the cutting portion at the start of cutting and the temperature of the cutting portion during cutting is preferably 15°C or less. If the temperature difference is low enough, the base film 3 is less likely to crack.

[0074] Next, in the second step, the laminated film 10 is cut using the heated cutting tool 30. The laminated film 10 is cut into a predetermined shape by moving the cutting tool 30 along the outer shape of the substrate 20. When the cutting tool 30 is a punching tool, the shape of the cutting body of the punching tool is processed according to the outer shape of the substrate 20, and the laminated film 10 is cut by punching the laminated film 10.

[0075] The manufacturing method of the laminated body of the present embodiment uses a cutting tool 30 heated to a temperature of 65°C lower than the softening point temperature to cut the laminated film 10, so it is not easy to crack. If the laminated film 10 is tried to be cut without heating, when the cutting tool 30 abuts against the laminated film 10, the organic layer represented by the substrate film 3, for example, will be strained. This strain will cause the inorganic layer represented by the optical functional layer 5 to be stressed, causing cracks in the inorganic layer. In contrast, the manufacturing method of the laminated body of the present embodiment uses a cutting tool 30 heated to a temperature of 65°C lower than the softening point temperature. When the cutting tool 30 abuts against the laminated film 10, the organic layer will deform, thereby relieving the stress applied to the inorganic layer. As a result, the manufacturing method of the laminated body of the present embodiment can suppress the generation of cracks in the inorganic layer.

[0076] In addition, in the manufacturing method of the laminated body of the present embodiment, the heating object is the cutting tool 30, and even if the substrate 20 and the laminated film 10 are large, there is no need to enlarge the equipment. In addition, only the vicinity of the cut portion of the laminated film 10 is heated, which can suppress the generation of strain in the laminated film 10 as a whole.

[0077] "Laminate manufacturing device"

[0078] The manufacturing apparatus of the laminated body of this embodiment has a laminating device and a cutting device. The laminating device and the cutting device are independent devices, and each can operate independently.

[0079] The laminating device is a device for laminating the laminated film to the substrate, and a known laminating device can be used.

[0080] The cutting device is a device for cutting the laminated film according to the shape of the substrate. Figure 3 As shown, the cutting device has a heating mechanism 40 for heating the cutting tool 30 to a temperature 65°C lower than the softening point temperature of the base film 3. The heating mechanism 40 is, for example, a heater. The softening point temperature of the base film 3 is measured in advance using TMA or the like, and the heating mechanism 40 heats the cutting edge 31 of the cutting tool 30 to a temperature 65°C lower than the softening point temperature of the base film 3 measured in advance.

[0081] The cutting device may include a thermometer 50 and a control unit 60 in addition to the heating mechanism 40. The thermometer 50 measures the temperature of the cutting tool 30. The thermometer 50 may be a contact type or a non-contact type.

[0082] The control unit 60 moves the cutting tool 30 along the outer periphery of the substrate 20. The control unit 60 includes, for example, a camera that measures the outer shape of the substrate 20, a drive unit that moves the cutting tool 30 along the measured outer shape, and a processor that processes the measurement results of the camera and operates the drive unit based on the processing results. The drive unit includes, for example, a horizontal movement mechanism that moves the cutting tool 30 within the plane where the substrate 20 extends, and a lifting mechanism that moves the cutting tool 30 up and down. It should be noted that in Figure 3 Although a mechanism for moving the cutting tool 30 relative to the fixed substrate 20 is illustrated in FIG. 1 , the substrate 20 may be moved relative to the fixed cutting tool 30 .

[0083] The manufacturing apparatus of the laminated body of the present embodiment can heat the cutting tool 30 to a temperature 65° C. or higher lower than the softening point. When this manufacturing apparatus is used, cracks are less likely to occur when the laminated film 10 is processed into a predetermined shape.

[0084] As mentioned above, although the preferred embodiment of the present invention is described in detail, the present invention is not limited to the specific embodiment, and various modifications and changes can be made within the scope of the gist of the present invention described in the means for solving the problem.

[0085] Example

[0086] "Example 1"

[0087] First prepare Figure 2 The laminated film 10 shown. The structure of each layer of the laminated film 10 is as follows.

[0088] Release layer 1: PET film with a thickness of 75 μm.

[0089] Adhesive layer 2: a silicone adhesive film having a thickness of 25 μm.

[0090] Substrate film 3: TAC film having a thickness of 80 μm.

[0091] Hard coat layer 4: an acrylic hard coat layer having a thickness of 6 μm.

[0092] Optical functional layer 5: Total thickness 185 μm, high refractive index layers (Nb2O5) and low refractive index layers (SiO2) alternately stacked. The high refractive index layer and low refractive index layer each have two layers, and the optical functional layer 5 has a total of four layers.

[0093] Antifouling layer 6: an antifouling layer on which an alkoxysilane compound having a perfluoropolyether group (KY-1901: manufactured by Shin-Etsu Chemical Co., Ltd.) was deposited.

[0094] Protective layer 7: a polyolefin protective film having a thickness of 59 μm.

[0095] The acrylic hard coat layer used in the hard coat layer 4 was obtained by applying and curing the photocurable resin composition shown in the following Table 1 using a gravure coater.

[0096] [Table 1]

[0097]

[0098] Next, a glass substrate is prepared as the substrate 20. Then, the release layer 1 is peeled off from the laminate film 10, and the laminate film 10 is bonded to the substrate 20 in such a manner that the adhesive layer 2 is in close contact with the glass substrate. The outer shape of the laminate film 10 is larger than that of the substrate 20, and the laminate film 10 protrudes from the outer periphery of the substrate 20 by about 10 mm.

[0099] Next, the center of the razor blade was heated to 300°C to cut the excess portion of the laminate film 10. The temperature of the cutting portion of the razor blade was 200°C. The softening point of the TAC film was 255°C, and the temperature of the cutting portion of the razor blade was 65°C lower than the softening point of the base film 3 (190°C) or higher. In addition, the maximum temperature difference between the temperature of the cutting portion at the start of cutting and the temperature of the cutting portion during cutting was 8°C.

[0100] Figure 4 1 is a diagram showing a cut surface of the laminated film 10 of Example 1. Figure 4 In the figure, the lower half of the image is the laminated film, and the laminated film 10 is cut along the dotted line. Figure 4This is a diagram of the laminated film 10 observed from the cutting direction, and the front side of the paper corresponds to the upper surface of the laminated film 10. The cut surface was measured using Microscope VHX7000 (manufactured by Keyence). Figure 4 As shown, no cracks were confirmed on the cut surface of the laminated film of Example 1.

[0101] "Example 2"

[0102] The difference between Example 2 and Example 1 is that the temperature of the center of the razor blade is heated to 400°C, and the temperature of the cutting portion of the razor blade is set to 260°C to cut the excess portion of the laminated film 10. The other conditions are the same as those of Example 1, and the laminated film 10 is cut. In addition, the maximum temperature difference between the temperature of the cutting portion at the start of cutting and the temperature of the cutting portion during cutting is 12°C.

[0103] Figure 5 1 is a diagram showing a cut surface of the laminated film 10 of Example 2. Figure 5 In the figure, the lower half of the image is the laminated film, and the laminated film 10 is cut along the dotted line. Figure 5 1 is a diagram of the laminated film 10 observed from the cutting direction, and the front side of the paper corresponds to the upper surface of the laminated film 10. Figure 5 As shown, no cracks were observed on the cut surface of the laminated film 10 of Example 2. However, on the cut surface of Example 2, the melt of the laminated film 10 adhered to the cut surface of the cutting blade.

[0104] "Comparative Example 1"

[0105] Comparative Example 1 differs from Example 1 in that the temperature of the razor blade was kept at room temperature and the razor blade was not heated. The other conditions were the same as those of Example 1, and the laminated film 10 was cut.

[0106] Figure 6 1 is a diagram showing the measurement of the cut surface of the laminated film 10 of Comparative Example 1. Figure 6 In the figure, the lower half of the image is the laminated film, and the laminated film 10 is cut along the dotted line. Figure 6 1 is a diagram of the laminated film 10 observed from the cutting direction, and the front side of the paper corresponds to the upper surface of the laminated film 10. Figure 6 As shown, cracks were confirmed on the cut surface of the laminated film 10 of Comparative Example 1.

[0107] "Comparative Example 2"

[0108] Comparative Example 2 differs from Example 1 in that the temperature of the center of the razor blade is heated to 200°C, and the temperature of the cutting portion of the razor blade is set to 150°C to cut the excess portion of the laminated film 10. The other conditions are the same as those of Example 1, and the laminated film 10 is cut. In addition, the maximum temperature difference between the temperature of the cutting portion at the start of cutting and the temperature of the cutting portion during cutting is 23°C.

[0109] Figure 7 1 is a diagram showing the measurement of the cut surface of the laminated film 10 of Comparative Example 2. Figure 7 In the figure, the lower half of the image is the laminated film, and the laminated film 10 is cut along the dotted line. Figure 7 1 is a diagram of the laminated film 10 observed from the cutting direction, and the front side of the paper corresponds to the upper surface of the laminated film 10. Figure 7 As shown in FIG. 2 , cracks were confirmed on the cut surface of the laminated film of Comparative Example 2.

[0110] As shown in Example 1, Example 2, Comparative Example 1 and Comparative Example 2, when the temperature of the cutting portion of the cutting tool was set to a temperature 65°C lower than the softening point of the base film to cut the laminated film, no cracks were generated on the cut surface. In addition, as shown in Example 1 and Example 2, it was confirmed that the laminated film 10 can be cut more cleanly by not excessively increasing the temperature of the cutting portion of the cutting tool.

[0111] Figure 8 The figure shows the temperature relationship between the center and the cutting part of the cutting tool, i.e., the razor blade of Example 1, Example 2, Comparative Example 1, and Comparative Example 2. There is a correlation between the temperature of the center and the temperature of the cutting part, and the temperature of the cutting part can be obtained from the temperature of the center.

[0112] Description of Reference Numerals

[0113] 1: peeling layer; 2: adhesive layer; 3: base film; 4: hard coating layer; 5: optical functional layer; 5A: first high refractive index layer; 5B: first low refractive index layer; 5C: second high refractive index layer; 5D: second low refractive index layer; 6: antifouling layer; 7: protective layer; 10: laminated film; 20: substrate; 21: bonding surface; 30: cutting tool; 31: cutting blade; 40: heating mechanism; 50: thermometer; 60: control unit.

Claims

1. A method for producing a laminate, wherein: have: a laminating step of laminating a laminated film having a base film and an inorganic layer laminated on the base film to a substrate; as well as a cutting step of cutting the laminated film according to the shape of the substrate, In the cutting step, the cutting tool is heated to a temperature that is 65° C. or higher lower than the softening point of the base film to cut the laminated film.

2. The method for producing a laminate according to claim 1, wherein: The cutting tool has a cutting edge.

3. The method for producing a laminate according to claim 1, wherein: The laminated film comprises an adhesive layer, the base film, and the inorganic layer. The inorganic layer is formed by alternately stacking a low refractive index layer and a high refractive index layer having a higher refractive index than the low refractive index layer.

4. The method for producing a laminate according to claim 1, wherein: The bonding surface of the substrate to which the laminated film is bonded is curved.

5. A device for manufacturing a laminate, wherein: have: a laminating device for laminating a laminated film having a base film and an inorganic layer laminated on the base film to a substrate; as well as a cutting device for cutting the laminated film according to the shape of the substrate, The cutting device includes a heating mechanism for heating the cutting tool to a temperature that is 65° C. or higher lower than a softening point of the base film.

6. The manufacturing device of a laminated body according to claim 5, wherein: The cutting device comprises: a thermometer to measure the temperature of the cutting tool; and The control unit moves the cutting tool along the outer periphery of the substrate.

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