Silicon material screening device

Abstract

The invention discloses a silicon material screening device. The silicon material screening device comprises a driving base; the vibration disc is suitable for containing particle silicon materials; the feeding disc rail is spirally wound along the inner circumferential surface of the vibration disc, a plurality of screening holes are formed in the bottom wall of the feeding disc rail, the feeding disc rail is divided into a plurality of screening sections in the extending direction, and the hole diameter of the screening holes in the upper screening section of every two adjacent screening sections is larger than that of the screening holes in the lower screening section of every two adjacent screening sections; and the material receiving groove body is spirally coiled along the inner circumferential surface of the vibration disc and is divided into a plurality of receiving sections, and the plurality of receiving sections are respectively suitable for receiving the silicon materials falling from the screening holes of the plurality of screening sections. The silicon material screening device has the advantages of being not prone to blockage, good in screening effect, high in reliability, small in silicon material abrasion and the like.

Description

Technical Field

[0001] The invention relates to the technical field of polysilicon manufacturing, and in particular to a silicon material screening device. Background Art

[0002] Electronic-grade polysilicon is mainly produced by the modified Siemens method, which uses chemical vapor deposition to produce electronic-grade polysilicon rods in a reactor. The electronic-grade polysilicon rods are then crushed, screened, cleaned and other subsequent processes to obtain silicon block products with a diameter range of 6 to 100 mm. After the electronic-grade polysilicon rods are crushed, they are sorted using screening equipment to sort the electronic-grade polysilicon blocks into specifications with different particle size distributions.

[0003] In the related art, the crushed silicon material is subjected to multi-stage screening, and the mesh size of the screen decreases from top to bottom. It is very easy for the silicon material to clog the screen holes, thereby interfering with the normal screening process and affecting the screening effect. Summary of the invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a silicon material screening device, which has the advantages of being not easy to be blocked, having a good screening effect, being highly reliable, and having little silicon material wear.

[0005] To achieve the above-mentioned purpose, a silicon material screening device is proposed according to an embodiment of the present invention, the silicon material screening device comprising: a driving base; a vibrating plate, the vibrating plate is vibratingly arranged on the driving base and the driving base is suitable for driving the vibrating plate to vibrate, the vibrating plate is suitable for accommodating granular silicon material; a loading plate rail, the loading plate rail is spirally wound along the inner circumference of the vibrating plate, the bottom wall of the loading plate rail is provided with a plurality of screening holes, the loading plate rail is divided into a plurality of screening sections in the extension direction, the aperture of the screening holes in the upper screening section of two adjacent screening sections is larger than the aperture of the screening holes in the lower screening section, the loading plate rail is constructed to be suitable for causing the granular silicon material in the vibrating plate to spirally rise along the loading plate rail under the vibration of the vibrating plate; a material receiving trough body, the material receiving trough body is spirally wound along the inner circumference of the vibrating plate and is divided into a plurality of receiving sections, the plurality of receiving sections are respectively suitable for receiving the silicon material falling from the screening holes of the plurality of screening sections.

[0006] The silicon material screening device according to the embodiment of the present invention has the advantages of being not easy to be blocked, having a good screening effect, being highly reliable, and having little wear on the silicon material.

[0007] In addition, the silicon material screening device according to the above embodiment of the present invention may also have the following additional technical features:

[0008] According to one embodiment of the present invention, a partition is provided between two adjacent receiving sections.

[0009] According to one embodiment of the present invention, a plurality of discharge ports are provided on the vibration plate, and the plurality of discharge ports are respectively connected to the plurality of receiving sections.

[0010] According to one embodiment of the present invention, each of the discharge ports is located at the lower end of the connected receiving section.

[0011] According to one embodiment of the present invention, the outer peripheral surface of the vibration plate is provided with peripheral wall discharge guide grooves respectively connected to the plurality of discharge ports, and the upper end of the loading plate rail is connected with an upper end discharge guide groove.

[0012] According to one embodiment of the present invention, the plurality of receiving sections are arranged one-to-one correspondingly below the plurality of screening sections.

[0013] According to one embodiment of the present invention, the screening section and the corresponding material receiving section constitute a feeding section, and the distance between the screening section and the material receiving section of the upper feeding section in each adjacent two feeding sections in the vertical direction is greater than the distance between the screening section and the material receiving section of the lower feeding section in the vertical direction.

[0014] According to one embodiment of the present invention, the sieve holes in each sieve segment have the same aperture.

[0015] According to one embodiment of the present invention, the lower end of the loading pan rail is connected to the bottom wall of the vibration pan.

[0016] According to one embodiment of the present invention, an electromagnet is provided on the bottom wall of the vibration plate.

[0017] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0019] Figure 1 Schematic diagram of the structure of a silicon material screening device according to an embodiment of the present invention.

[0020] Figure 2 4 is a partial cross-sectional view of a silicon material screening device according to an embodiment of the present invention.

[0021] Reference numerals: silicon material screening device 1 , driving base 10 , vibration plate 20 , material discharge port 21 , peripheral wall material discharge guide groove 22 , loading plate rail 30 , screening hole 31 , upper end material discharge guide groove 32 , material receiving trough body 40 , partition plate 41 . DETAILED DESCRIPTION

[0022] The present invention is based on the findings of the inventors of this application regarding the following facts and problems:

[0023] In the related art, the crushed silicon material is subjected to multi-stage screening, and the mesh size of the screen decreases from top to bottom. It is very easy for the silicon material to clog the screen holes, thereby interfering with the normal screening process and affecting the screening effect.

[0024] Specifically, in the top-down multi-stage screening method, when the silicon material passes through the upper sieve with larger mesh sizes, the granular silicon material with larger particle sizes and the granular silicon material with smaller particle sizes are mixed together and there are more granular silicon materials, which can easily cause the granular silicon materials to pass through the mesh at the same time and get stuck, causing the sieve holes to be blocked.

[0025] In addition, in the top-down multi-stage screening method, the silicon material is poured from top to bottom, and the collision and friction of the silicon material during the screening process is relatively violent. The silicon material is easily worn and produces silicon powder, resulting in a large loss of silicon material and affecting the silicon material yield.

[0026] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0027] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0028] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0029] The silicon material screening device 1 according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0030] like Figure 1 and Figure 2 As shown, the silicon material screening device 1 according to the embodiment of the present invention includes a driving base 10, a vibration plate 20, a loading plate rail 30 and a material receiving trough body 40.

[0031] The vibration plate 20 is vibratingly arranged on the driving base 10, and the driving base 10 is suitable for driving the vibration plate 20 to vibrate. The vibration plate 20 is suitable for containing granular silicon materials. The loading plate rail 30 is spirally wound along the inner circumference of the vibration plate 20, and the bottom wall of the loading plate rail 30 is provided with a plurality of screening holes 31. The loading plate rail 30 is divided into a plurality of screening sections in the extension direction. The aperture of the screening hole 31 in the upper screening section of two adjacent screening sections is larger than the aperture of the screening hole 31 in the lower screening section. The loading plate rail 30 is configured to be suitable for causing the granular silicon materials in the vibration plate 20 to spirally rise along the loading plate rail 30 under the vibration of the vibration plate 20. The receiving trough body 40 is spirally wound along the inner circumference of the vibration plate 20 and is divided into a plurality of receiving sections, and the plurality of receiving sections are respectively suitable for receiving the silicon materials falling from the screening holes 31 of the plurality of screening sections.

[0032] Specifically, during screening, the crushed granular silicon material to be screened is poured into the vibration plate 20, and the driving base 10 starts to drive the vibration plate 20 to vibrate. The vibration of the vibration plate 20 drives the granular silicon material in the vibration plate 20 to vibrate together, and the granular silicon material gradually enters the feeding plate track 30. The granular silicon material that first enters the feeding plate track 30 gradually spirals up along the feeding plate track 30 under the push of the granular silicon material that enters the feeding plate track 30 later. The principle is similar to that of a vibrating screw elevator. When the granular silicon material passes through the screening hole 31, the granular silicon material that is smaller than the aperture of the screening hole 31 passes through the screening hole 31 and falls into the receiving trough 40. Since the feeding disc rail 30 is divided into a plurality of screening sections in the extension direction, the aperture of the screening hole 31 in the upper screening section of two adjacent screening sections is larger than the aperture of the screening hole 31 in the lower screening section, as the granular silicon material in the feeding disc rail 30 gradually rises, the granular silicon material with a smaller particle size first falls into the receiving trough body 40 from the screening hole 31, and then the granular silicon material with a larger particle size gradually falls into the receiving trough body 40 through the screening hole 31. In this way, granular silicon materials of different particle sizes can be received respectively by a plurality of receiving sections, so as to achieve the screening of granular silicon materials of different particle sizes.

[0033] According to the silicon material screening device 1 of the embodiment of the present invention, by providing screening holes 31 on the feeding tray rail 30 and providing a material receiving trough 40 below the feeding tray rail 30, the feeding tray rail 30 is divided into a plurality of screening sections in the extension direction, so that the aperture of the screening holes 31 in the upper screening section of two adjacent screening sections is larger than the aperture of the screening holes 31 in the lower screening section. In this way, the screening holes 31 of the plurality of screening sections can be used to screen out granular silicon materials of different particle sizes.

[0034] In addition, a vibration plate 20 and a loading plate rail 30 are provided, and the granular silicon material in the vibration plate 20 can be spirally ascended along the loading plate rail 30 through the vibration of the vibration plate 20, so that the granular silicon material with particle sizes from small to large can be gradually screened out during the process of the granular silicon material gradually ascending from bottom to top. Compared with the technical solution in the related art that the granular silicon material passes through a multi-stage screen from top to bottom, the granular silicon material first passes through a smaller screening hole 31 when large and small particle sizes are mixed, and then passes through a larger screening hole 31 after the silicon material particles with smaller particle sizes are screened out. When passing through the larger screening hole 31, silicon material particles with smaller particle sizes will not be mixed, which can prevent the silicon material from entering the screening hole 31 at the same time and getting stuck, and prevent the screening hole 31 from being blocked, thereby preventing the screening effect from being affected, and ensuring the reliable implementation of the screening process.

[0035] In addition, since the vibration plate 20 itself is vibrating, the granular silicon material continues to spiral upward under the vibration of the vibration plate 20. Even if there is silicon material stuck in the screening hole 31, it will be swept out of the screening hole 31 under the thrust and vibration of the subsequent silicon material, thereby further avoiding the clogging of the screening hole 31 and affecting the screening effect, ensuring the reliable implementation of the screening process, reducing the need for cleaning the screening hole 31, and reducing the maintenance frequency required for the silicon material screening device 1.

[0036] Furthermore, since the granular silicon material slowly climbs from bottom to top in the loading pan rail 30, compared with the method of pouring silicon material from top to bottom in the related art, the screening process can be made gentler, silicon material wear can be reduced, silicon powder generation can be reduced, silicon material loss can be reduced, and silicon material yield can be improved.

[0037] Therefore, the silicon material screening device 1 according to the embodiment of the present invention has the advantages of being not easy to be blocked, having a good screening effect, being highly reliable, and having little wear on the silicon material.

[0038] The silicon material screening device 1 according to a specific embodiment of the present invention is described below with reference to the accompanying drawings.

[0039] In some specific embodiments of the present invention, Figure 1 and Figure 2 As shown, the silicon material screening device 1 according to the embodiment of the present invention includes a driving base 10, a vibration plate 20, a loading plate rail 30 and a material receiving trough body 40.

[0040] Specifically, Figure 2 As shown, a partition plate 41 is provided between two adjacent receiving sections. This can prevent the granular silicon materials of different particle sizes received by the two receiving sections from mixing, further improving the reliability of screening.

[0041] More specifically, Figure 1 and Figure 2 As shown, the vibration plate 20 is provided with a plurality of discharge ports 21, and the plurality of discharge ports 21 are respectively connected to a plurality of receiving sections. Specifically, the discharge ports 21 are provided on the peripheral wall of the vibration plate 20. In this way, granular silicon materials of different particle sizes received by different receiving sections can be discharged through different discharge ports 21, so that granular silicon materials of different particle sizes can be collected separately.

[0042] Advantageously, if Figure 2 As shown, each discharge port 21 is located at the lower end of the connected receiving section. Specifically, the discharge port 21 is arranged adjacent to the partition 41. In this way, the silicon material can move toward the discharge port 21 under the action of gravity, so that the granular silicon material in the receiving section can be completely discharged through the discharge port 21, and the silicon material is prevented from remaining in the receiving tank body 40.

[0043] More advantageously, if Figure 1 and Figure 2As shown, the outer peripheral surface of the vibration plate 20 is provided with peripheral wall discharge guide grooves 22 respectively connected to a plurality of discharge ports 21, and the upper end of the loading plate rail 30 is connected with the upper end discharge guide groove 32. Specifically, the peripheral wall discharge guide groove 22 extends in the radial direction of the vibration plate 20, and the upper end discharge guide groove 32 extends in the tangential direction of the loading plate rail 30. In this way, the peripheral wall discharge guide groove 22 can be used to guide the granular silicon material discharged from the discharge port 21, so as to facilitate the collection of the granular silicon material discharged from the discharge port 21, and the granular silicon material with a particle size larger than all the sieve holes 31 will move to the upper end of the loading plate rail 30 and be guided to discharge through the upper end discharge guide groove 32, so as to facilitate the collection of granular silicon material with a larger particle size.

[0044] Figure 1 and Figure 2 1 shows a silicon material screening device 1 according to some examples of the present invention. Figure 2 As shown, a plurality of receiving sections are arranged one by one under a plurality of screening sections, so that the plurality of receiving sections can receive granular silicon materials of different particle sizes respectively, which is convenient for collecting granular silicon materials of different particle sizes respectively.

[0045] Advantageously, the screening section and the corresponding receiving section form a feeding section, and the distance between the screening section and the receiving section of the upper feeding section of each adjacent two feeding sections in the vertical direction is greater than the distance between the screening section and the receiving section of the lower feeding section in the vertical direction. In this way, the receiving trough body 40 closer to the top can more easily receive and guide the granular silicon material with a larger particle size, avoid the granular silicon material with a larger particle size being stuck between the feeding pan rail 30 and the receiving trough body 40, and facilitate the guidance and collection of the granular silicon material after screening.

[0046] Specifically, the apertures of the screening holes 31 in each screening segment are the same, so that each screening segment can screen out silicon material particles with similar particle sizes.

[0047] More specifically, the lower end of the loading pan rail 30 is connected to the bottom wall of the vibration pan 20 , so that the granular silicon material in the vibration pan 20 can be easily entered into the loading pan rail 30 .

[0048] In some embodiments, an electromagnet is provided on the bottom wall of the vibration plate 20. In this way, the electromagnet can be used to absorb metal impurities in the granular silicon material, such as metal debris generated during the crushing process, to reduce the metal impurity content of the granular silicon material after screening.

[0049] Other structures and operations of the silicon material screening device 1 according to the embodiment of the present invention are known to those skilled in the art and will not be described in detail here.

[0050] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0051] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A silicon material screening device, characterized in that: include: Driving base; A vibration plate, the vibration plate is vibratingly arranged on the driving base and the driving base is suitable for driving the vibration plate to vibrate, and the vibration plate is suitable for containing granular silicon material; A loading pan rail, the loading pan rail is spirally wound along the inner circumference of the vibrating pan, a plurality of screening holes are arranged on the bottom wall of the loading pan rail, the loading pan rail is divided into a plurality of screening sections in the extension direction, the aperture of the screening holes in the upper screening section of two adjacent screening sections is larger than the aperture of the screening holes in the lower screening section, and the loading pan rail is configured to be suitable for causing the granular silicon material in the vibrating pan to spirally rise along the loading pan rail under the vibration of the vibrating pan; The material receiving trough body is spirally wound along the inner circumference of the vibration plate and is divided into a plurality of receiving sections, wherein the plurality of receiving sections are respectively suitable for receiving silicon materials falling from the screening holes of the plurality of screening sections.

2. The silicon material screening device according to claim 1, characterized in that: A partition is provided between two adjacent receiving sections.

3. The silicon material screening device according to claim 1, characterized in that: The vibration plate is provided with a plurality of discharge ports, and the plurality of discharge ports are respectively connected with the plurality of receiving sections.

4. The silicon material screening device according to claim 3, characterized in that: Each of the discharge ports is located at the lower end of the connected receiving section.

5. The silicon material screening device according to claim 3, characterized in that: The outer peripheral surface of the vibration plate is provided with peripheral wall discharge guide grooves respectively connected with the plurality of discharge ports, and the upper end of the loading plate rail is connected with an upper end discharge guide groove.

6. The silicon material screening device according to claim 1, characterized in that: The plurality of receiving sections are arranged one by one correspondingly below the plurality of screening sections.

7. The silicon material screening device according to claim 6, characterized in that: The screening section and the corresponding material receiving section constitute a feeding section, and the distance between the screening section and the material receiving section of the upper feeding section in each adjacent two feeding sections in the vertical direction is greater than the distance between the screening section and the material receiving section of the lower feeding section in the vertical direction.

8. The silicon material screening device according to claim 1, characterized in that: The sieve holes in each sieve segment have the same aperture.

9. The silicon material screening device according to claim 1, characterized in that: The lower end of the loading pan rail is connected to the bottom wall of the vibration pan.

10. The silicon material screening device according to claim 1, characterized in that: An electromagnet is arranged on the bottom wall of the vibration plate.

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