Tolerance analysis method, device, related equipment and system

Abstract

The embodiment of the invention discloses a tolerance analysis method, a tolerance analysis device, related equipment and a tolerance analysis system. Target tolerance data corresponding to a target optical system are obtained, wherein the target tolerance data comprises a tolerance variable used for tolerance analysis and a tolerance value corresponding to the tolerance variable; setting the target optical system in optical simulation software based on the target tolerance data; performing optical simulation processing based on the set target optical system to obtain light distribution data; and performing tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system. Therefore, in the optical simulation software, the target optical system is set according to the target tolerance data required by tolerance analysis of the target optical system, and optical simulation processing is performed on the target optical system after tolerance setting, so that tolerance analysis can be performed according to the light distribution data obtained through simulation; the tolerance analysis result of the target optical system is obtained, and efficient tolerance analysis on the optical system is achieved.

Description

Technical Field

[0001] The present application relates to the field of computer technology, and in particular to a tolerance analysis method, device, related equipment and system. Background Art

[0002] In the field of optical engineering, after completing the preliminary optical design of optical systems such as lighting systems, it is necessary to perform tolerance analysis on the optical system to evaluate manufacturability and further guide the design optimization and project implementation of the optical system. However, in the current optical design simulation method, it is impossible to efficiently perform tolerance analysis on the optical system, which makes the tolerance analysis of the optical system inefficient. Summary of the invention

[0003] The embodiments of the present application provide a tolerance analysis method, apparatus, related equipment and system, which can automatically perform optical simulation and tolerance analysis of an optical system, realize efficient tolerance analysis of the optical system, and effectively improve the tolerance analysis efficiency of the optical system.

[0004] In order to achieve the above object, according to a first aspect of the present application, a tolerance analysis method is provided, the method comprising:

[0005] Acquire target tolerance data corresponding to the target optical system, wherein the target tolerance data includes tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables;

[0006] Based on the target tolerance data, setting the target optical system in optical simulation software;

[0007] Perform optical simulation processing based on the set target optical system to obtain light distribution data;

[0008] Tolerance analysis is performed based on the light distribution data to obtain a tolerance analysis result of the target optical system.

[0009] In some embodiments, performing tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system includes: calculating at least one energy distribution parameter based on the light distribution data; and determining, based on the energy distribution parameter, a tolerance analysis result of the target optical system under the target tolerance data.

[0010] In some embodiments, the energy distribution parameter includes at least one of pupil ellipticity, pupil polarity balance, and numerical aperture.

[0011] In some embodiments, calculating at least one energy distribution parameter based on the light distribution data includes: dividing the light distribution data into regions to obtain light distribution data of multiple regions; calculating the regional total energy of the light distribution data of each region; and calculating at least one energy distribution parameter based on the regional total energy.

[0012] In some embodiments, performing tolerance analysis based on the light distribution data to obtain tolerance analysis results of the target optical system includes: sending the light distribution data to data analysis software connected to the optical simulation software; performing tolerance analysis based on the light distribution data by the data analysis software to obtain tolerance analysis results of the target optical system under the target tolerance data.

[0013] In some embodiments, acquiring target tolerance data corresponding to the target optical system includes: acquiring tolerance data corresponding to the target optical system, the tolerance data including tolerance variables configured for the target optical system and tolerance range data corresponding to the tolerance variables; determining a tolerance analysis type for the target optical system, the tolerance analysis type including at least one of sensitivity analysis and Monte Carlo analysis; and acquiring target tolerance data based on the tolerance analysis type and the tolerance data.

[0014] In some embodiments, the target tolerance data is obtained based on the tolerance analysis type and the tolerance data, including: when the tolerance analysis type is a sensitivity analysis type, determining the target tolerance variable that needs to be sensitivity analyzed in the target optical system; based on the tolerance data, obtaining the maximum value and the minimum value of the tolerance range data corresponding to the target tolerance variable, and obtaining the target tolerance value corresponding to the target tolerance variable; based on the target tolerance variable and the target tolerance value, determining the target tolerance data.

[0015] In some embodiments, the target tolerance data is obtained based on the tolerance analysis type and the tolerance data, including: when the tolerance analysis type is a Monte Carlo analysis type, based on the tolerance data, a plurality of random tolerance values ​​corresponding to the tolerance variable are obtained, the random tolerance values ​​being random numbers within a numerical range of tolerance range data corresponding to the tolerance variable; and a plurality of sets of target tolerance data corresponding to the target optical system are determined based on the tolerance variable and the plurality of random tolerance values ​​corresponding to the tolerance variable.

[0016] In some embodiments, obtaining multiple random tolerance values ​​corresponding to the tolerance variable based on the tolerance data includes: determining a preset tolerance analysis number and a tolerance distribution function; generating multiple random numbers corresponding to the tolerance variable based on the tolerance distribution function, the tolerance analysis number and the tolerance range data as multiple random tolerance values ​​corresponding to the tolerance variable, wherein the number of random tolerance values ​​corresponding to the tolerance variable is the same as the tolerance analysis number, and the random tolerance value is within the numerical range of the tolerance range data of the tolerance variable.

[0017] In some embodiments, when the tolerance analysis type corresponding to the target tolerance data is a Monte Carlo analysis type, the energy distribution parameters include energy distribution parameters corresponding to multiple groups of target tolerance data, and after calculating at least one energy distribution parameter based on the light distribution data, it also includes: obtaining evaluation values ​​corresponding to each of the energy distribution parameters; based on the energy distribution parameters corresponding to each group of the target tolerance data and the evaluation values ​​corresponding to the energy distribution parameters, determining the number of qualified groups in the target tolerance data that meet preset qualified conditions; and determining the yield analysis result of the target optical system in the Monte Carlo analysis based on the number of qualified groups and the total number of groups of the target tolerance data.

[0018] According to a second aspect of the present application, a tolerance analysis method is provided, which is applied to a tolerance analysis platform, wherein the tolerance analysis platform is connected to optical simulation software and data analysis software, and the method comprises:

[0019] receiving a tolerance analysis instruction for a target optical system, triggering the data analysis software to obtain target tolerance data, and transmitting the target tolerance data to the optical simulation software;

[0020] Based on the target tolerance data, the target optical system is set by optical simulation software, and optical simulation processing is performed on the set target optical system to obtain light distribution data, and the light distribution data is transmitted to the data analysis software;

[0021] By using the data analysis software, tolerance analysis is performed based on the light distribution data to obtain a tolerance analysis result of the target optical system under the target tolerance data.

[0022] According to a third aspect of the present application, a tolerance analysis device is provided, the device comprising:

[0023] A data acquisition module, used for acquiring target tolerance data corresponding to the target optical system, wherein the target tolerance data includes tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables;

[0024] A data setting module, used for setting the target optical system in the optical system simulation software based on the target tolerance data;

[0025] An optical simulation module is used to perform optical simulation processing based on the set target optical system to obtain light distribution data;

[0026] The tolerance analysis module is used to perform tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system.

[0027] According to a fourth aspect of the present application, an electronic device is provided, including a processor and a memory, wherein the memory stores an application program, and the processor is used to run the application program in the memory to implement the tolerance analysis method provided in an embodiment of the present application.

[0028] According to a fifth aspect of the present application, a computer-readable storage medium is provided, wherein the computer-readable storage medium stores a computer program, and the computer program is suitable for being loaded by a processor to execute the steps in any tolerance analysis method provided in the embodiments of the present application.

[0029] According to the sixth aspect of the present application, a computer program product is provided, which includes a computer program, and the computer program is stored in a computer-readable storage medium; when a processor of an electronic device reads the computer program from the computer-readable storage medium, the processor executes the computer program, so that the electronic device performs the steps in the tolerance analysis method provided in an embodiment of the present application.

[0030] According to the seventh aspect of the present application, a system is provided, which includes a tolerance analysis platform, optical simulation software and data analysis software, wherein the optical simulation software and the data analysis software are connected based on the tolerance analysis platform, or the above-mentioned tolerance analysis device, or the above-mentioned electronic device, or the above-mentioned storage medium, or the above-mentioned computer program product.

[0031] In the tolerance analysis method, device, related equipment and system of the embodiment of the present application, by obtaining the target tolerance data corresponding to the target optical system, the target tolerance data includes the tolerance variables used for tolerance analysis and the tolerance values ​​corresponding to the tolerance variables; based on the target tolerance data, the target optical system is set in the optical simulation software; based on the set target optical system, optical simulation processing is performed to obtain light distribution data; tolerance analysis is performed based on the light distribution data to obtain the tolerance analysis result of the target optical system. In this way, by obtaining the target tolerance data required for tolerance analysis of the target optical system, and then setting the target optical system in the optical simulation software according to the target tolerance data, optical simulation processing can be performed on the target optical system after the tolerance setting, and then tolerance analysis can be performed according to the light distribution data obtained by simulation, and optical simulation and tolerance analysis of the optical system can be automatically performed to obtain the tolerance analysis result of the target optical system, thereby realizing efficient tolerance analysis of the optical system and effectively improving the tolerance analysis efficiency of the optical system. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0033] Figure 1 It is a schematic diagram of an implementation scenario of a tolerance analysis method provided in an embodiment of the present application;

[0034] Figure 2 It is a flow chart of a tolerance analysis method provided in an embodiment of the present application;

[0035] Figure 3a It is a schematic diagram of the overall architecture of a tolerance analysis method provided in an embodiment of the present application;

[0036] Figure 3b It is a schematic diagram of a specific architecture of a tolerance analysis method provided in an embodiment of the present application;

[0037] Figure 3c It is a specific flow chart of a tolerance analysis method provided in an embodiment of the present application;

[0038] Figure 3d It is a data transmission schematic diagram of a tolerance analysis method provided in an embodiment of the present application;

[0039] Figure 3e is another data transmission schematic diagram of a tolerance analysis method provided in an embodiment of the present application;

[0040] Figure 4a It is a schematic diagram of light distribution data partitioning of a tolerance analysis method provided in an embodiment of the present application;

[0041] Figure 4b It is a schematic diagram of a sensitivity analysis process of a tolerance analysis method provided in an embodiment of the present application;

[0042] Figure 4c It is a schematic diagram of a Monte Carlo analysis process of a tolerance analysis method provided in an embodiment of the present application;

[0043] Figure 4d It is a schematic diagram of saving analysis results of a tolerance analysis method provided in an embodiment of the present application;

[0044] Figure 4e It is a schematic diagram of a yield analysis process of a tolerance analysis method provided in an embodiment of the present application;

[0045] Figure 5 It is a flow chart of a tolerance analysis method provided in an embodiment of the present application;

[0046] Figure 6 is a schematic diagram of the structure of a tolerance analysis device provided in an embodiment of the present application;

[0047] Figure 7 It is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0048] The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0049] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0050] The embodiments of the present application provide a tolerance analysis method, apparatus, related equipment and system. The tolerance analysis apparatus can be integrated in an electronic device, which can be a server, a terminal or other equipment.

[0051] Among them, the server can be an independent physical server, or a server cluster or distributed system composed of multiple physical servers, or a cloud server that provides cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, network acceleration services (Content Delivery Network, CDN), and basic cloud computing services such as big data and artificial intelligence platforms. Terminals may include but are not limited to mobile phones, computers, intelligent voice interaction devices, smart home appliances, vehicle-mounted terminals, aircraft, etc. Terminals and servers can be directly or indirectly connected via wired or wireless communications, and this application does not limit this.

[0052] Optionally, the electronic device may be integrated into a vehicle, which may be a fuel vehicle, a plug-in hybrid vehicle, a new energy vehicle, etc., and this application does not make any specific limitation on this.

[0053] See also Figure 1 , taking the integration of tolerance analysis devices into electronic equipment as an example, Figure 1 A schematic diagram of an implementation scenario of the tolerance analysis method provided in an embodiment of the present application, wherein the electronic device can obtain target tolerance data corresponding to the target optical system, the target tolerance data including tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables; based on the target tolerance data, the target optical system is set in optical simulation software; based on the set target optical system, optical simulation processing is performed to obtain light distribution data; based on the light distribution data, tolerance analysis is performed to obtain tolerance analysis results of the target optical system.

[0054] It should be noted that Figure 1 The implementation environment scenario diagram of the tolerance analysis method shown is only an example. The implementation environment scenario of the tolerance analysis method described in the embodiment of the present application is to more clearly illustrate the technical solution of the embodiment of the present application, and does not constitute a limitation on the technical solution provided by the embodiment of the present application. It is known to those skilled in the art that with the evolution of tolerance analysis and the emergence of new business scenarios, the technical solution provided by the present application is also applicable to similar technical problems.

[0055] The solutions provided by the embodiments of the present application are specifically described by the following embodiments. It should be noted that the description order of the following embodiments is not intended to limit the preferred order of the embodiments.

[0056] This embodiment will be described from the perspective of a tolerance analysis device, which can be specifically integrated into an electronic device.

[0057] See also Figure 2 , Figure 2: is a flow chart of a tolerance analysis method provided in an embodiment of the present application. The tolerance analysis method comprises:

[0058] Step S101, obtaining target tolerance data corresponding to a target optical system.

[0059] Wherein, the target optical system may be an optical system for tolerance analysis, and the optical system (optical system) may refer to a system composed of a plurality of optical elements such as lenses, reflectors, prisms and apertures in a certain order, which may be generally used for imaging or optical information processing, and may include an illumination system, an imaging system, etc. The target tolerance data may be data for tolerance analysis of the target optical system, and different tolerance analysis methods may obtain different target tolerance data. The target tolerance data may include tolerance variables for tolerance analysis and tolerance values ​​corresponding to the tolerance variables. The tolerance variables may be variables of tolerance, each tolerance variable may correspond to a tolerance name, and the tolerance value may be a tolerance value of the tolerance variable. For example, the tolerance variables may include surface eccentricity of the front surface of the optical element in the X direction, surface eccentricity of the rear surface of the optical element in the X direction, air spacing tolerance of the optical element, thickness tolerance of the optical element, and other tolerance variables.

[0060] There are many ways to obtain target tolerance data corresponding to the target optical system. For example, the tolerance data corresponding to the target optical system can be obtained; the tolerance analysis type for the target optical system can be determined; and the target tolerance data can be obtained based on the tolerance analysis type and the tolerance data.

[0061] The tolerance data may include all tolerance variables configured for the target optical system and tolerance range data corresponding to the tolerance variables. The tolerance range data may be data indicating the tolerance value range of the tolerance variables, for example, may include a tolerance range from a lower tolerance limit of -1 to an upper tolerance limit of 1, a tolerance range from a lower tolerance limit of -0.02 to an upper tolerance limit of 0.02, etc. The tolerance analysis type may be the type of tolerance analysis performed, and the tolerance analysis type may include at least one of sensitivity analysis and Monte Carlo analysis. The Monte Carlo analysis may refer to analyzing the changes in the optical system evaluation index when all tolerance variables change within the tolerance range, that is, analyzing the influence of multiple tolerance variables of the optical system on the optical characteristics. This sensitivity analysis can analyze the influence of each tolerance variable on the optical characteristics of the optical system at the upper and lower extreme values ​​of the tolerance range, and analyze the sensitivity of each tolerance variable in turn, and analyze the manufacturability of the optical system. It mainly focuses on the influence of a single tolerance variable on the evaluation indicators of the optical system. According to the sensitivity analysis results, combined with the specific optomechanical structure design, the tolerance variable that is most sensitive to the optical system can be used to reduce its corresponding tolerance, or optimize the optical design to make the optical system easier to manufacture or assemble.

[0062] Among them, based on the tolerance analysis type and tolerance data, there are multiple ways to obtain the target tolerance data. For example, when the tolerance analysis type is a sensitivity analysis type, the target tolerance variable that needs to be sensitivity analyzed in the target optical system can be determined; based on the tolerance data, the maximum and minimum values ​​of the tolerance range data corresponding to the target tolerance variable are obtained to obtain the target tolerance value corresponding to the target tolerance variable; based on the target tolerance variable and the target tolerance value, the target tolerance data is determined.

[0063] The target tolerance variable may be a tolerance variable that needs to be subjected to sensitivity analysis among all tolerance variables configured for the target optical system. The target tolerance value may include the maximum value and the minimum value of the tolerance range data corresponding to the target tolerance variable. For example, assuming that the tolerance range data of the target tolerance variable "optical element thickness tolerance" is data indicating a tolerance range from a lower tolerance limit of -0.02 to an upper tolerance limit of 0.02, the target tolerance value corresponding to the target tolerance variable may be a lower limit value of "-0.02" and an upper limit value of "0.02". In this way, each target tolerance variable and the corresponding target tolerance value may be used as the target tolerance data required by the target optical system under sensitivity analysis.

[0064] Optionally, there are multiple ways to obtain target tolerance data based on the tolerance analysis type and tolerance data. For example, when the tolerance analysis type is a Monte Carlo analysis type, multiple random tolerance values ​​corresponding to the tolerance variables can be obtained based on the tolerance data; based on the tolerance variables and the multiple random tolerance values ​​corresponding to the tolerance variables, multiple sets of target tolerance data corresponding to the target optical system can be determined.

[0065] The random tolerance value is a random number within the numerical range of the tolerance range data corresponding to the tolerance variable, so that all tolerance variables of the target optical system and multiple random tolerance values ​​corresponding to each tolerance variable can be used as multiple sets of target tolerance data corresponding to the target optical system. For example, assuming that the numerical range of the tolerance range data corresponding to a tolerance variable is -1 to 1, the random tolerance value is a random number within the range of [-1,1]. At the same time, it can be assumed that 5 random tolerance values ​​are obtained for each tolerance variable, and then 5 sets of target tolerance data corresponding to the target optical system can be obtained.

[0066] Among them, based on the tolerance data, there can be multiple ways to obtain multiple random tolerance values ​​corresponding to the tolerance variable. For example, the preset number of tolerance analyses and the tolerance distribution function can be determined; based on the tolerance distribution function, the number of tolerance analyses and the tolerance range data, multiple random numbers corresponding to the tolerance variable are generated as multiple random tolerance values ​​corresponding to the tolerance variable, wherein the number of random tolerance values ​​corresponding to the tolerance variable is the same as the number of tolerance analyses, and the random tolerance values ​​are within the numerical range of the tolerance range data of the tolerance variable.

[0067] The number of tolerance analyses may be the number of Monte Carlo analyses performed on the target optical system, and the tolerance distribution function may be a function for generating random numbers, for example, a function for generating Gaussian distribution or uniform distribution.

[0068] There are many ways to generate multiple random numbers corresponding to tolerance variables based on the tolerance distribution function, the number of tolerance analyses and the tolerance range data. For example, distribution data with a numerical range within the numerical range corresponding to the tolerance range data can be fitted according to the tolerance distribution function and the tolerance range data, so that sampling can be performed in the distribution data according to the number of tolerance analyses to obtain multiple random numbers with the same number as the number of tolerance analyses, as multiple random tolerance values ​​corresponding to the tolerance variable.

[0069] In one embodiment, the tolerance analysis method provided in the embodiment of the present application can be applied to the tolerance analysis platform provided in the embodiment of the present application. The tolerance analysis platform can combine optical simulation software and data analysis software to realize automated optical analysis and tolerance analysis of the target optical system, thereby realizing efficient and automated tolerance analysis of the optical system. The optical simulation software can be software for modeling and optical simulation of the target optical system, and the data analysis software can be software for data processing and tolerance analysis based on the simulation results of the optical simulation software. For example, please refer to Figure 3a , Figure 3a It is a schematic diagram of the overall architecture of a tolerance analysis method provided by an embodiment of the present application. The plastic system automated tolerance analysis platform is a tolerance analysis platform provided by an embodiment of the present application. The tolerance analysis platform is mainly composed of six modules: a system parameter setting module, a tolerance setting module, a tolerance import module, a tolerance analysis module, an analysis result storage and display module, and a yield analysis tool. Among them, the system parameter setting module includes a Lighttools connection parameter setting submodule and a tolerance analysis related setting submodule, wherein the optical simulation software (Lighttools) can be a kind of optical system modeling software. The Lighttools connection parameter setting submodule is mainly used to set the information acquisition entry. According to this setting entry, the data analysis software (such as Matlab) can be correctly connected with the optical simulation software (such as Lighttools) to import the tolerance data set subsequently into the Lighttools software. At the same time, according to the information acquisition entry set by the module, the data simulated in the optical simulation can be obtained, so that the optical simulation data is processed for tolerance analysis in the Matlab software.

[0070] For example, see Figure 3b , Figure 3bIt is a specific architecture diagram of a tolerance analysis method provided by an embodiment of the present application. The Lighttools connection parameter setting submodule may include Lighttools file number setting, detector access address setting, illumination section access address setting, and intensity section access address setting. Among them, the Lighttools file number setting can be used to set the file number (LTID) of each Lighttools file. The Lighttools file ky1 refers to various file types created or imported when using the Lighttools software for optical design and simulation, mainly including light source files, model files, simulation setting files, etc., that is, files that can be models of the target optical system, used for optical simulation of the target optical system. Each Lighttools file can have a unique number ID. By setting this ID, the data analysis software Matlab can be pointed to the Lighttools file of the specified target optical system. The detector access address setting can map the detector access address in the formulated Lighttools file to the Matlab software, so that the Matlab software can access the detector data of the corresponding address, thereby obtaining the simulation data obtained by the optical simulation software performing optical simulation processing on the target optical system. Similarly, the illumination section access address setting and the intensity section access address setting can be used to set the address of accessing the illumination section corresponding to the target optical system, and set the address of accessing the intensity section corresponding to the target optical system. Setting the corresponding illumination section access address and intensity section access address can enable the data analysis software to access the illumination and intensity data in the corresponding optical simulation software, thereby realizing the connection between the optical simulation software of the data analysis software. In addition, the tolerance analysis related setting submodule can be used to set the relevant parameters of the tolerance analysis, for example, the objective lens numerical aperture setting and the tolerance distribution mode and simulation number setting submodule can be used, wherein the objective lens numerical aperture setting submodule can be used to set the numerical aperture of the objective lens in the target optical system, and the tolerance distribution mode and simulation number setting submodule can be used for the tolerance distribution function and the tolerance analysis number used in the Monte Carlo analysis.

[0071] Please continue to refer to Figure 3a, the tolerance setting module can set the component processing tolerance (also called surface tolerance) and component assembly tolerance (also called component tolerance). Among them, the surface tolerance can include the aperture number of the lens processing, which can be related to the curvature of the lens surface, the thickness of each curved surface, the inclination of the optical surface along the X direction, the inclination of the optical surface along the Y direction, the eccentricity of the optical surface in the X direction, the eccentricity of the optical surface in the Y direction, the theoretical cone angle of the conical lens in the lighting system, and the cone angle error. The component tolerance can include the Z position tolerance, that is, the air spacing tolerance, the inclination of the optical element along the X-axis direction, the inclination of the optical element along the Y-axis direction, the eccentricity of the optical element in the X direction, the eccentricity of the optical element in the Y direction, and other tolerances. According to the tolerance analysis requirements of the specific optical system, the tolerance range of the above tolerances can be set through the tolerance setting module and input into the corresponding area in the interface to import the tolerance variables corresponding to the target optical system and the corresponding tolerance range data.

[0072] The main function of the tolerance import module is to import the tolerances set in the tolerance setting module into the Lighttools software, so as to quickly import the set tolerance variables and tolerance range data into each optical surface and each optical element of the target optical system in the Lighttools software in one go. At the same time, each tolerance variable name can be given a unique name for intuitive viewing. For example, please refer to Figure 3c , Figure 3c It is a specific flow chart of a tolerance analysis method provided in an embodiment of the present application. When the tolerance import module transmits information, it can save the tolerance data of all surfaces and components set in the Matlab software to the tolerance data table, and then transfer the tolerance data in the integrated tolerance data table to the Lighttools software and save them as tolerance variables. At the same time, each tolerance is named according to the type of the tolerance variable. In the Lighttools software, each tolerance variable can store data such as the tolerance name, enabled status, upper tolerance limit, and lower tolerance limit.

[0073] Optionally, in the embodiment of the present application, each tolerance variable may be named using the following rules:

[0074] XXX_YYY_ZZZ

[0075] Among them, XXX can represent the component name, which can be consistent with the component name in the Lighttools software. YYY can refer to the secondary classification of the component name, which can include two name options "surf" and "ele". "surf" can represent the surface tolerance, and "ele" represents the component tolerance. ZZZ can represent the meaning of a specific tolerance variable. For example, when ZZZ is "decentXf", it can be represented as the surface eccentricity of the front surface of the optical component in the X direction, when ZZZ is "decentXb", it can be represented as the surface eccentricity of the rear surface of the optical component in the X direction, when ZZZ is "decentYf", it can be represented as the surface eccentricity of the front surface of the optical component in the Y direction, when ZZZ is "decentYb", it can be represented as the surface eccentricity of the rear surface of the optical component in the Y direction, when ZZZ is "alpha", it can be represented as the tilt tolerance of the optical component along the X axis, when ZZZ is "beta", it can be represented as the tilt tolerance of the optical component along the Y axis, and when ZZZ is "alphaf", it can be represented as It is shown as the tilt tolerance of the front surface of the optical element along the X-axis. When ZZZ is "alphab", it can be expressed as the tilt tolerance of the back surface of the optical element along the X-axis. When ZZZ is "betaf", it can be expressed as the tilt tolerance of the front surface of the optical element along the Y-axis. When ZZZ is "betab", it can be expressed as the tilt tolerance of the back surface of the optical element along the Y-axis. When ZZZ is "thickness", it can be expressed as the thickness tolerance of the optical element. When ZZZ is "radiusf", it can be expressed as the curvature tolerance of the front surface of the optical element. When ZZZ is "radiusb", it can be expressed as the curvature tolerance of the back surface of the optical element, etc. The specific settings can be made according to actual needs, and the embodiments of the present application are not limited here.

[0076] In addition, please continue to refer to Figure 3a , the tolerance analysis module can mainly include a sensitivity analysis submodule and a Monte Carlo analysis submodule. In both analysis modules, the pupil characteristic parameter calculation unit needs to be used. In the tolerance analysis platform design, a selection module can be designed to select the two tolerance analysis submodules to be started separately or simultaneously. When both submodules are checked to perform sensitivity analysis and Monte Carlo analysis, sensitivity analysis can be performed first, and then Monte Carlo analysis.

[0077] Step S102: Setting the target optical system in the optical simulation software based on the target tolerance data.

[0078] The optical simulation software may be software for modeling and optical simulation of a target optical system.

[0079] Among them, based on the target tolerance data, there can be many ways to set the target optical system in the optical simulation software. For example, in the optical simulation software, based on the tolerance value corresponding to each tolerance variable in the target tolerance data, the tolerances of each surface and component corresponding to the target optical system in the optical simulation software can be set to adjust the parameters of each surface and component in the target optical system, so as to judge the degree of influence of the parameters of each surface and component in the target optical system on the optical performance of the optical system based on the tolerance analysis results, so as to better design and optimize the optical system and obtain an optical system with better optical performance and more stability.

[0080] In one embodiment, when performing sensitivity analysis on the target optical system, please refer to Figure 3d , Figure 3d It is a data transfer schematic diagram of a tolerance analysis method provided in an embodiment of the present application. The target tolerance variable that needs to be subjected to sensitivity analysis can be selected from the tolerance data imported by the tolerance import module stored in the Lighttools software, so that the target tolerance variable can be transferred to the sensitivity analysis tolerance data table in the Matlab software through the Lighttools software. In the sensitivity analysis tolerance data table, the data transferred by the Lighttools software can be processed to obtain the target tolerance data, which can include all the tolerance variables that need to participate in the sensitivity analysis and the corresponding upper and lower tolerance limits. Then, the Matlab software can sequentially transfer the target tolerance data in the sensitivity analysis tolerance data table to the Lighttools software, so that each variable in the optical system changes according to the target tolerance data in the tolerance data table, so as to perform optical simulation processing such as ray tracing after setting.

[0081] In one embodiment, when performing Monte Carlo analysis on the target optical system, please refer to Figure 3e , Figure 3e It is another data transfer schematic diagram of a tolerance analysis method provided by an embodiment of the present application. Through the Lighttools software, the tolerance variables of the tolerance data stored by the tolerance import module can be transferred from the Lighttools software to the tolerance range data table in the Matlab software. According to the selected tolerance distribution function and the number of Monte Carlo analysis (i.e., the number of tolerance analysis), each tolerance variable generates a random number that conforms to the tolerance distribution function within the numerical range corresponding to the tolerance range data, and saves it to the Monte Carlo analysis data table. Then, the data in the Monte Carlo analysis data table can be transferred to the Lighttools software in turn, and the Lighttools software sets each surface and component based on each tolerance variable passed in, so as to perform optical simulation processing such as ray tracing after the setting.

[0082] Step S103, performing optical simulation processing based on the set target optical system to obtain light distribution data.

[0083] The light distribution data may be data obtained after optical simulation processing is performed on the set target optical system, the light distribution data may be data detected by a detector set in the target optical system, and may describe the distribution of light on the detector surface of the target optical system, and may be used to indicate the data of light distribution in the target optical system, for example, information such as the light trend, light path distribution, and energy distribution in the target optical system. In a specific embodiment, the light distribution data may be optical system imaging detector data, for example, may be a light intensity distribution matrix generated on the detection surface, indicating the light spot distributed on the pupil surface due to the propagation of light in the target optical system, etc.

[0084] There are many ways to obtain light distribution data by performing optical simulation processing based on the target optical system after setting. For example, ray tracing can be performed on the target optical system after setting, so as to obtain light distribution data based on data detected by an imaging detector set for the target optical system.

[0085] For example, please refer to Figure 3d and Figure 3e , the set target light system can be traced, so that after the ray tracing, the optical system imaging detector data can be transferred to the Matlab software for pupil characteristic parameter calculation to perform tolerance analysis on the target optical system.

[0086] Step S104: performing tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system.

[0087] The tolerance analysis result may be a result of a tolerance analysis performed on a target optical system.

[0088] There are many ways to perform tolerance analysis based on light distribution data to obtain the tolerance analysis result of the target optical system. For example, at least one energy distribution parameter can be calculated based on the light distribution data; and the tolerance analysis result of the target optical system under the target tolerance data can be determined based on the energy distribution parameter.

[0089] The energy distribution parameter may be a parameter of the distribution of light in the target optical system, for example, it may describe the distribution of the energy of light on the detector surface of the target optical system.

[0090] Optionally, the energy distribution parameter may be a pupil characteristic parameter, which may include at least one of pupil ellipticity, pupil polar balance and numerical aperture.

[0091] Among them, pupil ellipticity, pupil polar balance and numerical aperture can be evaluation indicators for optical systems such as lighting systems. Among them, pupil ellipticity refers to the energy difference between equal-area block areas on the pupil plane of the light system. Pupil ellipticity can include HV ellipticity (Pellipticity_HV) and ST ellipticity (Pellipticity_ST). HV ellipticity is defined as the energy difference between the X direction and the Y direction, and ST ellipticity is defined as the energy difference between the S direction and the T direction. Pupil polar balance represents the symmetry of light intensity in light distribution data. Pupil polar balance can be subdivided into polar balance in four dimensions: X direction, Y direction, four quadrants (Quad, Q) 0°, and four quadrants 45°, which respectively characterize the light intensity deviation in the positive and negative directions, between quadrants, and between rotational quadrants. Numerical aperture is a dimensionless number that can be used to measure the angular range of light that an optical system can collect. In the field of optics, it can describe the size of the light collection cone angle of the lens and determines the light collection ability of the lens.

[0092] There are many ways to calculate at least one energy distribution parameter based on the light distribution data, for example, dividing the light distribution data into regions to obtain light distribution data of multiple regions; calculating the regional total energy of the light distribution data of each region; and calculating at least one energy distribution parameter based on the regional total energy.

[0093] The total energy of the region may be the energy of light irradiation in each region of the pupil surface, such as illumination.

[0094] There are many ways to divide the light distribution data into regions and obtain the light distribution data of multiple regions. For example, the regions can be divided according to the energy distribution parameters to be calculated. For example, when calculating pupil ellipticity, the light distribution data can be divided into four regions of equal area. When calculating pupil polarity balance in the X direction or Y direction, the light distribution data can be divided into two regions of equal area. Optionally, when it is necessary to calculate multiple energy distribution parameters at the same time, the light distribution data can be divided into eight regions of equal area. For example, please refer to Figure 4a , Figure 4a This is a schematic diagram of the partitioning of light distribution data of a tolerance analysis method provided in an embodiment of the present application, wherein the red area can represent the light spot generated on the detection surface of the pupil when tracing the light rays of the target optical system, and the black area can represent the background. In this way, the light distribution data can be divided into eight equal areas, namely A1, A2, A3, A4, A5, A6, A7 and A8, so that the total energy of each area can be calculated to obtain the regional total energy of each area.

[0095] There are many ways to calculate at least one energy distribution parameter based on the regional total energy. For example, energy distribution parameters such as pupil ellipticity, pupil polar balance, and numerical aperture corresponding to the target light system can be calculated based on the regional total energy.

[0096] There are many ways to calculate pupil ellipticity based on regional total energy. For example, the following formula (1) can be used to calculate HV ellipticity, and the following formula (2) can be used to calculate ST ellipticity:

[0097]

[0098] Among them, ∑E (A2+A3+A6+A7) It can be expressed as the sum of the total energy of regions A2, A3, A6 and A7, ∑E (A1+A4+A5+A8) It can be expressed as the sum of the total energy of regions A1, A4, A5 and A8, ∑E (A1+A2+A5+A6) It can be expressed as the sum of the total energy of regions A1, A2, A5 and A6, ∑E (A3+A4+A7+A8) It can represent the sum of the total regional energies of A3, A4, A7 and A8.

[0099] There are many ways to calculate the pupil polar balance corresponding to the target light system based on the total regional energy. For example, the pupil polar balance in the X direction (N) can be calculated using the following formula (3): balance_X ), and the pupil polarity balance in the Y direction (N) is calculated using the following equation (4): balannce_Y ):

[0100]

[0101] Among them, E (A1+A2+A7+A8) It can be expressed as the sum of the total energy of the regions A1, A2, A7 and A8, E (A3+A4+A5+A6) It can represent the sum of the total regional energies of A3, A4, A5 and A6, and so on.

[0102] In addition, the pupil polarity balance (N) of the four quadrants at 0° can be calculated using the following formula: balance_quad ):

[0103]

[0104] Among them, max(x1, x2) can be a maximum function, which can represent the maximum value of x1 and x2, min(x1, x2) can be a minimum function, which can represent the minimum value of x1 and x2. E(A1)+E(A2) can represent the addition of the regional total energy of region A1 and the regional total energy of region A2, E(A3)+E(A4) can represent the addition of the regional total energy of region A3 and the regional total energy of region A4, and so on.

[0105] The pupil polarity balance of the four-quadrant 45° can also be calculated using the following formula (N balance_quad_45 ):

[0106]

[0107] In this way, a variety of energy distribution parameters can be calculated based on the total regional energy, which can be used as tolerance analysis results of the target light system.

[0108] In one embodiment, there are multiple ways to perform tolerance analysis based on light distribution data to obtain tolerance analysis results of the target optical system. For example, the light distribution data can be sent to data analysis software connected to optical simulation software; tolerance analysis can be performed based on the light distribution data by the data analysis software to obtain tolerance analysis results of the target optical system under the target tolerance data.

[0109] Among them, through the combined optical simulation software and data analysis software, automated optical analysis and tolerance analysis of the target optical system can be achieved. At the same time, the tolerance analysis results of the optical system are characterized based on various energy distribution-based evaluation indicators of the optical system, which can realize efficient and automated tolerance analysis of the optical system.

[0110] For sensitivity analysis type tolerance analysis, please refer to Figure 4b , Figure 4bIt is a sensitivity analysis flow diagram of a tolerance analysis method provided in an embodiment of the present application. The tolerance variable that needs to be sensitivity analyzed, that is, the target tolerance variable, can be selected in the Lighttools software. Then, the target tolerance variable is transferred to the sensitivity analysis tolerance data table in the Matlab software. The data is processed by the Matlab software to obtain the target tolerance value corresponding to the target tolerance variable. The data in the sensitivity analysis tolerance data table is then transferred to the Lighttools software in sequence, and it is determined whether the i-th data currently transmitted is the last data in the sensitivity analysis tolerance data table. If it is not the last data, the i-th tolerance variable in the sensitivity analysis tolerance data table is transferred to the Lighttools software. The data is transmitted to the Lighttools software, and the Lighttools software adjusts and sets the parameters of each surface or component according to the transmitted tolerance variable data. The Lighttools software then performs ray tracing on the set target optical system, and then the ray tracing data (i.e., light distribution data) of the target optical system is transmitted to the Matlab software, and the pupil characteristic parameters are calculated according to the ray tracing data. After all the pupil characteristic parameters corresponding to the target tolerance variables are calculated, the tolerance analysis results of the target light system based on the target tolerance data can be obtained. Optionally, the analysis completion information can be displayed in the interface of the tolerance analysis platform, and the time consumed by the tolerance analysis process can also be displayed.

[0111] Among them, for the tolerance analysis of the Monte Carlo analysis type, when performing the Monte Carlo analysis, each tolerance variable will generate a series of data that meets the tolerance distribution function according to the set number of tolerance analyses. When performing each Monte Carlo analysis, all tolerance variables of the target optical system will be adjusted relative to the ideal value based on the generated data, and then ray tracing will be performed to analyze the optical characteristics to obtain the corresponding light distribution data. This will be repeated many times until the set number of tolerance analyses is met. Based on the tolerance analysis results, the yield and manufacturability of the target optical system can be analyzed. It simulates the mass production of a batch of products and the distribution of the number of products that meet the index requirements. For example, please refer to Figure 4c , Figure 4c1 is a schematic diagram of a Monte Carlo analysis flow of a tolerance analysis method provided in an embodiment of the present application. In the system parameter setting module of the tolerance analysis platform, the tolerance distribution mode and the number of Monte Carlo analyses (i.e., the number of tolerance analyses) can be set. Then, when performing the Monte Carlo analysis, the tolerance variables and the tolerance range data in the Lighttools software can be transferred to the tolerance range data table in the Matlab software. Then, according to the tolerance distribution function corresponding to the tolerance distribution mode and the number of tolerance analyses, a random number that conforms to the tolerance distribution function (uniform distribution or Gaussian distribution) can be generated for each tolerance variable of the target optical system, and the data can be saved in the Monte Carlo analysis data table. Each set of data in the Monte Carlo analysis data table is transferred to the Lighttools software once. httools software, so that the Lighttools software adjusts and sets various variables in the target optical system according to a set of data received, and then, light tracing is performed through the Lighttools software to obtain the tracing data of the target light system, that is, the light distribution data of the optical system on the detection surface, and the tracing data is transferred to the Matlab software to calculate the energy distribution parameters in the Matlab software, that is, the calculation of the pupil characteristic parameters, to obtain the tolerance analysis results of the set of data, and then, the above process can be repeated to generate a new set of data for subsequent calculation of the pupil characteristic parameters until the analysis that meets the tolerance analysis number is completed, and the tolerance analysis results corresponding to multiple sets of target tolerance data corresponding to the tolerance analysis number are obtained.

[0112] In one embodiment, the analysis result saving and display module can be used to display the tolerance analysis results analyzed by the tolerance analysis module in the result display area. At the same time, the analysis results can be saved and output as an Excel file and saved in a specified path for further optical performance analysis. For example, please refer to Figure 4d , Figure 4d This is a schematic diagram of saving the analysis results of a tolerance analysis method provided in an embodiment of the present application. Before completing the tolerance analysis of the target optical system, you can select the file saving path and the save file name. When the tolerance analysis module completes the analysis task, the tolerance analysis results can be displayed in the result display area, and the analysis file can be saved in a specified file saving path to generate a specified file name.

[0113] Among them, the tolerance analysis results of the sensitivity analysis may include the variable name of the tolerance variable, the variable design value, the variable tolerance data, the pupil ellipticity, the X-direction polar balance, the Y-direction polar balance, the four-quadrant polar balance, the numerical aperture and other calculation results. For example, please refer to Table 1, which is a schematic table of the saved file content of the tolerance analysis results of the sensitivity analysis, in which the first line of the data is the analysis data when no tolerance is set, that is, the design value. Each line represents the change amount of each tolerance item and the impact it brings on the evaluation parameters.

[0114]

[0115] Table 1

[0116] Among them, the tolerance analysis results of Monte Carlo analysis, the corresponding saved file can contain each set of Monte Carlo analysis data, as well as the variation of each tolerance variable. At the same time, it can include the calculation results of pupil ellipticity, X-direction polar balance, Y-direction polar balance, four-quadrant polar balance, numerical aperture, etc. For example, please refer to Table 2, which is a schematic table of the saved file content of the tolerance analysis results of Monte Carlo analysis, in which the data corresponding to the row of data number 1 is the analysis data without tolerance, that is, the design value. A_ele_decentXf, A_ele_decentYf are tolerance items, and each row represents the variation of each tolerance item and the impact it brings on the evaluation parameters.

[0117]

[0118]

[0119] Table 2

[0120] Optionally, for Monte Carlo analysis, yield analysis can also be performed, and the yield can be the ratio of the number of qualified groups to the number of tolerance analysis times. For example, when the tolerance analysis type corresponding to the target tolerance data is the Monte Carlo analysis type, the energy distribution parameters include energy distribution parameters calculated from multiple groups of target tolerance data corresponding to the tolerance analysis times, so that the evaluation values ​​corresponding to each energy distribution parameter can be obtained; based on the energy distribution parameters corresponding to each group of target tolerance data and the evaluation values ​​corresponding to the energy distribution parameters, the number of qualified groups in the target tolerance data that meet the preset qualified conditions is determined; based on the number of qualified groups and the total number of groups of target tolerance data, the yield analysis result of the target optical system in the Monte Carlo analysis is determined.

[0121] The evaluation value may be a preset value, and when the energy distribution parameter is not greater than the corresponding evaluation value, it may indicate that the optical performance of the target optical system meets the design requirements. The preset qualified condition may be that all energy distribution parameters calculated in each group are not greater than the design value, or the deviation range from the design value is within a certain range, etc. The number of qualified groups may be the number of groups in the target tolerance data that meet the preset qualified conditions. The total number of groups may be the number of times the Monte Carlo analysis is performed, that is, the number of groups of the Monte Carlo analysis data table used for the Monte Carlo analysis.

[0122] Among them, the yield analysis tool provided by the tolerance analysis platform can mainly calculate the yield of the tolerance analysis results of Monte Carlo analysis, which is mainly divided into absolute value evaluation and relative value evaluation. Among them, the absolute value evaluation means that all energy distribution parameter indicators are less than or equal to the evaluation value, and the group of analysis data is judged to be qualified, that is, when all energy distribution parameters calculated by a set of target tolerance data are not greater than their corresponding evaluation values, it can be shown that this set of target tolerance data is qualified data. The relative value evaluation means that all energy distribution parameter indicators are within the deviation range, and the group of analysis data is judged to be qualified. The specific evaluation method can be as follows:

[0123] (1-A relative)T design ≤ T pupil ≤ (1+A relative)T design

[0124] Among them, T pupil can be expressed as the value of the energy distribution parameter calculated by tolerance analysis, T design can be a design evaluation value, A relative can be an allowable deviation range, and the numerical range can be [0, 1], etc.

[0125] For example, see Figure 4e , Figure 4e It is a schematic diagram of the yield analysis process of a tolerance analysis method provided in an embodiment of the present application. Absolute value evaluation or relative value evaluation can be selected according to the characteristics of energy distribution parameters, and whether it is an absolute value evaluation can be determined during yield analysis. When it is an absolute value evaluation, a set of evaluation indicators of each pupil characteristic parameter corresponding to a set of target tolerance data can be input, that is, the calculation results of each energy distribution parameter, to determine whether each pupil characteristic parameter in the set of data is less than or equal to the evaluation indicator. If so, the status of the set of data is marked as qualified "true", and the number of qualified groups is calculated. When it is a relative value evaluation, a set of evaluation indicators of each pupil characteristic parameter corresponding to a set of target tolerance data can be input, that is, the calculation results of each energy distribution parameter, to determine whether each pupil characteristic parameter in the set of data is within the range of allowable deviation values. If so, the status of the set of data is marked as qualified "true", and the number of qualified groups is calculated. In this way, the number of qualified groups can be counted, and the yield analysis result under the Monte Carlo analysis corresponding to the target optical system can be obtained according to the ratio between the number of qualified groups and the number of Monte Carlo analyses.

[0126] Among them, when the calculated yield meets a certain ratio, it can be shown that the tolerance provided by the tolerance data is more appropriate, the tolerance analysis result of the target optical system is better, and the optical design of the target optical system is also better. When the calculated yield is low, it can be shown that the set tolerance data is less appropriate, and the tolerance range needs to be reallocated to improve the optical design quality of the target optical system.

[0127] In the existing optical design simulation, it is impossible to perform tolerance analysis based on the evaluation index of the lighting system. In order to achieve efficient tolerance analysis tasks, the embodiment of the present application provides an automated tolerance analysis platform. The platform combines Matlab software and Lighttools software to realize the setting and importing of optical system tolerance range data, sensitivity analysis of each tolerance variable of the optical system, Monte Carlo analysis of the optical system, and calculation of yield. Based on the tolerance analysis platform, tolerance analysis of optical systems such as lighting systems can be quickly performed to complete an optical system that meets the design and is easy to produce. Among them, the embodiment of the present application realizes sensitivity analysis and Monte Carlo analysis of the optical system with energy distribution as the evaluation index, which plays a guiding role in the optical design of the lighting system. In addition, by combining Matlab software and Lighttools software, tolerance analysis can be automatically performed after completing the setting of tolerance variables. At the same time, based on the connection established with the optical simulation software, the optical design parameters can be changed in real time without affecting the tolerance analysis process, which greatly improves the tolerance analysis efficiency of the optical system.

[0128] As can be seen from the above, the embodiment of the present application obtains the target tolerance data corresponding to the target optical system, the target tolerance data includes the tolerance variables used for tolerance analysis and the tolerance values ​​corresponding to the tolerance variables; based on the target tolerance data, the target optical system is set in the optical simulation software; based on the set target optical system, optical simulation processing is performed to obtain light distribution data; tolerance analysis is performed based on the light distribution data to obtain the tolerance analysis result of the target optical system. In this way, by obtaining the target tolerance data required for tolerance analysis of the target optical system, and then setting the target optical system in the optical simulation software according to the target tolerance data, optical simulation processing can be performed on the target optical system after the tolerance setting, and then tolerance analysis can be performed according to the light distribution data obtained by simulation, and optical simulation and tolerance analysis of the optical system can be automatically performed to obtain the tolerance analysis result of the target optical system, thereby realizing efficient tolerance analysis of the optical system and effectively improving the tolerance analysis efficiency of the optical system.

[0129] In order to better implement the tolerance analysis method provided in the embodiment of the present application, the present application also provides a tolerance analysis method, which is applied to a tolerance analysis platform, and the tolerance analysis platform is connected to the optical simulation software and the data analysis software. The meanings of the terms are the same as those in the above tolerance analysis method, and the specific implementation details can refer to the description in the above method embodiment. For example, refer to Figure 5 , Figure 5 : is another flow chart of a tolerance analysis method provided by an embodiment of the present application. The tolerance analysis method may include the following steps:

[0130] Step S201 , receiving a tolerance analysis instruction for a target optical system, triggering data analysis software to obtain target tolerance data, and transmitting the target tolerance data to optical simulation software.

[0131] The tolerance analysis instruction may be an instruction triggered by a user based on a tolerance analysis platform and used to perform tolerance analysis on a target optical system.

[0132] In one embodiment, the tolerance analysis method provided in the embodiment of the present application can be applied to the tolerance analysis platform provided in the embodiment of the present application. The tolerance analysis platform can combine optical simulation software and data analysis software to realize automated optical analysis and tolerance analysis of the target optical system, thereby realizing efficient and automated tolerance analysis of the optical system. For example, please refer to Figure 3a , the tolerance analysis platform can be composed of six modules: system parameter setting module, tolerance setting module, tolerance import module, tolerance analysis module, analysis result storage and display module, and yield analysis tool. Among them, the system parameter setting module includes the Lighttools connection parameter setting submodule and the tolerance analysis related setting submodule. The Lighttools connection parameter setting submodule is mainly used to set the information acquisition entry. According to this setting entry, the data analysis software (such as Matlab) can be correctly connected with the optical simulation software (such as Lighttools) to import the tolerance data set subsequently into the Lighttools software. At the same time, according to the information acquisition entry set by this module, the data simulated in the optical simulation can be obtained, so that the optical simulation data can be processed for tolerance analysis in the Matlab software.

[0133] Step S202, based on the target tolerance data, the target optical system is set by optical simulation software, and optical simulation processing is performed based on the set target optical system to obtain light distribution data, and the light distribution data is transmitted to the data analysis software.

[0134] Among them, in the optical simulation software, based on the tolerance value corresponding to each tolerance variable in the target tolerance data, the tolerances of each surface and component corresponding to the target optical system in the optical simulation software can be set to adjust the parameters of each surface and component in the target optical system, so as to judge the influence of the parameters of each surface and component in the target optical system on the optical performance of the optical system based on the tolerance analysis results, so as to better design and optimize the optical system and obtain an optical system with better optical performance and more stability.

[0135] Step S203, performing tolerance analysis based on the light distribution data by using data analysis software to obtain tolerance analysis results of the target optical system under the target tolerance data.

[0136] In order to better implement the tolerance analysis method provided in the embodiment of the present application, the embodiment of the present application also provides a device based on the tolerance analysis method. The meanings of the terms are the same as those in the tolerance analysis method, and the specific implementation details can refer to the description in the method embodiment.

[0137] For example, Figure 6 As shown, it is a schematic diagram of the structure of the tolerance analysis device provided in the embodiment of the present application. The tolerance analysis device may include a data acquisition module 301, a data setting module 302, an optical simulation module 303 and a tolerance analysis module 304, as follows:

[0138] A data acquisition module 301 is used to acquire target tolerance data corresponding to a target optical system, wherein the target tolerance data includes tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables;

[0139] A data setting module 302 is used to set the target optical system in the optical system simulation software based on the target tolerance data;

[0140] The optical simulation module 303 is used to perform optical simulation processing based on the set target optical system to obtain light distribution data;

[0141] The tolerance analysis module 304 is used to perform tolerance analysis based on the light distribution data to obtain tolerance analysis results of the target optical system.

[0142] In one embodiment, the tolerance analysis module 304 includes:

[0143] A parameter calculation submodule, used to calculate at least one energy distribution parameter based on the light distribution data;

[0144] The analysis result determination submodule is used to determine the tolerance analysis result of the target optical system under the target tolerance data according to the energy distribution parameters.

[0145] In one embodiment, the energy distribution parameter includes at least one of pupil ellipticity, pupil polarity balance, and numerical aperture.

[0146] In one embodiment, the parameter calculation submodule is used to:

[0147] Dividing the light distribution data into regions to obtain light distribution data of multiple regions;

[0148] Calculate the total regional energy of the light distribution data of each area;

[0149] At least one energy distribution parameter is calculated based on the total energy of the region.

[0150] In one embodiment, the tolerance analysis module 304 is used to:

[0151] sending the light distribution data to data analysis software connected to the optical simulation software;

[0152] The tolerance analysis is performed based on the light distribution data through data analysis software to obtain the tolerance analysis results of the target optical system under the target tolerance data.

[0153] In one embodiment, the data acquisition module 301 includes:

[0154] A first acquisition submodule is used to acquire tolerance data corresponding to the target optical system, where the tolerance data includes tolerance variables configured for the target optical system and tolerance range data corresponding to the tolerance variables;

[0155] An analysis type determination submodule, used to determine a tolerance analysis type for a target optical system, where the tolerance analysis type includes at least one of sensitivity analysis and Monte Carlo analysis;

[0156] The second acquisition submodule is used to acquire target tolerance data based on the tolerance analysis type and the tolerance data.

[0157] In one embodiment, the second acquisition submodule is used to:

[0158] When the tolerance analysis type is a sensitivity analysis type, determine the target tolerance variable that needs to be subjected to sensitivity analysis in the target optical system;

[0159] Based on the tolerance data, the maximum value and the minimum value of the tolerance range data corresponding to the target tolerance variable are obtained to obtain the target tolerance value corresponding to the target tolerance variable;

[0160] Target tolerance data is determined based on the target tolerance variable and the target tolerance value.

[0161] In one embodiment, the second acquisition submodule includes:

[0162] A random number acquisition unit, used for acquiring a plurality of random tolerance values ​​corresponding to the tolerance variables based on the tolerance data when the tolerance analysis type is a Monte Carlo analysis type, wherein the random tolerance values ​​are random numbers within the numerical range of the tolerance range data corresponding to the tolerance variables;

[0163] The data determination unit is used to determine multiple groups of target tolerance data corresponding to the target optical system based on the tolerance variables and multiple random tolerance values ​​corresponding to the tolerance variables.

[0164] In one embodiment, the random number acquisition unit is used to:

[0165] Determine the preset tolerance analysis times and tolerance distribution function;

[0166] Based on the tolerance distribution function, the number of tolerance analyses and the tolerance range data, multiple random numbers corresponding to the tolerance variable are generated as multiple random tolerance values ​​corresponding to the tolerance variable, wherein the number of random tolerance values ​​corresponding to the tolerance variable is the same as the number of tolerance analyses, and the random tolerance values ​​are within the numerical range of the tolerance range data of the tolerance variable.

[0167] In one embodiment, when the tolerance analysis type corresponding to the target tolerance data is a Monte Carlo analysis type, the energy distribution parameters include multiple sets of energy distribution parameters corresponding to the target tolerance data, and the tolerance analysis device further includes a yield analysis module for:

[0168] Obtaining evaluation values ​​corresponding to each energy distribution parameter;

[0169] Determine the number of qualified groups in the target tolerance data that meet preset qualified conditions based on the energy distribution parameters corresponding to each group of target tolerance data and the evaluation values ​​corresponding to the energy distribution parameters;

[0170] The yield analysis result of the target optical system in the Monte Carlo analysis is determined based on the number of qualified groups and the total number of groups of target tolerance data.

[0171] As can be seen from the above, the embodiment of the present application obtains the target tolerance data corresponding to the target optical system through the data acquisition module 301, and the target tolerance data includes the tolerance variables used for tolerance analysis and the tolerance values ​​corresponding to the tolerance variables; the data setting module 302 sets the target optical system in the optical simulation software based on the target tolerance data; the optical simulation module 303 performs optical simulation processing based on the set target optical system to obtain light distribution data; the tolerance analysis module 304 performs tolerance analysis based on the light distribution data to obtain the tolerance analysis result of the target optical system. In this way, by obtaining the target tolerance data required for tolerance analysis of the target optical system, and then setting the target optical system in the optical simulation software according to the target tolerance data, the target optical system after the tolerance setting can be optically simulated, and then the tolerance analysis can be performed according to the light distribution data obtained by the simulation, so that the optical simulation and tolerance analysis of the optical system can be automatically performed, and the tolerance analysis result of the target optical system can be obtained, so as to realize efficient tolerance analysis of the optical system and effectively improve the tolerance analysis efficiency of the optical system.

[0172] Accordingly, the present application also provides an electronic device, such as Figure 7 As shown, Figure 7A schematic diagram of the structure of an electronic device provided in an embodiment of the present application. The electronic device 400 includes a processor 401 having one or more processing cores, a memory 402 having one or more computer-readable storage media, and a computer program stored in the memory 402 and executable on the processor. The processor 401 is electrically connected to the memory 402. Those skilled in the art will appreciate that the electronic device structure shown in the figure does not constitute a limitation on the electronic device, and may include more or fewer components than shown, or combine certain components, or arrange components differently.

[0173] The processor 401 is the control center of the electronic device 400, and uses various interfaces and lines to connect various parts of the entire electronic device 400, and executes various functions and processes data of the electronic device 400 by running or loading software programs and / or units stored in the memory 402, and calling data stored in the memory 402. The processor 401 can be a processor CPU, a graphics processor GPU, a network processor (Network Processor, NP), etc., and can implement or execute the various methods, steps and logic block diagrams disclosed in the embodiments of the present application.

[0174] In the embodiment of the present application, the processor 401 in the electronic device 400 will load instructions corresponding to the processes of one or more application programs into the memory 402 according to the following steps, and the processor 401 will run the application programs stored in the memory 402 to implement various functions, such as:

[0175] Obtain target tolerance data corresponding to the target optical system, the target tolerance data including tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables; set the target optical system in optical simulation software based on the target tolerance data; perform optical simulation processing based on the set target optical system to obtain light distribution data; perform tolerance analysis based on the light distribution data to obtain tolerance analysis results of the target optical system.

[0176] Furthermore, various functions implemented by running the application stored in the memory 402 can also be found in the description of the aforementioned embodiments, which will not be repeated here.

[0177] The specific implementation of the above operations can be found in the previous embodiments, which will not be described in detail here.

[0178] Optional, such as Figure 7As shown, the electronic device 400 further includes: a touch screen 403, a radio frequency circuit 404, an audio circuit 405, an input unit 406, and a power supply 407. The processor 401 is electrically connected to the touch screen 403, the radio frequency circuit 404, the audio circuit 405, the input unit 406, and the power supply 407, respectively. Those skilled in the art can understand that Figure 7 The electronic device structure shown in the figure does not constitute a limitation of the electronic device, and may include more or less components than shown in the figure, or combine certain components, or arrange the components differently.

[0179] The touch display screen 403 can be used to display a graphical user interface and receive operation instructions generated by the user acting on the graphical user interface. The touch display screen 403 may include a display panel and a touch panel. Among them, the display panel may be used to display information input by the user or information provided to the user and various graphical user interfaces of the electronic device, and these graphical user interfaces may be composed of graphics, text, icons, videos and any combination thereof. Optionally, the display panel may be configured in the form of a liquid crystal display (LCD, Liquid Crystal Display), an organic light-emitting diode (OLED, Organic Light-Emitting Diode) and the like. The touch panel may be used to collect the user's touch operation on or near it (such as the user using any suitable object or attachment such as a finger, a stylus, etc. on the touch panel or near the touch panel), and generate corresponding operation instructions, and the operation instructions execute corresponding programs. Optionally, the touch panel may include two parts, a touch detection device and a touch controller. Among them, the touch detection device detects the user's touch orientation, detects the signal brought by the touch operation, and transmits the signal to the touch controller; the touch controller receives the touch information from the touch detection device, converts it into the touch point coordinates, and then sends it to the processor 401, and can receive the command sent by the processor 401 and execute it. The touch panel can cover the display panel. When the touch panel detects a touch operation on or near it, it is transmitted to the processor 401 to determine the type of touch event, and then the processor 401 provides a corresponding visual output on the display panel according to the type of touch event. In an embodiment of the present application, the touch panel and the display panel can be integrated into the touch display screen 403 to realize the input and output functions. However, in some embodiments, the touch panel and the touch panel can be used as two independent components to realize the input and output functions. That is, the touch display screen 403 can also be used as a part of the input unit 406 to realize the input function.

[0180] The radio frequency circuit 404 may be used to send and receive radio frequency signals, so as to establish wireless communication with a network device or other electronic devices through wireless communication, and to send and receive signals with the network device or other electronic devices.

[0181] The audio circuit 405 can be used to provide an audio interface between the user and the electronic device through a speaker and a microphone. The audio circuit 405 can transmit the electrical signal converted from the received audio data to the speaker, which is converted into a sound signal for output; on the other hand, the microphone converts the collected sound signal into an electrical signal, which is received by the audio circuit 405 and converted into audio data, and then the audio data is output to the processor 401 for processing, and then sent to another electronic device through the radio frequency circuit 404, or the audio data is output to the memory 402 for further processing. The audio circuit 405 may also include an earplug jack to provide communication between an external headset and an electronic device.

[0182] The input unit 406 may be used to receive input target video and generate keyboard, mouse, joystick, optical or trackball signal input related to user settings and function control.

[0183] The power supply 407 is used to supply power to various components of the electronic device 400. Optionally, the power supply 407 can be logically connected to the processor 401 through a power management system, so that the power management system can manage charging, discharging, and power consumption. The power supply 407 can also include one or more DC or AC power supplies, recharging systems, power failure detection circuits, power converters or inverters, power status indicators, and other arbitrary components.

[0184] although Figure 7 Not shown, the electronic device 400 may also include a camera, a sensor, a wireless fidelity module, a Bluetooth module, etc., which will not be described in detail here.

[0185] In the above embodiments, the description of each embodiment has its own emphasis. For parts not described in detail in a certain embodiment, please refer to the relevant description of other embodiments. It should be noted that the electronic device provided in the embodiment of the present application and the tolerance analysis method in the above embodiment belong to the same concept. The specific implementation process is detailed in the above method embodiment, which will not be repeated here.

[0186] As can be seen from the above, the electronic device provided in the embodiment of the present application can obtain the target tolerance data corresponding to the target optical system, the target tolerance data includes the tolerance variables used for tolerance analysis and the tolerance values ​​corresponding to the tolerance variables; based on the target tolerance data, the target optical system is set in the optical simulation software; based on the set target optical system, optical simulation processing is performed to obtain light distribution data; based on the light distribution data, tolerance analysis is performed to obtain the tolerance analysis result of the target optical system. In this way, by obtaining the target tolerance data required for tolerance analysis of the target optical system, and then setting the target optical system in the optical simulation software according to the target tolerance data, optical simulation processing can be performed on the target optical system after the tolerance is set, and then tolerance analysis can be performed according to the light distribution data obtained by simulation, and optical simulation and tolerance analysis of the optical system can be automatically performed to obtain the tolerance analysis result of the target optical system, thereby realizing efficient tolerance analysis of the optical system and effectively improving the tolerance analysis efficiency of the optical system.

[0187] A person of ordinary skill in the art will appreciate that all or part of the steps in the various methods of the above embodiments may be completed by instructions, or by controlling related hardware through instructions. The instructions may be stored in a computer-readable storage medium and loaded and executed by a processor.

[0188] To this end, an embodiment of the present application provides a computer-readable storage medium, which includes a computer program. When the computer program is run on an electronic device, the computer program is used to enable the electronic device to perform any tolerance analysis method provided in the embodiment of the present application. For example, the computer program can perform the following steps of the tolerance analysis method:

[0189] Obtain target tolerance data corresponding to the target optical system, the target tolerance data including tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables; set the target optical system in optical simulation software based on the target tolerance data; perform optical simulation processing based on the set target optical system to obtain light distribution data; perform tolerance analysis based on the light distribution data to obtain tolerance analysis results of the target optical system.

[0190] Furthermore, for the detailed steps of the above method steps, reference can be made to the description in the above embodiments, which will not be repeated here.

[0191] The specific implementation of the above operations can be found in the previous embodiments, which will not be described in detail here.

[0192] The computer-readable storage medium may include: a read-only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk, etc.

[0193] Since the computer program stored in the computer-readable storage medium can execute any tolerance analysis method provided in the embodiments of the present application, the beneficial effects that can be achieved by any tolerance analysis method provided in the embodiments of the present application can be achieved. Please refer to the previous embodiments for details and will not be repeated here.

[0194] According to one aspect of the present application, a computer program product is also provided, including a computer program, which is stored in a computer-readable storage medium; when a processor of an electronic device reads the computer program from the computer-readable storage medium, the processor executes the computer program, so that the electronic device executes the methods provided in various optional implementations of the above embodiments.

[0195] In the above tolerance analysis device, computer-readable storage medium, electronic device, and computer program product embodiments, the description of each embodiment has its own emphasis. For parts not described in detail in a certain embodiment, reference can be made to the relevant description of other embodiments. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working process and beneficial effects of the tolerance analysis device, computer-readable storage medium, computer program product, electronic device, and corresponding units described above can refer to the description of the tolerance analysis method in the above embodiment, and will not be repeated here.

[0196] The embodiment of the present application also provides a system, which includes a tolerance analysis platform, optical simulation software and data analysis software, the optical simulation software and the data analysis software are connected based on the tolerance analysis platform, or the above-mentioned tolerance analysis device, or the above-mentioned electronic device, or the above-mentioned storage medium, or the above-mentioned computer program product. The specific structure of the system is not limited in this application. The specific implementation methods of the above operations of the electronic device and the corresponding beneficial effects are also applicable to the system. For details, please refer to the detailed description of the above-mentioned embodiment, which will not be repeated here.

[0197] The above is a detailed introduction to a tolerance analysis method, device, electronic device, computer-readable storage medium, computer program product and system provided in the embodiments of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea; at the same time, for technical personnel in this field, according to the ideas of the present application, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A tolerance analysis method, characterized in that: include: Acquire target tolerance data corresponding to the target optical system, wherein the target tolerance data includes tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables; Based on the target tolerance data, setting the target optical system in optical simulation software; Perform optical simulation processing based on the set target optical system to obtain light distribution data; Tolerance analysis is performed based on the light distribution data to obtain a tolerance analysis result of the target optical system.

2. The tolerance analysis method according to claim 1, characterized in that: The performing tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system includes: Calculating at least one energy distribution parameter based on the light distribution data; A tolerance analysis result of the target optical system under the target tolerance data is determined according to the energy distribution parameter.

3. The tolerance analysis method according to claim 2, characterized in that: The energy distribution parameter includes at least one of pupil ellipticity, pupil polar balance and numerical aperture.

4. The tolerance analysis method according to claim 2, characterized in that: The calculating at least one energy distribution parameter based on the light distribution data comprises: Dividing the light distribution data into regions to obtain light distribution data of multiple regions; Calculate the total regional energy of the light distribution data of each area; At least one energy distribution parameter is calculated based on the total energy of the region.

5. The tolerance analysis method according to claim 1, characterized in that: The performing tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system includes: sending the light distribution data to a data analysis software connected to the optical simulation software; The data analysis software performs tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system under the target tolerance data.

6. The tolerance analysis method according to any one of claims 1 to 5, characterized in that: The step of obtaining target tolerance data corresponding to the target optical system includes: Acquire tolerance data corresponding to a target optical system, wherein the tolerance data includes tolerance variables configured for the target optical system and tolerance range data corresponding to the tolerance variables; Determine a tolerance analysis type for a target optical system, wherein the tolerance analysis type includes at least one of a sensitivity analysis and a Monte Carlo analysis; Based on the tolerance analysis type and the tolerance data, target tolerance data is acquired.

7. The tolerance analysis method according to claim 6, characterized in that: The step of acquiring target tolerance data based on the tolerance analysis type and the tolerance data includes: When the tolerance analysis type is a sensitivity analysis type, determining a target tolerance variable that needs to be subjected to sensitivity analysis in the target optical system; Based on the tolerance data, obtaining the maximum value and the minimum value of the tolerance range data corresponding to the target tolerance variable, and obtaining the target tolerance value corresponding to the target tolerance variable; Target tolerance data is determined based on the target tolerance variable and the target tolerance value.

8. The tolerance analysis method according to claim 6, characterized in that: The step of acquiring target tolerance data based on the tolerance analysis type and the tolerance data includes: When the tolerance analysis type is a Monte Carlo analysis type, based on the tolerance data, a plurality of random tolerance values ​​corresponding to the tolerance variables are obtained, wherein the random tolerance values ​​are random numbers within a numerical range of the tolerance range data corresponding to the tolerance variables; Based on the tolerance variables and a plurality of random tolerance values ​​corresponding to the tolerance variables, a plurality of groups of target tolerance data corresponding to the target optical system are determined.

9. The tolerance analysis method according to claim 8, characterized in that: The step of obtaining a plurality of random tolerance values ​​corresponding to the tolerance variable based on the tolerance data includes: Determine the preset tolerance analysis times and tolerance distribution function; Based on the tolerance distribution function, the tolerance analysis times and the tolerance range data, a plurality of random numbers corresponding to the tolerance variable are generated as a plurality of random tolerance values ​​corresponding to the tolerance variable, wherein the number of random tolerance values ​​corresponding to the tolerance variable is the same as the tolerance analysis times, and the random tolerance values ​​are within the numerical range of the tolerance range data of the tolerance variable.

10. The tolerance analysis method according to claim 2, characterized in that: When the tolerance analysis type corresponding to the target tolerance data is a Monte Carlo analysis type, the energy distribution parameter includes multiple sets of energy distribution parameters corresponding to the target tolerance data, and after calculating at least one energy distribution parameter based on the light distribution data, the method further includes: Obtaining evaluation values ​​corresponding to each of the energy distribution parameters; Determining the number of qualified groups in the target tolerance data that meet preset qualified conditions based on the energy distribution parameters corresponding to each group of the target tolerance data and the evaluation values ​​corresponding to the energy distribution parameters; A yield analysis result of the target optical system in a Monte Carlo analysis is determined according to the number of qualified groups and the total number of groups of the target tolerance data.

11. A tolerance analysis method, characterized in that: Applied to a tolerance analysis platform, the tolerance analysis platform is connected with optical simulation software and data analysis software, the method comprises: receiving a tolerance analysis instruction for a target optical system, triggering the data analysis software to obtain target tolerance data, and transmitting the target tolerance data to the optical simulation software; Based on the target tolerance data, the target optical system is set by optical simulation software, and optical simulation processing is performed on the set target optical system to obtain light distribution data, and the light distribution data is transmitted to the data analysis software; By using the data analysis software, tolerance analysis is performed based on the light distribution data to obtain a tolerance analysis result of the target optical system under the target tolerance data.

12. A tolerance analysis device, characterized in that: include: A data acquisition module, used for acquiring target tolerance data corresponding to the target optical system, wherein the target tolerance data includes tolerance variables used for tolerance analysis and tolerance values ​​corresponding to the tolerance variables; A data setting module, used for setting the target optical system in the optical system simulation software based on the target tolerance data; An optical simulation module is used to perform optical simulation processing based on the set target optical system to obtain light distribution data; The tolerance analysis module is used to perform tolerance analysis based on the light distribution data to obtain a tolerance analysis result of the target optical system.

13. An electronic device, characterized in that: The method comprises a processor and a memory, wherein the memory stores a computer program, and when the computer program is executed by the processor, the processor executes the steps of any one of the methods of claims 1 to 11.

14. A computer-readable storage medium, characterized in that: The method comprises a computer program. When the computer program is run on an electronic device, the computer program is used to enable the electronic device to execute the steps of any one of the methods of claims 1 to 11.

15. A system, characterized in that: The system includes a tolerance analysis platform, optical simulation software and data analysis software, wherein the optical simulation software and the data analysis software are connected based on the tolerance analysis platform, or the tolerance analysis device as claimed in claim 12, or the electronic device as claimed in claim 13, or the computer-readable storage medium as claimed in claim 14.

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