A continuous collaborative modular photocatalytic assisted chemical mechanical polishing device and method

By designing a continuous collaborative operation modular photocatalytic assisted chemical mechanical polishing device, the photocatalytic reaction and mechanical polishing are alternated at high frequency, which solves the problem that photocatalysis and mechanical polishing are difficult to perform simultaneously in the prior art, and improves the polishing efficiency and process simplification.

CN119839764BActive Publication Date: 2025-06-06ZHEJIANG UNIV OF TECH
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Patent Information

Application Number
CN202510337365.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-03-21
Publication Date
2025-06-06
Estimated Expiration
2045-03-21

AI Technical Summary

Technical Problem

In the existing photocatalytic assisted chemical mechanical polishing technology, photocatalytic reaction and mechanical polishing are difficult to carry out simultaneously, resulting in high process complexity and reduced photochemical corrosion efficiency.

Method used

A continuous collaborative operation modular photocatalytic assisted chemical mechanical polishing device is designed, and the photocatalytic reaction and mechanical polishing are alternating at high frequency through modular mechanical polishing head and adjustable ultraviolet lamp illumination device.

Benefits of technology

The simultaneous execution of photocatalytic chemical corrosion and mechanical polishing is achieved, the polishing efficiency is improved, the process flow is simplified, and the polishing processing requirements of different materials are adapted.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention discloses a continuous collaborative modular photocatalytic assisted chemical mechanical polishing device and method; the device includes a machine tool, a modular mechanical polishing module, an adjustable ultraviolet lamp irradiation module and a polishing installation module. The modular mechanical polishing module is clamped on the main shaft of the machine tool. The modular mechanical polishing module includes a plurality of modular blades arranged in sequence along the circumference of the main shaft. The present invention arranges an ultraviolet lamp above the blade-shaped polishing structure so that the ultraviolet light emitted by the ultraviolet lamp can be irradiated onto the polishing liquid and the sample through the gaps between the polishing blades, thereby inducing photocatalytic assisted chemical corrosion, realizing the simultaneous execution of photocatalytic chemical corrosion and mechanical polishing, avoiding the complicated operation of first placing the sample in a photocatalytic device for treatment and then placing it in a mechanical polishing machine for processing in the prior art, and improving the polishing efficiency. At the same time, the present invention reduces the diameter of the slot disk on which the modular blades are installed by interlocking the inner ends of adjacent modular blades.
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Description

Technical Field

[0001] The present invention belongs to the technical field of photocatalytically assisted chemical polishing, and in particular relates to a continuous collaborative modular photocatalytically assisted chemical mechanical polishing device and method. Background Art

[0002] Photocatalytic assisted chemical mechanical polishing is an ultra-precision machining method that combines photocatalytic technology and chemical mechanical polishing technology. This method uses the strong oxidant produced by the photocatalytic reaction to enhance the material removal efficiency, thereby achieving efficient and low-damage polishing of the material surface. Compared with the existing more mature chemical mechanical polishing methods, photocatalytic assisted chemical mechanical polishing has added a new important influencing factor due to the introduction of a catalytic ultraviolet lamp, which has an all-round impact on the original chemical mechanical polishing process.

[0003] Since the polishing head of the mechanical polishing equipment will block the ultraviolet light, it is difficult to carry out the photocatalytic reaction and mechanical polishing at the same time; most of the existing technologies first chemically corrode the sample under ultraviolet light in the photocatalytic equipment, and then take out the sample and place it in the mechanical polishing equipment for polishing; on the one hand, this method will cause the photocatalytic assisted chemical mechanical polishing operation to require two or more sample clampings, which increases the complexity of the process; on the other hand, the step-by-step process requires one-time photochemical corrosion, but as the depth of the pores produced by the chemical reaction increases, the efficiency of the photochemical reaction will significantly decrease, so the one-time photochemical corrosion requires a longer reaction time. Therefore, it is urgent to design a new photocatalytic assisted chemical mechanical polishing device that can effectively combine photocatalytic technology and chemical mechanical polishing technology, so that the photocatalytic reaction and mechanical polishing can be alternated and carried out at a high frequency, and polishing experiments can be carried out on samples of various materials to achieve process optimization. Summary of the invention

[0004] The present invention provides a continuous collaborative modular photocatalytically assisted chemical mechanical polishing device and method. The mechanical polishing head with modular design can be clamped by the tool handle of various types of CNC milling machines; the adjustable ultraviolet light irradiation device can adapt to the vertical spindle external structure of various types of CNC milling machines by adjusting the height and width; the chassis is fixed by the table top groove provided by the workbench, and the vacuum adsorption plate inside it can be fixed with different types of trays to achieve the function of quick release. The continuous collaborative modular photocatalytically assisted chemical mechanical polishing device and method provided by the present invention can complete photocatalytically assisted chemical mechanical polishing by quickly modifying the existing CNC milling machine. It has a simple structure, strong compatibility, and low use cost, and has a high application value in the field of photocatalytically assisted chemical mechanical polishing.

[0005] In the first aspect, the present invention provides a continuous collaborative modular photocatalytic assisted chemical mechanical polishing device, which includes a machine tool, a modular mechanical polishing module, an adjustable ultraviolet lamp irradiation module and a polishing installation module. The machine tool is provided with a main shaft and a workbench capable of relative translation in three degrees of freedom. The polishing installation module is installed on the workbench of the machine tool for installing a sample. The modular mechanical polishing module is clamped on the main shaft of the machine tool. The modular mechanical polishing module includes a plurality of modular blades arranged in sequence along the circumference of the main shaft. The adjustable ultraviolet lamp irradiation module includes an ultraviolet lamp installed above the modular blades and arranged downward. During the polishing process, the main shaft drives the modular blades to rotate to polish the sample, and the ultraviolet light emitted by the ultraviolet lamp is irradiated into the polishing liquid where the sample is located through the gaps between different modular blades, thereby promoting a photocatalytic reaction on the surface of the sample.

[0006] Preferably, the modular mechanical polishing module also includes a groove plate and a pressure plate. An installation groove body is provided on the bottom surface of the groove plate. The installation groove body includes a central circular groove and a plurality of radial groove bodies. The radial groove bodies are arranged in sequence along the circumference of the central circular groove. The inner end of each radial groove body is connected to the central circular groove; the outer end of each radial groove body is connected to the outer circumferential surface of the groove plate; modular blades are embedded in some or all of the radial groove bodies. The modular blades include a blade part and a plug-in part. The plug-in part includes a circumferential limit section and a radial limit section. The circumferential limit section is embedded in the radial groove body of the groove plate. The radial limit section is embedded in the central circular groove of the groove plate. The two side walls of the radial groove body provide circumferential limit for the circumferential limit section of the modular blade. The circumferential side wall of the central circular groove provides radial limit for the radial limit section of the modular blade.

[0007] Preferably, the circumferential angle of the central circular groove occupied by the radial limit segment is greater than 360° / n and less than or equal to 720° / n. n is the number of radial slot bodies; the modular blades have two different types, namely, off-type modular blades and cannulated modular blades. The radial limit segment structures of the off-type modular blades and cannulated modular blades are different. The radial limit segments of both the off-type modular blades and cannulated modular blades include a solid part and an empty slot part that are alternately arranged in sequence along the axial direction of the slot disk. The thickness and arrangement position of the solid part and the empty slot part in the off-type modular blade and the cannulated modular blade are opposite. The same type of modular blades cannot be installed in adjacent radial slot bodies. In two modular blades installed in adjacent radial slot bodies, the solid part and the empty slot part of the radial limit segment are interlocked with each other.

[0008] Preferably, the modular mechanical polishing module further comprises a rotating rod. The top end of the rotating rod is clamped on the main shaft of the machine tool. The center holes of the groove plate and the pressure plate are both connected to the rotating rod by threads. The top surface of the groove plate is positioned by a shoulder on the rotating rod.

[0009] Preferably, an annular groove body is formed between the circumferential side surface of the central circular groove and the outer circumferential surface of the rotating rod.

[0010] Preferably, the modular blade material is made of elastic material, preferably glass fiber reinforced ABS resin; a layer of consolidated abrasive grains is attached to the bottom edge of the modular blade material to achieve flexible polishing.

[0011] Preferably, the bottom edge of one side of the blade part of the modular blade is provided with a downwardly inclined inclined surface structure. The orientation of the inclined surface structures on all modular blades is consistent with the rotation direction of the main axis during the polishing process.

[0012] Preferably, the adjustable ultraviolet lamp irradiation module further comprises a connecting bracket made of profiles; the connecting bracket is fixed on a frame of the machine tool; one or more ultraviolet lamps are mounted on the connecting bracket and the height thereof can be adjusted.

[0013] Preferably, the polishing installation module comprises a liquid collection tray and a quick-detachable vacuum adsorption chassis. The bottom of the quick-detachable vacuum adsorption chassis is fixed on the workbench of the machine tool. The bottom surface of the liquid collection tray is adsorbed and fixed on the quick-detachable vacuum adsorption chassis. The liquid collection tray is provided with one or more grooves for mounting the sample.

[0014] By loading different samples into the liquid collection tray, photocatalytically assisted chemical mechanical polishing tests of multiple different materials can be performed simultaneously.

[0015] In a second aspect, the present invention provides a continuous collaborative modular photocatalytically assisted chemical mechanical polishing method, which uses the aforementioned continuous collaborative modular photocatalytically assisted chemical mechanical polishing device. The photocatalytically assisted chemical mechanical polishing method comprises the following steps:

[0016] Mount the specimen on the polishing mounting module and immerse the workpiece with polishing liquid;

[0017] The ultraviolet light emitted by the ultraviolet lamp irradiates the polishing liquid and the workpiece through the gaps of different modular blades, and performs photocatalytically assisted chemical pre-etching on the surface of the workpiece.

[0018] The machine tool drives the modular blades to press against the polished surface of the sample; the main shaft of the machine tool drives the modular blades of the polishing installation module to rotate; as the modular blades rotate, photocatalytic reaction and mechanical polishing continue to alternate at different positions of the polished surface of the sample.

[0019] Preferably, the number of modular blades and the spindle speed are adjusted according to the photocatalytically assisted chemical mechanical polishing conditions; the photocatalytically assisted chemical mechanical polishing conditions include the number of polishing times per unit time, the ratio of the mechanical polishing time to the photocatalytic reaction time, and the photocatalytic reaction time before a single polishing. The more modular blades there are, the greater the ratio of the mechanical polishing time to the photocatalytic reaction time, and the shorter the photocatalytic reaction time before a single polishing.

[0020] Compared with the prior art, the present invention has the following beneficial effects:

[0021] 1. The present invention arranges an ultraviolet lamp above the blade-shaped polishing structure, so that the ultraviolet light emitted by the ultraviolet lamp can be irradiated onto the polishing liquid and the sample through the gaps between the polishing blades, thereby inducing photocatalytic-assisted chemical corrosion, realizing the simultaneous execution of photocatalytic chemical corrosion and mechanical polishing, and avoiding the complicated operation of first placing the sample in a photocatalytic device for treatment and then placing it in a mechanical polishing machine for processing in the prior art.

[0022] 2. In the present invention, "photocatalytic chemical corrosion before the blade passes" and "mechanical polishing when the blade passes" occur alternately at high frequencies at different positions of the sample during the polishing process. This polishing method can quickly remove the part of the sample with pores caused by photochemical corrosion by mechanical polishing, avoiding the problem of limited corrosion depth of the sample surface by photochemical corrosion in the prior art of "photocatalytic reaction first and then mechanical polishing", thereby significantly improving the polishing efficiency.

[0023] 3. The present invention provides off-type modular blades and step-type modular blades whose inner ends of the plug-in parts can be nested with each other, so that while the inner ends of the modular blades have sufficient radial limiting structural width, the diameter of the groove disk on which the modular blades are installed is significantly reduced, the shading area of ​​the modular mechanical polishing module is reduced, and the efficiency of the photocatalytic reaction is improved.

[0024] 4. The present invention can conveniently adjust the number of polishing times per unit time, the ratio of mechanical polishing time to photocatalytic reaction time by adjusting the number and position of modular blades installed on the slot plate, thereby finely adjusting the process of photocatalytically assisted chemical mechanical polishing to meet the polishing processing requirements of different materials.

[0025] 5. The present invention utilizes a connecting bracket with a long groove, in conjunction with a corner bracket, to achieve widely compatible fixation of the ultraviolet lamp irradiation device to the external structure of the spindle of different types of vertical CNC milling machines, and supports adjustment of the distance from the ultraviolet lamp to the polishing liquid surface, thereby achieving control of the photocatalytic auxiliary effect.

[0026] 6. The present invention utilizes a chassis with a vacuum adsorption function to achieve effective fixation and rapid disassembly of liquid collection trays of different specifications, which helps to develop and use liquid collection trays of specific specifications to adapt to samples of different sizes and materials, so as to realize the process exploration of photocatalytic assisted chemical mechanical polishing technology in various application fields. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0028] Figure 2 It is an exploded schematic diagram of the modular mechanical polishing module in the present invention.

[0029] Figure 3 It is a schematic diagram of the structure of the off-type modular blade in the present invention.

[0030] Figure 4 Schematic diagram of installing different numbers of modular blades in the modular mechanical polishing module of the present invention (part (a) corresponds to the case where all 12 radial grooves are filled, part (b) corresponds to the case where radial grooves No. 1, 2, 4, 5, 7, 8, 10, and 11 are filled, part (c) corresponds to the case where radial grooves No. 1, 2, 5, 6, 9, and 10 are filled, and part (d) corresponds to the case where radial grooves No. 3, 6, 7, and 12 are filled).

[0031] Figure 5 It is a schematic diagram of the adjustable ultraviolet lamp irradiation module in the present invention.

[0032] Figure markings: 1. milling machine; 2. modular mechanical polishing module; 3. adjustable ultraviolet lamp irradiation module; 4. liquid collection tray; 5. quick-release vacuum adsorption chassis; 2-1. rotating rod; 2-2. groove plate; 2-2-1. radial groove body; 2-3. pressure plate; 2-4. off-type modular blade; 2-5. cang type modular blade; 2-6. blade part; 2-7. circumferential limit section; 2-8. radial limit section; 3-1. connecting bracket; 3-2. corner bracket; 3-3. ultraviolet lamp. DETAILED DESCRIPTION

[0033] In the description of the present invention, it is necessary to understand that terms such as "top", "bottom", "inside", "outside", "horizontal", and "vertical" indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0034] The preferred embodiments of the present invention are described in detail below in conjunction with the accompanying drawings so that the advantages and features of the present invention can be more easily understood by those skilled in the art, thereby defining the protection scope of the present invention more clearly.

[0035] like Figure 1 As shown, a continuous collaborative modular photocatalytic assisted chemical mechanical polishing device includes a machine tool 1, a modular mechanical polishing module 2, an adjustable ultraviolet lamp irradiation module 3, a liquid collection tray 4, and a quick-release vacuum adsorption chassis 5. The machine tool 1 adopts a three-axis milling machine, including a manual or electric workbench that can move with two degrees of freedom in the horizontal direction, and a main shaft that can be raised and lowered. In this embodiment, the machine tool 1 adopts an existing finished milling machine equipment, which is only used as the basic structure of the device without internal changes.

[0036] The modular mechanical polishing module 2 is mounted on the spindle tool holder of the machine tool 1 and is used for performing rotational polishing driven by the spindle.

[0037] The adjustable ultraviolet lamp irradiation module 3 is installed on the frame structure of the machine tool 1 close to the main axis, and is used to irradiate ultraviolet light from top to bottom to the liquid collection tray 4 on the workbench.

[0038] The bottom of the quick-detachable vacuum adsorption chassis 5 is fixed on the workbench of the machine tool 1 .

[0039] The bottom surface of the liquid collection tray 4 is fixed on the quick-release vacuum adsorption chassis 5 by vacuum adsorption.

[0040] like Figure 2 As shown, the modular mechanical polishing module 2 includes a rotating rod 2-1, a groove plate 2-2, a pressure plate 2-3 and a plurality of modular blades.

[0041] The top end of the rotating rod 2-1 is clamped on the spindle tool holder of the machine tool 1. The bottom end of the rotating rod 2-1 is provided with a positioning shoulder and an external thread; the central through hole of the groove plate 2-2 is provided with an internal thread; the central through hole of the groove plate 2-2 is connected to the bottom end of the rotating rod 2-1 through a thread; the top surface of the groove plate 2-2 is in contact with the positioning shoulder of the rotating rod 2-1; part of the external thread at the bottom end of the rotating rod 2-1 is exposed for connecting the pressure plate 2-3.

[0042] The bottom surface of the slot disk 2-2 is provided with a mounting slot body. The mounting slot body includes a central circular slot and radial slot bodies 2-2-1. The radial slot bodies 2-2-1 are evenly distributed along the circumference of the central circular slot. The inner end of each radial slot body 2-2-1 is connected to the central circular slot; the outer end of each radial slot body 2-2-1 is connected to the outer circumferential surface of the slot disk 2-2; an annular slot body is formed between the circumferential side surface of the central circular slot and the outer circumferential surface of the rotating rod 2-1. In this embodiment, the number of radial slot bodies 2-2-1 is twelve. Modular blades are embedded in part or all of the radial slot bodies 2-2-1. The circumferential side surface of the central circular slot provides radial limitation for the modular blades; the two side walls of the radial slot body 2-2-1 provide circumferential limitation for the modular blades.

[0043] like Figure 2 and Figure 3 As shown, the modular blade includes a blade portion 2-6 and a plug-in portion. The blade portion 2-6 is used to polish the workpiece as the spindle rotates. The bottom edge of one of the sides of the blade portion 2-6 is provided with a downwardly inclined inclined surface structure. The orientation of the inclined surface structure on all modular blades is consistent with the direction of the spindle; during rotation, the inclined surface structure can push the polishing liquid to impact the sample surface, thereby improving the polishing effect.

[0044] In this embodiment, the polishing liquid is specifically an aqueous solution containing 5 wt.% hydrogen peroxide and 3 wt.% nano titanium dioxide particles; in other embodiments, polishing liquids with other concentrations of hydrogen peroxide and titanium dioxide particles, or other polishing liquids that can be used for photocatalytic fluid polishing can also be used.

[0045] The plug-in part is used to connect the mounting groove body at the bottom of the groove disk 2-2 to achieve the fixation of the modular blades. The plug-in part includes a circumferential limit section 2-7 and a radial limit section 2-8. The two ends of the circumferential limit section 2-7 are respectively connected to the inner end of the blade part 2-6 and the radial limit section 2-8. The circumferential limit section 2-7 is embedded in and completely filled in the corresponding radial groove body 2-2-1 of the groove disk 2-2. The radial limit section 2-8 is embedded in the annular groove body of the groove disk 2-2. The width of the radial limit section 2-8 is greater than the width of the circumferential limit section 2-7, so that the outer circumferential side wall of the annular groove body provides radial limitation to the radial limit section 2-8. The radial limit section 2-8 occupies a circumferential angle of 720° / n of the annular groove body. n is the number of radial grooves 2-2-1; when n is 12, the circumferential angle 720° / n=60°; in some other embodiments, the circumferential angle of the annular groove occupied by the radial limiting segment 2-8 can also be other values ​​greater than 360° / n and less than or equal to 720° / n.

[0046] A first limiting inclined surface is provided on both sides of the connection between the circumferential limiting section 2-7 and the blade portion 2-6. The two first limiting inclined surfaces form an angle of 90°. The end of the radial groove body 2-2-1 away from the central circular groove is provided with a second limiting inclined surface matching the two first limiting inclined surfaces. The two second limiting inclined surfaces form a chamfered structure that expands outward; the two first limiting inclined surfaces on the modular blade are in contact with the second limiting inclined surface on the radial groove body 2-2-1, respectively, to provide a constraint on the modular blade to prevent the modular blade from moving radially inward.

[0047] The modular blades are of two different types, namely, the off-type modular blade 2-4 and the canopy-type modular blade 2-5. The blade part 2-6 of the off-type modular blade 2-4 and the canopy-type modular blade 2-5, as well as the circumferential limit section 2-7 of the plug-in part are of the same structure, and only the radial limit section 2-8 of the plug-in part is different in structure.

[0048] The radial limiting segments 2-8 of the off-type modular blade 2-4 and the canopy-type modular blade 2-5 both include solid parts and empty slot parts that are alternately arranged in sequence along the axial direction of the slot plate 2-2. The number of the solid parts and the empty slot parts can be one or more. The thickness and arrangement position of the solid parts and the empty slot parts in the off-type modular blade 2-4 are opposite to those in the canopy-type modular blade 2-5.

[0049] The same type of modular blades cannot be installed in adjacent radial slots 2-2-1, that is, the modular blades embedded in the two adjacent radial slots 2-2-1 are the off-type modular blades 2-4 and the canopy-type modular blades 2-5. Therefore, in the adjacent off-type modular blades 2-4 and canopy-type modular blades 2-5, the solid part of the radial limiting section 2-8 of one modular blade can just fill the empty slot part of the radial limiting section 2-8 of another modular blade, forming a mutually nested stable structure; this structure can minimize the size of the slot plate 2-2 while ensuring the reliable radial limiting of the blades.

[0050] In this embodiment, the radial limiting section 2-8 of the off-type modular blade 2-4 includes an empty slot portion and two solid portions; the radial limiting section 2-8 of the can type modular blade 2-5 includes two empty slot portions and one solid portion; therefore, when the off-type modular blade 2-4 and the can type modular blade 2-5 are installed in adjacent radial slot bodies 2-2-1 of the slot disk 2-2, the empty slot portion in the middle of the off-type modular blade 2-4 is filled by the solid portion in the middle of the can type modular blade 2-5; the empty slot portions at the upper and lower ends of the can type modular blade 2-5 are filled by the solid portions at the upper and lower ends of the off-type modular blade 2-4. The radial limiting sections 2-8 of the off-type modular blade 2-4 and the can type modular blade 2-5 contact and fill each other, so that the blades can be fixed to the slot disk 2-2 while avoiding interference between blade slot portions of adjacent slots.

[0051] Further preferably, the thickness of the two solid parts of the off-type modular blade 2-4 (i.e., the axial dimension of the slot disk 2-2) is 1.5 mm to 3 mm (preferably 2 mm); the thickness of the solid part of the can-type modular blade 2-5 (i.e., the axial dimension of the slot disk 2-2) is 3 mm to 6 mm (preferably 4 mm);

[0052] Further preferably, the length of the radial limiting section 2-8 (ie, the radial dimension of the groove plate 2-2) is 9 mm to 13 mm (preferably 11 mm); the height of the radial limiting section 2-8 (ie, the axial dimension of the groove plate 2-2) is 7 mm to 10 mm (preferably 8 mm).

[0053] More preferably, the diameter of the groove plate 2 - 2 is 28 mm to 32 mm (preferably 30 mm).

[0054] The internal thread in the center hole of the pressure plate 2-3 is threadedly connected to the bottom end of the rotating rod 2-1. The pressure plate 2-3 abuts against the lower surface of the plug-in part of each modular blade; the pressure plate 2-3 cooperates with the bottom surface of the mounting groove of the groove plate 2-2 to provide axial limit and clamping for each modular blade. The lower edge of the blade part 2-6 of the modular blade is lower than the bottom surface of the pressure plate 2-3.

[0055] like Figure 5As shown, the adjustable ultraviolet lamp irradiation module includes a connecting bracket 3-1, a corner bracket 3-2 and an ultraviolet lamp 3-3. The connecting bracket 3-1 is fixed on the frame of the machine tool 1. The connecting bracket 3-1 includes a crossbeam and two vertical connecting columns; the upper horizontal crossbeam is fixed to the vertical connecting columns on both sides through the corner bracket 3-2; the vertical connecting brackets 3-1 on both sides have corner brackets 3-2 in the middle, and their relative positions are adjustable for clamping on the frame of the machine tool 1. There are corner brackets 3-2 at the bottom of the two vertical connecting brackets 3-1, and their relative positions are adjustable for fixing the ultraviolet lamp 3-3. The ultraviolet lamp is located above the modular blades and is set downward. The ultraviolet light emitted by the ultraviolet lamp can be irradiated onto the workpiece through the gaps between different modular blades.

[0056] The liquid collection tray 4 is located directly below each modular blade and is used to place the sample and provide a limit for the sample, so that the rotating modular blades can continuously polish the top surface of the sample.

[0057] like Figure 4 As shown, in the process of the modular mechanical polishing module 2 being driven by the spindle to rotate, each time the modular blades pass through the sample surface is counted as an effective polishing, and the number of effective polishing times per minute is equal to the spindle speed per minute multiplied by the number of blades in the modular mechanical polishing module. The time interval between two adjacent effective polishings of the sample is counted as the effective photocatalytic assisted chemical corrosion time before mechanical polishing, and its value is inversely proportional to the spindle speed per minute and directly proportional to the angular spacing of adjacent blades in the modular mechanical polishing module. The number and layout of blades installed in the slot disk 2-2 can be changed according to processing needs to adjust the effective photocatalytic assisted chemical corrosion time before each mechanical polishing at the same effective polishing times per minute, or the number of effective polishing times per minute at the same effective photocatalytic assisted chemical corrosion time before each mechanical polishing. Figure 4 Taking the layout provided in part (d) as an example, four blades are installed in the modular mechanical polishing module 2. When the spindle speed is set at 300 rpm, the effective polishing times per minute = 300×4 = 1200, and the effective photocatalytic assisted chemical corrosion time before each mechanical polishing = 60 / 300 / 4 = 0.05 seconds.

[0058] In this embodiment, the machine tool 1 is a finished product sold on the market. It only serves as the basic structure of a continuous collaborative modular photocatalytic assisted chemical mechanical polishing device. There is no internal modification. It is only used to realize the controllable rotation of the vertical spindle, the overall movement of the spindle in the vertical direction, and the horizontal movement of the worktable.

[0059] In some embodiments, the material of the rotating rod 2-1 is 316 stainless steel; the material of the groove plate 2-2 and the pressure plate 2-3 is ABS resin; the material of the off-type modular blade 2-4 and the canopy modular blade 2-5 is glass fiber reinforced ABS resin, and a layer of consolidated abrasive layer is attached to the lower edge that contacts the surface of the sample.

[0060] In some embodiments, the materials of the connecting bracket 3-1 and the corner bracket 3-2 are both aluminum alloy; the model of the connecting bracket 3-1 is TXCP-6-3030; the model of the corner bracket 3-2 is TPPC-306-3030; the ultraviolet lamp 3-3 is an ultraviolet lamp with a wavelength of 395 nm, a power of 10W, and 30 lamp beads arranged in a rectangular array.

[0061] In some embodiments, the liquid collection tray 4 is made of ABS resin, and the thickness of its wall and bottom plate is 2 mm. The bottom of its inner surface has grooves arranged in a rectangular array to accommodate and fix multiple samples. The bottom of the quick-release vacuum adsorption chassis 5 has a 3 / 8'' screw hole, which can be fixed to the T-slot of the workbench of the machine tool 1; the main body is a vacuum suction cup with a locking switch, and the suction cup surface faces upward, and the liquid collection tray 4 can be quickly adsorbed or released by flipping the locking switch.

[0062] In some embodiments, the threaded rotating rod, grooved plate, and pressure plate in the modular mechanical polishing module have a right-hand thread direction, which has a self-tightening effect when the milling machine spindle is working.

[0063] The process of photocatalytically assisted chemical mechanical polishing using the modular device is as follows:

[0064] Step 1: Fix the required model of liquid collection tray 4 on the quick-detachable vacuum adsorption chassis 5, place the corresponding model of the sample to be polished in the groove in the center of the liquid collection tray 4, and inject polishing liquid into the liquid collection tray 4 until the liquid level is slightly higher than the upper surface of the sample.

[0065] Step 2: According to the experimental requirements, a specific number of off-type modular blades 2-4 and canopy modular blades 2-5 are placed in the groove plate 2-2, and the pressure plate 2-3 is rotated until all modular blades are fixed on the rotating rod 2-1 to form a modular mechanical polishing module 2 with a specific layout, and fixed on the spindle of the machine tool 1 through the tool holder.

[0066] Step three: adjust the position of the ultraviolet lamp 3 - 3 in the adjustable ultraviolet lamp irradiation module 3 to change the distance between the ultraviolet lamp 3 - 3 and the surface of the polishing liquid, and turn on the ultraviolet lamp.

[0067] Step 4. After waiting for a certain period of time to complete the chemical pre-corrosion assisted by photocatalysis, the spindle of the machine tool 1 descends until the modular blades of the modular mechanical polishing module 2 press the sample, and the rotation of the spindle drives the modular mechanical polishing module 2 to move; the modular blades polish the surface of the sample, and the ultraviolet light emitted by the ultraviolet lamp 3-3 irradiates the sample through the gaps between different modular blades, thereby realizing simultaneous photocatalytic reaction and mechanical polishing.

[0068] During the photocatalytically assisted chemical mechanical polishing process, the worktable of the machine tool 1 can move in the horizontal direction to achieve uniform polishing of the samples in the grooves of the liquid collecting tray 4 .

[0069] Step 5: After the photocatalytic assisted chemical mechanical polishing is completed, the vacuum adsorption of the quick-release vacuum adsorption chassis 5 is released, the polishing liquid is poured out, the sample in the groove of the liquid collection tray 4 is taken out, and it is rinsed with clean water.

[0070] The present invention can be better understood according to the above embodiments. It is easy for those skilled in the art to understand that the specific specifications, materials of each part, process conditions and results described in the embodiments are only used to illustrate the present invention. The above is only a preferred embodiment of the present invention. It should be pointed out that for those skilled in the art, several improvements and modifications can be made without departing from the principles of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A continuous collaborative modular photocatalytic assisted chemical mechanical polishing device, comprising a machine tool (1), a modular mechanical polishing module (2), an adjustable ultraviolet lamp irradiation module (3) and a polishing installation module; the polishing installation module is installed on a workbench of the machine tool (1) and is used to install a sample; the modular mechanical polishing module (2) is clamped on a spindle of the machine tool (1); characterized in that: The modular mechanical polishing module (2) comprises a plurality of modular blades arranged in sequence along the circumference of the main shaft; the adjustable ultraviolet lamp irradiation module comprises an ultraviolet lamp (3-3) installed above the modular blades and arranged downward; during the polishing process, the main shaft drives the modular blades to rotate to polish the sample, and the ultraviolet light emitted by the ultraviolet lamp (3-3) is irradiated into the polishing liquid in which the sample is located through the gaps between different modular blades, thereby causing a photocatalytic reaction to occur on the surface of the sample; The modular mechanical polishing module (2) further comprises a groove plate (2-2) and a pressure plate (2-3); the bottom surface of the groove plate (2-2) is provided with an installation groove body; the installation groove body comprises a central circular groove and a plurality of radial groove bodies (2-2-1); the radial groove bodies (2-2-1) are arranged in sequence along the circumference of the central circular groove; the inner end of each radial groove body (2-2-1) is connected to the central circular groove; the outer end of each radial groove body (2-2-1) is connected to the outer circumferential surface of the groove plate (2-2); modular blades are embedded in part or all of the radial groove bodies (2-2-1); The modular blade comprises a blade portion (2-6) and an inserting portion; the inserting portion comprises a circumferential limiting segment (2-7) and a radial limiting segment (2-8); the circumferential limiting segment (2-7) is embedded in a radial groove body (2-2-1) of a groove disk (2-2); the radial limiting segment (2-8) is embedded in a central circular groove of the groove disk (2-2); the two side walls of the radial groove body (2-2-1) provide circumferential limiting for the circumferential limiting segment (2-7) of the modular blade; and the circumferential side walls of the central circular groove provide radial limiting for the radial limiting segment (2-8) of the modular blade.

2. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The circumferential angle of the central circular groove occupied by the radial limiting section (2-8) is greater than 360° / n and less than or equal to 720° / n; n is the number of radial groove bodies (2-2-1); the modular blades have two different types, namely, off-type modular blades (2-4) and canopy-type modular blades (2-5); the off-type modular blades (2-4) and canopy-type modular blades (2-5) have different radial limiting section (2-8) structures; the off-type modular blades (2-4) and canopy-type modular blades (2-5) The radial limiting sections (2-8) all include solid parts and empty slot parts that are alternately arranged in sequence along the axial direction of the slot disk (2-2); the thickness and arrangement position of the solid parts and the empty slot parts in the off-type modular blades (2-4) and the canopy-type modular blades (2-5) are opposite; the same type of modular blades cannot be installed in adjacent radial slot bodies (2-2-1); in two modular blades installed in adjacent radial slot bodies (2-2-1), the solid parts and the empty slot parts of the radial limiting sections (2-8) are interlocked.

3. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The modular mechanical polishing module (2) further comprises a rotating rod (2-1); the top end of the rotating rod (2-1) is clamped on the main shaft of the machine tool (1); the center holes of the groove plate (2-2) and the pressure plate (2-3) are both connected to the rotating rod (2-1) by threads; and the top surface of the groove plate (2-2) is positioned by a shaft shoulder on the rotating rod (2-1).

4. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The modular blade material is made of elastic material; a layer of consolidated abrasive grains is attached to the bottom edge of the modular blade material.

5. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The bottom edge of one side of the blade part (2-6) of the modular blade is provided with a bevel structure inclined downward; the orientation of the bevel structures on all modular blades is consistent with the rotation direction of the main axis during the polishing process.

6. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The adjustable ultraviolet lamp irradiation module further comprises a connecting bracket (3-1) made of profile; the connecting bracket (3-1) is fixed on a frame of a machine tool (1); and one or more ultraviolet lamps (3-3) are mounted on the connecting bracket (3-1) and are height-adjustable.

7. The continuous collaborative modular photocatalytic assisted chemical mechanical polishing device according to claim 1, characterized in that: The polishing installation module comprises a liquid collection tray (4) and a quick-detachable vacuum adsorption chassis (5); the bottom of the quick-detachable vacuum adsorption chassis (5) is fixed on a workbench of a machine tool (1); the bottom surface of the liquid collection tray (4) is adsorbed and fixed on the quick-detachable vacuum adsorption chassis (5); and the liquid collection tray (4) is provided with one or more grooves for mounting a sample.

8. A continuous collaborative modular photocatalytic assisted chemical mechanical polishing method, characterized in that: Using a continuous collaborative modular photocatalytically assisted chemical mechanical polishing device as claimed in claim 1; the photocatalytically assisted chemical mechanical polishing method comprises the following steps: Mount the specimen on the polishing mounting module and immerse the workpiece with polishing liquid; The ultraviolet light emitted by the ultraviolet lamp (3-3) is irradiated onto the polishing liquid and the workpiece through the gaps between the different modular blades, and the workpiece surface is subjected to photocatalytically assisted chemical pre-etching. The machine tool (1) drives the modular blades to press against the polished surface of the sample; the main shaft of the machine tool (1) drives each modular blade of the polishing installation module to rotate; as the modular blades rotate, photocatalytic reaction and mechanical polishing continue to alternate at different positions on the polished surface of the sample.

9. A continuous collaborative modular photocatalytic assisted chemical mechanical polishing method according to claim 8, characterized in that: According to the conditions of photocatalytically assisted chemical mechanical polishing, the number of modular blades and the spindle speed are adjusted; the photocatalytically assisted chemical mechanical polishing conditions include the number of polishing times per unit time, the ratio of mechanical polishing time to photocatalytic reaction time, and the photocatalytic reaction time before a single polishing; the more modular blades there are, the greater the ratio of mechanical polishing time to photocatalytic reaction time, and the shorter the photocatalytic reaction time before a single polishing.

Citation Information

Patent Citations

  • Flexible machining device and method for photoelectrochemical mechanical polishing of hard and brittle material complex curved surface element

    CN116551555A