Improved method for obtaining Lichtenberg pattern by processing acrylic material through electron beam irradiation
By punching holes in the acrylic material and using a special mold for electron beam irradiation, the problem of difficulty in obtaining specific shapes and multiple Lichtenberg patterns in the prior art is solved, and a diversified Lichtenberg pattern is formed inside the acrylic material.
Patent Information
- Application Number
- CN202411959707.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-30
- Publication Date
- 2025-04-18
AI Technical Summary
The prior art is difficult to obtain Lichtenberg patterns of a specific shape, and it is impossible to form multiple Lichtenberg patterns that do not interfere with each other within the same material.
By punching holes in the acrylic material and using a special mold, electron beams are irradiated, and electrons are drawn out from the specific defects formed, and the Lichtenberg pattern is bound to a plane and within a specific range through the mold.
It is realized that multiple Lichtenberg graphics that do not interfere with each other are obtained inside the same acrylic material, and the graphics can be bound to obtain designated patterns, such as heart-shaped, five-pointed star-shaped, etc. The pattern depth can also be adjusted, and the process is simple, fast and effective.
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Figure CN119842109A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of irradiation production lines, and in particular to an improved method for obtaining a Lichtenberg pattern by treating an acrylic material with electron beam irradiation. Background Art
[0002] The Lichtenberg figure is named after the German scientist Georg Christoph Lichtenberg. Its shape characteristics help to reveal the nature of electric current. The Lichtenberg figure can be created in solid insulating materials. Through electron accelerator irradiation treatment, electrons can be temporarily captured inside the insulating material to form a negative charge plane. Once there are too many electrons, the dielectric strength of the material is exceeded and the material is broken down. It can be manually triggered by hitting the material with a sharp conductive object, thereby generating an excessive voltage stress point. During the discharge process, a Lichtenberg figure is formed inside it.
[0003] For example, the Chinese patent with publication number CN109535453A and titled “Method for obtaining Lichtenberg figures by electron beam irradiation” selects an acrylic material body of a specific shape, then places the acrylic material body on an insulating material, uses an electron accelerator to irradiate the acrylic material body with an electron beam, and then uses a sharp conductive object to damage the surface of the acrylic material body, and forms a Lichtenberg figure inside the acrylic material body with the damage position as the starting point. However, the above method cannot obtain a Lichtenberg figure of a specific shape. Summary of the invention
[0004] The technical problem to be solved by the present invention is to provide an improved method for obtaining Lichtenberg patterns by treating acrylic materials with electron beam irradiation in view of the above-mentioned deficiencies in the prior art.
[0005] In order to solve the above technical problems, the technical solution adopted by the present invention is:
[0006] An improved method for obtaining a Lichtenberg pattern by treating an acrylic material with electron beam irradiation comprises the following steps:
[0007] Step 1: Take the formed acrylic material and punch holes at the predetermined positions with a sharp object;
[0008] Step 2: Place the mold on top of the acrylic material;
[0009] Step three: placing the acrylic material on the insulating material and irradiating it with an electron beam.
[0010] Furthermore, in step 1, the acrylic material is selected from one of a cube, a cuboid, and a cylinder.
[0011] Furthermore, in step 1, the thickness of the acrylic material in the irradiation direction is 0.5-5 cm.
[0012] Furthermore, in step 1, the punching position of the acrylic material is the discharge position, the hole diameter is no more than 0.5 cm, and the depth is no more than 1 cm.
[0013] Furthermore, in step 2, the mold is made of metal or plastic, with a wall thickness of 0.1-10 cm, and the mold shape is set according to design requirements.
[0014] Furthermore, in step 2, the mold is placed directly above the acrylic material, a hollow pattern is processed in the middle of the mold, and the size of the hollow pattern is smaller than the outer dimensions of the acrylic material.
[0015] Furthermore, in step three, the electron beam energy is 2 to 10 MeV, and the dose is 1 to 40 kGy.
[0016] Compared with the prior art, the improved electron beam irradiation method for processing acrylic materials to obtain Lichtenberg figures of the present invention, by first punching and then irradiating, electrons are led out from the formed specific defects, and the Lichtenberg figures are bounded in a plane and a specific range by a specific mold, so that multiple Lichtenberg figures that do not interfere with each other can be obtained inside the same acrylic material, and the Lichtenberg figures can be bound to obtain specified patterns, such as heart-shaped, five-pointed star-shaped and other patterns, and the depth of the pattern inside the acrylic material can also be adjusted to a certain extent by the mold to obtain rich Lichtenberg figures, and the method is simple, fast and effective.
[0017] By adopting the above method, a Lichtenberg figure was obtained in the acrylic molding material. The figure was different from the original one and had an improved shape. This method not only provided a new direction for electron beam irradiation processing, but also recorded the shape of the instantaneous current of the material breakdown in the acrylic molding material treated by electron beam irradiation; it also improved the original Lichtenberg figure, restrained the appearance, created diversity, had research significance, and the molded material also had handicraft value. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 is a flow chart of the present invention;
[0019] Figure 2 is the Lichtenberg figure obtained in Example 1 of the present invention;
[0020] Figure 3is the Lichtenberg figure obtained in Example 2 of the present invention; DETAILED DESCRIPTION
[0021] The technical solutions in the embodiments of the present invention will be described clearly and completely below.
[0022] like Figure 1 As shown, an improved method for obtaining a Lichtenberg pattern by electron beam irradiation treatment of acrylic material includes the following steps: step 1, taking a formed acrylic material and punching holes at predetermined positions with a sharp object; step 2, placing a mold above the acrylic material; step 3, placing the acrylic material on an insulating material and irradiating it with an electron beam.
[0023] In the above step 1, the acrylic material is selected from one of a cube, a cuboid, and a cylinder, wherein the acrylic material can also be selected from other shapes, such as a triangle, a star, etc. The thickness of the acrylic material in the irradiation direction is 0.5-5 cm.
[0024] The position where the acrylic material is punched in the above step 1 is the discharge position, the hole diameter is no more than 0.5 cm, and the depth is no more than 1 cm.
[0025] In the above step 2, the mold is made of metal or plastic material, with a wall thickness of 0.1-10 cm, and the mold shape is set according to design requirements.
[0026] In the above step 2, the mold is placed directly above the acrylic material, and a hollow pattern is processed in the middle of the mold, and the size of the hollow pattern is smaller than the outer dimensions of the acrylic material.
[0027] In the above step 3, the electron beam energy is 2 to 10 MeV, and the dose is 1 to 40 kGy.
[0028] Example 1
[0029] Take a formed acrylic rectangular material with a length of 10 cm, a width of 2 cm, and a height of 10 cm, and punch a hole at a position 2.5 cm away from the edge of the 10cm*2cm plane, for a total of two holes with a hole diameter of 1 mm and a depth of 4 mm. Place an iron bar with a width of 2.5 cm, a length of not less than 10 cm, and a thickness of not less than 6 mm on the upper surface of the acrylic square and between the two holes to form a mold, and place an iron sheet with a thickness of 3 mm and a length and width of not less than 10 cm on top of the iron bar. Fix the whole and place it on a foam pad, and use a 10MeV electron beam to irradiate along the width direction of the acrylic with a dose of 8 kGy.
[0030] After the irradiation is completed, the material is taken out and the following Figure 2 Lichtenberg figure shown.
[0031] Example 2
[0032] Take a formed acrylic rectangular material with a length of 10 cm, a width of 2 cm, and a height of 10 cm, and place an iron hollow mold on the upper surface of the acrylic square. The hollow part is in the shape of a five-pointed star, and the longest side of the five-pointed star is 7m, and the thickness of the mold is not less than 6mm; punch a hole in the center of the hollow part of the five-pointed star, with a diameter of 1mm and a depth of 4mm; place an iron sheet with a thickness of 3mm and a length and width of not less than 10cm above the hollow mold, fix the whole and place it on a foam pad, and use a 10MeV electron beam to irradiate along the width direction of the acrylic with a dose of 8kGy.
[0033] After the irradiation is completed, the material is taken out and the following Figure 3 Lichtenberg figure shown.
[0034] The present invention is not limited to the described embodiments. Those skilled in the art may make some modifications or changes without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be based on the scope defined in the claims.
Claims
1. An improved method for obtaining Lichtenberg patterns by treating acrylic materials with electron beam irradiation, characterized in that: The following steps are included: Step 1: Take the formed acrylic material and punch holes at the predetermined positions with a sharp object; Step 2: Place the mold on top of the acrylic material; Step three: placing the acrylic material on the insulating material and irradiating it with an electron beam.
2. The improved method for obtaining Lichtenberg patterns by treating acrylic materials with electron beam irradiation according to claim 1, characterized in that: In step 1, the acrylic material is selected from one of a cube, a cuboid, and a cylinder.
3. The improved method for obtaining Lichtenberg patterns by electron beam irradiation treatment of acrylic materials according to claim 1, characterized in that: In step 1, the thickness of the acrylic material in the irradiation direction is 0.5-5 cm.
4. The improved method for obtaining Lichtenberg patterns by treating acrylic materials with electron beam irradiation according to claim 1, characterized in that: In step 1, the punching position of the acrylic material is the discharge position, the hole diameter is no more than 0.5 cm, and the depth is no more than 1 cm.
5. The improved method for obtaining Lichtenberg patterns by electron beam irradiation treatment of acrylic materials according to claim 1, characterized in that: In step 2, the mold is made of metal or plastic, with a wall thickness of 0.1-10 cm, and the mold shape is set according to design requirements.
6. The improved method for obtaining Lichtenberg patterns by electron beam irradiation treatment of acrylic materials according to claim 1, characterized in that: In step 2, the mold is placed directly above the acrylic material, and a hollow pattern is processed in the middle of the mold, and the size of the hollow pattern is smaller than the outer dimensions of the acrylic material.
7. The improved method for obtaining Lichtenberg patterns by treating acrylic materials with electron beam irradiation according to claim 1, characterized in that: In step 3, the electron beam energy is 2 to 10 MeV, and the dose is 1 to 40 kGy.
Citation Information
Patent Citations
Method for obtaining Lichtenberg figures by utilizing electron beam irradiation
CN109535453A