Display panel, preparation method thereof and display device

Abstract

The invention provides a display panel and a preparation method thereof and a display device.The display panel is provided with a light-transmitting area and a display area, the display area comprises a first substrate, a first pixel defining layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first packaging layer, a first touch layer and a first black matrix layer, the first touch layer comprises a first touch electrode layer, a first insulating layer and a second touch electrode layer which are sequentially stacked in the direction away from the first substrate, and the light-transmitting area comprises a second substrate, and a second pixel defining layer, a third electrode layer, a second packaging layer, a second insulating layer and a second black matrix layer which are sequentially stacked on the second substrate. Light holes are formed in corresponding positions of the second black matrix layer and the second pixel defining layer; the light-transmitting area further comprises a dimming structure, the dimming structure is arranged on the side, away from the second substrate, of the third electrode layer, and the dimming structure is used for reducing ambient light reflected by the light-transmitting area to the light-emitting side of the display panel.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and more specifically, to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] The reflection and glare problems of OLED (Organic Light-Emitting Diode) panels under strong ambient light have always troubled users and manufacturers. In order to overcome this problem, COE (color filter on encapsulation) technology came into being and has been widely used in OLED products. COE technology builds a fine color film structure inside the OLED panel to effectively absorb and scatter ambient light, greatly reducing the reflection on the screen surface and thus reducing the glare problem. It not only improves light transmittance and has a wider color gamut, but also significantly reduces the thickness of the screen, making the OLED screen easier to fold, meeting consumers' dual needs for portability and visual experience.

[0003] When an optical element is set under the screen, the display panel needs to have an opening at the position of the optical element, that is, the sensor hole, which allows ambient light to pass through. However, the transmittance and concealment of the sensor hole are difficult to balance. How to ensure the transmittance of the sensor hole while improving its concealment has become a technical problem that needs to be solved urgently. Summary of the invention

[0004] The purpose of the present disclosure is to provide a display panel and a method for manufacturing the same, and a display device, so as to reduce the reflectivity of the sensor hole while ensuring the transmittance of the sensor hole.

[0005] In order to achieve the above objectives, the present invention adopts the following technical solutions:

[0006] According to a first aspect of the present disclosure, there is provided a display panel, the display panel having a light-transmitting area and a display area surrounding the light-transmitting area, the display area comprising a first substrate, a first pixel defining layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first encapsulation layer, a first touch layer and a first black matrix layer sequentially stacked on the first substrate, the first touch layer comprising a first touch electrode layer, a first insulating layer and a second touch electrode layer sequentially stacked in a direction away from the first substrate, the light-transmitting area comprising a second substrate, a second pixel defining layer, a third electrode layer, a second encapsulation layer, a second insulating layer and a second black matrix layer sequentially stacked on the second substrate, the third electrode layer being arranged in the same layer as the second electrode layer, the second encapsulation layer being arranged in the same layer as the first encapsulation layer, the second insulating layer being arranged in the same layer as the first insulating layer, the second black matrix layer being arranged in the same layer as the first black matrix layer, and light-transmitting holes being arranged at corresponding positions of the second black matrix layer and the second pixel defining layer; wherein the light-transmitting area further comprises a dimming structure, the dimming structure being arranged on a side of the third electrode layer away from the second substrate, the dimming structure being used to reduce ambient light reflected from the light-transmitting area to a light-emitting side of the display panel.

[0007] Optionally, the dimming structure includes at least one of a first microstructure, a second microstructure and an anti-reflection and anti-transmission layer, the first microstructure is arranged on the surface of the third electrode layer away from the second substrate, the second microstructure is arranged on the surface of the second insulating layer away from the second substrate, and the anti-reflection and anti-transmission layer is arranged between the third electrode layer and the second packaging layer, and when ambient light is incident on the first microstructure or the second microstructure, part of the ambient light is reflected to the second pixel defining layer or the second black matrix layer.

[0008] Optionally, the first microstructure or the second microstructure includes a plurality of first protrusions.

[0009] Optionally, the first protrusion is an arc-shaped protrusion, a polygonal protrusion or a triangular protrusion, and the angle between the line connecting the protrusion vertex and the protrusion edge of the triangular protrusion and the first plane ranges from 65° to 80°, and the first plane is a plane parallel to the second substrate.

[0010] Optionally, the first microstructure includes a plurality of first recesses.

[0011] Optionally, the first depression is an arc-shaped depression or a polygonal depression.

[0012] Optionally, the first touch layer further includes a first protective layer disposed on a side of the second touch electrode layer away from the first substrate, the light-transmitting area further includes a second protective layer, the second protective layer is disposed on the same layer as the first protective layer, and the refractive index of the second protective layer is less than the refractive index of the second microstructure.

[0013] Optionally, the refractive index of the second microstructure is greater than or equal to 1.8 and less than or equal to 1.9, and the refractive index of the second protective layer is greater than or equal to 1.5 and less than or equal to 1.7.

[0014] Optionally, a surface of the anti-reflection and anti-reflection layer away from the second substrate is flush with a surface of the second pixel defining layer away from the second substrate.

[0015] Optionally, the thickness of the third electrode layer is smaller than the thickness of the second electrode layer.

[0016] A second aspect of the present disclosure provides a method for preparing a display panel, comprising the following steps:

[0017] Providing a first substrate, forming a first pixel defining layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first encapsulation layer, a first touch layer and a first black matrix layer stacked in sequence on the first substrate, wherein the first touch layer includes a first touch electrode layer, a first insulating layer and a second touch electrode layer stacked in sequence in a direction away from the first substrate;

[0018] A second substrate is provided, and a second pixel defining layer, a third electrode layer, a second encapsulation layer, a second insulating layer and a second black matrix layer are formed on the second substrate in sequence, the third electrode layer is arranged on the same layer as the second electrode layer, the second encapsulation layer is arranged on the same layer as the first encapsulation layer, the second insulating layer is arranged on the same layer as the first insulating layer, the second black matrix layer is arranged on the same layer as the first black matrix layer, and light-transmitting holes are arranged at corresponding positions of the second black matrix layer and the second pixel defining layer; wherein the light-transmitting area also includes a dimming structure, the dimming structure is arranged on a side of the third electrode layer away from the second substrate, and the dimming structure is used to reduce the ambient light reflected from the light-transmitting area to the light-emitting side of the display panel.

[0019] A third aspect of the present disclosure provides a display device, comprising the display panel as described above; and an optical sensor disposed on a non-light-emitting side of the display panel and located in the light-transmitting area.

[0020] The beneficial effects of the present disclosure are as follows:

[0021] The display panel of the disclosed embodiment, by setting a dimming structure above the third electrode layer in the light-transmitting area, can reflect part of the ambient light to the second pixel defining layer or the second black matrix layer through the dimming structure instead of emitting from the light-emitting side of the display panel, or directly reduce the reflection of the third electrode layer to the ambient light, thereby effectively reducing the reflection of ambient light in the light-transmitting area, thereby reducing the reflectivity difference between the light-transmitting area and the display area, and improving the hiding of the light-transmitting hole. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The specific implementation methods of the present disclosure are further described in detail below with reference to the accompanying drawings.

[0023] Figure 1 It is a schematic diagram of the film layer structure of the COE structure display panel in the related art;

[0024] Figure 2 A schematic diagram of a planar structure of a display panel provided in an embodiment of the present disclosure;

[0025] Figure 3 A schematic diagram of the film layer structure of the display area A1 provided in an embodiment of the present disclosure;

[0026] Figure 4 A schematic diagram of a structure in which an arc-shaped protrusion is formed on a third electrode layer according to an embodiment of the present disclosure;

[0027] Figure 5 A schematic diagram of a structure in which a triangular protrusion is formed on a third electrode layer according to an embodiment of the present disclosure;

[0028] Figure 6 A schematic diagram of a structure for forming a first recess on a third electrode layer provided in an embodiment of the present disclosure;

[0029] Figure 7 A schematic diagram of a structure for forming a first protrusion on a second insulating layer provided in an embodiment of the present disclosure;

[0030] Figure 8 A schematic diagram of a structure in which an arc-shaped protrusion is formed on the third electrode layer and a triangular protrusion is formed on the second insulating layer, provided in an embodiment of the present disclosure;

[0031] Fig. 9 A schematic diagram of a structure in which a triangular protrusion is formed on the third electrode layer and a triangular protrusion is formed on the second insulating layer;

[0032] Fig.10 A schematic diagram of a structure in which an arc-shaped depression is formed on the third electrode layer and a triangular protrusion is formed on the second insulating layer;

[0033] Fig.11 It is a schematic diagram of the structure in which the thickness of the third electrode layer is thinned;

[0034] Fig.12 A schematic diagram of the structure in which the third electrode layer is removed;

[0035] Fig.13 A flow chart of a method for preparing a display panel provided in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0036] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0037] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as "one", "one" or "the" do not indicate quantity restrictions, but indicate that there is at least one. Similar words such as "include" or "comprise" mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0038] In related technologies, a display panel that integrates a color filter layer or a color filter (CF) into a color on encapsulation layer (COE) to reduce ambient light reflection and improve the light output efficiency of the display panel can be called a COE structure display panel. Figure 1 , Figure 1 Schematic diagram of the film structure of the COE structure display panel in the related art, such as Figure 1As shown, the display panel includes a base substrate 310, a driving circuit layer 320, a pixel defining layer 330, an anode layer 340, a light-emitting material layer 350, a cathode layer 360, an encapsulation layer 370, a touch layer 380, a color film layer 390 and a glass cover 300, wherein the light-emitting material layer 350 includes a plurality of light-emitting devices, and the pixel defining layer 330 has a plurality of first openings, each of which has a light-emitting device formed therein. When an optical sensor (such as a camera, an ambient light sensor or a fingerprint sensor, etc.) is integrated under the screen, an array of openings will be provided in the display area (AA) of the display panel, and the openings can generally be represented as sensor holes to allow ambient light to pass through the sensor holes and be detected by the optical sensor under the screen. In order to distinguish the representation, the display area outside the sensor hole is recorded as the normal display area.

[0039] For the above-mentioned display panel, in order to ensure the detection accuracy of the optical sensor, the sensor hole needs to have a high transmittance, wherein the transmittance of the sensor hole is determined by the transmittance of the film layer at the sensor hole position and the opening ratio of the sensor hole, which can be simply expressed as the transmittance of the sensor hole = the transmittance of the film layer at the sensor hole position * the opening ratio of the sensor hole. In the sensor hole area, the black matrix in the color filter layer 390 and the pixel definition layer 330 both need to be dug. After the ambient light is incident, more light is reflected from the cathode layer, resulting in a large difference in the reflectivity of the sensor hole area and the reflectivity of the normal display area. In addition, the reflectivity of the sensor hole area is usually much higher than that of the normal display area, which will result in poor hiding of the sensor hole. For details, please refer to Figure 1 , Figure 1 The upper middle image (a) is a schematic diagram of light reflection in the Normal display area, and the lower middle image (b) is a schematic diagram of light reflection in the light-transmitting area with the sensor hole. Figure 1 The solid arrows in the figure are used to indicate the transmission direction of the light passing through the film layers of the display panel, and the dotted arrows are used to indicate the transmission direction of the light reflected by the film layers of the display panel, but do not represent the specific position or reflection angle where the light is reflected in the actual product.

[0040] In order to reduce the reflectivity of the sensor hole while ensuring the transmittance of the sensor hole and improve the concealment of the sensor hole, the embodiment of the present disclosure provides a display panel and a manufacturing method thereof, and a display device. Figures 2 to 12 , Figure 2 A schematic diagram of a planar structure of a display panel provided in an embodiment of the present disclosure, Figure 3 A schematic diagram of the film layer structure of the display area of ​​the display panel provided in an embodiment of the present disclosure, Figures 4 to 12A schematic diagram of the film structure of the light-transmitting area of ​​the display panel provided in the embodiment of the present disclosure, such as Figures 2 to 12 As shown, the display panel has a light-transmitting area A2 and a display area A1 surrounding the light-transmitting area A2.

[0041] Among them, the light-transmitting area A2 is the area where the light-transmitting holes are set in the display panel, and the display area A1 is the display area where the light-transmitting holes are not set in the display panel, which can also be understood as a conventional display area. The display area A1 and the light-transmitting area A2 together constitute the display area AA of the display panel. Exemplarily, the light-transmitting area A2 can be the area where the fingerprint sensor is located in the display panel or the area where the front camera is located. It can be understood that the light-transmitting area A2 in the embodiment of the present disclosure is the area where the light-transmitting holes are located. For the fingerprint sensor, it may include a plurality of light-transmitting holes arranged in an array, and there is a display area between each light-transmitting hole. Then the light-transmitting area A2 includes the area where each light-transmitting hole is located.

[0042] like Figures 3 to 12 As shown, the display area A1 includes a first substrate 110, a first pixel defining layer 120, a first electrode layer 130, a light-emitting device layer 140, a second electrode layer 150, a first encapsulation layer 160, a first touch layer 170 and a first black matrix layer 180 stacked in sequence on the first substrate 110, and the first touch layer 170 includes a first touch electrode layer (TMA), a first insulating layer (TLD) 1710 and a second touch electrode layer (TMB) stacked in sequence in a direction away from the first substrate 110.

[0043] The light-transmitting area A2 includes a second substrate 210, a second pixel defining layer 220, a third electrode layer 230, a second encapsulation layer 240, a second insulating layer 250 and a second black matrix layer 260 stacked in sequence on the second substrate 210, the third electrode layer 230 and the second electrode layer 150 are arranged in the same layer, the second encapsulation layer 240 and the first encapsulation layer 160 are arranged in the same layer, the second insulating layer 250 and the first insulating layer 1710 are arranged in the same layer, the second black matrix layer 260 and the first black matrix layer 180 are arranged in the same layer, and light-transmitting holes are arranged at corresponding positions of the second black matrix layer 260 and the second pixel defining layer 220.

[0044] The light-transmitting area A2 further includes a dimming structure, which is disposed on a side of the third electrode layer 230 away from the second substrate 210 , and is used to reduce ambient light reflected from the light-transmitting area to the light-emitting side of the display panel.

[0045] Among them, the dimming structure is arranged on the side of the third electrode layer 230 away from the second substrate 210, which may include multiple situations. For example, when part of the ambient light needs to be reflected to the second pixel defining layer 220, the dimming structure can be arranged on the upper surface of the third electrode layer 230 or between the third electrode layer 230 and the upper surface of the second pixel defining layer 220. When part of the ambient light needs to be reflected to the second black matrix layer 260, the dimming structure needs to be arranged between the third electrode layer 230 and the second black matrix layer 260, for example, on the upper surface of the third electrode layer 230, or on the second insulating layer 250. That is, the position of the dimming structure can be set according to actual needs, but it needs to be located above the third electrode layer 230.

[0046] Compared with the related art, the display panel of the embodiment of the present disclosure has a dimming structure set above the third electrode layer in the light-transmitting area. Through the dimming structure, part of the ambient light can be reflected to the second pixel defining layer or the second black matrix layer instead of being emitted from the light-emitting side of the display panel. Therefore, the reflection of ambient light in the light-transmitting area can be effectively reduced, thereby reducing the reflectivity difference between the light-transmitting area and the display area, and improving the hiding of the light-transmitting hole.

[0047] Optional, such as Figure 3 As shown, the display area A1 also includes a driving circuit layer 190 disposed between the first substrate 110 and the first pixel defining layer 120. The embodiment of the present disclosure does not improve the specific structure of the driving circuit layer 190, and the driving circuit layer in the related art can be used. The first black matrix layer 180 includes a plurality of black matrices BM arranged at intervals, and a color filter portion is arranged between adjacent black matrices, such as Figure 3 In addition, the display area A1 further includes a first planar layer (COC) 191 covering the first black matrix layer 180 and the color filter portion, a first glass cover (CG) 193, and a first adhesive layer (OCA) 192 disposed between the first planar layer 191 and the first glass cover 193.

[0048] Optional, such as Figure 4 As shown, the light-transmitting area A2 further includes a second planar layer 291 covering the second black matrix layer 260 , a second glass cover plate 293 and a second adhesive layer 292 .

[0049] In the embodiment of the present disclosure, in the display area A1, one of the first electrode layer 130 and the second electrode layer 150 may be an anode layer, and the other may be a cathode layer. The embodiment of the present disclosure is described by taking the first electrode layer 130 as an anode layer and the second electrode layer 150 as a cathode layer as an example. The cathode layer is usually formed on the entire surface of the display panel and covers the light-emitting device layer 140 and the first pixel defining layer 120. The material of the cathode layer may include metals such as Mg, Ca, Li or Al or alloys thereof, or metal oxides such as IZO and ZTO.

[0050] In the embodiments of the present disclosure, unless otherwise specified, the term "same-layer arrangement" used refers to two layers, parts, components, elements or parts that can be formed by the same preparation process (such as a patterning process, etc.), and the two layers, parts, components, elements or parts are generally formed of the same material. For example, two or more functional layers are arranged in the same layer, which means that these functional layers arranged in the same layer can be formed using the same material layer and the same preparation process, thereby simplifying the preparation process of the display panel. Exemplarily, the second pixel defining layer 220 in the light-transmitting area A2 is arranged in the same layer as the first pixel defining layer 120 in the display area A1, which can be understood as forming the first pixel defining layer 120 and the second pixel defining layer 220 simultaneously in the same preparation process by the same material, and can also be understood as distinguishing and representing the pixel defining layers formed in the same process according to the region, and representing the pixel defining layer located in the display area A1 as the first pixel defining layer 120, and the pixel defining layer located in the light-transmitting area A2 as the second pixel defining layer 220. Similarly, the second encapsulation layer 240 in the light-transmitting area A2 and the first encapsulation layer 160 in the display area A1 are formed by the same material and the same preparation process, the second insulating layer 250 in the light-transmitting area A2 and the first insulating layer 1710 in the display area A1 are formed by the same material and the same preparation process, and the second black matrix layer 260 in the light-transmitting area A2 and the first black matrix layer 180 in the display area A1 are formed by the same material and the same preparation process. Similarly, the first flat layer (COC) 191 and the second flat layer 291 are prepared by the same process, which constitute the entire film layer covering the display area A1 and the light-transmitting area A2, the first adhesive layer 192 and the second adhesive layer 292 are prepared by the same process, which constitute the entire film layer covering the display area A1 and the light-transmitting area A2, and the first glass cover plate 193 and the second glass cover plate 293 are the entire glass covering the display area A1 and the light-transmitting area A2.

[0051] In the embodiment of the present disclosure, the first pixel defining layer 120 and the second pixel defining layer 220 are black pixel defining layers (BPDL), that is, the first pixel defining layer 120 and the second pixel defining layer 220 are formed of black material, and the light-transmitting holes include a first through hole H1 opened on the second pixel defining layer 220 and a second through hole H2 opened on the second black matrix layer 260. At the same time, since light-emitting sub-pixels do not need to be formed in the light-transmitting area A2, compared with the display area A1, the film layer structures such as the driving circuit layer, the anode layer, and the light-emitting material layer are reduced.

[0052] In a possible implementation, the dimming structure includes at least one of a first microstructure 270a, a second microstructure 270b and an anti-reflection and anti-transmission layer 280, the first microstructure 270a is arranged on the surface of the third electrode layer 230 away from the second substrate 210, the second microstructure 270b is arranged on the surface of the second insulating layer 250 away from the second substrate 210, and the anti-reflection and anti-transmission layer 280 is arranged between the third electrode layer 230 and the second encapsulation layer 240. When ambient light is incident on the first microstructure 270a or the second microstructure 270b, part of the ambient light is reflected to the second pixel defining layer 220 or the second black matrix layer 260.

[0053] In the embodiment of the present disclosure, a microstructure may be formed on the third electrode layer 230, or may be formed on the second insulating layer 250. To distinguish and represent, the microstructure on the third electrode layer 230 is recorded as a first microstructure 270a, and the microstructure on the second insulating layer 250 is recorded as a second microstructure 270b. Optionally, the orthographic projection of the light-transmitting hole on the second substrate 210 covers the orthographic projection of the microstructure on the second substrate 210, that is, the first microstructure 270a formed on the third electrode layer 230 and the second microstructure 270b formed on the second insulating layer 250 are both located in the region where the light-transmitting hole is located.

[0054] In one implementation, the upper surface of the third electrode layer 230 in the light-transmitting area A2, that is, the surface of the third electrode layer 230 away from the second substrate 210, can be improved, and a first microstructure 270a can be formed on the upper surface of the third electrode layer 230. The first microstructure 270a changes the reflection direction of the ambient light incident on the third electrode layer 230, and reflects part of the light to the second pixel defining layer 220 and part of the light to the second black matrix layer 260. That is, at this time, part of the reflected light will be emitted from the side of the light-transmitting hole, enter the second pixel defining layer 220 or the second black matrix layer 260, and be blocked by the second pixel defining layer 220 and the second black matrix layer 260, but will not be emitted from the light-emitting side of the display panel (specifically, the light-emitting area corresponding to the light-transmitting hole). Without reducing the transmittance, the reflectivity of the light-transmitting area A2 can be reduced, thereby reducing the reflectivity difference between the light-transmitting area A2 and the display area A1, and improving the hiding of the light-transmitting hole.

[0055] In one implementation, the upper surface of the second insulating layer 250 in the light-transmitting area A2, that is, the surface of the second insulating layer 250 away from the second substrate 210, can also be improved, and a second microstructure 270b can be formed on the upper surface of the second insulating layer 250. The second microstructure 270b changes the reflection direction of the ambient light incident on the second insulating layer 250, and reflects part of the light to the second black matrix layer 260, that is, at this time, part of the reflected light will be emitted from the side of the light-transmitting hole, enter the second black matrix layer 260, and be blocked by the second black matrix layer 260, and will not be emitted from the light-emitting side of the display panel (specifically, the light-emitting area corresponding to the light-transmitting hole). Under the premise of not reducing the transmittance, the reflectivity of the light-transmitting area A2 can be reduced, thereby reducing the reflectivity difference between the light-transmitting area A2 and the display area A1, and improving the hiding of the light-transmitting hole. Among them, the ambient light reflected from the second insulating layer 250 to the second black matrix layer 260 is mainly the light reflected from the third electrode layer 230 to the second insulating layer 250.

[0056] In the embodiment of the present disclosure, the surface structure of the third electrode layer 230 or the second insulating layer 250 is improved, which can change the reflection direction of part of the ambient light so that it will not be emitted from the light-emitting side of the display panel, thereby reducing the reflectivity. At the same time, the materials of the film layers in the light-transmitting area remain unchanged, and the opening ratio of the light-transmitting holes also remains unchanged, so it will not affect the transmittance of the light-transmitting area, that is, it is possible to reduce the reflectivity while ensuring the transmittance.

[0057] In one implementation, Fig.11 As shown, an anti-reflection and anti-reflection layer 280 may be further disposed above the third electrode layer 230 , and the anti-reflection and anti-reflection layer 280 may reduce the reflection of ambient light at the third electrode layer 230 .

[0058] Among them, the anti-reflection and anti-transmission layer 280 can reduce the reflection at the third electrode layer 230 by refractive index matching. Specifically, when the refractive index of the anti-reflection and anti-transmission layer 280 is close to the refractive index of the third electrode layer 230, the reflection of the ambient light when passing through the interface of these media will be reduced. In some cases, the anti-reflection and anti-transmission layer 280 can also adopt a gradient refractive index gradual change design, that is, the refractive index of the film gradually changes from the interface to the inside. This design can make the ambient light gradually adapt to the change of refractive index when passing through the anti-reflection and anti-transmission layer 280, thereby reducing reflection and improving transmittance. Exemplarily, the anti-reflection and anti-transmission layer 280 can be prepared using materials such as silicon dioxide, magnesium oxide, magnesium fluoride, aluminum oxide, zirconium oxide, and calcium fluoride.

[0059] In a specific implementation, a first through hole H1 is formed on the second pixel defining layer 220. When forming the anti-reflection and anti-reflection layer 280, the anti-reflection and anti-reflection layer 280 can be formed at the position of the first through hole H1 by using a process such as ultrasonic spraying or chemical vapor deposition (CVD) according to different materials of the anti-reflection and anti-reflection layer 280. Optionally, the surface of the anti-reflection and anti-reflection layer 280 away from the second substrate 210 is flush with the surface of the second pixel defining layer 220 away from the second substrate 210. In this way, the anti-reflection and anti-reflection layer 280 just fills the first through hole H1, and the process is simple to implement.

[0060] Compared with the related art, the display panel of the embodiment of the present disclosure arranges a microstructure on the surface of the third electrode layer and / or the second insulating layer in the light-transmitting area away from the second substrate, and arranges an anti-reflection and anti-reflection film between the third electrode layer and the second packaging layer, wherein the microstructure can make part of the ambient light be reflected to the second pixel defining layer or the second black matrix layer when the ambient light is incident on the microstructure, and will not be emitted from the light-emitting side of the display panel, and the anti-reflection and anti-reflection film can reduce the reflection of the ambient light by the third electrode layer, so as to effectively reduce the reflection of the light-transmitting area while ensuring the transmittance of the light-transmitting hole, thereby reducing the reflectivity difference between the light-transmitting area and the display area, and improving the hiding of the light-transmitting hole.

[0061] In a possible implementation manner, the first microstructure 270a or the second microstructure 270b includes a plurality of first protrusions.

[0062] Specifically, the first microstructure 270a or the second microstructure 270b includes two or more first protrusions, each of which has the same or similar shape, the same or similar size, and each of which is arranged according to a certain rule. For example, each of the first protrusions is evenly distributed on the upper surface of the third electrode layer 230 or the second insulating layer 250. This arrangement can ensure that the relative positions and spacings between each of the first protrusions remain consistent, thereby ensuring the uniformity of light transmission in the light-transmitting area A2. It is understandable that the first protrusions can also be distributed in other ways, for example, they can also be distributed in a stepped manner along the aperture direction of the light-transmitting hole, and in the area close to the light-transmitting hole, they are evenly distributed around the light-transmitting hole with a first density, and in the circumferential direction away from the light-transmitting hole, they are evenly distributed around the light-transmitting hole with a second density, wherein the first density can be greater than or less than the second density.

[0063] Optionally, the first protrusion is an arc-shaped protrusion or a polygonal protrusion. For example, the arc-shaped protrusion can be a semicircular protrusion, a one-third circular protrusion, etc., and the polygonal protrusion can be an octagonal protrusion, a hexadecagonal protrusion, etc. It can be understood that the polygonal protrusion in the embodiment of the present disclosure is preferably a polygonal protrusion of a half structure, that is, a half structure in a polygonal protrusion. For details, please refer to Figure 4 , Figure 4 It is a schematic diagram of the structure in which an arc-shaped protrusion is provided on the third electrode layer.

[0064] Optionally, when the first protrusion is a triangular protrusion, the angle between the line connecting the protrusion vertex and the protrusion edge of the triangular protrusion and the first plane is in the range of 65° to 80°, and the first plane is a plane parallel to the second substrate 210. Figure 5 , Figure 5 Schematic diagram of a structure in which a triangular protrusion is provided on the third electrode layer, wherein the line connecting the protrusion vertex and the protrusion edge of the triangular protrusion can also be understood as Figure 5 The two sides of the middle triangular protrusion and the base of the triangular protrusion can be understood as being parallel to the first plane, that is, the angle formed by the two sides and the base of the triangle ranges from 65° to 80°. This angle setting can ensure that more ambient light is reflected to the second pixel defining layer 220 or the second black matrix layer 260.

[0065] In the related art, the upper surface of the third electrode layer 230 is a planar structure. When ambient light is incident on the upper surface of the third electrode layer 230, part of the ambient light passes through the third electrode layer 230, and part of the ambient light is reflected at the upper surface of the third electrode layer 230. According to the law of reflection, for vertically incident ambient light, this part of the ambient light will return to the light-emitting side of the display panel along the original path. In the embodiment of the present disclosure, a first protrusion is formed on the upper surface of the third electrode layer 230. When ambient light is incident on the upper surface of the third electrode layer 230, the incident angle of the ambient light changes compared to the planar structure. According to the law of reflection, the reflection angle of the ambient light at the third electrode layer 230 will also change accordingly, so that part of the reflected light will be emitted from the side, such as Figures 4 to 5 As shown, part of the reflected ambient light toward the second pixel defining layer 220 and / or the second black matrix layer 260 will be blocked by the second pixel defining layer 220 and the second black matrix layer 260 and cannot be emitted from the light output side of the display panel, thereby reducing the reflectivity of the light-transmitting area A2.

[0066] In a possible implementation manner, the first microstructure includes a plurality of first recesses.

[0067] Specifically, the first microstructure includes two or more first depressions, each of which has the same or similar shape, the same or similar size, and each of which is arranged according to a certain rule. For example, each of the first depressions is evenly distributed on the upper surface of the third electrode layer 230. This arrangement can ensure that the relative positions and spacings between each of the first depressions remain consistent, thereby ensuring the uniformity of light transmission in the light-transmitting area A2. It is understandable that the first depressions can also be distributed in other ways, for example, they can also be distributed in a stepped manner along the aperture direction of the light-transmitting hole, and in the area close to the light-transmitting hole, they are evenly distributed around the light-transmitting hole with a first density, and in the circumferential direction away from the light-transmitting hole, they are evenly distributed around the light-transmitting hole with a second density, wherein the first density can be greater than or less than the second density. Exemplarily, the first depression can also be understood as a pit, that is, a plurality of pits are formed on the upper surface of the third electrode layer 230 by an etching process.

[0068] Optionally, the first depression is an arc-shaped depression, and the arc-shaped depression can be a semicircular depression, a third of a circular depression, or the like. Figure 6 , Figure 6 Schematic diagram of a structure for forming a first recess on the third electrode layer, as shown in Figure 6As shown, the principle is the same as the first protrusion. When ambient light is incident on the upper surface of the third electrode layer 230, the incident angle of the ambient light changes compared to the planar structure. According to the law of reflection, the reflection angle of the ambient light at the third electrode layer 230 will also change accordingly, so that part of the reflected light will be emitted from the side of the light-transmitting hole, wherein part of the reflected ambient light toward the second pixel defining layer 220 and / or the second black matrix layer 260 will be blocked by the second pixel defining layer 220 and the second black matrix layer 260 and cannot be emitted from the light-emitting side of the display panel, thereby reducing the reflectivity of the light-transmitting area A2.

[0069] Optionally, the first touch layer 170 in the display area A1 includes, in addition to the first touch electrode layer, the first insulating layer 1710 and the second touch electrode layer, a first buffer layer disposed between the first encapsulation layer 160 and the first touch electrode layer, and a first protective layer 1720 disposed on the side of the second touch electrode layer away from the first substrate 110. Exemplarily, the first buffer layer can be formed of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride; the first protective layer 1720 is a TOC layer, which is a touch protection layer. Exemplarily, the material of the first protective layer may include inorganic insulating materials or organic insulating materials. Correspondingly, the light-transmitting area A2 may also include a second buffer layer disposed on the same layer as the first buffer layer, and a second protective layer 290 disposed on the same layer as the first protective layer 1720. In the embodiment of the present disclosure, only the insulating layer (including the first insulating layer 1710 located in the display area A1 and the second insulating layer 250 located in the light-transmitting area A2) and the protective layer (including the first protective layer 1720 located in the display area A1 and the second protective layer 290 located in the light-transmitting area A2) in the touch layer are drawn, and no improved design is made for other film layers, such as the buffer layer and the touch electrode layer, and therefore other film layers are not drawn in the figure.

[0070] In a possible implementation, when the second microstructure 270 b is formed on the second insulating layer 250 , the materials of each layer in the touch layer also need to be designed accordingly.

[0071] Optionally, when the first touch layer 170 includes a first buffer layer, a first touch electrode layer, a first insulating layer 1710, a second touch electrode layer and a first protective layer 1720 stacked in sequence in a direction away from the first substrate 110, the light-transmitting area A2 further includes a second protective layer 290, the second protective layer 290 is disposed in the same layer as the first protective layer 1720, and the refractive index of the second protective layer 290 is less than the refractive index of the second microstructure 270b. The second microstructure 270b is formed by etching the surface of the second insulating layer 250, and the second microstructure 270b is made of the same material as the second insulating layer 250, so the refractive index of the second microstructure 270b is the same as the refractive index of the second insulating layer 250, and the refractive index of the second protective layer 290 is less than the refractive index of the second microstructure 270b, which can also be understood as the refractive index of the second protective layer 290 is less than the refractive index of the second insulating layer 250.

[0072] Optionally, the refractive index of the second microstructure 270b is greater than or equal to 1.8 and less than or equal to 1.9, and the refractive index of the second protective layer 290 is greater than or equal to 1.5 and less than or equal to 1.7. Assuming that the refractive index of the second microstructure 270b is recorded as n1 and the refractive index of the second protective layer 290 is recorded as n2, then 1.8≤n1≤1.9, 1.5≤n2≤1.7. Exemplarily, n2=1.53.

[0073] Please refer to Figure 7 , Figure 7 A schematic diagram of a structure in which a first protrusion is formed on the second insulating layer, as shown in FIG. Figure 7 As shown, the principle of anti-reflection achieved by the first protrusion on the second insulating layer is as follows:

[0074] The refractive index of the second insulating layer 250 is greater than the refractive index of the second protective layer 290. The second insulating layer 250 is equivalent to a high refractive index layer, and the second protective layer 290 is equivalent to a low refractive index layer. When the ambient light reflected by the third electrode layer 230 (expressed as reflected ambient light) enters the second protective layer 290 from the second insulating layer 250, according to the law of refraction, when light enters from one medium (refractive index n1) into another medium (refractive index n2), the incident light, the refracted light and the normal are all in the same plane, and the ratio of the sine of the incident angle to the sine of the refractive angle is equal to the ratio of the refractive indices of the two media, that is, n 1 sinθ 1 =n 2 sinθ 2In the embodiment of the present disclosure, since n1>n2, the refraction angle θ2 will be greater than the incident angle θ1, so the reflected ambient light will be deflected in the direction of the interface normal when entering the second protective layer 290, and the refraction angle θ2 increases. At this time, part of the reflected ambient light may be deflected to a degree close enough to the edge of the interface so that it is emitted from the side, that is, enters the second black matrix layer 260. This part of the reflected ambient light is blocked by the BM second black matrix layer 260 and will not be emitted from the light output side of the display panel, thereby reducing the ambient light reflection in the light-transmitting area A2.

[0075] In the disclosed embodiment, the first microstructure 270a on the third electrode layer 230 or the second microstructure 270b on the second insulating layer 250 can be prepared by a laser etching process. Taking the first microstructure 270a as an example, after a whole cathode layer is deposited in the display panel, the mask is precisely aligned with the display panel, wherein the mask has an opening corresponding to the position of the light-transmitting hole (i.e., the sensor hole), and after precise alignment, the opening on the mask is completely aligned with the position of the light-transmitting hole, so that the cathode in the light-transmitting hole area is exposed to the mask, while other areas are blocked by the mask, and then the cathode surface in the light-transmitting hole area is etched by a laser etching process to obtain a side-by-side raised or recessed structure to form the first microstructure.

[0076] In a possible implementation manner, the thickness of the third electrode layer 230 is smaller than the thickness of the second electrode layer 150 .

[0077] In the embodiment of the present disclosure, after the third electrode layer 230 and the second electrode layer 150 are prepared in the same process, the third electrode layer 230 is thinned so that the thickness of the cathode layer of the light-transmitting area A2 (that is, the third electrode layer 230) is smaller than the thickness of the cathode layer of the display area A1 (that is, the second electrode layer 150). By reducing the thickness of the third electrode layer 230, the reflection of ambient light by the third electrode layer 230 can also be reduced, that is, the reflectivity of the light-transmitting area A2 is reduced, thereby reducing the difference in reflectivity between the light-transmitting area A2 and the display area A1, thereby improving the hiding of the light-transmitting hole.

[0078] Optionally, in extreme cases, the thickness of the third electrode layer 230 may be reduced to 0, that is, the third electrode layer 230 may be directly removed, that is, the light-transmitting area A2 has no cathode, and the reflectivity of the light-transmitting area A2 may be greatly reduced.

[0079] It is understandable that in the embodiment of the present disclosure, the technical solutions of providing the first microstructure on the surface of the third electrode layer 230 away from the second substrate 210, providing the second microstructure on the surface of the second insulating layer 250 away from the second substrate 21, and reducing the thickness of the third electrode layer 230 can be arbitrarily combined to reduce the reflectivity of the light-transmitting area. Exemplary, Figure 8This is a schematic diagram of a structure in which an arc-shaped protrusion is provided on the third electrode layer and a triangular protrusion is provided on the second insulating layer. Fig. 9 The schematic diagram is a structural diagram of a triangular protrusion being provided on the third electrode layer and a triangular protrusion being provided on the second insulating layer. Fig.10 This is a schematic diagram of a structure in which an arc-shaped depression is provided on the third electrode layer and a triangular protrusion is provided on the second insulating layer. Fig.11 It is a schematic diagram of the structure in which the thickness of the third electrode layer is reduced. Fig.12 In addition, the second microstructure on the second insulating layer can also be a structure such as an arc-shaped protrusion, which will not be described in detail in the embodiment of the present disclosure.

[0080] Based on the same inventive concept, the second aspect of the present disclosure provides a method for preparing a display panel, such as Fig.13 As shown, the following steps are included:

[0081] Step S10, providing a first substrate, and forming a first pixel definition layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first encapsulation layer, a first touch layer and a first black matrix layer stacked in sequence on the first substrate, wherein the first touch layer includes a first touch electrode layer, a first insulating layer and a second touch electrode layer stacked in sequence in a direction away from the first substrate;

[0082] Step S20, providing a second substrate, and forming a second pixel defining layer, a third electrode layer, a second encapsulation layer, a second insulating layer and a second black matrix layer stacked in sequence on the second substrate, the third electrode layer and the second electrode layer are arranged on the same layer, the second encapsulation layer and the first encapsulation layer are arranged on the same layer, the second insulating layer and the first insulating layer are arranged on the same layer, the second black matrix layer and the first black matrix layer are arranged on the same layer, and light-transmitting holes are arranged at corresponding positions of the second black matrix layer and the second pixel defining layer; wherein the light-transmitting area also includes a dimming structure, the dimming structure is arranged on a side of the third electrode layer away from the second substrate, and the dimming structure is used to reduce the ambient light reflected from the light-transmitting area to the light-emitting side of the display panel.

[0083] Compared with the related art, the display panel prepared by the preparation method of the embodiment of the present invention has a dimming structure formed above the third electrode layer in the light-transmitting area. The dimming structure can reflect part of the ambient light to the second pixel defining layer or the second black matrix layer without being emitted from the light-emitting side of the display panel, or directly reduce the reflection of the ambient light by the third electrode layer. Therefore, the reflection of ambient light in the light-transmitting area can be effectively reduced, thereby reducing the reflectivity difference between the light-transmitting area and the display area, and improving the hiding of the light-transmitting hole.

[0084] Based on the same inventive concept, the third aspect of the present disclosure provides a display device, including the display panel as described above; and an optical sensor disposed on the non-light-emitting side of the display panel and located in the light-transmitting area. Exemplarily, the display device can be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigator, etc., which is not limited in this embodiment.

[0085] Obviously, the above embodiments of the present disclosure are merely examples for clearly illustrating the present disclosure, and are not limitations on the implementation methods of the present disclosure. For ordinary technicians in this field, other different forms of changes or modifications can be made on the basis of the above description. It is impossible to list all the implementation methods here. All obvious changes or modifications derived from the technical solution of the present disclosure are still within the protection scope of the present disclosure.

Claims

1. A display panel, characterized in that: The display panel has a light-transmitting area and a display area surrounding the light-transmitting area, wherein the display area includes a first substrate, a first pixel defining layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first encapsulation layer, a first touch layer and a first black matrix layer sequentially stacked on the first substrate, wherein the first touch layer includes a first touch electrode layer, a first insulating layer and a second touch electrode layer sequentially stacked in a direction away from the first substrate, and the light-transmitting area includes a second substrate, a second pixel defining layer, a third electrode layer, a second encapsulation layer, a second insulating layer and a second black matrix layer sequentially stacked on the second substrate, wherein the third electrode layer is arranged in the same layer as the second electrode layer, the second encapsulation layer is arranged in the same layer as the first encapsulation layer, the second insulating layer is arranged in the same layer as the first insulating layer, the second black matrix layer is arranged in the same layer as the first black matrix layer, and light-transmitting holes are arranged at corresponding positions of the second black matrix layer and the second pixel defining layer; wherein the light-transmitting area further includes a dimming structure, wherein the dimming structure is arranged on a side of the third electrode layer away from the second substrate, and the dimming structure is used to reduce ambient light reflected from the light-transmitting area to a light-emitting side of the display panel.

2. The display panel according to claim 1, characterized in that: The dimming structure includes at least one of a first microstructure, a second microstructure and an anti-reflection and anti-transmission layer. The first microstructure is arranged on the surface of the third electrode layer away from the second substrate, the second microstructure is arranged on the surface of the second insulating layer away from the second substrate, and the anti-reflection and anti-transmission layer is arranged between the third electrode layer and the second packaging layer. When ambient light is incident on the first microstructure or the second microstructure, part of the ambient light is reflected to the second pixel defining layer or the second black matrix layer.

3. The display panel according to claim 2, characterized in that: The first microstructure or the second microstructure includes a plurality of first protrusions.

4. The display panel according to claim 3, characterized in that: The first protrusion is an arc-shaped protrusion, a polygonal protrusion or a triangular protrusion, and the angle between the line connecting the protrusion vertex and the protrusion edge of the triangular protrusion and the first plane is in the range of 65° to 80°, and the first plane is a plane parallel to the second substrate.

5. The display panel according to claim 2, characterized in that: The first microstructure includes a plurality of first recesses.

6. The display panel according to claim 5, characterized in that: The first depression is an arc-shaped depression or a polygonal depression.

7. The display panel according to claim 2, characterized in that: The first touch layer also includes a first protective layer arranged on the side of the second touch electrode layer away from the first substrate. The light-transmitting area also includes a second protective layer. The second protective layer is arranged on the same layer as the first protective layer, and the refractive index of the second protective layer is smaller than the refractive index of the second microstructure.

8. The display panel according to claim 7, characterized in that: The refractive index of the second microstructure is greater than or equal to 1.8 and less than or equal to 1.9, and the refractive index of the second protective layer is greater than or equal to 1.5 and less than or equal to 1.

7.

9. The display panel according to claim 2, characterized in that: A surface of the anti-reflection and anti-reflection layer away from the second substrate is flush with a surface of the second pixel defining layer away from the second substrate.

10. The display panel according to claim 1, characterized in that: The thickness of the third electrode layer is smaller than the thickness of the second electrode layer.

11. A method for preparing a display panel, characterized in that: The following steps are involved: Providing a first substrate, forming a first pixel defining layer, a first electrode layer, a light-emitting device layer, a second electrode layer, a first encapsulation layer, a first touch layer and a first black matrix layer stacked in sequence on the first substrate, wherein the first touch layer includes a first touch electrode layer, a first insulating layer and a second touch electrode layer stacked in sequence in a direction away from the first substrate; A second substrate is provided, and a second pixel defining layer, a third electrode layer, a second encapsulation layer, a second insulating layer and a second black matrix layer are formed on the second substrate in sequence, the third electrode layer is arranged on the same layer as the second electrode layer, the second encapsulation layer is arranged on the same layer as the first encapsulation layer, the second insulating layer is arranged on the same layer as the first insulating layer, the second black matrix layer is arranged on the same layer as the first black matrix layer, and light-transmitting holes are arranged at corresponding positions of the second black matrix layer and the second pixel defining layer; wherein the light-transmitting area also includes a dimming structure, the dimming structure is arranged on a side of the third electrode layer away from the second substrate, and the dimming structure is used to reduce the ambient light reflected from the light-transmitting area to the light-emitting side of the display panel.

12. A display device, characterized in that: A display panel comprising any one of claims 1 to 10; and An optical sensor is arranged on the non-light-emitting side of the display panel and located in the light-transmitting area.

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