High-silica glass shallow liquid level grading founding device and continuous production method

Abstract

According to the high-silica glass shallow liquid level grading melting device and the continuous production method, a melting furnace adopts four layers of electrodes, and corresponding power, current and voltage are set according to the temperature requirement of glass melting, so that the temperature of a glass kiln is reasonably distributed in a stepped manner, the quality of the melted glass is good, the components are stable, and the wiredrawing operation is normal. By adopting split control and shallow pool homogenization cooling, efficient glass melting, ordered production rhythm, flexible control and convenient adjustment are realized, stable glass components are ensured, glass pollution is reduced, the efficiency is increased, the cost is saved, and the overall performance requirement of the ternary high-silica glass is ensured. The prepared high-silica glass fiber can be used as a high-temperature-resistant, insulating, structural and bulk multifunctional material, can be massively used as a heat-proof material for rockets and missiles, has good economic benefits and social benefits, and is suitable for industrial production.

Description

Technical Field

[0001] The invention relates to the technical field of high-silica glass fiber production, in particular to a shallow liquid surface high-temperature melting device and a continuous production process method for melting ternary high-silica glass with four-level power. Background Art

[0002] High silica glass fiber is first industrially produced by HIThompson in the United States based on the research of Owens Corning Fiberglass Company. High silica glass is made of sodium borosilicate glass through phase separation, acid treatment, drying and sintering. The performance and composition are close to quartz glass. It has the advantages of high temperature resistance, good chemical stability, low thermal expansion coefficient, and ultraviolet light transmission. It is widely used in aerospace, metallurgy, chemical industry, building materials, fire protection and other fields.

[0003] The current technology basically adopts the process of making balls in a single kiln and then heating and drawing the wires. Although some manufacturers have tried to use pool kilns for one-time drawing, they all failed and stopped production due to various reasons. The existing problems are: the glass liquid seriously erodes the refractory materials of the kiln, the quality of the glass liquid has major defects, resulting in wire breakage, serious flying wires, unstable fiber quality, short kiln life, and high energy consumption.

[0004] CM212894424U provides a fully electric melting furnace for producing high-silica glass balls, which includes a furnace body and a drainage device; the furnace body is a two-layer structure, the inner wall of the furnace body is in contact with the molten high-silica glass, and the material of the inner wall of the furnace body is electric melting brick; the material of the outer wall of the furnace body is insulation material; multiple groups of molybdenum electrodes are arranged on the top of the furnace body; the heating ends of the multiple groups of molybdenum electrodes are arranged inside the furnace body; the drainage device is used to guide the molten high-silica glass in the furnace body to flow out. However, the furnace uses a top-inserted electrode structure, the melting part is relatively concentrated, and the staged melting effect cannot be produced. The melting efficiency is low, and the furnace structure is complex. The subsequent glass clarification efficiency is low and the quality is unstable.

[0005] CM215250384U relates to a unit furnace for all-electric melting glass, including a rectangular deep melting pool, a forming pool and a plurality of electrode arrays; through the arrangement of multiple layers and multiple pairs of electrode arrays on the two long sides of the melting channel, the melting, homogenization and clarification zones of the melting channel are clearly divided into zones, and flow to the flow holes along the length direction of the melting channel, taking into account the glass melting process characteristics of the conventional rectangular flame unit furnace, the horizontal distribution of the melting, homogenization and clarification along the length direction of the furnace, and the vertical distribution of the melting, homogenization and clarification along the depth direction of the furnace in the conventional vertical all-electric melting furnace. However, the working pool of the furnace is too small, or even has no working pool, which cannot fully clarify and homogenize the high-viscosity and severely volatile glass liquid. The fiber quality prepared by this furnace type is unstable, and the performance cannot meet the needs of high-silica glass fiber.

[0006] CM101456664A discloses a special fiber glass melting method, the steps are preparing a mixture, melting, and clarifying. Before melting, the electric melting furnace is first baked in the melting process, and the hot spot temperature of the furnace is maintained at 1500-1600°C for normal operation. During melting, the depth of the glass liquid in the melting part is greater than 600mm. The special electric melting furnace of the method includes an electrode, a melting part, and a power supply system for the forming part. The furnace is used to melt low-boron formulas, the furnace pool is deep and large, and the clarification is slow, which cannot meet the efficient production of high-volatile high-silica glass fibers.

[0007] In summary, the current existing technology cannot achieve efficient high-silica glass continuous drawing in a pool furnace, and there is no report in domestic and foreign literature on the one-time continuous drawing of high-boron, high-silicon, high-viscosity, low-expansion glass fibers in a continuous pool furnace. Summary of the invention

[0008] In order to overcome the shortcomings of the prior art of slow high-silica glass melting and clarification, large boron volatilization, unstable glass composition and quality, long adjustment cycle and inflexible control, the present invention proposes a high-silica glass shallow liquid surface graded melting device and a continuous production method.

[0009] The shallow liquid surface graded melting device of high silica glass proposed in the present invention is characterized by comprising a four-stage melting furnace with a deep multi-well type tank, a liquid flow pipe, an ascending channel, a working tank, a material distribution channel, a passage and a wire drawing machine. The four-stage melting furnace with a deep multi-well type tank is connected to one end of the liquid flow pipe; the other end of the liquid flow pipe is connected to one end of the ascending channel; the other end of the ascending channel is connected to the front end of the working tank; two material distribution channels are installed on the outer surface of the other side of the working tank. The other ends of the two material distribution channels are connected to the wire drawing machine. The front end of the passage is connected to the material distribution channel; the front end of the material distribution channel is connected to the bottom of the working tank; there is a silicon carbon rod at the upper part of the material distribution channel, which is not in contact with the glass liquid and the quartz glass material, and heats the upper part of the material distribution channel.

[0010] The shell of the multi-side well type deep pool four-stage melting furnace is provided with three electrode groups, each of which is divided into four levels from top to bottom.

[0011] The height difference between two adjacent layers of electrodes is 35 cm. In the electrodes, the top layer has two electrodes in each direction, and the distance between the two electrodes is 40 cm; the second layer has three electrodes, and the distance between adjacent electrodes in the second layer is 40 cm; the third layer and the fourth layer each have one electrode. A cooling water jacket is installed on each of the electrodes.

[0012] The electrode material is a molybdenum electrode or a platinum-rhodium electrode;

[0013] One side of the working pool is in an arc shape, and a material distribution channel opening is provided at the bottom of the arc side; an electrode is installed on the working pool for heating the working pool; and a cooling water jacket is mounted on the electrode;

[0014] There are two material distribution channels, and the angle between them is 45 degrees;

[0015] The passage is made of quartz glass material, and the upper part is heated by a silicon carbon rod, which is above the top quartz material and does not contact the glass liquid and the quartz glass material. At the same time, a wire drawing machine hole is set at the bottom of the passage, and a wire drawing machine is connected below the wire drawing machine hole.

[0016] The specific process of using the high-temperature melting device to melt the shallow liquid surface of high-silicon-oxygen glass proposed by the present invention is:

[0017] Step 1: Kiln heating:

[0018] The multilateral well-type deep pool four-stage melting furnace, liquid flow pipe, ascending channel, working pool, distribution channel and passage are heated at a rate of 1 to 2°C per hour; wherein the temperature of the multilateral well-type deep pool four-stage melting furnace is 1350 to 1400°C, the temperature of the ascending channel is 1200 to 1230°C, the temperature of the working pool is 1180 to 1200°C, the temperature of the distribution channel is 1150 to 1180°C, and the temperature of the passage is 1100 to 1150°C.

[0019] Step 2: Preparation of batch materials:

[0020] According to the mass fraction, weigh 50-56% of quartz sand, 3-5% of albite, 14-20% of borax, 18-24% of boric acid, 2.4-6% of soda ash, and 0.1-0.6% of cerium oxide; mix the above raw materials until the uniformity is greater than 96% and completely pass through a 50-mesh standard sieve for use.

[0021] Step 3: Glass melting:

[0022] The batch material of step 2 is added into the heated multilateral well-type deep pool four-stage melting furnace for melting.

[0023] The molten glass flows through the liquid flow hole, the rising channel, the working pool and the material distribution channel at one time, and finally enters the passage and is wound into glass fibers under the action of the wire drawing machine.

[0024] When melting glass, the parameters of each layer of electrodes are:

[0025] The first layer of electrode power is 120-150kW, the temperature is 1250-1280℃, the current is 210-240A, and the voltage is 350-380V;

[0026] The second layer electrode power is 150-170kW, the temperature is 1350-1400℃, the current is 240-260A, and the voltage is 360-380V;

[0027] The third layer electrode power is 10-16kW, the temperature is 1350-1400℃, the current is 45-55A, and the voltage is 220-240V;

[0028] The fourth layer electrode power is 5-15kW, the temperature is 1250-1280°C, the current is 10-24A, and the voltage is 220-210V.

[0029] Step 4: Finished product

[0030] The six bundles of glass fibers obtained in step 3 are combined into one strand, and then pickled with hydrochloric acid, dried and calcined to obtain a ternary high-silica glass fiber product.

[0031] At this point, the process of melting the high-silica glass shallow liquid surface is completed.

[0032] The hydrochloric acid pickling temperature is 90°C, the drying temperature is 105°C, and the calcination temperature is 650°C.

[0033] The melting furnace of the present invention adopts four layers of electrodes, and each layer of electrodes carries out different power input according to the temperature requirements of the specific glass melting quality, melts the glass according to the glass generation law, and ensures that high-homogeneous glass liquid is melted. The daily feed rate of the kiln used in the present invention is greater than 4 tons / day, and some ball-making products can be connected at the same time. The back end adopts a flow hole working pool structure to fully meet the process requirements of glass clarification and homogenization, realizes efficient melting and homogenization of glass, avoids the erosion and volatilization of high boron materials on the furnace wall, and the process operation process is simple. The glass is uniform, no boron silicon phase separation occurs, boron volatilization is small, and the glass components are uniform. High production efficiency, no volatiles, environmental protection and energy saving. Small erosion to the kiln, long kiln production life, and low production cost. The present invention adopts a split structure, split control, and shallow pool homogenization cooling, which ensures the quality of the glass while realizing efficient glass melting, energy saving, orderly production rhythm, flexible control, and convenient adjustment. The present invention adopts a closed material distribution channel and passage to ensure the stability of the glass composition, reduce glass pollution, increase efficiency and save costs, and ensure the overall performance requirements of the ternary high silica glass. The prepared high-silica glass fiber has stable composition, high strength, low bubble content, high glass melting efficiency, high whiteness, high linear density, high breaking strength, high SiO2 content, small thermal vector and shrinkage. The preparation process of the present invention has no waste liquid and waste gas emissions, is less harmful to operators and the environment, has good economic and social benefits, and is suitable for industrial production. The preparation process of the present invention has no waste liquid and waste gas emissions, is less harmful to operators and the environment, has good economic and social benefits. The softening point of the ternary high-silica glass fiber product prepared by the present invention is close to 1700°C, can be used for a long time in a 900°C environment, can instantly withstand thousands of degrees of air flow scouring, and can be widely used in spacecraft thermal ablation materials, high temperature resistant insulation and fireproof materials, high temperature resistant insulation materials, high temperature gas dust collection, liquid filtration, metal melting filtration purification and other purposes. The prepared ternary high-silica glass fiber product can also be used as a high temperature resistant-insulating-structural-integrated multifunctional material. The prepared ternary high-silica glass fiber can also be used to reinforce phenolic resin to make high-temperature resistant and ablation-resistant fiberglass parts of various structural forms, which are widely used in heat-resistant materials for rockets and missiles.

[0034] The process operation process of the present invention is simple, the glass is uniform, no borosilicate phase separation occurs, the boron volatilization is small, and the glass components are uniform. The production efficiency is high, the volatile matter is very small, and it is environmentally friendly and energy-saving. Reasonable current distribution has little erosion on kiln bricks, the production life of the kiln is extended, and the production cost is low. The temperature step distribution of the glass kiln is reasonable, the molten glass is of good quality, the composition is stable, and the wire drawing operation is normal. The present invention is suitable for continuous pool kiln wire drawing of high-boron, high-silicon, high-viscosity, and low-expansion glass fibers. The production process has little harm to operators and the environment, has good economic and social benefits, and is suitable for industrial production.

[0035] Compared with the prior art, the present invention has the following technical effects:

[0036] The kiln melting furnace of the present invention adopts four layers of electrodes, and each layer of electrodes performs different power input according to the temperature requirements of the specific glass melting quality, melts the glass according to the glass generation law, and ensures the continuous melting of high-homogeneous glass liquid. The continuous daily output of the kiln used in the present invention is greater than 4 tons / day, and some ball-making products can be connected at the same time. The shallow liquid surface structure of the flow hole working pool at the rear end fully meets the process requirements of glass clarification and homogenization, realizes efficient melting and homogenization of glass, avoids the erosion and volatilization of the furnace wall by high-boron materials, and has a simple process operation process, uniform glass liquid, no borosilicate phase separation, small boron volatilization, and uniform glass components. High production efficiency, no volatiles, environmental protection and energy saving. The overall process of the present invention adopts a "fast melting" scheme, which has little erosion on the kiln, a long kiln production life, and low production cost.

[0037] The present invention adopts a split structure, split control, and shallow pool homogenization cooling, which ensures the quality of the glass while achieving efficient glass melting, energy saving, orderly production rhythm, flexible control, and convenient adjustment.

[0038] The present invention adopts a closed material distribution channel and passage, which ensures the stability of glass composition, reduces glass pollution, increases efficiency and saves costs, and ensures the overall performance requirements of ternary high-silica glass. The prepared high-silica glass fiber has stable composition, high strength, low bubble content, high glass melting efficiency, high whiteness, high linear density, high breaking strength, high SiO2 content, and small thermal vector and shrinkage. The continuous preparation process of the present invention has no waste liquid and waste gas emissions, has little harm to operators and the environment, has good economic and social benefits, and is suitable for industrial production. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 It is a schematic diagram of the structure of a shallow liquid surface high temperature melting device for melting ternary high silica glass at four power levels;

[0040] Figure 2 It is a schematic diagram of the structure of a four-level power melting pit electric melting furnace device;

[0041] Figure 3 It is a schematic diagram of the top view structure of the electrode part of the rising channel;

[0042] Figure 4 It is a structural diagram of the main view of the working pool;

[0043] Figure 5 It is a schematic diagram of the main view structure of the material distribution channel;

[0044] Figure 6 It is a schematic diagram of the main view structure of the passage;

[0045] In the figure: 1. a four-stage melting furnace with a deep pool of a multi-sided well; 2. a liquid flow hole; 3. an ascending channel; 4. a working pool; 5. a material distribution channel; 6. a passage; 101. an electrode; 102. a water jacket; 103. a refractory layer; 104. a light insulation layer; 301. an electrode; 302. a water jacket; 303. a circular hole; 304. a 41ws refractory material; 305. a light insulation material; 401. an electrode; 402. a stainless steel water jacket; 403. a quartz glass material; 501. a quartz glass material; 502. a silicon carbon rod; 503. a glass liquid; 601. a quartz glass material; 602. a silicon carbon rod; 603. a glass liquid; 604. a hole for a wire drawing machine. DETAILED DESCRIPTION

[0046] This embodiment is a shallow liquid surface high temperature melting device and continuous production process method for melting ternary high silica glass at four-level power, including a sealing furnace, a four-level melting furnace 1 with a multi-sided well-type deep pool, a liquid flow pipe 2, an ascending channel 3, a working pool 4, a material distribution channel 5, a passage 6 and a wire drawing machine 7. The multi-sided well-type deep pool four-level melting furnace is connected to one end of the liquid flow pipe; the other end of the liquid flow pipe is connected to one end of the ascending channel; the other end of the ascending channel is connected to one side of the working pool; and two material distribution channels 5 are installed on the outer surface of the other side of the working pool. The other ends of the two material distribution channels are both connected to the passage 6.

[0047] Three electrode groups 101 are distributed on the shell of the multi-sided deep pool four-stage melting furnace 1. Each electrode group is divided into 4 levels from top to bottom, and the height difference between two adjacent layers of electrodes is 35 cm. Among the electrodes, the top layer has 2 electrodes side by side in each direction, and the distance between the two electrodes is 40 cm; the second layer has 3 electrodes, and the distance between adjacent electrodes in the second layer is 40 cm; the third layer and the fourth layer each have 1 electrode. A cooling water jacket 102 is installed on each electrode.

[0048] The electrode material is a molybdenum electrode or a platinum-rhodium electrode; the water jacket material is 301 stainless steel or 310S stainless steel.

[0049] The inner wall of the melting furnace is made of corrosion-resistant high-temperature material 41ws refractory material 103, and the outer layer is lightweight thermal insulation material 104, with a wall thickness greater than 40cm.

[0050] The molten glass liquid enters the ascending channel 3 through the liquid flow pipe 2, wherein the material of the liquid flow pipe is 41ws refractory material;

[0051] The ascending channel 3 is connected to the liquid flow pipe 2 and is made of 41ws refractory material 304 and lightweight thermal insulation material 305;

[0052] The front end of the working pool 4 is connected to the ascending channel 3. One side of the working pool 4 is arc-shaped, and the thickness of the glass liquid is 15 cm. The material of the working pool 4 is quartz glass material 403, the thickness is 20 cm, and the area is the same as that of the melting furnace. The bottom of the semicircular part of the working pool 4 has a material distribution channel opening. The working pool 4 is heated by an electrode 401, and the electrode 401 is cooled by a stainless steel water jacket 402.

[0053] The front end of the material distribution channel 5 is connected to the bottom of the working pool 4, and the length is 4.22m; the material channel 5 is completely filled with glass liquid 503, and the material is quartz glass material 501; the upper part of the material distribution channel is heated by silicon carbon rods 502, and the silicon carbon rods 502 are above the top quartz material 501 and do not contact the glass liquid 503 and the quartz glass material 501. There are two material distribution channels, and the angle is 45 degrees;

[0054] The front end of the passage 6 is connected to the material distribution channel 5, and the length is matched according to the kiln output and the wire drawing rate; the material of the passage 6 is quartz glass material 601, and the upper part is heated by a silicon carbon rod 602, and the silicon carbon rod 602 is above the top quartz material 601 and does not contact the glass liquid 603 and the quartz glass material 601; at the same time, a wire drawing machine hole 604 is set at the bottom of the passage, and a wire drawing machine 7 is connected below the wire drawing machine hole 604.

[0055] The method for melting high-silica glass shallow liquid level using the high-temperature melting device proposed by the present invention comprises the following specific processes:

[0056] Step 1: Kiln heating:

[0057] The multilateral well-type deep pool four-stage melting furnace, liquid flow pipe, ascending channel, working pool, distribution channel and passage are heated at a rate of 1 to 2°C per hour; wherein the temperature of the multilateral well-type deep pool four-stage melting furnace is 1350 to 1400°C, the temperature of the ascending channel is 1200 to 1230°C, the temperature of the working pool is 1180 to 1200°C, the temperature of the distribution channel is 1150 to 1180°C, and the temperature of the passage is 1100 to 1150°C.

[0058] Step 2: Preparation of batch materials:

[0059] According to the mass fraction, weigh 50-56% of quartz sand, 3-5% of albite, 14-20% of borax, 18-24% of boric acid, 2.4-6% of soda ash, and 0.1-0.6% of cerium oxide; mix the above raw materials until the uniformity is greater than 96% and completely pass through a 50-mesh standard sieve for use.

[0060] The content of components in each embodiment in step 2

[0061]

[0062] Step 3: Glass melting:

[0063] The batch material in step 2 is added into the heated multi-sided well-type deep pool four-stage melting furnace for melting. To ensure melting, there are one to four layers of electrodes from bottom to top, and the parameters of each layer are:

[0064] The first layer of electrode power is 120-150kW, the temperature is 1250-1280℃, the current is 210-240A, and the voltage is 350-380V;

[0065] The second layer electrode power is 150-170kW, the temperature is 1350-1400℃, the current is 240-260A and the voltage is 360-380V;

[0066] The third layer electrode power is 10-16kW, the temperature is 1350-1400℃, the current is 45-55A, and the voltage is 220-240V;

[0067] The fourth layer electrode power is 1-15kW, the temperature is 1250-1280°C, the current is 10-24A, and the voltage is 220-210V.

[0068] The molten glass flows through the liquid flow hole, the rising channel, the working pool and the material distribution channel at one time, and finally enters the passage and is wound into glass fibers under the action of the wire drawing machine.

[0069] Electrical parameters of each embodiment in step 3

[0070]

[0071]

[0072] Step 4: Finished product

[0073] The glass fibers obtained in step 3 are synthesized into one strand by using the existing technology, and then pickled with hydrochloric acid at 90° C., dried at 105° C., and calcined at 650° C. to obtain a ternary high-silica glass fiber product.

[0074] Test results of products in each embodiment in step 4

[0075]

[0076] The kiln melting furnace of the present invention adopts four layers of electrodes, and each layer of electrodes performs different power input according to the temperature requirements of the specific glass melting quality, melts the glass according to the glass generation law, and ensures the continuous melting of high-homogeneous glass liquid. The continuous daily output of the kiln used in the present invention is greater than 4 tons / day, and some ball-making products can be connected at the same time. The shallow liquid surface structure of the flow hole working pool at the rear end fully meets the process requirements of glass clarification and homogenization, realizes efficient melting and homogenization of glass, avoids the erosion and volatilization of the furnace wall by high-boron materials, and has a simple process operation process, uniform glass liquid, no borosilicate phase separation, small boron volatilization, and uniform glass components. High production efficiency, no volatiles, environmental protection and energy saving. The overall process of the present invention adopts a "fast melting" scheme, which has little erosion on the kiln, a long kiln production life, and low production cost.

[0077] The present invention adopts a split structure, split control, and shallow pool homogenization cooling, which ensures the quality of the glass while achieving efficient glass melting, energy saving, orderly production rhythm, flexible control, and convenient adjustment. The present invention adopts a closed material distribution channel and passage to ensure the stability of the glass composition, reduce glass pollution, increase efficiency and save costs, and ensure the overall performance requirements of the ternary high-silica glass. The prepared high-silica glass fiber has stable composition, high strength, low bubble content, high glass melting efficiency, high whiteness, high linear density, high breaking strength, high SiO2 content, and small thermal vector and shrinkage. The preparation process of the present invention has no waste liquid and waste gas emissions, is less harmful to operators and the environment, has good economic and social benefits, and is suitable for industrial production. The preparation process of the present invention has no waste liquid and waste gas emissions, is less harmful to operators and the environment, and has good economic and social benefits. The ternary high-silica glass fiber product prepared by the present invention has a softening point close to 1700°C, can be used for a long time in an environment of 900°C, can instantly withstand thousands of degrees of airflow scouring, and can be widely used in spacecraft heat-resistant ablation materials, high-temperature insulation and fireproof materials, high-temperature insulation materials, high-temperature gas dust collection, liquid filtration, metal melting filtration and purification, etc. The prepared ternary high-silica glass fiber product can also be used as a high-temperature resistant-insulating-structural-integrated multifunctional material. The prepared ternary high-silica glass fiber can also be used to reinforce phenolic resin to make various structural forms of high-temperature resistant and ablation-resistant glass fiber reinforced plastic parts, which are widely used in rockets and missiles for heat protection materials.

Claims

1. A shallow liquid level graded melting device for high silica glass, characterized in that: It comprises a four-stage melting furnace (1) with a multi-sided well-type deep pool, a liquid flow pipe (2), an ascending channel (3), a working pool (4), a material distribution channel (5), a passage (6) and a wire drawing machine (7); wherein the four-stage melting furnace with a multi-sided well-type deep pool is connected to one end of the liquid flow pipe; the other end of the liquid flow pipe is connected to one end of the ascending channel; the other end of the ascending channel is connected to the front end of the working pool; two material distribution channels are installed on the outer surface of the other side of the working pool; the other ends of the two material distribution channels are connected to the wire drawing machine (7); the front end of the passage (6) is connected to the material distribution channel; the front end of the material distribution channel is connected to the bottom of the working pool (4); a silicon carbon rod (502) is provided at the upper part of the material distribution channel and is not in contact with the glass liquid (503) and the quartz glass material (501) to heat the upper part of the material distribution channel; Three electrodes (101) are distributed on the shell of the multilateral well-type deep pool four-stage melting furnace (1); each electrode group is divided into four levels from top to bottom.

2. The shallow liquid level graded melting device for high silica glass according to claim 1, characterized in that: The height difference between two adjacent layers of electrodes is 35 cm; among the electrodes, the top layer has two electrodes arranged side by side in each direction, and the distance between the two electrodes is 40 cm; the second layer has three electrodes, and the distance between adjacent electrodes in the second layer is 40 cm; the third layer and the fourth layer each have one electrode; and each of the electrodes is installed with a cooling water jacket (102).

3. The shallow liquid level graded melting device for high silica glass according to claim 1, characterized in that: The electrode material is a molybdenum electrode or a platinum-rhodium electrode.

4. The shallow liquid level graded melting device for high silica glass according to claim 1, characterized in that: One side of the working pool (4) is in an arc shape, and a material distribution channel opening is provided at the bottom of the arc side; an electrode (401) is installed on the working pool for heating the working pool; and a cooling water jacket (402) is mounted on the electrode.

5. The shallow liquid level graded melting device for high silica glass according to claim 1, characterized in that: There are two material distribution channels, and the included angle is 45 degrees.

6. The shallow liquid level graded melting device for high silica glass according to claim 1, characterized in that: The passage (6) is made of quartz glass material (601), and the upper part is heated by a silicon carbon rod (602). The silicon carbon rod is above the top quartz material and does not contact the glass liquid (603) and the quartz glass material. At the same time, a wire drawing machine hole (604) is provided at the bottom of the passage, and a wire drawing machine (7) is connected below the wire drawing machine hole.

7. A method for melting high-silica glass shallow liquid level using the high-temperature melting device according to claim 1, characterized in that: The specific process is: Step 1: Kiln heating: The temperature of the four-stage melting furnace with a deep multi-well tank, a liquid flow pipe, an ascending channel, a working tank, a material distribution channel and a passage is heated at a rate of 1 to 2°C per hour; wherein the temperature of the four-stage melting furnace with a deep multi-well tank is 1350 to 1400°C, the temperature of the ascending channel is 1200 to 1230°C, the temperature of the working tank is 1180 to 1200°C, the temperature of the material distribution channel is 1150 to 1180°C, and the temperature of the passage is 1100 to 1150°C; Step 2: Preparation of batch materials: According to the mass fraction, weigh 50-56% of quartz sand, 3-5% of albite, 14-20% of borax, 18-24% of boric acid, 2.4-6% of soda ash, and 0.1-0.6% of cerium oxide; mix the above raw materials until the uniformity is greater than 96% and completely pass through a 50-mesh standard sieve for use; Step 3, glass melting: The batch material of step 2 is added into the heated multilateral well-type deep pool four-stage melting furnace for melting; The molten glass flows through the liquid flow hole, the rising channel, the working pool and the material distribution channel at one time, and finally enters the passage and is wound into glass fibers under the action of the wire drawing machine; Step 4, finished product: The six bundles of glass fibers obtained in step 3 are combined into one strand, and then pickled with hydrochloric acid, dried and calcined to obtain a ternary high-silica glass fiber product; At this point, the process of melting the high-silica glass shallow liquid surface is completed.

8. The method for melting high-silica glass with a shallow liquid level by a high-temperature melting device as claimed in claim 6, characterized in that: Step 3: When melting glass, the parameters of each layer of electrodes are: The first layer of electrode power is 120-150kW, the temperature is 1250-1280℃, the current is 210-240A, and the voltage is 350-380V; The second layer electrode power is 150-170kW, the temperature is 1350-1400℃, the current is 240-260A, and the voltage is 360-380V; The third layer electrode power is 10-16kW, the temperature is 1350-1400℃, the current is 45-55A, and the voltage is 220-240V; The fourth layer electrode power is 5-15kW, the temperature is 1250-1280℃, the current is 10-24A, and the voltage is It is 220~210V.

9. The method for melting high-silica glass with a shallow liquid level by a high-temperature melting device as claimed in claim 6, characterized in that: In step 4, the hydrochloric acid pickling temperature is 90°C, the drying temperature is 105°C, and the calcination temperature is 650°C.

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