A method of depositing a sample holder using a patterned mask electrode

Abstract

The application discloses a kind of hollow mask electrode deposition sample holder and method, including connecting tray, movable sample table and mask plate clamp;The bottom of slide rail connector is slidably connected with X linear slide rail in X direction, and the top of slide rail connector is slidably connected with the bottom of sample table in Y direction;Slide rail connector is provided with X through screw hole, and the threaded one end of X adjusting screw rod is installed in the X through screw hole of slide rail connector, and the other end is arranged in X clamping device;Sample table is provided with Y through screw hole, and the threaded one end of Y adjusting screw rod is installed in the Y through screw hole of sample table, and the other end is arranged in Y clamping device;Mask plate clamp fixing stud is higher than sample table, and mask plate clamp is connected with the top of mask plate clamp fixing stud.Carry out the precision requirement when using photolithography process to transfer single-crystal island two-dimensional material and grow single-crystal island two-dimensional material deposition electrode.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of two-dimensional materials, and relates to a hollow mask electrode deposition sample holder and method. BACKGROUND

[0002] In the process of two-dimensional material device manufacturing, there are mainly two methods for defining electrode patterns, namely, a photolithography method using a photo mask plate to expose a pattern by photolithography and a photolithography-free process using a hollow mask plate to define an electrode pattern and deposit an electrode in an ultra-high vacuum. In the photolithography method, photoresist is spin-coated on the substrate, and after development, there is inevitably residual photoresist, which leads to degradation of the performance of the device, such as difficulty in forming a good contact between the electrode and the device, affecting the carrier mobility, etc. The photolithography-free process using a hollow mask plate to deposit an electrode in an ultra-high vacuum can directly process the device on the hollow part of the mask plate, and the process is carried out in an ultra-high vacuum with less impurities and without contacting any chemicals, which can ensure good contact between the electrode and the device.

[0003] However, when depositing an electrode on a two-dimensional material using the photolithography-free process, the alignment problem between the electrode pattern on the hollow mask plate and the two-dimensional material inevitably occurs, especially when transferring a single crystal island two-dimensional material and growing a single crystal island two-dimensional material. Because the single crystal island of such two-dimensional material is extremely small, with a size of only a few tens of microns to a few hundred microns, it is difficult to accurately position the electrode pattern on the hollow mask plate to a single crystal island.

[0004] Moreover, the traditional alignment method is relatively rough, and the experimenter needs to position the hollow electrode pattern on the mask plate to a single crystal island under a light microscope by hand, which not only has low accuracy, but also causes a relative displacement between the electrode pattern on the hollow mask plate and the single crystal island when the mask plate is fixed after positioning and during the subsequent transfer to the vacuum chamber, resulting in a secondary error and further reducing the success rate. SUMMARY

[0005] The purpose of the present application is to overcome the above-mentioned shortcomings of the prior art, and to provide a hollow mask electrode deposition sample holder and method, which avoids secondary errors to meet the accuracy requirements when depositing an electrode on a transferred single crystal island two-dimensional material and a grown single crystal island two-dimensional material using a photolithography-free process.

[0006] To achieve the above-mentioned purpose, the present application adopts the following technical solutions:

[0007] A hollow mask electrode deposition sample holder, comprising a connecting tray, a movable sample stage and a mask plate clamp;

[0008] The connecting tray is provided with a vacuum chamber connecting piece, an X linear slide rail, a mask plate clamp fixing stud and an X clamping device, and the movable sample stage comprises a slide rail connecting piece, an X adjusting screw, a Y adjusting screw, a Y clamping device and a sample stage.

[0009] The bottom of the slide rail connector is connected with the X linear slide rail in the X direction, and the bottom of the sample stage is connected with the top of the slide rail connector in the Y direction; the slide rail connector is provided with an X through screw hole, one end of an X adjusting screw is screwed into the X through screw hole of the slide rail connector, and the other end is arranged in the X clamping device; the sample stage is provided with a Y through screw hole, one end of a Y adjusting screw is screwed into the Y through screw hole of the sample stage, and the other end is arranged in the Y clamping device.

[0010] The mask plate clamp is connected with the mask plate clamp fixing screw column at the top.

[0011] Preferably, one end of the sample stage is provided with a sample limiting baffle, and the other end is provided with a sample clamp; the sample limiting baffle is higher than the sample stage; the sample clamp is L-shaped, the horizontal side is used for fixing the sample, and the vertical side is connected with the side of the sample stage.

[0012] Further, the horizontal side of the sample clamp is provided with an inclined chamfer.

[0013] Further, the sample limiting baffle is 50-200 microns higher than the sample, and the thickness of the end of the sample clamp for fixing the sample is the same as that of the sample limiting baffle.

[0014] Preferably, the vacuum cavity connector is located on the side of the connecting tray, and the vacuum cavity connector is provided with a horizontal through hole and two vertical screw holes.

[0015] Preferably, the mask plate clamp includes a mask clamp top, a mask plate clamp bottom and a mask plate bottom, the center of the mask plate clamp bottom is provided with a hollow hole with a size corresponding to that of the mask plate, the mask plate bottom is fixed at the center of the bottom of the mask plate clamp bottom, and the center of the mask plate clamp top is provided with a hollow hole with the same size as that of the mask plate bottom.

[0016] Further, the mask plate clamp top is provided with symmetrical pressing strips on both sides of the hollow hole.

[0017] Preferably, the X clamping device includes an X upper limiting block and an X lower limiting block, the X upper limiting block and the X lower limiting block are correspondingly provided with two vertical screw holes, the bottom of the X upper limiting block and the top of the X lower limiting block are both provided with a semicircular limiting groove, and the radius of the limiting groove is smaller than the radius of the X adjusting screw.

[0018] Preferably, the Y clamping device includes a Y upper limiting block and a Y lower limiting block, the Y upper limiting block and the Y lower limiting block are correspondingly provided with two vertical screw holes, the bottom of the Y upper limiting block and the top of the Y lower limiting block are both provided with a semicircular limiting groove, and the radius of the limiting groove is smaller than the radius of the Y adjusting screw.

[0019] A hollow mask electrode deposition method of the sample holder includes the following processes:

[0020] S1, fix the sample on the sample stage;

[0021] S2, install the required mask in the mask holder, and fix the mask holder on the mask holder fixing screw on the connecting tray;

[0022] S3, place the installed sample holder under the microscope, focus the microscope on the electrode pattern of the hollow mask, and adjust the X adjusting screw and the Y adjusting screw until the electrode pattern on the hollow mask is positioned on the single crystal island two-dimensional material at a certain place of the sample;

[0023] S4, fix the X upper limit block and the Y upper limit block through the X clamping device and the Y clamping device respectively;

[0024] S5, install the above positioned sample holder through the vacuum cavity connector on the screw rod of the ultra vacuum cavity, and finally deposit the electrode on the single crystal island two-dimensional material.

[0025] Compared with the prior art, the present application has the following beneficial effects:

[0026] The present application ingeniously utilizes the XY displacement of the sample stage bearing the sample driven by the fixed rotation of the XY adjusting screw to realize the accurate positioning of the electrode pattern on the hollow mask and the single crystal island at any position of the sample, and avoids the secondary error that may be generated in the fixing and transferring process of the mask and the sample after positioning, greatly improving the success rate of depositing the electrode on the single crystal island two-dimensional material by using the photolithography-free process, so as to meet the accuracy requirement of depositing the electrode on the transferred single crystal island two-dimensional material and the grown single crystal island two-dimensional material by using the photolithography-free process. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 The design principle diagram of the hollow mask electrode deposition sample holder of the present application;

[0028] Figure 2 The overall structure schematic diagram of the hollow mask electrode deposition sample holder of the present application;

[0029] Figure 3 The structure schematic diagram of the connecting tray of the present application;

[0030] Figure 4 The structure schematic diagram of the movable sample stage of the present application;

[0031] Figure 5 The structure schematic diagram of the mask holder of the present application;

[0032] Figure 6 The loading schematic diagram of the sample and the mask of the present application;

[0033] Figure 7Figure 2 shows a partial enlarged view of the electrode pattern region of the hollow mask plate of the present application;

[0034] Figure 8 Figure 4 shows a device example fabricated using the sample holder of the present application.

[0035] Wherein: 1. Connecting tray; 2. Movable sample stage; 3. Mask plate clamp; 111. Vacuum cavity connector; 112. X straight line slide rail; 113. Mask plate clamp fixing stud; 121. X upper limit block; 122. X lower limit block; 211. Slide rail connector; 212. X adjusting screw; 213. Y adjusting screw; 214. Sample stage; 221. Sample limiting baffle; 222. Sample clamp; 231. Y upper limit block; 232. Y lower limit block; 20. Sample; 30. Hollow mask plate; 31. Mask plate clamp top; 32. Mask plate clamp bottom; 33. Mask plate bottom plate; 311. Pressing strip. DETAILED DESCRIPTION

[0036] Embodiments of the present application are described in detail below with reference to the attached drawing figures, wherein the same or like reference numerals and characters throughout the figures denote the same or like components or elements having the same or similar functions. The embodiments described below are exemplary and are merely intended to explain the present application, and are not to be interpreted as limiting the present application.

[0037] In the description of the present application, it is to be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise specifically limited.

[0038] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terms "install", "connect", and "couple" are used broadly and encompass both direct and indirect connections, as well as fixed and removable connections. The term "couple" can also mean one element is in communication with another element. The term "and / or" includes any and all combinations of one or more of the associated listed items. The above terms are to be interpreted in accordance with the ordinary meaning of such terms as understood by those skilled in the art without limitation. The terms used herein are for the purpose of describing specific embodiments and are not intended to limit the application.

[0039] The following disclosure provides many different embodiments, or examples, for implementing different structures of the present application. For the purpose of simplification, the elements of the specific examples are described in the following disclosure. Of course, they are merely examples and are not intended to limit the present application. In addition, the present application can repeatedly refer to reference numerals and / or reference letters in different examples. Such repetition is for the purpose of simplification and clarity, and does not itself indicate a relationship between the various embodiments and / or arrangements being discussed. In addition, the present application provides various specific examples of processes and materials, but those skilled in the art can appreciate the application of other processes and / or the use of other materials.

[0040] As shown in Figure 1 The electrode deposition sample holder contemplated by the present application requires precise positioning of the mask electrode pattern on the single crystal island two-dimensional material. The sample stage needs to be moved in the X and Y directions to precisely position the electrode pattern on the hollow mask on the single crystal island two-dimensional material at a certain location of the sample 20 and keep it stable without moving with

[0041] As shown in Figure 2 The overall structure of the hollow mask electrode deposition sample holder described in the present application is shown in the schematic diagram, which includes a connecting tray 1, a movable sample stage 2 and a mask plate clamp 3.

[0042] The connecting tray 1 is provided with a connecting mechanism and an X adjusting screw 212 fixing mechanism, the movable sample stage 2 is provided with a moving system, a sample fixing mechanism and a Y adjusting screw 213 fixing mechanism, which can realize the displacement of the sample stage in the XY direction and the fixation of the sample. The mask plate clamp 3 is provided with a clamping and fixing mechanism, which can realize the clamping and fixing of the mask plate. The connecting tray 1 carries the movable sample stage 2, the mask plate clamp 3 can be fixed on the connecting tray 1, and the movable sample stage 2 is located between the connecting tray 1 and the mask plate clamp 3.

[0043] As shown in Figure 3As shown in the structural diagram of the connecting tray 1, the vacuum cavity connector 111, the X linear slide rail 112, the mask plate clamp fixing stud 113, the X upper limit block 121 and the X lower limit block 122 are included. The vacuum cavity connector 111 is located on one side of the connecting tray 1 in the X direction, the X upper limit block 121 and the X lower limit block 122 are located on the other side of the connecting tray 1 in the X direction, and the mask plate clamp fixing stud 113 is four in number and is located at the four corners of the connecting tray 1.

[0044] The vacuum cavity connector 111 is provided with a horizontal through hole and two vertical threaded holes, the vacuum cavity connector 111 is installed on the screw rod in the super vacuum cavity of the deposition electrode, the mask plate clamp fixing stud 113 is provided with a threaded hole at the top, the X upper limit block 121 and the X lower limit block 122 are correspondingly provided with two vertical threaded holes for connecting and fixing the X upper limit block 121 and the X lower limit block 122, the X upper limit block 121 and the X lower limit block 122 are provided with semicircular limit grooves at the bottom and the top respectively, the radius of the limit groove is smaller than the radius of the X adjusting screw 212, the movable sample stage 2 is slidably installed on the X linear slide rail 112, and the mask plate clamp 3 is fixed on the mask plate clamp fixing stud 113 by screws.

[0045] As shown in the structural diagram of the movable sample stage 2, the slide rail connector 211, the X adjusting screw 212, the Y adjusting screw 213, the sample stage 214, the sample limiting baffle 221, the sample clamp 222, the Y upper limit block 231 and the Y lower limit block 232 are included. Figure 4 The slide rail connector 211 is slidably connected with the X linear slide rail 112 at the bottom, the sample stage 214 is slidably connected above the slide rail connector 211 in the Y direction, the slide rail connector 211 is provided with an X-direction through screw hole, the X adjusting screw 212 is threadedly installed in the X-direction through screw hole of the slide rail connector 211, one end of the X adjusting screw 212 is installed in the limit groove between the X upper limit block 121 and the X lower limit block 122 and is fixed by screws, and the limiting baffle is clamped between the slide rail connector 211 and the limit groove; the Y clamping device includes the Y upper limit block 231 and the Y lower limit block 232, the Y upper limit block 231 and the Y lower limit block 232 are correspondingly provided with two vertical threaded holes, the Y upper limit block 231 and the Y lower limit block 232 are provided with semicircular limit grooves at the bottom and the top respectively, the radius of the limit groove is smaller than the radius of the Y adjusting screw 213, the sample stage 214 is provided with a Y-direction through screw hole, the Y adjusting screw 213 is threadedly installed in the Y-direction through screw hole of the sample stage 214, one end of the Y adjusting screw 213 is installed between the Y upper limit block 231 and the Y lower limit block 232 and is fixed by screws, and the limiting baffle is clamped between the sample stage 214 and the limit groove, so as to realize the fixed rotation of the X adjusting screw 212 and the Y adjusting screw 213 to drive the sample stage 214 to move in the XY direction.

[0046] The sample limiting baffle 221 is higher than the sample stage 214, and the sample clamp 222 is L-shaped, with the horizontal side used for fixing the sample 20 and the horizontal side edge provided with an inclined chamfer, and the vertical side used for connecting the side of the sample stage 214; the sample 20 is placed on the platform of the sample stage 214, with one end on the sample limiting baffle 221, and the other end of the sample clamped by the inclined chamfer of the sample clamp 222, and the sample clamp 222 is fixed on one side of the sample stage 214 by a screw, so that the sample can be fixed. The size and shape of the sample limiting baffle 221 and the sample clamp 222 can be changed according to the actual situation of the sample.

[0047] The mask plate clamp fixing screw 113 is 50 microns higher than the sample limiting baffle 221, which prevents the mask plate from directly contacting the sample 20 within the range of precision allowed, and wears the mask plate and the sample.

[0048] The sample limiting baffle 221 is about 100 microns higher than the sample 20, and the thickness of the sample clamp 222 fixed to one end of the sample 20 is the same as that of the sample limiting baffle 211.

[0049] As shown in Figure 5 Fig. 3 is a structural schematic diagram of the mask plate clamp 3, which comprises a mask clamp top 31, a mask plate clamp bottom 32, a mask plate bottom 33 and a pressing strip 311. The mask plate clamp bottom 32 has a hollow hole in the center with a size corresponding to that of the mask plate, and the mask plate bottom 33 has a hollow hole slightly smaller than the mask plate, which is welded at the bottom center of the mask plate clamp bottom 32 to support the mask plate, and the electrode pattern on the mask plate is exposed in the center of the mask plate bottom 33. The mask plate clamp top 31 has a hollow hole in the center with the same size as the mask plate bottom 33, and the pressing strip 311 is symmetrically arranged on both sides of the hollow hole to press the mask plate tightly; the mask plate top 31 and the mask plate bottom 32 are provided with screw holes matched with the mask plate clamp fixing screw 113 as shown in Fig. 2, which are fixed on the connecting tray 1 by screws to realize clamping and fixing of the mask plate. Figure 3 The mask plate clamp fixing screw 113 is 50 microns higher than the sample limiting baffle 221, which prevents the mask plate from directly contacting the sample 20 within the range of precision allowed, and wears the mask plate and the sample.

[0050] In combination Figure 6 With Figure 7 The above technical solutions are applied to practice, and the specific installation and use process is as follows:

[0051] Firstly, the sample 20 is fixed on the sample stage 214 so that the sample 20 does not move relative to the sample stage 214, and the Y adjusting screw 213 is installed on the sample stage 214.

[0052] Secondly, the sample stage 214 with the sample 20 is installed above the slide rail connecting piece 211, and the X adjusting screw 212 is installed on the slide rail connecting piece 211, and the Y adjusting screw 213 is clamped in the Y lower limiting block 232 at one end.

[0053] In the third step, the above-mentioned installed device is installed as a whole on the connecting tray 1, and one end of the limit baffle of the X adjusting screw 214 is stuck in the X lower limit block 122.

[0054] The fourth step is as follows Figure 5 As shown in , the required mask is installed in the mask holder 3.

[0055] Step 5: Figure 6 As shown in , the installed mask clamp 3 is fixed to the mask clamp fixing studs 113 on the connection tray 1 by screws.

[0056] Step 6: Figure 8 As shown in , the mounted sample holder is placed under a microscope, the microscope is focused on the electrode pattern of the hollow mask, and the X adjustment screw 212 and the Y adjustment screw 213 are adjusted until the electrode pattern on the hollow mask is accurately positioned on the single crystal island two-dimensional material somewhere in the sample 20.

[0057] Step 7: Figure 6 As shown in , the X upper limit block 121 and the Y upper limit block 231 are respectively fixed to the X lower limit block 122 and the Y lower limit block 232 by screws to fix the X adjustment screw 212 and the Y adjustment screw 213 to prevent them from rotating again.

[0058] In the eighth step, the positioned sample holder is mounted on the spiral rod of the ultra-vacuum chamber through the vacuum chamber connector 111, and finally an electrode is deposited on the single crystal island two-dimensional material.

[0059] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus.

[0060] It is to be understood that the above description is intended to be illustrative, and not restrictive. Many embodiments and applications other than the examples provided would be apparent to those of skill in the art upon reading the above description. The scope of the application should be determined, not with reference to the above description, but should instead be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled. The disclosures of all articles and references, including patent applications and publications, are incorporated by reference for all purposes. The omission in the foregoing description of any aspect of the subject matter disclosed herein is not a disclaimer of such subject matter, nor should it be regarded that the applicant has disclaimed any such subject matter, nor should any such omission be regarded as affecting the scope of the disclosed innovations.

Claims

1. A hollow mask electrode deposition sample holder, characterized in that: It includes a connecting tray (1), a movable sample stage (2) and a mask clamp (3); The connecting tray (1) is provided with a vacuum chamber connecting piece (111), an X linear slide rail (112), a mask clamp fixing stud (113) and an X clamping device, and the movable sample stage (2) includes a slide rail connecting piece (211), an X adjusting screw (212), a Y adjusting screw (213), a Y clamping device and a sample stage (214); The bottom of the slide rail connector (211) is slidably connected to the X linear slide rail (112) in the X direction, and the bottom of the sample stage (214) is slidably connected to the top of the slide rail connector (211) in the Y direction; the slide rail connector (211) is provided with an X-direction through-screw hole, one end of the X adjustment screw (212) is installed in the X-direction through-screw hole of the slide rail connector (211), and the other end is arranged in the X clamping device; the sample stage (214) is provided with a Y-direction through-screw hole, one end of the Y adjustment screw (213) is installed in the Y-direction through-screw hole of the sample stage (214), and the other end is arranged in the Y clamping device; The mask clamp fixing stud (113) is higher than the sample stage (214), and the mask clamp (3) is connected to the top of the mask clamp fixing stud (113); The mask clamp (3) includes a mask clamp top (31), a mask clamp bottom (32) and a mask base (33), the center of the mask clamp bottom (32) has a hollow portion of a size equivalent to the mask, the hollow portion of the mask base (33) is smaller than the size of the mask, the mask base (33) is fixed to the bottom center of the mask clamp bottom (32), and the center of the mask clamp top (31) has a hollow portion of the same size as the mask base (33); The mask clamp top (31) is provided with symmetrical pressure strips (311) on both sides of the hollowing.

2. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: A sample limiting baffle (221) is provided at one end of the sample stage (214), and a sample clamp (222) is provided at the other end. The sample limiting baffle (221) is higher than the sample stage (214). The sample clamp (222) is L-shaped, with a horizontal side for fixing the sample (20) and a vertical side connected to the side of the sample stage (214).

3. The hollow mask electrode deposition sample holder according to claim 2, characterized in that: The horizontal side edge of the sample holder (222) is provided with an oblique chamfer.

4. The hollow mask electrode deposition sample holder according to claim 2, characterized in that: The sample limiting baffle (221) is 50-200 microns higher than the sample (20), and the thickness of one end of the sample clamp (222) fixing the sample (20) is the same as that of the sample limiting baffle (221).

5. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The vacuum cavity connecting piece (111) is located on the side of the connecting tray (1), and the vacuum cavity connecting piece (111) is provided with a through hole in the horizontal direction and two threaded holes in the vertical direction.

6. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The X clamping device comprises an X upper limit block (121) and an X lower limit block (122), wherein the X upper limit block (121) and the X lower limit block (122) are respectively provided with two vertical threaded holes, and the bottom of the X upper limit block (121) and the top of the X lower limit block (122) are both provided with semicircular limit grooves, and the radius of the limit grooves is smaller than the radius of the X adjusting screw (212).

7. The hollow mask electrode deposition sample holder according to claim 1, characterized in that: The Y clamping device comprises a Y upper limit block (231) and a Y lower limit block (232), wherein the limit block (231) and the Y lower limit block (232) are respectively provided with two vertical threaded holes, and the bottom of the Y upper limit block (231) and the top of the Y lower limit block (232) are both provided with semicircular limit grooves, the radius of which is smaller than the radius of the Y adjusting screw (213).

8. A method for depositing a hollow mask electrode based on the sample holder according to any one of claims 1 to 7, characterized in that: The following processes are included: S1, fixing the sample (20) on the sample stage (214); S2, installing the required mask in the mask clamp (3), and fixing the mask clamp (3) to the mask clamp fixing stud (113) on the connection tray (1); S3, placing the mounted sample holder under a microscope, focusing the microscope on the electrode pattern of the hollow mask, and adjusting the X adjustment screw (212) and the Y adjustment screw (213) until the electrode pattern on the hollow mask is positioned on the single crystal island two-dimensional material somewhere on the sample (20); S4, fixing the X upper limit block (121) and the Y upper limit block (231) by an X clamping device and a Y clamping device respectively; S5, the sample holder positioned above is mounted on the spiral rod of the ultra-vacuum chamber through the vacuum chamber connector (111), and finally the electrode is deposited on the single crystal island two-dimensional material.

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