X-ray source advanced composite target material and preparation method thereof

Abstract

The invention relates to the technical field, in particular to an X-ray source advanced composite target material and a preparation method thereof.The preparation method comprises the steps that S1, a base material and a base material pressing plate are selected, cleaned and then subjected to vacuum drying treatment; s2, the base material subjected to vacuum drying is placed on a special tool, a layer of inner thin film is sputtered on the inner side face of the base material in a sputtering mode, then a layer of outer thin film is formed on the outer side face of the base material in a sputtering mode or a chemical vapor deposition process, and the coated base material is obtained; and S3, the coated base material and the vacuum-dried base material pressing plate are subjected to vacuum brazing connection, the brazing temperature is controlled within the range of 450-550 DEG C, and the composite target material is obtained. The composite target material has excellent performance, heat uniformizing and heat dissipation efficiency can be well considered, and heat concentrated at the focus is conducted and diffused in the X direction and the Y direction; the problems that in the prior art, an existing target material is poor in uniform heat performance, poor in heat dissipation effect and the like are solved.

Description

Technical Field

[0001] The present invention relates to the technical field of X-ray source manufacturing, and in particular to an advanced composite target material for an X-ray source and a preparation method thereof. Background Art

[0002] X-ray source, also known as light tube, is one of the indispensable core components of X-ray detection equipment. It mainly bears the function of emitting X-rays, and its performance directly affects the detection quality and efficiency of the detection equipment. X-ray sources mainly include two types of structures: open tube and closed tube. Among them, the electrons of the open tube X-ray source directly hit the target material, so that the X-rays it releases directly penetrate the sample; and the open tube X-ray source is equipped with a vacuum pump and a vacuum valve. When the ray source is damaged and needs repair, the cathode and anode can be replaced. The target material used in the open tube X-ray source is one of the core components of the open tube X-ray source. It has an important influence on the performance of the open tube X-ray source, and is mainly reflected in the key influence on the X-ray power density and the X-ray passability. Therefore, the performance requirements of the open tube X-ray source for its target material are mainly concentrated on both withstanding higher power density and having higher passability for X-rays; in addition, as one of the structural parts of the open tube X-ray source, the target material also needs to have sufficient strength. The existing open-tube X-ray source target is usually made by directly evaporating a tungsten film on a single substrate. The selected substrate is generally a metal or non-metal substrate that has relatively good X-ray permeability and considerable heat resistance, such as beryllium, aluminum, and diamond. Although these target materials have the characteristics of simple structure, they have the defects of poor omnidirectional heat uniformity and poor heat dissipation effect due to the limitation of the physical properties of the substrate material itself. For example, although beryllium metal material has good heat resistance and excellent X-ray permeability, its thermal conductivity is average, and beryllium metal material The material itself has a certain degree of toxicity; aluminum metal materials have good thermal conductivity, but their heat resistance is not ideal; diamond materials have good heat resistance, relatively good X-ray transmission, and excellent thermal conductivity, but their excellent thermal conductivity is only reflected in the X direction, while the thermal conductivity in the Y direction is relatively poor, and the cost of diamond is also very high; the power density that the target surface of these targets can withstand is limited, and ablation is prone to occur; and when the focus reaches below microns, these targets cannot meet the needs of long-term and high-power use; thus limiting the application scope of open-tube X-ray sources.

[0003] The present invention provides an advanced composite target material for an X-ray source and a preparation method thereof, so as to solve the problems of poor heat uniformity and poor heat dissipation effect of existing target materials in the prior art. Summary of the invention

[0004] The purpose of the present invention is to provide an advanced composite target material for an X-ray source and a preparation method thereof, so as to solve the problems of poor heat uniformity and poor heat dissipation effect of existing target materials in the prior art.

[0005] The technical solution of the present invention is: a method for preparing an advanced composite target material for an X-ray source, comprising the following steps:

[0006] S1, selecting a substrate and a substrate pressing plate according to a certain size and shape, and cleaning the substrate and the substrate pressing plate, and then performing a vacuum drying process; the substrate and the substrate pressing plate are both made of aluminum metal or aluminum alloy;

[0007] S2, placing the vacuum-dried substrate on a special tooling, sputtering an inner thin film on the inner side of the substrate, and then forming an outer thin film on the outer side of the substrate by sputtering or chemical vapor deposition process to obtain a coated substrate; the inner thin film is a pure tungsten film; the outer thin film is a graphite film or a graphene film;

[0008] S3. Connect the coated substrate and the vacuum-dried substrate pressing plate by vacuum brazing, and control the brazing temperature within the range of 450-550° C. to obtain a composite target material.

[0009] Preferably, the aluminum alloy material is any one of aluminum silicon alloy, zinc aluminum alloy, zirconium aluminum alloy, and titanium aluminum alloy; the outer side surface of the substrate pressing plate is provided with a fin-shaped structure;

[0010] In step S2, the sputtering method is any one or more of radio frequency sputtering, magnetron sputtering, ion beam sputtering, and focused heavy ion sputtering;

[0011] The thickness of the substrate between the inner side surface on which the inner film is sputtered and the outer side surface on which the outer film is formed is 0.5-1 mm.

[0012] Preferably, a filter layer is provided between the inner film and the substrate; the thickness of the transition layer is 8-12 nm;

[0013] The material of the transition layer is copper metal.

[0014] Preferably, the thickness of the inner film is 1-3 um.

[0015] Preferably, the outer film is a graphene film; the graphene film is a CVD graphene film prepared by a chemical vapor deposition process or a PVD graphene film prepared by a magnetron sputtering process;

[0016] The thickness of the PVD graphene film is 1-3um; the thickness of the CVD graphene film is 100-500nm.

[0017] Preferably, the outer film is a graphite film; the thickness of the graphite film is 1-3 um.

[0018] Preferably, in step S1, the cleaning process comprises the following steps:

[0019] a. Pre-cleaning the substrate and the substrate pressing plate with alcohol;

[0020] b. Put the pre-scrubbed substrate and the substrate pressing plate into a three-dimensional ultrasonic cleaning machine, and use an alkaline cleaning agent to clean them. The cleaning temperature is controlled within the range of 50-70° C. After cleaning for 30-50 minutes, rinse them with clean water, and then use deionized water for ultrasonic cleaning. The cleaning temperature is controlled within the range of 50-70° C. and the cleaning time is controlled within the range of 20-30 minutes;

[0021] c. Use alkaline cleaning agent to clean again, and control the cleaning temperature within the range of 50-70℃. After cleaning for 20-30 minutes, rinse with clean water. Then, use acetone for three-dimensional ultrasonic cleaning, and control the cleaning temperature within the range of 50-70℃ and the cleaning time within the range of 10-20 minutes.

[0022] Preferably, in step S1, the vacuum drying process is carried out at a drying temperature of 100-110°C and for a drying time of 60-70 minutes.

[0023] The present invention also provides an advanced composite target material for an X-ray source, and the composite target material is prepared by the above-mentioned preparation method.

[0024] Compared with the prior art, the advantages of the present invention are:

[0025] (1) The present invention provides an advanced composite target material for an X-ray source and a preparation method thereof. The advanced composite target material for an X-ray source is a multilayer composite structure prepared by using aluminum metal or aluminum alloy as a substrate and a substrate pressing plate, and forming a thin film on the inner side and outer side of the substrate. The target material has excellent performance, can well balance heat uniformity and heat dissipation efficiency, can quickly and evenly conduct and diffuse the heat concentrated at the focus in the X and Y directions, and quickly dissipate the heat to the surrounding air through the fin structure on the substrate pressing plate; it avoids the occurrence of phenomena such as excessive local heat at the focus and ablation caused by the increase of target power due to the continuous accumulation of heat caused by untimely heat conduction and diffusion; it enables the target surface to withstand higher target power, expanding the application scenarios of this type of open tube X-ray source; at the same time, due to the low price of the material of the substrate, the substrate pressing plate and the raw materials, it can effectively reduce its production cost, and the production process is simple to operate, the quality is controllable, and it is conducive to mass production; it solves the problems of poor heat uniformity and poor heat dissipation effect of the existing target materials in the prior art.

[0026] (2) The present invention provides an advanced composite target material for an X-ray source and a method for preparing the same. The advanced composite target material for an X-ray source uses aluminum metal or aluminum alloy as a substrate, a substrate pressing plate, and a pure tungsten film as an inner film. The aluminum material and the pure tungsten film both have good vertical thermal conductivity and can conduct and diffuse the heat at the focus in the Y direction. At the same time, a graphite film or a graphene film is used as an outer film. With the help of its good horizontal thermal conductivity, the heat is conducted and diffused in the X direction. The fin structure on the substrate pressing plate quickly dissipates the heat into the surrounding air. This enables the advanced composite target material for an X-ray source to have higher heat distribution efficiency and heat dissipation efficiency.

[0027] (3) The present invention provides an advanced composite target material for an X-ray source and a method for preparing the same, wherein a transition layer is provided between the inner side surface of the substrate and the inner film, which can enhance the bonding strength between the inner film and the substrate, thereby enhancing the performance of the advanced composite target material for an X-ray source. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The present invention will be further described below in conjunction with the accompanying drawings and embodiments:

[0029] Figure 1 A top view of the advanced composite target material for the X-ray source of the present invention;

[0030] Figure 2 It is a cross-sectional view of the advanced composite target material for an X-ray source according to the present invention along the BB direction of the top view;

[0031] Figure 3 It is an enlarged view of the P portion of the cross-sectional view of the advanced composite target material for the X-ray source of the present invention along the BB direction of the top view;

[0032] Wherein: 1. substrate; 2. inner film; 3. outer film; 4. substrate pressing plate. DETAILED DESCRIPTION

[0033] The present invention is further described in detail below in conjunction with specific embodiments:

[0034] Example 1

[0035] S1, such as Figure 1As shown, an aluminum substrate with a groove on the inner side is selected as the substrate 1 and an aluminum pressing plate with a fin-shaped structure on the upper end surface is selected as the substrate pressing plate 4. The size of the aluminum substrate matches the size of the aluminum pressing plate; and the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and the corresponding outer side surface is 0.5 mm; then, alcohol is used to pre-clean the aluminum substrate and the aluminum pressing plate respectively; then the aluminum substrate and the aluminum pressing plate are respectively placed in a three-dimensional ultrasonic cleaning machine for cleaning; during the cleaning process, an alkaline cleaning agent is first used for cleaning, and the cleaning temperature is controlled at about 60°C; after cleaning for 50 minutes, clean water is used to clean it. Rinse; then, use deionized water for ultrasonic cleaning, the cleaning temperature is controlled at about 60°C, and the cleaning is carried out for 30 minutes; then, use alkaline cleaning agent for cleaning again, and the cleaning temperature is controlled at about 50°C; after cleaning for 30 minutes, rinse it with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, the cleaning temperature is controlled at about 50°C, and the cleaning is carried out for 20 minutes; after cleaning, transfer the aluminum substrate and aluminum pressing plate to a drying oven for vacuum drying. During the drying process, ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0036] S2, placing the vacuum-dried aluminum substrate on a special tooling, and using a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2 μm on the bottom surface of the groove set on the inner side of the aluminum substrate, namely, inner film 2, and then, using the magnetron sputtering process again to sputter a layer of PVD graphene film with a thickness of 1.5 μm on the outer side of the aluminum substrate, namely, outer film 3, as shown in FIG. Figure 2 , Figure 3 As shown, the coated aluminum substrate is obtained.

[0037] S3. The coated aluminum substrate is connected to the vacuum-dried aluminum pressing plate by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source.

[0038] In this embodiment, the substrate and the substrate pressing plate are both made of aluminum metal, while in other embodiments, the substrate and the substrate pressing plate can be made of different materials; for example, the substrate is made of aluminum metal, and the substrate pressing plate is made of aluminum alloy, etc. At the same time, as a control variable, in this embodiment and the following embodiments, the substrate and the substrate pressing plate are both selected to have the same structural shape as in this embodiment, and the thickness of the substrate between the inner side surface of the substrate sputtered with the inner film and the outer side surface of the substrate sputtered with the outer film is 0.5mm; while in other embodiments, the thickness of the substrate between the inner side surface of the substrate sputtered with the inner film and the outer side surface of the substrate sputtered with the outer film should be in the range of 0.3-1.5mm, and preferably in the range of 0.5-1mm; at the same time, the structure of the substrate and the substrate pressing plate can also be designed into other shapes according to actual use requirements. In addition, in this embodiment or other embodiments, the outer side surface of the substrate pressing plate needs to be sputtered with an insulating layer.

[0039] Example 2

[0040] S1. Select an aluminum substrate and an aluminum pressing plate with the same structure and thickness as those in Example 1 as the substrate and the substrate pressing plate respectively; then, use alcohol to pre-clean the aluminum substrate and the aluminum pressing plate respectively; then put the aluminum substrate and the aluminum pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning; during the cleaning process, first use an alkaline cleaning agent for cleaning, and the cleaning temperature is controlled at about 55°C; after cleaning for 50 minutes, rinse it with clean water; then, use deionized water for ultrasonic cleaning, the cleaning temperature is controlled at about 55°C, and the cleaning is carried out for 30 minutes; then, use an alkaline cleaning agent for cleaning again, and the cleaning temperature is controlled at about 60°C; after cleaning for 30 minutes, rinse it with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, the cleaning temperature is controlled at about 60°C, and the cleaning is carried out for 20 minutes; after cleaning, transfer the aluminum substrate and the aluminum pressing plate to a drying oven for vacuum drying. During the drying process, it is necessary to ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0041] S2. Place the vacuum-dried aluminum substrate on a special tooling, and use a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2 um on the bottom surface of the groove set on the inner side of the aluminum substrate. Then, use the magnetron sputtering process again to sputter a layer of PVD graphene film with a thickness of 2 um on the outer side of the aluminum substrate to obtain a coated aluminum substrate.

[0042] S3. The coated aluminum substrate is connected to the vacuum-dried aluminum pressing plate by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source.

[0043] Example 3

[0044] S1. Select an aluminum substrate and an aluminum pressing plate with the same structure and thickness as Example 1 as the substrate and the substrate pressing plate respectively; then, use alcohol to pre-clean the aluminum substrate and the aluminum pressing plate respectively; then put the aluminum substrate and the aluminum pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning; during the cleaning process, first use an alkaline cleaning agent for cleaning, and the cleaning temperature is controlled at about 70°C; after cleaning for 50 minutes, rinse it with clean water; then, use deionized water for ultrasonic cleaning, the cleaning temperature is controlled at about 70°C, and the cleaning is carried out for 30 minutes; then, use an alkaline cleaning agent for cleaning again, and the cleaning temperature is controlled at about 60°C; after cleaning for 30 minutes, rinse it with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, the cleaning temperature is controlled at about 60°C, and the cleaning is carried out for 20 minutes; after cleaning, transfer the aluminum substrate and the aluminum pressing plate to a drying oven for vacuum drying. During the drying process, it is necessary to ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0045] S2. Place the vacuum-dried aluminum substrate on a special tooling, and use a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2.5um on the bottom surface of the groove set on the inner side of the aluminum substrate. Then, use a chemical vapor deposition process to sputter a layer of CVD graphene film with a thickness of 300nm on the outer side of the aluminum substrate to obtain a coated aluminum substrate.

[0046] S3. The coated aluminum substrate is connected to the vacuum-dried aluminum pressing plate by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source.

[0047] Example 4

[0048] S1. Select an aluminum substrate and an aluminum pressing plate with the same structure and thickness as those in Example 1 as the substrate and the substrate pressing plate respectively; then, use alcohol to pre-clean the aluminum substrate and the aluminum pressing plate respectively; then put the aluminum substrate and the aluminum pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning; during the cleaning process, first use an alkaline cleaning agent for cleaning, and the cleaning temperature is controlled at about 60°C; after cleaning for 50 minutes, rinse it with clean water; then, use deionized water for ultrasonic cleaning, the cleaning temperature is controlled at about 60°C, and the cleaning is carried out for 30 minutes; then, use an alkaline cleaning agent for cleaning again, and the cleaning temperature is controlled at about 50°C; after cleaning for 30 minutes, rinse it with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, the cleaning temperature is controlled at about 50°C, and the cleaning is carried out for 20 minutes; after cleaning, transfer the aluminum substrate and the aluminum pressing plate to a drying oven for vacuum drying. During the drying process, it is necessary to ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0049] S2. Place the vacuum-dried aluminum substrate on a special tooling, first use a magnetron sputtering process to sputter a layer of pure copper film with a thickness of 10nm on the bottom surface of the groove set on the inner side of the aluminum substrate as a transition layer; then use a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2.5um on the transition layer; then, use a chemical vapor deposition process to sputter a layer of CVD graphene film with a thickness of 300nm on the outer side of the aluminum substrate to obtain a coated aluminum substrate.

[0050] S3. The coated aluminum substrate and the vacuum-dried aluminum pressing plate are connected by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source. In this embodiment, a layer of pure copper film with a thickness of 10nm is plated between the substrate and the inner film as a transition layer to improve the bonding strength between the inner film and the substrate; in other embodiments, the thickness of the transition layer should be within the range of 8-12nm; the material of the transition layer can also be selected from other metals or alloys.

[0051] Example 5

[0052] S1. Select a silicon-aluminum alloy substrate and a silicon-aluminum alloy pressing plate with the same structure as that of Example 1 as the substrate and the substrate pressing plate, respectively. The size of the silicon-aluminum alloy substrate matches the size of the silicon-aluminum alloy pressing plate; and the thickness of the silicon-aluminum alloy substrate between the bottom surface of the groove on the inner side of the silicon-aluminum alloy substrate and the corresponding outer side surface is 0.5 mm; then, use alcohol to pre-clean the silicon-aluminum alloy substrate and the silicon-aluminum alloy pressing plate respectively; then put the silicon-aluminum alloy substrate and the silicon-aluminum alloy pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning; during the cleaning process, first use an alkaline cleaning agent for cleaning, and the cleaning temperature is controlled at about 60°C; after cleaning for 50 minutes, Rinse it with clean water; then, use deionized water for ultrasonic cleaning, control the cleaning temperature at about 60°C, and clean for 30 minutes; then, use alkaline cleaning agent to clean again, and control the cleaning temperature at about 50°C; after cleaning for 30 minutes, rinse it with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, control the cleaning temperature at about 50°C, and clean for 20 minutes; after cleaning, transfer the silicon-aluminum alloy substrate and the silicon-aluminum alloy pressing plate to a drying oven for vacuum drying. During the drying process, ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0053] S2. Place the vacuum-dried silicon-aluminum alloy substrate on a special tooling, and use a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2 um on the bottom surface of the groove set on the inner side of the silicon-aluminum alloy substrate. After that, use the magnetron sputtering process again to sputter a layer of PVD graphene film with a thickness of 2 um on the outer side of the silicon-aluminum alloy substrate to obtain a coated aluminum substrate.

[0054] S3. The coated silicon-aluminum alloy substrate and the vacuum-dried silicon-aluminum alloy pressing plate are connected by vacuum brazing, and the brazing temperature is controlled within the range of 450-550° C. to obtain an advanced composite target material for an X-ray source.

[0055] Example 6

[0056] S1. Select an aluminum substrate and an aluminum pressing plate with the same structure as that of Example 1 as the substrate and the substrate pressing plate respectively. The size of the aluminum substrate matches that of the aluminum pressing plate. Moreover, the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and its corresponding outer side surface is 0.5 mm. Then, pre-clean the aluminum substrate and the aluminum pressing plate with alcohol respectively. Then, put the aluminum substrate and the aluminum pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning. During the cleaning process, firstly use an alkaline cleaning agent for cleaning, and control the cleaning temperature at about 65°C. After cleaning for 50 minutes, rinse with clean water. Next, use deionized water for ultrasonic cleaning, control the cleaning temperature at about 65°C, and clean for 30 minutes; then, use alkaline cleaning agent for cleaning again, and control the cleaning temperature at about 60°C; after cleaning for 30 minutes, rinse with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, control the cleaning temperature at about 60°C, and clean for 20 minutes; after cleaning, transfer the aluminum substrate and aluminum pressing plate to a drying oven for vacuum drying. During the drying process, ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0057] S2. Place the vacuum-dried aluminum substrate on a special tooling, first use a magnetron sputtering process to sputter a layer of pure copper film with a thickness of 10nm on the bottom surface of the groove set on the inner side of the aluminum substrate as a transition layer; then use a magnetron sputtering process to sputter a layer of pure tungsten film with a thickness of 2um on the transition layer; then, use a magnetron sputtering process to sputter a layer of PVD graphene film with a thickness of 2um on the outer side of the aluminum substrate to obtain a coated aluminum substrate.

[0058] S3. The coated aluminum substrate is connected to the vacuum-dried aluminum pressing plate by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source.

[0059] Example 7

[0060] S1. Select an aluminum substrate and an aluminum pressing plate with the same structure as that of Example 1 as the substrate and the substrate pressing plate respectively. The size of the aluminum substrate matches that of the aluminum pressing plate. Moreover, the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and its corresponding outer side surface is 0.5 mm. Then, pre-clean the aluminum substrate and the aluminum pressing plate with alcohol respectively. Then, put the aluminum substrate and the aluminum pressing plate into a three-dimensional ultrasonic cleaning machine for cleaning. During the cleaning process, firstly use an alkaline cleaning agent for cleaning, and control the cleaning temperature at about 65°C. After cleaning for 50 minutes, rinse with clean water. Next, use deionized water for ultrasonic cleaning, control the cleaning temperature at about 65°C, and clean for 30 minutes; then, use alkaline cleaning agent for cleaning again, and control the cleaning temperature at about 60°C; after cleaning for 30 minutes, rinse with clean water; finally, use acetone for three-dimensional ultrasonic cleaning, control the cleaning temperature at about 60°C, and clean for 20 minutes; after cleaning, transfer the aluminum substrate and aluminum pressing plate to a drying oven for vacuum drying. During the drying process, ensure that the drying oven is within the range of 100-110°C; the drying time is controlled within the range of 60-70 minutes.

[0061] S2. Place the vacuum-dried aluminum substrate on a special tooling, first use a magnetron sputtering process to sputter a layer of 1um thick diamond on the bottom surface of the groove set on the inner side of the aluminum substrate, and then use a magnetron sputtering process to sputter a layer of 2um thick pure tungsten film on the diamond; then, use a magnetron sputtering process to sputter a layer of 2um thick PVD graphene film on the outer side of the aluminum substrate to obtain a coated aluminum substrate.

[0062] S3. The coated aluminum substrate is connected to the vacuum-dried aluminum pressing plate by vacuum brazing, and the brazing temperature is controlled within the range of 450-550°C to obtain an advanced composite target material for an X-ray source.

[0063] Comparative Example 1

[0064] Pure tungsten target is selected as the X-ray source target.

[0065] Comparative Example 2

[0066] Pure diamond target is selected as the X-ray source target.

[0067] In order to evaluate the performance of the X-ray source advanced composite target materials prepared in the above-mentioned Examples 1-7 and the X-ray source target materials in Comparative Examples 1-2; the above-mentioned X-ray source advanced composite target materials and X-ray source target materials are placed on the detection instrument for testing; first, the detection is started under the condition of 8W power, and then the power of each detection is increased by 2W; by continuously increasing the power, the maximum target power that it can withstand is detected. At the same time, in order to reduce the detection error, 5 X-ray source advanced composite target material samples are prepared at the same time under the conditions of the same embodiment for evaluating their performance; after each power increase test, the sample is observed, if there is obvious film shedding or burning, it is considered that the film fails, and the maximum tolerable target power is equivalent to the target material performance, that is, the larger the average maximum tolerable power value of all X-ray source advanced composite target material samples prepared in each embodiment, the better the performance of the X-ray source advanced composite target material, and the test data is shown in Table 1.

[0068] Table 1. Average maximum tolerable power of X-ray source target materials in different embodiments and comparative examples

[0069] Examples Average maximum tolerated target power Example 1 15.2 Example 2 17.2 Example 3 18 Example 4 19.6 Example 5 16.8 Example 6 19.2 Example 7 18.4 Comparative Example 1 12 Comparative Example 2 18.8

[0070] It can be seen from Table 1 that the average maximum tolerable target power of the X-ray source composite target materials prepared in Examples 1-7 is greater than 15W; and, by comparing Examples 1-7 with Comparative Example 1, it can be seen that the average maximum tolerable target power of the X-ray source composite target materials prepared in Examples 1-7 is significantly higher than the maximum tolerable target power of the pure tungsten target material in Comparative Example 1, that is, the performance of the X-ray source composite target materials prepared in Examples 1-7 is significantly better than that of the pure tungsten target material in Comparative Example 1; by comparing Examples 1-7 with Comparative Example 2, it can be seen that the X-ray source composite target materials prepared in Examples 1-7 have an average maximum tolerable target power of more than 15W. The average maximum tolerable target power can reach a level equivalent to or higher than the average maximum tolerable power of the pure diamond target in Comparative Example 2, indicating that the performance of the X-ray source composite target prepared in Examples 1-7 is equivalent to or slightly better than that of the pure diamond target; however, the price of diamond is relatively high, and the substrate and other raw materials selected when preparing the X-ray source composite target in Examples 1-7 are lower in price than diamond, which can effectively save its production cost, and the preparation process is simple, the product quality is controllable, and it is convenient for mass production.

[0071] Comparing Example 1 with Example 2, the average maximum tolerable target power of the X-ray source composite target prepared in Example 2 is significantly higher than the maximum tolerable target power of the X-ray source composite target prepared in Example 1, indicating that increasing the thickness of the outer film can effectively improve the uniform heat and heat dissipation efficiency of the X-ray source composite target, that is, the heat concentrated at the focus can be quickly and evenly conducted and diffused in the X direction, and the heat can be quickly dissipated into the surrounding air through the fin structure on the substrate pressure plate, avoiding the phenomenon of ablation caused by continuous accumulation of heat due to untimely heat conduction and diffusion as the target power increases. Comparing Example 3 with Example 4 and Example 6 with Example 2, it can be seen that setting a transition layer between the inner film and the substrate can improve the bonding performance of the inner film and the substrate, thereby improving the performance of the X-ray source composite target. Comparing Example 7 with 1-6, it can be seen that due to the good thermal conductivity and good permeability of the diamond plane, the X-ray source composite target prepared in Example 7 can also achieve better performance, but the price of diamond is relatively high, which will greatly increase the production cost. In summary, by using aluminum metal or aluminum alloy as the substrate, magnetron sputtering or chemical vapor deposition of an outer thin film on the outer side of the substrate, and magnetron sputtering of an inner thin film on the inner side of the substrate, an X-ray source composite target material can be prepared, which has excellent performance, low production cost and controllable quality.

[0072] The above embodiments are only for illustrating the technical concept and features of the present invention, and their purpose is to enable people familiar with this technology to understand the content of the present invention and implement it accordingly, and they cannot be used to limit the scope of protection of the present invention. For those skilled in the art, it is obvious that the present invention is not limited to the details of the above exemplary embodiments, and the present invention can be implemented in other specific forms without departing from the spirit or basic features of the present invention. Therefore, no matter from which point of view, the embodiments should be regarded as exemplary and non-restrictive. The scope of the present invention is limited by the attached claims rather than the above description, and it is intended to include all changes within the meaning and scope of the equivalent elements of the claims in the present invention.

Claims

1. A method for preparing an advanced composite target material for an X-ray source, characterized in that: The following steps are involved: S1, selecting a substrate and a substrate pressing plate according to a certain size and shape, and cleaning the substrate and the substrate pressing plate, and then performing a vacuum drying process; the substrate and the substrate pressing plate are both made of aluminum metal or aluminum alloy; S2, placing the vacuum-dried substrate on a special tooling, sputtering an inner thin film on the inner side of the substrate, and then forming an outer thin film on the outer side of the substrate by sputtering or chemical vapor deposition process to obtain a coated substrate; the inner thin film is a pure tungsten film; the outer thin film is a graphite film or a graphene film; S3. Connect the coated substrate and the vacuum-dried substrate pressing plate by vacuum brazing, and control the brazing temperature within the range of 450-550° C. to obtain a composite target material.

2. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: The aluminum alloy material is any one of aluminum silicon alloy, zinc aluminum alloy, zirconium aluminum alloy, and titanium aluminum alloy; the outer side surface of the substrate pressing plate is provided with a fin-shaped structure; In step S2, the sputtering method is any one or more of radio frequency sputtering, magnetron sputtering, ion beam sputtering, and focused heavy ion sputtering; The thickness of the substrate between the inner side surface on which the inner film is sputtered and the outer side surface on which the outer film is formed is 0.5-1 mm.

3. The method for preparing an advanced composite target material for an X-ray source according to claim 2, characterized in that: A filter layer is also provided between the inner film and the substrate; the thickness of the transition layer is 8-12 nm; The material of the transition layer is copper metal.

4. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: The thickness of the inner film is 1-3 um.

5. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: The outer film is a graphene film; the graphene film is a CVD graphene film prepared by a chemical vapor deposition process or a PVD graphene film prepared by a magnetron sputtering process; The thickness of the PVD graphene film is 1-3um; the thickness of the CVD graphene film is 100-500nm.

6. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: The outer film is a graphite film; the thickness of the graphite film is 1-3 um.

7. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: In step S1, the cleaning process comprises the following steps: a. Pre-cleaning the substrate and the substrate pressing plate with alcohol; b. Put the pre-scrubbed substrate and the substrate pressing plate into a three-dimensional ultrasonic cleaning machine, and use an alkaline cleaning agent to clean them. The cleaning temperature is controlled within the range of 50-70° C. After cleaning for 30-50 minutes, rinse them with clean water, and then use deionized water for ultrasonic cleaning. The cleaning temperature is controlled within the range of 50-70° C. and the cleaning time is controlled within the range of 20-30 minutes; c. Use alkaline cleaning agent to clean again, and control the cleaning temperature within the range of 50-70℃. After cleaning for 20-30 minutes, rinse with clean water. Then, use acetone for three-dimensional ultrasonic cleaning, and control the cleaning temperature within the range of 50-70℃ and the cleaning time within the range of 10-20 minutes.

8. The method for preparing an advanced composite target material for an X-ray source according to claim 1, characterized in that: In step S1, the vacuum drying process is carried out at a drying temperature of 100-110°C and a drying time of 60-70 minutes.

9. An advanced composite target material for an X-ray source, characterized in that: The preparation method is described in any one of claims 1 to 8.

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