Cleaning system

Abstract

The invention provides a cleaning system which comprises a cleaning base station and a cleaning host, the cleaning base station is provided with a base station center line, a first water gap structure and a first guide structure, the first water gap structure and the first guide structure are separately spaced from the base station center line, and the cleaning host is provided with a host center line, a second water gap structure and a second guide structure, and the second water gap structure and the second guide structure are separately spaced from the host center line; when the cleaning host stops towards the cleaning base station, the first guide structure provides guidance for enabling the host center line to coincide with the base station center line through the second guide structure. And when the cleaning host stops in place on the cleaning base station, the first guide structure and the second guide structure are completely matched, and the first water gap structure and the second water gap structure are in butt joint. The first guiding structure does not coincide with the center line of the base station, the design that the first guiding structure is separated from the center line of the base station can enable the first guiding structure to provide obvious guiding and adjusting effects for the cleaning main machine, the adjustable angle range is large in the guiding process, and the guiding flexibility of the cleaning main machine when the cleaning main machine stops towards the base station can be improved.

Description

Technical Field

[0001] The present application belongs to the technical field of cleaning equipment, and more specifically, to a cleaning system. Background Art

[0002] The cleaning system usually includes a cleaning host and a maintenance base station. The cleaning host is used to clean and store garbage on the ground. After the cleaning host finishes cleaning the ground, the cleaning host moves to the base station, sucks out the garbage stored in the cleaning host and stores it in the base station. When the clean water in the floor washing or mopping module inside the cleaning host reaches a low water level, the cleaning host moves to the base station to add water.

[0003] The existing base station is provided with a guide protrusion and a docking port, and the docking port is used to supply clean water to the cleaning host. After the cleaning host is aligned with the guide protrusion, the docking port and the clean water port are docked. Generally, there is one guide protrusion, which is set on the center line of the base station, that is, after the cleaning host is aligned with the base station, the vertex position of the cleaning host in contact with the base station is adapted to the guide protrusion. The setting position of the guide protrusion makes its guiding effect on the cleaning host not obvious, and the angle range that can be adjusted during the guiding process is small, which is not conducive to improving the guiding flexibility of the cleaning host when docking at the base station. Summary of the invention

[0004] The purpose of the embodiments of the present application is to provide a cleaning system to solve the technical problem that the existing cleaning base station provides poor guidance flexibility when docking with the cleaning host.

[0005] To achieve the above purpose, the technical solution adopted in this application is:

[0006] A cleaning system is provided, the cleaning system comprising a cleaning base station and a cleaning host;

[0007] The cleaning base station has a base station centerline, and a first water inlet structure and a first guide structure respectively spaced apart from the base station centerline; the cleaning host has a host centerline, and a second water inlet structure and a second guide structure respectively spaced apart from the host centerline;

[0008] When the cleaning host is docked toward the cleaning base station, the first guide structure provides guidance through the second guide structure to make the center line of the host coincide with the center line of the base station;

[0009] When the cleaning host is docked on the cleaning base station, the first guide structure and the second guide structure are fully adapted and the first water inlet structure is docked with the second water inlet structure.

[0010] In some embodiments, the cleaning base station has a pair of first water inlet structures and a pair of first guide structures symmetrically arranged on both sides of the center line of the base station, and the cleaning host has a pair of second water inlet structures and a pair of second guide structures symmetrically arranged on both sides of the center line of the host.

[0011] In some embodiments, the cleaning base station has a first adapting surface, the cleaning host has a second adapting surface, and when the cleaning host is docked on the cleaning base station, the first adapting surface and the second adapting surface are facing each other;

[0012] The first water inlet structure and the first guide structure are convexly arranged by the first matching surface, and the second water inlet structure and the second guide structure are concavely arranged by the second matching surface toward the inner side of the cleaning main unit.

[0013] In some embodiments, a pair of the first guide structures are arranged on the outside of a pair of the first sprue structures, and a pair of the second guide structures are arranged on the outside of a pair of the second sprue structures; a height of the first guide structure relative to the first matching surface is higher than a height of the first sprue structure relative to the first matching surface.

[0014] In some embodiments, two side surfaces of a pair of the first guide structures that are opposite to each other and located on both sides of the center line of the base station respectively include guide slopes, and the guide slopes are connected to the top of the first guide structure; in the direction in which the cleaning host docks toward the cleaning base station, the guide slopes gradually move away from the center line of the base station.

[0015] In some embodiments, two opposite side surfaces of a pair of the first guide structures respectively include arcuate surfaces, the arcuate surfaces and the guide inclined surfaces are smoothly connected, and the position of the smooth connection constitutes the top of the first guide structure.

[0016] In some embodiments, the first guide structure includes a positioning portion and a guiding portion sequentially arranged along a protruding direction thereof, the guiding portion includes the guiding inclined surface and the arc surface, and a profile of the positioning portion extending along the protruding direction remains unchanged.

[0017] In some embodiments, the first adapting surface extends in a direction perpendicular to the center line of the base station and has two open ends disposed on both sides of the center line of the base station;

[0018] The cleaning base station includes a docking platform, which includes a platform body and two guide wheels rotatably arranged on the platform body; the platform body is placed on the side where the first matching surface is located and is lower than the first matching surface, and the two guide wheels are arranged on both sides of the center line of the base station and on the outsides of the two open ends;

[0019] The rotation axis of the guide wheel is respectively perpendicular to the center line of the base station and the extension direction of the first adapting surface, so as to provide guidance for the cleaning host when it is docked on the platform toward the cleaning base station.

[0020] In some embodiments, the cleaning main body includes a main side wall constituting its maximum contour, and an inclined side wall disposed below the main side wall and at an angle to the main side wall, the main side wall includes the second matching surface, and the guide wheel is provided for providing guidance by contacting the inclined side wall.

[0021] In some embodiments, the cleaning base station is movably configured with a water outlet assembly, and the water outlet assembly includes a pair of first water outlet structures. The water outlet assembly is configured to drive the water outlet assembly to move toward the inner side of the cleaning base station and store reverse driving force when the cleaning host is docked toward the cleaning base station, and after the cleaning host is docked in place, the first water outlet structure and the second water outlet structure are driven by the reverse driving force to remain docked.

[0022] In some embodiments, the nozzle assembly includes a main body and an elastic member; the main body extends in a direction perpendicular to the center line of the base station, and the main body has an inner side and an outer side facing the inner side and the outer side of the cleaning base station respectively; wherein the elastic member is arranged on the side where the inner side is located;

[0023] The first water inlet structure passes through the main body, and the two first inlets of a pair of the first water inlet structures are arranged on the side facing the outside for docking with a pair of the second water inlet structures; the two second inlets of a pair of the first water inlet structures are arranged on the side facing the inside for respectively connecting to the two water tanks of the cleaning base station.

[0024] In some embodiments, the nozzle assembly includes a pair of elastic members, and the pair of elastic members are respectively arranged on both sides of the center line of the base station and respectively arranged on the outside of a pair of first nozzle structures.

[0025] In some embodiments, the cleaning base station is provided with a base station clean water tank and a base station sewage tank, and the cleaning host is provided with a host clean water tank and a host sewage tank, the base station clean water tank and the base station sewage tank are respectively connected to a pair of the first water inlet structures, and the host clean water tank and the host sewage tank are respectively connected to a pair of the second water inlet structures.

[0026] In some embodiments, the cleaning base station is provided with a trigger switch, which is arranged on the center line of the base station, and is used to receive the trigger of the arrival switch of the cleaning host when the cleaning host is docked in place, and start the cleaning base station to supply water to the cleaning host or pump water from the cleaning host.

[0027] In some embodiments, the trigger switch is disposed on the water inlet assembly.

[0028] The beneficial effects of the cleaning system provided by the present application are:

[0029] Compared with the prior art, the cleaning system provided in the present application includes a cleaning base station and a cleaning host. The first water inlet structure and the first guide structure of the cleaning base station are both separated from the base station centerline of the cleaning base station. The second water inlet structure and the second guide structure of the cleaning host are both separated from the host centerline of the cleaning host. When the cleaning host docks toward the cleaning base station, the first guide structure provides guidance through the second guide structure to make the host centerline coincide with the base station centerline. The first guide structure does not coincide with the base station centerline. The design of being separated from the base station centerline allows the first guide structure to provide obvious guidance and adjustment for the cleaning host. The angle range that can be adjusted during the guidance process is large, which is conducive to improving the guidance flexibility of the cleaning host when it docks at the base station. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0031] Figure 1 A schematic diagram of a cleaning host provided in an embodiment of the present application, wherein the cleaning host starts to move toward the cleaning base station after the infrared receiving sensor thereon is connected and aligned with the infrared transmitting signal of the cleaning base station;

[0032] Figure 2 A schematic diagram of a cleaning host provided in an embodiment of the present application entering a docking station but not yet docked;

[0033] Figure 3 A schematic diagram of a cleaning host provided in an embodiment of the present application being docked on a cleaning base station;

[0034] Figure 4 A schematic diagram of a cleaning base station provided in an embodiment of the present application;

[0035] Figure 5 A schematic diagram of a cleaning base station from another perspective provided in an embodiment of the present application;

[0036] Figure 6 A schematic longitudinal section diagram of a cleaning base station provided in an embodiment of the present application;

[0037] Figure 7 A schematic diagram of a cleaning host provided in an embodiment of the present application being docked on a cleaning base station;

[0038] Figure 8A partial schematic diagram of a cleaning main unit provided by an embodiment of the present application, showing a second matching surface and an inclined side wall;

[0039] Fig. 9 A longitudinal sectional schematic diagram of the first water inlet structure of the cleaning host and the second water inlet structure of the cleaning base station provided in an embodiment of the present application being connected;

[0040] Fig.10 A longitudinal sectional schematic diagram of the first guide structure of the cleaning host provided in an embodiment of the present application docking with the second guide structure of the cleaning base station;

[0041] Fig.11 A longitudinal cross-sectional diagram of the connection between the trigger switch of the cleaning host and the in-position switch of the cleaning base station provided in an embodiment of the present application;

[0042] Fig.12 A cross-sectional schematic diagram of the first guide structure of the cleaning host provided in an embodiment of the present application docking with the second guide structure of the cleaning base station;

[0043] Fig.13 A longitudinal sectional diagram of the first water inlet structure of the cleaning host provided in the embodiment of the present application docking with the second water inlet structure of the cleaning base station and the docking of the trigger switch of the cleaning host with the in-position switch of the cleaning base station;

[0044] Fig.14 A schematic diagram of a nozzle assembly provided in an embodiment of the present application;

[0045] Fig.15 A schematic diagram of a first guide structure and a second guide structure of a cleaning base station provided in an embodiment of the present application not yet in contact;

[0046] Fig.16 A schematic diagram showing that a base station centerline of a cleaning base station and a host centerline of a cleaning host have an angle provided in an embodiment of the present application;

[0047] Fig.17 A cross-sectional schematic diagram of the first guide structure of the cleaning host provided in an embodiment of the present application docking with the second guide structure of the cleaning base station;

[0048] Fig.18 A longitudinal sectional schematic diagram of the docking of the first water inlet structure of the cleaning host with the second water inlet structure of the cleaning base station and the docking of the trigger switch of the cleaning host with the in-place switch of the cleaning base station provided in an embodiment of the present application.

[0049] Among them, the reference numerals in the figure are:

[0050] 100, cleaning system; 10, base station; 20, host;

[0051] 11. First adapting surface; 12. Water inlet assembly; 13. Base station center line; 14. Docking station;

[0052] 111, first guide structure; 112, trigger switch; 1111, guide portion; 1112, positioning portion; 1111a, guide slope; 1111b, arc surface; 1111c, top; 1111d, inclined surface;

[0053] 121, main body; 122, first water inlet structure; 123, elastic member; 124, support column; 125, rubber member; 121a, facing inward; 121b, facing outward; 1221, first inlet; 1222, second inlet;

[0054] 141. platform body; 142. guide wheel;

[0055] 21. Main side wall; 22. Inclined side wall; 23. Mainframe centerline;

[0056] 211, second matching surface; 2111, second guide structure; 2112, second water inlet structure; 2113, in-position switch; 211a, open end. DETAILED DESCRIPTION

[0057] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0058] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0059] It should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0060] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0061] Now refer to Figures 1 to 18 The cleaning system 100 provided in the embodiment of the present application is described.

[0062] See also Figures 1 to 3 ,as well as Figures 15 to 18 As shown, the cleaning system 100 provided in the embodiment of the present application includes a cleaning base station 10 and a cleaning host 20. The cleaning base station 10 has a base station centerline 13, and a first water inlet structure 122 and a first guide structure 111 that are spaced apart from the base station centerline 13. The cleaning host 20 has a host centerline 23, and a second water inlet structure 2112 and a second guide structure 2111 that are spaced apart from the host centerline 23. When the cleaning host 20 is docked toward the cleaning base station 10, the first guide structure 111 provides guidance through the second guide structure 2111 to make the host centerline 23 coincide with the base station centerline 13. When the cleaning host 20 is docked in place on the cleaning base station 10, the first guide structure 111 and the second guide structure 2111 are fully adapted and the first water inlet structure 122 is docked with the second water inlet structure 2112.

[0063] Compared with the prior art, the cleaning system 100 provided in the present application includes a cleaning base station 10 and a cleaning host 20. The first water inlet structure 122 and the first guide structure 111 provided on the cleaning base station 10 are both separated from the base station center line 13 of the cleaning base station 10. The second water inlet structure 2112 and the second guide structure 2111 provided on the cleaning host 20 are both separated from the host center line 23 of the cleaning host 20. When the cleaning host 20 docks toward the cleaning base station 10, the first guide structure 111 provides guidance through the second guide structure 2111 to make the host center line 23 coincide with the base station center line 13. The first guide structure 111 does not coincide with the base station center line 13. The design of being separated from the base station center line 13 enables the first guide structure 111 to provide obvious guidance and adjustment for the cleaning host 20. The angle range that can be adjusted during the guidance process is large, which is conducive to improving the guidance flexibility of the cleaning host 20 when it docks at the base station.

[0064] The first nozzle structure 122 and the second nozzle structure 2112 may be one or more or may be arranged in pairs, and the first guide structure 111 and the second guide structure 2111 may be one or more or may be arranged in pairs.

[0065] Among them, the water inlet structure refers to a structure with two water inlets connected to each other, and the water inlet is used to connect a water-using component, a water collecting component or a water supply component. For example, the water collecting component can be a sewage tank for collecting sewage, and the water supply component can be a clean water tank for supplying clean water. The water-using component can clean the cleaning parts on the main unit 20.

[0066] In some embodiments, the cleaning base station 10 has a pair of first water inlet structures 122 and a pair of first guide structures 111 symmetrically arranged on both sides of the base station center line 13, and the cleaning host 20 has a pair of second water inlet structures 2112 and a pair of second guide structures 2111 symmetrically arranged on both sides of the host center line 23.

[0067] The cleaning host 20 is a structure that is roughly symmetrical about the host centerline 23, and a pair of second guide structures 2111 are symmetrical about the host centerline 23. When the cleaning host 20 docks toward the cleaning base station 10, a pair of first guide structures 111 symmetrically located on both sides of the base station centerline 13 substantially synchronously contact a pair of second guide structures 2111. Since the cleaning host 20 is moving during the docking process, the movement may be to enter the docking station 14 in the forward direction or to enter the docking station 14 in the backward direction. During the movement of the cleaning host 20, the two first guide structures 111 respectively adjust the movement direction of the cleaning host 20 through the two second guide structures 2111. When the host centerline 23 and the cleaning centerline have an angle, the cleaning host 20 is adjusted so that the host centerline 23 infinitely approaches to coincide with the base station centerline 13.

[0068] A pair of first guide structures 111 and a pair of second guide structures 2111 are used to guide the cleaning host 20. The two different side surfaces belonging to the pair of first guide structures 111 can play a guiding role. The two different side surfaces can be arranged on both sides of the base station center line 13 at a certain interval, which plays an obvious guiding role for the cleaning host 20 and increases the adjustable angle range of the cleaning host 20.

[0069] In some embodiments, the first water inlet structure 122 and the first guide structure 111 are convexly arranged from the first adapting surface 11 , and the second water inlet structure 2112 and the second guide structure 2111 are concavely arranged from the second adapting surface 211 toward the inner side of the cleaning main unit 20 .

[0070] The first guide structure 111 is convexly arranged by the first adapting surface 11, that is, when the cleaning host 20 has not yet docked in place, the second guide structure 2111 of the cleaning host 20 can contact the first guide structure 111, and continue to move and dock in place under the guidance of the first guide structure 111. The second guide structure 2111 is concavely arranged, allowing the cleaning host 20 to continue to accommodate the first guide structure 111 as the cleaning host 20 moves during the docking process. When the first guide structure 111 is fully adapted to the second guide structure 2111, the cleaning host 20 is docked in place relative to the cleaning base station 10.

[0071] The first nozzle structure 122 is convexly arranged on the first adapting surface 11, and the second nozzle structure 2112 is concavely arranged on the second adapting surface 211. During the adaptation process of the first guide structure 111 and the second guide structure 2111, the first nozzle structure 122 and the second nozzle structure 2112 are constantly approached and connected with each other as the cleaning main unit 20 moves. The convex arrangement of the first nozzle structure 122 can ensure that it is well connected with the second nozzle structure 2112 according to the docking requirements and sealing requirements before the cleaning main unit 20 is docked in place.

[0072] In some embodiments, a pair of first guide structures 111 are disposed outside a pair of first nozzle structures 122, and a pair of second guide structures 2111 are disposed outside a pair of second nozzle structures 2112. The height of the first guide structure 111 relative to the first matching surface 11 is higher than the height of the first nozzle structure 122 relative to the first matching surface 11.

[0073] A pair of first guide structures 111 are arranged on the outside of a pair of first sprue structures 122, which is conducive to the integrated design of the pair of first sprue structures 122, for example, the pair of first sprue structures 122 are arranged on a detachable integral part, and the space between the pair of first guide structures 111 can be used to configure the integral part.

[0074] A pair of first guide structures 111 are arranged on the outside of a pair of first water inlet structures 122. The pair of first guide structures 111 play a guiding role in the docking process of the cleaning host 20. The pair of first water inlet structures 122 located on the inner side thereof are accurately docked with the pair of second water inlet structures 2112 in the process of the cleaning host 20 being continuously guided, so that the overall layout of the water inlet structure and the guide structure is more conducive to the docking and docking of the cleaning host 20.

[0075] The height of the first guide structure 111 relative to the first adapting surface 11 is higher than the height of the first water inlet structure 122 relative to the first adapting surface 11. During the adaptation process of the first guide structure 111 and the second guide structure 2111, the first water inlet structure 122 and the second water inlet structure 2112 are constantly approaching and docking with the movement of the cleaning host 20. Specifically, when the first guide structure 111 begins to guide the cleaning host 20, the first water inlet structure 122 and the second water inlet structure 2112 are close but not docked. As the first guide structure 111 guides the cleaning host 20, the host center line 23 gradually coincides with the base station center line 13. The first water inlet structure 122 and the second water inlet structure 2112 begin to align and dock with the movement of the cleaning host 20. After the first guide structure 111 and the second guide structure 2111 are fully adapted, the cleaning host 20 is docked in place, and the first water inlet structure 122 and the second water inlet structure 2112 are well docked, making the docking process of the cleaning host 20 more orderly and accurate.

[0076] In some embodiments, two side surfaces of a pair of first guide structures 111 that are opposite to each other and located on both sides of the base station center line 13 respectively include a guide slope 1111a, and the guide slope 1111a is connected to the top 1111c of the first guide structure 111. In the direction in which the cleaning host 20 docks toward the cleaning base station 10, the guide slope 1111a gradually moves away from the base station center line 13.

[0077] like Fig.15 As shown, after the cleaning host 20 is aligned with the infrared transmitting signal of the cleaning base station 10 through the infrared receiving sensor arranged at the front end or rear end thereof, the cleaning host 20 slowly enters the ramp of the parking platform 14 of the cleaning base station 10 along the center line 13 of the base station in an advancing or retreating manner. As the cleaning host 20 continues to move, compared with other parts of the cleaning base station 10, a pair of first guide structures 111 first contact the cleaning host 20, and the two opposite guide slopes 1111a thereon can guide from the left and right directions of the cleaning host 20 respectively.

[0078] For example, Fig.16 As shown, the cleaning host 20 is offset toward the right side. In the area close to the cleaning base station 10, the host center line 23 is located on the right side of the base station center line 13, and there is a certain angle difference between the two. As the cleaning host 20 moves, the guide slope 1111a on the first guide structure 111 located on the left side contacts the inner wall surface of the second guide structure 2111 located on the left side, and as the cleaning host 20 moves, the cleaning host 20 is continuously guided to offset toward the left side, thereby causing the host center line 23 to offset toward the left side and coincide with the base station center line 13.

[0079] Alternatively, the cleaning host 20 is offset toward the left side. In the area close to the cleaning base station 10, the host center line 23 is located on the left side of the base station center line 13. There is a certain angle difference between the two. As the cleaning host 20 moves, the guide slope 1111a on the first guide structure 111 located on the right side contacts the inner wall surface of the second guide structure 2111 located on the right side, and as the cleaning host 20 moves, the cleaning host 20 is continuously guided to offset toward the right side, thereby causing the host center line 23 to offset toward the right side and coincide with the base station center line 13.

[0080] like Fig.17 and Fig.18 As shown, after the host center line 23 and the base station center line 13 coincide, a pair of first guide structures 111 and a pair of second guide structures 2111 are fully adapted, and a pair of first water inlet structures 122 and a pair of second water inlet structures 2112 are well connected and connected.

[0081] In some embodiments, two opposite side surfaces of a pair of first guide structures 111 respectively include arcuate surfaces 1111 b , and the arcuate surfaces 1111 b and the guide inclined surfaces 1111 a are smoothly connected, and the smoothly connected positions constitute the tops 1111 c of the first guide structures 111 .

[0082] The parts close to the top 1111c on the two opposite sides of a pair of first guide structures 111 are designed as arcuate surfaces 1111b, so that the arcuate surfaces 1111b are smoothly connected to the guide slopes 1111a. Then, the surface of the part of the first guide structure 111 away from the first adapting surface 11 is smoother as a whole, which plays a role in assisting the guidance. In addition, it is beneficial for the first guide structure 111 to smoothly adapt to the second guide structure 2111 during the continuous movement of the cleaning main unit 20, thereby preventing the guidance and adaptation process of the first guide structure 111 from being hindered due to the design of a non-smooth surface, resulting in a jamming phenomenon.

[0083] In some embodiments, the first guide structure 111 includes a positioning portion 1112 and a guide portion 1111 sequentially arranged along its protruding direction, the guide portion 1111 includes a guiding inclined surface 1111a and an arc surface 1111b, and the contour of the positioning portion 1112 extending along the protruding direction remains unchanged.

[0084] The contour of the positioning portion 1112 extending in the protruding direction remains unchanged. For example, the positioning portion 1112 may be a square body as a whole. In the direction perpendicular to the protruding direction, the cross-sectional shape of the positioning portion 1112 is a square. In the protruding direction, the cross-sectional shape and size of the positioning portion 1112 remain unchanged. Alternatively, the positioning portion 1112 may be a column as a whole. In the direction perpendicular to the protruding direction, the cross-sectional shape of the positioning portion 1112 is a circle or an ellipse. In the protruding direction, the cross-sectional shape and size of the positioning portion 1112 remain unchanged.

[0085] After the first guide structure 111 completes the guiding effect on the cleaning host 20, the host center line 23 and the base station center line 13 coincide with each other. At this time, the cleaning host 20 has not yet been fully docked, and there is still a certain distance between the first adaptation surface 11 and the second adaptation surface 211, which is the protruding height of the positioning portion 1112. At this time, the cleaning host 20 is positioned by the positioning portion 1112. Since the contour of the positioning portion 1112 extending along the protruding direction remains unchanged, the host center line 23 and the base station center line 13 can be kept in a coincident state. The cleaning host 20 continues to move in the positioning state of the positioning portion 1112. The positioning portion 1112 enters the second guide structure 2111 with the movement of the cleaning host 20. After the cleaning host 20 is docked, the positioning portion 1112 and the guide portion 1111 are fully adapted to the second guide structure 2111.

[0086] In some embodiments, in order to further improve the smoothness of the first guide structure 111 entering the second guide structure 2111, two inclined surfaces 1111d are provided on both sides of the guide portion 1111 along the height direction, pointing from the positioning portion 1112 to the direction of the top 1111c, and the spacing between the two inclined surfaces 1111d gradually decreases, and the two inclined surfaces 1111d are smoothly connected to the top 1111c, so that the surface of the top 1111c is smooth as a whole, which is beneficial to the guidance of the first guide structure 111 and improves its smoothness of entering the second guide structure 2111.

[0087] Reference Figures 4 to 7 As shown, in some embodiments, the first adapting surface 11 extends in a direction perpendicular to the center line 13 of the base station, and has two open ends 211a disposed on both sides of the center line 13 of the base station. The cleaning base station 10 includes a docking platform 14, and the docking platform 14 includes a platform body 141 and two guide wheels 142 rotatably disposed on the platform body 141. The platform body 141 is disposed on the side where the first adapting surface 11 is located and is lower than the first adapting surface 11, and the two guide wheels 142 are disposed on both sides of the center line 13 of the base station and on the outside of the two open ends 211a.

[0088] The rotation axis of the guide wheel 142 is perpendicular to the center line 13 of the base station and the extension direction of the first adapting surface 11 , respectively, so as to provide guidance for the cleaning host 20 when it is docked on the platform 141 toward the cleaning base station 10 .

[0089] Generally, the area of ​​the cleaning base station 10 for docking the cleaning host 20 is closed along both sides of the width of the base station, and only an entrance and exit are provided to allow the cleaning host 20 to enter and exit the area. For example, the cleaning base station 10 forms a U-shaped area, the U-shaped side wall of the U-shaped area is composed of a first adapter surface 11, and the docking platform 14 is arranged below the first adapter surface 11. After the cleaning host 20 docks on the docking platform 14, most of the cleaning host 20 on both sides along the width direction is shielded by the U-shaped side wall on both sides along the width direction, that is, the cleaning host 20 on both sides along the width direction is located inside the U-shaped side wall on both sides along the width direction, and the maximum width of the cleaning host 20 is limited by the width of the base station.

[0090] Since the cleaning host 20 needs to be accommodated along the width direction, the width dimension of the cleaning base station 10 is large, the volume of the base station is large, and the occupied area of ​​the base station is large, which is not conducive to the miniaturization and integration of the base station, nor is it conducive to the design of various sizes of the cleaning host 20.

[0091] Reference Fig.12 and Fig.13As shown, in the embodiment of the present application, the two guide wheels 142 are arranged on both sides of the base station center line 13 and on the outside of the two open ends 211a, that is, the guide wheels 142 are spaced apart from the first adapter surface 11 on both sides along the width direction, and the design of the side walls on both sides of the first adapter surface 11 along the width direction is cancelled, so that the area where the first adapter surface 11 is located is in a state of openness on three sides, including open settings on both sides along the width direction and an open setting on one side of the host entry and exit docking station 14.

[0092] The two guide wheels 142 both restrict the cleaning host 20 along the width direction to prevent the host from deviating from the docking station 14 from both sides of the width direction of the docking station 14, and the guide wheels 142 can rotate relative to the cleaning host 20, allowing the guide wheels 142 to guide the host when the host enters and exits the docking station 14.

[0093] In this embodiment, the side walls on both sides of the first adaptation surface 11 along the width direction are eliminated, and guide wheels 142 are set at corresponding positions. Compared with the side walls occupying the entire height of the host along the height direction, the guide wheels 142 only occupy a part of the height of the host along the height direction, while the size of the part of the host at other heights along the width direction may not be restricted. Therefore, the maximum width profile of the host is not restricted by the guide wheels 142 and can be designed to be equal to or exceed the width of the base station.

[0094] For example, compared to the maximum height of the main machine, the height of the guide wheel 142 can be low enough, as long as the guide wheel 142 can guide the main machine. The guide wheel 142 can contact the lower position on both sides of the main machine along the width direction, and the part of the main machine on both sides along the width direction that is above the guide wheel 142 can be increased in size as needed.

[0095] Based on the above, the width of the base station can be reduced, and the width of the host is allowed to be equal to or exceed the width of the base station, which is conducive to the miniaturization and integration of the base station and reduces the occupied space of the base station.

[0096] like Fig.15As shown, after the cleaning host 20 is aligned with the infrared transmitting signal of the cleaning base station 10 through the infrared receiving sensor set at the front end or rear end thereof, the cleaning host 20 slowly enters the ramp of the docking platform 14 of the cleaning base station 10 along the center line 13 of the base station in a forward or backward manner. During the entry process, the host first contacts the two guide wheels 142 on the docking platform 14, and the two guide wheels 142 perform initial guide correction on the host to minimize the angle between the center line 23 of the host and the center line 13 of the base station. The host continues to enter the docking platform 14, and compared with other parts on the first adapter surface 11, a pair of first guide structures 111 first contact the cleaning host 20, and the two guide inclined surfaces 1111a on them that are separated from each other can guide from the left and right directions of the cleaning host 20 respectively, so that the center line 23 of the host and the center line 13 of the base station tend to overlap.

[0097] Reference Figure 8 As shown, in some embodiments, the cleaning main body 20 includes a main side wall 21 constituting its maximum contour, and an inclined side wall 22 disposed below the main side wall 21 and at an angle to the main side wall 21, the main side wall 21 includes a second matching surface 211, and the guide wheel 142 is provided for providing guidance by contacting the inclined side wall 22.

[0098] The guide wheel 142 contacts the inclined side wall 22, and the other parts above the inclined side wall 22 constitute the maximum outline of the main unit, allowing the main side walls 21 above the inclined side walls 22 on both sides of the host along the width direction to be increased in size as needed, thereby allowing the maximum width dimension of the host to be greater than or equal to the width dimension of the base station.

[0099] Reference Fig.14 As shown, in some embodiments, the cleaning base station 10 is movably configured with a water inlet assembly 12, and the water inlet assembly 12 includes a pair of first water inlet structures 122. The water inlet assembly 12 is configured to drive the water inlet assembly 12 to move toward the inner side of the cleaning base station 10 and store reverse driving force when the cleaning host 20 is docked toward the cleaning base station 10, and to drive the first water inlet structure 122 and the second water inlet structure 2112 to maintain docking through the reverse driving force after the cleaning host 20 is docked in place.

[0100] On the one hand, a pair of first water inlet structures 122 are arranged in the water inlet assembly 12, and the water inlet assembly 12 is configured as a whole to drive the water inlet assembly 12 to move toward the inner side of the cleaning base station 10 and store reverse driving force when the cleaning host 20 is docked toward the cleaning base station 10. The water inlet assembly 12 is driven in an integrated manner through the autonomous movement of the cleaning host 20, and the two first water inlet structures 122 can be conveniently controlled to be driven synchronously and store the same reverse driving force, and then synchronously dock with the two second water inlet structures 2112, so that the dynamic rhythm, direction, and strength of the two first water inlet structures 122 remain consistent.

[0101] On the other hand, the nozzle assembly 12 is first driven in the same direction by the autonomous movement of the cleaning host 20 to make the first nozzle structure 122 and the second nozzle structure 2112 dock well, and then the first nozzle structure 122 and the second nozzle structure 2112 are reversely driven by the stored reverse driving force to maintain docking, which is conducive to improving the docking stability of the first nozzle structure 122 and the second nozzle structure 2112 during use. In addition, by first driving in the same direction and then maintaining in the reverse direction, the movement inertia of the host entering the docking platform 14 can weaken the impact damage to the nozzle structure, prevent the movement inertia from damaging the first nozzle structure 122 and the second nozzle structure 2112, and reduce the cost and probability of repairing and replacing the nozzle structure.

[0102] In some embodiments, the water inlet assembly 12 includes a main body 121 and an elastic member 123. The main body 121 extends in a direction perpendicular to the center line 13 of the base station, and the main body 121 has an inner side 121a and an outer side 121b facing the inner side and the outer side of the cleaning base station 10, respectively. Among them, the elastic member 123 is arranged on the side where the inner side 121a is located. The first water inlet structure 122 runs through the main body 121, and the two first ports 1221 of a pair of first water inlet structures 122 are arranged on the side where the outer side 121b is located, for docking with a pair of second water inlet structures 2112; the two second ports 1222 of a pair of first water inlet structures 122 are arranged on the side where the inner side 121a is located, for connecting two water tanks of the cleaning base station 10 respectively.

[0103] Among them, the main body 121 plays the role of supporting the first water inlet structure 122 and the elastic member 123. When the cleaning host 20 is docked toward the cleaning base station 10, the main body 121 is driven to move toward the inner side of the cleaning base station 10. The elastic member 123 synchronously stores the reverse driving force under the drive of the main body 121. When the cleaning host 20 is docked in place, the first water inlet structure 122 and the second water inlet structure 2112 are well connected and connected under the action of the elastic member 123.

[0104] In some embodiments, the main body 121 can be a rigid part or a plastic part. A support column 124 is provided on the side of the main body 121 facing away from the main unit. The support column 124 and the main body 121 are perpendicular to each other. The elastic member 123 is a spring. The elastic member 123 is sleeved on the support column 124. The support column 124 supports and guides the elastic member 123, which is beneficial for the elastic member 123 to be compressed along the length direction of the support column 124 to store reverse driving force, or to be released along the length direction of the support column 124 to restore the original length.

[0105] In some embodiments, the first nozzle structure 122 is integrally formed with the main body 121, or the first nozzle structure 122 is detachably mounted on the main body 121. A rubber member 125 is sleeved on the first port 1221 of the first nozzle structure 122, and the rubber member 125 has a plurality of rubber rings surrounding the outer circumference of the first port 1221. The plurality of rubber rings do not hinder the docking of the first nozzle structure 122 and the second nozzle structure 2112, and can ensure the docking sealing of the two.

[0106] In some embodiments, the nozzle assembly 12 includes a pair of elastic members 123 , and the pair of elastic members 123 are respectively disposed on both sides of the base station center line 13 and respectively disposed on the outer sides of the pair of first nozzle structures 122 .

[0107] The pair of elastic members 123 improves the balance of the entire nozzle assembly 12 during movement, and also ensures the consistency of movement of the pair of first nozzle structures 122 .

[0108] In some embodiments, the cleaning base station 10 is provided with a base station clean water tank and a base station sewage tank, and the cleaning host 20 is provided with a host clean water tank and a host sewage tank. The base station clean water tank and the base station sewage tank are respectively connected to a pair of first water inlet structures 122, and the host clean water tank and the host sewage tank are respectively connected to a pair of second water inlet structures 2112.

[0109] The path for the base station to add clean water to the host in the cleaning system 100 includes the base station clean water tank, a first water inlet structure 122, a second water inlet structure 2112 and the host clean water tank, so that the clean water in the base station clean water tank is added to the host clean water tank.

[0110] The path of sewage generated by the base station sucking the host to clean the ground or self-cleaning in the cleaning system 100 includes the host sewage tank, another second water inlet structure 2112, another first water inlet structure 122 and the base station sewage tank, so that the sewage in the host sewage tank is sucked into the base station sewage tank.

[0111] In some embodiments, the cleaning base station 10 is provided with a trigger switch 112, which is arranged on the center line 13 of the base station, and is used to receive the trigger of the in-place switch 2113 of the cleaning host 20 when the cleaning host 20 is docked in place, and start the cleaning base station 10 to supply water to the cleaning host 20 or pump water from the cleaning host 20.

[0112] The trigger switch 112 of the base station is used to connect with the in-place switch 2113 of the host to generate a trigger signal. When the trigger switch 112 triggers the in-place switch 2113 to generate a trigger signal, the control part of the base station obtains the trigger signal and determines based on the trigger signal that the pair of first water inlet structures 122 and the pair of second water inlet structures 2112 are well connected, and starts the system sewage pumping and system fresh water adding process based on the trigger signal.

[0113] In some embodiments, the trigger switch 112 is disposed on the water inlet assembly 12. The trigger switch 112 can accurately trigger the position switch 2113. At the same time, the buffering effect of the elastic member 123 is used to protect the trigger switch 112 and prevent the movement inertia of the main machine from damaging the trigger switch 112.

[0114] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A cleaning system (100), characterized in that: The cleaning system (100) comprises a cleaning base station (10) and a cleaning host (20); The cleaning base station (10) has a base station center line (13), and a first water inlet structure (122) and a first guide structure (111) respectively spaced apart from the base station center line (13); the cleaning host (20) has a host center line (23), and a second water inlet structure (2112) and a second guide structure (2111) respectively spaced apart from the host center line (23); When the cleaning main unit (20) is docked toward the cleaning base station (10), the first guide structure (111) provides guidance through the second guide structure (2111) so that the center line (23) of the main unit coincides with the center line (13) of the base station; When the cleaning host (20) is docked in place on the cleaning base station (10), the first guide structure (111) and the second guide structure (2111) are fully adapted and the first water inlet structure (122) and the second water inlet structure (2112) are docked.

2. The cleaning system (100) according to claim 1, characterized in that: The cleaning base station (10) comprises a pair of the first water inlet structures (122) and a pair of the first guide structures (111) which are symmetrically arranged on both sides of the center line (13) of the base station, and the cleaning main unit (20) comprises a pair of the second water inlet structures (2112) and a pair of the second guide structures (2111) which are symmetrically arranged on both sides of the center line (23) of the main unit.

3. The cleaning system (100) according to claim 2, characterized in that: The cleaning base station (10) has a first adapting surface (11), and the cleaning host (20) has a second adapting surface (211), and when the cleaning host (20) is docked on the cleaning base station (10), the first adapting surface (11) and the second adapting surface (211) are directly opposite; The first water inlet structure (122) and the first guide structure (111) are convexly arranged on the first adapting surface (11), and the second water inlet structure (2112) and the second guide structure (2111) are concavely arranged on the inner side of the second adapting surface (211) toward the cleaning main unit (20).

4. The cleaning system (100) according to claim 3, characterized in that: A pair of the first guide structures (111) are arranged outside a pair of the first nozzle structures (122), and a pair of the second guide structures (2111) are arranged outside a pair of the second nozzle structures (2112); The height of the first guide structure (111) relative to the first matching surface (11) is higher than the height of the first nozzle structure (122) relative to the first matching surface (11).

5. The cleaning system (100) according to claim 4, characterized in that: Two side surfaces of a pair of the first guide structures (111) that are opposite to each other and located on both sides of the center line (13) of the base station respectively comprise guide slopes (1111a), and the guide slopes (1111a) are connected to the top (1111c) of the first guide structure (111); along the direction in which the cleaning host (20) docks toward the cleaning base station (10), the guide slopes (1111a) gradually move away from the center line (13) of the base station.

6. The cleaning system (100) according to claim 5, characterized in that: Two opposite side surfaces on a pair of the first guide structures (111) respectively include arcuate surfaces (1111b), the arcuate surfaces (1111b) and the guide inclined surfaces (1111a) are smoothly connected, and the position of the smooth connection constitutes the top (1111c) of the first guide structure (111).

7. The cleaning system (100) according to claim 6, characterized in that: The first guide structure (111) comprises a positioning portion (1112) and a guide portion (1111) which are sequentially arranged along a protruding direction thereof, the guide portion (1111) comprising the guiding inclined surface (1111a) and the arcuate surface (1111b), and the contour of the positioning portion (1112) extending along the protruding direction remains unchanged.

8. The cleaning system (100) according to claim 3, characterized in that: The first adapting surface (11) extends in a direction perpendicular to the center line (13) of the base station and has two open ends (211a) disposed on both sides of the center line (13) of the base station; The cleaning base station (10) comprises a docking platform (14), wherein the docking platform (14) comprises a platform body (141) and two guide wheels (142) rotatably arranged on the platform body (141); the platform body (141) is located on the side where the first matching surface (11) is located and is lower than the first matching surface (11); the two guide wheels (142) are respectively arranged on both sides of the center line (13) of the base station and respectively arranged on the outsides of the two open ends (211a); The rotation axis of the guide wheel (142) is respectively perpendicular to the center line (13) of the base station and the extension direction of the first adapting surface (11), so as to provide guidance for the cleaning host (20) when it is docked on the platform (141) toward the cleaning base station (10).

9. The cleaning system (100) according to claim 8, characterized in that: The cleaning main body (20) comprises a main side wall (21) constituting its maximum contour, and an inclined side wall (22) disposed below the main side wall (21) and forming an angle with the main side wall (21), the main side wall (21) comprising the second matching surface (211), and the guide wheel (142) is used to provide guidance by contacting the inclined side wall (22).

10. The cleaning system (100) according to any one of claims 2 to 9, characterized in that: The cleaning base station (10) is movably equipped with a nozzle assembly (12), and the nozzle assembly (12) includes a pair of first nozzle structures (122). The nozzle assembly (12) is configured to drive the nozzle assembly (12) to move toward the inner side of the cleaning base station (10) and store reverse driving force when the cleaning host (20) is docked toward the cleaning base station (10), and to drive the first nozzle structure (122) and the second nozzle structure (2112) to maintain docking through the reverse driving force after the cleaning host (20) is docked.

11. The cleaning system (100) according to claim 10, characterized in that: The nozzle assembly (12) comprises a main body (121) and an elastic member (123); the main body (121) extends in a direction perpendicular to the center line (13) of the base station, and the main body (121) has an inner side (121a) and an outer side (121b) facing the inner side and the outer side of the cleaning base station (10), respectively; wherein the elastic member (123) is arranged on the side where the inner side (121a) is located; The first water inlet structure (122) passes through the main body (121); the two first ports 1221 of a pair of the first water inlet structures (122) are arranged on the side facing the outer side (121b) for docking with a pair of the second water inlet structures (2112); the two second ports 1222 of a pair of the first water inlet structures (122) are arranged on the side facing the inner side (121a) for respectively connecting to two water tanks of the cleaning base station (10).

12. The cleaning system (100) according to claim 11, characterized in that: The nozzle assembly (12) comprises a pair of elastic members (123), wherein the pair of elastic members (123) are arranged on both sides of the center line (13) of the base station and on the outer sides of a pair of the first nozzle structures (122).

13. The cleaning system (100) according to claim 10, characterized in that: The cleaning base station (10) is provided with a base station clean water tank and a base station sewage tank, and the cleaning host (20) is provided with a host clean water tank and a host sewage tank, the base station clean water tank and the base station sewage tank are respectively connected to a pair of the first water inlet structures (122), and the host clean water tank and the host sewage tank are respectively connected to a pair of the second water inlet structures (2112).

14. The cleaning system (100) according to claim 10, characterized in that: The cleaning base station (10) is provided with a trigger switch (112), and the trigger switch (112) is arranged on the center line (13) of the base station, and is used to receive the trigger of the in-position switch (2113) of the cleaning host (20) when the cleaning host (20) is docked in position, and start the cleaning base station (10) to supply water to the cleaning host (20) or to pump water from the cleaning host (20).

15. The cleaning system (100) according to claim 14, characterized in that: The trigger switch (112) is arranged on the water inlet assembly (12).

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