A cleaning system

Abstract

The application provides a cleaning system, comprising a cleaning base station and a cleaning host, the cleaning base station has a base station center line, and a first water outlet structure and a first guide structure are respectively spaced apart from the base station center line, the cleaning host has a host center line, and a second water outlet structure and a second guide structure are respectively spaced apart from the host center line; when the cleaning host approaches the cleaning base station, the first guide structure provides guidance for the host center line to coincide with the base station center line through the second guide structure. When the cleaning host is parked in place on the cleaning base station, the first guide structure and the second guide structure are completely matched, and the first water outlet structure is connected with the second water outlet structure. The first guide structure does not coincide with the base station center line, and the design of being spaced apart from the base station center line can make the first guide structure provide obvious guidance and adjustment for the cleaning host, the angle range that can be adjusted in the guidance process is larger, and the guidance flexibility when the cleaning host approaches the base station is improved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of cleaning equipment, and more particularly to a cleaning system. BACKGROUND

[0002] The cleaning system generally comprises a cleaning host and a maintenance base station, the cleaning host is used for cleaning and storing garbage on the ground, after the cleaning host finishes cleaning the ground, the cleaning host moves to the base station, the garbage stored in the cleaning host is sucked out and stored in the base station, and the cleaning water of the cleaning module inside the cleaning host is used when the water level is low, and the cleaning host moves to the base station for water filling.

[0003] The existing base station is provided with a guide protrusion and a docking port, the docking port is used for supplying cleaning water to the cleaning host. After the cleaning host is aligned with the guide protrusion, the docking port and the cleaning water port are docked. Generally, the number of the guide protrusion is one, which is arranged on the center line of the base station, that is, the vertex position of the contact between the cleaning host and the base station after the cleaning host is aligned with the base station is matched with the guide protrusion. The setting position of the guide protrusion leads to that the guiding effect of the guide protrusion on the cleaning host is not obvious, and the angle range that can be adjusted during the guiding process is small, which is not conducive to improving the guiding flexibility of the cleaning host when the cleaning host is parked at the base station. SUMMARY

[0004] The purpose of the embodiment of the application is to provide a cleaning system to solve the technical problem of poor guiding flexibility provided by the existing cleaning base station when parking the cleaning host.

[0005] To achieve the above purpose, the technical scheme adopted by the application is:

[0006] Provided is a cleaning system, which comprises a cleaning base station and a cleaning host.

[0007] The cleaning base station has a base station center line, and a first water port structure and a first guide structure which are respectively spaced apart from the base station center line. The cleaning host has a host center line, and a second water port structure and a second guide structure which are respectively spaced apart from the host center line.

[0008] When the cleaning host is parked towards the cleaning base station, the first guide structure provides guiding for the host center line to coincide with the base station center line through the second guide structure.

[0009] When the cleaning host is parked in place on the cleaning base station, the first guide structure and the second guide structure are completely matched, and the first water port structure and the second water port structure are docked.

[0010] In some embodiments, the cleaning base station has a pair of the first water outlet structures and a pair of the first guide structures symmetrically arranged on two sides of a center line of the cleaning base station respectively, and the cleaning main machine has a pair of the second water outlet structures and a pair of the second guide structures symmetrically arranged on two sides of a center line of the cleaning main machine respectively.

[0011] In some embodiments, the cleaning base station has a first adapting surface, the cleaning main machine has a second adapting surface, and the first adapting surface and the second adapting surface face each other when the cleaning main machine is parked in place on the cleaning base station.

[0012] The first water outlet structures and the first guide structures are arranged protruding from the first adapting surface, and the second water outlet structures and the second guide structures are arranged recessed towards the inner side of the cleaning main machine from the second adapting surface.

[0013] In some embodiments, a pair of the first guide structures are arranged outside a pair of the first water outlet structures, and a pair of the second guide structures are arranged outside a pair of the second water outlet structures; the height of the first guide structures relative to the first adapting surface is higher than the height of the first water outlet structures relative to the first adapting surface.

[0014] In some embodiments, two opposite sides of a pair of the first guide structures, which are located on two sides of the center line of the cleaning base station, respectively comprise guide slopes, and the guide slopes are connected with the top of the first guide structures; in the direction in which the cleaning main machine is parked towards the cleaning base station, the guide slopes gradually move away from the center line of the cleaning base station.

[0015] In some embodiments, two opposite sides of a pair of the first guide structures respectively comprise arc surfaces, the arc surfaces and the guide slopes are smoothly connected, and the smoothly connected positions constitute the top of the first guide structures.

[0016] In some embodiments, the first guide structure comprises a positioning portion and a guide portion arranged in sequence in the protruding direction of the first guide structure, the guide portion comprises the guide slope and the arc surface, and the contour of the positioning portion remains unchanged along the protruding direction.

[0017] In some embodiments, the first adapting surface extends in a direction perpendicular to the center line of the cleaning base station, and has two open ends arranged on two sides of the center line of the cleaning base station respectively.

[0018] The cleaning base station comprises a parking platform, and the parking platform comprises a platform body and two guide wheels rotatably arranged on the platform body; the platform body is arranged on the side of the first adapting surface and is lower than the first adapting surface, and the two guide wheels are arranged on two sides of the center line of the cleaning base station and are arranged outside the two open ends.

[0019] The rotation axis of the guide wheel is perpendicular to the extension direction of the middle line of the base station and the first adapting surface, and the guide wheel provides guidance when the cleaning main machine approaches the cleaning base station.

[0020] In some embodiments, the cleaning main machine comprises a main side wall constituting the maximum profile thereof, and an inclined side wall disposed below and at an angle to the main side wall, the main side wall comprising the second adapting surface, and the guide wheel provides guidance by contacting the inclined side wall.

[0021] In some embodiments, the cleaning base station is movably configured with a water port assembly comprising a pair of the first water port structures, the water port assembly being configured to move towards the inside of the cleaning base station and store a reverse driving force when the cleaning main machine approaches the cleaning base station, and to drive the first water port structures and the second water port structures to remain in abutment by the reverse driving force after the cleaning main machine is parked in place.

[0022] In some embodiments, the water port assembly comprises a main body and a resilient member; the main body extends in a direction perpendicular to the middle line of the base station, and the main body has an inside-facing side and an outside-facing side facing towards the inside and outside of the cleaning base station, respectively; wherein the resilient member is disposed on the inside-facing side.

[0023] The first water port structures pass through the main body, two first ports of a pair of the first water port structures are disposed on the outside-facing side for abutting a pair of the second water port structures, and two second ports of a pair of the first water port structures are disposed on the inside-facing side for connecting two water tanks of the cleaning base station, respectively.

[0024] In some embodiments, the water port assembly comprises a pair of the resilient members, and the pair of the resilient members are disposed on both sides of the middle line of the base station and outside a pair of the first water port structures.

[0025] In some embodiments, the cleaning base station is provided with a base station clean water tank and a base station dirty water tank, and the cleaning main machine is provided with a main machine clean water tank and a main machine dirty water tank, the base station clean water tank and the base station dirty water tank are in communication with a pair of the first water port structures, and the main machine clean water tank and the main machine dirty water tank are in communication with a pair of the second water port structures.

[0026] In some embodiments, the cleaning base station is provided with a trigger switch, the trigger switch is disposed on the middle line of the base station, and the trigger switch receives the triggering of the in-place switch of the cleaning main machine when the cleaning main machine is parked in place, and starts the cleaning base station to supply water to the cleaning main machine or to pump water from the cleaning main machine.

[0027] In some embodiments, the trigger switch is disposed on the water port assembly.

[0028] The cleaning system provided by the application has the beneficial effects that:

[0029] Compared with the prior art, the cleaning system provided by the application comprises a cleaning base station and a cleaning host, the first water port structure and the first guide structure of the cleaning base station are both spaced apart from the base station center line of the cleaning base station, the second water port structure and the second guide structure of the cleaning host are both spaced apart from the host center line of the cleaning host, when the cleaning host approaches the cleaning base station, the first guide structure provides the guide for the host center line to coincide with the base station center line through the second guide structure, and the first guide structure is not coincided with the base station center line, the design that the first guide structure is spaced apart from the base station center line can make the first guide structure provide obvious guide and adjustment to the cleaning host, the angle range that can be adjusted in the guide process is larger, and the guide flexibility when the cleaning host approaches the base station is improved. BRIEF DESCRIPTION OF DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only some embodiments of the application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0031] Figure 1 The schematic diagram of the cleaning host provided by the embodiment of the application moving to the cleaning base station after the infrared receiving sensor on the cleaning host is connected with the infrared emission signal of the cleaning base station;

[0032] Figure 2 The schematic diagram of the cleaning host provided by the embodiment of the application entering the parking platform and not yet parked in place;

[0033] Figure 3 The schematic diagram of the cleaning host provided by the embodiment of the application parked in place on the cleaning base station;

[0034] Figure 4 The schematic diagram of the cleaning base station provided by the embodiment of the application;

[0035] Figure 5 The schematic diagram of the cleaning base station provided by the embodiment of the application from another perspective;

[0036] Figure 6 The longitudinal section schematic diagram of the cleaning base station provided by the embodiment of the application;

[0037] Figure 7 The schematic diagram of the cleaning host provided by the embodiment of the application parked in place on the cleaning base station;

[0038] Figure 8A partial view of a cleaning main machine provided by an embodiment of the present application, showing a second adapter surface and an inclined side wall;

[0039] Figure 9 A longitudinal sectional view of a first water outlet structure of a cleaning main machine provided by an embodiment of the present application and a second water outlet structure of a cleaning base station;

[0040] Figure 10 A longitudinal sectional view of a first guide structure of a cleaning main machine provided by an embodiment of the present application and a second guide structure of a cleaning base station;

[0041] Figure 11 A longitudinal sectional view of a trigger switch of a cleaning main machine provided by an embodiment of the present application and a position switch of a cleaning base station;

[0042] Figure 12 A transverse sectional view of a first guide structure of a cleaning main machine provided by an embodiment of the present application and a second guide structure of a cleaning base station;

[0043] Figure 13 A longitudinal sectional view of a first water outlet structure of a cleaning main machine provided by an embodiment of the present application and a second water outlet structure of a cleaning base station, and a trigger switch of the cleaning main machine and a position switch of the cleaning base station;

[0044] Figure 14 A schematic view of a water outlet assembly provided by an embodiment of the present application;

[0045] Figure 15 A schematic view of a first guide structure and a second guide structure of a cleaning base station provided by an embodiment of the present application, which have not yet contacted;

[0046] Figure 16 A schematic view of a base station center line of a cleaning base station and a main machine center line of a cleaning main machine provided by an embodiment of the present application, which have an angle;

[0047] Figure 17 A transverse sectional view of a first guide structure of a cleaning main machine provided by an embodiment of the present application and a second guide structure of a cleaning base station;

[0048] Figure 18 A longitudinal sectional view of a first water outlet structure of a cleaning main machine provided by an embodiment of the present application and a second water outlet structure of a cleaning base station, and a trigger switch of the cleaning main machine and a position switch of the cleaning base station.

[0049] In the drawings, various reference numerals refer to:

[0050] 100, a cleaning system; 10, a base station; 20, a main machine;

[0051] 11, a first adapter surface; 12, a water outlet assembly; 13, a base station center line; 14, a docking station;

[0052] 111, first guide structure; 112, trigger switch; 1111, guide portion; 1112, positioning portion; 1111a, guide inclined surface; 1111b, arc surface; 1111c, top portion; 1111d, inclined surface;

[0053] 121, main body; 122, first gate structure; 123, elastic member; 124, support column; 125, rubber member; 121a, inward side; 121b, outward side; 1221, first gate; 1222, second gate;

[0054] 141, table body; 142, guide wheel;

[0055] 21, main side wall; 22, inclined side wall; 23, main machine center line;

[0056] 211, second adapting surface; 2111, second guide structure; 2112, second gate structure; 2113, in-place switch; 211a, open end. DETAILED DESCRIPTION

[0057] In order to make the technical problems to be solved, technical solutions and beneficial effects of the present application clearer, the present application will be further described in detail below in combination with the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not intended to limit the present application.

[0058] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0059] It should be understood that the terms "length", "width", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate the orientation or positional relationship shown in the drawings based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0060] In addition, the terms "first", "second", "third", etc. are only used for description purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second", etc. can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0061] Reference will now be made to Figures 1 to 18 The cleaning system 100 provided by the embodiments of the present application will be described.

[0062] Referring to Figures 1 to 3 , and Figures 15 to 18 , the cleaning system 100 provided by the embodiments of the present application includes a cleaning base station 10 and a cleaning host 20. The cleaning base station 10 has a base station center line 13, and a first water port structure 122 and a first guide structure 111 spaced apart from the base station center line 13 respectively. The cleaning host 20 has a host center line 23, and a second water port structure 2112 and a second guide structure 2111 spaced apart from the host center line 23 respectively. When the cleaning host 20 docks towards the cleaning base station 10, the first guide structure 111 provides guidance for the host center line 23 to coincide with the base station center line 13 through the second guide structure 2111. When the cleaning host 20 is docked in place on the cleaning base station 10, the first guide structure 111 and the second guide structure 2111 are completely fitted, and the first water port structure 122 is docked with the second water port structure 2112.

[0063] Compared with the prior art, the cleaning system 100 provided by the present application includes a cleaning base station 10 and a cleaning host 20, the first water port structure 122 and the first guide structure 111 provided by the cleaning base station 10 are both spaced apart from the base station center line 13 of the cleaning base station 10, the second water port structure 2112 and the second guide structure 2111 provided by the cleaning host 20 are both spaced apart from the host center line 23 of the cleaning host 20, when the cleaning host 20 docks towards the cleaning base station 10, the first guide structure 111 provides guidance for the host center line 23 to coincide with the base station center line 13 through the second guide structure 2111, the first guide structure 111 does not coincide with the base station center line 13, the design of being spaced apart from the base station center line 13 can make the first guide structure 111 provide obvious guidance and adjustment to the cleaning host 20, the angle range available for adjustment during the guidance is larger, which is beneficial to improve the guidance flexibility when the cleaning host 20 docks to the base station.

[0064] Among them, the first water port structure 122 and the second water port structure 2112 can be one or more, or can be arranged in pairs, the first guide structure 111 and the second guide structure 2111 can be one or more, or can be arranged in pairs.

[0065] Among them, the water port structure refers to a structure with two water ports communicating with each other, the water port is used to connect a water using component, a water collecting component or a water supplying component, for example, the water collecting component can be a sewage tank for collecting sewage, the water supplying component can be a clean water tank for supplying clean water, and the water using component can be a cleaning component on the cleaning host 20.

[0066] In some embodiments, the cleaning base station 10 has a pair of first water outlet structures 122 and a pair of first guide structures 111 symmetrically arranged on both sides of the base station center line 13, and the cleaning host 20 has a pair of second water outlet structures 2112 and a pair of second guide structures 2111 symmetrically arranged on both sides of the host center line 23.

[0067] The cleaning host 20 is a structure substantially symmetrical about the host center line 23, and the pair of second guide structures 2111 are symmetrical about the host center line 23. During the docking process of the cleaning host 20 towards the cleaning base station 10, the pair of first guide structures 111 symmetrically located on both sides of the base station center line 13 substantially synchronously contact the pair of second guide structures 2111. Since the cleaning host 20 is in motion during the docking process, the motion can be into the docking platform 14 in the forward direction or into the docking platform 14 in the backward direction. During the motion of the cleaning host 20, the two first guide structures 111 respectively adjust the motion direction of the cleaning host 20 through the two second guide structures 2111, and in the case that the host center line 23 and the cleaning center line have an angle, the cleaning host 20 is adjusted to make the host center line 23 infinitely approach to coincide with the base station center line 13.

[0068] The pair of first guide structures 111 and the pair of second guide structures 2111 guide the cleaning host 20, and the two different sides belonging to the pair of first guide structures 111 can play a guiding role. The two different sides can be arranged at a certain interval on both sides of the base station center line 13, which can play a significant guiding role on the cleaning host 20 and increase the adjustable angle range of the cleaning host 20.

[0069] In some embodiments, the first water outlet structure 122 and the first guide structure 111 are protrusively arranged by the first adaptive surface 11, and the second water outlet structure 2112 and the second guide structure 2111 are recessively arranged by the second adaptive surface 211 towards the inner side of the cleaning host 20.

[0070] The first guide structure 111 is protrusively arranged by the first adaptive surface 11, that is, when the cleaning host 20 has not been docked in place, the second guide structure 2111 of the cleaning host 20 can contact the first guide structure 111 and continuously move and dock in place under the guidance of the first guide structure 111. The second guide structure 2111 is recessively arranged, which allows the first guide structure 111 to be continuously accommodated with the motion of the cleaning host 20 during the docking process of the cleaning host 20. When the first guide structure 111 is completely adapted to the second guide structure 2111, the cleaning host 20 is docked in place relative to the cleaning base station 10.

[0071] The first water port structure 122 is protruded from the first adapting surface 11, and the second water port structure 212 is recessed on the second adapting surface 211. During the adapting process of the first guiding structure 111 and the second guiding structure 211, the first water port structure 122 and the second water port structure 212 are constantly approaching and docking in communication with the movement of the cleaning host 20. The protruded setting of the first water port structure 122 can ensure that it is well docked with the second water port structure 212 according to the docking requirements and sealing requirements before the cleaning host 20 is parked in place.

[0072] In some embodiments, a pair of first guiding structures 111 is arranged outside a pair of first water port structures 122, and a pair of second guiding structures 211 is arranged outside a pair of second water port structures 212. The height of the first guiding structure 111 relative to the first adapting surface 11 is higher than the height of the first water port structure 122 relative to the first adapting surface 11.

[0073] A pair of first guiding structures 111 is arranged outside a pair of first water port structures 122, which facilitates the integrated design of the pair of first water port structures 122, such as configuring the pair of first water port structures 122 on a detachable integrated piece. The space between the pair of first guiding structures 111 can be used to configure the integrated piece.

[0074] A pair of first guiding structures 111 is arranged outside a pair of first water port structures 122, which plays a guiding role in the parking process of the cleaning host 20. The pair of first water port structures 122 inside the pair of first guiding structures 111 is accurately docked with the pair of second water port structures 212 during the constant guiding process of the cleaning host 20, so that the water port structure and the guiding structure are more conducive to the parking and docking of the cleaning host 20 in the overall layout.

[0075] The height of the first guiding structure 111 relative to the first adapting surface 11 is higher than the height of the first water port structure 122 relative to the first adapting surface 11. During the adapting process of the first guiding structure 111 and the second guiding structure 211, the first water port structure 122 and the second water port structure 212 are constantly approaching and docking in communication with the movement of the cleaning host 20. Specifically, when the first guiding structure 111 starts to guide the cleaning host 20, the first water port structure 122 and the second water port structure 212 are approaching but not yet docked. With the guidance of the first guiding structure 111 to the cleaning host 20, the host center line 23 gradually coincides with the base station center line 13, and the first water port structure 122 and the second water port structure 212 start to align and dock with the movement of the cleaning host 20. After the first guiding structure 111 and the second guiding structure 211 are fully adapted, the cleaning host 20 is parked in place, and the first water port structure 122 and the second water port structure 212 are well docked, making the parking process of the cleaning host 20 more orderly and accurate.

[0076] In some embodiments, two opposing sides of a pair of first guide structures 111 located on either side of the base station centerline 13 respectively include guide slopes 1111a, and the guide slopes 1111a are connected to the top 1111c of the first guide structures 111. In the direction in which the cleaning host 20 is parked toward the cleaning base station 10, the guide slopes 1111a gradually move away from the base station centerline 13.

[0077] like Figure 15 As shown, after the cleaning host 20 completes its alignment with the infrared transmission signal of the cleaning base station 10 via an infrared receiving sensor located on its front or rear side, the cleaning host 20 slowly enters the ramp of the docking platform 14 of the cleaning base station 10 along the centerline 13 of the base station in a forward or backward manner. As the cleaning host 20 continues to move, compared with other parts of the cleaning base station 10, a pair of first guide structures 111 first contact the cleaning host 20, and the two opposing guide ramps 1111a on them can guide the cleaning host 20 from the left and right sides, respectively.

[0078] For example, such as Figure 16 As shown, the cleaning host 20 is offset to the right. In the area close to the cleaning base station 10, the host centerline 23 is located to the right of the base station centerline 13, and there is a certain angle difference between the two. As the cleaning host 20 moves, the guide slope 1111a on the first guide structure 111 on the left side contacts the inner wall surface of the second guide structure 2111 on the left side, and continuously guides the cleaning host 20 as it moves, causing it to offset to the left side, thereby causing the host centerline 23 to offset to the left side and coincide with the base station centerline 13.

[0079] Alternatively, the cleaning host 20 may shift to the left. In the area near the cleaning base station 10, the host centerline 23 is located to the left of the base station centerline 13, with a certain angle difference between them. As the cleaning host 20 moves, the guide slope 1111a on the first guide structure 111 on the right side contacts the inner wall of the second guide structure 2111 on the right side, and continuously guides the cleaning host 20 as it moves, causing it to shift to the right side. This causes the host centerline 23 to shift to the right side and coincide with the base station centerline 13.

[0080] like Figure 17 and Figure 18 As shown, after the host centerline 23 and the base station centerline 13 coincide, a pair of first guide structures 111 and a pair of second guide structures 2111 are fully adapted, and a pair of first water inlet structures 122 and a pair of second water inlet structures 2112 are well connected and interconnected.

[0081] In some embodiments, the two opposite sides of the first guide structure 111 each include an arc-shaped surface 1111b, and the arc-shaped surface 1111b and the guide inclined surface 1111a are smoothly connected and the smoothly connected position forms a top 1111c of the first guide structure 111.

[0082] In some embodiments, the arc-shaped surface 1111b is designed on the part of the two opposite sides of the first guide structure 111 close to the top 1111c, and the arc-shaped surface 1111b and the guide inclined surface 1111a are smoothly connected, so that the surface of the part of the first guide structure 111 away from the first fitting surface 11 is relatively smooth as a whole, which helps the guiding, and facilitates the smooth fitting of the first guide structure 111 to the second guide structure 2111 during the continuous movement of the cleaning host 20, and prevents the design of the non-smooth surface from hindering the guiding and fitting process of the first guide structure 111 and causing the phenomenon of jamming.

[0083] In some embodiments, the first guide structure 111 includes a positioning portion 1112 and a guide portion 1111 arranged in sequence along the protruding direction of the first guide structure 111, and the guide portion 1111 includes the guide inclined surface 1111a and the arc-shaped surface 1111b, and the contour of the positioning portion 1112 extending along the protruding direction remains unchanged.

[0084] The contour of the positioning portion 1112 extending along the protruding direction remains unchanged, for example, the positioning portion 1112 as a whole can be a square body, the cross-sectional shape of the positioning portion 1112 in the direction perpendicular to the protruding direction is square, and the cross-sectional shape and size of the positioning portion 1112 in the protruding direction remain unchanged. Alternatively, the positioning portion 1112 as a whole can be a column body, the cross-sectional shape of the positioning portion 1112 in the direction perpendicular to the protruding direction is circular or elliptical, and the cross-sectional shape and size of the positioning portion 1112 in the protruding direction remain unchanged.

[0085] After the first guide structure 111 completes the guiding of the cleaning host 20, the host center line 23 and the base station center line 13 coincide, at this time, the cleaning host 20 has not yet completely docked in place, and there is a certain gap between the first fitting surface 11 and the second fitting surface 211, which is the protruding height of the positioning portion 1112, at this time, the cleaning host 20 is positioned by the positioning portion 1112, and since the contour of the positioning portion 1112 extending along the protruding direction remains unchanged, the host center line 23 and the base station center line 13 can be kept in the coinciding state, the cleaning host 20 continues to move in the positioning state of the positioning portion 1112, the positioning portion 1112 moves into the second guide structure 2111 with the movement of the cleaning host 20, and after the cleaning host 20 is docked in place, the positioning portion 1112 and the guide portion 1111 are completely fitted to the second guide structure 2111.

[0086] In some embodiments, in order to further improve the smoothness of the first guide structure 111 entering the second guide structure 2111, two inclined surfaces 1111d are arranged on both sides of the guide portion 1111 along the height direction, and gradually decrease in spacing from the direction of the positioning portion 1112 to the top portion 1111c, and the two inclined surfaces 1111d are smoothly connected with the top portion 1111c, so that the surface of the top portion 1111c is smooth as a whole, which is beneficial to the guidance of the first guide structure 111 and improves the smoothness of the first guide structure 111 entering the second guide structure 2111.

[0087] Referring to Figures 4 to 7 In some embodiments, the first fitting surface 11 extends in a direction perpendicular to the base station center line 13 and has two open ends 211a arranged on both sides of the base station center line 13. The cleaning base station 10 includes a docking station 14, which includes a table body 141 and two guide wheels 142 rotatably arranged on the table body 141. The table body 141 is arranged on the side of the first fitting surface 11 and is lower than the first fitting surface 11, and the two guide wheels 142 are arranged on both sides of the base station center line 13 and are arranged outside the two open ends 211a.

[0088] The rotation axes of the guide wheels 142 are perpendicular to the extension directions of the base station center line 13 and the first fitting surface 11, respectively, to provide guidance when the cleaning main machine 20 docks on the table body 141 towards the cleaning base station 10.

[0089] Generally, the area of the cleaning base station 10 for docking the cleaning main machine 20 is enclosed along both sides of the width of the base station, and only an entrance and exit are provided to allow the cleaning main machine 20 to enter and exit the area. For example, the cleaning base station 10 forms a U-shaped area, and the U-shaped side wall of the U-shaped area is formed by the first fitting surface 11. The docking station 14 is arranged below the first fitting surface 11. After the cleaning main machine 20 docks on the docking station 14, most of the cleaning main machine 20 along the width direction is shielded by the U-shaped side wall along the two sides of the width direction, that is, the cleaning main machine 20 along the two sides of the width direction is located inside the two sides of the U-shaped side wall along the width direction, and the maximum width of the cleaning main machine 20 is limited by the width of the base station.

[0090] Because the cleaning main machine 20 needs to be accommodated along the width direction, the width dimension of the cleaning base station 10 is large, the volume of the base station is large, and the occupied area of the base station is large, which is not conducive to the miniaturization and integration of the base station, and is also not conducive to the design of various sizes of the cleaning main machine 20.

[0091] Referring to Figure 12 and Figure 13As shown, in the embodiment of the present application, the two guide wheels 142 are arranged on the two sides of the middle line 13 of the base station and on the outer sides of the two open ends 211a, that is, the guide wheels 142 are spaced apart from the two sides of the first adapting surface 11 along the width direction, the design of the side walls on the two sides of the first adapting surface 11 along the width direction is cancelled, and the area where the first adapting surface 11 is located is in a three-side open state, including the open arrangement of the two sides along the width direction and the open arrangement of one side of the host machine access and parking platform 14.

[0092] The two guide wheels 142 limit the host machine 20 along the width direction to prevent the host machine from deviating from the parking platform 14 along the width direction, and the guide wheels 142 can rotate relative to the host machine 20 to allow the guide wheels 142 to guide the host machine when the host machine accesses the parking platform 14.

[0093] The embodiment cancels the side walls on the two sides of the first adapting surface 11 along the width direction, and the guide wheels 142 are arranged at the corresponding positions. Compared with the side walls occupying the entire height of the host machine along the height direction, the guide wheels 142 only occupy part of the height of the host machine along the height direction, and the size of the part of the host machine at other heights along the width direction can not be limited. Therefore, the maximum width profile of the host machine is not limited by the guide wheels 142, and can be designed to be equal to or greater than the width of the base station.

[0094] For example, compared with the maximum height of the host machine, the height of the guide wheel 142 can be low enough, as long as the guide wheel 142 can guide the host machine. The guide wheel 142 can be in contact with the lower position on the two sides of the host machine along the width direction, and the part of the host machine above the guide wheel 142 along the width direction can be increased in size according to the requirement.

[0095] Based on the above, the width size of the base station can be reduced, and the width of the host machine is allowed to be equal to or greater than the width of the base station, which is beneficial to the miniaturization and integration of the base station and reduces the occupied space of the base station.

[0096] For example, as shown in FIG. 6, the guide wheels 142 are arranged on the two sides of the middle line 13 of the base station and on the outer sides of the two open ends 211a, that is, the guide wheels 142 are spaced apart from the two sides of the first adapting surface 11 along the width direction, and the design of the side walls on the two sides of the first adapting surface 11 along the width direction is cancelled. Figure 15As shown, after the cleaning host 20 is aligned with the cleaning base station 10 by the infrared receiving sensor provided on the front end or rear end of the cleaning host 20, the cleaning host 20 slowly enters the slope of the docking platform 14 of the cleaning base station 10 along the center line 13 of the base station in a forward or backward manner. The host first contacts the two guide wheels 142 on the docking platform 14 during the entering process, and the two guide wheels 142 initially guide and correct the host to minimize the angle between the center line 23 of the host and the center line 13 of the base station. The host continues to enter the docking platform 14, and a pair of first guide structures 111 first contact the cleaning host 20 compared to other parts of the first adaptation surface 11. The two guide inclined surfaces 1111a on the first guide structures 111 can guide the host from the left side and the right side of the cleaning host 20, respectively, so that the center line 23 of the host and the center line 13 of the base station tend to coincide.

[0097] Referring to Figure 8 As shown, in some embodiments, the cleaning host 20 includes a main side wall 21 constituting the maximum profile of the cleaning host 20, and an inclined side wall 22 disposed below the main side wall 21 and at an angle to the main side wall 21. The main side wall 21 includes a second adaptation surface 211, and the guide wheels 142 are configured to provide guidance by contacting the inclined side wall 22.

[0098] The guide wheels 142 contact the inclined side wall 22, and other parts above the inclined side wall 22 constitute the maximum profile of the host. The main side wall 21 above the inclined side wall 22 on both sides in the width direction can be increased in size as needed, thereby allowing the maximum width dimension of the host to be greater than or equal to the width dimension of the base station.

[0099] Referring to Figure 14 As shown, in some embodiments, the cleaning base station 10 is movably configured with a water outlet assembly 12, and the water outlet assembly 12 includes a pair of first water outlet structures 122. The water outlet assembly 12 is configured to drive the water outlet assembly 12 to move towards the inner side of the cleaning base station 10 and store a reverse driving force when the cleaning host 20 approaches the cleaning base station 10, and to drive the first water outlet structures 122 and the second water outlet structures 2112 to remain in abutment by the reverse driving force after the cleaning host 20 is docked in place.

[0100] In one aspect, a pair of first water outlet structures 122 are configured in the water outlet assembly 12, and the water outlet assembly 12 is configured as a whole to drive the water outlet assembly 12 to move towards the inner side of the cleaning base station 10 and store a reverse driving force when the cleaning host 20 approaches the cleaning base station 10. The water outlet assembly 12 is integrally driven by the autonomous movement of the cleaning host 20, which can conveniently control the two first water outlet structures 122 to be driven synchronously and store the same reverse driving force, and then synchronously abut with the two second water outlet structures 2112, so that the dynamic rhythm, direction and strength of the two first water outlet structures 122 remain consistent.

[0101] On the other hand, by the autonomous movement of the cleaning host 20, the water port assembly 12 is first driven in the same direction and the first water port structure 122 and the second water port structure 2112 are well docked, and then the stored reverse driving force is used to reverse drive the first water port structure 122 and the second water port structure 2112 to keep docking, which is beneficial to improve the docking stability of the first water port structure 122 and the second water port structure 2112 during use. Moreover, by first driving in the same direction and then keeping in reverse, the impact damage of the water port structure caused by the movement inertia of the host entering the docking station 14 can be weakened, the movement inertia can be prevented from damaging the first water port structure 122 and the second water port structure 2112, and the cost and probability of repairing and replacing the water port structure are reduced.

[0102] In some embodiments, the water port assembly 12 includes a main body 121 and an elastic member 123. The main body 121 extends in a direction perpendicular to the center line 13 of the base station, and the main body 121 has an inboard side 121a and an outboard side 121b facing the inside and outside of the cleaning base station 10, respectively. The elastic member 123 is arranged on the side where the inboard side 121a is located. The first water port structure 122 penetrates the main body 121, and two first ports 1221 of the first water port structure 122 are arranged on the side where the outboard side 121b is located, for docking with a pair of second water port structures 2112; two second ports 1222 of the first water port structure 122 are arranged on the side where the inboard side 121a is located, for connecting two water tanks of the cleaning base station 10, respectively.

[0103] The main body 121 serves to support the first water port structure 122 and the elastic member 123, and when the cleaning host 20 approaches the cleaning base station 10, the main body 121 is driven to move towards the inboard side of the cleaning base station 10, and the elastic member 123 stores a reverse driving force under the driving of the main body 121. When the cleaning host 20 is parked in place, the first water port structure 122 and the second water port structure 2112 are well docked and connected under the action of the elastic member 123.

[0104] In some embodiments, the main body 121 can be a rigid member or a plastic member, and the side of the main body 121 away from the host is provided with a support column 124, which is perpendicular to the main body 121. The elastic member 123 is a spring, which is sleeved on the support column 124. The support column 124 serves to support and guide the elastic member 123, which is beneficial to compress the elastic member 123 along the length direction of the support column 124 to store the reverse driving force, or release the elastic member 123 along the length direction of the support column 124 to restore the original length.

[0105] In some embodiments, the first water outlet structure 122 is integrally formed with the main body 121, or the first water outlet structure 122 is detachably assembled on the main body 121. The first water outlet structure 122 is sleeved with a rubber member 125, which has a plurality of rubber rings surrounding the outer periphery of the first water outlet 1221. The plurality of rubber rings do not hinder the docking of the first water outlet structure 122 and the second water outlet structure 2112, and can ensure the sealing of the docking of the two.

[0106] In some embodiments, the water outlet assembly 12 includes a pair of elastic members 123, which are arranged on both sides of the base station center line 13 and outside the pair of first water outlet structures 122.

[0107] The pair of elastic members 123 improves the balance of the water outlet assembly 12 during movement, and ensures the consistent movement of the pair of first water outlet structures 122.

[0108] In some embodiments, the cleaning base station 10 is provided with a base station clean water tank and a base station sewage tank, and the cleaning main machine 20 is provided with a main machine clean water tank and a main machine sewage tank. The base station clean water tank and the base station sewage tank are respectively communicated with the pair of first water outlet structures 122, and the main machine clean water tank and the main machine sewage tank are respectively communicated with the pair of second water outlet structures 2112.

[0109] The path of the cleaning system 100 in which the base station fills the main machine with clean water includes the base station clean water tank, one first water outlet structure 122, one second water outlet structure 2112, and the main machine clean water tank, so that the clean water in the base station clean water tank is filled into the main machine clean water tank.

[0110] The path of the cleaning system 100 in which the base station pumps the sewage generated by cleaning the ground or self-cleaning of the main machine includes the main machine sewage tank, another second water outlet structure 2112, another first water outlet structure 122, and the base station sewage tank, so that the sewage in the main machine sewage tank is pumped into the base station sewage tank.

[0111] In some embodiments, the cleaning base station 10 is provided with a trigger switch 112, which is arranged on the base station center line 13, and is used to receive the trigger of the arrival switch 2113 of the cleaning main machine 20 when the cleaning main machine 20 is parked in place, and to start the water supply or pumping of the cleaning base station 10 to the cleaning main machine 20.

[0112] The trigger switch 112 of the base station is used to dock with the arrival switch 2113 of the main machine to generate a trigger signal. When the trigger switch 112 triggers the arrival switch 2113 to generate a trigger signal, the control part of the base station acquires the trigger signal and determines that the pair of first water outlet structures 122 and the pair of second water outlet structures 2112 have been well docked based on the trigger signal, and starts the sewage pumping and clean water filling processes of the system based on the trigger signal.

[0113] In some embodiments, the trigger switch 112 is arranged on the water gap assembly 12, and the trigger switch 112 can be accurately triggered to the on-position switch 2113, while facilitating the protection of the trigger switch 112 by the buffering effect of the elastic member 123, preventing the motion inertia of the main machine from damaging the trigger switch 112.

[0114] The above description is merely the preferred embodiments of the present application, and is not intended to limit the present application. Any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A cleaning system (100), characterized in that: the cleaning system (100) comprises a cleaning base station (10) and a cleaning host (20); the cleaning base station (10) has a base station center line (13), and a first water port structure (122) and a first guide structure (111) respectively spaced apart from the base station center line (13); the cleaning base station (10) comprises a docking table (14), the docking table (14) comprises a table body (141) and two guide wheels (142) rotatably arranged on the table body (141), the two guide wheels (142) are arranged on both sides of the base station center line (13); the cleaning base station (10) has a first adaptation surface (11), the rotation axis of the guide wheel (142) is perpendicular to the extension direction of the base station center line (13) and the first adaptation surface (11) respectively, to provide guidance when the cleaning host (20) docks on the table body (141) towards the cleaning base station (10); the cleaning host (20) has a host center line (23), and a second water port structure (2112) and a second guide structure (2111) respectively spaced apart from the host center line (23); the first guide structure (111) provides guidance for the host center line (23) to coincide with the base station center line (13) through the second guide structure (2111) when the cleaning host (20) docks towards the cleaning base station (10); the first guide structure (111) and the second guide structure (2111) are completely adapted and the first water port structure (122) and the second water port structure (2112) are docked when the cleaning host (20) docks in place on the cleaning base station (10).

2. The cleaning system (100) of claim 1, characterized in that: the cleaning base station (10) has a pair of first water port structures (122) and a pair of first guide structures (111) respectively symmetrically arranged on both sides of the base station center line (13), and the cleaning host (20) has a pair of second water port structures (2112) and a pair of second guide structures (2111) respectively symmetrically arranged on both sides of the host center line (23).

3. The cleaning system (100) of claim 2, characterized in that: the cleaning host (20) has a second adaptation surface (211), the first adaptation surface (11) and the second adaptation surface (211) are opposite when the cleaning host (20) docks in place on the cleaning base station (10); the first water port structure (122) and the first guide structure (111) are arranged protruding from the first adaptation surface (11), and the second water port structure (2112) and the second guide structure (2111) are arranged recessed towards the inside of the cleaning host (20) from the second adaptation surface (211).

4. The cleaning system (100) of claim 3, characterized in that: A pair of the first guide structures (111) are arranged outside a pair of the first water gap structures (122), and a pair of the second guide structures (2111) are arranged outside a pair of the second water gap structures (2112); The height of the first guide structure (111) relative to the first fitting surface (11) is higher than the height of the first water gap structure (122) relative to the first fitting surface (11).

5. The cleaning system (100) of claim 4, wherein: The two opposite sides of a pair of the first guide structures (111) on both sides of the base station center line (13) respectively include a guide inclined surface (1111a), and the guide inclined surface (1111a) is connected with the top (1111c) of the first guide structure (111); along the direction of the cleaning main machine (20) approaching the cleaning base station (10), the guide inclined surface (1111a) gradually moves away from the base station center line (13).

6. The cleaning system (100) of claim 5, wherein: The two opposite sides of a pair of the first guide structures (111) respectively include an arc surface (1111b), and the arc surface (1111b) and the guide inclined surface (1111a) are smoothly connected, and the smoothly connected position constitutes the top (1111c) of the first guide structure (111).

7. The cleaning system (100) of claim 6, wherein: The first guide structure (111) includes a positioning portion (1112) and a guide portion (1111) arranged in sequence along the protruding direction thereof, the guide portion (1111) includes the guide inclined surface (1111a) and the arc surface (1111b), and the contour of the positioning portion (1112) extending along the protruding direction remains unchanged.

8. The cleaning system (100) of claim 3, wherein: The first fitting surface (11) extends along a direction perpendicular to the base station center line (13) and has two open ends (211a) arranged on both sides of the base station center line (13); the table body (141) is arranged on the side of the first fitting surface (11) and is lower than the first fitting surface (11), and the two guide wheels (142) are arranged on both sides of the base station center line (13) and outside the two open ends (211a).

9. The cleaning system (100) of claim 8, wherein: The cleaning main machine (20) includes a main side wall (21) constituting the maximum contour thereof, and an inclined side wall (22) arranged below the main side wall (21) and at an angle with the main side wall (21), the main side wall (21) includes the second fitting surface (211), and the guide wheels (142) are arranged to provide guidance by contacting the inclined side wall (22).

10. The cleaning system (100) of any one of claims 2-9, wherein: The cleaning base station (10) is movably configured with a water port assembly (12), the water port assembly (12) comprising a pair of the first water port structures (122), the water port assembly (12) being configured to move the water port assembly (12) towards the inside of the cleaning base station (10) and store a reverse driving force when the cleaning host (20) is docked towards the cleaning base station (10), and drive the first water port structures (122) and the second water port structures (2112) to remain in butt joint by the reverse driving force after the cleaning host (20) is docked in place.

11. The cleaning system (100) according to claim 10, characterized in that: The water port assembly (12) comprises a main body (121) and a resilient member (123), the main body (121) extending along a direction perpendicular to the base station center line (13), the main body (121) having an inside-facing side (121a) and an outside-facing side (121b) facing towards the inside and the outside of the cleaning base station (10) respectively, wherein the resilient member (123) is arranged on the side of the inside-facing side (121a). The first water port structures (122) pass through the main body (121), two first ports 1221 of a pair of the first water port structures (122) being arranged on the side of the outside-facing side (121b) for butt joint with a pair of the second water port structures (2112), and two second ports 1222 of a pair of the first water port structures (122) being arranged on the side of the inside-facing side (121a) for connection with two water tanks of the cleaning base station (10) respectively.

12. The cleaning system (100) according to claim 11, characterized in that: The water port assembly (12) comprises a pair of the resilient members (123), a pair of the resilient members (123) being arranged on both sides of the base station center line (13) and on the outside of a pair of the first water port structures (122).

13. The cleaning system (100) according to claim 10, characterized in that: The cleaning base station (10) is provided with a base station clean water tank and a base station dirty water tank, the cleaning host (20) is provided with a host clean water tank and a host dirty water tank, the base station clean water tank and the base station dirty water tank are in communication with a pair of the first water port structures (122) respectively, and the host clean water tank and the host dirty water tank are in communication with a pair of the second water port structures (2112) respectively.

14. The cleaning system (100) according to claim 10, characterized in that: The cleaning base station (10) is provided with a trigger switch (112), the trigger switch (112) being arranged on the base station center line (13) for receiving a trigger of a presence switch (2113) of the cleaning host (20) when the cleaning host (20) is docked in place, and starting water supply to the cleaning host (20) or water extraction from the cleaning host (20) by the cleaning base station (10).

15. The cleaning system (100) according to claim 14, characterized in that: The trigger switch (112) is arranged on the water port assembly (12).

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