A method and apparatus for detecting a quartz crucible

Abstract

The present disclosure provides a method and device for detecting a quartz crucible; the device comprises: a first detection chamber with an opening; a base arranged in the first detection chamber for carrying the quartz crucible; in the first detection chamber, light sources are arranged on the inner walls opposite to the base; a second detection chamber with an opening, the second detection chamber can enter or leave the first detection chamber from the opening of the first detection chamber, and after the second detection chamber enters the first detection chamber, the base and the quartz crucible are in the second detection chamber; a distance sensor arranged in the second detection chamber for detecting the outer shape parameters of the quartz crucible after the second detection chamber enters the first detection chamber; a photographing device arranged in the first detection chamber for shooting the inner surface image of the quartz crucible after the second detection chamber leaves the first detection chamber; a confirmation unit for confirming the detection state of the quartz crucible according to the outer shape parameters of the quartz crucible and the inner surface image of the quartz crucible.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of semiconductor manufacturing, and in particular, to a method and device for detecting a quartz crucible. BACKGROUND

[0002] In the process of drawing a single crystal silicon rod (which can also be referred to as a crystal rod) by the Czochralski (CZ) method, a polycrystalline silicon raw material is melted in a quartz crucible to generate a silicon melt, a seed crystal is immersed in the silicon melt, and the seed crystal is slowly pulled up while the quartz crucible and the seed crystal are rotated, thereby growing a large single crystal at the lower end of the seed crystal. According to the CZ method, the yield of large-diameter silicon single crystals can be improved.

[0003] As a container for holding the silicon melt in the process of drawing a single crystal silicon rod by the CZ method, the quartz crucible is required to be non-deformed, and the inner surface of the quartz crucible is required to be free of defects. If the quartz crucible is deformed, the shape and quality of the drawn crystal rod will change, and in the most serious case, the crucible wall will come into contact with the structure in the furnace, causing an accident. If the inner surface of the quartz crucible in contact with the silicon melt has defects such as spots, bubbles, or scratches, the quality of the crystal rod will also be reduced, and even the silicon melt may leak. Therefore, it is usually necessary to detect the outer shape parameters and defects of the quartz crucible.

[0004] In current related solutions, the quartz crucible is usually detected by manual inspection. However, the manual inspection method has low work efficiency, and the detection result is easily affected by subjective factors such as the technical level, experience, and fatigue degree of the detection personnel, and the quartz crucible cannot be accurately and objectively detected. SUMMARY

[0005] The present disclosure provides a method and device for detecting a quartz crucible, which can accurately and objectively detect the outer shape parameters and defects of the quartz crucible.

[0006] The technical solution of the present disclosure is implemented as follows:

[0007] In a first aspect, the present disclosure provides a device for detecting a quartz crucible, the device comprising:

[0008] a first detection chamber having an opening;

[0009] a base arranged in the first detection chamber and configured to support the quartz crucible;

[0010] a light source arranged on the inner wall of each of the two sides of the base in the first detection chamber;

[0011] a second detection chamber with an opening, which can enter or exit the first detection chamber from the opening of the first detection chamber, and the base and the quartz crucible are in the second detection chamber after the second detection chamber enters the first detection chamber;

[0012] a distance sensor arranged in the second detection chamber, which is used to detect the outer shape parameters of the quartz crucible after the second detection chamber enters the first detection chamber;

[0013] a photographing device arranged in the first detection chamber, which is used to take an inner surface image of the quartz crucible after the second detection chamber exits the first detection chamber;

[0014] a confirmation unit configured to confirm the detection state of the quartz crucible according to the outer shape parameters of the quartz crucible and the inner surface image of the quartz crucible.

[0015] In a second aspect, the disclosure provides a method for detecting a quartz crucible, which is applied to the device for detecting a quartz crucible in the first aspect, and the method comprises:

[0016] detecting the outer shape parameters of the quartz crucible after the second detection chamber enters the first detection chamber;

[0017] taking an inner surface image of the quartz crucible after the second detection chamber exits the first detection chamber;

[0018] confirming the detection state of the quartz crucible according to the outer shape parameters of the quartz crucible and the inner surface image of the quartz crucible.

[0019] The disclosure provides a method and a device for detecting a quartz crucible; in the optical dark field detection environment provided by the second detection chamber entering the first detection chamber, the outer shape parameters of the quartz crucible are detected by a distance sensor; in the bright field detection environment provided by the second detection chamber exiting the first detection chamber, the defects existing in the inner surface of the quartz crucible are detected by taking an inner surface image of the quartz crucible; and according to the detected outer shape parameters and defects, it is determined whether the detection state of the quartz crucible can continue to be used, so that the quartz crucible can be accurately and objectively detected without manual inspection. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 An exemplary cross-sectional view of a quartz crucible is provided for the disclosure.

[0021] Figure 2 A schematic diagram of a device for detecting a quartz crucible is provided for the disclosure.

[0022] Figure 3 A front view schematic diagram of a first detection chamber is provided for the disclosure.

[0023] Figure 4 This is a schematic diagram of another device for detecting quartz crucibles provided in this disclosure.

[0024] Figure 5 This is a schematic diagram illustrating an example of detecting the external parameters of a quartz crucible provided in this disclosure.

[0025] Figure 6 This is a schematic diagram illustrating another example of detecting the external parameters of a quartz crucible provided in this disclosure.

[0026] Figure 7 This is a top view schematic diagram of a method for controlling the movement of an infrared displacement sensor provided in this disclosure.

[0027] Figure 8 This is a schematic diagram illustrating another example of detecting the external parameters of a quartz crucible provided in this disclosure.

[0028] Figure 9 This is a schematic diagram illustrating another example of detecting the external parameters of a quartz crucible provided in this disclosure.

[0029] Figure 10 This is a schematic diagram of an internal surface defect of a quartz crucible provided in this disclosure.

[0030] Figure 11 This is a schematic flowchart of a method for testing a quartz crucible provided in this disclosure. Detailed Implementation

[0031] The technical solutions in this disclosure will now be clearly and completely described with reference to the accompanying drawings.

[0032] Figure 1 A cross-sectional view of the quartz crucible 1, which enables the implementation of the technical solution disclosed herein. See also... Figure 1 The quartz crucible 1 has an approximately cylindrical straight section 11 with an open top and extending vertically, a curved bottom 12, and a side section 13 connecting the straight section 11 and the bottom 12 with a curvature greater than that of the bottom 12.

[0033] by Figure 1 Taking the quartz crucible 1 shown as an example, its shape parameters can be used to determine whether the quartz crucible 1 is deformed. For example, the shape parameters can be compared with the shape parameters at the time of manufacture to determine whether deformation exists. Additionally, the shape parameters can be used to guide the crystal pulling process. For example, the position of the liquid level line containing polycrystalline silicon raw materials and melted into molten silicon can be assessed based on the shape parameters. During the crystal pulling process, the rising speed of the quartz crucible or the rising speed of the crystal rod can be finely adjusted based on this position to stabilize the solid-liquid gap, ensuring that the crystal rod quality is within the optimal range.

[0034] In some examples, as shown in Figure 1 The outer shape parameters of the quartz crucible 1 can include: the height of the quartz crucible 1; the inner diameter D1 and the outer diameter D2 of the straight section 11 of the quartz crucible 1; the wall thickness T between the inner surface and the outer surface of the quartz crucible at the straight section 11; the wall thickness N between the inner surface and the outer surface of the quartz crucible at the bottom section 12; the radius of curvature R1 of the bottom section 12 and the radius of curvature R2 of the side section 13.

[0035] In addition to the outer shape parameters of the quartz crucible 1, the defects existing on the inner surface of the quartz crucible 1 can also affect the quality of the drawn crystal rod. The three common defects on the inner surface of the quartz crucible 1 are spots, bubbles and scratches.

[0036] For the spot defect, during the molding process of the quartz crucible 1, the synthetic sand or natural sand in the material contains impurities or metal components. Under the high temperature and high pressure environment in the molding process, these impurities or metal elements will gather to form black or brown abnormal spots. During the crystal pulling process, the high temperature and high pressure environment for a long time will further promote the gathering of impurities or metal elements, so that the size of the abnormal spot becomes larger and larger, and it is more likely to fall off from the inner surface of the quartz crucible 1 and enter the silicon melt. In the case that the silicon melt mixes with the falling abnormal spot, the drawn crystal rod will have a reduced quality due to the presence of impurities or metal elements.

[0037] For the bubble defect, during the molding process of the quartz crucible 1, due to the influence of temperature and gas, bubbles will gather in the interior of the quartz crucible 1 and cannot be discharged. During the crystal pulling process, the high temperature and high pressure environment will promote the expansion of the bubbles, and the expanded bubbles will cause the deformation of the quartz crucible 1. In addition, with the melting loss of the quartz crucible 1 during the crystal pulling process, the bubbles in the interior of the quartz crucible 1 will enter the silicon melt, causing bubbles in the crystal rod or an increase in the oxygen content in the crystal rod.

[0038] For the scratch defect, during the crystal pulling process, the high temperature environment will cause softening or crystallization at the scratch defect, so that the impurities or metal components in the quartz crucible 1 enter the silicon melt, causing the drawn crystal rod to have a reduced quality due to the presence of impurities or metal elements.

[0039] In summary of the outer shape parameters and defects of the quartz crucible, in related solutions, artificial inspection is usually used for detection, which cannot accurately and objectively detect the quartz crucible. Based on this, the present disclosure expects to provide a detection scheme for a quartz crucible, which can accurately and objectively detect the outer shape parameters and defects of the quartz crucible.

[0040] Referring to Figure 2 which shows a device 20 for detecting a quartz crucible provided by the present disclosure, the device 20 can include:

[0041] The first detection chamber 21 has an opening;

[0042] The base 22, located inside the first testing chamber 21, is used to support the quartz crucible;

[0043] In the first testing chamber 21, light sources 23 are arranged on the inner walls of the opposite sides of the base 22;

[0044] The second detection chamber 24 has an opening, which can enter or exit the first detection chamber 21 from the opening in the direction indicated by the arrow, and after the second detection chamber 24 enters the first detection chamber 21, the base 22 and the quartz crucible are in the second detection chamber 24.

[0045] The distance sensor 25, installed in the second detection chamber 24, is used to detect the external parameters of the quartz crucible after it enters the first detection chamber 21 from the second detection chamber 24.

[0046] The photographic device 26, installed in the first detection chamber 21, is used to take an image of the inner surface of the quartz crucible after the second detection chamber 24 leaves the first detection chamber 21.

[0047] The confirmation unit 27 is used to confirm the detection status of the quartz crucible based on the external parameters of the quartz crucible and the image of the inner surface of the quartz crucible.

[0048] In some examples, such as Figure 3 The diagram shows a front view of the first testing chamber 21. The first testing chamber 21 can be implemented as a box structure with an opening, which defines the internal space 217 of the first testing chamber 21. Figure 3 The box structure shown may further include five inner walls. Specifically, these five inner walls include four peripheral walls, namely the first peripheral wall 211, the second peripheral wall 212, the third peripheral wall 213 and the fourth peripheral wall 214. In addition, among the five inner walls, there is also a bottom wall 216 relative to the opening.

[0049] In some examples, in the first detection chamber 21 according to Figure 3 When placed as shown, the base 22 can be mounted on the second peripheral wall 212. In this case, the light source 23 can be positioned on the two opposing inner walls, the first peripheral wall 211 and the third peripheral wall 213. When the base 22 supports a quartz crucible, the light source 23 can provide light to the quartz crucible.

[0050] In some examples, in the first detection chamber 21, according to... Figure 2When the opening of the second detection chamber 24 is opposite to the opening of the first detection chamber 21, the base 22 and the quartz crucible carried thereby can enter or exit the first detection chamber 21 from the opening of the first detection chamber 21. After the second detection chamber 24 enters the first detection chamber 21, the base 22 and the quartz crucible carried thereby are not only in the internal space 217 of the first detection chamber 21, but also in the internal space defined by the box structure of the second detection chamber 24.

[0051] In some examples, the second detection chamber 24 can also be implemented as a box structure with an opening similar to the first detection chamber 21. In a specific implementation, when the opening of the second detection chamber 24 is opposite to the opening of the first detection chamber 21, the second detection chamber 24 can enter or exit the first detection chamber 21 from the opening of the first detection chamber 21. After the second detection chamber 24 enters the first detection chamber 21, the base 22 and the quartz crucible carried thereby are not only in the internal space 217 of the first detection chamber 21, but also in the internal space defined by the box structure of the second detection chamber 24.

[0052] In some examples, the box material of the second detection chamber 24 is made of light-absorbing material, so that when the base 22 and the quartz crucible carried thereby are in the internal space of the second detection chamber 24, the base 22 and the quartz crucible carried thereby are in an optical darkroom environment. For example, a black light-shielding cloth can be arranged on the inner wall of the second detection chamber 24 to shield external light from entering the internal space of the second detection chamber 24, or a chemical light-absorbing material with high light absorption rate can be coated on the inner wall of the second detection chamber 24. Based on the optical darkroom environment provided by the second detection chamber 24, the distance sensor 25 can avoid interference from other light during detection, so that the distance sensor 25 can capture more subtle displacement changes, thereby improving the detection accuracy and precision of the distance sensor 25.

[0053] In some examples, a sliding guide rail is arranged in the second detection chamber 24, and the distance sensor 25 moves in the second detection chamber 24 by using the sliding guide rail to measure the shape parameters of the quartz crucible. In some examples, the distance sensor 25 can be implemented as an infrared displacement sensor, and the infrared displacement sensor measures the quartz crucible in a direction perpendicular to the central axis of the quartz crucible.

[0054] In some examples, the confirmation unit 27 can be implemented as an electronic device with data processing and operation functions, such as at least one of a smartphone, a smartwatch, a desktop computer, a laptop computer, a virtual reality terminal, an augmented reality terminal, a wireless terminal, and a laptop computer. The electronic device has a communication function and can access a wired network or a wireless network and receive data transmitted by other components in the device 20 based on the accessed wired network or wireless network.

[0055] In some possible implementations, referring to Figure 4 The device 20 for detecting the quartz crucible further comprises a control unit 28 configured to control the movement of the distance sensor 25 within the second detection chamber 24, for example, to control the movement of the distance sensor 25 on the sliding rail within the second detection chamber 24, when the pedestal 22 and the quartz crucible carried thereby are located in the inner space of the second detection chamber 24, so that the distance sensor 25 measures the outer shape parameters of the quartz crucible during the movement.

[0056] For the above implementations, in combination with the aforementioned exemplary outer shape parameters of the quartz crucible, in some examples, when the distance sensor 25 is an infrared displacement sensor, in combination with Figure 5 As shown in the figure, the control unit 28 is configured to:

[0057] control the infrared displacement sensor to move according to a first movement process and obtain a first movement distance of the infrared displacement sensor during the first movement process; wherein the first movement process is a movement process in which the infrared displacement sensor moves in a vertical direction from the top of the pedestal 22 to a position where the infrared displacement sensor cannot receive reflected infrared rays;

[0058] and, in the first movement process, select at least three first measurement distances of the infrared displacement sensor in a first stage of measuring the bottom of the quartz crucible;

[0059] and, in the first movement process, select at least three second measurement distances of the infrared displacement sensor in a second stage of measuring the side of the quartz crucible;

[0060] The confirmation unit 27 is further configured to:

[0061] determine the first movement distance as the height of the quartz crucible;

[0062] obtain the radius of curvature of the bottom of the quartz crucible according to the at least three first measurement distances;

[0063] obtain the radius of curvature of the side of the quartz crucible according to the at least three second measurement distances.

[0064] Specifically, as Figure 5As shown, the distance sensor 25, for example, the infrared displacement sensor, emits infrared rays in a direction perpendicular to the central axis of the quartz crucible (as shown by the dotted line), i.e. in a horizontal direction, towards the outer surface of the quartz crucible during the first movement. After absorbing part of the infrared rays, the outer surface of the quartz crucible reflects the remaining infrared rays. After the infrared displacement sensor receives the reflected infrared rays, it calculates the change in the distance between the infrared displacement sensor and the outer surface of the quartz crucible during the first movement according to the change in light intensity between the emitted infrared rays and the received reflected infrared rays. When the distance sensor 25, for example, the infrared displacement sensor, moves in the vertical direction to the top of the quartz crucible, as shown by the dashed line, the infrared displacement sensor no longer receives reflected infrared rays, i.e. the infrared rays emitted by the infrared displacement sensor are not blocked by the quartz crucible, and there is no reflection of infrared rays in the optically dark environment of the interior space of the second detection chamber 24, which indicates that the movement distance of the infrared displacement sensor exceeds the height of the quartz crucible. Based on this, the confirmation unit 27 can determine the movement distance of the infrared displacement sensor during the first movement as the height of the quartz crucible.

[0065] In addition, during the first movement, the infrared displacement sensor sequentially measures the distances between itself and the bottom, side and straight portion of the quartz crucible. In the first stage of measuring the distance between the infrared displacement sensor and the bottom of the quartz crucible, the infrared displacement sensor can collect first measurement distances of at least three measurement points on the bottom of the quartz crucible. Based on this, the confirmation unit 27 can determine the positions of the at least three measurement points using the at least three first measurement distances, and calculate the radius of curvature of the bottom of the quartz crucible based on the property that the at least three measurement points are not collinear. For example, starting from the top of the base 22, collect a measurement point every 1 mm, a total of three non-collinear measurement points P1, P2 and P3, and calculate the radius of curvature of the bottom of the quartz crucible according to the positions of the three measurement points P1, P2 and P3.

[0066] Similarly, in the second stage of measuring the infrared displacement sensor itself and the side of the quartz crucible, the second measured distances of the infrared displacement sensor itself and at least three measuring points on the side of the quartz crucible can be collected. Based on this, the confirmation unit 27 can determine the positions of the three measuring points using the at least three second measured distances, and based on the property that the at least three measuring points are not collinear, the curvature radius of the side of the quartz crucible can be calculated using the positions of the at least three measuring points. For example, within a set moving distance before measuring the distance from the straight tube, three non-collinear measuring points P4, P5 and P6 are collected, and based on the positions of the three measuring points P4, P5 and P6, the curvature radius of the side of the quartz crucible can be calculated.

[0067] For the above implementation, in combination with the aforementioned exemplary shape parameters of the quartz crucible, in some examples, when the distance sensor 25 is an infrared displacement sensor, the control unit 28 is configured to:

[0068] control the infrared displacement sensor to collect third measured distances of three measuring points on the inner surface of the straight tube of the quartz crucible at a set height;

[0069] the confirmation unit 27 is configured to:

[0070] obtain a center point of the quartz crucible at the set height according to the third measured distances of the three measuring points on the inner surface of the straight tube of the quartz crucible;

[0071] the control unit 28 is further configured to:

[0072] control the infrared displacement sensor to move to the center point at the set height and then move to the height of the quartz crucible in the vertical direction;

[0073] and control the infrared displacement sensor to measure a fourth measured distance between the infrared displacement sensor and the lowest point of the inner surface of the quartz crucible at the center point of the quartz crucible at the height of the quartz crucible;

[0074] the confirmation unit 27 is further configured to:

[0075] obtain the wall thickness between the inner surface and the outer surface of the quartz crucible at the bottom according to the height of the quartz crucible and the fourth measured distance.

[0076] Specifically, the control unit 28 can move the distance sensor 25, such as the infrared displacement sensor, into the quartz crucible and to a set height below the top of the quartz crucible, as shown in Figure 6 Then, the control unit 28 controls the distance sensor 25, such as the infrared displacement sensor, to translate at the set height, as shown in Figure 7The illustrated top view shows that the infrared displacement sensor measures a third measurement distance between three measurement points P7, P8 and P9 on the inner surface of the straight section of the quartz crucible at the set height, based on which the confirming unit 27 can determine the positions of the at least three measurement points P7, P8 and P9 using the third measurement distances corresponding to the at least three measurement points P7, P8 and P9, and based on the property that the at least three measurement points P7, P8 and P9 are not collinear, the center point O of the quartz crucible at the set height can be determined by the three-point circle determination method using the positions of the at least three measurement points P7, P8 and P9.

[0077] In addition, the three non-collinear measurement points collected at the set height inside the quartz crucible and below the top of the quartz crucible can also be obtained by rotating the distance sensor 25, such as the infrared displacement sensor, and measuring the third measurement distances corresponding to the three measurement points by the infrared displacement sensor.

[0078] After the center point O of the quartz crucible at the set height is determined, the control unit 28 can also control the distance sensor 25, such as the infrared displacement sensor, to move to the center point at the height of the quartz crucible. Specifically, the control unit 28 can first control the distance sensor 25, such as the infrared displacement sensor, to move to the center point O at the set height, and then control the distance sensor 25, such as the infrared displacement sensor, to move upward along the vertical direction to the height of the quartz crucible. After the distance sensor 25, such as the infrared displacement sensor, moves to the center of the quartz crucible at the height (as shown by the dashed line), the distance sensor 25, such as the infrared displacement sensor, can be controlled to measure toward the quartz crucible to obtain a fourth measurement distance between the infrared displacement sensor and the lowest point of the inner surface of the quartz crucible. Figure 8 As shown, the confirming unit 27 can determine the wall thickness between the inner surface and the outer surface of the quartz crucible at the bottom according to the difference between the height H of the quartz crucible obtained in the foregoing example and the fourth measurement distance M, that is, Figure 1 the wall thickness N shown in the middle.

[0079] For the above implementation, in combination with the foregoing exemplary shape parameters of the quartz crucible, in some examples, when the distance sensor 25 is an infrared displacement sensor, in combination with Figure 9 the control unit 28 is configured to:

[0080] control the infrared displacement sensor to move according to a second movement process, the second movement process being a movement process in which the infrared displacement sensor moves from the center at the height of the quartz crucible to a position where the infrared displacement sensor cannot receive reflected infrared light along the horizontal direction indicated by the solid arrow;

[0081] In the second movement, a first position of the infrared displacement sensor when the measured distance is less than a set distance threshold is recorded, and a second position of the infrared displacement sensor when the reflected infrared light is no longer received is recorded;

[0082] The confirming unit 27 is configured to:

[0083] The inner diameter, the outer diameter and the wall thickness of the quartz crucible between the inner surface and the outer surface of the straight portion of the quartz crucible are determined according to the first position and the second position.

[0084] Specifically, as shown in Figure 9 the distance sensor 25, for example, the infrared displacement sensor, emits infrared light towards the inner surface of the quartz crucible in the direction parallel to the central axis of the quartz crucible (as shown by the dotted line) in the second movement. After absorbing part of the infrared light, the inner surface of the quartz crucible reflects the remaining infrared light. After receiving the reflected infrared light by the infrared displacement sensor, the infrared displacement sensor calculates the change of the distance between the infrared displacement sensor and the outer surface of the quartz crucible in the second movement according to the change of the light intensity between the emitted infrared light and the received reflected infrared light.

[0085] When the distance sensor 25, for example, the infrared displacement sensor, moves to the first position Loc-1 corresponding to the top plane of the quartz crucible (as shown by the dotted line) in the horizontal direction, the distance measured by the infrared displacement sensor will significantly decrease to a smaller distance. The present disclosure uses a distance threshold to determine whether the distance is small at this position. As the infrared displacement sensor continues to move and starts to move out of the outer surface of the quartz crucible (as shown by the second position Loc-2), the infrared displacement sensor no longer receives the reflected infrared light, i.e. the infrared light emitted by the infrared displacement sensor is not blocked by the quartz crucible, and there is no reflection of the infrared light in the internal space of the second detection chamber 24 which is an optically dark chamber environment, which indicates that the infrared displacement sensor has moved out of the measurement range of the quartz crucible. Based on this, the confirming unit 27 can determine the inner diameter of the quartz crucible according to the distance of the infrared displacement sensor from the center of the height of the quartz crucible to the first position Loc-1, determine the outer diameter of the quartz crucible according to the distance of the infrared displacement sensor from the center of the height of the quartz crucible to the second position Loc-2, and determine the wall thickness of the quartz crucible between the inner surface and the outer surface of the straight portion of the quartz crucible according to the distance of the infrared displacement sensor from the first position Loc-1 to the second position Loc-2, i.e. Figure 1 the wall thickness T shown in

[0086] Through the above Figures 5 to 9In the example shown, a specific implementation example is described in which the control unit 28 controls the movement of the distance sensor 25 within the second detection chamber 24 so that the distance sensor 25 measures the profile parameters of the quartz crucible during the movement. By way of example, the profile parameters measured by the distance sensor 25 include the height of the quartz crucible 1, the inner diameter D1 and the outer diameter D2 of the straight portion 11 of the quartz crucible 1, the wall thickness T between the inner surface and the outer surface of the quartz crucible at the straight portion 11, the wall thickness N between the inner surface and the outer surface of the quartz crucible at the bottom portion 12, the radius of curvature R1 of the bottom portion 12, and the radius of curvature R2 of the side portion 13. Figure 1 After the profile parameters of the quartz crucible 1, such as the height of the quartz crucible 1, the inner diameter D1 and the outer diameter D2 of the straight portion 11 of the quartz crucible 1, the wall thickness T between the inner surface and the outer surface of the quartz crucible at the straight portion 11, the wall thickness N between the inner surface and the outer surface of the quartz crucible at the bottom portion 12, the radius of curvature R1 of the bottom portion 12, and the radius of curvature R2 of the side portion 13, are measured by the distance sensor 25, the confirmation unit 27 can be used to determine whether the quartz crucible 1 is in an abnormal state, such as deformation, by comparing the profile parameters with the profile parameters at the time of manufacture, for example. In addition, these profile parameters can be used to guide the use during the crystal pulling process, for example, to evaluate the position of the liquid level line at which the polycrystalline silicon raw material is filled and melted into a silicon melt.

[0087] In some possible implementations, the control unit 28 is further configured to control the photographing device 26 to capture an image of the inner surface of the quartz crucible after the second detection chamber 24 exits the first detection chamber 21.

[0088] The confirmation unit 27 is configured to determine the type of defect present on the inner surface of the quartz crucible based on the image of the inner surface of the quartz crucible.

[0089] For the above implementations, in particular, after the second detection chamber 24 exits the first detection chamber 21, the light source 23 arranged in the first detection chamber 21 can provide a bright detection environment, i.e., a bright field detection environment. In this detection environment, the light source 23 can be implemented as an LED array to form a line light source as shown in Figure 2 which provides light irradiation towards the quartz crucible. This can improve the contrast, enhance the visible details on the surface of the quartz crucible, and enable the image captured by the photographing device 26 to better capture the defects on the inner surface of the quartz crucible, which is helpful for the analysis of the type of defect.

[0090] In some examples, the photographing device 26 can be implemented as a Charge-Coupled Device (CCD) camera. The controller 28 can control the photographing device 26 to move in the quartz crucible in the direction shown by the dashed line to capture images of all regions of the inner surface of the quartz crucible. Alternatively, the photographing device 26 can be controlled to be deflected at a fixed position in the quartz crucible to capture images of all regions of the inner surface of the quartz crucible. For the captured images of the inner surface of the quartz crucible, the confirmation unit 27 identifies whether defects are present on the inner surface of the quartz crucible and the type of defect present based on the images.

[0091] Specifically, the confirming unit 27 can obtain the image features of the inner surface image of the quartz crucible through image processing means, then identify whether the inner surface of the quartz crucible has defects through feature classification, and match the type of the defect existing in the inner surface of the quartz crucible according to the image features corresponding to each type of defect. The implementation means of identifying the defect and its type based on the image is not described in detail in the present disclosure. In Figure 10 In the figure, from left to right, the images of the three defects commonly seen on the inner surface of the quartz crucible, namely, spots, bubbles and scratches, are shown. After the confirming unit 27 identifies these types of defects based on the images, it can also determine the use state of the quartz crucible according to the size and number of these defects. For example, it can determine whether the quartz crucible can continue to be used according to the size and number of spot defects, or whether the quartz crucible can continue to be used according to the length and number of scratch defects and whether the position of the scratch defect is above the liquid level line, or whether the quartz crucible can continue to be used according to the distribution density of bubble defects, such as the number of bubble defects within 1 square centimeter.

[0092] The device 20 for detecting a quartz crucible provided by the above technical solution provides two detection environments of optical dark field and bright field respectively, and detects the outer shape parameters of the quartz crucible through the distance sensor in the optical dark field detection environment, and detects the defects existing in the inner surface of the quartz crucible by shooting the inner surface image of the quartz crucible in the bright field detection environment, so as to determine whether the detection state of the quartz crucible can continue to be used according to the detected outer shape parameters and defects, without manual inspection, so as to accurately and objectively detect the quartz crucible.

[0093] Based on the same inventive concept of the foregoing technical solution, see Figure 11 which shows a method for detecting a quartz crucible provided by the present disclosure. The method can be applied to the device 20 for detecting a quartz crucible described in any of the foregoing schemes or examples, and can include:

[0094] S1101: After the second detection chamber enters the first detection chamber, detecting the outer shape parameters of the quartz crucible;

[0095] S1102: After the second detection chamber leaves the first detection chamber, shooting the inner surface image of the quartz crucible;

[0096] S1103: Confirming the detection state of the quartz crucible according to the outer shape parameters of the quartz crucible and the inner surface image of the quartz crucible.

[0097] In some examples, the detection of the outer shape parameters of the quartz crucible after the second detection chamber enters the first detection chamber includes:

[0098] After the second detection chamber enters the first detection chamber, the movement of the distance sensor in the second detection chamber is controlled so that the distance sensor measures the shape parameters of the quartz crucible during the movement.

[0099] In some examples, the movement of the distance sensor in the second detection chamber is controlled so that the distance sensor measures the shape parameters of the quartz crucible during the movement, including:

[0100] When the distance sensor is an infrared displacement sensor, the infrared displacement sensor is controlled to move according to a first movement process, and a first movement distance of the infrared displacement sensor during the first movement process is obtained, and the first movement distance is determined as the height of the quartz crucible; wherein the first movement process is a movement process of the infrared displacement sensor from the top of the base to a position where the infrared displacement sensor cannot receive reflected infrared rays in the vertical direction.

[0101] In the first movement process, at least three first measurement distances of the infrared displacement sensor in a first stage of measuring the bottom of the quartz crucible are selected, and a radius of curvature of the bottom of the quartz crucible is obtained according to the at least three first measurement distances.

[0102] In the first movement process, at least three second measurement distances of the infrared displacement sensor in a second stage of measuring the side of the quartz crucible are selected, and a radius of curvature of the side of the quartz crucible is obtained according to the at least three second measurement distances.

[0103] In some examples, the movement of the distance sensor in the second detection chamber is controlled so that the distance sensor measures the shape parameters of the quartz crucible during the movement, including:

[0104] When the distance sensor is an infrared displacement sensor, the infrared displacement sensor is controlled to collect third measurement distances of three measurement points of the inner surface of the straight cylinder part of the quartz crucible at a set height;

[0105] According to the third measurement distances, a center point of the quartz crucible at the set height is obtained;

[0106] After the infrared displacement sensor moves to the center point at the set height, the infrared displacement sensor moves to the height of the quartz crucible in the vertical direction;

[0107] The infrared displacement sensor is controlled to measure a fourth measurement distance between the infrared displacement sensor and the lowest point of the inner surface of the quartz crucible from the center point of the infrared displacement sensor at the height of the quartz crucible towards the quartz crucible;

[0108] According to the height of the quartz crucible and the fourth measurement distance, a wall thickness between the inner surface and the outer surface of the quartz crucible at the bottom is obtained.

[0109] In some examples, the control distance sensor moves in the second detection chamber, so that the distance sensor measures the outer shape parameters of the quartz crucible during the movement, including:

[0110] The infrared displacement sensor is controlled to move according to a second movement process, the second movement process being a movement process in which the infrared displacement sensor moves from the center at the height of the quartz crucible in a horizontal direction to a position where the infrared displacement sensor cannot receive reflected infrared rays;

[0111] During the second movement process, a first position where the distance measured by the infrared displacement sensor is less than a set distance threshold is recorded, and a second position where the infrared displacement sensor cannot receive reflected infrared rays is recorded;

[0112] According to the first position and the second position, the inner diameter, the outer diameter of the quartz crucible, and the wall thickness between the inner surface and the outer surface of the quartz crucible at the straight section are determined.

[0113] In some examples, the detection state of the quartz crucible is determined according to the outer shape parameters of the quartz crucible and the inner surface image of the quartz crucible, including:

[0114] According to the outer shape parameters of the quartz crucible, it is determined whether the quartz crucible is deformed;

[0115] The inner surface image of the quartz crucible is subjected to image analysis to determine defects present on the inner surface of the quartz crucible and corresponding defect types.

[0116] The above is a schematic scheme of a method for detecting a quartz crucible provided by the present disclosure. It should be noted that the technical scheme of the method for detecting a quartz crucible and the technical scheme of the device for detecting a quartz crucible described above belong to the same concept. The technical scheme of the method for detecting a quartz crucible, which is not described in detail, can be referred to the description of the technical scheme of the device for detecting a quartz crucible.

[0117] It should be noted that the technical schemes described in the present disclosure can be combined arbitrarily without conflict.

[0118] The above merely illustrates the specific embodiments of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can easily think of the changes or replacements within the technical range disclosed by the present application, which should be covered in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. An apparatus for detecting a quartz crucible, characterized by comprising: The device for detecting the quartz crucible comprises: a first detection chamber with an opening; a base arranged in the first detection chamber and used for carrying the quartz crucible; a light source arranged in the first detection chamber and on the inner wall of the opposite sides of the base; a second detection chamber with an opening, the second detection chamber can enter or leave the first detection chamber from the opening of the first detection chamber, and the base and the quartz crucible are in the second detection chamber after the second detection chamber enters the first detection chamber; wherein the box material of the second detection chamber is made of light-absorbing material, and the base and the quartz crucible carried thereby are in the environment of an optical darkroom when they are in the internal space of the second detection chamber; a distance sensor arranged in the second detection chamber and used for detecting the shape parameters of the quartz crucible after the second detection chamber enters the first detection chamber; a control unit configured to control the movement of the distance sensor in the second detection chamber when the base and the quartz crucible carried thereby are in the internal space of the second detection chamber, so that the distance sensor measures the shape parameters of the quartz crucible during the movement; a photographing device arranged in the first detection chamber and used for shooting the image of the inner surface of the quartz crucible after the second detection chamber leaves the first detection chamber; a confirmation unit configured to confirm the detection state of the quartz crucible according to the shape parameters of the quartz crucible and the image of the inner surface of the quartz crucible.

2. The apparatus for detecting a quartz crucible according to claim 1, characterized by, The distance sensor is an infrared displacement sensor.

3. The apparatus for detecting a quartz crucible according to claim 2, characterized by, The control unit is configured to: control the infrared displacement sensor to move according to a first movement process and obtain a first movement distance of the infrared displacement sensor in the first movement process; wherein the first movement process is the movement process of the infrared displacement sensor from the top of the base to the position where the infrared displacement sensor cannot receive reflected infrared light in the vertical direction; in the first movement process, select at least three first measurement distances of the infrared displacement sensor in a first stage of measuring the bottom of the quartz crucible; in the first movement process, select at least three second measurement distances of the infrared displacement sensor in a second stage of measuring the side of the quartz crucible; The confirmation unit is further configured to: determine the first movement distance as the height of the quartz crucible; obtain the radius of curvature of the bottom of the quartz crucible according to the at least three first measurement distances; obtain the radius of curvature of the side of the quartz crucible according to the at least three second measurement distances.

4. The apparatus for detecting a quartz crucible according to claim 3, wherein The control unit is configured to: control the infrared displacement sensor to collect the third measurement distances of three measurement points of the inner surface of the straight cylinder part of the quartz crucible at a set height; The confirmation unit is further configured to: obtain the center point of the quartz crucible at the set height according to the third measurement distances; The control unit is further configured to: After the infrared displacement sensor is controlled to move to the center point at the set height, the infrared displacement sensor is controlled to move to the height of the quartz crucible in the vertical direction; The infrared displacement sensor is controlled to measure a fourth measurement distance between the infrared displacement sensor and the lowest point of the inner surface of the quartz crucible at the center point of the height of the quartz crucible towards the quartz crucible. The confirmation unit is further configured to: According to the height of the quartz crucible and the fourth measurement distance, the wall thickness between the inner surface and the outer surface of the quartz crucible at the bottom is obtained.

5. The apparatus for detecting a quartz crucible according to claim 4, wherein The control unit is configured to: Control the infrared displacement sensor to move according to a second movement process, the second movement process being a movement process in which the infrared displacement sensor moves from the center at the height of the quartz crucible in the horizontal direction until the infrared displacement sensor cannot receive reflected infrared rays. During the second movement process, a first position at which the measurement distance of the infrared displacement sensor is less than a set distance threshold is recorded, and a second position at which the infrared displacement sensor cannot receive reflected infrared rays is recorded. The confirmation unit is configured to: According to the first position and the second position, the inner diameter, the outer diameter of the quartz crucible, and the wall thickness between the inner surface and the outer surface of the quartz crucible at the straight section are determined.

6. The apparatus for inspecting a quartz crucible according to any one of claims 1 to 5, characterized by The confirmation unit is configured to: According to the shape parameters of the quartz crucible, it is determined whether the quartz crucible is deformed.

7. The apparatus for detecting a quartz crucible according to claim 1, wherein The confirmation unit is configured to: Image analysis is performed on the inner surface image of the quartz crucible to determine the defects present on the inner surface of the quartz crucible and the corresponding defect types.

8. A method of inspecting a quartz crucible, characterized by, The method is applied to the device for detecting a quartz crucible according to any one of claims 1 to 7, and the method comprises: After the second detection chamber enters the first detection chamber, the shape parameters of the quartz crucible are detected; After the second detection chamber leaves the first detection chamber, an inner surface image of the quartz crucible is taken; According to the shape parameters of the quartz crucible and the inner surface image of the quartz crucible, the detection state of the quartz crucible is confirmed.

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