Optical assembly, optical system and projection exposure equipment

Abstract

The invention relates to an optical assembly (102) for a projection exposure apparatus (1), comprising an optical element (126) and a mount (128) carrying the optical element (126), where the mount (128) comprises a mount lower part (136) and a mount upper part (138) releasably connected to the mount lower part (136), where the optical element (126) is connected only to the mount upper part (138), and where the optical element (126) is connected only to the mount upper part (138). And wherein the mount upper part (138) comprises a plurality of spring-elastically deformable support legs (246) on which the optical element (126) is supported.

Description

Technical Field

[0001] The invention relates to an optical component, an optical system having such an optical component and a projection exposure apparatus having such an optical component and / or having such an optical system.

[0002] The content of the priority application DE 10 2022 209 868.4 is hereby incorporated in its entirety by reference. Background Art

[0003] Microlithography is used to produce microstructured structural elements, such as integrated circuits. The microlithography process is performed using a lithography apparatus comprising an illumination system and a projection system. An image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate (e.g. a silicon wafer) which is coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system, so that the mask structure is transferred to the photosensitive coating of the substrate.

[0004] Driven by the need for smaller structures in the production of integrated circuits, currently under development are EUV lithography systems, which use light with a wavelength in the range of 0.1 nm to 30 nm, in particular 13.5 nm, and DUV lithography systems, which use light with a wavelength in the range of 30 nm to 250 nm. In the case of such EUV lithography equipment in particular, due to the high absorption of light of this wavelength by most materials, reflective optical units (i.e., mirrors) must be used to replace the previous refractive optical units (i.e., lens elements).

[0005] It would be desirable to be able to exchange mirrors of this type at the point of use of such a lithographic apparatus. This is usually not possible at the point of use of a lithographic apparatus due to limited space conditions and the required tolerances to be observed when exchanging mirrors of this type, which is associated with a significant expenditure in terms of time and labor. This requires improvement. Summary of the invention

[0006] Against this background, it is an object of the present invention to provide an improved optical component.

[0007] Therefore, an optical assembly for a projection exposure apparatus is proposed. The optical assembly comprises an optical element and a mount supporting the optical element, wherein the mount has a mount lower part and a mount upper part detachably connected to the mount lower part, wherein the optical element is connected only to the mount upper part, and wherein the mount upper part has a plurality of small elastically deformable supporting feet on which the optical element rests.

[0008] Since the optical element is only connected to the upper part of the mount, the clamping forces for fixing the optical assembly are introduced only into the lower part of the mount and thus not into the optical element. As a result, the exchange of the optical assembly at the use position of the projection exposure apparatus is facilitated.

[0009] The optical component may be or may be referred to as a reflector or a reflector module. The optical element is a reflector. However, the optical element may also be a lens element. The mount at least partially receives the optical element. In the present case, the fact that the mount "carries" the optical element particularly means that the mount can absorb the force of the weight of the optical element. For example, the optical element is adhesively bonded to the mount.

[0010] A coordinate system having a first spatial direction or x-direction, a second spatial direction or y-direction and a third spatial direction or z-direction is assigned to the optical component. The spatial directions are aligned perpendicularly with respect to one another. A central axis or axis of symmetry is assigned to the optical element and the optical element and / or the mount may be substantially rotationally symmetrical with respect to this axis. However, this is not mandatory. The axis of symmetry extends parallel to the z-direction or coincides with it.

[0011] The mounting element is subdivided into a mounting element lower part and a mounting element upper part, in particular as viewed in the z-direction. The mounting element lower part and the mounting element upper part are stacked or placed one on top of the other when viewed in the z-direction. The mounting element upper part rests on the mounting element lower part. The mounting element upper part is fixedly connected to the mounting element lower part. For this purpose, for example, a threaded connection can be provided. In the present case, the fact that the mounting element lower part is "detachably" connected to the mounting element upper part means in particular that the mounting element lower part and the mounting element upper part can be connected to each other and detached again as often as required.

[0012] In the present case, the fact that the optical element is "only" connected to the mount upper part means in particular that there is no direct connection between the optical element and the mount lower part. Forces applied to the mount lower part are therefore not introduced into the mount upper part and also into the optical element. The mount upper part is in particular arranged between the optical element and the mount lower part. The mount lower part is annular. Therefore, the mount lower part can also be referred to as a lower mounting ring. The mount upper part is also annular. Therefore, the mount upper part can also be referred to as an upper mounting ring.

[0013] According to one embodiment, the mount has a spacer ring arranged between the mount lower part and the mount upper part, wherein the spacer ring has a contact area contacting both the mount lower part and the mount upper part and a non-contact area contacting neither the mount lower part nor the mount upper part.

[0014] The non-contact area has a lower or smaller wall thickness than the contact area. In particular, the mounting part bottom part and the mounting part top part are fixedly connected to each other only in the area of ​​the contact area, in particular are screwed. The non-contact area preferably does not contain a connection between the mounting part bottom part and the mounting part top part. The spacer ring enables adjustment in the z direction. For this purpose, the spacer ring can be appropriately finely ground.

[0015] According to another embodiment, contact areas and non-contact areas alternate.

[0016] This means in particular that there is a non-contact region between two contact regions and a contact region between two non-contact regions. Particularly preferably, there are exactly three contact regions, which are evenly distributed around the axis of symmetry. In particular, the contact regions are offset from one another by 120°. The same applies to the non-contact regions.

[0017] According to a further embodiment, the mounting part lower part and the mounting part upper part are connected to one another by means of a connecting element, wherein the connecting element passes through a hole provided on the contact region and through the spacer ring.

[0018] The connecting element can be a screw. Each contact area can be assigned a plurality of connecting elements. For this purpose, holes are provided on or in the contact area. Thus, the connecting element passes from the upper part of the mounting through the spacer ring and into the lower part of the mounting.

[0019] According to another embodiment, the optical assembly further comprises a plurality of mounting posts to which a clamping force can be applied to connect the optical assembly to the manipulator frame, wherein the mounting posts are mounted on the mount lower portion.

[0020] In particular, the mounting struts are screwed to the mounting lower part. Preferably, there are exactly three mounting struts. The mounting struts are evenly distributed around the axis of symmetry. In particular, the mounting struts are offset from one another by 120°. Since the mounting struts are mounted on the mounting lower part, corresponding clamping forces are introduced only into the mounting lower part and therefore not into the mounting upper part or the optical element.

[0021] According to a further embodiment, the mount has a plurality of gravity compensators which are arranged between the mount lower part and the mount upper part and are designed to apply a spring force to the mount upper part which is directed oppositely to the force of the weight of the optical element.

[0022] Preferably, the mounting lower part and the mounting upper part have cutouts for receiving the gravity compensator. This means in particular that the gravity compensator is arranged inside the mounting, in particular inside the mounting lower part and the mounting upper part.

[0023] According to a further embodiment, each gravity compensator has a first guide element assigned to the mounting lower part, a second guide element assigned to the mounting upper part and a spring element arranged between the first guide element and the second guide element.

[0024] The first guide element is positioned inside the lower part of the mounting. The second guide element is positioned inside the upper part of the mounting. The first guide element and the second guide element are preferably tubular. In particular, the first guide element and / or the second guide element are arranged at least partially inside the spring element. The spring element is a cylindrical spring. In particular, the spring element is a compression spring. The spacer ring has a hole through which the spring element passes. This also means, in particular, that the gravity compensator passes through the spacer ring.

[0025] According to a further embodiment, the first guide element is fixedly connected to the mounting lower part, wherein the second guide element is linearly displaceably mounted on the mounting upper part.

[0026] For example, the first guide element is screwed to the mounting lower part.The second guide element is preferably not fixedly connected to the mounting upper part, but is instead pressed against the mounting upper part by means of a spring element.

[0027] The upper part of the mounting part has a plurality of small, elastically deformable supporting feet, on which the optical element rests.

[0028] "Elastic deformation" is understood in the present case to mean reversible deformation. This means, in particular, that the small supporting foot can be brought from an undeformed state into a deformed state by applying a force. As soon as the force is no longer acting, the small supporting foot automatically or independently deforms from the deformed state back into the non-deformed state. In particular, the optical element is adhesively bonded to the small supporting foot. UV-curable adhesives can be used for this purpose.

[0029] According to another embodiment, each small supporting foot has a supporting portion on which the optical element rests and a spring portion connecting the supporting portion to the upper portion of the mounting member.

[0030] The spring portion is in particular a leaf spring portion and can therefore also be referred to as such. The optical element is adhesively bonded to the support portion. The support portion is in the form of a wedge and comprises a support surface which is inclined relative to the axis of symmetry. The optical element rests on the support surface. In particular, the optical element is adhesively bonded to the support surface. The contact surface of the optical element which is inclined relative to the axis of symmetry abuts the support surface of the support portion.

[0031] According to another embodiment, small supporting feet protrude from the mounting upper part into the mounting lower part.

[0032] In particular, the small support foot protrudes radially into the mounting part, in particular into the mounting part lower part. In particular, the spring part extends out of the upper mounting part along the symmetry axis or along the z-direction into the mounting part lower part. In particular, the small support foot is oriented vertically relative to the spring part.

[0033] An optical system for a projection exposure apparatus is also proposed. The optical system comprises an optical assembly as described above and an actuatable manipulator frame carrying the optical assembly.

[0034] In the present case, the fact that the manipulator frame is "actuable" means in particular that the pose of the manipulator frame can be modified by actuators attached to the manipulator frame. The optical assembly has six degrees of freedom, namely three degrees of freedom of translation along the x-direction, the y-direction and the z-direction, and three degrees of freedom of rotation about the x-direction, the y-direction and the z-direction. This means that the position and orientation of the optical assembly can be determined or described using six degrees of freedom.

[0035] The "position" of an optical component is to be understood as meaning, in particular, its coordinates with respect to the x-direction, the y-direction, and the z-direction. In particular, the "orientation" of an optical component is to be understood as meaning its tilt relative to three directions. This means that the optical component can be tilted with respect to the x-direction, the y-direction, and the z-direction. This provides six degrees of freedom for the position and orientation of the optical component. Therefore, the "posture" of an optical component is to be understood as meaning both its position and its orientation. An actuator can be used to make the optical component, for example, reach a target posture from an actual posture, and vice versa.

[0036] According to one embodiment, the optical system further comprises a locking frame connected to the manipulator frame, wherein the optical assembly is arranged between the manipulator frame and the locking frame to apply a clamping force to the mount.

[0037] For example, the locking frame is fixedly connected (e.g., threadedly connected) to the manipulator frame. The locking frame is designed to apply a clamping force to the mounting struts of the mount along an axis of symmetry relative to the z-direction. The manipulator frame is actuatable and can be moved, for example, along the z-direction, in order to apply the clamping force to the mounting struts or to relieve the mounting struts from the clamping force.

[0038] According to a further embodiment, the optical system further comprises a plurality of bearing units, wherein the optical component is mounted on the manipulator frame by means of the bearing units, wherein each bearing unit comprises a spherical element and a groove element, which at least partially receives the spherical element.

[0039] Preferably, there are exactly three support units, each of which can be assigned two of the aforementioned degrees of freedom. Thus, three support units result in six degrees of freedom. The support units are preferably evenly distributed around the axis of symmetry. In particular, the support units are offset from each other by 120°. The corresponding spherical elements can be connected, in particular threaded, to the manipulator frame. The groove element is fixedly connected to the mounting part, in particular the lower part of the mounting part. Each groove element has a V-shaped groove, which at least partially accommodates the spherical element. When viewed in the z direction, the support unit and the mounting support are arranged one below the other or one above the other, respectively.

[0040] Furthermore, a projection exposure apparatus having such an optical component and / or having such an optical system is proposed.

[0041] The optical system is preferably a projection optical unit of a projection exposure apparatus. However, the optical system may also be an illumination system. The projection exposure apparatus may be an EUV lithography apparatus. EUV stands for "extreme ultraviolet" and refers to a wavelength of the working light between 0.1 nm and 30 nm. The projection exposure apparatus may also be a DUV lithography apparatus. DUV stands for "deep ultraviolet" and refers to a wavelength of the working light between 30 nm and 250 nm.

[0042] In the present case, "one" or "an" should not be understood as being limited to only one element. On the contrary, there may also be a plurality of elements, such as two, three or more. Any other number used herein should also not be understood as being limited to the stated number of elements. On the contrary, unless otherwise indicated, upward and downward deviations of the numerical values ​​are possible.

[0043] The embodiments and features described for the optical assembly apply correspondingly to the proposed optical system and / or the proposed projection exposure apparatus and vice versa.

[0044] Other possible implementations of the present invention also include combinations not explicitly mentioned of features or embodiments described above or below with respect to the exemplary embodiments. Those skilled in the art will also add individual aspects as improvements or supplements to the corresponding basic forms of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Further advantageous configurations and aspects of the invention are the subject matter of the dependent claims and of the exemplary embodiments of the invention described below.The invention will be explained in detail below based on preferred embodiments with reference to the drawings.

[0046] Figure 1 A schematic meridional cross section showing a projection exposure apparatus for EUV projection lithography;

[0047] Figure 2 Display according to Figure 1A schematic diagram of an embodiment of an optical system of a projection exposure apparatus;

[0048] Figure 3 Shown according to Figure 2 A schematic plan view of an optical system;

[0049] Figure 4 Shown according to Figure 2 A schematic side view of an optical system;

[0050] Figure 5 Shown according to Figure 4 Detail of view of V;

[0051] Figure 6 Shown for use according to Figure 2 A schematic cross-sectional view of an embodiment of a gravity compensator for an optical system;

[0052] Figure 7 Shown is the Figure 2 A schematic plan view of an embodiment of a spacer ring of an optical system;

[0053] Figure 8 Shown according to Figure 7 A schematic side view of a spacer ring;

[0054] Fig. 9 Shown according to Figure 2 A schematic side view of an optical system;

[0055] Fig.10 shows the installation according to Figure 2 A schematic plan view of an embodiment of a mounting arrangement of an optical system;

[0056] Fig.11 Shown according to Fig.10 Another schematic plan view of the mounting arrangement of; and

[0057] Fig.12 shows the method for exchanging Figure 2 Schematic plan view of an embodiment of a tool for optical components of an optical system.

[0058] Unless indicated to the contrary, identical or functionally identical elements are provided with the same reference numerals in the figures. It should also be noted that the illustrations in the figures are not necessarily drawn to scale. DETAILED DESCRIPTION

[0059] Figure 1An embodiment of a projection exposure apparatus 1 (lithography apparatus), in particular an EUV lithography apparatus, is shown. The embodiment of the illumination system 2 of the projection exposure apparatus 1 has, in addition to a light source or radiation source 3, an illumination optical unit 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a module separate from the rest of the illumination system 2. In this case, the illumination system 2 does not comprise the light source 3.

[0060] A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8. The reticle holder 8 is displaceable by a reticle displacement drive 9, in particular in a scanning direction.

[0061] Figure 1 By way of illustration, a Cartesian coordinate system is shown with an x-direction x, a y-direction y and a z-direction z. The x-direction x extends vertically into the plane of the drawing. The y-direction y extends horizontally and the z-direction z extends vertically. The scanning direction is Figure 1 The z direction z extends perpendicular to the object plane 6.

[0062] The projection exposure apparatus 1 comprises a projection optical unit 10. The projection optical unit 10 serves to image the object field 5 into an image field 11 in an image plane 12. The image plane 12 extends parallel to the object plane 6. In alternatives, angles between the object plane 6 and the image plane 12 other than 0° are also possible.

[0063] The structures on the reticle 7 are imaged onto a photosensitive layer of a wafer 13 arranged in the region of an image field 11 in an image plane 12. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be displaced, in particular in the y direction y, by a wafer displacement drive 15. The displacement of the reticle 7 on the one hand by the reticle displacement drive 9 and the displacement of the wafer 13 on the other hand by the wafer displacement drive 15 can be carried out synchronously with one another.

[0064] The light source 3 is an EUV radiation source. The light source 3 in particular emits EUV radiation 16, which is also referred to below as used radiation, illumination radiation or illumination light. The used radiation 16 in particular has a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, such as an LPP (laser produced plasma) source or a GDPP (gas discharge produced plasma) source. It can also be a synchrotron-based radiation source. The light source 3 can be a free electron laser (FEL).

[0065] The illumination radiation 16 emitted from the light source 3 is focused by the light collector 17. The light collector 17 may be a light collector having one or more ellipsoidal and / or hyperbolic reflective surfaces. The illumination radiation 16 may be incident on at least one reflective surface of the light collector 17 at grazing incidence (GI) (i.e., at an angle of incidence greater than 45°) or at normal incidence (NI) (i.e., at an angle of incidence less than 45°). The light collector 17 may be structured and / or coated to optimize its reflectivity for the radiation used and to suppress extraneous light.

[0066] The illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18 downstream of the light collector 17. The intermediate focal plane 18 may represent a separation between the radiation source module comprising the light source 3 and the light collector 17 and the illumination optical unit 4.

[0067] The exposure optical unit 4 comprises a deflection mirror 19 and a first facet mirror 20 downstream of the deflection mirror 19 in its beam path. The deflection mirror 19 can be a plane deflection mirror or, alternatively, a mirror with a beam influencing effect that goes beyond a pure deflection effect. Alternatively or additionally, the deflection mirror 19 can be in the form of a spectral filter, which separates the used light wavelength of the illumination radiation 16 from extraneous light of different wavelengths. If the first facet mirror 20 is arranged in a plane of the illumination optical unit 4 that is optically conjugate to the object plane 6 (as a field plane), this facet mirror is also referred to as a field facet mirror. The first facet mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Figure 1 Only some of these first facets 21 are shown by way of example.

[0068] The first facets 21 may be in the form of macroscopic facets, in particular rectangular facets or facets with an arcuate edge profile or an edge profile formed as a part of a circle. The first facets 21 may be in the form of planar facets or, alternatively, convexly or concavely curved facets.

[0069] As is known, for example, from DE 10 2008 009 600 A1, the first facets 21 themselves can also each consist of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirrors 20 can be in particular in the form of a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1.

[0070] The illuminating radiation 16 propagates horizontally (ie in the y-direction y) between the light collector 17 and the deflection mirror 19 .

[0071] In the beam path of the illumination optical unit 4, the second facet reflector 22 is downstream of the first facet reflector 20. If the second facet reflector 22 is arranged in the pupil plane of the illumination optical unit 4, it is also referred to as a pupil facet reflector. The second facet reflector 22 can also be spaced apart from the pupil plane of the illumination optical unit 4. In this case, the combination of the first facet reflector 20 and the second facet reflector 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1614 008 B1 and US 6,573,978.

[0072] The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also called pupil facets.

[0073] The second facets 23 can likewise be macroscopic facets which can have, for example, circular, rectangular or hexagonal boundaries, or alternatively facets consisting of micromirrors. For details, reference is also made to DE 10 2008 009 600 A1.

[0074] The second facet 23 may have a planar or, alternatively, a convexly or concavely curved reflecting surface.

[0075] The illumination optical unit 4 thus forms a two-facet system. This basic principle is also known as a fly's eye integrator.

[0076] It may be advantageous to arrange the second facet mirror 22 not exactly in a plane optically conjugate to the pupil plane of the projection optical unit 10. In particular, the second facet mirror 22 may be arranged tilted relative to the pupil plane of the projection optical unit 10, as described, for example, in DE 10 2017 220 586 A1.

[0077] The second facet mirror 22 serves to image the individual first facets 21 into the object field 5 . The second facet mirror 22 is the last beam-shaping mirror in the beam path upstream of the object field 5 or indeed the last mirror for the illumination radiation 16 .

[0078] In a further embodiment (not shown) of the illumination optical unit 4, a transfer optical unit can be arranged in the beam path between the second facet mirror 22 and the object field 5 and in particular contribute to the imaging of the first facet 21 into the object field 5. The transfer optical unit can have exactly one mirror or alternatively two or more mirrors, which are arranged one behind the other in the beam path of the illumination optical unit 4. The transfer optical unit can in particular comprise one or two normal incidence mirrors (NI mirrors) and / or one or two grazing incidence mirrors (GI mirrors).

[0079] exist Figure 1In the embodiment shown, the illumination optical unit 4 has, downstream of the light collector 17 , exactly three mirrors, in particular a deflection mirror 19 , a first facet mirror 20 and a second facet mirror 22 .

[0080] In another embodiment of the illumination optical unit 4 , the deflection mirror 19 can also be omitted and the illumination optical unit 4 can therefore then have exactly two mirrors downstream of the light collector 17 , in particular a first facet mirror 20 and a second facet mirror 22 .

[0081] The imaging of the first facet 21 into the object plane 6 by the second facet 23 or using the second facet 23 and the transfer optics is usually only an approximate imaging.

[0082] The projection optical unit 10 comprises a plurality of mirrors Mi which are numbered consecutively according to their arrangement in the beam path of the projection exposure apparatus 1 .

[0083] exist Figure 1 In the example shown, the projection optical unit 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or any other number of mirrors Mi are also possible. The projection optical unit 10 is a doubly shielded optical unit. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optical unit 10 has an image-side numerical aperture which is greater than 0.5 and may also be greater than 0.6 and may be, for example, 0.7 or 0.75.

[0084] The reflective surface of the reflector Mi can be in the form of a free-form surface without an axis of rotational symmetry. Alternatively, the reflective surface of the reflector Mi can be in the form of an aspherical surface with exactly one axis of rotational symmetry of the shape of the reflective surface. Just like the reflectors of the illumination optical unit 4, the reflector Mi can have a highly reflective coating for the illumination radiation 16. These coatings can take the form of multilayer coatings, in particular with alternating layers of molybdenum and silicon.

[0085] The projection optical unit 10 has a large object-image offset in the y direction y between the y coordinate of the center of the object field 5 and the y coordinate of the center of the image field 11. This object-image offset in the y direction y can have approximately the same magnitude as the z distance between the object plane 6 and the image plane 12.

[0086] The projection optical unit 10 may have a deformable design in particular. It has different imaging ratios βx, βy in particular in the x-direction x and the y-direction y. The two imaging ratios βx, βy of the projection optical unit 10 are preferably (βx, βy) = (+ / -0.25, + / -0.125). A positive imaging ratio β means imaging without image inversion. A negative sign of the imaging ratio β means imaging with image inversion.

[0087] The projection optical unit 10 thus results in a reduction in size in the x-direction x, ie in a direction perpendicular to the scanning direction, by a ratio of 4:1.

[0088] The projection optical unit 10 results in a size reduction in the y-direction y (ie in the scanning direction) of a ratio of 8:1.

[0089] Other imaging ratios are likewise possible. Imaging ratios with the same sign and the same absolute value in the x-direction x and the y-direction y are also possible, for example with an absolute value of 0.125 or 0.25.

[0090] The number of intermediate image planes in the x-direction x and in the y-direction y in the beam path between the object field 5 and the image field 11 may be the same or may be different, depending on the embodiment of the projection optical unit 10. Examples of projection optical units with different numbers of such intermediate images in the x-direction x and in the y-direction y are known from US 2018 / 0074303 A1.

[0091] In each case, one of the second facets 23 is assigned to exactly one of the first facets 21 for forming a corresponding illumination channel for illuminating the object field 5. This can in particular produce an illumination according to the Köhler principle. The far field is decomposed into a plurality of object fields 5 by means of the first facets 21. The first facets 21 produce a plurality of images of the intermediate focus on the second facets 23 respectively assigned to them.

[0092] The first facets 21 are each imaged onto the reticle 7 and overlap one another via the associated second facets 23 for the purpose of illuminating the object field 5. The illumination of the object field 5 is in particular as homogeneous as possible. It preferably has a homogeneity error of less than 2%. Field homogeneity can be achieved by superimposing different illumination channels.

[0093] The illumination of the entrance pupil of the projection optical unit 10 can be geometrically defined by the arrangement of the second facets 23. The intensity distribution in the entrance pupil of the projection optical unit 10 can be set by selecting the illumination channels, in particular the subset of the second facets 23, through which the light is guided. This intensity distribution is also referred to as illumination setting or illumination pupil filling.

[0094] An equally preferred pupil homogeneity in the region of the portion of the illumination pupil of the illumination optical unit 4 which is illuminated in a defined manner can be achieved by redistribution of the illumination channels.

[0095] Further aspects and details of the illumination of the object field 5 and in particular the entrance pupil of the projection optical unit 10 are described below.

[0096] The projection optical unit 10 may in particular have a concentric entrance pupil. The latter may be accessible. It may also be inaccessible.

[0097] The entrance pupil of the projection optical unit 10 cannot usually be accurately illuminated with the second facet mirror 22. In the case of an imaging process in which the center of the second facet mirror 22 is telecentrically imaged onto the projection optical unit 10 on the wafer 13, the aperture rays usually do not intersect at a single point. However, a region can be found in which the spacing of the aperture rays determined in pairs is minimized. This region represents the entrance pupil or a region conjugate therewith in real space. In particular, this region exhibits a finite curvature.

[0098] It may be the case that the projection optical unit 10 has different postures of the entrance pupil for the tangential beam path and for the sagittal beam path. In this case, an imaging element, in particular an optical structural element of the transfer optical unit, should be provided between the second facet mirror 22 and the reticle 7. With the help of this optical element, the different postures of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

[0099] In the components of the illumination optical unit 4 Figure 1 In the arrangement shown, the second facet mirror 22 is arranged in a region conjugate with the entrance pupil of the projection optical unit 10. The first facet mirror 20 is arranged tilted relative to the object plane 6. The first facet mirror 20 is arranged tilted relative to the arrangement plane defined by the deflection mirror 19. The first facet mirror 20 is arranged tilted relative to the arrangement plane defined by the second facet mirror 22.

[0100] Figure 2 A schematic diagram of an embodiment of an optical system 100 for a projection exposure apparatus 1 is shown.

[0101] The optical system 100 can be part of a projection optical unit 10 as described above. However, the optical system 100 can also be part of an illumination optical unit 4 as described above. However, it is assumed below that the optical system 100 is part of a projection optical unit 4 of this type. The optical system 100 is suitable for DUV lithography. However, the optical system 100 can also be suitable for EUV lithography.

[0102] The optical system 100 includes an optical component 102. The optical component 102 may be a reflector. The optical component 102 includes an optically active surface 104. The optically active surface 104 is a reflector surface. The optically active surface 104 is adapted to reflect the illumination radiation 16. The optically active surface 104 may be Figure 2 Orientation in the upward or downward orientation.

[0103] In addition to the optical assembly 102, the optical system 100 also includes a manipulator frame 106. The optical assembly 102 is coupled to the manipulator frame 106. The nature of the coupling between the optical assembly 102 and the manipulator frame 106 will be explained in detail below. The manipulator frame 106 carries the optical assembly 102.

[0104] The optical component 102 or the optically active surface 104 has six degrees of freedom, namely three degrees of freedom of translation along a first spatial direction or x-direction x, a second spatial direction or y-direction y and a third spatial direction or z-direction z, and three degrees of freedom of rotation about the x-direction x, the y-direction y and the z-direction z. This means that the position and orientation of the optical component 102 or the optically active surface 104 can be determined or described using six degrees of freedom.

[0105] The "position" of the optical component 102 or the optically active surface 104 is understood in particular to mean its coordinates or the coordinates of the measuring points provided on the optical component 102 relative to the x-direction x, the y-direction y and the z-direction z. The "orientation" of the optical component 102 or the optically active surface 104 is understood in particular to mean its tilt relative to the three directions x, y, z. This means that the optical component 102 or the optically active surface 104 can be tilted around the x-direction x, the y-direction y and the z-direction z.

[0106] This provides six degrees of freedom for the position and orientation of the optical component 102 or the optically active surface 104. The "pose" of the optical component 102 or the optically active surface 104 includes its position and its orientation. Therefore, the term "pose" can be replaced by the wording "position and orientation" and vice versa.

[0107] Figure 2 The actual pose IL of the optical assembly 102 or the optically effective surface 104 is shown in solid lines, and the target pose SL of the optical assembly 102 or the optically effective surface 104 is shown in dashed lines and has reference numerals 102' and 104', respectively. The actual pose IL of the manipulator frame 106 coupled to the optical assembly 102 is also depicted using solid lines. The target pose SL of the manipulator frame 106 is depicted using dashed lines and reference numeral 106'.

[0108] The optical component 102 together with the manipulator frame 106 can be brought from its actual pose IL to a target pose SL and vice versa. For example, the optical component 102 or the optically effective surface 104 satisfies certain optical specifications or requirements in the target pose SL that the optical component 102 or the optically effective surface 104 does not satisfy in the actual pose IL.

[0109] In order to move the optical component 102 from the actual pose IL to the target pose SL, the optical system 100 comprises an adjustment device 108. The adjustment device 108 is designed to adjust the optical component 102. In the present case, "adjustment" or "alignment" is to be understood as a change in the pose of the optical component 102 in particular. When the pose of the optical component 102 is changed, the manipulator frame 106 moves together with the optical component 102.

[0110] For example, the optical component 102 can be brought from an actual pose IL to a target pose SL and vice versa by means of the adjustment device 108. The optical component 102 can thus be adjusted or aligned in all six aforementioned degrees of freedom by means of the adjustment device 108. The adjustment device 108 is a known hexapod or can be referred to as a hexapod.

[0111] The adjustment device 108 includes a plurality of actuators 110, 112, 114, which are only Figure 2 1. The actuators 110, 112, 114 may also be referred to as actuator systems or actuator elements. The actuators 110, 112, 114 may be actuators referred to as bipods or may be referred to as bipods. Preferably, there are exactly three actuators 110, 112, 114, which are offset from each other by 120°. The actuators 110, 112, 114 preferably have the same design.

[0112] The actuators 110, 112, 114 are joined to the manipulator frame 106 by joints 116, only one of which is located at Figure 2 For example, an adhesive connection or a screw connection can be provided at each of the joint points 116. Preferably, there are exactly three joint points 116, wherein each joint point 116 is assigned an actuator 110, 112, 114.

[0113] Furthermore, each actuator 110, 112, 114 is coupled to the load-bearing structure 122 via two joints 118, 120, wherein only two joints are Figure 2 The bearing structure 122 may be a force frame or any other immovable structure. The bearing structure 122 may also be referred to as a fixture.

[0114] The actuators 110, 112, 114 can be used to move the manipulator frame 106 and the optical assembly 102 relative to the carrier structure 122. Each actuator 110, 112, 114 can be assigned two of the above-mentioned degrees of freedom. Therefore, three actuators 110, 112, 114 make it possible to adjust the optical assembly 102 in all six degrees of freedom.

[0115] The actuators 110, 112, 114 can be activated by means of an open-loop and closed-loop control unit 124 of the adjustment device 108 in order to adjust the optical assembly 102. All actuators 110, 112, 114 are operatively connected to the open-loop and closed-loop control unit 124, and thus the open-loop and closed-loop control unit 124 can adjust the optical assembly 102 in all six degrees of freedom together with the manipulator frame 106 by appropriately activating these actuators 110, 112, 114. This can be achieved based on sensor signals from a sensor system (not shown) that is capable of detecting an actual pose IL and a target pose SL of the optical assembly 102.

[0116] Figure 3 A schematic plan view of an optical system 100 is shown. Figure 4 A schematic side view of an optical system 100 is shown. Figure 5 Shown according to Figure 4 Detail of the view of V. Below, also refer to Figures 3 to 5 .

[0117] The optical assembly 102 comprises an optical element 126, in particular a reflector, and a mount 128 carrying the optical element 126. The optical element 126 comprises the aforementioned optically active surface 104. The optical element 126 is assigned a central axis or symmetry axis 130. The optical element 126 may be rotationally symmetric with respect to the symmetry axis 130. However, this is not mandatory.

[0118] The optical element 126 is also assigned a radial direction R. The radial direction R is oriented perpendicularly with respect to the symmetry axis 130 and is oriented away from the symmetry axis 130. The optical element 126 also has two semi-axes 132, 134 with respect to which the optical element 126 can be rotationally symmetrical.

[0119] The mounting member 128 may also be rotationally symmetric with respect to the axis of symmetry 130. The mounting member 128 has a mounting member lower portion 136 and a mounting member upper portion 138 positioned on the mounting member lower portion 136. The mounting member lower portion 136 and the mounting member upper portion 138 are annular. Therefore, the mounting member lower portion 136 may also be referred to as a lower mounting ring, and the mounting member upper portion 138 may be referred to as an upper mounting ring.

[0120] The optical element 126 is connected, in particular adhesively bonded, only to the mount upper part 138. The mount lower part 136 and the mount upper part 138 are connected to each other by means of connecting elements 140, 142, 144. The connecting elements 140, 142, 144 may be screws. Preferably, there are at least exactly three connecting elements 140, 142, 144, which are evenly distributed around the axis of symmetry 130. For example, the connecting elements 140, 142, 144 are offset from each other by 120°.

[0121] The mounting 128, in particular the mounting lower part 136, is mounted on the manipulator frame 106 by means of support units 146, 148, 150. The support units 146, 148, 150 are identical. Only the support unit 148 is discussed below. All statements about the support unit 148 apply accordingly to the support units 146, 150 and vice versa.

[0122] like Figure 5 As shown, a bearing unit 148 is arranged between the mount lower part 136 and the manipulator frame 106. The mount 128 is thus supported on the manipulator frame 106 by means of the bearing unit 148. The bearing unit 148 has a spherical element 152, which has a spherical flange 154 and a spherical section 156, which supports the spherical section 156. The bearing unit 148 is assigned a central axis or symmetry axis 158, relative to which the spherical element 152 is rotationally symmetrical.

[0123] The spherical flange 154 is fixedly connected to the manipulator frame 106. For example, the spherical flange 154 is screwed to the manipulator frame 106. The spherical portion 156 may be made of a ceramic material, in particular Si3N4. The spherical portion 156 may be screwed to the spherical flange 154.

[0124] In addition to the spherical element 152, the support unit 148 also includes a groove element 160. The groove element 160 is fixedly connected (e.g., screwed) to the mounting lower part 136. The groove element 160 has a V-shaped groove 162, which faces the spherical portion 156 and has two contact surfaces 164, 166 inclined toward each other. The spherical portion 156 contacts the contact surfaces 164, 166. The contact surfaces 164, 166 intersect in a common intersection line 168.

[0125] like Figure 3 As shown, the support units 146 , 148 , 150 are aligned such that the extensions 170 , 172 , 174 of the intersection lines 168 of all groove elements 160 of the support units 146 , 148 , 150 intersect in the symmetry axis 130 .

[0126] Now return to Figure 5 , a spacer 176 is positioned between the groove element 160 and the mount lower part 136. The spacer 176 may be a washer. There may be a plurality of spacers 176. The spacers make it possible to adjust the support unit 148 in the z-direction z.

[0127] like Figure 3 and Figure 4As shown, the optical assembly 102 includes a plurality of mounting posts 178, 180, 182. The mounting posts 178, 180, 182 are identical. In particular, there are exactly three mounting posts 178, 180, 182, which are evenly distributed around the symmetry axis 130. In particular, the mounting posts 178, 180, 182 are offset from each other by 120°. The mounting posts 178, 180, 182 are only connected to the lower mount portion 136, but not to the upper mount portion 138.

[0128] Each mounting column 178, 180, 182 is assigned exactly one support unit 146, 148, 150. As viewed along the z-direction z, the respective support unit 146, 148, 150 is positioned below its associated mounting column 178, 180, 182.

[0129] The optical system 100 also includes a locking frame 184 that is connected to the manipulator frame 106. The locking frame 184 is only Figure 4 The locking frame 184 makes it possible to apply a clamping force K to each mounting strut 178 , 180 , 182 . For this purpose, the locking frame 184 is movable in the z direction z. The clamping force K is introduced into the manipulator frame 106 via the mounting struts 178 , 180 , 182 and the support units 146 , 148 , 150 .

[0130] The optical system 100 is also assigned a plurality of gravity compensators 186, 188, 190, 192, 194, 196, the function of which will be explained in detail later. There may be any desired number of gravity compensators 186, 188, 190, 192, 194, 196. For example, there are exactly six gravity compensators 186, 188, 190, 192, 194, 196. The gravity compensators 186, 188, 190, 192, 194, 196 are positioned between the mounting posts 178, 180, 182. The gravity compensators 186, 188, 190, 192, 194, 196 are arranged between the mount lower portion 136 and the mount upper portion 138.

[0131] Figure 6 A schematic cross-sectional view of an embodiment of a gravity compensator 186 as described above is shown.

[0132] The gravity compensators 186, 188, 190, 192, 194, 196 are identical. In the following, only the gravity compensator 186 is discussed. All statements regarding the gravity compensator 186 apply correspondingly to the gravity compensators 188, 190, 192, 194, 196 and vice versa.

[0133] The gravity compensator 186 is assigned a center axis or axis of symmetry 198, about which it is rotationally symmetrical. A spacing ring 200 is positioned between the mounting lower part 136 and the mounting upper part 138. In the region of the gravity compensator 186, the spacing ring 200 contacts neither the mounting lower part 136 nor the mounting upper part 138. The spacing ring 200 has a hole 202. Each gravity compensator 186, 188, 190, 192, 194, 196 is assigned such a hole 202.

[0134] The mount lower portion 136 has a bore 204 containing a lower or first guide element 206. The first guide element 206 includes a mounting portion 208 supported on the mount lower portion 136 and a guide portion 210 extending into the bore 204. The mounting portion 208 may be threadedly connected to the mount lower portion 136. The guide portion 210 is tubular.

[0135] The upper mount portion 138 has a hole 212 containing an upper or second guide element 214. The second guide element 214 includes a bearing portion 216 that is supported on a bearing surface 218 of the hole 212. The second guide element 214 also has a guide portion 220 that faces the first guide element 206. The guide portion 220 is tubular. The second guide element 214 is not fixedly connected to the upper mount portion 138.

[0136] The spring element 222 is mounted on the guide parts 210, 220. The spring element 222 is a compression spring. The spring element 222 may be a cylindrical spring. The spring element 222 is supported on the mounting part 208 of the first guide element 206 and on the support part 216 of the second guide element 214. The spring element 222 passes through the hole 202 of the spacer ring 200.

[0137] The spring element 222 generates a spring force F oriented in the z-direction z. The spring force F acts oppositely to the force G of the weight of the optical element 126 acting on the mount upper portion 138. The spring force F and the gravity force G act in opposite directions. Thus, the gravity force G acts opposite to the z-direction z, while the spring force F acts in the z-direction.

[0138] Figure 7 A schematic plan view of an embodiment of a spacer ring 200 as described above is shown. Figure 8 A schematic side view of the spacer ring 200 is shown. Figure 7 and Figure 8 .

[0139] The spacer ring 200 is not rotationally symmetrical with respect to the axis of symmetry 130. The spacer ring 200 comprises a plurality of holes 202. Each hole 202 is assigned a gravity compensator 186, 188, 190, 192, 194, 196, whose spring element 222 passes through the respective hole 202.

[0140] The spacer ring 200 comprises a plurality of contact areas 224, 226, 228. Preferably, there are exactly three contact areas 224, 226, 228, which are evenly distributed around the axis of symmetry 130. The contact areas 224, 226, 228 are offset from one another by 120°. At the contact areas 224, 226, 228, the spacer ring 200 contacts both the mount lower part 136 and the mount upper part 138.

[0141] Each contact region 224, 226, 228 is assigned a support unit 146, 148, 150 and a mounting support 178, 180, 182. The connecting elements 140, 142, 144 pass through the contact regions 224, 226, 228. For this purpose, each contact region 224, 226, 228 has a hole 230, 232, 234. Each contact region 224, 226, 228 can have a plurality of holes 230, 232, 234. Therefore, each contact region 224, 226, 228 can also be assigned a plurality of connecting elements 140, 142, 144.

[0142] Each contact area 224, 226, 228 has a lower contact portion 236 extending from the bottom side of the spacer ring 200 and an upper contact portion 238 extending from the top side of the spacer ring 200. The lower mount portion 136 abuts the lower contact portion 236. The upper mount portion 138 abuts the upper contact portion 238.

[0143] The spacer ring 200 also includes non-contact areas 240, 242, 244 where the spacer ring 200 contacts neither the mounting lower part 136 nor the mounting upper part 138. This is achieved by the non-contact areas 240, 242, 244 having a lower wall thickness than the contact areas 224, 226, 228.

[0144] There are three non-contact areas 240, 242, 244, which are evenly distributed around the axis of symmetry 130. Contact areas 224, 226, 228 and non-contact areas 240, 242, 244 alternate, with the result that a non-contact area 240, 242, 244 is arranged between two contact areas 224, 226, 228 and vice versa. The holes 202 are only provided in the non-contact areas 240, 242, 244.

[0145] Fig. 9A schematic cross-sectional view of an optical system 100 is shown.

[0146] As described above, the optical element 126 is only connected to the upper mount portion 138, and not to the lower mount portion 136. In order to connect the optical element 126 to the upper mount portion 138, the upper mount portion 138 includes a plurality of small support feet 246 that are elastically deformable. The optically active surface 104 can be Fig. 9 Orientation in the upward or downward orientation.

[0147] Small support feet 246 extend from mount upper part 138 into mount upper part 138 opposite to radial direction R. In particular, small support feet 246 protrude into mount lower part 136. Small support feet 246 are evenly distributed around axis of symmetry 130.

[0148] The small support foot 246 and the upper part 138 of the mounting part are formed in one piece, in particular, they are formed in one piece from the same material. "Integrally" or "integrally" means in particular that the upper part 138 of the mounting part and the small support foot 246 are not composed of different sub-components, but form a common component. In contrast, "formed in one piece from the same material" means that the small support foot 246 and the upper part 138 of the mounting part are always made of the same material.

[0149] Only one small support foot 246 is discussed in more detail below. The small support foot 246 has a support portion 248 in the form of a wedge and having a support surface 250, on which the optical element 126 rests, and a spring portion 252 connecting the support portion 248 to the upper mount portion 138. The spring portion 252 is elastically deformable. The spring portion 252 is a leaf spring and can therefore also be referred to as such. The support surface 250 is inclined relative to the axis of symmetry 130.

[0150] The optical element 126 has a circumferential contact surface 254 which abuts the support surface 250 of the small support foot 246. For example, the contact surface 254 is adhesively bonded to the support surface 250. The adhesive bond can be established, for example, by means of a UV-curable adhesive. The contact surface 254 is inclined relative to the symmetry axis 130.

[0151] The optical element 126 also has a cylindrical radial scanning surface 256, which adjoins the contact surface 254. The radial scanning surface 256 is rotationally symmetric with respect to the symmetry axis 130. Adjoining the radial scanning surface 256 is an axial scanning surface 258, which annularly surrounds the symmetry axis 130. The axial scanning surface 258 is perpendicular to the symmetry axis 130.

[0152] Now return to Figure 4, the optical system 100 further includes a housing 260, which contains the manipulator frame 106 and the optical assembly 102. The manipulator frame 106 can also be positioned outside the housing 260. The housing 260 has an opening 262, which can be closed by a cover. Through the opening 262, the optical assembly 102 can be exchanged.

[0153] Fig.10 and Fig.11 Each shows a schematic diagram of an embodiment of a mounting arrangement 264 .

[0154] The mounting arrangement 264 comprises a measuring flange 266. The measuring flange may be part of a coordinate measuring machine. The mounting lower part 136 is mounted on the measuring flange 266 by means of the support units 146, 148, 150 as already described. In other words, the mounting of the mounting lower part 136 on the manipulator frame 106 is identical to the mounting of the mounting lower part 136 on the measuring flange 266.

[0155] The mounting arrangement 264 is assigned a measuring head 268 for measuring the mount lower part 136. The measuring head 268 can be operated in contact and / or non-contact mode. The measuring head 268 can include different (also exchangeable) sensors. The mount lower part 136 can be measured tactilely. This means scanning the mount lower part 136. The measuring head 268 can be part of the aforementioned coordinate measuring machine. The measuring head 268 makes it possible to determine an undesired tilting of the mount lower part 136. If the mount lower part 136 tilts, it is aligned and remeasured with the aid of the measuring head 268.

[0156] Then, a spacer ring 200 (not shown) is placed onto the mount lower part 136 and the mount upper part 138 is positioned onto the mount lower part 136. The mount upper part 138 and the mount lower part 136 are pre-aligned relative to each other. For this purpose, azimuth marks aligned relative to each other are added to the mount lower part 136 and the mount upper part 138. The marks can be read by means of a camera. The mount lower part 136 and the mount upper part 138 are not yet connected to each other by means of connecting elements 140, 142, 144.

[0157] like Fig.11 As shown, the mounting arrangement 264 has a clamp flange 270 that is designed to clamp the optical element 126. The clamp flange 270 includes a plurality of arms 272, 274, 276 on which the optical element 126 rests. As shown by arrows 278, the clamp flange 270 sets the optical element 126 downward on the small support feet 246 of the upper mount portion 138. Adhesive bonding of the optical element 126 to the upper mount portion 138 has not yet occurred. The lower mount portion 136 and the upper mount portion 138 are also not yet fixedly connected to each other.

[0158] A breakout may be provided on the optical element 126 so that the clamp flange 270 can clamp the optical element 126. Azimuth markings aligned with the markings on the mount upper portion 138 may also be provided on the optical element 126. To read the markings, a camera may be provided.

[0159] After the optical element 126 has been lowered onto the mount upper part 138, the optical element 126 is measured. For this purpose, the aforementioned measuring head 268 can be used. First, the optical element 126 is measured on the radial scanning surface 256. For this purpose, a confocal sensor with a deflection mirror can be used. It can be part of the measuring head 268. Then, the optical element 126 is measured on the axial scanning surface 258. For this purpose, the axial scanning surface 258 is scanned. This can be performed with the aid of the measuring head 268.

[0160] In order to align the optical element 126, the lower mount 136 is mounted radially offset from the upper mount 138 relative to the axis of symmetry 130. This produces a radial offset Δr between the lower mount 136 and the upper mount 138. The radial offset is preset based on the determination of a so-called CAA vector. The CAA vector can be determined with the aid of an assembly and / or calculation program. The upper mount 138 is then tapped until the calculated radial offset Δr is zero. The lower mount 136 is then screwed to the upper mount 138.

[0161] Then, as described above, the optical element 126 is measured on the scan surfaces 256, 258. This then results in a new radial offset Δr between the mount lower part 136 and the mount upper part 138. The iterative process makes it possible to minimize the radial offset Δr.

[0162] Residual errors can be minimized by aligning the optical element 126 in the upper mount part 138. To this end, the optical element 126 can be aligned on the small support feet 246 by tapping and sphering. The optical element 126 is then measured again on the scanning surfaces 256, 258. This is performed with the aid of the measuring head 268. If excessive residual errors are detected during the measurement, the upper mount part 138 is realigned relative to the lower mount part 136 in an iterative process.

[0163] Fig.12 A schematic diagram of an embodiment of a tool 280 for exchanging optical assemblies 102 is shown.

[0164] The tool 280 is designed to carry the optical assembly 102, including the mount 128 and the optical element 126, and insert them into the housing 260 through the opening 262 of the housing 260, as shown in FIG. Fig.12 As shown by arrow 282, tool 280 includes a track system with forks for supporting and moving optical assembly 102.

[0165] There is also a rail system on the manipulator frame 106. With the aid of the tool 280, the optical component 102 is lowered onto the spherical element 152 of the support unit 146, 148, 150. Via the rail system of the manipulator frame 106, the optical component 102 is supplied. As soon as the optical component 102 rests on the support unit 146, 148, 150, a clamping force K is applied to the mounting struts 178, 180, 182 with the aid of the locking frame 184. The manipulator frame 106 is then coupled to the actuators 110, 112, 114. As an alternative, the optical component 102 can also be coupled to the manipulator frame 106 with the aid of a clamping spindle.

[0166] Although the present invention has been described based on exemplary embodiments, the present invention can be modified in various ways.

[0167] Reference numerals list

[0168] 1Projection exposure equipment

[0169] 2 Lighting System

[0170] 3 Light Source

[0171] 4 Illumination optical unit

[0172] 5. Physical Field

[0173] 6 Object Plane

[0174] 7. Mask Master

[0175] 8 Mask Master Holder

[0176] 9Mask displacement driver

[0177] 10 Projection optics unit

[0178] 11 Image Field

[0179] 12 Image plane

[0180] 13 Chip

[0181] 14 Wafer Holder

[0182] 15 Chip shift driver

[0183] 16 Lighting Radiation

[0184] 17 light collector

[0185] 18 Intermediate focal plane

[0186] 19 Deflecting mirror

[0187] 20 First facet reflector

[0188] 21 First facet

[0189] 22 Second facet reflector

[0190] 23 Second facet

[0191] 100 optical system

[0192] 102 Optical components

[0193] 102' Optical Components

[0194] 104 optically effective surface

[0195] 104' optically effective surface

[0196] 106 manipulator frame

[0197] 106' manipulator frame

[0198] 108 Adjustment device

[0199] 110 Actuator

[0200] 112 Actuator

[0201] 114 Actuator

[0202] 116 junctions

[0203] 118 Junction Points

[0204] 120 junction points

[0205] 122 load-bearing structure

[0206] 124 Open-loop and closed-loop control units

[0207] 126 Optical elements

[0208] 128 mounting parts

[0209] 130 symmetry axis

[0210] 132 half shaft

[0211] 134 half shaft

[0212] 136 Mounting lower part

[0213] 138 Mounting upper part

[0214] 140Connection elements

[0215] 142Connection elements

[0216] 144Connection elements

[0217] 146 Support Unit

[0218] 148 Support Unit

[0219] 150 support unit

[0220] 152 Spherical elements

[0221] 154 spherical flange

[0222] 156 Spherical part

[0223] 158 symmetry axis

[0224] 160 groove element

[0225] 162 grooves

[0226] 164 contact surface

[0227] 166 contact surface

[0228] 168 intersecting lines

[0229] 170 extension

[0230] 172 extension

[0231] 174 extension

[0232] 176 Spacers

[0233] 178 Installation pillar

[0234] 180 installation support

[0235] 182 Installation pillar

[0236] 184 Locking frame

[0237] 186 Gravity Compensator

[0238] 188 Gravity Compensator

[0239] 190 Gravity Compensator

[0240] 192 Gravity Compensator

[0241] 194 Gravity Compensator

[0242] 196 Gravity Compensator

[0243] 198 symmetry axis

[0244] 200 Spacer Ring

[0245] 202 holes

[0246] 204 holes

[0247] 206 guide element

[0248] 208 Installation Section

[0249] 210 Guide Section

[0250] 212 holes

[0251] 214 guide element

[0252] 216 Supporting part

[0253] 218 bearing surface

[0254] 220 guide part

[0255] 222 Spring element

[0256] 224 contact area

[0257] 226 contact area

[0258] 228 contact area

[0259] 230 holes

[0260] 232 holes

[0261] 234 holes

[0262] 236 contact part

[0263] 238 contact part

[0264] 240 Area

[0265] Area 242

[0266] 244 Area

[0267] 246 small support feet

[0268] 248 Support part

[0269] 250 support surface

[0270] 252 Spring part

[0271] 254 contact surface

[0272] 256 scan surfaces

[0273] 258 Scanning Surface

[0274] 260 Shell

[0275] 262 Opening

[0276] 264 Installation Layout

[0277] 266 Measuring flange

[0278] 268 measuring head

[0279] 270 Clamp flange

[0280] 272 Arm

[0281] 274 Arm

[0282] 276 Arm

[0283] 278 Arrow

[0284] 280 Tools

[0285] 282 Arrow

[0286] F Spring force

[0287] G-Gravity

[0288] KClamping force

[0289] M1 Reflector

[0290] M2 Reflector

[0291] M3 Reflector

[0292] M4 Reflector

[0293] M5 Reflector

[0294] M6 Reflector

[0295] xx Direction

[0296] yy direction

[0297] zz direction

[0298] Δr offset

Claims

1. An optical assembly (102) for a projection exposure apparatus (1), comprising: an optical element (126), and a mounting member (128) which carries the optical element (126), The mounting member (128) comprises a mounting member lower portion (136) and a mounting member upper portion (138), wherein the mounting member upper portion (138) is detachably connected to the mounting member lower portion (136), wherein the optical element (126) is connected only to the upper portion (138) of the mount, and The upper portion (138) of the mounting member has a plurality of small, elastically deformable supporting feet (246), and the optical element (126) rests on the supporting feet (246).

2. The optical assembly according to claim 1, wherein the mount (128) has a spacer ring (200) arranged between the mount lower portion (136) and the mount upper portion (138), and wherein the spacer ring (200) has a contact area (224, 226, 228) and a non-contact area (240, 242, 244), the contact area (224, 226, 228) contacts both the mount lower portion (136) and the mount upper portion (138), and the non-contact area (240, 242, 244) contacts neither the mount lower portion (136) nor the mount upper portion (138).

3. The optical assembly according to claim 2, wherein: The contact areas (224, 226, 228) and the non-contact areas (240, 242, 244) alternate.

4. An optical component according to claim 2 or 3, wherein the lower mounting part (136) and the upper mounting part (138) are connected to each other by a connecting element (140, 142, 144), and wherein the connecting element (140, 142, 144) passes through a hole (230, 232, 234) provided on the contact area (224, 226, 228) and passes through the spacer ring (200).

5. The optical assembly of any one of claims 1 to 4, further comprising a plurality of mounting posts (178, 180, 182) to which a clamping force (K) can be applied to connect the optical assembly (100) to a manipulator frame (106), wherein the mounting posts (178, 180, 182) are mounted on the mount lower portion (136).

6. An optical component according to any one of claims 1 to 5, wherein the mount (128) has a plurality of gravity compensators (186, 188, 190, 192, 194, 196), the gravity compensators (186, 188, 190, 192, 194, 196) being arranged between the mount lower part (136) and the mount upper part (138) and being designed to apply a spring force (F) directed opposite to the force (G) of the weight of the optical element (126) to the mount upper part (138).

7. An optical component according to claim 6, wherein each gravity compensator (186, 188, 190, 192, 194, 196) has a first guide element (206) assigned to the lower part (136) of the mount, a second guide element (214) assigned to the upper part (138) of the mount, and a spring element (222) arranged between the first guide element (206) and the second guide element (214).

8. The optical assembly of claim 7, wherein the first guide element (206) is fixedly connected to the mount lower part (136), and wherein the second guide element (214) is linearly displaceably mounted on the guide upper part (138).

9. An optical assembly according to any one of claims 1 to 8, wherein each small supporting foot (246) has a supporting portion (248) and a spring portion (252), the optical element (126) resting on the supporting portion (248), and the spring portion (252) connects the supporting portion (248) to the upper portion (138) of the mounting member.

10. The optical assembly of any one of claims 1 to 9, wherein the small support feet (246) protrude from the mount upper part (138) into the mount lower part (136).

11. An optical system (100) for a projection exposure apparatus (1), comprising: An optical component (102) according to any one of claims 1 to 10, and A manipulator frame (106) is actuatable, carrying the optical assembly (102).

12. The optical system of claim 11, further comprising a locking frame (184) connected to the manipulator frame (106), wherein the optical assembly (102) is arranged between the manipulator frame (106) and the locking frame (184) so ​​as to apply a clamping force (K) to the mount (128).

13. The optical system according to claim 11 or 12, further comprising a plurality of support units (146, 148, 150), wherein the optical assembly (102) is mounted on the manipulator frame (106) via the support units (146, 148, 150), wherein each support unit (146, 148, 150) has a spherical element (152) and a groove element (160), wherein the groove element (160) at least partially receives the spherical element (152).

14. A projection exposure apparatus (1) having an optical component (102) according to any one of claims 1 to 10 and / or an optical system (100) according to any one of claims 11 to 13.

Images