KrF / ArF photoresist continuous flow synthesis process and production device

Abstract

The invention belongs to the technical field of photoresist production, and discloses a KrF / ArF photoresist continuous flow synthesis process and production device, and the KrF / ArF photoresist continuous flow synthesis process and production device further comprises a shunting assembly which is arranged in a reactor body and can divide entering raw materials into a plurality of parts; the stirring assembly is arranged at the top end of the reactor body; raw materials can be stirred; the plugging mechanism is arranged at the bottom end of the reactor body; wherein the plugging mechanism comprises a square shell; according to the invention, photoresist is completely pushed out of the shunting pipe at one time through air pressure in the shunting pipe, and finally, the shunting pipe is divided into a plurality of parts, and the photoresist in the shunting pipe can be completely discharged out of the reactor body at one time by using the air pressure, so that the photoresist is prevented from continuously reacting in the reactor body; the occurrence of side reactions can be reduced, the deterioration and pollution risks of the photoresist are reduced, and the quality stability and consistency of a final product can be improved.

Description

Technical Field

[0001] The invention belongs to the technical field of photoresist production, in particular to a KrF / ArF photoresist continuous flow synthesis process and a production device. Background Art

[0002] The KrF / ArF photoresist continuous flow synthesis process and production device is a combination of advanced technologies and equipment specifically used for efficient and continuous production of KrF and ArF photoresists; At present, the traditional KrF / ArF photoresist continuous flow synthesis production device is to accurately measure and deeply purify a variety of key raw materials in strict proportions, and then smoothly and continuously pump them into a microreactor or tubular reactor through a gear pump. Through the stirring system, temperature control, and pressure regulation, the polymerization reaction of the photoresist can be carried out efficiently and controllably. After the polymerization reaction is completed, the solid impurities and excess solvents in the reaction product are filtered out and then discharged.

[0003] However, in actual operation, especially in the process of discharging the completed photoresist from the reactor, the traditional method mostly uses pipette suction. Although this method is easy to operate, the discharge speed is relatively slow, resulting in a relatively high temperature and pressure environment inside the reactor. Under such conditions, even if the polymerization reaction is theoretically completed, the residual monomers or oligomers in the photoresist may continue to undergo side reactions, which will not only affect the purity of the final product, but may also cause fluctuations in key performance indicators such as the viscosity and exposure sensitivity of the photoresist, thereby reducing the overall quality stability and batch-to-batch consistency of the product. Summary of the invention

[0004] In order to solve the above-mentioned background technology, the present invention provides a KrF / ArF photoresist continuous flow synthesis process and a production device.

[0005] To achieve the above object, the present invention provides the following technical solution: a KrF / ArF photoresist continuous flow synthesis process, including a reactor body, and the synthesis process is as follows: S1: Precisely mix and purify monomers, photosensitizers, solvents and other raw materials to ensure the quality of reactants; S2: pumping the raw materials into a microreactor or tubular reactor through a gear pump, and achieving polymerization of the photoresist by stirring, controlling temperature, pressure and flow rate; S3: Use online analytical technology to monitor the reaction process in real time to ensure product quality; S4: Remove impurities and adjust the viscosity and concentration of the photoresist through continuous filtration and desolvation steps.

[0006] The KrF / ArF photoresist continuous flow synthesis production device also includes: a flow splitting component, which is arranged inside the reactor body and can divide the incoming raw materials into multiple portions; A stirring assembly, which is disposed at the top of the reactor body and is capable of stirring the raw materials; A plugging mechanism, which is arranged at the bottom end of the reactor body; The blocking mechanism comprises a square shell, the bottom end of the reactor body is fixedly mounted on the square shell, a fixing block is arranged inside the square shell, a blocking block is arranged on the top of the fixing block, a connecting rod located inside the fixing block is fixedly mounted on the bottom end of the blocking block, a connecting plate is fixedly mounted on the bottom end of the connecting rod, a sliding groove is provided on the surface of the connecting plate, a hydraulic cylinder is fixedly mounted on the inner wall of the fixing block, and a sliding block located inside the sliding groove is fixedly mounted on the output shaft of the hydraulic cylinder; The limiting component is arranged inside the fixing block and can limit the connection plate.

[0007] Preferably, the diversion assembly includes: a partition plate, the partition plate is fixedly connected to the interior of the reactor body, a high-temperature butterfly valve is fixedly installed on the bottom end of the partition plate, a diversion pipe is fixedly installed on the bottom end of the high-temperature butterfly valve, a heating cylinder is fixedly installed on the bottom end of the partition plate, an exhaust duct is fixedly installed on the interior of the reactor body, and the exhaust duct is connected to the diversion pipe.

[0008] Preferably, the stirring assembly comprises a motor, the motor is fixedly connected to the top of the reactor body, a rotating rod located inside the reactor body is fixedly mounted on the output end of the motor, and a stirring paddle is fixedly connected to the surface of the rotating rod.

[0009] Preferably, it also includes: a sealing mechanism, which is arranged at the top of the interior of the fixed block, the sealing mechanism includes a spring 1, the spring 1 is fixedly connected to the top of the interior of the fixed block, a mounting plate is fixedly installed at the bottom end of the spring 1, four fixing grooves are opened on the inner wall of the fixed block, a sealing plate is slidably connected inside the fixing groove, and the mounting plate is fixedly connected to the sealing plate, and a connecting block is fixedly installed at one end of the mounting plate close to the center of the fixed block; A driving assembly, which is arranged on the surface of the connecting rod and can drive the sealing mechanism to work; The filter component is arranged inside the square shell and is connected to the fixing groove, and can filter the photoresist.

[0010] Preferably, the driving assembly includes an extrusion block 1, which is fixedly connected to the surface of the connecting rod, a fixed shell is fixedly installed on the top of the fixed block, an air intake pipe located at the bottom of the extrusion block 1 is fixedly installed on the top of the fixed shell, an extrusion block 2 is slidably connected to the inside of the fixed shell, and the fixed shell and the extrusion block 2 are elastically connected by a spring 2.

[0011] Preferably, the limiting assembly comprises a limiting rod, the limiting rod is fixedly connected to the inside of the fixing block, the surface of the limiting rod is slidably connected to the limiting block, and one side of the limiting block is connected to the connecting plate.

[0012] Preferably, the filter assembly includes an ultrafilter, the ultrafilter is fixedly connected to the inside of the square shell, and a discharge pipe is provided on one side of the ultrafilter.

[0013] Preferably, a sealing ring located at the top of the fixing block is fixedly installed on the surface of the reactor body, and a gap is provided between the reactor body, the square shell and the fixing block.

[0014] Preferably, the slide groove is designed as an inclined surface, the surface of the slider is designed to be smooth, and the slider is fully fitted with the inner wall of the slide groove.

[0015] Compared with the prior art, the present invention has the following beneficial effects: The present invention divides the combined raw materials into multiple parts by using a shunt pipe, and drives the hydraulic cylinder to make its output shaft pull the slider to slide inside the slide groove, the slider drives the connecting plate and the connecting rod to descend, the connecting rod drives the blocking block away from the bottom end of the shunt pipe, and then the blocking of the shunt pipe can be cancelled, and then the photoresist is pushed out of the shunt pipe at one time by the air pressure inside the shunt pipe, and finally the shunt pipe is divided into multiple parts and the air pressure is used to discharge the photoresist inside the shunt pipe at one time from the inside of the reactor body, so that the photoresist is prevented from continuing to react in the reactor body, the occurrence of side reactions can be reduced, the risk of deterioration and pollution of the photoresist is reduced, and the quality stability and consistency of the final product are improved; The present invention drives the extrusion block 1 to descend when the connecting rod descends, and the extrusion block 1 will squeeze the air inside the fixed shell, and the squeezed air will push the extrusion block 2 to move, and the spring 2 will be stretched, and then the extrusion block 2 will squeeze and push the connecting block to descend, and the connecting block will drive the sealing plate to cancel the blockage of the fixed groove, and finally through the design of the sealing plate, the fixed groove can be blocked, thereby preventing impurities in the air from entering the interior of the filter component, and after the photoresist is discharged, the sealing plate is reset, and the fixed groove can be blocked again to ensure the filtering effect of the photoresist. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1It is a schematic diagram of the structure of the present invention; Figure 2 It is a schematic diagram of a cross-sectional view of a reactor of the present invention; Figure 3 This is a schematic diagram showing the connection pipeline of the present invention; Figure 4 This is a schematic diagram of a cross-sectional square shell of the present invention; Figure 5 This is a schematic diagram of a cross-sectional fixed block of the present invention; Figure 6 This is a schematic diagram showing the blocking mechanism of the present invention; Figure 7 This is a schematic diagram of the working process of the blocking block of the present invention; Figure 8 It is a schematic diagram of a cross-section fixed shell of the present invention.

[0017] In the figure: 1, reactor body; 2, flow dividing assembly; 201, partition plate; 202, flow dividing pipe; 203, heating cylinder; 204, air extraction channel; 205, high temperature butterfly valve; 3, blocking mechanism; 301, fixing block; 302, blocking block; 303, connecting rod; 304, connecting plate; 305, slide groove; 306, hydraulic cylinder; 307, slider; 308, square shell; 4, sealing mechanism; 401, spring 1; 402, mounting plate; 40 3. Sealing plate; 404. Fixing groove; 405. Connecting block; 5. Driving assembly; 501. Extrusion block 1; 502. Fixing shell; 503. Inlet pipe; 504. Extrusion block 2; 505. Spring 2; 6. Limiting assembly; 601. Limiting rod; 602. Limiting block; 7. Stirring assembly; 701. Motor; 702. Rotating rod; 703. Stirring paddle; 8. Filtering assembly; 801. Ultrafiltration; 802. Discharge pipe; 9. Sealing ring. DETAILED DESCRIPTION

[0018] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0019] like Figures 1 to 8 As shown, the present invention provides a KrF / ArF photoresist continuous flow synthesis process, including a reactor body 1, and the synthesis process is as follows: S1: Precisely mix and purify monomers, photosensitizers, solvents and other raw materials to ensure the quality of reactants; S2: pumping the raw materials into a microreactor or tubular reactor through a gear pump, and achieving polymerization of the photoresist by stirring, controlling temperature, pressure and flow rate; S3: Use online analytical technology to monitor the reaction process in real time to ensure product quality; S4: Remove impurities and adjust the viscosity and concentration of the photoresist through continuous filtration and desolvation steps.

[0020] like Figures 1 to 8 As shown, the flow splitting component 2 is arranged inside the reactor body 1, and can divide the incoming raw materials into multiple parts; A stirring assembly 7, which is disposed at the top of the reactor body 1 and can stir the raw materials; A plugging mechanism 3, which is arranged at the bottom end of the reactor body 1; The blocking mechanism 3 includes a square shell 308, the square shell 308 is fixedly mounted with the bottom end of the reactor body 1, a fixed block 301 is arranged inside the square shell 308, a blocking block 302 is arranged at the top of the fixed block 301, a connecting rod 303 located inside the fixed block 301 is fixedly mounted at the bottom end of the blocking block 302, a connecting plate 304 is fixedly mounted at the bottom end of the connecting rod 303, a slide groove 305 is provided on the surface of the connecting plate 304, a hydraulic cylinder 306 is fixedly mounted on the inner wall of the fixed block 301, and a slider 307 located inside the slide groove 305 is fixedly mounted on the output shaft of the hydraulic cylinder 306; The limiting assembly 6 is arranged inside the fixing block 301 and can limit the connection plate 304 .

[0021] According to the above scheme, the operator uses a gear pump to pump the raw materials into the reactor body 1 in proportion, and then drives the stirring component 7 to stir the raw materials, so as to fully combine the various raw materials, and then drives the diversion component 2 to divide the raw materials into multiple portions, and the raw materials are reacted for several hours by vacuum and heating; After the reaction is completed, the hydraulic cylinder 306 can be driven to make its output shaft pull the slider 307 to slide inside the slide groove 305, and then through the limit of the limit assembly 6, the slider 307 will drive the connecting plate 304 to descend, the connecting plate 304 will drive the connecting rod 303 to move, and the connecting rod 303 will drive the blocking block 302 away from the bottom end of the shunt tube 202, thereby canceling the blockage of the shunt tube 202, and then through the air pressure inside the shunt tube 202, the photoresist is pushed out of the inside of the shunt tube 202 at one time, and finally, by dividing the shunt tube 202 into multiple pieces and using air pressure, the photoresist inside the shunt tube 202 can be discharged from the inside of the reactor body 1 at one time, so as to avoid the photoresist from continuing to react in the reactor body 1, reduce the occurrence of side reactions, reduce the risk of deterioration and contamination of the photoresist, and help improve the quality stability and consistency of the final product.

[0022] like Figure 2 , Figure 3 and Figure 4As shown, the diversion component 2 includes: a partition plate 201, the partition plate 201 is fixedly connected to the inside of the reactor body 1, a high-temperature butterfly valve 205 is fixedly installed at the bottom end of the partition plate 201, a diversion pipe 202 is fixedly installed at the bottom end of the high-temperature butterfly valve 205, a heating tube 203 is fixedly installed at the bottom end of the partition plate 201, and an exhaust duct 204 is fixedly installed inside the reactor body 1, and the exhaust duct 204 is connected to the diversion pipe 202.

[0023] The above scheme is adopted: through the design of the diversion component 2, after the raw material is injected into the reactor body 1, it will remain on the top of the partition plate 201, and then after the stirring is completed, the high-temperature butterfly valve 205 can be opened. Since the holes on the surface of the partition plate 201 are aligned with the high-temperature butterfly valve 205, the stirred raw material will pass through the holes on the surface of the partition plate 201 and the high-temperature butterfly valve 205, and enter the inside of the diversion tube 202, and then drive the heating wire inside the heating tube 203 to heat the raw material inside the diversion tube 202. During the heating process, the vacuum pump is connected to the exhaust duct 204, and the vacuum pump is driven to make the exhaust duct 204 vacuum the inside of the diversion tube 202, and then after several hours of reaction, the raw material is processed into photoresist.

[0024] like Figure 2 As shown, the stirring assembly 7 includes a motor 701, which is fixedly connected to the top of the reactor body 1. A rotating rod 702 located inside the reactor body 1 is fixedly installed at the output end of the motor 701, and a stirring paddle 703 is fixedly connected to the surface of the rotating rod 702.

[0025] The above solution is adopted: through the design of the stirring component 7, the motor 701 can be driven to rotate the rotating rod 702, and the rotating rod 702 will drive the stirring paddle 703 to rotate, and the rotating stirring paddle 703 can stir the raw materials to fully combine the raw materials.

[0026] like Figure 5 , Figure 6 , Figure 7 and Figure 8 As shown, it also includes: a sealing mechanism 4, which is arranged at the top of the interior of the fixed block 301, and the sealing mechanism 4 includes a spring 1 401, and the spring 1 401 is fixedly connected to the top of the interior of the fixed block 301, and a mounting plate 402 is fixedly installed at the bottom end of the spring 1 401, and four fixing grooves 404 are opened on the inner wall of the fixed block 301, and a sealing plate 403 is slidably connected inside the fixing groove 404, and the mounting plate 402 is fixedly connected to the sealing plate 403, and a connecting block 405 is fixedly installed at one end of the mounting plate 402 close to the center of the fixed block 301; A driving assembly 5, which is disposed on the surface of the connecting rod 303 and can drive the sealing mechanism 4 to work; The filter assembly 8 is disposed inside the square shell 308 and is connected to the fixing groove 404 , and is capable of filtering the photoresist.

[0027] The above scheme is adopted: through the design of the sealing mechanism 4, when the connecting rod 303 moves, the driving assembly 5 will be linked to move, and the driving assembly 5 will drive the connecting block 405 to descend, and the connecting block 405 will drive the mounting plate 402 and the sealing plate 403 to descend. In the process of the mounting plate 402 descending, the spring 401 will be stretched, and then the sealing plate 403 will cancel the blockage of the fixed groove 404, and the photoresist will pass through the fixed groove 404 and flow into the interior of the filter assembly 8, and the filter assembly 8 can filter the photoresist. After the photoresist is discharged from the inside of the shunt pipe 202, the hydraulic cylinder 306 can be driven again to reset the blocking block 302, and then the driving assembly 5 will also be reset, and the sealing plate 403 can block the fixed groove 404 again to prevent dust from entering the interior of the filter assembly 8 along the fixed groove 404.

[0028] like Figure 8 As shown, the driving assembly 5 includes an extrusion block 501, which is fixedly connected to the surface of the connecting rod 303, a fixed shell 502 is fixedly installed on the top of the fixed block 301, an air intake pipe 503 located at the bottom of the extrusion block 501 is fixedly installed on the top of the fixed shell 502, an extrusion block 504 is slidably connected inside the fixed shell 502, and the fixed shell 502 and the extrusion block 504 are elastically connected by a spring 505.

[0029] The above scheme is adopted: through the design of the driving component 5, when the connecting rod 303 descends, the extrusion block 1 501 will be driven to descend, and then the extrusion block 1 501 will enter the interior of the air intake pipe 503 and squeeze the air inside the fixed shell 502, and then the squeezed air will push the extrusion block 2 504 to move, and in the process of the extrusion block 2 504 moving, the spring 2 505 will be stretched, and then the extrusion block 2 504 will contact one side of the connecting block 405. Since the extrusion block 2 504 and one side of the connecting block 405 are both inclined designs, the extrusion block 2 504 will squeeze and push the connecting block 405 to descend, and the connecting block 405 will drive the sealing plate 403 to cancel the blocking of the fixed groove 404. Finally, through the design of the sealing plate 403, the fixed groove 404 can be blocked, thereby preventing impurities in the air from entering the interior of the filter component 8, and after the photoresist is discharged, the sealing plate 403 is reset, and then the fixed groove 404 can be blocked again to ensure the filtering effect of the photoresist.

[0030] like Figure 5 and Figure 7As shown, the limiting assembly 6 includes a limiting rod 601 , which is fixedly connected to the inside of the fixing block 301 , and the surface of the limiting rod 601 is slidably connected to the limiting block 602 , and one side of the limiting block 602 is connected to the connecting plate 304 .

[0031] The above solution is adopted: through the design of the limit assembly 6, when the connecting plate 304 moves, it will drive the limit block 602 to slide on the surface of the limit rod 601, and then the limit rod 601 can limit the limit block 602 and the connecting plate 304, thereby ensuring the stability of the movement of the connecting plate 304.

[0032] like Figure 4 As shown, the filter assembly 8 includes an ultrafilter 801 , which is fixedly connected to the interior of the square shell 308 , and a discharge pipe 802 is provided on one side of the ultrafilter 801 .

[0033] The above solution is adopted: through the design of the filter component 8, when the sealing plate 403 cancels the blockage of the fixed groove 404, the photoresist flowing into the top of the fixed block 301 will pass through the fixed groove 404 and enter the interior of the ultrafiltration 801, and the ultrafiltration 801 can filter the photoresist, and after the filtering is completed, it can be discharged from the inside of the discharge pipe 802.

[0034] like Figure 1 , Figure 2 and Figure 4 As shown, a sealing ring 9 located at the top of the fixed block 301 is fixedly installed on the surface of the reactor body 1, and a gap is provided between the reactor body 1 and the square shell 308 and the fixed block 301. The slide groove 305 is designed as an inclined surface, the surface of the slider 307 is designed as a smooth surface, and the slider 307 is fully fitted with the inner wall of the slide groove 305.

[0035] The above scheme is adopted: through the design of the sealing ring 9, since a gap is provided between the reactor body 1 and the square shell 308, heat will not be transferred to the inside of the square shell 308 during the heating process of the heating tube 203, and the sealing ring 9 can seal the gap between the reactor body 1 and the square shell 308 and the fixed block 301. Through the design of the slide groove 305 and the slider 307, since the slide groove 305 is inclined, the slider 307 will move in the inclined direction, thereby driving the connecting plate 304 to move, and the slider 307 is fully fitted with the inner wall of the slide groove 305, so that the slider 307 can move more smoothly.

[0036] The working principle and use process of the present invention: The operator uses a gear pump to draw various raw materials into the reactor body 1 in proportion, and then drives the motor 701 to make the stirring paddle 703 stir the raw materials, so as to fully combine the various raw materials. After the stirring is completed, the high-temperature butterfly valve 205 can be opened, and the raw materials will pass through the holes on the surface of the partition plate 201 and the high-temperature butterfly valve 205 to enter the inside of the shunt pipe 202. Then, the heating wire and vacuum pump inside the heating cylinder 203 are driven to vacuum the inside of the shunt pipe 202, and then after several hours of reaction, the raw materials are processed into photoresist; After the reaction is completed, the hydraulic cylinder 306 can be driven to make its output shaft pull the slider 307 to slide inside the slide groove 305, and the slider 307 will drive the connecting plate 304 and the connecting rod 303 to descend, and the connecting rod 303 will drive the blocking block 302 away from the bottom end of the shunt tube 202, so that the blocking of the shunt tube 202 can be cancelled, and then the photoresist can be pushed out of the shunt tube 202 at one time through the air pressure inside the shunt tube 202; At the same time, when the connecting rod 303 descends, it will drive the extrusion block 1 501 to descend, and the extrusion block 1 501 will squeeze the air inside the fixed shell 502. The squeezed air will push the extrusion block 2 504 to move, and the spring 2 505 will be stretched. Then the extrusion block 2 504 and the connecting block 405 will squeeze and push the connecting block 405 to descend. The connecting block 405 will drive the mounting plate 402 and the sealing plate 403 to descend, and the spring 1 401 will be stretched. Then the sealing plate 403 will cancel the blockage of the fixed groove 404, and the photoresist will pass through the fixed groove 404 and flow into the interior of the ultrafiltration 801. The ultrafiltration 801 can filter the photoresist. After the filtration is completed, it can be discharged from the inside of the discharge pipe 802, and finally the operation process is completed.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A KrF / ArF photoresist continuous flow synthesis process, comprising a reactor body (1), characterized in that: The synthesis process is as follows: S1: Precisely mix and purify monomers, photosensitizers, solvents and other raw materials to ensure the quality of reactants; S2: pumping the raw materials into a microreactor or tubular reactor through a gear pump, and achieving polymerization of the photoresist by stirring, controlling temperature, pressure and flow rate; S3: Use online analytical technology to monitor the reaction process in real time to ensure product quality; S4: Remove impurities and adjust the viscosity and concentration of the photoresist through continuous filtration and desolvation steps.

2. A KrF / ArF photoresist continuous flow synthesis production device for implementing the synthesis process of claim 1, wherein the reactor in step S2 comprises a reactor body (1), characterized in that: It also includes: a flow splitting component (2), which is arranged inside the reactor body (1) and can split the incoming raw materials into multiple portions; A stirring assembly (7) disposed at the top of the reactor body (1); It can stir the raw materials; A plugging mechanism (3) is arranged at the bottom end of the reactor body (1); The blocking mechanism (3) comprises a square shell (308), the square shell (308) being fixedly mounted with the bottom end of the reactor body (1), a fixing block (301) being arranged inside the square shell (308), a blocking block (302) being arranged at the top end of the fixing block (301), a connecting rod (303) located inside the fixing block (301) being fixedly mounted at the bottom end of the blocking block (302), a connecting plate (304) being fixedly mounted at the bottom end of the connecting rod (303), a sliding groove (305) being provided on the surface of the connecting plate (304), a hydraulic cylinder (306) being fixedly mounted on the inner wall of the fixing block (301), and a sliding block (307) located inside the sliding groove (305) being fixedly mounted on the output shaft of the hydraulic cylinder (306); A limiting component (6) is arranged inside the fixing block (301) and can limit the connection plate (304).

3. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: The flow diversion component (2) comprises: a partition plate (201), the partition plate (201) being fixedly connected to the inside of the reactor body (1), a high-temperature butterfly valve (205) being fixedly mounted on the bottom end of the partition plate (201), a flow diversion pipe (202) being fixedly mounted on the bottom end of the high-temperature butterfly valve (205), a heating cylinder (203) being fixedly mounted on the bottom end of the partition plate (201), and an exhaust duct (204) being fixedly mounted inside the reactor body (1), and the exhaust duct (204) being connected to the flow diversion pipe (202).

4. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: The stirring assembly (7) comprises a motor (701), the motor (701) being fixedly connected to the top of the reactor body (1), a rotating rod (702) located inside the reactor body (1) being fixedly mounted on the output end of the motor (701), and a stirring paddle (703) being fixedly connected to the surface of the rotating rod (702).

5. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: It also includes: a sealing mechanism (4) which is arranged at the top end of the fixed block (301), the sealing mechanism (4) including a spring 1 (401), the spring 1 (401) being fixedly connected to the top end of the fixed block (301), a mounting plate (402) being fixedly mounted on the bottom end of the spring 1 (401), four fixing grooves (404) being provided on the inner wall of the fixed block (301), a sealing plate (403) being slidably connected inside the fixing groove (404), the mounting plate (402) being fixedly connected to the sealing plate (403), and a connecting block (405) being fixedly mounted on one end of the mounting plate (402) close to the center of the fixed block (301); A driving assembly (5), which is arranged on the surface of the connecting rod (303) and is capable of driving the sealing mechanism (4) to work; A filter component (8) is arranged inside the square shell (308); the filter component (8) is connected to the fixing groove (404) and is capable of filtering the photoresist.

6. The KrF / ArF photoresist continuous flow synthesis production device according to claim 5, characterized in that: The driving assembly (5) comprises an extrusion block 1 (501), the extrusion block 1 (501) being fixedly connected to the surface of a connecting rod (303), a fixed shell (502) being fixedly mounted on the top end of the fixed block (301), an air intake pipe (503) located at the bottom end of the extrusion block 1 (501) being fixedly mounted on the top end of the fixed shell (502), an extrusion block 2 (504) being slidably connected to the inside of the fixed shell (502), and the fixed shell (502) and the extrusion block 2 (504) being elastically connected via a spring 2 (505).

7. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: The limiting assembly (6) comprises a limiting rod (601), wherein the limiting rod (601) is fixedly connected to the interior of the fixing block (301), the surface of the limiting rod (601) is slidably connected to the limiting block (602), and one side of the limiting block (602) is connected to the connecting plate (304).

8. The KrF / ArF photoresist continuous flow synthesis production device according to claim 5, characterized in that: The filter assembly (8) includes an ultrafilter (801), the ultrafilter (801) is fixedly connected to the inside of the square shell (308), and a discharge pipe (802) is provided on one side of the ultrafilter (801).

9. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: A sealing ring (9) located at the top of the fixing block (301) is fixedly mounted on the surface of the reactor body (1), and a gap is provided between the reactor body (1), the square shell (308) and the fixing block (301).

10. The KrF / ArF photoresist continuous flow synthesis production device according to claim 2, characterized in that: The slide groove (305) is designed to be an inclined surface, the surface of the slider (307) is designed to be smooth, and the slider (307) is fully fitted to the inner wall of the slide groove (305).

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