Pigment composition, patterning composition, patterned substrate, color filter, semiconductor device

Abstract

The present application provides a pigment composition, a patterning composition, a patterned substrate, a color filter, and a semiconductor device. The pigment composition includes a dispersant, an organic pigment, and a solvent. The synergist includes a basic compound. The dispersant includes a first structural unit represented by formula (I) and a second structural unit represented by formula (II). #imgabs0#Formula (I), #imgabs1#Formula (II). The pigment composition provided by the present application has a high organic pigment content and excellent dispersion performance, improves the spectroscopic effect and anti-optical crosstalk ability of the color filter, and enhances the high pixelation performance of the semiconductor device.

Description

Technical Field

[0001] The present application relates to the field of semiconductor preparation, and particularly relates to a pigment composition, a patterning composition, a patterned substrate, a color filter, and a semiconductor device. Background Art

[0002] With the continuous development of semiconductor technology, the industry has increasingly high requirements for the high-pixel performance of semiconductor devices, especially image sensors. In related technologies, by increasing the content of organic pigments in the pigment composition and forming a patterned film layer for application in semiconductor devices, the spectral splitting requirements can be met and the adverse effects of optical crosstalk can be reduced. However, too high an organic pigment content will cause the pigment composition to agglomerate, resulting in significant changes in viscosity and particle size, and a decline in coating performance, which is not conducive to improving the high-pixel performance of semiconductor devices. Therefore, a pigment composition with good dispersion performance and a high organic pigment content is needed to improve the spectral splitting performance and high-pixel performance of semiconductor devices. Summary of the Invention

[0003] In view of this, the present application provides a pigment composition, a patterning composition, a patterned substrate, a color filter, and a semiconductor device. In this pigment composition, the dispersant includes a first structural unit and a second structural unit. Under the interaction of a synergist, the dispersant can be anchored on the surface of the organic pigment through the first structural unit, while the second structural unit can increase the steric hindrance, inhibit agglomeration, and promote the dispersion of the organic pigment, so that the pigment composition has excellent dispersion performance while having a high organic pigment content, thereby improving the spectral splitting effect and anti-optical crosstalk ability of the obtained pattern, which is beneficial to improving the high-pixel performance of semiconductor devices.

[0004] In a first aspect, the present application provides a pigment composition, which includes a dispersant, an organic pigment, a synergist, and a solvent. The synergist includes a basic compound, and the dispersant includes a first structural unit represented by formula (I) and a second structural unit represented by formula (II).

[0005] Formula (I), Formula (II),

[0006] For formula (I), R1, R2, and R3 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R4 is selected from a single bond or -C(=O)O-, and R5 is selected from a single bond, -R a -O(O=)C-R b -, -R c -HN-(O=)C-R d -, -R e -(O=)2SNH-R f -, an alkylene group or an arylene group, R a 、Rb , R c , R d , R e , R f are independently selected from a single bond or an alkylene group; in formula (II), R 1 , R 2 and R 3 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 4 is -C(=O)O-, R 5 is selected from , , or , R 6 is selected from an alkyl group having 1 to 20 carbon atoms, R 7 is selected from -R a -O(O=)C-, -R b -HN-(O=)C- or -R c -(O=)2SNH-, R 8 is selected from an alkylene group, R a , R b , R c are independently selected from an alkylene group, p, q, and n are each any positive number in the range of 4 to 10, and the sum of m1 + m2 is any positive number in the range of 4 to 10. The pigment composition provided by the present application promotes the dispersion of the organic pigment through the dispersant, improves the dispersibility of the pigment composition, enables the pigment composition to have both a high organic pigment content and high dispersibility, and is beneficial to improving the spectroscopic properties and anti-optical crosstalk ability of the prepared pattern.

[0007] Optionally, in the dispersant, the mass percentage of the first structural unit is 20% - 25%, and the mass percentage of the second structural unit is 75% - 80%. The appropriate ratio of different structural units can improve the dispersion ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena.

[0008] Optionally, the R 6 is selected from an alkyl group having 5 to 20 carbon atoms. Thus, the hydrophobic property of the dispersant can be further improved, and the steric stability of the dispersant can be enhanced.

[0009] Optionally, the dispersant includes the structure shown in formula (III):

[0010] Formula (III),

[0011] Among them, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, the ratio of x to y is (20 - 25):(75 - 80), x + y = 100, and n is any positive number within the range of 4 - 10. The appropriate ratio of different structural units in the dispersant can better exert the anchoring ability of the first structural unit, the hydrophobic property and steric hindrance of the second structural unit, improve the dispersion ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena.

[0012] Optionally, the dispersant further comprises a third structural unit represented by formula (IV),

[0013] Formula (IV),

[0014] wherein, R 9 、R 10 and R 11 are independently selected from a hydrogen atom or an alkyl group having 1 - 4 carbon atoms, R 12 is an alkylene group, R 13 is ,R 14 is an alkoxy group having 1 - 3 carbon atoms, R 15 is an alkylene group having 1 - 3 carbon atoms, and h is any positive number within the range of 5 - 10. The third structural unit has a hydrophilic ether bond, which enables the pigment composition to be easily dissolved in an alkaline developer when applied in the patterning process, has excellent alkali solubility, a fast cleaning speed, can improve the developing effect, and is beneficial to obtaining a patterned film with clear and highly refined patterns.

[0015] Optionally, in the dispersant, the mass percentage of the first structural unit is 20% - 25%, the mass percentage of the second structural unit is 60% - 70%, and the mass percentage of the third structural unit is 10% - 20%. The appropriate ratio of different structural units can improve the dispersion ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena; at the same time, it can improve the alkali solubility of the pigment composition in the patterning process, which is beneficial to the formation of a refined patterned film.

[0016] Optionally, the dispersant comprises a structure represented by formula (V):

[0017] Formula (V),

[0018] Among them, x is the mass percentage of the first structural unit, y is the mass percentage of the second structural unit, z is the mass percentage of the third structural unit, the ratio of x, y and z is (20 - 25):(60 - 70):(10 - 20), x + y + z = 100, n is any positive number within the range of 4 - 10, and h is any positive number within the range of 5 - 10. In the dispersant, appropriate proportions of different structural units can endow the dispersant with excellent alkali-soluble properties and good dispersing ability, which is beneficial to the preparation process of semiconductor devices and improves the high pixelation performance of semiconductor devices.

[0019] Optionally, the weight-average molecular weight of the dispersant is 9000 - 25000. Appropriate weight-average molecular weight can enable the dispersant to have better dispersing performance and can better avoid self-aggregation.

[0020] Optionally, the polydispersity index of the dispersant is less than or equal to 1.4. The smaller the dispersity index of the dispersant, the more regular the monomer arrangement and the better the dispersity.

[0021] Optionally, based on the total mass of the non-volatile components in the pigment composition being 100%, in the pigment composition, the mass percentage of the organic pigment is 69% - 76.9%, the mass percentage of the dispersant is 18% - 24%, and the mass percentage of the synergist is 5% - 8%. Appropriate dispersant content has excellent dispersing effects, while a high content of organic pigment is beneficial to improving the spectroscopic effect and anti-optical crosstalk ability of the prepared pattern.

[0022] Optionally, the mass ratio of the dispersant to the organic pigment is (0.2 - 0.3):1, the mass ratio of the synergist to the organic pigment is (0.05 - 0.1):1, and the mass ratio of the dispersant to the synergist is (0.2 - 0.3):(0.05 - 0.1). Appropriate mass ratios can obtain a pigment composition with both a high organic pigment content and high dispersing performance.

[0023] Optionally, the synergist is a small molecule amine compound. The synergist is used to interact with the dispersant and / or the organic pigment. Some amino groups in the basic small molecule amine compound interact with the carboxyl groups in the dispersant and are connected together; the remaining amino groups are anchored and connected to the surface of the organic pigment, thereby realizing the connection between the dispersant and the organic pigment and promoting the dispersion of the organic pigment.

[0024] Optionally, the solvent includes one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether. This can improve the uniformity of the pigment composition, enhance the coating performance of the patterning composition, and is beneficial to improving the structural stability of the prepared pattern.

[0025] Optionally, in the pigment composition, the mass percentage of the solvent is 75%-80%. An appropriate amount of solvent can promote the uniform dispersion of the organic pigment while improving the coating performance of the pigment composition, which is beneficial to the stability of the semiconductor process.

[0026] Optionally, the particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm. The appropriate particle size indicates that the pigment composition has high dispersibility and no significant agglomeration phenomenon, so that the coating performance of the pigment composition can be improved, and the spectral performance and anti-optical crosstalk ability of the semiconductor device can be enhanced.

[0027] Optionally, the viscosity of the pigment composition is less than or equal to 4 mPa·s. The smaller the viscosity, the better the dispersion performance of the pigment composition and no agglomeration phenomenon. In this way, the pigment composition has a high pigment content and high dispersibility.

[0028] Optionally, when stored at 40°C for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%. In this way, the dispersant with excellent dispersion performance has strong anti-agglomeration ability, which improves the dispersion performance and stability of the pigment composition and is beneficial to improving the storage property of the pigment composition.

[0029] In a second aspect, the present application provides a patterning composition, which includes the pigment composition described in the first aspect and a film-forming resin.

[0030] The patterning composition provided by the present application has excellent dispersibility and stability, which is beneficial to improving the storage period of the patterning composition and the fineness of the prepared pattern.

[0031] In a third aspect, the present application provides a patterned substrate, which is prepared by using the patterning composition described in the second aspect.

[0032] The patterned substrate provided by the present application has clear patterns, good structural stability and strong spectral performance.

[0033] In a fourth aspect, the present application provides a color filter, which includes the patterned substrate described in the third aspect.

[0034] The color filter provided by the present application has good spectral performance and strong anti-optical crosstalk ability.

[0035] In a fifth aspect, the present application provides a semiconductor device, which is prepared by coating with the patterning composition described in the second aspect.

[0036] The semiconductor device provided by the present application has high precision, high pixel performance and excellent comprehensive performance. Detailed implementation manners

[0037] The technical solutions in the embodiments of the present application will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without creative efforts shall fall within the protection scope of the present application.

[0038] With the rapid development of semiconductor devices, they are widely used in various fields. For example, complementary metal oxide semiconductors (CMOS) can be used as image sensors in camera modules and are applied in fields such as electronic devices, aerospace, transportation, and industrial production. The performance of the color filter determines the performance of the CMOS sensor. As the requirement for high pixelization of the CMOS sensor becomes higher, the performance requirements for the color filter in the CMOS sensor are also getting higher. The color filter is formed by coating and etching a patterned composition containing a pigment composition on the surface of a substrate. In order to reduce the optical crosstalk phenomenon of the color filter, it is necessary to increase the content of organic pigments in the pigment composition. However, a high content of organic pigments will cause agglomeration in the pigment composition, changes in particle size and viscosity, which is not conducive to the storage of the pigment composition and the coating performance of the patterned composition. The spectral performance of the prepared patterned film decreases, and the anti-optical crosstalk ability weakens, resulting in a reduction in the pixelization performance of the semiconductor device.

[0039] To solve the above technical problems, the present application provides a pigment composition, which includes a dispersant, an organic pigment, a synergist, and a solvent. The synergist includes a basic compound, and the dispersant includes a first structural unit represented by formula (I) and a second structural unit represented by formula (II).

[0040] Formula (I) Formula (II)

[0041] In formula (I), R1, R2, and R3 are independently selected from a hydrogen atom or an alkyl group of C1-C4, R4 is selected from a single bond or -C(=O)O-, R5 is selected from a single bond, -R a -O(O=)C-R b -, -R c -HN-(O=)C-R d -, -R e -(O=)2SNH-R f -, an alkylene group or an arylene group, R a , R b , R c , R d , R e , R f are independently selected from a single bond or an alkylene group; in formula (II), R 1 , R2 and R 3 is independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 4 is -C(=O)O-, and R 5 is selected from 、 、 or ,and R 6 is selected from an alkyl group having 1 to 20 carbon atoms, and R 7 is selected from -R a -O(O=)C-, -R b -HN-(O=)C- or -R c -(O=)2SNH-, and R 8 is selected from an alkylene group, and R a 、R b 、R c are independently selected from an alkylene group, p, q, and n are any positive numbers within the range of 4 to 10, and the sum of m1 + m2 is any positive number within the range of 4 to 10. In the present application, the organic pigment can make the patterning composition have a corresponding color, can form a patterning film of a certain color, and improve the spectroscopic performance of the semiconductor device; the dispersant interacts with the synergist through the first structural unit, and the synergist interacts with the surface of the organic pigment, so that the dispersant is anchored on the surface of the organic pigment. At the same time, the alkyl chain (R 6 ) with hydrophobic properties and the R 5 group that increases the steric hindrance in the second structural unit promote the dispersant to have a steric hindrance effect; under the combined action of the first structural unit and the second structural unit of the dispersant, the organic pigment has excellent dispersion effect, which is beneficial to the formation of a highly homogeneous patterning film layer and improves the fineness of the pattern. The pigment composition provided by the present application can still maintain excellent dispersion performance under the conditions of high organic pigment content and low dispersant content, can improve the spectroscopic performance and anti-optical crosstalk ability of the prepared patterning film, and thus improve the high pixel performance of the semiconductor device.

[0042] In the present application, the dispersant is a controlled polymerization product, including a first structural unit having an anchoring effect and a second structural unit having hydrophobic properties and increasing steric hindrance. The dispersant can interact with the synergist on the surface of the organic pigment through the carboxyl group in the first structural unit, so as to be anchored on the surface of the organic pigment, promote the dispersion of the organic pigment, and improve the dispersion performance of the organic pigment; at the same time, R 4 in the second structural unit is -C(=O)O-, which can improve the compatibility between the dispersant and the solvent and enhance the coating performance of the pigment composition. R 5 can increase the steric hindrance of the dispersant and improve the spatial dispersion ability of the organic pigment. R 6It has excellent hydrophobic properties, thereby improving the hydrophobicity of the dispersant and enhancing the steric stability of the dispersant. This dispersant can maintain a pigment composition with a low dispersant content, increase the content of organic pigments, improve the dispersion performance of the pigment composition, and further enhance the spectral performance and anti-optical crosstalk ability of the color filter.

[0043] An alkyl group is a monovalent group obtained by removing one hydrogen atom from an alkane molecule. In one embodiment of the present application, R1, R2, R3, R 1 , R 2 and R 3 can be alkyl groups of C1-C4. For example, they can include straight-chain alkyl groups of C1-C4, branched-chain alkyl groups of C1-C4, and cycloalkyl groups of C3-C4. Specifically, the alkyl groups of C1-C4 can be, but are not limited to, one or more of methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, cyclopropyl, and cyclobutyl.

[0044] In one embodiment of the present application, R 6 is selected from alkyl groups of C1-C20. For example, they can include straight-chain alkyl groups of C1-C20, branched-chain alkyl groups of C1-C20, and cycloalkyl groups of C3-C20. Specifically, the alkyl groups of C1-C20 can be, but are not limited to, including one or more of methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, 2-methylbutyl, 3-methylbutyl, 4-methylbutyl, 2,2-dimethylpropyl, n-hexyl, heptyl, 2-methylhexyl, 3-methylhexyl, 4-methylpentyl, 5-methylpentyl, 2-ethylbutyl, 3-ethylbutyl, heptyl, octyl, nonyl, and decyl, cyclopropyl, 4-methylcyclobutyl, cyclopentyl, 2-ethylcyclohexyl, cyclooctyl, and adamantyl. In one embodiment of the present application, R 6 can be 2-methylbutyl. In another embodiment of the present application, R 6 can be 5-methylpentyl. In some embodiments, R 6 is selected from alkyl groups of C5-C20. Thus, the hydrophobic property of the dispersant can be further improved, and the steric stability of the dispersant can be enhanced.

[0045] An alkylene group is a divalent group obtained by removing two hydrogen atoms from an alkane molecule. In one embodiment of the present application, the alkylene group has 1-18 carbon atoms and may include a linear alkylene group, a branched alkylene group, and a cycloalkylene group. Specifically, the number of carbon atoms in the alkylene group may be, but is not limited to, 1, 4, 6, 8, 10, 12, 14, 16, or 18, etc.; exemplarily, the alkylene group may include, but is not limited to, at least one of -CH2-, -CH2CH2-, -CH2CH2CH2-, -CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2-, and -CH2CH2CH2CH2CH2CH2-. In one embodiment of the present application, the alkylene group may be -CH2CH2CH2CH2-. In another embodiment of the present application, the alkylene group may be -CH2CH2-.

[0046] An arylene group is a general term for the remaining divalent group after removing two hydrogen atoms from the aromatic nucleus carbon of an aromatic hydrocarbon molecule. In one embodiment of the present application, R5 is selected from arylene groups, and the number of carbon atoms in the arylene group can be 6-30. Specifically, the number of carbon atoms in the arylene group may be, but is not limited to, 6, 10, 12, 14, 18, 22, 24, 26, or 30, etc.; exemplarily, the arylene group may include, but is not limited to, at least one of a phenylene group, a naphthylene group, an anthrylene group, a terphenylene group, a quaterphenylene group, and a tetrahydronaphthylene group. In one embodiment of the present application, R5 may be a divalent anthryl group. In another embodiment of the present application, R5 may be a phenylene group.

[0047] In one embodiment of the present application, R1 and R2 may be hydrogen atoms, R3 may be a methyl group, R4 may be -C(=O)O-, R5 may be -CH^3-CH^3-O-(O=)C-CH^3-, and the first structural unit is . In another embodiment of the present application, R1 and R2 may be hydrogen atoms, R3 may be a methyl group, R4 and R5 may be a single bond, and the first structural unit is . In some embodiments, R4 may be -C(=O)O- to improve the compatibility between the dispersant and the solvent and enhance the coating performance of the pigment composition.

[0048] In one embodiment of the present application, R 5 is selected from , , or , p, q, and n are respectively any positive numbers within the range of 4 - 10, the sum of m1 + m2 is any positive number within the range of 4 - 10, and the number of suitable polyether or polyester structures can increase the steric hindrance of the dispersant, promote the dispersion of organic pigments, and prevent the pigment composition from agglomerating. Specifically, p can be, but is not limited to, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, or 10, etc.; q can be, but is not limited to, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, or 10, etc.; n can be, but is not limited to, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, or 10, etc. In an embodiment of the present application, R 5 can be , and p can be any positive number within the range of 2 - 8. In another embodiment of the present application, R 5 can be , and n can be any positive number within the range of 8 - 10, which can further improve the dispersion ability of the dispersant, enhance the dispersibility in the pigment composition, and obtain a pigment composition with a high organic pigment content and a low dispersant content.

[0049] In one embodiment of the present application, R 5 is , the sum of m1 + m2 is any positive number within the range of 4 - 10, and suitable values of m1 and m2 can increase the number of polyether groups in the dispersant, increase its steric hindrance, improve the dispersion ability of the dispersant, and further enhance the dispersibility of organic pigments. Specifically, m1 can be, but is not limited to, 1, 2, 4, 6, 8, or 9, etc., and m2 can be, but is not limited to, 1, 2, 4, 6, 8, or 9, etc. In an embodiment of the present application, R 5 can be , m1 can be any positive number within the range of 2 - 4, m2 can be any positive number within the range of 2 - 5, and the sum of m1 + m2 is any positive number within the range of 4 - 10. In another embodiment of the present application, R 5 can be , m1 can be any positive number within the range of 5 - 7, m2 can be any positive number within the range of 2 - 5, and the sum of m1 + m2 is any positive number within the range of 4 - 10.

[0050] In one embodiment of the present application, R 4 is -C(=O)O-, R 5 is , R 6 is 2-ethyl-butyl, and the second structural unit is . In another embodiment of the present application, R 1 , R 2 can be a hydrogen atom, R 3 is methyl, R5 is , R 7 is -R b -HN-(O=)C-, R b is ethylene, R 8 is pentylene, R 6 is 2-ethyl-butyl, and the second structural unit is .

[0051] In an embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20% - 25%, and the mass percentage of the second structural unit is 75% - 80%. Appropriate ratios of different structural units can improve the dispersion ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena. Specifically, the mass percentage of the first structural unit can be, but is not limited to, 20%, 21%, 22%, 23%, 24% or 25%, etc.; the mass percentage of the second structural unit can be, but is not limited to, 75%, 76%, 77%, 78%, 79% or 80%, etc. In an embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20% - 23%, and the mass percentage of the second structural unit is 77% - 80%. In another embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 22% - 25%, and the mass percentage of the second structural unit is 75% - 78%.

[0052] In an embodiment of the present application, the dispersant includes the structure shown in formula (III):

[0053] Formula (III),

[0054] wherein, x and y respectively represent the mass ratios of the first structural unit and the second structural unit, the ratio of x to y is (20 - 25):(75 - 80), x + y = 100. Appropriate ratios of different structural units in the polymer can better exert the anchoring ability of the first structural unit, the hydrophobic property and steric hindrance of the second structural unit, improve the dispersion ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena. Specifically, the ratio of x to y can be, but is not limited to, 20:80, 21:79, 22:78, 23:77, 24:76 or 21:75, etc. In an embodiment of the present application, in the dispersant, the ratio of x to y is (20 - 23):(77 - 80), x + y = 100. In another embodiment of the present application, in the dispersant, the ratio of x to y is (22 - 25):(75 - 78), x + y = 100.

[0055] In an embodiment of the present application, the dispersant further includes the structure shown in formula (IV),

[0056] Formula (IV),

[0057] wherein R 9 , R 10 and R 11 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 12 is an alkylene group, R 13 is , R 14 is an alkoxy group having 1 to 3 carbon atoms, R 15 is an alkylene group having 1 to 3 carbon atoms, and h is any positive number within the range of 5 to 10. The third structural unit has a hydrophilic ether bond, which can enable the pigment composition to be easily dissolved in an alkaline developer when applied in the patterning process, has excellent alkali solubility, a fast cleaning speed, can improve the development effect, and is beneficial to obtaining a patterned film with clear and highly refined patterns. Specifically, h can be, but is not limited to, 5, 6, 7, 8, 9, or 10, etc. In an embodiment of the present application, h can be 7 - 8, which can further improve the alkali solubility effect and at the same time has excellent dispersing ability, promoting the dispersion degree of the organic pigment.

[0058] In an embodiment of the present application, the dispersant includes a first structural unit, a second structural unit, and a third structural unit. Among them, the mass percentage of the first structural unit is 20% - 25%, the mass percentage of the second structural unit is 60% - 70%, and the mass percentage of the third structural unit is 10% - 20%. The appropriate ratio of different structural units can improve the dispersing ability of the dispersant, thereby promoting the uniform dispersion of the pigment composition and avoiding the occurrence of agglomeration phenomena; at the same time, it improves the alkali solubility of the pigment composition in the patterning process, which is beneficial to the formation of a refined patterned film. Specifically, the mass percentage of the first structural unit can be, but is not limited to, 20%, 21%, 22%, 23%, 24%, or 25%, etc.; the mass percentage of the second structural unit can be, but is not limited to, 60%, 62%, 64%, 65%, 68%, or 70%, etc.; the mass percentage of the third structural unit can be, but is not limited to, 10%, 12%, 13%, 15%, 16%, 17%, 18%, 19%, or 20%, etc. In an embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 20% - 23%, the mass percentage of the second structural unit is 62% - 70%, and the mass percentage of the third structural unit is 10% - 18%. In another embodiment of the present application, in the dispersant, the mass percentage of the first structural unit is 22% - 25%, the mass percentage of the second structural unit is 60% - 65%, and the mass percentage of the third structural unit can be 13% - 20%.

[0059] In one embodiment of the present application, the dispersant includes a first structural unit, a second structural unit, and a third structural unit, and the connection manner of the first structural unit, the second structural unit, and the third structural unit is not limited. In one example of the present application, the dispersant includes the structure shown in formula (V):

[0060] Formula (V),

[0061] wherein, x is the mass ratio of the first structural unit, y is the mass ratio of the second structural unit, z is the mass ratio of the third structural unit, the ratio of x, y, and z is (20 - 25):(60 - 70):(10 - 20), x + y + z = 100, n is any positive number within the range of 4 - 10, and h is any positive number within the range of 5 - 10. In the dispersant, appropriate ratios of different structural units can endow the dispersant with excellent alkali solubility and good dispersing ability, which is beneficial to the preparation process of semiconductor devices and improves the high pixel performance of semiconductor devices. Specifically, the ratio of x, y, and z can be, but is not limited to, 20:60:20, 21:62:17, 23:61:16, 23:60:17, 20:62:18, or 20:61:19, etc. In one example of the present application, in the dispersant, the ratio of x, y, and z is (20 - 23):(60 - 65):(10 - 17), and x + y + z = 100. In another example of the present application, in the dispersant, the ratio of x, y, and z is (22 - 25):(75 - 78):(17 - 20), and x + y + z = 100.

[0062] In one embodiment of the present application, the weight average molecular weight (Mw) of the dispersant is 9000 - 25000. An appropriate weight average molecular weight can endow the dispersant with better dispersing performance and can preferably avoid self - aggregation. Specifically, the weight average molecular weight of the dispersant can be, but is not limited to, 9000, 10000, 12000, 14000, 16000, 18000, 20000, 22000, 24000, or 25000, etc. In one example of the present application, the weight average molecular weight of the dispersant can be 9000 - 15000. In another example of the present application, the weight average molecular weight of the dispersant can be 15000 - 25000.

[0063] In an embodiment of the present application, the polymer dispersity index (PDI) of the dispersant is less than or equal to 1.4. A high molecular polymer is composed of a combination of monomers with various molecular weights. The polymer dispersity index is used to describe the molecular weight distribution of the polymer. The narrower the molecular weight distribution (i.e., the smaller the PDI), the more regular the arrangement of the monomers and the better the dispersibility. Specifically, the polymer dispersity index of the dispersant can be, but is not limited to, 1.4, 1.3, 1.2, 1.1, 1, 0.9, 0.8, or 0.7, etc. In an embodiment of the present application, the polymer dispersity index of the dispersant can be 1 - 1.4, which can further improve the dispersing performance of the dispersant, inhibit the occurrence of agglomeration of the pigment composition, and extend its storage period. In another embodiment of the present application, the polymer dispersity index of the dispersant can be 0.2 - 1.

[0064] In an embodiment of the present application, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the dispersant in the pigment composition is 18% - 24%. An appropriate content of the dispersant has an excellent dispersing effect, and at the same time, the content of the organic pigment is high, which is beneficial to improving the spectral effect and anti-optical crosstalk ability of the prepared pattern. Specifically, the mass percentage of the dispersant in the pigment composition can be, but is not limited to, 18%, 19%, 20%, 20.5%, 21%, 21.5%, 22%, 22.5%, 23%, 23.5%, or 24%, etc. In an embodiment of the present application, the mass percentage of the dispersant in the pigment composition can be 18% - 22%. In another embodiment of the present application, the mass percentage of the dispersant in the pigment composition can be 22% - 24%.

[0065] In the present application, the pigment composition includes an organic pigment, which can make the prepared pattern have an ideal color, thereby achieving excellent anti-optical crosstalk; and the organic pigment and the dispersant act synergistically to further improve the dispersing performance of the organic pigment. In an embodiment of the present application, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the organic pigment in the pigment composition is 69% - 76.9%, which further improves the anti-spectral crosstalk ability of the pigment composition and obtains a semiconductor device with excellent spectral performance. Specifically, the mass percentage of the organic pigment can be, but is not limited to, 69%, 70%, 71%, 72%, 73%, 74%, 75%, 76%, or 76.9%, etc. In an embodiment of the present application, the mass percentage of the organic pigment in the pigment composition can be 69% - 74%. In another embodiment of the present application, the mass percentage of the organic pigment in the pigment composition can be 74% - 76.9%, which can further improve the anti-optical crosstalk ability of the semiconductor device.

[0066] In an embodiment of the present application, the mass percentage of the organic pigment in the pigment composition can be obtained by, but not limited to, absorption spectrum testing. For example: by testing multiple groups of pigment compositions with different organic pigment contents, after coating the pigment composition into a film, an absorption spectrum curve is obtained as the standard curve; the absorption spectrum of the pigment composition with unknown organic pigment content is tested to obtain its absorption spectrum curve, and compared with the standard curve, so as to obtain the mass percentage of the unknown organic pigment. In an embodiment of the present application, after coating the pigment composition into a film, in the absorption spectrum curve of the 400 nm thick pigment composition film, the wavelength is 530 nm - 550 nm, and the transmittance of the pigment composition is 90% - 94%. At this time, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the organic pigment in the pigment composition is 69% - 76.9%.

[0067] In an embodiment of the present application, the mass ratio of the dispersant to the organic pigment is (0.2 - 0.3):1. An appropriate mass ratio can obtain a pigment composition with both a high organic pigment content and high dispersion performance. Specifically, the mass ratio of the dispersant to the organic pigment can be, but not limited to, 0.2:1, 0.21:1, 0.22:1, 0.23:1, 0.24:1, 0.25:1, 0.26:1, 0.27:1, 0.28:1, 0.29:1 or 0.3:1, etc. In an embodiment of the present application, the mass ratio of the dispersant to the organic pigment can be (0.2 - 0.26):1. In another embodiment of the present application, the mass ratio of the dispersant to the organic pigment can be (0.25 - 0.3):1.

[0068] In the present application, the synergist includes a basic compound, which can interact with the carboxylic acid group in the first structural unit of the dispersant, so that the dispersant can be anchored on the surface of the organic pigment through the synergist, promoting the dispersion of the organic pigment, reducing the viscosity of the pigment composition, and maintaining the high organic pigment content of the pigment composition. Specifically, the synergist can be, but not limited to, small molecule amine compounds. In an embodiment of the present application, the synergist is a small molecule amine compound. A part of the amino groups in the basic small molecule amine compound undergoes an acid-base reaction with the carboxyl groups in the dispersant and are connected together; the remaining amino groups interact with the surface of the organic pigment, thereby realizing the connection between the dispersant and the organic pigment, and no chemical reaction occurs between the two. Specifically, the small molecule amine compound can be, but not limited to, a fatty amine compound, a cyclic amine compound containing a piperidine group, etc. In an embodiment of the present application, the structural formula of the small molecule amine can be In the present application, the dispersant interacts with the synergist to improve the dispersion performance of the pigment composition. The interaction can be achieved through charge interaction, acid-base interaction, and / or chemical reaction, etc. Specifically, the interaction can include, but is not limited to, the interaction formed by non-bonding (such as electrostatic interaction, hydrogen bond, π-π interaction, or acid-base interaction, etc.), and the interaction formed by bonding (such as covalent bond, ionic bond formed by chemical reaction). For example, the carboxyl group in the first structural unit of the dispersant can undergo a chemical reaction with the amino group in the synergist of the small molecule amine compound to form an interaction; the carboxyl group in the first structural unit of the dispersant can also form an acid-base interaction with the amino group in the synergist of the small molecule amine compound to promote the dispersion of the organic pigment.

[0069] In an embodiment of the present application, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the synergist in the pigment composition is 5%-8%. Specifically, the mass percentage of the synergist in the pigment composition can be, but is not limited to, 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, or 8%, etc., to avoid the adverse effects of poor dispersion performance or even non-dispersion of the pigment composition caused by too low a mass percentage of the synergist. In an embodiment of the present application, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the synergist in the pigment composition can be 5%-7%. In another embodiment of the present application, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the synergist in the pigment composition can be 6.5%-8%. In some embodiments, the pigment composition includes a dispersant, an organic pigment, a synergist, and a solvent, and the non-volatile components include the dispersant, the organic pigment, and the synergist other than the solvent.

[0070] In an embodiment of the present application, the mass ratio of the synergist to the organic pigment is (0.05-0.1):1, and the appropriate mass ratio can promote the dispersion of the pigment composition. Specifically, the mass ratio of the synergist to the organic pigment can be, but is not limited to, 0.05:1, 0.06:1, 0.07:1, 0.08:1, 0.09:1, or 0.1:1, etc. In an embodiment of the present application, the mass ratio of the synergist to the organic pigment can be (0.05-0.08):1. In another embodiment of the present application, the mass ratio of the synergist to the organic pigment can be (0.07-0.1):1.

[0071] In an embodiment of the present application, the mass ratio of the dispersant to the synergist is (0.2 - 0.3):(0.05 - 0.1). An appropriate mass ratio can promote the anchoring effect of the dispersant on the surface of the organic pigment and improve the dispersion performance of the pigment composition. Specifically, the mass ratio of the dispersant to the synergist can be, but is not limited to, 0.2:0.05, 0.21:0.06, 0.22:0.08, 0.23:0.06, 0.24:0.05, 0.25:0.09, 0.26:0.1, 0.27:0.7, 0.28:0.8, 0.29:0.6 or 0.3:0.7, etc. In an embodiment of the present application, the mass ratio of the dispersant to the synergist can be (0.2 - 0.28):(0.05 - 0.07). In another embodiment of the present application, the mass ratio of the dispersant to the synergist can be (0.25 - 0.3):(0.07 - 0.1).

[0072] In the present application, the solvent can improve the uniformity of the pigment composition, enhance the coating performance of the patterning composition, and is beneficial to improving the structural stability of the obtained pattern. Specifically, the solvent can include, but is not limited to, one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether. In an embodiment of the present application, the solvent can be propylene glycol methyl ether acetate. In another embodiment of the present application, the solvent can be propylene glycol monomethyl ether.

[0073] In an embodiment of the present application, in the pigment composition, the mass percentage of the solvent is 75% - 80%. An appropriate amount of the solvent can promote the uniform dispersion of the organic pigment while improving the coating performance of the pigment composition, which is beneficial to the stability of the semiconductor process. Specifically, in the pigment composition, the mass percentage of the solvent can be, but is not limited to, 75%, 76%, 77%, 78%, 79% or 80%, etc. In an embodiment of the present application, in the pigment composition, the mass percentage of the solvent can be 75% - 78%. In another embodiment of the present application, in the pigment composition, the mass percentage of the solvent can be 77% - 80%.

[0074] In an embodiment of the present application, the particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm. The suitable particle size indicates that the pigment composition has high dispersibility and no significant agglomeration phenomenon, thereby improving the coating performance of the pigment composition and enhancing the spectroscopic performance and anti-optical crosstalk ability of the semiconductor device. Specifically, the particle size D50 of the pigment composition can be, but is not limited to, 120 nm, 110 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 40 nm, 30 nm, 20 nm, 10 nm, etc.; the particle size D90 of the pigment composition can be, but is not limited to, 200 nm, 180 nm, 160 nm, 140 nm, 120 nm, 100 nm, 80 nm, 60 nm, 40 nm, 30 nm, 20 nm, 10 nm, etc. In an embodiment of the present application, the particle size D50 of the pigment composition can be 80 nm - 120 nm; the particle size D90 of the pigment composition can be 130 nm - 200 nm. In another embodiment of the present application, the particle size D50 of the pigment composition can be 50 nm - 100 nm; the particle size D90 of the pigment composition can be 60 nm - 120 nm. In some embodiments, the particle size of the pigment composition refers to the measured particle size of the particles composed of the remaining components except the solvent. In the present application, the method for measuring the particle size of the pigment composition is as follows: After diluting the pigment composition by about 2000 times, the optical particle size is measured with a dynamic light scattering nano-particle size analyzer.

[0075] In an embodiment of the present application, the viscosity of the pigment composition is less than or equal to 4 mPa·s, indicating that the pigment composition has excellent dispersion performance. In the case of a high organic pigment content, the pigment composition still has high dispersion performance and no agglomeration phenomenon. Specifically, the viscosity of the pigment composition can be, but is not limited to, 4 mPa·s, 3.5 mPa·s, 3.2 mPa·s, 3 mPa·s, 2.8 mPa·s, 2.5 mPa·s, 2.4 mPa·s, 2.3 mPa·s, 2.2 mPa·s, 2.1 mPa·s, 2 mPa·s, etc. In an embodiment of the present application, the viscosity of the pigment composition can be 2.5 mPa·s - 4 mPa·s. In another embodiment of the present application, the viscosity of the pigment composition can be 2 mPa·s - 3 mPa·s.

[0076] In an embodiment of the present application, when stored at 40°C for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%, indicating that the dispersant provided by the present application has excellent dispersion performance and strong anti-agglomeration ability, improving the dispersion performance and stability of the pigment composition, and being beneficial to improving the storage stability of the pigment composition. The viscosity change rate = (viscosity of the pigment composition after storage at 40°C for 7 days - viscosity of the prepared pigment composition) / viscosity of the prepared pigment composition × 100%. Specifically, when stored at 40°C for 7 days, the viscosity change rate of the pigment composition can be, but is not limited to, 5%, 4.5%, 4%, 3.5%, 3%, 2.5%, 2% or 1%, etc. In an embodiment of the present application, when stored at 40°C for 7 days, the viscosity change rate of the pigment composition can be less than or equal to 4%. In another embodiment of the present application, when stored at 40°C for 7 days, the viscosity change rate of the pigment composition can be less than or equal to 2%.

[0077] An embodiment of the present application provides a method for preparing a pigment composition, including: mixing and dispersing an organic pigment, a dispersant, a synergist and a solvent to obtain the pigment composition. This preparation method is simple, has a low preparation cost, and the prepared pigment composition has good stability and high dispersibility. In an embodiment of the present application, the organic pigment, the dispersant, the synergist and the solvent are mixed and subjected to two-stage sanding, and then centrifuged for post-treatment to obtain the pigment composition.

[0078] The present application provides a patterning composition, including the pigment composition provided in any of the above embodiments and a film-forming resin, which is beneficial to improving the coating performance of the patterning composition, enhancing the anti-optical crosstalk ability of the prepared pattern, and improving the light splitting performance of the semiconductor device.

[0079] In an embodiment of the present application, based on the total mass of the non-volatile components in the patterning composition being 100%, in the patterning composition, the mass percentage of the non-volatile components in the pigment composition is 80%-90%, which is beneficial to improving the anti-optical crosstalk ability of the patterning composition. Specifically, based on the solid content of the patterning composition, in the patterning composition, the mass percentage of the non-volatile components in the pigment composition can be, but is not limited to, 80%, 82%, 84%, 85%, 86%, 88%, 89% or 90%, etc. In an embodiment of the present application, based on the total mass of the non-volatile components in the patterning composition being 100%, in the patterning composition, the mass percentage of the non-volatile components in the pigment composition can be 80%-86%. In another embodiment of the present application, based on the total mass of the non-volatile components in the patterning composition being 100%, in the patterning composition, the mass percentage of the non-volatile components in the pigment composition can be 84%-90%.

[0080] In an embodiment of the present application, the patterning composition includes a film-forming resin, which can endow the patterning composition with film-forming properties and promote the formation of a patterned film. Specifically, the film-forming resin may include, but is not limited to, acrylate polymers, etc. In an example of the present application, the film-forming resin may be an acrylate polymer, and the acrylate polymer is a homopolymer or copolymer of acrylate and its derivatives, methacrylate and its derivatives, etc. In some embodiments, the film-forming resin may be polyacrylate. In other embodiments, the film-forming resin may be polymethacrylate.

[0081] In an embodiment of the present application, the patterning composition further includes various additives such as polymerizable monomers, epoxy resins, polymerization initiators, chain transfer agents, polymerization inhibitors, ultraviolet absorbers (UV absorbers), and surfactants. Those skilled in the art can determine the addition amounts of the above additives in the patterning composition according to actual production needs.

[0082] In an embodiment of the present application, the epoxy resin can improve the film-forming properties of the patterning composition and is beneficial to the formation of a patterned film or a patterned substrate. Specifically, the epoxy resin may include, but is not limited to, compounds having two or more epoxy rings in the molecule such as bisphenol A type, cresol novolac type, biphenyl type, and alicyclic epoxy compounds. In an example of the present application, the epoxy resin may be bisphenol A type.

[0083] In an embodiment of the present application, the thermal polymerization initiator can initiate monomer polymerization, prompt the patterning composition to react quickly, and is beneficial to the formation of a pattern. Specifically, the thermal polymerization initiator may include, but is not limited to, azo compounds and peroxide compounds. Exemplarily, the peroxide compounds may include, but are not limited to, ketone peroxides, peroxyketals, hydrogen peroxide, dialkyl peroxides, diacyl peroxides, peroxy esters, and peroxy dicarbonates.

[0084] In an embodiment of the present application, the chain transfer agent is also called a molecular weight regulator. In the free radical polymerization process, sometimes a small molecule with a relatively large chain transfer constant is intentionally added to the polymerization reaction system to adjust and control the molecular weight of the polymerization product. Specifically, the chain transfer agent may include, but is not limited to, one or more of mercaptans, α-methylstyrene dimer, trichloroethylene, and carbon tetrachloride.

[0085] In an embodiment of the present application, the polymerization inhibitor can prevent side reactions from occurring during the chemical reaction of the polymer. Specifically, the polymerization inhibitor may include, but is not limited to, one or more of polyphenol polymerization inhibitors, quinone polymerization inhibitors, aromatic amine polymerization inhibitors, and aromatic nitro compounds.

[0086] In one embodiment of the present application, the ultraviolet absorber (UV absorber) can absorb the ultraviolet part in sunlight and fluorescent light sources without changing itself, extend the storage period of the patterning composition, and provide its stability. Specifically, the ultraviolet absorber may include, but is not limited to, one or more of salicylates, benzophenones, benzotriazoles, substituted acrylonitriles, and triazines.

[0087] In one embodiment of the present application, the surface activator can improve the etching quality of the patterning composition, enhance the fineness of the pattern, and improve the refinement degree of semiconductor devices. Specifically, the surface activator may be, but is not limited to, one or more of anionic, cationic, nonionic, and zwitterionic types.

[0088] In one embodiment of the present application, other additives may also be included in the patterning composition, such as a leveling agent, etc. In this way, it is beneficial to improve the coating performance of the patterning composition. Those skilled in the art can determine the addition amount of the above additives in the patterning composition according to actual production needs.

[0089] One embodiment of the present application also provides a patterned film, which is prepared from the patterning composition provided in any of the above embodiments. The patterned film can be used for the preparation of a mask in the semiconductor manufacturing process, which is beneficial to transfer the pattern of the patterned film to a substrate such as a wafer through subsequent processes such as exposure, and form a pattern corresponding to the mask on the substrate.

[0090] In one embodiment of the present application, the method for preparing a patterned film includes: coating the patterning composition on a substrate to form a patterning composition film layer; exposing and developing the patterning composition film layer through a photomask to form a patterned film on the surface of the substrate.

[0091] The present application also provides a patterned substrate, which is prepared from the patterning composition described in any of the above embodiments. The patterned substrate can be applied in the preparation of semiconductor devices, improving the manufacturing precision and quality of semiconductor devices, and being beneficial to improving the comprehensive performance of semiconductor devices.

[0092] In one embodiment of the present application, the method for preparing a patterned substrate includes: forming a patterned film on both sides of a substrate, and transferring the pattern of the patterned film to the substrate to obtain a patterned substrate.

[0093] In one embodiment of the present application, the pattern formed by the patterning composition forms a selective protection effect on the underlying substrate material during the etching step. After etching under certain conditions, the unprotected substrate material is etched, but the etching rate at the protected area is slower than that at the unprotected area. Finally, a pattern is formed on the substrate material, that is, the pattern is transferred to the substrate. The etching process can specifically transfer the pattern to the substrate through HF etching, ion etching, or ion implantation processes.

[0094] The present application provides a color filter, which includes the above-mentioned patterned substrate or the patterned substrate prepared by the above-mentioned method for preparing a patterned substrate. In some embodiments, the color filter is formed by coating and etching a patterned composition provided by the present application on the surface of a substrate, and has good spectral splitting effect and strong anti-optical crosstalk ability.

[0095] The present application provides a semiconductor device, which is prepared by coating the above-mentioned patterned composition on a substrate and then through exposure and development, or is prepared by using the patterned film of any one of the above-mentioned embodiments, or is prepared by using the patterned substrate of any one of the above-mentioned embodiments. The semiconductor device provided by the present application has high precision and is beneficial to improving the comprehensive performance of the semiconductor device.

[0096] In one embodiment of the present application, the semiconductor device includes: a structure obtained by etching or electron injection of a patterned substrate. In one embodiment of the present application, the semiconductor device is a structure obtained by etching or electron injection of a patterned substrate with a silicon wafer as the substrate.

[0097] In the present application, there is no limitation on the specific type of the semiconductor device. In one embodiment of the present application, the semiconductor device may be an integrated circuit device including a chip, etc. During the preparation process of the chip, after the foregoing patterning process is completed, the preparation of other functional layers may be carried out.

[0098] In one embodiment of the present application, the semiconductor device may be a CMOS sensor, including a photodiode, a color filter, and a microlens arranged in a stacked manner, and the color filter is prepared by the patterned composition provided by any one of the above-mentioned embodiments. The color filter has a high organic pigment content, improves the spectral splitting performance of the CMOS sensor, and is beneficial to improving its pixelation performance.

[0099] In one embodiment of the present application, the CMOS sensor can be used in a camera module, and then applied in fields such as electronic devices, aerospace, transportation, and industrial production, which is beneficial to the commercial application of semiconductor devices.

[0100] One embodiment of the present application further provides a method for preparing a semiconductor device, including:

[0101] S101: Coating the patterned composition of any one of the above-mentioned embodiments on the surface of a substrate to form a patterned composition film layer;

[0102] S102: Obtaining a patterned film after masking, exposure, and development of the patterned composition film layer. The preparation method provided by the present application is simple, and the prepared semiconductor device has excellent comprehensive performance, which is beneficial to its commercial application.

[0103] In an embodiment of the present application, the substrate is selected according to actual needs. Specifically, the substrate can be, but is not limited to, a silicon wafer, a silicon wafer with a coating. Exemplarily, the coating can be an antireflection coating, an etching-resistant coating, an epitaxial layer, a metal layer, a dielectric layer, a modification layer, or a matching layer, etc. Generally, other coatings can be obtained by pre-treating the substrate. The pre-treatment methods can be: performing O2 plasma surface hydrophilic activation on the silicon wafer substrate; or cleaning in a Piranha solution (H2O: 30% ammonia water: 30% H2O2 = 5:1:1) for 15 mins - 20 mins, then washing with deionized water and isopropyl alcohol to complete the hydrophilic treatment; or using evaporation or spin coating to cover hexamethyldisilazane (HMDS) on the substrate for surface hydrophobic treatment; the hydrophobic treatment can be after the hydrophilic treatment; or adding a bottom antireflection coating (BARC), a bottom carbon-containing coating (Spin on carbon, SOC), or a bottom silicon-containing coating (Spin on glass, SOG).

[0104] In an embodiment of the present application, the substrate can be cleaned before coating to remove impurities and dust on the substrate surface. Specifically, the cleaning method can be, but is not limited to, using solvents, acids, ultrasonic waves, or spray cleaning, etc. In an embodiment of the present application, the cleaning method can be ultrasonic cleaning.

[0105] In an embodiment of the present application, the exposure light source can be, but is not limited to, light with a wavelength of 10 nm - 380 nm, X-rays, electron beams, ion beams, etc.

[0106] In an embodiment of the present application, after coating and before exposure, a baking treatment can be performed to remove excess solvent in the film layer and improve the structural reliability of the patterning composition; a baking treatment can also be performed after exposure and before development to promote chemical reactions in the etching-resistant coating. The baking temperature is 60°C - 200°C, and the baking time is 20s - 120s. Specifically, the baking temperature can be, but is not limited to, 60°C, 80°C, 100°C, 120°C, 140°C, 160°C, 180°C, or 200°C, etc., and the baking time can be, but is not limited to, 20s, 40s, 60s, 80s, 100s, or 120s, etc. In an embodiment of the present application, the baking temperature can be 60°C - 150°C, and the baking time can be 20s - 80s. In an embodiment of the present application, the baking temperature can be 100°C - 200°C, and the baking time can be 70s - 120s.

[0107] In one embodiment of the present application, a developer solution is used for development. Since the chemical properties and solubility of the exposed regions of the patterned composition film layer change, the exposed patterned composition film layer needs to be cleaned with a developer solution to obtain a patterned film. The cleaning time ranges from 10s to 300s and can be divided into single-step cleaning and multi-step cleaning. After cleaning, if the exposed regions of the patterned composition film layer are washed away, it is a positive development, forming a positive pattern, and the patterned composition is a positive patterned composition; if the exposed regions are not washed away, it is a negative development, forming a negative pattern, and the patterned composition is a negative patterned composition.

[0108] In one embodiment of the present application, the developing solution includes a developer. The developer can be selected according to the properties of the patterned composition and used in combination to improve the etching effect. The developing time is 10s-120s. Specifically, the developer can include, but is not limited to, organic solutions, inorganic solutions, pure solvents, mixed solvents, solvents containing other additives, etc.; illustratively, the organic solvent can be, but is not limited to, one or more of ketones, alcohols, ethers, esters, lactones, and high-boiling-point alcohols; among them, ketones can be, but are not limited to, cyclohexanone or methyl-2-n-pentyl ketone; alcohols can be, but are not limited to, 3-methoxybutanol, 3-methyl-3-methoxybutanol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, or diacetone alcohol; ethers can be, but are not limited to, propylene glycol monohydrate. Methyl ether, ethylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monoethyl ether, propylene glycol dimethyl ether, or diethylene glycol dimethyl ether; esters may include, but are not limited to, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl lactate, ethyl pyruvate, butyl acetate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, tert-butyl acetate, tert-butyl propionate, or propylene glycol monotert-butyl ether acetate; lactones may include, but are not limited to, γ-butyrolactone; high-boiling-point alcohol solvents may include, but are not limited to, diethylene glycol, propylene glycol, glycerol, 1,4-butanediol, or 1,3-butanediol. In one embodiment of the present application, the developer may be a 0.5%-5% aqueous solution of tetramethylammonium hydroxide (TMAH). In some embodiments, the developer further includes rinsing and baking after development to remove impurities on the surface of the patterned film and improve the structural reliability of the patterned film.

[0109] In one embodiment of the present application, after forming a patterned film on a substrate, the method further includes: etching the patterned substrate or injecting electrons to form a pattern on the surface of the patterned substrate, thereby forming a structure required for a semiconductor device on the surface of the substrate to obtain a semiconductor device.

[0110] The effects of the technical solution of this application are further illustrated below through specific examples.

[0111] Example 1

[0112] Mix a dispersant, an organic pigment (PG58), a synergist (the structural formula of the synergist is ), and a solvent (propylene glycol methyl ether acetate), and perform two sanding and centrifugation treatments to obtain a pigment composition. The dispersant includes:

[0113] , where the weight-average molecular weight Mw of the dispersant is 20,000, PDI = 1.4, n is 9.5, and x:y is 20.99:79.01.

[0114] Example 2

[0115] The difference from Example 1 is that, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the dispersant in the pigment composition is 20%.

[0116] Example 3

[0117] The difference from Example 1 is that the dispersant includes n is 9, h is 7.5, where the weight-average molecular weight Mw of the dispersant is 18,000, PDI = 1.61, and x:y:z is 20.83:63.96:15.21.

[0118] Example 4

[0119] The difference from Example 1 is that, based on the total mass of the non-volatile components in the pigment composition being 100%, the mass percentage of the synergist in the pigment composition is 3.57%, and the mass percentage of the dispersant is 24.99%.

[0120] Comparative Example 1

[0121] The difference from Example 1 is that the dispersant includes: , where the weight-average molecular weight Mw of the dispersant is 12,600, PDI = 1.3, n is 3, and x:y is 30.67:69.33.

[0122] Comparative Example 2

[0123] The difference from Example 1 is that the dispersant includes: , where the weight-average molecular weight Mw of the dispersant is 10,198, PDI = 1.36, n is 3, and x:y is 30.67:69.33.

[0124] Comparative Example 3

[0125] The difference from Example 1 is that the dispersant includes: , n is 3, h is 3.5, wherein the weight-average molecular weight Mw of the dispersant is 12952, PDI = 1.53, and x:y:z is 33.85:58.46:7.69.

[0126] Comparative Example 4

[0127] The difference from Example 1 is that the dispersant is , n is 3, the weight-average molecular weight Mw of the dispersant is 20,000, and PDI = 1.4.

[0128] Comparative Example 5

[0129] The difference from Example 1 is that no dispersant is added.

[0130] Comparative Example 6

[0131] The difference from Example 1 is that no synergist is added.

[0132] Performance detection

[0133] The component contents of the pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 are shown in Table 1.

[0134] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to particle size testing. The testing method was as follows: after diluting the pigment composition by about 2000 times, the particle size was tested using a dynamic light scattering nanometer particle size analyzer. The test results are shown in Table 1.

[0135] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to viscosity testing using an E-type viscometer. The test results are shown in Table 1.

[0136] The pigment compositions prepared in the above Examples 1-4 and Comparative Examples 1-6 were subjected to stability testing using an E-type viscometer. The pigment composition was heat stored at 40 °C for 7 days, and the stability of the dispersion was judged by comparing with the initial viscosity.

[0137] The pigment compositions prepared in the above Examples 1-4, together with a film-forming resin, a polymerizable monomer, an initiator, a UV absorber, and a leveling agent, constituted a patterning composition, and the cleaning rate was tested using (aqueous TMAH solution). The testing method was to coat the patterning composition on a 4-inch glass sheet, drop in the developer, record the cleaning thickness and cleaning time, and calculate the cleaning speed. The test results are shown in Table 2.

[0138] Table 1 Performance testing of pigment compositions

[0139]

[0140] Table 2 Performance testing of patterning compositions

[0141]

[0142] It can be seen from Examples 1-4 and Comparative Examples 1-6 that the pigment composition provided by the present application has both high dispersion performance and high organic pigment content and excellent stability when using a low dispersant content. It can be seen from Example 1 and Examples 2-4 that the pigment composition provided by the present application can increase the usage amount of organic pigment without affecting the dispersion performance of the pigment composition when using a low content of dispersant and an appropriate amount of synergist, and has similar levels of viscosity and particle size, achieving the same dispersion effect. It can be seen from Example 1 and Example 3 that the third structural unit can enable the patterning group to have excellent cleaning rate, which is beneficial to the stability of semiconductor processes. It can be seen from Example 1 and Comparative Examples 1-6 that by using the present application under the interaction of dispersant and synergist, the organic pigment content in the pigment composition can be further increased, the dispersion performance of the pigment composition can be improved, the agglomeration of the pigment composition can be inhibited, and a nano-level pigment composition can be obtained, which is beneficial to improving the refinement, spectroscopic effect and anti-optical crosstalk ability of semiconductor devices.

[0143] It should be understood that the first, second and various numerical numbers involved herein are only for convenience of description and are not used to limit the scope of the present application.

[0144] In the present application, "and / or" describes the association relationship of associated objects, indicating that three relationships can exist. For example, A and / or B can represent: A exists alone, A and B exist simultaneously, and B exists alone, where A and B can be singular or plural. The character " / " generally represents an "or" relationship between the associated objects before and after.

[0145] In the present application, "at least one" means one or more, and "a plurality" means two or more. "At least one (item)" or its similar expression below refers to any combination of these items, including any combination of single item (item) or plural items (items). For example, "at least one (item) of a, b, or c", or "at least one (item) of a, b, and c" can both represent: a, b, c, a-b (that is, a and b), a-c, b-c, or a-b-c, where a, b, and c can be single or multiple respectively.

[0146] In the present application, "-" represents a range value, including the endpoint values at both ends. For example, the value of a can be 0.5-15, indicating that the value of a can be between 0.5 and 15, and includes the endpoint values 0.5 and 15.

[0147] The above are the preferred embodiments of the present application, but it should not be construed as limiting the scope of the present application. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present application, several improvements and refinements can be made, and these improvements and refinements are also regarded as the protection scope of the present application.

Claims

1. A pigment composition, characterized in that, The pigment composition includes a dispersant, an organic pigment, a synergist, and a solvent. The synergist includes a basic compound. The dispersant includes a first structural unit represented by formula (I), a second structural unit represented by formula (II), and a third structural unit represented by formula (IV). Formula (I), Formula (II), Formula (IV), In formula (I), R1, R2 and R3 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R4 is selected from a single bond or -C(=O)O-, and R5 is selected from a single bond, -R a -O(O=)C-R b -, -R c -HN-(O=)C-R d -, -R e -(O=)2SNH-R f -, an alkylene group or an arylene group, R a , R b , R c , R d , R e , R f are independently selected from a single bond or an alkylene group; In formula (II), R 1 , R 2 and R 3 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 4 is -C(=O)O-, R 5 is , R 6 is selected from an alkyl group having 1 to 20 carbon atoms, R , R 7 is selected from -R a -O(O=)C-, -R b -HN-(O=)C- or -R c -(O=)2SNH-, R 8 is selected from an alkylene group, R a , R b , R c are independently selected from an alkylene group, and n is any positive number within the range of 4 to 10; In formula (IV), R 9 , R 10 and R 11 are independently selected from a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 12 is an alkylene group, R 13 is , R 14 is an alkoxy group having 1 to 3 carbon atoms, R 15 is an alkylene group having 1 to 3 carbon atoms, h is any positive number in the range of 5 to 10; In the dispersant, the mass percentage of the first structural unit is 20% - 25%, the mass percentage of the second structural unit is 60% - 70%, and the mass percentage of the third structural unit is 10% - 20%.

2. The pigment composition according to claim 1, wherein Said R 6 is selected from C5-C20 alkyl groups.

3. The pigment composition according to claim 1, characterized in that, The dispersant includes a structure represented by formula (V): Formula (V), Wherein, x is the mass ratio of the first structural unit, y is the mass ratio of the second structural unit, z is the mass ratio of the third structural unit, the ratio of x, y, and z is (20 - 25):(60 - 70):(10 - 20), x + y + z = 100, n is any positive number in the range of 4 - 10, and h is any positive number in the range of 5 - 10.

4. The pigment composition according to claim 1, characterized in that, The weight - average molecular weight of the dispersant is 9000 - 25000, and the polydispersity index of the dispersant is less than or equal to 1.

4.

5. The pigment composition according to any one of claims 1-4, characterized in that, Based on the total mass of the non - volatile components in the pigment composition being 100%, in the pigment composition, the mass percentage of the organic pigment is 69% - 76.9%, the mass percentage of the dispersant is 18% - 24%, and the mass percentage of the synergist is 5% - 8%.

6. The pigment composition according to claim 1, characterized in that, The mass ratio of the dispersant to the organic pigment is (0.2 - 0.3):1, the mass ratio of the synergist to the organic pigment is (0.05 - 0.1):1, and the mass ratio of the dispersant to the synergist is (0.2 - 0.3):(0.05 - 0.1).

7. The pigment composition according to claim 1, characterized in that, The solvent includes one or more of propylene glycol methyl ether acetate and propylene glycol monomethyl ether; In the pigment composition, the mass percentage of the solvent is 75% - 80%.

8. The pigment composition according to claim 1, characterized in that, The particle size D50 of the pigment composition is less than or equal to 120 nm, and the particle size D90 of the pigment composition is less than or equal to 200 nm.

9. The pigment composition according to claim 1, characterized in that, The viscosity of the pigment composition is less than or equal to 4 mPa·s; Stored at 40°C for 7 days, the viscosity change rate of the pigment composition is less than or equal to 5%.

10. A patterned composition, characterized in that, The patterning composition includes the pigment composition according to any one of claims 1 - 9 and a film - forming resin.

11. A patterned substrate, characterized in that, The patterned substrate is prepared from the patterning composition according to claim 10.

12. A color filter, characterized in that, The color filter includes the patterned substrate according to claim 11.

13. A semiconductor device, characterized in that, The semiconductor device is prepared using the patterning composition according to claim 10.

Images