Uniformity-adjustable coating equipment

Abstract

The invention discloses uniformity-adjustable coating equipment, and relates to the technical field of film deposition, the uniformity-adjustable coating equipment comprises a coating equipment main body and a controller, the coating equipment main body comprises a box body, a workbench and a target material adjusting assembly are mounted in the box body, the workbench is mounted in the middle of the box body, and the target material adjusting assembly is mounted in the box body. The target material adjusting assembly is installed above the workbench, a target material is installed at the bottom of the target material adjusting assembly, an adjusting assembly is arranged on the workbench and can adjust a material, and a detection assembly is arranged between the adjusting assembly and the target material, so that when the device is used, a film on the surface of the material can be more uniform; when one surface is homogenized, the other surface can be coated, so that films on two surfaces of a material can be in a balanced state, and in consideration of different products, the device can properly adjust the thickness of the coated film, so that the produced finished product is more excellent.

Description

Technical Field

[0001] The invention relates to the technical field of thin film deposition, in particular to a uniformity-adjustable film coating device. Background Art

[0002] In semiconductor manufacturing technology, in order to impart certain properties to the material used, it is necessary to form a thin film on the surface of the material.

[0003] Thin film deposition methods generally include physical vapor deposition. When the existing equipment is used, when a wafer can be placed in a reaction chamber and a deposition gas can be filled into the reaction chamber, the reaction chamber is heated by a heating plate, and the gas entering the reaction chamber is deposited on the wafer to form a thin film.

[0004] However, when the existing equipment is coating the material, because the target atoms produced by the target material are not always in a balanced state, the target material block is not in a balanced consumption, which will affect the target material block at a specific position, with more or less target atoms. When the target atoms are deposited on the material again, the film on its surface will not be in a uniform state.

[0005] Although a small number of devices can achieve uniform balance, different materials require films of different thicknesses, which will cause the difference to expand and lead to the output of a large number of defective products. Summary of the invention

[0006] The purpose of the present invention is to provide a uniformity-adjustable film coating device to solve the problems raised in the prior art.

[0007] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a uniformity adjustable film coating device, comprising a film coating device body and a controller, the film coating device body comprising a box body, a workbench and a target material adjustment assembly are installed inside the box body, the workbench is installed in the middle of the box body, the target material adjustment assembly is installed above the workbench, a target material is installed at the bottom of the target material adjustment assembly, an adjustment assembly is arranged on the workbench, the adjustment assembly can adjust the material, and a detection assembly is arranged between the adjustment assembly and the target material.

[0008] Furthermore, the adjusting assembly includes two groups of adjusting cylinders and two groups of clamping assemblies, an installation groove is provided on the workbench, and the two groups of clamping assemblies are relatively installed between the installation grooves, the clamping assembly includes a limit rod, a clamping frame is installed above the limit rod, a clamping cylinder is installed above the clamping frame, a clamping plate is installed between the clamping frames, the output end of the clamping cylinder is connected to the clamping plate, materials are installed between the two groups of clamping assemblies, a clamping motor is installed on the side of the limit rod, and the output end of the clamping motor is connected to the clamping frame.

[0009] Furthermore, a supporting platform is installed at the bottom of the workbench, a driving motor is installed at the bottom of the supporting platform, a driving wheel and two groups of driven wheels are installed above the supporting platform, the output end of the driving motor cooperates with the driving wheel, a limiting slide groove is arranged on the supporting platform, the two groups of driven wheels are respectively installed in the limiting slide groove through bearings, the two groups of driven wheels cooperate with the driving wheel, the adjusting cylinders are respectively installed above the two groups of driven wheels, and the output end of the adjusting cylinder is connected to the limiting rod.

[0010] Furthermore, a limiting groove is provided on the limiting rod, sliding grooves are provided on both sides of the limiting groove, a T-shaped rod is installed inside the limiting groove, both sides of the T-shaped rod are connected to the sliding groove through sliders, and return springs are respectively installed on the upper and lower sides of the T-shaped rod, and the other ends of the two groups of return springs are respectively connected to the limiting grooves.

[0011] Furthermore, a barrier component is provided on the workbench, and the barrier component can block the target atoms. The barrier component includes a barrier bearing, and the barrier bearing is embedded in the workbench and located outside the mounting groove. A barrier film is installed on the barrier bearing, and the other end of the barrier film is connected to two sets of limit rods.

[0012] Furthermore, a vacuum pump and a gas tank are installed at the bottom of the box, and the vacuum pump and the gas tank are located on the same plane as the driving motor. The output ends of the vacuum pump and the gas tank are respectively connected to the top of the workbench. The vacuum pump can extract air from the working area of ​​the box, and the gas tank can inject argon into the working area of ​​the box.

[0013] Furthermore, the detection assembly includes multiple groups of X-ray diffractors, the output ends of the X-ray diffractors close to the workbench are oriented toward the workbench, and the output ends of the X-ray diffractors close to the target are oriented toward the target.

[0014] Furthermore, the target material adjustment assembly includes an adjustment motor, which is installed above the box body. An adjustment plate is installed at the output end of the adjustment motor, and the adjustment plate is located inside the box body. The target material is installed at the bottom of the adjustment plate.

[0015] Furthermore, when the target material is consumed severely locally: the motor is adjusted to drive the rotating target material to change the consumption area.

[0016] When the target atoms on the material are uneven: the drive motor and adjustment components will adjust the current angle and position of the material.

[0017] Furthermore, the controller is installed at the bottom of the box, and a control panel is provided on the box, and the control panel is connected to the controller.

[0018] Compared with the prior art, the present invention has the following beneficial effects:

[0019] 1. When the device is in use, the film on the surface of the material can be more uniform. After one side is uniformized, the other side can be coated again, so that the films on both sides of the material can be in a balanced state. Considering the difference in products, the device can properly adjust the thickness of the coating, so that the finished product can be better.

[0020] 2. Through the detection component of the device, it can be known whether the target atoms on the surface of the material are uniform, and the consumption of the target material can also be known. Then, under the control of the controller, the material can be adjusted, and the target material can also be adjusted. The current angle and position of the material can be adjusted to autonomously receive more target atoms, so as to autonomously make up for the missing target atoms and make the whole uniform. Adjusting the target material can prevent excessive consumption of the target material in a specific area, resulting in uneven overall target material and affecting the release of target atoms;

[0021] 3. After the device has perfectly coated one side of the material, the clamping component of the device can drive the material to flip over, so as to coat the other side of the material, and the final diffraction pattern of the first side of the material will become the comparative diffraction pattern of the second side of the material, so that the films coated on both sides of the material can also be in a uniform state;

[0022] 4. When the device is working normally, the barrier component can block the deposited target atoms to prevent the target atoms from being deposited outside the working area and affecting the other components of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0024] Figure 2 It is a schematic diagram of the internal structure of the present invention;

[0025] Figure 3 It is a structural schematic diagram of the base surface on the workbench of the present invention;

[0026] Figure 4 It is a schematic cross-sectional structure diagram of a part of the present invention;

[0027] Figure 5 It is a structural schematic diagram of the limiting rod of the present invention;

[0028] Figure 6 For the present invention Figure 4 An enlarged schematic diagram of the area "A" in the figure;

[0029] Figure 7 For the present invention Figure 5 An enlarged schematic diagram of the area "B" in the figure;

[0030] Figure 8 For the present invention Figure 2 Enlarged schematic diagram of point "C" in the figure.

[0031] In the figure: 1. Coating equipment body; 11. Box; 12. Workbench; 121. Mounting slot; 13. Support platform; 14. Drive motor; 15. Vacuum pump; 16. Gas tank; 2. Target adjustment assembly; 21. Adjustment motor; 3. Adjustment assembly; 31. Adjustment cylinder; 4. Detection assembly; 41. X-ray diffractometer; 5. Clamping assembly; 51. Limit rod; 511. Limit slot; 512. T-bar; 52. Clamping frame; 53. Clamping cylinder; 54. Clamping plate; 55. Clamping motor; 6. Barrier assembly; 61. Barrier bearing; 62. Barrier film; 7. Controller; 71. Operation panel. DETAILED DESCRIPTION

[0032] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0033] Example: Figure 1-Figure 8 As shown, the present invention provides a technical solution of a uniformity adjustable coating equipment, including a coating equipment body 1 and a controller 7, characterized in that: the coating equipment body 1 includes a box body 11, a workbench 12 and a target material adjustment component 2 are installed inside the box body 11, the workbench 12 is installed in the middle of the box body 11, the target material adjustment component 2 is installed above the workbench 12, a target material is installed at the bottom of the target material adjustment component 2, an adjustment component 3 is arranged on the workbench 12, the adjustment component 3 can adjust the material, and a detection component 4 is arranged between the adjustment component 3 and the target material;

[0034] When the device is in use, the material needs to be placed on the clamping assembly 5 above the workbench 12 first, and the material is clamped by the clamping assembly 5. Then the staff can start the device and start the vacuum pump 15. The working area of ​​the device is evacuated by the vacuum pump 15, and then argon gas is introduced into the working area. Because the target material is connected to the anode, plasma is generated in the area at the bottom of the target material. After the argon gas enters the working area, it will come into contact with the plasma, and then the argon atoms in the argon gas will generate argon positive ions after coming into contact with the electrons. After the argon positive ions collide with the target material, the target atoms will fall off the surface of the target material and will be deposited on the material between the clamping assemblies 5. When the target atoms are deposited on the material, the detection assembly 4 will detect the deposited side of the material. At the same time, the other half of the detection component 4 will detect the target material, so as to know the current consumption of the target material and whether the consumption of the local area of ​​the current target material is different, and then detect whether the target atoms on the surface of the material are uniform. When the deposit on the surface of the material is not uniform, the current angle of the material can be adjusted by adjusting the component 3, and the target material can also be adjusted by the external adjustment motor 21 to change the position of the target material to prevent the target material from being consumed in one area all the time. After the deposition of one side of the material is completed, the clamping component 5 will turn the material over and then perform thin film deposition on the other side of the material again. Therefore, when the device is in use, it can adaptively adjust the thickness and uniformity of the film, and can also detect the local consumption of the target material, so as to adjust it in conjunction with the material.

[0035] like Figure 1-Figure 3 and Figure 8 As shown, in this embodiment, specifically, the adjustment component 3 includes two groups of adjustment cylinders 31 and two groups of clamping components 5, the workbench 12 is provided with a mounting groove 121, and the two groups of the clamping components 5 are relatively installed between the mounting grooves 121, and the clamping component 5 includes a limit rod 51, a clamping frame 52 is installed above the limit rod 51, a clamping cylinder 53 is installed above the clamping frame 52, a clamping plate 54 is installed between the clamping frames 52, the output end of the clamping cylinder 53 is connected to the clamping plate 54, and materials are installed between the two groups of the clamping components 5, and a clamping motor 55 is installed on the side of the limit rod 51, and the output end of the clamping motor 55 is connected to the clamping frame 52;

[0036] When in use, the adjusting component 3 of the device can adjust the material, and the detection component 4 can detect the target material and the material. When the target atoms on the surface of the material are uneven, the adjusting component 3 will adjust the material, and when the target atoms on one side of the material are deposited, the clamping component 5 will drive the material to turn the material over so that a thin film can be deposited on the other side of the material. When in use, the clamping component 5 can clamp the material, and then start the coating equipment body 1 to deposit a thin film on the surface of the material. When the surface of the material is uneven in a local area, the adjusting component 3 adjusts the current angle of the material by adjusting the cylinder 31, and when the thin film deposition on one side of the material is completed, the clamping motor 55 will drive the clamping frame 52 to rotate, thereby turning the material over, and thus the device can ensure the uniformity of the thin film on both sides of the material when in use.

[0037] like Figure 2 , Figure 4 and Figure 6 As shown, in this embodiment, specifically, a support platform 13 is installed at the bottom of the workbench 12, a drive motor 14 is installed at the bottom of the support platform 13, a driving wheel and two groups of driven wheels are installed above the support platform 13, the output end of the drive motor 14 cooperates with the driving wheel, a limited sliding groove is provided on the support platform 13, the two groups of driven wheels are respectively installed inside the limited sliding groove through bearings, the two groups of driven wheels cooperate with the driving wheel, and the regulating cylinders 31 are respectively installed above the two groups of driven wheels, and the output end of the regulating cylinder 31 is connected to the limiting rod 51;

[0038] The material of the device can also rotate under the limitation of the clamping component 5, so that the material can be deposited with a thin film more evenly. During specific use, the driving motor 14 can drive the active wheel to rotate, and when the active wheel rotates, it will drive the driven wheel to rotate, and the driven wheel will rotate in the limiting groove as limited by the limiting groove, and when the driven wheel rotates, it will drive the adjusting cylinder 31 to move, and the output end of the adjusting cylinder 31 is connected to the limiting rod 51, and can drive the limiting rod 51 to move together, so as to drive the material to rotate, so that the film on the surface of the material can be more uniform.

[0039] like Figure 5 and Figure 7 As shown, in this embodiment, specifically, a limiting groove 511 is provided on the limiting rod 51, and sliding grooves are provided on both sides of the limiting groove 511. A T-shaped rod 512 is installed inside the limiting groove 511, and both sides of the T-shaped rod 512 are connected to the sliding groove through sliders. Return springs are installed on the upper and lower sides of the T-shaped rod 512, and the other ends of the two groups of return springs are connected to the limiting groove 511 respectively;

[0040] When the device is adjusting the material, the height of the limit rod 51 can be controlled by adjusting the cylinder 31. When the height of a group of limit rods 51 changes, the current angle of the material will change, so that the target atoms deposited on the material can be more uniform. When the limit rod 51 is adjusted, one end of the T-bar 512 on the limit rod 51 will be limited between the installation grooves 121, so that even if the limit rod 51 is adjusted again, it can prevent the limit rod 51 from being affected. At the same time, it can also play the role of limiting the limit rod 51, so that the device can be more stable when adjusting the material.

[0041] like Figure 1-Figure 2 As shown, in this embodiment, specifically, a barrier component 6 is further provided on the workbench 12, and the barrier component 6 can block the target atoms. The barrier component 6 includes a barrier bearing 61, and the barrier bearing 61 is embedded and installed on the workbench 12. The barrier bearing 61 is located at the periphery of the installation groove 121, and a barrier film 62 is installed on the barrier bearing 61. The other end of the barrier film 62 is connected to the two groups of limit rods 51;

[0042] The barrier component 6 of the device can play a role in blocking target atoms and prevent target atoms from being deposited outside the working area. When the barrier component 6 is used, one end of the barrier film 62 is connected to the barrier bearing 61, and the other end is respectively surrounded by two groups of limit rods 51. When the driving motor 14 drives the limit rod 51 to rotate, the limit rod 51 will also drive the barrier film 62 to rotate, and the other end of the barrier film 62 will drive the barrier bearing 61 to rotate. Because the barrier film 62 has a certain ductility, the device will not cause damage to the barrier film 62 when adjusted, so that the target atoms can be effectively blocked.

[0043] like Figure 2 and Figure 4 As shown, in this embodiment, specifically, a vacuum pump 15 and a gas storage tank 16 are installed at the bottom of the box body 11, and the vacuum pump 15 and the gas storage tank 16 are both located on the same plane as the drive motor 14. The output ends of the vacuum pump 15 and the gas storage tank 16 are respectively connected to the top of the workbench 12. The vacuum pump 15 can extract air from the working area of ​​the box body 11, and the gas storage tank 16 can inject argon gas into the working area of ​​the box body 11;

[0044] When the device is in use, the vacuum pump 15 is started to evacuate the working area of ​​the device through the vacuum pump 15, and then argon gas is introduced into the working area. Because the target material is connected to the anode, plasma will be generated in the area at the bottom of the target material. After the argon gas enters the working area, it will come into contact with the plasma. After the argon atoms in the argon gas come into contact with electrons, argon positive ions will be generated. After the argon positive ions collide with the target material, the target atoms will fall off the surface of the target material.

[0045] like Figure 1-Figure 2 As shown, in this embodiment, specifically, the detection assembly 4 includes a plurality of groups of X-ray diffractors 41, the output end of the X-ray diffractors 41 close to the workbench 12 is oriented toward the workbench 12, and the output end of the X-ray diffractors 41 close to the target is oriented toward the target;

[0046] Half of the detection component 4 will detect the side where the material is deposited, while the other half of the detection component 4 will detect the target material, so that the detection component 4 can know the uniformity of the target atoms on the current material, and can also know the overall consumption of the current target material. When used specifically, the material is diffracted by X-rays, and a diffraction pattern can be formed through the controller 7. From the diffraction pattern, it can be known whether the target atoms deposited on the material are uniform. When the target atoms are uniformly deposited on the material, it means that the generation of target atoms is sufficient, and the distribution of target atoms is also relatively uniform. Then, the material at this time is the best finished product. At the same time, according to the distribution of target atoms and the results obtained by the other half of the detection component 4, it is possible to more accurately know the consumption of the current target material, whether the local area is intensively consumed, or whether the local area is unevenly consumed.

[0047] like Figure 1-Figure 2 As shown, in this embodiment, specifically, the target material adjustment assembly 2 includes an adjustment motor 21, the adjustment motor 21 is installed above the box body 11, an adjustment plate is installed at the output end of the adjustment motor 21, the adjustment plate is located inside the box body 11, and the target material is installed at the bottom of the adjustment plate.

[0048] When the target material of the device is partially consumed unevenly, the adjustment component 3 of the device will drive the adjustment plate to rotate, and then drive the target material to rotate, so as to adjust the current target material, improve the consumption of the target material, and make the target material consumption relatively uniform.

[0049] like Figure 1-Figure 8 As shown, in this embodiment, specifically, when the target material is consumed severely locally: the motor 21 is adjusted to drive the rotating target material to change the consumption area.

[0050] When the target atoms on the material are uneven: the driving motor 14 and the adjusting component 3 will adjust the current angle and position of the material;

[0051] When the target material is partially consumed unevenly, the controller 7 will automatically control the adjustment motor 21 to adjust the current state of the target material. When the target atoms on the material are uneven, the device will also adaptively adjust the position of the target material so that the final product can be in the best state.

[0052] like Figure 1 As shown, in this embodiment, specifically, the controller 7 is installed at the bottom of the box 11, and a control panel 71 is provided on the box 11, and the control panel 71 is connected to the controller 7;

[0053] Therefore, when the device is in use, each device of the device can be controlled through the controller 7, and because the controller 7 is connected to the control panel 71, the staff can indirectly control and monitor the coating device body 1 through the control panel 71.

[0054] Working principle: When the device is in use, the material must first be placed on the clamping assembly 5 above the workbench 12, and the material is clamped by the clamping assembly 5. Then the staff can start the device and start the vacuum pump 15. The working area of ​​the device is evacuated by the vacuum pump 15, and then argon gas is introduced into the working area. Because the target material is connected to an anode, plasma is generated in the area at the bottom of the target material. After the argon gas enters the working area, it will come into contact with the plasma, and then the argon atoms in the argon gas will produce argon positive ions after coming into contact with electrons. After the argon positive ions collide with the target material, the target atoms will fall off the surface of the target material and will be deposited on the material between the clamping assembly 5. When the target atoms are deposited on the material, the detection assembly 4 will detect the deposited side of the material. The detection is carried out, and at the same time, the other half of the detection component 4 will detect the target material, so as to know the current consumption of the target material, whether the consumption of the local area of ​​the current target material is different, and then detect whether the target atoms on the surface of the material are uniform. When the deposit on the surface of the material is not uniform, the current angle of the material can be adjusted by adjusting the component 3, and at the same time, the target material can also be adjusted by the external adjustment motor 21 to change the position of the target material to prevent the target material from being consumed in one area all the time. After the deposition of one side of the material is completed, the clamping component 5 will turn the material over, and then perform thin film deposition on the other side of the material again. Therefore, when the device is in use, it can adaptively adjust the thickness and uniformity of the film, and can also detect the local consumption of the target material, so as to adjust it in conjunction with the material.

[0055] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

Claims

1. A uniformity-adjustable coating device, comprising a coating device body (1) and a controller (7), characterized in that: The coating equipment body (1) comprises a box (11), a workbench (12) and a target material adjustment component (2) are installed inside the box (11), the workbench (12) is installed in the middle of the box (11), the target material adjustment component (2) is installed above the workbench (12), a target material is installed at the bottom of the target material adjustment component (2), an adjustment component (3) is arranged on the workbench (12), the adjustment component (3) can adjust the material, a detection component (4) is arranged between the adjustment component (3) and the target material, and the adjustment component (3) ) includes two groups of adjusting cylinders (31) and two groups of clamping components (5). The detection component (4) detects the side where the material is deposited, while the other half of the detection component (4) detects the target material, so as to know the current consumption of the target material and then detect whether the target atoms on the surface of the material are uniform. When the deposit on the surface of the material is not uniform, the current angle of the material is adjusted by the adjusting component (3). When one side of the material is deposited, the clamping component (5) will turn the material over and then perform thin film deposition on the other side of the material again.

2. The uniformity adjustable coating device according to claim 1, characterized in that: The workbench (12) is provided with a mounting groove (121), and the two groups of the clamping assemblies (5) are relatively mounted between the mounting grooves (121). The clamping assembly (5) comprises a limit rod (51), a clamping frame (52) is mounted above the limit rod (51), a clamping cylinder (53) is mounted above the clamping frame (52), a clamping plate (54) is mounted between the clamping frames (52), an output end of the clamping cylinder (53) is connected to the clamping plate (54), a material is mounted between the two groups of the clamping assemblies (5), a clamping motor (55) is mounted on the side of the limit rod (51), and an output end of the clamping motor (55) is connected to the clamping frame (52).

3. The uniformity adjustable coating device according to claim 2, characterized in that: A support platform (13) is installed at the bottom of the workbench (12), a drive motor (14) is installed at the bottom of the support platform (13), a driving wheel and two groups of driven wheels are installed above the support platform (13), the output end of the drive motor (14) cooperates with the driving wheel, a limiting slide groove is provided on the support platform (13), the two groups of driven wheels are respectively installed inside the limiting slide groove through bearings, the two groups of driven wheels cooperate with the driving wheel, the regulating cylinders (31) are respectively installed above the two groups of driven wheels, and the output end of the regulating cylinder (31) is connected to the limiting rod (51).

4. The uniformity adjustable coating device according to claim 3, characterized in that: The limiting rod (51) is provided with a limiting groove (511), and sliding grooves are provided on both sides of the limiting groove (511). A T-shaped rod (512) is installed inside the limiting groove (511), and both sides of the T-shaped rod (512) are connected to the sliding groove via sliding blocks. Return springs are respectively installed on the upper and lower sides of the T-shaped rod (512), and the other ends of the two groups of return springs are respectively connected to the limiting groove (511).

5. The uniformity adjustable coating device according to claim 4, characterized in that: The workbench (12) is also provided with a barrier component (6), the barrier component (6) being capable of blocking target atoms, the barrier component (6) comprising a barrier bearing (61), the barrier bearing (61) being embedded and mounted on the workbench (12), the barrier bearing (61) being located at the periphery of the mounting groove (121), a barrier film (62) being mounted on the barrier bearing (61), the other end of the barrier film (62) being connected to two sets of limit rods (51).

6. The uniformity adjustable coating device according to claim 5, characterized in that: A vacuum pump (15) and a gas storage tank (16) are installed at the bottom of the box (11); the vacuum pump (15) and the gas storage tank (16) are both located on the same plane as the drive motor (14); the output ends of the vacuum pump (15) and the gas storage tank (16) are respectively connected to the top of the workbench (12); the vacuum pump (15) can extract air from the working area of ​​the box (11), and the gas storage tank (16) can inject argon gas into the working area of ​​the box (11).

7. The uniformity adjustable coating device according to claim 6, characterized in that: The detection assembly (4) comprises a plurality of groups of X-ray diffractors (41), wherein the output end of the X-ray diffractors (41) close to the workbench (12) faces the workbench (12), and the output end of the X-ray diffractors (41) close to the target material faces the target material.

8. The uniformity adjustable coating device according to claim 7, characterized in that: The target material adjustment assembly (2) comprises an adjustment motor (21), the adjustment motor (21) is mounted above the box body (11), an adjustment plate is mounted on the output end of the adjustment motor (21), the adjustment plate is located inside the box body (11), and the target material is mounted on the bottom of the adjustment plate.

9. The uniformity adjustable coating device according to claim 8, characterized in that: When the target material is consumed severely locally, the regulating motor (21) drives the rotating target material to change the consumption area; when the target atoms on the material are uneven, the driving motor (14) and the regulating component (3) adjust the current angle and position of the material.

10. The uniformity adjustable coating device according to claim 9, characterized in that: The controller (7) is installed at the bottom of the box (11), and a control panel (71) is provided on the box (11), and the control panel (71) is connected to the controller (7).

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