Chemical liquid supply system, liquid replacement method, substrate processing device and medium

Abstract

The present application discloses a chemical liquid supply system, a liquid replacement method, a substrate processing device, and a medium. The chemical liquid supply system includes a first supply unit and a control unit. The first supply unit includes a liquid storage tank, a liquid inlet pipeline, a first circulation pipeline, a heater, a first discharge pipeline, a flushing pipeline, and a detection device. The liquid inlet pipeline is used to pass chemical liquid into the liquid storage tank; the first circulation pipeline connects the inlet and outlet of the liquid storage tank; the heater is set in the first circulation pipeline; the first discharge pipeline is connected to the first circulation pipeline, and the flushing pipeline is used to pass flushing liquid into the liquid storage tank after the chemical liquid in the liquid storage tank and the heater is discharged from the first discharge pipeline; the detection device is used to detect the process parameters in the liquid storage tank and / or the first circulation pipeline; the control unit is respectively connected to the liquid inlet pipeline, the flushing pipeline, and the detection device, and is used to control the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters detected by the detection device. The present application can achieve discharge for liquid replacement and prevent leakage.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a chemical liquid supply system, a liquid replacement method for the chemical liquid supply system, a substrate processing device, and a computer-readable medium storing computer program code. Background Art

[0002] During the wet cleaning process, a single-wafer, high-temperature SPM (sulfuric acid hydrogen peroxide mixture) cleaning system is used to supply SPM solution to the substrate surface to clean organic matter and etching residues from the substrate surface. The single-wafer, high-temperature SPM cleaning system consists of a chamber and a sulfuric acid CDS (chemical distribution system). The chamber is used to accommodate the substrate, and the sulfuric acid CDS includes a reservoir, a circulation line, and a heater. The reservoir is used to supply sulfuric acid solution to the chamber. The provided sulfuric acid solution has a temperature of 90°C to 190°C and a concentration of 96%. The circulation line connects the inlet and outlet of the reservoir. The heater is installed in the circulation line to heat the sulfuric acid solution in the circulation line, and the heated sulfuric acid solution is returned to the reservoir through the circulation line.

[0003] When replacing a new sulfuric acid solution in a sulfuric acid CDS, the sulfuric acid solution in the CDS's reservoir, circulation piping, and heater must first be drained. The system must then be rinsed clean with a rinse solution, such as deionized water (DIW), before introducing a new sulfuric acid solution. If too much sulfuric acid solution remains before rinsing, the deionized water and the high-concentration, high-temperature sulfuric acid solution will react chemically, releasing significant heat. The combined temperature of the deionized water and sulfuric acid solution may even exceed 100°C within a short period of time, causing boiling. This in turn generates a large amount of water vapor, creating localized high pressure and potentially rupturing the sulfuric acid reservoir and piping, leading to leaks. Similarly, if too much rinse solution remains after rinsing and reacts chemically with the new sulfuric acid solution, this can also rupture the sulfuric acid reservoir and piping, causing leaks. Summary of the Invention

[0004] The purpose of this application is to solve the problem in the prior art of how to enable a chemical liquid supply system to be discharged in order to replace the liquid and prevent leakage.

[0005] To solve the above problems, one embodiment of the present application proposes a chemical liquid supply system, including a first supply part and a control part, the first supply part including: a liquid storage tank for storing chemical liquid; a liquid inlet pipeline for introducing chemical liquid into the liquid storage tank; a first circulation pipeline connecting the inlet and outlet of the liquid storage tank; a heater, arranged in the first circulation pipeline; a first discharge pipeline, connected to the first circulation pipeline, for discharging the chemical liquid in the liquid storage tank and the heater; a flushing pipeline, for introducing flushing liquid into the liquid storage tank after the chemical liquid in the liquid storage tank and the heater is discharged from the first discharge pipeline, so that the flushing liquid flushes the liquid storage tank and the first circulation pipeline in turn; and a detection device for detecting process parameters in the liquid storage tank and / or the first circulation pipeline; wherein the control part is respectively communicated with the liquid inlet pipeline, the flushing pipeline and the detection device, and the control part is used to control the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters detected by the detection device.

[0006] In one embodiment of the present application, the detection device includes a temperature sensor and / or a pressure sensor, and the process parameters include a temperature value and / or a pressure value; in response to the temperature value and / or the pressure value exceeding the corresponding predetermined value, the control unit controls the liquid inlet pipeline or the flushing pipeline to be shut down to stop the chemical liquid or flushing liquid from being introduced into the liquid storage tank.

[0007] In one embodiment of the present application, it further includes: a pressure protection device, which is arranged in the liquid storage tank and / or the first circulation pipeline, and is used to release the pressure when the pressure in the liquid storage tank and / or the first circulation pipeline exceeds a set value.

[0008] In one embodiment of the present application, it also includes: a liquid outlet pipeline, the access point of which is connected to the first circulation pipeline and is located between the outlet of the heater and the inlet of the liquid storage tank; a first filter, which is arranged in the liquid outlet pipeline and is used to filter the chemical liquid in the liquid outlet pipeline; and a second discharge pipeline, which is connected to the first filter and is used to discharge the chemical liquid in the first filter.

[0009] In one embodiment of the present application, a second supply part is further included, which includes: a liquid replenishing tank, connected to the liquid inlet pipeline, for replenishing chemical liquid into the liquid storage tank; a third discharge pipeline, connected to the liquid replenishing tank, for discharging the chemical liquid in the liquid replenishing tank; a second circulation pipeline, connecting the inlet and outlet of the liquid replenishing tank; a second filter, arranged in the second circulation pipeline; a fourth discharge pipeline, connected to the second filter, for discharging the chemical liquid in the second filter; wherein, the outlet of the fourth discharge pipeline is connected to the third discharge pipeline.

[0010] In one embodiment of the present application, it also includes: a recovery part for recovering chemical liquid; a waste liquid part for treating the flushing liquid after flushing; and a discharge main pipe, which is respectively connected to the recovery part and the waste liquid part, and is respectively connected to the first discharge pipeline, the second discharge pipeline and the third discharge pipeline.

[0011] In one embodiment of the present application, it further includes: a residual liquid detection sensor, which is arranged at the outlet of the discharge main pipe and is used to detect whether there are liquid droplets at the outlet of the discharge main pipe.

[0012] In one embodiment of the present application, the liquid storage tank includes: an inner tank body for containing the chemical liquid; and an outer tank body arranged on the periphery of the inner tank body.

[0013] Another embodiment of the present application provides a substrate processing apparatus, comprising: a plurality of chambers, each for accommodating a substrate; and the above-mentioned chemical liquid supply system, for supplying the chemical liquid in the liquid storage tank to the plurality of chambers respectively.

[0014] Another embodiment of the present application provides a liquid replacement method for a chemical liquid supply system, comprising the following steps:

[0015] Step S10: discharging the chemical liquid in the liquid storage tank and the heater through the first discharge pipeline, wherein the heater is provided in the first circulation pipeline, and the first circulation pipeline is connected to the inlet and outlet of the liquid storage tank;

[0016] Step S20: introducing a flushing liquid into the liquid reservoir through the flushing pipeline, so that the flushing liquid flushes the liquid reservoir and the first circulation pipeline in sequence, while detecting process parameters in the liquid reservoir and / or the first circulation pipeline, and controlling the on / off of the flushing pipeline according to the process parameters;

[0017] Step S30: discharging the flushing liquid in the liquid storage tank and the heater through the first discharge pipeline;

[0018] Step S40: introducing chemical liquid into the liquid storage tank through the liquid inlet pipeline, detecting process parameters in the liquid storage tank and / or the first circulation pipeline at the same time, and controlling the opening and closing of the liquid inlet pipeline according to the process parameters.

[0019] Another embodiment of the present application provides a computer-readable medium storing computer program code, which implements the above-mentioned fluid replacement method when executed by a processor.

[0020] The present application can discharge the liquid storage tank, the first circulation pipeline and the heater on the first circulation pipeline by setting a first discharge pipeline, and can flush the liquid storage tank, the first circulation pipeline and the heater on the first circulation pipeline after discharge by setting a flushing pipeline. Chemical liquid can be introduced into the liquid storage tank after discharge and flushing through the liquid inlet pipeline. On this basis, the process parameters in the liquid storage tank and the first circulation pipeline are detected by setting a detection device, and the control unit controls the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters. When an abnormality in the process parameters is detected, the liquid inlet pipeline or the flushing pipeline can be promptly controlled to be shut down, the supply of chemical liquid or flushing liquid can be stopped, and then the new liquid can be stopped from participating in the chemical reaction, thereby avoiding the occurrence of a chemical reaction on a larger scale, so that the process parameters are controlled within the expected range, and the liquid storage tank and the first circulation pipeline are prevented from being broken, thereby avoiding leakage.

[0021] Other features and corresponding beneficial effects of the present application are described in the latter part of the specification, and it should be understood that at least some of the beneficial effects become obvious from the description in the specification of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a structural schematic diagram of a first supply part in a chemical liquid supply system according to an embodiment of the present application;

[0023] Figure 2 A schematic structural diagram of a chemical liquid supply system according to an embodiment of the present application; and

[0024] Figure 3 Flowchart of a liquid replacement method for a chemical liquid supply system according to an embodiment of the present application. DETAILED DESCRIPTION

[0025] The following specific embodiments illustrate the implementation of the present application. Those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Although the description of the present application will be introduced in conjunction with the preferred embodiment, this does not mean that the features of this application are limited to this implementation. On the contrary, the purpose of introducing the application in conjunction with the implementation is to cover other options or modifications that may extend based on the scope of protection of the present application. In order to provide an in-depth understanding of the present application, the following description will contain many specific details. The present application can also be implemented without using these details. In addition, in order to avoid confusion or blurring the focus of the present application, some specific details will be omitted in the description. It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other unless there is a conflict.

[0026] It should be noted that in this specification, similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0027] The following will clearly and completely describe the technical solution of this application in conjunction with the accompanying drawings. Obviously, the embodiments described are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making any creative efforts are within the scope of protection of this application.

[0028] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of this application and simplify the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0029] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0030] In order to make the objectives, technical solutions and advantages of this application clearer, the implementation methods of this application will be further described in detail below with reference to the accompanying drawings.

[0031] Figure 1 Schematic diagram of the structure of the first supply part of the chemical liquid supply system according to one embodiment of the present application.

[0032] refer to Figure 1The chemical liquid supply system proposed in this application includes a first supply unit 10 and a control unit 100. The first supply unit 10 includes a liquid storage tank 11, a liquid inlet pipeline 12, a first circulation pipeline 13, a heater 131, a first discharge pipeline 14, a flushing pipeline 15 and a detection device 101. The liquid storage tank 11 is used to store chemical liquid, the liquid inlet pipeline 12 is used to pass chemical liquid into the liquid storage tank 11, the first circulation pipeline 13 connects the inlet and outlet of the liquid storage tank 11, and the heater 131 is arranged in the first circulation pipeline 13 to heat the chemical liquid in the first circulation pipeline 13. The heated chemical liquid returns to the liquid storage tank 11 through the first circulation pipeline 13, thereby achieving heating of the chemical liquid in the liquid storage tank 11. The first discharge pipeline 14 is connected to the first circulation pipeline 13 and is used to discharge the chemical liquid in the liquid storage tank 11 and the heater 131. The flushing line 15 is used to pass flushing liquid into the liquid reservoir 11 after the chemical liquid in the liquid reservoir 11 and the heater 131 is discharged from the first discharge line 14, so that the flushing liquid flushes the liquid reservoir 11 and the first circulation line 13 in turn. After the flushing liquid is finally discharged through the first discharge line 14, the liquid inlet line 12 passes the chemical liquid into the liquid reservoir 11. The discharge process of the flushing liquid is similar to the discharge process of the chemical liquid. The detection device 101 is used to detect the process parameters in the liquid reservoir 11 and / or the first circulation line 13. The control unit 100 is respectively connected to the liquid inlet line 12, the flushing line 15 and the detection device 101 for communication, and the control unit 100 is used to control the on and off of the liquid inlet line 12 or the flushing line 15 according to the process parameters detected by the detection device 101. The liquid inlet pipeline 12 is provided with an automatic valve 121, and the flushing pipeline 15 is provided with an automatic valve 151. The control unit 100 controls the opening and closing of the liquid inlet pipeline 12 or the flushing pipeline 15 by controlling the opening and closing of the automatic valve 121 and the automatic valve 151 respectively.

[0033] exist Figure 1 In the illustrated example, the first circulation pipeline 13 is equipped with a first pump 132 and an automatic valve 133. The first pump 132 is located at the outlet of the liquid storage tank 11. The chemical liquid in the liquid storage tank 11 can be discharged through the first discharge pipeline 14 under the action of the first pump 132. The automatic valve 133 is used to control the on / off state of the first circulation pipeline 13. The first discharge pipeline 14 is equipped with an automatic valve 141 for controlling the on / off state of the first discharge pipeline 14. The chemical liquid in the heater 131 is discharged through the first discharge pipeline 14 under the action of gravity. During the drainage process of the heater 131 and the liquid storage tank 11, the automatic valve 133 can be opened. This facilitates the discharge of the chemical liquid in the first circulation pipeline 13 from the first discharge pipeline 14 after the chemical liquid in the liquid storage tank 11 and heater 131 is discharged from the first discharge pipeline 14. It also prevents the chemical liquid discharged from the liquid storage tank 11 from flowing back into the liquid storage tank 11.

[0034] The present application realizes discharge of the liquid storage tank 11, the first circulation pipeline 13, and the heater 131 on the first circulation pipeline 13 by setting a first discharge pipeline 14, and realizes flushing of the liquid storage tank 11, the first circulation pipeline 13, and the heater 131 on the first circulation pipeline 13 after discharge by setting a flushing pipeline 15, and can introduce chemical liquid into the liquid storage tank 11 after discharge and flushing through the liquid inlet pipeline 12. On this basis, the process parameters in the liquid storage tank 11 and the first circulation pipeline 13 are detected by setting a detection device 101, and the control unit 100 controls the opening and closing of the liquid inlet pipeline 12 or the flushing pipeline 15 according to the process parameters. When an abnormality in the process parameters is detected, the liquid inlet pipeline 12 or the flushing pipeline 15 can be promptly controlled to be shut down, the supply of chemical liquid or flushing liquid can be stopped, and then the new liquid can be stopped from participating in the chemical reaction, thereby avoiding the occurrence of a chemical reaction on a larger scale, controlling the process parameters within the expected range, and preventing the liquid storage tank 11 and the first circulation pipeline 13 from rupturing, thereby avoiding leakage.

[0035] refer to Figure 1 In some embodiments, the detection device 101 includes a temperature sensor 102 and / or a pressure sensor 103, and the process parameters include temperature values and / or pressure values. Abnormal process parameters can be detected promptly using the detection device 101. In this embodiment, the detection device 101 includes a temperature sensor 102 and a pressure sensor 103, and the temperature sensor 102 and the pressure sensor 103 are both installed on the liquid storage tank 11 and the first circulation pipeline 13.

[0036] When the detection device 101 includes a temperature sensor 102 and a pressure sensor 103, and the temperature sensor 102 and the pressure sensor 103 are both provided on the liquid storage tank 11 and the first circulation pipeline 13, during the drainage process, that is, the chemical liquid in the liquid storage tank 11 and the heater 131 is discharged through the first discharge pipeline 14 and flushed after discharge through the flushing pipeline 15, and the flushing liquid after flushing is discharged through the first discharge pipeline 14, in response to the temperature sensor 102 at any position detecting that the temperature value exceeds the preset temperature value and the pressure sensor 103 at any position detecting that the pressure value exceeds the preset pressure value, the control unit 100 controls the flushing pipeline 15 to be shut off. During the liquid replacement process, that is, after the flushing liquid after flushing is discharged through the first discharge pipeline 14, the liquid inlet pipeline 12 is passed into the liquid storage tank 11, in response to the temperature sensor 102 at any position detecting that the temperature value exceeds the preset temperature value and the pressure sensor 103 at any position detecting that the pressure value exceeds the preset pressure value, the control unit 100 controls the liquid inlet pipeline 12 to be shut off.

[0037] During the aforementioned draining and replacement processes, the temperature sensor 102 can promptly detect high temperatures caused by the reaction between the chemical liquid and the flushing liquid, and the pressure sensor 103 can promptly detect high pressures caused by the reaction between the chemical liquid and the flushing liquid. Therefore, simultaneous detection of these two process parameters improves detection accuracy and enhances the reliability of the chemical liquid supply system. In this embodiment, an alarm device (not shown) can be provided. When the detection device 101 detects an abnormal process parameter, the alarm device issues an alarm, thereby promptly stopping the supply of flushing liquid or chemical liquid to prevent the situation from worsening.

[0038] refer to Figure 1 In some embodiments, the chemical liquid supply system further includes a pressure protection device 104, which is disposed in the liquid storage tank 11 and / or the first circulation pipeline 13. When the pressure in the liquid storage tank 11 and / or the first circulation pipeline 13 exceeds a set value, the pressure protection device 104 discharges excess pressure in the liquid storage tank 11 and / or the first circulation pipeline 13 to prevent the liquid storage tank 11 or the first circulation pipeline 13 from being damaged. In some embodiments, the pressure protection device 104 may be a safety valve or a pressure relief valve. In this embodiment, the liquid storage tank 11 includes an inner tank body 111 and an outer tank body 112. The inner tank body 111 is used to contain the chemical liquid. The material of the inner tank body 111 is quartz. The outer tank body 112 is disposed on the outer periphery of the inner tank body 111 to catch the leaked liquid when the inner tank body 111 ruptures. The material of the outer tank body 112 may be PTFE. When the pressure protection device 104 is disposed in the inner tank body 111 , it can release the pressure when the pressure inside the inner tank body 111 is too high, thereby preventing the inner tank body 111 from rupturing.

[0039] exist Figure 1 In the example shown, the connection point 134 where the first discharge line 14 connects to the first circulation line 13 is located between the outlet of the liquid storage tank 11 and the inlet of the heater 131 .

[0040] refer to Figure 1 In some embodiments, the chemical liquid supply system further includes a liquid outlet pipeline 16, a first filter 161 and a second discharge pipeline 17. The access point 136 where the liquid outlet pipeline 16 is connected to the first circulation pipeline 13 is located between the outlet of the heater 131 and the inlet of the liquid storage tank 11. The first filter 161 is arranged on the liquid outlet pipeline 16 for filtering the chemical liquid in the liquid outlet pipeline 16. The second discharge pipeline 17 is connected to the first filter 161 for discharging the chemical liquid in the first filter 161. The second discharge pipeline 17 is provided with an automatic valve 171. Specifically, the first filter 161 includes a first shell and a first filter element. The first filter element is located inside the first shell and is used to filter the chemical liquid in the liquid outlet pipeline 16. The second discharge pipeline 17 is connected to the cavity between the first shell and the first filter element for discharging the chemical liquid in the cavity.

[0041] Figure 2 Schematic diagram of the structure of a chemical liquid supply system according to an embodiment of the present application.

[0042] refer to Figure 2 In some embodiments, the chemical liquid supply system further includes a second supply unit 20, which includes a liquid replenishing tank 21, a third discharge line 22, a second circulation line 23, a second filter 231, and a fourth discharge line 24. The liquid replenishing tank 21 is connected to the liquid inlet line 12 of the first supply unit 10 for replenishing the chemical liquid into the liquid storage tank 11. The third discharge line 22 is connected to the liquid replenishing tank 21 for discharging the chemical liquid in the liquid replenishing tank 21. The second circulation line 23 connects the inlet and outlet of the liquid replenishing tank 21, and the second filter 231 is provided in the second circulation line 23. The fourth discharge line 24 is connected to the second filter 231 for discharging the chemical liquid in the second filter 231; wherein the outlet of the fourth discharge line 24 is connected to the third discharge line 22, so that the chemical liquids in the third discharge line 22 and the fourth discharge line 24 are collected and discharged together. In this embodiment, the second circulation line 23 is provided with a second pump 233 and an automatic valve 234. The second pump 233 is located at the outlet of the liquid replenishing tank 21. The chemical liquid in the liquid replenishing tank 21 can be discharged under the action of the second pump 233. The automatic valve 234 is used to control the opening and closing of the second circulation line 23. The third discharge line 22 is connected to the second circulation line 23, and is connected to the liquid replenishing tank 21 through the second circulation line 23.

[0043] refer to Figure 2 In some embodiments, the second supply unit 20 further includes a pre-heater 232 and a fifth discharge pipeline 25. The fifth discharge pipeline 25 is configured so that the chemical liquid in the pre-heater 232 is discharged through the fifth discharge pipeline 25 under the action of gravity. Figure 2 In the illustrated example, a first end 251 of the fifth discharge line 25 is connected to the second circulation line 23 and is located between the preheater 232 and the second filter 231. A second end 252 of the fifth discharge line 25 is connected to the second circulation line 23 and is located between the second filter 231 and the outlet of the liquid replenishment tank 21. The fifth discharge line 25 is connected to the third discharge line 22, and the chemical liquid in the fifth discharge line 25 is ultimately discharged into the third discharge line 22. An automatic valve 253 is provided on the fifth discharge line 25 to control the opening and closing of the fifth discharge line 25.

[0044] refer to Figure 2In some embodiments, the chemical liquid supply system further includes a recovery unit 30, a waste liquid unit 40, a discharge main pipe 50, and a residual liquid detection sensor 60. The recovery unit 30 is used to recover the chemical liquid, and the waste liquid unit 40 is used to treat the rinse liquid after rinsing. The discharge main pipe 50 is connected to the recovery unit 30 and the waste liquid unit 40, respectively, and is connected to the first discharge line 14, the second discharge line 17, and the third discharge line 22, respectively, so that the chemical liquid in the first discharge line 14, the second discharge line 17, and the third discharge line 22 is discharged to the recovery unit 30 through the discharge main pipe 50, and the rinse liquid in the first discharge line 14, the second discharge line 17, and the third discharge line 22 is discharged to the waste liquid unit 40 through the discharge main pipe 50.

[0045] refer to Figure 2 In some embodiments, a residual liquid detection sensor 60 is disposed at the outlet of the discharge manifold 50. When the chemical liquid supply system is supplying chemical liquid to the substrate during the wet cleaning process, the residual liquid detection sensor 60 is inoperative. When the chemical liquid supply system is draining, the residual liquid detection sensor 60 operates to detect the presence of liquid droplets at the outlet of the discharge manifold 50, ensuring that the chemical liquid supply system has completed draining so that subsequent processes can proceed. In this embodiment, the discharge manifold 50 is a transparent or translucent pipe. The residual liquid detection sensor 60 is mounted on the periphery of the discharge manifold 50 to detect whether there are liquid droplets flowing through the discharge manifold 50. The residual liquid detection sensor 60 may be a clamp-tube photoelectric sensor or a clamp-tube laser sensor.

[0046] refer to Figure 2 In some embodiments, the second supply part 20 further includes a liquid inlet pipeline 27, a flushing pipeline 26, a detection device 201 and a pressure protection device 204. The design principles of the liquid inlet pipeline 27, the flushing pipeline 26, the detection device 201 and the pressure protection device 204 of the second supply part 20 and the connection relationship between them and the fluid replenishment tank 21 are similar to the design principles of the liquid inlet pipeline 12, the flushing pipeline 15, the detection device 101 and the pressure protection device 104 of the first supply part 10 and the connection relationship between them and the liquid storage tank 11, and will not be repeated here.

[0047] This application also provides a substrate processing apparatus comprising multiple chambers (not shown) and the aforementioned chemical liquid supply system. The multiple chambers are each used to accommodate a substrate. A first end of the chemical liquid supply system's liquid outlet line 16 is connected to the first circulation line 13 and is located between the outlet of the heater 131 and the inlet of the liquid reservoir 11. The second end of the liquid outlet line 16 is connected to multiple branched liquid outlet lines, allowing the chemical liquid in the liquid reservoir 11 to be supplied to the multiple chambers via the branched liquid outlet lines.

[0048] Figure 3 Flowchart of a liquid replacement method for a chemical liquid supply system according to an embodiment of the present application.

[0049] refer to Figure 3 The present application also proposes a liquid replacement method for a chemical liquid supply system. The liquid replacement method can be implemented based on the above-mentioned chemical liquid supply system. The liquid replacement method of this embodiment includes the following steps:

[0050] Step S10: discharging the chemical liquid in the liquid storage tank 11 and the heater 131 through the first discharge pipeline 14, wherein the heater 131 is provided in the first circulation pipeline 13, and the first circulation pipeline 13 is connected to the inlet and outlet of the liquid storage tank 11;

[0051] Step S20: introducing a flushing liquid into the liquid reservoir 11 through the flushing pipeline 15, so that the flushing liquid flushes the liquid reservoir 11 and the first circulation pipeline 13 in sequence, and simultaneously detecting process parameters in the liquid reservoir 11 and / or the first circulation pipeline 13, and controlling the on / off of the flushing pipeline 15 according to the process parameters;

[0052] Step S30: discharging the flushing liquid in the liquid storage tank 11 and the heater 131 through the first discharge pipe 14;

[0053] Step S40: introducing chemical liquid into the liquid storage tank 11 through the liquid inlet pipeline 12, detecting process parameters in the liquid storage tank 11 and / or the first circulation pipeline 13 at the same time, and controlling the opening and closing of the liquid inlet pipeline 12 according to the process parameters.

[0054] In some embodiments, in step S10, the chemical liquid in the liquid reservoir 11 can be first discharged through the first discharge line 14 under the action of the first pump 132 according to a first predetermined time. When the liquid level in the liquid reservoir 11 drops to a predetermined low level, the chemical liquid in the liquid reservoir 11 can be discharged through the first discharge line 14 according to a second predetermined time to ensure that the chemical liquid in the liquid reservoir 11 is completely discharged. The chemical liquid in the heater 131 can then be discharged through the first discharge line 14 according to a third predetermined time. Subsequently, the chemical liquid in the first filter 161 can be discharged through the second discharge line 17 according to a fourth predetermined time. In this embodiment, the first and second predetermined times are, for example, 10 seconds each, the third predetermined time is, for example, 20 seconds, and the fourth predetermined time is, for example, 30 seconds. In other embodiments, the starting points of the first, third, and fourth predetermined times are synchronized, that is, the draining processes of the liquid reservoir 11, heater 131, and first filter 161 can be performed simultaneously. In the embodiment of the present application, there is no particular limitation on the order of draining the liquid from the liquid storage tank 11 , the heater 131 , and the first filter 161 , as long as the purpose of draining the liquid is achieved.

[0055] The method for discharging the flushing liquid in step S30 may refer to the method for discharging the chemical liquid in step S10 described above.

[0056] The specific process of controlling the on-off of the flushing pipeline 15 according to the process parameters in step S20, and the specific process of controlling the on-off of the liquid inlet pipeline 12 according to the process parameters in step S40 are described in detail in the above-mentioned chemical liquid supply system embodiment and will not be repeated here.

[0057] It should be noted that during the wet cleaning process, the first supply unit 10 and the second supply unit 20 work in conjunction with each other. While the first supply unit 10 provides chemical liquid to the substrate in the chamber, the second supply unit 20 is used to replenish the chemical liquid to the liquid reservoir 11 in the first supply unit 10 to a predetermined high liquid level. For the liquid replacement method of the second supply unit 20, refer to the liquid replacement method of the first supply unit 10 described above. The first supply unit 10 and the second supply unit 20 can drain and rinse separately, or they can drain and rinse simultaneously.

[0058] The present application also provides a computer-readable medium storing computer program code, which implements the aforementioned fluid replacement method when executed by a processor.

[0059] When the fluid exchange method is implemented as a computer program, it can also be stored in a computer-readable storage medium as an article of manufacture. For example, a computer-readable storage medium can include, but is not limited to, magnetic storage devices (e.g., hard disks, floppy disks, magnetic strips), optical disks (e.g., compact disks (CDs), digital versatile disks (DVDs)), smart cards, and flash memory devices (e.g., electrically erasable programmable read-only memories (EPROMs), cards, sticks, key drives). In addition, the various storage media described herein can represent one or more devices and / or other machine-readable media for storing information. The term "machine-readable medium" can include, but is not limited to, wireless channels and various other media (and / or storage media) that can store, contain, and / or carry code and / or instructions and / or data.

[0060] It should be understood that the embodiments described above are merely illustrative. The embodiments described herein may be implemented in hardware, software, firmware, middleware, microcode, or any combination thereof. For hardware implementation, the processor may be implemented within one or more application specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, and / or other electronic units designed to perform the functions herein, or a combination thereof.

[0061] Some aspects of this application may be implemented entirely in hardware, entirely in software (including firmware, resident software, microcode, etc.), or a combination of hardware and software. These hardware and software components may be referred to as "data blocks," "modules," "engines," "units," "components," or "systems." A processor may be one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, or combinations thereof. Furthermore, various aspects of this application may be embodied as computer products embodied in one or more computer-readable media, including computer-readable program code. For example, computer-readable media may include, but are not limited to, magnetic storage devices (e.g., hard disks, floppy disks, magnetic tapes), optical disks (e.g., compact disks, digital versatile disks, DVDs), smart cards, and flash memory devices (e.g., cards, sticks, key drives, etc.).

[0062] A computer-readable medium may include a propagated data signal embodying computer program code, for example, in baseband or as part of a carrier wave. The propagated signal may be in a variety of forms, including electromagnetic, optical, etc., or a suitable combination thereof. A computer-readable medium may be any computer-readable medium other than a computer-readable storage medium that can be connected to an instruction execution system, apparatus, or device to communicate, propagate, or transmit the program for use. The program code on the computer-readable medium may be transmitted via any suitable medium, including radio, cable, fiber optic cable, radio frequency signal, or similar medium, or any combination of the above.

[0063] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some or all of the technical features therein. These modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A chemical liquid supply system, characterized in that: The device comprises a first supply unit and a control unit, wherein the first supply unit comprises: A liquid storage tank for storing chemical liquid; a liquid outlet pipeline, for supplying the chemical liquid in the liquid storage tank to the chamber; a liquid inlet pipeline, used for introducing chemical liquid into the liquid storage tank; a first circulation pipeline connecting the inlet and the outlet of the liquid storage tank; a heater, disposed in the first circulation pipeline; a first discharge pipeline, connected to the first circulation pipeline, for discharging the chemical liquid in the liquid storage tank and the heater; a flushing pipeline, configured to introduce flushing liquid into the liquid reservoir after the chemical liquid in the liquid reservoir and the heater is discharged from the first discharge pipeline, so that the flushing liquid flushes the liquid reservoir and the first circulation pipeline in sequence; and A detection device is used to detect process parameters in the liquid storage tank and / or the first circulation pipeline, wherein the process parameters include temperature and / or pressure values; wherein, The control unit is communicatively connected with the liquid inlet pipeline, the flushing pipeline and the detection device respectively, and the control unit is used to control the opening and closing of the liquid inlet pipeline or the flushing pipeline according to the process parameters detected by the detection device during the process of introducing chemical liquid into the liquid storage tank and introducing flushing liquid into the liquid storage tank.

2. The chemical liquid supply system according to claim 1, characterized in that: The detection device includes a temperature sensor and / or a pressure sensor; In response to the temperature value and / or the pressure value exceeding the corresponding predetermined value, the control unit controls the liquid inlet pipeline or the flushing pipeline to be closed to stop the chemical liquid or flushing liquid from being introduced into the liquid storage tank.

3. The chemical liquid supply system according to claim 1, characterized in that: Also includes: A pressure protection device is provided in the liquid storage tank and / or the first circulation pipeline, and is used to release the pressure when the pressure in the liquid storage tank and / or the first circulation pipeline exceeds a set value.

4. The chemical liquid supply system according to claim 1, characterized in that: The connection point of the liquid outlet pipeline to the first circulation pipeline is located between the outlet of the heater and the inlet of the liquid storage tank; and further comprising: a first filter, disposed in the liquid outlet pipeline, for filtering the chemical liquid in the liquid outlet pipeline; The second discharge pipeline is connected to the first filter and is used for discharging the chemical liquid in the first filter.

5. The chemical liquid supply system according to claim 4, characterized in that: Also included is a second supply unit, the second supply unit comprising: a liquid replenishing tank, connected to the liquid inlet pipeline, for replenishing chemical liquid into the liquid storage tank; a third discharge pipeline connected to the liquid replenishing tank and used for discharging the chemical liquid in the liquid replenishing tank; a second circulation pipeline, connecting the inlet and outlet of the fluid infusion tank; a second filter, disposed in the second circulation pipeline; A fourth discharge pipeline is connected to the second filter and is used to discharge the chemical liquid in the second filter; wherein the outlet of the fourth discharge pipeline is connected to the third discharge pipeline.

6. The chemical liquid supply system according to claim 5, characterized in that: Also includes: Recovery department, used to recover chemical liquids; The waste liquid section is used for treating the flushing liquid after flushing; The discharge main pipe is connected to the recovery part and the waste liquid part respectively, and is connected to the first discharge pipeline, the second discharge pipeline and the third discharge pipeline respectively.

7. The chemical liquid supply system according to claim 6, characterized in that: Also includes: The residual liquid detection sensor is arranged at the outlet of the discharge main pipe and is used to detect whether there are liquid drops at the outlet of the discharge main pipe.

8. The chemical liquid supply system according to claim 1, characterized in that: The liquid storage tank comprises: The inner tank is used to contain chemical liquid; The outer tank body is arranged on the outer periphery of the inner tank body.

9. A substrate processing device, characterized in that: include: a plurality of chambers, each for accommodating a substrate; as well as The chemical liquid supply system according to any one of claims 1 to 8, configured to supply the chemical liquid in the liquid storage tank to the plurality of chambers respectively.

10. A liquid replacement method for a chemical liquid supply system, characterized in that: The method is performed using the chemical liquid supply system according to any one of claims 1 to 8, comprising the following steps: Step S10: discharging the chemical liquid in the liquid storage tank and the heater through a first discharge pipeline, wherein the heater is provided in a first circulation pipeline, and the first circulation pipeline is connected to an inlet and an outlet of the liquid storage tank; Step S20: introducing a flushing liquid into the liquid reservoir through the flushing pipeline, so that the flushing liquid flushes the liquid reservoir and the first circulation pipeline in sequence, while detecting process parameters in the liquid reservoir and / or the first circulation pipeline, and controlling the on / off of the flushing pipeline according to the process parameters; Step S30: discharging the flushing liquid in the liquid storage tank and the heater through the first discharge pipeline; Step S40: introducing chemical liquid into the liquid storage tank through the liquid inlet pipeline, detecting process parameters in the liquid storage tank and / or the first circulation pipeline, and controlling the opening and closing of the liquid inlet pipeline according to the process parameters.

11. A computer-readable medium storing computer program code, characterized in that: When the computer program code is executed by a processor, the liquid replacement method according to claim 10 is implemented.

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