Display substrate, display device and mask plate

Abstract

The invention discloses a display substrate, a display device and a mask plate. The display substrate comprises a substrate and a black matrix. The black matrix is located on one side of the substrate and comprises a plurality of strip-shaped parts, and the section, cut by a plane perpendicular to the extending direction of the strip-shaped parts, of at least one strip-shaped part comprises a first edge close to one side of the substrate and a second edge away from one side of the substrate. The length of the first side and the length of the second side are both smaller than the maximum size of the cross section in the direction parallel to the substrate. The length of the first edge and the length of the second edge in the cross section shape of the black matrix in the display substrate are both smaller than the maximum size of the cross section in the direction parallel to the substrate, and the uniformity of the edge of the black matrix can be improved.

Description

Display substrate, display device, and mask Technical Field

[0001] Embodiments of the present disclosure relate to a display substrate, a display device, and a mask. Background Art

[0002] Liquid crystal display, such as thin film thin film display (TFT-LCD) technology, is one of the current mainstream display technologies. People's growing demand for high-end displays has also placed higher and higher demands on improving the display quality of TFT-LCD.

[0003] Mura & Block is a common display defect in TFT-LCD manufacturing, primarily manifesting as uneven display brightness and color. The causes of this display defect are related to the glass, photoresist, liquid crystal, and equipment process parameters. Mura & Block includes both electro-induced Mura & Block and photo-induced Mura & Block. Electro-induced Mura & Block is caused by a significant difference in the voltage of sub-pixels in a local area of ​​the display panel compared to the voltage of sub-pixels elsewhere, resulting in visible grayscale unevenness. Photo-induced Mura refers to the uneven grayscale caused by differences in backlight transmittance due to optical factors such as liquid crystal molecular arrangement, liquid crystal purity, liquid crystal cell thickness, color filter pigment purity and ratio, and the black matrix resin material and thickness.

[0004] Summary of the Invention

[0005] The present disclosure provides a display substrate, a display device, and a mask.

[0006] An embodiment of the present disclosure provides a display substrate comprising a substrate and a black matrix. The black matrix is ​​located on one side of the substrate and comprises a plurality of strip-shaped portions. A cross section of at least one strip-shaped portion, taken along a plane perpendicular to its extension direction, comprises a first side proximal to the substrate and a second side distal to the substrate, wherein the lengths of the first side and the second side are both less than the maximum dimension of the cross section in a direction parallel to the substrate.

[0007] For example, according to an embodiment of the present disclosure, the ratio of the length of the first side to the second side is 0.95 to 1.05, the dimension of a position between the first side and the second side in a direction parallel to the substrate is the maximum dimension, and the length of at least one of the first side and the second side is the minimum dimension of the cross section in a direction parallel to the substrate.

[0008] For example, according to an embodiment of the present disclosure, the cross-section includes a curved side connecting the first side and the second side, the curved side bends toward a side away from the center of the cross-section, the curved side includes a first connection point connected to the first side, a second connection point connected to the second side, and a convex point located between the first connection point and the second connection point, and the distance between the two intersection points of the curved side of the cross-section and a straight line passing through the convex point and parallel to the substrate is the maximum dimension.

[0009] For example, according to an embodiment of the present disclosure, the difference between the maximum size and the minimum size is 0.04 to 0.42 microns.

[0010] For example, according to an embodiment of the present disclosure, the angle between the tangent line passing through the protrusion and the first side is 70 to 88 degrees.

[0011] For example, according to an embodiment of the present disclosure, the difference in width of the orthographic projection of the same strip portion at different positions on the substrate does not exceed 0.3 micrometers.

[0012] For example, according to an embodiment of the present disclosure, the difference in maximum widths of orthographic projections of different strip-shaped portions on the substrate does not exceed 0.92 micrometers.

[0013] For example, according to an embodiment of the present disclosure, in the at least one strip portion, the maximum dimension is 5.5 to 6.5 microns, the thickness is 1 to 1.5 microns, and the angle between the tangent line and the first side is 72 to 77 degrees.

[0014] For example, according to an embodiment of the present disclosure, in the at least one strip portion, the maximum dimension is 6.5 to 7.5 microns, the thickness is 1 to 1.5 microns, and the angle between the tangent line and the first side is 82 to 87 degrees.

[0015] For example, according to an embodiment of the present disclosure, in the at least one strip portion, the maximum dimension is 15.5 to 28.5 microns, the thickness is 1 to 1.5 microns, and the angle between the tangent line and the first side is 77 to 82 degrees.

[0016] For example, according to an embodiment of the present disclosure, in the at least one strip portion, the maximum dimension is 49.5 to 50.5 microns, the thickness is 1 to 1.5 microns, and the angle between the tangent line and the first side is 85 to 88 degrees.

[0017] For example, according to an embodiment of the present disclosure, the multiple strip-shaped portions include strip-shaped portions extending along a first direction and strip-shaped portions extending along a second direction. The strip-shaped portions extending along the first direction and the strip-shaped portions extending along the second direction are cross-arranged to define multiple openings, and the first direction intersects with the second direction; the display substrate also includes a color film layer, which is located within the multiple openings.

[0018] The present disclosure provides a mask for forming the aforementioned display substrate, comprising: a light-transmitting portion and a light-blocking region. The light-transmitting portion includes a plurality of strip-shaped light-transmitting portions, configured to be patterned using the strip-shaped light-transmitting portions as a mask; the light-blocking region is located between at least two of the strip-shaped light-transmitting portions. The edge of at least one of the strip-shaped light-transmitting portions corresponding to the at least one strip-shaped portion includes a plurality of continuously arranged protrusions or notches.

[0019] For example, according to an embodiment of the present disclosure, the edge of the at least one strip-shaped light-transmitting portion includes the multiple notches, the shape of each notch includes a semicircle, the multiple semicircles are continuously arranged, and the diameter of the semicircle is 0.3 to 1.2 microns.

[0020] For example, according to an embodiment of the present disclosure, the multiple protrusions include multiple saw teeth, the maximum dimension of each saw tooth in the extension direction of the strip-shaped light-transmitting portion is a first dimension, and the maximum dimension perpendicular to the extension direction is a second dimension, and the first dimension and the second dimension are both in the range of 0.3 to 1.7 microns.

[0021] For example, according to an embodiment of the present disclosure, the maximum width of the strip-shaped light-transmitting portion in the direction perpendicular to its extension direction is the mask plate width, the maximum width of the strip-shaped portion in the direction perpendicular to its extension direction is the black matrix width, and the difference between the mask plate width and the black matrix width is no more than 1.2 microns.

[0022] For example, according to an embodiment of the present disclosure, the maximum width of the strip-shaped light-transmitting portion in the direction perpendicular to its extension direction is the mask plate width, the maximum width of the strip-shaped portion in the direction perpendicular to its extension direction is the black matrix width, and the difference between the mask plate width and the black matrix width is no more than 2 microns.

[0023] For example, according to an embodiment of the present disclosure, the maximum width of the strip-shaped portion in the direction perpendicular to its extension direction is 5.5 to 6.5 microns, and the diameter of the semicircle is 0.8 to 1.2 microns; or, the maximum width of the strip-shaped portion in the direction perpendicular to its extension direction is 27.5 to 28.5 microns, and the diameter of the semicircle is 0.3 to 0.7 microns.

[0024] For example, according to an embodiment of the present disclosure, the maximum width of the strip portion in the direction perpendicular to its extension direction is 6.5 to 7.5 microns, and the first size and the second size of the sawtooth are both 0.8 to 1.2 microns; or, the maximum width of the strip portion in the direction perpendicular to its extension direction is 17.5 to 18.5 microns, and the first size and the second size of the sawtooth are both 1.3 to 1.7 microns; or, the maximum width of the strip portion in the direction perpendicular to its extension direction is 49.5 to 50.5 microns, and the first size and the second size of the sawtooth are both 0.3 to 0.7 microns.

[0025] An embodiment of the present disclosure provides a display device, comprising: the above-mentioned display substrate, wherein the display substrate is a color filter substrate; and an array substrate disposed opposite to the color filter substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, rather than limiting the present disclosure.

[0027] FIG. 1A is a schematic diagram of a black matrix in a normal development area and a weak development area.

[0028] 1B and 1C are scanning electron microscope images of the cross-sectional structure of the black matrix shown in FIG. 1A at different angles.

[0029] FIG2 is a schematic diagram of a partial planar structure of a display substrate provided according to an embodiment of the present disclosure.

[0030] FIG3 is a schematic diagram of a partial cross-section structure taken along line AA′ shown in FIG2 .

[0031] FIG4 is a scanning electron microscope (SEM) image of the cross-sectional structure shown in FIG3 .

[0032] FIG. 5 shows a structure formed after the black matrix shown in FIG. 2 and FIG. 3 is exposed and developed.

[0033] FIG6 is a schematic diagram of a partial planar structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0034] FIG. 7 is a mask for forming the black matrix shown in FIG. 2 .

[0035] FIG. 8 is a mask sheet for forming the black matrix shown in FIG. 6 .

[0036] FIG. 9 is a mask sheet for forming another example of the black matrix shown in FIG. 2 .

[0037] 10 and 11 are schematic diagrams of strip-shaped light-transmitting portions of other mask plates provided according to embodiments of the present disclosure.

[0038] FIG. 12 is a diagram showing the size difference between the strip-shaped light-transmitting portions and the strip-shaped portions when the mask plates p1 - p10 are used to form strip-shaped portions of different sizes.

[0039] FIG13 is a schematic diagram of a display device according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0040] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0041] Unless otherwise defined, technical or scientific terms used in this disclosure should have the ordinary meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are simply used to distinguish different components. The words "include" or "comprising" and similar terms mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0042] The features such as “parallel”, “perpendicular” and “same” used in the embodiments of the present disclosure include the features such as “parallel”, “perpendicular” and “same” in the strict sense, as well as the cases where “approximately parallel”, “approximately perpendicular” and “approximately the same” contain certain errors, taking into account the errors associated with the measurement and the measurement of specific quantities (for example, the limitations of the measurement system), and are expressed as being within the acceptable deviation range for a specific value determined by a person of ordinary skill in the art. For example, “approximately” can mean within one or more standard deviations, or within 10% or 5% of the value. When the number of a component is not specifically indicated below in the embodiments of the present disclosure, it means that the component can be one or more, or can be understood as at least one. “At least one” refers to one or more, and “a plurality” refers to at least two.

[0043] During research, the inventors of this application discovered that poor thickness uniformity in the black matrix of a display panel can affect image quality and is a common cause of light-induced mura and block. For example, in large-size LCD panels larger than 32 inches, the glass material is large, making it extremely challenging to ensure uniform film thickness.

[0044] Photoinduced mura and block problems may be related to the bubble jet (BJ) process in the black matrix (BM) development stage. Development is a critical process in black matrix pattern formation, where the developer is applied to unexposed areas to form the pattern. The developer can be sprayed onto the unexposed areas using a nozzle.

[0045] Figure 1A shows a schematic diagram of a black matrix in normal and weak development areas. When adjacent nozzles spray developer, interference can create weak and strong cleaning areas, resulting in differences in development intensity at different locations. As shown in Figure 1A, Area 02 is a weak development area, while Area 01 is a normal development area. This difference in development intensity is reflected in the exposed edge area, affecting the uniformity of the black matrix edge. For example, the black matrix edge uniformity in Area 02 is worse than that in Area 01, and the black matrix edge in Area 02 is less smooth and has multiple protrusions.

[0046] Figures 1B and 1C are scanning electron microscope images of the cross-sectional structure of the black matrix shown in Figure 1A at different angles. The black matrix shown in Figures 1B and 1C is a structure formed after exposure and development. As shown in Figures 1B and 1C, the cross-sectional shape of the black matrix 03 is roughly trapezoidal, and the edges of the black matrix 03 are relatively rough and have poor uniformity. Therefore, the uniformity of the black matrix edge will microscopically affect the aperture ratio of the sub-pixel, thereby causing the display panel to have a transmittance difference under backlight, resulting in poor display problems on the display panel, such as the appearance of striped brightness unevenness (Mura & Block) screen.

[0047] The present disclosure provides a display substrate, a display device, and a mask. The display substrate includes a substrate and a black matrix. The black matrix is ​​located on one side of the substrate. The black matrix includes multiple strips. A cross-section of at least one strip taken by a plane perpendicular to its extension direction includes a first side close to the substrate and a second side away from the substrate. The length of the first side and the length of the second side are both less than the maximum dimension of the cross-section in a direction parallel to the substrate. In the cross-sectional shape of the black matrix in the display substrate provided by the present disclosure, the length of the first side and the length of the second side are both less than the maximum dimension of the cross-section in a direction parallel to the substrate, which is beneficial to improving the uniformity of the black matrix edge.

[0048] The display substrate, display device, and mask provided by the embodiments of the present disclosure are described below with reference to the accompanying drawings.

[0049] Figure 2 is a schematic diagram of a partial planar structure of a display substrate provided according to an embodiment of the present disclosure. Figure 3 is a schematic diagram of a partial cross-sectional structure taken along line AA' shown in Figure 2. Figure 4 is a scanning electron microscope (SEM) image of the cross-sectional structure shown in Figure 3. Figure 5 is a structure formed after the black matrix shown in Figures 2 and 3 is exposed and developed. The black matrices shown in Figures 5 and 4 are structures formed after exposure and development.

[0050] As shown in Figures 2 to 4, the display substrate includes a substrate 100 and a black matrix 200 located on the substrate 100. The black matrix 200 is located on one side of the substrate 100 and includes a plurality of strips 210. For example, the substrate 100 includes two main surfaces parallel to the XY plane, and the black matrix 200 is located on one of the main surfaces. For example, Figure 2 schematically shows that the plurality of strips 210 extend along the X direction, with openings formed between adjacent strips 210. For example, the plurality of strips 210 can be arranged at equal or unequal intervals along the Y direction.

[0051] As shown in Figures 2 to 4, a cross-section of at least one strip portion 210 cut by a plane perpendicular to its extension direction includes a first side 201 close to the substrate 100 and a second side 202 away from the substrate 100, and the length of the first side 201 and the length of the second side 202 are both smaller than the maximum dimension D1 of the cross-section in a direction parallel to the substrate 100.

[0052] In the display substrate provided by the present disclosure, in the cross-sectional shape of the black matrix formed by a mask plate of a specific shape, the length of the first side and the length of the second side are both smaller than the maximum dimension of the cross-section in the direction parallel to the substrate, which is beneficial to improving the uniformity of the black matrix edge.

[0053] The cross-sectional shape of the black matrix 200 shown in Figures 4 and 5 is different from the cross-sectional shape of the black matrix 200 shown in Figure 1B. By using a mask different from the one used to form the black matrix shown in Figures 1B and 1C to form the black matrix 200 shown in Figures 4 and 5, the uniformity of the edge of the black matrix 200 is significantly improved, which is beneficial for reducing the impact of the edge of the black matrix 200 on the sub-pixel aperture ratio, improving the display uniformity of the display device including the display substrate, and avoiding the occurrence of strip-shaped brightness unevenness (Mura & Block) in the display device including the display substrate.

[0054] For example, as shown in Figures 2 to 4 , the maximum dimension D1 of the cross section of the strip-shaped portion 210 may be the width of the orthographic projection of the strip-shaped portion 210 on the substrate 100. This width may refer to the maximum width, minimum width, or average width of the orthographic projection of the strip-shaped portion 210. For example, the first side 201 of the cross section close to the substrate 100 may be located on the substrate 100. For example, the first side 201 and the second side 202 may both be straight lines, including standard straight lines and approximate straight lines. An approximate straight line means that more than 90% of the approximate straight line lies on a standard straight line.

[0055] For example, as shown in Figures 2 to 4, the cross-section of each strip-shaped portion 210 cut by a plane perpendicular to its extension direction includes a first side 201 close to the substrate 100 and a second side 202 away from the substrate 100, and the length of the first side 201 and the length of the second side 202 are both smaller than the maximum dimension D1 of the cross-section in a direction parallel to the substrate 100.

[0056] In some examples, as shown in Figures 2 and 5 , the width difference of the orthographic projection of the same strip 210 at different locations on the substrate 100 does not exceed 0.3 microns. For example, the width difference of the orthographic projection of each strip 210 at different locations on the substrate 100 does not exceed 0.3 microns. The width difference here may refer to the difference in the maximum cross-sectional dimension D1 of the same strip 210 at different locations. The smaller width difference of the same strip at different locations improves the smoothness of the strip edge and enhances the uniformity of the black matrix edge.

[0057] For example, as shown in FIG2 and FIG5 , the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.25 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.2 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.18 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.15 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.1 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.08 microns. For example, the difference in width of the orthographic projection of the same strip portion 210 at different locations on the substrate 100 does not exceed 0.05 microns.

[0058] In some examples, as shown in Figures 3 and 4, the ratio of the length of the first side 201 to the second side 202 of the cross section of the strip portion 210 is 0.95 to 1.05, the dimension of a position between the first side 201 and the second side 202 in a direction parallel to the substrate 100 is a maximum dimension D1, and the length of at least one of the first side 201 and the second side 202 is a minimum dimension D2 of the cross section in a direction parallel to the substrate 100. For example, the distance between the position with the maximum dimension D1 and the first side 201 can be greater than the distance between the position with the maximum dimension D1 and the second side 202, or the distance between the position with the maximum dimension D1 and the first side 201 can be less than the distance between the position with the maximum dimension D1 and the second side 202, or the distance between the position with the maximum dimension D1 and the first side 201 can be equal to the distance between the position with the maximum dimension D1 and the second side 202.

[0059] For example, as shown in Figures 3 and 4, the ratio of the length of the first side 201 to the length of the second side 202 can be 0.98 to 1.02. For example, the length of the first side 201 can be equal to the length of the second side 202. For example, the edge of the first side 201 is retracted relative to the edge of the position having the maximum dimension D1, and the edge of the second side 202 is retracted relative to the edge of the position having the maximum dimension D1.

[0060] In some examples, as shown in Figures 3 and 4, the cross section includes a curved side 203 connecting a first side 201 and a second side 202. The curved side 203 curves toward a side away from the center of the cross section. The curved side 203 includes a first connection point 2031 connected to the first side 201, a second connection point 2032 connected to the second side 202, and a protrusion 2030 located between the first connection point 2031 and the second connection point 2032. The distance between two intersection points of the curved side 203 of the cross section and a straight line passing through the protrusion 2030 and parallel to the substrate 100 is a maximum dimension D1. For example, the protrusion 2030 of the curved side 203 protrudes beyond the edge of the first side 201, and the protrusion 2030 of the curved side 203 protrudes beyond the edge of the second side 202. For example, the protrusion 2030 is the point on the curved side 203 farthest from the center of the cross section. For example, the curved side edges 203 of multiple cross sections of the strip portion 210 constitute a curved side surface of the strip portion 210, and the multiple protrusions 2030 included in the curved side surface constitute a straight line, which includes a standard straight line and an approximate straight line. The approximate straight line means that more than 90% of the approximate straight line is located on a standard straight line.

[0061] For example, as shown in Figures 3 and 4 , the cross section includes two curved sides 203. A straight line passing through a bump 2030 and parallel to the substrate 100 intersects the two curved sides 203 at two points. These two intersections are the bumps 2030 on the two curved sides 203. The distance between the two bumps 2030 is the maximum dimension D1. For example, the shapes of the two curved sides 203 included in the cross section can be the same or different.

[0062] For example, as shown in FIG. 4 , the first connection point 2031 between the curved side 203 and the first side 201 has a certain curvature.

[0063] In some examples, as shown in FIG3 , the difference between the maximum dimension D1 and the minimum dimension D2 is 0.04 to 0.42 microns. For example, the difference between the maximum dimension D1 and the minimum dimension D2 is 0.05 to 0.4 microns. For example, the difference between the maximum dimension D1 and the minimum dimension D2 is 0.1 to 0.3 microns. For example, the difference between the maximum dimension D1 and the minimum dimension D2 is 0.2 to 0.35 microns.

[0064] In some examples, as shown in FIG4 , the angle α between the tangent line passing through the protrusion 2030 and the first side 201 is 70 to 88 degrees. For example, the angle α may be 75 to 85 degrees. For example, the angle α may be 77 to 82 degrees. For example, the angle α may be 76 to 80 degrees.

[0065] Compared with the shape of the black matrix 200 shown in Figure 1B, in which the angle between the side edge (or the tangent line at a certain point on the side edge) and the bottom edge is 45 degrees, the cross-section of the black matrix provided in the present disclosure is provided with a curved side edge, and the angle between the tangent line at the position of the convex point of the curved side edge and the first side of the cross-section of the black matrix closest to the substrate is set to 70 to 88 degrees, which is beneficial to improving the smoothness of the black matrix edge, thereby improving the display uniformity of the display device including the display substrate.

[0066] In some examples, as shown in FIG2 , the difference in the maximum width of the orthographic projections of different strip-shaped portions 210 on the substrate 100 does not exceed 0.92 microns. By minimizing the difference in the maximum widths of the different strip-shaped portions, the effect of the black matrix on the sub-pixel aperture ratio is further reduced, thereby improving the display uniformity of a display device including this display substrate.

[0067] For example, as shown in FIG2 , the difference in the maximum width of the orthographic projections of different strip-shaped portions 210 on the substrate 100 does not exceed 0.91 micrometers. For example, the difference in the maximum width of the orthographic projections of different strip-shaped portions 210 on the substrate 100 does not exceed 0.9 micrometers. For example, the difference in the maximum width of the orthographic projections of different strip-shaped portions 210 on the substrate 100 does not exceed 0.89 micrometers.

[0068] Figure 6 is a schematic diagram of a partial planar structure of a display substrate according to another example of an embodiment of the present disclosure. The display substrate shown in Figure 6 differs from the display substrate shown in Figure 2 in that the shape of the black matrix 200 is different.

[0069] In some examples, as shown in FIG6 , the plurality of strips 210 include strips 210 extending along a first direction and strips 210 extending along a second direction. The strips 210 extending along the first direction and the strips 210 extending along the second direction are arranged to intersect to define a plurality of openings. FIG6 schematically illustrates that the first direction is the X direction and the second direction is the Y direction, and the first direction and the second direction intersect. For example, the first direction is perpendicular to the second direction. For example, the angle between the first direction and the second direction can be 80 to 120 degrees. Of course, the first direction and the second direction can be interchangeable.

[0070] For example, as shown in FIG6 , the strip portion 210 extending along the first direction may be a first strip sub-portion 211 , and the strip portion 210 extending along the second direction may be a second strip sub-portion 212 . The first strip sub-portion 211 and the second strip sub-portion 212 are cross-arranged to define a plurality of openings.

[0071] In some examples, as shown in FIG6 , the display substrate further includes a color filter layer 300 located within the plurality of openings. For example, the color filter layer 300 may include film layers of different colors, such as a red color filter layer, a green color filter layer, and a blue color filter layer, wherein the red color filter layer, the green color filter layer, and the blue color filter layer correspond to red sub-pixels, green sub-pixels, and blue sub-pixels, respectively. For example, the red sub-pixels, the green sub-pixels, and the blue sub-pixels may be located on an array substrate disposed opposite the display substrate. For example, the display substrate may be a color filter substrate. For example, the black matrix in a TFT-LCD is a completely opaque portion whose main function is to block light and distinguish between red sub-pixels, green sub-pixels, and blue sub-pixels.

[0072] In some examples, as shown in Figures 2, 5, and 6, the maximum dimension D1 of at least one strip portion 210 is 5.5 to 6.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the location of the bump 2030 of the curved side 203 of the cross section of the at least one strip portion 210 and the first side 201 is 72 to 77 degrees. For example, the maximum dimension D1 of the strip portion 210 can be the final width of the black matrix 200 after exposure and development, such as the width of the black matrix 200.

[0073] For example, as shown in Figures 2, 5, and 6, the maximum dimension D1 of each strip portion 210 is 5.5 to 6.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line of the curved side 203 of the cross section of the strip portion 210 at the position of the protruding point 2030 and the first side 201 is 72 to 77 degrees. For example, the maximum dimension D1 of the strip portion 210 is 6 microns, the thickness of the strip portion 210 is 1.15 microns, and the angle between the tangent line of the curved side 203 of the cross section of the strip portion 210 at the position of the protruding point 2030 and the first side 201 is 75 degrees.

[0074] In some examples, as shown in Figures 2 and 6, the maximum dimension D1 of at least one strip portion 210 is 6.5 to 7.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the at least one strip portion 210 and the first side 201 is 82 to 87 degrees. For example, the maximum dimension D1 of each strip portion 210 is 6.5 to 7.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 82 to 87 degrees.

[0075] For example, as shown in Figures 2 and 6, the maximum dimension D1 of the strip portion 210 is 7 microns, the thickness of the strip portion 210 is 1.15 microns, and the angle between the tangent line at the position of the protrusion 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 85 degrees.

[0076] In some examples, as shown in Figures 2 and 6, the maximum dimension D1 of at least one strip portion 210 is 15.5 to 28.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the at least one strip portion 210 and the first side 201 is 77 to 82 degrees. For example, the maximum dimension D1 of each strip portion 210 is 15.5 to 28.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 77 to 82 degrees.

[0077] For example, as shown in Figures 2 and 6, the maximum dimension D1 of the strip portion 210 is 18 microns, the thickness of the strip portion 210 is 1.15 microns, and the angle between the tangent line at the position of the protrusion 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 80 degrees.

[0078] For example, as shown in Figures 2 and 6, the maximum dimension D1 of the strip portion 210 is 28 microns, the thickness of the strip portion 210 is 1.15 microns, and the angle between the tangent line at the position of the protrusion 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 80 degrees.

[0079] For example, as shown in Figures 2 and 6, the maximum dimension D1 of at least one strip portion 210 is 49.5 to 50.5 microns, the thickness of at least one strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the at least one strip portion 210 and the first side 201 is 85 to 88 degrees. For example, the maximum dimension D1 of each strip portion 210 is 49.5 to 50.5 microns, the thickness of the strip portion 210 is 1 to 1.5 microns, and the angle between the tangent line at the position of the protruding point 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 85 to 88 degrees.

[0080] For example, as shown in Figures 2 and 6, the maximum dimension D1 of the strip portion 210 is 50 microns, the thickness of the strip portion 210 is 1.15 microns, and the angle between the tangent line at the position of the protrusion 2030 of the curved side 203 of the cross section of the strip portion 210 and the first side 201 is 87 degrees.

[0081] For example, when the width of the strip portions 210 of the black matrix 200 is 6 to 9 microns, it can be applied to small-size displays, such as (monitor, MNT) displays; when the width of the strip portions 210 of the black matrix 200 is 16 to 28 microns, it can be applied to television (TV) displays; when the width of the strip portions 210 of the black matrix 200 is 50 microns, it can be applied to ultra-large displays.

[0082] Figure 7 is a mask for forming the black matrix shown in Figure 2. Figure 8 is a mask for forming the black matrix shown in Figure 6. Cross-sectional views of a black matrix formed using the mask shown in Figure 7 or Figure 8 are shown in Figures 4 and 5.

[0083] As shown in Figures 7 and 8, the mask plate includes a light-transmitting portion 400 and a light-blocking region 420. The light-transmitting portion 400 includes a plurality of strip-shaped light-transmitting portions 410, which are configured to be used as a mask for patterning to form the plurality of strip-shaped portions 210 in the black matrix 200 shown in Figures 2 or 6. The light-blocking region 420 is located between at least two of the strip-shaped light-transmitting portions 410. The edge of at least one strip-shaped light-transmitting portion 410 corresponding to at least one strip-shaped portion 210 includes a plurality of continuously arranged protrusions 403 or a plurality of notches 402. The light-transmitting portion can be an area on the mask plate having light-transmitting properties.

[0084] When a mask with conventional straight edges is used as a mask to pattern a black matrix, the light-transmitting portions transmit light. After exposure, the portion of the black matrix film to be formed into strips is solidified, resulting in straight-line edges. After developing the exposed black matrix film, the unexposed areas are completely dissolved and removed to form openings in the black matrix. However, the upper surface of the black matrix film at the edges of the exposed areas is strongly eroded by the developer, causing a certain degree of development. After development, the cross-section of the black matrix strips becomes trapezoidal. Furthermore, due to the differences in development intensity between the strong and weak development zones, the edges of the black matrix strips become jagged after development, as shown in Figure 1C. This irregular morphology affects the uniformity of the black matrix edges.

[0085] The edge of the strip-shaped light-transmitting portion of the mask provided by the present invention includes a plurality of continuously arranged protrusions or a plurality of notches. When the mask is used as a mask to pattern a black matrix, the strip-shaped light-transmitting portion is used to transmit light. After the black matrix film layer is exposed, the portion to be formed into the strip-shaped portion is solidified, and its edge presents a plurality of protrusions or a plurality of notches; after the exposed black matrix film layer is developed, the black matrix film layer in the unexposed area is completely dissolved and removed to form an opening in the black matrix. The upper surface of the black matrix film layer at the edge of the exposure area is strongly scour by the developer, and a certain degree of development occurs. After development, the cross-section of the black matrix includes curved side edges. For example, the closer to the edge of the black matrix, the lower the exposure curing degree of the black matrix is ​​affected by diffraction, and the more intense the development. Since the edge of the strip portion to be formed in the black matrix includes multiple protrusions or multiple notches, the contact area between the strip portion of the black matrix and the developer is increased. The lower surface of the strip portion of the black matrix also shrinks inward after development to form the side of the black matrix into a curved side. For example, the closer to the lower surface of the black matrix, the greater the developer pressure, and the higher the degree of development. At the same time, the surface area of ​​the multiple notches or multiple protrusions is large, and the edges of the strip portion of the black matrix originally formed with multiple protrusions or multiple notches can all be fully in contact with the developer, compensating for the influence of the difference in development strength and weak zones. Therefore, after the black matrix is ​​developed, the edge of the strip portion appears straight when viewed from above, as shown in Figure 5, with a relatively regular morphology, which greatly improves the uniformity of the black matrix edge.

[0086] In some examples, as shown in Figures 7 and 8, the edge of at least one strip-shaped light-transmitting portion 410 includes multiple notches 402. Each notch 402 has a semicircular shape. The multiple semicircles are arranged in a row, and the diameter of the semicircle is 0.3 to 1.2 microns. For example, the diameter of the semicircle is 0.5 to 1 micron. For example, the diameter of the semicircle is 0.4 to 0.8 micron. For example, the diameter of the semicircle is 0.6 to 0.9 micron. For example, the diameter of the semicircle is 0.7 to 1.1 micron. The shapes and sizes of the different notches 402 are identical, where "identical" includes strictly identical and approximately identical. Approximately identical means that the different notches 402 may have different dimensions due to process reasons, and the difference in dimensions does not exceed 10% of the larger dimension of the notch 402. The above-mentioned notches are filled with protrusions at the edge of the light-shielding area 420, such as the edge of the light-shielding area 420 has a shape complementary to the edge of the strip-shaped light-transmitting portion 410. For example, the strip-shaped portion of the black matrix can be made of a negative photoresist.

[0087] For example, as shown in Figures 7 and 8, the edge of each strip-shaped light-transmitting portion 410 includes a plurality of notches 402, and each notch 402 is semicircular in shape. The notches 402 are depressions formed by the edges of the strip-shaped light-transmitting portion 410 being concave inward. The plurality of semicircular shapes being arranged continuously means that the edges of adjacent semicircles are connected, with almost no space between the edges of adjacent semicircles.

[0088] FIG. 9 is a mask sheet for forming another example of the black matrix shown in FIG. 2 .

[0089] In some examples, as shown in FIG9 , the edge of at least one strip-shaped light-transmitting portion 410 includes a plurality of continuously arranged protrusions 403 , and the plurality of protrusions 403 include a plurality of serrations 403 , and the maximum dimension of each serration 403 in the extension direction of the strip-shaped light-transmitting portion 410 is a first dimension, and the maximum dimension perpendicular to the extension direction is a second dimension, and both the first dimension and the second dimension are in the range of 0.3 to 1.7 microns.

[0090] For example, as shown in FIG9 , each sawtooth 403 may be triangular in shape. For example, a triangular sawtooth located at the edge of a strip-shaped light-transmitting portion 410 extending in the X direction may have a maximum dimension in the X direction of the triangular sawtooth being a first dimension, where the first dimension is the length of the side of the triangle extending in the X direction; a maximum dimension in the Y direction of the triangular sawtooth being a second dimension, where the second dimension is the height of the triangle in the Y direction. For example, multiple sawtooths 403 may be arranged continuously, such that the corners of adjacent triangles are connected to each other, and there is almost no space between the adjacent corners of the adjacent triangles.

[0091] For example, as shown in FIG9 , the first dimension of each sawtooth 403 in the direction in which the strip-shaped light-transmitting portion 410 extends and the second dimension perpendicular to the direction in which the sawtooth 403 extends are both within a range of 0.5 to 1.5 microns. For example, the first dimension of each sawtooth 403 in the direction in which the strip-shaped light-transmitting portion 410 extends and the second dimension perpendicular to the direction in which the sawtooth 403 extends are both within a range of 0.6 to 1 microns. For example, the first dimension of each sawtooth 403 in the direction in which the strip-shaped light-transmitting portion 410 extends and the second dimension perpendicular to the direction in which the sawtooth 403 extends are both within a range of 0.7 to 1.2 microns. For example, the first dimension of each sawtooth 403 in the direction in which the strip-shaped light-transmitting portion 410 extends and the second dimension perpendicular to the direction in which the sawtooth 403 extends are both within a range of 0.8 to 1.4 microns. For example, the first dimension of each sawtooth 403 in the direction in which the strip-shaped light-transmitting portion 410 extends and the second dimension perpendicular to the direction in which the sawtooth 403 extends are both within a range of 0.4 to 0.9 microns.

[0092] For example, as shown in FIG9 , each serration 403 is a portion protruding from the edge of the strip-shaped light-transmitting portion 410. The shapes and sizes of the different serrations 403 are identical, where the identical includes strictly identical and substantially identical. Substantially identical means that the different serrations 403 may have different sizes due to process reasons, and the size difference does not exceed 10% of the larger size of the serrations 403.

[0093] For example, as shown in FIG9 , the first size and the second size of each saw tooth 403 may be the same. For example, the ratio of the first size to the second size of each saw tooth 403 may be 0.8 to 1.2. For example, the ratio of the first size to the second size of each saw tooth 403 may be 0.9 to 1.1.

[0094] 10 and 11 are schematic diagrams of strip-shaped light-transmitting portions of other mask plates provided according to embodiments of the present disclosure.

[0095] For example, the embodiment of the present disclosure provides 8 types of mask plates. The edge of the strip-shaped light-transmitting portion 410 in the first mask plate p1 is a smooth edge and does not include a protrusion 403 or a notch 402; the edge of the strip-shaped light-transmitting portion 410 in the second mask plate p2 has the continuous serrations 403 shown in Figure 9, and the first size and second size of each serration 403 are both 0.5 microns; the third mask plate p3 has the serrations 403 arranged at intervals as shown in Figure 10, and the first size and second size of the serrations 403 are both 0.5 microns, and the distance between adjacent serrations 403 is 0.5 microns; the edge of the strip-shaped light-transmitting portion 410 in the fourth mask plate p4 has the continuous serrations 403 shown in Figure 9, and the first size and second size of each serration 403 are both 1 micron; the edge of the strip-shaped light-transmitting portion 410 in the fifth mask plate p5 has the continuous serrations 403 shown in Figure 9, and the first size and second size of each serration 403 are both 1.5 microns ; The strip-shaped light-transmitting portion 410 in the sixth mask plate p6 has the continuous semicircular notch 402 shown in Figure 8, and the diameter of the semicircle is 0.5 microns; the strip-shaped light-transmitting portion 410 in the seventh mask plate p7 has the continuous semicircular notch 402 shown in Figure 8, and the diameter of the semicircle is 0.75 microns; the strip-shaped light-transmitting portion 410 in the eighth mask plate p8 has the continuous semicircular notch 402 shown in Figure 8, and the diameter of the semicircle is 1 micron; the strip-shaped light-transmitting portion 410 in the ninth mask plate p9 has the spaced notches 402 shown in Figure 11, and the shape of the notch 402 is a square, the side length of the square is 0.5 microns, and the interval between adjacent notches 402 is 0.5 microns; the strip-shaped light-transmitting portion 410 in the tenth mask plate p10 has the spaced notches 402 shown in Figure 11, and the shape of the notch 402 is a square, the side length of the square is 1 micron, and the interval between adjacent notches 402 is 1 micron.

[0096] For example, the black matrix 200 including strip portions 210 having a width of 6±0.5 microns can be formed using the above-mentioned masks p6, p7, p8, and p9. Specific parameters are shown in Table 1. In Table 1, the maximum width of the strip-shaped light-transmitting portions 410 of mask p6 is 6 microns, the maximum width of the strip-shaped light-transmitting portions 410 of mask p7 is 6 microns, and the maximum width of the strip-shaped light-transmitting portions 410 of both mask p8 and mask p9 is 6.5 microns.

[0097] Table 1

[0098] In Table 1 and subsequent tables, FICD represents the width of the strips of the black matrix formed after exposure and development; RANGE represents the fluctuation range, i.e., the difference between the maximum width MAX of the different strips 210 included in the black matrix 200 and the minimum width MIN of the different strips 210 included in the black matrix 200, in microns; AVE represents the average width of the different strips 210 in the black matrix 200, in microns; 3SIGMA represents 3*sample standard deviation, which can be used to quickly extrapolate normally distributed data with known mean and standard deviation. The percentage of data within three sample standard deviations from the mean is 99.73%.

[0099] For example, as shown in Table 1, the performance of the strip portions 210 of the black matrix 200 can be determined by synergistically analyzing the RANGE and 3SIGMA of the strip portions 210 of the black matrix 200. As shown in Table 1, the black matrix 200 including strip portions 210 with a width of 6±0.5 microns formed using mask plate p8 with a strip-shaped light-transmitting portion 410 with a width of 6.5 microns has the smallest RANGE and the smallest 3SIGMA. In addition, based on its PPK and CPK values, such as the maximum PPK and CPK values, such as both 1.92, and the smoothness of the edges of the strip portions 210 of the black matrix 200 formed using mask plate p8, it can be concluded that the black matrix 200 including strip portions 210 with a width of 6±0.5 microns formed using mask plate p8 with a strip-shaped light-transmitting portion 410 with a width of 6.5 microns has the best performance. Using mask plate p8 to form the black matrix can significantly improve the smoothness of the edges of the black matrix strip portions, thereby improving the uniformity of their width.

[0100] The above and subsequent PPK represent the process capability index, such as the capability evaluation of small-batch production before large-scale production; CPK represents the manufacturing capability index, such as the production capability evaluation after large-scale production to ensure that the quality of products under mass production does not decline and to ensure the same control capability as small-batch production.

[0101] For example, the black matrix 200 including strip portions 210 with a width of 7±0.5 microns formed by using the mask template p4 including strip-shaped light-transmitting portions 410 with a width of 6 microns has the best performance. For example, in the process of forming the black matrix using the mask template p4, 3SIGMA is the smallest, such as 0.89; CPK is the largest, such as 2.24; PPK is relatively large, such as 2.25; RANGE is relatively small, such as 0.82; and the smoothness of the edges of the strip portions 210 of the black matrix 200 formed by the mask template p4 can be judged.

[0102] For example, the black matrix 200 including strip portions 210 with a width of 8±0.5 microns formed by using the mask template p7 including strip-shaped light-transmitting portions 410 with a width of 7.5 microns has the best performance. For example, in the process of forming the black matrix using the mask template p7, 3SIGMA is the smallest, such as 0.81; PPK is the largest, such as 2.46; CPK is the largest, such as 2.43; RANGE is relatively small, such as 0.86, and the edge smoothness of the strip portions 210 of the black matrix 200 formed by the mask template p7 can be judged.

[0103] For example, the black matrix 200 including strip portions 210 with a width of 9±0.5 microns formed by using the mask template p5 including strip-shaped light-transmitting portions 410 with a width of 8 microns has the best performance. For example, in the process of forming the black matrix using the mask template p5, 3SIGMA is the smallest, such as 0.79; PPK is the largest, such as 2.55; CPK is the largest, such as 2.52; RANGE is relatively small, such as 0.76, and the edge smoothness of the strip portions 210 of the black matrix 200 formed by the mask template p5 can be judged.

[0104] For example, the above-mentioned masks p6-p9 can be used to form a black matrix 200 including strip portions 210 with a width of 16±0.5 microns, with specific parameters shown in Table 2. In Table 2, the maximum width of the strip-shaped transparent portions 410 in each mask is 17 microns.

[0105] Table 2

[0106] For example, as shown in Table 2, the performance of the strip portions 210 of the black matrix 200 can be determined by the RANGE and 3SIGMA of the strip portions 210 of the black matrix 200. As shown in Table 2, the black matrix 200 including strip portions 210 with a width of 16±0.5 microns formed by mask plate p6 having a strip-shaped light-transmitting portion 410 with a width of 17 microns has the smallest RANGE and the smallest 3SIGMA. In addition, combined with its PPK and CPK values, such as its maximum PPK and CPK values, such as both PPK and CPK values ​​are 2.63, and the smoothness of the edges of the strip portions 210 of the black matrix 200 formed by the mask plate p6, it can be concluded that the black matrix 200 including strip portions 210 with a width of 16±0.5 microns formed by mask plate p6 including strip-shaped light-transmitting portions 410 with a width of 17 microns has the best performance. Using mask plate p6 to form the black matrix can significantly improve the smoothness of the edges of the strip portions of the black matrix, thereby improving the uniformity of their width.

[0107] For example, the black matrix 200 including strip portions 210 with a width of 18±0.5 microns formed by using the mask template p5 including strip-shaped light-transmitting portions 410 with a width of 17 microns has the best performance. For example, in the process of forming the black matrix using the mask template p5, 3SIGMA is the smallest, such as 0.85; PPK is the largest, such as 2.36; CPK is the largest, such as 2.32; RANGE is the smallest, such as 0.85, and the edge smoothness of the strip portions 210 of the black matrix 200 formed by the mask template p5 can be judged.

[0108] For example, the black matrix 200 including strip portions 210 with a width of 24±0.5 microns formed by using mask template p6 including strip-shaped light-transmitting portions 410 with a width of 19 microns has the best performance. In the process of forming the black matrix using mask template p5, 3SIGMA is the smallest, such as 0.87; PPK is the largest, such as 2.29; CPK is the largest, such as 2.28; RANGE is the smallest, such as 0.87, and the edge smoothness of the strip portions 210 of the black matrix 200 formed by combining the mask template p6 can be judged.

[0109] For example, the above-mentioned masks p6-p9 can be used to form a black matrix 200 including strip portions 210 with a width of 28±0.5 microns, with specific parameters shown in Table 3. In Table 3, the maximum width of the strip-shaped transparent portions 410 in each mask is 29 microns.

[0110] Table 3

[0111] For example, as shown in Table 3, the performance of the strip portions 210 of the black matrix 200 can be determined by coordinating the RANGE and 3SIGMA of the strip portions 210 of the black matrix 200 . As shown in Table 3, the black matrix 200 including the strip portions 210 with a width of 28±0.5 microns formed by the mask template p6 with a strip-shaped light-transmitting portion 410 with a width of 29 microns has the smallest RANGE and the smallest 3SIGMA. In addition, combined with its PPK and CPK values, such as the maximum PPK and CPK values, such as PPK of 2.55 and CPK of 2.52, and the smoothness of the edges of the strip portions 210 of the black matrix 200 formed by the mask template p6, it can be concluded that the black matrix 200 including the strip portions 210 with a width of 28±0.5 microns formed by the mask template p6 including the strip-shaped light-transmitting portion 410 with a width of 29 microns has the best performance. Using the mask template p6 to form the black matrix can significantly improve the smoothness of the edges of the strip portions of the black matrix to improve the uniformity of its width.

[0112] For example, the above-mentioned masks p1-p4 can be used to form a black matrix 200 including strip portions 210 with a width of 50±0.5 microns, with specific parameters shown in Table 4. In Table 4, the maximum width of the strip-shaped transparent portions 410 in each mask is 50 microns.

[0113] Table 4

[0114] For example, as shown in Table 4, the performance of the strip portions 210 of the black matrix 200 can be determined by coordinating the RANGE and 3SIGMA of the strip portions 210 of the black matrix 200 . As shown in Table 4, the black matrix 200 including the strip portions 210 with a width of 50±0.5 microns formed by the mask template p2 having the strip-shaped light-transmitting portion 410 with a width of 50 microns has the smallest RANGE and the smallest 3SIGMA. In addition, combined with its PPK and CPK values, such as the maximum PPK and CPK values, such as PPK of 2.29 and CPK of 2.28, and the smoothness of the edges of the strip portions 210 of the black matrix 200 formed by the mask template p2, it can be concluded that the black matrix 200 including the strip portions 210 with a width of 50±0.5 microns formed by the mask template p2 including the strip-shaped light-transmitting portion 410 with a width of 50 microns has the best performance. Using the mask template p2 to form the black matrix can significantly improve the smoothness of the edges of the strip portions of the black matrix, thereby improving the uniformity of its width.

[0115] According to the above tables and other experimental parameters of black matrices with better performance formed using different masks, masks with different parameters can be used for black matrices of different sizes to specifically improve the uniformity of the width of black matrices of different sizes.

[0116] The above-mentioned mask plate that can effectively improve the edge uniformity of black matrices of various sizes includes the following features: in the mask plate with a concave semicircular notch on the edge, the diameter of the semicircle is 0.5 to 1 micron; in the mask plate with continuous serrations on the edge, the size of the serrations in the extension direction of the strip-shaped light-transmitting portion and the size perpendicular to its extension direction are both 0.5 to 1.5 microns.

[0117] For example, the shape of the opening formed by the cross-arrangement of the strip-shaped portions included in the black matrix can be the same as the shape of the sub-pixel, such as a rectangle. For example, if the sub-pixel includes a first seed pixel and a second seed pixel, the side extending along the X direction shown in FIG6 is the short side, and the side extending along the Y direction shown in FIG6 is the long side; and the side extending along the X direction shown in FIG6 is the long side, and the side extending along the Y direction shown in FIG6 is the short side. When the black matrix corresponding to the first seed pixel is formed using the above-mentioned masks, the uniformity of the black matrix edge is not significantly different from that when the black matrix corresponding to the second seed pixel is formed. Therefore, the position of the long side and the short side of the sub-pixel corresponding to different exposure directions has little effect on the uniformity of the black matrix edge.

[0118] For example, if the short side of the sub-pixel is 50 microns and the long side is 150 microns, the width of the mask plate forming the black matrix corresponding to the sub-pixel of this size can be 6 microns, 6.5 microns, 7 microns, 7.5 microns or 8 microns. For example, if the short side of the sub-pixel is 160 microns and the long side is 490 microns, the width of the mask plate forming the black matrix corresponding to the sub-pixel of this size can be 19 microns or 24 microns. For example, if the short side of the sub-pixel is 100 microns and the long side is 300 microns, the width of the mask plate forming the black matrix corresponding to the sub-pixel of this size can be 17 microns. For example, if the short side of the sub-pixel is 190 microns and the long side is 560 microns, the width of the mask plate forming the black matrix corresponding to the sub-pixel of this size can be 29 microns. For example, if the short side of the sub-pixel is 210 microns and the long side is 630 microns, the width of the mask plate forming the black matrix corresponding to the sub-pixel of this size can be 50 microns.

[0119] For example, the size of the display screen to which the above-mentioned black matrix is ​​applied can be 23.8 inches, 27 inches, 31.5 inches, 43 inches, 55 inches, 65 inches and 86 inches, etc. The black matrix in the display screens of different sizes uses the above-mentioned mask plates with semicircular notches of different sizes or serrations of different sizes, which is helpful to significantly solve the Mura & Block defects.

[0120] FIG12 illustrates the size difference between the strip-shaped light-transmitting portions and the strip-shaped portions when using masks p1-p10 to form strip-shaped portions of different sizes. The light-transmitting areas of masks p1-p10 used for transmitting light to expose the strip-shaped portions 210 of the black matrix 200 are collectively referred to as strip-shaped light-transmitting portions 410. The maximum width of the strip-shaped light-transmitting portion 410 perpendicular to its extension direction is the mask width, and the maximum width of the strip-shaped portion 210 perpendicular to its extension direction is the black matrix width. Taking the black matrix width (FICD) of the strip-shaped portion 210 of the black matrix 200 to be formed as an example, the mask width (Mask CD) of the strip-shaped light-transmitting portion 410 of the mask can be determined by determining the size difference (CD Bias) between the strip-shaped light-transmitting portions 410 and the strip-shaped portions 210 when forming black matrices 200 of different sizes using different masks. For example, the FICD, CD Bias, and Mask CD satisfy the relationship: Mask CD = FICD – CDBias.

[0121] For example, as shown in FIG12 , when the same mask is used to form black matrices with widths of 6 microns, 6.5 microns, 7 microns, 7.5 microns, 8 microns, 17 microns, 19 microns, 24 microns, 29 microns, and 50 microns, the size difference between the mask width and the width of the formed black matrix is ​​different.

[0122] In some examples, as shown in FIG. 12 , in a mask having a semicircular notch 402 at the edge of a strip-shaped light-transmitting portion 410 , the difference between the width of the mask and the width of the black matrix formed thereon is no greater than 1.2 μm.

[0123] In some examples, as shown in FIG. 12 , in a mask having continuous sawtooth 403 at the edge of the strip-shaped light-transmitting portion 410 , the difference between the width of the mask and the width of the black matrix formed thereon is no greater than 2 micrometers.

[0124] For example, as shown in FIG12 and Table 1, a mask plate 8 is used to form a black matrix 200 with a black matrix width of 6±0.5 μm, wherein the notch 402 thereof is semicircular in shape with a semicircular diameter of 1 μm, and the difference between the mask plate width and the black matrix width is no more than 1.1 μm, such as 1.01 μm or 0.94 μm.

[0125] For example, as shown in FIG12 , a mask plate 4 is used to form a black matrix 200 having a black matrix width of 7±0.5 μm, wherein the edge of the strip-shaped light-transmitting portion 410 thereof has continuously arranged serrations 403, and the dimensions of the serrations 403 in a direction parallel to and perpendicular to the extension direction of the strip-shaped light-transmitting portion 410 are both 1 μm, and the difference between the mask plate width and the black matrix width is no more than 1.5 μm, such as 1.3 μm, 1.26 μm or 1.22 μm.

[0126] For example, as shown in FIG12 , a mask plate 7 is used to form a black matrix 200 having a black matrix width of 8±0.5 μm, wherein the notch 402 thereof is semicircular in shape with a semicircular diameter of 0.75 μm, and the difference between the mask plate width and the black matrix width is no more than 1 μm, such as 0.32 μm, 0.19 μm or 0.94 μm.

[0127] For example, as shown in FIG12 , a mask plate 5 is used to form a black matrix 200 having a black matrix width of 9±0.5 μm, wherein the edge of the strip-shaped light-transmitting portion 410 thereof has continuously arranged serrations 403, and the dimensions of the serrations 403 in a direction parallel to and perpendicular to the extension direction of the strip-shaped light-transmitting portion 410 are both 1.5 μm, and the difference between the mask plate width and the black matrix width is no more than 1.5 μm, such as 1.38 μm.

[0128] For example, as shown in FIG12 and Table 2, a mask plate 6 is used to form a black matrix 200 with a black matrix width of 16±0.5 μm and 17±0.5 μm, wherein the notch 402 is semicircular in shape with a semicircular diameter of 0.5 μm, and the difference between the mask plate width and the black matrix width is no greater than 1 μm, such as no greater than 0.8 μm, such as 0.5 μm.

[0129] For example, as shown in FIG12 , a mask plate 5 is used to form a black matrix 200 having a black matrix width of 18±0.5 μm, wherein the edge of the strip-shaped light-transmitting portion 410 thereof has continuously arranged serrations 403, and the dimensions of the serrations 403 in a direction parallel to and perpendicular to the extension direction of the strip-shaped light-transmitting portion 410 are both 1.5 μm, and the difference between the mask plate width and the black matrix width is no more than 1.1 μm, such as 1.06 μm or 1.07 μm.

[0130] For example, as shown in FIG12 , a mask plate 6 is used to form a black matrix 200 having a black matrix width of 24±0.5 μm, wherein the notch 402 thereof is semicircular in shape with a semicircular diameter of 0.5 μm, and the difference between the mask plate width and the black matrix width is no more than 0.8 μm, such as 0.5 μm or 0.52 μm.

[0131] For example, as shown in FIG12 and Table 3, a mask plate 6 is used to form a black matrix 200 with a black matrix width of 28±0.5 μm, wherein the notch 402 is semicircular in shape with a semicircular diameter of 0.5 μm, and the difference between the mask plate width and the black matrix width is no more than 0.8 μm, such as 0.5 μm or 0.52 μm.

[0132] For example, as shown in FIG12 and Table 4, a mask plate 2 is used to form a black matrix 200 having a black matrix width of 50±0.5 μm, wherein the edge of the strip-shaped light-transmitting portion 410 thereof has continuously arranged serrations 403, and the dimensions of the serrations 403 in a direction parallel to the extension direction of the strip-shaped light-transmitting portion 410 and in a direction perpendicular to the extension direction are both 0.5 μm, and the difference between the mask plate width and the black matrix width is not greater than 0.5 μm, such as not greater than 0.3 μm, such as 0.19 μm.

[0133] In some examples, as shown in FIG12 and the above tables, the maximum width of the strip portions 210 of the black matrix 200 in the direction perpendicular to their extension is 5.5 to 6.5 microns, and the diameter of the semicircular notches 402 in the strip-shaped light-transmitting portions 410 of the mask plate is 0.8 to 1.2 microns. For example, the maximum width of the strip portions 210 of the black matrix 200 in the direction perpendicular to their extension is 6 microns, and the diameter of the semicircular notches 402 in the strip-shaped light-transmitting portions 410 of the mask plate is 1 micron.

[0134] In some examples, as shown in FIG12 and the above tables, the maximum width of the strip portions 210 of the black matrix 200 in the direction perpendicular to their extension is 27.5 to 28.5 microns, and the diameter of the semicircular notches 402 in the strip-shaped light-transmitting portions 410 of the mask plate is 0.3 to 0.7 microns. For example, the maximum width of the strip portions 210 of the black matrix 200 in the direction perpendicular to their extension is 28 microns, and the diameter of the semicircular notches 402 in the strip-shaped light-transmitting portions 410 of the mask plate is 0.5 microns.

[0135] In some examples, as shown in FIG12 and the above tables, the maximum width of the strips 210 of the black matrix 200 in the direction perpendicular to their extension is 6.5 to 7.5 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 0.8 to 1.2 microns. For example, the maximum width of the strips 210 of the black matrix 200 in the direction perpendicular to their extension is 7 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 1 micron.

[0136] In some examples, as shown in FIG12 and the above tables, the maximum width of the strips 210 of the black matrix 200 in the direction perpendicular to their extension is 17.5 to 18.5 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 1.3 to 1.7 microns. For example, the maximum width of the strips 210 of the black matrix 200 in the direction perpendicular to their extension is 18 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 1.5 microns.

[0137] In some examples, as shown in FIG12 and the above tables, the maximum width of the strip portions 210 of the black matrix 200 perpendicular to their extension direction is 49.5 to 50.5 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 0.3 to 0.7 microns. For example, the maximum width of the strip portions 210 of the black matrix 200 perpendicular to their extension direction is 50 microns, and the first and second dimensions of the serrations 403 at the edges of the strip-shaped light-transmitting portions 410 of the mask plate are both 0.5 microns.

[0138] FIG13 is a schematic diagram of a display device according to an embodiment of the present disclosure.

[0139] As shown in Figure 13, the display device includes the display substrate 20 shown in Figures 2 to 6, which is a color filter substrate. The display device also includes an array substrate 10 disposed opposite to the color filter substrate.

[0140] For example, as shown in FIG. 13 , the display device further includes a liquid crystal layer 40 located between the display substrate 20 and the array substrate 10 and a frame sealant 30 encapsulating the liquid crystal layer 40 .

[0141] 13 , the display device may be a liquid crystal display device. For example, the display device further includes a backlight source located on a side of the array substrate 10 away from the display substrate 20 to provide backlight for a display panel formed by the display substrate 20 and the array substrate 10.

[0142] For example, the display device may be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, etc., but the present embodiment is not limited thereto.

[0143] There are a few points to note:

[0144] (1) The drawings of the embodiments of the present disclosure only involve structures related to the embodiments of the present disclosure, and other structures can refer to general designs.

[0145] (2) In the absence of conflict, features in the same embodiment and different embodiments of the present disclosure may be combined with each other.

[0146] The foregoing description is merely an exemplary embodiment of the present disclosure and is not intended to limit the scope of protection of the present disclosure. The scope of protection of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: substrate; A black matrix is ​​located on one side of the substrate, and the black matrix includes a plurality of strip-shaped portions. Among them, a cross-section of at least one strip portion cut by a plane perpendicular to its extension direction includes a first edge close to the substrate and a second edge away from the substrate, and the length of the first edge and the length of the second edge are both smaller than the maximum dimension of the cross-section in a direction parallel to the substrate.

2. The display substrate according to claim 1, wherein: The ratio of the length of the first side to the length of the second side is 0.95 to 1.05, the dimension of a position between the first side and the second side in a direction parallel to the substrate is the maximum dimension, and the length of at least one of the first side and the second side is the minimum dimension of the cross section in a direction parallel to the substrate.

3. The display substrate according to claim 1 or 2, wherein: The cross-section includes a curved side edge connecting the first side and the second side, the curved side edge is curved toward a side away from the center of the cross-section, the curved side edge includes a first connection point connected to the first side, a second connection point connected to the second side, and a convex point located between the first connection point and the second connection point, and the distance between the two intersection points of the curved side edge of the cross-section with a straight line passing through the convex point and parallel to the substrate is the maximum dimension.

4. The display substrate according to claim 2, wherein: The difference between the maximum size and the minimum size is 0.04 to 0.42 micrometers.

5. The display substrate according to claim 3, wherein: The angle between the tangent line passing through the protrusion and the first side is 70 to 88 degrees.

6. The display substrate according to any one of claims 1 to 5, wherein: The difference in width of the orthographic projection of the same strip portion at different positions on the substrate does not exceed 0.3 micrometers.

7. The display substrate according to any one of claims 1 to 6, wherein: The difference in maximum widths of orthographic projections of different strip-shaped portions on the substrate does not exceed 0.92 micrometers.

8. The display substrate according to claim 5, wherein: In the at least one strip-shaped portion, the maximum dimension is 5.5 to 6.5 micrometers, the thickness is 1 to 1.5 micrometers, and the angle between the tangent line and the first side is 72 to 77 degrees.

9. The display substrate according to claim 5, wherein: In the at least one strip-shaped portion, the maximum dimension is 6.5 to 7.5 micrometers, the thickness is 1 to 1.5 micrometers, and the angle between the tangent line and the first side is 82 to 87 degrees.

10. The display substrate according to claim 5, wherein: In the at least one strip-shaped portion, the maximum dimension is 15.5 to 28.5 micrometers, the thickness is 1 to 1.5 micrometers, and the angle between the tangent line and the first edge is 77 to 82 degrees.

11. The display substrate according to claim 5, wherein: In the at least one strip-shaped portion, the maximum dimension is 49.5 to 50.5 micrometers, the thickness is 1 to 1.5 micrometers, and the angle between the tangent line and the first edge is 85 to 88 degrees.

12. The display substrate according to any one of claims 1 to 11, wherein: The plurality of strip-shaped portions include strip-shaped portions extending along a first direction and strip-shaped portions extending along a second direction, the strip-shaped portions extending along the first direction and the strip-shaped portions extending along the second direction are cross-arranged to define a plurality of openings, and the first direction intersects the second direction; The display substrate further includes a color filter layer located in the plurality of openings.

13. A mask for forming the display substrate according to any one of claims 1 to 7, comprising: The light-transmitting portion includes a plurality of strip-shaped light-transmitting portions, and the plurality of strip-shaped light-transmitting portions are configured to be patterned using the light-transmitting portion as a mask to form the plurality of strip-shaped portions; The light-shielding area is located between at least two strip-shaped light-transmitting portions. Wherein, the edge of at least one strip-shaped light-transmissive portion corresponding to the at least one strip-shaped portion includes a plurality of continuously arranged protrusions or a plurality of notches.

14. The mask according to claim 13, wherein: The edge of the at least one strip-shaped light-transmitting portion includes the plurality of notches, each notch has a shape of a semicircle, the plurality of semicircles are continuously arranged, and the diameter of the semicircle is 0.3 to 1.2 micrometers.

15. The mask according to claim 13, wherein: The plurality of protrusions include a plurality of saw teeth, each of which has a maximum dimension of a first dimension in the extension direction of the strip-shaped light-transmissive portion and a maximum dimension of a second dimension perpendicular to the extension direction, and both the first dimension and the second dimension are within the range of 0.3 to 1.7 microns.

16. The mask according to claim 14, wherein: The maximum width of the strip-shaped transparent portion in a direction perpendicular to its extension is the mask width, the maximum width of the strip-shaped portion in a direction perpendicular to its extension is the black matrix width, and the difference between the mask width and the black matrix width is no more than 1.2 microns.

17. The mask according to claim 15, wherein: The maximum width of the strip-shaped transparent portion perpendicular to its extension direction is the mask width, the maximum width of the strip-shaped portion perpendicular to its extension direction is the black matrix width, and the difference between the mask width and the black matrix width is no more than 2 microns.

18. The mask according to claim 14, wherein: The maximum width of the strip-shaped portion in a direction perpendicular to its extension direction is 5.5 to 6.5 micrometers, and the diameter of the semicircle is 0.8 to 1.2 micrometers; or, The maximum width of the strip-shaped portion in a direction perpendicular to its extension direction is 27.5 to 28.5 micrometers, and the diameter of the semicircle is 0.3 to 0.7 micrometers.

19. The mask according to claim 15, wherein: The maximum width of the strip-shaped portion in a direction perpendicular to its extension direction is 6.5 to 7.5 micrometers, and the first size and the second size of the sawtooth are both 0.8 to 1.2 micrometers; or, The maximum width of the strip-shaped portion in a direction perpendicular to its extension direction is 17.5 to 18.5 micrometers, and the first size and the second size of the sawtooth are both 1.3 to 1.7 micrometers; or, The maximum width of the strip portion in a direction perpendicular to its extension direction is 49.5-50.5 micrometers, and the first size and the second size of the sawtooth are both 0.3-0.7 micrometers.

20. A display device, comprising: The display substrate according to any one of claims 1 to 12, wherein the display substrate is a color filter substrate; The array substrate is arranged opposite to the color filter substrate.

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