Substrate loading mechanism and vacuum processing apparatus

Abstract

The invention relates to the technical field of vacuum processing such as vacuum coating, in particular to a substrate loading mechanism and a vacuum processing device.The substrate loading mechanism comprises a mounting part used for arranging a substrate in a substrate processing cavity; the substrate loading part is used for loading the substrate, and the substrate loading part is rotationally connected with the mounting part; the first rotating transmission part is used for driving the substrate loading part to rotate relative to the mounting part, the transmission ratio of the power input end to the power output end of the first rotating transmission part is N: 1, and N is a positive integer larger than 1; and the angle measuring part is used for measuring the rotation angle of the substrate loading part, and at least part of the angle measuring part is connected with the rotation transmission part. According to the invention, high-precision angle adjustment of the mounting arm and the rotating arm can be realized, so that the processing precision of wafers is ensured.

Description

Technical Field

[0001] The present invention relates to the technical field of vacuum processing such as vacuum coating, and particularly to a substrate loading mechanism and a vacuum processing device. Background Art

[0002] To improve the accuracy of vacuum processing, it is often necessary to precisely control the tilt angle of the substrate relative to the processing source in the vacuum processing device. However, in the prior art, during the adjustment of the substrate angle, it is difficult to achieve small-angle adjustments such as 1° and below, and the adjustment process is cumbersome, thus unable to meet the accuracy and efficiency requirements of vacuum processing of substrates such as wafers in vacuum coating and the like. For example, during the vacuum evaporation coating process of a wafer, the mounting arm and the rotating arm are generally connected by a gear train. When adjusting the angle of the wafer relative to the evaporation source, the included angle between the mounting arm and the rotating arm is often directly changed first, and then, the angle is measured, and the foregoing process is repeated until the preset value; finally, the included angle between the mounting arm and the rotating arm is locked, and the coating starts. However, in the prior art, the accuracy of the included angle between the mounting arm and the rotating arm obtained by the foregoing adjustment method cannot meet the high-precision vacuum processing requirements of the wafer, and the controllability of the adjustment process is relatively low, and the time consumption is relatively long, thus affecting the quality and efficiency of wafer processing. Summary of the Invention

[0003] The purpose of the present invention is to provide a substrate loading mechanism and a vacuum processing device, which can achieve high-precision adjustment of the angles of the mounting arm and the rotating arm, thereby ensuring the processing accuracy of the wafer.

[0004] To achieve this purpose, the present invention adopts the following technical solutions:

[0005] A substrate loading mechanism, comprising:

[0006] A mounting part, which is used to arrange the substrate in a substrate processing chamber;

[0007] A substrate loading part, which is used to load the substrate, and the substrate loading part is rotatably connected to the mounting part;

[0008] A first rotation transmission part, which is used to drive the substrate loading part to rotate relative to the mounting part, and the transmission ratio between the power input end and the power output end of the first rotation transmission part is N:1, where N is a positive integer greater than 1;

[0009] An angle measurement part, which is used to measure the rotation angle of the substrate loading part, and at least part of the angle measurement part is connected to the rotation transmission part.

[0010] Further, the mounting part includes:

[0011] The mounting base plate, which is connected to the cavity wall of the substrate processing chamber;

[0012] The mounting arm, which is arranged between the mounting base plate and the substrate loading part.

[0013] Further, the substrate loading part includes a substrate loading disk and a rotating arm, and the rotating arm is arranged between the power output end of the first rotating transmission part and the substrate loading disk.

[0014] Further, the transmission ratio of the power input end to the power output end of the first rotating transmission part is N:1, where N is greater than 20.

[0015] Further, the first rotating transmission part includes a worm gear assembly and a worm assembly that mesh with each other. The worm assembly and the worm gear assembly are rotatably arranged in the mounting arm, and the worm gear assembly is fixedly connected to the substrate loading part.

[0016] Further, the worm assembly includes a worm body and a worm shaft. The worm body is fixedly sleeved on the worm shaft. The worm body meshes with the worm gear assembly. Two worm bearings are arranged on the mounting arm, and the worm shaft is fixedly arranged through the inner ring of the worm bearings.

[0017] Further, the first end of the worm shaft extends relative to the mounting arm, and a rocker is fixedly arranged on the first end of the worm shaft.

[0018] Further, a support frame is fixedly arranged in the mounting arm, and one of the worm bearings is fixedly arranged on the support frame.

[0019] Further, the worm gear assembly includes a worm gear and a rotating shaft. The worm gear is non-rotatably arranged on the rotating shaft. The worm gear is fixedly arranged on the rotating shaft. Two worm gear bearings are fixedly arranged on the mounting arm, and the rotating shaft is fixedly arranged through the inner ring of the worm gear bearings.

[0020] Further, the angle measuring part includes a first rotating angle measuring part and / or a second rotating angle measuring part. The first rotating angle measuring part includes a first pointer and a first scale disk. Among the first scale disk and the first pointer, one is arranged on the mounting part and the other is arranged on the substrate loading part; the second rotating angle measuring part includes a second pointer and a second scale disk. Among the second scale disk and the second pointer, one is arranged on the mounting part and the other is arranged on the power input end of the first rotating transmission part. The graduation value of the first scale disk is N times that of the second scale disk.

[0021] Further, a second rotating transmission part is further included, and the second rotating transmission part is arranged between the mounting part and the substrate loading part.

[0022] Further, the second rotation transmission part includes an upper fine adjustment limiting component and a lower fine adjustment limiting component. The upper fine adjustment limiting component and the lower fine adjustment limiting component are fixedly arranged on the installation part. The upper fine adjustment limiting component can push the substrate loading part to rotate counterclockwise, and the lower fine adjustment limiting component can push the substrate loading part to rotate clockwise. Moreover, the upper fine adjustment limiting component and the lower fine adjustment limiting component can cooperate to lock the substrate loading part.

[0023] Further, the upper fine adjustment limiting component includes a first mounting plate, a first locking screw, and a first adjusting micrometer head. The first mounting plate is arranged on the installation part. The first locking screw is screwed with the first mounting plate. The first adjusting micrometer head is fixedly arranged on the first mounting plate. The first locking screw and the first adjusting micrometer head can abut against the substrate loading part. The lower fine adjustment limiting component includes a second mounting plate, a second locking screw, and a second adjusting micrometer head. The second mounting plate is arranged on the installation part. The second locking screw is screwed with the second mounting plate. The second adjusting micrometer head is fixedly arranged on the second mounting plate. The second locking screw and the second adjusting micrometer head can abut against the substrate loading part.

[0024] Further, a first abutting part and a second abutting part are arranged at intervals on the substrate loading part. The first abutting part cooperates with the upper fine adjustment limiting component, and the second abutting part cooperates with the lower fine adjustment limiting component.

[0025] Further, an arc-shaped groove is formed on the installation part. The first abutting part and the second abutting part are located in the arc-shaped groove. A plurality of connecting holes are formed on both sides of the arc-shaped groove. The upper fine adjustment limiting component and the lower fine adjustment limiting component are connected to the installation part through the connecting holes.

[0026] A vacuum processing device includes the substrate loading mechanism as described above.

[0027] The beneficial effects of the present invention:

[0028] A substrate loading mechanism provided by the present invention, an installation part is used to set a substrate in a substrate processing chamber, a substrate loading part is rotationally connected to the installation part, a first rotation transmission part is used to drive the substrate loading part to rotate relative to the installation part, the transmission ratio between the power input end and the power output end of the first rotation transmission part is N:1, an angle measurement part is used to measure the rotation angle of the substrate loading part, and at least a part of the angle measurement part is connected to the rotation transmission part. During the rotation process, since the rotation angle of the power input end of the first rotation transmission part is N times that of the power output end, small-angle adjustment can be achieved, high-precision adjustment of the angles of the installation part and the substrate loading part can be realized, and the angle measurement part is used to measure the rotation angle of the substrate loading part. Thus, the processing precision of various substrates such as wafers can be ensured. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments of the present invention. Obviously, the following drawings are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained according to the content of the embodiments of the present invention and these drawings.

[0030] Figure 1 is a schematic diagram of a substrate loading mechanism of the present invention;

[0031] Figure 2 is an internal structure diagram of a substrate loading mechanism of the present invention;

[0032] Figure 3 is a cross-sectional view of a substrate loading mechanism of the present invention;

[0033] Figure 4 is a schematic diagram of an upper fine-tuning limit component and a lower fine-tuning limit component in a substrate loading mechanism of the present invention;

[0034] Figure 5 is a schematic diagram of a first rotation transmission part in a substrate loading mechanism of the present invention;

[0035] Figure 6 is a schematic diagram of a first dial in a substrate loading mechanism of the present invention;

[0036] Figure 7 is a schematic diagram of a second dial in a substrate loading mechanism of the present invention.

[0037] In the figure:

[0038] 1. Mounting base plate; 2. Mounting arm; 21. Support frame; 3. First rotary transmission part; 31. Worm assembly; 311. Worm shaft; 312. Worm body; 313. Rocker; 314. Worm bearing; 32. Worm gear assembly; 321. Worm gear; 322. Rotating shaft; 323. Worm gear bearing; 4. Rotating arm; 41. First abutting member; 42. Second abutting member; 43. Substrate loading plate; 5. First scale; 51. First pointer; 52. Arc groove; 53. Connecting hole; 6. Second scale; 61. Second pointer; 7. Upper fine adjustment limit component; 71. First mounting plate; 72. First locking screw; 73. First adjusting micrometer head; 8. Lower fine adjustment limit component; 81. Second mounting plate; 82. Second locking screw; 83. Second adjusting micrometer head. Detailed implementation manners

[0039] Before explaining any implementation manners of the present application in detail, it should be understood that the present application is not limited to the structural details and component arrangements described in the following description or shown in the above drawings.

[0040] In the present application, the terms "comprise", "include", "have" or any other variant thereof are intended to cover non-exclusive inclusion, such that a process, method, article or device including a series of elements not only includes those elements but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "comprising a..." does not exclude the presence of additional identical elements in the process, method, article or device including the element.

[0041] In the present application, the term "and / or" is an associative relationship describing associated objects, indicating that three relationships may exist. For example, a substrate loading mechanism and / or a substrate loading mechanism may represent: the sole existence of a substrate loading mechanism, the simultaneous existence of a substrate loading mechanism and a substrate loading mechanism, and the sole existence of a substrate loading mechanism, these three situations. Additionally, in the present application, the character " / " generally represents an "and / or" relationship between the associated objects before and after.

[0042] In the present application, the terms "connect", "combine", "couple", "mount" may be direct connection, combination, coupling or mounting, or may be indirect connection, combination, coupling or mounting. Among them, by way of example, direct connection means that two parts or components are connected together without the need for an intermediate member, and indirect connection means that two parts or components are respectively connected to at least one intermediate member, and these two parts or components are connected through the intermediate member. In addition, "connect" and "couple" are not limited to physical or mechanical connection or coupling, and may include electrical connection or coupling.

[0043] In this application, those of ordinary skill in the art will understand that relative terms used in connection with quantities or conditions (e.g., "about", "approximately", "substantially", etc.) are intended to include the recited value and have the meaning indicated by the context. For example, such relative terms include at least the degree of error associated with the measurement of a particular value, tolerances resulting from manufacturing, assembly, use in relation to a particular value, etc. Such terms should also be considered to disclose ranges defined by the absolute values of two endpoints. Relative terms may refer to plus or minus a certain percentage (e.g., 1%, 5%, 10% or more) of the indicated value. Numerical values without the use of relative terms should also be disclosed as specific values with tolerances. In addition, when expressing relative angular positional relationships (e.g., substantially parallel, substantially perpendicular), "substantially" may refer to plus or minus a certain number of degrees (e.g., 1 degree, 5 degrees, 10 degrees or more) from the indicated angle.

[0044] In this application, those of ordinary skill in the art will understand that the functions performed by a component can be performed by one component, multiple components, one part, or multiple parts. Similarly, the functions performed by a part can also be performed by one part, one component, or a combination of multiple parts.

[0045] In this application, the orientation terms such as "upper", "lower", "left", "right", "front", "rear", etc. are described based on the orientation and positional relationship shown in the drawings, and should not be construed as a limitation on the embodiments of this application. In addition, in the context, it should also be understood that when it is mentioned that one element is connected "above" or "below" another element, it can not only be directly connected "above" or "below" another element, but also be indirectly connected "above" or "below" another element through an intermediate element. It should also be understood that the orientation terms such as the upper side, lower side, left side, right side, front side, rear side, etc. not only represent the positive orientation, but can also be understood as the side orientation. For example, the lower side can include directly below, lower left, lower right, lower front, and lower rear, etc.

[0046] During the vacuum processing of a substrate such as a wafer, such as vacuum coating, in order to ensure that the high-precision adjustment of the angle between the mounting arm and the rotating arm can be achieved, thereby ensuring the processing accuracy of the substrate, as Figures 1 - 7 shown, the present invention provides a substrate loading mechanism. The substrate loading mechanism includes a mounting portion, a substrate loading portion, a first rotation transmission portion 3, and an angle measurement portion.

[0047] Among them, the installation part is used to set the substrate in the substrate processing chamber; the substrate loading part is used to load the substrate, and the substrate loading part is rotationally connected to the installation part; the first rotation transmission part 3 is used to drive the substrate loading part to rotate relative to the installation part, and the transmission ratio between the power input end and the power output end of the first rotation transmission part 3 is N:1, where N is a positive integer greater than 1; the angle measurement part is used to measure the rotation angle of the substrate loading part relative to the installation part, and at least part of the angle measurement part is connected to the rotation transmission part.

[0048] During the rotation process, since the rotation angle of the power input end of the first rotation transmission part 3 is N times that of the power output end, small-angle adjustment can be achieved, realizing high-precision adjustment of the angle between the installation part and the substrate loading part. The angle measurement part is used to measure the rotation angle of the substrate loading part, thereby ensuring the processing accuracy of the substrate.

[0049] Furthermore, the installation part includes an installation base plate 1 and an installation arm 2. The installation base plate is connected to the cavity wall of the substrate processing chamber; the installation arm 2 is arranged between the installation base plate 1 and the substrate loading part.

[0050] Furthermore, the installation base plate 1 can also be used to connect with the coating umbrella rack, and the coating umbrella rack can be set to be rotationally connected to the cavity wall of the substrate processing chamber, so that the installation base plate 1 can rotate together with the umbrella rack; one end of the installation arm 2 is fixedly arranged on the installation base plate 1; part of the first rotation transmission part 3 is arranged in the installation arm 2. The installation arm 2 can be driven to rotate by the umbrella rack. In this embodiment, preferably, the installation arm 2 is a planetary arm.

[0051] Furthermore, the substrate loading part includes a substrate loading disk 43 and a rotating arm 4 that are fixedly connected. The rotating arm 4 is arranged between the power output end of the first rotation transmission part 3 and the substrate loading disk 43, and the rotating arm 4 is connected to the power output end. The included angle between the rotating arm 4 and the installation arm 2 can be adjusted by the first rotation transmission part 3, and it is convenient to install the substrate by setting the substrate loading disk 43.

[0052] Furthermore, the transmission ratio between the power input end and the power output end of the first rotation transmission part is N:1, where N is greater than 20. In this embodiment, N is 60, and a transmission ratio of 60:1 is adopted. That is to say, when the power input end of the first rotation transmission part 3 rotates 60 circles, the power output end rotates 1 circle. Therefore, an adjustment accuracy of ±0.1° can be achieved. In other embodiments, the transmission ratio can be set according to actual needs, and no further limitation is made here.

[0053] Further, the first rotation transmission part 3 includes a worm wheel assembly 32 and a worm assembly 31 that mesh with each other. The worm assembly 31 is rotatably arranged on the mounting arm 2, the worm wheel assembly 32 is rotatably arranged in the mounting arm 2, and the worm wheel assembly 32 is fixedly connected to the rotating arm 4 of the substrate loading part. By adopting the above rotation transmission structure, it is convenient to arrange in the mounting arm 2 and can ensure an accurate transmission ratio. In other embodiments, gear transmission, chain transmission or synchronous belt transmission can also be used, which will not be limited here.

[0054] Further, the worm assembly 31 includes a worm body 312 and a worm shaft 311. The worm body 312 is fixedly sleeved on the worm shaft 311. The worm body 312 meshes with the worm wheel assembly 32. Two worm bearings 314 are fixedly arranged on the mounting arm 2, and the worm shaft 311 is fixedly inserted into the inner ring of the worm bearings 314. By designing the worm assembly 31 as a split structure, it can ensure transmission while saving materials and facilitating manufacturing. By arranging the worm bearings 314, the smooth rotation of the worm body 312 can be ensured. In other embodiments, the worm body 312 and the worm shaft 311 can be designed as an integral structure to ensure the connection stability between the worm body 312 and the worm shaft 311 and prevent the worm body 312 from rotating relative to the worm shaft 311, resulting in inaccurate angle adjustment.

[0055] Further, the first end of the worm shaft 311 extends relative to the mounting arm 2, and a rocker 313 is fixedly arranged on the first end of the worm shaft 311. By arranging the rocker 313, it is convenient to rotate the worm shaft 311, thereby realizing power input. Moreover, by arranging the rocker 313, the force arm is increased, and manpower can be saved. Specifically, the rocker 313 can be rotated by manpower or a motor, which will not be limited here.

[0056] Further, a support frame 21 is fixedly arranged in the mounting arm 2, and one of the worm bearings 314 is fixedly arranged on the support frame 21. In this embodiment, the support frame 21 is in an inverted L shape. By arranging the support frame 21, it is convenient to install the worm bearing 314 and the worm shaft 311.

[0057] Further, the worm wheel assembly 32 includes a worm wheel 321 and a rotating shaft 322. The worm wheel 321 is non-rotatably arranged on the rotating shaft 322 and is fixedly arranged on the rotating shaft 322. Two worm wheel bearings 323 are fixedly arranged on the mounting arm 2, and the rotating shaft 322 is fixedly inserted into the inner ring of the worm wheel bearings 323. Specifically, the worm wheel 321 and the rotating shaft 322 are connected by key fit. During the process of rotating the worm body 312, the worm body 312 drives the worm wheel 321 to rotate. The rotating arm 4 is fixed on the rotating shaft 322, and the worm wheel 321 drives the rotating shaft 322 to drive the rotating arm 4 to rotate. By arranging the worm wheel bearings 323, the smooth rotation of the worm wheel 321 can be ensured.

[0058] The angle measurement unit includes a first rotation angle measurement unit and / or a second rotation angle measurement unit. The first rotation angle measurement unit includes a first pointer 51 and a first scale 5. Among the first scale 5 and the first pointer 51, one is disposed on the mounting arm 2 of the mounting portion, and the other is disposed on the rotating arm 4 of the substrate loading portion. The second rotation angle measurement unit includes a second pointer 61 and a second scale 6. Among the second scale 6 and the second pointer 61, one is disposed on the mounting arm 2 of the mounting portion, and the other is disposed on the power input end of the first rotation transmission portion 3. The graduation value of the first scale 5 is N times that of the second scale 6. Specifically, the first rotation angle measurement unit or the second rotation angle measurement unit can be arranged separately according to needs, or the first rotation angle measurement unit and the second rotation angle measurement unit can be arranged simultaneously. Arranging the first rotation angle measurement unit alone can achieve rough adjustment of the angle between the rotating arm 4 and the mounting arm 2. By separately setting the second rotation angle measurement unit, fine adjustment of the angle between the rotating arm 4 and the mounting arm 2 can be achieved, but personnel need to calculate the roughly adjusted angle, and the angle adjustment is a bit cumbersome. By setting the first rotation angle measurement unit and the second rotation angle measurement unit, the angle adjustment can be completed intuitively.

[0059] In this embodiment, a first pointer 51 is provided on the rotating arm 4; the first scale 5 is fixedly provided on the mounting arm 2 and is located on one side of the first pointer 51; the second scale 6 is fixedly provided on the mounting arm 2, and the second scale 6 is located on the rocker 313 at the power input end, and a second pointer 61 is provided at the power input end. The graduation value of the first scale 5 is N times that of the second scale 6. During the rotation process, the first pointer 51 on the rotating arm 4 can indicate the approximate rotation angle. Since the graduation value of the first scale 5 is N times that of the second scale 6, the second scale 6 can magnify the angle of the first scale 5. Thus, by cooperating the second pointer 61 at the power input end with the second scale 6, fine adjustment of a small angle can be achieved, so as to cooperate with the first scale 5 to complete the fine indication of the angle adjustment, realize high-precision adjustment of the angle between the mounting arm 2 and the rotating arm 4, and thus ensure the processing accuracy of various substrates such as wafers.

[0060] Furthermore, the substrate loading mechanism further includes a second rotation transmission portion, which is disposed between the mounting arm 2 of the mounting portion and the rotating arm 4 of the substrate loading portion, and the second rotation transmission portion is used to achieve fine adjustment of the angle between the mounting arm 2 and the rotating arm 4 of the substrate loading portion.

[0061] The second rotation transmission part includes an upper fine-tuning limit component 7 and a lower fine-tuning limit component 8. The upper fine-tuning limit component 7 and the lower fine-tuning limit component 8 are fixedly arranged on the first scale disk 5 on the mounting arm 2. The upper fine-tuning limit component 7 can push the rotating arm 4 of the substrate loading part to rotate counterclockwise, and the lower fine-tuning limit component 8 can push the rotating arm 4 to rotate clockwise, and the upper fine-tuning limit component 7 and the lower fine-tuning limit component 8 can cooperate to lock the rotating arm 4. Due to the backlash between the worm gear 321 and the worm body 312, the backlash can be adjusted by the upper fine-tuning limit component 7 and the lower fine-tuning limit component 8, thereby further improving the accuracy of angle adjustment.

[0062] Furthermore, the upper fine-tuning limit component 7 includes a first mounting plate 71, a first locking screw 72 and a first adjusting micrometer head 73. The first mounting plate 71 is arranged on the first scale disk 5. The first locking screw 72 is screwed with the first mounting plate 71. The first adjusting micrometer head 73 is fixedly arranged on the first mounting plate 71. The first locking screw 72 and the first adjusting micrometer head 73 can abut against the rotating arm 4. The lower fine-tuning limit component 8 includes a second mounting plate 81, a second locking screw 82 and a second adjusting micrometer head 83. The second mounting plate 81 is arranged on the first scale disk 5. The second locking screw 82 is screwed with the second mounting plate 81. The second adjusting micrometer head 83 is fixedly arranged on the second mounting plate 81. The second locking screw 82 and the second adjusting micrometer head 83 can abut against the rotating arm 4. Due to the backlash between the worm gear 321 and the worm body 312, the conversion error is within ±0.2°. The first locking screw 72, the first adjusting micrometer head 73, the second locking screw 82 and the second adjusting micrometer head 83 are assembled and fixed on the first scale disk 5. The first locking screw 72, the first adjusting micrometer head 73, the second locking screw 82 and the second adjusting micrometer head 83 all abut against the rotating arm 4, thereby locking the position of the rotating arm 4 relative to the mounting arm 2. During precise fine-tuning, if the actually measured angle value is less than the angle value shown on the scale, causing a deviation, first loosen the first locking screw 72, and then retract the first adjusting micrometer head 73 (there are scales on the first adjusting micrometer head 73, and each 0.1 mm linear scale corresponds to 0.02°). At this time, adjust the second locking screw 82 to abut against the rotating arm 4 tightly, and then advance the second adjusting micrometer head 83. Finally, tighten the first locking screw 72, and the precise fine-tuning is completed. Through the above method, the adjustment of the backlash error can be realized, and the accuracy of angle adjustment can be further improved.

[0063] Furthermore, a first abutting member 41 and a second abutting member 42 are fixedly arranged at intervals on the rotating arm 4 of the substrate loading part. The first abutting member 41 cooperates with the upper fine-tuning limit component 7, and the second abutting member 42 cooperates with the lower fine-tuning limit component 8. By arranging the first abutting member 41 and the second abutting member 42, it is convenient to cooperate with the upper fine-tuning limit component 7 and the lower fine-tuning limit component 8 to limit the position of the rotating arm 4, and it is also convenient to adjust the angle of the rotating arm 4 relative to the mounting arm 2.

[0064] Furthermore, an arc-shaped groove 52 is formed in the mounting portion. Specifically, an arc-shaped groove 52 is formed in the first dial 5 located on the mounting portion. The first abutting member 41 and the second abutting member 42 are located in the arc-shaped groove 52. A plurality of connecting holes 53 are formed on both sides of the arc-shaped groove 52. The upper fine adjustment limiting component 7 and the lower fine adjustment limiting component 8 are connected to the first dial 5 through the connecting holes 53. By providing a plurality of connecting holes 53, it is convenient to adjust the installation positions of the upper fine adjustment limiting component 7 and the lower fine adjustment limiting component 8 according to actual needs. Specifically, both the first mounting plate 71 and the second mounting plate 81 are connected to the connecting holes 53 by bolts.

[0065] Taking the adjustment of the included angle α between the rotating arm 4 and the mounting arm 2 to 76.3° as an example, the adjustment process is shown as follows:

[0066] The manual driving rocker 313 can be used to adjust the angle upward clockwise and downward counterclockwise. After adjusting to the required angle (for example, 76.3°); first, read the degree 72° closest to the position of the first pointer 51 indicating the first dial 5. Then, read the scale line angle 4.3° of the second pointer 61 indicating the second dial 6. Add the read angles to obtain the currently displayed scale angle of 76.3°. Then, use an angle gauge for verification to obtain the measured angle. If there is an error between the scale-displayed angle and the measured angle, the upper fine adjustment limiting component 7 and the lower fine adjustment limiting component 8 are adjusted to eliminate the error caused by backlash. Suppose the target angle is 76.3°. The scale-displayed angle obtained by adjusting the manual driving rocker 313 is 76.3°. Due to the existence of backlash, the measured angle is 76.28°. In the foregoing case, the upper fine adjustment limiting component 7 and the lower fine adjustment component 8 can be adjusted to finely adjust the included angle between the rotating arm 4 and the mounting arm 2. It can be understood that, as Figure 3 and Figure 6 shown, Figure 6 the angle displayed on the scale is the included angle between the downward direction of the mounting arm 2 and the direction of the rotating arm 4 away from the mounting arm 2. Specifically, first loosen the first locking screw 72, then retract the first adjusting micrometer head 73. At this time, adjust the second locking screw 82 to hold the rotating arm 4 firmly, and then advance the second adjusting micrometer head 83. Finally, lock the first locking screw 72. Using the scale on the micrometer head 73, obtain the target scale-displayed angle of 76.3°, and the precision fine adjustment is completed. Then, use an angle gauge for verification again to verify whether the target angle is reached. If there is an error, continue to repeat the above adjustment until the target angle is reached.

[0067] Furthermore, the shape of the arc-shaped groove can correspond to an arc length on the rotation circle of the substrate loading portion around the mounting arm 2. Therefore, by utilizing the corresponding relationship between the central angle and the arc length, another set of scales can be set on the second dial 6. Furthermore, on the basis of obtaining the adjustment distances of the upper fine adjustment limiting component 7 and the lower fine adjustment limiting component 8, the angle corresponding to the backlash can be approximately obtained directly by using the second pointer and the second dial 6.

[0068] This embodiment also provides a vacuum processing device, including the substrate loading mechanism as described above, which can achieve high-precision adjustment of the angles of the mounting arm and the rotating arm, thereby ensuring the accuracy of vacuum processing such as vacuum coating and etching of substrates such as wafers.

[0069] Obviously, the above-mentioned embodiments of the present invention are merely examples for clearly illustrating the present invention, rather than limiting the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes or variations can be made on the basis of the above description. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A substrate loading mechanism, characterized in that: include: A mounting portion, the mounting portion being used to place the substrate in a substrate processing chamber; A substrate loading portion, the substrate loading portion is used to load the substrate, and the substrate loading portion is rotatably connected to the mounting portion; A first rotating transmission part (3), the first rotating transmission part (3) is used to drive the substrate loading part to rotate relative to the mounting part, and the transmission ratio between the power input end and the power output end of the first rotating transmission part (3) is N:1, wherein N is a positive integer greater than 1; An angle measuring part is used to measure the rotation angle of the substrate loading part, and at least a part of the angle measuring part is connected to the rotation transmission part.

2. The substrate loading mechanism according to claim 1, characterized in that: The installation part comprises: A mounting base plate (1), wherein the mounting base plate (1) is connected to a cavity wall of the substrate processing cavity; A mounting arm (2), wherein the mounting arm (2) is arranged between the mounting base plate (1) and the substrate loading portion.

3. The substrate loading mechanism according to claim 1, characterized in that: The substrate loading part comprises a substrate loading plate (43) and a rotating arm (4), and the rotating arm (4) is arranged between the power output end of the first rotating transmission part (3) and the substrate loading plate (43).

4. The substrate loading mechanism according to claim 1, characterized in that: The transmission ratio between the power input end and the power output end of the first rotating transmission part (3) is N:1, wherein N is greater than 20.

5. The substrate loading mechanism according to claim 2, characterized in that: The first rotary transmission part (3) comprises a worm wheel assembly (32) and a worm assembly (31) meshing with each other, the worm assembly (31) and the worm wheel assembly (32) being rotatably arranged in the mounting arm (2), and the worm wheel assembly (32) being fixedly connected to the substrate loading part.

6. The substrate loading mechanism according to claim 5, characterized in that: The worm assembly (31) comprises a worm body (312) and a worm shaft (311); the worm body (312) is fixedly sleeved on the worm shaft (311); the worm body (312) is meshed with the worm wheel assembly (32); two worm bearings (314) are provided on the mounting arm (2); and the worm shaft (311) is fixedly inserted into the inner ring of the worm bearing (314).

7. The substrate loading mechanism according to claim 6, characterized in that: The first end of the worm shaft (311) extends out relative to the mounting arm (2), and a rocker (313) is fixedly arranged on the first end of the worm shaft (311).

8. The substrate loading mechanism according to claim 6, characterized in that: A support frame (21) is fixedly arranged in the mounting arm (2), and one of the worm bearings (314) is fixedly arranged on the support frame (21).

9. The substrate loading mechanism according to claim 5, characterized in that: The worm gear assembly (32) comprises a worm gear (321) and a rotating shaft (322); the worm gear (321) is arranged on the rotating shaft (322) to prevent rotation; the worm gear (321) is fixedly arranged on the rotating shaft (322); two worm gear bearings (323) are fixedly arranged on the mounting arm (2); and the rotating shaft (322) is fixedly arranged in the inner ring of the worm gear bearing (323).

10. The substrate loading mechanism according to claim 1, characterized in that: The angle measuring part comprises a first rotation angle measuring part and / or a second rotation angle measuring part, the first rotation angle measuring part comprises a first pointer (51) and a first scale plate (5), one of the first scale plate (5) and the first pointer (51) is arranged on the mounting part, and the other is arranged on the substrate loading part; the second rotation angle measuring part comprises a second pointer (61) and a second scale plate (6), one of the second scale plate (6) and the second pointer (61) is arranged on the mounting part, and the other is arranged on the power input end of the first rotation transmission part (3), and the graduation value of the first scale plate (5) is N times the graduation value of the second scale plate (6).

11. The substrate loading mechanism according to claim 1, characterized in that: The device further includes a second rotation transmission part, which is disposed between the mounting part and the substrate loading part.

12. The substrate loading mechanism according to claim 11, characterized in that: The second rotation transmission part comprises an upper fine-tuning limit assembly (7) and a lower fine-tuning limit assembly (8), wherein the upper fine-tuning limit assembly (7) and the lower fine-tuning limit assembly (8) are fixedly arranged on the mounting part, the upper fine-tuning limit assembly (7) can push the substrate loading part to rotate counterclockwise, and the lower fine-tuning limit assembly (8) can push the substrate loading part to rotate clockwise, and the upper fine-tuning limit assembly (7) and the lower fine-tuning limit assembly (8) can cooperate to lock the substrate loading part.

13. The substrate loading mechanism according to claim 12, characterized in that: The upper fine-tuning limit assembly (7) comprises a first mounting plate (71), a first locking screw (72) and a first adjusting differential head (73); the first mounting plate (71) is arranged on the mounting portion; the first locking screw (72) is screwed to the first mounting plate (71); the first adjusting differential head (73) is fixedly arranged on the first mounting plate (71); the first locking screw (72) and the first adjusting differential head (73) can abut against the substrate loading portion; the lower fine-tuning limit assembly (8) comprises a second mounting plate (81), a second locking screw (82) and a second adjusting differential head (83); the second mounting plate (81) is arranged on the mounting portion; the second locking screw (82) is screwed to the second mounting plate (81); the second adjusting differential head (83) is fixedly arranged on the second mounting plate (81); the second locking screw (82) and the second adjusting differential head (83) can abut against the substrate loading portion.

14. The substrate loading mechanism according to claim 12, characterized in that: A first abutment member (41) and a second abutment member (42) are arranged at intervals on the substrate loading portion; the first abutment member (41) cooperates with the upper fine-tuning limit assembly (7), and the second abutment member (42) cooperates with the lower fine-tuning limit assembly (8).

15. The substrate loading mechanism according to claim 14, characterized in that: An arc-shaped groove (52) is provided on the mounting portion, the first abutment member (41) and the second abutment member (42) are located in the arc-shaped groove (52), a plurality of connection holes (53) are provided on both sides of the arc-shaped groove (52), and the upper fine-tuning limit assembly (7) and the lower fine-tuning limit assembly (8) are connected to the mounting portion via the connection holes (53).

16. A vacuum processing device, characterized in that It comprises a substrate loading mechanism as described in any one of claims 1-15.

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