Preparation method of anti-dazzle glass and anti-dazzle glass

Abstract

The invention discloses a preparation method of anti-dazzle glass, and belongs to the technical field of glass processing. According to the scheme, firstly, an anti-dazzle area is divided into a plurality of sub-areas with the same size, the same number of random points are generated in each sub-area, whether the positions of the random points are reasonable or not is judged according to the distances between the random points, and after the random points of the whole page are generated, the minimum pattern units are generated in the large format based on the random points. And zooming the minimum graph unit to obtain the photomask drawing. And finally, sequentially carrying out yellow light-etching on two photomask drawings with different minimum pattern unit layouts to obtain a microstructure with higher randomness in plane patterns and depth. According to the scheme, efficient drawing of the large-breadth, high-randomness and splicing-free photomask drawing is achieved, the finally-manufactured anti-dazzle structure has randomness on the plane figure and the three-dimensional layer, the anti-dazzle effect of a large-breadth glass product is improved, and the problem of poor appearance splicing caused by an array figure splicing method is solved.

Description

Technical Field

[0001] The invention relates to the technical field of glass processing, and in particular to an anti-glare glass preparation method and the anti-glare glass. Background Art

[0002] At present, the cover glass of most electronic products on the market is bright glass. When there is a point light source or a strong surface light source in the product use environment, the mirror reflection of the glass will cause glare on the product cover surface. This glare will not only greatly reduce the screen display effect, but also cause discomfort to people's eyes. In order to solve this problem, AG (Anti-Glare) glass came into being.

[0003] At present, anti-glare glass is mainly processed in the following two ways:

[0004] 1. Sandblasting and etching: These two methods use physical or chemical means to process pits or convex structures of varying sizes on the glass surface, causing the mirror glass that originally reflects light to diffusely reflect, thereby achieving an anti-glare effect. However, these methods cannot accurately control the consistency of parameters such as the size and depth of the pits. In actual use, this inconsistency will cause tiny flickering points to appear on the surface of the display, reducing display clarity and affecting the user experience.

[0005] 2. Yellow light plus chemical etching: In order to overcome the limitations of the above methods, a yellow light plus chemical etching anti-glare glass processing method has emerged. This method first needs to generate the mask drawing required by the exposure machine, then attach photoresist to the glass surface and use the generated mask drawing to transfer the pattern on the drawing to the glass surface in the form of exposure and development, and then etch the glass with the patterned photoresist. By adjusting the parameters, the structural surface of the glass surface presents a bowl-shaped structure, thereby achieving the desired AG effect. For the generation of mask drawings for large-area glass products such as tablets, handwriting tablets, and car screens, in order to avoid the performance bottleneck of the large-format random pattern generation process, the following two solutions are mainly used:

[0006] Solution 1: Grid lattice method: Confirm the periodic size and density of the structure by drawing a grid, add fluctuation values ​​to the grid structure points to get random points, so that the center of the figure has a certain degree of randomness, and then draw the required structural pattern one by one with the random points as the center, such as a circle, regular hexagon, Thiessen polygon or other patterns. The specific process is as follows Figure 1 As shown, Figure 1 The grid in the figure is a honeycomb grid structure. However, this method uses a regular array of grid points to determine the center point of the figure in a random fluctuation form, resulting in the overall consistency of the final pattern at the macro level, making the light and shadow reflection have a directionality consistent with the grid points, thereby reducing the diffuse reflection effect.

[0007] Solution 2: Array graphic stitching method: First draw a complete small-format vector drawing, trim the edge structure of the entire pattern, so that the overall pattern can be replicated by array, and expand the size of the drawing by array replication to obtain the required large-format structural drawing. The specific process is as follows: Figure 2 However, since this solution obtains a large-format drawing by splicing array drawings, there will be traces of the array on the appearance, and the splicing lines at the edge of the array can be seen visually, affecting the appearance.

[0008] In addition, the existing yellow light exposure plus chemical etching method usually only performs yellow light exposure and chemical etching once, and the pattern is exposed with uniform energy during exposure, and the structural depth is consistent, so the depth of the final surface formed during etching is also consistent. The bowl-shaped structure requires multiple parameter adjustments to form, and the overall AG effect is limited by the consistency of depth, and a clear rainbow ring print will appear under the light source.

[0009] In summary, although the anti-glare glass in the prior art can reduce glare to a certain extent, it still has many shortcomings due to the limitation of processing technology. Therefore, a new anti-glare glass processing method is urgently needed to overcome the above defects and improve display quality and user experience. Summary of the invention

[0010] The technical problem to be solved by the present invention is: in view of the above-mentioned defects of the prior art, a method for preparing anti-glare glass is provided.

[0011] To achieve the above object, the present invention provides a method for preparing anti-glare glass, the method comprising the following steps:

[0012] Step S1, determining the exposure machine mask layout parameters according to the anti-glare requirements and the anti-glare area size, and generating a first mask drawing and a second mask drawing according to the mask layout parameters; the layout of the minimum graphic unit in the first mask drawing and the second mask drawing is different;

[0013] The mask layout parameters include the opening shape of the minimum graphic unit, the average period of the minimum graphic unit, the number of minimum graphic units, and the minimum spacing between the center points of adjacent minimum graphic units;

[0014] The method for generating the first mask drawing sheet and the second mask drawing sheet comprises the following steps:

[0015] Step S11, dividing the anti-glare area into a plurality of sub-areas of equal size in a grid form, evenly distributing the number of the minimum graphic units to all the sub-areas, generating random coordinate points in each of the sub-areas according to the mask layout parameters, wherein the Euclidean distance between the newly generated random points and other random points is greater than the minimum spacing between the center points of the adjacent minimum graphic units; eliminating random points in the connecting areas of adjacent sub-areas that do not meet the minimum spacing between the center points of the adjacent minimum graphic units; and summarizing the coordinates of the random coordinate points in all the sub-areas to form a random dot matrix;

[0016] Step S12, generating a minimum graphic unit according to the random dot matrix, and scaling the minimum graphic unit according to etching requirements to obtain the vertex coordinates of the scaled minimum graphic unit; generating a vector drawing according to the vertex coordinates of the minimum graphic unit;

[0017] Step S2, coating a photoresist on the processed surface of the glass, exposing the photoresist using the first mask drawing, and then developing and chemically etching to form an anti-glare microstructure on the processed surface;

[0018] Step S3, coating the processed surface of the glass with photoresist again, exposing the photoresist using the second mask drawing, and then developing and chemically etching to change the anti-glare microstructure of the processed surface.

[0019] In the method for preparing the anti-glare glass of the present invention, the step S12 further includes:

[0020] Step S13, importing the vector drawing into an exposure machine, setting the interior of the smallest graphic unit as an exposure area, and obtaining a mask drawing that can be used by the exposure machine.

[0021] In the anti-glare glass preparation method of the present invention, the first mask drawing is a part of the second mask drawing. In step S12, some minimum graphic units are randomly selected from all the scaled minimum graphic units, and the first mask drawing is generated according to the vertex coordinates of the selected minimum graphic units, and the second mask drawing is generated according to the vertex coordinates of all the minimum graphic units.

[0022] In the anti-glare glass preparation method of the present invention, the first mask drawing and the second mask drawing are two independent mask drawings, and the generation processes of the two are completely independent. In step S12, vector drawings are generated according to the vertex coordinates of all the scaled minimum graphic units.

[0023] In the anti-glare glass preparation method of the present invention, in the step S11, the random coordinate points are generated in each of the sub-areas according to the mask layout parameters, and the Euclidean distance between the newly generated random points and other random points is greater than the minimum spacing between the center points of the adjacent minimum graphic units. The specific method is: traverse each separate sub-area in sequence, generate random point coordinates one by one through a random number generator, the value range of the random point coordinates is within the coordinate range of the current sub-area, and the generated random points only need to perform Euclidean distance judgment with the random points generated in the current area.

[0024] In the method for preparing the anti-glare glass of the present invention, the minimum graphic unit is a random polygon, and the specific method for generating the minimum graphic unit according to the random dot matrix is:

[0025] The random points in the random dot matrix are triangulated to obtain a set of vertex coordinates of all triangles after triangulation, and then a random polygon is generated according to the obtained set of vertex coordinates of the triangles.

[0026] In the method for preparing the anti-glare glass of the present invention, the specific method of step S2 is:

[0027] Step S21, cleaning the glass, applying protective oil on the non-processed surface of the glass, evenly coating positive photoresist on the processed surface of the glass, and pre-baking the photoresist;

[0028] Step S22, loading the first mask drawing into an exposure machine to expose the photoresist;

[0029] Step S23, placing the exposed glass in a developer for development;

[0030] Step S24, baking the developed glass to solidify the photoresist structure;

[0031] Step S25, placing the glass in a chemical etching solution for etching, and obtaining a desired surface shape by controlling etching conditions;

[0032] Step S26, cleaning the etched glass to remove the residual photoresist and etching solution.

[0033] In the method for preparing the anti-glare glass of the present invention, the specific method of step S3 is:

[0034] Step S31, evenly coating the photoresist on the processed surface of the glass again to ensure the flatness of the outer surface of the photoresist, and pre-baking the photoresist;

[0035] Step S32, loading the second mask drawing into an exposure machine to expose the photoresist;

[0036] Step S33, placing the exposed glass in a developer for development;

[0037] Step S34, baking the developed glass to solidify the photoresist structure;

[0038] Step S35, placing the glass in a chemical etching solution for etching, and obtaining a desired surface shape by controlling etching conditions;

[0039] Step S36, cleaning the etched glass to remove the residual photoresist, etching solution and protective oil.

[0040] The present invention also provides an anti-glare glass, which is prepared by the anti-glare glass preparation method as described above.

[0041] The present invention has the following beneficial effects: the scheme of the present invention first divides the entire anti-glare area into a plurality of sub-areas of the same size, generates the same number of random points in each sub-area, determines whether the position of the random points is reasonable based on the Euclidean distance between the random points, generates a full page of random points, and then generates the minimum graphic unit in a large format at one time based on each random point, and obtains the mask drawing after scaling the minimum graphic unit. Finally, two mask drawings with different minimum graphic unit layouts are sequentially photo-etched to obtain a microstructure with stronger randomness in both plane graphics and depth. The scheme of the present invention realizes the efficient drawing of large-format, high-random, and non-spliced ​​mask drawings, and the anti-glare structure finally obtained has randomness in both plane graphics and three-dimensional levels, which improves the anti-glare effect of large-format glass products and avoids the problem of poor appearance splicing caused by the array graphic splicing method. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0043] Figure 1 Schematic diagram of the steps to generate a large-format mask drawing for the grid lattice method.

[0044] Figure 2 Schematic diagram of the steps to generate a large-format mask drawing for the array pattern stitching method.

[0045] Figure 3 Schematic diagram of the steps of the method for preparing anti-glare glass according to an embodiment of the present invention.

[0046] Figure 4 A schematic diagram of the steps of generating a large-format mask drawing according to an embodiment of the present invention.

[0047] Figure 5 The figure is a schematic diagram of a process of generating random polygons according to random points in an embodiment of the present invention.

[0048] Figure 6 Schematic diagram of a yellow light-etching process of the honeycomb grid dot matrix method.

[0049] Figure 7 Schematic diagram of the secondary yellow light etching process according to an embodiment of the present invention.

[0050] Figure 8 This is the surface structure diagram obtained after the honeycomb grid dot matrix method is yellow light-etched.

[0051] Fig. 9 This is a surface structure diagram obtained after one yellow light-etching according to an embodiment of the present invention.

[0052] Fig.10 This is a surface structure diagram obtained after secondary yellow light-etching in an embodiment of the present invention. DETAILED DESCRIPTION

[0053] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0054] The embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings of the specification. It should be understood that the embodiments described herein are only used to illustrate and explain the present invention, and are not used to limit the present invention.

[0055] The anti-glare glass preparation method of the present invention is suitable for preparing anti-glare glass, and is particularly suitable for preparing large-area anti-glare glass such as tablet computers, handwriting tablets, and vehicle-mounted screens.

[0056] like Figure 3 As shown, an embodiment of the present invention provides a method for preparing anti-glare glass, the method comprising the following steps:

[0057] Step S1, determining the exposure machine mask layout parameters according to the anti-glare requirements and the anti-glare area size, and generating a first mask drawing and a second mask drawing according to the mask layout parameters; the layout of the minimum graphic unit in the first mask drawing and the second mask drawing is different;

[0058] The mask layout parameters include the opening shape of the minimum graphic unit, the average period of the minimum graphic unit, the average opening diameter of the minimum graphic unit, the average spacing between adjacent minimum graphic unit edges, the minimum number of graphic units, and the minimum spacing between adjacent minimum graphic unit center points.

[0059] In the embodiment of the present invention, the minimum spacing between the center points of adjacent minimum graphic units is smaller than the average period of the minimum graphic units.

[0060] The parameters related to the anti-glare requirements mainly include optical parameters such as haze, roughness, flash point value, and clarity. In practical applications, the opening shape of the minimum graphic unit, the average period of the minimum graphic unit, the average opening diameter of the minimum graphic unit, and the average spacing between the edges of adjacent minimum graphic units are determined according to the anti-glare requirements. The average period of the minimum graphic unit is equivalent to the average side length or diameter of the minimum graphic unit. In an embodiment of the present invention, the mask drawing includes a plurality of non-overlapping closed minimum graphic units, and the period fluctuation range of the minimum graphic unit is small. The opening shape of the minimum graphic unit can be circular, square, or polygonal. The fluctuation range of the minimum graphic unit area depends on the minimum spacing between the center points of adjacent minimum graphic units. The closer the minimum spacing between the center points of adjacent minimum graphic units is to the average period of the minimum graphic unit, the smaller the fluctuation range of the minimum graphic unit area, and vice versa.

[0061] The minimum number of graphic units can be determined based on the size of the anti-glare area and the minimum average period of the graphic unit. The minimum number of graphic units = anti-glare area / minimum average period of the graphic unit 2 The average period of the smallest graphic unit is usually in the range of 3um to 100um, and correspondingly, the average size of the smallest graphic unit is usually in the range of 10um. 2 ~10000um 2 For large-area glass products such as tablets, writing tablets, and car screens, the side length of the anti-glare area is usually between 200mm and 300mm, and the minimum number of graphic units is in the tens of millions.

[0062] The method for generating the first mask drawing sheet and the second mask drawing sheet comprises the following steps:

[0063] Step S11, dividing the anti-glare area into a plurality of sub-areas of equal size in a grid form, evenly distributing the number of the minimum graphic units to all the sub-areas, generating random coordinate points in each of the sub-areas according to the mask layout parameters, wherein the Euclidean distance between the newly generated random points and other random points is greater than the minimum spacing between the center points of adjacent minimum graphic units; eliminating random points in the connecting areas of adjacent sub-areas that do not meet the minimum spacing between the center points of adjacent minimum graphic units; and summarizing the coordinates of the random coordinate points in all the sub-areas to form a random dot matrix.

[0064] In the embodiments of the present invention, there is a random point in each minimum graphic unit. Therefore, the number of random points is also in the order of tens of millions. In practical applications, each random point is generated sequentially through a loop. For each random point, the coordinates of the random point are generated by a random number generator, and the generated random coordinates are controlled to be within the anti-glare area by controlling the numerical range of the random number. The newly generated random point coordinates need to be judged by the Euclidean distance from the saved random point coordinates. When the Euclidean distance between the newly generated random point and other random points is greater than the minimum distance between the centers of adjacent minimum graphic units, this newly generated random point can be added to the set of saved random points. Since the coordinates of each newly generated random point need to be judged by the distance from all the random point coordinates in the coordinate set, when the number of saved random point coordinates in the random point coordinate set reaches the order of tens of millions, each newly generated random point coordinate needs to be calculated and judged by the distance from the tens of millions of data volumes to determine whether it meets the conditions for being added to the random point set. The later the random number generation, the fewer positions where the random points can be placed, resulting in a non-linear slowdown trend in the generation speed of the random points. To optimize the generation speed of random points and compress the time for generating random points, in the embodiments of the present invention, the anti-glare area is cut into a plurality of equally sized sub-regions in a grid pattern, the number of minimum graphic units to be generated is evenly distributed to each sub-region, and then each individual sub-region is traversed in sequence to generate the required number of random point coordinates one by one. The value range of the generated random point coordinates needs to be synchronously modified to the X and Y axis ranges where the current sub-region is located. The set of random coordinates generated for each sub-region is stored separately in a list, and then for the splicing part between small regions, the random points that do not meet the minimum distance condition between the centers of adjacent minimum graphic units are processed. Finally, the coordinates of all random points are summarized to obtain a random dot matrix. When generating random points in this way, the random points generated within a small region only need to be judged by the Euclidean distance from the random points that have been generated in the current region, reducing the computational amount of the distance judgment for a large number of random points with too large distances and significantly accelerating the generation speed of random points.

[0065] During the random point generation process, for each new random point, it is necessary to judge whether its distance from other random points meets the requirements by calculating the Euclidean distance. Because the number of random points is huge, generating genuine random points has become a performance bottleneck. The random point generation time accounts for the vast majority of the vector drawing generation time. The limit of the anti-glare area supported by the conventional random point generation method is 50mm * 50mm. For a 50mm * 50mm anti-glare area, when the minimum graphic period is 30um, the vector graphic generation time exceeds 72 hours. While adopting the solution of this embodiment, for a 200mm * 300mm area with a minimum graphic period of 30um, the vector graphic generation time is 24 hours. In actual verification, the method of this embodiment has been used to achieve 100000mm 2Therefore, the solution of the embodiment of the present invention solves the performance bottleneck problem of generating large-format graphics in the whole page, and significantly improves the efficiency of generating large-format vector graphics.

[0066] like Figure 4 As shown, in the embodiment of the present invention, in order to improve the anti-glare effect and avoid the poor appearance caused by the array pattern stitching method, firstly, a full-page random point ( Figure 4 (a) Calculate the number of points required in the area according to the required design cycle, use the stacking algorithm to avoid gaps and prevent point overlap, so that there is enough cycle margin between points, and then expand the structural pattern ( Figure 4 (b)), so the pattern will not show grid periodicity, and a more disordered drawing can be obtained. In addition, the embodiment of the present invention separates the generation of graphics from the steps of random dot matrix when drawing large-format drawings. First, an algorithm is used to generate all random points in the entire required drawing area, and then the random dot matrix is ​​filled with patterns. Therefore, there is no need for graphic array splicing, and a completely random required pattern can be generated by calculation, which can avoid the poor appearance of splicing marks caused by the array graphic splicing method.

[0067] Step S12, generating a minimum graphic unit according to the random dot matrix, and scaling the minimum graphic unit according to etching requirements to obtain the vertex coordinates of the scaled minimum graphic unit; and generating a vector drawing according to the vertex coordinates of the minimum graphic unit.

[0068] In some embodiments of the present invention, the opening shape of the minimum graphic unit is a circle, and the specific method of generating the minimum graphic unit based on the random dot matrix and relevant parameters of the minimum graphic unit is: using a random point as the center of the opening of the minimum graphic unit to generate a circle of a specified diameter.

[0069] In some embodiments of the present invention, the opening shape of the minimum graphic unit is a connectable random polygon such as a Thiessen polygon, and the specific method of generating the minimum graphic unit according to the random dot matrix is:

[0070] Triangulate the random points in the random dot matrix to obtain the vertex coordinates of all triangles after triangulation, and then generate a random polygon based on the obtained vertex coordinates of the triangles. Figure 5 As shown, first perform a two-dimensional Delaunay triangulation on all random coordinate points, then find the center of the circumscribed circle of each triangle, and finally connect the centers of the circumscribed circles of adjacent triangles to form a random polygon with each triangle vertex as the center point, and return the vertex coordinates and coordinate indexes of all random polygons as well as the center point coordinates and indexes.

[0071] like Figure 4 (b) Figure 4 As shown in (c), after the minimum graphic unit is generated, the minimum graphic unit needs to be scaled to provide an operating space for subsequent chemical etching. In the embodiment of the present invention, the specific method of scaling the minimum graphic unit according to the etching needs is: traverse all the minimum graphic units generated in the above steps to obtain the vertex coordinates of each minimum graphic unit, add the X coordinates and Y coordinates of all vertices respectively, and then divide by the number of vertices to obtain the center coordinate point of each minimum graphic unit, and then create a direction vector with each vertex and the center point, and multiply the direction vector by the graphic scaling ratio to obtain the vertex coordinates after the vertex is scaled.

[0072] It should be noted that during the graphic design process, the scaling ratio of the minimum graphic unit or the shape of the minimum graphic unit can be adjusted according to the needs. Specifically, when a lower flash point value is required, the scaling ratio of all minimum graphic units can be set to a fixed value, or the minimum graphic unit of the polygonal structure can be changed to a circular structure with a fixed diameter size to reduce the size fluctuation of the minimum graphic unit and reduce the overall flash point value; when a better anti-glare effect is required, the graphic scaling ratio of the minimum graphic unit can be randomly controlled to increase the fluctuation range of the size of all minimum graphic units, so that the graphics have greater differences and randomness in the depth direction after etching, thereby enhancing the anti-glare effect of the product. The scaled minimum graphic unit still retains the vertex coordinate value of each unit in a matrix manner.

[0073] After subsequent development, the inside of the polygon is a non-photoresist area, and the outside of the polygon is a photoresist protection area, so the etching solution will start to etch the glass from the inside of the polygon. The scaling ratio of the graphics will directly affect the etching rate and the shape of the etched pits. In order to accurately control the shape of the final pit, the scaling ratio needs to be accurately controlled. In practical applications, the scaling ratio of the graphics can be gradient verified, with the standard that the groove surface after etching must be an arc-shaped bowl structure. It should also be noted that due to the limitation of the yellow light process accuracy, the minimum graphic unit size after scaling must be larger than the minimum processable size that can be processed by the yellow light.

[0074] After scaling the minimum graphic unit, only the vertex coordinates and center point coordinates of the minimum graphic unit are obtained, and the machine cannot directly read and process it. The vertex coordinate data can be converted into a vector graphic that can be processed by the machine through programming software. In an embodiment of the present invention, the vertex coordinates of all minimum graphic units are output to Excel, txt and other data formats through programming software, and then the vertex coordinates are imported into a vector drawing software with macro processing or scripting functions. Through the macro or script function, all minimum unit graphics are traversed, and all vertices of each minimum unit graphic are connected in turn to obtain a vector drawing.

[0075] Step S13, importing the vector drawing into an exposure machine, setting the interior of the smallest graphic unit as an exposure area, and obtaining a mask drawing that can be used by the exposure machine;

[0076] Step S2, coating a photoresist on the processed surface of the glass, exposing the photoresist using the first mask drawing, and then developing and chemically etching to form an anti-glare microstructure on the processed surface.

[0077] The specific method of step S2 is:

[0078] Step S21, clean the glass, apply protective oil on the non-processed surface of the glass, evenly apply positive photoresist on the processed surface of the glass, and pre-bake the photoresist. The processed surface refers to the surface that needs to be treated with anti-glare, and the non-processed surface refers to the surface that does not need to be treated with anti-glare. Specifically, the photoresist inside the tool head is squeezed to the glass surface by the coating air pressure, and the tool is slowly moved to evenly apply the photoresist to the glass surface. In the embodiment of the present invention, because the interior of the minimum graphic unit is set as the exposure area, the positive photoresist is coated.

[0079] In an embodiment of the present invention, a baking oven is used to pre-bake the photoresist to remove most of the solvent in the photoresist, so that the photoresist forms a solid film, the adhesion ability of the photoresist layer to the glass surface is increased, the solvent in the photoresist is reduced to 5-20%, and the thickness is reduced by 10-20%.

[0080] Step S22, loading the first mask drawing into an exposure machine to expose the photoresist. The exposure causes the photoresist to undergo chemical changes in its sensitivity to light, and the exposed photoresist has the ability to resist acid and alkali, thereby protecting the glass.

[0081] Step S23, the exposed glass is placed in a developer for development. The exposed portion of the positive photoresist can be removed by development. After development, the appearance of the processed glass surface is similar to Figure 4 (c), the photoresist inside the minimum graphic unit is removed, and the photoresist outside the minimum graphic unit is retained.

[0082] Step S24, baking the developed glass to solidify the photoresist structure. The high temperature baking further removes the solvent in the photoresist, reduces the solvent content to a minimum, further solidifies the photoresist, and increases the adhesion of the photoresist.

[0083] Step S25, the glass is placed in a chemical etching solution for etching, and the desired surface shape is obtained by controlling the etching conditions. After the etching is completed, a random pit microstructure appears on the processed surface of the glass.

[0084] In the embodiment of the present invention, the chemical etching liquid is a hydrofluoric acid solution. The etching time needs to be adjusted according to the thickness of the previous photoresist, and the speed of the etching reaction is controlled to achieve the desired bowl-shaped structure. Specifically, the opening shape of the minimum graphic unit, the average spacing of the minimum graphic unit, the average opening diameter of the minimum graphic unit, and the average period of the minimum graphic unit all need to be as close as possible to the range determined in step S1. During chemical etching, the etching liquid etches away the internal area of ​​the minimum graphic unit, forming a pit inside the minimum graphic unit and spreading outward, and finally Figure 4 As shown in (b), the edges of the random polygons are connected together, and each random polygon presents a bowl-shaped three-dimensional structure.

[0085] Step S26, cleaning the etched glass to remove the residual photoresist and etching solution.

[0086] Step S3, coating the processed surface of the glass with photoresist again, exposing the photoresist using the second mask drawing, and then developing and chemically etching to change the anti-glare microstructure of the processed surface.

[0087] The specific method of step S3 is:

[0088] Step S31, evenly coat the photoresist on the processed surface of the glass again to ensure the flatness of the outer surface of the photoresist, and pre-bake the photoresist. Specifically, the photoresist inside the cutter head is squeezed onto the glass surface by the coating air pressure, and the cutter is slowly moved to evenly coat the photoresist on the glass surface. The glass surface has an uneven structure due to the first yellow light-etching, so it is necessary to pay attention to the uniformity problem during coating to ensure the flatness of the photoresist.

[0089] Step S32, loading the second mask drawing into the exposure machine to expose the photoresist; if the photoresist in the pits cannot be exposed due to insufficient energy due to different depths, it is necessary to appropriately increase the exposure energy so that the exposure area is fully exposed.

[0090] Step S33, placing the exposed glass in a developer for development.

[0091] Step S34, baking the developed glass to solidify the photoresist structure.

[0092] Step S35, put the glass into a chemical etching solution for etching, and obtain the desired surface shape by controlling the etching conditions. Because the second etching is performed on the structure after the first yellow light-etching, after the second etching is completed, the processed surface of the glass presents a more random structure. The concentration of the etching solution and the etching time during the second etching are usually different from those of the first etching. The specific conditions of the two etchings need to be determined based on the difference between the first mask drawing and the second mask drawing and the expected surface characteristics.

[0093] Step S36, cleaning the etched glass to remove the residual photoresist, etching solution and protective oil.

[0094] In the embodiment of the present invention, the mask drawing used in the first yellow light exposure is different from the mask drawing used in the second yellow light exposure, so as to make the obtained anti-glare structure more random, thereby improving the anti-glare capability. In practical applications, the combination of the first mask drawing and the second mask drawing can be determined according to the specific goal of anti-glare and experimental results. By adjusting the drawings of the two exposures, the height variation density, depth, and size of the anti-glare pit structure finally generated can be dynamically adjusted.

[0095] In some embodiments of the present invention, the first mask drawing is a part of the second mask drawing. In step S12, some minimum graphic units are randomly selected from all the scaled minimum graphic units, and the first mask drawing is generated according to the vertex coordinates of the selected minimum graphic units, and the second mask drawing is generated according to the vertex coordinates of all the minimum graphic units. In this way, the first mask drawing and the second mask drawing form a combination of the local plus the whole. This combination can produce greater fluctuations in the depth direction and enhance the randomness of the pit height. And because the height value of the pit is very small, it will not cause flash point problems.

[0096] In some other embodiments of the present invention, the first mask drawing and the second mask drawing are two independent mask drawings, and the generation process of the two is completely independent. In step S12, the vector drawing is generated according to the vertex coordinates of all the scaled minimum graphic units. Because the entire random dot matrix is ​​newly generated each time, the mask drawings obtained by the two independent generation processes are quite different, and this combination method has stronger randomness on the plane.

[0097] It is understandable that the embodiment of the present invention performs two yellow light-etching processes, and in actual applications, more than two yellow light-etching processes may be performed as needed. The embodiment of the present invention does not limit the specific number of yellow light-etching processes.

[0098] Figure 6 This is a schematic diagram of the yellow light-etching process of the honeycomb grid dot matrix method. Because the random points are generated based on the honeycomb grid, even if random fluctuations are made, the spacing between adjacent minimum graphic units is not much different. Therefore, Figure 6 In (f), the size of the remaining photoresist after development does not differ much. Figure 7 FIG. 1 is a schematic diagram of the secondary yellow light etching process according to an embodiment of the present invention. As the spacing between the minimum graphic units is random, Figure 7 As shown in (f), during the first yellow light-etching process, the size of the photoresist layer obtained after development is uneven, such as Figure 7As shown in (m), during the second yellow light-etching process, the size uniformity of the photoresist layer obtained after development is improved.

[0099] Figure 8 This is the surface structure diagram obtained after yellow light etching using the honeycomb grid dot matrix method. The depth differences of the pits are not much different. Fig. 9 The surface structure diagram obtained after one yellow light-etching of the embodiment of the present invention, the randomness of each pit in the depth direction is Figure 8 The stronger of Fig.10 This is the surface structure diagram obtained after two yellow light etchings of the embodiment of the present invention. The mask drawing used for the two yellow light etchings is a combination of local and overall. Therefore, the randomness of each pit in the depth direction is significantly enhanced compared to that after one etching. By comparison, it is found that the surface structure of the embodiment of the present invention has greater randomness in both the plane figure and the three-dimensional level, which is specifically reflected in the greater randomness in the size and position of the random polygons and the depth of the pits. Therefore, the anti-glare effect is better and can effectively reduce the appearance defects such as rainbow ring printing.

[0100] The anti-glare processing process of the embodiment of the present invention is described in detail below with reference to a specific embodiment.

[0101] In this embodiment, the expected AG optical performance parameters are as follows: haze 30, roughness 0.13-0.17, flash point value less than 5; AG format size 200mm*300mm. The specific steps are as follows:

[0102] (1) The drawing parameters determined according to the above optical performance requirements are as follows: the opening shape of the smallest graphic unit is a random polygon, the average period is 30um, the average opening diameter of the polygon is 10um, the average spacing between polygon edges is 20um, the number of random polygons is approximately 66666667 (size area / area of ​​a single polygon, 300*200 / 0.032), the minimum point spacing between polygon center points is 26um, and the expected polygon diameter fluctuation range is 26um-34um.

[0103] (2) The 200mm*300mm area is divided into 2400 5*5mm blocks according to the grid, and then the 66666667 random polygons are divided into 2400 blocks, that is, the number of random points generated by a single block is 27778. After the required random points are generated in sequence, the edge areas where the blocks connect to each other are optimized, and the points that do not meet the minimum point spacing are eliminated. Then all the random points are aggregated to complete the drawing of random coordinate points of the entire size.

[0104] (3) First, perform a two-dimensional Delaunay triangulation on the random points to obtain the vertex coordinates of all triangles after triangulation, and then generate random polygons based on the obtained vertex coordinates of all triangles. Traverse all random polygons in turn, calculate the corresponding polygon center point for each polygon, and then calculate the vertex coordinates of the scaled random polygon based on the polygon center point and vertex coordinates and the 1:3 ratio of the polygon opening (10um) to the polygon period (30um), and then export the vertex coordinates of the scaled polygon in text format to vector drawing software to generate vector graphics.

[0105] (4) The entire random polygon drawing is used as the drawing for the second yellow light; 80% of the random polygons in the entire random polygon drawing are randomly removed to use as the drawing for the first yellow light.

[0106] (5) After the vector file is imported into the processing machine, the interior of the closed polygonal structure is set as the exposure area to obtain a processing drawing that can be used by the machine.

[0107] (6) Use a CNC machine to cut the glass substrate into the required size, and then perform a vertical polishing on the cut glass to increase the strength of the glass edge. Remove the protective oil during transportation, hot press molding, and polishing, and then spray the non-etched surface with acid-resistant protective oil. The composition of the acid-resistant protective oil is: 40-70% resin, 20-50% filler, 10-20% diluent, and 1-10% additive. Then use ultrasonic water to wash the glass, and remove the oil, dirt, and stubborn foreign matter on the glass surface under ultrasonic vibration with alkaline solution, and then wash and soak it with water, and slowly pull it to make the glass surface cleaner.

[0108] (7) The photoresist inside the tool head is squeezed out onto the glass surface by the coating air pressure, and the tool is slowly moved to evenly coat the photoresist onto the glass surface. In this embodiment, the photoresist coating thickness of one yellow light-etching is 1 um.

[0109] (8) Use an oven to pre-bake the coated glass to reduce the solvent in the photoresist to 5-20% and the thickness to 10-20%.

[0110] (9) Use an exposure machine and the selected first yellow light drawing to expose the photoresist. In this embodiment, according to the 30um graphic design cycle, the exposure energy is 300mj.

[0111] (10) Place the exposed glass in a developer for development at a time of 2 m / min;

[0112] (11) The developed glass is baked to shrink and solidify the structure. In this embodiment, the photoresist curing baking time is 180 degrees Celsius for 30 minutes.

[0113] (12) The baked glass is placed in an etching solution for etching, wherein the etching solution is a hydrofluoric acid solution. In this embodiment, in a yellow light-etching process, the ratio of the etching solution to water is 1:10, and the etching time is 5 minutes.

[0114] (13) Cleaning the etched glass to remove residual photoresist and etching solution;

[0115] (14) Re-coat the glass with photoresist. In this embodiment, the thickness of the second coating is 3um. 3um specifically refers to the photoresist thickness of the unetched area in the first yellow light-etching. The etched area needs to be as flush as possible with the unetched area.

[0116] (15) Pre-baking the glass to reduce the solvent in the photoresist to 5-20% and the thickness to 10-20%;

[0117] (16) Use an exposure machine and the selected second yellow light drawing to expose the photoresist. In this embodiment, according to the 30um graphic design cycle, the exposure energy is 300mj.

[0118] (17) The exposed glass is placed in a developer for development. In this embodiment, the development time is 2 m / min.

[0119] (18) The developed glass is baked to shrink and solidify the structure. In this embodiment, the photoresist curing baking time is 30 minutes at 180 degrees Celsius.

[0120] (19) The baked glass is placed in an etching solution for etching. The etching solution is composed of a hydrofluoric acid solution. In this embodiment, in the secondary yellow light-etching process, the ratio of the etching solution to water is 1:15, and the etching time is 12 minutes.

[0121] (20) Cleaning: Clean the etched glass to remove residual photoresist, etching solution and protective oil.

[0122] (21) Strengthening: The cleaned glass is placed in a furnace for preheating, and then transferred to a molten salt furnace for strengthening. The strengthened glass is allowed to stand and drip salt, and then naturally cooled to room temperature; then it is soaked in pure water and dried to complete the strengthening.

[0123] Ten pieces of glass were randomly selected from the prepared glass for testing. The average glossiness was 19.7, the average haze was 30.4, the average flash point was 3.419, the average clarity was 27.889, the average diffuse reflection was 34.480, and the average roughness was 0.149, achieving the expected design goals.

[0124] The embodiment of the present invention further provides an anti-glare glass, which is prepared by the anti-glare glass preparation method as described above.

[0125] The above are only specific implementations of the present invention, which cannot be used to limit the scope of the present invention. Equivalent changes made by ordinary technicians in this technical field based on this creation, as well as changes known to technicians in this field, should still fall within the scope of the present invention.

Claims

1. A method for preparing anti-glare glass, characterized in that: The method comprises the following steps: Step S1, determining the exposure machine mask layout parameters according to the anti-glare requirements and the anti-glare area size, and generating a first mask drawing and a second mask drawing according to the mask layout parameters; the layout of the minimum graphic unit in the first mask drawing and the second mask drawing is different; The mask layout parameters include the opening shape of the minimum graphic unit, the average period of the minimum graphic unit, the number of minimum graphic units, and the minimum spacing between the center points of adjacent minimum graphic units; The method for generating the first mask drawing sheet and the second mask drawing sheet comprises the following steps: Step S11, dividing the anti-glare area into a plurality of sub-areas of equal size in a grid form, evenly distributing the number of the minimum graphic units to all the sub-areas, generating random coordinate points in each of the sub-areas according to the mask layout parameters, wherein the Euclidean distance between the newly generated random points and other random points is greater than the minimum spacing between the center points of the adjacent minimum graphic units; eliminating random points in the connecting areas of adjacent sub-areas that do not meet the minimum spacing between the center points of the adjacent minimum graphic units; and summarizing the coordinates of the random coordinate points in all the sub-areas to form a random dot matrix; Step S12, generating a minimum graphic unit according to the random dot matrix, and scaling the minimum graphic unit according to etching requirements to obtain the vertex coordinates of the scaled minimum graphic unit; generating a vector drawing according to the vertex coordinates of the minimum graphic unit; Step S2, coating a photoresist on the processed surface of the glass, exposing the photoresist using the first mask drawing, and then developing and chemically etching to form an anti-glare microstructure on the processed surface; Step S3, coating the processed surface of the glass with photoresist again, exposing the photoresist using the second mask drawing, and then developing and chemically etching to change the anti-glare microstructure of the processed surface.

2. The method for preparing anti-glare glass according to claim 1, characterized in that: After step S12, the following steps are also included: Step S13, importing the vector drawing into an exposure machine, setting the interior of the smallest graphic unit as an exposure area, and obtaining a mask drawing that can be used by the exposure machine.

3. The method for preparing anti-glare glass according to claim 1, characterized in that: The first mask drawing is a part of the second mask drawing. In step S12, some minimum graphic units are randomly selected from all the scaled minimum graphic units, and the first mask drawing is generated according to the vertex coordinates of the selected minimum graphic units, and the second mask drawing is generated according to the vertex coordinates of all the minimum graphic units.

4. The method for preparing anti-glare glass according to claim 1, characterized in that: The first mask drawing sheet and the second mask drawing sheet are two independent mask drawings, and the generation processes of the two drawings are completely independent. In step S12, vector drawings are generated according to the vertex coordinates of all the scaled minimum graphic units.

5. The method for preparing anti-glare glass according to claim 1, characterized in that: In the step S11, the random coordinate points are generated in each of the sub-areas according to the mask layout parameters, and the Euclidean distance between the newly generated random points and other random points is greater than the minimum spacing between the center points of the adjacent minimum graphic units. The specific method is: traverse each separate sub-area in sequence, generate random point coordinates one by one through a random number generator, the value range of the random point coordinates is within the coordinate range of the current sub-area, and the generated random points only need to perform Euclidean distance judgment with the random points generated in the current area.

6. The method for preparing anti-glare glass according to claim 1, characterized in that: The minimum graphic unit is a random polygon, and the specific method of generating the minimum graphic unit according to the random dot matrix is: The random points in the random dot matrix are triangulated to obtain a set of vertex coordinates of all triangles after triangulation, and then a random polygon is generated according to the obtained set of vertex coordinates of the triangles.

7. The method for preparing anti-glare glass according to claim 1, characterized in that: The specific method of step S2 is: Step S21, cleaning the glass, applying protective oil on the non-processed surface of the glass, evenly coating positive photoresist on the processed surface of the glass, and pre-baking the photoresist; Step S22, loading the first mask drawing into an exposure machine to expose the photoresist; Step S23, placing the exposed glass in a developer for development; Step S24, baking the developed glass to solidify the photoresist structure; Step S25, placing the glass in a chemical etching solution for etching, and obtaining a desired surface shape by controlling etching conditions; Step S26, cleaning the etched glass to remove the residual photoresist and etching solution.

8. The method for preparing anti-glare glass according to claim 7, characterized in that: The specific method of step S3 is: Step S31, evenly coating the photoresist on the processed surface of the glass again to ensure the flatness of the outer surface of the photoresist, and pre-baking the photoresist; Step S32, loading the second mask drawing into an exposure machine to expose the photoresist; Step S33, placing the exposed glass in a developer for development; Step S34, baking the developed glass to solidify the photoresist structure; Step S35, placing the glass in a chemical etching solution for etching, and obtaining a desired surface shape by controlling etching conditions; Step S36, cleaning the etched glass to remove the residual photoresist, etching solution and protective oil. 9.An anti-glare glass, characterized in that: The anti-glare glass is prepared by the method for preparing the anti-glare glass according to any one of claims 1 to 9.

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