RPS source detection table

Abstract

An RPS source detection bench disclosed by the present invention comprises a main body mechanism, a vacuum system mechanism, an atmosphere access mechanism and a water circulation mechanism, the main body mechanism comprises a rack, the top of the rack is provided with an RPS source interface, the vacuum system mechanism is installed in the rack, and the atmosphere access mechanism is installed in the rack. The vacuum system mechanism is used for generating a high vacuum environment and feeding back vacuum detection data; according to the RPS source detection table, the vacuum system mechanism, the atmosphere access mechanism and the water circulation mechanism are integrated through the rack, the vacuum system mechanism is used for pre-vacuumizing through the vacuum pump, the vacuum degree is further improved through the molecular pump, the vacuum level is controlled through the pressure control valve and the pre-vacuumizing valve, the atmosphere access mechanism accurately controls the gas environment, and the water circulation efficiency is improved. The water circulation mechanism adjusts the flow of a water cooling bin through a ball valve, overheating is prevented, an industrial personal computer in the electric soft control mechanism achieves system automatic control, and therefore the control precision of the vacuum environment and the environmental adaptability of the experiment are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of RPS source plasma detection, and in particular to an RPS source detection platform. Background Art

[0002] RPS plasma source is widely used in many high-precision process fields, such as surface treatment, material modification and thin film deposition. In the field of surface treatment, it is used to change the surface properties of materials to give them specific adhesion, hydrophobicity or antioxidant properties; in material modification, it can inject specific elements or chemical groups into the material to improve the physical and chemical properties of the material. In addition, RPS plasma source plays an important role in thin film deposition processes such as semiconductors and photovoltaics, and can ensure the uniformity and density of the film layer, thereby meeting the process requirements of high-tech industries.

[0003] With the widespread application of RPS plasma sources in various fields, users have an increasing demand for monitoring their working status and performance evaluation. Since the generation of plasma jets involves high-energy electric fields, gas flow and ion release, the use of RPS sources will be accompanied by problems such as aging of equipment components and performance degradation, which can easily affect the uniformity and stability of its plasma. Therefore, users need a highly reliable device that can monitor the performance of RPS plasma sources in real time. Summary of the invention

[0004] The object of the present invention is to provide a RPS source detection station to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an RPS source detection platform, comprising a main body mechanism, a vacuum system mechanism, an atmosphere access mechanism and a water circulation mechanism, the main body mechanism comprising a frame and an RPS source interface arranged on the top of the frame, the vacuum system mechanism, the atmosphere access mechanism and the water circulation mechanism are respectively installed on the frame, the main body mechanism, the vacuum system mechanism, the atmosphere access mechanism and the water circulation mechanism constitute a complete RPS source detection platform.

[0006] Preferably, the vacuum system mechanism includes a vacuum pump and a molecular pump, the inlet of the molecular pump is connected to the vacuum chamber through a plug valve, the outlet of the molecular pump is installed with a fore-stage valve, a pressure-controlled valve is installed at the bottom of the vacuum chamber, the inlet of the vacuum pump is connected to a pre-pumping valve and a fore-stage valve, and the inlet of the pre-pumping valve is connected to the pressure-controlled valve.

[0007] Preferably, the atmosphere access mechanism comprises two solenoid valves, the outlets of the solenoid valves are provided with reserved atmosphere access pipes, the inlets of the solenoid valves are connected with flow meters, and the inlets of the flow meters are provided with reserved atmosphere access pipes.

[0008] Preferably, the water circulation mechanism comprises a water cooling chamber, the water cooling chamber covers the vacuum chamber, the water cooling chamber is connected to two second tube bodies, and the other end of each of the second tube bodies is connected to the diverter block.

[0009] Preferably, an electrical soft control mechanism is installed inside the rack, and the electrical soft control mechanism includes an industrial computer and a compressed air control system. The industrial computer is installed on one side of the rack, and the compressed air control system is installed on an inner wall of one side of the rack.

[0010] Preferably, the compressed air control system is electrically connected to the gate valve, the front-stage valve and the pre-pumping valve respectively, and the industrial computer is electrically connected to the compressed air control system.

[0011] Preferably, a film gauge and a vacuum gauge are respectively installed on the vacuum chamber.

[0012] Preferably, the electrical soft control mechanism further includes an electrical control box, and the electrical control box is installed inside the frame.

[0013] Preferably, walking wheels are installed at the bottom of the frame.

[0014] Preferably, the ball valve is installed at the bottom of the frame, and one end of the ball valve is connected to the diverter block.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows: the RPS source detection station provided by the present invention integrates a vacuum system mechanism, an atmosphere access mechanism and a water circulation mechanism through a frame; the vacuum system mechanism is used for pre-vacuuming through a vacuum pump, a molecular pump further improves the vacuum degree, a pressure control valve and a pre-vacuuming valve control the vacuum level, the atmosphere access mechanism accurately controls the gas environment, the water circulation mechanism uses a ball valve to adjust the flow of the water cooling bin to prevent overheating, and the industrial computer in the electrical soft control mechanism realizes automatic system control, thereby improving the control accuracy of the vacuum environment and the environmental adaptability of the experiment, simplifying the operation, and enhancing the safety and reliability of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 A schematic diagram of the structure of an RPS source detection station according to an embodiment of the present invention;

[0017] Figure 2 It is a structural schematic diagram of the main mechanism in the RPS source detection station of an embodiment of the present invention;

[0018] Figure 3 It is a structural schematic diagram of the vacuum system mechanism in the RPS source detection station of an embodiment of the present invention;

[0019] Figure 4 It is a structural schematic diagram of the electrical soft control mechanism in the RPS source detection station according to an embodiment of the present invention;

[0020] Figure 5 It is a structural schematic diagram of the atmosphere access mechanism in the RPS source detection station according to an embodiment of the present invention;

[0021] Figure 6 It is a structural schematic diagram of the water circulation mechanism in the RPS source detection station according to an embodiment of the present invention.

[0022] In the figure:

[0023] 1. Main body; 11. Frame; 12. Electrical installation compartment; 13. Cover plate; 14. RPS source interface; 15. Travel wheels;

[0024] 2. Vacuum system mechanism; 21. Molecular pump; 22. Vacuum pump; 23. Thin film gauge; 24. Vacuum gauge; 25. Gate valve; 26. Pressure control valve; 27. Fore valve; 28. Pre-evacuation valve; 29. ​​Vacuum chamber;

[0025] 3. Electrical soft control mechanism; 31. Industrial computer; 32. Electric control box; 33. Compressed air control system;

[0026] 4. Atmosphere access mechanism; 41. Flow meter; 42. Solenoid valve; 43. Atmosphere access pipe;

[0027] 5. Water circulation mechanism; 51. Ball valve; 52. Diverter block; 53. Water cooling chamber; 54. Second pipe body. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] See also Figure 1-Figure 4 An embodiment of the present invention provides a RPS source detection platform, including: a main body mechanism 1, a vacuum system mechanism 2, an atmosphere access mechanism 4 and a water circulation mechanism 5.

[0030] Among them, the main mechanism 1 includes a frame 11, a RPS source interface 14 is provided on the top of the frame 11, cover plates 13 are installed on both sides of the frame 11, an electrical installation compartment 12 is installed on the front surface of the frame 11, and the vacuum system mechanism 2 is installed on the top of the frame 11.

[0031] In this embodiment, Figure 1-Figure 4As shown, the vacuum system mechanism 2 includes a vacuum pump 22 and a molecular pump 21. The inlet of the molecular pump 21 is connected to a vacuum chamber 29 through a plug valve 25. A fore-stage valve 27 is installed at the outlet of the molecular pump 21. A pressure-controlled valve 26 is installed at the bottom of the vacuum chamber 29. The inlet of the vacuum pump 22 is connected to a pre-pumping valve 28 and the fore-stage valve 27. Both ends of the pre-pumping valve 28 are connected to the vacuum pump 22 and the pressure-controlled valve 26, respectively.

[0032] Specifically, the vacuum pump 22 in the vacuum system mechanism 2 is used for primary vacuuming to form a pre-vacuum environment, while the molecular pump 21 is used to further increase the vacuum degree to meet the high vacuum requirements. The molecular pump 21 is connected to the vacuum chamber 29 through the plug valve 25, and the front valve 27 is connected to the outlet of the molecular pump 21 to maintain vacuum stability. The pressure control valve 26 is installed at the bottom of the vacuum chamber 29 to control the pressure to maintain an appropriate vacuum level. The pre-vacuum valve 28 ensures the connection with the vacuum pump 22 and the pressure control valve 26 during the pre-vacuuming process.

[0033] Furthermore, a film gauge 23 and a vacuum meter 24 are respectively installed on the vacuum chamber 29. The vacuum meter 24 is used to monitor the vacuum degree in the vacuum chamber 29 in real time, and the film gauge 23 is used for high vacuum detection.

[0034] In this embodiment, Figure 1-Figure 5 As shown, the atmosphere access mechanism 4 is installed inside the frame 11, and the atmosphere access mechanism 4 includes two solenoid valves 42, the outlet of the solenoid valve 42 is reserved for an atmosphere access pipe, the inlet of the solenoid valve 42 is connected to a flow meter 41, and the inlet of the flow meter 41 is connected to an atmosphere access pipe 43.

[0035] Specifically, it is installed inside the frame 11 and consists of two solenoid valves 42 and a flow meter 41. The solenoid valve 42 is used for switching the atmosphere on and off, and the flow meter 41 controls the gas flow to ensure a suitable atmosphere environment.

[0036] In this embodiment, Figure 1-Figure 6 As shown, the water circulation mechanism 5 is installed at the bottom of the frame 11, and the water circulation mechanism 5 includes two ball valves 51 and a water cooling chamber 53. The water cooling chamber 53 covers the vacuum chamber 29. The ball valve 51 is installed at the bottom of the frame 11. Each ball valve 51 is installed with a diverter block 52. The diverter block 52 is connected to a second pipe body 54, and one end of the two second pipe bodies 54 are connected to the water cooling chamber 53.

[0037] Specifically, the water circulation mechanism 5 controls the on and off of the water flow through a ball valve 51 installed at the bottom of the frame 11. Each ball valve 51 is connected to a diverter block 52. Two second tubes 54 on the diverter block 52 introduce cooling water into the water cooling bin 53, thereby effectively cooling the vacuum bin 29, and discharging water through the other two second tubes 54 to prevent the vacuum bin 29 from overheating.

[0038] In this embodiment, Figure 1-Figure 4 As shown, an electrical soft control mechanism 3 is installed inside the rack 11, and the electrical soft control mechanism 3 includes an industrial computer 31 and a compressed air control system 33. The industrial computer 31 is installed on one side of the rack 11, and the compressed air control system 33 is installed on an inner wall of one side of the rack 11. The compressed air control system 33 is electrically connected to the gate valve 25, the front stage valve 27 and the pre-pumping valve 28 respectively, and the industrial computer 31 is electrically connected to the compressed air control system 33.

[0039] Furthermore, the electrical soft control mechanism 3 also includes an electrical control box 32, which is installed inside the frame 11. The electrical soft control mechanism 3 includes an industrial computer 31 and a compressed air control system 33, which are used to control the electrical operations of the vacuum pump 22, the plug valve 25, the front valve 27, the pre-pumping valve 28, the pressure control valve 26 and the molecular pump 21. Precise control is achieved through the instructions of the industrial computer 31 to complete the automation and stable operation of the vacuum system. The electrical control box 32 can provide stable power distribution and circuit protection for the equipment.

[0040] like Figure 1 As shown, a running wheel 15 is installed at the bottom of the frame 11. By installing the running wheel 15 at the bottom of the frame 11, it is convenient to manually push the main body mechanism 1 to move.

[0041] According to the above technical scheme, the working steps of this scheme are summarized and sorted out: in the RPS source detection station provided by the present invention, the main mechanism 1 integrates the vacuum system mechanism 2, the atmosphere access mechanism 4 and the water circulation mechanism 5 through its frame 11, and the vacuum system mechanism 2 mainly includes a vacuum pump 22 and a molecular pump 21. The vacuum pump 22 is used for primary exhaust to form a pre-vacuum environment, and the molecular pump 21 is used to further improve the vacuum degree to meet the high vacuum requirements. The molecular pump 21 is connected to the vacuum chamber 29 through the plug valve 25, and the front valve 27 is connected to the outlet of the molecular pump 21 to maintain vacuum stability. The pressure control valve 26 is installed at the bottom of the vacuum chamber 29 to control the pressure to maintain an appropriate vacuum level. The pre-exhaust valve 28 ensures the connection with the vacuum pump 22 and the pressure control valve 26 during the pre-exhaust process.

[0042] The atmosphere access mechanism 4 is installed inside the frame 11, and is composed of two solenoid valves 42 and a flow meter 41. The solenoid valve 42 is used for atmosphere switching, and the flow meter 41 controls the gas flow to ensure a suitable atmosphere environment. The water circulation mechanism 5 controls the inlet and outlet water flow of the water cooling chamber 53 through the ball valve 51 to ensure that the vacuum system mechanism 2 and the vacuum chamber 29 will not overheat. The electrical soft control mechanism 3 includes an industrial computer 31 and a compressed air control system 33, which are used to control the electrical operation of the vacuum pump 22, the plug valve 25, the front stage valve 27, the pre-pumping valve 28, the pressure control valve 26 and the molecular pump 21, and realize precise control through the instructions of the industrial computer 31 to complete the automation and stable operation of the vacuum system.

[0043] Parts not involved in the present invention are the same as the prior art or can be implemented by the prior art. Although the embodiments of the present invention have been shown and described, it is understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A RPS source detection station, comprising a main body (1), characterized in that: The main body mechanism (1) comprises a frame (11) and an RPS source interface (14) arranged on the top of the frame (11); a vacuum system mechanism (2), an atmosphere access mechanism (4) and a water circulation mechanism (5) are respectively installed on the frame (11); the main body mechanism (1), the vacuum system mechanism (2), the atmosphere access mechanism (4) and the water circulation mechanism (5) constitute an RPS source detection platform.

2. The RPS source detection station according to claim 1, characterized in that: The vacuum system mechanism (2) comprises a vacuum pump (22) and a molecular pump (21); the inlet of the molecular pump (21) is connected to a vacuum chamber (29) via a plug valve (25); the outlet of the molecular pump (21) is provided with a fore-stage valve (27); the bottom of the vacuum chamber (29) is provided with a pressure-controlled valve (26); the inlet of the vacuum pump (22) is connected to the fore-stage valve (27) and a pre-pumping valve (28); and the inlet of the pre-pumping valve (28) is connected to the pressure-controlled valve (26).

3. The RPS source detection station according to claim 1, characterized in that: The atmosphere access mechanism (4) comprises two solenoid valves (42), the outlets of the solenoid valves (42) are provided with reserved atmosphere access pipes, the inlets of the solenoid valves (42) are connected with flow meters (41), and the inlets of the flow meters (41) are provided with reserved atmosphere access pipes (43).

4. The RPS source detection station according to claim 2, characterized in that: The water circulation mechanism (5) comprises a water cooling chamber (53), the water cooling chamber (53) covers the vacuum chamber (29), and the water cooling chamber (53) is connected to two second tubes (54), and the other end of each second tube (54) is connected to the diverter block (52).

5. The RPS source detection station according to claim 2, characterized in that: An electrical soft control mechanism (3) is installed inside the frame (11), and the electrical soft control mechanism (3) comprises an industrial computer (31) and a compressed air control system (33). The industrial computer (31) is installed on one side of the frame (11), and the compressed air control system (33) is installed on an inner wall of one side of the frame (11).

6. The RPS source detection station according to claim 5, characterized in that: The compressed air control system (33) is electrically connected to the vacuum pump (22), the gate valve (25), the front valve (27), the pressure control valve (26) and the molecular pump (21), respectively, and the industrial computer (31) is electrically connected to the compressed air control system (33).

7. The RPS source detection station according to claim 2, characterized in that: The vacuum chamber (29) is respectively equipped with a film gauge (23) and a vacuum gauge (24).

8. The RPS source detection station according to claim 5, characterized in that: The electrical soft control mechanism (3) also includes an electrical control box (32), and the electrical control box (32) is installed inside the frame (11).

9. The RPS source detection station according to claim 1, characterized in that: Travel wheels (15) are installed at the bottom of the frame (11).

10. The RPS source detection station according to claim 1, characterized in that: The ball valve (51) is installed at the bottom of the frame (11), and one end of the ball valve (51) is connected to the diverter block (52).

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