Inductively coupled plasma processing apparatus

Abstract

The application relates to an inductively coupled plasma processing device and relates to the technical field of semiconductor processing. The inductively coupled plasma processing device comprises a processing machine body, a base and a spraying mechanism. The spraying mechanism comprises a gas conveying pipe, a plurality of branch pipes and a plurality of spraying heads. A dispersion mechanism is further arranged on the gas conveying pipe. The dispersion mechanism comprises a dispersion box and a blending assembly. A plurality of dispersion cavities are arranged in the dispersion box. The dispersion cavities correspond to the branch pipes. One end of the gas conveying pipe is in communication with each dispersion cavity. Each dispersion cavity is in communication with one end of the corresponding branch pipe. The blending assembly is arranged in each dispersion cavity. Each blending assembly is used for conveying the gas in the corresponding dispersion cavity into another adjacent dispersion cavity with smaller gas pressure. The application has the effect of reducing the probability that the flow difference between the spraying heads is too large.

Description

Technical Field

[0001] This application relates to the field of semiconductor processing technology, and in particular to an inductively coupled plasma processing apparatus. Background Technology

[0002] With the continuous development of the social economy and the increasing level of science and technology, my country's semiconductor processing industry is also booming. Inductively coupled plasma processing equipment, as a device that performs various processes such as film deposition and etching on semiconductor wafers, is widely used in semiconductor device manufacturing and plays an important role in the semiconductor processing industry.

[0003] An inductively coupled plasma processing device exists in the prior art, comprising a processing body and a base. The bottom of the base extends upward into the cavity of the processing body, and a substrate is placed on the top of the base. A spray mechanism is also provided on the top of the processing body. The spray mechanism includes a gas supply pipe, several branch pipes, and several spray heads. One end of the gas supply pipe is connected to a process gas source, and the other end of the supply pipe is connected to one end of each branch pipe. Each branch pipe is correspondingly arranged with a spray head, and the other end of each branch pipe extends into the processing body and connects to the corresponding spray head within the processing body, allowing the process gas to diffuse into the cavity of the processing body via the spray heads. In use, the gas supply pipe delivers the process gas, through the branch pipes, to each spray head, thereby allowing the process gas to diffuse into the cavity of the processing body, thus performing a predetermined process on the substrate.

[0004] Regarding the aforementioned technologies, since the end of the gas supply pipe is connected to each branch pipe, and each branch pipe is connected to its corresponding spray head, it is difficult to ensure that the gas entering each branch pipe is uniform, which can easily lead to excessive flow differences between each spray head. Therefore, improvements are needed. Summary of the Invention

[0005] To reduce the likelihood of excessive differences in flow rates between different spray heads, this application provides an inductively coupled plasma treatment device.

[0006] This application provides an inductively coupled plasma processing device, which adopts the following technical solution:

[0007] An inductively coupled plasma processing device includes a processing body, a base, and a spraying mechanism. The spraying mechanism includes a gas supply pipe, several branch pipes, and several spray heads. A dispersion mechanism is also provided on the gas supply pipe. The dispersion mechanism includes a dispersion box and a mixing component. Several dispersion chambers are opened in the dispersion box. The dispersion chambers correspond to the branch pipes. One end of the gas supply pipe is connected to each dispersion chamber. Each dispersion chamber is connected to one end of the corresponding branch pipe. A mixing component is provided in each dispersion chamber. Each mixing component is used to introduce the gas in the corresponding dispersion chamber into another adjacent dispersion chamber with a lower gas pressure than the corresponding dispersion chamber.

[0008] By adopting the above technical solution, compared with the prior art where the end of each branch pipe is directly connected to the gas supply pipe, making it difficult for the gas supplied to each branch pipe to be uniform, thus easily causing excessive flow differences between the spray heads, this application, through the setting of the dispersion mechanism, enables the supply pipe to supply gas into each dispersion chamber, and enables the corresponding harmonizing component to connect the two dispersion chambers when there are different gas pressures in adjacent dispersion chambers, and to supply the gas in the dispersion chamber with higher gas pressure into the other dispersion chamber, thereby reducing the gas pressure difference between the two adjacent dispersion chambers, reducing the difference in gas quantity in adjacent dispersion chambers, and thus reducing the flow differences between the spray heads, reducing the probability of excessive flow differences between the spray heads, thereby ensuring the processing effect of the processing device of this application.

[0009] Preferably, a mixing groove is provided through the inner wall between every two adjacent dispersion cavities. Each mixing component includes a mixing frame and an elastic element. The mixing frame is slidably connected to the inner wall of the corresponding mixing groove, and both ends of the mixing frame are respectively attached to the inner wall of the corresponding mixing groove to close the mixing groove. The elastic element is used to allow the corresponding mixing frame to return to its initial position.

[0010] By adopting the above technical solution and configuring the mixing component, when the gas pressure in two adjacent dispersion chambers is too high, the gas in the dispersion chamber with higher gas pressure can push the mixing frame to slide, thereby releasing the mixing frame from the sealing of the mixing tank and connecting the two corresponding dispersion chambers. This allows the gas in the mixing chamber with higher gas pressure to enter the other dispersion chamber through the mixing tank, thus mixing the gases in the two dispersion chambers and reducing the difference in the amount of gas in the two dispersion chambers.

[0011] Preferably, each of the mixing tanks is provided with a closing mechanism, each of the closing mechanisms includes a closing frame and a sliding component. Each closing frame is slidably connected to the inner wall of the corresponding mixing tank, and the sliding direction is perpendicular to the sliding direction of the corresponding mixing frame. Each mixing frame is located on the sliding path of the corresponding closing frame. The sliding component is used to drive the corresponding closing frame to slide when the corresponding mixing frame slides.

[0012] By adopting the above technical solution, the sealing mechanism is designed so that when the mixing frame slides under the push of gas, the sliding component can drive the sealing frame to rotate, thereby releasing the sealing frame from the dispersion chamber. This allows the gas in the dispersion chamber with higher gas pressure to smoothly enter another adjacent dispersion chamber. Furthermore, the presence of the sealing mechanism also allows the sealing frame to seal the dispersion chamber when the gas pressure difference between the two dispersion chambers is small, making it difficult for gas to flow between the two dispersion chambers. This keeps the gas difference between the two dispersion chambers small, thereby reducing the flow rate difference on the corresponding spray pipe.

[0013] Preferably, each of the sliding components includes a rotating frame, a connecting frame, and a linkage component. One end of each rotating frame is rotatably connected to the inner wall of the corresponding mixing frame. One end of each connecting frame is rotatably connected to the corresponding rotating frame, and the other end is rotatably connected to the corresponding closing frame. Each mixing frame drives the corresponding rotating frame to rotate through the linkage component.

[0014] By adopting the above technical solution and setting the sliding component, when the mixing frame slides, it can drive the rotating frame to rotate through the linkage, thereby causing the rotating frame to move the connecting frame, which in turn causes the connecting frame to slide the closing frame, thus realizing the driving of the closing frame. At the same time, it also realizes the linkage between the closing frame and the dispersing frame, saving the active device for driving the sliding of the closing frame.

[0015] Preferably, each of the linkage components includes a linkage frame, one end of which is rotatably connected to the corresponding harmonizing frame, and the other end of which is rotatably connected to the corresponding rotating frame.

[0016] By adopting the above technical solution and setting the linkage frame, when the dispersing frame slides, the dispersing frame can drive the linkage frame to move and rotate relative to itself, thereby driving the corresponding rotating frame to rotate, thus realizing the drive of the rotating frame. At the same time, the linkage between the dispersing frame and the rotating frame is also realized, which facilitates the driving of the sliding of the enclosed frame.

[0017] Preferably, each sliding assembly contains several linkage frames and connecting frames, which are located on opposite sides of the enclosing frame.

[0018] By adopting the above technical solution, the arrangement of multiple linkage frames and connecting frames can effectively ensure the stability of the rotating frame during rotation, as well as the stability of the transmission between the rotating frame and the enclosing frame, thus ensuring the smooth driving of the enclosing frame.

[0019] Preferably, the cross-sectional area of ​​the mixing frame near the end of the closing frame is smaller than the cross-sectional area of ​​the other end of the mixing frame along its sliding direction.

[0020] By adopting the above technical solution, the cross-sectional area of ​​the mixing frame is set so that the cross-sectional area of ​​the end of the mixing frame away from the closed frame is larger, thereby increasing the pressure on that end of the mixing frame under the same air pressure, which facilitates the gas to push the mixing frame to slide, and thus effectively ensures the smooth operation of this application.

[0021] Preferably, each of the mixing racks is provided with a guide rod, one end of which is connected to the corresponding mixing rack, and the other end is inserted into the dispersion box and slidably connected to the dispersion box.

[0022] By adopting the above technical solution, the guide rod is designed to guide the sliding of the mixing frame, while also increasing the stability of the mixing frame during sliding, ensuring smooth sliding of the mixing frame, reducing the probability of misalignment during sliding, and thus ensuring the smooth opening and closing of the mixing frame.

[0023] Preferably, each of the spray heads is provided with a uniforming frame at one end. The chamber formed by the spray head and the uniforming frame is connected to the corresponding branch pipe. The portion of the uniforming frame opposite the corresponding branch pipe is recessed inward and has several first spray holes through it. The outer periphery of each uniforming frame away from the branch pipe is protruded outward and has several second spray holes through it.

[0024] By adopting the above technical solution, the uniformity frame is configured such that the gas introduced into the corresponding spray head through the branch pipe can flow along the recessed area opposite the end of the branch pipe to the outer edge away from the branch pipe after contacting the inner wall of the uniformity frame. This allows the gas that cannot pass through the first spray hole to flow to the outer perimeter of the uniformity frame and be sprayed out through the second spray hole.

[0025] Preferably, the diameter of each of the first spray holes is smaller than the diameter of the corresponding second spray hole on the uniform frame.

[0026] By adopting the above technical solution and setting the size of the first and second spray holes, the gas flowing from the recess of the uniform frame to the outer edge can be increased, thereby increasing the uniformity of the gas sprayed from each spray head, reducing the probability of the gas sprayed from the spray head being concentrated at the branch pipe, and effectively improving the uniformity of spraying.

[0027] In summary, this application includes at least one of the following beneficial technical effects:

[0028] 1. The dispersion mechanism is designed so that the delivery pipe can introduce gas into each dispersion chamber, and when there is a difference in gas pressure in adjacent dispersion chambers, the corresponding harmonizing component can connect the two dispersion chambers and introduce the gas in the dispersion chamber with higher gas pressure into the other dispersion chamber, thereby reducing the gas pressure difference between the two adjacent dispersion chambers, reducing the difference in gas volume in adjacent dispersion chambers, thereby reducing the difference in flow rate between each spray head, reducing the probability of excessive difference in flow rate between each spray head, and thus ensuring the processing effect of the processing device of this application;

[0029] 2. The mixing component is designed so that when the gas pressure in two adjacent dispersion chambers is too high, the gas in the dispersion chamber with higher gas pressure can push the mixing frame to slide, thereby releasing the mixing frame from the sealing of the mixing tank and connecting the two corresponding dispersion chambers. This allows the gas in the mixing chamber with higher gas pressure to enter the other dispersion chamber through the mixing tank, mixing the gas in the two dispersion chambers and reducing the difference in the amount of gas in the two dispersion chambers.

[0030] 3. The sealing mechanism allows the sliding component to rotate the sealing frame when the mixing frame slides under the pressure of gas. This releases the sealing frame from the dispersion chamber, allowing gas from the higher-pressure dispersion chamber to smoothly enter the adjacent dispersion chamber. Furthermore, the sealing mechanism also ensures that when the pressure difference between the two dispersion chambers is small, the sealing frame can close the dispersion chamber, making it difficult for gas to flow between them. This keeps the two dispersion chambers in a state with a small gas difference, thereby reducing the flow rate difference on the corresponding spray pipe. Attached Figure Description

[0031] Figure 1 This is a schematic diagram illustrating the overall structure of the inductively coupled plasma processing device in the embodiments of this application.

[0032] Figure 2 This is a schematic diagram illustrating the structure of the partition plate in an embodiment of this application.

[0033] Figure 3 This is a structural schematic diagram used to illustrate the closure mechanism in the embodiments of this application.

[0034] Figure 4 This is a schematic diagram illustrating the structure of the uniform frame in the embodiments of this application.

[0035] Explanation of reference numerals in the attached drawings: 1. Processing body; 2. Base; 3. Spraying mechanism; 31. Gas supply pipe; 32. Branch pipe; 33. Spray head; 331. Uniformity frame; 4. Dispersion mechanism; 41. Dispersion box; 411. Divider plate; 42. Mixing assembly; 421. Mixing frame; 422. Elastic element; 423. Guide rod; 5. Dispersion chamber; 6. Mixing tank; 7. Sealing mechanism; 71. Sealing frame; 72. Sliding assembly; 721. Rotating frame; 722. Connecting frame; 723. Linkage element; 7231. Linkage frame; 8. First spray hole; 9. Second spray hole. Detailed Implementation

[0036] The following is in conjunction with the appendix Figure 1-4 This application will be described in further detail.

[0037] This application discloses an inductively coupled plasma processing device. (Refer to...) Figure 1 and Figure 2 The system includes a processing body 1, a base 2, and a spraying mechanism 3. The spraying mechanism 3 includes a gas supply pipe 31, several branch pipes 32, and several spray heads 33. A dispersion mechanism 4 is also provided on the gas supply pipe 31. The dispersion mechanism 4 includes a dispersion box 41 and a mixing component 42. Several dispersion chambers 5 are opened inside the dispersion box 41, and the dispersion chambers 5 correspond to the branch pipes 32. One end of the gas supply pipe 31 is connected to each dispersion chamber 5, and each dispersion chamber 5 is connected to one end of the corresponding branch pipe 32. A mixing component 42 is provided in each dispersion chamber 5, and each mixing component 42 is used to introduce the gas in the corresponding dispersion chamber 5 into another adjacent dispersion chamber 5 with a lower gas pressure than the corresponding dispersion chamber 5.

[0038] Reference Figure 1 The processing unit 1 has a chamber. In this embodiment, a plasma generating module and a metal window (not shown in the figures) may be provided on the top of the processing unit 1. The generating module includes an antenna, which is connected to a high-frequency power supply for applying high-frequency power and can be grounded to the outside. At the same time, a matching device for impedance matching is also provided between the antenna and the high-frequency power supply, and the antenna forms an induced electric field inside the chamber of the processing unit 1 based on the high-frequency power.

[0039] Reference Figure 1In this embodiment, a metal window is disposed on the lower side of the antenna, and the interior of the metal window is hollow. The metal window is made of a non-magnetic and conductive material, such as aluminum. The metal window is insulated from the cavity inside the processing unit 1 and is disposed between the antenna and the base, such that the upper part of the metal window forms the antenna chamber and the lower part forms the process area for processing the substrate.

[0040] Reference Figure 1 The base 2 is located inside the cavity of the processing body 1, and the top of the base 2 is used to place the substrate. In this embodiment, the bottom end of the base 2 also extends downward with a rotating shaft, which is rotatably connected to the processing body 1 through a bearing. The outside of the processing body 1 is also provided with a rotating structure for driving the base 2 to rotate. This rotating structure can be a combination of a geared motor, a belt, and a pulley, so that the geared motor drives one of its pulleys to rotate, and the pulley drives the aforementioned rotating shaft to rotate through the belt drive.

[0041] Reference Figure 1 In this embodiment, a heater may be provided inside the base 2 to heat the base 2, thereby increasing the temperature on the substrate and facilitating a chemical reaction with the raw materials in the process gas (i.e., the gas supplied by the spray head 33 to the processing body 1). In this embodiment, the processing body 1 is also provided with an exhaust structure to create a vacuum in the chamber of the processing body 1.

[0042] Reference Figure 1 One end of the gas supply pipe 31 is located outside the processing unit 1 and is connected to a process gas source. In this embodiment, the process gas source is configured as a tank containing process gas. The other end of the gas supply pipe 31 extends into the chamber inside the processing unit 1 and is connected to the center of the top of the dispersion box 41. The dispersion box 41 is fixedly installed on the top of the processing unit 1. In this embodiment, the dispersion box 41 is configured as a cylinder with a vertical axis.

[0043] Reference Figure 2 The dispersion box 41 has a chamber containing four partition plates 411. These partition plates 411 are evenly distributed around the circumference of the dispersion box 41's axis, and all four are the same size. One end of each partition plate 411 is fixedly connected to the other end, and the remaining ends of each partition plate 411 are fixedly connected to the inner wall of the chamber within the dispersion box 41, thus dividing the chamber into four dispersion cavities 5 of the same size and shape. A gas supply pipe 31 is connected to the top of each dispersion cavity 5.

[0044] Reference Figure 2 and Figure 3Each partition plate 411 has a mixing groove 6 extending through its opposite side walls. Each mixing groove 6 is equipped with a mixing assembly 42, which includes a mixing frame 421 and an elastic element 422. Each mixing frame 421 is equipped with two guide rods 423. One end of each guide rod 423 is fixedly connected to the corresponding mixing frame 421, and the other end extends outward from the mixing groove 6 and passes through the corresponding partition plate 411 from the inside. Each guide rod 423 is slidably connected to the inner wall of the corresponding partition plate 411 to realize the sliding of the mixing frame 421 and guide the sliding of the mixing frame 421.

[0045] Reference Figure 2 and Figure 3 In this embodiment, each mixing frame 421 has two elastic elements 422, which are correspondingly arranged with the guide rods 423 and are all configured as compression springs. Each compression spring is sleeved on the corresponding guide rod 423, with one end abutting against one end of the mixing frame 421 and the other end abutting against the inner wall of the mixing groove 6.

[0046] Reference Figure 2 and Figure 3 Each mixing groove 6 has a circular opening at one end, and the inner wall of the circular opening is inclined. The other end of each mixing groove 6 has a rectangular opening, and the inclined inner walls of the two mixing grooves 6 on each partition plate 411 face opposite directions. Each mixing frame 421 has a cylindrical end along its sliding direction, and each end has a guide surface that abuts against the inclined inner wall of the corresponding mixing groove 6 to close that end of the mixing groove 6.

[0047] Reference Figure 2 and Figure 3 Each mixing frame 421 extends beyond its corresponding mixing groove 6 at one end, and each groove is rectangular and abuts against the side wall of the corresponding partition plate 411 to partially close the rectangular opening on the partition plate 411, leaving one end of the opening along its length. The cross-sectional area of ​​the circular end of each mixing frame 421 is larger than the cross-sectional area of ​​its rectangular end to facilitate the sliding of the mixing frame 421 by the gas.

[0048] Reference Figure 2 and Figure 3Each mixing tank 6 is provided with a closing mechanism 7. Each closing mechanism 7 includes a closing frame 71 and a sliding component 72. Each closing frame 71 is slidably connected to the inner wall of the corresponding mixing tank 6, and the sliding direction is perpendicular to the sliding direction of the closing frame 71. One end of each closing frame 71 is attached to the end of the corresponding mixing frame 421, and the other end is attached to the inner wall of the mixing tank 6. The cross-sectional area of ​​each closing frame 71 is larger than the part of the rectangular opening on the corresponding mixing tank 6 that is not closed by the closing frame 71, so as to close the part, thereby achieving complete closure of the rectangular opening with the corresponding end of the mixing frame 421.

[0049] Reference Figure 2 and Figure 3 Each sliding assembly 72 includes a rotating frame 721, a connecting frame 722, and a linkage 723, and each linkage 723 includes a linkage frame 7231. In this embodiment, each sliding assembly 72 has two linkage frames 7231 and two connecting frames 722, located on opposite sides of the corresponding enclosing frame 71. One end of each linkage frame 7231 is rotatably connected to the corresponding adjusting frame 421 via a pin, and the other end of each linkage frame 7231 is rotatably connected to the corresponding rotating frame 721 via a pin.

[0050] Reference Figure 2 and Figure 3 One end of each rotating frame 721 is rotatably connected to the inner wall of the mixing tank 6 via a pin, and the other end of each rotating frame 721 extends toward the closing frame 71. One end of each connecting frame 722 is rotatably connected to the corresponding rotating frame 721 via a pin, and the other end of each connecting frame 722 is rotatably connected to the corresponding closing frame 71.

[0051] Reference Figure 2 and Figure 3 Initially, the circular end of the mixing frame 421 abuts against the inclined inner wall of the corresponding mixing tank 6. At this time, the sealing frame 71 seals the gap between the other end of the mixing frame 421 and the inner wall of the mixing tank 6. When the air pressure in the dispersion chamber 5 facing the circular end of the mixing frame 421 is greater than the air pressure in the dispersion chamber 5 facing the other end of the mixing frame 421, the mixing frame 421 slides, thereby causing both ends of the mixing tank 6 to gradually open.

[0052] Reference Figure 2 and Figure 3During this process, the mixing frame 421 drives the corresponding linkage frame 7231 to move, which in turn drives the corresponding rotating frame 721 to rotate. The rotation of the rotating frame 721 drives the connecting frame 722 to move, which in turn drives the sealing frame 71 to slide. The sealing frame 71 gradually slides into the area inside the mixing tank 6, which gradually increases the opening at the corresponding end of the mixing tank 6, facilitating gas flow and gradually reducing the gas pressure difference in the adjacent dispersion chambers 5, thereby reducing the difference in the amount of gas in the adjacent dispersion chambers 5.

[0053] Reference Figure 2 and Figure 4 The number of branch pipes 32 is set to four. One end of each branch pipe 32 is connected to the corresponding dispersion chamber 5, and the other end extends downward and is connected to the corresponding spray head 33. Each spray head 33 is provided with a uniforming frame 331 at its bottom end, and each uniforming frame 331 is fixedly connected to the housing of the corresponding spray head 33. The chamber formed by each spray head 33 and the uniforming frame 331 is connected to the corresponding branch pipe 32.

[0054] Reference Figure 2 and Figure 4 The portion of the uniform distribution frame 331 located directly below the corresponding branch pipe 32 is recessed inward and has several first spray holes 8 extending through it. The outer periphery of each uniform distribution frame 331 protrudes outward and has several second spray holes 9 extending through it. The diameter of each first spray hole 8 is smaller than the diameter of the second spray hole 9 on the corresponding uniform distribution frame 331, so as to make the gas flow more uniform.

[0055] The implementation principle of an inductively coupled plasma processing device according to an embodiment of this application is as follows: when the gas pressure in the dispersion cavity 5 facing one end of the mixing frame 421 (which has a circular cross-section) is greater than the gas pressure in the dispersion cavity 5 facing the other end of the mixing frame 421, the mixing frame 421 slides, thereby causing the two ends of the mixing tank 6 to gradually open.

[0056] During this process, the mixing frame 421 drives the corresponding linkage frame 7231 to move, which in turn drives the corresponding rotating frame 721 to rotate. The rotation of the rotating frame 721 drives the connecting frame 722 to move, which in turn drives the sealing frame 71 to slide. The sealing frame 71 gradually slides into the area inside the mixing tank 6, which gradually increases the opening at the corresponding end of the mixing tank 6, facilitating gas flow and gradually reducing the gas pressure difference in the adjacent dispersion chambers 5, thereby reducing the difference in the amount of gas in the adjacent dispersion chambers 5.

[0057] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. An inductively coupled plasma processing device, comprising a processing body (1), a base (2), and a spraying mechanism (3), wherein the spraying mechanism (3) comprises a gas supply pipe (31), a plurality of branch pipes (32), and a plurality of spray heads (33), characterized in that: The gas supply pipe (31) is also provided with a dispersion mechanism (4), which includes a dispersion box (41) and a mixing component (42). The dispersion box (41) has a plurality of dispersion chambers (5) and the dispersion chambers (5) correspond to the branch pipe (32). One end of the gas supply pipe (31) is connected to each dispersion chamber (5), and each dispersion chamber (5) is connected to one end of the corresponding branch pipe (32). A mixing groove (6) is provided through the inner sidewall between every two adjacent dispersion chambers (5). A mixing component (42) is provided in each mixing groove (6). Each mixing component (42) is used to introduce the gas in the corresponding dispersion chamber (5) into another adjacent dispersion chamber (5) with a lower gas pressure than the corresponding dispersion chamber (5).

2. The inductively coupled plasma processing device according to claim 1, characterized in that: Each of the blending components (42) includes a blending frame (421) and an elastic element (422). The blending frame (421) is slidably connected to the inner wall of the corresponding blending groove (6), and both ends of the blending frame (421) are respectively attached to the inner sidewall of the corresponding blending groove (6) to close the blending groove (6). The elastic element (422) is used to allow the corresponding blending frame (421) to return to its initial position.

3. The inductively coupled plasma processing device according to claim 2, characterized in that: Each of the mixing tanks (6) is provided with a closing mechanism (7). Each closing mechanism (7) includes a closing frame (71) and a sliding component (72). Each closing frame (71) is slidably connected to the inner wall of the corresponding mixing tank (6), and the sliding direction is perpendicular to the sliding direction of the corresponding mixing frame (421). Each mixing frame (421) is located on the sliding path of the corresponding closing frame (71). The sliding component (72) is used to drive the corresponding closing frame (71) to slide when the corresponding mixing frame (421) slides.

4. The inductively coupled plasma processing device according to claim 3, characterized in that: Each of the sliding components (72) includes a rotating frame (721), a connecting frame (722), and a linkage (723). One end of each rotating frame (721) is rotatably connected to the inner wall of the corresponding mixing frame (421). One end of each connecting frame (722) is rotatably connected to the corresponding rotating frame (721), and the other end is rotatably connected to the corresponding closing frame (71). Each mixing frame (421) drives the corresponding rotating frame (721) to rotate through the linkage (723).

5. The inductively coupled plasma processing device according to claim 4, characterized in that: Each of the linkage components (723) includes a linkage frame (7231), one end of each linkage frame (7231) is rotatably connected to the corresponding harmonizing frame (421), and the other end is rotatably connected to the corresponding rotating frame (721).

6. The inductively coupled plasma processing device according to claim 5, characterized in that: In each of the sliding components (72), the number of the linkage frame (7231) and the connecting frame (722) is set to several, and they are respectively located on opposite sides of the closing frame (71).

7. The inductively coupled plasma processing device according to claim 3, characterized in that: The cross-sectional area of ​​the mixing frame (421) near the end of the closing frame (71) is smaller than the cross-sectional area of ​​the other end of the mixing frame (421) along its sliding direction.

8. The inductively coupled plasma processing device according to claim 1, characterized in that: Each of the spray heads (33) is provided with a uniform frame (331) at one end. The chamber formed by the spray head (33) and the uniform frame (331) is connected to the corresponding branch pipe (32). The uniform frame (331) is recessed inward in the part opposite to the corresponding branch pipe (32) and has several first spray holes (8) through it. The outer part of each uniform frame (331) away from the branch pipe (32) is protruding outward and has several second spray holes (9) through it.

9. The inductively coupled plasma processing device according to claim 8, characterized in that: The diameter of each of the first spray holes (8) is smaller than the diameter of the corresponding second spray hole (9) on the uniform frame (331).

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