Membrane-method helium purification device, purification system and purification method

Abstract

The invention relates to the technical field of helium gas separation, in particular to a membrane-method helium gas purification device, system and method, the membrane-method helium gas purification device comprises a purifier and two separation tanks fixed on the side wall of the purifier, and the two separation tanks are communicated with each other through a first conveying pipe; the rotating rod is rotatably mounted in the separation tank, a clamping ring is axially arranged on the rotating rod in a sliding manner, and a separation membrane is fixed on the clamping ring; the trigger discharge mechanism is arranged in the separation tank, is connected with the rotating rod and is used for driving the rotating rod to rotate when the pressure intensity in the separation tank is increased and discharging residual gas; the pressurizing mechanism is arranged in the separation tank, a conduction impact mechanism is arranged on the pressurizing mechanism, pressure difference can be formed on the two sides of the separation membrane through cooperation of the pressurizing mechanism and the conduction impact mechanism, and when the pressure intensity reaches a set value, the effect of rapidly purifying helium is achieved through dual cooperation of airflow impact and bidirectional pressure intensity.

Description

Technical Field

[0001] The invention relates to the technical field of helium purification, and in particular to a membrane helium purification device, a purification system and a purification method. Background Art

[0002] Membrane separation is a highly efficient and energy-saving gas separation technology suitable for the purification of helium (He), especially for recovering helium from natural gas or industrial waste gas.

[0003] Its working principle is to use the difference in permeation rate between helium and other gases in membrane materials for separation. Helium molecules are small and inert, and their permeation rate in most membrane materials is much higher than that of other gases. During the separation process, separation is achieved by pressure difference.

[0004] In actual separation and purification, in order to ensure that there is always a certain pressure difference during the separation process, it is necessary to continuously pressurize the retention side of the membrane. During the pressurization process, as the separation permeation volume increases, the gas is in a steady-state flow state, and it is very easy to form a concentration polarization layer on the membrane surface, hindering the permeation of helium.

[0005] To this end, a conduction plate can be set up to first pressurize the retention side of the membrane and then conduct it. After the pressure reaches a threshold, the conduction plate is controlled to conduct, so that the high-pressure gas is separated and permeated by impact, thereby improving the separation and purification efficiency of helium.

[0006] However, although high-pressure shock can temporarily destroy the concentration polarization layer, under a fixed membrane structure, the separation of helium can only be subjected to the unidirectional force of positive pressure, and a "dead zone" will remain on the membrane surface. The heavy components will still be enriched on the membrane surface due to gravity, resulting in uneven concentration distribution on the membrane surface and a decrease in separation permeability. Summary of the invention

[0007] The object of the present invention is to provide a membrane helium purification device, a purification system and a purification method to solve the problems raised in the above background technology.

[0008] To achieve the above object, the present invention provides the following technical solutions: A membrane helium purification device, comprising: A purifier, and two separation tanks fixed to the side wall of the purifier, wherein the two separation tanks are connected to each other through a first delivery pipe; Also includes: A rotating rod is rotatably mounted in the separation tank, the rotating rod is axially slidably provided with a clamping ring which is sealingly and slidably connected with the separation tank, and a separation membrane is fixed on the clamping ring; a trigger discharge mechanism, which is disposed in the separation tank and connected to the rotating rod, and is used to drive the rotating rod to rotate when the pressure in the separation tank increases, and discharge the residual gas; The boosting mechanism is arranged in the separation tank, and a conductive impact mechanism is arranged on the boosting mechanism. The conductive impact mechanism can form a pressure difference on both sides of the separation membrane when the boosting mechanism moves, and when the pressure in the separation tank reaches a set threshold, control the gas to impact toward the separation membrane.

[0009] As a further solution of the present invention: the boosting mechanism includes an air supply disk fixed on the clamping ring, the side wall of the air supply disk is formed with an arc groove, a sliding block is slidably installed in the arc groove, a sealing disk tightly fitted with the air supply disk is fixed on the sliding block, and the air supply disk and the sealing disk are respectively formed with a first conducting hole and a second conducting hole which are equidistantly distributed around the circumference and are connected and cooperate with each other.

[0010] As a further solution of the present invention: the boosting mechanism further comprises a cylinder fixed on the separation tank, and a push plate fixedly connected to the clamping ring is fixed at the telescopic end of the cylinder.

[0011] As a further solution of the present invention: the conduction impact mechanism includes an inclined block fixed on the sealing disk, the rotating rod axially slides with a rotating sleeve rotatably connected to the air supply disk, and a supporting ring is fixed on the rotating sleeve.

[0012] As a further solution of the present invention: the conductive impact mechanism also includes a support sleeve fixed on the support ring, a support rod axially sliding in the support sleeve, a movable plate fixed to the end of the support rod, a limiting column fixed on the movable plate that abuts against the tilting block, a first spring is sleeved on the support sleeve and the support rod, and two ends of the first spring are respectively abutted against the support ring and the movable plate.

[0013] As a further solution of the present invention: the trigger discharge mechanism comprises a guide column fixed in the separation tank, and a fixing ring is fixed on the guide column; It also includes a blocking component and a guiding component which are arranged on the guide column and are used to adjust the conduction state of the separation tank and drive the rotating rod to rotate.

[0014] As a further solution of the present invention: the blocking assembly includes a guide sleeve axially sliding along the guide column, the guide sleeve axially slidingly has a follower plate slidably connected to the rotating rod, and the follower plate is formed with an exhaust hole; It also includes a limit ring and a blocking plate fixed on both sides of the guide sleeve, the blocking plate is in abutment with the follower plate, a second spring is sleeved on the guide sleeve, and two ends of the second spring are respectively in abutment with the limit ring and the follower plate.

[0015] As a further solution of the present invention: the guide assembly includes a guide groove formed on the circumferential outer wall of the rotating rod, a limit block is fixed to the inner wall of the movable plate and is slidably engaged with the guide groove, and a third spring is sleeved on the rotating rod, and both ends of the third spring are respectively in contact with the inner wall of the separation tank and the movable plate.

[0016] A membrane helium purification system comprises the membrane helium purification device.

[0017] A membrane helium purification method comprises the following steps: Step 1: The gas to be purified is transported into the separation tank, and under the action of the booster mechanism, the clamping ring and the separation membrane are controlled to slide along the axial direction of the separation tank; Step 2: Under the action of the clamping ring and the separation membrane, the pressure in the separation tank increases, thereby driving the trigger discharge mechanism to move, so as to control the rotation of the rotating rod; Step 3: Under the action of the rotating rod, the conduction impact mechanism is controlled to move. When the pressure in the separation tank reaches the set value, the conduction impact mechanism controls the gas in the separation tank to impact on the separation membrane; Step 4: When the purification is completed, the booster mechanism continues to move, and under the action of pressure, the control triggers the discharge mechanism to move, so that the separation tank is turned on to discharge the residual gas in the separation tank.

[0018] Compared with the prior art, the beneficial effects of the present invention are as follows: the present application can realize the separation and purification of helium through the dual effects of positive pressure and negative pressure, and the high-speed impact of airflow on the separation membrane. Specifically, through the boosting mechanism, when the separation membrane is in an isolated state, the pressure on the interception side can be increased, and a negative pressure can be formed on the permeation side. At the same time, under the action of pressure, the rotation of the rotating rod is controlled by triggering the discharge mechanism to drive the movement of the conduction impact mechanism. When the pressure reaches the set value, the conduction of the separation membrane is controlled by the conduction impact mechanism to control the high-pressure airflow to impact on the separation membrane, thereby enhancing the separation and purification rate and effect of helium.

[0019] By first pressurizing the gas on the interception side and then conducting it, it is possible to ensure that the helium partial pressure is high enough, the permeation power is maximized, and ineffective permeation under low pressure can be avoided. At the same time, when the high-pressure gas passes through the second conducting hole and the first conducting hole, the airflow is further accelerated and impacts the surface of the separation membrane, which can not only break the retention layer on the membrane surface and reduce concentration polarization, but also form an instantaneous low-pressure area near the first conducting hole, further driving the helium permeation. At the same time, under the impact of the airflow, the problem of clogging of the separation membrane due to enrichment of heavy components can be avoided.

[0020] By controlling the rotation of the rotating rod, the separation membrane can be controlled to be in a conductive state when helium is purified. When the helium purification is completed and exhaust is required, the separation membrane can be controlled to be in a blocked state. This can prevent the separation membrane from being damaged due to excessive exhaust pressure, and prevent the separation membrane from being turned on during the exhaust process, which may cause helium reflux on the permeate side. At the same time, multi-stage purification in two separation tanks can ensure that the purified helium meets the required requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 The figure is a schematic structural diagram of an embodiment of a membrane helium purification device.

[0022] Figure 2 This is a schematic diagram of the structure of a separation tank, a first delivery pipe, and a discharge pipe in an embodiment of a membrane helium purification device.

[0023] Figure 3 The figure is a schematic diagram of the cross-sectional structure of a separation tank in one embodiment of a membrane helium purification device.

[0024] Figure 4 for Figure 3 A schematic diagram of the enlarged structure at point A in the middle.

[0025] Figure 5 This is a schematic diagram of the structure inside the separation tank in one embodiment of a membrane helium purification device.

[0026] Figure 6 for Figure 5 Schematic diagram of the structure from another angle.

[0027] Figure 7 This is a schematic diagram of the connection relationship between some of the boosting mechanisms and the conduction impact mechanisms in an embodiment of a membrane helium purification device.

[0028] Figure 8 This is a schematic diagram of the explosion structure of part of the pressurizing mechanism and the conductive impact mechanism in an embodiment of a membrane helium purification device.

[0029] Fig. 9 This is a schematic diagram of the structure of a partially triggered discharge mechanism and a rotating rod in an embodiment of a membrane helium purification device.

[0030] Fig.10 This is a schematic diagram of the explosion structure of the triggering discharge mechanism and the rotating rod in one embodiment of the membrane helium purification device.

[0031] Fig.11 for Fig.10 A magnified schematic diagram of the structure at point B in the middle.

[0032] In the figure: 1, purifier; 2, separation tank; 3, feed pipe; 4, discharge pipe; 5, first conveying pipe; 6, second conveying pipe; 7, guide column; 8, fixing ring; 9, rotating rod; 901, first straight groove; 902, first spiral groove; 903, second spiral groove; 904, second straight groove; 10, clamping ring; 11, separation membrane; 12, cylinder; 13, push plate; 14, air delivery disk; 1401, first conduction hole; 1402, arc slide groove ; 15. Rotating sleeve; 16. Sealing disk; 1601. Second conducting hole; 1602. Sliding block; 17. Tilting block; 18. Support ring; 19. Support sleeve; 20. Support rod; 21. Movable plate; 22. First spring; 23. Limiting column; 24. Guide sleeve; 2401. Limiting ring; 25. Sealing plate; 26. Follow-up disk; 2601. Exhaust hole; 2602. Limiting block; 27. Second spring; 28. Third spring. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0034] In addition, when an element in the present invention is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only embodiment.

[0035] See also Figure 1 to Figure 11 In an embodiment of the present invention, a membrane helium purification device comprises: A purifier 1, and two separation tanks 2 fixed to the side wall of the purifier 1, wherein the two separation tanks 2 are connected to each other through a first delivery pipe 5; Also includes: A rotating rod 9 is rotatably mounted in the separation tank 2. The rotating rod 9 is axially slidably provided with a clamping ring 10 which is sealingly and slidably connected to the separation tank 2. A separation membrane 11 is fixed on the clamping ring 10. A trigger discharge mechanism is disposed in the separation tank 2 and connected to the rotating rod 9, and is used to drive the rotating rod 9 to rotate when the pressure in the separation tank 2 increases, and discharge the residual gas; The boosting mechanism is arranged in the separation tank 2, and a conductive impact mechanism is provided on the boosting mechanism. The conductive impact mechanism can form a pressure difference on both sides of the separation membrane 11 when the boosting mechanism moves, and when the pressure in the separation tank 2 reaches a set threshold, the gas is controlled to impact toward the separation membrane 11.

[0036] Specifically, two separation tanks 2 are provided, which are used for primary purification and secondary purification of helium respectively. The separation tank 2 used for primary purification is connected with a feed pipe 3 connected with the purifier 1, and the feed pipe 3 is used to transport unpurified gas into the separation tank 2. The separation tank 2 used for secondary purification is connected with a second delivery pipe 6 for transporting helium after secondary purification. The ends of the two separation tanks 2 facing away from the first delivery pipe 5 are connected with a discharge pipe 4 for discharging residual gas. When the helium is separated and purified, the untreated gas can be transported to the primary separation tank 2 through the feed pipe 3. At this time, under the action of the conduction impact mechanism, the separation membrane 11 and the gas are in a separated state. Under the action of the boosting mechanism, the separation membrane 11 is controlled by the clamping ring 10 to move in a direction away from the first delivery pipe 5, so that the pressure on the interception side increases, and a negative pressure is formed on the permeation side. The pressure will also drive the triggering discharge mechanism to move, so that the rotating rod 9 rotates, and the rotating rod 9 will drive the conduction impact mechanism to move. When the pressure on the interception side is When the set value is reached, the conduction impact mechanism can control the gas on the interception side to impact on the separation membrane 11 with a higher pressure, thereby accelerating the helium to pass through the separation membrane 11. At the same time, under the action of the negative pressure on the permeation side, the purification of the helium is further assisted. After the helium purification is completed, the booster mechanism continues to move, so that the pressure on the interception side continues to increase, and controls the trigger discharge mechanism to move, so that the rotating rod 9 rotates. At this time, the conduction impact mechanism will again control the separation membrane 11 to be in a blocked state to ensure that the helium will not flow back during the gas discharge process. When the pressure reaches a certain level, the trigger discharge mechanism controls the separation tank 2 to be conducted, so that the residual gas can be discharged through the discharge pipe 4, and the helium after the first-level purification will be transported to the separation tank 2 for the second-level purification through the first delivery pipe 5, and the above operation is performed again, so that the gas purified once is under the dual coordination of high-pressure impact and negative pressure suction, and the effect of secondary purification is obtained. The gas after the secondary purification can be transported to the storage position through the second delivery pipe 6.

[0037] See also Figure 1-Figure 3 , Figure 5-Figure 8The boosting mechanism includes an air supply disk 14 fixed on the clamping ring 10, and the side wall of the air supply disk 14 is formed with an arc groove 1402, and a sliding block 1602 is slidably installed in the arc groove 1402, and a sealing disk 16 tightly fitted with the air supply disk 14 is fixed on the sliding block 1602, and the air supply disk 14 and the sealing disk 16 are respectively formed with a first conducting hole 1401 and a second conducting hole 1601 that are equidistantly distributed around the circumference and are interconnected and coordinated with each other, and the boosting mechanism also includes a cylinder 12 fixed on the separation tank 2, and a push plate 13 fixedly connected to the clamping ring 10 is fixed at the telescopic end of the cylinder 12.

[0038] See also Figure 5 , Figure 6 In detail, in the initial state, the clamping ring 10 is located at the end of the stroke toward the first delivery pipe 5, so that the cavity size on the retention side in the separation tank 2 is the largest, and the cavity size on the permeate side is the smallest, and the cavity on the retention side is filled with unpurified gas, the first conducting hole 1401 and the second conducting hole 1601 are in a separated state, and the sealing disk 16 is tightly fitted with the air supply disk 14, so the separation membrane 11 cannot contact the gas on the retention side; the sealing disk 16 is limited to control the first conducting hole 1401 to rotate toward the conducting position with the second conducting hole 1601, which is forward rotation, and vice versa. Under the action of the conducting impact mechanism, the sealing disk 16 has a tendency to reverse. Since the sliding block 1602 is located at the end of the stroke on one side of the arc slide groove 1402, the sealing disk 16 cannot rotate.

[0039] When it is necessary to purify the gas on the trapped side, the valves of the feed pipe 3 and the first delivery pipe 5 can be closed, so that the cavities on the trapped side and the permeate side are in a blocked state. At this time, the cylinder 12 works and pushes the clamping ring 10 to move in a direction away from the first delivery pipe 5 through the push plate 13. The clamping ring 10 also drives the sealing plate 16 to move synchronously through the air delivery plate 14, so that the cavity size on the trapped side is reduced and the cavity size on the permeate side is increased, so that the pressure of the gas on the trapped side is increased and a negative pressure is formed on the permeate side. Under the action of the pressure, the discharge mechanism is also triggered to move, so that the rotating rod 9 rotates, and the rotating rod 9 will drive the conduction impact mechanism to move. In this process, the pressure on the trapped side continues to increase, the gas molecules are compressed, and the helium partial pressure increases significantly. When the pressure on the interception side increases to the set value, under the action of the conductive impact mechanism, the sealing disk 16 is controlled to rotate rapidly forward and drive the sliding block 1602 to slide toward the other side of the arc groove 1402. The sealing disk 16 will also control the second conductive hole 1601 to move rapidly to the connection position with the first conductive hole 1401. At this time, the high-pressure gas will quickly pass through the second conductive hole 1601 and the first conductive hole 1401 and impact on the separation membrane 11. At the same time, under the attraction of the negative pressure on the permeation side, the separation of helium is further accelerated.

[0040] Preferably, by first pressurizing the gas on the interception side and then conducting it, it is possible to ensure that the helium partial pressure is high enough, the permeation power is maximized, and ineffective permeation under low pressure can be avoided. At the same time, when the high-pressure gas passes through the second conducting hole 1601 and the first conducting hole 1401, the airflow is further accelerated and impacts the surface of the separation membrane 11, which can not only break the retention layer on the membrane surface and reduce concentration polarization, but also form an instantaneous low-pressure area near the first conducting hole 1401, further driving the helium permeation. In summary, through the bidirectional action of positive and negative pressures, and the impact of high-speed airflow, the helium purification efficiency can be effectively enhanced.

[0041] See also Figure 5 , Figure 6 , Figure 9-11 The trigger discharge mechanism includes a guide column 7 fixed in the separation tank 2, and a fixing ring 8 is fixed on the guide column 7; it also includes a plugging component and a guide component arranged on the guide column 7 for adjusting the conduction state of the separation tank 2 and driving the rotating rod 9 to rotate, and the plugging component includes a guide sleeve 24 axially sliding along the guide column 7, and the guide sleeve 24 axially slides with a follower plate 26 slidably connected to the rotating rod 9, and an exhaust hole 2601 is formed on the follower plate 26; it also includes a limit ring fixed on both sides of the guide sleeve 24 2401 and a blocking plate 25, the blocking plate 25 is in contact with the follower disk 26, a second spring 27 is sleeved on the guide sleeve 24, and the two ends of the second spring 27 are respectively in contact with the limit ring 2401 and the follower disk 26, the guide assembly includes a guide groove formed on the circumferential outer wall of the rotating rod 9, a limit block 2602 is fixed to the inner wall of the follower disk 26 and is slidably engaged with the guide groove, a third spring 28 is sleeved on the rotating rod 9, and the two ends of the third spring 28 are respectively in contact with the inner wall of the separation tank 2 and the follower disk 26.

[0042] See also Fig.11 It should be noted that the guide groove can be divided into four sections, namely the first straight groove 901, the first spiral groove 902, the second spiral groove 903, and the second straight groove 904, which are sequentially connected to each other. The first spiral groove 902 and the second spiral groove 903 have the same number of spiral turns and different pitches. Therefore, the length of the first spiral groove 902 formed along the axial direction of the rotating rod 9 is greater than that of the second spiral groove 903; See also Fig. 9In the initial state, the pressure in the cavity on the interception side is consistent with the external pressure, the follower disk 26 is not pushed by the air pressure, and the third spring 28 is in a compressed state, so that the follower disk 26 is located at the end of the stroke away from the discharge pipe 4, so that the limit block 2602 is located at the end of the stroke of the first straight groove 901 away from the first spiral groove 902. The second spring 27 is also in a compressed state, and controls the guide sleeve 24 to have a tendency to move away from the follower disk 26 through the limit ring 2401. Under the action of the guide sleeve 24, the blocking plate 25 is tightly fitted with the follower disk 26, and the exhaust hole 2601 is blocked, so that the side of the interception side cavity away from the separation membrane 11 is in a blocked state. Since the first conductive hole 1401 and the second conductive hole 1601 are in a separated state, both sides of the cavity on the interception side are in a blocked state; When the helium needs to be purified, at this time, under the action of the cylinder 12, the sealing disk 16 is controlled to move toward the follower disk 26, so that the pressure in the cavity on the interception side increases, and the thrust generated by the pressure will act on the follower disk 26 and push the follower disk 26 to move toward the discharge pipe 4, thereby compressing the third spring 28, and under the action of the second spring 27, the blocking plate 25 moves synchronously with the follower disk 26 to ensure that the exhaust hole 2601 is always in a blocked state; The follower disk 26 will also drive the limit block 2602 to slide along the first straight groove 901. When the limit block 2602 disengages from the first straight groove 901 and enters the first spiral groove 902, the rotating rod 9 will rotate, thereby driving the conduction impact mechanism to move. At this time, the conduction impact mechanism always provides a reverse force to the sealing disk 16. When the gas pressure in the cavity on the interception side reaches a set value, the limit block 2602 is still located in the first spiral groove 902. Under the action of the conduction impact mechanism, the reverse force provided to the sealing disk 16 is converted into a forward force to assist the forward rotation of the sealing disk 16, thereby controlling the rapid rotation of the sealing disk 16, so that the second conduction hole 1601 moves to a position connected with the first conduction hole 1401, and the gas on the interception side will impact on the surface of the separation membrane 11 through the second conduction hole 1601 and the first conduction hole 1401, so as to quickly separate and purify the helium through the separation membrane 11.

[0043] In this process, as the helium is separated, the air pressure on the interception side decreases, and the cylinder 12 can continue to control the sealing disk 16 to move toward the follower disk 26 to keep the interception side always in a certain high pressure state, so that the position change of the follower disk 26 is small, ensuring the best separation effect of helium; If the helium content in the gas undergoing primary purification is high, the amount of residual gas is small after the helium is separated. Therefore, there is no need to discharge the residual gas. After the primary purification is completed, the separation membrane 11 can be controlled to reset and the separation tank 2 can be filled with untreated gas again. If the amount of gas remaining after the helium separation is large, when the sealing disk 16 continues to move toward the follower disk 26, the air pressure on the interception side continues to increase, and the follower disk 26 is pushed to continue moving. By increasing the pressure on the interception side again, the small amount of helium remaining in the gas can be separated and purified. When the limit block 2602 disengages from the first spiral groove 902 and enters the second spiral groove 903, it means that the primary purification of the helium is completed, the rotating rod 9 is reversed, and The conduction impact mechanism is driven to move, causing the sealing disk 16 to reverse, so that the second conduction hole 1601 is separated from the first conduction hole 1401, and the separation membrane 11 is in a blocked state again. When the limit block 2602 disengages from the second spiral groove 903 and enters the second straight groove 904, the limit ring 2401 just moves to the abutment position with the fixed ring 8, so that the guide sleeve 24 and the sealing plate 25 no longer move. When the follower disk 26 continues to move, it will separate from the sealing plate 25, so that the exhaust hole 2601 is connected. Under high pressure conditions, the remaining gas in the interception side can be quickly discharged through the exhaust hole 2601 and the discharge pipe 4. When the discharge is completed, the cylinder 12 controls the clamping ring 10 to move toward the initial position.

[0044] Among them, when discharging gas, the first delivery pipe 5 is in an open state to transport the gas on the permeate side through the first delivery pipe 5 to the separation tank 2 for secondary purification. The separation tank 2 for secondary purification can repeat the operation in the primary purification separation tank 2 to purify the helium for the second time. Since the helium after the first purification contains a small amount of other impurity gases, the exhaust treatment can be carried out after multiple secondary purifications.

[0045] Preferably, by controlling the rotation of the rotating rod 9, it is possible to control the separation membrane 11 to be in a conducting state when purifying the helium, and to control the separation membrane 11 to be in a blocked state when the helium purification is completed and exhaust is required. This can prevent the separation membrane 11 from being damaged due to excessive exhaust pressure, and can also prevent the separation membrane from being turned on during the exhaust process, causing helium reflux on the permeate side. At the same time, through multi-stage purification of the two separation tanks 2, it can be ensured that the purified helium meets the required requirements.

[0046] See also Figure 3-Figure 8The conduction impact mechanism includes a tilting block 17 fixed on the sealing disk 16, the rotating rod 9 axially slides with a rotating sleeve 15 rotatably connected to the air supply disk 14, and a support ring 18 is fixed on the rotating sleeve 15. The conduction impact mechanism also includes a support sleeve 19 fixed on the support ring 18, and a support rod 20 axially slides in the support sleeve 19, and a movable plate 21 is fixed at the end of the support rod 20, and a limiting column 23 that contacts and cooperates with the tilting block 17 is fixed on the movable plate 21. A first spring 22 is sleeved on the support sleeve 19 and the support rod 20, and the two ends of the first spring 22 are respectively in contact with the support ring 18 and the movable plate 21.

[0047] See also Figure 7 , further, the tilting block 17 is arranged in a triangular tilted shape, and the tilting angles of the two tilting surfaces are different, and the two tilting surfaces are divided into a forward rotation surface and a reverse rotation surface by the positive rotation force or reverse rotation force provided to the sealing disk 16 by the stop column 23 and the tilting block 17, and the tilting angle of the reverse rotation surface is greater than the tilting angle of the forward rotation surface; In the initial state, the first spring 22 is in a compressed state, so that the movable plate 21 is located at the end of the stroke away from the support sleeve 19, so that the limit column 23 abuts against the reversal surface. At this time, the sealing disk 16 has a tendency to reverse. As the pressure on the interception side increases, the follower plate 26 will slide axially along the guide column 7, so that the limit block 2602 slides in the guide groove. When the limit block 2602 moves to the first spiral groove 902, the rotating rod 9 will rotate and drive the rotating sleeve 15 to rotate, thereby driving the support sleeve 19 to move through the support ring 18, so as to drive the limit column 23 to slide on the reversal surface through the support rod 20 and the movable plate 21, and move toward the support ring 18 to compress the first spring 22. At this time, the reversal force provided to the sealing disk 16 by the limit column 23 and the reversal surface increases. As the first spring 22 is compressed, the resistance that the rotating rod 9 needs to overcome when rotating also increases. When the pressure on the interception side reaches the set value, the limit column 23 just passes over the reverse surface and abuts against the forward surface. At this time, the first spring 22 is elastically released, and the thrust provided by the limit column 23 to the forward surface is converted into the forward rotational force of the sealing disk 16, thereby controlling the sealing disk 16 to rotate rapidly, so that the second conducting hole 1601 moves to the conducting position with the first conducting hole 1401, so as to separate the gas on the interception side.

[0048] When the helium separation is completed, under the action of the cylinder 12, the trapped side gas continues to be compressed, and the follower disk 26 continues to move relative to it, so that the limit block 2602 moves into the second spiral groove 903 to reverse the rotating rod 9. Since the pitch of the second spiral groove 903 is smaller than the pitch of the first spiral groove 902, the trapped side pressure only needs to be increased a little, and the rotating rod 9 can be rotated to the initial angle. In addition, since the inclination angle of the forward rotating surface is smaller than the inclination angle of the reverse rotating surface, the resistance provided to the rotating rod 9 by the limit column 23 and the forward rotating surface is also small, so as to ensure that the sealing disk 16 can be reset when the pressure increase is small.

[0049] Preferably, by different inclination angles of the two inclined surfaces of the inclined block 17, different rotational resistances can be provided to the rotating rod 9 in cooperation with the limiting column 23, so as to realize automatic adjustment of the conduction state of the separation membrane 11 according to the pressure change in the cavity on the interception side, which can not only enhance the separation effect of helium, but also ensure that when gas is discharged under high pressure, the separation membrane 11 is controlled to be in a blocked state, so as to protect the separation membrane 11.

[0050] A membrane helium purification system comprises the membrane helium purification device.

[0051] A membrane helium purification method comprises the following steps: Step 1: The gas to be purified is transported into the separation tank 2, and under the action of the booster mechanism, the clamping ring 10 and the separation membrane 11 are controlled to slide axially along the separation tank 2; Step 2: Under the action of the clamping ring 10 and the separation membrane 11, the pressure in the separation tank 2 is increased, thereby driving the trigger discharge mechanism to move, so as to control the rotation of the rotating rod 9; Step 3: Under the action of the rotating rod 9, the conduction impact mechanism is controlled to move. When the pressure in the separation tank 2 reaches the set value, the conduction impact mechanism controls the gas in the separation tank 2 to impact on the separation membrane 11; Step 4: After the purification is completed, the booster mechanism continues to move, and under the action of the pressure, the control triggers the discharge mechanism to move, so that the separation tank 2 is turned on to discharge the residual gas in the separation tank 2.

[0052] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

[0053] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. A membrane helium purification device, comprising: A purifier, and two separation tanks fixed to the side wall of the purifier, wherein the two separation tanks are connected to each other through a first delivery pipe; It is characterized by further comprising: A rotating rod is rotatably mounted in the separation tank, the rotating rod is axially slidably provided with a clamping ring which is sealingly and slidably connected with the separation tank, and a separation membrane is fixed on the clamping ring; a trigger discharge mechanism, which is disposed in the separation tank and connected to the rotating rod, and is used to drive the rotating rod to rotate when the pressure in the separation tank increases, and discharge the residual gas; The boosting mechanism is arranged in the separation tank, and a conductive impact mechanism is arranged on the boosting mechanism. The conductive impact mechanism can form a pressure difference on both sides of the separation membrane when the boosting mechanism moves, and when the pressure in the separation tank reaches a set threshold, control the gas to impact toward the separation membrane.

2. A membrane helium purification device according to claim 1, characterized in that: The boosting mechanism includes an air supply disk fixed on the clamping ring, the side wall of the air supply disk is formed with an arc groove, a sliding block is slidably installed in the arc groove, a sealing disk tightly fitted with the air supply disk is fixed on the sliding block, and the air supply disk and the sealing disk are respectively formed with first conducting holes and second conducting holes that are equidistantly distributed around the circumference and are interconnected and cooperate with each other.

3. A membrane helium purification device according to claim 2, characterized in that: The boosting mechanism further comprises a cylinder fixed on the separation tank, and a push plate fixedly connected to the clamping ring is fixed on the telescopic end of the cylinder.

4. A membrane helium purification device according to claim 2, characterized in that: The conduction impact mechanism comprises an inclined block fixed on the sealing disk, the rotating rod axially slides with a rotating sleeve rotatably connected to the air supply disk, and a supporting ring is fixed on the rotating sleeve.

5. A membrane helium purification device according to claim 4, characterized in that: The conductive impact mechanism also includes a support sleeve fixed on the support ring, a support rod axially sliding in the support sleeve, a movable plate fixed to the end of the support rod, a limit column fixed on the movable plate that abuts against the tilting block, a first spring is sleeved on the support sleeve and the support rod, and two ends of the first spring abut against the support ring and the movable plate respectively.

6. A membrane helium purification device according to claim 1, characterized in that: The trigger discharge mechanism comprises a guide column fixed in the separation tank, and a fixing ring is fixed on the guide column; It also includes a blocking component and a guiding component which are arranged on the guide column and are used to adjust the conduction state of the separation tank and drive the rotating rod to rotate.

7. A membrane helium purification device according to claim 6, characterized in that: The blocking assembly comprises a guide sleeve axially sliding along the guide column, the guide sleeve axially slidingly has a follower plate slidably connected to the rotating rod, and the follower plate is formed with an exhaust hole; It also includes a limit ring and a blocking plate fixed on both sides of the guide sleeve, the blocking plate is in abutment with the follower plate, a second spring is sleeved on the guide sleeve, and two ends of the second spring are respectively in abutment with the limit ring and the follower plate.

8. A membrane helium purification device according to claim 7, characterized in that: The guide assembly includes a guide groove formed on the circumferential outer wall of the rotating rod, a limit block slidably engaged with the guide groove is fixed to the inner wall of the follower plate, a third spring is sleeved on the rotating rod, and two ends of the third spring are respectively in contact with the inner wall of the separation tank and the follower plate.

9. A membrane helium purification system, characterized in that: It comprises the membrane helium purification device as claimed in claim 1.

10. A membrane helium purification method, using the membrane helium purification device as claimed in claim 1, characterized in that: The following steps are involved: Step 1: The gas to be purified is transported into the separation tank, and under the action of the booster mechanism, the clamping ring and the separation membrane are controlled to slide along the axial direction of the separation tank; Step 2: Under the action of the clamping ring and the separation membrane, the pressure in the separation tank increases, thereby driving the trigger discharge mechanism to move, so as to control the rotation of the rotating rod; Step 3: Under the action of the rotating rod, the conduction impact mechanism is controlled to move. When the pressure in the separation tank reaches the set value, the conduction impact mechanism controls the gas in the separation tank to impact on the separation membrane; Step 4: When the purification is completed, the booster mechanism continues to move, and under the action of pressure, the control triggers the discharge mechanism to move, so that the separation tank is turned on to discharge the residual gas in the separation tank.

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