Acidic etching liquid waste treatment device
Patent Information
- Application Number
- CN202510534923.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-27
- Publication Date
- 2025-09-19
- Estimated Expiration
- 2045-04-27
AI Technical Summary
Existing acid etching liquid waste treatment equipment has a complex structure and a large size, requires additional power, has a risk of leakage during transportation, and has high treatment costs, which cannot meet industrial production needs.
A waste liquid treatment device for acidic etching liquid is designed, which includes a collector and an intermittent rotating component. The waste liquid is sprayed under pressure by a piston rod. Combined with the 90-degree intermittent rotation of the rotating disk and the linkage component, the waste liquid is treated in situ. The evaporation crystallization structure is used to separate copper sulfate and hydrogen chloride, which are collected and reused separately.
The waste liquid treatment process is simplified, safety and applicability are improved, production costs are reduced, and efficient waste liquid treatment and resource recycling are achieved.
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Figure CN120039965B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of etching, in particular to a device for treating waste acidic etching liquid. Background Art
[0002] Acidic copper sulfate waste liquid is the copper sulfate waste liquid discharged from the electroplating tank during the copper manufacturing process of semiconductor wafers. Its main components are copper sulfate and sulfuric acid. The copper ion content is tens to hundreds of grams per liter, and the weight ratio of sulfuric acid is about 15%. In addition, it also contains a small amount of organic and inorganic additives. Acidic copper sulfate waste liquid belongs to Class HW22 hazardous waste. If it is not effectively treated, it will not only pollute the environment, but also be a waste of resources.
[0003] However, in traditional technology, the waste liquid collection and treatment device and the etching mold are often independent of each other (such as a waste treatment system and a waste treatment method shown in publication number CN110546109B, in which a liquid delivery pump is required to deliver the etching waste liquid stored in the waste liquid storage tank to the reaction tank). It can be seen that in the etching production process, the waste liquid generated needs to be transported to other equipment (such as the reaction tank) for subsequent treatment. During the transportation process, if the staff operates improperly, the waste liquid will not only be at risk of polluting the environment due to pipeline leakage, but the device for waste liquid treatment often requires additional power to meet the waste liquid treatment needs, resulting in a large device with a complex structure. The cost of treating the waste liquid is high and cannot meet the existing industrial production needs well.
[0004] Therefore, in view of this, the existing structural deficiencies are studied and improved, and an acid etching liquid waste liquid treatment device is proposed. Summary of the Invention
[0005] The object of the present invention is to provide an acidic etching liquid waste liquid treatment device to solve the problems raised in the above background technology.
[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solution: an acid etching liquid waste treatment device, comprising a collector and an intermittent rotating component, a powder collecting chamber is opened in the middle of the collector, the intermittent rotating component is arranged inside the powder collecting chamber, the intermittent rotating component comprises a rotating disk, a heating block, a cam column, a fixed sleeve, a trigger cylinder, a toggle pin, a second spring and a lifting wheel, the heating blocks are fixed in an array around the bottom of the rotating disk, and a cam column is coaxially fixed to the center of the bottom of the rotating disk, and the circumferential groove of the cam column is a "W"-shaped closed ring structure, the cam column is rotatably mounted at the top opening of the fixed sleeve through a bearing, and the fixed sleeve is fixed to the inner wall of the powder collecting chamber through a connecting rib, a trigger cylinder is movably mounted at the bottom opening of the fixed sleeve, and a toggle pin that matches the groove on the surface of the cam column is fixed on the inner wall of the trigger cylinder opening, the inner bottom end of the trigger cylinder is elastically connected to the bottom of the cam column with the second spring, and the bottom of the trigger cylinder is rotatably mounted with a lifting wheel.
[0007] Furthermore, a powder collection assembly is provided on the side wall of the powder collection chamber, and the powder collection assembly includes a baffle, a push plate, an electric cylinder and a scraper strip. The shape of the bottom of the baffle is adapted to the inner concave of the rotating disk, and a push plate is horizontally slidably installed in the inner concave of the baffle. The push plate is fixedly connected to the telescopic end of the electric cylinder, and a scraper strip made of elastic rubber is provided at the bottom of the push plate. A powder collection box fixed to the bottom wall of the powder collection chamber is provided on the outer edge of the rotating disk, and the part of the powder collection box close to the rotating disk is flush with the bottom surface of the rotating disk, and the part of the powder collection box away from the rotating disk is higher than the upper surface of the rotating disk.
[0008] Furthermore, a mounting recess is provided at the top side end of the collector, and an etching mold is fixed to the top bolt of the mounting recess, a waste liquid chamber is provided inside the etching mold, and positioning blocks are symmetrically fixed at both ends of the waste liquid chamber opening, and a metal workpiece is placed horizontally on the positioning blocks, a pressurized recovery chamber is provided on the left side of the collector, and a pumping assembly is built into the pressurized recovery chamber, and the pumping assembly includes a pump cylinder, a one-way liquid inlet pipe and a liquid inlet screen barrel, one side of the pump cylinder is connected to a one-way liquid inlet pipe with a one-way valve, and the head end of the one-way liquid inlet pipe is connected to the waste liquid chamber inside the etching mold through the liquid inlet screen barrel.
[0009] Furthermore, the pumping assembly also includes a one-way liquid outlet pipe and a spray pipe. The other side of the pump cylinder is connected to a one-way liquid outlet pipe with a one-way valve, and the end of the one-way liquid outlet pipe is connected to a spray pipe, and the spray pipe is located above the rotating disk surface.
[0010] Furthermore, the pumping assembly also includes a piston rod and a spring 1. The piston rod is slidably installed inside the pump cylinder, and the piston rod consists of a rod body at the top and a disc body fixedly connected to the bottom of the rod body. A spring 1 is elastically connected between the bottom surface of the disc body in the piston rod and the bottom wall of the pump cylinder, and the rod body in the piston rod passes through the pump cylinder and extends to the top of the collector.
[0011] Furthermore, a linkage assembly is placed horizontally at the bottom of the collector, and the linkage assembly includes a crossbeam and a driven wedge. The driven wedges are fixed in the middle and end parts of the crossbeam in a mirror-image manner, and the driven wedge located in the middle of the crossbeam abuts and cooperates with the lifting wheel at the bottom of the trigger cylinder.
[0012] Furthermore, the linkage assembly also includes a driving pin, a connecting rod and a gear rod. The driven wedge located at the end of the beam abuts against the internal inclined groove of the driving pin, and the driving pin is fixed to the piston rod through the connecting rod, and a gear rod is extended and fixed to the end of the beam away from the driving pin.
[0013] Furthermore, a gas collection chamber is opened on the right side of the collector, and a stirring and absorption component is built into the gas collection chamber. The stirring and absorption component includes a solution collection box and an immersion tube. One side of the solution collection box is connected to the powder collection chamber through the immersion tube, and the end of the immersion tube bend is immersed below the liquid surface of the solution collection box.
[0014] Furthermore, the stirring and absorbing assembly also includes a pressure relief pipe and a drainage pipe. The top of the other side of the solution collecting box is connected to the pressure relief pipe, and the bottom of the other side of the solution collecting box is connected to the drainage pipe.
[0015] Furthermore, the stirring and absorbing assembly also includes a stirring rod and a gear. The stirring rod is rotatably installed at the bottom end of the solution collection box through a shaft sleeve, and a gear is coaxially fixed to the bottom end of the stirring rod, and the outer edge teeth of the gear are engaged with the gear rod extending from the end of the beam for transmission.
[0016] The present invention provides an acidic etching liquid waste treatment device, which has the following beneficial effects:
[0017] 1. During the use of this application, during etching, without the need to transfer the etching waste liquid, the waste liquid in the pump cylinder is pressurized by pressing the piston rod downward, so that the waste liquid is sprayed onto the surface of the rotating disk through the spray pipe connected to the end of the one-way liquid outlet pipe, and then the rotating disk is driven to rotate intermittently 90 degrees through the linkage component, so that the waste liquid sprayed on the rotating disk surface has sufficient heating time to allow the internal moisture and hydrogen chloride gas to evaporate, and finally the copper sulfate crystal powder remaining after sufficient drying is collected into the powder collection box by the collection component. This not only reduces the tedious steps of transporting the etching waste liquid, but also simplifies the treatment process of the etching waste liquid, thereby improving the safety and applicability of the etching waste liquid treatment.
[0018] 2. During use of the present invention, the water in the solution collection box can fully absorb hydrogen chloride. The stirring rod is intermittently rotated within the solution collection box, further improving the absorption efficiency of hydrogen chloride by promoting the flow of water within the solution collection box. The waste liquid utilizes the evaporative crystallization structure to achieve the separation of copper sulfate and hydrogen chloride. The copper sulfate and hydrogen chloride are collected by the powder collection box and the solution collection box, respectively. The collected copper sulfate and hydrogen chloride can be reused as raw materials, thereby reducing production costs, protecting the environment, and improving economic benefits.
[0019] 3. During the use of the present invention, during the etching operation, the demoulding process of the upper mold is utilized to suck in the residual etching waste liquid in the etching mold through the one-way liquid inlet pipe, and further the fine waste residue in the waste liquid is filtered out through the liquid inlet screen barrel connected to the head end of the one-way liquid inlet pipe; and during the closing process of the upper mold, the upper mold is moved down to abut the part of the piston rod body extending above the collector, so as to apply pressure to the pump cylinder, and the etching waste liquid sucked in the pump cylinder is pressurized and pumped out through the one-way liquid outlet pipe, and then sprayed onto the surface of the rotating disk through the spray pipe connected to the end of the one-way liquid outlet pipe. The present application links the closing and separating process of the upper mold and the etching mold with the suction and discharge stroke of the pump cylinder, and can link the suction and pressurized discharge operations of the residual etching waste liquid in the etching mold during each closing and separating process, and can synchronously collect and process the waste liquid during the etching operation, without the need for additional equipment to achieve the transportation of the waste liquid, and has stronger applicability. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 Schematic diagram of the overall structure of the device of the present invention;
[0021] Figure 2 It is a schematic cross-sectional structural diagram of the device of the present invention;
[0022] Figure 3 This is a schematic diagram of the structure of the pumping assembly of the present invention;
[0023] Figure 4 This is a schematic diagram of the linkage assembly structure of the present invention;
[0024] Figure 5 This is a schematic diagram of the partial explosion structure of the intermittent rotating assembly of the present invention;
[0025] Figure 6 This is a schematic cross-sectional view of the intermittent rotating assembly of the present invention;
[0026] Figure 7 This is a schematic structural diagram of the stirring absorption component of the present invention;
[0027] Figure 8 For the present invention Figure 2 Enlarged structural diagram at point A in the middle.
[0028] In the figure: 1. Collector; 2. Mounting notch; 3. Etching mold; 4. Waste liquid chamber; 5. Positioning block; 6. Metal workpiece; 7. Pressurized recovery chamber;
[0029] 8. Pumping assembly; 801. Pump cylinder; 802. One-way liquid inlet pipe; 803. Liquid inlet screen barrel; 804. One-way liquid outlet pipe; 805. Spray pipe; 806. Piston rod; 807. Spring 1;
[0030] 9. Linkage assembly; 901. Crossbeam; 902. Driven wedge; 903. Drive pin; 904. Connecting rod; 905. Gear rod;
[0031] 10. Powder collection chamber;
[0032] 11. Powder collection assembly; 1101. Baffle; 1102. Push plate; 1103. Electric cylinder; 1104. Scraper; 12. Powder collection box;
[0033] 13. Intermittent rotating assembly; 1301. Rotating disk; 1302. Heating block; 1303. Cam post; 1304. Fixed sleeve; 1305. Trigger cylinder; 1306. Toggle pin; 1307. Second spring; 1308. Lifting wheel;
[0034] 14. Gas collection chamber;
[0035] 15. Stirring and absorbing assembly; 1501. Solution collecting box; 1502. Immersion tube; 1503. Pressure relief tube; 1504. Drain tube; 1505. Stirring rod; 1506. Gear. DETAILED DESCRIPTION
[0036] The following embodiments of the present invention are described in further detail with reference to the accompanying drawings and examples. The following examples are used to illustrate the present invention but are not intended to limit the scope of the present invention. Example 1
[0037] See also Figures 1 to 8A device for treating waste liquid of acidic etching liquid includes a collector 1 and an intermittent rotating component 13. A powder collecting chamber 10 is opened in the middle of the collector 1. The intermittent rotating component 13 is arranged inside the powder collecting chamber 10. The intermittent rotating component 13 includes a rotating disk 1301, a heating block 1302, a cam column 1303, a fixed sleeve 1304, a trigger cylinder 1305, a toggle pin 1306, a second spring 1307 and a lifting wheel 1308. The heating blocks 1302 are fixed in an array around the bottom of the rotating disk 1301, and a cam column 1303 is coaxially fixed to the center of the bottom of the rotating disk 1301, and the circumferential groove of the cam column 1303 is a "W"-shaped closed ring structure. The cam column 1303 is rotatably mounted at the top opening of the fixed sleeve 1304 through a bearing, and the fixed sleeve 1304 is fixed to the inner wall of the powder collection chamber 10 through connecting ribs. A trigger cylinder 1305 is movably mounted at the bottom opening of the fixed sleeve 1304, and a push pin 1306 that cooperates with the groove on the surface of the cam column 1303 is fixed on the inner wall of the opening of the trigger cylinder 1305. A spring 2 1307 is elastically connected between the bottom end of the inner bottom of the trigger cylinder 1305 and the bottom of the cam column 1303, and a lifting wheel 1308 is rotatably mounted on the bottom of the trigger cylinder 1305.
[0038] Further, see Figures 2 to 4 , a mounting recess 2 is provided at the top side end of the collector 1, and an etching mold 3 is fixed with bolts on the top of the mounting recess 2, a waste liquid chamber 4 is provided inside the etching mold 3, and positioning blocks 5 are symmetrically fixed at both ends of the opening of the waste liquid chamber 4, and a metal workpiece 6 is placed horizontally on the positioning blocks 5, a pressurized recovery chamber 7 is provided on the left side of the collector 1, and a pumping assembly 8 is built into the pressurized recovery chamber 7, the pumping assembly 8 includes a pump cylinder 801, a one-way liquid inlet pipe 802 and a liquid inlet screen barrel 803, one side of the pump cylinder 801 is connected to a one-way liquid inlet pipe 802 with a one-way valve, and the head end of the one-way liquid inlet pipe 802 is connected to the waste liquid chamber 4 inside the etching mold 3 through the liquid inlet screen barrel 803, specifically, the liquid inlet screen barrel 803 and the head end of the one-way liquid inlet pipe 802 are threadedly connected; and the liquid inlet screen barrel 803 and the etching mold 3 are rotatably connected; in addition, the liquid inlet screen barrel 803 consists of a barrel cover and a barrel body, and the barrel cover is sealed and plugged into the top of the barrel body.
[0039] During the specific operation, the staff can manually rotate the liquid inlet screen barrel 803 and the one-way liquid inlet pipe 802 to separate them, and then separate the barrel cover from the barrel body to pour out the waste residue inside the liquid inlet screen barrel 803.
[0040] The pumping assembly 8 also includes a one-way liquid outlet pipe 804 and a spray pipe 805. The other side of the pump cylinder 801 is connected to the one-way liquid outlet pipe 804 with a one-way valve, and the end of the one-way liquid outlet pipe 804 is connected to the spray pipe 805, and the spray pipe 805 is located above the surface of the rotating disk 1301. The pumping assembly 8 also includes a piston rod 806 and a spring 807. The piston rod 806 is slidably installed inside the pump cylinder 801, and the piston rod 806 consists of an upper rod body and a disc body fixedly connected to the bottom of the rod body. A spring 807 is elastically connected between the bottom surface of the disc body in the piston rod 806 and the bottom wall of the pump cylinder 801, and the rod body in the piston rod 806 passes through the pump cylinder 801 and extends to the receiving end. Above the collector 1, a linkage assembly 9 is placed horizontally at the bottom of the collector 1. The linkage assembly 9 includes a crossbeam 901 and a driven wedge 902. The driven wedge 902 is fixed in the middle and end of the crossbeam 901 in a mirror-image manner, and the driven wedge 902 located in the middle of the crossbeam 901 abuts against the lifting wheel 1308 at the bottom of the trigger cylinder 1305. The linkage assembly 9 also includes a driving pin 903, a connecting rod 904 and a gear rod 905. The driven wedge 902 located at the end of the crossbeam 901 abuts against the internal inclined groove of the driving pin 903, and the driving pin 903 is fixed to the piston rod 806 through the connecting rod 904, and a gear rod 905 is extended and fixed to the end of the crossbeam 901 on the side away from the driving pin 903.
[0041] The specific operations are as follows: Figure 3 The driving pin 903 shown in the figure is at the end of its stroke, and the connection between the connecting rod 904 and the piston rod 806 has sufficient height clearance from the pump cylinder 801 to meet the lifting requirements. On the one hand, during the demolding process of the upper mold, the piston rod 806 in the pump cylinder 801 is lifted and reset under the elastic force of the spring 807, and then the etching waste liquid remaining in the etching mold 3 is sucked in through the one-way liquid inlet pipe 802, and the fine waste residue in the waste liquid is further filtered out through the liquid inlet screen barrel 803 connected to the head end of the one-way liquid inlet pipe 802.
[0042] On the other hand, during the closing process of the upper mold, the upper mold abuts against the piston rod 806 and extends to the part above the collector 1 and applies pressure to the pump cylinder 801, so that the etching waste liquid sucked into the pump cylinder 801 is pressurized and pumped out by the one-way liquid outlet pipe 804, and then sprayed onto the surface of the rotating disk 1301 through the spray pipe 805 connected to the end of the one-way liquid outlet pipe 804. The present application links the closing and opening process of the upper mold and the etching mold 3 with the suction and discharge stroke of the pump cylinder 801, and can link the suction and pressurized discharge operations of the residual etching waste liquid in the etching mold 3 during each closing and opening process, and can simultaneously collect and process the waste liquid during the etching operation, without the need for additional equipment to achieve the transportation of the waste liquid, and has stronger applicability.
[0043] The specific operation is as follows: in this application, a driving pin 903 is bound to the "T"-shaped structure of the piston rod 806 through the connecting rod 904. In this way, during each mold closing process of the upper mold, not only the waste liquid in the pump cylinder 801 is pressurized and pumped by the descending piston rod 806, but also the driven wedge 902 at one end of the beam 901 is pressed against and pressed by the inclined groove opened by the driving pin 903 that descends together with the piston rod 806, and then the driven wedge 902 at the other end of the beam 901 is displaced along the length direction by the beam 901. 902 abuts against a lifting wheel 1308 rotatably mounted on the bottom of the trigger cylinder 1305 via a bracket. During the lifting process of the trigger cylinder 1305, the toggle pins 1306 at both ends of its opening move within the grooves on the surface of the cam column 1303 rotating in the fixed sleeve 1304. Thanks to the groove arrangement of the circumferential "W"-shaped closed ring structure of the cam column 1303, the cam column 1303 and the coaxial rotating disk 1301 on its top are synchronously driven to achieve 90-degree intermittent rotation during each lifting process of the trigger cylinder 1305.
[0044] Specifically, the intermittent rotational power of the rotating disk 1301 of the present application comes from the downward pressure on the piston rod 806 during the closing process of the upper mold. Not only is the waste liquid in the pump cylinder 801 pressurized by the downward pressure of the piston rod 806, so that the waste liquid is sprayed onto the surface of the rotating disk 1301 by the spray pipe 805 connected to the end of the one-way liquid outlet pipe 804, but the displacement drive of the crossbeam 901 is realized by the driving pin 903 that moves synchronously with the piston rod 806, and then the ninety-degree intermittent rotation of the lower rotating disk 1301 is driven by the linkage component 9, so that the waste liquid sprayed on the surface of the rotating disk 1301 is left with sufficient heating time to allow the internal moisture and hydrogen chloride gas to evaporate, and the remaining copper sulfate crystal powder is gathered by the scraper 1104 in the powder collection box 12 after being fully dried. The process-oriented design has strong applicability.
[0045] In the present application, a heating block 1302 is fixed on the bottom surface of the rotating disk 1301. The heating block 1302 is electrically heated. The ninety-degree intermittent rotation of the rotating disk 1301 allows sufficient heating time for the waste liquid sprayed on the top surface of the rotating disk 1301, so that the moisture and hydrogen chloride gas in the waste liquid evaporate, and the copper sulfate crystals in the waste liquid precipitate and remain on the surface of the rotating disk 1301. As the rotating disk 1301 rotates intermittently ninety degrees, the crystals are brought to the powder collection box 12.
[0046] The rotating disk 1301 of the present application adopts a bowl-shaped structure with a slight depression in the middle, which can prevent the powder after the waste liquid is dried from being thrown out from the edge of the disk under the action of centrifugal force during intermittent rotation. In addition, the rotating disk 1301 does not rotate continuously, but only rotates intermittently by ninety degrees each time. The material itself is not easy to separate from the edge of the disk under the action of centrifugal force. Example 2
[0047] Furthermore, if Figure 2 and Figure 8 As shown, a powder collecting assembly 11 is provided on the side wall of the powder collecting chamber 10, and the powder collecting assembly 11 includes a baffle 1101, a push plate 1102, an electric cylinder 1103 and a scraper 1104. The bottom shape of the baffle 1101 is adapted to the concave of the rotating disk 1301, and the push plate 1102 is horizontally slidably installed in the inner recess of the baffle 1101. The push plate 1102 is fixedly connected to the telescopic end of the electric cylinder 1103, and a scraper 1104 made of elastic rubber is provided at the bottom of the push plate 1102. A powder collecting box 12 fixed to the bottom wall of the powder collecting chamber 10 is provided on the outer edge of the rotating disk 1301, and the part of the powder collecting box 12 close to the rotating disk 1301 is flush with the bottom surface of the rotating disk 1301, and the part of the powder collecting box 12 away from the rotating disk 1301 is higher than the upper surface of the rotating disk 1301.
[0048] The present application provides a powder collecting assembly 11 at the powder unloading station of the rotating disk 1301, and a push plate 1102 that can slide horizontally and is driven by an electric cylinder 1103 is provided on the inner side of the baffle 1101. A scraper 1104 made of elastic rubber is provided at the bottom of the push plate 1102, which automatically adapts to the concave arc surface and can accurately deliver the powder into the powder collection box 12 for collection. The powder is shaken by elastic force to reduce surface adhesion.
[0049] As an optimization, when the push plate 1102 translates toward the powder collection box 12, the bottom scraper 1104 contacts the rotating disk 1301 to push the powder. During the reverse translation, the scraper 1104 does not contact the rotating disk 1301. This application ensures that the gap between the bottom of the scraper 1104 and the upper surface of the rotating disk 1301 is controlled to 1-3mm (with floating adjustment based on powder particle size) to ensure that the scraper 1104 does not directly rub against the upper surface of the rotating disk 1301 during reset, preventing some uncollected powder from being brought back to the surface of the rotating disk 1301.
[0050] See also Figure 7A gas collecting chamber 14 is provided on the right side of the collector 1, and a stirring and absorbing component 15 is built into the gas collecting chamber 14. The stirring and absorbing component 15 includes a solution collecting box 1501 and an immersion tube 1502. Specifically, a one-way valve is installed on the immersion tube 1502 to prevent the liquid in the solution collecting box 1501 from flowing back. One side of the solution collection box 1501 is connected to the powder collection chamber 10 through an immersion tube 1502, and the bent end of the immersion tube 1502 is immersed below the liquid level of the solution collection box 1501. The stirring and absorption assembly 15 also includes a pressure relief pipe 1503 and a drainage pipe 1504. The top of the other side of the solution collection box 1501 is connected to the pressure relief pipe 1503, and the bottom of the other side of the solution collection box 1501 is connected to the drainage pipe 1504. The stirring and absorption assembly 15 also includes a stirring rod 1505 and a gear 1506. The stirring rod 1505 is rotatably mounted on the bottom end of the solution collection box 1501 through a shaft sleeve, and the gear 1506 is coaxially fixed to the bottom end of the stirring rod 1505. The outer edge teeth of the gear 1506 are meshed with the gear rod 905 extending from the end of the crossbeam 901 for transmission.
[0051] The specific operation is as follows: as the waste liquid is sprayed into the spray pipe 805, the pressure in the pressurized recovery chamber 7 increases. Therefore, the hydrogen chloride gas generated by the volatilization of the waste liquid will enter the liquid surface of the solution collection box 1501 through the immersion pipe 1502 under the action of positive pressure. The hydrogen chloride can be fully absorbed by the water in the solution collection box 1501. In addition, the present application further extends and fixes a gear rod 905 at the end of the beam 901 away from the driving pin 903. In this way, when the beam 901 moves along the length direction, the stirring rod 15 The outer edge teeth of the coaxial gear 1506 at the bottom of 05 are engaged with the gear rod 905 extending from the end of the beam 901, driving the stirring rod 1505 to rotate intermittently in the solution collection box 1501, and further improving the absorption efficiency of hydrogen chloride by promoting the flow of water in the solution collection box 1501. The present application is provided with a pH sensor in the solution collection box 1501. When the pH value of the water in the solution collection box 1501 is less than three, the original water can be discharged from the drain pipe 1504, and new water can be replaced to resume the absorption work.
[0052] A pressure relief pipe 1503 is also provided above the solution collection box 1501. As the water temperature rises, excess water vapor can be discharged through the pressure relief pipe 1503. The above-mentioned drain pipe 1504 and the pressure relief pipe 1503 are both provided with valves. The waste liquid of this application is subjected to the evaporation crystallization structure to achieve the separation of copper sulfate and hydrogen chloride. The copper sulfate and hydrogen chloride are collected by the powder collection box 12 and the solution collection box 1501 respectively. The collected copper sulfate and hydrogen chloride can be reused as raw materials, thereby reducing production costs, protecting the environment and improving economic benefits. The rotational power of the stirring rod 1505 in the solution collection box 1501 also comes from the downward pressure on the piston rod 806 during the upper mold closing process, and then the power transmission is realized through the linkage component 9. There is no need to add an additional power mechanism to drive the stirring rod 1505 to rotate. The linkage between the various structures in the device is strong, the structure is compact and the applicability is strong.
[0053] In summary, when using the acidic etching liquid waste liquid treatment device, the metal workpiece 6 to be etched is placed on the positioning block 5, and then the upper mold is fitted with the etching mold 3, and the etching liquid is continuously sprayed by the liquid spray head in the upper mold to etch the metal workpiece 6. After the processing of one metal workpiece 6 is completed, the upper mold stops spraying the etching liquid and resets. At this time, the metal workpiece 6 after etching is taken out, and a new metal workpiece 6 is placed therein, and the upper mold is moved down again and the etching liquid is sprayed. When the above process is repeated to achieve continuous etching of the metal workpiece 6, on the one hand, during the demoulding process of the upper mold, the piston rod 806 in the pump cylinder 801 is lifted and reset under the elastic force of the spring 1 807, and then the residual etching waste liquid in the etching mold 3 is sucked in through the one-way liquid inlet pipe 802, and further connected to the first end of the one-way liquid inlet pipe 802. The liquid inlet screen barrel 803 filters out fine waste residue in the waste liquid, and the waste residue is retained in the etching mold 3 for separate collection and disposal. On the other hand, during the upper mold closing process, the upper mold abuts against the rod body of the piston rod 806 extending to the part above the collector 1 and applies pressure to the pump cylinder 801, and the etching waste liquid sucked into the pump cylinder 801 is pressurized and pumped out by the one-way liquid outlet pipe 804, and then sprayed onto the surface of the rotating disk 1301 through the spray pipe 805 connected to the end of the one-way liquid outlet pipe 804. The present application links the closing and separating process of the upper mold and the etching mold 3 with the suction and discharge stroke of the pump cylinder 801, and can link the suction and pressurized discharge operations of the residual etching waste liquid in the etching mold 3 during each closing and separating process, and can synchronously collect and process the waste liquid during the etching operation, without the need for additional equipment to achieve the transportation of the waste liquid, and has stronger applicability.
[0054] In the present application, a driving pin 903 is bound to the "T"-shaped structure of the piston rod 806 through a connecting rod 904. In this way, during each mold closing process of the upper mold, not only the waste liquid in the pump cylinder 801 is pressurized and pumped by the descending of the piston rod 806, but also the driven wedge block 902 at one end of the crossbeam 901 is abutted and pressed by the inclined groove opened by the driving pin 903 that descends together with the piston rod 806. Then, through the displacement of the crossbeam 901 along the length direction, the driven wedge block 902 at the other end of the crossbeam 901 is abutted and matched with the lifting wheel 1308 installed by the bracket at the bottom of the trigger cylinder 1305. During the lifting process of the trigger cylinder 1305, the toggle pins 1306 at both ends of its opening are located in the grooves on the surface of the cam column 1303 rotating in the fixed sleeve 1304, and then, during each lifting process of the trigger cylinder 1305, the cam column 1303 and the coaxial rotating disk 1301 at its top are synchronously driven to achieve ninety-degree intermittent rotation.
[0055] In the present application, a heating block 1302 is fixed on the bottom surface of the rotating disk 1301. The ninety-degree intermittent rotation of the rotating disk 1301 provides sufficient heating time for the waste liquid sprayed on the top surface of the rotating disk 1301, so that the moisture and hydrogen chloride gas in the waste liquid are volatilized, and the copper sulfate crystals in the waste liquid are precipitated and remain on the surface of the rotating disk 1301. As the rotating disk 1301 rotates intermittently at ninety degrees, the crystals are brought to the powder collection box 12, and then the powder is collected into the powder collection box 12 by the powder collection component 11.
[0056] The intermittent rotational power of the rotating disk 1301 of the present application comes from the downward pressure on the piston rod 806 during the closing process of the upper mold. Not only is the waste liquid in the pump cylinder 801 pressurized by the downward pressure of the piston rod 806, so that the waste liquid is sprayed onto the surface of the rotating disk 1301 by the spray pipe 805 connected to the end of the one-way liquid outlet pipe 804, but the displacement drive of the crossbeam 901 is realized by the driving pin 903 that moves synchronously with the piston rod 806, and then the ninety-degree intermittent rotation of the lower rotating disk 1301 is driven by the linkage component 9, so that the waste liquid sprayed on the surface of the rotating disk 1301 is left with sufficient heating time to allow the internal moisture and hydrogen chloride gas to evaporate. The remaining copper sulfate crystal powder is gathered by the scraper 1104 in the powder collection box 12 after being fully dried, and the process-oriented design has strong applicability.
[0057] The hydrogen chloride gas generated by the volatilization of the waste liquid enters below the liquid surface of the solution collection box 1501 through the immersion tube 1502 , and the hydrogen chloride can be fully absorbed by the water in the solution collection box 1501 .
[0058] In addition, the present application further extends and fixes a gear rod 905 at the end of the beam 901 away from the driving pin 903. In this way, when the beam 901 moves along the length direction, the outer edge teeth of the coaxial gear 1506 at the bottom end of the stirring rod 1505 engage with the gear rod 905 extending from the end of the beam 901 for transmission, driving the stirring rod 1505 to rotate intermittently in the solution collection box 1501, thereby further improving the absorption efficiency of hydrogen chloride by promoting the flow of water in the solution collection box 1501.
[0059] When the pH value of the water in the solution collection box 1501 is less than three, the original water can be discharged from the drain pipe 1504 and replaced with new water to restart the absorption work. A pressure relief pipe 1503 is also provided above the solution collection box 1501, and excess water vapor can be discharged through the pressure relief pipe 1503.
[0060] The waste liquid of the present application is subjected to the evaporation crystallization structure to achieve the separation of copper sulfate and hydrogen chloride. The copper sulfate and hydrogen chloride are collected respectively by the powder collection box 12 and the solution collection box 1501. The collected copper sulfate and hydrogen chloride can be reused as raw materials, thereby reducing production costs, protecting the environment and improving economic benefits. The rotational power of the stirring rod 1505 in the solution collection box 1501 also comes from the downward pressure of the piston rod 806 during the upper mold closing process, and then the power transmission is realized by the linkage component 9. There is no need to add an additional power mechanism to drive the stirring rod 1505 to rotate. The linkage between the various structures in the device is strong, the structure is compact and the applicability is strong.
[0061] The embodiments of the present invention are presented for purposes of illustration and description and are not intended to be exhaustive or to limit the invention to the disclosed forms. Many modifications and variations will be apparent to those skilled in the art. The embodiments are chosen and described in order to better illustrate the principles of the invention and its practical application and to enable those skilled in the art to understand the invention and design various implementations with various modifications as suited for specific applications.
Claims
1. A waste liquid treatment device for acidic etching liquid, characterized in that: The invention comprises a collector (1) and an intermittent rotating assembly (13), wherein a powder collecting chamber (10) is provided in the middle of the collector (1), and the intermittent rotating assembly (13) is arranged inside the powder collecting chamber (10). The intermittent rotating assembly (13) comprises a rotating disk (1301), a heating block (1302), a cam column (1303), a fixed sleeve (1304), a trigger cylinder (1305), a toggle pin (1306), a second spring (1307) and a lifting wheel (1308), wherein the heating blocks (1302) are fixed in an array around the bottom of the rotating disk (1301), and the cam column (1303) is coaxially fixed to the center of the bottom of the rotating disk (1301), and the circumferential groove of the cam column (1303) is "W" shaped and closed. The cam column (1303) is rotatably mounted on the top opening of the fixed sleeve (1304) through a bearing, and the fixed sleeve (1304) is fixed to the inner wall of the powder collecting chamber (10) through a connecting rib. A trigger cylinder (1305) is movably mounted at the bottom opening of the fixed sleeve (1304), and a toggle pin (1306) that matches the surface groove of the cam column (1303) is fixed on the inner wall of the opening of the trigger cylinder (1305). A spring 2 (1307) is elastically connected between the bottom end of the inner side of the trigger cylinder (1305) and the bottom of the cam column (1303), and a lifting wheel (1308) is rotatably mounted on the bottom of the trigger cylinder (1305). A pressurized recovery chamber (7) is opened on the left side of the collector (1). The recovery chamber (7) is equipped with a pumping assembly (8), the pumping assembly (8) comprising a pump cylinder (801), a one-way liquid inlet pipe (802) and a liquid inlet screen barrel (803), one side of the pump cylinder (801) being connected to a one-way liquid inlet pipe (802) provided with a one-way valve, and the head end of the one-way liquid inlet pipe (802) being connected to the waste liquid chamber (4) inside the etching mold (3) through the liquid inlet screen barrel (803), the pumping assembly (88) further comprising a one-way liquid outlet pipe (804) and a spray pipe (805), the other side of the pump cylinder (801) being connected to a one-way liquid outlet pipe (804) provided with a one-way valve, and the end of the one-way liquid outlet pipe (804) being connected to the spray pipe (805), and the spray pipe (805) being located on the surface of the rotating disk (1301). The pumping assembly (8) further includes a piston rod (806) and a spring (807). The piston rod (806) is slidably mounted inside the pump cylinder (801). The piston rod (806) is composed of a rod body at the top and a disc body fixedly connected to the bottom of the rod body. A spring (807) is elastically connected between the bottom surface of the disc body in the piston rod (806) and the bottom wall of the pump cylinder (801). The rod body in the piston rod (806) passes through the pump cylinder (801) and extends to the top of the collector (1). A linkage assembly (9) is horizontally placed at the bottom of the collector (1). The linkage assembly (9) includes a crossbeam (901) and a driven wedge (902). The driven wedge (902) is fixed to the middle and end of the crossbeam (901) in a mirror-like manner.The driven wedge (902) located in the middle of the crossbeam (901) is in contact with the lifting wheel (1308) at the bottom of the trigger cylinder (1305), and the linkage assembly (9) further includes a driving pin (903), a connecting rod (904) and a gear rod (905). The driven wedge (902) located at the end of the crossbeam (901) is in contact with the internal inclined groove of the driving pin (903), and the driving pin (903) is fixed to the piston rod (806) through the connecting rod (904), and the crossbeam A gear rod (905) is fixed to the end of (901) on one side away from the driving pin (903). The stirring and absorbing assembly (15) further includes a stirring rod (1505) and a gear (1506). The stirring rod (1505) is rotatably mounted on the bottom end of the solution collection box (1501) through a shaft sleeve, and a gear (1506) is coaxially fixed to the bottom end of the stirring rod (1505). The outer edge teeth of the gear (1506) are meshed with the gear rod (905) extending from the end of the beam (901) for transmission.
2. A waste acid etching liquid treatment device according to claim 1, characterized in that: The side wall of the powder collection chamber (10) is provided with a powder collection assembly (11), and the powder collection assembly (11) includes a baffle (1101), a push plate (1102), an electric cylinder (1103) and a scraper (1104). The bottom shape of the baffle (1101) is adapted to the inner concave of the rotating disk (1301), and the push plate (1102) is horizontally slidably mounted on the inner concave of the baffle (1101). The push plate (1102) is fixedly connected to the telescopic end of the electric cylinder (1103), and a scraper (1104) made of elastic rubber is provided at the bottom of the push plate (1102). The outer edge of the rotating disk (1301) is provided with a powder collection box (12) fixed to the bottom wall of the powder collection chamber (10), and the part of the powder collection box (12) close to the side of the rotating disk (1301) is flush with the bottom surface of the rotating disk (1301).
3. A waste acid etching liquid treatment device according to claim 2, characterized in that, A mounting recess (2) is provided at the top side end of the collector (1), and an etching mold (3) is fixed to the top of the mounting recess (2) by bolts. A waste liquid cavity (4) is provided inside the etching mold (3), and positioning blocks (5) are symmetrically fixed at both ends of the opening of the waste liquid cavity (4), and a metal workpiece (6) is horizontally placed on the positioning blocks (5).
4. A waste acid etching liquid treatment device according to claim 3, characterized in that: A gas collecting chamber (14) is provided on the right side of the collector (1), and a stirring and absorbing assembly (15) is built into the gas collecting chamber (14). The stirring and absorbing assembly (15) comprises a solution collecting box (1501) and an immersion tube (1502). One side of the solution collecting box (1501) is connected to the powder collecting chamber (10) through the immersion tube (1502), and the bent end of the immersion tube (1502) is immersed below the liquid surface of the solution collecting box (1501).
5. The acidic etching liquid waste treatment device according to claim 4, characterized in that: The stirring and absorbing assembly (15) further comprises a pressure relief pipe (1503) and a liquid discharge pipe (1504); the top of the other side of the solution collection box (1501) is connected to the pressure relief pipe (1503), and the bottom of the other side of the solution collection box (1501) is connected to the liquid discharge pipe (1504).
Citation Information
Patent Citations
Etching waste liquid treatment methods
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Copper-containing etching waste liquid recovery device and copper-containing etching waste liquid recovery method
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