Port-coupled ion forming device

Abstract

An embodiment provides an ion forming apparatus coupled to a port, comprising: an ion source in which an output portion communicates with a chamber through a through hole, and which generates ions between an anode electrode and a cathode electrode by using a voltage supplied from a source main body to the anode electrode of the output portion, thereby forming ions in an internal space of the chamber; and a port coupling structure for coupling the ion source outside the chamber to a port provided on one side of the chamber to communicate with the chamber to perform a specific process in the internal space of the chamber.

Description

Technical Field

[0001] This embodiment relates to an ion formation device coupled to a port that eliminates static electricity by forming ions in the internal space of a chamber by coupling an ion source communicating with the chamber to one side of the port of the chamber. Background Art

[0002] There are many reasons for generating static electricity, among which friction, peeling, etc. are the main reasons. The static electricity can be generated in various environments such as solids, liquids, insulators, and conductors. The static electricity generated in this way generates positive charges and negative charges in equal amounts, but in actual processes, due to the difference in the two capacitances of static electricity, static electricity of one polarity is generated in most cases.

[0003] In addition, in the processes of manufacturing electronic devices such as memory elements, flat panel display devices, and integrated circuits, various problems are caused by the generation of static electricity. In particular, foreign matter adheres to the electronic device due to the generation of static electricity, or the pattern is damaged due to the discharge of static electricity.

[0004] Various methods have been proposed to suppress or remove the static electricity, mainly including the method of removing static electricity using an ionization device. The ionization device generates positive ions and negative ions and discharges them into the air. The ions generated thereby neutralize the charged ions of the substrate that generates static electricity, thereby removing the static electricity.

[0005] However, the existing ionization devices have the problem that it is difficult to apply them to a vacuum environment that requires maintaining a high cleanliness because ions are discharged into the air in a non-vacuum environment. Therefore, the existing static electricity elimination process includes two steps: after forming a thin film in a vacuum environment, another static electricity elimination process is performed in a non-vacuum environment.

[0006] The existing static electricity elimination device cannot immediately remove the static electricity generated when forming the thin film because the thin film process and the static electricity elimination process are separated, so there are limitations in preventing damage to components.

[0007] In addition, the existing static electricity elimination device irradiates ions and ion light generated during the ion generation process directly onto the substrate, resulting in damage to the substrate.

[0008] To solve the above problems, it is urgent to develop a static electricity elimination device with higher efficiency and more advanced technology. Summary of the Invention

[0009] Problems to be Solved

[0010] In this context, the purpose of this embodiment is to provide a technology that improves the above problems.

[0011] Another object of this embodiment is a technique for minimizing the impact on the process conditions of the chamber, thereby minimizing the impact on a specific process performed by the electrostatic elimination device in the chamber.

[0012] Another object of this embodiment is to provide a technique for minimizing the modification of the chamber, so that the electrostatic elimination device can be added without replacing the existing chamber.

[0013] Problem solution

[0014] To achieve the above object, an embodiment can provide an ion formation device combined with a port, including: an ion source, an output part is communicated with the chamber through a through hole, and ions are generated between the anode electrode and the cathode electrode by using the voltage of the anode electrode supplied from the source body to the output part, so as to form ions in the internal space of the chamber; and a port combination structure, which combines the ion source located outside the chamber with the port provided on one side of the chamber to communicate with the chamber, so as to perform a specific process in the internal space of the chamber.

[0015] The output part may further include an opening part opened towards one side of the port, and the anode electrode is exposed along the direction of the chamber through the opening part.

[0016] The ion source may not be equipped with a vacuum pump and an ionization gas injection device.

[0017] The cathode electrode may include a central cathode electrode located at the center of the opening part and an edge cathode electrode located at the edge of the opening part.

[0018] The port combination structure may include an area arranged for combining the through hole of the ion source.

[0019] The area where the through hole is arranged may be biased towards the central part or one side of the port combination structure.

[0020] The port combination structure may further include a port combination frame for fixing to the port of the chamber.

[0021] To achieve the above object, another embodiment can provide an ion formation device combined with a port, including: an ion source, an output part is communicated with the chamber through a through hole, and ions are generated between the anode electrode and the cathode electrode by using the voltage of the anode electrode supplied from the source body to the output part, so as to form ions in the internal space of the chamber; and a circular port combination structure, which combines the ion source located outside the chamber with the circular port provided on one side of the chamber to communicate with the chamber, disperses the weight of the ion source and fixes it to the outside of the chamber, so as to perform a specific process in the internal space of the chamber.

[0022] The port coupling structure may include a region arranged to couple a through-hole of the ion source.

[0023] The region where the through-hole is arranged may be biased towards the central portion or one side of the port coupling structure.

[0024] Another embodiment may provide an ion formation device coupled to a port, including: an ion source, an output portion communicating with a chamber through a through-hole, generating ions between an anode electrode and a cathode electrode by using a voltage of the anode electrode supplied from a source body to the output portion, thereby forming ions in an internal space of the chamber; and a port coupling structure, coupling an ion source located outside the chamber to a viewing port provided on one side of the chamber to communicate with the chamber, for observing a specific process performed in the internal space of the chamber; wherein the ion source is biased and coupled to one side of the port coupling structure.

[0025] The chamber provides a space for performing a specific process on an object, and the specific process may include at least one of vacuum PVD (Physical Vapor Deposition) and vacuum CVD (Chemical Vapor Deposition) processes of depositing a material on the object.

[0026] The output portion may further include an opening portion opened towards one side of the viewing port, and the anode electrode is exposed along the chamber direction through the opening portion.

[0027] The ion source may not be provided with a vacuum pump and an ionization gas injection device.

[0028] The cathode electrode may include a central cathode electrode located at the center of the opening portion and an edge cathode electrode located at the edge of the opening portion.

[0029] The port coupling structure may include: a first region provided on one side to arrange a perspective window for an observer to visually observe the internal space of the chamber; and a second region provided on the other side to arrange a through-hole for coupling the ion source.

[0030] The port coupling structure may further include a port coupling frame for fixing the first region and the second region to the chamber.

[0031] The perspective window may adopt a rounded corner design to closely fit with the first region.

[0032] The perspective window may include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires.

[0033] The second region may include an adapter for coupling the ion source to the through-hole.

[0034] The adapter may include a first connection structure combined with the through hole and a second connection structure combined with the output part of the ion source.

[0035] The cross-sectional area of the output part of the ion source combined with the second connection structure may be different from the cross-sectional area of the through hole combined with the first connection structure.

[0036] The first connection structure may include a through hole insertion structure that is provided along the direction of the internal space of the chamber and inserted into the through hole, an output pipe extension structure that extends the output pipe formed inside the through hole insertion structure, and a port connection structure combined with one port of the chamber.

[0037] The outer diameter of the through hole insertion structure may be the same as the inner diameter of the through hole so that the through hole insertion structure is inserted into the inside of the through hole in contact.

[0038] The ions can adjust the output intensity by expanding or shrinking the output direction through the output pipe.

[0039] The first connection structure and the second connection structure may include a plurality of holes to combine the coupling components.

[0040] The first connection structure may include a first sealing member provided opposite to the through hole and made of a flexible material, and the second connection structure may include a second sealing member provided opposite to the output part and made of a flexible material.

[0041] The first connection structure may further include a baffle support structure to mount a baffle along the direction of the internal space of the chamber.

[0042] Another embodiment may provide an ion formation system combined with a port, including: a plurality of ion sources, the output parts of which are communicated with the chamber through through holes, and ions are generated between the anode electrode and the cathode electrode by using the voltage of the anode electrode supplied from the source body to the output part, so as to form ions in the internal space of the chamber; and a plurality of port connection structures, which are combined with the plurality of ion sources located outside the chamber at the observation port provided on one side of the chamber to communicate with the chamber, so as to observe a specific process performed in the internal space of the chamber.

[0043] The plurality of port connection structures may include at least one of the following: a biasing port connection structure in which the ion source is biased and combined on one side; and a central port connection structure in which the ion source is combined at the central part.

[0044] The port connection structure may include: a first area where a perspective window for an observer to visually observe the internal space of the chamber is arranged; and a second area where a through hole for combining the ion source is arranged.

[0045] The port bonding structure may further include a port bonding frame for fixing the first region and the second region to the chamber.

[0046] The first region and the second region of the biasing port bonding structure may be located on opposite sides so that the ion source and the viewing window are in different positions.

[0047] The first region of the central port bonding structure may include a 1-1 region provided with a first viewing window for observing one side of the internal space of the chamber, and a 1-2 region provided with a second viewing window for observing the other side of the internal space of the chamber. The 1-1 region and the 1-2 region may be located in opposite positions.

[0048] The 1-1 region may include a first viewing window bonding frame for fixing the first viewing window to the chamber, and the 1-2 region may include a second viewing window bonding frame for fixing the second viewing window to the chamber.

[0049] The second region of the central port bonding structure may be disposed between the 1-1 region and the 1-2 region.

[0050] The viewing window may adopt a rounded corner design to closely combine with the first region.

[0051] The second region may include an adapter for bonding the ion source to the through hole.

[0052] The adapter may include a first connection structure for bonding to the through hole and a second connection structure for bonding to the output portion of the ion source.

[0053] The cross-sectional area of the output portion of the ion source bonded to the second connection structure may be different from the cross-sectional area of the through hole bonded to the first connection structure.

[0054] Advantages of the Invention

[0055] As described above, according to this embodiment, there is an effect of improving the above problems.

[0056] In addition, according to this embodiment, the influence on the process conditions of the chamber is minimized, thereby minimizing the influence on a specific process performed by the electrostatic elimination device in the chamber.

[0057] Furthermore, according to this embodiment, the modification to the chamber is minimized, so that the electrostatic elimination device can be added without replacing the existing chamber.

[0058] The technical problems to be solved by the present invention are not limited by the above technical issues. For those skilled in the art, other technical issues not mentioned will become clear through the following content. BRIEF DESCRIPTION OF THE DRAWINGS

[0060] Figure 1 A schematic diagram of a chamber providing a space for performing a specific process on an object in a vacuum state;

[0061] Figure 2 A schematic diagram of an ion formation device combined with a chamber according to an embodiment;

[0062] Figure 3 A side cross-sectional view of an ion source according to an embodiment;

[0063] Figure 4 A partial top view of an ion source according to an embodiment;

[0064] Figure 5 A front-side perspective view of a port coupling structure according to the first example;

[0065] Figure 6 A rear-side perspective view of a port coupling structure according to the first example;

[0066] Figure 7 A schematic diagram showing that the viewing window according to the first example has a rounded corner design;

[0067] Figure 8 A schematic diagram showing an adapter included in the second region according to the first example;

[0068] Figure 9 A front-side perspective view of a deflected port coupling structure according to the second example;

[0069] Figure 10 A rear-side perspective view of a deflected port coupling structure according to the second example;

[0070] Figure 11 A schematic diagram showing the state where an adapter is coupled to the deflected port coupling structure according to the second example;

[0071] Figure 12 A perspective view showing an ion formation system coupled to a port according to an embodiment;

[0072] Figure 13 A plan view showing an ion formation system coupled to a port according to an embodiment;

[0073] Figure 14 A front-side perspective view of a circular port coupling structure according to the third example;

[0074] Figure 15 Rear side perspective view of the circular port coupling structure according to the third example;

[0075] Figure 16 Schematic diagram showing the state of the coupling adapter on the circular port coupling structure;

[0076] Figure 17 Schematic diagram showing that the perspective window according to the third example has a rounded corner design;

[0077] Figure 18 Plan view showing an ion formation system coupled to a circular port according to an embodiment; Figure 19 Side view showing an ion formation system coupled to a circular port according to an embodiment.

[0078] *Reference numerals*

[0079] 1: Object

[0080] 10: Chamber

[0081] 20: Service port

[0082] 30: Observation port

[0083] 40: Process port

[0084] 200: Ion formation device

[0085] 210: Ion source

[0086] 211: Source body

[0087] 212: Output section

[0088] 220: Port coupling structure

[0089] 220-1: Deflection port coupling structure

[0090] 221: First region

[0091] 221a: Region 1-1

[0092] 221b: Region 1-2

[0093] 222: Second region

[0094] 223: Port coupling frame

[0095] 224: Perspective window

[0096] 224a: First perspective window

[0097] 224b: Second perspective window

[0098] 225: Perspective window coupling frame

[0099] 225a: First perspective window coupling frame

[0100] 225b: Second perspective window coupling frame

[0101] 226: Through-hole

[0102] 227: Adapter

[0103] 228: First connection structure

[0104] 229: Second connection structure

[0105] 310: Anode electrode

[0106] 320: Cathode electrode

[0107] 322: Central cathode electrode

[0108] 324: Edge cathode electrode

[0109] 326: Cathode electrode connection part

[0110] 330: Output box

[0111] 331: Box joint part

[0112] 332: Coupling component

[0113] 400: Ion formation system coupled to a port Specific embodiments

[0114] Next, some embodiments of the present invention will be described in detail with reference to the exemplary drawings. It should be noted that when assigning labels to the structures in the respective drawings, the same structures are preferably assigned the same labels even in different drawings. In addition, during the detailed description of the present invention, if the specific description of the related publicly known functions or structures is considered to impede the understanding of the present invention, the detailed description thereof will be omitted.

[0115] In addition, when describing the components of the present invention, terms such as first, second, A, B, (a), (b), etc. may be used. These terms are only used to distinguish one component from another, and the nature or order of the corresponding components is not limited by these terms. When a component is described as "connected", "coupled" or "joined" to another component, the component may be directly connected or joined to other components, but other components may also be "connected", "coupled" or "joined" between the components.

[0116] Figure 1 A schematic diagram of a chamber providing a space for performing a specific process on an object in a vacuum state.

[0117] Refer to Figure 1, within the chamber 10, a specific process can be performed on the object 1 under a high vacuum state.

[0118] In the field of process technology, a pressure range of 10-3 to 10-9 Torr is regarded as a high vacuum state. Under a high vacuum state, most air molecules are removed, and collisions between gases and gas molecules in the general sense hardly exist. In addition to the high vacuum state, a medium vacuum state and a low vacuum state can also be distinguished. Among them, the medium vacuum state is generally understood to be within the pressure range of 1 to 10-3 Torr, while the low vacuum state is understood to be within the pressure range of 1 Torr under atmospheric pressure. The medium vacuum state is suitable for evaporation, drying, and certain coating processes, while the low vacuum state is suitable for commercial uses such as vacuum cleaners and vacuum packaging machines.

[0119] In the field of process technology, many processes are carried out under a high vacuum state.

[0120] High vacuum deposition technology is a typical example. High vacuum deposition technology is a technology that evaporates the precursor of the material to be deposited into a gas phase in a vacuum atmosphere, thereby forming a condensed phase of a thin film on the surface of the substrate. This process can be used as a method to transfer materials from one surface to the surface of an object. Since it is carried out in a high vacuum environment, it is also called high vacuum deposition. High vacuum deposition technology can be used in the manufacturing processes of semiconductors, optical coatings, and various sensors and electronic devices, and can be used to highly purify materials or obtain extremely thin coatings.

[0121] Well-known high vacuum depositions include Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), etc. PVD can include the process of physically evaporating materials and transporting the vapor to the object, while CVD can include the process of making the material to be deposited into a gas, placing the gas on the object, and then causing a chemical reaction to carry out the deposition.

[0122] Physical Vapor Deposition (PVD) includes processes such as evaporation, sputtering, ion plating, etc., while Chemical Vapor Deposition (CVD) includes processes such as APVCD, LPCVD, PECVD, HDPCVD, ALCVD, etc.

[0123] A specific process performed inside the chamber 10 according to an example of the present invention may include at least one of vacuum PVD (Physical Vapor Deposition) and vacuum CVD (Chemical Vapor Deposition) processes, preferably vacuum PVD (Physical Vapor Deposition), and more preferably evaporation.

[0124] In addition, an organic deposition process can be performed on the object 1 inside the chamber 10. In the case of the organic deposition process, this process is often carried out under a high vacuum state. In the organic deposition process, it is necessary to maintain a fixed purity of the organic matter, and it may be more advantageous to maintain the purity of the organic matter under a high vacuum state because the interaction with other gases is minimized. In addition, under a high vacuum state, a high-quality coating with the required thickness and structure can also be manufactured, and these characteristics are also beneficial to the organic deposition process. In addition, under a high vacuum state, molecules can move in a one-way straight line from the source to the object 1, and there are fewer collisions or reactions with other gases under a high vacuum state, so the deposition efficiency is high, which is why the process under a high vacuum state is used for the organic deposition process.

[0125] The chamber 10 can be connected to or include a device for maintaining a high vacuum state. For example, the chamber 10 can be connected to a vacuum pump that removes the gas inside the chamber 10 to generate and maintain a vacuum state, and can also include a vacuum gauge for continuously monitoring and measuring the pressure inside the chamber 10.

[0126] In addition, the chamber 10 is not limited to a process chamber, and can also include a non-process chamber, and can also include various chambers operating under a vacuum state.

[0127] To perform a specific process inside the chamber 10, the chamber 10 can be formed with a plurality of ports 20, 30, 40.

[0128] The chamber 10 can be formed with a process port 40. The process port 40 can be a connection point directly related to the specific process performed in the chamber 10. Gases, liquids, or materials required for the specific process can be transferred to the chamber 10 through the process port 40. Or a device for measuring or analyzing the conditions related to the execution of the specific process inside the chamber 10 can be connected to the process port 40. The process port 40 can be customized according to the requirements of the specific process and may be restricted for other uses. For example, the process port 40 can be a port for supplying reaction gases in chemical vapor deposition, a port for supplying target materials in physical vapor deposition, etc.

[0129] The chamber 10 can be formed with a Service Port 20. The process port 20 can be a connection point related to the maintenance and management of the chamber 10. The service port 20 can be used to connect utilities and auxiliary devices, such as a vacuum pump, a cooling system, a power supply device, a vacuum gauge, etc.

[0130] The chamber 10 can be formed with a View Port 30. An administrator can directly observe the process situation inside the chamber 10 with the naked eye through the view port 30. Or a management device (such as a camera or other optical device) can be connected to the view port 30 so that the administrator can remotely monitor the process situation inside the chamber 10. The viewing window included in the view port 30 can be made of materials such as tempered glass, ceramics, industrial diamonds, quartz, industrial sapphires, and reinforced plastics. These materials can withstand extreme environments, such as high vacuum and high temperature, and have high optical transparency. In addition, the view port 30 can also have a sealing structure to prevent vacuum leakage, so as not to affect the high vacuum state inside the chamber 10.

[0131] In Figure 1 the figure, the position of the service port 20 is higher than that of the view port 30, but this is not limited thereto. The service port 20 and the view port 30 can be arranged at different positions.

[0132] A specific process can be performed in the chamber 10 including these structures and devices. At this time, the generation of static electricity on the object 1 can become a problem.

[0133] There are various reasons for the formation of static electricity on the object 1. For example, static electricity may be generated due to the friction between the object 1 and another object; or static electricity may be generated on the object 1 due to the uneven charge distribution caused by deposition or etching in a specific process step; or static electricity may be generated and accumulated due to the role of the insulating layer provided on the object 1 in hindering the movement of charges.

[0134] These static electricity may form a voltage high enough to damage the microstructure of the object 1, or may generate a force that attracts or repels the fine particles in the chamber 10 to the object 1, resulting in process defects, and may also affect the electrical performance of the object 1, reducing the overall performance of the process device.

[0135] To solve these problems, the embodiments of the present specification provide an ion generation device for removing static electricity in the chamber 10, especially the static electricity generated on the object 1. The ion formation device minimizes the influence on the process conditions of the chamber 10, thereby minimizing the influence on the specific process performed by the ion formation device in the chamber 10, and minimizing the modification of the chamber 10, so that the ion formation device can be added without replacing the existing chamber 10.

[0136] The ion formation device can form ions in the chamber 10 by utilizing the high vacuum state of the chamber 10 without additional supply of process gas.

[0137] The ion formation device may include an ion source, and an electric field is formed between the electrodes provided in the ion source. Electrons leaving from one of the electrodes in the ion source are accelerated in the electric field between the electrodes and output, and the accelerated electrons collide with gas molecules in the high vacuum state in the chamber 10, thereby ionizing these gas molecules to form a plurality of ions. In addition, these ions move to the object 1 and eliminate the static electricity formed on the object 1. This phenomenon in the high vacuum state is also called Townsend discharge, but the present invention is not limited thereto.

[0138] The ion formation device does not require additional supply of process gas and does not include a separate vacuum device, so it can minimize the impact on the process conditions of the chamber 10. Further, the ion formation device does not require additional supply of process gas and does not include a separate vacuum device, so it can simplify the structure and minimize the modification to the chamber 10.

[0139] The ion source can be coupled to the access port 20 or the observation port 30 to minimize the modification to the chamber 10.

[0140] Figure 2 It is a schematic diagram of an ion formation device according to an embodiment coupled to a chamber.

[0141] Refer to Figure 2 , the ion formation device 200 may include an ion source 210 and a port coupling structure 220. The port coupling structure 220 can be a device that helps the ion source 210 to be coupled to the observation port 30.

[0142] The port coupling structure 220 may include a first region for providing a viewing window for an observer to visually observe the internal space of the chamber 10 with the naked eye, and a second region for providing a through hole facilitating the coupling of the ion source 210. The first region and the second region can be fixed to the chamber 10 through a port coupling frame.

[0143] The viewing window provided in the first region can adopt a rounded corner design to closely fit with the first region.

[0144] The first region may include a 1-1 region provided with a first viewing window for observing one side of the internal space of the chamber 10, and a 1-2 region provided with a second viewing window for observing the other side of the internal space of the chamber 10. The 1-1 region and the 1-2 region can be located at opposite positions. In addition, the 1-1 region and the 1-2 region may include a viewing window coupling frame for fixing the viewing window to the chamber 10.

[0145] The second region may be disposed between the 1-1 region and the 1-2 region. In addition, the second region may include an adapter for coupling the ion source 210 to the through hole. Here, the adapter may include a first connection structure coupled to the through hole and a second connection structure coupled to the output portion of the ion source 210. Further, the through hole and the output portion of the ion source 210 may have different cross-sectional dimensions.

[0146] In addition, the ion formation device 200 may include a service port coupling structure (not shown) instead of the port coupling structure 220. The service port coupling structure (not shown) may be a device for assisting in coupling the ion source 210 to the service port 20. According to an embodiment, the service port coupling structure (not shown) may not be provided separately, and the function of the service port coupling structure (not shown) may be replaced by a partial structure of the ion source 210.

[0147] Furthermore, the ion formation device 200 may further include a device for adjusting the output direction of the ions so that the ions are formed in the direction of the object 1 performing a specific process.

[0148] The ion formation device 200 may include an adapter that connects one port of the chamber 10 and the ion source 210. Here, the adapter may include a first connection structure coupled to the through hole formed in one port of the chamber and a second connection structure coupled to the output portion exposing the anode electrode. Here, the through hole coupled to the first connection structure and the output portion coupled to the second connection structure may have different cross-sectional dimensions.

[0149] The first connection structure may include a through hole insertion structure that is provided along the direction of the internal space of the chamber 10 and inserted into the through hole, and an output pipe extension structure that extends the output pipe formed inside the through hole insertion structure. Here, the outer diameter of the through hole insertion structure may be the same as the inner diameter of the through hole so that the through hole insertion structure is inserted into the inside of the through hole and contacts.

[0150] In addition, the ions may expand or contract the output direction through the output pipe, thereby adjusting the output intensity.

[0151] The first connection structure and the second connection structure may include a plurality of holes for coupling the coupling members. In addition, the first connection structure may include a sealing member provided opposite to the through hole and made of a flexible material, and the second connection structure may include a sealing member provided opposite to the output portion and made of a flexible material.

[0152] The first connection structure may further include a baffle connection structure for mounting a baffle along the direction of the internal space of the chamber 10. Here, the baffle may be formed in a circular, rectangular, conical, or polygonal shape with at least one groove, and ions may be output along the groove direction. In addition, the baffle and the baffle connection structure may be connected through a baffle connection portion and spaced apart from each other.

[0153] The ion source 210 may include a source body 211 and an output unit 212.

[0154] The source body 211 may include a power supply device. The power supply device may supply a specific voltage to the electrodes provided in the output unit 212. Here, the specific voltage may be a high voltage, which may be a voltage equivalent to several hundred to several thousand volts. The power supply device may receive the high voltage from the outside through a cable and supply it to the electrodes, or may receive a voltage with a level lower than the high voltage from the outside and then supply it to the electrodes after boosting the voltage level through power conversion.

[0155] The source body 211 may be encapsulated in a metal box to prevent electromagnetic waves generated by the power supply device, etc. from spreading to the outside including the chamber 10, etc.

[0156] One side of the output unit 212 facing the service port 20 is open, while all other sides are closed. The output unit 212 may communicate with the chamber 10 in a high-vacuum state through the service port 20 and does not communicate with any other space. For example, the output unit 212 may not communicate with the source body 211 and may not directly communicate with the external space of the chamber 10.

[0157] If the internal space of the chamber 10 maintains a high-vacuum state (e.g., 10-3 to 10-9 Torr, preferably 10-5 to 10-9 Torr), the output unit 212 communicating therewith may also maintain a high-vacuum state. Therefore, the ion formation device according to an embodiment does not require additional supply of process gas and does not include a separate vacuum device, so it can minimize the impact on the process conditions of the chamber 10. Further, the ion formation device according to an embodiment does not require additional supply of process gas and does not include a separate vacuum device, so it can simplify the structure and minimize the modification to the chamber 10.

[0158] In the atmosphere of the high-vacuum state, when the source body 211 provides a specific voltage to the electrodes of the output unit 212, ions may be formed in the internal space of the chamber 10 in a high-vacuum state.

[0159] The ions formed in the internal space of the chamber 10 may contact the object 1 and eliminate the static electricity of the object 1.

[0160] The internal spaces of the chamber 10 and the output section can communicate with each other and share a vacuum state of 10-3 to 10-9 Torr, preferably 10-5 to 10-9 Torr.

[0161] In the chamber 10, specific processes that require a vacuum can be performed. Here, the specific processes can include at least one of vacuum PVD (Physical Vapor Deposition) and vacuum CVD (Chemical Vapor Deposition) processes for depositing materials on the object 1. In addition, the specific processes can also include a vacuum process for depositing organic substances on the object. To perform the specific processes, the chamber 10 can maintain a vacuum state.

[0162] The vacuum state can be 10-3 to 10-9 Torr, preferably 10-5 to 10-9 Torr.

[0163] Since the internal spaces of the chamber 10 and the output section communicate with each other, a vacuum pump and an ionized gas injection device may not be provided.

[0164] The cavity 10 can include a service port 20 for connecting utilities and auxiliary devices and a view port 30 for visually observing the inside of the cavity.

[0165] The output section 212 can also include an opening that is open to one side of the service port 20 or the view port 30, and the chamber 10 and the output section 212 can communicate through the opening. Specifically, the chamber 10 and the output section 212 can be joined by a joining portion provided at the edge of the opening.

[0166] The joining portion can include at least one selected from the group consisting of a service port joining structure (not shown), a port joining structure 220, a box joining portion, a joining member, and a sealing member, and the chamber 10 and the output section 212 can be tightly joined by the joining portion to prevent fluid from flowing in from the outside.

[0167] Figure 3 For the side cross-sectional view of an ion source according to an embodiment, and Figure 4 For a partial schematic view of the top of an ion source according to an embodiment.

[0168] Refer to Figure 3 and Figure 4 , the ion source 210 can include a source body 211 and an output section 212.

[0169] The output section 212 can include an anode electrode 310, a cathode electrode 320, an output box 330, etc.

[0170] The output box 330 may have a structure with a side facing the service port 20 or the observation port 30 open and the remaining sides closed. The output box 330 may have a space for installing the anode electrode 310 and the cathode electrode 320, and may be formed with one side open and the remaining sides closed so as to communicate with the internal space of the chamber in a high vacuum state.

[0171] The output box 330 may include a box engaging portion 331 formed side by side with the chamber frame. The box engaging portion 331 is tightly engaged with the chamber frame through the port coupling structure 220 to prevent the inside of the output box 330 from directly communicating with the external space of the chamber. The box engaging portion 331 may be tightly engaged with the chamber frame by using a coupling member 332 (such as a bolt), and a sealing member (such as an O-ring) is also provided on the engaging surface.

[0172] The anode electrode 310 and the cathode electrode 320 may be installed in the space formed inside the output box 330.

[0173] The cathode electrode 320 may include a central cathode electrode 322, an edge cathode electrode 324, and a cathode electrode connection portion 326, etc. The central cathode electrode 322 may be located at the center of the opening surface of the output box 330. When viewed from the side of the observation port 30, the central cathode electrode 322 may be located at the center of the opening of the observation port 30. The edge cathode electrode 324 may be located at the edge of the opening surface of the output box 330. The edge cathode electrode 324 may be formed along the edge of the opening surface of the output box 330. If the opening surface is circular, the edge cathode electrode 324 may also be circular (hollow doughnut shape).

[0174] The central cathode electrode 322 and the edge cathode electrode 324 may be electrically connected to the cathode electrode connection portion 326 and have the same potential with each other. A magnet may also be provided on the cathode electrode connection portion 326 or inside the central cathode electrode 322 or inside the edge cathode electrode 324. The magnetic field generated by the magnet may affect the movement of electrons emitted by the cathode electrode 320, thereby adjusting the movement direction or movement speed of the electrons.

[0175] The power supply device provided with the source body 211 may supply a specific voltage to the anode electrode 310. In addition, according to the specific voltage, an electric field may be formed between the anode electrode 310 and the cathode electrode 320, and ions may be formed in the internal space of the chamber through this electric field.

[0176] The output unit 212 may not have a separate cooling device or a separate process gas supply device. In the prior art, there is also a case where a separate cooling device combined with the anode electrode is attached to cool the anode electrode. In the ion source 210 according to an embodiment, due to the use of the atmosphere in a high vacuum state, a separate cooling device may not be required, resulting in low power consumption, less heat generation, and no need for a separate cooling device. In addition, in the prior art, a separate process gas supply device is also included to form ions, while in the ion source 210 according to an embodiment, due to the use of the atmosphere in a high vacuum state, ions can be formed without additional supply of process gas.

[0177] The cathode electrode 320 includes a first cathode electrode disposed on one side edge of the opening that is open toward the chamber 10, a third cathode electrode disposed on the other side of the opening edge, and a second cathode electrode disposed at the center of the opening, and determines the output direction of ions according to the electrode spacing between the anode electrode 310 and the cathode electrode 320.

[0178] The ion source 210 can be combined with a port other than the port for a specific process. Specifically, the ion source 210 can be combined with the service port 20 or the observation port 30. The service port 20 and the observation port 30 can be at different heights relative to the object 1. Therefore, it is necessary to adjust the output direction of the ions output from the ion source 210.

[0179] The electrode spacing can include a first electrode spacing between the anode electrode 310 and the first cathode electrode, a second electrode spacing between the anode electrode 310 and the second cathode electrode, and a third electrode spacing between the anode electrode 310 and the third cathode electrode.

[0180] Here, the lengths of at least two of the first electrode spacing, the second electrode spacing, and the third electrode spacing may be different. Thus, ions may be directed to be output in the direction of the cathode electrode where the shortest length among the first electrode spacing, the second electrode spacing, and the third electrode spacing is located.

[0181] In addition, the object 1 is provided at a distance from the ion source 210, and the object 1 is provided on the extension line in the direction of the cathode electrode where the shortest length among the first electrode spacing, the second electrode spacing, and the third electrode spacing is located.

[0182] Preferably, the first electrode spacing is the longest and the third electrode spacing is the shortest. Thus, ions are directed to be output in the direction of the third cathode electrode.

[0183] In addition, the object 1 is provided at a distance from the ion source 210, and the object 1 is provided on the extension line in the direction of the third hidden cathode electrode.

[0184] In the ion forming device 200, the output direction of ions can be determined according to the shape of the edge cathode electrode 324.

[0185] A part of the edge of the edge cathode electrode 324 can be tapered, while the remaining edges can be cylindrical with a fixed thickness. Specifically, in the tapered portion of the edge cathode electrode 324, the edge in the direction toward the output portion 212 has a fixed thickness, while a part of the edge in the direction toward the chamber 10 is thinner. Therefore, ions can be output in the direction toward the tapered portion of the edge cathode electrode 324. In addition, the inclination angle of the tapered portion of the edge cathode electrode 324 can determine the degree of ion diffusion.

[0186] In addition, the edge cathode electrode 324 can be cylindrical, and the inner diameter becomes larger toward the chamber 10. Therefore, the shape of the edge cathode electrode 324 can cause ions to be diffusely output in a flared shape.

[0187] In addition, the edge cathode electrode 324 can have a plurality of coupling grooves in the direction toward the output portion 212.

[0188] The output portion 212 can further include a baffle, and the baffle can be disposed on one surface of the cathode electrode 320 along the ion output direction to prevent ions from directly hitting the object 1. Specifically, the baffle can be disposed on the center cathode electrode 322 along the ion output direction, so that ions are diffused to form ions on the entire surface of the object 1.

[0189] The baffle can be connected through a baffle connection portion to be separated from the center cathode electrode 322. The baffle connection portion can include a baffle connection length adjustment portion for adjusting the length to control the degree of ion diffusion. In addition, the baffle connection portion further includes an inclination unit for adjusting the angle of the baffle to control the output direction of ions. Here, the inclination unit can include a hinge housing, a rotary hinge, and a fixing unit.

[0190] The baffle can be formed in a circular, rectangular, conical, or polygonal shape having at least one groove. At this time, ions can also be output in the direction of the groove.

[0191] The ion forming device 200 can further include an ion sensor for measuring the ion concentration at a position in the internal space of the chamber 10, and the ion sensor is disposed in the internal space of the chamber 10 through a bracket extending in the direction of the internal space of the chamber 10.

[0192] In addition, the ion forming device 200 can include an adapter connecting a port of the chamber 10 and the ion source 210, and the adapter can include a first connection structure coupled to a through hole formed in a port of the chamber, and a second connection structure coupled to the output portion 212 exposing the anode electrode 310.

[0193] The first connection structure may further include a baffle connection structure for mounting the baffle along the direction of the internal space of the chamber 10. In addition, the baffle and the baffle connection structure may be connected through a baffle connection portion to be separated from each other. Here, the ion sensor may be located on one side of the baffle to measure the ion concentration in the internal space of the chamber 10.

[0194] The monitoring cable connected to the ion sensor may be provided along the baffle connection portion. The ion sensor is connected to an ion source control device located outside the chamber 10 through the monitoring cable, and the monitoring cable may be provided through one side of the first connection structure of the adapter.

[0195] The control method for the ion forming device 200 is to measure the ion concentration at a position in the internal space of the chamber 10 by an ion sensor provided in the internal space of the chamber 10, and adjust the voltage level supplied from the source body 211 to the anode electrode 310 according to the measured ion concentration to adjust the generation amount of ions generated from the ion forming device 200.

[0196] If the measured ion concentration is lower than the reference concentration, the voltage level supplied from the source body 211 to the anode electrode 310 may be increased to increase the amount of generated ions. On the contrary, if the measured ion concentration exceeds the reference concentration, the voltage level supplied from the source body 211 to the anode electrode 310 may be restored to the initial value to reduce the amount of generated ions.

[0197] Figure 5 Front side perspective view of the port coupling structure according to the first example, Figure 6 Rear side perspective view of the port coupling structure according to the first example, Figure 7 Schematic diagram showing that the viewing window according to the first example has a rounded corner design, and Figure 8 Schematic diagram showing the adapter included in the second region according to the first example.

[0198] Please refer to Figures 5 to 8 , and the port coupling structure 220 can be seen, which is used to couple the ion source 210 to the viewing port 30 provided on one side of the chamber 10 so as to perform a specific process in the internal space of the chamber 10.

[0199] In addition, the ports provided on one side of the chamber 10 to perform a specific process in the internal space of the chamber 10 include the viewing port 30, the service port 20, and the process port 40. For convenience, the following description will be centered around the viewing port 30. Except for the viewing port 30, the following description also applies to the service port 20, the process port 40, etc.

[0200] The port coupling structure 220 may include a first region 221 for providing perspective windows 224a and 224b to enable an observer to visually observe a first region of the internal space of the chamber 10 with the naked eye, and a second region 222 for providing a through-hole 226 facilitating the coupling of the ion source 210.

[0201] The observation port 30 can serve to provide information for visually observing a specific process that can be performed in the internal space of the chamber 10 and implementing the conditions required for each process. However, if the size of the observation port 30 is large relative to the overall size of the chamber 10, it may be difficult to effectively utilize the space.

[0202] In the present invention, a port coupling structure 220 that can couple other devices to the observation port 30 is provided, so that a part of the overall area of the observation port 30 is used for a purpose different from the existing use.

[0203] The port coupling structure 220 according to the present invention, while maintaining the existing function of providing information for visual observation through the first region 221 where the perspective windows 224a and 224b are arranged, provides another function that can be coupled with other devices through the second region 222 where the through-hole 226 is arranged.

[0204] The port coupling structure 220 may further include a port coupling frame 223 for fixing the first region 221 and the second region 222 to the chamber 10.

[0205] The modification to the chamber 10 can be minimized through the port coupling frame 223, so that other devices can be added without replacing the chamber 10.

[0206] On the other hand, the size of the port coupling frame 223 can be equal to or larger than the observation port 30 to be tightly coupled with the observation port 30. In addition, the port coupling frame 223 can be formed to include the first region 221 and the second region 222, so that the first region 221 and the second region 222 can be simultaneously fixed to the chamber 10.

[0207] The perspective windows 224a and 224b can be designed with rounded corners to be tightly coupled with the first region 221. By providing the perspective windows 224a and 224b with rounded corner designs, the coupling components and sealing components for tightly coupling the perspective windows 224a and 224b in the first region 221 can be effectively coupled to prevent external liquid from entering and maintaining the internal space of the chamber 10 in a vacuum state.

[0208] The first region 221 may include a first 1-1 region 221a where a first viewing window 224a for visually observing one side of the inner space of the chamber 10 is arranged; and a first 1-2 region 221a where a second viewing window 224b for visually observing the other side of the inner space of the chamber 10 is arranged. In addition, the first 1-1 region 221a and the first 1-2 region 221b may be located on opposite sides so as to visually observe one side and the other side of the inner space of the chamber 10 in real time.

[0209] As described above, the first region 221 may serve the existing function of providing information through the observation port 30 to visually observe a specific process that can be performed in the inner space of the chamber 10 and adjust the conditions required for each process in real time. Therefore, even when other devices are combined through the second region 222, the first 1-1 region 221a and the first 1-2 region 221b are located on opposite sides to avoid dead angles, so that the existing function of the observation port 30 can be effectively exerted.

[0210] In addition, in Figure 4 and Figure 5 , although the first 1-1 region 221a and the first 1-221b are arranged left and right, it is not limited thereto, and they may also be arranged up and down or relatively arranged so as to be able to observe the inner space of the chamber 10 without dead angles.

[0211] The viewing windows 224a, 224b may use materials with high durability to ensure that while the inner space of the chamber 10 remains in a vacuum state, the conditions of a specific process will not be changed by the external environment. Specifically, the viewing windows 224a, 224b may include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires, and preferably, the viewing windows 224a, 224b may include ceramics.

[0212] The first 1-1 region 221a may include a first viewing window coupling frame 225a for fixing the first viewing window 224a to the chamber 10, and the first 1-2 region 221b may include a second viewing window coupling frame 225b for fixing the second viewing window 224b to the chamber 10.

[0213] The first viewing window coupling frame 225a and the second viewing window coupling frame 225b may be coupled to one side of the port coupling frame 223 so that the first viewing window 224a and the second viewing window 224b can be simultaneously fixed to the chamber 10.

[0214] Specifically, the port coupling frame 223 can be directly in contact and coupled with the chamber 10, while the first viewing window coupling frame 225a and the second viewing window coupling frame 225b can be coupled to the port coupling frame 223 along the direction of the position where other devices coupled to the port coupling structure 220 are located. Thus, the modification to the chamber 10 is minimized, so that the chamber 10 does not need to be replaced. Among them, other devices coupled to the port coupling structure 220 may include an ion formation device 200.

[0215] The second region 222 can be disposed between the first region 221a and the first region 221b. As described above, the second region can function to connect other devices to the chamber 10 through the viewing port 30. Generally, other devices connected to the chamber 10 can function to control the conditions of a specific process performed in the internal space of the chamber 10. Therefore, it is very important to control the conditions in the internal space of the chamber 10 to be uniform throughout the internal space.

[0216] On the other hand, the viewing port 30 can be provided at the center of one side of the chamber 10 so that the internal space of the chamber 10 can be visually observed with the naked eye, avoiding any dead spots. At this time, by providing the second region 222 between the first region 221a and the first region 221b, the second region 222 can be provided at the center of one side of the chamber 10. Therefore, the conditions in the internal space of the chamber 10 can be controlled by other devices connected to the second region 222 to be uniform throughout the internal space. Among them, other devices coupled to the port coupling structure 220 may include an ion formation device 200.

[0217] The second region 222 may include an adapter 227 for coupling the ion source 210 to the through-hole 226. The adapter 227 can function to tightly couple other devices coupled through the second region 222 to the chamber 10. Specifically, not limited to the chamber, the adapter 227 can also function to tightly couple other devices coupled through the second region 222 to each other without any other modification.

[0218] The adapter 227 may include a first connection structure coupled to the through-hole 226 and a second connection structure coupled to the output portion 212 of the ion source 210.

[0219] The first connection structure may include a through-hole insertion structure that is internally inscribed in the through-hole 226, and the outer diameter of the through-hole insertion structure may be the same as the inner diameter of the through-hole 226. The second connection structure can be coupled to the output portion 212 to communicate the ion formation device 200 with the chamber 10.

[0220] The through-hole 226 and the output portion 212 of the ion source 210 may have different cross-sectional dimensions. Accordingly, the adapter 227 connects the first connection structure to the through-hole 226 and the second connection structure to the output portion 212, so that the through-hole 226 and the output portion 212 can be connected to each other without additional modification even if they have different cross-sectional dimensions.

[0221] Ions generated by supplying a voltage from the source body 211 to the anode electrode 310 can be output to the internal space of the chamber 10 through the through-hole 226. Specifically, even if the through-hole 226 and the output portion 212 of the ion source 210 have different cross-sectional dimensions, they can be connected to each other through the adapter 227, and the ions output from the output portion 212 can pass through the through-hole 226 and be output to the internal space of the chamber 10.

[0222] In addition, the observation port 30 may be installed at the eye level of an observer so that the observer can visually observe the internal space of the chamber 10. Accordingly, the position where the observation port 30 is installed may be at a different height from the position where the object 1 is located. Accordingly, the ion forming device combined with the port according to an embodiment of the present invention may include a device for adjusting the output direction of ions so that the ions are output along the direction of the object 1 on which a specific process is performed. Specifically, as the device for adjusting the output direction of ions, a baffle, a beam director, an electrode shape, etc. may be included.

[0223] Figure 9 is a front-side perspective view of the biasing port coupling structure according to the second example, Figure 10 is a rear-side perspective view of the biasing port coupling structure according to the second example, and Figure 11 is a schematic view showing a state in which an adapter is coupled to the biasing port coupling structure according to the second example.

[0224] Refer to Figures 9 to 11 , the port coupling structure 220 may include a biasing port coupling structure 220-1 that biases the ion source 210 to a side coupled to the port coupling structure 220.

[0225] Specifically, the port coupling structure 220 may include a first region 221 for providing a perspective window so that an observer can visually observe the internal space of the chamber 10 with the naked eye, and a second region 222 for providing a through-hole 226 facilitating the coupling of the ion source 210.

[0226] The observation port 30 may serve to provide information to visually observe a specific process that can be performed in the internal space of the chamber 10 and to implement conditions required for adjusting each process. However, if the size of the observation port 30 is large relative to the overall size of the chamber 10, it may be difficult to effectively utilize the space.

[0227] In the present invention, a port coupling structure 220 is provided that can be coupled with other devices on the observation port 30, so as to use a part of the overall area of the observation port 30 for a purpose different from the existing purpose, thereby improving the space utilization rate.

[0228] While maintaining the existing function of providing information observable with the naked eye through the first area 221 where the perspective window is arranged, the port coupling structure 220 according to the present invention provides other functions that can be coupled with other devices through the second area 222 where the through-hole 226 is arranged.

[0229] In particular, in the case of the biased port coupling structure 220-1, a perspective window 224 with a relatively large area can be installed, so that a specific process that can be performed in the internal space of the chamber 10 can be observed in detail. Further, since a large-area perspective window 224 can be arranged, the process of a large-area object can be reliably performed.

[0230] In addition, in the case of the biased port coupling structure 220-1, the ion source 210 is arranged at a position biased to one side. Therefore, more ions can be generated at a specific position in the internal space of the chamber 10. Therefore, when performing a specific process that may generate uneven static electricity inside the chamber 10, the biased port coupling structure 220-1 can be used to effectively eliminate static electricity.

[0231] The port coupling structure 220 may further include a port coupling frame 223 for fixing the first area 221 and the second area 222 to the chamber 10.

[0232] The modification to the chamber 10 can be minimized through the port coupling frame 223, so that other devices can be added without replacing the chamber 10.

[0233] On the other hand, the size of the port coupling frame 223 can be equal to or larger than the observation port 30 to be tightly coupled with the observation port 30. In addition, the port coupling frame 223 can be formed to include the first area 221 and the second area 222, so that the first area 221 and the second area 222 can be fixed to the chamber 10 simultaneously.

[0234] On the other hand, the perspective window can be designed with rounded corners to be tightly coupled with the first area 221. By providing a perspective window with a rounded-corner design, the coupling components and sealing components for tightly coupling the perspective window in the first area 221 can be effectively coupled to prevent external liquid from entering and keep the internal space of the chamber 10 in a vacuum state.

[0235] The viewing window can be made of materials with high durability to ensure that the internal space of the chamber 10 remains in a vacuum state while the conditions of a specific process are not changed by the external environment. Specifically, the viewing window may include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires, and preferably, the viewing window may include ceramics.

[0236] The first region 221 may include a viewing window coupling frame 225 for fixing the viewing window 224 to the chamber 10. The viewing window coupling frame 225 may be coupled to one side of the port coupling frame 223 to fix the viewing window 224 to the chamber 10.

[0237] Specifically, the port coupling frame 223 may be directly coupled to the chamber 10 in contact, and the viewing window coupling frame 225 may be coupled to the port coupling frame 223 along the direction of the position where other devices coupled to the port coupling structure 220 are located. Thus, the modification to the chamber 10 is minimized, so that the chamber 10 does not need to be replaced. Among them, other devices coupled to the port coupling structure 220 may include an ion formation device 200.

[0238] The second region 222 may function to connect other devices to the chamber 10 through the observation port 30. Generally, other devices connected to the chamber 10 may function to control the conditions of a specific process performed in the internal space of the chamber 10.

[0239] The second region 222 may include an adapter 227 for coupling the ion source 210 to the through hole 226. The adapter 227 may function to tightly couple other devices coupled through the second region 222 to the chamber 10. Specifically, not limited to the chamber, the adapter 227 may also function to tightly couple other devices coupled through the second region 222 to each other without other modifications.

[0240] The adapter 227 may include a first connection structure coupled to the through hole 226 and a second connection structure coupled to the output portion 212 of the ion source 210.

[0241] The first connection structure may include a through hole insertion structure that is internally inscribed in the through hole 226, and the outer diameter of the through hole insertion structure may be the same as the inner diameter of the through hole 226. The second connection structure may be coupled to the output portion 212 to communicate the ion formation device 200 with the chamber 10.

[0242] The through hole 226 and the output portion 212 of the ion source 210 may have different cross-sectional dimensions. Therefore, the adapter 227 connects the first connection structure to the through hole 226 and the second connection structure to the output portion 212, so that even if the through hole 226 and the output portion 212 have different cross-sectional dimensions, they can be connected to each other without other modifications.

[0243] Ions generated by supplying a voltage from the source body 211 to the anode electrode 310 can be output to the internal space of the chamber 10 through the through-hole 226. Specifically, even if the through-hole 226 and the output portion 212 of the ion source 210 have different cross-sectional dimensions, they can be interconnected through the adapter 227, and the ions output from the output portion 212 can pass through the through-hole 226 and be output to the internal space of the chamber 10.

[0244] Figure 12 FIG. is a perspective view showing an ion formation system coupled to a port according to an embodiment, and Figure 13 FIG. is a plan view showing an ion formation system coupled to a port according to an embodiment.

[0245] Refer to Figure 12 and Figure 13 , an ion formation system 400 coupled to a port according to an embodiment may include a plurality of ion sources 210a, 210b, 210c for forming ions inside the chamber 10 and a plurality of port coupling structures 220-1, 220-2 for connecting the plurality of ion sources 210a, 210b, 210c to the chamber 10.

[0246] Specifically, the plurality of ion sources 210a, 210b, 210c can be used to effectively remove static electricity that may be generated by a specific process inside the chamber 10, and the plurality of port coupling structures 220-1, 220-2 can be used to connect the plurality of ion sources 210a, 210b, 210c to the chamber 10.

[0247] Among them, the plurality of port coupling structures 220 may include at least one of the following: a biasing port coupling structure 220-1 in which the ion source 210 is biased and coupled to one side; and a central port coupling structure 220-2 in which the ion source 210 is coupled to the central portion. That is, an ion formation system coupled to a port according to an embodiment can connect the plurality of ion sources 210a, 210b, 210c to the chamber 10 by using only the biasing port coupling structure 220-1, or only the central port coupling structure 220-2, or both the biasing port coupling structure 220-1 and the central port coupling structure 220-2.

[0248] Since the bias port coupling structure 220-1 arranges the ion source 210 to one side, a large amount of ions can be generated in a specific part inside the chamber 10 to eliminate static electricity. Therefore, it can be installed in the corresponding part of the process that may generate static electricity in a specific part. On the contrary, since the central port coupling structure 220-2 can eliminate static electricity by uniformly generating ions inside the chamber 10, it can be installed in the corresponding part that requires uniform elimination of static electricity. Therefore, at least one of the bias port coupling structure 220-1 and the central port coupling structure 220-2 can be flexibly used according to the process executed in the chamber 10 to form an ion formation system 400 coupled to the port.

[0249] Multiple ion sources 210a, 210b, 210c can form ions in the internal space of the chamber 10 because the output part 212 communicates with the chamber 10 through the through hole 226, and ions are generated between the anode electrode 310 and the cathode electrode 320 of the source body 211 at the output part 212.

[0250] Multiple port coupling structures 220-1, 220-2 can connect multiple ion sources 210a, 210b, 210c located outside the chamber 10 to multiple observation ports 30 arranged on one side of the chamber 10 to communicate with the chamber 10, so as to perform a specific process in the internal space of the observation chamber 10.

[0251] On the other hand, the port coupling structure 220 may include a first region 221 for setting a perspective window so that an observer can observe the internal space of the chamber 10 with the naked eye, and a second region 222 for setting a through hole 226 facilitating the coupling of the ion source 210. In addition, the port coupling structure 220 may further include a port coupling frame 223 for fixing the first region 221 and the second region 222 to the chamber 10.

[0252] On the other hand, the first region 221 and the second region 222 of the bias port coupling structure 220-1 are located on opposite sides, so that the ion source 210 and the perspective window 224 can be provided at different positions.

[0253] The first region 221 of the central port coupling structure 220-2 may include a 1-1 region 221a where a first perspective window 224a for observing one side of the internal space of the chamber 10 with the naked eye is arranged; and a 1-2 region 221a where a second perspective window 224b for observing the other side of the internal space of the chamber 10 with the naked eye is arranged. In addition, the 1-1 region 221a and the 1-2 region 221b may be located on opposite sides so as to observe one side and the other side of the internal space of the chamber 10 in real time.

[0254] As described above, the first region 221 can serve the existing function of providing information through the observation port 30 to visually observe a specific process that can be performed in the internal space of the chamber 10 and adjust the conditions required for each process in real time. Therefore, even if other devices are combined through the second region 222 and the 1-1 region 221a and the 1-2 region 221b are located on opposite sides to avoid dead angles, the existing function of the observation port 30 can be effectively exerted.

[0255] The perspective windows 224a and 224b can use materials with high durability to ensure that while the internal space of the chamber 10 remains in a vacuum state, the conditions of a specific process are not changed by the external environment. Specifically, the perspective windows 224a and 224b can include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires, and preferably, the perspective windows 224a and 224b can include ceramics.

[0256] The 1-1 region 221a can include a first perspective window coupling frame 225a for fixing the first perspective window 224a to the chamber 10, and the 1-2 region 221b can include a second perspective window coupling frame 225b for fixing the second perspective window 224b to the chamber 10.

[0257] The first perspective window coupling frame 225a and the second perspective window coupling frame 225b can be coupled to one side of the port coupling frame 223 so that the first perspective window 224a and the second perspective window 224b can be fixed to the chamber 10 simultaneously.

[0258] Specifically, the port coupling frame 223 can be directly in contact with and coupled to the chamber 10, and the first perspective window coupling frame 225a and the second perspective window coupling frame 225b can be coupled to the port coupling frame 223 along the direction of the position where other devices coupled to the port coupling structure 220 are located. Thereby, the modification to the chamber 10 is minimized, and thus the chamber 10 does not need to be replaced. Among them, other devices coupled to the port coupling structure 220 can include an ion formation device 200.

[0259] The second region 222 can be provided between the 1-1 region 221a and the 1-2 region 221b. As described above, the second region can serve the function of connecting other devices to the chamber 10 through the observation port 30. Generally, other devices connected to the chamber 10 can serve the function of controlling the conditions of a specific process performed in the internal space of the chamber 10. Therefore, it is very important to control the conditions in the internal space of the chamber 10 to be uniform throughout the internal space.

[0260] The second region 222 may include an adapter 227 for coupling the ion source 210 to the through-hole 226. The adapter 227 may function to tightly couple other devices coupled through the second region 222 to the chamber 10. Specifically, not limited to the chamber, the adapter 227 may also function to tightly couple other devices coupled through the second region 222 to each other without any other modifications.

[0261] The adapter 227 may include a first connection structure coupled to the through-hole 226 and a second connection structure coupled to the output portion 212 of the ion source 210.

[0262] The first connection structure may include a through-hole insertion structure that is internally inscribed in the through-hole 226, and the outer diameter of the through-hole insertion structure may be the same as the inner diameter of the through-hole 226. The second connection structure may be coupled to the output portion 212 to communicate the ion forming device 200 with the chamber 10.

[0263] The through-hole 226 and the output portion 212 of the ion source 210 may have different cross-sectional dimensions. Therefore, the adapter 227 connects the first connection structure to the through-hole 226 and the second connection structure to the output portion 212, so that even if the through-hole 226 and the output portion 212 have different cross-sectional dimensions, they can be connected to each other without any other modifications.

[0264] Ions generated by supplying a voltage from the source body 211 to the anode electrode 310 may be output through the through-hole 226 to the internal space of the chamber 10. Specifically, even if the through-hole 226 and the output portion 212 of the ion source 210 have different cross-sectional dimensions, they can be connected to each other through the adapter 227, and the ions output from the output portion 212 can pass through the through-hole 226 and be output to the internal space of the chamber 10.

[0265] Figure 14 Is a front-side perspective view of the circular port coupling structure according to the third example, Figure 15 Is a rear-side perspective view of the circular port coupling structure according to the third example, Figure 16 Is a schematic diagram showing the state of the adapter coupled to the circular port coupling structure, and Figure 17 Is a schematic diagram showing that the viewing window according to the third example has a rounded corner design.

[0266] Refer to Figures 14 to 17 , the circular port coupling structure 220 may include a first region 221 for setting a viewing window for an observer to visually observe the internal space of the chamber 10, and a second region 222 for setting a through-hole 226 for facilitating the coupling of the ion source 210.

[0267] The circular observation port 30 can provide information for visually observing a specific process that can be performed in the internal space of the chamber 10, and implement the conditions required for adjusting each process. However, it is necessary to effectively disperse the weights of various devices that can be combined with the outside of the chamber 10 while being fixed to the outside of the chamber 10.

[0268] Therefore, the ion formation device 200 combined with the circular port according to an embodiment of the present invention provides a circular coupling structure 220 that utilizes the circular observation port 30 to effectively disperse the weights of the devices combined with the outside of the chamber 10.

[0269] Specifically, the circular port coupling structure 220 combined with the circular observation port 30 is circular, so that the weight can be evenly dispersed. Therefore, various devices combined with the outside of the chamber 10 can be stably fixed to the chamber 10, so that relatively large and heavy devices can be combined with the port of the chamber 10. For example, in order to be able to remove the static electricity of a large-area object 1 by using a high-capacity ion source 210, the circular port coupling structure 220 can be utilized on the circular observation port 30 to stably fix the ion source 210 to the chamber 10.

[0270] The circular port coupling structure 220 according to the present invention provides other functions that can be combined with other devices through the second region 222 where through holes 226 are arranged while maintaining the existing function of providing information for visual observation through the first region 221 where the perspective window is arranged.

[0271] The circular port coupling structure 220 may further include a circular port coupling frame 223 for fixing the first region 221 and the second region 222 to the chamber 10.

[0272] The modification to the chamber 10 can be minimized through the circular port coupling frame 223, so that other devices can be added without replacing the chamber 10.

[0273] On the other hand, the size of the circular port coupling frame 223 can be equal to or larger than that of the circular observation port 30 to be tightly combined with the circular observation port 30. In addition, the circular port coupling frame 223 can be formed to include the first region 221 and the second region 222, so that the first region 221 and the second region 222 can be simultaneously fixed to the chamber 10.

[0274] In addition, the perspective window can be designed with rounded corners to be tightly combined with the first region 221. By providing a perspective window with a rounded corner design, the coupling components and sealing components for tightly combining the perspective window in the first region 221 can be effectively combined to prevent external liquid from entering and keep the internal space of the chamber 10 in a vacuum state.

[0275] Furthermore, the perspective window can be semi-circular to correspond to the first region. Thus, the perspective window 224 is closely combined with the first region 221, enabling a clear visual observation of the internal space of the chamber 10 without blind spots.

[0276] The perspective window can be made of a material with high durability to ensure that while the internal space of the chamber 10 remains in a vacuum state, the conditions of a specific process are not altered by the external environment. Specifically, the perspective window can include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires. Preferably, the perspective window includes ceramics.

[0277] The first region 221 can include a perspective window coupling frame 225 for fixing the perspective window 224 to the chamber 10. The circular perspective window coupling frame 225 can be coupled to one side of the port coupling frame 223 to fix the perspective window 224 to the chamber 10.

[0278] Specifically, the circular port coupling frame 223 can be directly coupled in contact with the chamber 10, and the perspective window coupling frame 225 can be coupled to the circular port coupling frame 223 along the direction of the position where other devices coupled to the circular port coupling structure 220 are located. This minimizes the modification to the chamber 10, so that the chamber 10 does not need to be replaced. Among them, other devices coupled to the circular port coupling structure 220 can include an ion formation device 200.

[0279] The second region 222 can function to connect other devices to the chamber 10 through the circular observation port 30. Generally, other devices connected to the chamber 10 can function to control the conditions of a specific process performed in the internal space of the chamber 10.

[0280] The second region 222 can include an adapter 227 for coupling the ion source 210 to the through-hole 226. The adapter 227 can function to closely couple other devices coupled through the second region 222 to the chamber 10. Specifically, not limited to the chamber, the adapter 227 can also function to closely couple other devices coupled through the second region 222 to each other without other modifications.

[0281] The adapter 227 can include an extension structure 227a connected to the circular port coupling frame 223 and a connection structure 227b coupled to the output portion 212 of the ion source 210.

[0282] The extension structure 227a is obliquely connected to the circular port coupling frame 223 to adjust the output direction of ions. By adjusting the output direction of ions, more ions can be generated at a specific position in the internal space of the chamber 10. Therefore, when performing a specific process that may generate uneven static electricity inside the chamber 10, the static electricity can be effectively eliminated by adjusting the inclination of the extension structure 227a.

[0283] The extension structure 227a connected to the circular port coupling frame 223 can be inclined at least in one direction among the upper side, lower side, left side, and right side. The inclination direction of the extension structure 227a can be determined by the position of the object 1, a specific process performed in the internal space of the chamber 10, and the like.

[0284] In addition, the inclination direction of the extension structure 227a can be a direction that does not block the installation position of the perspective window 224. For example, in Figure 16 the case of, the extension structure 227a can be inclined at least in one direction among the lower side, left side, and right side, without inclining in the upper side direction where the perspective window 224 is installed. Or, if the perspective window 224 is installed on the lower side, the extension structure 227a can also be inclined at least in one direction among the upper side, left side, and right side.

[0285] The connection structure 227b can include a plurality of holes to couple the coupling members. Thereby, the output portion 212 of the ion source 210 and the adapter 227 can be coupled.

[0286] The connection structure 227b can include a sealing member made of a flexible material disposed opposite to the output portion 212 of the ion source 210. Thereby, the ion source 210 and the chamber 10 are tightly coupled to maintain the internal environments of the chamber 10 and the ion source 210.

[0287] The circular port coupling frame 223 can further include a baffle connection structure 228 to mount a baffle along the direction of the internal space of the chamber 10.

[0288] The baffle can be disposed along the direction of ion output to prevent ions from directly irradiating the object 1. Specifically, a porous baffle can be disposed on one side of the central cathode electrode 322 along the ion output direction, so that the ions are diffused to form ions on the entire surface of the object 1.

[0289] The baffle can be located at the central portion of the through hole 226 that is a channel for ion output to effectively control the ion output direction. Therefore, the baffle connection structure 228 can extend along the central portion direction of the through hole 226 so that the baffle is located at the central portion of the through hole 226.

[0290] In addition, the circular observation port 30 can be installed at the eye level of an observer so that the observer can visually observe the internal space of the chamber 10. Therefore, the position where the circular observation port 30 is installed can be at a different height from the position where the object 1 is located. Therefore, the ion forming device coupled to the circular port according to an embodiment of the present invention can include a device for adjusting the ion output direction so as to output ions along the direction of the object 1 where a specific process is performed. Specifically, as a device for adjusting the ion output direction, it can include a baffle, a beam director, an electrode shape, and the like.

[0291] Figure 18 To show a plan view of an ion formation system incorporated in a circular port according to an embodiment, and Figure 19 To show a side view of an ion formation system incorporated in a circular port according to an embodiment.

[0292] Refer to Figure 18 and Figure 19 According to an embodiment, an ion formation system 400 incorporated in a circular port may include a plurality of ion sources 210a, 210b for forming ions inside a chamber 10 and a plurality of circular port coupling structures 220-1, 220-2 for connecting the plurality of ion sources 210a, 210b to the chamber 10.

[0293] Specifically, the plurality of ion sources 210a, 210b can be used to effectively remove static electricity that may be generated by a specific process inside the chamber 10, and the plurality of circular port coupling structures 220-1, 220-2 can be used to connect the plurality of ion sources 210a, 210b to the chamber 10.

[0294] The circular port coupling structure 220 may include a first region 221 for providing a viewing window so that an observer can visually observe the internal space of the chamber 10, and a second region 222 for providing a through hole 226 that facilitates coupling of the ion source 210.

[0295] The circular port coupling structure 220 coupled to the circular viewing port 30 is circular, so that the weight can be evenly distributed. Therefore, various devices coupled to the outside of the chamber 10 can be stably fixed to the chamber 10, and relatively large and heavy devices can be coupled to the port of the chamber 10. For example, in order to be able to use a high-capacity ion source 210 to remove static electricity from a large-area object 1, the circular port coupling structure 220 can be used on the circular viewing port 30 to stably fix the ion source 210 to the chamber 10.

[0296] The circular port coupling structure 220 may further include a circular port coupling frame 223 for fixing the first region 221 and the second region 222 to the chamber 10.

[0297] The modification to the chamber 10 can be minimized through the circular port coupling frame 223, so that other devices can be added without replacing the chamber 10.

[0298] In addition, the viewing window can be designed with rounded corners to closely fit the first region 221. By providing a viewing window with a rounded corner design, a coupling member and a sealing member for closely fitting the viewing window in the first region 221 can be effectively coupled to prevent external liquid from entering and to keep the internal space of the chamber 10 in a vacuum state.

[0299] Furthermore, the perspective window can be semi-circular to correspond to the first region. Thus, the perspective window 224 is closely combined with the first region 221, so that the internal space of the chamber 10 can be observed visually without dead angles.

[0300] The perspective window can use materials with high durability to ensure that the internal space of the chamber 10 remains in a vacuum state while the conditions of a specific process are not changed by the external environment. Specifically, the perspective window can include at least one selected from the group consisting of ceramics, industrial diamonds, quartz, and industrial sapphires. Preferably, the perspective window can include ceramics.

[0301] The first region 221 can include a perspective window coupling frame 225 for fixing the perspective window 224 to the chamber 10. The circular perspective window coupling frame 225 can be coupled to one side of the port coupling frame 223 so that the perspective window 224 is fixed to the chamber 10.

[0302] Specifically, the circular port coupling frame 223 can be directly in contact with and coupled to the chamber 10, and the perspective window coupling frame 225 can be coupled to the circular port coupling frame 223 along the direction of the position where other devices coupled to the circular port coupling structure 220 are located. Thus, the modification to the chamber 10 is minimized, so that the chamber 10 does not need to be replaced. Among them, other devices coupled to the circular port coupling structure 220 can include an ion formation device 200.

[0303] The second region 222 can function to connect other devices to the chamber 10 through the circular observation port 30. Generally, other devices connected to the chamber 10 can function to control the conditions of a specific process performed in the internal space of the chamber 10.

[0304] The second region 222 can include an adapter 227 for coupling the ion source 210 to the through-hole 226. The adapter 227 can function to closely couple other devices coupled through the second region 222 to the chamber 10. Specifically, not limited to the chamber, the adapter 227 can also function to closely couple other devices coupled through the second region 222 to each other without other modifications.

[0305] The adapter 227 can include an extension structure 227a connected to the circular port coupling frame 223 and a connection structure 227b coupled to the output portion 212 of the ion source 210.

[0306] The extension structure 227a is obliquely connected to the circular port coupling frame 223 to adjust the output direction of ions. By adjusting the output direction of ions, more ions can be generated at a specific position in the internal space of the chamber 10. Therefore, when performing a specific process that may generate uneven static electricity inside the chamber 10, the static electricity can be effectively eliminated by adjusting the inclination of the extension structure 227a.

[0307] The extension structure 227a connected to the circular port coupling frame 223 can be inclined at least in one direction among the upper side, lower side, left side, and right side. The inclination direction of the extension structure 227a can be determined by the position of the object 1, a specific process performed in the internal space of the chamber 10, and the like.

[0308] In addition, the inclination direction of the extension structure 227a can be a direction that does not block the installation position of the perspective window 224. For example, in Figure 16 this case, the extension structure 227a can be inclined at least in one direction among the lower side, left side, and right side, without inclining in the upper side direction where the perspective window 224 is installed. Or, if the perspective window 224 is installed on the lower side, the extension structure 227a can also be inclined at least in one direction among the upper side, left side, and right side.

[0309] In addition, the extension structures 227a of the plurality of ion sources 210a, 210b can be inclined in different directions to further facilitate the adjustment of the ion concentration deviation in the internal space of the chamber 10.

[0310] For example, as in Figure 18 and Figure 19 the plurality of ion sources 210a, 210b, by arranging the extension structures 227a in an inclined manner, ions are generated concentratedly in a specific area in the internal space of the chamber 10, thereby effectively removing a large amount of static electricity generated in a specific area in the internal space of the chamber 10. On the contrary, the extension structures 227a of the plurality of ion sources 210a, 210b are inclined and arranged towards different areas so as to generate fewer ions in a specific area in the internal space of the chamber 10.

[0311] In the above content, terms such as "including", "comprising", or "having", unless there is a contrary record as expected, mean that the corresponding constituent elements can be included, and moreover, other components can also be included instead of excluding other components. Unless otherwise specified, the meanings of all terms, including technical or scientific terms, are the same as those generally understood by those skilled in the technical field to which the present invention belongs. Terms such as those generally used, such as terms defined in a dictionary, have the same meaning as the meaning in the context of the related art, and do not have an ideal or excessive meaning in the present application unless clearly defined.

[0312] The above embodiments are only used to illustrate the present invention and not to limit it. Those of ordinary skill in the art should understand that the present invention can be modified, deformed, or equivalently replaced. Without departing from the spirit and scope of the present invention, they should all be covered within the scope of the claims of the present invention.

Claims

1. An ion forming device coupled to a port, comprising: an ion source, wherein an output portion is connected to the chamber through a through hole, and ions are generated between the anode electrode and the cathode electrode by a voltage supplied from a source body to the anode electrode of the output portion, thereby forming ions in the internal space of the chamber; and The port coupling structure is coupled to the ion source located outside the chamber at a port provided on one side of the chamber to communicate with the chamber so as to perform a specific process in the internal space of the chamber. 2 . The ion forming device combined with a port according to claim 1 , wherein the output portion further comprises an opening portion opened toward one side of the port, and the anode electrode is exposed along the chamber direction through the opening portion.

3. The port-coupled ion forming device of claim 1, wherein the ion source is free of a vacuum pump and an ionized gas injection device. 4 . The port-coupled ion forming device according to claim 2 , wherein the cathode electrode comprises a central cathode electrode located at the center of the opening and an edge cathode electrode located at the edge of the opening. 5 . The port-coupled ion forming device according to claim 1 , wherein the port coupling structure includes a region where a through hole is arranged for coupling the ion source. 6 . The ion forming device coupled to a port according to claim 5 , wherein the region where the through holes are arranged is biased toward a center portion or one side of the port coupling structure. 7 . The ion forming device coupled to a port according to claim 1 , wherein the port coupling structure further comprises a port coupling frame for being fixed to the chamber.

8. An ion forming device coupled to a port, comprising: an ion source, wherein an output portion is connected to the chamber through a through hole, and ions are generated between the anode electrode and the cathode electrode by a voltage supplied from a source body to the anode electrode of the output portion, thereby forming ions in the internal space of the chamber; and A circular port coupling structure is provided on one side of the chamber and is coupled to an ion source located outside the chamber to communicate with the chamber, dispersing the weight of the ion source and fixing it to the outside of the chamber so as to perform a specific process in the internal space of the chamber. 9 . The port-coupled ion forming device according to claim 8 , wherein the port coupling structure includes a region where a through hole is arranged for coupling the ion source. 10 . The ion forming device coupled to a port according to claim 9 , wherein the region where the through holes are arranged is biased toward a center portion or one side of the port coupling structure.

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