Electrolytic nickel cleaning system and electrolytic nickel cleaning method

Abstract

The invention discloses an electrolytic nickel cleaning system and an electrolytic nickel cleaning method.The electrolytic nickel cleaning system comprises a cleaning pool, an electrolytic nickel cleaning device and a controller, the cleaning pool is provided with a containing groove which is open towards the upper side, and the containing groove is used for containing a cleaning medium; the receiving frame is used for receiving the materials; the driving device is installed on the installation support and connected with the receiving frame, and the driving device can be used for driving the receiving frame to rotate around the first axis and driving the receiving frame to ascend and descend in the vertical direction so that the receiving frame can be placed in the containing groove. Therefore, the receiving frame is used for receiving materials (such as a plurality of nickel plates which are arranged in a stacked mode), the driving device is used for driving the position adjustment of the receiving frame so that the receiving frame can be adjusted to the position where the materials can be immersed in the cleaning medium, and the receiving frame is further driven to rotate around the first axis so that swinging of the receiving frame can be achieved; therefore, the materials make full contact with the flowing cleaning medium, the multiple nickel plates can be cleaned at the same time, and then the cleaning efficiency is improved while the nickel plate cleaning effect is improved.

Description

Technical Field

[0001] The present application relates to the technical field of nickel electrowinning, and in particular to an electrolytic nickel cleaning system and an electrolytic nickel cleaning method. Background Art

[0002] Currently, after nickel plates are prepared by electrolysis, it is necessary to remove the electrolyte, crystals, and impurities remaining on the surface of the nickel plates to ensure the quality of the finished electrolytic nickel.

[0003] In the related art, when the nickel plates are cleaned by spraying, the nickel plates are vertically suspended without removing the conductive bar gaskets for rinsing, resulting in insufficient cleaning of the area between the lifting lugs and the conductive bars, and the liquid remaining on the lifting lugs will drip onto the plate body, causing secondary pollution to the surface of the nickel plates; if the nickel plates are horizontally arranged on the conveying equipment and cleaned by spraying, the horizontal rinsing method occupies a large space, and when ensuring the cleaning efficiency of the equipment, the nickel plates stay in the spraying area for a short time, resulting in poor cleaning effect due to short rinsing time and unable to meet the cleaning requirements of the nickel plates; when the nickel plates are cleaned by being statically placed in the cleaning tank, the static nickel plates can only contact the cleaning liquid near them. As the concentration of the liquid around the nickel plates increases, the dissolution effect of the aqueous solution around the nickel plates on the residues weakens, affecting the cleaning effect. At the same time, the overlapping parts between the closely arranged nickel plates do not contact the cleaning liquid sufficiently, resulting in poor cleaning effect of the nickel plates. Summary of the Invention

[0004] The present application aims to at least solve one of the technical problems existing in the prior art. For this reason, an object of the present application is to provide an electrolytic nickel cleaning system, which has good cleaning effect on nickel plates and high cleaning efficiency.

[0005] The present application also provides an electrolytic nickel cleaning method.

[0006] The electrolytic nickel cleaning system according to the first aspect embodiment of the present application includes: a cleaning tank, the cleaning tank has a receiving groove opening upward, and the receiving groove is used to accommodate a cleaning medium; a receiving rack for receiving materials; a mounting bracket and a driving device, the driving device is mounted on the mounting bracket and connected to the receiving rack, and the driving device can be used to drive the receiving rack to rotate around a first axis and drive the receiving rack to lift in the vertical direction, so as to place at least part of the receiving rack in the receiving groove.

[0007] Wherein, after the receiving rack receives the materials, the stacking arrangement direction of a plurality of nickel plates is perpendicular to the first axis. During the cleaning of the materials, the driving device is adapted to drive the receiving rack to drive the materials to swing reciprocally around the first axis within a preset angle range.

[0008] According to some embodiments of the present application, the receiving rack includes: a first bracket having a support seat and adapted to receive the material; a second bracket connected to the driving device and used for installing and fixing the first bracket; wherein, in the projection in the vertical direction, at least a part of the projection of the first bracket falls within the projection of the open end of the receiving groove.

[0009] According to some embodiments of the present application, the first bracket includes: a first limiting portion connected to the support seat and adapted to limit both sides of the material in a first direction; a second limiting portion connected to the support seat and adapted to limit both sides of the material in a second direction; wherein, the first direction and the second direction are perpendicularly arranged.

[0010] According to some embodiments of the present application, the first limiting portion and the second limiting portion protrude from the support surface of the support seat towards the first side in a third direction, and the first bracket is adapted to receive the material on the first side in the third direction.

[0011] According to some embodiments of the present application, the second bracket includes: a first mounting rack arranged in a U shape, and the opening direction of the U shape is the same as the direction in which the first bracket receives the material; a second mounting rack connected to the outside of the opening of the first mounting rack and used for connecting to the driving device.

[0012] According to some embodiments of the present application, the second mounting rack includes: a first connecting arm spaced from the side wall of the first mounting rack, and a avoiding portion for avoiding the cleaning pool is formed between the first mounting rack and the first connecting arm, and the driving device is connected to the side of the first connecting arm away from the first bracket; a second connecting arm arranged in an L shape with the first connecting arm, and the second connecting arm is connected between the first connecting arm and the first mounting rack.

[0013] According to some embodiments of the present application, the driving device includes: a rotating mechanism connected to the receiving rack, and the driving end of the rotating mechanism is connected to the receiving rack and used for driving the receiving rack to rotate; a lifting mechanism installed on the mounting bracket, and the lifting end of the lifting mechanism is connected to the rotating mechanism and used for driving the rotating mechanism to lift.

[0014] According to some embodiments of the present application, the lifting mechanism includes: a driving seat and a driving rod. The driving seat is fixedly engaged with the mounting bracket. The driving rod is telescopically mounted on the driving seat in the vertical direction, and one end of the driving rod outside the driving seat is configured as the lifting end; and / or, the lifting mechanism includes: a guide rail and a guide seat. The guide rail is mounted on the mounting bracket. The guide seat is connected and engaged with the lifting end, and the guide rail is adapted to be in guiding cooperation with the guide seat.

[0015] According to some embodiments of the present application, the rotating mechanism includes: a driving motor for outputting a driving force; a transmission mechanism, and the transmission mechanism is power-connected between the driving motor and the receiving bracket.

[0016] According to some embodiments of the present application, a heating device is provided in the cleaning tank for heating the cleaning medium; and / or, the inner bottom wall of the cleaning tank extends obliquely downward to one side.

[0017] The electrolytic nickel cleaning system according to the embodiments of the present application has at least the following advantages compared with the prior art:

[0018] (1) It can clean the nickel stack composed of multiple stacked nickel plates in the cleaning tank, improve the cleaning effect and efficiency of the nickel plates while enhancing the cleaning effect of the nickel plates. Moreover, the electrolytic nickel cleaning system requires a small floor area during operation, which is convenient for arranging the electrolytic nickel cleaning system in the production line and can improve the space utilization rate.

[0019] (2) In the cleaning tank, multiple nickel plates are immersed in the cleaning medium, and by swinging, a gap is formed between two adjacent nickel plates, enabling the cleaning medium to flow between the nickel plates, thereby cleaning the overlapping and mutually shielded parts between the nickel plates. At the same time, the cleaning medium can be heated by the heating device, which helps to further improve the cleaning effect of the nickel plates.

[0020] (3) The bottom of the cleaning tank is inclined, which can effectively reduce the disturbance of the bottom impurity deposits in the cleaning tank during the swinging hot wash and the removal of the nickel stack, and reduce the possibility of secondary contamination of the already cleaned nickel plates.

[0021] According to the electrolytic nickel cleaning method of the second aspect embodiment of the present application, the electrolytic nickel cleaning method is applied to the above-mentioned electrolytic nickel cleaning system, and the electrolytic nickel cleaning method at least includes the following steps: Step 1: The receiving rack receives the material; Step 2: The driving device drives the receiving rack to move to a first preset position and immerses the material in the cleaning medium; Step 3: The driving device drives the receiving rack to swing periodically back and forth between a second preset position and a third preset position; Step 4: The driving device drives the receiving rack to reset, moves the material above the liquid level of the cleaning medium, and drains the material.

[0022] The advantages of the electrolytic nickel cleaning method compared with the prior art are the same as those of the above-mentioned electrolytic nickel cleaning system, and will not be elaborated here.

[0023] Additional aspects and advantages of the present application will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present application. Description of the Drawings

[0024] The above and / or additional aspects and advantages of the present application will become apparent and be readily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0025] Figure 1 is a schematic structural diagram of an electrolytic nickel cleaning system according to an embodiment of the present application;

[0026] Figure 2 is a schematic diagram of a receiving rack receiving a material according to an embodiment of the present application;

[0027] Figure 3 is a schematic diagram of a lifting mechanism according to an embodiment of the present application;

[0028] Figure 4 is a schematic diagram of the cooperation between a first bracket and a material according to an embodiment of the present application;

[0029] Figure 5 is a cross-sectional view of a cleaning tank according to an embodiment of the present application;

[0030] Figure 6 is a flowchart of an electrolytic nickel cleaning method according to an embodiment of the present application.

[0031] Reference Signs:

[0032] Electrolytic nickel cleaning system 100; Material 200; Nickel plate 201;

[0033] Cleaning tank 1; Accommodating groove 101; Side wall 11; Inner bottom wall 12;

[0034] Receiving rack 2; first support 21; support base 211; first limiting part 212; first arm 2121; second limiting part 213; second arm 2131; second support 22; first mounting bracket 221; second mounting bracket 222; first connecting arm 2221; second connecting arm 2222;

[0035] Mounting bracket 3;

[0036] Drive device 4; rotating mechanism 41; lifting mechanism 42; drive seat 421; drive rod 422; guide rail 423; guide seat 424. Detailed implementation manners

[0037] The embodiments of the present application will be described in detail below. Examples of the embodiments are shown in the drawings, where the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary and are only used to explain the present application and should not be construed as a limitation to the present application.

[0038] Below, refer to Figures 1 - 5 Describe the electrolytic nickel cleaning system 100 according to an embodiment of the present application. The electrolytic nickel cleaning system 100 is used to clean nickel plates to remove residual electrolyte, crystals, impurities, etc. on the surface of the nickel plates to ensure the cleanliness of the nickel plates.

[0039] Among them, nickel plates can be prepared by electrolysis. Electrolytic nickel mainly consists of three parts, namely, a conductive member (such as a conductive rod, etc.), a plate body, and two lifting lugs of the electrolytic conductive plate and the plate body. During electrolysis, an electric current is passed through the conductive member through the lifting lug to the plate body, so that nickel ions in the electrolyte are gradually attached to the plate body under the action of direct current, thereby realizing the preparation of nickel plates. Thus, the surface of the nickel plates prepared by electrolysis is usually attached with electrolyte, crystals, impurities, etc. that need to be removed.

[0040] Refer to Figure 1 , the electrolytic nickel cleaning system 100 according to an embodiment of the present application includes: a cleaning tank 1, a receiving rack 2, a mounting bracket 3, and a drive device 4.

[0041] As Figure 1 shown, the cleaning tank 1 has a receiving groove 101 that is open upward. The receiving groove 101 is used to accommodate a cleaning medium, and the cleaning medium can be used to clean nickel plates. Among them, the above-mentioned "cleaning medium" can be a liquid medium such as water or an aqueous solution, and the type of the cleaning medium is not specifically limited herein.

[0042] Combined with Figure 1 and Figure 2As shown, the receiving rack 2 is used to hold the material 200. The mounting bracket 3 is arranged outside the cleaning tank 1, and the mounting bracket 3 can serve as the mounting carrier for the receiving rack 2. The driving device 4 is installed on the mounting bracket 3 and connected to the receiving rack 2. The driving device 4 can be used to drive the receiving rack 2 to rotate around the first axis and drive the receiving rack 2 to lift in the vertical direction, so that at least part of the receiving rack 2 is placed in the receiving groove 101, so that the material 200 arranged in the receiving rack 2 can be immersed below the liquid level of the cleaning medium, enabling the material 200 to be in full contact with the cleaning medium and realizing the cleaning of the material 200.

[0043] Among them, after the receiving rack 2 holds the material 200, the stacking arrangement direction of multiple nickel plates is perpendicular to the first axis. And during the process of cleaning the material 200, the driving device 4 is adapted to drive the receiving rack 2 to drive the material 200 to swing reciprocally around the first axis within a preset angle range to clean the material 200 and improve the cleaning effect on the material 200.

[0044] It should be noted that the mounting bracket 3 is arranged outside the cleaning tank 1 so that the mounting bracket 3 can fully avoid the open end of the receiving groove 101, and the receiving rack 2 is arranged above the cleaning tank 1, which is convenient for the receiving rack 2 to hold the material 200 and at the same time can enter the receiving groove 101 from the open end of the receiving groove 101.

[0045] Among them, the receiving rack 2 has multiple working positions in the electrolytic nickel cleaning system 100. When the receiving rack 2 needs to hold the material 200, the receiving rack 2 is placed above the cleaning tank 1, and the receiving rack 2 is fully exposed to facilitate the receiving of the material 200 through the receiving rack 2; when the material 200 needs to be cleaned, at least part of the receiving rack 2 extends through the open end of the receiving groove 101, and the material 200 is immersed in the cleaning medium so that the material 200 can be in full contact with the cleaning medium.

[0046] It should be noted that the "material 200" refers to the nickel plates to be cleaned. The number of nickel plates in the material 200 can be multiple, and multiple nickel plates can be placed on the receiving rack 2 in a stacked arrangement to clean multiple stacked nickel plates through the electrolytic nickel cleaning system 100, which helps to improve the cleaning efficiency of the electrolytic nickel cleaning system 100.

[0047] Refer to Figure 4 As shown, by driving the receiving rack 2 to rotate around the first axis through the driving device 4, the cooperation position between the material 200 and the receiving rack 2 can be changed, so that the material 200 can be in full contact with the cleaning medium and the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200 can be improved.

[0048] Specifically, during the process of the driving device 4 driving the receiving rack 2 to swing around the first axis, gaps can be formed between the stacked nickel plates, and the cleaning medium in a liquid state can come into full contact with the surfaces of the nickel plates to clean the crystals and impurities adhering to the surfaces of the nickel plates. Meanwhile, during the swinging process of the driving device 4 driving the receiving rack 2, the cleaning medium flows relative to the surfaces of the materials 200 (i.e., multiple nickel plates) arranged within the receiving position of the receiving rack 2, so that the cleaning medium can have a good flushing effect on the materials 200 and reduce the impurities adhering to the surfaces of the materials 200.

[0049] It should be noted that currently, after nickel plates are prepared by electrolysis, it is necessary to remove the residual electrolyte, crystals, and impurities on the surfaces of the nickel plates to ensure the finished product quality of electrolytic nickel. In related technologies, usually three methods are used to clean the nickel plates. The first method is that the nickel plates are vertically hung on the conductive rods of the chain conveyor by lifting lugs and sent into the spraying area, and the spraying devices in the spraying area flush the surfaces of the nickel plates from above and the sides; the second method is that after the conductive rods are removed, the nickel plates are stacked, and the closely arranged nickel plates are transported to the cleaning pool for cleaning by a transfer trolley; the third method is that after the conductive rods are removed, the nickel plates are horizontally placed on the conveying chain machine and sent into the spraying area, and the spraying devices flush the nickel plates from multiple directions.

[0050] Among them, when the nickel plates are cleaned by the first method above, the nickel plates are flushed in a way of vertically hanging without removing the conductive rod gaskets, resulting in the area between the lifting lugs and the conductive rods not being fully cleaned, and the liquid remaining on the lifting lugs will drip onto the plate body, causing secondary pollution to the surface of the nickel plates; when the nickel plates are cleaned by the second method above, the static nickel plates can only come into contact with the cleaning liquid near them. As the concentration of the liquid around the nickel plates increases, the dissolution effect of the aqueous solution around the nickel plates on the residues weakens, affecting the cleaning effect. At the same time, the overlapping parts between the closely arranged nickel plates do not come into full contact with the cleaning liquid, resulting in poor cleaning effect of the nickel plates; when the nickel plates are cleaned by the third method above, the horizontal flushing method occupies a large space, and when ensuring the cleaning efficiency of the equipment, the nickel plates stay in the spraying area for a short time, and due to the short flushing time, the cleaning effect is poor, unable to meet the cleaning requirements of the nickel plates.

[0051] In this application, the electrolytic nickel cleaning system 100 receives the materials 200 (such as multiple stacked nickel plates) through the receiving rack 2, and adjusts the position of the receiving rack 2 by driving the driving device 4, so as to adjust the receiving rack 2 to a position where the materials 200 can be immersed in the cleaning medium, and further drive the receiving rack 2 to rotate around the first axis to realize the swinging of the receiving rack 2, so that the materials 200 can come into full contact with the flowing cleaning medium, can clean multiple nickel plates simultaneously, and further improve the cleaning effect of the nickel plates while improving the cleaning efficiency.

[0052] Specifically, the driving device 4 selectively immerses the material 200 in the cleaning medium by driving the receiving rack 2 to lift and lower. After the receiving rack 2 receives the material 200, the driving device 4 can drive the receiving rack 2 to descend, so that the receiving rack 2 and the material 200 extend from the open end of the receiving tank 101 and immerse the material 200 in the cleaning medium; when the cleaning of the material 200 in the cleaning tank 1 is completed, the driving device 4 can drive the receiving rack 2 to ascend to take out the material 200 from the cleaning medium, facilitating the draining of the moisture adhering to the surface of the nickel plate.

[0053] Furthermore, the driving device 4 drives the receiving rack 2 to rotate around the first axis to realize the swinging of the receiving rack 2 driving the material 200, so that the cleaning medium flows relative to the material 200, avoiding the influence of too high liquid concentration around the material 200 on the dissolution effect of the cleaning medium on the residues, and being able to realize the position transformation of the material 200 (i.e., multiple nickel plates) on the receiving rack 2 to form gaps between the nickel plates, enabling the nickel plates to be in full contact with the cleaning medium and improving the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200.

[0054] It can be understood that the driving mode of the driving device 4 for the receiving rack 2 can be reciprocating driving within a preset angle range (such as: -22.5° - 22.5°), for example: rotating 22.5° clockwise and then rotating 45° counterclockwise, etc., so that the swinging action of the receiving rack 2 and the material 200 can drive the cleaning medium to flow, thereby improving the contact effect between the material 200 and the cleaning medium.

[0055] Refer to Figure 1 As shown, in some embodiments of the present application, the receiving rack 2 includes a first bracket 21 and a second bracket 22. The first bracket 21 has a support seat 211 for receiving the material 200, and the second bracket 22 is connected to the driving device 4 and is used to install and fix the first bracket 21.

[0056] Among them, in the projection in the vertical direction, at least part of the projection of the first bracket 21 falls within the projection of the open end of the receiving tank 101, so as to ensure that the first bracket 21 for receiving the material 200 can extend into or out of the receiving tank 101 through the open end of the receiving tank 101 in the vertical direction, so as to selectively immerse the material 200 in the cleaning medium.

[0057] Combined with Figure 1 、 Figure 2 and Figure 4 As shown, it can be understood that the first bracket 21 is used to receive the material 200, and when the receiving rack 2 swings, the support seat 211 is placed below the material 200 to support the material 200 through the support seat 211.

[0058] Specifically, the first support 21 is a receiving member for the material 200. The material 200 (such as a stack of nickel plates) can be conveyed to the first support 21 by a transfer device, and the second support 22 is an installation carrier for the first support 21 and is connected to the driving device 4. When the driving device 4 drives the second support 22 to move, the second support 22 can drive the first support 21 to move synchronously.

[0059] Such as Figure 1 And Figure 2 As shown, in a further embodiment of the present application, the first support 21 includes a first limiting portion 212 and a second limiting portion 213. The first limiting portion 212 is connected to the support seat 211, and the first limiting portion 212 can limit both sides of the material 200 in the first direction. The second limiting portion 213 is connected to the support seat 211, and the second limiting portion 213 can limit both sides of the material 200 in the second direction.

[0060] Wherein, the first direction and the second direction are perpendicularly arranged to each other, so that the material 200 can be limited from multiple directions by the first limiting portion 212 and the second limiting portion 213 respectively, improving the restraint effect of the first support 21 on the material 200, and being able to restrain the position transformation of the material 200 within the first support 21 to prevent the material 200 from coming out or falling off during the swinging process of the first support 21.

[0061] Referring to Figure 1 And Figure 2 As shown, in some embodiments of the present application, the first limiting portion 212 and the second limiting portion 213 protrude from the support surface of the support seat 211 toward the first side in the third direction, and the first support 21 can receive the material 200 on the first side in the third direction, so that the material 200 can enter the position matching with the support seat 211 through the first support 21 on the first side in the third direction.

[0062] The above-mentioned "first direction" refers to the arrangement position of the first limiting portion 212 relative to the support seat 211, and the "second direction" refers to the arrangement position of the second limiting portion 213 relative to the support seat 211. That is to say, the reference object for the arrangement positions of the first limiting portion 212 and the second limiting portion 213 is the support seat 211. Wherein, when the driving device 4 drives the receiving frame 2 to be in any position, the first direction is perpendicularly arranged to the first axis, and the second direction is parallel to the first axis.

[0063] It can be understood that since both the first limiting portion 212 and the second limiting portion 213 protrude from the supporting surface, when the material 200 is arranged on the first support 21, the first limiting portion 212 is oppositely arranged with at least a part of the material 200 in the first direction, and the second limiting portion 213 is oppositely arranged with at least a part of the material 200 in the second direction, so as to limit the material 200 through the first limiting portion 212 and the second limiting portion 213.

[0064] Referring to Figure 2 , in a further embodiment of the present application, both the first limiting portion 212 and the second limiting portion 213 can be composed of arm structures. Among them, the length dimension of the arm structure constituting the first limiting portion 212 protruding from the supporting surface in the third direction is not less than the length dimension of the material 200 arranged on the first support 21 in the third direction, so that the arm can play a good supporting role for the material 200.

[0065] Specifically, the first limiting portion 212 is composed of two first arms 2121, and the two first arms 2121 are respectively arranged on both sides of the support seat 211 in the first direction to limit the material 200 in the first direction through the two first arms 2121; the second limiting portion 213 is composed of two second arms 2131, and the two second arms 2131 are respectively arranged on both sides of the support seat 211 in the second direction to limit the material 200 in the second direction through the two second arms 2131.

[0066] It should be noted that the material 200 is composed of a plurality of stacked nickel plates. As Figure 2 and Figure 4 shown, when the material 200 is arranged on the first support 21, the plurality of nickel plates are arranged in sequence in the first direction, and the total thickness dimension of the plurality of nickel plates in the first direction is less than the distance between the two first arms 2121 in the first direction, so that two adjacent nickel plates can be separated when the first support 21 swings around the first axis, and the cleaning medium can be in full contact with the nickel plates, ensuring the cleaning effect of the cleaning medium on the impurities on the surface of the nickel plates; as Figure 2 shown, when the material 200 is arranged on the first support 21, the two second arms 2131 are respectively arranged on both sides of the material 200 in the second direction, and the length dimension of the nickel plate in the second direction is not greater than the distance between the two second arms 2131 in the second direction, so that the nickel plate can be inserted and arranged between the two second arms 2131 in the third direction.

[0067] Preferably, the distance between the two second arms 2131 in the second direction is slightly greater than the size of the nickel plate in the second direction, such as: greater than 2 mm, 3 mm, 4 mm, etc., so that while arranging the material 200 between the two second arms 2131, the second limiting part 213 (i.e., the two second arms 2131) can enhance the restraint effect on the material 200 in the second direction.

[0068] Combined Figure 1 , Figure 2 and Figure 4 As shown in, the driving device 4 is used to drive the receiving rack 2 to change its position relative to the mounting bracket 3 and the cleaning tank 1, so as to adjust the matching state between the receiving rack 2 and the material 200.

[0069] Referring to Figure 4 As shown in Figure a in, the driving device 4 adjusts the first bracket 21 to a position convenient for receiving the material 200, that is, one end of the receiving rack 2 for the material 200 to enter is open to one side in the horizontal direction. When the first bracket 21 maintains the above position, the material 200 can be placed on one first arm 2121 in the first limiting part 212 through the transfer device to receive the material 200 through the first arm 2121, and the material 200 can also be taken out from the first bracket 21 through the transfer device to further transfer the cleaned material 200.

[0070] Referring to Figure 4 As shown in Figure b in, the driving device 4 adjusts the first bracket 21 to a vertical position, that is, one end of the receiving rack 2 for the material 200 to enter is open upward. At this time, the material 200 can be supported by the support seat 211, and the material 200 can be limited by the first limiting part 212 and the second limiting part 213, so as to play a good restraining role in the circumferential direction of the material 200, so as to facilitate driving the first bracket 21 to perform a lifting action through the driving device 4, so as to immerse the material 200 in the cleaning medium or take it out of the cleaning medium through the first bracket 21.

[0071] Referring to Figure 4 As shown in Figure c in, the driving device 4 rotates the first bracket 21 clockwise by a certain angle so that the multiple nickel plates are gradually separated, so that each nickel plate can be fully contacted with the cleaning medium.

[0072] Referring to Figure 4 As shown in Figure d in, after the driving device 4 rotates the first bracket 21 clockwise to a preset angle, the multiple stacked nickel plates are supported on one first arm 2121 in the first direction; Referring to Figure 4 As shown in Figure e in, after the driving device 4 rotates the first bracket 21 counterclockwise to a preset angle, the multiple stacked nickel plates are supported on another first arm 2121 in the first direction.

[0073] Combined Figure 4 As shown in Figures a and b in Figure 4 , the first bracket 21 and the material 200 in Figure a rotate counterclockwise to obtain the postures of the first bracket 21 and the material 200 shown in Figure b. At this time, the first bracket 21 remains vertically arranged, that is, the third direction of the first bracket 21 is parallel to the vertical direction; Combined Figure 4 As shown in Figures b and c in Figure 4 , the first bracket 21 and the material 200 in Figure b rotate clockwise by a certain angle (such as: 10° etc.) to obtain the postures of the first bracket 21 and the material 200 shown in Figure c; Combined Figure 4 As shown in Figures c and d in Figure 4 , the first bracket 21 and the material 200 in Figure c further rotate clockwise to a preset angle (such as: 22.5° etc.) to obtain the postures of the first bracket 21 and the material 200 shown in Figure d. In the above process, multiple nickel plates in the material 200 deflect to the right in sequence, thereby realizing the separation of two stacked nickel plates, so that the contact surface between the two nickel plates can be fully contacted with the cleaning medium; Combined Figure 4 As shown in Figures d and e in Figure 4 , the first bracket 21 and the material 200 in Figure d rotate counterclockwise to a preset angle (such as: -22.5° etc.) to obtain the postures of the first bracket 21 and the material 200 shown in Figure e. In the above process, multiple nickel plates in the material 200 deflect to the left in sequence, thereby realizing the separation of multiple nickel plates in sequence again.

[0074] It should be noted that during the cleaning process of the material 200 by the electrolytic nickel cleaning system 100, the above-mentioned movement mode of the first bracket 21 (i.e., swinging within a preset angle range) can be realized periodically multiple times to improve the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200. Thus, by immersing the material 200 in the cleaning medium and driving the receiving bracket 2 to swing to fully contact multiple nickel plates in the material 200 with the cleaning medium, the cleaning effect of the cleaning medium on the material 200 is improved, and it can meet the simultaneous cleaning of multiple nickel plates, which helps to improve the cleaning efficiency of the material 200.

[0075] Referring to Figure 4 Combined Figure 4 As shown in Figures b, c, and d in Figure 4 , it can be understood that when the material 200 swings from one side to the other side within the first bracket 21, the nickel plates will be opened and closed (opened, fitted) in sequence. The cleaning medium located between the nickel plates will form a pressure difference at the nickel plates and the cleaning medium flowing around them as the gap size between the nickel plates changes. The pressure difference can promote the flow of the cleaning medium between the nickel plates, thereby improving the cleaning effect on the overlapping area where the nickel plates block each other.

[0076] Such as Figure 2As shown, in some embodiments of the present application, the second bracket 22 includes a first mounting bracket 221 and a second mounting bracket 222, the first mounting bracket 221 is arranged in a U-shape, and the opening of the U-shape faces the same direction as the first bracket 21 receiving the material 200, so that the first mounting bracket 221 can avoid the material 200 and the transfer device (such as a mechanical arm, a clamping mechanism, etc.) for conveying the material 200, thereby improving the operating reliability of the electrolytic nickel cleaning system 100. At the same time, the second mounting bracket 222 is connected to the outside of the opening of the first mounting bracket 221, and the second mounting bracket 222 is used to be connected to the driving device 4, so that the second mounting bracket 222 can be driven by the driving device 4 to drive the first mounting bracket 221 to move.

[0077] The first mounting frame 221 is a mounting carrier of the first bracket 21 , and the first bracket 21 is arranged in the U-shaped first mounting frame 221 , so that the strength of the first bracket 21 is further improved through the first mounting frame 221 .

[0078] Combination Figure 1 and Figure 2 As shown, at least part of the second mounting frame 222 is arranged outside the cleaning tank 1, so as to facilitate the second mounting frame 222 to avoid the cleaning tank 1 to prevent the receiving frame 2 from interfering with the wall of the cleaning tank 1 during the position adjustment process.

[0079] like Figure 2 As shown, in a further embodiment of the present application, the second mounting frame 222 includes a first connecting arm 2221 and a second connecting arm 2222, the first connecting arm 2221 is spaced apart from the side wall 11 of the first mounting frame 221, and a avoidance portion for avoiding the cleaning pool 1 is formed between the first mounting frame 221 and the first connecting arm 2221, and the driving device 4 is connected to the side of the first connecting arm 2221 away from the first bracket 21, the second connecting arm 2222 and the first connecting arm 2221 are arranged in an L shape, and the second connecting arm 2222 is connected between the first connecting arm 2221 and the first mounting frame 221.

[0080] Reference Figure 2 As shown, it can be understood that the first connecting arm 2221 and the first mounting frame 221 are arranged at intervals and connected and fixed by the second connecting arm 2222, so that an escape space can be reserved between the first connecting arm 2221 and the first mounting frame 221. In the process of adjusting the position of the receiving frame 2 relative to the cleaning tank 1 by the driving device 4, the escape space can prevent interference between the receiving frame 2 and the cleaning tank 1, thereby improving the operational reliability of the electrolytic nickel cleaning system 100. Among them, the gap size between the first connecting arm 2221 and the first mounting frame 221 is greater than the wall thickness of the cleaning tank 1, so that the wall can extend into the reserved space between the first connecting arm 2221 and the first mounting frame 221 to prevent the cleaning tank 1 from interfering with the downward movement or swinging of the receiving frame 2.

[0081] As Figure 1 shown, in some embodiments of the present application, the driving device 4 includes: a rotating mechanism 41 and a lifting mechanism 42. The rotating mechanism 41 is connected to the receiving rack 2, and the driving end of the rotating mechanism 41 is connected to the receiving rack 2. The rotating mechanism 41 is configured to drive the receiving rack 2 to rotate. The lifting mechanism 42 is installed on the mounting bracket 3, and the lifting end of the lifting mechanism 42 is connected to the rotating mechanism 41. The lifting mechanism 42 is configured to drive the rotating mechanism 41 to lift, and further drive the receiving rack 2 to move synchronously in the vertical direction through the rotating mechanism 41. Thus, the receiving rack 2 is driven by the driving device 4 to perform vertical translation and rotation about the first axis.

[0082] As Figure 1 shown, in some embodiments of the present application, the lifting mechanism 42 includes: a driving seat 421 and a driving rod 422. The driving seat 421 is fixedly engaged with the mounting bracket 3. The driving rod 422 is installed on the driving seat 421 in a vertically telescopic manner. The end of the driving rod 422 located outside the driving seat 421 is configured as a lifting end, and the lifting end is used to connect to the receiving rack 2 to transmit the driving force to the side of the receiving rack 2 through the lifting end.

[0083] It can be understood that the driving seat 421 is configured to output a driving force. Under the driving of the driving seat 421, the driving rod 422 can be driven to lift and lower in the vertical direction to achieve the lifting function of the lifting mechanism 42. Among them, the driving cooperation form between the driving seat 421 and the driving rod 422 can be configured as hydraulic driving, lead screw, etc. For example: the driving seat 421 is configured as a hydraulic cylinder, and the driving rod 422 is configured as a hydraulic rod. Under the driving of the hydraulic cylinder, the hydraulic rod can be driven to extend outwards or retract inwards. The driving method is simple and has good stability.

[0084] Combined with Figure 1 and Figure 3 shown, in some embodiments of the present application, the lifting mechanism 42 further includes: a guide rail 423 and a guide seat 424. The guide rail 423 is installed on the mounting bracket 3. The guide seat 424 is connected and engaged with the lifting end, and the guide rail 423 can be in guiding cooperation with the guide seat 424, so as to be able to guide the lifting action of the lifting end to assist in the position adjustment of the lifting end.

[0085] In some embodiments of the present application, the rotating mechanism 41 includes: a driving motor and a transmission mechanism. The driving motor is configured to output a driving force. The transmission mechanism is power-connected between the driving motor and the receiving rack 2 to transmit the driving force to the receiving rack 2 through the transmission mechanism. Among them, the transmission mechanism can be composed of transmission gears, such as multiple gear pairs, etc.

[0086] It can be understood that the transmission mechanism can be configured as a speed reduction mechanism, so as to achieve speed reduction and torque increase, and improve the driving stability and reliability of the rotating mechanism 41 for the receiving rack 2.

[0087] In some embodiments of the present application, a heating device is provided in the cleaning tank 1. The heating device is used to heat the cleaning medium to increase the temperature of the cleaning medium, improve the dissolution effect of the cleaning medium on the residues on the surface of the nickel plate, and can achieve hot washing of the material 200, which helps to improve the cleaning efficiency of the electrolytic nickel cleaning system 100.

[0088] Among them, the heating device can be configured as a steam heating device. The steam outlet of the steam heating device faces the position of the lifting lug, so as to specifically increase the temperature of the area near the lifting lug in the nickel plate, and the high-temperature steam can drive the cleaning medium to scour the lifting lug, improving the cleaning effect of the cleaning medium on the nickel plate.

[0089] Such as Figure 5 As shown, in some embodiments of the present application, a discharge part is provided on the side wall 11 of the cleaning tank 1. The discharge part is used for discharging the cleaning medium from the accommodating groove 101, and the inner bottom wall 12 of the cleaning tank 1 extends obliquely downward towards the discharge part, so as to effectively reduce the agitation of the impurity precipitates at the bottom of the cleaning tank 1 during the swinging hot washing and taking out of the material 200, and reduce the risk of secondary contamination of the cleaned nickel plate.

[0090] It can be understood that during the cleaning process of the material 200 (such as a nickel stack formed by stacking multiple nickel plates), the impurities washed off from the material 200 will sink to the bottom of the cleaning tank 1. The obliquely arranged inner bottom wall 12 can converge the impurities towards the bottom side of the accommodating groove 101, so as to reduce the influence of the moving receiving rack 2 and the material 200 during movement on the impurities deposited at the bottom of the accommodating groove 101, and effectively prevent the secondary contamination of the cleaned material 200.

[0091] Referring to Figure 5 , in some embodiments of the present application, a sunken groove is formed on the inner bottom wall 12 of the cleaning tank 1. The sunken groove is located on the lower side of the inner bottom wall 12 and is used for accumulating sediments such as impurities, so as to further improve the restraint effect on the sediments deposited at the bottom of the cleaning tank 1.

[0092] In some embodiments of the present application, the cleaning tank 1 is connected with a circulating filtration device. The circulating filtration device is used to purify and circulate the filtration of the cleaning medium in the cleaning tank 1 to filter out impurities and the like in the cleaning tank 1, collect the impurities, and reduce the risk of secondary contamination of the material 200 by the impurities.

[0093] The electrolytic nickel cleaning system 100 according to the embodiments of the present application has at least the following advantages compared with the prior art:

[0094] (1) It can clean the nickel stack composed of multiple stacked nickel plates in the cleaning tank 1, improve the cleaning effect and efficiency of the nickel plates while enhancing the cleaning effect, and the electrolytic nickel cleaning system 100 requires a small floor area during operation, which is convenient for arranging the electrolytic nickel cleaning system 100 in the production line and can improve the space utilization rate at the same time.

[0095] (2) In the cleaning tank 1, multiple nickel plates are immersed in the cleaning medium, and by swinging, a gap is formed between two adjacent nickel plates, enabling the cleaning medium to flow between the nickel plates, thereby cleaning the overlapping parts that block each other between the nickel plates. At the same time, the cleaning medium can be heated by a heating device, which helps to further improve the cleaning effect of the nickel plates.

[0096] (3) The bottom of the cleaning tank 1 is inclined, which can effectively reduce the disturbance of the bottom impurity deposits in the cleaning tank 1 when swinging and washing and taking out the nickel stack, and reduce the possibility of secondary contamination of the already cleaned nickel plates.

[0097] According to the electrolytic nickel cleaning method of the embodiment of the present application, the electrolytic nickel cleaning method is applied to the above-mentioned electrolytic nickel cleaning system 100, and the electrolytic nickel cleaning method at least includes the following steps: Step 1: The receiving rack 2 receives the material 200; Step 2: The driving device 4 drives the receiving rack 2 to move to the first preset position and immerses the material 200 in the cleaning medium; Step 3: The driving device 4 drives the receiving rack 2 to swing periodically between the second preset position and the third preset position; Step 4: The driving device 4 drives the receiving rack 2 to reset, moves the material 200 above the liquid level of the cleaning medium, and drains the material 200. Thus, the above-mentioned electrolytic nickel cleaning system 100 cleans the material 200 through the electrolytic nickel cleaning method, ensuring the cleaning effect while improving the cleaning efficiency.

[0098] It can be understood that the electrolytic nickel cleaning system 100 can perform the above steps to achieve the cleaning of the material 200 (the nickel stack formed by stacking multiple nickel plates).

[0099] Among them, before receiving the material 200 by the receiving rack 2, it is necessary to adjust the receiving rack 2 to a position suitable for docking with the transfer device through the driving device 4, such as: maintaining Figure 4 the posture shown in Figure a. It should be noted that during the above adjustment process, the adjustment actions of the driving device 4 include the lifting adjustment of the height position of the receiving rack 2 and the rotation adjustment of the orientation of the receiving rack 2 (i.e., rotating around the first axis) to facilitate receiving the material 200 by the receiving rack 2.

[0100] After the receiving rack 2 receives the material 200, the receiving rack 2 can be adjusted to the first preset position through the driving device 4, such as: maintaining Figure 4The attitude shown in Figure b in the middle is such that the receiving port of the first support 21 is opened upward, and the material 200 can be fully immersed below the liquid level of the cleaning medium to ensure the contact and cooperation effect between the material 200 and the cleaning medium. It should be noted that during the above adjustment process, the adjustment actions of the driving device 4 include the lifting adjustment of the height position of the receiving rack 2 and the rotational adjustment of the orientation of the receiving rack 2 (i.e., rotation around the first axis).

[0101] Further, the driving device 4 drives the receiving rack 2 so that the receiving rack 2 can be in a periodic reciprocating swing between a second preset position (such as: Figure 4 the attitude shown in Figure d in the middle) and a third preset position ( Figure 4 the attitude shown in Figure e in the middle). Thus, the material 200 is fully cleaned.

[0102] After the material 200 is cleaned, the driving device 4 drives the receiving rack 2 to reset, so that the material 200 is adjusted to a position higher than the liquid level of the cleaning medium to facilitate the draining of the material 200. At the same time, the receiving rack 2 is located at a position where it can be docked with the transfer device, and the material 200 can be further transferred by the transfer device, so as to facilitate the further processing of the material 200, such as: packing and weighing, etc.

[0103] It should be noted that during the draining process of the material 200, auxiliary means such as a blowing device and a drying device can be used, which are not specifically limited herein. Among them, the completion of cleaning can be determined based on the cleaning time of the electrolytic nickel cleaning system 100, such as: resetting the receiving rack 2 after reaching the preset cleaning time.

[0104] The advantages of the electrolytic nickel cleaning method according to the embodiments of the present application compared with the prior art are the same as those of the above-mentioned electrolytic nickel cleaning system 100, and will not be elaborated herein.

[0105] In the description of the present application, it should be understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present application.

[0106] In the description of the present application, the "first feature" and "second feature" may include one or more of such features.

[0107] In the description of the present application, the meaning of "a plurality" is two or more.

[0108] In the description of the present application, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, or may include the first and second features not being in direct contact but being in contact through additional features therebetween.

[0109] In the description of the present application, a first feature being "on", "above", or "over" a second feature includes the first feature being directly above and obliquely above the second feature, or merely indicating that the horizontal height of the first feature is higher than that of the second feature.

[0110] In the description of this specification, descriptions with reference to terms such as "one embodiment", "some embodiments", "schematic embodiments", "examples", "specific examples", or "some examples", etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0111] Although the embodiments of the present application have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. An electrolytic nickel cleaning system, characterized in that: include: A cleaning tank, wherein the cleaning tank has a receiving tank open to the upper side, and the receiving tank is used to receive the cleaning medium; A receiving rack, the receiving rack is used to receive materials, the materials are nickel stacks formed by stacking multiple nickel plates; A mounting bracket and a driving device, wherein the driving device is mounted on the mounting bracket and connected to the receiving frame, and the driving device can be used to drive the receiving frame to rotate around a first axis and drive the receiving frame to rise and fall in a vertical direction, so as to place at least part of the receiving frame in the receiving groove; wherein, After the receiving rack receives the material, the stacking arrangement direction of the plurality of nickel plates is arranged perpendicular to the first axis, and during the process of cleaning the material, the driving device is suitable for driving the receiving rack to drive the material to swing back and forth around the first axis within a preset angle range.

2. The electrolytic nickel cleaning system according to claim 1, characterized in that: The receiving frame comprises: A first bracket, the first bracket having a support seat and used for receiving the material; A second bracket, the second bracket is connected to the driving device and is used to install and fix the first bracket; wherein, In the vertical projection, at least a portion of the projection of the first bracket falls within the projection of the open end of the accommodating groove.

3. The electrolytic nickel cleaning system according to claim 2, characterized in that: The first bracket comprises: A first limiting portion, the first limiting portion is connected to the support seat and is suitable for limiting the two sides of the material in a first direction; The second limiting portion is connected to the support seat and is suitable for limiting the two sides of the material in the second direction; wherein, The first direction and the second direction are arranged perpendicular to each other.

4. The electrolytic nickel cleaning system according to claim 3, characterized in that: The first limiting portion and the second limiting portion are arranged to protrude from the supporting surface of the supporting seat toward the first side of the third direction, and the first bracket is suitable for receiving the material at the first side of the third direction.

5. The electrolytic nickel cleaning system according to claim 2, characterized in that: The second bracket comprises: A first mounting frame, wherein the first mounting frame is arranged in a U shape, and the opening of the U shape faces the same direction as the first bracket receives the material; A second mounting frame is connected to the outer side of the opening of the first mounting frame and is used to be connected to the driving device.

6. The electrolytic nickel cleaning system according to claim 5, characterized in that: The second mounting frame comprises: A first connecting arm, wherein the first connecting arm is spaced apart from a side wall of the first mounting frame, and a relief portion for avoiding the cleaning pool is formed between the first mounting frame and the first connecting arm, and the driving device is connected to a side of the first connecting arm away from the first bracket; The second connecting arm is arranged in an L shape with the first connecting arm, and the second connecting arm is connected between the first connecting arm and the first mounting bracket.

7. The electrolytic nickel cleaning system according to claim 1, characterized in that: The driving device comprises: A rotating mechanism, the rotating mechanism is connected to the receiving frame, and a driving end of the rotating mechanism is connected to the receiving frame and is used to drive the receiving frame to rotate; A lifting mechanism is installed on the mounting bracket, and a lifting end of the lifting mechanism is connected to the rotating mechanism and is used to drive the rotating mechanism to rise and fall.

8. The electrolytic nickel cleaning system according to claim 7, characterized in that: The lifting mechanism comprises: a driving seat and a driving rod, wherein the driving seat is fixedly matched with the mounting bracket, the driving rod is telescopically mounted on the driving seat in a vertical direction, and one end of the driving rod located outside the driving seat is configured as the lifting end; And / or, the lifting mechanism includes: a guide rail and a guide seat, the guide rail is installed on the mounting bracket, the guide seat is connected and cooperated with the lifting end, and the guide rail is suitable for guiding and cooperating with the guide seat.

9. The electrolytic nickel cleaning system according to claim 1, characterized in that: A heating device is provided in the cleaning pool, and the heating device is used to heat the cleaning medium; And / or, the inner bottom wall of the cleaning tank is inclined to one side and extends downward.

10. A method for cleaning electrolytic nickel, characterized in that: The electrolytic nickel cleaning method is applied to the electrolytic nickel cleaning system according to any one of claims 1 to 9, and the electrolytic nickel cleaning method at least comprises the following steps: Step 1: The receiving rack receives the material; Step 2: The driving device drives the receiving frame to move to a first preset position to immerse the material in the cleaning medium; Step 3: The driving device drives the receiving frame to swing back and forth periodically between the second preset position and the third preset position; Step 4: The driving device drives the receiving rack to reset, moves the material to above the liquid level of the cleaning medium, and drains the material.

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