Color display processing method of nanometer miniature carving pattern

Abstract

The invention relates to the technical field of nano miniature carving, and particularly discloses a color display processing method of a nano miniature carving pattern, which comprises the following steps: selecting transparent glass as a substrate material; a plurality of layers of thin film materials with different refractive indexes are alternately deposited on transparent glass by adopting a physical vapor deposition or chemical vapor deposition technology to form a color mask. And the required color effect is obtained by accurately controlling the thickness and the deposition sequence of each layer of film. And designing corresponding black and white patterns according to user requirements by using micro-carving pattern design software. And after the design is completed, converting the pattern into a format which can be identified by the nano miniature carving equipment, and importing the pattern into the nano miniature carving equipment. According to the method disclosed by the invention, fine combination of the color mask and the black and white patterns can be realized, so that the nano micro-carving projection stone presents a richer and more unique visual effect, and the requirements of the market on high-quality and personalized art products are met.

Description

Technical Field

[0001] The present invention relates to the technical field of nano micro-engraving, and specifically refers to a method for processing color display of nano micro-engraved patterns. Background Art

[0002] Nano micro-engraving technology is to perform black and white engraving on a glass sheet electroplated with metal in the traditional way, that is, only black and white effects can be presented, which limits its performance in application scenarios with color requirements and cannot meet people's pursuit of rich colors. Due to the lack of color changes, the visual impact and expressiveness are relatively weak when expressing complex patterns and information. For some situations that need to distinguish levels and details through different gray scales, the black and white technology may not be able to clearly and accurately display, resulting in unclear information transmission. In some fields that require color identification or decoration, such as art creation, high-end decoration, etc., the application of black and white technology is greatly limited.

[0003] Later, with the market demand, color nano film sheets and colored glass sheets appeared on the market. However, colored glass sheets on the market have disadvantages such as high customization costs (customizing colors for lenses can only be done by opening molds one by one and dyeing, with high costs and high fees) and poor sales, and cannot achieve mass customization. Although the nano film sheet makes up for the color defect, due to the light transmissibility of the film sheet, the projection is not clear and can only be seen clearly under specific dim light and at a specific distance. In addition, there are many uncertain factors in the development process, making the color of the product prone to deviation and not meeting the expectations.

[0004] Therefore, a method for processing color display of nano micro-engraved patterns has become an urgent problem to be solved by people. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a method for processing color display of nano micro-engraved patterns, which performs black and white engraving on a glass sheet with locally dyed color by a lithography machine again. Mentally, it overcomes the shortcomings of the film sheet and the glass sheet, making the two: "moving (engraving black and white patterns with a laser) and static (mining glass sheets with different colored background patterns as the negative for engraving)" combined; it realizes that there is no need to open a mold for each colored pattern customized glass sheet, and only requires customers to select a glass sheet with a colored pattern for black and white creative customization; greatly reduces the cost and improves the efficiency of the process, and meets the market demand.

[0006] To solve the above technical problem, the technical solution provided by the present invention is: a method for processing color display of nano micro-engraved patterns, including the following steps:

[0007] S1. Select transparent glass as the base material. Due to its good light transmissibility and chemical stability, it is suitable as the base for depositing multi-layer thin films.

[0008] S2. On the transparent glass, using physical vapor deposition (PVD) or chemical vapor deposition (CVD) techniques, alternately deposit multiple layers of thin film materials with different refractive indices, such as silicon dioxide (SiO 2 ) and titanium dioxide (TiO 2 ) to form a color mask. By precisely controlling the thickness and deposition sequence of each layer of the film, the desired color effect can be obtained.

[0009] S3. Use micro-engraving pattern design software to design the corresponding black and white pattern according to user requirements. After the design is completed, convert the pattern into a format that can be recognized by the nano-micro-engraving device and import it into the device. This step ensures the seamless connection from design to processing of the pattern.

[0010] Use high-precision nano-micro-engraving equipment such as laser direct writing or electron beam lithography to perform micro-engraving on the color mask. During the engraving process, by adjusting micro-engraving parameters such as laser power, scanning speed, and pulse frequency, precisely engrave the black and white pattern while ensuring the integrity of the color mask, so that the final product has both fine pattern details and retains the underlying color effect.

[0011] Further, before step S1, pre-treat the transparent glass substrate material: first immerse the transparent glass in a hydrofluoric acid solution to remove the oxide layer and impurities on the glass surface, then rinse it with deionized water, and then dry it in an oven to ensure that the glass surface is clean and dry.

[0012] Further, after completing step S3, post-treat the micro-engraved product: place the product in a vacuum annealing furnace and anneal it at a temperature of 300°C for 1 hour to eliminate the internal stress generated during the engraving process.

[0013] The advantages of the present invention compared with the prior art are as follows: The method of the present invention can achieve a fine combination of a color mask and a black and white pattern, making the nano-micro-engraved projection stone present a richer and more unique visual effect, meeting the market demand for high-quality and personalized art products. The present invention improves the accuracy and clarity of the pattern, enhances the artistic expressiveness and collection value of the projection stone. The optimized process flow of the present invention improves production efficiency, reduces production costs, and is conducive to large-scale production and popularization and application. Specific embodiments

[0014] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "front", "rear", "left", "right", "inner", "outer", "vertical", "circumferential", etc. is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.

[0015] In the description of the present invention, the "first feature" and "second feature" may include one or more of such features. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include one or more of such features.

[0016] In the present invention, unless otherwise clearly defined and limited, terms such as "installed", "connected", "joined", "fixed", etc. shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention may be understood according to specific circumstances.

[0017] The following further elaborates on a method for processing a color display of a nano micro-engraved pattern according to the present invention.

[0018] A method for processing a color display of a nano micro-engraved pattern includes the following steps:

[0019] S1. Select transparent glass as the base material. The selected transparent glass should have a high optical transmittance, with a transmittance in the visible light band not less than 90%, and the content of bubbles and impurities inside the glass is extremely low. The number of bubbles with a diameter greater than 1 μm per unit area does not exceed 5, and the number of impurity particles does not exceed 10. This can ensure the stability of subsequent processing and the pattern display effect. When selecting transparent glass, strict screening is carried out according to the above standards. The high optical transmittance ensures that light can fully penetrate during subsequent color display, reducing light loss, while the extremely low content of bubbles and impurities avoids processing abnormalities caused by defects during micro-engraving and thin film deposition, providing a good foundation for the entire processing process.

[0020] S2. Alternately deposit multiple layers of thin film materials with different refractive indices on the transparent glass to form a color mask. The alternate deposition of the thin films is achieved by physical vapor deposition or chemical vapor deposition technology. During the deposition process, strict control is carried out on the environmental conditions. When performing physical vapor deposition, the vacuum degree needs to be maintained at 10 -5 Pa to 10 -6Between 100 Pa and 500 Pa, during chemical vapor deposition, the pressure in the reaction chamber is controlled to ensure that the deposition environment is not interfered by the outside world and the film quality is guaranteed. By using advanced in-situ monitoring techniques such as ellipsometers, the optical parameter changes during the deposition of each layer of film are monitored in real time, so as to accurately adjust the deposition time and control the thickness deviation of each layer of film within ±0.5 nm to ensure the accuracy of the color effect. The thin film materials are selected as silica and titanium dioxide. Before use, the purity of the silica and titanium dioxide raw materials is detected. The purity of silica needs to reach more than 99.999%, and the purity of titanium dioxide needs to reach more than 99.99% to prevent the optical properties of the film and the final color display effect from being affected by raw material impurities. Silica and titanium dioxide thin films with different refractive indexes form a specific optical structure through precise control of the thickness and deposition sequence, and according to the principles of light interference and diffraction, selective transmission or reflection of different color lights is achieved, thus presenting a rich color effect.

[0021] S3. Use micro-engraving pattern design software to design corresponding black and white patterns according to user requirements. This micro-engraving pattern design software has an intelligent optimization function, which can automatically optimize the lines of the designed pattern according to the performance parameters of the nano-micro-engraving equipment, reduce the breakpoints and defects during the engraving process, and improve the engraving efficiency and quality. Convert the designed pattern into a format that can be recognized by the nano-micro-engraving equipment and import it. The nano-micro-engraving equipment uses laser direct writing or electron beam lithography equipment, and the nano-micro-engraving equipment needs to be calibrated regularly for accuracy. After every 100 engraving tasks, use a standard template to detect and calibrate the positioning accuracy and focusing accuracy of the equipment to ensure that the engraving accuracy of the equipment always remains within ±5 nm. During the engraving process of the nano-micro-engraving equipment, adjust the micro-engraving parameters, including laser power, scanning speed, pulse frequency, etc., and at the same time, collect the temperature data on the surface of the color mask in real time, and automatically adjust the laser power through a closed-loop control system to control the temperature change on the surface of the color mask within ±2°C to prevent the performance of the thin film material from changing due to excessive temperature and affecting the engraving quality. By precisely controlling these micro-engraving parameters, black and white patterns that meet the design requirements are precisely engraved on the color mask to achieve nano-level micro-engraving accuracy.

[0022] Pre-treatment and post-treatment of processing:

[0023] Before step S1, pre-treat the transparent glass substrate material. First, immerse the glass in a 5% hydrofluoric acid solution for 5 minutes to remove the oxide layer and impurities on the glass surface, then rinse it 5 times with deionized water, and then dry it in an oven at 120°C for 2 hours to ensure that the glass surface is clean and dry, and improve the adhesion of the subsequent thin film deposition.

[0024] After completing step S3, post-processing is performed on the micro-sculpted product. The product is placed in a vacuum annealing furnace and annealed at a temperature of 300°C for 1 hour to eliminate the internal stress generated during the engraving process, improve the stability and durability of the pattern, and prevent problems such as pattern deformation and fading during long-term use of the product.

[0025] Processing environment control: The entire processing process is carried out in a clean workshop. The cleanliness level of the clean workshop reaches the ISO5 standard, and the particle concentration of particles with a diameter greater than 0.5μm in the air does not exceed 3520 per m 3 , to avoid contamination of the processing process by dust and other impurities, and ensure the consistency and stability of product quality. In an environment with such high cleanliness, it is possible to effectively prevent impurity particles from adhering to the surface of the substrate material, thin film or engraved pattern, and avoid adverse effects on processing accuracy and product performance.

[0026] The specific implementation process of a color display processing method for a nano micro-engraved pattern of the present invention is as follows:

[0027] 1. Select a high-quality glass with a size of 50mm×50mm and a thickness of 2mm as the substrate material. For example, high-purity borosilicate glass. Before use, the glass substrate is subjected to strict and meticulous cleaning to remove impurities such as dust and oil stains that may exist on the surface, and ensure the cleanliness of the glass surface. Subsequently, a pretreatment operation is carried out to microscopically roughen the glass surface through chemical etching and other methods to enhance the adhesion between the subsequent deposited thin film and the glass substrate, providing a good foundation for the smooth progress of the subsequent process.

[0028] 2. Select a physical vapor deposition (PVD) device (chemical vapor deposition (CVD) device can also be used, with a similar operating principle), and deposit thin films in a specific order. Taking the formation of a specific blue tone as an example, by controlling the gas flow control system of the device, silane (SiH 4 ) gas with a purity of 99.99% is introduced at a speed of 10 sccm (standard cubic centimeters per minute), and at the same time, the device power is set to 150W, and the deposition time is set to 20 minutes. A layer of silicon dioxide (SiO 2 ) thin film with a thickness of 50 nanometers measured by an ellipsometer is successfully deposited on the glass substrate. Immediately afterwards, the organic precursor gas of titanium is switched to be introduced, with a flow rate control of 8 sccm, the device power is adjusted to 200W, and the deposition is carried out for 30 minutes to obtain a titanium dioxide (TiO 2 ) thin film with a thickness of about 80 nanometers. Finally, silane gas is introduced again, with a flow rate of 10 sccm and a power of 150W, and the deposition is carried out for 25 minutes to cover a layer of silicon dioxide (SiO 2 ) thin film with a thickness of 60 nanometers. The three-layer thin films are precisely deposited, presenting an ideal blue-effect color mask.

[0029] 3. Use professional micro-engraving pattern design software to design a black-and-white pattern such as "blooming flowers" according to actual requirements. During the design process, fully consider factors such as the line complexity of the pattern, the detail clarity, and the color coordination with the color mask to ensure the best visual effect of the final product. After the design is completed, convert the pattern file into the format supported by the nano-micro-engraving device to ensure that the pattern can be successfully imported into the nano-micro-engraving device.

[0030] 4. Import the pattern file with the converted format into a high-precision nano-micro-engraving device, such as a laser direct writing device. Before engraving, finely adjust the device parameters. Set the laser power to 20 milliwatts. At this power, it can effectively engrave the color mask without causing excessive damage to the underlying structure of the color mask; set the scanning speed to 10 millimeters per second to ensure the accuracy and smoothness of the engraved lines; adjust the pulse frequency to 1000 hertz so that the laser pulses can accurately act on the surface of the color mask to engrave a clear black-and-white pattern. During the engraving process, closely monitor the operation status of the device and the engraving effect of the pattern to ensure the smooth progress of the engraving process.

[0031] 5. After engraving, it is a nano-micro-engraving projection stone. Put the made projection stone into a special cleaning solution composed of ethanol and deionized water in a 1:1 ratio and ultrasonically clean it for 10 minutes to remove debris, residual impurities, etc. generated during the engraving process, ensuring the cleaning effect while avoiding damage to the pattern. After cleaning, conduct a quality inspection on the projection stone. Observe the clarity of the pattern, the integrity of the edges, and the fusion effect with the color mask through a microscope to ensure that the product quality meets the expected standards. If any defects are found, carry out corresponding repair treatments in a timely manner.

[0032] The above describes the present invention and its implementation manners. Such a description is not restrictive. If those of ordinary skill in the art are inspired by it and, without departing from the gist of the present invention, design similar structural manners and embodiments to this technical solution without creative efforts, they shall fall within the protection scope of the present invention.

Claims

1. A color display processing method for nano-micro-carving patterns, characterized in that: The following steps are included: S1. Select transparent glass as the substrate material; S2, alternately depositing multiple layers of thin film materials with different refractive indices on transparent glass to form a color mask; S3. Design the black and white micro-carving content and use the engraving machine to perform micro-carving.

2. The color display processing method of a nano-micro-carving pattern according to claim 1, characterized in that: In step S2, multiple layers of thin film materials with different refractive indices are alternately deposited by physical vapor deposition or chemical vapor deposition to form a color mask.

3. The color display processing method of a nano-micro-carving pattern according to claim 2, characterized in that: In step S2, the thickness and deposition order of each layer of film are controlled to obtain the desired color effect.

4. The color display processing method of a nano-micro-carving pattern according to claim 3 is characterized in that: The thin film material includes silicon dioxide and titanium dioxide.

5. The color display processing method of a nano-micro-carving pattern according to claim 1, characterized in that: In step S3, a micro-carving pattern design software is used to design a corresponding black and white pattern according to user requirements; the designed pattern is converted into a format that can be recognized by the nano-micro-carving device and imported.

6. The color display processing method of a nano-micro-carving pattern according to claim 1, characterized in that: The nanometer micro-engraving equipment adopts laser direct writing lithography equipment or electron beam lithography equipment.

7. The color display processing method of a nano-micro-carving pattern according to claim 6 is characterized in that: During the engraving process of the nano-micro-engraving equipment, the micro-engraving parameters are adjusted to engrave a black and white pattern on the color mask; the micro-engraving parameters include laser power, scanning speed, and pulse frequency.

8. The color display processing method of a nano-micro-carving pattern according to claim 1, characterized in that: Before step S1, the transparent glass substrate material is pretreated: the transparent glass is first immersed in a hydrofluoric acid solution to remove the oxide layer and impurities on the glass surface, then rinsed with deionized water, and then dried in an oven to ensure that the glass surface is clean and dry.

9. The color display processing method of a nano-micro-carving pattern according to claim 1, characterized in that: After completing step S3, the micro-carved product is post-processed: the product is placed in a vacuum annealing furnace and annealed at a temperature of 250-350° C. for 1-1.5 hours to eliminate the internal stress generated during the carving process.