Fuel cell bipolar plate flow resistance monitoring method, device and system

Abstract

The invention relates to a fuel cell bipolar plate flow resistance monitoring method, device and system. The method comprises the following steps: acquiring actual gas pressure values of a plurality of measuring points on each target flow channel in a bipolar plate to be measured; the actual gas pressure value is obtained by detecting a measuring point by using a pressure sensor; the pressure sensor is communicated with a pressure leading hole which is formed in the bipolar plate and is formed in a measuring point position at the bottom of the target flow channel through a pressure leading pipe; obtaining a calibrated pressure drop value of each target flow channel; for each target flow channel, determining a flow channel pressure drop value of the target flow channel according to the actual gas pressure values of the plurality of measuring points in the target flow channel; the pressure drop information comprises a pressure drop value of each target flow channel in the target area; and for each target flow channel, according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, determining whether the flow resistance of the target flow channel meets a first preset condition, and under the condition that the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal. According to the scheme, the flow resistance monitoring accuracy of the bipolar plate is improved.

Description

Technical Field

[0001] The present disclosure relates to the technical field of fuel cells, and particularly to a method, device, and system for monitoring the flow resistance of a fuel cell bipolar plate. Background Art

[0002] In the related art, as one of the key components of a fuel cell, the bipolar plate guides the gas flow to the electrodes, helps to discharge the water generated by the reaction, and also plays a role in support and heat dissipation. Its flow channel design directly affects the gas distribution, water management, and heat conduction effect. Among them, the resistance characteristics of the flow field are an important index for evaluating the rationality of the flow field design.

[0003] Currently, the flow resistance of the bipolar plate is usually obtained based on simulation analysis and theoretical calculation. However, since the simulation model often needs to be simplified and there are certain differences from the actual bipolar plate structure, and the assumptions and boundary conditions adopted in the simulation process are relatively idealized, the data obtained through simulation calculation cannot fully and accurately reflect the actual operating conditions of the bipolar plate. In addition, the structure of the traditional device for monitoring the flow resistance is too complex, the operation is inconvenient, the monitoring positions are limited, and it can only monitor the entire single-cell level, and cannot reflect the true changes in the flow resistance of each region during the actual operation of the stack. Summary of the Invention

[0004] To overcome the problems in the related art, the present disclosure provides a method, device, and system for monitoring the flow resistance of a fuel cell bipolar plate.

[0005] According to the first aspect of the embodiments of the present disclosure, a method for monitoring the flow resistance of a fuel cell bipolar plate is provided, including:

[0006] Obtaining the actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured; the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected to a pressure guiding hole provided at the position of the bottom measurement point of the target flow channel in the bipolar plate through a pressure guiding pipe;

[0007] Obtaining the calibrated pressure drop value of each target flow channel;

[0008] For each target flow channel, determining the flow channel pressure drop value of the target flow channel according to the actual gas pressure values of multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area;

[0009] For each target flow channel, determining whether the flow resistance of the target flow channel meets a first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, and when the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal.

[0010] In some embodiments of the present disclosure, the method further includes:

[0011] For each target flow channel, determine the flow rate of the target flow channel based on the pressure drop value of the target flow channel;

[0012] Obtain the overall flow rate of the bipolar plate to be measured;

[0013] Based on the overall flow rate and the flow rate of the flow channel, determine whether the flow rate of the target flow channel meets the second preset condition;

[0014] In the case where the flow rates of at least one target flow channel do not meet the second preset condition, determine that the flow field distribution of the bipolar plate is uneven.

[0015] In some embodiments of the present disclosure, the target flow channels include a first flow channel, a second flow channel, a third flow channel, and a fourth flow channel. The first flow channel is the first flow channel in the gas inlet distribution area of the bipolar plate to be measured, the second flow channel is the last flow channel in the gas inlet distribution area of the bipolar plate to be measured, the third flow channel is the first flow channel in the gas outlet distribution area of the bipolar plate to be measured, and the fourth flow channel is the last flow channel in the gas outlet distribution area of the bipolar plate to be measured;

[0016] The obtaining of the actual gas pressure values at multiple measurement points on each target flow channel in the bipolar plate to be measured includes:

[0017] Obtain the pressure value of the first measurement point and the pressure value of the second measurement point on each target flow channel among the first flow channel, the second flow channel, the third flow channel, and the fourth flow channel; the first measurement point is the starting point of the target flow channel, and the second measurement point is the ending point of the target flow channel;

[0018] The determining of the flow channel pressure drop value of the target flow channel according to the actual gas pressure values at multiple measurement points in the target flow channel includes:

[0019] For each target flow channel among the first flow channel, the second flow channel, the third flow channel, and the fourth flow channel, calculate the difference between the pressure value of the first measurement point and the pressure value of the second measurement point on the target flow channel to obtain the flow channel pressure drop value of the target flow channel.

[0020] In some embodiments of the present disclosure, the target flow channels include a fifth flow channel, and there are multiple fifth flow channels. The fifth flow channels are the flow channels arranged in the main reaction area of the bipolar plate to be measured; the multiple fifth flow channels are evenly distributed;

[0021] The obtaining of the actual gas pressure values at multiple measurement points on each target flow channel in the bipolar plate to be measured includes:

[0022] Obtain the pressure values of the third measurement point, the fourth measurement point, and the fifth measurement point on each of the multiple fifth flow channels; the third measurement point is the starting point of the fifth flow channel, the fourth measurement point is the midpoint of the fifth flow channel, and the fifth measurement point is the end point of the fifth flow channel;

[0023] For each target flow channel, according to the actual gas pressure values of multiple measurement points in the target flow channel, determining the flow channel pressure drop value of the target flow channel includes:

[0024] For each of the multiple fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula:

[0025] △Pi in = (Pi starting point - Pi end point) / (Pi starting point - Pi middle) / (Pi middle - Pi end point)

[0026] where, △Pi in is the flow channel pressure drop value of the i-th target flow channel, Pi starting point is the pressure value of the third measurement point, Pi middle is the pressure value of the fourth measurement point, and Pi end point is the pressure value of the fifth measurement point.

[0027] In some embodiments of the present disclosure, the calibrated pressure drop value is the first average value of the flow channel pressure drop values of the target flow channel within a first preset time period in the offline dry gas state of the to-be-tested bipolar plate;

[0028] Determining whether the flow resistance of the target flow channel meets a first preset condition according to the flow channel pressure drop value of the target flow channel and the calibrated pressure drop value includes:

[0029] Calculate the second average value of the flow channel pressure drop values of the target flow channel within a second preset time period;

[0030] Calculate the difference between the first average value and the second average value to obtain a first difference;

[0031] Determine the proportion of the first difference in the second average value;

[0032] In the case where the proportion is greater than a first preset proportion, determine that the flow resistance of the target flow channel does not meet the first preset condition.

[0033] In some embodiments of the present disclosure, determining whether the flow rate of the target flow channel meets a second preset condition based on the overall plate flow rate and the flow channel flow rate includes:

[0034] Obtain a first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the overall plate flow rate and pressure drop of the to-be-tested bipolar plate in the offline dry gas state;

[0035] Using the flow channel flow rate and the first relationship, calculate the flow rate of the target flow channel;

[0036] Calculate a first occupancy ratio of the total plate flow rate in the number of flow channels of the bipolar plate to be measured to obtain a standard flow rate;

[0037] Calculate a second occupancy ratio of the flow rate of the target flow channel in the standard flow rate. When the second occupancy ratio is greater than a preset threshold, determine that the flow rate of the target flow channel does not meet the second preset condition.

[0038] According to a second aspect of the embodiments of the present disclosure, there is provided a fuel cell bipolar plate flow resistance monitoring device, including:

[0039] A first acquisition unit configured to acquire actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured; the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected through a pressure guiding pipe to a pressure guiding hole provided at the position of the bottom measurement point of the target flow channel in the bipolar plate;

[0040] A second acquisition unit configured to acquire a calibrated pressure drop value of each target flow channel;

[0041] A first determination unit configured to, for each target flow channel, determine a flow channel pressure drop value of the target flow channel according to the actual gas pressure values of multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area;

[0042] A second determination unit configured to, for each target flow channel, determine whether the flow resistance of the target flow channel meets a first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel. When the flow resistance of the target flow channel does not meet the first preset condition, determine that the flow resistance of the target flow channel is abnormal.

[0043] According to a third aspect of the embodiments of the present disclosure, an electronic device includes: a memory, a processor, and a computer program stored on the memory and executable on the processor. When the processor executes the computer program, the method described in any one of the first aspects is implemented.

[0044] According to a fourth aspect of the embodiments of the present disclosure, there is provided a computer-readable storage medium, on which a computer program is stored. When the computer program is executed by a processor, the method described in any one of the first aspects is implemented.

[0045] According to a fifth aspect of the embodiments of the present disclosure, there is provided a computer program product, including a computer program. When the computer program is executed by a processor, the method described in any one of the first aspects is implemented.

[0046] The technical solutions provided by the embodiments of the present disclosure may include the following beneficial effects: by obtaining the actual gas pressure values at multiple measurement points on each target flow channel in the bipolar plate to be measured; the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected through a pressure guiding pipe to a pressure guiding hole provided in the bipolar plate at the position of the bottom measurement point of the target flow channel; obtaining the calibrated pressure drop value of each target flow channel; for each target flow channel, determining the flow channel pressure drop value of the target flow channel according to the actual gas pressure values at multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area; for each target flow channel, determining whether the flow resistance of the target flow channel meets the first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, and when the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal. By providing pressure guiding holes at multiple measurement points at the bottom of the flow channels of the bipolar plate, it is possible to obtain the pressure values at different positions of the bipolar plate using only a pressure sensor, thereby determining the pressure drops of different flow channels, and further being able to conveniently and quickly determine whether there is an abnormality in the flow resistance of different areas of the bipolar plate, improving the accuracy of the flow resistance monitoring of the bipolar plate.

[0047] It should be understood that the above general description and the following detailed description are only exemplary and explanatory, and do not limit the present disclosure. Brief Description of the Drawings

[0048] The drawings herein are incorporated into the specification and form a part of the specification, showing embodiments consistent with the present invention, and are used together with the specification to explain the principles of the present invention.

[0049] Figure 1 is a flowchart of a method for monitoring the flow resistance of a fuel cell bipolar plate shown according to an exemplary embodiment.

[0050] Figure 2 is a schematic diagram of the measurement points and pressure guiding holes proposed in the present application.

[0051] Figure 3 is a schematic diagram of the bipolar plate to be measured proposed in the present application.

[0052] Figure 4 is a block diagram of a device for monitoring the flow resistance of a fuel cell bipolar plate shown according to an exemplary embodiment.

[0053] Figure 5 is a block diagram of a device for a method for monitoring the flow resistance of a fuel cell bipolar plate shown according to an exemplary embodiment.

[0054] Reference numerals

[0055] 1 - Measuring point; 2 - Target flow channel; 3 - Pressure tapping hole; 31 - Threaded part; 4 - Gas inlet distribution area; 41 - First flow channel; 42 - ; 5 - Gas outlet distribution area; 51 - Third flow channel; 52 - Fourth flow channel; 6 - First measuring point; 7 - Second measuring point; 8 - Main reaction area; 81 - Fifth flow channel; 9 - Gas inlet; 10 - Gas outlet. Detailed implementation manners

[0056] Here, the exemplary embodiments will be described in detail, and examples thereof are shown in the drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The implementation manners described in the following exemplary embodiments do not represent all implementation manners consistent with the present invention. On the contrary, they are merely examples of devices and methods consistent with some aspects of the present invention as detailed in the appended claims.

[0057] The terms used in the embodiments of the present disclosure are only for the purpose of describing specific embodiments, and are not intended to limit the embodiments of the present disclosure. The singular forms "a" and "the" used in the embodiments of the present disclosure and the appended claims are also intended to include the plural forms, unless the context clearly indicates otherwise.

[0058] It should be understood that although the terms first, second, third, etc. may be used in the embodiments of the present disclosure to describe various information, such information should not be limited to these terms. These terms are only used to distinguish the same type of information from each other. For example, without departing from the scope of the embodiments of the present disclosure, the first information may also be referred to as the second information, and similarly, the second information may also be referred to as the first information. Depending on the context, the words "if" and "when" as used herein may be interpreted as "when" or "while" or "in response to determining".

[0059] In addition, various forms of processes shown in the embodiments of the present disclosure can be used, reordering, adding or deleting steps. For example, the steps described in the present application can be executed in parallel, sequentially, or in a different order, as long as the desired results of the technical solutions disclosed in the present disclosure can be achieved, and no limitations are imposed herein.

[0060] In the related art, a fuel cell is a device that directly converts chemical energy into electrical energy, and has the characteristics of high efficiency and environmental protection. Among them, proton exchange membrane fuel cells are widely used in the fields of transportation and stationary power generation due to their high power density and fast startup characteristics. As one of the key components of a fuel cell, the bipolar plate guides the gas flow to the electrodes, helps discharge the water generated by the reaction, and at the same time plays a role in support and heat dissipation. Its flow channel design directly affects gas distribution, water management, and heat conduction effects.

[0061] Among them, the resistance characteristics of the flow field are an important index for evaluating the rationality of the flow field design. When hydrogen, air, and water flow in the stack, they are all affected by the flow field resistance. The flow resistance of the anode and cathode flow fields affects the uniform distribution of gases, ensuring that effective chemical reactions can occur in all parts of the fuel cell and improving the energy conversion efficiency. In addition, it also affects the generation and removal of water. Excessive water will block the flow channels or electrodes, affecting the battery performance. The flow resistance of the coolant flow field affects the heat dissipation of the stack. A reasonable flow resistance of the coolant flow field helps manage the temperature of the battery, ensuring that the battery operates within an appropriate temperature range and preventing overheating or overcooling. The flow resistance of the flow field directly affects the efficiency and lifespan of the fuel cell.

[0062] Currently, the flow resistance of the bipolar plate is usually obtained based on simulation analysis and theoretical calculation. However, since the simulation model often needs to be simplified and there are certain differences from the actual bipolar plate structure, and the assumptions and boundary conditions adopted in the simulation process are relatively idealized, the data obtained through simulation calculation cannot fully and accurately reflect the actual operating conditions of the bipolar plate. In addition, the structure of traditional devices for monitoring flow resistance is too complex, inconvenient to operate, has limited monitoring positions, and can only monitor at the whole plate level of a single cell, unable to reflect the true changes in the flow resistance of each area during the actual operation of the stack.

[0063] To solve the above problems, the present disclosure provides a method, device, and system for monitoring the flow resistance of a fuel cell bipolar plate. By obtaining the actual gas pressure values at multiple measurement points on each target flow channel in the bipolar plate to be measured; among them, the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected to a pressure guiding hole provided at the position of the bottom measurement point of the target flow channel in the bipolar plate through a pressure guiding tube; obtaining the calibrated pressure drop value of each target flow channel; for each target flow channel, determining the flow channel pressure drop value of the target flow channel according to the actual gas pressure values at multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area; for each target flow channel, determining whether the flow resistance of the target flow channel meets a first preset condition, and when the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal. By providing pressure guiding holes at multiple measurement points at the bottom of the flow channels of the bipolar plate, it is possible to obtain the pressure values at different positions of the bipolar plate only using a pressure sensor, thereby determining the pressure drop of different flow channels, and further being able to conveniently and quickly determine whether there are abnormalities in the flow resistance of different areas of the bipolar plate, improving the accuracy of monitoring the flow resistance of the bipolar plate.

[0064] Figure 1 is a flowchart of a method for monitoring the flow resistance of a fuel cell bipolar plate shown according to an exemplary embodiment, as Figure 1As shown, it should be noted that the fuel cell bipolar plate flow resistance monitoring method of the present disclosure embodiment is applied to a fuel cell bipolar plate flow resistance monitoring device. As Figure 1 shown, the method may include the following steps:

[0065] Step 101, obtaining the actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured; the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor.

[0066] Among them, the pressure sensor is connected to a pressure guiding hole provided at the bottom measurement point position of the target flow channel in the bipolar plate through a pressure guiding pipe.

[0067] In some embodiments of the present application, in order to exclude the influence of end effects on the monitoring results, 5 short stacks can be used for test verification.

[0068] In one embodiment, as Figure 2 shown, the thickness of the bipolar plate to be measured can be 18 mm, the flow channel width can be 1 mm, and at the position of different measurement points 1 of different target flow channels to be tested, a pressure guiding hole 3 with a diameter of 1 mm can be opened at the bottom of the target flow channel 2 along the long side direction of the bipolar plate. The pressure guiding hole 3 is a through hole, and a threaded portion 31 for fixing the pressure guiding pipe is provided inside one end of the pressure guiding hole 3 close to the outer side of the bipolar plate. The pressure guiding pipe penetrates through the pressure guiding hole 3 and is threadedly connected to the pressure guiding hole 3 through the threaded portion 31. One end of the pressure guiding pipe is connected to the pressure sensor, and the other end is connected to the target flow channel 2.

[0069] As a possible implementation manner, according to actual needs, the pressure sensor can be controlled to collect the actual gas pressure values of the measurement points at a preset frequency.

[0070] Step 102, obtaining the calibrated pressure drop value of each target flow channel.

[0071] In some embodiments of the present application, the pressure drop value of the target flow channel of the bipolar plate to be measured in the off-line dry gas state can be calculated, and the average value of multiple pressure drop values within a preset time period can be obtained to obtain the calibrated pressure drop value of the target flow channel.

[0072] It can be understood that the off-line dry gas state is a state where no load is applied to the bipolar plate and the gas is dry gas. Determining the calibrated pressure drop value when the bipolar plate to be measured is in the off-line dry gas state can exclude the influence of water on the pressure drop.

[0073] Step 103, for each target flow channel, determining the flow channel pressure drop value of the target flow channel according to the actual gas pressure values of multiple measurement points in the target flow channel.

[0074] Among them, the pressure drop information includes the pressure drop values of each target flow channel within the target area.

[0075] In some embodiments of the present application, asFigure 3 As shown, the target flow channels include a first flow channel 41, a second flow channel 42, a third flow channel 51, and a fourth flow channel 52. The first flow channel 41 is the first flow channel in the gas inlet distribution area 4 of the bipolar plate to be measured. The second flow channel 42 is the last flow channel in the gas inlet distribution area 4 of the bipolar plate to be measured. The third flow channel 51 is the first flow channel in the gas outlet distribution area 5 of the bipolar plate to be measured. The fourth flow channel 52 is the last flow channel in the gas outlet distribution area 5 of the bipolar plate to be measured. Step 101 may specifically include:

[0076] Obtain the pressure values of the first measurement point 6 and the second measurement point 7 on each target flow channel among the first flow channel 41, the second flow channel 42, the third flow channel 51, and the fourth flow channel 52. The first measurement point 6 is the starting point of the target flow channel, and the second measurement point 7 is the ending point of the target flow channel;

[0077] Step 103 may specifically include:

[0078] For each target flow channel among the first flow channel 41, the second flow channel 42, the third flow channel 51, and the fourth flow channel 52, calculate the difference between the pressure value of the first measurement point 6 and the pressure value of the second measurement point 7 on the target flow channel to obtain the flow channel pressure drop value of the target flow channel. In one embodiment, as Figure 3 shown, in order to verify the pressure loss of the bipolar plate and the true pressure drop of the entire bipolar plate, points can be arranged on the first flow channel in the gas inlet distribution area 4 of the bipolar plate to be measured, the last flow channel in the gas inlet distribution area 4 of the bipolar plate to be measured, the first flow channel in the gas outlet distribution area 5 of the bipolar plate to be measured, and the last flow channel in the gas outlet distribution area 5 of the bipolar plate to be measured. A measurement point is set at the starting point and the ending point of each flow channel, so as to determine the flow channel pressure drop value of each target flow channel each time.

[0079] As an example of a possible implementation manner, the difference between the flow channel pressure drop values of the first flow channel in the gas inlet distribution area and the last flow channel in the gas inlet distribution area can be calculated to obtain a second difference. When the second difference is greater than or equal to a preset threshold, it indicates that the pressure distribution in the gas inlet distribution area is uneven, and it is determined that there is an abnormal flow resistance in the gas inlet distribution area, that is, there is a risk of water blockage in the gas inlet distribution area.

[0080] In one embodiment, when the target flow channel is any one of the first flow channel, the second flow channel, the third flow channel, and the fourth flow channel, the following formula can be used to calculate the calibrated pressure drop value of the target flow channel: That is,

[0081] △P 离 =P 起点 -P 终点

[0082] △P avg离 =△P 离 / k

[0083] Among them, △P 离 is, P 起点 is the pressure value of the first measurement point in the off-line dry gas state, P 终点 is the pressure value of the second measurement point in the off-line dry gas state, △P avg离 is the calibrated pressure drop value, k is the duration of the preset time period, and k can be 5 min.

[0084] In some other embodiments of the present application, the target flow channel includes a fifth flow channel. There are multiple fifth flow channels, and the fifth flow channels are the flow channels arranged in the main reaction area of the bipolar plate to be measured; the multiple fifth flow channels are evenly distributed. Step 101 may specifically include:

[0085] Obtain the pressure values of the third measurement point, the fourth measurement point, and the fifth measurement point on each of the multiple fifth flow channels; the third measurement point is the starting point of the fifth flow channel, the fourth measurement point is the midpoint of the fifth flow channel, and the fifth measurement point is the end point of the fifth flow channel;

[0086] Step 103 may specifically include:

[0087] For each of the multiple fifth flow channels, use the following formula to calculate the flow channel pressure drop value of the target flow channel:

[0088] △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0089] Among them, △P i在 is the flow channel pressure drop value of the i-th target flow channel, P i起点 is the pressure value of the third measurement point, P i中间 is the pressure value of the fourth measurement point, P i终点 is the pressure value of the fifth measurement point.

[0090] It can be understood that in order to reduce the processing difficulty of the measurement points, a part of the flow channels in the main reaction area can be selected as the fifth flow channels according to actual needs.

[0091] It should be noted that by setting measurement points at the starting point, midpoint, and end point of the fifth flow channel, the distance between the measurement points can be shortened, so that the flow resistance and drainage capacity of the fifth flow channel can be calculated more accurately.

[0092] In one embodiment, when the target flow channel is the fifth flow channel, the following formula can be used to calculate the calibrated pressure drop value of the target flow channel:

[0093] △P i离 =Pi起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0094] △P avg离 =△P i离 / k

[0095] Wherein, △P i离 is the pressure drop value of the i-th target flow channel under the off-line dry gas state, P i起点 is the pressure value of the third measuring point under the off-line dry gas state, P i中间 is the pressure value of the fourth measuring point under the off-line dry gas state, P i终点 is the pressure value of the fifth measuring point under the off-line dry gas state, △P avg离 is the calibrated pressure drop value, k is the duration of the preset time period, and k can be 5 min.

[0096] In some embodiments of the present application, the pressure drop value of the target flow channel of the bipolar plate to be tested under the off-line dry gas state can be calculated, and the average value of multiple pressure drop values within the preset time period is obtained to obtain the calibrated pressure drop value of the target flow channel.

[0097] It can be understood that the off-line dry gas state is a state where no load is applied to the bipolar plate and the gas is dry gas. Determining the calibrated pressure drop value when the bipolar plate to be tested is in the off-line dry gas state can exclude the influence of water on the pressure drop.

[0098] In some embodiments of the present application, when monitoring the bipolar plate to be tested using a test bench, measuring points can also be arranged at the gas inlet 9 and gas outlet 10 of the bipolar plate to be tested, and a pressure sensor is used to measure the actual pressures of the gas entering the reactor and the gas leaving the reactor. When the difference between the gas inlet pressure and the gas outlet pressure is greater than a preset threshold, it is determined that the pressure loss of the test bench is large, and the gas inlet pressure can be increased so that the gas outlet pressure reaches the desired pressure value, thereby correcting the test verification working condition.

[0099] Step 104, for each target flow channel, determine whether the flow resistance of the target flow channel meets the first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel. When the flow resistance of the target flow channel does not meet the first preset condition, it is determined that the flow resistance of the target flow channel is abnormal.

[0100] In one embodiment, it can be determined whether the flow resistance of the target flow channel meets the first preset condition according to the degree of difference between the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel. When the flow resistance of the target flow channel does not meet the first preset condition, it indicates that the degree of difference between the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel is too large, and the flow resistance of the target flow channel is in an abnormal state.

[0101] In some embodiments of the present application, the calibrated pressure drop value is the first average value of the target flow channel pressure drop value within the first preset time period in the off-line dry gas state of the bipolar plate to be measured. Determining whether the flow resistance of the target flow channel meets the first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel in step 104 may specifically include the following steps:

[0102] Calculate the second average value of the flow channel pressure drop value of the target flow channel within the second preset time period;

[0103] Calculate the difference between the first average value and the second average value to obtain the first difference;

[0104] Determine the proportion of the first difference in the second average value;

[0105] In the case where the proportion is greater than the first preset proportion, determine that the flow resistance of the target flow channel does not meet the first preset condition.

[0106] In one embodiment, the first preset condition may be (△P avg在 -△P avg离 ) / △P avg离 *100% ≤ 10%, where △P avg在 is the second average value, and △P avg离 is the first average value.

[0107] In some embodiments of the present application, the method may further include the following steps:

[0108] For each target flow channel, determine the flow rate of the target flow channel based on the pressure drop value of the target flow channel;

[0109] Obtain the overall flow rate of the bipolar plate to be measured;

[0110] Based on the overall flow rate and the flow rate of the flow channel, determine whether the flow rate of the target flow channel meets the second preset condition;

[0111] In the case where the flow rate of at least one target flow channel does not meet the second preset condition, determine that the flow field distribution of the bipolar plate is uneven.

[0112] In some embodiments of the present application, determining whether the flow rate of the target flow channel meets the second preset condition based on the overall flow rate and the flow rate of the flow channel may specifically include the following steps:

[0113] Obtain the first relationship between the flow rate and the pressure drop; the first relationship is obtained by fitting the relationship between the overall flow rate and the pressure drop of the bipolar plate to be measured in the off-line dry gas state;

[0114] Using the flow rate of the flow channel and the first relationship, calculate the flow rate of the target flow channel;

[0115] Calculate the first occupancy ratio of the total plate flow rate in the number of flow channels of the bipolar plate to be measured to obtain the standard flow rate;

[0116] Calculate the second occupancy ratio of the flow rate of the target flow channel in the standard flow rate. When the second occupancy ratio is greater than the preset threshold, it is determined that the flow rate of the target flow channel does not meet the second preset condition.

[0117] In one embodiment, the relationship between the total plate flow rate and the pressure drop in the offline dry gas state can be calibrated, and the first relational expression between the flow rate and the pressure drop is fitted according to the data:

[0118] Q i = 2.27△P i + 0.34△P i 2 + 16.07

[0119] Wherein, Q i is the flow rate of the i-th target flow channel, and △P i is the pressure drop value of the i-th target flow channel. According to the above first relational expression, the flow rate of the target flow channel can be determined based on the pressure drop value of the target flow channel.

[0120] As an example, the following formula can be used to calculate the standard flow rate Q of a single flow channel of the whole plate in the theoretical state i理 :

[0121] Q i理 = Q / n

[0122] Wherein, Q is the total plate flow rate, n is the number of flow channels, and n≥1.

[0123] In one embodiment, the above second preset condition may be |Q i / Q i理 - 1| * 100% ≤ 10%.

[0124] According to the fuel cell bipolar plate flow resistance monitoring method proposed by the embodiments of the present disclosure, the actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured are obtained; wherein, the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected through a pressure guiding pipe to a pressure guiding hole arranged in the bipolar plate at the position of the bottom measurement point of the target flow channel; the calibrated pressure drop value of each target flow channel is obtained; for each target flow channel, according to the actual gas pressure values of multiple measurement points in the target flow channel, the flow channel pressure drop value of the target flow channel is determined; the pressure drop information includes the pressure drop values of each target flow channel in the target area; for each target flow channel, according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, it is determined whether the flow resistance of the target flow channel meets the first preset condition, and when the flow resistance of the target flow channel does not meet the first preset condition, it is determined that the flow resistance of the target flow channel is abnormal. By arranging pressure guiding holes at multiple measurement points at the bottom of the flow channels of the bipolar plate, it is realized that only by using a pressure sensor can the pressure values at different positions of the bipolar plate be obtained, so as to determine the pressure drops of different flow channels, and further be able to conveniently and quickly determine whether there is an abnormality in the flow resistance of different areas of the bipolar plate, improving the accuracy of bipolar plate flow resistance monitoring.

[0125] Figure 4 is a block diagram of a fuel cell bipolar plate flow resistance monitoring device shown according to an exemplary embodiment. Refer to Figure 4 This device includes a first acquisition unit 401, a second acquisition unit 402, a first determination unit 403, and a second determination unit 404.

[0126] Among them, the first acquisition unit 401 is used to obtain the actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured; the actual gas pressure values are obtained by detecting the measurement points using a pressure sensor; the pressure sensor is connected through a pressure guiding pipe to a pressure guiding hole arranged in the bipolar plate at the position of the bottom measurement point of the target flow channel;

[0127] The second acquisition unit 402 is used to obtain the calibrated pressure drop value of each target flow channel;

[0128] The first determination unit 403 is used to, for each target flow channel, determine the flow channel pressure drop value of the target flow channel according to the actual gas pressure values of multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area;

[0129] The second determination unit 404 is used to, for each target flow channel, determine whether the flow resistance of the target flow channel meets the first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, and when the flow resistance of the target flow channel does not meet the first preset condition, determine that the flow resistance of the target flow channel is abnormal.

[0130] In some embodiments of the present application, the device may further include:

[0131] A third determination unit, configured to determine the flow rate of each target flow channel based on the pressure drop value of the target flow channel.

[0132] A third acquisition unit, configured to acquire the overall flow rate of the bipolar plate to be measured.

[0133] A fourth determination unit, configured to determine whether the flow rate of the target flow channel meets a second preset condition based on the overall flow rate and the flow rate of the flow channel.

[0134] A fifth determination unit, configured to determine that the flow field distribution of the bipolar plate is uneven when the flow rates of at least one target flow channel do not meet the second preset condition.

[0135] In some embodiments of the present application, the target flow channels include a first flow channel, a second flow channel, a third flow channel, and a fourth flow channel. The first flow channel is the first flow channel in the gas inlet distribution area of the bipolar plate to be measured, the second flow channel is the last flow channel in the gas inlet distribution area of the bipolar plate to be measured, the third flow channel is the first flow channel in the gas outlet distribution area of the bipolar plate to be measured, and the fourth flow channel is the last flow channel in the gas outlet distribution area of the bipolar plate to be measured. The first acquisition unit 401 may specifically be configured to: acquire the pressure value of the first measurement point and the pressure value of the second measurement point on each target flow channel among the first flow channel, the second flow channel, the third flow channel, and the fourth flow channel; the first measurement point is the starting point of the target flow channel, and the second measurement point is the ending point of the target flow channel; the first determination unit 403 may specifically be configured to: for each target flow channel among the first flow channel, the second flow channel, the third flow channel, and the fourth flow channel, calculate the difference between the pressure value of the first measurement point and the pressure value of the second measurement point on the target flow channel to obtain the flow channel pressure drop value of the target flow channel.

[0136] In some embodiments of the present application, the target flow channels include a fifth flow channel, and there are multiple fifth flow channels. The fifth flow channels are the flow channels provided in the main reaction area of the bipolar plate to be measured; the multiple fifth flow channels are evenly distributed. The first acquisition unit 401 may specifically be configured to: acquire the pressure value of the third measurement point, the pressure value of the fourth measurement point, and the pressure value of the fifth measurement point on each fifth flow channel among the multiple fifth flow channels; the third measurement point is the starting point of the fifth flow channel, the fourth measurement point is the midpoint of the fifth flow channel, and the fifth measurement point is the ending point of the fifth flow channel; the first determination unit 403 may specifically be configured to:

[0137] For each fifth flow channel among the multiple fifth flow channels, calculate the flow channel pressure drop value of the target flow channel by using the following formula:

[0138] △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0139] wherein, △P i在 is the pressure drop value of the i-th target flow channel, P i起点 is the pressure value at the third measurement point, P i中间 is the pressure value at the fourth measurement point, P i终点 is the pressure value at the fifth measurement point.

[0140] In some embodiments of the present application, the calibrated pressure drop value is the first average value of the pressure drop values of the target flow channels within the first preset time period in the offline dry gas state of the bipolar plate to be measured;

[0141] In some embodiments of the present application, the second determination unit 404 may specifically be configured to: calculate the second average value of the pressure drop values of the target flow channels within the second preset time period;

[0142] calculate the difference between the first average value and the second average value to obtain a first difference;

[0143] determine the proportion of the first difference in the second average value;

[0144] In the case where the proportion is greater than the first preset proportion, it is determined that the flow resistance of the target flow channel does not meet the first preset condition.

[0145] In some embodiments of the present application, the fourth determination unit may specifically be configured to:

[0146] obtain a first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the overall flow rate and pressure drop of the bipolar plate to be measured in the offline dry gas state;

[0147] calculate the flow rate of the target flow channel by using the flow rate of the flow channel and the first relationship;

[0148] calculate the first proportion of the overall flow rate in the number of flow channels of the bipolar plate to be measured to obtain a standard flow rate;

[0149] calculate the second proportion of the flow rate of the target flow channel in the standard flow rate, and in the case where the second proportion is greater than a preset threshold, determine that the flow rate of the target flow channel does not meet the second preset condition.

[0150] Regarding the device in the above embodiments, the specific manners in which each module performs operations have been described in detail in the embodiments related to the method, and will not be elaborated herein.

[0151] The fuel cell bipolar plate flow resistance monitoring device proposed according to the embodiments of the present disclosure obtains the actual gas pressure values of multiple measurement points on each target flow channel in the bipolar plate to be measured; wherein, the actual gas pressure value is obtained by detecting the measurement point using a pressure sensor; the pressure sensor is connected through a pressure guiding pipe to a pressure guiding hole provided in the bipolar plate at the position of the bottom measurement point of the target flow channel; obtains the calibrated pressure drop value of each target flow channel; for each target flow channel, determines the flow channel pressure drop value of the target flow channel according to the actual gas pressure values of multiple measurement points in the target flow channel; the pressure drop information includes the pressure drop values of each target flow channel in the target area; for each target flow channel, determines whether the flow resistance of the target flow channel meets the first preset condition according to the flow channel pressure drop value and the calibrated pressure drop value of the target flow channel, and determines that the flow resistance of the target flow channel is abnormal when the flow resistance of the target flow channel does not meet the first preset condition. By providing pressure guiding holes at multiple measurement points at the bottom of the flow channels of the bipolar plate, it is possible to obtain the pressure values at different positions of the bipolar plate only using a pressure sensor, thereby determining the pressure drop of different flow channels, and further being able to conveniently and quickly determine whether there is an abnormality in the flow resistance of different areas of the bipolar plate, improving the accuracy of bipolar plate flow resistance monitoring.

[0152] Figure 5 It is a block diagram of a device for a fuel cell bipolar plate flow resistance monitoring method shown according to an exemplary embodiment. For example, device 500 may be an electronic device, such as a mobile phone, a computer, a digital broadcast terminal, a messaging device, a game console, a tablet device, a medical device, a fitness device, a personal digital assistant, etc.

[0153] Referring to Figure 5 , device 500 may include one or more of the following components: a processing component 502, a memory 504, a power component 506, a multimedia component 508, an audio component 510, an input / output (I / O) interface 512, a sensor component 514, and a communication component 516.

[0154] The processing component 502 generally controls the overall operation of the device 500, such as operations associated with display, telephone calls, data communication, camera operations, and recording operations. The processing component 502 may include one or more processors 520 to execute instructions to complete all or part of the steps of the above method. In addition, the processing component 502 may include one or more modules to facilitate the interaction between the processing component 502 and other components. For example, the processing component 502 may include a multimedia module to facilitate the interaction between the multimedia component 508 and the processing component 502.

[0155] The memory 504 is configured to store various types of data to support the operation of the device 500. Examples of such data include instructions for any application or method operating on the device 500, contact data, phone book data, messages, pictures, videos, and the like. The memory 504 can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as static random access memory (SRAM), electrically erasable programmable read-only memory (EEPROM), erasable programmable read-only memory (EPROM), programmable read-only memory (PROM), read-only memory (ROM), magnetic memory, flash memory, a magnetic disk, or an optical disk.

[0156] The power component 506 provides power to the various components of the device 500. The power component 506 may include a power management system, one or more power supplies, and other components associated with generating, managing, and distributing power for the device 500.

[0157] The multimedia component 508 includes a screen that provides an output interface between the device 500 and the user. In some embodiments, the screen may include a liquid crystal display (LCD) and a touch panel (TP). If the screen includes a touch panel, the screen can be implemented as a touch screen to receive input signals from the user. The touch panel includes one or more touch sensors to sense touches, swipes, and gestures on the touch panel. The touch sensors can not only sense the boundaries of the touch or swipe actions, but also detect the duration and pressure associated with the touch or swipe operations. In some embodiments, the multimedia component 508 includes a front camera and / or a rear camera. When the device 500 is in an operating mode, such as a shooting mode or a video mode, the front camera and / or the rear camera can receive external multimedia data. Each of the front camera and the rear camera can be a fixed optical lens system or have a focal length and optical zoom capabilities.

[0158] The audio component 510 is configured to output and / or input audio signals. For example, the audio component 510 includes a microphone (MIC) that is configured to receive external audio signals when the device 500 is in an operating mode, such as a call mode, a recording mode, and a voice recognition mode. The received audio signals can be further stored in the memory 504 or transmitted via the communication component 516. In some embodiments, the audio component 510 further includes a speaker for outputting audio signals.

[0159] The I / O interface 512 provides an interface between the processing component 502 and a peripheral interface module, which can be a keyboard, a click wheel, buttons, and the like. These buttons can include, but are not limited to: a home button, a volume button, a power button, and a lock button.

[0160] The sensor assembly 514 includes one or more sensors for providing an assessment of various aspects of the status of the device 500. For example, the sensor assembly 514 can detect the on / off state of the device 500, the relative positioning of components, such as the display and keypad of the device 500. The sensor assembly 514 can also detect a change in the position of the device 500 or a component of the device 500, the presence or absence of user contact with the device 500, the orientation or acceleration / deceleration of the device 500, and the temperature change of the device 500. The sensor assembly 514 can include a proximity sensor configured to detect the presence of nearby objects without any physical contact. The sensor assembly 514 can also include a light sensor, such as a CMOS or CCD image sensor, for use in imaging applications. In some embodiments, the sensor assembly 514 can also include an acceleration sensor, a gyroscope sensor, a magnetic sensor, a pressure sensor, or a temperature sensor.

[0161] The communication component 516 is configured to facilitate communication between the device 500 and other devices in a wired or wireless manner. The device 500 can access a wireless network based on communication standards, such as WiFi, 2G, or 3G, or a combination thereof. In an exemplary embodiment, the communication component 516 receives a broadcast signal or broadcast-related information from an external broadcast management system via a broadcast channel. In an exemplary embodiment, the communication component 516 further includes a near field communication (NFC) module to facilitate short-range communication. For example, the NFC module can be implemented based on radio frequency identification (RFID) technology, infrared data association (IrDA) technology, ultra-wideband (UWB) technology, Bluetooth (BT) technology, and other technologies.

[0162] In an exemplary embodiment, the device 500 can be implemented by one or more application specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field programmable gate arrays (FPGAs), controllers, microcontrollers, microprocessors, or other electronic components for performing the above method.

[0163] In an exemplary embodiment, a non-transitory computer-readable storage medium including instructions is also provided, such as a memory 504 including instructions, and the above instructions can be executed by the processor 520 of the device 500 to complete the above method. For example, the non-transitory computer-readable storage medium can be a ROM, a random access memory (RAM), a CD-ROM, a magnetic tape, a floppy disk, and an optical data storage device, etc.

[0164] In an exemplary embodiment, a computer program product including a computer program is also provided, and the computer program implements the above method when executed by the processor 520 of the device 500.

[0165] Other embodiments of the present invention will be readily apparent to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This disclosure is intended to cover any variations, uses, or adaptations of the invention that follow the general principles of the invention and include known or customary technical means in the art not disclosed herein. The specification and examples are only to be considered as exemplary, and the true scope and spirit of the invention are pointed out by the following claims.

[0166] It should be understood that the present invention is not limited to the exact structures described above and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present invention is only limited by the appended claims.

Claims

1. A method for monitoring the flow resistance of a fuel cell bipolar plate, characterized in that: include: Acquire actual gas pressure values ​​of multiple measuring points on each target flow channel in the bipolar plate to be tested; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; The pressure sensor is connected to a pressure-inducing hole arranged in the bipolar plate and at a measuring point at the bottom of the target flow channel through a pressure-inducing pipe; Obtaining a calibrated pressure drop value of each target flow channel; For each target flow channel, a flow channel pressure drop value of the target flow channel is determined according to actual gas pressure values ​​at multiple measuring points in the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel in the target area; For each target flow channel, whether the flow resistance of the target flow channel meets a first preset condition is determined based on the flow channel pressure drop value of the target flow channel and the calibrated pressure drop value. If the flow resistance of the target flow channel does not meet the first preset condition, it is determined that the flow resistance of the target flow channel is abnormal.

2. The method for monitoring flow resistance of a fuel cell bipolar plate according to claim 1, characterized in that: Also includes: For each target flow channel, determining a flow channel flow rate of the target flow channel based on a pressure drop value of the target flow channel; Obtaining the entire plate flow rate of the bipolar plate to be tested; Based on the whole plate flow rate and the flow channel flow rate, determining whether the flow rate of the target flow channel meets a second preset condition; In the case that the flow rate of at least one target flow channel does not satisfy the second preset condition, it is determined that the flow field distribution of the bipolar plate is uneven.

3. The method for monitoring flow resistance of a fuel cell bipolar plate according to claim 1, characterized in that: The target flow channel includes a first flow channel, a second flow channel, a third flow channel and a fourth flow channel, the first flow channel is the first flow channel of the gas inlet distribution area of ​​the bipolar plate to be tested, the second flow channel is the last flow channel of the gas inlet distribution area of ​​the bipolar plate to be tested, the third flow channel is the first flow channel of the gas outlet distribution area of ​​the bipolar plate to be tested, and the fourth flow channel is the last flow channel of the gas outlet distribution area of ​​the bipolar plate to be tested; The step of obtaining actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate to be tested includes: Obtaining a pressure value of a first measuring point and a pressure value of a second measuring point on each target flow channel among the first flow channel, the second flow channel, the third flow channel and the fourth flow channel; the first measuring point is the starting point of the target flow channel, and the second measuring point is the end point of the target flow channel; For each target flow channel, determining the flow channel pressure drop value of the target flow channel according to actual gas pressure values ​​of multiple measuring points in the target flow channel includes: For each target flow channel among the first flow channel, the second flow channel, the third flow channel and the fourth flow channel, the difference between the pressure value of the first measuring point and the pressure value of the second measuring point on the target flow channel is calculated to obtain the flow channel pressure drop value of the target flow channel.

4. The method for monitoring flow resistance of a fuel cell bipolar plate according to claim 1, characterized in that: The target flow channel includes a fifth flow channel, and there are multiple fifth flow channels, and the fifth flow channel is a flow channel arranged in the mainstream reaction area of ​​the bipolar plate to be tested; the multiple fifth flow channels are evenly distributed; The step of obtaining actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate to be tested includes: Obtaining a pressure value of a third measuring point, a pressure value of a fourth measuring point, and a pressure value of a fifth measuring point on each of the plurality of fifth flow channels; the third measuring point is the starting point of the fifth flow channel, the fourth measuring point is the midpoint of the fifth flow channel, and the fifth measuring point is the end point of the fifth flow channel; For each target flow channel, determining the flow channel pressure drop value of the target flow channel according to actual gas pressure values ​​of multiple measuring points in the target flow channel includes: For each of the plurality of fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula: △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点 Among them, △P i在 is the pressure drop value of the i-th target flow channel, P i起点 is the pressure value of the third measuring point, P i中间 is the pressure value of the fourth measuring point, P i终点 is the pressure value of the fifth measuring point.

5. The method for monitoring flow resistance of a fuel cell bipolar plate according to claim 1, characterized in that: The calibration pressure drop value is a first average value of the target flow channel pressure drop value within a first preset time period of the bipolar plate to be tested in an offline dry gas state; The determining, based on the flow channel pressure drop value of the target flow channel and the calibrated pressure drop value, whether the flow resistance of the target flow channel satisfies a first preset condition comprises: Calculating a second average value of the flow channel pressure drop value of the target flow channel within a second preset interval; Calculating a difference between the first average value and the second average value to obtain a first difference value; Determine a proportion of the first difference in the second average value; When the proportion value is greater than the first preset proportion value, it is determined that the flow resistance of the target flow channel does not satisfy the first preset condition.

6. The method for monitoring flow resistance of a fuel cell bipolar plate according to claim 2, characterized in that: The determining, based on the whole plate flow rate and the flow rate of the flow channel, whether the flow rate of the target flow channel satisfies a second preset condition comprises: Obtaining a first relationship between flow and pressure drop; the first relationship is obtained by fitting the relationship between the whole plate flow and pressure drop of the bipolar plate to be tested in an offline dry gas state; Calculating the flow rate of the target flow channel by using the flow rate of the flow channel and the first relationship; Calculating a first proportion of the whole plate flow rate in the number of flow channels of the bipolar plate to be tested to obtain a standard flow rate; A second proportion of the flow rate of the target flow channel in the standard flow rate is calculated, and when the second proportion is greater than a preset threshold, it is determined that the flow rate of the target flow channel does not satisfy a second preset condition.

7. A fuel cell bipolar plate flow resistance monitoring device, characterized in that: include: A first acquisition unit is used to acquire actual gas pressure values ​​of multiple measuring points on each target flow channel in the bipolar plate to be tested; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; The pressure sensor is connected to a pressure-inducing hole arranged in the bipolar plate and at a measuring point at the bottom of the target flow channel through a pressure-inducing pipe; A second acquisition unit, used to acquire a calibrated pressure drop value of each target flow channel; A first determining unit is used to determine, for each target flow channel, a flow channel pressure drop value of the target flow channel according to actual gas pressure values ​​of multiple measuring points in the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel in the target area; The second determination unit is used to determine, for each target flow channel, whether the flow resistance of the target flow channel meets a first preset condition based on the flow channel pressure drop value of the target flow channel and the calibrated pressure drop value, and to determine that the flow resistance of the target flow channel is abnormal if the flow resistance of the target flow channel does not meet the first preset condition.

8. An electronic device, characterized in that: include: A memory, a processor, and a computer program stored in the memory and executable on the processor, wherein when the processor executes the computer program, the method according to any one of claims 1 to 6 is implemented.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the method according to any one of claims 1 to 6 is implemented.

10. A computer program product, comprising a computer program, characterized in that The computer program implements the method according to any one of claims 1 to 6 when executed by a processor.

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