Compatible photomask cleaning equipment and cleaning method

Abstract

The invention relates to the field of semiconductor production equipment manufacturing, in particular to compatible photomask cleaning equipment and a cleaning method. The device comprises a cleaning pool which is suitable for containing liquid medicine; a water inlet pipe and a water outlet pipe are mounted on one side of the cleaning pool; wherein the water inlet pipe is communicated with the bottom of the cleaning pool; a bottom spraying pipe is arranged at the bottom of the cleaning pool; and a top spraying pipe is arranged at the top of the cleaning pool. The water inlet pipe and the water outlet pipe are arranged on one side of the cleaning pool, the liquid medicine is supplemented into the cleaning pool through the bottom spraying pipe and the top spraying pipe, and the liquid medicine in the cleaning pool is discharged through the water outlet pipe, so that the liquid medicine in the cleaning pool keeps stable concentration, and the situation that the cleaning quality is reduced due to the fact that the concentration of the liquid medicine is gradually reduced when the liquid medicine cleans a photomask in a standing state is avoided.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor production equipment manufacturing, and particularly to a compatible photomask cleaning device and a cleaning method. Background Art

[0002] In the process of semiconductor production and manufacturing, lithography, etching, and oxidation are key technologies in the process. Among them, lithography is to "print" the circuit pattern onto the photomask through light, and the coating, exposure, and development of photoresist are the key steps. Among them, the photomask, that is, the photomask, as an important component in the exposure equipment, various specifications of photomasks will be used in the process of semiconductor chip and panel manufacturing. When performing the "printing" process, high requirements are placed on the cleanliness of the photomask. After the photomask is used for a period of time, fine dust and the like will accumulate, so the photomask needs to be cleaned.

[0003] However, in the related art, the liquid medicine in the cleaning tank is in a static state and is replaced after a period of time, resulting in a decrease in the concentration of the liquid medicine and a decline in the cleaning effect in the later stage of the use of the liquid medicine.

[0004] Therefore, there is an urgent need to design a compatible photomask cleaning device and a cleaning method to solve the technical problems that in the later stage of the use of the above-mentioned liquid medicine, the concentration of the liquid medicine decreases and the cleaning effect declines.

[0005] It should be noted that the above information disclosed in this background art section is only used to understand the background art of the concept of this embodiment, and therefore, it may include information that does not constitute the prior art. Summary of the Invention

[0006] The embodiments of the present disclosure at least provide a compatible photomask cleaning device and a cleaning method.

[0007] In a first aspect, the embodiments of the present disclosure provide a compatible photomask cleaning device, including: a cleaning tank, the inside of which is adapted to hold liquid medicine; A water inlet pipe and a water outlet pipe are respectively installed on one side of the cleaning tank; Wherein, the water inlet pipe is communicated with the bottom of the cleaning tank; A bottom spray pipe is arranged at the bottom of the cleaning tank; A top spray pipe is arranged at the top of the cleaning tank.

[0008] In an optional embodiment, the diameter of the water outlet pipe is larger than the diameter of the water inlet pipe.

[0009] In an optional embodiment, a plurality of overflow ports are provided at the top of the side wall of the cleaning tank.

[0010] In an alternative embodiment, the cleaning device further includes a drying device, which includes a positioning table, a drying base, and a drying motor. There are several placement stations on the wafer stage, and the drying motor is drivingly connected to the drying base; A drying box is further installed on the positioning table, and the drying box covers the outside of the wafer stage.

[0011] In an alternative embodiment, an air extraction pipeline is further provided at the bottom of the drying box; One end of the air extraction pipeline is communicated with the inside of the drying box.

[0012] In an alternative embodiment, the cleaning device further includes a flipping device, which includes two flipping components. Each flipping component includes a flipping plate and a rotating shaft adapted to drive the flipping plate to rotate. Claws are respectively installed at both ends of the flipping plate, and clamping limit grooves are provided at the ends of the claws.

[0013] In an alternative embodiment, each flipping component further includes a fixture bottom plate and two fixture positioning plates slidably installed on the fixture bottom plate; The rotating shaft is drivingly connected to the fixture positioning plate.

[0014] In an alternative embodiment, the cleaning device further includes a device frame, a guide rail, a main manipulator, and a sub-manipulator. The device frame covers the outside of the guide rail, the main manipulator, and the sub-manipulator. The main manipulator is slidably arranged on the guide rail, and the sub-manipulator is arranged on one side of the cleaning tank; In an alternative embodiment, the main manipulator includes a long arm and a short arm, and main clamps are installed on both the long arm and the short arm.

[0015] The sub-manipulator includes a sub-lifting rod and a sub-clamp installed at the end of the sub-lifting rod.

[0016] The embodiments of the present disclosure further provide a photomask cleaning method, which is applied to the compatible photomask cleaning device as described above. The cleaning method includes the following steps: Step S1, putting the photomask into the cleaning tank for cleaning; Step S2, the water inlet pipe replenishes the cleaning liquid into the cleaning tank through the bottom spray pipe and the top spray pipe, and the water outlet pipe discharges the cleaning liquid in the cleaning tank, so as to keep the concentration of the cleaning liquid in the cleaning tank stable.

[0017] The beneficial effect of the present invention is that by providing a water inlet pipe and a water outlet pipe on one side of the cleaning tank, and replenishing the cleaning liquid into the cleaning tank through the bottom spray pipe and the top spray pipe, and the water outlet pipe discharges the cleaning liquid in the cleaning tank, the concentration of the cleaning liquid in the cleaning tank is kept stable, avoiding cleaning the photomask in a static state of the cleaning liquid, and the cleaning quality is reduced due to the gradual decrease of the cleaning liquid concentration.

[0018] Other features and advantages of the present invention will be set forth in the following description, and in part will be obvious from the description, or may be learned by practice of the present invention. The objectives and other advantages of the present invention are realized and attained by the structure particularly pointed out in the specification, claims as well as the drawings.

[0019] To make the above objectives, features and advantages of the present invention more comprehensible, the following specific preferred embodiments are given, in conjunction with the accompanying drawings, and are described in detail as follows. Brief Description of the Drawings

[0020] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following will briefly introduce the drawings required for the description of the specific embodiments or the prior art. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0021] Figure 1 A perspective view of a compatible photomask cleaning device provided by an embodiment of the present disclosure; Figure 2 A schematic position diagram of a flipping device provided by an embodiment of the present disclosure; Figure 3 A schematic structural diagram of a cleaning tank provided by an embodiment of the present disclosure; Figure 4 A perspective view of a cleaning tank provided by an embodiment of the present disclosure; Figure 5 A schematic structural diagram of a flipping device provided by an embodiment of the present disclosure; Figure 6 A schematic structural diagram of a main manipulator provided by an embodiment of the present disclosure; Figure 7 A schematic structural diagram of an auxiliary manipulator provided by an embodiment of the present disclosure; Figure 8 A schematic structural diagram of a drying device provided by an embodiment of the present disclosure; Figure 9 A schematic structural diagram of a drying base provided by an embodiment of the present disclosure; Figure 10 A schematic structural diagram of a loading device provided by an embodiment of the present disclosure; Figure 11 A flowchart of the operation of a compatible photomask cleaning device provided by an embodiment of the present disclosure; Figure 12 A schematic structural diagram of a device frame provided by an embodiment of the present disclosure; Figure 13Schematic diagram of the device distribution of a compatible photomask cleaning device provided by an embodiment of the present disclosure.

[0022] In the figure: 1. Cleaning tank; 11. Water inlet pipe; 12. Water outlet pipe; 13. Bottom spray pipe; 14. Top spray pipe; 15. Overflow port; 16. Housing; 2. Drying device; 21. Positioning table; 22. Drying seat; 23. Drying motor; 24. Drying box; 25. Exhaust pipe; 26. Drying fixture; 27. Drying flipping table; 3. Flipping device; 31. Flipping plate; 32. Rotating shaft; 33. Claw; 34. Clamping limit groove; 35. Fixture bottom plate; 36. Fixture positioning plate; 4. Equipment frame; 5. Guide rail; 6. Main manipulator; 61. Long arm; 62. Short arm; 63. Main fixture; 7. Sub-manipulator; 71. Lifting rod; 72. Sub-fixture; 8. Loading device; 81. Lifting seat; 82. Loading table; 83. Loading motor; 84. Carrier plate. Detailed implementation manners

[0023] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Apparently, the described embodiments are some but not all of the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0024] It has been found through research that the liquid medicine inside the cleaning tank is in a static state and is replaced after a period of time, resulting in a decrease in the concentration of the liquid medicine and a decline in the cleaning effect in the later stage of the use of the liquid medicine.

[0025] All the defects existing in the above solutions are the results obtained by the inventor through practice and careful research. Therefore, the process of discovering the above problems and the solutions proposed by the present disclosure for the above problems in the following text should be the contributions made by the inventor to the present disclosure during the process of the present disclosure.

[0026] Hereinafter, some embodiments of the present invention will be described in detail with reference to the accompanying drawings. Without conflict, the following embodiments and the features in the embodiments can be combined with each other. In addition, in the drawings, for the purpose of effectively describing the technical content, the thickness of the components can be exaggerated or reduced.

[0027] It should be noted that similar reference numerals and letters denote similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0028] Based on the above research, with reference to Figure 1 and Figure 12 , an embodiment of the present disclosure provides a compatible photomask cleaning device, including: a device frame 4, a guide rail 5, a main manipulator 6, a sub-manipulator 7, a flipping device 3, a cleaning tank 1, and a drying device 2. The device frame 4 is used to cover the outside of the above-mentioned devices to encapsulate the devices and provide protection. The guide rail 5 is horizontally arranged along the width direction of the device frame 4, and the flipping device 3, the cleaning tank 1, and the drying device 2 are arranged in sequence along the guide rail 5. The main manipulator 6 is slidably arranged on the guide rail 5, and the sub-manipulator 7 is installed on one side of the cleaning tank 1.

[0029] With reference to Figure 13 , through the above settings, after the photomask is manually or automatically loaded horizontally, the flipping device 3 clamps the diagonal and flips it to the vertical state, and then transfers it to the main manipulator 6. The main manipulator 6 clamps the photomask and moves along the guide rail 5 to one side of the cleaning tank 1, and transfers the photomask to the sub-manipulator 7. After the sub-manipulator 7 receives the photomask, it carries the photomask down and immerses it in the cleaning tank 1, and the photomask is cleaned by the liquid medicine in the cleaning tank 1. After the cleaning is completed, the sub-manipulator 7 rises and transfers the photomask to the main manipulator 6. The main manipulator 6 continues to move the photomask along the guide rail 5 to one side of the drying device 2. The drying device 2 receives the photomask in the vertical state and flips it to the horizontal state, then rotates to dry the photomask. After the drying is completed, the photomask is flipped back to the vertical state and transferred to the main manipulator 6. The main manipulator 6 conveys the dried photomask along the guide rail 5 to the next process.

[0030] With reference to Figure 3 , in at least one embodiment, in order to maintain a stable concentration of the liquid medicine in the cleaning tank 1, a water inlet pipe 11 and a water outlet pipe 12 are respectively installed on one side of the cleaning tank 1. The liquid medicine is replenished into the cleaning tank 1 through the water inlet pipe 11, and the liquid medicine in the cleaning tank 1 is discharged through the water outlet pipe 12, so as to form a state where the old liquid medicine can be discharged and new liquid medicine can be replenished, avoiding the decrease in the concentration of the liquid medicine in the static state during continuous immersion cleaning of the photomask, which affects the cleaning quality. On the other hand, the water inlet pipe 11 is communicated with the bottom of the cleaning tank 1, that is, the height of the water outlet pipe 12 is higher than that of the water inlet pipe 11, to ensure that the liquid medicine is fully utilized in the cleaning tank 1 and will not be quickly discharged, resulting in "idle running". In addition, a bottom spray pipe 13 is arranged at the bottom of the cleaning tank 1, and a top spray pipe 14 is arranged at the top of the cleaning tank 1. Both the bottom spray pipe 13 and the top spray pipe 14 are communicated with the water inlet pipe 11. While the bottom spray pipe 13 and the top spray pipe 14 improve the water inlet rate, the bottom spray pipe 13 and the top spray pipe 14 can make the range where the liquid medicine enters cover as much as possible the entire range of the cleaning tank 1, that is, the liquid inlet is more uniform, improving the mixing effect.

[0031] In at least one embodiment, the diameter of the water outlet pipe 12 is larger than that of the water inlet pipe 11 to improve the water outlet efficiency.

[0032] Reference Figure 3 In at least one embodiment, the top of the side wall of the cleaning tank 1 has a plurality of overflow ports 15. The overflow circulation can be designed according to the process requirements and the water inlet rate of the water inlet pipe 11 to maintain the concentration of the liquid medicine.

[0033] Reference Figure 4 In some embodiments, a cover shell 16 is provided on the top of the cleaning pool 1 , and the cover shell 16 is used to protect the cleaning pool 1 .

[0034] Reference Figure 2 and Figure 5 In at least one embodiment, the cleaning device further comprises a flipping device 3, the flipping device 3 comprises a fixture bottom plate 35, two fixture positioning plates 36 and two flipping assemblies, the two fixture positioning plates 36 are both slidably arranged on the fixture bottom plate 35, the two flipping assemblies are respectively mounted on the two fixture positioning plates 36, and the two flipping assemblies are arranged opposite to each other. The fixture positioning plate 36 has a motor inside to drive the flipping assembly to rotate. Specifically, the flipping assembly comprises a flipping plate 31 and a rotating shaft 32 suitable for driving the flipping plate 31 to rotate, and claws 33 are respectively mounted at both ends of the flipping plate 31. The rotating shaft 32 is inserted into the fixture positioning plate 36 and connected to the motor. The clamping ends of the two claws 33 are arranged obliquely so that when the flipping assembly clamps the photomask, the two claws 33 of one flipping assembly clamp the two diagonal sides of the photomask respectively. Since the photomask is square, this clamping method can cope with photomasks of different sizes and stably clamp the diagonal sides of the photomask. Furthermore, a clamping limit groove 34 is formed at the end of the clamping jaw 33 , and the edge of the light mask can be inserted into the clamping limit groove 34 , thereby preventing the light mask from being separated from the clamping jaw 33 when flipping.

[0035] Therefore, the flip assembly has the function of being compatible with masks of different sizes. In order to keep this function uniform in the overall device, in some embodiments, when other components clamp the mask, they clamp it diagonally.

[0036] Reference Figure 9 In at least one embodiment, the drying device 2 includes a positioning table 21, a drying seat 22 and a drying motor 23. The wafer carrier is provided with a plurality of placement stations, and the drying motor 23 is connected to the drying seat 22 by transmission. The placement station can be composed of a plurality of step blocks distributed in an array, so that the square photomask can be embedded in the inner side of the steps of a plurality of step blocks to form a positioning. And according to the above arrangement, a plurality of placement stations can be arranged in a staggered manner, or an inner and outer ring arrangement can be formed along the axial direction to adapt to photomasks of different sizes. After the photomask is placed, the drying motor 23 drives the drying seat 22 to rotate, thereby driving the photomask to rotate to achieve drying.

[0037] In addition, refer to Figure 8, since the main manipulator 6 holds the photomask in a vertical state during transfer, while the photomask needs to be in a horizontal state during drying, the drying device 2 further includes two drying turntables 27 and two drying jigs 26. The two drying turntables 27 are respectively arranged on both sides of the drying box 24. The two drying jigs 26 are rotatably installed on the two drying turntables 27, and the two drying turntables 27 are adapted to slide horizontally. And a motor is arranged inside the drying turntable 27, and the motor is connected to the corresponding drying jig 26. Through the above settings, when the main manipulator 6 holds the photomask and enters the drying box 24, the drying turntable 27 drives the drying jig 26 to hold the photomask and flip it to the horizontal. Conversely, after drying is completed, the photomask in the horizontal state can also be flipped to the vertical for the main manipulator 6 to pick up.

[0038] Referring to Figure 8 , in at least one embodiment, in order to further limit the wanton splashing of the ejected liquid medicine, a drying box 24 is further installed on the positioning table 21. The drying box 24 covers the outside of the wafer stage to block the liquid medicine. At the same time, the liquid medicine will volatilize in the drying box 24 to generate alkaline or acidic gases, which are easily attached to the photomask and affect the drying quality. Therefore, an air extraction pipeline 25 is further arranged at the bottom of the drying box 24. One end of the air extraction pipeline 25 is communicated with the inside of the drying box 24, and the other end is connected to an air pump. By continuously extracting air, an air flow from top to bottom is formed in the drying box 24 to take away the volatilized liquid medicine.

[0039] Referring to Figure 6 , in at least one embodiment, the main manipulator 6 includes a long arm 61 and a short arm 62, and main jigs 63 are installed on both the long arm 61 and the short arm 62. A motor is arranged inside the main manipulator 6, and a gear is installed at the movable end of the motor. And racks are arranged on both the long arm 61 and the short arm 62, so that when the motor is started, the long arm 61 and the short arm 62 are driven to slide linearly through the gear, thereby realizing the effect of controlling the long arm 61 and the short arm 62 to open or close. When the long arm 61 and the short arm 62 are closed, the photomask is clamped diagonally by the main jig 63, and conversely, the photomask is released.

[0040] Referring to Figure 7 , in at least one embodiment, the auxiliary manipulator 7 includes an auxiliary lifting rod 71 and an auxiliary jig 72 installed at the end of the auxiliary lifting rod 71. The auxiliary lifting rod 71 is used to drive the auxiliary jig 72 to lift and lower. That is, after the main manipulator 6 transfers the photomask to the auxiliary manipulator 7, the auxiliary jig 72 clamps the diagonal of the bottom of the photomask and is driven by the auxiliary lifting rod 71 to descend into the cleaning pool 1. After cleaning is completed, it rises through the auxiliary lifting rod 71 and disengages from the cleaning pool 1.

[0041] Referring to Figure 10, in at least one embodiment, the compatible photomask cleaning device further includes a loading device 8, which is also arranged on one side of the guide rail 5 and is located in front of the flipping device 3 along the conveying process of the photomask. The loading device 8 includes a lifting seat 81, a loading table 82, a loading motor 83 and a wafer carrier 84. There is a cylinder on the equipment frame 4 to drive the lifting seat 81 to lift and lower in the vertical direction. The loading motor 83 is installed on the lifting seat 81, and the loading table 82 is installed at the movable end of the loading motor 83, so that when the loading motor 83 is started, it can drive the loading table 82 to rotate. The wafer carrier 84 is arranged on the loading table 82. After the photomask is initially loaded manually or automatically, it is placed on the wafer carrier 84. Then, the lifting seat 81 drives the loading table 82 to lift and lower, and the loading motor 83 drives the loading table 82 to rotate, so that the wafer carrier 84 conveys the photomask to the center of the flipping device 3, so that the flipping device 3 can flip the horizontally placed photomask into a vertical state.

[0042] In addition, an embodiment of the present disclosure also provides a cleaning method, which is applied to the compatible photomask cleaning device as described above. The cleaning method includes the following steps: Step S1, put the photomask into the cleaning tank 1 for cleaning; Step S2, the water inlet pipe 11 replenishes the cleaning liquid into the cleaning tank 1, and the water outlet pipe 12 discharges the cleaning liquid in the cleaning tank 1, so as to keep the concentration of the cleaning liquid in the cleaning tank 1 stable.

[0043] In addition, referring to Figure 11 , an embodiment of the present disclosure also provides a usage method of a compatible photomask cleaning device. Using the compatible photomask cleaning device as described above and executing this usage method, it specifically includes the following steps: Step A1, place the photomask on the wafer carrier 84 through manual or automatic loading equipment; Step A2, the lifting seat 81 lifts the loading table 82, and the loading motor 83 drives the loading table 82 to rotate, so that the wafer carrier 84 conveys the photomask to the flipping device 3; Step A3, the fixture positioning plate 36 drives the jaws 33 to clamp the photomask and flips it to the vertical through the rotating shaft 32; Step A4, the main manipulator 6 clamps the photomask through the main fixture 63 and conveys it to one side of the cleaning tank 1 along the guide rail 5; Step A5, the auxiliary manipulator 7 clamps the photomask through the auxiliary fixture 72; Step A6, the auxiliary manipulator 7 descends through the lifting rod 71 to be immersed in the cleaning tank 1 to clean the photomask; Step A7, the auxiliary manipulator 7 rises and transfers the photomask to the main manipulator 6; Step A8, the main manipulator 6 clamps the photomask and conveys it to the drying device 2; Step A9, the drying fixture 26 clamps the photomask and flips it to the horizontal; Step A10: The drying motor 23 drives the drying base 22 to rotate to dry the photomask. Step A11: The drying fixture 26 clamps the photomask again and flips it to the vertical position. Step A12: The main manipulator 6 receives the photomask and transports it to the unloading location.

[0044] In several embodiments provided in this embodiment, it should be understood that the disclosed system, device, and method can be implemented in other ways. The device embodiments described above are merely illustrative. For example, the division of the units is only a logical function division, and there may be other division methods in actual implementation. For another example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Based on the above inspiration from the ideal embodiment of the present invention, through the above description, relevant staff can completely make various changes and modifications without departing from the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A compatible mask cleaning device, characterized in that: include: At least one cleaning tank (1), the interior of which is suitable for containing liquid medicine; A water inlet pipe (11) and a water outlet pipe (12) are respectively installed on one side of the cleaning pool (1); Wherein, the water inlet pipe (11) is connected to the bottom of the cleaning pool (1); A bottom spray pipe (13) is provided at the bottom of the cleaning pool (1); A top spray pipe (14) is provided on the top of the cleaning pool (1).

2. The compatible mask cleaning device according to claim 1, characterized in that: The diameter of the water outlet pipe (12) is greater than the diameter of the water inlet pipe (11).

3. The compatible mask cleaning device according to claim 1, characterized in that: The top of the side wall of the cleaning tank (1) is provided with a plurality of overflow ports (15); A protective cover shell (16) is installed on the top of the cleaning tank (1).

4. The compatible mask cleaning device according to claim 1, characterized in that: The cleaning device further comprises a drying device (2), the drying device (2) comprising a positioning platform (21), a drying seat (22) and a drying motor (23), the wafer carrier platform is provided with a plurality of placement positions, and the drying motor (23) is connected to the drying seat (22) by transmission; A drying box (24) is also installed on the positioning platform (21), and the drying box (24) is covered on the outside of the film carrier platform.

5. The compatible mask cleaning device according to claim 4, characterized in that: The bottom of the drying box (24) is also provided with an air extraction pipe (25); One end of the air extraction pipe (25) is in communication with the interior of the drying box (24).

6. The compatible mask cleaning device according to claim 4, characterized in that: The drying device (2) further comprises two drying turning tables (27) and two drying clamps (26), wherein the two drying turning tables (27) are respectively arranged on two sides of the drying box (24), and the two drying clamps (26) are rotatably mounted on the two drying turning tables (27); The two drying turning platforms (27) are suitable for sliding horizontally.

7. The compatible mask cleaning device according to claim 1, characterized in that: The cleaning device further comprises a flipping device (3), the flipping device (3) comprising two flipping components, the flipping components comprising a flipping plate (31) and a rotating shaft (32) suitable for driving the flipping plate (31) to rotate, clamping claws (33) are respectively installed at both ends of the flipping plate (31), and the ends of the clamping claws (33) are provided with clamping limit grooves (34).

8. The compatible mask cleaning device according to claim 7, characterized in that: The flip assembly also includes a fixture bottom plate (35) and two fixture positioning plates (36) slidably mounted on the fixture bottom plate (35); The rotating shaft (32) is in transmission connection with the fixture positioning plate (36).

9. The compatible mask cleaning device according to claim 1, characterized in that: The cleaning device further comprises a device frame (4), a guide rail (5), a main manipulator (6) and an auxiliary manipulator (7); the device frame (4) is covered on the outside of the guide rail (5), the main manipulator (6) and the auxiliary manipulator (7); the main manipulator (6) is slidably arranged on the guide rail (5); and the auxiliary manipulator (7) is arranged on one side of the cleaning pool (1).

10. The compatible mask cleaning device according to claim 9, characterized in that: The main manipulator (6) comprises a long arm (61) and a short arm (62), and a main clamp (63) is installed on both the long arm (61) and the short arm (62). The auxiliary manipulator (7) comprises an auxiliary lifting rod (71) and an auxiliary clamp (72) mounted on the end of the auxiliary lifting rod (71).

11. The compatible mask cleaning device according to claim 9, characterized in that: The cleaning device further comprises a loading device, the loading device (8) comprising a lifting seat (81), a loading platform (82), a loading motor (83) and a wafer carrier (84), the device frame (4) having a cylinder for driving the lifting seat (81) to move up and down in a vertical direction, the loading motor (83) being mounted on the lifting seat (81), and the loading platform (82) being mounted on the movable end of the loading motor (83) so that the loading platform (82) can be driven to rotate when the loading motor (83) is started; The wafer carrier plate (84) is arranged on the loading platform (82).

12. A photomask cleaning method, characterized in that: Applied to the compatible mask cleaning device according to any one of claims 1 to 11, the cleaning method comprises the following steps: Step S1, placing the photomask into a cleaning tank (1) for cleaning; In step S2, the water inlet pipe (11) replenishes the liquid medicine into the cleaning pool (1), and the water outlet pipe (12) discharges the liquid medicine in the cleaning pool (1), so that the liquid medicine in the cleaning pool (1) maintains a stable concentration.

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