Spray head of deposition device

Abstract

The present invention relates to a showerhead of a deposition apparatus, including a gas plate including a process gas inlet formed in the center, a baffle plate disposed at a lower portion of the gas plate and including a plurality of gas holes, and an end plate disposed at a lower portion of the baffle plate and including a plurality of gas holes. The end plate is pre-assembled at the lower part of the baffle plate to form an assembly of the baffle plate and the end plate, the assembly is mounted at the lower part of the gas plate, and the gas plate on which the assembly is mounted is inserted and arranged in an arrangement groove of a cover formed in a process chamber. According to the invention, the parts of the spray head forming the deposition device can be separated, performance testing can be easily carried out on various part combinations, the cost required for manufacturing the spray heads of various combinations is greatly saved, and the interior of the spray head is easy to clean when polluted.

Description

Technical Field

[0001] The present invention relates to a nozzle of a deposition device, and more particularly to a nozzle of a deposition device capable of realizing separation of various components. Background Art

[0002] Generally, plasma chemical vapor deposition (PECVD) equipment is used to form insulating films, protective films, oxide films, metal films, etc. on the surface of a wafer by chemical reactions of process gases under vacuum in display manufacturing processes or semiconductor manufacturing processes.

[0003] The PECVD equipment has a chamber, providing a process execution space for forming a vacuum and plasma, and a nozzle is provided on the cover of the chamber. The nozzle is arranged to penetrate the cover and plays a role in supplying process gas to the inside of the chamber. When supplying the process gas, the nozzle can also supply the process gas evenly on the entire wafer.

[0004] Reference Figure 1 According to the prior art, the nozzle comprises: a gas plate 1, a baffle plate 2, and an end plate 3. The end plate 3 is formed integrally with a cylindrical portion 3a, and a horizontal flange 3b may be formed at the upper end of the cylindrical portion 3a. The gas plate 1, the baffle plate 2, and the cylindrical portion 3a of the end plate 3 are formed integrally.

[0005] The flange 3b is fixed to the cover 4 of the process chamber by bolts 6, and the shower head can be arranged on the cover 4. An insulating ring 5 is arranged between the cover 4 and the shower head to insulate the shower head.

[0006] Therefore, the process gas is supplied to the interior of the process chamber through the inlet at the center of the gas plate 1 , the gas holes of the baffle plate 2 , and the gas holes of the end plate 3 , thereby depositing a thin film on the surface of the wafer.

[0007] On the other hand, the components that constitute the nozzle (the gas plate 1, the baffle 2, the end plate 3) affect the performance (function, effect) of the nozzle. Therefore, in order to improve the nozzle to produce better chips, various designs and combinations of the components are performed, and it is necessary to test the performance of the nozzle.

[0008] However, according to the prior art, the nozzle is formed of the gas plate 1, the baffle plate 2, and the end plate 3 as a whole, and thus cannot be disassembled.

[0009] Therefore, it is impossible to carry out various combinations and tests on the parts of the nozzle, and thus a new nozzle having the specifications to be tested has to be remade each time, which greatly increases the cost.

[0010] In addition, contamination occurring inside the nozzle cannot be cleaned for the same reason.

[0011] The prior art refers to the technical information that the inventor possesses in order to derive the present invention or that he or she acquires in the process of deriving the present invention. It is not necessarily the known technology disclosed to the general public before the application of the present invention.

[0012] (Prior art literature)

[0013] (Patent Document)

[0014] (Patent Document 1) Korean Patent Publication No. 10-2003-0069705 (published on August 27, 2003) Summary of the invention

[0015] Problem to be solved

[0016] In order to solve the above-mentioned problems, the purpose of the present invention is to provide a nozzle for a deposition device, which can realize the separation between components and facilitate performance testing of various component combinations. Not only that, it greatly saves the cost of making various combinations of nozzles and is easy to clean the inside when contaminated.

[0017] The problems to be solved by the present invention are not limited to those mentioned above, and other problems to be solved that are not mentioned can be clearly understood from the following description by relevant persons having ordinary knowledge in the technical field to which the present invention belongs.

[0018] Means of solving the problem

[0019] According to an embodiment of the present invention, the nozzle of the deposition device includes a gas plate, a baffle plate and an end plate, the gas plate includes a process gas inlet formed in the center, the baffle plate is arranged at the lower part of the gas plate and includes a plurality of gas holes, the end plate is arranged at the lower part of the baffle plate and includes a plurality of gas holes, and it is characterized in that the end plate is preassembled at the lower part of the baffle plate to form an assembly of the baffle plate and the end plate, the assembly is installed at the lower part of the gas plate, and the gas plate with the assembly installed is inserted into and arranged in a setting groove formed in the cover of the process chamber.

[0020] At this time, the component is that a plurality of first bolt holes are formed along the circumferential direction at the outer end of the baffle, and an equal number of first screw grooves corresponding to the first bolt holes are formed at the outer end of the end plate. The first bolt is inserted through the first bolt hole and can be threadedly fastened in the first screw groove.

[0021] In addition, the nozzle of the deposition device is formed with a second bolt hole between each of the first bolt holes in the outer end of the baffle plate, an equal number of second screw grooves corresponding to the second bolt holes of the baffle plate are formed in the outer end of the end plate, a cylindrical portion is formed on the outer periphery of the gas plate, an equal number of second bolt holes corresponding to the second bolt holes of the baffle plate are formed in the cylindrical portion, and a second bolt is inserted through the second bolt hole of the gas plate and the second bolt hole of the baffle plate, and can be threadedly fastened to the second screw groove of the end plate.

[0022] In addition, the nozzle of the deposition device is formed with a plurality of bolt mounting portions protruding radially outward from the upper end of the cylindrical portion of the gas plate, a third bolt hole is formed on the bolt mounting portion, and an equal number of third screw grooves corresponding to the third bolt holes are formed on the cover, and the third bolts are inserted through the third bolt holes of the bolt mounting portion and can be threadedly fastened to the third screw grooves of the cover.

[0023] In addition, the nozzle of the deposition device is formed by the cylindrical portion of the gas plate protruding downward, the outer end portion of the end plate protruding upward, a first diffusion space is formed between the gas plate and the baffle plate, and a second diffusion space is formed between the baffle plate and the end plate.

[0024] In addition, in the gas plate, the second bolt hole in the cylindrical portion and the third bolt hole in the bolt mounting portion may be formed on the same radius line.

[0025] In addition, the shower head of the deposition device includes an insulating ring, and the insulating ring is arranged between the shower head and the cover.

[0026] Effects of the Invention

[0027] As described above, the nozzle of the deposition device according to the present invention can realize the separation between components, and performance testing can be easily carried out for various combinations of components. Not only that, it also greatly saves the cost required to make various combinations of nozzles, and the inside is easy to clean when contaminated.

[0028] The effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned can be clearly understood from the following description by a person skilled in the art having ordinary knowledge in the art to which the present invention belongs. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 2 is a cross-sectional view showing the structure and arrangement structure of a showerhead of a deposition device according to the prior art.

[0030] Figure 22 is a cross-sectional view showing the structure and arrangement structure of a shower head of a deposition device according to an embodiment of the present invention.

[0031] Figure 3 FIG. 1 is a plan view of a gas plate of a structure of a deposition apparatus according to an embodiment of the present invention.

[0032] Figure 4 is a plan view of a baffle of another structure of a deposition apparatus according to an embodiment of the present invention.

[0033] (Explanation of Reference Numerals)

[0034] 10: Gas plate 11: Cylindrical part

[0035] 11a: Second bolt hole 12: Bolt mounting portion

[0036] 12a: Third bolt hole 20: Baffle

[0037] 21: Outer end 21a: First bolt hole

[0038] 21b: Second bolt hole 22: Air hole

[0039] 30: End plate 31: Outer end

[0040] 31a: First screw slot 31b: Second screw slot

[0041] 32: air hole 40: first bolt

[0042] 50: Second bolt 60: First diffusion space

[0043] 70: Second diffusion space 100: Cover

[0044] 100a: Third screw slot 110: Insulation ring

[0045] 120: Third bolt DETAILED DESCRIPTION

[0046] In the present invention, the drawings may be exaggerated for the sake of difference, clarity and ease of understanding of the prior art. In addition, the terms described below are defined as terms considering the functions in the present invention, and may be different according to the intentions or conventions of the operators and users, so the definition of such terms should be defined based on the technical content of the full text of this specification. On the other hand, the embodiments are only examples of the components proposed in the claims of the present invention, and do not limit the scope of rights of the present invention, which should be interpreted based on the technical ideas of the full text of the specification of the present invention.

[0047] Throughout the specification, when a component “includes” a component, this means that other components may also be included, but the components other than the components are not excluded, unless there is a special description to the contrary.

[0048] In addition, when a certain component is “connected”, “contacted” or “combined” to another component, it not only means the case of “direct connection”, “direct contact” or “direct combination”, but also means the case of “connection with other components in between”, “contact with other components in between” or “combination with other components in between”. On the contrary, when a certain component is “directly connected”, “directly contacted” or “directly combined” to another component, it should be understood that there is no other component in between.

[0049] In addition, when using directional terms such as "front", "rear", "up", "down", "left", "right", "one end", "the other end", "both ends", etc., these are used as examples of the directional configuration of the disclosed drawings and should not be interpreted restrictively. When using terms such as "first", "second", etc., these are used as terms to distinguish between various structures and should not be interpreted restrictively.

[0050] In order to more clearly explain the features of the embodiments of the present invention, detailed descriptions of matters known to relevant persons with common knowledge in the technical field to which the following embodiments belong will be omitted. Then, detailed descriptions of parts in the drawings that are not related to the description of the embodiments will be omitted.

[0051] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0052] Figure 2 is a cross-sectional view showing the structure and arrangement structure of a nozzle of a deposition device according to an embodiment of the present invention; Figure 3 is a plan view of a gas plate of a structure of a deposition apparatus according to an embodiment of the present invention; Figure 4 is a plan view of a baffle of another structure of a deposition apparatus according to an embodiment of the present invention.

[0053] Reference Figures 2 to 4 The showerhead of the deposition device according to the embodiment of the present invention comprises: a gas plate 10, a baffle plate 20 and an end plate 30. In the showerhead of the deposition device according to the embodiment of the present invention, the end plate 30 is preassembled at the lower part of the baffle plate 20 to form an assembly of the baffle plate 20 and the end plate 30, and the assembly is installed at the lower part of the gas plate 10, and the gas plate 10 with the assembly installed can be inserted into the installation groove of the cover 100 formed in the process chamber.

[0054] The gas plate 10 is a component constituting the upper portion of the showerhead, and includes a circular process gas inlet 13 formed at the center. Process gas, cleaning gas, etc. can flow into the inlet 13 .

[0055] The gas plate 10 is substantially formed in a disc shape, and may include a cylindrical portion 11 at a frame portion. The cylindrical portion 11 is formed to protrude upward and downward.

[0056] The outer end portion 21 of the baffle 20 may be closely attached to the lower side of the cylindrical portion 11 .

[0057] A first diffusion space 60 for diffusing the process gas radially outward may be formed between the gas plate 10 and the baffle plate 20 by the lower protruding portion of the cylindrical portion 11 .

[0058] The cylindrical portion 11 may be formed with a second bolt hole 11a through which the second bolt 50 is inserted. A plurality of the second bolt holes 11a may be formed at equal intervals along the circumferential direction of the cylindrical portion 11. Figure 3 The embodiment in which the second bolt holes 11 a are formed at a total of eight locations at intervals of 45° in the cylindrical portion 11 is shown.

[0059] The gas plate 10 may be formed with a plurality of bolt mounting portions 12, which protrude horizontally and radially outward from the upper end of the cylindrical portion 11. The bolt mounting portion 12 may be formed radially outward of a position where the second bolt hole 11a is formed. A third bolt hole 12a for inserting a third bolt 120 may be formed through the bolt mounting portion 12. The second bolt hole 11a and the third bolt hole 12a may be formed on the same radial line of the gas plate 10.

[0060] The baffle plate 20 is disposed at the lower portion of the gas plate 10 and includes a plurality of gas holes 22. The baffle plate 20 is a disc-shaped structure having the same radius as the gas plate 10. The baffle plate 20 may be disposed between the gas plate 10 and the end plate 30.

[0061] The baffle plate 20 is formed in a flat plate shape as a whole, and a plurality of first bolt holes 21 a for inserting first bolts 40 are formed at equal intervals along the circumferential direction at the outer end portion 21 connected to the lower surface of the cylindrical portion 11 of the gas plate 10 .

[0062] In addition, a plurality of second bolt holes 21 b for inserting the second bolts 50 may be formed through the outer end portion 21 at equal intervals.

[0063] The first bolt hole 21a into which the first bolt 40 is inserted and the second bolt hole 21b into which the second bolt 50 is inserted are formed alternately once in the outer end portion 21 along the circumferential direction. Figure 4As shown, the second bolt holes 21 b are formed between each of the first bolt holes 21 a in the outer end portion 21 , and the first bolt holes 21 a and the second bolt holes 21 b are formed in the same number.

[0064] The plurality of air holes 22 are formed throughout the entire portion except the inner portion of the baffle 20, that is, the outer end portion 21. According to design purposes, the air holes 22 may be formed in a specific pattern or may be formed in a structure in which density varies according to position.

[0065] The end plate 30 is provided at the lower part of the baffle plate 20 and includes a plurality of air holes 32. The end plate 30, as a component constituting the lower part of the showerhead, is formed in a disk shape having the same radius as the baffle plate 20, and the outer end portion 31 in the radial direction may protrude upward by a predetermined amount. A second diffusion space 70 for diffusing the process gas may be formed between the baffle plate 20 and the end plate 30 by the upper protrusion of the outer end portion 31.

[0066] In the outer end portion 31, a plurality of first screw grooves 31a and second screw grooves 31b may be alternately formed along the circumferential direction. The first screw grooves 31a are formed at the outer end portion of the end plate 30, and correspond to and are equal in number to the first bolt holes 21a formed at the outer end portion of the baffle plate 20 along the circumferential direction. The first bolts 40 are inserted through the first bolt holes 21a and can be threadedly fastened to the first screw grooves 31a. The second screw grooves 31b are formed at the outer end portion of the end plate 30, and correspond to and are equal in number to the second bolt holes 21b formed at the outer end portion of the baffle plate 20 along the circumferential direction. A cylindrical portion 11 is formed at the outer periphery of the gas plate 10, and the same number of second bolt holes 11a corresponding to the second bolt holes 21b of the baffle plate 20 are formed in the cylindrical portion 11. The second bolts 50 are inserted through the second bolt holes 11a of the gas plate 10 and the second bolt holes 21b of the baffle plate 20, and can be threadedly fastened to the second screw grooves 31b of the end plate 30.

[0067] An internal thread is formed on the inner circumferential surface of the first screw groove 31 a , and the first bolt 40 can be screwed together.

[0068] An internal thread is formed on the inner circumferential surface of the second screw groove 31 b , and the second bolt 50 is screwed into place.

[0069] In more detail, the first screw groove 31a and the second screw groove 31b formed at the outer end portion 31 of the end plate 30 may be formed on the same line in a vertical direction with the first bolt hole 21a and the second bolt hole 21b formed at the outer end portion 21 of the baffle plate 20, respectively. That is, the first bolt hole 21a and the first screw groove 31a are formed on the same line with each other, and the second bolt hole 21b and the second screw groove 31b may be formed on the same vertical line with each other.

[0070] In addition, the second bolt hole 21 b and the second screw groove 31 b are formed on the same vertical line as the second bolt hole 11 a formed in the cylindrical portion 11 of the gas plate 10 .

[0071] The plurality of air holes 32 may be formed throughout the entire portion except the inner portion of the end plate 30, that is, the outer end portion 31. According to design purposes, the air holes 22 may be formed to have a specific pattern, or may be formed to have a structure in which density varies according to position.

[0072] The assembly process of the showerhead of the deposition chamber according to an embodiment of the present invention is as follows:

[0073] First, the baffle plate 20 and the end plate 30 can be assembled. The outer end portion 21 of the baffle plate 20 is brought into contact with the outer end portion 31 of the end plate 30, and the first bolt hole 21a and the first screw groove 31a can be aligned. Accordingly, the second bolt hole 21b and the second screw groove 31b are automatically aligned. Then, the first bolt 40 is inserted into the first screw groove 31a through the first bolt hole 21a and threadedly fastened. Along the circumferential direction of the baffle plate 20, the first bolt 40 can be respectively inserted and fastened in all the first bolt holes 21a and the first screw groove 31a. In this way, the baffle plate 20 and the end plate 30 can be assembled.

[0074] Then, the gas plate 10 and the "assembly of the baffle plate 20 and the end plate 30" can be combined. The lower side of the cylindrical portion 11 of the gas plate 10 contacts the outer end portion 21 of the baffle plate 20 of the assembly, and the second bolt hole 11a of the gas plate 10 can be aligned with the second bolt hole 21b of the baffle plate 20. Since the baffle plate 20 and the end plate 30 are preassembled, the lower side of the second bolt hole 11a of the gas plate 10 can also automatically align the second screw groove 31b of the end plate 30. Then, the second bolt 50 is inserted through the second bolt hole 11a of the gas plate 10 and the second bolt hole 21b of the baffle plate 20, and can be screwed and fastened to the second screw groove 31b of the end plate 30. In this way, the gas plate 10 and the assembly are assembled with each other, thereby completing the assembly of the nozzle itself.

[0075] The shower head assembled as described above is inserted into a setting groove formed in the cover 100. For insulation, an insulating ring 110 may be inserted in advance into the setting groove of the cover 100. The insulating ring 110 may be disposed between the shower head and the cover 100.

[0076] The nozzle is formed with a plurality of bolt mounting portions 12 protruding radially outward from the upper end of the cylindrical portion 11 of the gas plate 10, a third bolt hole 12a is formed on the bolt mounting portion 12, and an equal number of third screw grooves 100a corresponding to the third bolt hole 12a are formed on the cover 100, and third bolts 120 are inserted through the third bolt holes 12a of the bolt mounting portion 12 and can be threadedly fastened to the third screw grooves 100a of the cover 100.

[0077] That is to say, by inserting the nozzle into the setting groove of the cover 100 and adjusting the position in the circumferential direction, the third bolt hole 12a of the bolt mounting portion 12 can be aligned with the position of the third screw groove 100a formed in the cover 100 (the third screw groove 100a can be formed on the upper surface of the cover 100 along the radial direction with the same spacing and number as the third bolt hole 12a of the bolt mounting portion 12).

[0078] Next, the third bolt 120 is inserted into the third screw groove 100 a through the third bolt hole 12 a for threaded fastening, and then the nozzle can be installed on the cover 100 .

[0079] Now, the function and effect of the shower head of the deposition device according to the embodiment of the present invention will be described.

[0080] The process gas supplied from the process gas supply source enters the interior of the showerhead through the inlet 13 of the gas plate 10 , and then diffuses from the first diffusion space 60 to the radially outer side of the showerhead due to the resistance of the baffle 20 .

[0081] Then, the process gas can enter the second diffusion space 70 through the gas holes 22 of the baffle 20. In the second diffusion space 70, the gas flow rate is the largest in the center portion close to the inlet 13, and the gas in the center portion can diffuse into the entire interior of the second diffusion space 70 due to the resistance of the end plate 30.

[0082] Through the secondary diffusion effect as described above, the process gas can be discharged substantially uniformly through all the gas holes 32 in most areas except the outer end 31 of the end plate 30. The process gas discharged from the gas holes 32 of the end plate 30 is deposited on the wafer surface as described above to form various types of deposited films.

[0083] On the other hand, the nozzle of the deposition device according to the embodiment of the present invention is that the parts are fastened by bolts and can be separated from each other. In addition, the separation and assembly operations are very easy. In particular, the nozzle is installed on the cover 100 through the third bolt 120 on the bolt installation part 12 of the gas plate 10, and the assembly of the baffle plate 20 and the end plate 30 is installed on the lower part of the gas plate 10 through the second bolt 50 that penetrates the cylindrical part 11 of the gas plate 10. Therefore, only the third bolt 120 is loosened to completely remove the nozzle from the cover 100, or only the second bolt 50 is loosened in the state of opening the cover 100, so that only the baffle plate 20 and the end plate 30 assembly can be separated in the state where the setting state of the gas plate 10 remains unchanged. Such a separation method is particularly practical when the gas plate 10 does not change and only the baffle plate 20 and the end plate 30 are assembled with different specifications to implement testing.

[0084] As described above, the time for separating and assembling the parts of the nozzle is greatly shortened, and the labor intensity of the experimenters required for the operation is also significantly reduced.

[0085] In addition, the nozzle of the deposition device according to the embodiment of the present invention is, as described above, since all the components can be separated from each other, various combinations of the gas plate 10, the baffle 20 and the end plate 30 designed in various specifications can be made to test the influence of each component and the various overall performances of the combined nozzle.

[0086] In addition, as described above, since the parts of the nozzle are easy to combine, a new nozzle can be easily constructed by replacing only the parts with changed specifications. This greatly saves costs compared to completely remaking a new test object nozzle.

[0087] In addition, according to the showerhead of the deposition device of the embodiment of the present invention, since the bolts (the first bolts 40 and the second bolts 50) that connect the components to each other are not exposed to the process gas, no bolt contamination will occur.

[0088] In addition, the nozzle of the deposition device according to the embodiment of the present invention can realize the separation of parts, so it is easy to clean the inside and improve the cleaning efficiency.

[0089] As described above, the nozzle of the deposition device according to the present invention is easier to replace than the previous welding type nozzle, and can be replaced in parts units, and the impact of various combinations of hardware (components) can be tested, and can be completely disassembled, thereby improving the tilting efficiency.

[0090] As described above, the present invention is described with reference to the embodiments shown in the accompanying drawings, but it should be understood that this is only exemplary, and various modifications and equivalent embodiments can be realized based on the common knowledge in the technical field to which the technology belongs. Therefore, the true technical protection scope of the present invention should be defined by the above claims and the specific contents of the invention based on the above.

[0091] Industrial Applicability

[0092] The present invention relates to a showerhead of a deposition device, which can be used in the film-forming related industry field of a substrate or a wafer using the showerhead in order to supply a process gas into a vacuum chamber.

Claims

1. A showerhead of a deposition device, comprising a gas plate, a baffle plate and an end plate, wherein the gas plate comprises a process gas inlet formed in the center, the baffle plate is arranged at the lower part of the gas plate and comprises a plurality of gas holes, and the end plate is arranged at the lower part of the baffle plate and comprises a plurality of gas holes, characterized in that: pre-assembling the end plate at the lower part of the baffle to form an assembly of the baffle and the end plate; installing the assembly at the lower portion of the gas plate; The gas plate on which the assembly is mounted is inserted into and disposed in a disposition groove formed in a cover of a process chamber.

2. The nozzle of the deposition device according to claim 1, characterized in that: The component is that a plurality of first bolt holes are formed along the circumferential direction at the outer end of the baffle, and the same number of first screw grooves corresponding to the first bolt holes are formed at the outer end of the end plate, and the first bolts are inserted through the first bolt holes and then threadedly fastened in the first screw grooves.

3. The nozzle of the deposition device according to claim 2, characterized in that: The nozzle of the deposition device is: forming a second bolt hole in the outer end of the baffle between each of the first bolt holes; Forming the same number of second screw grooves corresponding to the second bolt holes of the baffle at the outer end of the end plate; A cylindrical portion is formed on the outer circumference of the gas plate, and second bolt holes having the same number as the second bolt holes of the baffle plate are formed on the cylindrical portion; The second bolt is inserted through the second bolt hole of the gas plate and the second bolt hole of the baffle plate, and then threadedly fastened to the second screw groove of the end plate.

4. The nozzle of the deposition device according to claim 1, characterized in that: The nozzle of the deposition device is: A plurality of bolt mounting portions are formed at the upper end of the cylindrical portion of the gas plate, protruding outward in the radial direction; forming a third bolt hole in the bolt mounting portion; The cover is formed with the same number of third screw grooves corresponding to the third bolt holes; The third bolt is inserted through the third bolt hole of the bolt mounting portion and is then threadedly fastened to the third screw groove of the cover.

5. The nozzle of the deposition device according to claim 3, characterized in that: The nozzle of the deposition device is: The cylindrical portion of the gas plate is formed to protrude downward; The outer end of the end plate is formed to protrude upward; forming a first diffusion space between the gas plate and the baffle; A second diffusion space is formed between the baffle plate and the end plate.

6. The nozzle of the deposition device according to claim 4, characterized in that: In the gas plate, the second bolt hole in the cylindrical portion and the third bolt hole in the bolt mounting portion are formed on the same radial line.

7. The nozzle of the deposition device according to claim 4, characterized in that: The nozzle of the deposition device comprises an insulating ring, The insulating ring is disposed between the shower head and the cover.

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