An electrostatic field orbital trap and a mass spectrometer having the same
Through the active metal brazing process and precision machining of the inner electrode and integrated outer electrode assembly, the problems of many parts and high accuracy requirements of track trap assembly are solved, and the effect of simplifying assembly and improving accuracy is achieved.
Patent Information
- Application Number
- CN202510592329.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-09
- Publication Date
- 2025-08-22
- Estimated Expiration
- 2045-05-09
AI Technical Summary
The existing track traps have a large number of assembly parts, are difficult to assemble and high accuracy requirements, resulting in low assembly efficiency.
The inner electrode and the integrated outer electrode assembly are sealed through an active metal brazing process, combined with precision machining, reducing axial and radial tolerances and simplifying the assembly process.
It reduces the number of assembly parts, simplifies assembly difficulty, improves assembly efficiency and accuracy, and reduces material costs.
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Figure CN120109004B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of analytical instruments, and in particular to an electrostatic field orbital trap and a mass spectrometer having the same. Background Art
[0002] An Orbitrap is a high-resolution ion trap mass analyzer. It uses an electrostatic field to capture and analyze ions. In mass spectrometry, its primary function is to accurately determine the mass-to-charge ratio (m / z) of ions, thereby enabling the study of the molecular composition and structure of substances.
[0003] The orbital trap is a complex and sophisticated structure. It primarily consists of an outer electrode, an inner electrode, and a detection electrode. These two electrodes are typically concentric cylindrical structures, which generate the appropriate electrostatic field to capture and confine ions.
[0004] The orbital trap has high sensitivity and can detect the presence of ions at low ion signal levels even when the sample amount is small.
[0005] The assembly accuracy of the orbital trap electrodes will have a great impact on the sensitivity of the orbital trap. Figure 1 As shown, from left to right, the sequence is left ceramic joint, left outer electrode, right outer electrode, and right ceramic joint. This joint is coaxially assembled with the inner electrode, and the orbital trap is secured to the baseplate using a retaining nut and radial locating member 700. If the radial assembly length exceeds the required tolerance, a quartz ring 600 can be added between the two outer electrodes to compensate.
[0006] The disclosure of the above background technology content is only used to assist in understanding the concept and technical solution of this application. It does not necessarily belong to the prior art of this application, nor does it necessarily provide technical guidance. In the absence of clear evidence that the above content has been disclosed before the filing date of this application, the above background technology should not be used to evaluate the novelty and creativity of this application. Summary of the Invention
[0007] The purpose of the present invention is to provide a track trap that reduces the number of assembly parts, reduces assembly difficulty, and improves overall accuracy.
[0008] In order to achieve the above object, the technical solution adopted by the present invention is as follows:
[0009] An electrostatic field orbital trap, comprising:
[0010] An inner electrode having a first threaded portion and a second threaded portion at both ends thereof;
[0011] a first outer electrode assembly comprising a first outer electrode and a first ceramic joint of an integral structure, wherein the first outer electrode assembly has a first through hole that cooperates with the first threaded portion;
[0012] a second outer electrode assembly comprising a second outer electrode and a second ceramic joint of an integral structure, wherein the second outer electrode assembly has a second through hole matched with the second threaded portion;
[0013] a positioning substrate, which is planar and has a third through hole that cooperates with the first threaded portion;
[0014] The middle portion of the inner electrode is accommodated in a cavity formed by the relative buckling of the first outer electrode and the second outer electrode;
[0015] The first threaded portion passes through the first through hole and the third through hole in sequence and is threadedly connected to the first nut; the second threaded portion passes through the second through hole and is threadedly connected to the second nut; and the end face of the first ceramic joint abuts against the one side plane of the positioning substrate, the end face of the first nut abuts against the other side plane of the positioning substrate, and the end face of the second nut abuts against the end face of the second ceramic joint.
[0016] Furthermore, based on any one of the technical solutions or a combination of multiple technical solutions described above, the first external electrode and the first ceramic joint are sealed as an integral component through an active metal brazing process, and the second external electrode and the second ceramic joint are sealed as an integral component through an active metal brazing process.
[0017] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the first outer electrode assembly and / or the second outer electrode assembly are obtained by processing in the following manner:
[0018] A metallized layer is formed on the surface of the ceramic joint by using the Mo-Mn method and then sintered;
[0019] A brazing material foil is placed between the outer electrode and the sintered ceramic joint, and the outer electrode and the ceramic joint are coaxially clamped together;
[0020] The outer electrode and ceramic joint of the coaxial clamp are placed in a vacuum of no more than 5×10 -3 Complete the brazing seal in an environment with a temperature of 850±10℃;
[0021] The sealing body is subjected to CNC grinding so that the tolerance of the axial length of the outer electrode and the ceramic joint is controlled to ±0.005 mm, thereby obtaining an outer electrode assembly.
[0022] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the ceramic joint is a high-alumina ceramic, the thickness of the metallized layer on its surface ranges from 20 μm to 50 μm, and the sintering temperature is between 1300° C. and 1500° C.;
[0023] The solder foil is an Ag-Cu-Ti foil with a thickness of 0.1±0.02 mm, and the proportion of Ti is less than 3%. The clamping coaxiality tolerance of the outer electrode and the ceramic joint is less than or equal to 0.03 mm.
[0024] The CNC grinding process ensures that the coaxiality tolerance of the outer electrode and the ceramic joint does not exceed 0.005 mm.
[0025] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the inner electrode includes an electrode body and a first extension member and a second extension member located at both ends of the electrode body, the first extension member, the electrode body and the second extension member are an integrated structure, and the axes of the three coincide with each other;
[0026] The first threaded portion is provided on the first extension member, and the second threaded portion is provided on the second extension member;
[0027] The tolerance between the first extension piece and the first through hole is less than 0.05 mm, and the tolerance between the second extension piece and the second through hole is less than 0.05 mm.
[0028] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the first extension member is further provided with a first limiting portion, and the second extension member is further provided with a second limiting portion;
[0029] The first limiting portion abuts against the inner wall of the first outer electrode or the first ceramic joint, and the second limiting portion abuts against the inner wall of the second outer electrode or the second ceramic joint.
[0030] Further, based on any one of the above technical solutions or a combination of multiple technical solutions, the first extension member and the first outer electrode assembly are provided with mutually cooperating locking structures to prevent the inner electrode from rotating relative to the first outer electrode assembly;
[0031] And / or, the second extension member and the second outer electrode assembly are provided with mutually cooperating locking structures to prevent the inner electrode from rotating relative to the second outer electrode assembly.
[0032] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the inner electrode is a stainless steel mallet-shaped electrode, and the electrode body has a structure in which the outer diameter narrows from the middle to both sides;
[0033] The coaxiality tolerance of the first extension member and the second extension member is less than or equal to 0.03 mm.
[0034] Further, based on any one of the above technical solutions or a combination of multiple technical solutions, five six-divided points on the virtual axis of the electrode body of the inner electrode are defined as a first position, a second position, a third position, a fourth position and a fifth position, wherein the third position is the center point of the electrode body;
[0035] The outer diameter of the inner electrode at the third position is 40% to 45% of the inner diameter of the outer electrode at that position;
[0036] The outer diameter of the inner electrode at the second position and the fourth position is 50% to 55% of the inner diameter of the outer electrode at that position;
[0037] The outer diameter of the inner electrode at the first position and the fifth position is 54% to 60% of the inner diameter of the outer electrode at that position.
[0038] Furthermore, based on any one of the technical solutions or a combination of multiple technical solutions described above, no ceramic ring or quartz ring is provided between the first outer electrode of the first outer electrode assembly and the second outer electrode of the second outer electrode assembly.
[0039] Furthermore, based on any one of the technical solutions or a combination of multiple technical solutions mentioned above, the orbital trap is not provided with a positioning component in a direction intersecting with the axial direction of the inner electrode.
[0040] According to another aspect of the present invention, the present invention provides a mass spectrometer comprising the electrostatic field orbital trap as described above.
[0041] The beneficial effects brought about by the technical solution provided by the present invention are as follows:
[0042] a. Fewer assembly parts simplify assembly difficulty and improve assembly efficiency;
[0043] b. Using ceramic-metal sealing technology to seal the outer electrode and ceramic joint into an integrated structure, and eliminating or reducing axial and radial tolerances through precision machining;
[0044] c. Combined with the precise control of the coaxiality of both ends of the inner electrode, there is no need to consider axial and radial assembly errors during the assembly process, and there is no need to use ceramic rings or quartz rings to control the gap. BRIEF DESCRIPTION OF THE DRAWINGS
[0045] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in this application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0046] Figure 1Schematic diagram of the assembly of an orbital trap in the prior art;
[0047] Figure 2 A schematic diagram of an assembly of an orbital trap provided by an exemplary embodiment of the present invention from a first viewing angle;
[0048] Figure 3 for Figure 2 Schematic diagram of the corresponding orbital trap explosion structure;
[0049] Figure 4 A schematic diagram of an assembly of an orbital trap provided by an exemplary embodiment of the present invention from a first viewing angle;
[0050] Figure 5 for Figure 4 Schematic diagram of the corresponding orbital trap explosion structure;
[0051] Figure 6 A front view of an orbital trap provided for an exemplary embodiment of the present invention;
[0052] Figure 7 for Figure 6 Cross-sectional view of the corresponding orbital trap;
[0053] Figure 8 for Figure 6 Schematic diagram of the corresponding orbital trap explosion structure;
[0054] Figure 9 for Figure 8 Cross-sectional view of the corresponding orbital trap.
[0055] Among them, the figure marks include: 100-inner electrode, 110-first threaded portion, 120-second threaded portion, 130-first extension member, 140-second extension member, 150-electrode body, 170-second limiting portion, 210-first outer electrode, 220-second outer electrode, 310-first ceramic joint, 320-second ceramic joint, 400-positioning substrate, 510-first nut, 520-second nut, 600-quartz ring, 700-radial positioning member. DETAILED DESCRIPTION
[0056] In order to enable those skilled in the art to better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.
[0057] It should be noted that the terms "first", "second", etc. in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, apparatus, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.
[0058] In one embodiment of the present invention, an electrostatic field orbital trap is provided, such as Figure 3 、 Figure 5 、 Figures 7 to 9 As shown, the orbital trap includes:
[0059] The inner electrode 100 has a first threaded portion 110 and a second threaded portion 120 at both ends thereof;
[0060] A first outer electrode assembly, comprising a first outer electrode 210 and a first ceramic joint 310 of an integral structure, wherein the first outer electrode 210 has a first through hole that cooperates with the first threaded portion 110;
[0061] A second outer electrode assembly, comprising an integrally structured second outer electrode 220 and a second ceramic joint 320 , having a second through hole that cooperates with the second threaded portion 120 ;
[0062] A positioning substrate 400 , which is planar and has a third through hole configured to cooperate with the first threaded portion 110 ;
[0063] The middle portion of the inner electrode 100 is accommodated in a cavity formed by the relative engagement of the first outer electrode 210 and the second outer electrode 220;
[0064] The first threaded portion 110 passes through the first through hole and the third through hole in sequence and is threadedly connected to the first nut 510; the second threaded portion 120 passes through the second through hole and is threadedly connected to the second nut 520; and the end face of the first ceramic joint 310 is against the one side plane of the positioning substrate 400, the end face of the first nut 510 is against the other side plane of the positioning substrate 400, and the end face of the second nut 520 is against the end face of the second ceramic joint 320.
[0065] An important concept of the embodiment of the present invention is to seal the first outer electrode 210 and the first ceramic joint 310 into an integral component through an active metal brazing process, and to seal the second outer electrode 220 and the second ceramic joint 320 into an integral component through an active metal brazing process, and to perform precision machining in axial direction and coaxiality, so that the axial tolerance and coaxiality tolerance of the outer electrode assembly sealed as an integral structure are controlled within a strict range; at the same time, the inner electrode 100 is precisely machined to control its overall coaxiality tolerance within a very small range; in this way, during the assembly of the outer electrode assembly and the inner electrode 100, the assembler does not need to consider the axial tolerance and coaxiality tolerance, and the assembly operation is simplified to passing the two ends of the inner electrode 100 through the two outer electrode assemblies respectively and fixing them at both ends with nuts.
[0066] In a specific embodiment of the present invention, the first outer electrode assembly and / or the second outer electrode assembly are obtained by processing in the following manner:
[0067] The first step is to form a metallized layer on the surface of the ceramic joint using the Mo-Mn method, preferably with a thickness range of 20μm to 50μm, and sinter it at a high temperature in the temperature range of 1300℃-1500℃ to achieve chemical bonding between the W / Mo layer and the ceramic: high-temperature sintering allows the Mo (molybdenum) particles to react with the glass phase (SiO2, CaO, etc.) in the ceramic to form a chemical bond. In this embodiment, the ceramic joint material can be a high-alumina ceramic (such as 99% alumina), which has a high bonding strength with Mo-Mn.
[0068] The second step is to place a brazing foil between the outer electrode and the sintered ceramic joint. It is preferred to use an Ag-Cu-Ti foil with a thickness of 0.1±0.02mm and a Ti content of less than 3%, such as an Ag72Cu28Ti1 (wt.%) foil. A graphite clamp is used to coaxially clamp the outer electrode and the ceramic joint together to ensure that the coaxiality tolerance of the clamping is less than or equal to 0.03mm. Ag72Cu28 is a eutectic composition with excellent liquid phase fluidity, which can fill the gaps of complex interfaces. The active element Ti reacts with Al2O3 to form TiO / Ti3Al, reducing the interfacial energy. The Ti content is strictly controlled to be less than 3% to avoid the formation of brittle Ti-Cu intermetallic compounds. A foil with a thickness of about 0.1mm can avoid the formation of residual stress and cracks, while reducing the amount of precious metals and reducing material costs.
[0069] The third step is to place the coaxial clamped outer electrode and the ceramic joint in a vacuum of no more than 5×10 -3Pa, and the temperature is within the range of 850±10℃, and the heat preservation is carried out for about 10 minutes to complete the brazing sealing; the Mo layer serves as an intermediate transition layer, and the thermal expansion coefficient transitions gradually with the stainless steel outer electrode to relieve the interface thermal stress; the metallization layer with a thickness of 20μm to 50μm allows the solder to fully spread on the surface of the metallization layer. The metallization layer of this thickness can provide sufficient roughness and active surface to promote the flow of the solder, while also avoiding the introduction of residual stress due to the excessive thickness of the metallization layer.
[0070] The fourth step is to perform CNC grinding on the sealing body so that the tolerance of the axial length of the outer electrode and the ceramic joint is controlled to ±0.005mm and the coaxiality tolerance does not exceed 0.005mm, thereby obtaining the outer electrode assembly.
[0071] like Figures 7 to 9 As shown, the inner electrode 100 includes an electrode body 150 and a first extension piece 130 and a second extension piece 140 located at both ends of the electrode body. The first extension piece 130, the electrode body 150 and the second extension piece 140 are an integral structure, and the axes of the three coincide. The "coincidence" here means substantially coincidence. The standard is that the coaxiality tolerance of the first extension piece 130, the electrode body 150 and the second extension piece 140 is less than or equal to 0.03 mm.
[0072] The first threaded portion 110 is arranged on the first extension member 130, and the second threaded portion 120 is arranged on the second extension member 140; the tolerance between the first extension member 130 and the first through hole is less than 0.05 mm, and the tolerance between the second extension member 140 and the second through hole is less than 0.05 mm, so that when the first extension member 130 is located in the first through hole and the second extension member 140 is located in the second through hole, the radial offset of the inner electrode 100 relative to the outer electrode assembly is less than 0.05 mm.
[0073] In one embodiment, a second limiting portion 170 is further provided on the second extension member 140, that is, the second threaded portion 120 has an extreme position when passing through the second through hole, and this extreme position is determined by the second limiting portion 170. In the assembled state, the second nut 520 is locked with the second threaded portion 120. At this time, the second limiting portion 170 is against the inner wall of the second outer electrode 220 or the second ceramic joint 320; although not shown in the figure, it can be understood that a first limiting portion can also be provided on the first extension member 130, and the first threaded portion 110 has an extreme position when passing through the first through hole, which is determined by the first limiting portion. In the assembled state, the first nut 510 is locked with the first threaded portion 110. At this time, the first limiting portion is against the inner wall of the first outer electrode 210 or the first ceramic joint 310.
[0074] In addition to providing a limiting portion to prevent axial movement between the inner electrode 100 and the outer electrode assembly, this embodiment also provides a structure for preventing axial rotation between the inner electrode 100 and the outer electrode assembly: the first extension member 130 and the first outer electrode assembly are provided with mutually cooperating locking structures to prevent the inner electrode 100 from rotating relative to the first outer electrode assembly; or, the second extension member 140 and the second outer electrode assembly are provided with mutually cooperating locking structures to prevent the inner electrode 100 from rotating relative to the second outer electrode assembly.
[0075] In the above embodiment, the inner electrode 100 is a stainless steel mallet-shaped electrode, and the electrode body 150 has a structure in which the outer diameter narrows from the middle to both sides; Figure 7 For example, the five six-divided points on the virtual axis of the electrode body 150 of the inner electrode 100 are defined as the first position, the second position, the third position, the fourth position and the fifth position, wherein the third position is the center point of the electrode body 150; in this embodiment, the outer diameter of the inner electrode at the third position is 40% to 45% of the inner diameter of the outer electrode at that position; the outer diameter of the inner electrode at the second position and the fourth position is 50% to 55% of the inner diameter of the outer electrode at that position; the outer diameter of the inner electrode at the first position and the fifth position is 54% to 60% of the inner diameter of the outer electrode at that position. In other words, the position with the largest inner diameter of the outer electrode is the farthest away from the inner electrode 100, and the position with the smallest inner diameter of the outer electrode is the smallest away from the inner electrode 100, and from the second position toward the first position, the corresponding inner diameter of the outer electrode narrows rapidly, which is reflected in the definition Figure 7 In the cross section, the gap value between the inner wall surface of the outer electrode and the outer wall of the inner electrode corresponding to the first position is gap1, the gap value between the inner wall surface of the outer electrode and the outer wall of the inner electrode corresponding to the second position is defined as gap2, and the gap value between the inner wall surface of the outer electrode and the outer wall of the inner electrode corresponding to the third position is defined as gap3, then gap1: gap2<gap2: gap3; similarly, from the fourth position toward the fifth position, the corresponding inner diameter of the outer electrode accelerates to narrow.
[0076] Compared to Figure 1 , the example of this embodiment Figures 2 to 8 In the orbital trap shown, there is no ceramic ring or quartz ring between the first outer electrode 210 of the first outer electrode assembly and the second outer electrode 220 of the second outer electrode assembly. The integrated structure of the outer electrode and the ceramic joint can greatly reduce the axial tolerance. Figure 1 A radial positioning member 700 is provided in the middle orbital trap. The orbital trap in this embodiment is not provided with a positioning member in a direction intersecting the axial direction of the inner electrode 100, because the coaxiality of the inner electrode combined with the coaxiality of the integrated structure of the outer electrode and the ceramic joint can ensure that the assembled orbital trap has a qualified radial tolerance without the need for radial positioning members.
[0077] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply the existence of any such actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or device comprising the element.
[0078] The above is only a specific implementation method of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.
Claims
1. An electrostatic field orbital trap, characterized in that: include: An inner electrode (100), having a first threaded portion (110) and a second threaded portion (120) respectively provided at two ends thereof; A first outer electrode assembly comprising a first outer electrode (210) and a first ceramic joint (310) of an integral structure, the first outer electrode assembly having a first through hole that cooperates with the first threaded portion (110); A second outer electrode assembly comprising a second outer electrode (220) and a second ceramic joint (320) of an integral structure, the second outer electrode assembly having a second through hole that cooperates with the second threaded portion (120); The first outer electrode (210) and the first ceramic joint (310) are sealed as an integral component by an active metal brazing process, and the second outer electrode (220) and the second ceramic joint (320) are sealed as an integral component by an active metal brazing process; the first outer electrode assembly and the second outer electrode assembly are obtained by the following process: forming a metallization layer on the surface of the ceramic joint by a Mo-Mn method and sintering; placing a brazing material foil between the outer electrode and the sintered ceramic joint, and coaxially clamping the outer electrode and the ceramic joint together; placing the coaxially clamped outer electrode and ceramic joint in a vacuum of no more than 5×10 -3 The brazing seal is completed in an environment with a pressure of 100 Pa and a temperature within the range of 850±10°C; the sealing body is subjected to CNC grinding so that the tolerance of the axial length of the outer electrode and the ceramic joint is controlled to ±0.005mm, thereby obtaining an outer electrode assembly; a positioning substrate (400) which is planar and has a third through hole that cooperates with the first threaded portion (110); The middle portion of the inner electrode (100) is accommodated in a cavity formed by the relative engagement of the first outer electrode (210) and the second outer electrode (220); The first threaded portion (110) passes through the first through hole and the third through hole in sequence and is threadedly connected to the first nut (510); the second threaded portion (120) passes through the second through hole and is threadedly connected to the second nut (520); and the end face of the first ceramic joint (310) abuts against a plane on one side of the positioning substrate (400), the end face of the first nut (510) abuts against a plane on the other side of the positioning substrate (400), and the end face of the second nut (520) abuts against an end face of the second ceramic joint (320).
2. The electrostatic field orbital trap according to claim 1, characterized in that: The ceramic joint is made of high-alumina ceramic, the thickness of the metallized layer on its surface ranges from 20 μm to 50 μm, and the sintering temperature is between 1300° C. and 1500° C.; The solder foil is an Ag-Cu-Ti foil with a thickness of 0.1±0.02 mm, and the proportion of Ti is less than 3%. The clamping coaxiality tolerance of the outer electrode and the ceramic joint is less than or equal to 0.03 mm. The CNC grinding process ensures that the coaxiality tolerance of the outer electrode and the ceramic joint does not exceed 0.005 mm.
3. The electrostatic field orbital trap according to claim 1, characterized in that: The inner electrode (100) comprises an electrode body (150) and a first extension piece (130) and a second extension piece (140) located at two ends of the electrode body, wherein the first extension piece (130), the electrode body (150) and the second extension piece (140) are an integrated structure, and the axes of the three coincide with each other; The first threaded portion (110) is provided on the first extension member (130), and the second threaded portion (120) is provided on the second extension member (140); The tolerance between the first extension piece (130) and the first through hole is less than 0.05 mm, and the tolerance between the second extension piece (140) and the second through hole is less than 0.05 mm.
4. The electrostatic field orbital trap according to claim 3, characterized in that: The first extension piece (130) is further provided with a first limiting portion, and / or the second extension piece (140) is further provided with a second limiting portion (170); The first limiting portion abuts against the inner wall of the first outer electrode (210) or the first ceramic joint (310), and / or the second limiting portion (170) abuts against the inner wall of the second outer electrode (220) or the second ceramic joint (320).
5. The electrostatic field orbital trap according to claim 3, characterized in that: The first extension piece (130) and the first outer electrode assembly are provided with mutually matching latching structures to prevent the inner electrode (100) from rotating relative to the first outer electrode assembly; And / or, the second extension piece (140) and the second outer electrode assembly are provided with mutually matching locking structures to prevent the inner electrode (100) from rotating relative to the second outer electrode assembly.
6. The electrostatic field orbital trap according to claim 3, characterized in that: The inner electrode (100) is a stainless steel mallet-shaped electrode, and the electrode body (150) has a structure in which the outer diameter narrows from the middle toward both sides; The coaxiality tolerance of the first extension piece (130) and the second extension piece (140) is less than or equal to 0.03 mm.
7. The electrostatic field orbital trap according to claim 6, characterized in that: Five six equally divided points on a virtual axis of the electrode body (150) of the inner electrode (100) are defined as a first position, a second position, a third position, a fourth position, and a fifth position, wherein the third position is the center point of the electrode body (150); The outer diameter of the inner electrode at the third position is 40% to 45% of the inner diameter of the outer electrode at the third position; The outer diameter of the inner electrode at the second position and the fourth position is 50% to 55% of the inner diameter of the outer electrode at the second position and the fourth position; The outer diameter of the inner electrode at the first position and the fifth position is 54% to 60% of the inner diameter of the outer electrode at the first position and the fifth position.
8. The electrostatic field orbital trap according to any one of claims 1 to 7, characterized in that: No ceramic ring or quartz ring is provided between the first outer electrode (210) of the first outer electrode assembly and the second outer electrode (220) of the second outer electrode assembly.
9. The electrostatic field orbital trap according to any one of claims 1 to 7, characterized in that: The orbital trap is not provided with a positioning component in a direction intersecting the axial direction of the inner electrode (100).
10. A mass spectrometer, characterized in that The method comprises the electrostatic field orbital trap according to any one of claims 1 to 9.
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