Multi-degree-of-freedom adjusting mechanism and equipment

By designing a multi-degree of freedom adjustment mechanism, using the independent adjustment functions of the centering adjustment components and the horizontal adjustment components, the problems of low adjustment accuracy and high operation difficulty in the prior art are solved, and high-precision wafer neutralization and leveling are achieved, and processing uniformity is improved.

CN120109076APending Publication Date: 2025-06-06SHENZHEN SICARRIER IND MACHINES CO LTD
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Patent Information

Application Number
CN202510106115.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-22
Publication Date
2025-06-06

AI Technical Summary

Technical Problem

The existing wafer tray adjustment mechanisms have interference and mutual influence in the neutralization and leveling process, resulting in low adjustment accuracy and high operation difficulty, and the uniformity of wafer surface treatment cannot be achieved.

Method used

A multi-degree of freedom adjustment mechanism is designed, including a centering adjustment component and a horizontal adjustment component. Through the combination of abutment, sliding table and ball hinge structure, independent adjustment of neutralization and leveling is achieved, avoiding mutual interference.

Benefits of technology

Improves the accuracy of neutralization and leveling of wafers, simplifies the operation process, and enhances the uniformity of wafer surface treatment.

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Abstract

The invention discloses a multi-degree-of-freedom adjusting mechanism and equipment, and relates to the technical field of direction adjustment of precision equipment, the multi-degree-of-freedom adjusting mechanism comprises a centering adjusting assembly and a horizontal adjusting assembly, the centering adjusting assembly comprises a base table, a first sliding table and a second sliding table which are sequentially stacked and relatively slide, and the relative sliding directions are inclined or vertical; the horizontal adjusting assembly comprises a base, a spherical hinge structure and adjusting mechanisms, the base and the base table are rotationally connected through the spherical hinge structure, at least two adjusting mechanisms are connected between the base and the base table, the adjusting mechanisms are used for adjusting the relative distance between the base and the base table in the first direction, and the spherical hinge structure and the two adjusting mechanisms are arranged in a triangular shape. The adjusting process of horizontal adjusting and the adjusting process of centering adjusting are decoupled, the centering adjusting assembly and the horizontal adjusting assembly can be independently operated, and the adjusting precision is improved; the three-layer structure enables two sliding directions not to interfere with each other, and the centering adjustment precision is improved.
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Description

Technical Field

[0001] The present application relates to the technical field of precision equipment orientation adjustment, and in particular to a multi-degree-of-freedom adjustment mechanism and equipment. Background Art

[0002] In high-precision processing equipment such as semiconductors, it is usually necessary to keep the wafer and the shower head (or other parts) parallel and aligned with high precision during the processing to achieve better processing uniformity. Similarly, the distance between the wafer and the shower head (or other parts) also needs to be adjusted according to the actual situation.

[0003] Since the wafer is generally placed on a crystal seat, the crystal seat needs to have high-precision, high-resolution and multi-degree-of-freedom adjustment functions. However, in the existing adjustment mechanism, the centering and leveling mechanisms are coupled, and the centering and leveling are performed simultaneously. Although the adjustment speed is improved, the centering and leveling are interfered and affected by each other, and the adjustment accuracy is not high, resulting in the inability to achieve the optimal uniformity of the wafer surface treatment, and the adjustment method is difficult to operate. Summary of the invention

[0004] The present application provides a multi-degree-of-freedom adjustment mechanism and device for a wafer tray, which can perform high-precision horizontal and centering adjustments on the wafer and is easy to operate.

[0005] In a first aspect, the present application provides a multi-degree-of-freedom adjustment mechanism, comprising:

[0006] A centering adjustment component comprises a base, a first slide and a second slide which are stacked in sequence, a first sliding mechanism is connected between the base and the first slide, a second sliding mechanism is connected between the first slide and the second slide, and a sliding direction of the first sliding mechanism is inclined or perpendicular to a sliding direction of the second sliding mechanism;

[0007] A horizontal adjustment component includes a base, a ball joint structure and an adjustment mechanism. The base and the base are rotatably connected via the ball joint structure. At least two adjustment mechanisms are connected between the base and the base. The first direction is a direction perpendicular to the sliding direction of the first sliding mechanism and the sliding direction of the second sliding mechanism. The adjustment mechanism is used to adjust the relative distance between the base and the base along the first direction. The ball joint structure and the two adjustment mechanisms are arranged in a triangle.

[0008] The multi-degree-of-freedom adjustment mechanism described in the present application decouples the adjustment processes of horizontal adjustment and centering adjustment, and the centering adjustment component and the horizontal adjustment component can be operated independently, thereby improving the adjustment accuracy. In addition, the centering adjustment component of the three-layer platform structure composed of the base, the first slide and the second slide can prevent mutual interference between the relative sliding in the two directions during the centering adjustment. After the relative sliding in one direction is completed, when adjusting the relative sliding in the other direction, it will not affect the relative sliding completed before, thereby improving the centering adjustment accuracy. The base and the base are connected by a ball joint structure, and the base and the base are rotatably connected, while the base and the base are mutually limited in the height direction to prevent the base and the base from being separated during the adjustment process of the adjustment mechanism.

[0009] In a possible implementation, a mounting hole is provided on the second slide, and the mounting hole is used to install a support column of the semiconductor device; the support column can be inserted into the mounting hole to achieve the connection between the second slide and the device to be adjusted.

[0010] In a possible implementation, the multi-degree-of-freedom adjustment mechanism further includes a connecting mechanism, the connecting mechanism includes an edge portion, a bottom wall and a side wall portion, the bottom wall and the side wall portion enclose a groove cavity, and the groove cavity is used to accommodate the support column;

[0011] The edge portion is located on the outer wall surface of the side wall portion, and the side wall portion passes through the mounting hole. The edge portion and the second slide are fixedly connected. The connecting mechanism can fixedly connect the flat second slide and the cylindrical support column, and the fixed connection positions of the second slide and the connecting mechanism are on the same plane, and the connection positions of the connecting mechanism and the support column are also on the same plane, so the connection is more secure.

[0012] In one possible implementation, the base is located on a side of the platform away from the first slide, and the base, the platform, the first slide and the second slide constitute a four-layer stacked structure. In the four-layer stacked structure, the platform, the first slide and the second slide slide relative to each other for centering, and the base and the platform rotate relative to each other for leveling. Centering and leveling are decoupled, but the base still serves as a common component for centering and leveling, which separates functions while simplifying the structure.

[0013] In a possible implementation, the centering adjustment assembly further includes a first adjustment mechanism, which is connected to the first sliding mechanism and is used to adjust the relative sliding distance between the base and the first sliding platform.

[0014] In a possible implementation, the centering adjustment assembly further includes a second adjustment mechanism, which is connected to the second sliding mechanism and is used to adjust the relative sliding distance between the first slide table and the second slide table.

[0015] In a possible implementation, the ball joint structure includes a ball head rod and a ball joint support, the ball head rod has a ball head, the ball joint support has a spherical groove, the ball head is located in the spherical groove and is in close contact with at least part of the inner wall surface of the spherical groove, and the ball head is slidably connected to the inner wall surface of the spherical groove. The ball joint structure can prevent the base and the base from being relatively separated during rotation while realizing relative rotation between the base and the base.

[0016] In a possible implementation, the ball joint support includes a body and a compression sleeve, the body has a cavity, the body includes a first end, the inner wall surface of the first end includes a spherical wall surface, the compression sleeve is located in the cavity, the compression sleeve has an inner ball groove surface, and the inner ball groove surface and the spherical wall surface constitute the inner wall surface of the spherical groove. The ball head is clamped together by the compression sleeve and the spherical wall surface of the body, and the body of the ball joint support can be an integrated structure with high structural strength. In addition, the ball head rod can pass through one end of the body and come out from the other end, and the ball head is clamped on the spherical wall surface to achieve the installation of the ball head rod and the ball joint support.

[0017] In a possible implementation, the ball joint support further includes a spring and a pre-tightening screw, the body includes a second end, the pre-tightening screw is located in the second end and fixedly connected to the body, and the spring is located in the cavity and supported between the compression sleeve and the pre-tightening screw. The support force given by the spring to the compression sleeve is an elastic force, and when the ball head and the spherical groove rotate relative to each other, there will be no jamming of the ball head and the inner wall of the spherical groove, which improves the smoothness of the horizontal adjustment component when adjusting the relative angle between the base and the base, thereby improving the accuracy of the adjustment.

[0018] In a second aspect, the present application provides a device, comprising the multi-degree-of-freedom adjustment mechanism described in any one of the above items, and also comprising a first component and a second component, the second component being connected to the multi-degree-of-freedom adjustment mechanism, and the multi-degree-of-freedom adjustment mechanism being used to adjust the relative position of the second component and the first component. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a multi-degree-of-freedom adjustment mechanism provided in the implementation mode of the present application;

[0020] Figure 2 It is a schematic diagram of the connection between the multi-degree-of-freedom adjustment mechanism and the device to be adjusted provided in the embodiment of the present application;

[0021] Figure 3 It is a schematic diagram of a connection mechanism provided in an embodiment of the present application;

[0022] Figure 4 It is a schematic diagram of a control system of a multi-degree-of-freedom adjustment mechanism provided in an embodiment of the present application;

[0023] Figure 5 is a schematic cross-sectional view of a ball joint structure provided in an embodiment of the present application;

[0024] Figure 6 It is a cross-sectional schematic diagram of the adjustment mechanism provided in the embodiment of the present application.

[0025] Description of reference numerals:

[0026] 100-centering adjustment assembly; 110-base; 111-first sliding mechanism; 113-through hole; 120-first slide; 121-second sliding mechanism; 130-second slide; 131-mounting hole; 140-first adjustment mechanism; 150-second adjustment mechanism; 160-locking mechanism; 170-driving mechanism; 171-controller; 172-sensing system; 180-connecting mechanism; 181-edge portion; 182-bottom wall; 183-side wall portion;

[0027] 131a-hole inner wall;

[0028] 183a-groove cavity; 183b-groove inner wall;

[0029] 200-horizontal adjustment assembly; 210-base; 211-ball head; 220-ball joint structure; 221-ball head rod; 222-ball joint support; 230-adjustment mechanism; 231-screw; 232-spherical washer; 233-knob; 234-locking nut;

[0030] 2211-ball head; 2212-connecting rod; 2221-spherical groove; 2222-body; 2223-compression sleeve; 2224-spring; 2225-preload screw;

[0031] 2222a- cavity; 2222b- first end; 2222c- spherical wall surface; 2222d- second end; 2223a- inner spherical groove surface;

[0032] 300-height adjustment mechanism; 310-screw; 320-kit;

[0033] 400 - device to be adjusted; 410 - shower head; 420 - wafer; 430 - tray; 431 - supporting surface; 432 - lower surface; 440 - enclosure; 441 - cavity; 450 - support column; 451 - top end; 452 - bottom end. DETAILED DESCRIPTION

[0034] The embodiments of the present application are described below in conjunction with the drawings in the embodiments of the present application.

[0035] For ease of understanding, the English abbreviations and related technical terms involved in the embodiments of the present application are explained and described below.

[0036] It should be clear that the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0037] The terms used in the embodiments of the present application are only for the purpose of describing specific embodiments, and are not intended to limit the present application. The singular forms "a", "said" and "the" used in the embodiments of the present application and the appended claims are also intended to include plural forms, unless the context clearly indicates other meanings.

[0038] It should be understood that the term "and / or" used in this article is only a description of the same field of the associated objects, indicating that there can be three relationships. For example, A and / or B can represent: A exists alone, A and B exist at the same time, and B exists alone. In addition, the character " / " in this article generally indicates that the associated objects before and after are in an "or" relationship.

[0039] It should be understood that the terms “first”, “second”, etc. used in the present application are only used for the purpose of distinguishing the description, and cannot be understood as indicating or implying relative importance, nor can they be understood as indicating or implying an order.

[0040] In the description of the present application, the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0041] In the description of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, a conflicting connection or an integrated connection. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0042] The present application provides a multi-degree-of-freedom adjustment mechanism. The device to be adjusted can be connected to the multi-degree-of-freedom adjustment mechanism. The multi-degree-of-freedom adjustment mechanism can perform centering and adjustment on the device to be adjusted. Specifically, refer to Figure 1 As shown, the multi-degree-of-freedom adjustment mechanism includes a centering adjustment component 100 and a horizontal adjustment component 200 .

[0043] See also Figure 2As shown, the device to be adjusted may be a shower head and a wafer in a semiconductor device, wherein the device to be adjusted 400 may include a shower head 410, a wafer 420, a tray 430, a panel 440 and a support column 450, wherein the panel 440 is a shell structure having a cavity 441. It should be noted that Figure 2 Only the bottom part of the enclosure 440 is shown, and the cavity 441 is shown to be in an open state. In an actual product, the enclosure 440 may be a sealed shell to enclose a relatively sealed cavity 441. Figure 2 Other enclosed parts of the middle panel 440 are not shown.

[0044] The tray 430 is located in the cavity 441 , and the supporting surface 431 of the tray 430 is a plane. The wafer 420 is placed on the supporting surface 431 of the tray 430 , and the wafer 420 may be in the shape of a flat plate.

[0045] The top end 451 (one end on one side in the Z direction) of the support column 450 is connected to the lower surface 432 of the tray 430, and the top end 451 and the tray 430 are fixed to each other, or the top end 451 and the lower surface 432 of the tray 430 are an integrated structure.

[0046] In one embodiment, the bottom end 452 (the end on the opposite side of the Z direction) of the support column 450 is connected to the freedom adjustment mechanism described in the present application, and the freedom adjustment mechanism can drive the support column 450 to move in the XY plane ( Figure 2 The Y direction is not shown in the figure, and the Y direction is a direction perpendicular to the X direction and the Z direction), the support column 450 drives the tray 430 to move in the XY plane, so as to drive the wafer 420 to move in the XY plane relative to the shower head 410, and adjust the center of the wafer 420 and the center of the shower head 410 relative to each other, so as to realize the centering adjustment of the wafer 420 and the shower head 410, and the medium sprayed by the shower head 410 can be evenly sprinkled on the wafer 420, so as to form a film with uniform thickness at the set position of the wafer 420.

[0047] Similarly, the degree of freedom adjustment mechanism described in the present application can also drive the support column 450 to swing relative to the Z direction to adjust the relative angle between the central axis of the support column 450 (the support column 450 in this embodiment is a cylindrical shape as an example) and the Z direction. The support column 450 drives the tray 430 to swing until the supporting surface 431 of the tray 430 is adjusted to be parallel to the air outlet surface of the shower 410 (in this embodiment, the air outlet surface of the shower 410 is parallel to the XY plane, and the supporting surface 431 of the tray 430 can be driven to be parallel to the XY plane by the degree of freedom adjustment mechanism), and the distance between the wafer 420 on the supporting surface 431 and the shower 410 is equal, so that the medium sprayed by the shower 410 can be evenly sprinkled on the wafer 420, forming a film with uniform thickness at the set position of the wafer 420.

[0048] See also Figure 1 As shown, the centering adjustment component 100 includes a base 110, a first slide 120, and a second slide 130 which are stacked in sequence. The shapes of the base 110, the first slide 120, and the second slide 130 are not limited. In this embodiment, a flat plate is used as an example, and the base 110, the first slide 120, and the second slide 130 are all used as a square plate. The four corners of the square plate are rounded to prevent the degree of freedom adjustment mechanism from scratching the operator.

[0049] The centering adjustment assembly 100 may be provided with a mounting mechanism, and the mounting mechanism is used to mount the support column 450 and the waiting adjustment device. In one embodiment, the mounting mechanism may be a mounting hole 131 provided on the second slide 130, and the shape and size of the mounting hole 131 are the same as the outer shape and size of the support column 450, and the support column 450 may pass through the mounting hole 131 and be fixed in the mounting hole 131.

[0050] In one embodiment, mounting holes 131 are provided on both the second slide 130 and the first slide 120. The support column 450 can pass through the mounting holes 131 of the second slide 130 and the first slide 120 in sequence along the reverse Z direction and be fixedly connected to the second slide 130. The mounting hole 131 of the first slide 120 can be adaptively adjusted for support columns 450 of different lengths.

[0051] In one embodiment, mounting holes 131 are provided on the second slide 130, the first slide 120 and the base 110, and the support column 450 can sequentially pass through the mounting holes 131 of the second slide 130, the first slide 120 and the base 110 along the Z-reverse direction and be fixedly connected to the second slide 130. The mounting holes 131 of the base 110 and the first slide 120 can be adaptively adjusted for support columns 450 of different lengths.

[0052] In one embodiment, a first sliding mechanism 111 is connected between the base 110 and the first slide 120, and the first sliding mechanism 111 can slide relatively along the X direction, so that the base 110 and the first slide 120 can slide relatively along the X direction. Specifically, the first sliding mechanism 111 may include a slide rail and a slider, the slider is located on the base 110, and the slide rail is located on the first slide 120; or, the slider is located on the first slide 120, and the slide rail is located on the base 110.

[0053] The second sliding mechanism 121 is connected between the first slide 120 and the second slide 130. The second sliding mechanism 121 can slide relative to each other along the Y direction, so that the first slide 120 and the second slide 130 can slide relative to each other along the Y direction. Specifically, the second sliding mechanism 121 may include a slide rail and a slider. The slider is located on the first slide 120, and the slide rail is located on the second slide 130; or the slider is located on the second slide 130, and the slide rail is located on the first slide 120. In one embodiment, the X direction and the Y direction are as follows: Figure 1 As shown in , they are two perpendicular directions.

[0054] In one embodiment, there may be at least two first sliding mechanisms 111, the two first sliding mechanisms 111 are arranged along the Y direction, and the two first sliding mechanisms 111 can slide relative to each other along the X direction. Figure 1 As shown, the two first sliding mechanisms 111 can be located on one side of the Y direction and the other side of the Y direction of the mounting hole 131 in the base 110. The two first sliding mechanisms 111 can improve the stability of relative sliding between the base 110 and the first slide 120, ensuring that no relative displacement in the Z direction occurs between the base 110 and the first slide 120.

[0055] In one embodiment, there may be at least two second sliding mechanisms 121, the two second sliding mechanisms 121 are arranged along the X direction, and the two second sliding mechanisms 121 can slide relative to each other along the Y direction. Figure 1 As shown, the two second sliding mechanisms 121 can be located on one side of the X direction and the other side of the X direction of the mounting hole 131 in the first slide 120. The two second sliding mechanisms 121 can improve the stability of the relative sliding between the first slide 120 and the second slide 130, ensuring that no relative displacement in the Z direction occurs between the first slide 120 and the second slide 130.

[0056] When in use, the base 110 is placed horizontally, and the first slide 120 and the second slide 130 are parallel to the base 110, so that the centering adjustment assembly 100 is in a horizontal state as a whole.

[0057] The horizontal adjustment component 200 includes a base 210 and a ball joint structure 220. The base 210 and the base 110 are connected through the ball joint structure 220 and at least two adjustment mechanisms 230, respectively. The ball joint structure 220 is rotatably connected to the base 210 and the base 110, so that the centering adjustment component 100 can rotate 360 ​​degrees (360 degrees only refers to the relative rotation direction and rotation capacity of the spherical surface of the ball joint structure is 360 degrees. In practice, the relative rotation angle of the centering adjustment component 100 relative to the base 210 does not reach 360 degrees) through the ball joint structure 220 and the base 210; and the adjustment mechanism 230 connects the base 210 and the base 110, and can adjust the relative distance between the base 210 and the base 110. In addition, the ball joint structure 220 and the two adjustment mechanisms 230 are arranged in a triangle.

[0058] During adjustment, the base 110 and the base 210 are rotatably connected via the ball joint structure 220. In this embodiment, the first direction is a direction perpendicular to both the sliding direction of the first sliding mechanism 111 and the sliding direction of the second sliding mechanism 121. Figure 1 As shown, the first direction is parallel to the Z-axis direction, and the two adjustment mechanisms 230 adjust the relative distance between the base 110 and the base 210 along the first direction. When the base 210 is placed on a horizontal plane, the base 110 and the base 210 are relatively fixed along the Z direction at the connection of the ball joint structure 220, and can rotate relative to each other with 6 degrees of freedom (any rotation direction between the three axes of X, Y and Z). The two adjustment mechanisms 230 continuously adjust the relative distance between the side of the base 110 in the opposite direction of the X direction and the base 210, and adjust until the base 110 and the base 210 are parallel, completing the horizontal adjustment operation.

[0059] In one embodiment, see Figure 2 As shown, the multi-degree-of-freedom adjustment mechanism also includes a height adjustment mechanism 300, which may include a screw assembly, including a screw 310 and a kit 320, wherein the kit 320 is sleeved on the screw 310, and the screw 310 may be fixedly connected to the base 210, and the kit 320 is fixedly connected to the enclosure 440 via a connecting frame. Through the relative sliding between the screw 310 and the kit 320, the tray 430 is driven to move along the direction of the Z axis via the horizontal adjustment assembly 200 to adjust the relative distance between the shower head 410 and the wafer 420.

[0060] The multi-degree-of-freedom adjustment mechanism described in this application, see Figure 1 and Figure 2 As shown, it can be operated through the adjustment steps described below:

[0061] Step S100, the device to be adjusted is installed on the multi-degree-of-freedom adjustment mechanism, and the support column 450 can be moved from top to bottom ( Figure 2The support column 450 is passed through the mounting hole 131 of the second slide 130, and the inner wall of the mounting hole 131 on the second slide 130 is fixedly connected, for example, by a clamp, a clamp, a buckle, or a screw;

[0062] Step S200, alternately adjusting the two adjustment mechanisms 230 so that the supporting surface 431 of the tray 430 and the air outlet surface of the shower head 410 are parallel;

[0063] Step S300, adjusting the height adjustment mechanism 300 to adjust the height of the centering adjustment assembly 100 and the horizontal adjustment assembly 200, and driving the device to be adjusted to move up and down (in the Z direction or the reverse Z direction), so that the wafer 420 on the supporting surface 431 and the air outlet surface of the shower head 410 reach a predetermined distance;

[0064] Step S400, alternately adjust the phase positions of the second slide 130, the first slide 120 and the base 110, the first slide 120 slides relative to the base 110 along the X direction and the opposite X direction, and the second slide 130 slides relative to the first slide 120 along the Y direction and the opposite Y direction, so as to adjust the center of the wafer 420 on the supporting surface 431 and the center of the air outlet surface of the shower 410 relative to each other, so as to realize the centering and leveling operation of the shower 410 and the wafer 420.

[0065] In one embodiment, the order of the above steps can be swapped, for example, step S400 can be performed first, and then step S300 can be performed.

[0066] The multi-degree-of-freedom adjustment mechanism described in the present application decouples the adjustment processes of horizontal adjustment and centering adjustment, and the centering adjustment component 100 and the horizontal adjustment component 200 can be operated independently, thereby improving the adjustment accuracy.

[0067] Furthermore, the centering adjustment component 100 of the three-layer platform structure composed of the base 110, the first slide 120 and the second slide 130 can prevent mutual interference between the relative sliding in the two directions during the centering adjustment. After the relative sliding in one direction is completed, when adjusting the relative sliding in the other direction, it will not affect the relative sliding completed before, thereby improving the centering adjustment accuracy. For example, after the relative sliding between the base 110 and the first slide 120 along the direction of the X-axis is completed, the relative position of the base 110 and the first slide 120 can be locked. When adjusting the relative sliding of the first slide 120 and the second slide 130 along the direction of the Y-axis, under the action of the locking mechanism between the base 110 and the first slide 120 and the first sliding mechanism 111 relatively fixed along the Y-axis direction, there will be no relative sliding in the Y-axis direction between the base 110 and the first slide 120. Furthermore, no force in the direction of the X-axis is applied to the first slide 120 , and the base 110 and the first slide 120 do not slide relative to each other in the direction of the X-axis. There is no mutual interference between the relative sliding in the X-axis direction and the Y-axis direction, and the centering adjustment is more precise.

[0068] The base 110 and the base 210 are connected by a ball joint structure 220 to realize rotational connection between the base 110 and the base 210 while limiting the base 110 and the base 210 to each other in the Z direction to prevent the base 110 and the base 210 from separating during adjustment by the adjustment mechanism 230.

[0069] In some possible implementations, see Figure 1 As shown, the centering adjustment assembly 100 further includes a first adjustment mechanism 140 , which is connected to the first sliding mechanism 111 and is used to adjust the relative sliding distance between the base 110 and the first sliding platform 120 .

[0070] Among them, the first adjustment mechanism 140 can be directly connected to the first sliding mechanism 111, and the relative sliding distance between the base 110 and the first slide 120 can be adjusted by adjusting the relative displacement of the slide rail and the slider of the first sliding mechanism 111. It should be noted that this embodiment is only described with the first sliding mechanism 111 in the form of a slide rail and a slider structure, and does not limit the first sliding mechanism 111 corresponding to this embodiment to only be in the form of a slide rail and a slider structure. Any other form of sliding mechanism, the first adjustment mechanism 140 can directly drive the first sliding mechanism 111 to indirectly drive the base 110 and the first slide 120 to slide relative to each other, all fall within the protection scope defined by this embodiment.

[0071] In one embodiment, the first adjustment mechanism 140 can be connected to the base 110 and the first slide 120, so as to be indirectly connected to the first sliding mechanism 111, directly adjusting the relative sliding distance between the base 110 and the first slide 120, and the first sliding mechanism 111 only serves as a limiting mechanism in the sliding direction.

[0072] In one embodiment, the first adjustment mechanism 140 may be a micrometer head capable of fine feeding in micrometer units, and the sleeve is moved on the main shaft by screwing the external thread provided on the main shaft with the internal thread provided on the sleeve.

[0073] In some possible implementations, see Figure 1 As shown, the centering adjustment assembly 100 further includes a second adjustment mechanism 150 , which is connected to the second sliding mechanism 121 and is used to adjust the relative sliding distance between the first slide 120 and the second slide 130 .

[0074] Among them, the second adjustment mechanism 150 can be directly connected to the second sliding mechanism 121, and the relative sliding distance between the first slide 120 and the second slide 130 can be adjusted by adjusting the relative displacement of the slide rail and the slider of the second sliding mechanism 121. It should be noted that this embodiment is only described with the second sliding mechanism 121 in the form of a slide rail and a slider structure, and does not limit the second sliding mechanism 121 corresponding to this embodiment to only be in the form of a slide rail and a slider structure. Any other form of sliding mechanism, the second adjustment mechanism 150 can directly drive the second sliding mechanism 121 to indirectly drive the first slide 120 and the second slide 130 to slide relative to each other, all fall within the protection scope defined by this embodiment.

[0075] In one embodiment, the second adjustment mechanism 150 can be connected to the first slide 120 and the second slide 130, so as to be indirectly connected to the second sliding mechanism 121, directly adjusting the relative sliding distance between the first slide 120 and the second slide 130, and the second sliding mechanism 121 only serves as a limiting mechanism in the sliding direction.

[0076] In some possible implementations, see Figure 3 As shown, the multi-degree-of-freedom adjustment mechanism also includes a connecting mechanism 180, which fixedly connects the bottom end 452 of the support column 450 and the second slide 130. Adjusting the position of the second slide 130 can drive the wafer 420 to move so that the centers of the wafer 420 and the shower head 410 are aligned, and the air outlet surfaces of the wafer 420 and the shower head 410 are parallel.

[0077] In one embodiment, see Figure 3As shown, the connecting mechanism 180 can be a groove-like structure, including an edge portion 181, a bottom wall 182 and a side wall portion 183, and the side wall portion 183 encloses a groove cavity 183a. The shape of the inner wall 183b of the groove cavity 183a matches the outer wall shape of the support column 450. The bottom end 452 of the support column 450 can be inserted into the groove cavity 183a, and the outer wall surface of the support column 450 is in contact with the inner wall 183b of the groove, and the inner wall 183b of the groove can limit the movement of the support column 450 in the XY direction.

[0078] The bottom wall 182 is located at the bottom of the side wall portion 183 and extends from the side wall portion 183 to the inner wall. The bottom wall 182 can close the groove cavity 183a on the Z-direction side of the groove cavity 183a, or can be connected to the groove cavity 183a. Figure 3 As shown, the side wall portion 183 is an eave structure extending inward at one end in the Z-direction opposite direction. A through hole is provided on the bottom wall 182, and the bottom end 452 of the support column 450 can be fixedly connected to the bottom wall 182 by screws. In one embodiment, the side surface of the bottom end 452 along the Z-direction opposite direction is planar, and the side surface of the bottom wall 182 along the Z-direction side is planar, and the bottom wall 182 and the bottom end 452 are closely connected.

[0079] The edge portion 181 may be an edge structure in which the side wall portion 183 extends outward at one end in the Z direction, and a through hole is provided in the edge portion 181. When connecting the support column 450 and the second slide 130, the side wall portion 183 is partially inserted into the mounting hole 131 of the second slide 130, the outer wall surface of the side wall portion 183 and the inner wall surface 131a of the mounting hole 131 are fitted and connected, and the side surface of the edge portion 181 on the opposite Z direction and the side surface of the second slide 130 on the Z direction are fitted, and the connection mechanism 180 and the second slide 130 are fixedly connected by a structure such as a screw.

[0080] The edge portion 181 is fixedly connected to the second slide platform 130 , and the bottom wall 182 is fixedly connected to the support column 450 , so as to achieve a fixed connection between the support column 450 and the second slide platform 130 .

[0081] In some possible implementations, see Figure 1 and Figure 4As shown, the centering adjustment component 100 may also include a driving mechanism 170 and a controller 171. There may be two driving mechanisms 170, and the two driving mechanisms 170 are respectively connected to the first adjustment mechanism 140 and the second adjustment mechanism 150. For example, the driving mechanism 170 may be a driving motor, and the first adjustment mechanism 140 and the second adjustment mechanism 150 may be micrometers, and the driving end of the driving motor is connected to the sleeve of the micrometer. The controller 171 is connected to the driving motor, and the controller 171 can control the rotation direction and rotation angle of the driving motor to control the screw-in and screw-out amount of the micrometer, so as to realize the controller 171 intelligently controlling the relative sliding direction and relative sliding distance of the base 110 and the first slide 120.

[0082] In one embodiment, the centering adjustment component 100 also includes a sensor system 172, which can be composed of sensors such as infrared optical instruments. The sensor system 172 obtains the offset direction and offset distance of the center of the shower head 410 and the center of the wafer 420, and feeds the data back to the controller 171. The controller 171 converts the data into adjustment parameters of the first adjustment mechanism 140, and adjusts the relative sliding direction and relative sliding distance of the base 110, the first slide 120 and the second slide 130 through the driving mechanism 170 according to the adjustment parameters.

[0083] In some possible implementations, see Figure 5 As shown, Figure 5 The spherical joint structure 220 includes a ball head rod 221 and a ball joint support 222 , and the ball head rod 221 and the ball joint support 222 are rotatably connected to realize the rotatable connection between the centering adjustment component 100 and the horizontal adjustment component 200 .

[0084] Among them, see Figure 5 As shown, the ball head rod 221 has a ball head 2211, the ball head 2211 is a spherical structure, and the outer wall surface of the ball head 2211 is a spherical surface. The ball joint support 222 has a spherical groove 2221, and the ball joint support 222 can be a sleeve-shaped structure with a hollow cavity. At least part of the inner wall surface of the hollow cavity of the ball joint support 222 is a spherical surface to form the spherical groove 2221. The ball head 2211 is located in the spherical groove 2221, and the outer spherical surface of the ball head 2211 and at least part of the spherical inner wall surface of the spherical groove 2221 are fitted and connected, and the ball head 2211 and the inner wall surface of the spherical groove 2221 are slidably connected.

[0085] It should be noted that the spherical inner wall of the spherical groove 2221 described in the present application is at least larger than half of the spherical structure. When the ball head 2211 is placed in the spherical groove 2221, part of the inner wall surface along one side of the spherical groove 2221 along the Z direction can provide support force to the ball head 2211 in the opposite direction of the Z direction, thereby preventing the ball head 2211 and the spherical groove 2221 from detaching when they rotate relative to each other.

[0086] In some possible embodiments, the ball joint support 222 includes a body 2222 and a compression sleeve 2223, the body 2222 has a cavity 2222a, the cavity 2222a may be a hollow cavity passing through the body 2222, and the cavity 2222a may be cylindrical, and the body 2222 as a whole may be in the shape of a cylindrical sleeve.

[0087] The main body 2222 includes a first end 2222b, which is one end of the main body 2222 on one side of the Z direction. The inner wall surface of the first end 2222b includes a spherical wall surface 2222c, and the spherical wall surface 2222c gradually approaches the central axis of the cavity 2222a (the present embodiment takes the cylindrical cavity 2222a as an example) along the Z direction.

[0088] The compression sleeve 2223 is located in the cavity 2222a, and the compression sleeve 2223 has an inner spherical groove surface 2223a, the opening of the inner spherical groove surface 2223a faces one side in the Z direction, and the inner spherical groove surface 2223a of the compression sleeve 2223 and the spherical wall surface 2222c of the first end portion 2222b constitute the inner wall surface of the spherical groove 2221. It should be noted that the inner wall surface of the spherical groove 2221 may not be a complete spherical surface, but a part of a spherical surface.

[0089] The ball joint structure 220 described in this embodiment can first insert the ball head rod 221 from the Z-opposite side of the ball joint support 222 along the Z direction into the cavity 2222a of the ball joint support 222, and make the ball head 2211 contact the spherical wall 2222c; the ball head rod 221 described in this embodiment also includes a connecting rod portion 2212, one end of the connecting rod portion 2212 is fixedly connected to the ball head 2211 or is an integral structure, and the connecting rod portion 2212 can pass through the cavity 2222a in The port on one side of the Z direction extends to the outside of the main body 2222; then the compression sleeve 2223 is inserted into the cavity 2222a on the opposite Z direction side of the ball joint support 222 with its opening facing the Z direction, and the inner ball groove surface 2223a and the ball head 2211 are in contact, the inner ball groove surface 2223a and the spherical wall surface 2222c clamp the ball head 211 in the spherical groove 2221, and the ball head 211 can slide relative to the inner wall surface of the spherical groove 2221.

[0090] In one embodiment, the ball joint support 222 further includes a spring 2224 and a pre-tightening screw 2225, and the body 2222 includes a second end 2222d, and the second end 2222d is located on the side of the body 2222 in the opposite direction of Z.

[0091] At least part of the pre-tightening screw 2225 is located in the second end 2222d and fixedly connected to the body 2222. An internal thread may be provided on the inner wall surface of the second end 2222d, and an external thread may be provided on the pre-tightening screw 2225, and the two may be fixedly connected by threaded fit.

[0092] The spring 2224 is located in the cavity 2222a and supported between the compression sleeve 2223 and the pre-tightening screw 2225. The spring 2224 provides a supporting force to the compression sleeve 2223 along the Z direction, so that the compression sleeve 2223 supports the ball head 2211 in the spherical groove 2221. In addition, the supporting force provided by the spring 2224 to the compression sleeve is an elastic force. When the ball head 2211 and the spherical groove 2221 rotate relative to each other, there will be no jamming of the ball head 2211 and the inner wall of the spherical groove 2221, thereby improving the smoothness of the horizontal adjustment component 200 when adjusting the relative angle between the base 210 and the base 110, thereby improving the accuracy of the adjustment.

[0093] In one embodiment, see Figure 5 As shown, the connecting rod portion 2212 is fixedly connected to the base 110, the connecting rod portion 2212 can pass through the base 110, and an external thread can be set on the outer wall surface of the connecting rod portion 2212, and the connecting rod portion 2212 and the base 110 are fixedly connected by a nut, and the ball joint support 222 and the base 210 are fixedly connected, and the ball joint support 222 and the base 210 can be fixedly connected by bolts and other components.

[0094] In one embodiment, the ball joint structure 220 can be Figure 5 In an inverted form, the connecting rod portion 2212 can be fixedly connected to the base 210, and the ball joint support 222 can be fixedly connected to the base 110.

[0095] In some possible implementations, see Figure 1 As shown, the multi-degree-of-freedom adjustment mechanism further includes a locking mechanism 160 , which is connected to the first sliding mechanism 111 and is used to lock the base 110 and the first sliding platform 120 to slide relative to each other.

[0096] Among them, the locking mechanism 160 can be a locking knob, including a seat body and a knob part. The knob part can rotate relative to the seat body, and the seat body can be connected to the slide rail of the first sliding mechanism 111. The knob part rotates relative to the seat body. In the free state, the knob part and the slider are not in contact, and the slider and the slide rail can slide relative to each other; when the knob part rotates to the locked state, the knob part and the slider are in contact, and the slide rail and the slider can be kept in a relatively fixed state by abutment.

[0097] In one embodiment, the locking mechanism 160 may also directly connect the base 110 and the first slide 120 to indirectly connect the first sliding mechanism 111 , and lock the relative positions of the base 110 and the first slide 120 to lock the relative sliding of the first sliding mechanism 111 .

[0098] In one embodiment, the locking mechanism 160 may be connected to the second sliding mechanism 121 to lock the relative sliding of the first sliding platform 120 and the second sliding platform 130 .

[0099] Among them, the locking mechanism 160 can be a locking knob, including a seat body and a knob part. The knob part can rotate relative to the seat body, and the seat body can be connected to the slide rail of the second sliding mechanism 121. The knob part rotates relative to the seat body. In the free state, the knob part and the slider are not in contact, and the slider and the slide rail can slide relative to each other; when the knob part is rotated to the locked state, the knob part and the slider are in contact, and the slide rail and the slider can be kept in a relatively fixed state by abutment.

[0100] In one embodiment, the locking mechanism 160 may also directly connect the first slide 120 and the second slide 130 to indirectly connect the second sliding mechanism 121 , and lock the relative position of the first slide 120 and the second slide 130 to lock the relative sliding of the second sliding mechanism 121 .

[0101] In one embodiment, only one locking mechanism 160 may be provided, and the locking mechanism 160 is connected to the first sliding mechanism 111 or the second sliding mechanism 121. Alternatively, two locking mechanisms 160 may be provided, and the two locking mechanisms 160 are connected to the first sliding mechanism 111 and the second sliding mechanism 121, respectively.

[0102] In some embodiments, see Figure 6 As shown, the adjustment mechanism 230 includes a screw rod 231, a spherical washer 232, a knob 233 and a locking nut 234. One end of the screw rod 231 is fixedly connected to the base 210. The base 110 is provided with a through hole 113, and the screw rod 231 passes through the through hole 113.

[0103] The direction from the base 110 to the base 210 is the second direction ( Figure 6 The second direction is the Z-opposite direction), along the second direction, on the side of the base 110 facing the base 210, a spherical washer 232, a knob 233 and a locking nut 234 are sequentially arranged on the screw 231; on the Z-opposite direction side of the base 110, the spherical washer 232 is arranged between the knob 233 and the base 110, which can play an anti-slip and supporting role; the knob 233 is located between the locking nut 234 and the spherical washer 232.

[0104] In the opposite direction of the second direction, on the side of the base 110 away from the base 210, a spherical washer 232, a knob 233 and a locking nut 234 are sequentially arranged on the screw 231. On the Z-direction side of the base 110, the spherical washer 232 is arranged between the knob 233 and the base 110 to play an anti-slip and support role; the knob 233 is located between the locking nut 234 and the spherical washer 232.

[0105] One end of the screw rod 231 in the Z-opposite direction is fixed on the base 210. When adjusting, the locking nuts 234 on both sides are loosened, and the position of the base 110 on the base 110 is adjusted by rotating the knob 233 to adjust the relative distance between the base 110 and the base 210. When adjusting to the target position, the locking nuts 234 on both sides are tightened, and the base 110 and the screw rod 231 are relatively fixed to realize the locking function of the adjustment mechanism 230.

[0106] The present application also provides a device, comprising the multi-degree-of-freedom adjustment mechanism described in any of the above embodiments, and also comprising a first component and a second component, the second component being connected to the multi-degree-of-freedom adjustment mechanism, and the multi-degree-of-freedom adjustment mechanism being used to adjust the relative position of the second component and the first component.

[0107] In one embodiment, the device may be a semiconductor-related device, see Figure 1 , Figure 2 and Figure 3 As shown, the first component may be a shower head 410 , and the second device may be a tray 430 . A wafer 420 is placed on the tray 430 , and the tray 430 is fixedly connected to the second slide 130 via a support column 450 .

[0108] The multi-degree-of-freedom adjustment mechanism described in this application, see Figure 1 and Figure 2 As shown, it can be operated through the adjustment steps described below:

[0109] Step S100, the support column 450 is moved from top to bottom ( Figure 2 The support column 450 is passed through the mounting hole 131 on the second slide 130, and the inner wall of the mounting hole 131 on the second slide 130 is fixedly connected, for example, by a clamp, a clamp, a buckle, or a screw;

[0110] Step S200, alternately adjusting the two adjustment mechanisms 230 so that the supporting surface 431 of the tray 430 and the air outlet surface of the shower head 410 are parallel;

[0111] Step S300, adjusting the height adjustment mechanism 300 to adjust the height of the centering adjustment assembly 100 and the horizontal adjustment assembly 200, and driving the device to be adjusted to move up and down (in the Z direction or the reverse Z direction), so that the wafer 420 on the supporting surface 431 and the air outlet surface of the shower head 410 reach a predetermined distance;

[0112] Step S400, alternately adjust the phase positions of the second slide 130, the first slide 120 and the base 110, the first slide 120 slides relative to the base 110 along the X direction and the opposite X direction, and the second slide 130 slides relative to the first slide 120 along the Y direction and the opposite Y direction, so as to adjust the center of the wafer 420 on the supporting surface 431 and the center of the air outlet surface of the shower 410 relative to each other, so as to realize the centering and leveling operation of the shower 410 and the wafer 420.

[0113] In one embodiment, the order of the above steps can be swapped, for example, step S400 can be performed first, and then step S300 can be performed.

[0114] The above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. These modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application, and should all be included in the protection scope of the present application.

Claims

1. A multi-degree-of-freedom adjustment mechanism, characterized in that: include: A centering adjustment component comprises a base, a first slide and a second slide which are stacked in sequence, a first sliding mechanism is connected between the base and the first slide, a second sliding mechanism is connected between the first slide and the second slide, and a sliding direction of the first sliding mechanism is inclined or perpendicular to a sliding direction of the second sliding mechanism; A horizontal adjustment component includes a base, a ball joint structure and an adjustment mechanism. The base and the base are rotatably connected via the ball joint structure. At least two adjustment mechanisms are connected between the base and the base. The first direction is a direction perpendicular to the sliding direction of the first sliding mechanism and the sliding direction of the second sliding mechanism. The adjustment mechanism is used to adjust the relative distance between the base and the base along the first direction. The ball joint structure and the two adjustment mechanisms are arranged in a triangle.

2. The multi-degree-of-freedom adjustment mechanism according to claim 1, characterized in that: The second slide is provided with a mounting hole, and the mounting hole is used to mount a support column of a semiconductor device.

3. The multi-degree-of-freedom adjustment mechanism according to claim 2, characterized in that: The multi-degree-of-freedom adjustment mechanism further includes a connecting mechanism, the connecting mechanism includes an edge portion, a bottom wall and a side wall portion, the bottom wall and the side wall portion enclose a groove cavity, and the groove cavity is used to accommodate the support column; The edge portion is located on the outer wall surface of the side wall portion, the side wall portion passes through the mounting hole, and the edge portion is fixedly connected to the second slide platform.

4. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 3, characterized in that: The base is located at a side of the pedestal away from the first slide, and the base, the pedestal, the first slide and the second slide form a four-layer stacked structure.

5. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 4, characterized in that: The centering adjustment assembly also includes a first adjustment mechanism, which is connected to the first sliding mechanism and is used to adjust the relative sliding distance between the base and the first sliding platform.

6. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 5, characterized in that: The centering adjustment assembly also includes a second adjustment mechanism, which is connected to the second sliding mechanism and is used to adjust the relative sliding distance between the first sliding platform and the second sliding platform.

7. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 6, characterized in that: The ball joint structure includes a ball head rod and a ball joint support, the ball head rod has a ball head portion, the ball joint support has a spherical groove, the ball head portion is located in the spherical groove and is closely connected to at least part of the inner wall surface of the spherical groove, and the ball head portion is slidably connected to the inner wall surface of the spherical groove.

8. The multi-degree-of-freedom adjustment mechanism according to claim 7, characterized in that: The ball joint support includes a main body and a compression sleeve, the main body has a cavity, the main body includes a first end, the inner wall surface of the first end includes a spherical wall surface, the compression sleeve is located in the cavity, the compression sleeve has an inner ball groove surface, the inner ball groove surface and the spherical wall surface constitute the inner wall surface of the spherical groove.

9. The multi-degree-of-freedom adjustment mechanism according to claim 8, characterized in that: The ball joint support also includes a spring and a pre-tightening screw, the body includes a second end, the pre-tightening screw is located in the second end and fixedly connected to the body, and the spring is located in the cavity and supported between the compression sleeve and the pre-tightening screw.

10. The multi-degree-of-freedom adjustment mechanism according to any one of claims 7 to 9, characterized in that: The ball head rod also includes a connecting rod portion, one end of which is connected to the ball head portion or forms an integral structure.

11. The multi-degree-of-freedom adjustment mechanism according to claim 10, characterized in that: The connecting rod portion is fixedly connected to the base, and the ball joint support is fixedly connected to the base; Alternatively, the other end of the connecting rod portion is fixedly connected to the base, and the ball joint support is fixedly connected to the base.

12. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 11, characterized in that: The multi-degree-of-freedom adjustment mechanism further includes a locking mechanism, which is connected to the first sliding mechanism and is used to lock the relative sliding between the base and the first sliding platform; and / or, The locking mechanism is connected to the second sliding mechanism and is used to lock the first sliding platform and the second sliding platform from sliding relative to each other.

13. The multi-degree-of-freedom adjustment mechanism according to any one of claims 1 to 12, characterized in that: The adjustment mechanism comprises a screw rod, a spherical washer, a knob and a locking nut, one end of the screw rod is fixedly connected to the base, a through hole is provided on the base, and the screw rod passes through the through hole; The direction of the base toward the pedestal is a second direction, and along the second direction, on a side of the base toward the pedestal, the spherical washer, the knob and the locking nut are sequentially arranged on the screw rod; Along the opposite direction of the second direction, on the side of the base away from the pedestal, the spherical washer, the knob and the locking nut are sequentially arranged on the screw rod.

14. A device, characterized in that It comprises the multi-degree-of-freedom adjustment mechanism as described in any one of claims 1 to 13 above, and also comprises a first component and a second component, wherein the second component is connected to the multi-degree-of-freedom adjustment mechanism, and the multi-degree-of-freedom adjustment mechanism is used to adjust the relative position of the second component and the first component.