Monocrystal surface preparation device

Abstract

The invention provides a single crystal surface preparation device, and belongs to the technical field of single crystal metal processing, the single crystal surface preparation device comprises a base, an adjusting assembly and a fixing seat, the adjusting assembly is arranged on the base; the fixing seat is arranged on the adjusting assembly, and the fixing seat is used for fixing a single crystal; the adjusting assembly is used for driving the fixing base to rotate around a first shaft and a second shaft, and the extending direction of the first shaft intersects with the extending direction of the second shaft. The adjusting assembly is arranged on the base, and the fixing seat can rotate around the first shaft and the second shaft, so that the crystal face of the single crystal fixed on the fixing seat can be adjusted to an ideal state, grinding or preparation and other work can be carried out, the experiment requirement is met, a complicated preparation method is avoided when the surface of the single crystal is prepared, and the experiment efficiency is improved. The operation and steps for preparing the single crystal are simplified, and the method has relatively good economic value and practicability.

Description

Technical Field

[0001] The present invention belongs to the technical field of single crystal metal processing, and particularly relates to a device for preparing a single crystal surface. Background Art

[0002] Due to their unique anisotropic physical and chemical properties, single crystal metal materials have important applications in fields such as catalysis, electronic materials, surface science, and crystal growth. However, currently, the surfaces of commercially available single crystal metals are mostly low-index crystal planes, because these surfaces have a lower surface Gibbs free energy, are easy to form, and have a lower cost. However, the demand for high-index crystal planes is increasing day by day. Such surfaces are of great significance in studying the mechanism of catalytic reactions, the surface behavior of materials, and directional surface modification due to their unique atomic arrangement and surface energy characteristics. High-index single crystal surfaces usually have a higher atomic density, uneven atomic exposure states, and specific active site distributions, so they show significant advantages in the design of heterogeneous catalysts, the growth of high-performance thin films, and the preparation of single crystal superconductors. However, currently, the preparation methods for high-index single crystal surfaces mainly rely on complex chemical vapor deposition, mechanical grinding combined with annealing processes, which are cumbersome in operation and require high equipment, making it difficult to achieve precise control and good preparation in the laboratory.

[0003] Due to the lack of multi-degree-of-freedom adjustment function in the existing device, it is difficult to adjust the crystal plane of the single crystal to an ideal state for grinding or preparation work, thus unable to meet the experimental requirements. Summary of the Invention

[0004] In view of the above-mentioned disadvantages of the prior art, the purpose of the present invention is to provide a device for preparing a single crystal surface, which is used to solve the problems that the crystal plane of the single crystal in the prior art is difficult to be adjusted to an ideal state and cannot meet the experimental requirements.

[0005] To achieve the above object and other related objects, the present invention provides a device for preparing a single crystal surface, including:

[0006] A base;

[0007] An adjustment component, which is arranged on the base;

[0008] A fixing seat, which is arranged on the adjustment component and is used to fix the single crystal;

[0009] Wherein, the adjustment component is used to drive the fixing seat to rotate around a first axis and a second axis, and the extending direction of the first axis intersects with the extending direction of the second axis.

[0010] Optionally, the extending direction of the first axis is perpendicular to the extending direction of the second axis.

[0011] Optionally, the adjusting assembly includes a circumferential direction adjuster and an inclination angle adjuster connected in sequence along the extension direction of the first axis. The circumferential direction adjuster is used to drive the fixed seat to rotate around the first axis, and the inclination angle adjuster is used to drive the fixed seat to rotate around the second axis. A circumferential adjustment scale is provided on the circumference of the circumferential direction adjuster, and the inclination angle adjuster has an inclination angle adjustment scale for indicating the rotation angle around the second axis.

[0012] Optionally, the adjusting assembly further includes a vertical direction adjuster, which is used to drive the fixed seat to translate relative to the base along the extension direction of the first axis. A displacement adjustment scale is provided on the vertical direction adjuster along the extension direction of the first axis.

[0013] Optionally, the fixed seat includes a plug-in seat and a fixed plug-in. The plug-in seat is connected to the adjusting assembly, and the fixed plug-in is provided with a pin. The fixed plug-in is plugged on the plug-in seat through the pin.

[0014] Optionally, the fixed plug-in includes a connection seat and a pin seat. The connection seat is used to place the crystal, the pin is arranged on the pin seat, and the connection seat and the pin seat are detachably connected.

[0015] Optionally, the single crystal surface preparation device further includes a support seat, which is used to be placed on the grinding disc. The support seat is connected to the base through a connection assembly, and the support seat is provided with an avoidance structure for avoiding the movement track of the single crystal.

[0016] Optionally, at least three non-collinear support protrusions are provided on the contact surface of the support seat for contacting the grinding disc, and the hardness of the support protrusions is greater than that of the support seat.

[0017] Optionally, each of the support protrusions has a grinding surface away from the contact surface. The grinding surfaces of the support protrusions are coplanar, and each of the grinding surfaces is parallel to the contact surface.

[0018] Optionally, the connection assembly includes at least three connection units. Each connection unit includes a support rod, a fixing bolt, an anti-slip nut and a fixing nut. One side of the support rod is connected to the base, and a connection threaded hole is opened on the other side of the support rod. The fixing bolt is threadedly connected to the support rod through the connection threaded hole. The fixing nut is used to cooperate with the fixing bolt to clamp the support seat. The anti-slip nut is threadedly connected to the fixing bolt and abuts against one end of the support rod provided with the connection threaded hole. Each of the connection assemblies is arranged around the adjusting assembly.

[0019] As described above, a single crystal surface preparation device of the present invention has the following beneficial effects:

[0020] By providing an adjustment component on the base, the fixing seat can rotate around the first axis and the second axis, so that the crystal plane of the single crystal fixed on the fixing seat can be adjusted to an ideal state for grinding or preparation work, etc., to meet the experimental requirements, avoid using complex preparation methods when preparing the single crystal surface, simplify the operation and steps of single crystal preparation, and have good economic value and practicability. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is the front view of the single crystal surface preparation device in the embodiment of the present invention.

[0022] Figure 2 It is the bottom view of the single crystal surface preparation device in the embodiment of the present invention.

[0023] Figure 3 It is the exploded view of the single crystal surface preparation device in the embodiment of the present invention.

[0024] Figure 4 It is the structural schematic diagram of the fixing seat in the embodiment of the present invention.

[0025] Figure 5 It is the exploded view of the fixing seat in the embodiment of the present invention.

[0026] Figure 6 It is the side view of the fixing seat in the embodiment of the present invention.

[0027] Figure 7 It is Figure 6 The cross-sectional schematic view of A-A in

[0028] Reference numeral description: 1. Base; 2. Vertical direction adjuster; 3. Circumferential direction adjuster; 4. Inclination adjuster; 5. Support seat; 501. Avoidance opening; 502. Support protrusion; 6. Connection component; 601. Support rod; 602. Anti-slip nut; 603. Fixing bolt; 604. Fixing nut; 7. Fixing seat; 701. Connection seat; 7011. Fixing groove; 702. Pin seat; 7021. Pin; 703. Plug-in seat; 7031. Pin hole; 704. Adapter. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0029] The following specific embodiments illustrate the implementation manners of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0030] Please refer to Figures 1 to 7It should be noted that the structures, proportions, sizes, etc. shown in the drawings of this specification are only used to cooperate with the content disclosed in the specification for those skilled in this technology to understand and read, and are not used to limit the conditions for the implementation of the present invention. Therefore, they do not have substantial technical significance. Any modification of the structure, change of the proportional relationship, or adjustment of the size, without affecting the effects that the present invention can produce and the purposes that can be achieved, should still fall within the scope that can be covered by the technical content disclosed in the present invention. At the same time, the terms such as "upper", "lower", "left", "right", "middle", and "one" cited in this specification are only for the convenience of clear narration and are not used to limit the scope for the implementation of the present invention. The change or adjustment of their relative relationships, without substantial change in the technical content, should also be regarded as the scope within which the present invention can be implemented.

[0031] In order to be able to describe the present invention in detail, a single crystal surface preparation device of the present invention will be specifically described next:

[0032] Please refer to Figures 1 to 3 As shown, the present invention provides a single crystal surface preparation device, including a base 1, an adjustment assembly, and a fixing seat 7. The adjustment assembly is arranged on the base 1; the fixing seat 7 is arranged on the adjustment assembly, and the fixing seat 7 is used to fix the single crystal; wherein, the adjustment assembly is used to drive the fixing seat to rotate around a first axis and a second axis, and the extending direction of the first axis intersects with the extending direction of the second axis. By arranging the adjustment assembly on the base 1, the fixing seat 7 can rotate around the first axis and the second axis, so that the crystal plane of the single crystal fixed on the fixing seat 7 can be adjusted to an ideal state for grinding or preparation work, etc., to meet the experimental requirements, avoid using complex preparation methods when preparing the single crystal surface, simplify the operation and steps of single crystal preparation, and have good economic value and practicability.

[0033] As Figures 4 to 7 shown, in this embodiment, the single crystal surface preparation device is used to adjust the single crystal to a predetermined angle for grinding or preparation operations on the target surface. The fixing seat 7 includes a plug-in seat 703 and a fixing plug. The plug-in seat 703 is connected to the adjustment assembly. The fixing plug is provided with a pin 7021. The plug-in seat 703 is provided with a pin hole 7031 corresponding to the pin 7021. The fixing plug is inserted into the plug-in seat 703 through the pin 7021 inserted into the pin hole 7031. The fixing plug is provided with two pins 7021, and the positions of the two pin holes 7031 provided on the plug-in seat 703 are spaced the same as the positions of the pin holes 7031 on the EBSD (Electron Backscatter Diffraction) crystal phase analysis equipment and the XRD (X-ray Diffraction) crystal phase analysis equipment, so that the fixing plug can be directly used on the EBSD, XRD and other crystal phase analysis equipment to complete high-precision surface orientation experiments.

[0034] Among them, the fixed plug-in includes a connecting base 701 and a pin base 702. The connecting base 701 is used to place the single crystal, and the pins 7021 are arranged on the pin base 702. A fixed groove 7011 is formed on the side of the connecting base 701 away from the pin base 702. After the heated single crystal is placed in the fixed groove 7011 and cooled by liquid nitrogen or other coolants, it is fixed on the connecting base 701, or the single crystal is directly adhered in the fixed groove. The way the single crystal is fixed in the fixed groove 7011 can be adjusted according to actual usage needs. The opening shape of the fixed groove 7011 can be circular or square, and different models can be manufactured according to usage requirements for the opening shape and thickness of the fixed groove 7011 for standby. The connecting base 701 and the pin base 702 are detachably connected, which is convenient for replacing the connecting base 701 to be applicable to single crystals of different sizes and materials, including but not limited to metal single crystals, semiconductor single crystals, composite material single crystals, etc. In this way, the adaptability of the single crystal surface preparation device to different single crystals is improved, and the applicable range of the single crystal surface preparation device is expanded. During actual use, the connecting base 701 with different opening shapes and thicknesses can be made according to actual needs. In this embodiment, the connecting base 701 is threadedly connected to the pin base 702 by bolts. In some embodiments, the connecting base 701 and the pin base 702 are connected by a buckle. The detachable connection method between the connecting base 701 and the pin base 702 can be adjusted according to actual needs. In this embodiment, the fixed base 7 further includes an adapter 704, and the adapter 704 is arranged between the adjusting component and the socket 703 to facilitate the socket 703 to be arranged on the adjusting component.

[0035] Among them, the adjusting component includes a circumferential direction adjuster 3 and an inclination angle adjuster 4 connected in sequence along the extension direction of the first axis. The fixed base 7 is arranged on the inclination angle adjuster 4. The circumferential direction adjuster 3 is used to drive the fixed base 7 to rotate around the first axis, and the inclination angle adjuster 4 is used to drive the fixed base 7 to rotate around the second axis. A circumferential adjustment scale is arranged on the circumference of the circumferential direction adjuster 3, and the inclination angle adjuster 4 has an inclination angle adjustment scale for indicating the rotation angle around the second axis. Through the sequentially connected circumferential direction adjuster 3 and inclination angle adjuster 4, the single crystal can be adjusted to a suitable orientation for grinding and preparation work on the target surface. Among them, the circumferential direction adjuster 3 allows the single crystal to rotate freely within a range of 360 degrees. The circumferential direction adjuster 3 is internally equipped with a high-precision circular bearing to reduce friction and ensure the smoothness and accuracy of rotation. The inclination angle adjuster 4 is used to control the inclination direction of the single crystal. The inclination angle adjuster 4 is internally equipped with a curved guide rail to achieve high angle accuracy through precise adjustment. In this embodiment, the extension direction of the first axis is perpendicular to the extension direction of the second axis, which is convenient for installing the circumferential direction adjuster 3 and the inclination angle adjuster 4.

[0036] Among them, the adjustment component further includes a vertical direction adjuster 2, which is used to drive the fixed seat 7 to translate relative to the base 1 along the extension direction of the first axis. The vertical direction adjuster 2, the circumferential direction adjuster 3, and the inclination angle adjuster 4 are sequentially connected along the extension direction of the first axis. The vertical direction adjuster 2 is connected to the base 1, and the inclination angle adjuster 4 is connected to the fixed seat 7. A displacement adjustment scale is provided on the vertical direction adjuster 2 along the extension direction of the first axis. When the single crystal is ground on the grinding disk, by adjusting the vertical direction adjuster 2, during the grinding process, by precisely controlling the protrusion amount of the single crystal, it can be ensured that the single crystal can maintain contact with the surface of the grinding disk, and the single crystal can be ground to the target state. Through the pressure control of the vertical direction adjuster 2, uniform grinding of the single crystal can be achieved. In this embodiment, a screw micrometer is provided on the vertical direction adjuster 2 to achieve high-precision fine adjustment, ensuring that the vertical direction adjustment error is within the controllable range, so as to meet the high requirements at the laboratory level. In the prior art, the accuracy of the vertical direction adjuster 2 can reach 0.01 mm; the angle adjustment accuracy of the circumferential direction adjuster 3 is less than 1°; the angle adjustment accuracy of the inclination angle adjuster 4 is less than 0.1°. The combination of adjusters with the above accuracies can meet the high-precision requirements of the laboratory. The vertical direction adjuster 2, the circumferential direction adjuster 3, and the inclination angle adjuster 4 are prior arts, and their structures will not be described in detail here.

[0037] Among them, the single-crystal surface preparation device further includes a support base, which is used to be placed on the grinding disc. The support base is connected to the base through a connection component, and the support base is provided with an avoidance structure for avoiding the movement track of the single crystal. It should be noted that since the angle presented by the grinding disc grinding the single crystal is related to the surface of the support base in contact with the grinding disc, both the base and the support base are plate-shaped, and they need to be kept parallel when connected, that is, the plane on the side of the base away from the support base needs to be parallel to the plane of the support base in contact with the grinding disc, so as to ensure that when adjusting the fixed seat through the circumferential direction regulator, the angle between the plane of the support base in contact with the grinding disc and the height direction of the single crystal remains unchanged at each rotation angle. It should be noted that the height direction of the single crystal is the concave direction of the fixed groove. Similarly, when the circumferential direction regulator, the vertical direction regulator, the inclination angle regulator and the fixed seat are connected, the connecting surfaces on each regulator and the fixed seat need to be parallel to the plane of the support base in contact with the grinding disc, that is, to ensure that when the single crystal is fixed on the fixed seat and the adjustment degree of the inclination angle regulator is 0, the height direction of the single crystal is perpendicular to the plane of the support base in contact with the grinding disc. Therefore, the connecting surfaces between the circumferential direction regulator, the vertical direction regulator, the inclination angle regulator and the fixed seat need to be polished so that the connecting surfaces are approximately mirror surfaces. After the circumferential direction regulator, the vertical direction regulator, the inclination angle regulator and the fixed seat are connected, it is ensured that the plane of the fixed seat where the single crystal is placed is also a horizontal plane. In this way, it can be ensured that when the single crystal rotates around the first axis, the angle between the height direction of the single crystal and the plane of the support base in contact with the grinding disc remains unchanged. By setting the support base, the surface of the support base in contact with the grinding disc can be used as a reference to grind the single crystal. In this way, there is no need to rely on complex clamping tools to clamp the single-crystal surface preparation device for grinding work, and the single-crystal surface preparation device can be held by hand for operation. This method is simple and easy to operate, improving the practicability of the single-crystal surface preparation device.

[0038] In this embodiment, the avoidance structure is the avoidance opening 501, and the single crystal can extend out of the support base 5 and contact the grinding disc through the avoidance opening 501. In some embodiments, the avoidance structure is an avoidance notch. The type of the avoidance structure can be adjusted according to actual usage needs.

[0039] Specifically, at least three non - collinear support protrusions 502 are provided on one side of the support base 5 away from the base 1, and the hardness of the support protrusions 502 is greater than that of the support base 5. By providing the support protrusions 502 on the support base 5, the wear of the grinding disc on the support base 5 can be reduced. At the same time, since materials with relatively high hardness are more expensive, if the support base 5 is entirely made of materials with higher hardness, its manufacturing cost is high. However, by setting the support protrusions 502, the production and manufacturing cost of the single - crystal surface preparation device can be greatly reduced, and at the same time, the purpose of reducing the wear of the support base 5 is also met. In this embodiment, at least three non - collinear grooves are provided on one side of the support base 5 away from the base 1, and the high - hardness support protrusions 502 are respectively placed in the corresponding grooves and connected to the groove surfaces. Since when grinding the single - crystal on the grinding disc, the groove surfaces can provide partial lateral forces to the support protrusions 502, the situation where the support protrusions 502 are separated from the support base 5 due to large lateral forces when on the grinding disc can be avoided, thereby improving the tightness of the connection between the support protrusions 502 and the support base 5.

[0040] In detail, each support protrusion 502 has a polishing surface away from the support base 5. The polishing surfaces of the support protrusions 502 are coplanar, and each polishing surface is parallel to the contact surface. In this way, the friction between the support protrusions 502 and the grinding disc can be further reduced, the wear of the grinding disc on the support protrusions 502 can be reduced, and the loss of the single - crystal surface preparation device during use can be reduced. The support protrusions 502 can be made of materials with relatively high hardness such as sapphire or diamond.

[0041] Among them, the connecting component 6 includes at least three connecting units. Each connecting unit includes a support rod 601, a fixing bolt 603, an anti-slip nut 602, and a fixing nut 604. One side of the support rod 601 is connected to the base 1, and a connecting threaded hole extending along the axial direction of the support rod 601 is formed on the other side of the support rod 601. The fixing bolt 603 is threadedly connected to the support rod 601 through the connecting threaded hole. The anti-slip nut 602 is threadedly connected to the fixing bolt 603 and abuts against one end of the support rod 601 provided with the connecting threaded hole. The fixing nut 604 is used to cooperate with the bolt to clamp the support seat 5. The connecting component 6 is arranged around the adjusting component. By connecting the base 1 and the support seat 5 through the support rod 601, the fixing bolt 603, and the fixing nut 604, it is convenient to pass through the space between the support rods 601 to adjust the adjusting component, so as to adjust the single crystal to the target orientation. In this embodiment, the hole formed on the support seat 5 for passing through the fixing bolt 603 is a stepped hole. The bolt head of the fixing bolt 603 is clamped on the stepped surface of the stepped hole, and the bolt head is located inside the stepped hole or flush with the grinding surface, so as to avoid wearing the bolt when grinding the single crystal. By providing the anti-slip nut 602 and using the anti-slip nut 602 and the fixing nut 604 in cooperation, the loosening of the fixing bolt 603 can be avoided, and the problem of the relative position change between the support seat 5 and the fixed seat 7 can be avoided, thereby increasing the stability of the single crystal surface preparation device during operation. In this embodiment, the connecting component 6 includes three connecting units, and the number of connecting units in the connecting component 6 can be adjusted according to actual needs.

[0042] The single crystal surface preparation device may further include a displacement sensor, which is used to monitor the position and angle of the single crystal in real time. When using the grinding disc for grinding, if the position or angle of the single crystal changes, the operator can be prompted in time by sound or light. The adjusting component in the single crystal surface preparation device can be an electric adjusting component. After the operator inputs the required data, the inclination adjuster 4, the circumferential direction adjuster 3, and the vertical direction adjuster 2 perform automatic adjustment. In this way, the automation degree of the single crystal surface preparation device can be improved, and the adjustment efficiency can be increased.

[0043] When using the single crystal surface preparation device, place the base 1 on a horizontal placement surface. Connect the support base 5 to the base 1 through the connection component 6, and use a laser aligner to determine whether the state of the single crystal is in a non-inclined state relative to the horizontal plane. Since when the circumferential direction adjuster 3, the vertical direction adjuster 2, the inclination adjuster 4 and the fixing base 7 are connected, the connecting surfaces on each adjuster and the fixing base 7 need to be parallel to the plane where the support base 5 contacts the grinding disc, and the surface where the support base 5 contacts the grinding disc is parallel to the surface where the base 1 contacts the horizontal placement surface. Therefore, the height direction of the single crystal is perpendicular to the horizontal plane, that is, the single crystal is in an un-tilted state relative to the contact surface between the support base 5 and the grinding disc. Adjust the specified inclination through the inclination adjuster 4. At the same time, when grinding, adjust the vertical direction adjuster 2 to adjust the grinding amount of the single crystal, and adjust the circumferential direction adjuster 3 to grind the single crystal in the circumferential direction. When grinding, the single crystal surface preparation device can be held by hand and the existing clamping mechanism to perform the grinding work. After the grinding of the single crystal is completed, the single crystal can be placed on an electron backscatter diffraction phase analysis device or an X-ray diffraction phase analysis device through a fixing plug for experimental measurement to complete the high-precision surface orientation experiment.

[0044] In summary, by setting the adjustment component on the base 1, the fixing base 7 can rotate around the first axis and the second axis, so that the crystal plane of the single crystal fixed on the fixing base 7 can be adjusted to an ideal state for grinding or preparation work to meet the experimental requirements, avoid using complex preparation methods when preparing the single crystal surface, simplify the operation and steps of single crystal preparation, and have good economic value and practicality.

[0045] The above embodiments are only illustrative of the principles and effects of the present invention, and are not used to limit the present invention. Any person familiar with this technology can modify or change the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or changes completed by those with ordinary knowledge in the technical field without departing from the spirit and technical idea disclosed by the present invention should still be covered by the claims of the present invention.

Claims

1. A single crystal surface preparation device, characterized in that: include: Base; An adjustment component, wherein the adjustment component is arranged on the base; A fixing seat, the fixing seat is arranged on the adjusting component, and the fixing seat is used to fix the single crystal; The adjusting assembly is used to drive the fixing seat to rotate around a first axis and a second axis, and an extending direction of the first axis intersects with an extending direction of the second axis.

2. The single crystal surface preparation device according to claim 1, characterized in that: An extending direction of the first axis is perpendicular to an extending direction of the second axis.

3. The single crystal surface preparation device according to claim 2, characterized in that: The adjustment assembly includes a circumferential direction adjuster and an inclination adjuster connected in sequence along the extension direction of the first axis, the circumferential direction adjuster is used to drive the fixing seat to rotate around the first axis, and the inclination adjuster is used to drive the fixing seat to rotate around the second axis. A circumferential adjustment scale is arranged on the circumference of the circumferential direction adjuster, and the inclination adjuster has an inclination adjustment scale for indicating the rotation angle around the second axis.

4. The single crystal surface preparation device according to any one of claims 1 to 3, characterized in that: The adjustment assembly also includes a vertical direction adjuster, which is used to drive the fixing seat to translate relative to the base along the extension direction of the first axis. The vertical direction adjuster is provided with a displacement adjustment scale along the extension direction of the first axis.

5. The single crystal surface preparation device according to any one of claims 1 to 3, characterized in that: The fixing seat comprises a socket and a fixing plug-in, the socket is connected to the adjusting component, a plug-in is provided on the fixing plug-in, and the fixing plug-in is plugged into the socket through the plug-in.

6. The single crystal surface preparation device according to claim 5, characterized in that: The fixing plug-in comprises a connection seat and a pin seat, the connection seat is used to place the crystal, the pin is arranged on the pin seat, and the connection seat and the pin seat are detachably connected.

7. The single crystal surface preparation device according to any one of claims 1 to 3, characterized in that: The single crystal surface preparation device also includes a support seat, which is used to be placed on the grinding disc. The support seat is connected to the base through a connecting component, and the support seat is provided with an avoidance structure for avoiding the movement trajectory of the single crystal.

8. The single crystal surface preparation device according to claim 7, characterized in that: The support seat is provided with at least three non-collinear support protrusions on a contact surface for contacting the grinding disc, and the hardness of the support protrusions is greater than the hardness of the support seat.

9. The single crystal surface preparation device according to claim 8, characterized in that: Each of the supporting protrusions has a polished surface away from the contact surface, the polished surfaces of the supporting protrusions are coplanar, and each of the polished surfaces is parallel to the contact surface.

10. The single crystal surface preparation device according to claim 7, characterized in that: The connecting assembly includes at least three connecting units, which include a support rod, a fixing bolt, an anti-slip nut and a fixing nut. One side of the support rod is connected to the base, and a connecting threaded hole is provided on the other side of the support rod. The fixing bolt is threadedly connected to the support rod through the connecting threaded hole. The fixing nut is used to cooperate with the fixing bolt to clamp the support seat. The anti-slip nut is threadedly connected to the fixing bolt and abuts against one end of the support rod where the connecting threaded hole is provided. Each of the connecting components is arranged around the adjusting component.

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