Magnetron design method, magnetron and magnetron sputtering equipment
Through simulation technology, the corrosion probability of magnetrons at each point on the target surface is calculated, and the problems of high design cost and long cycle of magnetrons in the prior art are solved, and the effect of reducing design costs and shortening design cycles is achieved.
Patent Information
- Application Number
- CN202311723084.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-14
- Publication Date
- 2025-06-17
AI Technical Summary
When designing magnetrons, existing magnetron sputtering equipment requires high cost and long-term magnetron sputtering experiments to obtain corrosion data of the target, resulting in high design costs and long cycles.
Through simulation technology, the horizontal magnetic field strength of each point on the magnetic field arc at any radius of the target surface is obtained based on the magnetic pole arrangement of the magnetron, and the corrosion probability of the target surface is calculated by combining the functional relationship between the horizontal magnetic field strength and the corrosion probability of the target surface, thereby determining whether the magnetic pole arrangement of the magnetron meets the design requirements.
It is possible to determine whether the magnetron pole arrangement meets the requirements without conducting actual magnetron sputtering experiments, which reduces design costs, shortens the design cycle, and improves the utilization rate of the target.
Smart Images
Figure CN120162839A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of semiconductor processing, and particularly to a design method of a magnetron, a magnetron, and a magnetron sputtering device. Background Art
[0002] Magnetron sputtering is a kind of physical vapor deposition (PVD). It generates a plasma including positive ions and new electrons by making electrons collide with process gas (such as argon), and sputters the material in the target and deposits it into a thin film by making the positive ions in the plasma collide with the target.
[0003] In order to improve the sputtering rate, a magnetron is usually arranged on the back of the target of the magnetron sputtering device, and the magnetic field generated by the magnetron is used to extend the movement trajectory of electrons, so as to increase the collision probability of electrons with process gas and improve the plasma density. However, because the plasma density at the position where the magnetic field is dense on the target surface is higher than that at other positions of the target, and the corrosion probability at the position with a high plasma density is greater than that at other positions, the corrosion probability at the position where the magnetic field is dense on the target surface is greater than that at other positions of the target, resulting in a lower material utilization rate at other positions of the target.
[0004] Although the utilization rate of the target can be improved by designing a magnetron with a specific magnetic pole distribution pattern, in the process of designing the magnetron, it is necessary to obtain the corrosion data of the corresponding target according to the magnetron sputtering experiment data, and then determine whether the design of the magnetron meets the requirements. However, because the cost of the target, especially the noble metal target, is high, and the time of the magnetron sputtering experiment is also long, the design cost of the magnetron is high and the design cycle is long. Summary of the Invention
[0005] The present invention discloses a design method of a magnetron, a magnetron, and a magnetron sputtering device to reduce the design cost and design cycle of the magnetron.
[0006] In a first aspect, the present invention discloses a design method of a magnetron, including: obtaining the horizontal magnetic field intensity of each point on the magnetic field arc at any radius on the target surface according to the magnetic pole arrangement of the magnetron through simulation; obtaining the corrosion probability at any radius on the target surface according to the horizontal magnetic field intensity of each point on the magnetic field arc at any radius on the target surface and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability; determining whether the magnetic pole arrangement of the magnetron meets the design requirements according to the corrosion probabilities at multiple radii on the target surface.
[0007] In some alternative examples, obtaining the corrosion probability at any radius on the surface of the target based on the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability includes: obtaining the radial corrosion probability at any radius on the surface of the target based on the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability in the stationary state of the magnetron; obtaining the tangential corrosion probability at any radius on the surface of the target based on the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability in the rotating state of the magnetron; obtaining the corrosion probability at any radius on the surface of the target based on the radial corrosion probability and the tangential corrosion probability at any radius on the surface of the target, and the corrosion probability at any radius on the surface of the target is equal to the sum of the radial corrosion probability and the tangential corrosion probability at that radius.
[0008] In some alternative examples, obtaining the radial corrosion probability at any radius on the surface of the target based on the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability in the stationary state of the magnetron includes:
[0009] Based on the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship formula E radial (r) = ∑B xyr (L Arc (r)) / Max(∑B xyr (L Arc (r))), obtaining the radial corrosion probability at any radius on the surface of the target; where r represents any radius on the surface of the target, B xyr (L Arc (r)) represents the radial component of the horizontal magnetic field intensity at any point on the magnetic field arc at any radius on the surface of the target, ∑B xyr (L Arc (r)) represents the sum of the radial components of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target, Max(∑B xyr (L Arc (r)) represents the maximum value of the sum of the radial components of the horizontal magnetic field intensity at each point on the magnetic field arc at each radius on the surface of the target, and E radial (r) represents the radial corrosion probability at any radius on the surface of the target.
[0010] In some alternative examples, obtaining the tangential corrosion probability at any radius on the surface of the target according to the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability under the rotation state of the magnetron includes:
[0011] According to the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relation Obtain the tangential corrosion probability at any radius on the surface of the target;
[0012] wherein, r represents any radius on the surface of the target, and B xyv (L Arc (r)) represents the tangential component of the horizontal magnetic field intensity at any point on the magnetic field arc at any radius on the surface of the target, and ∑B xyv (L Arc (r)) represents the sum of the tangential components of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target, Max(∑B xyv (L Arc (r)) represents the maximum value of the sum of the tangential components of the horizontal magnetic field intensity at each point on the magnetic field arc at each radius on the surface of the target, and E vertical (r) represents the tangential corrosion probability at any radius on the surface of the target.
[0013] In some alternative examples, determining whether the magnetic pole arrangement of the magnetron meets the design requirements according to the corrosion probabilities at multiple radii on the surface of the target includes: obtaining the utilization rate of the target according to the corrosion probabilities at multiple radii on the surface of the target; if the utilization rate of the target is less than the target utilization rate, it is determined that the magnetic pole arrangement of the magnetron does not meet the design requirements, and the magnetic pole arrangement of the magnetron is adjusted.
[0014] In some alternative examples, obtaining the utilization rate of the target according to the corrosion probabilities at multiple radii on the surface of the target includes: obtaining the corrosion probability curve or the proportion of the corrosion area on the surface of the target according to the corrosion probabilities at multiple radii on the surface of the target; obtaining the utilization rate of the target according to the corrosion probability curve or the proportion of the corrosion area on the surface of the target.
[0015] In some alternative examples, it further includes: if the utilization rate of the target is greater than or equal to the target utilization rate, obtaining the uniformity of the thin film formed by the magnetron sputtering device having the magnetron; if the uniformity of the thin film is less than the target uniformity, it is determined that the magnetic pole arrangement of the magnetron does not meet the design requirements, and the magnetic pole arrangement of the magnetron is finely adjusted.
[0016] In some alternative examples, the adjustment of the magnetic pole arrangement of the magnetron includes: adjusting the magnetic pole arrangement at a corresponding radius according to the maximum or minimum corrosion probability among the corrosion probabilities at multiple radii on the surface of the target; and / or, adjusting at least one of the number of magnetic poles of the magnetron, the number of spiral patterns of the arrangement, and the change in spiral curvature.
[0017] In a second aspect, the present invention discloses a magnetron designed by using the design method described in any one of the above.
[0018] In a third aspect, the present invention discloses a magnetron sputtering device including the magnetron described in any one of the above.
[0019] For the magnetron design method, magnetron, and magnetron sputtering device disclosed by the present invention, according to the magnetic pole arrangement of the magnetron, the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target is obtained through simulation. According to the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the corrosion probability of the target, the corrosion probability at any radius on the surface of the target is obtained. According to the corrosion probabilities at multiple radii on the surface of the target, it is determined whether the magnetic pole arrangement of the magnetron meets the design requirements, so that it is not necessary to use the target for magnetron sputtering experiments to obtain the corrosion data on the surface of the target, thereby reducing the design cost of the magnetron and shortening the design cycle of the magnetron. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the background art, the drawings required for use in the embodiments of the present invention or the background art will be described below.
[0021] Figure 1 It is a schematic structural diagram of a magnetron sputtering device disclosed in an embodiment of the present invention.
[0022] Figure 2 It is a flowchart of a magnetron design method disclosed in an embodiment of the present invention.
[0023] Figure 3 It is a schematic diagram of the horizontal magnetic field intensity distribution at each point on the surface of a target disclosed in an embodiment of the present invention.
[0024] Figure 4 It is a schematic diagram of the horizontal magnetic field intensity distribution at each point on each magnetic field arc on the surface of a target disclosed in an embodiment of the present invention.
[0025] Figure 5 It is a schematic diagram of the distribution of each magnetic field arc on the surface of a target disclosed in an embodiment of the present invention.
[0026] Figure 6 It is a schematic diagram of another magnetron disclosed in an embodiment of the present invention.
[0027] Figure 7 Schematic diagram of the radial component distribution of the horizontal magnetic field intensity at each point on the magnetic field arcs at multiple radii on the surface of a target, disclosed in an embodiment of the present invention.
[0028] Figure 8 Schematic diagram of the tangential component distribution of the horizontal magnetic field intensity at each point on the magnetic field arcs at multiple radii on the surface of a target, disclosed in an embodiment of the present invention.
[0029] Figure 9 Schematic diagram of a curve showing the variation of the radial corrosion probability with the radius, disclosed in an embodiment of the present invention.
[0030] Figure 10 Schematic diagram of a curve showing the variation of the tangential corrosion probability with the radius, disclosed in an embodiment of the present invention.
[0031] Figure 11 Schematic diagram of a curve showing the variation of the corrosion probability with the radius and the actual curve of the variation of the corrosion probability with the radius, disclosed in an embodiment of the present invention.
[0032] Figure 12 Schematic diagram of the relationship between the horizontal magnetic field intensity at each point on each magnetic field arc on the surface of a target and the radial component and tangential component, disclosed in an embodiment of the present invention. Detailed implementation manners
[0033] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present application.
[0034] As Figure 1 shown, the magnetron sputtering equipment includes a sputtering chamber 1, and the sputtering chamber 1 is composed of a chamber body 2, a process component 3, and a cathode sputtering system 4. The chamber body 2 includes a process gas interface 8, a chamber wall 9, a base 11, and a vacuum system 12. The process gas interface 8 is used to introduce a process gas such as argon into the chamber. The base 11 is used to carry workpieces to be processed such as a wafer 10. The vacuum system 12 is used to pump the chamber to a vacuum state. The process component 3 includes a lower lining 13, a deposition ring 14, a cover ring 15, and an upper lining 16. The process component 3 can be arranged around the chamber body 2 to shield the side walls of the chamber body 2 and ensure that the side walls of the chamber body 2 are not contaminated. The cathode sputtering system 4 includes a magnetron 5, a target 6, and a DC power supply 7.
[0035] Before the magnetron sputtering process, workpieces to be processed such as the wafer 10 are placed on the base 11, and then the chamber is evacuated to a vacuum state by the vacuum system 12. When the specified vacuum degree is reached in the chamber, a certain amount of argon gas is introduced into the chamber as the process gas through the process gas interface 8, and a negative bias voltage is applied to the target 6 through the DC power supply 7 to ionize the argon gas in the chamber. Under the confinement effect of the magnetic field generated by the magnetron 5 on electrons, a stable plasma 17 is formed in the dense region of the surface magnetic field 18 of the target 6. Under the action of the electric field, the argon ions in the plasma 17 continuously bombard the surface of the target 6, so that the atoms of the target 6 are sputtered out and deposited on the surface of workpieces to be processed such as the wafer 10 to form a coating.
[0036] Currently, the magnetron 5 is usually controlled to rotate during the operation of the magnetron sputtering equipment to improve the distribution uniformity of the magnetic field generated by the magnetron 5, so as to improve the corrosion uniformity of the target surface and the target utilization rate. However, the corrosion uniformity and utilization rate of the target 6 still need to be further improved. Although the corrosion uniformity of the target and the target utilization rate can also be improved by designing a magnetron with a specific magnetic pole distribution pattern, during the design process of the magnetron, it is necessary to obtain the corrosion data of the corresponding target according to the magnetron sputtering experiment to determine whether the design of the magnetron meets the requirements, resulting in a high design cost and a long design cycle of the magnetron.
[0037] It is found through research that electrons are mainly confined in the magnetron track near the target surface by the horizontal magnetic field of the magnetron, resulting in the plasma concentration in the area corresponding to the target surface and the magnetron track being much higher than that in other areas of the target surface, and the corrosion probability in the area corresponding to the target surface and the magnetron track being much higher than that in other areas of the target surface. Therefore, it can be determined that the plasma distribution is similar to the horizontal magnetic field distribution, and the functional relationship between the horizontal magnetic field intensity and the corrosion probability can be obtained according to the functional relationship between the plasma density and the corrosion probability, and then the corrosion probability of the target surface can be obtained according to the functional relationship between the horizontal magnetic field intensity and the corrosion probability.
[0038] Based on this, the present invention discloses a design scheme of a magnetron. By simulating the magnetron, the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the target surface of the magnetron is obtained, and the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the target surface and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability are used to obtain the corrosion probability at any radius on the target surface, so that it is not necessary to use the target for magnetron sputtering experiments to obtain the corrosion data of the target surface, and thus the design cost of the magnetron can be reduced and the design cycle of the magnetron can be shortened.
[0039] As an optional implementation of the disclosure of the present invention, an embodiment of the present invention discloses a design method of a magnetron, as Figure 2 shown, the design method includes:
[0040] S101: Obtain the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the target surface by simulating according to the magnetic pole arrangement of the magnetron.
[0041] In the embodiments of the present invention, by establishing a simulation model of the magnetron, the horizontal magnetic field intensity at each point on the magnetic field arcs at multiple radii on the target surface is obtained by simulation, so as to obtain the corrosion probability at multiple radii on the target surface according to the functional relationship between the horizontal magnetic field intensity and the target corrosion probability.
[0042] In some embodiments of the present invention, a simulation model is established according to the magnetic pole arrangement of the initially designed magnetron, and according to the direct current magnetron sputtering principle and the simulation model, the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the target surface is obtained by simulation.
[0043] In some embodiments, according to the direct current magnetron sputtering principle and the simulation model, the horizontal magnetic field intensities B10 - B1n at each point on the target surface of the magnetron as shown in Figure 3 can be obtained by simulation, and then according to the horizontal magnetic field intensities B10 - B1n at each point on the target surface of the magnetron, the horizontal magnetic field intensities B20 - B2n at each point on the magnetic field arc at any radius on the target surface are obtained.
[0044] Of course, the present invention is not limited to this. In some other embodiments, according to the direct current magnetron sputtering principle and the simulation model, the horizontal magnetic field intensities B20 - B2n at each point on the magnetic field arc at any radius on the target surface of the magnetron as shown in Figure 4 can also be directly obtained by simulation, that is, the horizontal magnetic field intensity dot matrix B20 - B2n of the magnetic field arcs at each radius on the target surface of the magnetron is obtained. Wherein, n is an integer greater than 2.
[0045] As Figure 5 shown, multiple radii on the surface of the target 6 are multiple circular rings at different distances from the center O of the target on the surface of the target 6. The magnetic field arc at any radius is the overlapping line between the circular ring at any radius and the horizontal magnetic field intensity distribution pattern. Each point on the magnetic field arc is obtained by equally dividing the magnetic field arc at equal radian intervals or equal angle intervals.
[0046] It should be noted that, as Figures 3 to 5 shown, in the embodiments of the present invention, only the case where the target is a circular target and the horizontal magnetic field intensity distribution pattern on the surface of the target by the magnetron is a heart-shaped pattern is taken as an example for illustration. Of course, the present invention is not limited to this. In some other embodiments, the horizontal magnetic field intensity distribution pattern can also be Figure 6 the magnetic field distribution pattern of the spiral magnetron as shown. Among them, the magnetic field intensity distribution pattern is determined by the magnetic pole distribution pattern, and the magnetic field intensity distribution pattern can be the same as the magnetic pole distribution pattern.
[0047] S102: Obtain the corrosion probability at any radius on the target surface according to the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the target surface and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability.
[0048] It can be understood that since the plasma density distribution is mainly determined by the horizontal magnetic field intensity distribution, the plasma density distribution pattern is similar to the horizontal magnetic field intensity distribution pattern. According to the horizontal magnetic field intensity at each point on the magnetic field arc at each radius on the horizontal magnetic field intensity distribution pattern and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability, the corrosion probability at each radius on the target surface can be obtained.
[0049] In some embodiments of the present invention, if the magnetron remains stationary during the operation of the magnetron sputtering device, the corrosion probability of the target surface can be obtained according to the corresponding relationship between the horizontal magnetic field intensity in the stationary state of the magnetron and the target corrosion probability; if the magnetron rotates during the operation of the magnetron sputtering device, the corrosion probability of the target surface can be obtained according to the corresponding relationship between the horizontal magnetic field intensity in the rotating state of the magnetron and the target corrosion probability.
[0050] However, the inventor's research finds that although the magnetron rotates during the operation of the magnetron sputtering device, the radial component of the horizontal magnetic field is independent of the angular velocity, and the tangential component of the horizontal magnetic field is positively correlated with the angular velocity. If the corrosion probability of the target surface is obtained only according to the corresponding relationship between the horizontal magnetic field intensity in the rotating state of the magnetron and the target corrosion probability, the accuracy of the corrosion probability will be relatively low.
[0051] Based on this, in order to improve the accuracy of the corrosion probability, the functional relationship between the horizontal magnetic field intensity in the stationary state of the magnetron and the target corrosion probability can be regarded as the functional relationship between the radial component of the horizontal magnetic field intensity and the target corrosion probability, and the radial corrosion probability of the target surface can be obtained accordingly. The corresponding relationship between the horizontal magnetic field intensity in the rotating state of the magnetron and the target corrosion probability can be regarded as the corresponding relationship between the tangential component of the horizontal magnetic field intensity and the target corrosion probability, and the tangential corrosion probability of the target surface can be obtained accordingly. Then, the corrosion probability of the target surface can be obtained according to the radial corrosion probability and the tangential corrosion probability of the target surface.
[0052] It should be noted that the horizontal magnetic field can be divided into a radial magnetic field and a tangential magnetic field according to the rotation direction of the magnetron. Among them, as Figure 12As shown, the radial component of the horizontal magnetic field strength is equal to the product of the horizontal magnetic field strength and cosθ, and the tangential component of the horizontal magnetic field strength is equal to the product of the horizontal magnetic field strength and sinθ, where θ represents the angle between the horizontal magnetic field direction and the radial direction. Among them, the radial component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface of the magnetron is as Figure 7 shown, and the tangential component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface of the magnetron is as Figure 8 shown.
[0053] Based on this, in some embodiments of the present invention, according to the radial component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface and the functional relationship between the horizontal magnetic field strength and the target corrosion probability in the stationary state of the magnetron, the radial corrosion probability at any radius on the target surface is obtained; according to the tangential component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface and the functional relationship between the horizontal magnetic field strength and the target corrosion probability in the rotating state of the magnetron, the tangential corrosion probability at any radius on the target surface is obtained; according to the radial corrosion probability and the tangential corrosion probability at any radius on the target surface, the corrosion probability at any radius on the target surface is obtained, and the corrosion probability at any radius on the target surface is equal to the sum of the radial corrosion probability and the tangential corrosion probability at that radius.
[0054] In some embodiments of the present invention, the radial corrosion probability at any radius on the target surface can be obtained according to the radial component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface and the functional relationship formula E radial (r) = ∑B xyr (L Arc (r)) / Max(∑B xyr (L Arc (r))).
[0055] Among them, r represents any radius on the target surface, B xyr (L Arc (r)) represents the radial component of the horizontal magnetic field strength at any point on the magnetic field arc at any radius on the target surface, ∑B xyr (L Arc (r)) represents the sum of the radial components of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface, Max(∑B xyr (L Arc (r)) represents the maximum value of the sum of the radial components of the horizontal magnetic field strength at each point on the magnetic field arc at each radius on the target surface, and E radial (r) represents the radial corrosion probability at any radius on the target surface. In some embodiments of the present invention, the tangential component of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the target surface and the functional relationship formula Obtain the tangential corrosion probability at any radius on the surface of the target material.
[0056] Among them, r represents any radius on the surface of the target material, and B xyv (L Arc (r)) represents the tangential component of the horizontal magnetic field intensity at any point on the magnetic field arc at any radius on the surface of the target material, and ∑B xyv (L Arc (r)) represents the sum of the tangential components of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target material, and Max(∑B xyr (L Arc (r)) represents the maximum value of the sum of the tangential components of the horizontal magnetic field intensity at each point on the magnetic field arcs at various radii on the surface of the target material, and E vertical (r) represents the tangential corrosion probability at any radius on the surface of the target material.
[0057] It should be noted that assuming that the respective radii are r1, r2…rm, where m is an integer greater than 2, then Max(∑B xyr (L Arc (r)) is the maximum value among ∑B xyr (L Arc (r1)), ∑B xyr (L Arc (r2))…∑B xyr (L Arc (rm)), and Max(∑B xyv (L Arc (r)) is the maximum value among ∑B xyv (L Arc (r1)), ∑B xyv (L Arc (r2))…∑B xyv (L Arc (rm)).
[0058] On this basis, according to the sum of the radial corrosion probability and the tangential corrosion probability at any radius on the surface of the target material, the corrosion probability at any radius on the surface of the target material can be obtained. In some embodiments, the radial corrosion probability curve of the surface of the target material can be obtained according to the radial corrosion probabilities at multiple radii on the surface of the target material. This radial corrosion probability curve is a curve of the radial corrosion probability of the surface of the target material varying with the radius, and this radial corrosion probability curve is as Figure 9 shown. The tangential corrosion probability curve of the surface of the target material can be obtained according to the tangential corrosion probabilities at multiple radii on the surface of the target material. This tangential corrosion probability curve is a curve of the tangential corrosion probability of the surface of the target material varying with the radius, and this tangential corrosion probability curve is as Figure 10 shown. Among them, the corrosion probability at the radius where the target material is most severely corroded is 1, and the corrosion probability at the radius where the target material is less severely corroded is less than 1.
[0059] As Figure 11 shown, the curve of the corrosion probability on the surface of the target obtained by the method disclosed in the embodiment of the present invention varying with the radius is basically similar to the curve of the actual corrosion probability on the surface of the target varying with the radius. Thus, the correctness of the corrosion probability calculation method disclosed in the embodiment of the present invention can be verified. After obtaining the corrosion probability of the target corresponding to the initially designed magnetron, the design of the magnetron can be optimized according to the corrosion probability of the target to obtain a magnetron with a higher target utilization rate. That is to say, the design method disclosed in the embodiment of the present invention can not only reduce the design cost of the magnetron and shorten the design cycle of the magnetron, but also improve the utilization rate of the target, and has good engineering application prospects.
[0060] It should be noted that the embodiment of the present invention only illustrates the process of predicting the corrosion probability by taking the target as a circular target as an example. However, the present invention is not limited thereto. In some other embodiments, the target can also be a target of other shapes such as a square or diamond target, which will not be elaborated herein.
[0061] S103: Determine whether the magnetic pole arrangement of the magnetron meets the design requirements according to the corrosion probabilities at multiple radii on the surface of the target.
[0062] According to the functional relationship between the horizontal magnetic field intensity and the target corrosion probability, it can be known that the target corrosion probability is mainly related to the magnetic field arc length (or the number of points on the magnetic field arc) and intensity of the horizontal magnetic field. The initially designed magnetic field distribution shape of the magnetron can be Figure 6 the multi - helix shape shown. This shape can include more magnetic field distribution paths. Therefore, the area of the corrosion region can be increased, and thus a magnetron with a high utilization rate can be obtained. However, the designed magnetic field distribution path cannot be too long. If the path is too long at a certain radius, it will cause the area at that radius to be corroded first until it is exhausted, while the corrosion at other radii is less, resulting in a low utilization rate of the target. Based on this, after obtaining the corrosion probabilities at multiple radii on the surface of the target, it is also necessary to judge whether the magnetic pole arrangement of the magnetron meets the design requirements according to the utilization rate of the target.
[0063] In some embodiments of the present invention, the utilization rate of the target can be obtained based on the corrosion probabilities at multiple radii on the surface of the target. Among them, if the corrosion probability at a certain radius is 1, the utilization rate of the target is equal to or close to 100%. Based on the average value of the utilization rates of the target at multiple radii, the utilization rate of the entire target can be obtained. If the utilization rate of the target is less than the target utilization rate, it is determined that the magnetic pole arrangement of the magnetron does not meet the design requirements, and the magnetic pole arrangement of the magnetron is adjusted. If the utilization rate of the target is greater than or equal to the target utilization rate, it is determined that the magnetic pole arrangement of the magnetron meets the design requirements, and the magnetic pole arrangement of the magnetron may not be adjusted, or the magnetic pole arrangement of the magnetron may be finely adjusted. Based on this, the method disclosed in the embodiments of the present invention can not only reduce the design cost of the magnetron and shorten the design cycle of the magnetron, but also ensure the uniformity of target corrosion by adjusting the magnetic pole arrangement of the magnetron.
[0064] In some embodiments, the corrosion probability curve or the proportion of the corrosion area on the surface of the target can be obtained based on the corrosion probabilities at multiple radii on the surface of the target, and the utilization rate of the target can be obtained based on the corrosion probability curve or the proportion of the corrosion area on the surface of the target.
[0065] On this basis, in some embodiments of the present invention, the design method of the magnetron further includes: if the utilization rate of the target is greater than or equal to the target utilization rate, the uniformity of the thin film formed by the magnetron sputtering device with this magnetron is obtained. If the uniformity of the thin film is greater than or equal to the target uniformity, the magnetic pole arrangement of the magnetron is not adjusted, and the magnetic pole arrangement of the magnetron is determined as the final arrangement result. If the uniformity of the thin film is less than the target uniformity, the magnetic pole arrangement of the magnetron is finely adjusted, for example, the magnetic pole arrangement in a local area of the magnetron is adjusted. If the uniformity of the thin film is still less than the target uniformity after multiple fine adjustments of the magnetic pole arrangement and process conditions (such as gas pressure, power, and target-substrate distance), the magnetic pole arrangement of the magnetron is redesigned. Based on this, the method disclosed in the embodiments of the present invention can not only reduce the design cost of the magnetron and shorten the design cycle of the magnetron, but also ensure the uniformity of target corrosion and the uniformity of the deposited thin film by adjusting the magnetic pole arrangement of the magnetron. In some embodiments, adjusting the magnetic pole arrangement of the magnetron includes: adjusting the magnetic pole arrangement at the corresponding radius according to the maximum corrosion probability (the corrosion probability at the peak of the curve) or the minimum corrosion probability (the corrosion probability at the trough of the curve) among the corrosion probabilities at multiple radii on the surface of the target. Specifically, the magnetic pole arrangement at the radius corresponding to the maximum corrosion probability or the magnetic pole arrangement at the radius corresponding to the minimum corrosion probability can be adjusted. And / or, at least one of the number of magnetic poles of the magnetron, the number of spiral arrangements of the pattern, and the change in spiral curvature is adjusted. Of course, the present invention is not limited to this, and the adjustment scheme of the magnetic pole arrangement can be determined according to specific situations in specific applications, which will not be elaborated here.
[0066] As another alternative implementation of the disclosure of the present invention, an embodiment of the present invention also discloses a magnetron sputtering device, as Figure 1 shown. The magnetron sputtering device includes a magnetron 5, etc. Among them, the magnetron 5 can be designed by using the design method disclosed in any of the above embodiments.
[0067] The technical features of the above embodiments can be combined arbitrarily. For the sake of concise description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope recorded in this specification.
[0068] The above embodiments only express several implementation manners of this specification, and the description is relatively specific and detailed, but it cannot be understood as a limitation on the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of this specification, several deformations and improvements can still be made, and these all belong to the protection scope of this specification. Therefore, the protection scope of the patent of this specification should be subject to the appended claims.
Claims
1. A design method of a magnetron, characterized in that, Including: According to the magnetic pole arrangement of the magnetron, the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target is obtained by simulation; According to the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability, the corrosion probability at any radius on the surface of the target is obtained; According to the corrosion probabilities at multiple radii on the surface of the target, it is determined whether the magnetic pole arrangement of the magnetron meets the design requirements.
2. The design method according to claim 1, characterized in that, The obtaining of the corrosion probability at any radius on the surface of the target according to the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity and the target corrosion probability includes: According to the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity in the stationary state of the magnetron and the target corrosion probability, the radial corrosion probability at any radius on the surface of the target is obtained; According to the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity in the rotating state of the magnetron and the target corrosion probability, the tangential corrosion probability at any radius on the surface of the target is obtained; According to the radial corrosion probability and the tangential corrosion probability at any radius on the surface of the target, the corrosion probability at any radius on the surface of the target is obtained, and the corrosion probability at any radius on the surface of the target is equal to the sum of the radial corrosion probability and the tangential corrosion probability at that radius.
3. The method according to claim 2, characterized in that, The obtaining of the radial corrosion probability at any radius on the surface of the target according to the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity in the stationary state of the magnetron and the target corrosion probability includes: According to the radial component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship E radial (r)=∑B xyr (L Arc (r)) / Max(∑B xyr (L Arc (r))), the radial corrosion probability at any radius on the surface of the target is obtained; where r represents any radius on the surface of the target, and B xyr (L Arc (r)) represents the radial component of the horizontal magnetic field strength at any point on the magnetic field arc at any radius on the surface of the target, and ∑B xyr (L Arc (r)) represents the sum of the radial components of the horizontal magnetic field strengths at each point on the magnetic field arc at any radius on the surface of the target, and Max(∑B xyr (L Arc (r)) represents the maximum value of the sum of the radial components of the horizontal magnetic field strengths at each point on the magnetic field arcs at each radius on the surface of the target, and E radial (r) represents the radial corrosion probability at any radius on the surface of the target.
4. The method according to claim 2, characterized in that, The obtaining of the tangential corrosion probability at any radius on the surface of the target according to the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship between the horizontal magnetic field intensity in the rotating state of the magnetron and the target corrosion probability includes: According to the tangential component of the horizontal magnetic field intensity at each point on the magnetic field arc at any radius on the surface of the target and the functional relationship obtain the tangential corrosion probability at any radius on the surface of the target; where r represents any radius on the surface of the target, and B xyv (L Arc (r)) represents the tangential component of the horizontal magnetic field strength at any point on the magnetic field arc at any radius on the surface of the target, and ∑B xyv (L Arc (r)) represents the sum of the tangential components of the horizontal magnetic field strength at each point on the magnetic field arc at any radius on the surface of the target, and Max(∑B xyv (L Arc (r)) represents the maximum value of the sum of the tangential components of the horizontal magnetic field strength at each point on the magnetic field arc at each radius on the surface of the target, and E vertical (r) represents the tangential corrosion probability at any radius on the surface of the target.
5. The method according to claim 1, characterized in that, The determining whether the magnetic pole arrangement of the magnetron meets the design requirements according to the corrosion probabilities at multiple radii on the surface of the target includes: According to the corrosion probabilities at multiple radii on the surface of the target, the utilization rate of the target is obtained; If the utilization rate of the target is less than the target utilization rate, it is determined that the magnetic pole arrangement of the magnetron does not meet the design requirements, and the magnetic pole arrangement of the magnetron is adjusted.
6. The method according to claim 5, characterized in that, The obtaining of the utilization rate of the target according to the corrosion probabilities at multiple radii on the surface of the target includes: According to the corrosion probabilities at multiple radii on the surface of the target, the corrosion probability curve or the proportion of the corrosion area on the surface of the target is obtained; According to the corrosion probability curve or the proportion of the corrosion area on the surface of the target, the utilization rate of the target is obtained.
7. The method according to claim 5, characterized in that, It also includes: If the utilization rate of the target is greater than or equal to the target utilization rate, the uniformity of the film formed by the magnetron sputtering device with the magnetron is obtained; If the uniformity of the thin film is less than the target uniformity, it is determined that the magnetic pole arrangement of the magnetron does not meet the design requirements, and the magnetic pole arrangement of the magnetron is finely adjusted.
8. The method according to claim 5, characterized in that, The adjustment of the magnetic pole arrangement of the magnetron includes: adjusting the magnetic pole arrangement at the corresponding radius according to the maximum or minimum corrosion probability among the corrosion probabilities at multiple radii on the surface of the target; and / or adjusting at least one of the number of magnetic poles of the magnetron, the number of spiral arrangements of the pattern, and the change in spiral curvature.
9. A magnetron, characterized in that, The magnetron is designed by using the design method described in any one of claims 1 to 8.
10. A magnetron sputtering device, characterized in that, It includes the magnetron described in claim 9.