Cleaning device and cleaning method for filter element of integrated tank of single crystal furnace

By designing a cleaning device for integrated tank filter element for single crystal furnaces, the rotating platform and spray system are used to achieve all-round cleaning of the filter element, solving the problem of incomplete cleaning in the prior art, improving cleaning efficiency and cleanliness, extending service life, and reducing the harm to the environment and workers.

CN120169728APending Publication Date: 2025-06-20SHANGHAI ADVANCED SILICON TECH CO LTD +1
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Patent Information

Application Number
CN202510317031.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-03-18
Publication Date
2025-06-20

AI Technical Summary

Technical Problem

In the prior art, during the preparation of single crystal silicon rods, the filter element is not thoroughly cleaned, resulting in the residue of SiO2 particles, damage to the filter structure, reduce service life, increase replacement cost, and may lead to unstable pressure in the single crystal furnace cavity, unstable crystal formation, and excessive particle standards, affecting the preparation of semiconductor single crystal silicon rods.

Method used

A cleaning device for integrated tank filter element of a single crystal furnace is designed, including a closed cleaning box, a rotating platform and a spray system. By installing the part to be cleaned and driving the rotation, the outer spraying mechanism and the inner spraying mechanism spray cleaning liquid on the outer surface and inner surface of the part to be cleaned respectively to achieve all-round cleaning.

Benefits of technology

It improves cleaning efficiency and cleanliness, extends the service life of the filter element, reduces the frequency of aging and replacement, and avoids dust pollution through a closed cleaning chamber, reducing harm to the environment and workers.

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Abstract

The invention belongs to the technical field of semiconductor single crystal silicon rod preparation, and discloses a cleaning device and a cleaning method for a single crystal furnace integrated tank filter element. The cleaning device comprises a cleaning box, a rotating mechanism and a spraying system, the cleaning box is provided with a closed cleaning cavity, and the cleaning cavity can be opened and closed; the rotating mechanism is arranged in the cleaning box, the rotating mechanism comprises a rotating platform, the rotating platform is used for installing a to-be-cleaned part, and the rotating platform can rotate to drive the to-be-cleaned part to rotate; the spraying system comprises a plurality of outer spraying mechanisms and a plurality of inner spraying mechanisms, the outer spraying mechanisms and the inner spraying mechanisms are both arranged in the cleaning box, the outer spraying mechanisms are arranged on the periphery of the rotating platform, and the outer spraying mechanisms are used for washing the outer surface of the part to be cleaned; the multiple inner spraying mechanisms are arranged on the inner ring of the rotating platform and used for washing the inner surface of the to-be-cleaned part. The cleaning efficiency and cleanliness can be improved, pollution to the environment is reduced, and harm to operators is reduced.
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Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor single crystal silicon rod preparation, and particularly to a cleaning device and a cleaning method for a filter element of an integrated tank of a single crystal furnace. Background Art

[0002] When preparing single crystal silicon, the CZ method of pulling single crystal directly is usually used. After the production is completed, the single crystal silicon rod needs to be taken out of the single crystal furnace, and then the furnace platform is cleaned. The cleaning process of the furnace platform is usually to clean the dust such as residual SiO2 particles inside, and the parts with the most attachment include the filter tank. During the cleaning process of the filter tank, the filter element needs to be taken out and cleaned to achieve the cleaning of the key part of the filter tank.

[0003] Currently, the main cleaning method for the filter element is manual cleaning. Specifically, a cleaning cloth and a brush head are used for cleaning, an M-shaped harrow member is used for cleaning, and vacuum cleaning and dust suction are used to clean each position of the filter element; however, the cleaning is still not thorough, which easily causes problems such as scratching of the filter element surface by residual SiO2 particles and damage to the filter screen structure of the filter element, reducing the service life of the filter element and increasing the replacement cost; and during the reuse of the filter element, it is easy to block the vacuum system or cause excessive dust to damage the evacuation ability of the vacuum pump, making the filter element unable to play a good filtering role, which may bring problems such as instability of the furnace pressure control in the single crystal furnace cavity, instability of crystal growth in the later stage of crystal formation, excessive particles in the cavity, breakage of the single crystal rod during the production process, and crystal contamination, affecting the preparation of semiconductor single crystal silicon rods.

[0004] During the process of taking out the filter element for cleaning, due to a large amount of dust on the surface of the filter element, it is easy to cause environmental pollution during the cleaning and transportation process of the filter element, thus damaging the environment of the thousand-class clean room where the semiconductor single crystal silicon rod preparation equipment is located. Furthermore, it is impossible to ensure that manual cleaning can be effectively and efficiently completed, and at the same time, it also pollutes the operators, increasing the harmfulness of the operation for the operators.

[0005] Therefore, there is an urgent need for a cleaning device and a cleaning method for a filter element of an integrated tank of a single crystal furnace to solve the above technical problems. Summary of the Invention

[0006] An object of the present invention is to provide a cleaning device for a filter element of an integrated tank of a single crystal furnace, which can improve the cleaning efficiency and cleanliness, reduce environmental pollution, and reduce the harm to operators.

[0007] To achieve this purpose, the present invention adopts the following technical solutions:

[0008] A cleaning device for a filter element of an integrated tank of a single crystal furnace includes:

[0009] A cleaning box, the cleaning box has a closed cleaning cavity, and the cleaning cavity can be opened and closed;

[0010] A rotating mechanism, which is arranged in the cleaning box. The rotating mechanism includes a rotating platform, which is arranged in the cleaning cavity for mounting the part to be cleaned. The rotating platform can rotate to drive the part to be cleaned to rotate.

[0011] A spraying system, which includes a plurality of external spraying mechanisms and a plurality of internal spraying mechanisms. Both the external spraying mechanisms and the internal spraying mechanisms are arranged in the cleaning box. The plurality of external spraying mechanisms are arranged on the outer periphery of the rotating platform, and the external spraying mechanisms are used to wash the outer surface of the part to be cleaned; the plurality of internal spraying mechanisms are arranged on the inner ring of the rotating platform, and the internal spraying mechanisms are used to wash the inner surface of the part to be cleaned.

[0012] Optionally, the cleaning box includes:

[0013] A box body, which has a cleaning cavity with one end open;

[0014] A cover body, which is detachably arranged at the opening to make the cleaning cavity openable and closable;

[0015] A first driving member, whose fixed end is fixedly arranged on either the box body or the cover body, and the output end of the first driving member is connected to the other of the box body and the cover body. The first driving member is used to drive the opening and closing of the cover body and the box body.

[0016] Optionally, the rotating mechanism includes:

[0017] A second driving member, which is arranged in the cleaning box;

[0018] A first transmission assembly, whose two ends are respectively connected to the output end of the second driving member and the rotating platform, so that the rotating platform is in transmission connection with the output end of the second driving member. The second driving member is used to drive the rotating platform to rotate.

[0019] Optionally, the rotation speed of the rotating platform is adjustable.

[0020] Optionally, the external spraying mechanism includes a first spray pipe and a plurality of first nozzles. The first spray pipe extends along the axial direction of the rotating platform. The cleaning liquid flows through the first spray pipe. The plurality of first nozzles are spaced apart along the extension direction of the first spray pipe and are communicated with the first spray pipe. The first nozzles are used to spray the cleaning liquid towards the outer surface of the part to be cleaned;

[0021] The above internal spraying mechanism includes a second spray pipe and a plurality of second nozzles. The cleaning liquid flows through the second spray pipe, and the plurality of second nozzles are evenly distributed and connected to the second spray pipe. The second nozzles are used to spray the cleaning liquid toward the inner surface of the part to be cleaned.

[0022] Optionally, the above internal spraying mechanism can be lifted and lowered along the axis direction of the rotating platform. The internal spraying mechanism is connected with a lifting component, and the lifting component is arranged on the wall of the cleaning cavity. The lifting component is used to drive the internal spraying mechanism to move up and down along the axis direction of the rotating platform, so that the internal spraying mechanism reciprocally penetrates through the part to be cleaned.

[0023] Optionally, the above lifting component includes:

[0024] A third driving part, which is arranged in the cleaning box;

[0025] A second transmission component, the input end of which is connected to the output end of the third driving part;

[0026] A lifting platform, which is connected to the output end of the second transmission component. The internal spraying mechanism is fixedly connected to the lifting platform, and the third driving part can drive the lifting platform to move up and down along the axis direction of the rotating platform through the second transmission component.

[0027] Optionally, it further includes a liquid supply mechanism. The external spraying mechanism and the internal spraying mechanism are both connected to the liquid supply mechanism, and the liquid supply mechanism is used to supply the cleaning liquid with a preset pressure to the external spraying mechanism and the internal spraying mechanism.

[0028] Optionally, it further includes a liquid discharge mechanism. The liquid discharge mechanism includes a drain pipe and a drainage filtration component. The two ends of the drain pipe are connected to the bottom of the cleaning cavity and the drainage filtration component. The drain pipe is used to discharge the cleaning liquid in the cleaning cavity, and the drainage filtration component is used to filter the discharged cleaning liquid.

[0029] Another object of the present invention is to provide a cleaning method for the filter element of the integrated tank of a single crystal furnace, which can improve the cleaning efficiency and cleanliness, reduce the environmental pollution, and reduce the harm to the operators.

[0030] To achieve this purpose, the present invention adopts the following technical solutions:

[0031] The cleaning method for the filter element of the integrated tank of a single crystal furnace uses the above cleaning device for the filter element of the integrated tank of a single crystal furnace. The cleaning method for the filter element of the integrated tank of a single crystal furnace includes:

[0032] Step S10: Take out the part to be cleaned and transport the part to be cleaned to the cleaning box through a transport cart;

[0033] Step S20: Open the above-mentioned cleaning chamber, place the part to be cleaned on the above-mentioned rotating platform in the above-mentioned cleaning chamber, and close the above-mentioned cleaning chamber;

[0034] Step S30: Drive the above-mentioned rotating platform to rotate at a first rotational speed, turn on the liquid supply mechanism, the liquid discharge mechanism, the above-mentioned external spraying mechanism and the above-mentioned internal spraying mechanism, and drive the above-mentioned internal spraying mechanism to move up and down along the axis of the above-mentioned rotating platform to perform a full-round flushing of the part to be cleaned for a first preset time;

[0035] Step S40: Turn off the above-mentioned external spraying mechanism and the above-mentioned internal spraying mechanism, drive the above-mentioned rotating platform to rotate at a second rotational speed for a second preset time, and the second rotational speed is greater than the first rotational speed;

[0036] Step S50: Turn off the above-mentioned rotating platform, open the cleaning chamber, and take out the part to be cleaned.

[0037] Advantages of the present invention:

[0038] The present invention provides a cleaning device and a cleaning method for a filter element of a single crystal furnace integrated tank. By installing the part to be cleaned on the rotating platform and driving the part to be cleaned to rotate, and then spraying cleaning liquid on the outer surface and the inner surface of the part to be cleaned respectively through the external spraying mechanism and the internal spraying mechanism, a full-round cleaning of the part to be cleaned can be realized, improving the cleaning effect. At the same time, the internal spraying mechanism and the external spraying mechanism clean together, which also improves the cleaning efficiency, thereby increasing the service life of the part to be cleaned and reducing the aging replacement frequency. Moreover, by providing a sealed cleaning chamber, dust will not flow out to pollute the environment during the cleaning process of the part to be cleaned, that is, the isolation of the pollution source is realized through a physical sealing method, reducing the pollution and harm caused to the environment and operating personnel. Description of the drawings

[0039] Figure 1 is an axonometric view of the cleaning device for the filter element of the single crystal furnace integrated tank provided by the specific embodiment of the present invention;

[0040] Figure 2 is a front view of the cleaning device for the filter element of the single crystal furnace integrated tank provided by the specific embodiment of the present invention;

[0041] Figure 3 is a top view of the cleaning device for the filter element of the single crystal furnace integrated tank provided by the specific embodiment of the present invention with the cover removed;

[0042] Figure 4 is a side sectional view of the cleaning device for the filter element of the single crystal furnace integrated tank provided by the specific embodiment of the present invention;

[0043] Figure 5 is Figure 4Partial enlarged view at A in the [diagram].

[0044] In the figure:

[0045] 10. Cleaning box; 101. Cleaning chamber; 102. Equipment chamber; 11. Box body; 12. Cover body; 13. First driving member; 14. Support base body;

[0046] 21. Rotating platform; 22. Second driving member; 23. First transmission assembly; 231. Transmission shaft; 232. Coupling; 233. Bearing; 234. Sealing structure; 24. Fixed fixture;

[0047] 31. External spraying mechanism; 311. First spray pipe; 312. First nozzle; 32. Internal spraying mechanism; 321. Second spray pipe; 322. Second nozzle;

[0048] 40. Liquid supply mechanism; 41. Water tank; 42. Water pump; 43. Pressure tank;

[0049] 51. Drain pipe;

[0050] 200. Component to be cleaned. Detailed implementation mode

[0051] The present invention will be further described in detail below with reference to the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the present invention, rather than limiting the present invention. Additionally, it should be noted that for the sake of description, only parts related to the present invention are shown in the drawings, rather than all structures.

[0052] In the description of the present invention, unless otherwise clearly defined and limited, the terms "connected", "connected to", and "fixed" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be directly connected, or indirectly connected through an intermediate medium, and can be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0053] In the present invention, unless otherwise clearly defined and limited, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or may include the first and second features not being in direct contact but being in contact through other features therebetween. Moreover, the first feature being "above", "above the top of", and "on the top of" the second feature includes the first feature being directly above and obliquely above the second feature, or merely indicating that the first feature has a higher horizontal height than the second feature. The first feature being "below", "below the bottom of", and "under the bottom of" the second feature includes the first feature being directly below and obliquely below the second feature, or merely indicating that the first feature has a lower horizontal height than the second feature.

[0054] In the description of this embodiment, the orientation or positional relationships such as "upper", "lower", "left", "right", etc. are based on the orientation or positional relationships shown in the drawings. They are only for the convenience of description and simplifying operations, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present invention. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0055] The following will introduce the cleaning device and cleaning method for the filter element of the single crystal furnace integrated tank provided by the present invention with reference to Figures 1 to 5 and the specific embodiments.

[0056] It should be noted that the part to be cleaned 200 in this embodiment is the filter element in the single crystal furnace integrated tank. During use, it is often attached with dust such as SiO2 particles. The dust is numerous and fine, making the cleaning relatively laborious, and the working environment is also a thousand-class clean room. Of course, in other embodiments, the part to be cleaned 200 can also be other structures that are difficult to clean and have high requirements for the working environment.

[0057] Please refer to Figures 1 to 4 , this embodiment provides a cleaning device for the filter element of the single crystal furnace integrated tank, which includes a cleaning box 10, a rotating mechanism and a spraying system. The cleaning box 10 has a closed cleaning chamber 101, so that dust will not flow out to pollute the environment during the cleaning process; and the cleaning chamber 101 can be opened and closed to enable the part to be cleaned 200 to be placed in the cleaning chamber 101; the rotating mechanism is arranged in the cleaning box 10. The rotating mechanism includes a rotating platform 21. The rotating platform 21 is used to install the part to be cleaned 200, and the rotating platform 21 can rotate to drive the part to be cleaned 200 to rotate; the spraying system includes a plurality of outer spraying mechanisms 31 and a plurality of inner spraying mechanisms 32. The outer spraying mechanisms 31 and the inner spraying mechanisms 32 are both arranged in the cleaning box 10. The plurality of outer spraying mechanisms 31 are arranged on the outer periphery of the rotating platform 21, and the outer spraying mechanisms 31 are used to wash the outer surface of the part to be cleaned 200; the plurality of inner spraying mechanisms 32 are arranged in the inner circle of the rotating platform 21, and the inner spraying mechanisms 32 are used to wash the inner surface of the part to be cleaned 200. Through the cooperation of the inner spraying mechanism 32, the outer spraying mechanism 31 and the rotating platform 21, the all-round cleaning of the part to be cleaned 200 can be realized.

[0058] Optionally, the inner spraying mechanism 32 and the outer spraying mechanism 31 both flow with cleaning liquid to clean the part to be cleaned 200.

[0059] It should be noted that the cleaning liquid in this embodiment is high-pressure RO pure water, that is, high-pressure reverse osmosis pure water, which is relatively pure and avoids polluting the part to be cleaned 200.

[0060] The cleaning device for the filter element of the integrated tank of the single crystal furnace in this embodiment installs the part to be cleaned 200 through the rotating platform 21 and drives the part to be cleaned 200 to rotate. Then, the outer spraying mechanism 31 and the inner spraying mechanism 32 spray the cleaning liquid on the outer surface and the inner surface of the part to be cleaned 200 respectively, so as to realize the all-round cleaning of the part to be cleaned 200, improve the cleaning effect. At the same time, the inner spraying mechanism 32 and the outer spraying mechanism 31 clean together, which also improves the cleaning efficiency, thereby improving the service life of the part to be cleaned 200 and reducing the frequency of aging replacement. Moreover, by setting the closed cleaning chamber 101, the dust will not flow out to pollute the environment during the cleaning process of the part to be cleaned 200, that is, the isolation of the pollution source is realized through the physical sealing method, reducing the pollution and harm to the environment and the operators.

[0061] Taking the single crystal furnace with a crystal formation rate of 76.87% before cleaning as an example, in actual use, during the use of the single crystal furnace corresponding to the filter element cleaned by the cleaning device for the filter element of the integrated tank of the single crystal furnace in this embodiment, the crystal formation is stable, and the average crystal formation rate can reach 73.22%; and the dust is well removed, so that during the use of the cleaned filter element, the crystal formation rate of the single crystal furnace rises to 79.54% and the crystal formation is stable.

[0062] Please refer to Figures 1 to 4 , in this embodiment, the cleaning box 10 includes a box body 11, a cover body 12 and a first driving member 13. The box body 11 has a cleaning chamber 101 with one end open; the cover body 12 is movably arranged at the opening so that the cleaning chamber 101 can be opened and closed; the fixed end of the first driving member 13 is fixedly arranged on either the box body 11 or the cover body 12, and the output end of the first driving member 13 is connected to the other of the box body 11 and the cover body 12. The first driving member 13 is used to drive the opening and closing of the cover body 12 and the box body 11. When in use, the first driving member 13 drives the box body 11 and the cover body 12 to open and close, and the opening and closing of the cleaning chamber 101 can be realized.

[0063] Specifically, one end of the box body 11 and one end of the cover body 12 are hinged, and the other ends of the two can be opened and closed; or the box body 11 and the cover body 12 are slidably connected, such as in the form of a lifting door; thus, the hinged opening and closing or the sliding opening and closing between the cover body 12 and the box body 11 can be realized, and the opening and closing setting of the two can be realized. Of course, in other embodiments, the connection between the box body 11 and the cover body 12 can also be other connection methods, as long as the two can be relatively closed and relatively opened, which is not specifically limited here.

[0064] More specifically, the box body 11 includes at least two accommodating chambers. One of the accommodating chambers is used as a cleaning chamber for carrying the part to be cleaned 200 and the rotating platform 21, and the other accommodating chamber is used as an equipment chamber 102 for loading various driving devices or other structures that need to be arranged in the cleaning box but not in the cleaning chamber.

[0065] Specifically, the first driving member 13 is selected as a cylinder, which is fixed on the box body 11, and the output end of the cylinder is connected to the cover body 12. By opening the cylinder, the cover body 12 can be opened relative to the box body 11.

[0066] Furthermore, the cleaning box 10 further includes a support base body 14 to support the entire device and can also be used to carry each structure inside the device.

[0067] Optionally, the support base body 14 is further provided with a plurality of adjustable feet to facilitate the stable placement and installation of the cleaning device for the filter element of the integrated tank of the single crystal furnace.

[0068] Optionally, the cleaning box 10 is made of anti-pollution material to avoid problems such as pollution caused by the contact between the cleaning box 10 and the part to be cleaned 200 after long-term use. Exemplarily, the cleaning box 10 is made of SUS304 material, which has good support and anti-pollution effects.

[0069] Please refer to Figure 1 、 Figure 2 、 Figure 4 and Figure 5 In this embodiment, the rotation mechanism includes a second driving member 22, a first transmission assembly 23 and a rotating platform 21. The second driving member 22 is disposed inside the cleaning box 10, specifically in the equipment cavity 102; both ends of the first transmission assembly 23 are respectively connected to the output end of the second driving member 22 and the rotating platform 21, so that the rotating platform 21 is in transmission connection with the output end of the second driving member 22, and the second driving member 22 is used to drive the rotating platform 21 to rotate. When in use, the second driving member 22 is driven to output a driving force, and through the first transmission assembly 23, the driving force of the second driving member 22 is transmitted to the rotating platform 21, thereby realizing the rotation of the rotating platform 21.

[0070] Furthermore, the rotation speed of the rotating platform 21 is adjustable, so that the rotating platform 21 can be adjusted according to actual needs, in order to facilitate the cleaning of the part to be cleaned 200.

[0071] Optionally, the second driving member 22 can be selected as a driving structure such as a motor, and no specific limitation is made here. Specifically, the second driving member 22 in this embodiment is a variable-frequency motor, which can adjust its own rotation speed, thereby adjusting the rotation speed of the rotating platform 21.

[0072] Optionally, the first transmission assembly 23 can be a gear transmission, a shaft transmission, etc., and no specific limitation is made here.

[0073] Specifically, the first transmission assembly 23 in this embodiment includes a transmission shaft 231. One end of the transmission shaft 231 is connected to the output shaft of the second driving member 22 through a coupling 232, and the other end is fixedly connected to the rotating platform 21 to achieve the transmission function of the transmission shaft 231.

[0074] More specifically, when the transmission shaft 231 passes through the cavity wall between the equipment cavity 102 and the cleaning cavity 101, the transmission shaft 231 is connected to the cavity wall through a bearing 233 to improve the service life of the transmission shaft 231.

[0075] Since the cleaning cavity 101 needs to have a certain degree of airtightness to avoid problems such as liquid leakage. Therefore, more specifically, a sealing structure 234 is provided between the transmission shaft 231 and the cavity wall to achieve the sealed isolation between the cleaning cavity 101 and the equipment cavity 102. Optionally, the sealing structure 234 is an oil seal structure, which can prevent fluid from overflowing and has advantages such as a long service life, good sealing performance, and low cost.

[0076] Further, a transmission can be provided between the first transmission assembly 23 and the second driving member 22 to make the selection of the second driving member 22 more diverse.

[0077] Still further, a plurality of fixing jigs 24 are evenly distributed on the rotating platform 21 for carrying and limiting the workpiece to be cleaned 200.

[0078] Specifically, the fixing jig 24 in this embodiment is U-shaped and provided in a plurality along the circumferential direction, so that the side wall of the annular filter element can be carried and limited.

[0079] Please refer to Figure 1 、 Figure 2 and Figure 4 , in this embodiment, the spraying system includes an external spraying mechanism 31 and an internal spraying mechanism 32. Among them, the external spraying mechanism 31 includes a first spray pipe 311 and a plurality of first nozzles 312. The first spray pipe 311 extends along the axis direction of the rotating platform 21. Cleaning liquid flows through the first spray pipe 311. The plurality of first nozzles 312 are spaced apart along the extending direction of the first spray pipe 311 and communicated with the first spray pipe 311. The first nozzles 312 are used to spray the cleaning liquid toward the outer surface of the workpiece to be cleaned 200; during use, the cleaning liquid flows from the first spray pipe 311 to each first nozzle 312 and then sprays out from the first nozzle 312 to achieve the cleaning of the outer surface of the workpiece to be cleaned 200. Such a setting can make the spraying range of the cleaning liquid of the external spraying mechanism 31 along the axis direction of the rotating platform 21 not less than the range of the cleaning cavity 101 along the axis direction of the rotating platform 21, so as to achieve more comprehensive cleaning of the workpiece to be cleaned 200.

[0080] To improve the selectivity and adjustability of the spraying range of the external spraying mechanism 31, specifically, the external spraying mechanism 31 further includes a position adjusting member to adjust the position of the external spraying mechanism 31, thereby realizing the adjustment of the nozzle position of the external spraying mechanism 31. Optionally, each first nozzle 312 and the corresponding first spray pipe 311 are separately arranged from the connection position, and corresponding telescopic rods or long circular hole sliding connection structures and other adjustment structures are provided as the position adjusting member to realize the adjustment of the nozzle position of the external spraying mechanism 31, which is not specifically limited herein.

[0081] Further, the internal spraying mechanism 32 includes a second spray pipe 321 and a plurality of second nozzles 322. A cleaning liquid flows through the second spray pipe 321, and the plurality of second nozzles 322 are uniformly distributed and communicated with the second spray pipe 321. The second nozzles 322 are used to spray the cleaning liquid toward the inner surface of the workpiece to be cleaned 200. During use, the cleaning liquid flows from the second spray pipe 321 to each second nozzle 322 and then sprays out from the second nozzles 322 to realize the cleaning of the inner surface of the workpiece to be cleaned 200.

[0082] Optionally, the first spray pipe 311, the second spray pipe 321, the first nozzle 312, and the second nozzle 322 are all made of stainless steel to avoid contamination during the cleaning process.

[0083] Specifically, the plurality of second nozzles 322 can be circumferentially uniformly arranged or radially circumferentially arrayed, both of which can realize a more comprehensive cleaning of the inner surface of the workpiece to be cleaned 200.

[0084] Optionally, the second nozzles 322 are inclined on the second spray pipe 321, that is, the second nozzles 322 are inclined toward the inner surface of the workpiece to be cleaned, which is convenient for better cleaning the inner surface of the workpiece to be cleaned 200.

[0085] Of course, in order to improve the cleaning effect of the internal spraying mechanism 32, the internal spraying mechanism 32 can also be made rotatable. It can not only clean each position in the circumferential direction of the workpiece to be cleaned 200, but also has a certain rotational force, which is more convenient for the cleaning of the cleaning liquid. The specific rotation structure is similar to the rotation mechanism and will not be elaborated here.

[0086] To realize the all-round cleaning of the inner surface of the workpiece to be cleaned 200 by the internal spraying mechanism 32 in the axial direction of its own axis, further, the internal spraying mechanism 32 can be lifted and lowered along the axis direction of the rotating platform 21. The internal spraying mechanism 32 is connected with a lifting assembly (not shown in the figure). The lifting assembly is arranged on the cavity wall of the cleaning cavity 101. The lifting assembly is used to drive the internal spraying mechanism 32 to make a lifting movement along the axis direction of the rotating platform 21, so that the internal spraying mechanism 32 reciprocally penetrates through the workpiece to be cleaned 200, and the all-round cleaning of the inner surface of the workpiece to be cleaned 200 in the axial direction of its own axis can be realized.

[0087] Specifically, the lifting assembly includes a third driving member, a second transmission assembly, and a lifting platform. The third driving member is disposed within the cleaning tank 10; the input end of the second transmission assembly is connected to the output end of the third driving member; the lifting platform is connected to the output end of the second transmission assembly, and the internal spraying mechanism 32 is fixedly connected to the lifting platform. The third driving member can drive the lifting platform to move up and down along the axis of the rotating platform 21 through the second transmission assembly, thereby driving the internal spraying mechanism 32 to move up and down along the axis of the rotating platform 21.

[0088] Optionally, the third driving member can be a driving structure such as a motor or a cylinder, and no specific limitation is made here. Exemplarily, the third driving member in this embodiment is a motor.

[0089] Optionally, the second transmission assembly can be a gear transmission, a belt transmission, a lead screw transmission, or a linear bearing 233 transmission, etc., and no specific limitation is made here. Exemplarily, the second transmission assembly in this embodiment uses a lead screw transmission structure, that is, it includes a lead screw and a bolt. The lead screw is connected to the third driving member, and the bolt is connected to the lifting platform. The bolt and the lead screw are in threaded connection. During use, the third driving member drives the lead screw to rotate, thereby realizing the movement of the bolt and the lifting platform along the extension direction of the lead screw.

[0090] Please refer to Figures 1 to 3 In this embodiment, the cleaning device for the filter element of the single crystal furnace integrated tank further includes a liquid supply mechanism 40. The external spraying mechanism 31 and the internal spraying mechanism 32 are both communicated with the liquid supply mechanism 40. The liquid supply mechanism 40 is used to supply cleaning liquid with a preset pressure to the external spraying mechanism 31 and the internal spraying mechanism 32, so as to continuously supply cleaning liquid to the external spraying mechanism 31 and the internal spraying mechanism 32.

[0091] Specifically, the liquid supply mechanism 40 includes a water tank 41, a water pump 42, and a pressure tank 43. The inlet of the water tank 41 is communicated with an external liquid supply source, the outlet of the water tank 41 is communicated with the water pump 42, the water pump 42 is communicated with the pressure tank 43, and the pressure tank 43 is communicated with the external spraying mechanism 31 and the internal spraying mechanism 32. During use, the cleaning liquid flows from the water tank 41 through the water pump 42 to the pressure tank 43, and after adding a preset pressure, it then flows to the external spraying mechanism 31 and the internal spraying mechanism 32, thereby realizing liquid supply.

[0092] Furthermore, the cleaning device for the filter element of the single crystal furnace integrated tank further includes a liquid discharge mechanism. The liquid discharge mechanism includes a drain pipe 51 and a drainage filtration component. Both ends of the drain pipe 51 are communicated with the bottom of the cleaning chamber 101 and the drainage filtration component. The drain pipe 51 is used to discharge the cleaning liquid in the cleaning chamber 101, and the drainage filtration component is used to filter the discharged cleaning liquid to realize the post-treatment of the waste liquid.

[0093] Optionally, the outlet of the drainage filtration component is communicated with the cleaning liquid preparation device, so as to realize the reuse of the waste liquid.

[0094] This embodiment also provides a cleaning method for the filter element of the integrated tank of a single crystal furnace, which uses the cleaning device for the filter element of the integrated tank of a single crystal furnace described in any of the above solutions to clean the filter element of the integrated tank of a single crystal furnace.

[0095] Please refer to Figures 1 to 5 , specifically, the cleaning method for the filter element of the integrated tank of a single crystal furnace includes the following steps:

[0096] Step S10: Take out the part to be cleaned 200 and transport the part to be cleaned 200 to the cleaning box 10 through a transport cart.

[0097] Specifically, the transport cart is selected as a cart with a closed structure that prevents the dust of the part to be cleaned 200 from flowing out and polluting, and this transport cart also needs to meet the requirements for use in a thousand-class clean room to avoid polluting the environment during transportation.

[0098] After step S10, there is also step S20: Open the cleaning chamber 101, place the part to be cleaned 200 on the rotating platform 21 in the cleaning chamber 101, and close the cleaning chamber 101; this step is used to put the part to be cleaned 200 into the closed cleaning chamber 101 so that dust and other pollutants will not flow out and pollute the environment during the subsequent cleaning process.

[0099] Specifically, the opening and closing of the cleaning chamber 101 can be realized by driving the opening and closing between the cover body 12 and the box body 11 by the first driving member 13.

[0100] After step S20, there is also step S30: Drive the rotating platform 21 to rotate at a first speed, turn on the liquid supply mechanism 40, the liquid discharge mechanism, the external spraying mechanism 31 and the internal spraying mechanism 32, and drive the internal spraying mechanism 32 to move up and down along the axis direction of the rotating platform 21 to perform a full-round flushing of the part to be cleaned 200 for a first preset time; thus, it can realize the flushing of each position on the inner surface and the outer surface of the part to be cleaned 200, and the flushing wastewater is discharged and will not pollute the part to be cleaned 200 again, improving the cleaning effect of the part to be cleaned 200.

[0101] It should be noted that the first preset time is a value set according to actual needs, which can meet the requirement of flushing the part to be cleaned 200 clean.

[0102] After step S30, there is also step S40: Turn off the external spraying mechanism 31 and the internal spraying mechanism 32, drive the rotating platform 21 to rotate at a second speed for a second preset time, and the second speed is greater than the first speed; after the cleaning is completed, by accelerating the rotation, the cleaning liquid on the surface of the part to be cleaned 200 can be spun dry and removed.

[0103] It should be noted that the second preset time is a value set according to actual requirements, which can meet the requirement of centrifuging and removing the cleaning liquid on the surface of the part to be cleaned 200.

[0104] After step S40, there is also step S50: close the rotating platform 21, open the cleaning chamber 101, take out the part to be cleaned 200, then the cleaning of the part to be cleaned 200 is completed, and the part to be cleaned 200 is placed on a special platform for standby.

[0105] In the cleaning method for the filter element of the integrated tank of the single crystal furnace in this embodiment, the part to be cleaned 200 is installed and driven to rotate by the rotating platform 21, and the external spraying mechanism 31 and the internal spraying mechanism 32 spray the cleaning liquid on the outer surface and the inner surface of the part to be cleaned 200 respectively, so as to achieve the all-round cleaning of the part to be cleaned 200, improve the cleaning effect. At the same time, the internal spraying mechanism 32 and the external spraying mechanism 31 clean together, which also improves the cleaning efficiency, thereby prolonging the service life of the part to be cleaned 200 and reducing the aging replacement frequency. Moreover, by setting up the sealed cleaning chamber 101, the dust will not flow out to pollute the environment during the cleaning process of the part to be cleaned 200, that is, the isolation of the pollution source is realized through physical sealing, reducing the pollution and harm to the environment and operating personnel.

[0106] Obviously, the above-mentioned embodiments of the present invention are only examples for clearly explaining the present invention, rather than limitations on the implementation manners of the present invention. For those of ordinary skill in the art, various obvious changes, re-adjustments and substitutions can be made without departing from the protection scope of the present invention. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A cleaning device for a single crystal furnace integrated tank filter element, characterized in that: include: A cleaning box (10), the cleaning box (10) having a sealed cleaning chamber (101), the cleaning chamber (101) being openable and closable; A rotating mechanism, the rotating mechanism being arranged in the cleaning box (10), the rotating mechanism comprising a rotating platform (21), the rotating platform (21) being arranged in the cleaning chamber (101) for mounting the object to be cleaned (200), the rotating platform (21) being rotatable to drive the object to be cleaned (200) to rotate; A spray system, the spray system comprising a plurality of external spray mechanisms (31) and a plurality of internal spray mechanisms (32), the external spray mechanisms (31) and the internal spray mechanisms (32) being both arranged in the cleaning box (10), a plurality of the external spray mechanisms (31) being arranged on the outer periphery of the rotating platform (21), the external spray mechanisms (31) being used for flushing the outer surface of the part to be cleaned (200); and a plurality of the internal spray mechanisms (32) being arranged on the inner ring of the rotating platform (21), the internal spray mechanisms (32) being used for flushing the inner surface of the part to be cleaned (200).

2. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 1 is characterized in that: The cleaning box (10) comprises: A box body (11), wherein the box body (11) has the cleaning chamber (101) with one end open; A cover body (12), the cover body (12) being arranged at the opening in an openable and closable manner so that the cleaning chamber (101) can be opened and closed; A first driving member (13), wherein a fixed end of the first driving member (13) is fixedly arranged on any one of the box body (11) and the cover body (12), an output end of the first driving member (13) is connected to the other of the box body (11) and the cover body (12), and the first driving member (13) is used to drive the cover body (12) and the box body (11) to open and close.

3. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 1 is characterized in that: The rotating mechanism comprises: a second driving member (22), the second driving member (22) being disposed in the cleaning box (10); A first transmission component (23), wherein two ends of the first transmission component (23) are respectively connected to the output end of the second driving member (22) and the rotating platform (21), so that the rotating platform (21) is transmission-connected to the output end of the second driving member (22), and the second driving member (22) is used to drive the rotating platform (21) to rotate.

4. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 1 is characterized in that: The rotation speed of the rotating platform (21) is adjustable.

5. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 1 is characterized in that: The external spray mechanism (31) comprises a first spray pipe (311) and a plurality of first nozzles (312); the first spray pipe (311) is extended along the axial direction of the rotating platform (21); a cleaning liquid flows in the first spray pipe (311); the plurality of first nozzles (312) are spaced apart along the extension direction of the first spray pipe (311) and are connected to the first spray pipe (311); the first nozzles (312) are used to spray the cleaning liquid toward the outer surface of the object (200) to be cleaned; The internal spray mechanism (32) comprises a second spray pipe (321) and a plurality of second nozzles (322); a cleaning liquid flows in the second spray pipe (321); the plurality of second nozzles (322) are evenly distributed and connected to the second spray pipe (321); and the second nozzles (322) are used to spray the cleaning liquid toward the inner surface of the object to be cleaned (200).

6. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 1, characterized in that: The internal spray mechanism (32) can be raised and lowered along the axial direction of the rotating platform (21); the internal spray mechanism (32) is connected to a lifting component, and the lifting component is arranged on the cavity wall of the cleaning cavity (101); the lifting component is used to drive the internal spray mechanism (32) to perform lifting movement along the axial direction of the rotating platform (21), so that the internal spray mechanism (32) reciprocates through the object to be cleaned (200).

7. The cleaning device for the filter element of the integrated tank of the single crystal furnace according to claim 6 is characterized in that: The lifting assembly comprises: a third driving member, the third driving member being arranged in the cleaning box (10); a second transmission assembly, wherein an input end of the second transmission assembly is connected to an output end of the third driving member; A lifting platform, the lifting platform is connected to the output end of the second transmission component, the internal spray mechanism (32) is fixedly connected to the lifting platform, and the third driving member can drive the lifting platform to perform lifting movement along the axial direction of the rotating platform (21) through the second transmission component.

8. The cleaning device for the filter element of the integrated tank of a single crystal furnace according to any one of claims 1 to 7, characterized in that: It also comprises a liquid supply mechanism (40), the external spray mechanism (31) and the internal spray mechanism (32) are both connected to the liquid supply mechanism (40), and the liquid supply mechanism (40) is used to supply cleaning liquid of a preset pressure to the external spray mechanism (31) and the internal spray mechanism (32).

9. The cleaning device for a filter element of a single crystal furnace integrated tank according to any one of claims 1 to 7, characterized in that: It also comprises a drainage mechanism, the drainage mechanism comprising a drainage pipe (51) and a drainage filter assembly, the two ends of the drainage pipe (51) being connected to the bottom of the cleaning chamber (101) and the drainage filter assembly, the drainage pipe (51) being used to discharge the cleaning liquid in the cleaning chamber (101), and the drainage filter assembly being used to filter the discharged cleaning liquid.

10. A cleaning method for a single crystal furnace integrated tank filter element, characterized in that: Using the cleaning device for the single crystal furnace integrated tank filter element according to any one of claims 1 to 9, the cleaning method for the single crystal furnace integrated tank filter element comprises: Step S10, taking out the object to be cleaned (200) and transporting the object to be cleaned (200) to the cleaning box (10) by means of a transport vehicle; Step S20: opening the cleaning chamber (101), placing the object to be cleaned (200) on the rotating platform (21) in the cleaning chamber (101), and closing the cleaning chamber (101); Step S30: driving the rotating platform (21) to rotate at a first speed, turning on the liquid supply mechanism (40), the liquid discharge mechanism, the external spray mechanism (31) and the internal spray mechanism (32), and driving the internal spray mechanism (32) to move up and down along the axis of the rotating platform (21) to perform all-round flushing of the inside and outside of the object to be cleaned (200) for a first preset time; Step S40: closing the external spray mechanism (31) and the internal spray mechanism (32), and driving the rotating platform (21) to rotate at a second speed for a second preset time, wherein the second speed is greater than the first speed; Step S50: closing the rotating platform (21), opening the cleaning chamber (101), and taking out the object to be cleaned (200).