Liquid source storage device

Abstract

The invention provides a liquid source storage device, which is used for storing and supplying a liquid source to a semiconductor process chamber, and comprises a storage main body, a gas transmission structure and a switching structure, the gas transmission structure is used for communicating with a carrier gas source and is provided with a first gas outlet and a second gas outlet; the first gas outlet and the second gas outlet are positioned at different horizontal positions in the storage main body; the switching structure is matched with the gas transmission structure and used for switching the gas transmission structure to output the carrier gas into the storage body through at least one of the first gas outlet and the second gas outlet. The liquid source storage device provided by the invention can be compatible with multiple liquid source transport modes, and can switch the multiple liquid source transport modes in a semiconductor process, so that the problems caused by a single liquid source transport mode can be avoided, the use stability and flexibility are improved, and the purchase cost and the storage difficulty can be reduced.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular, to a liquid source storage device. Background Art

[0002] The liquid source (i.e., liquid precursor) used in semiconductor processes can usually be stored in a liquid source storage device (e.g., a liquid source bottle). The liquid source storage device is connected to a semiconductor process chamber. In semiconductor processes, a carrier gas is introduced into the liquid source storage device to carry the vapor of the liquid source into the process chamber by means of the carrier gas. Under certain semiconductor process conditions, the liquid source can form a desired thin film on the surface of a wafer.

[0003] In the prior art, according to the different saturated vapor pressures of the liquid source, the transport methods of the liquid source are divided into the vapor draw method and the bubbler method. Among them, for the liquid source storage device using the vapor draw method, the inlet pipe is located above the liquid level of the liquid source, and the carrier gas is introduced through the inlet pipe above the liquid level of the liquid source to directly carry the vapor of the liquid source into the process chamber. For the liquid source storage device using the bubbler method, the inlet pipe is inserted below the liquid level of the liquid source, and the carrier gas is introduced through the inlet pipe below the liquid level of the liquid source (i.e., into the liquid source), and more vapor of the liquid source is carried into the process chamber by means of bubbling.

[0004] However, for the vapor draw method, during continuous semiconductor processes, the deposition rate of the thin film will decrease due to insufficient precursors as a large amount of the vapor of the liquid source is consumed and enters the process chamber. To maintain the deposition rate of the thin film, the temperature of the liquid source will be increased and the production interval time will be increased. However, the liquid source cannot be heated infinitely, and increasing the production interval time will reduce the production capacity and increase the use cost. For the bubbler method, the liquid source needs to be heated to increase the vapor pressure in the liquid source storage device, resulting in the liquid source flowing back into the inlet pipe at the moment when the inlet pipe valve is opened. Moreover, incomplete pressure relief of the liquid source storage device will also cause the liquid source to flow back, thus causing blockage of the pipeline of the liquid source storage device, particle contamination in the deposited thin film, etc., and further causing adverse consequences such as downtime of semiconductor equipment, increased maintenance costs, and decreased product performance. In addition, semiconductor factories also need to purchase liquid source storage devices of two transport methods according to different process requirements, resulting in increased procurement costs and increased storage difficulty. Summary of the Invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and provides a liquid source storage device, which can be compatible with multiple liquid source transportation methods, and can switch between multiple liquid source transportation methods in semiconductor processes, so as to avoid the problems brought by a single liquid source transportation method, improve the use stability and flexibility, and can reduce the procurement cost and the storage difficulty.

[0006] To achieve the purpose of the present invention, a liquid source storage device is provided for storing and supplying a liquid source to a semiconductor process chamber, including a storage main body, a gas transmission structure and a switching structure. Among them, the storage main body is used for storing the liquid source; the gas transmission structure is used to communicate with a carrier gas source and has a first gas outlet and a second gas outlet, and the first gas outlet and the second gas outlet are located at different horizontal positions inside the storage main body; the switching structure is cooperatively arranged with the gas transmission structure and is used to switch the gas transmission structure to output carrier gas into the storage main body through at least one of the first gas outlet and the second gas outlet.

[0007] Optionally, the gas transmission structure includes a gas transmission chamber, the gas transmission chamber is arranged inside the storage main body, and the first gas outlet and the second gas outlet are both arranged on the gas transmission chamber.

[0008] Optionally, the gas transmission chamber includes a chamber main body, a first gas outlet pipe and a second gas outlet pipe. The chamber main body is used to communicate with the carrier gas source. One end of the first gas outlet pipe is communicated with the chamber main body, and the other end of the first gas outlet pipe serves as the first gas outlet. One end of the second gas outlet pipe is communicated with the chamber main body, and the other end of the second gas outlet pipe serves as the second gas outlet.

[0009] Optionally, the gas transmission structure further includes a partition component, the partition component is arranged inside the gas transmission chamber and is used to partition the gas transmission chamber, so that there are an intake chamber, a first gas outlet chamber and a second gas outlet chamber which are separated from each other inside the gas transmission chamber. The intake chamber is used to communicate with the carrier gas source. The first gas outlet and the second gas outlet are respectively arranged corresponding to the first gas outlet chamber and the second gas outlet chamber. The partition component has a first communication port and a second communication port. The first communication port communicates the intake chamber and the first gas outlet chamber, and the second communication port communicates the intake chamber and the second gas outlet chamber. The switching structure switches the gas transmission structure to output carrier gas into the storage main body through at least one of the first gas outlet and the second gas outlet by controlling the opening and closing of the first communication port and the second communication port.

[0010] Optionally, the separation component includes a first partition, a second partition, and a third partition. At least a part of the first partition is vertically arranged in the gas transmission chamber and is sealed between the bottom wall of the gas transmission chamber and the peripheral walls on the opposite sides of the gas transmission chamber respectively. The second partition and the third partition are sealed between the first partition and the peripheral wall of the gas transmission chamber respectively, so as to form the intake chamber between the second partition, the third partition, the top wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber, form the first outlet chamber between the second partition, the first partition, the bottom wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber, and form the second outlet chamber between the third partition, the first partition, the bottom wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber. The first communication port is arranged on the second partition, and the second communication port is arranged on the third partition.

[0011] Optionally, the switching structure includes a first baffle, a second baffle, and a driving component. The first baffle is located below the second partition and corresponds to the first communication port for blocking the first communication port. The second baffle is located above the third partition and corresponds to the second communication port for blocking the second communication port. The driving component is connected to the first baffle and the second baffle respectively, and is used to control the first baffle to approach or move away from the first communication port and control the second baffle to move away from or approach the second communication port by driving the first baffle and the second baffle to move up and down.

[0012] Optionally, the driving component includes a driving source and a transmission member. The first partition is provided with a through hole for the transmission member to penetrate. The driving source is arranged outside the storage main body for providing the lifting driving force. The transmission member penetrates into the storage main body from outside the storage main body and extends above the first partition through the through hole. The driving source is connected to the first baffle and the second baffle respectively through the transmission member.

[0013] Optionally, the separation component further includes a telescopic isolation member. The switching structure further includes a fixed connecting plate, a first connecting rod, and a second connecting rod. The fixed connecting plate is hermetically connected to the end of the transmission member located above the second partition and the third partition. The first connecting rod penetrates through the first communication port. The first baffle is connected to the fixed connecting plate through the first connecting rod. The second baffle is connected to the fixed connecting plate through the second connecting rod. The telescopic isolation member is sleeved outside the part of the transmission member located above the first partition and is sealed between the fixed connecting plate and the first partition respectively, and the telescopic isolation member can be telescoped in the lifting direction of the transmission member.

[0014] Optionally, the first partition plate penetrates through the gas transmission chamber and extends to the bottom wall of the storage body, is sealed with the bottom wall of the storage body, and is sleeved outside the part of the transmission member located inside the storage body.

[0015] Optionally, a first sealing ring is provided on one of the two surfaces of the first baffle plate opposite to the second partition plate, and the first sealing ring is arranged corresponding to the first communication port for sealing between the first baffle plate and the second partition plate when the first baffle plate is in contact with the second partition plate. A second sealing ring is provided on one of the two surfaces of the second baffle plate opposite to the third partition plate, and the second sealing ring is arranged corresponding to the second communication port for sealing between the second baffle plate and the third partition plate when the second baffle plate is in contact with the third partition plate.

[0016] Optionally, the liquid source storage device further includes a pressure detection device, which is cooperatively arranged with the storage body for detecting the pressure inside the storage body.

[0017] The present invention has the following beneficial effects:

[0018] The liquid source storage device provided by the present invention can, by arranging the first gas outlet and the second gas outlet of the gas transmission structure at different horizontal positions within the storage main body, when there is a liquid source stored in the storage main body, make the gas outlet at the higher horizontal position among the first gas outlet and the second gas outlet be above the liquid level of the liquid source, and the gas outlet at the lower horizontal position be below the liquid level of the liquid source. As a result, the carrier gas output by the gas transmission structure through the gas outlet at the higher horizontal position can be above the liquid level of the liquid source, enabling a liquid source transportation method such as vapor draw. And the carrier gas output by the gas transmission structure through the gas outlet at the lower horizontal position can be below the liquid level of the liquid source, enabling a liquid source transportation method such as bubbler, thereby being able to be compatible with multiple liquid source transportation methods. On this basis, by arranging a switching structure in cooperation with the gas transmission structure, the switching structure can be used to switch the gas transmission structure to output carrier gas into the storage main body through at least one of the first gas outlet and the second gas outlet in semiconductor processing, so as to achieve at least one of the vapor draw method and the bubbler method, thereby being able to switch multiple liquid source transportation methods in semiconductor processing, and then being able to avoid problems such as a decrease in the film deposition rate, low production capacity, and high usage cost caused by a single vapor draw method, and also being able to avoid problems such as liquid source backflow, pipeline blockage, deposited film pollution, equipment downtime, high usage cost, and poor product performance caused by a single bubbler method. It can also avoid the problems of high procurement cost and increased storage difficulty caused by purchasing two sets of equipment for two liquid source transportation methods. That is to say, it can avoid the problems caused by a single liquid source transportation method, and further improve the use stability and flexibility, and can reduce the procurement cost and lower the storage difficulty. Description of the Drawings

[0019] Figure 1 It is a schematic structural diagram of the gas transmission structure of the liquid source storage device provided by the embodiment of the present invention for outputting carrier gas into the storage main body through the first gas outlet and the second gas outlet;

[0020] Figure 2 It is a schematic structural diagram of the gas transmission structure of the liquid source storage device provided by the embodiment of the present invention for outputting carrier gas into the storage main body through the first gas outlet;

[0021] Figure 3 It is a schematic structural diagram of the gas transmission structure of the liquid source storage device provided by the embodiment of the present invention for outputting carrier gas into the storage main body through the second gas outlet;

[0022] Description of the Reference Numerals:

[0023] 1 - Liquid source storage body; 21 - Gas transmission chamber; 211 - Intake chamber; 212 - First outlet chamber; 213 - Second outlet chamber; 22 - Intake pipe; 221 - Intake port; 222 - Intake pneumatic valve; 223 - Intake manual valve; 23 - First outlet pipe; 231 - First outlet port; 24 - Second outlet pipe; 241 - Second outlet port; 251 - First partition; 252 - Second partition; 253 - Third partition; 254 - First communication port; 255 - Second communication port; 256 - Telescopic isolation member; 31 - First baffle; 32 - Second baffle; 33 - Driving member; 331 - Driving source; 332 - Transmission member; 34 - Fixed connection plate; 35 - First connecting rod; 36 - Second connecting rod; 41 - First sealing ring; 42 - Second sealing ring; 5 - Pressure detection device; 6 - Exhaust pipe; 61 - Gas inlet; 62 - Exhaust pneumatic valve; 63 - Exhaust manual valve; 7 - Intermediate pipe; 71 - Intermediate valve. Detailed implementation mode

[0024] To enable those skilled in the art to better understand the technical solution of the present invention, the liquid source storage device provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0025] As Figures 1 - 3 shown, an embodiment of the present invention provides a liquid source storage device for storing and supplying a liquid source to a semiconductor process chamber. The liquid source storage device includes a storage body 1, a gas transmission structure, and a switching structure. Among them, the storage body 1 is used for storing a liquid source (as shown by the dotted line in Figures 1 - 3 ); the gas transmission structure is used to communicate with a carrier gas source and has a first outlet port 231 and a second outlet port 241, and the first outlet port 231 and the second outlet port 241 are located at different horizontal positions inside the storage body 1; the switching structure is cooperatively arranged with the gas transmission structure for switching the gas transmission structure to output a carrier gas to the inside of the storage body 1 through at least one of the first outlet port 231 and the second outlet port 241.

[0026] The liquid source storage device provided by the embodiment of the present invention is provided with a first air outlet 231 and a second air outlet 241 at different horizontal positions in the storage main body 1 on the gas transmission structure. When a liquid source is stored in the storage main body 1, the air outlet at the higher horizontal position among the first air outlet 231 and the second air outlet 241 can be located above the liquid level of the liquid source, and the air outlet at the lower horizontal position can be located below the liquid level of the liquid source. Thus, the carrier gas output by the gas transmission structure through the air outlet at the higher horizontal position can be located above the liquid level of the liquid source, and a liquid source transportation mode such as vapor draw can be realized. The carrier gas output by the gas transmission structure through the air outlet at the lower horizontal position can be located below the liquid level of the liquid source, and a liquid source transportation mode such as bubbler can be realized. Therefore, multiple liquid source transportation modes can be compatible. Moreover, by arranging a switching structure in cooperation with the gas transmission structure, the switching structure can be used to switch the gas transmission structure to output carrier gas into the storage main body 1 through at least one of the first air outlet 231 and the second air outlet 241 in the semiconductor process, so as to be able to switch and realize at least one of, for example, the vapor extraction mode and / or the bubbler mode in the semiconductor process. Thus, multiple liquid source transportation modes can be switched in the semiconductor process, and then problems such as a decrease in the film deposition rate, low production capacity, and high usage cost caused by a single vapor extraction mode can be avoided. Problems such as backflow of the liquid source, blockage of pipelines, contamination of the deposited film, equipment downtime, high usage cost, and poor product performance caused by a single bubbler mode can also be avoided. The problems of high procurement cost and increased storage difficulty caused by purchasing two sets of equipment for two liquid source transportation modes can also be avoided. That is to say, the problems caused by a single liquid source transportation mode can be avoided, thereby improving the usage stability and flexibility, reducing the procurement cost, and lowering the storage difficulty.

[0027] Hereinafter, the liquid source storage device provided by the embodiment of the present invention will be described by taking the example that the horizontal position of the first air outlet 231 in the storage main body 1 is higher than the horizontal position of the second air outlet 241 in the storage main body 1. However, the liquid source storage device provided by the embodiment of the present invention is not limited to the case where the horizontal position of the first air outlet 231 in the storage main body 1 is higher than the horizontal position of the second air outlet 241 in the storage main body 1. It may also be that the horizontal position of the second air outlet 241 in the storage main body 1 is higher than the horizontal position of the first air outlet 231 in the storage main body 1. In practical applications, there are various usage methods for the liquid source storage device provided by the embodiment of the present invention. Hereinafter, three usage methods will be specifically described by taking the state of the liquid source as an example. However, the usage methods of the liquid source storage device provided by the embodiment of the present invention are not limited to the following three, and are not limited to being distinguished according to the state of the liquid source.

[0028] Usage Mode 1: When using a liquid source with a relatively large saturated vapor pressure, the vapor extraction method is applicable for transporting the liquid source. When the vapor pressure in the storage body 1 is normal, the gas delivery structure can be switched by means of a switching structure to output the carrier gas into the storage body 1 through the first gas outlet 231, rather than through the second gas outlet 241 to output the carrier gas into the storage body 1 (as Figure 2 shown). At this time, the carrier gas provided by the carrier gas source can enter the gas delivery structure and be output into the storage body 1 through the first gas outlet 231, but cannot be output into the storage body 1 through the second gas outlet 241. Since the first gas outlet 231 is above the liquid level of the liquid source in the storage body 1, the first gas outlet 231 can output the carrier gas above the liquid level of the liquid source, thereby enabling the transportation of the liquid source by the vapor extraction method. When the vapor pressure in the storage body 1 drops due to the continuous transportation of the liquid source by the vapor extraction method, the gas delivery structure can be switched by means of a switching structure to output the carrier gas into the storage body 1 through the second gas outlet 241, rather than through the first gas outlet 231 to output the carrier gas into the storage body 1 (as Figure 3 shown). At this time, the carrier gas provided by the carrier gas source can enter the gas delivery structure and be output into the storage body 1 through the second gas outlet 241, but cannot be output into the storage body 1 through the first gas outlet 231. Since the second gas outlet 241 is below the liquid level of the liquid source in the storage body 1, the second gas outlet 241 can output the carrier gas below the liquid level of the liquid source (i.e., output into the liquid source), thereby enabling the transportation of the liquid source by the bubbling method to increase the amount of the liquid source carried by the carrier gas. When the vapor pressure in the storage body 1 rises back to normal due to the transportation of the liquid source by the bubbling method, the gas delivery structure can be switched by means of a switching structure to output the carrier gas into the storage body 1 through the first gas outlet 231, rather than through the second gas outlet 241 to output the carrier gas into the storage body 1 (as Figure 2 shown), thereby restoring the transportation of the liquid source by the vapor extraction method to make the transportation of the liquid source stable and continuous, so that the semiconductor process can be carried out stably and continuously.

[0029] Usage Mode 2: When using a liquid source with a relatively small saturated vapor pressure, to ensure the deposition rate of the thin film deposition, the bubbling method is applicable for transporting the liquid source. When the vapor pressure in the storage body 1 is normal, the gas delivery structure can be switched by means of a switching structure to output the carrier gas into the storage body 1 through the second gas outlet 241, rather than through the first gas outlet 231 to output the carrier gas into the storage body 1 (as Figure 3As shown in the figure, at this time, the carrier gas provided by the carrier gas source can enter the gas transmission structure and be output into the storage body 1 through the second air outlet 241, but cannot be output into the storage body 1 through the first air outlet 231. Since the second air outlet 241 is located below the liquid level of the liquid source in the storage body 1, the second air outlet 241 can output the carrier gas below the liquid level of the liquid source (i.e., output it into the liquid source), so as to realize the transportation of the liquid source in the form of bubbling, thereby increasing the amount of the liquid source carried by the carrier gas. When the vapor pressure in the storage body 1 rises above the warning value due to the transportation of the liquid source in the form of bubbling (optionally, the warning value can be set according to the vapor pressure in the storage body 1 when the liquid source may flow back in actual applications), in order to avoid the liquid source in the storage body 1 from flowing back, the switching structure can be used to switch the gas transmission structure to output the carrier gas into the storage body 1 through the first air outlet 231, rather than through the second air outlet 241 (as shown in Figure 2 As shown in the figure, at this time, the carrier gas provided by the carrier gas source can enter the gas transmission structure and be output into the storage body 1 through the first air outlet 231, but cannot be output into the storage body 1 through the second air outlet 241. Since the first air outlet 231 is located above the liquid level of the liquid source in the storage body 1, the first air outlet 231 can output the carrier gas above the liquid level of the liquid source, so as to realize the transportation of the liquid source in the form of steam extraction. When the vapor pressure in the storage body 1 drops back to normal after the continuous transportation of the liquid source in the form of steam extraction, the switching structure can be used to switch the gas transmission structure to output the carrier gas into the storage body 1 through the second air outlet 241, rather than through the first air outlet 231 (as shown in Figure 3 As shown in the figure), so as to resume the transportation of the liquid source in the form of bubbling, thereby increasing the amount of the liquid source carried by the carrier gas and ensuring the deposition rate of the thin film deposition.

[0030] Usage mode three: When the liquid level of the liquid source in the storage body 1 is relatively low, that is to say, when the remaining liquid source in the storage body 1 is relatively small, whether the liquid source is transported in the form of steam extraction or in the form of bubbling, the change frequency of the vapor pressure in the storage body 1 will be relatively fast, resulting in a relatively fast switching frequency of the switching structure. At this time, the switching structure can be used to switch the gas transmission structure to output the carrier gas into the storage body 1 through both the first air outlet 231 and the second air outlet 241 (as shown in Figure 1As shown, at this time, the carrier gas provided by the carrier gas source can enter the gas transmission structure and be output into the storage body 1 through the first air outlet 231 and the second air outlet 241 respectively. Since the first air outlet 231 is located above the liquid surface of the liquid source in the storage body 1, the first air outlet 231 can output the carrier gas above the liquid surface of the liquid source. And the second air outlet 241 is located below the liquid surface of the liquid source in the storage body 1, so the second air outlet 241 can output the carrier gas below the liquid surface of the liquid source (i.e., output into the liquid source), so as to be able to simultaneously transport the liquid source in the steam extraction mode and transport the liquid source in the bubbling mode, so as to reduce the change frequency of the steam pressure in the storage body 1 and reduce the switching frequency of the switching structure.

[0031] Optionally, the storage body 1 may include a liquid source bottle.

[0032] Optionally, the liquid source suitable for being transported in the steam extraction mode may include one of cobalt hexacarbonyl tert-butylacetylene and cobalt cyclopentadienyl dicarbonyl.

[0033] Optionally, the liquid source suitable for being transported in the bubbling mode may include one of titanium tetrakis(dimethylamino), trichlorosilane, trimethylgallium, and trimethylaluminum.

[0034] Optionally, the boiling point of the liquid source may be 0°C - 200°C.

[0035] Optionally, the carrier gas may include nitrogen or inert gas.

[0036] Optionally, the inert gas may include one of argon and helium.

[0037] In an embodiment of the present invention, the gas transmission structure may include a gas transmission chamber 21. The gas transmission chamber 21 is arranged in the storage body 1, and the first air outlet 231 and the second air outlet 241 are both arranged on the gas transmission chamber 21.

[0038] In practical applications, the carrier gas provided by the carrier gas source can first enter the gas transmission chamber 21 and then flow through the gas transmission chamber 21 to the first air outlet 231 and the second air outlet 241. In this way, when the steam pressure in the storage body 1 rises due to the bubbling mode of transporting the liquid source, which may cause the liquid source in the storage body 1 to possibly backflow into the gas transmission structure, the gas transmission chamber 21 can be used to buffer the backflow of the liquid source. That is to say, even if the liquid source in the storage body 1 backflows, the liquid source will first backflow into the gas transmission chamber 21 through the second air outlet 241, so as to avoid the liquid source directly backflowing into the carrier gas source. And, when the steam pressure in the storage body 1 rises and the switching structure switches the bubbling mode of transporting the liquid source to the steam extraction mode of transporting the liquid source, the liquid source backflowed into the gas transmission chamber 21 can also flow back into the storage body 1 through the second air outlet 241, thereby further improving the use stability.

[0039] Optionally, the gas delivery chamber 21 can be columnar.

[0040] In an embodiment of the present invention, the gas delivery chamber 21 can include a chamber main body, a first gas outlet pipe 23, and a second gas outlet pipe 24. The chamber main body is used to communicate with a carrier gas source. One end of the first gas outlet pipe 23 communicates with the chamber main body, and the other end of the first gas outlet pipe 23 serves as a first gas outlet 231. One end of the second gas outlet pipe 24 communicates with the chamber main body, and the other end of the second gas outlet pipe 24 serves as a second gas outlet 241.

[0041] Optionally, one end of the first gas outlet pipe 23 can communicate with the bottom of the chamber main body, and the other end can serve as the first gas outlet 231. One end of the second gas outlet pipe 24 can communicate with the bottom of the chamber main body, and the other end can serve as the second gas outlet 241. In practical applications, the carrier gas can first enter the chamber main body, then enter at least one of the first gas outlet pipe 23 and the second gas outlet pipe 24 through the chamber main body, and then be output into the storage main body 1 through at least one of the first gas outlet 231 and the second gas outlet 241.

[0042] In an embodiment of the present invention, the gas delivery structure can further include a partition component. The partition component is disposed in the gas delivery chamber 21 and is used to partition the gas delivery chamber 21, so that the gas delivery chamber 21 has a mutually partitioned intake chamber 211, a first gas outlet chamber 212, and a second gas outlet chamber 213. The intake chamber 211 is used to communicate with a carrier gas source. The first gas outlet 231 and the second gas outlet 241 are respectively disposed corresponding to the first gas outlet chamber 212 and the second gas outlet chamber 213. The partition component has a first communication port 254 and a second communication port 255. The first communication port 254 communicates the intake chamber 211 and the first gas outlet chamber 212, and the second communication port 255 communicates the intake chamber 211 and the second gas outlet chamber 213. The switching structure switches the gas delivery structure to output the carrier gas into the storage main body 1 through at least one of the first gas outlet 231 and the second gas outlet 241 by controlling the opening and closing of the first communication port 254 and the second communication port 255.

[0043] That is to say, the intake cavity 211 can communicate with the first outlet cavity 212 through the first communication port 254 and can communicate with the second outlet cavity 213 through the second communication port 255. In practical applications, by controlling the opening of the first communication port 254 and closing the second communication port 255, the switching structure can make the intake cavity 211 communicate with the first outlet cavity 212 and prevent the intake cavity 211 from communicating with the second outlet cavity 213. As a result, the gas delivery structure can output the carrier gas into the storage main body 1 through the first outlet 231 and prevent the gas delivery structure from outputting the carrier gas into the storage main body 1 through the second outlet 241. In this way, the carrier gas provided by the carrier gas source can first enter the intake cavity 211, then enter the first outlet cavity 212 through the first communication port 254, and then be output into the storage main body 1 through the first outlet 231, instead of entering the second outlet cavity 213 through the second communication port 255. By controlling the closing of the first communication port 254 and the opening of the second communication port 255, the switching structure can make the intake cavity 211 communicate with the second outlet cavity 213 and prevent the intake cavity 211 from communicating with the first outlet cavity 212. As a result, the gas delivery structure can output the carrier gas into the storage main body 1 through the second outlet 241 and prevent the gas delivery structure from outputting the carrier gas into the storage main body 1 through the first outlet 231. In this way, the carrier gas provided by the carrier gas source can first enter the intake cavity 211, then enter the second outlet cavity 213 through the second communication port 255, and then be output into the storage main body 1 through the second outlet 241, instead of entering the first outlet cavity 212 through the first communication port 254. By controlling the opening of both the first communication port 254 and the second communication port 255, the switching structure can make the intake cavity 211 communicate with both the first outlet cavity 212 and the second outlet cavity 213. As a result, the gas delivery structure can output the carrier gas into the storage main body 1 through both the first outlet 231 and the second outlet 241. In this way, the carrier gas provided by the carrier gas source can first enter the intake cavity 211, then enter the first outlet cavity 212 through the first communication port 254, and then be output into the storage main body 1 through the first outlet 231, and enter the second outlet cavity 213 through the second communication port 255, and then be output into the storage main body 1 through the second outlet 241.

[0044] In an embodiment of the present invention, the separation component may include a first partition plate 251, a second partition plate 252, and a third partition plate 253. At least a part of the first partition plate 251 is vertically arranged in the air delivery chamber 21 and is sealed between the bottom wall of the air delivery chamber 21 and the peripheral walls on the opposite two sides of the air delivery chamber 21 respectively. The second partition plate 252 and the third partition plate 253 are sealed between the first partition plate 251 and the peripheral wall of the air delivery chamber 21 respectively, so as to form an air inlet chamber 211 between the second partition plate 252, the third partition plate 253, the top wall of the air delivery chamber 21, and the peripheral wall of the air delivery chamber 21, form a first air outlet chamber 212 between the second partition plate 252, the first partition plate 251, the bottom wall of the air delivery chamber 21, and the peripheral wall of the air delivery chamber 21, form a second air outlet chamber 213 between the third partition plate 253, the first partition plate 251, the bottom wall of the air delivery chamber 21, and the peripheral wall of the air delivery chamber 21. A first communication port 254 is arranged on the second partition plate 252, and a second communication port 255 is arranged on the third partition plate 253.

[0045] By arranging the first communication port 254 on the second partition plate 252, the first communication port 254 can communicate the air inlet chamber 211 and the first air outlet chamber 212. By arranging the second communication port 255 on the third partition plate 253, the second communication port 255 can communicate the air inlet chamber 211 and the second air outlet chamber 213.

[0046] Optionally, the second partition plate 252 may be sealed with half of the peripheral wall of the air delivery chamber 21, and the third partition plate 253 may be sealed with the other half of the peripheral wall of the air delivery chamber 21.

[0047] Optionally, at least one of the second partition plate 252 and the third partition plate 253 may be arranged horizontally.

[0048] In an embodiment of the present invention, the switching structure may include a first baffle 31, a second baffle 32, and a driving component 33. The first baffle 31 is located below the second partition plate 252 and corresponds to the first communication port 254 for blocking the first communication port 254. The second baffle 32 is located above the third partition plate 253 and corresponds to the second communication port 255 for blocking the second communication port 255. The driving component 33 is connected to the first baffle 31 and the second baffle 32 respectively, and is used to control the first baffle 31 to approach or move away from the first communication port 254 and control the second baffle 32 to move away from or approach the second communication port 255 by driving the first baffle 31 and the second baffle 32 to move up and down.

[0049] In practical applications, by driving the first baffle 31 and the second baffle 32 to rise, the driving component 33 can make the first baffle 31 approach the first communication port 254 and the second baffle 32 move away from the second communication port 255. Thus, the first baffle 31 can block the first communication port 254 to close the first communication port 254, and the second baffle 32 does not block the second communication port 255 to open the second communication port 255. Furthermore, the carrier gas entering the intake chamber 211 cannot enter the first outlet chamber 212 through the first communication port 254 but can enter the second outlet chamber 213 through the second communication port 255. By driving the first baffle 31 and the second baffle 32 to descend, the driving component 33 can make the first baffle 31 move away from the first communication port 254 and the second baffle 32 approach the second communication port 255. Thus, the first baffle 31 does not block the first communication port 254 to open the first communication port 254, and the second baffle 32 blocks the second communication port 255 to close the second communication port 255. Furthermore, the carrier gas entering the intake chamber 211 can enter the first outlet chamber 212 through the first communication port 254 but cannot enter the second outlet chamber 213 through the second communication port 255. During the process of the driving component 33 driving the first baffle 31 and the second baffle 32 to move up and down, the first baffle 31 may not block the first communication port 254, and the second baffle 32 may not block the second communication port 255 either. At this time, both the first communication port 254 and the second communication port 255 are open, and the carrier gas entering the intake chamber 211 can enter the first outlet chamber 212 through the first communication port 254 and also enter the second outlet chamber 213 through the second communication port 255.

[0050] In an embodiment of the present invention, the driving component 33 may include a driving source 331 and a transmission member 332. The first partition 251 may be provided with a through hole for the transmission member 332 to penetrate. The driving source 331 is disposed outside the storage body 1 and is used to provide the lifting driving force. The transmission member 332 penetrates from outside the storage body 1 into the storage body 1 and extends above the first partition 251 through the through hole. The driving source 331 is connected to the first baffle 31 and the second baffle 32 respectively through the transmission member 332.

[0051] That is to say, the transmission member 332 penetrates from outside the storage body 1 into the storage body 1 and extends into the intake chamber 211 through the through hole. In practical applications, the driving source 331 drives the transmission member 332 to move up and down to drive the first baffle 31 and the second baffle 32 to move up and down.

[0052] Optionally, the transmission member 332 may include a transmission rod.

[0053] In an embodiment of the present invention, the separation component may further include a telescopic separator 256. The switching structure further includes a fixed connection plate 34, a first connecting rod 35, and a second connecting rod 36. The fixed connection plate 34 is hermetically connected to the end of the transmission member 332 above the second partition plate 252 and the third partition plate 253. The first connecting rod 35 is disposed through the first communication port 254. The first baffle 31 is connected to the fixed connection plate 34 through the first connecting rod 35. The second baffle 32 is connected to the fixed connection plate 34 through the second connecting rod 36. The telescopic separator 256 is sleeved outside the part of the transmission member 332 above the first partition plate 251 and is hermetically sealed between the fixed connection plate 34 and the first partition plate 251 respectively, and the telescopic separator 256 can be telescoped in the direction of the lifting of the transmission member 332.

[0054] Specifically, the fixed connection plate 34 can be horizontally disposed at the top of the transmission member 332. The first connecting rod 35 can be vertically disposed on one side of the transmission member 332. The second connecting rod 36 can be vertically disposed on the other side of the transmission member 332. In practical applications, the driving source 331 drives the transmission member 332 to lift and lower. The transmission member 332 drives the fixed connection plate 34 to lift and lower. The fixed connection plate 34 drives the first connecting rod 35 and the second connecting rod 36 to lift and lower. The first connecting rod 35 drives the first baffle 31 to lift and lower. The second connecting rod 36 drives the second baffle 32 to lift and lower, so as to realize that the driving component 33 drives the first baffle 31 and the second baffle 32 to lift and lower. By sleeving the telescopic separator 256 outside the part of the transmission member 332 above the first partition plate 251 and hermetically sealing between the telescopic separator 256 and the fixed connection plate 34 and the first partition plate 251 respectively, the gap between the transmission member 332 and the first partition plate 251 can be sealed by the telescopic separator 256, preventing the carrier gas in the intake cavity 211 from entering the gap between the transmission member 332 and the first partition plate 251, thereby avoiding the leakage of the carrier gas in the intake cavity 211. Moreover, the telescopic separator 256 can be driven by the fixed connection plate 34 to be telescoped along with the lifting and lowering of the fixed connection plate 34, avoiding interference with the lifting and lowering of the fixed connection plate 34.

[0055] Optionally, the telescopic separator 256 may include a telescopic tube.

[0056] Optionally, the top end of the telescopic separator 256 can be connected to the fixed connection plate 34. A top assembly groove can be provided at the top end of the telescopic separator 256. A top sealing ring can be embedded in the top assembly groove for sealing between the top end of the telescopic separator 256 and the fixed connection plate 34. The bottom end of the telescopic separator 256 can be connected to the first partition plate 251. A bottom assembly groove can be provided at the bottom end of the telescopic separator 256. A bottom sealing ring can be embedded in the bottom assembly groove for sealing between the bottom end of the telescopic separator 256 and the first partition plate 251.

[0057] In an embodiment of the present invention, the first partition 251 may penetrate through the gas transmission chamber 21 and extend to the bottom wall of the storage body 1, and is sealed with the bottom wall of the storage body 1, and is sleeved outside the part of the transmission member 332 located in the storage body 1.

[0058] With such a design, the gap between the transmission member 332 and the bottom wall of the storage body 1 can be sealed by the first partition 251, preventing the carrier gas in the first gas outlet chamber 212 or the second gas outlet chamber 213 from entering the gap between the transmission member 332 and the bottom wall of the storage body 1, thereby avoiding the leakage of the carrier gas in the first gas outlet chamber 212 or the second gas outlet chamber 213.

[0059] Optionally, the part of the first partition 251 disposed outside the gas transmission chamber 21 and located between the gas transmission chamber 21 and the bottom wall of the storage body 1 may be vertically arranged.

[0060] In an embodiment of the present invention, a first sealing ring 41 may be provided on one of the two opposite surfaces of the first baffle 31 and the second partition 252. The first sealing ring 41 is correspondingly arranged with the first communication port 254 and is used to seal between the first baffle 31 and the second partition 252 when the first baffle 31 contacts the second partition 252. A second sealing ring 42 may be provided on one of the two opposite surfaces of the second baffle 32 and the third partition 253. The second sealing ring 42 is correspondingly arranged with the second communication port 255 and is used to seal between the second baffle 32 and the third partition 253 when the second baffle 32 contacts the third partition 253.

[0061] As Figures 1 - 3 shown, optionally, the first sealing ring 41 may be provided on the bottom surface of the second partition 252 and correspondingly arranged with the first communication port 254. During the process of the first baffle 31 rising close to the second partition 252 and the first communication port 254, the first baffle 31 may be blocked by the first sealing ring 41, thereby sealing between the first baffle 31 and the second partition 252 through the first sealing ring 41 and preventing the carrier gas in the intake chamber 211 from entering the first communication port 254 through the gap between the first baffle 31 and the second partition 252. However, the first sealing ring 41 is not limited to being provided on the bottom surface of the second partition 252. For example, the first sealing ring 41 may also be provided on the top surface of the first baffle 31.

[0062] As Figures 1 - 3As shown, optionally, the second sealing ring 42 may be disposed on the top surface of the third partition plate 253 and correspondingly disposed with the second communication port 255. During the process of the second baffle plate 32 descending close to the third partition plate 253 and the second communication port 255, the second baffle plate 32 may be blocked by the second sealing ring 42, so as to seal between the second baffle plate 32 and the third partition plate 253 through the second sealing ring 42, and prevent the carrier gas in the intake cavity 211 from entering the second communication port 255 through the gap between the second baffle plate 32 and the third partition plate 253. However, the second sealing ring 42 is not limited to being disposed on the bottom surface of the third partition plate 253. For example, the second sealing ring 42 may also be disposed on the bottom surface of the second baffle plate 32.

[0063] Optionally, the material of the first sealing ring and / or the material of the second sealing ring is a fluorine-containing rubber material.

[0064] In an embodiment of the present invention, the liquid source storage device may further include a pressure detection device 5, and the pressure detection device 5 is cooperatively disposed with the storage main body 1 for detecting the pressure inside the storage main body 1.

[0065] Optionally, the pressure detection device 5 may detect the vapor pressure inside the storage main body 1.

[0066] Optionally, the liquid source storage device may further include an intake pipe 22, and the intake pipe 22 penetrates from outside the storage main body 1 into the storage main body 1, and the gas transmission chamber 21 is communicated with the carrier gas source through the intake pipe 22.

[0067] Specifically, one end of the intake pipe 22 may be communicated with the top of the gas transmission chamber 21, and the other end may have an air inlet 221, and the intake pipe 22 is communicated with the carrier gas source through the air inlet 221. In practical applications, the carrier gas provided by the carrier gas source may first enter the intake pipe 22 through the air inlet 221, and then enter the gas transmission chamber 21 through the intake pipe 22.

[0068] Optionally, the material of one or more of the intake pipe 22, the first connecting rod 35, the second connecting rod 36, the telescopic separator 256, the transmission member 332, the fixed connecting plate 34, the first partition plate 251, the second partition plate 252, the third partition plate 253, the first baffle plate 31 and the second baffle plate 32 is a stainless steel material.

[0069] Optionally, the fixed connecting plate 34 and the first connecting rod 35 may be welded, and / or the fixed connecting plate 34 and the second connecting rod 36 are welded.

[0070] Optionally, the second partition plate 252 and the peripheral wall of the gas transmission chamber 21 may be welded, and / or the third partition plate 253 and the peripheral wall of the gas transmission chamber 21 may be welded.

[0071] This can achieve the sealing between the second partition plate 252 and the peripheral wall of the gas transmission chamber 21, and / or the sealing between the third partition plate 253 and the peripheral wall of the gas transmission chamber 21.

[0072] Optionally, the first partition plate 251 and the bottom wall of the storage main body 1 can be welded.

[0073] This can achieve the sealing between the first partition plate 251 and the bottom wall of the storage main body 1.

[0074] Optionally, the liquid source storage device may further include an exhaust pipe 6. The horizontal position of the gas inlet 61 of the exhaust pipe 6 can be higher than or equal to the horizontal position of the higher one of the first gas outlet 231 and the second gas outlet 241. The storage main body 1 is communicated with the process chamber of the semiconductor device through the exhaust pipe 6.

[0075] That is to say, when a liquid source is stored in the storage main body 1, the gas inlet 61 of the exhaust pipe 6 can be located above the liquid level of the liquid source. In practical applications, the carrier gas carrying the liquid source vapor can enter the exhaust pipe 6 through the gas inlet 61, and then enter the process chamber through the exhaust pipe 6 to realize the semiconductor process.

[0076] Optionally, the inlet pipe 22 can be provided with an inlet pneumatic valve 222 and an inlet manual valve 223 at intervals. Both the inlet pneumatic valve 222 and the inlet manual valve 223 can control the on / off of the inlet pipe 22.

[0077] In practical applications, when the liquid source storage device needs to be maintained or transported, the inlet pipe 22 can be made in an open circuit state by closing the inlet manual valve 223. Controlling the on / off of the inlet pipe 22 by means of the inlet manual valve 223 can improve the stability of the on / off of the inlet pipe 22.

[0078] Optionally, the exhaust pipe 6 can be provided with an exhaust pneumatic valve 62 and an exhaust manual valve 63 at intervals. Both the exhaust pneumatic valve 62 and the exhaust manual valve 63 can control the on / off of the exhaust pipe 6.

[0079] In practical applications, when the liquid source storage device needs to be maintained or transported, the exhaust pipe 6 can be made in an open circuit state by closing the exhaust manual valve 63. Controlling the on / off of the exhaust pipe 6 by means of the exhaust manual valve 63 can improve the stability of the on / off of the exhaust pipe 6.

[0080] Optionally, the liquid source storage device may further include an intermediate pipe 7 and an intermediate valve 71. The intermediate pipe 7 can be communicated with the inlet pipe 22 through the inlet manual valve 223 and can be communicated with the exhaust pipe 6 through the exhaust manual valve 63. The intermediate valve 71 is arranged on the intermediate pipe 7 and is used to control the on / off of the intermediate pipe 7.

[0081] Specifically, the intermediate pipe 7 can be connected to the intake hand valve 223 and the exhaust hand valve 63 respectively. In this way, when the intake hand valve 223 is opened, the intermediate pipe 7 is connected to the intake pipe 22; when the intake hand valve 223 is closed, the intermediate pipe 7 is disconnected from the intake pipe 22; when the exhaust hand valve 63 is opened, the intermediate pipe 7 is connected to the exhaust pipe 6; when the exhaust hand valve 63 is closed, the intermediate pipe 7 is disconnected from the exhaust pipe 6.

[0082] In summary, the liquid source storage device provided by the embodiment of the present invention can be compatible with multiple liquid source transportation methods, and can switch between multiple liquid source transportation methods in semiconductor processes, thereby avoiding the problems brought by a single liquid source transportation method, improving the use stability and flexibility, and reducing the procurement cost and the storage difficulty.

[0083] It can be understood that the above embodiments are only exemplary embodiments adopted to illustrate the principle of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.

Claims

1. A liquid source storage device for storing and supplying a liquid source to a semiconductor process chamber, characterized in that It includes a storage body, a gas transmission structure, and a switching structure. Among them, the storage body is used to store the liquid source; the gas transmission structure is used to communicate with the carrier gas source and has a first gas outlet and a second gas outlet, and the first gas outlet and the second gas outlet are located at different horizontal positions within the storage body; the switching structure is cooperatively arranged with the gas transmission structure and is used to switch the gas transmission structure to output the carrier gas into the storage body through at least one of the first gas outlet and the second gas outlet.

2. The liquid source storage device according to claim 1, wherein The gas transmission structure includes a gas transmission chamber, the gas transmission chamber is arranged within the storage body, and both the first gas outlet and the second gas outlet are arranged on the gas transmission chamber.

3. The liquid source storage device according to claim 2, wherein, The gas transmission chamber includes a chamber main body, a first gas outlet pipe, and a second gas outlet pipe. The chamber main body is used to communicate with the carrier gas source. One end of the first gas outlet pipe is communicated with the chamber main body, and the other end of the first gas outlet pipe serves as the first gas outlet. One end of the second gas outlet pipe is communicated with the chamber main body, and the other end of the second gas outlet pipe serves as the second gas outlet.

4. The liquid source storage device according to claim 2, characterized in that, The gas transmission structure further includes a partition component. The partition component is arranged within the gas transmission chamber and is used to partition the gas transmission chamber, so that there are an intake chamber, a first gas outlet chamber, and a second gas outlet chamber that are separated from each other within the gas transmission chamber. The intake chamber is used to communicate with the carrier gas source. The first gas outlet and the second gas outlet are respectively arranged corresponding to the first gas outlet chamber and the second gas outlet chamber. The partition component has a first communication port and a second communication port. The first communication port communicates the intake chamber and the first gas outlet chamber, and the second communication port communicates the intake chamber and the second gas outlet chamber. The switching structure switches the gas transmission structure to output the carrier gas into the storage body through at least one of the first gas outlet and the second gas outlet by controlling the opening and closing of the first communication port and the second communication port.

5. The liquid source storage device according to claim 4, characterized in that, The partition component includes a first partition board, a second partition board, and a third partition board. At least a part of the first partition board is vertically arranged within the gas transmission chamber and is respectively sealed between the bottom wall of the gas transmission chamber and the opposite side peripheral walls of the gas transmission chamber. The second partition board and the third partition board are respectively sealed between the first partition board and the peripheral wall of the gas transmission chamber, so as to form the intake chamber between the second partition board, the third partition board, the top wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber, form the first gas outlet chamber between the second partition board, the first partition board, the bottom wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber, and form the second gas outlet chamber between the third partition board, the first partition board, the bottom wall of the gas transmission chamber, and the peripheral wall of the gas transmission chamber. The first communication port is arranged on the second partition board, and the second communication port is arranged on the third partition board.

6. The liquid source storage device according to claim 5, wherein, The switching structure includes a first baffle, a second baffle and a driving component. The first baffle is located below the second partition and corresponds to the first communication port, and is used to block the first communication port. The second baffle is located above the third partition and corresponds to the second communication port, and is used to block the second communication port. The driving component is respectively connected to the first baffle and the second baffle, and is used to control the first baffle to approach or move away from the first communication port and control the second baffle to move away from or approach the second communication port by driving the first baffle and the second baffle to move up and down.

7. The liquid source storage device according to claim 6, characterized in that, The driving component includes a driving source and a transmission member. The first partition is provided with a through hole for the transmission member to pass through. The driving source is arranged outside the storage body and is used to provide the lifting driving force. The transmission member penetrates into the storage body from outside the storage body and extends above the first partition through the through hole. The driving source is connected to the first baffle and the second baffle respectively through the transmission member.

8. The liquid source storage device according to claim 7, wherein, The separation assembly further includes a telescopic isolation member. The switching structure further includes a fixed connection plate, a first connecting rod and a second connecting rod. The fixed connection plate is hermetically connected to the end of the transmission member located above the second partition and the third partition. The first connecting rod penetrates through the first communication port. The first baffle is connected to the fixed connection plate through the first connecting rod. The second baffle is connected to the fixed connection plate through the second connecting rod. The telescopic isolation member is sleeved outside the part of the transmission member located above the first partition and is sealed between the fixed connection plate and the first partition respectively, and the telescopic isolation member can be telescoped in the direction of the lifting of the transmission member.

9. The liquid source storage device according to claim 7, characterized in that, The first partition penetrates through the gas transmission chamber and extends to the bottom wall of the storage body, and is sealed with the bottom wall of the storage body, and is sleeved outside the part of the transmission member located inside the storage body.

10. The liquid source storage device according to claim 6, characterized in that, One of the two surfaces of the first baffle opposite to the second partition is provided with a first sealing ring, and the first sealing ring is arranged corresponding to the first communication port and is used to seal between the first baffle and the second partition when the first baffle is in contact with the second partition. One of the two surfaces of the second baffle opposite to the third partition is provided with a second sealing ring, and the second sealing ring is arranged corresponding to the second communication port and is used to seal between the second baffle and the third partition when the second baffle is in contact with the third partition.

11. The liquid source storage device according to claim 1, characterized in that, The liquid source storage device further includes a pressure detection device, and the pressure detection device is cooperatively arranged with the storage body and is used to detect the pressure inside the storage body.

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