Probe structure for suppressing electric field disturbance of Rydberg atoms based on multilayer dielectric method

Abstract

The present invention discloses a probe structure for suppressing Rydberg atomic electric field disturbances based on a multi-layer dielectric method, comprising an atomic gas chamber, a dielectric base, and a dielectric insert; the dielectric base and dielectric insert are made of non-conductive dielectric material; the atomic gas chamber is disposed on the dielectric base, and at least two dielectric inserts are detachably disposed on both sides of the dielectric base and are respectively attached to opposite sides of the atomic gas chamber. The present invention does not require complex micromachining processes and does not rely on the electromagnetic control capabilities of metamaterials. The thickness of the dielectric insert compensates for the disturbance of the electric field by the atomic gas chamber, allowing large-sized atomic gas chambers to improve atomic detection sensitivity, and is suitable for atomic gas chambers of various frequencies and sizes. The present invention achieves Rydberg atomic electric field disturbance suppression based on the multi-layer dielectric method, which can achieve more accurate and reliable signal measurement and restoration.

Description

Technical Field

[0001] The present invention relates to the technical field of microwave electric field measurement, and in particular to a probe structure for suppressing Rydberg atom electric field disturbance based on a multilayer dielectric method. Background Art

[0002] Electric field strength is one of the seven key quantities of radio metrology defined by the International Committee for Weights and Measures. Currently, dipole antennas are commonly used as electric field probes to measure the field under test. This method requires a known electric field for calibration (which results in a complex traceability chain), and there are problems such as metal components disturbing the field under test, resolution being limited by antenna size (small antennas have low sensitivity), and high uncertainty.

[0003] The Rydberg atom antenna converts electric field measurements into precise frequency measurements, and ultimately measures the electric field strength by optically detecting the splitting width. This measurement method has the advantages of self-calibration and direct traceability of the electric field amplitude to the International System of Units (SI). However, although Rydberg atoms can be used for precise measurement of microwave electric fields, there are still many problems in establishing a quantum metrology benchmark based on this method. Among them, the standing wave effect of the atomic gas cell, electromagnetic scattering, and the perturbation effect of polarization mismatch are the largest error terms in microwave electric field measurements. This is especially evident at high frequencies or with larger gas cell sizes.

[0004] Current approaches to suppressing electromagnetic disturbances in atomic gas cells primarily include reducing the size of the gas cell, thinning the walls of the gas cell, and regulating the electromagnetic metasurface structure. The smaller the ratio of the atomic gas cell size to the microwave wavelength, the weaker the gas cell's scattering of the electric field and the standing wave effect. However, when the atomic gas cell size is reduced, the effective interaction length between light and atoms decreases, limiting signal detection efficiency. The thin-walled design of the atomic gas cell (e.g., wall thickness ≤ 1 mm) makes the gas cell susceptible to damage from physical impact. Electromagnetic metasurface structures are fabricated on the surface of borosilicate glass or quartz atomic gas cells through processes such as photolithography, metal deposition, and bonding. This method requires high precision for the periodic array structure, increasing manufacturing difficulty and cost. Summary of the Invention

[0005] In response to the shortcomings of the existing technology, the present invention aims to provide a probe structure for suppressing Rydberg atomic electric field disturbances based on the multi-layer dielectric method. By adding non-conductive dielectric materials to the outside of the atomic gas chamber, the disturbance of the atomic gas chamber on the electric field is suppressed. The probe structure can be applied to gas chambers of various sizes within a wide frequency band.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions:

[0007] A probe structure for suppressing Rydberg atomic electric field disturbances based on a multi-layer dielectric method comprises an atomic gas chamber, a dielectric base, and a dielectric insert; the dielectric base and the dielectric insert are made of non-conductive dielectric material; the atomic gas chamber is arranged on the dielectric base, and at least two dielectric inserts are detachably arranged on two sides of the dielectric base and respectively adhered to opposite sides of the atomic gas chamber.

[0008] Furthermore, an air chamber groove is provided on the dielectric base, and the bottom of the atomic air chamber is embedded in the air chamber groove.

[0009] Furthermore, two plug posts are provided on both sides of the dielectric base, and slots are provided on opposite sides of the two plug posts on the same side, and the upper ends of the slots are open; the two sides of the dielectric insert are respectively inserted into the slots of the two plug posts on the same side.

[0010] Furthermore, the atomic gas chamber is cylindrical, cube or cuboid.

[0011] As a more preferred solution, the atomic gas chamber is in the shape of a cube.

[0012] Furthermore, the glass shell of the atomic gas chamber is made of high borosilicate glass, quartz glass or sapphire.

[0013] As a more preferred solution, the glass shell of the atomic gas chamber is made of high borosilicate glass with a dielectric constant of 4.4 and a dielectric loss of 0.00037.

[0014] Furthermore, the dielectric base and the dielectric insert are made of the same non-conductive dielectric material, and the non-conductive dielectric material is alumina ceramics, polyetheretherketone, acrylonitrile / butadiene / styrene copolymer plate or polytetrafluoroethylene.

[0015] Furthermore, the dielectric base, dielectric insert and glass shell of the atomic gas chamber are precisely polished to a surface roughness of <10 nm.

[0016] The beneficial effects of the present invention are:

[0017] 1. The present invention compensates for the disturbance of the atomic gas cell to the electric field by the thickness of the dielectric insert made of non-conductive dielectric material, allowing for large-sized atomic gas cells to improve atomic detection sensitivity. It is applicable to atomic gas cells of various frequencies and sizes, does not require complex micromachining processes, and does not rely on the electromagnetic control capabilities of metamaterials.

[0018] 2. The present invention realizes Rydberg atom electric field disturbance suppression based on the multilayer dielectric method, which can achieve more accurate and reliable signal measurement and restoration. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1Schematic diagram of the probe structure in an embodiment of the present invention (the dielectric insert thickness is 1 mm);

[0020] Figure 2 Schematic diagram of the probe structure in an embodiment of the present invention (the dielectric insert is 5 mm thick);

[0021] Figure 3 Schematic diagram of a dielectric base in a probe structure according to an embodiment of the present invention;

[0022] Figure 4 The electric field distribution diagram of different positions of the atomic gas chamber at 17.04 GHz obtained from the experiment of the embodiment of the present invention;

[0023] Figure 5 The relationship between microwave frequency and coefficient of variation under different dielectric insert thickness combinations obtained from experiments in an embodiment of the present invention is shown. DETAILED DESCRIPTION

[0024] The present invention will be further described below in conjunction with the accompanying drawings. It should be noted that this embodiment is based on the technical solution and provides a detailed implementation method and specific operation process, but the protection scope of the present invention is not limited to this embodiment. Example 1

[0025] This embodiment provides a probe structure for suppressing Rydberg atom electric field disturbance based on a multilayer dielectric method, such as Figure 1-3 As shown, it includes an atomic gas chamber 1, a dielectric base 2 and a dielectric insert 3; the dielectric base 2 and the dielectric insert 3 are made of non-conductive dielectric material; the atomic gas chamber 1 is arranged on the dielectric base 2, and at least two dielectric inserts 3 can be detachably arranged on both sides of the dielectric base and are respectively attached to the opposite sides of the atomic gas chamber.

[0026] In this embodiment, a gas chamber groove 21 is provided on the dielectric base 2 , and the bottom of the atomic gas chamber 1 is embedded in the gas chamber groove 21 .

[0027] In this embodiment, two pins 22 are provided on both sides of the dielectric base 2. Opposite sides of the two pins 22 on the same side are provided with slots 23, with the upper ends of the slots 23 being open. The two sides of the dielectric insert 3 are respectively inserted into the slots 23 of the two pins 22 on the same side. When installing the dielectric insert, the two sides of the dielectric insert 3 are respectively inserted into the upper ends of the slots 23 of the two pins 22. When the dielectric insert needs to be replaced, the dielectric insert 3 is pulled upward to complete the separation from the dielectric base 2. This allows the reflection coefficient to be reduced by replacing dielectric inserts of different thicknesses, such as Figure 1 and Figure 2 , Figure 1 The thickness of the dielectric insert is 1mm. Figure 2The thickness of the dielectric insert is 5 mm.

[0028] Furthermore, the atomic gas chamber 1 can be cylindrical, cubic, or rectangular. This embodiment employs a cubic shape, which is more suitable for the design and processing of the dielectric base and dielectric insert. When a cylindrical atomic gas chamber is used, the dielectric insert can be annular, and similar disturbance suppression effects can be achieved by adjusting the thickness of the ring.

[0029] Furthermore, the glass shell of the atomic gas chamber 1 can be made of high borosilicate glass, quartz glass or sapphire. This embodiment uses high borosilicate glass with a dielectric constant of 4.4 and a dielectric loss of 0.00037, which has excellent heat resistance and can be used for gas chambers with complex structures.

[0030] Furthermore, the dielectric base 2 can be made of non-conductive dielectric materials such as alumina ceramic (ε=9.8), polyetheretherketone (PEEK) (ε=3.2), acrylonitrile / butadiene / styrene copolymer board (ABS) (ε=2.8), and polytetrafluoroethylene (ε=2.1). Specifically, the material with matching dielectric constant can be selected according to the target frequency band.

[0031] Furthermore, the dielectric insert 3 is made of the same material as the dielectric base 2 .

[0032] In this embodiment, the dielectric base 2 , dielectric insert 3 and the glass shell of the atomic gas cell 1 are precisely polished to a surface roughness of less than 10 nm, thereby ensuring seamless fitting of the dielectric insert and the atomic gas cell. Example 2

[0033] This embodiment further illustrates the performance of the probe structure described in embodiment 1 through experiments.

[0034] A two-photon excitation scheme is used to excite ground-state atoms into Rydberg states. The probe light is 780 nm, and the coupled light is 480 nm. The probe and coupled light beams are collimated and transmitted in opposite directions through an atomic gas chamber filled with rubidium vapor. Upon entering the atomic gas chamber, the rubidium atoms are excited into Rydberg states, forming an electromagnetically induced transparency (EIT) window. A microwave electric field is then added to couple the Rydberg transition, creating EIT-AT splitting. Signal acquisition is performed using a photodetector. After data processing and calculation, the electric field intensity is output.

[0035] By moving the position of the atomic gas cell in the direction of microwave propagation, the change of the electric field intensity on the laser path is measured. The disturbance of the atomic gas cell is characterized by the coefficient of variation of the microwave electric field distribution at different positions. The coefficient of variation is the ratio of the standard deviation to the mean value, that is:

[0036]

[0037] The coefficient of variation represents the standard deviation of the electric field strength at different locations within the atomic gas chamber, which is the average value. A larger coefficient of variation indicates a greater dispersion of the electric field strength at different locations within the atomic gas chamber, indicating a greater disturbance within the atomic gas chamber.

[0038] This example uses a low-disturbance test at a microwave frequency of 17.04 GHz as an example. A cubic atomic gas chamber with a side length of 30 mm and a wall thickness of 1 mm, made of borosilicate glass, is used. Electromagnetic simulation software is used to simulate a plane wave incident on the atomic gas chamber. The electric field intensity distribution at different locations within the atomic gas chamber at 17.04 GHz is obtained for both sides with dielectric inserts attached (i.e., with multiple dielectric layers, 2 mm thick) and without dielectric inserts (i.e., without multiple dielectric layers), as shown in the following example: Figure 4 As shown in the figure, when the multilayer dielectric is present, the electric field strength received by the atomic gas chamber fluctuates slightly at different locations, with a coefficient of variation of 7%. Without the multilayer dielectric, the electric field strength received by the atomic gas chamber fluctuates significantly at different locations, with a coefficient of variation of 13%. Therefore, the probe structure described in this embodiment can effectively reduce the interference of the atomic gas chamber itself on the electromagnetic signal, achieving accurate measurement.

[0039] Figure 5 The figure shows the relationship between microwave frequency and coefficient of variation for different dielectric insert thicknesses. The smaller the coefficient of variation, the lower the disturbance of the probe to the electric field. Taking a coefficient of variation of 10% as the cutoff, the low-disturbance design of the Rydberg atomic electric field probe within a wide frequency band can be achieved by using dielectric inserts of different thicknesses.

[0040] As can be seen, the probe structure of Example 1, through the provision of dielectric inserts, can reduce the coefficient of variation of electric field perturbation suppression by 46% (from 13% to 7%). Furthermore, precision machining can avoid multiple reflections caused by interlayer air gaps. The probe structure of this embodiment can be combined with high-precision optical detection and signal processing, and is suitable for fields such as quantum sensing and nondestructive testing.

[0041] Those skilled in the art can make various corresponding changes and modifications based on the above technical solutions and concepts, and all of these changes and modifications should be included in the scope of protection of the claims of the present invention.

Claims

1. A probe structure for suppressing Rydberg atom electric field disturbance based on a multilayer dielectric method, characterized in that: The device comprises an atomic gas chamber, a dielectric base and a dielectric insert; the dielectric base and the dielectric insert are made of non-conductive dielectric material; the atomic gas chamber is arranged on the dielectric base, and at least two dielectric inserts are detachably arranged on two sides of the dielectric base and respectively attached to opposite sides of the atomic gas chamber; Two plug posts are provided on both sides of the dielectric base, and slots are provided on opposite sides of the two plug posts on the same side, and the upper ends of the slots are open; the two sides of the dielectric insert are respectively inserted into the slots of the two plug posts on the same side; The dielectric base and the dielectric insert are made of the same non-conductive dielectric material, which is alumina ceramics, polyetheretherketone, acrylonitrile / butadiene / styrene copolymer plate or polytetrafluoroethylene.

2. The probe structure according to claim 1, characterized in that: An air chamber groove is provided on the dielectric base, and the bottom of the atomic air chamber is embedded in the air chamber groove.

3. The probe structure according to claim 1, characterized in that: The atomic gas chamber is cylindrical, cubic or rectangular.

4. The probe structure according to claim 3, characterized in that: The atomic gas chamber is in the shape of a cube.

5. The probe structure according to claim 1, characterized in that: The glass shell of the atomic gas cell is made of high borosilicate glass, quartz glass or sapphire.

6. The probe structure according to claim 5, characterized in that: The glass shell of the atomic gas cell is made of high borosilicate glass with a dielectric constant of 4.4 and a dielectric loss of 0.00037.

7. The probe structure according to claim 1, characterized in that: The dielectric base, dielectric insert and glass shell of the atomic gas chamber are precisely polished to a surface roughness of less than 10 nm.

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