Optical filter substrate, forming method of optical filter substrate, liquid crystal display and forming method of liquid crystal display

Abstract

The invention discloses an optical filter substrate and a forming method thereof, and a liquid crystal display and a forming method thereof, the optical filter substrate comprises a substrate, the substrate comprises a plurality of light-transmitting areas and a plurality of light-shielding areas, and the surface of each light-shielding area is provided with a light-shielding layer; the light filtering structure is positioned on the light-transmitting area of the substrate and a part of the light shielding layer; the supporting column structure is located on the light shielding layer and comprises a first supporting column; the wear-resistant layer is located at the top of the supporting column structure, and the hardness of the material of the wear-resistant layer is larger than that of the material of the supporting column structure. The supporting force of the supporting column structure is evenly distributed, and the display effect is improved.

Description

Technical Field

[0001] The present invention relates to the field of liquid crystal displays, and particularly to a filter substrate and a method for forming the same, a liquid crystal display and a method for forming the same. Background Art

[0002] Liquid crystal displays are currently the most widely used flat panel displays due to their high display quality, low cost, and portability. They have gradually become the displays with high-resolution color screens widely used in various electronic devices such as mobile phones, personal digital assistants, digital cameras, computer screens, or laptop screens.

[0003] Currently, the commonly used liquid crystal display devices display by controlling the optical properties of the outgoing light from the light source by using the liquid crystal layer filled in the liquid crystal display panel. Generally, they have an active matrix substrate, a filter substrate, and a liquid crystal layer disposed between them, and the thickness (cell gap) of the liquid crystal layer is maintained by using spacers disposed between the substrates. The filter substrate is a component that realizes color display in display devices such as liquid crystal display devices and has coloring layers of red (R), blue (B), green (G), etc.

[0004] However, the performance of existing liquid crystal displays still needs to be improved. Summary of the Invention

[0005] The technical problem solved by the present invention is to provide a filter substrate and a method for forming the same, a liquid crystal display and a method for forming the same, so as to improve the performance of the liquid crystal display.

[0006] To solve the above technical problem, the technical solution of the present invention provides a filter substrate, including: a substrate, the substrate includes a plurality of light-transmitting regions and a plurality of light-shielding regions, and a light-shielding layer is disposed on the surface of the light-shielding region; a filter structure located on the light-transmitting region of the substrate and on a part of the light-shielding layer; a support column structure located on the light-shielding layer, the support column structure includes a first support column; an anti-abrasion layer located on the top of the support column structure, and the hardness of the anti-abrasion layer material is greater than the hardness of the support column structure material.

[0007] Optionally, the top surface of the support column structure is a flat surface; the anti-abrasion layer is located on the top surface of the support column structure.

[0008] Optionally, the anti-abrasion layer has a first height h, the support column structure and the anti-abrasion layer have a total second height H, and the ratio h / H of the first height h to the second height H is greater than 10%.

[0009] Optionally, the top surface of the support column structure is a concave surface, and the top of the support column structure has a groove; the anti-abrasion layer is located in the groove at the top of the support column structure.

[0010] Optionally, the groove has a first depth d, the support pillar structure and the anti-wear layer have a total second height H, and the ratio d / H of the first depth d to the second height H is greater than or equal to 2% and less than or equal to 6%.

[0011] Optionally, the pencil hardness of the material of the anti-wear layer is greater than or equal to 3H.

[0012] Optionally, the material of the anti-wear layer includes an insulating material, and the insulating material includes: an organic material, an inorganic material or a composite material. The organic material includes acrylic or polyimide; the inorganic material includes silicon oxide or metal oxide. The silicon oxide includes silicon dioxide, and the metal oxide includes indium tin oxide; the composite material includes a composite of an organic material and an inorganic material.

[0013] Optionally, the support pillar structure further includes a second support pillar. One of the first support pillar or the second support pillar is located on a light-shielding area. The height of the first support pillar is greater than the height of the second support pillar, and the density of the distribution of the first support pillar on the substrate is less than the density of the distribution of the second support pillar on the substrate.

[0014] Optionally, the substrate includes a plurality of pixel areas, and each pixel area includes a plurality of the light-transmitting areas; the light-shielding area is located between adjacent light-transmitting areas; the light-filtering structure includes a plurality of light-filtering layers, and each light-transmitting area has one light-filtering layer; the light-filtering layer is a red light-filtering layer, a green light-filtering layer or a blue light-filtering layer.

[0015] Optionally, it further includes: a planarization layer located on the light-shielding layer, and the support pillar structure is located on the planarization layer above the light-shielding layer.

[0016] Correspondingly, the technical solution of the present invention further provides a method for forming a light-filtering substrate, including: providing a substrate, the substrate includes a plurality of light-transmitting areas and a plurality of light-shielding areas, the light-shielding areas are located between adjacent light-transmitting areas, and the surface of the light-shielding areas has a light-shielding layer; forming a light-filtering structure on the light-transmitting areas of the substrate and part of the light-shielding layer; forming a support pillar structure on the light-shielding layer, and the support pillar structure includes a first support pillar; forming an anti-wear layer on the top of the support pillar structure, and the hardness of the material of the anti-wear layer is greater than the hardness of the material of the support pillar structure.

[0017] Optionally, the method for forming the anti-wear layer includes: forming an anti-wear material layer on the top surface of the support pillar structure; performing a curing treatment on the anti-wear material layer to form an anti-wear layer on the top surface of the support pillar structure.

[0018] Optionally, the process for forming the anti-wear material layer includes a coating process; the process for performing a curing treatment on the anti-wear material layer includes thermal curing or UV curing.

[0019] Optionally, the method for forming the anti-wear layer includes: forming a sacrificial layer on a substrate, where the sacrificial layer exposes the top surface of the support pillar structure; forming an anti-wear layer on the top surface of the support pillar structure; and removing the sacrificial layer after forming the anti-wear layer.

[0020] Optionally, the top surface of the support pillar structure is a flat surface, and the anti-wear layer is located on the top surface of the support pillar structure; the method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a patterned mask layer on the support pillar material layer, where the patterned mask layer exposes the surface of the support pillar material layer on the light-transmitting region; using the patterned mask layer as a mask to remove the support pillar material layer on the light-transmitting region, and forming a support pillar structure on the light-blocking region.

[0021] Optionally, the top surface of the support pillar structure is a concave surface, and the top of the support pillar structure has a groove; the anti-wear layer is located in the groove at the top of the support pillar structure; the method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a first mask layer on the support pillar material layer, where the first mask layer exposes the surface of the support pillar material layer on the light-blocking region; using the first mask layer as a mask to etch the support pillar material layer, and forming a support pillar structure on the light-blocking region, where the top of the support pillar structure has a groove.

[0022] Optionally, the support pillar structure further includes a second support pillar, one of the first support pillar or the second support pillar is located in one light-blocking region, the height of the first support pillar is greater than the height of the second support pillar, and the density of the first support pillar distributed on the substrate is less than the density of the second support pillar distributed on the substrate; the top of the first support pillar has a first groove, and the top of the second support pillar has a second groove; the method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a photoresist layer on the support pillar material layer; exposing the photoresist layer using a halftone mask plate, where the transmittance of the halftone mask plate corresponding to the first support pillar region is 100%, and the transmittance of the halftone mask plate corresponding to the second support pillar region is greater than or equal to 20% and less than or equal to 25%; developing the exposed photoresist layer to form a second mask layer having a first mask groove and a second mask groove, where the first mask groove exposes the surface of the support pillar material layer in the second support pillar region, the bottom of the second mask groove is located in the second mask layer in the first support pillar region, and the depth of the second mask groove is less than the depth of the first mask groove; using the second mask layer as a mask to etch the support pillar material layer, and forming a support pillar structure on the light-blocking region, where the top of the first support pillar has a first groove, and the top of the second support pillar has a second groove.

[0023] Optionally, before forming the support pillar structure on the light-shielding layer, it further includes: forming a flat layer on the filter structure, and the support pillar structure is located on the flat layer above the light-shielding layer.

[0024] Correspondingly, the technical solution of the present invention further provides a liquid crystal display, including: the filter substrate as described above, the filter substrate includes: a substrate, the substrate includes a plurality of light-transmitting regions and a plurality of light-shielding regions, and the surface of the light-shielding region has a light-shielding layer; a filter structure located on the light-transmitting regions of the substrate and on a part of the light-shielding layer; a support pillar structure located on the light-shielding layer, the support pillar structure includes a first support pillar; an anti-abrasion layer located on the top of the support pillar structure, and the hardness of the anti-abrasion layer material is greater than the hardness of the support pillar structure material; an active matrix substrate overlapping with the filter substrate, the support pillar structure is located between the active matrix substrate and the light-shielding layer; a liquid crystal layer located between the filter substrate and the active matrix substrate.

[0025] Correspondingly, the technical solution of the present invention further provides a method for forming a liquid crystal display, including: the filter substrate as described above, the filter substrate includes: a substrate, the substrate includes a plurality of light-transmitting regions and a plurality of light-shielding regions, and the surface of the light-shielding region has a light-shielding layer; a filter structure located on the light-transmitting regions of the substrate and on a part of the light-shielding layer; a support pillar structure located on the light-shielding layer, the support pillar structure includes a first support pillar; an anti-abrasion layer located on the top of the support pillar structure, and the hardness of the anti-abrasion layer material is greater than the hardness of the support pillar structure material; providing an active matrix substrate, laminating it with the filter substrate to form a liquid crystal cell composed of the active matrix substrate and the filter substrate, and the support pillar structure is located between the active matrix substrate and the light-shielding layer; injecting liquid crystal into the liquid crystal cell composed of the filter substrate and the active matrix substrate to form a liquid crystal layer.

[0026] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0027] In the filter substrate of the technical solution of the present invention, by forming an anti-abrasion layer on the top of the support pillar structure, and the hardness of the anti-abrasion layer material is greater than the hardness of the support pillar structure material, the wear resistance of the top of the support pillar structure is improved, so that the support force distribution of the support pillar structure is more uniform, the display effect is improved, and the situation that the support force distribution is uneven due to the wear of the top of the support pillar structure and further affects the display effect is reduced.

[0028] Further, the support column structure further includes a second support column. Since the height of the first support column is greater than that of the second support column, and the density of the first support column distributed on the substrate is less than that of the second support column distributed on the substrate, the first support column plays a main support role, and the second support column plays a secondary support role. While an anti-wear layer is formed on the top surface of the first support column, an anti-wear layer is also formed on the top surface of the second support column. When the surface of the display is deformed and the second support column also provides support, the wear resistance of the top of the second support column is improved, so that the support force distribution of the second support column is more uniform, and the display effect is improved.

[0029] Further, the top surface of the support column structure has a groove, and the anti-wear layer is located in the groove, so that the retention effect of the anti-wear layer on the top of the support column structure is better and it is not easy to fall off, further improving the reliability.

[0030] Further, when the top surface of the support column structure is a flat surface, the ratio h / H of the first height h of the anti-wear layer to the total second height H is greater than 10%. Since the hardness of the anti-wear layer is greater than that of the support column structure, the height of the anti-wear layer is controlled within a certain range of the total height, reducing the situation that the overall support stress of the support column structure and the anti-wear layer is large due to the anti-wear layer occupying too much height, and the elastic effect of the overall support column structure and the anti-wear layer is poor, which affects the display effect and reliability.

[0031] Further, when the top surface of the support column structure is a concave surface, the ratio d / H of the first depth d of the groove to the total second height H is greater than or equal to 2% and less than or equal to 6%. Since the hardness of the anti-wear layer is greater than that of the support column structure, the height of the anti-wear layer is controlled within a certain range of the total height, reducing the situation that the overall support stress of the support column structure and the anti-wear layer is large due to the anti-wear layer occupying too much height, and the elastic effect of the overall support column structure and the anti-wear layer is poor, which affects the display effect and reliability. Description of the Drawings

[0032] Figures 1 to 8 is a schematic structural diagram of the formation process of the filter substrate in the embodiment of the present invention. Detailed Embodiments

[0033] As described in the background art, the performance of existing liquid crystal displays still needs to be improved.

[0034] Specifically, in order to pursue high PPI, the size of the support column in a full-screen LCD mobile phone is usually designed to be about 10um. Due to the insufficient mechanical properties of the small-sized support column, indentations appear on the surface of the support column after frequent extrusion or dropping, resulting in uneven distribution of the support force of the support column, and thus the display screen shows local yellowing, affecting the visual effect.

[0035] To solve the above problems, the technical solution of the present invention provides a filter substrate and a method for forming the same, a liquid crystal display and a method for forming the same. By forming an anti-wear layer on the top of the support pillar, the hardness of the anti-wear layer material is greater than that of the support pillar material, so that the wear resistance of the top of the support pillar structure is improved, and thus the support force distribution of the support pillar structure is more uniform, the display effect is improved, and the uneven support force distribution caused by the wear of the top of the support pillar structure is reduced, thereby affecting the display effect.

[0036] To make the above objects, features and beneficial effects of the present invention more obvious and understandable, the following detailed description of the specific embodiments of the present invention will be made in conjunction with the accompanying drawings.

[0037] Figures 1 to 8 It is a schematic structural diagram of the process of forming a filter substrate in an embodiment of the present invention.

[0038] Please refer to Figure 1 and Figure 2 , Figure 1 is Figure 2 a schematic cross-sectional structure diagram along the direction of the section line CC1, Figure 2 is Figure 1 a top view of, providing a substrate 100, the substrate 100 includes a light-transmitting area A and a light-shielding area B, the light-shielding area B is located between adjacent light-transmitting areas A, and a light-shielding layer 101 is provided on the surface of the light-shielding area B.

[0039] The substrate 100 includes a plurality of pixel areas, and each pixel area includes a plurality of the light-transmitting areas A; the light-shielding area B is located between adjacent light-transmitting areas A.

[0040] In this embodiment, each pixel area includes 3 light-transmitting areas A. In other embodiments, each pixel area includes 4 light-transmitting areas.

[0041] The light-shielding layer 101 is used to prevent light crosstalk between the filter layers formed on adjacent light-transmitting areas A subsequently.

[0042] In this embodiment, the material of the light-shielding layer 101 includes a black organic material; the black organic material includes a black photoresist.

[0043] The method for forming the light-shielding layer 101 includes: forming a light-shielding material layer (not shown) on the surface of the substrate 100; performing exposure and development processing on the light-shielding material layer to form the light-shielding layer 101 on the surface of the light-shielding area B.

[0044] The method for forming the light-shielding layer of the metal material includes: forming a light-shielding material layer (not shown) on the surface of the substrate; forming a patterned mask layer (not shown) on the surface of the light-shielding material layer; etching the light-shielding material layer using the patterned mask layer as a mask to form a light-shielding layer on the surface of the light-shielding region B.

[0045] The material of the substrate 100 includes silicon oxide, polyimide (PI), polyethylene terephthalate (PET), or triacetyl cellulose (TAC).

[0046] In this embodiment, the material of the substrate 100 includes silicon oxide.

[0047] Please continue to refer to Figure 1 and Figure 2 , and a filter structure 102 is formed on the light-transmitting region A of the substrate 100 and on a part of the light-shielding layer 101.

[0048] The filter structure 102 causes the light to become monochromatic light after passing through the filter structure to meet the requirements of the device.

[0049] The filter structure 102 includes a plurality of filter layers, and each light-transmitting region A has one of the filter layers; the filter layer is a red filter layer, a green filter layer, or a blue filter layer.

[0050] Each pixel region has at least one red filter layer, at least one green filter layer, and at least one blue filter layer.

[0051] In this embodiment, each pixel region has one red filter layer, one green filter layer, and one blue filter layer.

[0052] The material of the filter layer includes a photoresist that transmits monochromatic light.

[0053] In this embodiment, the material of the red filter layer includes a photoresist that transmits red light; the material of the green filter layer includes a photoresist that transmits green light; the material of the blue filter layer includes a photoresist that transmits blue light.

[0054] The method for forming the red filter layer includes: forming a red filter layer material (not shown) on the surface of the substrate 100 and on the surface of the light-shielding layer 101; performing exposure and development processing on the red filter layer material to form a red filter layer on one light-transmitting region A and on a part of the light-shielding layer 101.

[0055] The method for forming the green filter layer includes: forming a green filter layer material (not shown) on the surface of the substrate 100 and on the surface of the light-shielding layer 101; performing exposure and development processing on the green filter layer material to form a green filter layer on one light-transmitting region A and on a part of the light-shielding layer 101.

[0056] The forming method of the blue light filtering layer includes: forming a blue light filtering layer material (not shown) on the surface of the substrate 100 and the surface of the light shielding layer 101; performing exposure and development processing on the blue light filtering layer material to form a blue light filtering layer in a light transmitting area A and on a part of the light shielding layer 101.

[0057] There is no distinction in the forming order of the red light filtering layer, the green light filtering layer, and the blue light filtering layer.

[0058] Please refer to Figure 3 , Figure 3 For the schematic diagram based on Figure 1 a planarization layer 103 is formed on the light filtering structure 102.

[0059] The material of the planarization layer 103 includes an organic material, and the organic material includes acrylic or polyimide.

[0060] Please refer to Figure 4 and Figure 5 , Figure 4 is Figure 5 a schematic cross-sectional structure diagram along the direction of the section line CC1, Figure 5 is Figure 4 a top view of

[0061] On the planarization layer 103 above the light shielding layer 101, a support column structure is formed. The support column structure includes a first support column 104 and a second support column 105, and one of the first support column 104 or the second support column 105 is respectively located on a light shielding area B.

[0062] In this embodiment, the height of the first support column 104 is greater than the height of the second support column 105, and the density of the distribution of the first support column 104 on the substrate 100 is less than the density of the distribution of the second support column 105 on the substrate 100.

[0063] In this embodiment, the material of the support column structure includes an organic material, and the organic material includes resin.

[0064] In this embodiment, the top of the first support column 104 has a first groove 106, and the top of the second support column 105 has a second groove 107.

[0065] The forming method of the support pillar structure includes: forming a support pillar material layer (not shown) on the substrate 100; forming a photoresist layer (not shown) on the support pillar material layer; exposing the photoresist layer by using a halftone mask plate, wherein the transmittance of the halftone mask plate corresponding to the first support pillar 104 region is 100%, and the transmittance of the halftone mask plate corresponding to the second support pillar 105 region is greater than or equal to 20% and less than or equal to 25%; developing the exposed photoresist layer to form a second mask layer (not shown) having a first mask groove and a second mask groove, the first mask groove exposing the surface of the support pillar material layer in the second support pillar region, the bottom of the second mask groove being located in the second mask layer in the first support pillar region, and the depth of the second mask groove being less than the depth of the first mask groove; etching the support pillar material layer by using the second mask layer as a mask to form a support pillar structure above the light shielding layer 101, the top of the first support pillar 104 having a first groove 106, and the top of the second support pillar 105 having a second groove 107.

[0066] The process of etching the support pillar material layer by using the second mask layer as a mask includes a dry etching process. By adjusting the process parameters of the dry etching process, such as gas flow rate, etching gas type, chamber pressure, bias voltage, ion source power, etc., the top of the formed first support pillar 104 has a first groove 106, and the top of the second support pillar 105 has a second groove 107.

[0067] In another embodiment, the top surfaces of the first support pillar and the second support pillar are flat surfaces. The process of etching the support pillar material layer by using the second mask layer as a mask includes a dry etching process. By adjusting the process parameters of the dry etching process, such as gas flow rate, etching gas type, chamber pressure, bias voltage, ion source power, etc., the top surfaces of the formed first support pillar and the second support pillar are flat surfaces.

[0068] In other embodiments, the support pillar structure can only include the first support pillar, that is, the support pillar structure can not include two support pillars with different heights.

[0069] Specifically, the top surface of the support pillar structure is a concave surface, and the top of the support pillar structure has a groove; the forming method of the support pillar structure includes: forming a support pillar material layer on the substrate; forming a first mask layer on the support pillar material layer, the first mask layer exposing the surface of the support pillar material layer on the light shielding area; etching the support pillar material layer by using the first mask layer as a mask to form a support pillar structure on the light shielding area, and the top of the support pillar structure has a groove.

[0070] Specifically, the top surface of the support pillar structure is a flat surface; the method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a patterned mask layer on the support pillar material layer, and the patterned mask layer exposes the surface of the support pillar material layer on the light-transmitting area; using the patterned mask layer as a mask to remove the support pillar material layer on the light-transmitting area, and forming a support pillar structure on the light-blocking area.

[0071] Please refer to Figures 6 to 8 , Figure 6 is a schematic diagram based on Figure 4 and is a schematic diagram of the first support pillar 104 in Figure 7 is Figure 6 an enlarged schematic diagram of the first support pillar 104 in Figure 8 is Figure 6 an enlarged schematic diagram of the second support pillar 105 in . An anti-wear layer 108 is formed on the top of the support pillar structure, and the hardness of the material of the anti-wear layer 108 is greater than the hardness of the material of the support pillar structure.

[0072] An anti-wear layer 108 is formed on the top of the support pillar structure, and the hardness of the material of the anti-wear layer 108 is greater than the hardness of the material of the support pillar structure, so that the wear resistance of the top of the support pillar structure is improved, thereby the support force distribution of the support pillar structure is more uniform, the display effect is improved, and the situation that the support force distribution is uneven due to the wear of the top of the support pillar structure and further affects the display effect is reduced.

[0073] In this embodiment, the pencil hardness of the material of the anti-wear layer 108 is greater than or equal to 3H.

[0074] The material of the anti-wear layer 108 includes an insulating material, and the insulating material includes: an organic material, an inorganic material or a composite material. The organic material includes acrylic or polyimide; the inorganic material includes silicon oxide or metal oxide. The silicon oxide includes silicon dioxide, and the metal oxide includes indium tin oxide; the composite material includes a composite of an organic material and an inorganic material.

[0075] In this embodiment, the method for forming the anti-wear layer 108 includes: forming an anti-wear material layer (not shown) on the top surface of the support pillar structure; performing a curing treatment on the anti-wear material layer to form an anti-wear layer 108 on the top surface of the support pillar structure.

[0076] The process for forming the anti-wear material layer includes a coating process; the process for performing a curing treatment on the anti-wear material layer includes thermal curing or UV curing.

[0077] In another embodiment, the method for forming the anti-wear layer includes: forming a sacrificial layer on a substrate, and the sacrificial layer exposes the top surface of the support pillar structure; forming an anti-wear layer on the top surface of the support pillar structure; after forming the anti-wear layer, removing the sacrificial layer.

[0078] The process of forming an anti-wear layer on the top surface of the support pillar structure includes physical vapor deposition process or chemical vapor deposition process.

[0079] In this embodiment, the anti-wear layer 108 is located in the first groove 106 at the top of the first support pillar 104 and in the second groove 107 at the top of the second support pillar 105.

[0080] The top surface of the support pillar structure has grooves, and the anti-wear layer 108 is located in the grooves, so that the retention effect of the anti-wear layer 108 on the top of the support pillar structure is better, not easy to fall off, and the reliability is further improved.

[0081] The support pillar structure includes a first support pillar 104 and a second support pillar 105. Since the height of the first support pillar 104 is greater than the height of the second support pillar 105, the density of the first support pillar 104 distributed on the substrate is less than the density of the second support pillar 105 distributed on the substrate. The first support pillar 104 plays a main support role, and the second support pillar 105 plays a secondary support role. The anti-wear layer 108 is located in the first groove 106 at the top of the first support pillar 104 and in the second groove 107 at the top of the second support pillar 105. When the surface of the display deforms and the second support pillar 105 also provides support, the anti-wear layer 108 improves the wear resistance of the top of the second support pillar 105, so that the support force distribution of the second support pillar 105 is more uniform and the display effect is improved.

[0082] In this embodiment, the top surface of the support pillar structure is a concave surface. The groove has a first depth d, and the support pillar structure and the anti-wear layer have a total second height H. The ratio d / H of the first depth d to the second height H is greater than or equal to 2% and less than or equal to 6%.

[0083] Since the hardness of the anti-wear layer 108 is greater than that of the support pillar structure, the height of the anti-wear layer 108 is controlled within a certain range of the total height, reducing the situation that the overall support stress of the support pillar structure and the anti-wear layer 108 is large due to the anti-wear layer 108 occupying too much height, and the elastic effect of the overall support pillar structure and the anti-wear layer is poor, which affects the display effect and reliability.

[0084] Please refer to Figure 7 and Figure 8, in this embodiment, the top of the first support column 104 has a first groove 106, the first groove 106 has a first depth d1, the support column structure and the wear-resistant layer 108 have a total second height H1, and the ratio d1 / H1 of the first depth d1 to the second height H1 is greater than or equal to 2% and less than or equal to 6%; the top of the second support column 105 has a second groove 107, the second groove 107 has a first depth d2, the support column structure and the wear-resistant layer 108 have a total second height H2, and the ratio d2 / H2 of the first depth d2 to the second height H2 is greater than or equal to 2% and less than or equal to 6%.

[0085] In another embodiment, the top surface of the support column structure is a flat surface, and the wear-resistant layer is located on the top surface of the support column structure; the wear-resistant layer has a first height h, the support column structure and the wear-resistant layer have a total second height H, and the ratio h / H of the first height h to the second height H is greater than 10%. Since the hardness of the wear-resistant layer is greater than that of the support column structure, the height of the wear-resistant layer is controlled within a certain range of the total height, reducing the situation that the overall support stress of the support column structure and the wear-resistant layer is relatively large due to the wear-resistant layer occupying too much height, and the overall elastic effect of the support column structure and the wear-resistant layer is relatively poor, which affects the display effect and reliability.

[0086] In another embodiment, when the support column structure only includes support columns of one height, the top surface of the support column is a concave surface or a flat surface, and the relationship between the height of the wear-resistant layer and the total height of the support column structure and the wear-resistant layer is as described in the above embodiment.

[0087] Correspondingly, an embodiment of the present invention further provides a filter substrate, please continue to refer to Figure 6 , including:

[0088] A substrate 100, the substrate 100 includes a plurality of light-transmitting regions A and a plurality of light-shielding regions B, and a light-shielding layer 101 is disposed on the surface of the light-shielding region B;

[0089] A filter structure 102 located on the light-transmitting region A of the substrate 100 and on a part of the light-shielding layer 101;

[0090] A support column structure located on the light-shielding layer 101, the support column structure includes a first support column 104;

[0091] A wear-resistant layer 108 located on the top of the support column structure, and the hardness of the material of the wear-resistant layer 108 is greater than the hardness of the material of the support column structure.

[0092] In this embodiment, it further includes: a flat layer 103 located on the light-shielding layer 101, and the support column structure is located on the flat layer 103 above the light-shielding layer 101.

[0093] In other embodiments, the top surface of the support pillar structure is a flat surface; the anti-wear layer is located on the top surface of the support pillar structure.

[0094] In other embodiments, the anti-wear layer has a first height h, the support pillar structure and the anti-wear layer have a total second height H, and the ratio h / H of the first height h to the second height H is greater than 10%.

[0095] In this embodiment, the top surface of the support pillar structure is a concave surface, and the top of the support pillar structure has a groove; the anti-wear layer 108 is located in the groove at the top of the support pillar structure.

[0096] In this embodiment, the groove has a first depth d, the support pillar structure and the anti-wear layer have a total second height H, and the ratio d / H of the first depth d to the second height H is greater than or equal to 2% and less than or equal to 6%.

[0097] In this embodiment, the pencil hardness of the material of the anti-wear layer 108 is greater than or equal to 3H.

[0098] In this embodiment, the material of the anti-wear layer 108 includes an insulating material, and the insulating material includes: an organic material, an inorganic material or a composite material. The organic material includes acrylic or polyimide; the inorganic material includes silicon oxide or metal oxide. The silicon oxide includes silicon dioxide, and the metal oxide includes indium tin oxide; the composite material includes a composite of an organic material and an inorganic material.

[0099] In this embodiment, the material of the support pillar structure includes an organic material, and the organic material includes resin.

[0100] In this embodiment, the support pillar structure further includes a second support pillar 105. One of the first support pillar 104 or the second support pillar 105 is located on a light-shielding area B. The height of the first support pillar 104 is greater than the height of the second support pillar 105, and the density of the first support pillar 104 distributed on the substrate 100 is less than the density of the second support pillar 105 distributed on the substrate 100.

[0101] In this embodiment, the substrate 100 includes a plurality of pixel regions, and each pixel region includes a plurality of the light-transmitting regions A; the light-shielding area B is located between adjacent light-transmitting regions A.

[0102] In this embodiment, the filter structure 102 includes a plurality of filter layers, and each light-transmitting region A has one filter layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

[0103] Correspondingly, an embodiment of the present invention further provides a liquid crystal display, including:

[0104] As Figures 1 to 8 The filter substrate formed by the method steps described above, the filter substrate includes: a substrate 100, the substrate 100 includes a plurality of light-transmitting regions A and a plurality of light-shielding regions B, and the surface of the light-shielding region B has a light-shielding layer 101; a filter structure 102 located on the light-transmitting region A of the substrate 100 and on a part of the light-shielding layer 101; a support column structure located on the light-shielding layer 101, the support column structure includes a first support column 104; an abrasion-resistant layer 108 located on the top of the support column structure, and the hardness of the material of the abrasion-resistant layer 108 is greater than the hardness of the material of the support column structure;

[0105] An active matrix substrate overlapping with the filter substrate, and the support column structure is located between the active matrix substrate and the light-shielding layer 101;

[0106] A liquid crystal layer located between the filter substrate and the active matrix substrate.

[0107] Correspondingly, an embodiment of the present invention further provides a method for forming a liquid crystal display, including:

[0108] Providing a filter substrate formed by the method steps as Figures 1 to 8 described above, the filter substrate includes: a substrate 100, the substrate 100 includes a plurality of light-transmitting regions A and a plurality of light-shielding regions B, and the surface of the light-shielding region B has a light-shielding layer 101; a filter structure 102 located on the light-transmitting region A of the substrate 100 and on a part of the light-shielding layer 101; a support column structure located on the light-shielding layer 101, the support column structure includes a first support column 104; an abrasion-resistant layer 108 located on the top of the support column structure, and the hardness of the material of the abrasion-resistant layer 108 is greater than the hardness of the material of the support column structure;

[0109] Providing an active matrix substrate, bonding it with the filter substrate to form a liquid crystal cell composed of the active matrix substrate and the filter substrate, and the support column structure is located between the active matrix substrate and the light-shielding layer 101;

[0110] Injecting liquid crystal into the liquid crystal cell composed of the filter substrate and the active matrix substrate to form a liquid crystal layer.

[0111] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be subject to the scope defined by the claims.

Claims

1. A filter substrate, characterized in that, Comprising: A substrate, the substrate comprising a plurality of light-transmitting regions and a plurality of light-shielding regions, the surface of the light-shielding regions having a light-shielding layer; A filter structure located on the light-transmitting regions of the substrate and on a part of the light-shielding layer; A support pillar structure located on the light-shielding layer, the support pillar structure comprising a first support pillar; An abrasion-resistant layer located on the top of the support pillar structure, the hardness of the material of the abrasion-resistant layer being greater than the hardness of the material of the support pillar structure.

2. The filter substrate according to claim 1, wherein The top surface of the support pillar structure is a flat surface; the abrasion-resistant layer is located on the top surface of the support pillar structure.

3. The filter substrate according to claim 2, wherein The abrasion-resistant layer has a first height h, the support pillar structure and the abrasion-resistant layer have a total second height H, and the ratio h / H of the first height h to the second height H is greater than 10%.

4. The filter substrate according to claim 1, wherein, The top surface of the support pillar structure is a concave surface, and the top of the support pillar structure has a groove; the abrasion-resistant layer is located in the groove at the top of the support pillar structure.

5. The filter substrate according to claim 4, characterized in that, The groove has a first depth d, the support pillar structure and the abrasion-resistant layer have a total second height H, and the ratio d / H of the first depth d to the second height H is greater than or equal to 2% and less than or equal to 6%.

6. The filter substrate according to claim 1, characterized in that The pencil hardness of the material of the abrasion-resistant layer is greater than or equal to 3H.

7. The filter substrate according to claim 6, characterized in that, The material of the abrasion-resistant layer comprises an insulating material, the insulating material comprising: an organic material, an inorganic material or a composite material, the organic material comprising acrylic or polyimide; the inorganic material comprising silicon oxide or metal oxide, the silicon oxide comprising silicon dioxide, the metal oxide comprising indium tin oxide; the composite material comprising a composite of an organic material and an inorganic material.

8. The filter substrate according to claim 1, wherein The support pillar structure further comprises a second support pillar, one of the first support pillar or the second support pillar is located on one light-shielding region, the height of the first support pillar is greater than the height of the second support pillar, and the density of the distribution of the first support pillar on the substrate is less than the density of the distribution of the second support pillar on the substrate.

9. The filter substrate according to claim 1, wherein The substrate comprises a plurality of pixel regions, each pixel region comprising a plurality of the light-transmitting regions; the light-shielding regions are located between adjacent light-transmitting regions; The filter structure comprises a plurality of filter layers, and one of the filter layers is provided on each of the light-transmitting regions; The filter layer is a red filter layer, a green filter layer or a blue filter layer.

10. The filter substrate according to claim 1, wherein, Further comprising: A flat layer located on the light-shielding layer, the support pillar structure being located on the flat layer above the light-shielding layer.

11. A method for forming a filter substrate, characterized in that, Comprising: Providing a substrate, the substrate comprising a plurality of light-transmitting regions and a plurality of light-shielding regions, the light-shielding regions being located between adjacent light-transmitting regions, the surface of the light-shielding regions having a light-shielding layer; Forming a filter structure on the light-transmitting regions of the substrate and on a part of the light-shielding layer; Forming a support pillar structure on the light-shielding layer, the support pillar structure comprising a first support pillar; Forming an abrasion-resistant layer on the top of the support pillar structure, the hardness of the material of the abrasion-resistant layer being greater than the hardness of the material of the support pillar structure.

12. The method for forming a filter substrate according to claim 11, characterized in that, The method for forming the abrasion-resistant layer comprises: forming an abrasion-resistant material layer on the top surface of the support pillar structure; performing a curing treatment on the abrasion-resistant material layer to form an abrasion-resistant layer on the top surface of the support pillar structure.

13. The method for forming a filter substrate according to claim 12, wherein The process for forming the abrasion-resistant material layer comprises a coating process; the process for performing a curing treatment on the abrasion-resistant material layer comprises thermal curing or UV curing.

14. The method for forming a filter substrate according to claim 11, wherein, The method for forming the anti-wear layer includes: forming a sacrificial layer on a substrate, where the sacrificial layer exposes the top surface of the support pillar structure; forming an anti-wear layer on the top surface of the support pillar structure; and after forming the anti-wear layer, removing the sacrificial layer.

15. The method for forming a filter substrate according to claim 11, wherein, The top surface of the support pillar structure is a flat surface, and the anti-wear layer is located on the top surface of the support pillar structure. The method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a patterned mask layer on the support pillar material layer, where the patterned mask layer exposes the surface of the support pillar material layer on the light-transmitting region; using the patterned mask layer as a mask to remove the support pillar material layer on the light-transmitting region, and forming a support pillar structure on the light-shielding region.

16. The method for forming a filter substrate according to claim 11, wherein, The top surface of the support pillar structure is a concave surface, and the top of the support pillar structure has a groove. The anti-wear layer is located in the groove at the top of the support pillar structure. The method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a first mask layer on the support pillar material layer, where the first mask layer exposes the surface of the support pillar material layer on the light-shielding region; using the first mask layer as a mask to etch the support pillar material layer, and forming a support pillar structure on the light-shielding region, where the top of the support pillar structure has a groove.

17. The method for forming a filter substrate according to claim 11, wherein The support pillar structure further includes a second support pillar. One of the first support pillar or the second support pillar is located in one light-shielding region. The height of the first support pillar is greater than the height of the second support pillar, and the density of the first support pillar distributed on the substrate is less than the density of the second support pillar distributed on the substrate. The top of the first support pillar has a first groove, and the top of the second support pillar has a second groove. The method for forming the support pillar structure includes: forming a support pillar material layer on a substrate; forming a photoresist layer on the support pillar material layer; using a halftone mask to expose the photoresist layer, where the transmittance of the halftone mask corresponding to the first support pillar region is 100%, and the transmittance of the halftone mask corresponding to the second support pillar region is greater than or equal to 20% and less than or equal to 25%; developing the exposed photoresist layer to form a second mask layer having a first mask groove and a second mask groove, where the first mask groove exposes the surface of the support pillar material layer in the second support pillar region, the bottom of the second mask groove is located in the second mask layer in the first support pillar region, and the depth of the second mask groove is less than the depth of the first mask groove; using the second mask layer as a mask to etch the support pillar material layer, and forming a support pillar structure on the light-shielding region, where the top of the first support pillar has a first groove and the top of the second support pillar has a second groove.

18. The method for forming a filter substrate according to claim 11, wherein, Before forming the support pillar structure on the light-shielding layer, it further includes: forming a flat layer on the filter structure, and the support pillar structure is located on the flat layer above the light-shielding layer.

19. A liquid crystal display, characterized in that, Including: The filter substrate according to any one of claims 1 to 10, wherein the filter substrate comprises: a substrate including a plurality of light-transmitting regions and a plurality of light-shielding regions, a light-shielding layer being provided on the surface of the light-shielding regions; a filter structure provided on the light-transmitting regions of the substrate and on a part of the light-shielding layer; a support pillar structure provided on the light-shielding layer, the support pillar structure including a first support pillar; and an abrasion-resistant layer provided on the top of the support pillar structure, the hardness of the material of the abrasion-resistant layer being greater than the hardness of the material of the support pillar structure. An active matrix substrate overlapping with the filter substrate, the support pillar structure being located between the active matrix substrate and the light-shielding layer; A liquid crystal layer provided between the filter substrate and the active matrix substrate.

20. A method for forming a liquid crystal display, characterized in that, Comprising: Provided is the filter substrate according to any one of claims 1 to 10, wherein the filter substrate comprises: a substrate including a plurality of light-transmitting regions and a plurality of light-shielding regions, a light-shielding layer being provided on the surface of the light-shielding regions; a filter structure provided on the light-transmitting regions of the substrate and on a part of the light-shielding layer; a support pillar structure provided on the light-shielding layer, the support pillar structure including a first support pillar; and an abrasion-resistant layer provided on the top of the support pillar structure, the hardness of the material of the abrasion-resistant layer being greater than the hardness of the material of the support pillar structure. Provided is an active matrix substrate which is attached to the filter substrate to form a liquid crystal cell composed of the active matrix substrate and the filter substrate, the support pillar structure being located between the active matrix substrate and the light-shielding layer; and liquid crystal is injected into the liquid crystal cell composed of the filter substrate and the active matrix substrate to form a liquid crystal layer.

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