Substrate processing apparatus, imaging unit, and liquid processing chamber

Abstract

The invention discloses a substrate processing apparatus, an imaging unit, and a liquid processing chamber. Specifically, the apparatus for processing a substrate includes: a housing providing a processing space; a support unit configured to support the substrate in the processing space; and a photographing unit configured to photograph a processing space, in which the photographing unit includes: a container mounted on one upper side of the housing and providing an internal space separated from the processing space; and a vision member that is provided in the inner space of the container and photographs the processing space in a downward inclined direction.

Description

[0001] Cross - reference to related applications

[0002] This application claims the priority and benefit of Korean Patent Application No. 10 - 2023 - 0197566, filed with the Korean Intellectual Property Office on December 29, 2023, the entire content of which is incorporated herein by reference. Technical Field

[0003] The present invention relates to a substrate processing apparatus, a photographing unit, and a liquid processing chamber. Background Art

[0004] To manufacture semiconductor devices, wet processing such as cleaning and etching is performed on a substrate (such as a wafer). Wet processing includes a batch - type processing method and a single - wafer - type processing method. The batch - type processing method processes multiple substrates by immersing the substrates in a processing tank, and the single - wafer - type processing method processes a substrate by supplying a processing liquid to one substrate.

[0005] Generally, in a process chamber using the single - wafer - type processing method, the substrate placed on a chuck is rotated and a nozzle supplies a processing liquid to the top surface of the rotated substrate to perform wet processing.

[0006] Meanwhile, as semiconductor devices become more dense, highly integrated, and perform better, circuit patterns are rapidly becoming finer, and precise wet processing is required. For this, it is necessary to monitor and inspect the state of the substrate being processed in the process chamber, the state of the nozzle, the state of the processing liquid discharged from the nozzle, and the temperature of the substrate, etc.

[0007] For this, sensors and lighting are installed in the process chamber to monitor and inspect the substrate, the nozzle, and the processing liquid, etc. The sensors obtain images inside the process chamber. The lighting emits light in the process chamber to help the sensors obtain images. The sensors and lighting can be installed in multiple numbers.

[0008] However, there may be fumes in the process chamber due to the processing liquid supplied to the substrate. The fumes contaminate the sensors and lighting installed in the process chamber. When the sensors and lighting are contaminated, maintenance / repair work is required to clean the sensors and lighting. In this case, a worker needs to put at least a part of his or her body into the process chamber to perform the maintenance / repair work. In this case, the worker is at risk of being exposed to the fumes. In addition, when the sensors and lighting are installed in multiple different positions, the worker must perform the maintenance / repair work by finding each sensor and lighting, which takes a lot of time for the maintenance / repair work.

[0009] In addition, the top surface of the substrate can be integrally flat. Thus, the light irradiated by the lighting member can be reflected from the top surface of the substrate. In other words, light reflection can occur from the top surface of the substrate. The light reflection can be formed in a pattern shape on the substrate. When the light reflection occurs, it may be difficult to determine the state of the substrate through the image of the substrate obtained by the sensor. Summary of the Invention

[0010] The present invention is directed to providing a substrate processing apparatus, a photographing unit, and a liquid processing chamber capable of effectively inspecting a process state.

[0011] The present invention is also directed to providing a substrate processing apparatus, a photographing unit, and a liquid processing chamber capable of minimizing the occurrence of light reflection in an image or video for inspecting a substrate.

[0012] The present invention is also directed to providing a substrate processing apparatus, a photographing unit, and a liquid processing chamber capable of effectively obtaining an image or video for inspecting a nozzle state or a processing liquid state.

[0013] The present invention is also directed to providing a substrate processing apparatus, a photographing unit, and a liquid processing chamber capable of effectively shortening the time required for maintenance / repair work of the photographing unit.

[0014] The problems to be solved by the present invention are not limited to the above problems, and those skilled in the art will clearly understand the unmentioned problems from the following description.

[0015] Exemplary embodiments of the present invention provide an apparatus for processing a substrate, the apparatus including: a housing that provides a processing space; a support unit configured to support the substrate in the processing space; and a photographing unit configured to photograph the processing space, wherein the photographing unit includes: a container that is mounted on an upper side of the housing and provides an internal space compartmentalized from the processing space; and a vision that is disposed in the internal space of the container and photographs the processing space in a downwardly inclined direction.

[0016] According to an exemplary embodiment, the container may include: a barrel-shaped body having an open top; and a lid-shaped member that is coupled to the barrel-shaped body to form the internal space, and the lid-shaped member is configured to open and close the internal space from an outer side of the processing space.

[0017] According to an exemplary embodiment, the photographing unit may further include a lighting assembly that is disposed in the container and emits light in a downwardly inclined direction onto the substrate placed on the support unit.

[0018] According to an exemplary embodiment, the lighting assembly may include: a lighting board; and a plurality of lighting units mounted on the lighting board, the plurality of lighting units being divided into a plurality of groups, and each of the groups being configured to emit light to different regions of a substrate placed on a support unit.

[0019] According to an exemplary embodiment, the lighting board may be formed with a plurality of angle adjustment units respectively corresponding to the plurality of groups, and the plurality of angle adjustment units adjust the irradiation angles of the lighting units such that the central groups of the plurality of groups emit light to the central region of the substrate, and the edge groups of the plurality of groups emit light to the edge region of the substrate.

[0020] According to an exemplary embodiment, there may be a plurality of the edge groups, and the edge groups may emit light to different edge regions of the substrate.

[0021] According to an exemplary embodiment, the apparatus may further include: a nozzle configured to discharge a processing liquid onto a substrate supported on the support unit; wherein the imaging unit includes a chamber illuminator mounted on a sidewall of the housing and emitting light toward the support unit.

[0022] According to an exemplary embodiment, the apparatus may further include: a controller configured to control the imaging unit, wherein when the state of a substrate placed on the support unit is to be inspected, the controller controls the imaging unit in a first mode, in the first mode, the vision member captures an image of the substrate with the lighting units of the central group, the lighting units of the edge group, and the chamber illuminator turned on.

[0023] According to an exemplary embodiment, the apparatus may further include: a controller configured to control the imaging unit, wherein when the state of the nozzle or the processing liquid discharged from the nozzle is to be inspected, the controller controls the imaging unit in a second mode, in the second mode, the vision member captures an image of the nozzle or the processing liquid with the lighting units of the central group and the chamber illuminator turned on.

[0024] According to an exemplary embodiment, the lighting unit may include: a lighting member configured to generate light; and a condenser lens configured to collect the light generated by the lighting member.

[0025] According to an exemplary embodiment, the lighting board may be fixed to the front portion of the container facing the processing space by fixing bolts and adjustment bolts, and an elastic member may be inserted into the adjustment bolts, the elastic member being positioned between the container and the lighting board and configured to push the lighting board in a direction away from the front portion of the container.

[0026] According to an exemplary embodiment, a plurality of fixing bolts may be provided, and one end of each fixing bolt is inserted into a groove formed in the container, and the tilt angle of the lighting plate is adjusted according to the degree to which the fixing bolt is inserted into the groove.

[0027] According to an exemplary embodiment, the vision member may include: a first vision member configured to obtain an image or a monitoring video of the processing space; and a second vision member configured to obtain a thermal image of the processing space.

[0028] According to an exemplary embodiment, the apparatus may further include: a controller configured to control the photographing unit, wherein the controller identifies the support unit and / or the substrate placed on the support unit from the monitoring image obtained through the first vision member to extract measurement points, and controls the photographing unit to cause the second vision member to obtain a thermal image of the measurement points for measurement.

[0029] Another exemplary embodiment of the present invention provides a photographing unit provided in a chamber, the photographing unit including: a container providing an internal space different from the processing space of the chamber; a vision member provided in the internal space of the container; and a lighting assembly provided in the container and emitting light in a downwardly inclined direction into the processing space of the liquid processing chamber.

[0030] According to an exemplary embodiment, the lighting assembly may include: a lighting plate; and a plurality of lighting units mounted on the lighting plate.

[0031] According to an exemplary embodiment, the lighting plate may be formed with a plurality of angle adjustment units that provide a flat or inclined surface for a part of the plurality of lighting units and other parts of the plurality of lighting units to emit light in different directions.

[0032] According to an exemplary embodiment, the lighting unit may include: a lighting member configured to generate light; and a condenser lens configured to collect the light generated by the lighting member.

[0033] According to an exemplary embodiment, the container may include: a barrel-shaped body having an open top; and a lid-shaped member coupled to the barrel-shaped body to form an internal space, and the lid-shaped member is configured to open and close the internal space from the outside of the processing space.

[0034] Another exemplary embodiment of the present invention provides a liquid processing chamber for processing a liquid processing substrate, the liquid processing chamber comprising: a housing that provides a processing space; a support unit configured to support a substrate in the processing space; a nozzle configured to discharge a processing liquid onto the substrate supported on the support unit; and a photographing unit configured to photograph the substrate placed on the support unit, the nozzle, or the processing liquid discharged from the nozzle, the photographing unit being controlled by a controller, wherein the photographing unit comprises: a container mounted on an upper side of the housing and providing an internal space separated from the processing space; a vision member disposed in the internal space of the container and photographing the substrate placed on the support unit in a downwardly inclined direction; an illumination assembly disposed in the container and emitting light in a downwardly inclined direction onto the substrate placed on the support unit; and a chamber illumination member mounted on a side wall of the housing and emitting light toward the support unit, the container comprising: a barrel-shaped body having an open top; and a lid-shaped member coupled to the barrel-shaped body to form the internal space, and the lid-shaped member being configured to open and close the internal space from an outer side of the processing space, the illumination assembly comprising: an illumination plate; and a plurality of illumination units mounted on the illumination plate, and the plurality of illumination units being divided into a plurality of groups, and each of the groups being configured to emit light onto different regions of the substrate placed on the support unit, the illumination plate being formed with a plurality of angle adjustment units corresponding to the plurality of groups respectively, and the plurality of angle adjustment units adjusting the irradiation angles of the illumination units such that the central groups of the plurality of groups emit light onto the central region of the substrate, and the edge groups of the plurality of groups emit light onto the edge region of the substrate, and the controller controls the photographing unit in either a first mode or a second mode, in the first mode, when inspecting the state of the substrate placed on the support unit, the vision member photographs the substrate with the central group illumination units, the edge group illumination units, and the chamber illumination member turned on, in the second mode, when inspecting the state of the nozzle or the processing liquid discharged from the nozzle, the vision member photographs the nozzle or the processing liquid with the central group illumination units and the chamber illumination member turned on.

[0035] According to the exemplary embodiment of the present invention, the process state can be effectively inspected.

[0036] Furthermore, according to the exemplary embodiment of the present invention, the light reflection in the image or video for inspecting the substrate state can be minimized.

[0037] Furthermore, according to the exemplary embodiment of the present invention, the image or video for inspecting the nozzle state or the processing liquid state can be effectively obtained.

[0038] Furthermore, according to an exemplary embodiment of the present invention, the time required for maintenance / repair of the photographing unit can be effectively shortened.

[0039] The effects of the present invention are not limited to the above effects, and those skilled in the art will clearly understand the effects not mentioned from the specification and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1 A top plan view of a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0041] Figure 2 A cross-sectional view of a substrate processing apparatus disposed in a Figure 1 process chamber.

[0042] Figure 3 A top plan view of a substrate processing apparatus disposed in a Figure 1 process chamber.

[0043] Figure 4 A schematic view of the front part of a container as viewed from a Figure 2 photographing unit in direction A.

[0044] Figure 5 A schematic view of a vision member and an illumination assembly as viewed from a Figure 2 photographing unit in direction B.

[0045] Figure 6 A schematic view showing a method of fixing an illumination plate and a container.

[0046] Figure 7 A block diagram showing a control mode of illumination of a photographing unit of the present invention.

[0047] Figure 8 A schematic view showing a region where an illumination unit emits light onto a substrate in a substrate inspection mode.

[0048] Figure 9 A schematic view showing an illumination unit and a chamber illuminator emitting light onto a processing liquid as viewed from above in a liquid discharge inspection mode.

[0049] Figure 10 A schematic view showing a chamber illuminator emitting light onto a processing liquid as viewed from the front in a Figure 9 liquid discharge inspection mode.

[0050] After a detailed description in conjunction with the accompanying drawings, the various features and advantages of the non-limiting exemplary embodiments of this specification can become clearer. The accompanying drawings are for reference only and should not be construed as limiting the scope of the claims. Unless explicitly stated, the drawings should not be considered to be drawn to scale. For clarity, various dimensions in the figures may be exaggerated. Detailed Description

[0051] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. The exemplary embodiments are provided so that this disclosure will be thorough and will fully convey the scope to those skilled in the art. Numerous specific details are set forth (such as examples of specific components, devices, and methods) to provide a thorough understanding of the embodiments of this disclosure. It will be apparent to those skilled in the art that the exemplary embodiments may be embodied in many different forms and that specific details should not be construed as limiting the scope of this disclosure. In some exemplary embodiments, well-known processes, well-known device structures, and well-known technologies are not described in detail.

[0052] The terms used herein are for the purpose of describing particular exemplary embodiments only and are not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms "a," "an," and "the" may be intended to include the plural forms. The terms "comprises," "comprising," "including," and "having" are inclusive and thus specify the presence of the stated feature, integer, step, operation, element, and / or component, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or combinations thereof. Unless explicitly identified as the order of execution, the method steps, processes, and operations described herein should not be construed as necessarily being performed in the particular order discussed or illustrated. It should also be understood that additional or alternative steps may be employed.

[0053] When an element or layer is referred to as being "on", "engaged to", "connected to", or "coupled to" another element or layer, it can be directly on, engaged directly to, connected directly to, or coupled directly to the other element or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on", "directly engaged to", "directly connected to", or "directly coupled to" another element or layer, there may be no intervening elements or layers. Other words used to describe the relationship between elements should be interpreted in a like manner (e.g., "between" relative to "directly between", "adjacent" relative to "directly adjacent", etc.). As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0054] Although the terms "first", "second", "third", etc. may be used herein to describe different elements, components, regions, layers, and / or sections, these elements, components, regions, layers, and / or sections are not limited by these terms unless otherwise specified. These terms may be used only to distinguish one element, component, region, layer, and / or section from another. When used herein, terms such as "first", "second", and other numerical terms do not imply an order or sequence unless the context clearly dictates. Thus, a first element, first component, first region, first layer, or first section discussed below may be referred to as a second element, second component, second region, second layer, or second section without departing from the teachings of the exemplary embodiments.

[0055] For ease of description, spatial relative terms, such as "inner", "outer", "beneath", "below", "lower", "above", and "upper", etc., may be used herein to describe the relationship of one element or feature to another (other) element or feature shown in the figures. Spatial relative terms are intended to cover different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, an element described as "below" or "beneath" another element or feature will then be oriented "above" the other element or feature. Thus, the exemplary term "below" can cover both an orientation above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatial relative descriptors used herein are interpreted accordingly.

[0056] When the terms "same" or "identical" are used in the description of the exemplary embodiments, it should be understood that there may be some imprecision. Thus, when an element or value is said to be the same as another element or value, it should be understood that the element or value is the same as other elements or values within the manufacturing or operating tolerances (e.g., ±10%) thereof.

[0057] When the terms "about" or "substantially" are used in conjunction with a numerical value, it should be understood that the associated numerical value includes the manufacturing or operating tolerances around the stated numerical value (e.g., ±10%). Further, when the words "generally" and "substantially" are used in connection with a geometric shape, it should be understood that exactness of the geometric shape is not required, but the latitude of the shape is within the scope of the present disclosure.

[0058] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the exemplary embodiments belong. It should be further understood that terms, including those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0059] Hereinafter, reference will be made to the appended Figures 1 to 9 The exemplary embodiments of the present invention will be described in more detail.

[0060] Figure 1 FIG. 1 is a top plan view of a substrate processing apparatus according to an exemplary embodiment of the present invention.

[0061] The substrate processing apparatus 10 includes an indexing module 100, a process module 200, and a controller 900. The indexing module 100 includes a load port 120 and a transfer frame 140. The load port 120, the transfer frame 140, and the process module 200 are arranged in a row in sequence. Hereinafter, the direction in which the load port 120, the transfer frame 140, and the process module 200 are arranged is referred to as a first direction 12, and when viewed from above, the direction perpendicular to the first direction 12 is referred to as a second direction 14, and the direction perpendicular to the plane including the first direction 12 and the second direction 14 is referred to as a third direction 16.

[0062] A carrier 130 that houses a substrate W is installed on a load port 120. A plurality of load ports 120 are provided, and the plurality of load ports are arranged in a line along a second direction 14. The number of load ports 120 can be increased or decreased according to the process efficiency of the process module 200 and the floor area requirements. The carrier 130 is formed with a plurality of slots (not shown) for receiving the substrate W in a horizontal position relative to the ground. A Front Opening Unified Pod (FOUP) can be used as the carrier 130.

[0063] The process module 200 includes a buffer unit 220, a transfer chamber 240, and a process chamber 260. The transfer chamber 240 can be arranged such that its longitudinal direction is parallel to the first direction. The process chamber 260 can be provided on the opposite side of the transfer chamber 240. On one side of the transfer chamber 240 and on the other side of the transfer chamber 240, the process chambers 260 are symmetrically arranged with respect to the transfer chamber 240. On one side of the transfer chamber 240, a plurality of process chambers 260 are provided. Some of the process chambers 260 can be arranged along the longitudinal direction of the transfer chamber 240. Further, some of the plurality of process chambers 260 can be arranged to be stacked on top of each other. That is, the plurality of process chambers 260 can be arranged in an A×B arrangement on one side of the transfer chamber 240. Here, "A" is the number of process chambers 260 arranged in a line along the first direction 12, and "B" is the number of process chambers 260 arranged in a line along the third direction 16. When four or six process chambers 260 are provided on one side of the transfer chamber 240, the process chambers 260 can be arranged in a 2×2 or 3×2 arrangement. The number of process chambers 260 can be increased or decreased. Different from the foregoing, the process chambers 260 can be provided only on one side of the transfer chamber 240. In addition, the process chambers 260 can be provided as a single layer on one side or both sides of the transfer chamber 240.

[0064] The buffer unit 220 is provided between the transfer frame 140 and the transfer chamber 240. The buffer unit 220 can provide a space in which the substrate W stays before being transferred between the transfer chamber 240 and the transfer frame 140. Slots (not shown) for placing the substrate W are provided inside the buffer unit 220. A plurality of slots (not shown) can be provided to be spaced apart from each other along the third direction 16. The surface of the buffer unit 220 facing the transfer frame 140 and the surface of the buffer unit 220 facing the transfer chamber 240 can be open.

[0065] The transfer frame 140 transfers the substrate W between the carrier 130 installed at the loading port 120 and the buffer unit 220. The indexing rail 142 and the indexing robot 144 are provided to the transfer frame 140. The longitudinal direction of the indexing rail 142 is parallel to the second direction 14. The indexing robot 144 is mounted on the indexing rail 142 and linearly moves along the indexing rail 142 in the second direction 14. The indexing robot 144 includes a base 144a, a body 144b, and an indexing arm 144c. The base 144a is mounted to be movable along the indexing rail 142. The body 144b is coupled to the base 144a. The body 144b is provided to be movable along the third direction 16 on the base 144a. Further, the body 144b is provided to be rotatable on the base 144a. The indexing arm 144c is coupled to the body 144b and is provided to be movable forward and backward with respect to the body 144b. A plurality of indexing arms 144c are provided to be individually driven. The indexing arms 144c are provided to be stacked in a state of being spaced apart from each other along the third direction 16. When the substrate W is transferred from the process module 20 to the carrier 130, some of the indexing arms 144c can be used, and when the substrate W is transferred from the carrier 130 to the process module 200, some of the plurality of indexing arms 144c can be used. This can prevent particles generated by the substrate W before the process from adhering to the substrate W after the process during the loading and unloading of the substrate W by the indexing robot 144.

[0066] The transfer chamber 240 transfers the substrate W between the buffer unit 220 and the process chamber 260, and between the process chambers 260. The guide rail 242 and the main robot 244 are provided in the transfer chamber 240. The guide rail 242 is provided such that its longitudinal direction is parallel to the first direction 12. The main robot 244 is mounted on the guide rail 242 and linearly moves along the guide rail 242 in the first direction 12. The main robot 244 includes a base 244a, a body 244b, and a main arm 244c. The base 244a is mounted to be movable along the guide rail 242. The body 244b is coupled to the base 244a. The body 244b is provided to be movable along the third direction 16 on the base 244a. Further, the body 244b is provided to be rotatable on the base 244a. The main arm 244c is coupled to the body 244b and is provided to be movable forward and backward with respect to the body 244b. A plurality of main arms 244c are provided to be individually driven. The main arms 244c are provided to be stacked in a state of being spaced apart from each other along the third direction 16.

[0067] A substrate processing apparatus for performing a liquid processing process on a substrate W is disposed in a process chamber 260. The process chamber 260 may be a liquid processing chamber. Depending on the type of cleaning process performed, the substrate processing apparatus may have different structures. Alternatively, the substrate processing apparatus within each process chamber 260 may have the same structure. Optionally, the process chamber 260 may be divided into multiple groups such that the substrate processing apparatuses within the process chambers 260 belonging to the same group may have the same structure, while the substrate processing apparatuses disposed within the process chambers 260 belonging to different groups may have different structures.

[0068] The controller unit 900 may include: a process controller constituted by a microprocessor (computer) that executes control of the substrate processing apparatus 10; a user interface constituted by a keyboard on which an operator performs command input operations and the like for managing the substrate processing apparatus 10; a display for visualizing and displaying the operating status of the substrate processing apparatus 10 and the like; and a storage unit that stores a control program for executing a process performed in the substrate processing apparatus 10 under the control of the process controller, or stores a program (i.e., a processing recipe) for executing a process in each component according to various data and processing conditions. Further, the user interface and the storage unit may be connected to the process controller. The processing recipe may be stored in a storage medium in the storage unit, and the storage medium may be a hard disk, a portable disk (such as a CD-ROM or a DVD), or a semiconductor memory (such as a flash memory).

[0069] Figure 2 To show a cross-sectional view of the substrate processing apparatus disposed in the Figure 1 process chamber, and Figure 3 To show a top plan view of the substrate processing apparatus disposed in the Figure 1 process chamber.

[0070] Referring to Figure 2 and Figure 3 , the substrate processing apparatus includes a housing 310, a processing container 320, a support unit 340, a lifting unit 360, a liquid supply unit 380, and a photographing unit 400.

[0071] The housing 310 has a processing space 312 therein. The housing 310 may have a barrel shape with a space therein. The processing container 320, the support unit 340, the lifting unit 360, and the liquid supply unit 380 may be disposed in the internal space 310 of the housing 310. When viewed from the front cross-section, the housing 310 may have a rectangular shape. However, the present invention is not limited thereto, and the housing 310 may be deformed into various shapes capable of having the processing space 312.

[0072] The processing container 320 may have a barrel shape with an open top. The processing container 320 includes an internal recovery container 322 and an external recovery container 326. Each of the recovery containers 322 and 326 recovers different processing liquids in the processing liquid used in the process. The internal recovery container 322 is arranged in an annular shape surrounding the substrate support unit 340, and the external recovery container 326 is arranged in an annular shape surrounding the internal recovery container 326. The internal space of the internal recovery container 322 and the internal recovery container 322 serve as a first inlet 322a through which the processing liquid flows into the internal recovery container 322. The space between the internal recovery container 322 and the external recovery container 326 serves as a second inlet 326a through which the processing liquid flows into the external recovery container 326. In one example, the inlets 322a and 326a may be located at different heights. Recovery pipelines 322b and 326b are respectively connected below the bottoms of the recovery containers 322 and 326. The processing liquid introduced into each of the recovery containers 322 and 326 can be supplied to an external processing liquid regeneration system (not shown) through the recovery pipelines 322b and 326b and reused.

[0073] The support unit 340 supports the substrate W in the processing space 312. During the process, the support unit 340 supports and rotates the substrate W. The support unit 340 includes a support plate 342, support pins 344, chuck pins 346, and rotation drive members 348 and 349.

[0074] The support plate 342 is arranged in a substantially circular plate shape and has an upper surface and a lower surface. The lower surface has a diameter smaller than that of the upper surface. That is, the support plate 342 may have a shape with a narrow upper surface and a narrow lower surface. The upper surface and the lower surface are positioned such that their central axes coincide with each other. In addition, a heating device (not shown) may be provided on the support plate 342. The heating device provided on the support plate 342 can heat the substrate W placed on the support plate 342. The heating device can generate heat. The heat generated by the heating device can be hot or cold. The heat generated by the heating device can be transferred to the substrate W placed on the support plate 342. In addition, the heat transferred to the substrate W can heat the processing liquid supplied to the substrate W. The heating device may be a heater and / or a cooling coil. However, the present invention is not limited thereto, and the heating device can be differently modified with known devices.

[0075] A plurality of support pins 344 are provided. The support pins 344 are arranged at intervals with a predetermined gap on the edge of the upper surface of the support plate 342 and protrude upward from the support plate 342. The support pins 344 are arranged in an annular shape formed by combining with each other. The support pins 344 can support the rear edge of the substrate W such that the substrate W is spaced apart from the upper surface of the support plate 342 by a predetermined distance.

[0076] A plurality of chuck pins 346 are provided. The chuck pins 346 are provided to be farther from the center of the support plate 342 than the support pins 344. The chuck pins 346 are provided to protrude upward from the upper surface of the support plate 342. The chuck pins 346 support the side portions of the substrate W such that the substrate W does not laterally separate from the original position when the support plate 342 rotates. The chuck pins 346 are provided to be linearly movable between an outer position and an inner position in the radial direction of the support plate 342. The outer position is a position farther from the center of the support plate 342 than the inner position. When the substrate W is loaded onto or unloaded from the support plate 342, the chuck pins 346 are positioned at the outer position, and when a process is performed on the substrate W, the chuck pins 346 are positioned at the inner position. The inner position is a position where the chuck pins 346 and the side portions of the substrate W are in contact with each other, and the outer position is a position where the chuck pins 346 and the substrate W are spaced apart from each other.

[0077] Rotation drive members 348 and 349 rotate the support plate 342. The support plate 342 can be rotated about the magnetic center axis by the rotation drive members 348 and 349. The rotation drive members 348 and 349 include a support shaft 348 and a drive unit 349. The support shaft 348 has a barrel shape facing the third direction 16. The upper end of the support shaft 348 is fixedly coupled to the bottom surface of the support plate 342. According to an example, the support shaft 348 can be fixedly coupled to the center of the bottom surface of the support plate 342. The drive unit 349 provides a driving force to rotate the support shaft 348. The support shaft 348 is rotated by the drive unit 349, and the support plate 342 rotates together with the support shaft 348.

[0078] The lifting unit 360 linearly moves the processing container 320 in the vertical direction. When the processing container 320 moves up and down, the relative height of the processing container 320 with respect to the support plate 342 changes. When the substrate W is loaded onto or unloaded from the support plate 342, the lifting unit 360 lowers the processing container 320 such that the support plate 342 protrudes beyond the processing container 320. Further, during the process, the height of the processing container 320 is adjusted according to the type of the processing liquid supplied to the substrate W such that the processing liquid is introduced into the predetermined recovery containers 322, 326. The lifting unit 360 includes a bracket 362, a moving shaft 364, and a driver 366. The bracket 362 is fixedly mounted on the outer wall of the processing container 320, and the moving shaft 364 that is moved in the vertical direction by the driver 366 is fixedly coupled to the bracket 362. Optionally, the lifting unit 360 can move the support plate 342 in the vertical direction.

[0079] The liquid supply unit 380 supplies a processing liquid onto the substrate W. The liquid supply unit 380 may supply a processing liquid in which plasma is generated onto the substrate W. The processing liquid may be a chemical, a rinse liquid, a wetting liquid, a cleaning liquid, or an organic solvent. The chemical may be a liquid having acidity or alkalinity. For example, the chemical may include sulfuric acid (H2SO4), phosphoric acid (P2O5), hydrofluoric acid (HF), and ammonium hydroxide (NH4OH). The chemical may be a mixture of diluted sulfuric acid peroxide (DSP). The cleaning solution, the rinse liquid, and the wetting liquid may be pure water (H2O). The organic solvent may be isopropyl alcohol (IPA) liquid.

[0080] The liquid supply unit 380 may include a moving member 381 and a nozzle 385. The moving member 381 moves the nozzle 385 to a process position and a waiting position. The process position is a position where the nozzle 385 faces the substrate W supported by the support unit 340. According to an example, the process position is a position where the processing liquid is discharged onto the upper surface of the substrate W. Further, the process position further includes a first supply position and a second supply position. The first supply position may be a position closer to the center of the substrate W than the second supply position, and the second supply position may be a position including an end of the substrate. Optionally, the second supply position may be an area adjacent to the substrate end. The waiting position is defined as a position where the nozzle 385 is disengaged from the process position. According to an example, the waiting position may be a position where the nozzle 385 waits before or after the processing on the substrate W is completed.

[0081] The moving member 381 includes an arm 382, a support shaft 383, and a driver 384. The support shaft 383 is located on one side of the processing chamber 320. The support shaft 383 has a rod shape with a longitudinal direction facing a third direction. The support shaft 383 is provided to be rotatable by the driver 384. The support shaft 383 is provided to be capable of lifting and lowering movements. The arm 382 is coupled to the upper end of the support shaft 383. The arm 382 extends vertically from the support shaft 383. The nozzle 385 is coupled to the distal end of the arm 382. A liquid supply unit for supplying the processing liquid to the nozzle 385 may be provided inside the arm 382. In addition, the nozzle 385 may be coupled to the arm 382 to adjust the angle at which the processing liquid is discharged onto the upper surface of the substrate W. As the support shaft 383 rotates, the nozzle 382 may swing and move together with the arm 382. The nozzle 385 may swing and move to the process position and the waiting position. Optionally, the arm 382 may be provided to be capable of moving forward and backward along its longitudinal direction. When viewed from above, the path along which the nozzle 385 moves may coincide with the central axis of the substrate W at the process position.

[0082] In addition, a plurality of liquid supply units 380 may be provided. For example, the substrate processing apparatus may be provided with a first liquid supply unit 380A and a second liquid supply unit 380B. When viewed from above, the first liquid supply unit 380A and the second liquid supply unit 380B may have shapes that are symmetric to each other with respect to the center of the substrate W.

[0083] In addition, the first liquid supply unit 380A may include a first moving member 381A and a first nozzle 385A, and the second liquid supply unit 380B may include a second moving member 381B and a second nozzle 385B.

[0084] Hereinafter, the imaging unit 400 of the present invention will be described in detail.

[0085] Figure 4 To show the front part of the container Figure 2 viewed along direction A from the imaging unit, and Figure 5 To show the vision member and the illumination assembly Figure 2 viewed along direction B from the imaging unit.

[0086] The imaging unit according to an exemplary embodiment of the present invention may image the processing space 312. The imaging unit 400 may image the processing space 312 in order to obtain an image or video including the substrate W placed on the support unit 340 in the processing space 312, the nozzle 385 of the liquid supply unit 380, and the processing liquid L discharged from the nozzle 385. The imaging unit 400 may obtain an image or video and transmit the obtained image or video to the controller 900. The controller 900 may analyze the image or video obtained by the imaging unit 400 to check the process state.

[0087] The process state checked by the controller 900 through the image or video may refer to the substrate state, the nozzle state, or the processing liquid discharge state. The substrate state may refer to the presence or absence of the substrate W, the supporting state of the substrate W, and whether the substrate W is damaged, etc. The nozzle state may refer to the position of the nozzle 385, the misalignment of the nozzle 385, the contamination of the nozzle 385, etc. The processing liquid discharge state may refer to the discharge direction of the processing liquid L, the discharge thickness of the processing liquid L, etc.

[0088] The imaging unit 400 may include a container 410, a first vision member 420, a second vision member 430, an illumination assembly 440, and a chamber illumination member 450.

[0089] The container 410 can be mounted on the upper part of the housing 310. The container 410 can be mounted on the upper edge region of the housing 310. The container 410 can include a barrel-shaped body 411 having an open upper part and a lid 412 covering the upper part of the body 411. The body 411 and the lid 412 can be joined to each other to provide an internal space 413. The internal space 413 can be a space that is spatially separated from the processing space 312. In addition, the body 411 and / or the lid 412 of the container 410 can be formed of a material that has excellent corrosion resistance against the fumes generated by the processing liquid L in the processing space 312.

[0090] The front part 414 of the container 410 can face the processing space 413. The front part 414 can be a part of the body 411. The front part 414 faces the processing space 312 and can have an inclined surface. A plurality of openings can be formed in the front part 414, and a plurality of windows can be mounted in each opening. For example, a first window 415 corresponding to the first visual member 420 described below, a second window 416 corresponding to the second visual member 430, a third window 417 corresponding to the lighting units 443 belonging to the first group G to the sixth group G6, and a fourth window 418 corresponding to the lighting units 443 belonging to the seventh group G7 to the twelfth group G12 can be mounted in the openings formed in the front part 414.

[0091] The first window 415 can be provided with transparent PVC, the second window 416 can be provided with a germanium window capable of transmitting infrared rays, and the third window 417 and the fourth window 418 can be provided with transparent PVC.

[0092] The lid 412 can cover the body 411. The lid 412 can be provided at a position not exposed to the outside of the housing 310 (more specifically, the processing space 312). The lid 412 can be configured such that an operator can open and close the internal space 413 from the outside of the processing space 312. The lid 412 can be provided to be detachable from the body 411, or can be coupled to the body 411 through a hinge member (such as a hinge).

[0093] The first vision member 420 can be installed to be inserted into an opening formed in a lighting panel 441 as described below. The first vision member 420 can be configured to photograph the processing space 312 to obtain an image of the processing space or a monitoring image. The first vision member 420 can obtain an image in the form of unprocessed raw data and transmit the obtained image to the controller 900, enabling the process state of the processing space 312 to be accurately identified. In addition, the first vision member 420 can obtain an image of the processing space 312 as an image with Ultra High Definition-level resolution (UHD-level resolution) by using the H265 high compression method and transmit the obtained image to the controller 900.

[0094] In addition, the above-described nozzle 385 can be made of a transparent or translucent material and is arranged such that the internal path can be observed from the outside. When the processing liquid L of the nozzle 385 forms at the end of the nozzle 385, the processing liquid L may drop, and to prevent this, the processing liquid L of the nozzle 385 can be sucked back by using a decompression device or the like. The sucked-back state of the nozzle 385 can also be checked by an image or video obtained by the first vision member 420.

[0095] The second vision member 430 can be installed on one side of the first vision member 420. The second vision member 430 can obtain a thermal image. The thermal image can be an image indicating the temperature of the substrate W or processing containers and the support unit 340 etc. arranged around the substrate W. The second vision member 430 can be provided by an infrared thermal image camera or the like.

[0096] The controller 900 can simultaneously display the monitoring image obtained by the above-described first vision member 420 and the thermal image obtained by the second vision member 430 on a display (such as a monitor). For example, the monitoring image can be displayed on the display, and the thermal image can be displayed together at a reduced scale at the lower right end of the monitoring image. In this way, the operator can more effectively identify the process state.

[0097] In addition, the controller 900 can identify the support unit 340 and / or the substrate W placed on the support unit 340 from the monitoring image and obtain measurement points. The measurement points can be the center point of the substrate W, the edge boundary line of the substrate W, or the edge boundary line of the support unit 340. Based on the obtained measurement points, the measurement points of the thermal image can be automatically set (i.e., the position and target within the processing space 312 for thermal image data obtained by the second vision member 430).

[0098] The illumination assembly 440 can emit light into the processing space 312. The illumination assembly 440 can emit the light required for the first vision member 420 to obtain an image or monitor an image into the processing space 312. The illumination assembly 440 can emit light in a downwardly inclined direction onto the substrate W placed on the support unit 340. When the light is emitted in a direction perpendicular to the upper surface of the substrate W, the light can be reflected on the upper surface of the substrate W. In this case, light reflection may occur on the upper surface of the substrate W. A part of the substrate W where light reflection occurs may be brightly illuminated. Since light reflection occurs on the brightly illuminated part, it may be difficult to clearly identify the state of the substrate W in the image / video of the substrate W.

[0099] Therefore, the advantage of the present invention is that the light emitted by the illumination assembly 440 can be irradiated in a downwardly inclined direction, thereby minimizing the occurrence of light reflection on the substrate W.

[0100] The illumination assembly 440 can include an illumination plate 441 and an illumination unit 443. The longitudinal direction of the illumination plate 441 can be parallel to the direction in which the first liquid supply unit 380A and the second liquid supply unit 380B are arranged. Among the surfaces of the illumination plate 441, the surface on which the illumination unit 443 is mounted can be mounted to be inclined with respect to the processing space 312.

[0101] Among the surfaces of the illumination plate 441, a plurality of illumination angle adjustment units 442 can be formed on the surface on which the illumination unit 443 can be mounted. The illumination angle adjustment unit 442 can adjust the light emission angle of the illumination unit 443. The illumination angle adjustment unit 442 can be formed to correspond to the groups of the illumination unit 443 described below, respectively. For example, as described below, the illumination unit 443 can be classified into the first group G1 to the twelfth group G12, and the illumination angle adjustment unit 442 can be formed on the front surface of the illumination plate 441 to correspond to each of the first group G1 to the twelfth group G12.

[0102] The illumination angle adjustment unit 442 can be provided with inclined surfaces at different angles. In addition, each of the illumination angle adjustment units 442 can be provided with a plurality of inclined surfaces. In addition, the illumination unit 443 can be mounted on each inclined surface.

[0103] Through the illumination angle adjustment unit 442, the illumination units 443 of the first group G1 and the seventh group G7 belonging to the central group described below can emit light to the central region of the substrate W, and the illumination units 443 of the second group G2 to the sixth group G6 and the eighth group G8 to the twelfth group G12 belonging to the edge group described below can emit light to the edge region of the substrate W.

[0104] The illumination unit 443 can emit light to illuminate the processing space 312. When the first vision member 420 obtains an image or monitors an image (in some cases, when the second vision member 430 obtains a thermal image), the illumination unit 443 can emit light to illuminate the processing space 312.

[0105] The illumination unit 443 can include an illumination member 443a (LED light source) and a condenser lens 443b. The light generated by the illumination member 443a can have a very wide irradiation range, but by attaching the condenser lens 443b to the front surface of the illumination member 443a, the irradiation range of the light can be narrowed. As the irradiation range of each illumination unit 443 is narrowed, each illumination unit 443 can emit light by more clearly targeting a specific area.

[0106] The illumination units 443 can be divided into multiple groups. For example, the illumination units 443 can be divided into groups from the first group G1 to the twelfth group G12. The illumination units 443 of the first group G1 and the seventh group G7 can emit light to the central region of the substrate W and emit light in a downward inclined direction. The first group G1 and the seventh group G7 can be referred to as the central groups. The illumination units 443 of the second group G2 to the sixth group G6 and the eighth group G8 to the twelfth group G12 can emit light to the edge region of the substrate W and emit light in a downward inclined direction. The second group G2 to the sixth group G6 and the eighth group G8 to the twelfth group G12 can be referred to as the edge groups. Each group can be provided with multiple illumination units 443. For example, each group can be provided with two illumination units 443.

[0107] The chamber illumination member 450 can be mounted on the side wall of the housing 310. The chamber illumination member 450 can have a structure that is substantially the same as or similar to the above-described illumination unit 443. For example, the chamber illumination member 450 can be composed of an illumination member (LED light source) and a condenser lens. The chamber illumination members 450 can be provided in multiple. Some of the multiple chamber illumination members 450 can be provided to face one side of the substrate W, and some can be provided to face the other side of the substrate W. The irradiation range of the chamber illumination member 450 can be set within the range where light can reach the substrate W from the nozzle 385. In addition, the chamber illumination member 450 can be embedded in a cavity formed in the inner wall of the housing 310, and the cavity can be shielded by a window (such as the above-mentioned transparent PVC) to prevent impurities from entering the chamber illumination member 450.

[0108] Figure 6 It is a schematic diagram showing a method of fixing an illumination plate and a container.

[0109] Refer to Figure 5 and Figure 6, a plurality of fastening holes 441a may be formed on both sides of the lighting plate 441. The fixing bolt FB and the adjusting bolt AB, which will be described later, may be inserted into the plurality of fastening holes 441a.

[0110] As described above, the lighting plate 441 may be installed in a downwardly inclined direction with respect to the processing space 312. However, the inclination angle of the lighting plate 441 may need to be adjusted as required.

[0111] Therefore, the photographing unit 400 of the present invention includes a fixing bolt FB and an adjusting bolt AB. First, the adjusting bolt AB may be inserted into the fastening hole 441a, and one end may be fastened to the second groove 419b formed in the main body 411. In addition, the adjusting bolt AB may be inserted into an elastic member SP (such as a spring). The elastic member SP is located between the lighting plate 441 and the main body 411, and may push the lighting plate 441 away from the main body 411.

[0112] The fixing bolt FB is inserted into the fastening hole 441a, and may be fixed to the first groove 419a formed in the main body 411 at one end. The depth of the first groove 419a may be deeper than the depth of the second groove 419b. Therefore, when the operator wants to position the lighting plate 441 closer to the main body 411, the operator may fasten the fixing bolt FB deeper into the first groove 419a. Conversely, when the operator wants to position the lighting plate 441 farther from the main body 411, the fixing bolt FB may be fastened shallower into the first groove 419a. The inclination angle of the lighting plate 441 may vary according to the degree to which the fixing bolt FB is inserted into the first groove 419a.

[0113] Figure 7 FIG. is a block diagram showing a control mode of the lighting member of the photographing unit of the present invention.

[0114] The controller 900 controls the photographing unit 400 to obtain an image or video for inspecting the process state through any one of two lighting control modes M. The lighting control mode M may include a substrate inspection mode M1 and a liquid discharge inspection mode M2. The substrate inspection mode M1 may be a mode used when obtaining an image or video for inspecting the state of the substrate described above, and the liquid discharge inspection mode M2 may be a mode used when obtaining an image or video for inspecting the state of the nozzle and / or the liquid discharge state of the process liquid described above.

[0115] Figure 8 FIG. is a schematic diagram showing the area where the lighting unit emits light to the substrate in the substrate inspection mode.

[0116] Refer to Figure 8, the substrate inspection mode M1 is executed when the substrate W is placed on the support unit 340. In the substrate inspection mode M1, all the lighting elements of the imaging unit 400 can be turned on. For example, in the substrate inspection mode M1, the lighting units 443 of all the lighting assemblies 440 and the chamber lighting element 450 installed in the housing 310 can be turned on.

[0117] In this case, the lighting units 443 belonging to the first group G1 emit light to the first area A1 which is the central area of the substrate W, the lighting units 443 belonging to the second group G2 emit light to the second area A2 which is the edge area of the substrate W, the lighting units 443 belonging to the third group G3 emit light to the third area A3 which is the edge area of the substrate W, the lighting units 443 belonging to the fourth group G4 emit light to the fourth area A4 which is the edge area of the substrate W, the lighting units 443 belonging to the fifth group G5 emit light to the fifth area A5 which is the edge area of the substrate W, the lighting units 443 belonging to the sixth group G6 emit light to the sixth area A6 which is the edge area of the substrate W, the lighting units 443 belonging to the seventh group G7 emit light to the seventh area A7 which is the central area of the substrate W, the lighting units 443 belonging to the eighth group G8 emit light to the eighth area A8 which is the edge area of the substrate W, the lighting units 443 belonging to the ninth group G9 emit light to the ninth area A9 which is the edge area of the substrate W, the lighting units 443 belonging to the tenth group G10 emit light to the tenth area A10 which is the edge area of the substrate W, the lighting units 443 belonging to the eleventh group G11 emit light to the eleventh area A11 which is the edge area of the substrate W, and the lighting units 443 belonging to the twelfth group G12 emit light to the twelfth area A12 which is the edge area of the substrate W.

[0118] The first area A1 and the seventh area A7 can be substantially the same / similar areas, and the second area A2 to the sixth area A6 and the eighth area A8 to the twelfth area A12 can overlap to a certain extent but can be substantially different areas. In addition, in Figure 8 in order to facilitate the explanation of the areas where each group emits light, the areas where light is emitted are shown slightly narrowed, but actually, the areas where each group emits light are larger than Figure 8 the areas shown in

[0119] The lighting units 443 belonging to the second group G2 to the sixth group G6 and the eighth group G8 to the twelfth group G12 emit light to different edge regions arranged along the circumferential direction of the substrate W, and only the lighting units 443 belonging to the first group G1 and the seventh group G7 emit light to the central region of the substrate W. When all the lighting units 443 emit light towards the edge region of the substrate W, the light concentration in the central region of the substrate W is more obvious, and in this case, the light reflection phenomenon may occur more significantly. However, in the present invention, the lighting units 443 are classified into multiple groups, and the lighting units 443 belonging to each group emit light to different regions of the substrate W, so that the light concentration in a specific region of the substrate W can be alleviated. In this way, the obvious occurrence of the light reflection phenomenon can be minimized.

[0120] Figure 9 FIG. is a schematic view showing a lighting unit and a chamber lighting member that emit light to a processing liquid in a liquid discharge inspection mode as viewed from above, and Figure 10 FIG. is a schematic view showing a chamber lighting member that emits light to a processing liquid in a Figure 9 liquid discharge inspection mode as viewed from the front.

[0121] When the nozzle 385 is positioned at the upper center of the substrate W or when the nozzle 385 discharges the processing liquid L onto the substrate W, the liquid discharge inspection mode M2 can be executed. In the liquid discharge inspection mode M2, among the lighting members of the photographing unit 400, only the lighting units 443 belonging to the first group G1 and the seventh group G7 and the chamber lighting member 450 can be turned on. The lighting units 443 belonging to the remaining groups can be turned off.

[0122] Since the nozzle 385 is a rigid body, when the lighting units 443 belonging to the first group G1 and the seventh group G7 and the chamber lighting member 450 are turned on, the first vision member 420 can obtain an image or video of the outer appearance of the nozzle 385.

[0123] In addition, in the case where the processing liquid L is discharged from the nozzle 385, the processing liquid L usually has a cylindrical shape and can be supplied to the substrate W. In this case, the lighting angle adjustment unit 442 of the lighting plate 441 can set an inclined surface so that the light emitted by the lighting units 443 belonging to the first group G1 and the seventh group G7 can be reflected by the processing liquid L having a cylindrical shape and can travel towards the first vision member 420. In addition, the light emitted by the chamber lighting member 450 can be reflected by the processing liquid L and can propagate towards the first vision member 420.

[0124] In the substrate inspection mode M1, all the lighting elements of the imaging unit 400 can be turned on. For example, in the substrate inspection mode M1, the lighting units 443 of all the lighting assemblies 440 and the chamber lighting element 450 installed in the housing 310 can be turned on.

[0125] The imaging unit 400 according to an exemplary embodiment of the present invention can be installed in the upper edge region of the housing 310. The internal space 413 of the imaging unit 400 can be opened and closed by an operator through the lid-like member 412. Therefore, when the operator maintains / repairs the vision elements and lighting elements, he / she can maintain and repair most of the devices related to image / video shooting by only maintaining and repairing the imaging unit 400 from the outside of the housing 310. That is, since the imaging unit 400 is separately provided, the time required for maintenance / repair can be minimized.

[0126] In addition, since the vision elements 420 and 430 and the lighting unit 443 are provided in the internal space 413 separated from the processing space 312, a high-level explosion-proof design for the vision elements 420 and 430 and the lighting unit 443 is not required, and thus, the cost required for manufacturing the device can also be reduced.

[0127] Furthermore, according to the type of the process state to be inspected, the lighting control mode is changed to help obtain images and videos of the inspection target more effectively. Furthermore, the lighting unit 443 emits light in a downwardly inclined direction and disperses and emits the light to a plurality of regions of the substrate W, thereby minimizing the problem of light reflection.

[0128] It should be understood that exemplary embodiments are disclosed herein and other variations are possible. Each element or feature of a particular exemplary embodiment is generally not limited to that particular exemplary embodiment, but is interchangeable and can be used in a selected exemplary embodiment that is applicable even when not specifically stated or described. Such modifications should not be considered to depart from the spirit and scope of the present invention, and all such modifications that are obvious to a person of ordinary skill in the art are intended to be included within the scope of the appended claims.

Claims

1. A device for processing a substrate, the device comprising: A housing providing a processing space; a support unit configured to support a substrate in the processing space; as well as a photographing unit, wherein the photographing unit is configured to photograph the processing space, Wherein, the photographing unit comprises: a container mounted on one upper side of the housing and providing an inner space separated from the processing space; and A visual component is disposed in the inner space of the container and photographs the processing space in a downwardly inclined direction.

2. The device according to claim 1, wherein: The container comprises: a barrel-shaped body having an open top; and a cover-shaped member, the cover-shaped member being combined with the barrel-shaped body to form the inner space, and The cover is configured to open and close the internal space from an external side of the processing space.

3. The device according to claim 1, wherein: The photographing unit further includes a lighting assembly that is disposed in the container and emits light in a downwardly inclined direction onto the substrate placed on the supporting unit.

4. The device according to claim 3, wherein: The lighting assembly comprises: lighting panels; and a plurality of lighting units, the plurality of lighting units being mounted on the lighting panel, and The plurality of lighting units are divided into a plurality of groups, and each of the groups is configured to emit light to a different area of ​​the substrate placed on the supporting unit.

5. The device according to claim 4, wherein: The lighting panel is formed with a plurality of angle adjustment units respectively corresponding to the plurality of groups, and The plurality of angle adjustment units adjust the irradiation angles of the lighting units so that the center group of the plurality of groups emits the light to a center region of the substrate and the edge group of the plurality of groups emits the light to an edge region of the substrate.

6. The device according to claim 5, wherein: The edge groups are provided in plural numbers, and the edge groups emit the light to different edge regions of the substrate.

7. The device according to claim 5, wherein: The device also includes: a nozzle configured to discharge a processing liquid onto the substrate supported on the supporting unit; The photographing unit includes a chamber lighting element, which is mounted on a side wall of the housing and emits light toward the supporting unit.

8. The device according to claim 7, wherein: The device also includes: a controller configured to control the photographing unit, Wherein, when the state of the substrate placed on the supporting unit is to be checked, the controller controls the photographic unit in a first mode, in which the visual component photographs the substrate with the lighting unit of the center group, the lighting unit of the edge group and the chamber lighting component turned on.

9. The device according to claim 7, wherein: The device also includes: a controller configured to control the photographing unit, Wherein, when it is necessary to check the state of the nozzle or the processing liquid discharged from the nozzle, the controller controls the photographic unit in a second mode, in which the visual component photographs the nozzle or the processing liquid with the lighting unit of the central group and the chamber lighting component turned on.

10. The device according to claim 5, wherein: The lighting unit comprises: a lighting element configured to generate the light; and A condenser lens is configured to collect the light generated by the lighting element.

11. The device according to claim 4, wherein: The lighting panel is fixed to the front of the container facing the processing space by fixing bolts and adjusting bolts. An elastic member is inserted into the adjusting bolt, and The elastic member is positioned between the container and the lighting board and is configured to urge the lighting board in a direction away from the front of the container.

12. The device according to claim 11, wherein The fixing bolts are provided in plurality, and One end of the fixing bolt is inserted into a groove formed in the container, and the tilt angle of the lighting board is adjusted according to the extent to which the fixing bolt is inserted into the groove.

13. The device according to claim 1, wherein: The visual components include: a first visual component configured to obtain an image or a monitoring video of the processing space; A second vision component is configured to obtain a thermal image of the processing space.

14. The device according to claim 13, wherein: The device also includes: a controller configured to control the photographing unit, Wherein, the controller identifies the support unit and / or the substrate placed on the support unit from the monitoring image obtained by the first visual component to obtain the measurement point, and the controller controls the photographic unit so that the second visual component obtains the thermal image for the measured measurement point.

15. A photographing unit provided to a chamber, the photographing unit comprising: a container providing an interior space that is different from the processing space of the chamber; a visual component, the visual component being disposed in the inner space of the container; as well as The lighting assembly is disposed in the container and emits light to a processing space of the liquid processing chamber in a downwardly inclined direction.

16. The imaging unit according to claim 15, wherein: The lighting assembly comprises: lighting panels; and A plurality of lighting units are mounted on the lighting panel.

17. The imaging unit according to claim 16, wherein: The lighting panel is formed with a plurality of angle adjustment units which provide a portion of the plurality of lighting units and other portions of the plurality of lighting units with a flat surface or an inclined surface to emit the light in different directions.

18. The imaging unit according to claim 16, wherein: The lighting unit comprises: a lighting element configured to generate the light; and A condenser lens collects the light generated by the lighting element.

19. The imaging unit according to claim 15, wherein: The container comprises: a barrel-shaped body having an open top; and a cover-shaped member, the cover-shaped member being combined with the barrel-shaped body to form the inner space, and The cover is configured to open and close the internal space from an external side of the processing space.

20. A liquid processing chamber for liquid processing a substrate, the liquid processing chamber comprising: A housing providing a processing space; a support unit configured to support a substrate in the processing space; a nozzle configured to discharge a processing liquid onto the substrate supported on the supporting unit; as well as a photographing unit configured to photograph the substrate placed on the supporting unit, the nozzle, or the processing liquid discharged from the nozzle, the photographing unit being controlled by a controller, Wherein, the photographing unit comprises: a container mounted on an upper side of the housing and providing an inner space separated from the processing space; a visual member disposed in the inner space of the container and photographing the substrate placed on the supporting unit in a downwardly inclined direction; a lighting assembly disposed in the container and emitting light in a downwardly inclined direction onto the substrate placed on the supporting unit; and a chamber lighting member mounted on a side wall of the housing and emitting light toward the support unit, The container comprises: a barrel-shaped body having an open top; and a cover-shaped member, the cover-shaped member being combined with the barrel-shaped body to form the inner space, and The cover-like member is configured to open and close the inner space from the outer side of the processing space, The lighting assembly comprises: lighting panels; and a plurality of lighting units, the plurality of lighting units being mounted on the lighting panel, and The plurality of lighting units are divided into a plurality of groups, and each of the groups is configured to emit light to a different area of ​​the substrate placed on the supporting unit, The lighting panel is formed with a plurality of angle adjustment units respectively corresponding to the plurality of groups, and The plurality of angle adjustment units adjust the irradiation angles of the illumination units so that the center group of the plurality of groups emits the light to the center area of ​​the substrate, and the edge group of the plurality of groups emits the light to the edge area of ​​the substrate, and The controller controls the photographic unit in either a first mode or a second mode, wherein in the first mode, when checking the state of the substrate placed on the supporting unit, the visual component photographs the substrate with the lighting unit of the center group, the lighting unit of the edge group, and the chamber lighting component turned on, and in the second mode, when checking the state of the nozzle or the processing liquid discharged from the nozzle, the visual component photographs the nozzle or the processing liquid with the lighting unit of the center group and the chamber lighting component turned on.

Images